AU2003296167A1 - Illumination optical system, illuminating device, projection exposure apparatus and exposure method - Google Patents

Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Info

Publication number: AU2003296167A1
Authority: AU; Australia
Prior art keywords: optical system; illumination optical; illuminating device; exposure apparatus; exposure method
Prior art date: 2002-12-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2003296167A

Inventor

Kiyoshi Mitarai

Kenji Suzuki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-12-26

Filing date

2003-12-26

Publication date

2004-08-23

2003-12-26 Application filed by Nikon Corp filed Critical Nikon Corp

2004-08-23 Publication of AU2003296167A1 publication Critical patent/AU2003296167A1/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Engineering & Computer Science (AREA)
General Engineering & Computer Science (AREA)
High Energy & Nuclear Physics (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU2003296167A 2002-12-26 2003-12-26 Illumination optical system, illuminating device, projection exposure apparatus and exposure method Abandoned AU2003296167A1 (en)

Applications Claiming Priority (7)

Application Number	Priority Date	Filing Date	Title
JP2002377149		2002-12-26
JP2002-377149		2002-12-26
JP2003076492		2003-03-19
JP2003-076492		2003-03-19
JP2003-173974		2003-06-18
JP2003173974		2003-06-18
PCT/JP2003/017043 WO2004068564A1 (en)	2002-12-26	2003-12-26	Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Publications (1)

Publication Number	Publication Date
AU2003296167A1 true AU2003296167A1 (en)	2004-08-23

Family

ID=32830620

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2003296167A Abandoned AU2003296167A1 (en)	2002-12-26	2003-12-26	Illumination optical system, illuminating device, projection exposure apparatus and exposure method

Country Status (3)

Country	Link
JP (1)	JPWO2004068564A1 (en)
AU (1)	AU2003296167A1 (en)
WO (1)	WO2004068564A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7405804B2 (en) *	2004-10-06	2008-07-29	Asml Netherlands B.V.	Lithographic apparatus with enhanced spectral purity, device manufacturing method and device manufactured thereby
CN102365587B (en) *	2009-03-27	2015-07-22	卡尔蔡司Smt有限责任公司	Illumination optical system for EUV microlithography and EUV attenuator for such an illumination optical system, illumination system with such an illumination optical system and projection exposure apparatus
DE102014223454A1 (en) *	2014-11-18	2016-05-19	Carl Zeiss Smt Gmbh	Illumination optics for illuminating a lighting field and projection exposure apparatus with such an illumination optics

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3521506B2 (en) *	1994-11-24	2004-04-19	株式会社ニコン	Illumination device and exposure device
JP3706691B2 (en) *	1996-08-26	2005-10-12	キヤノン株式会社	X-ray reduction projection exposure apparatus and semiconductor device manufacturing method using the same
JPH10340843A (en) *	1997-06-06	1998-12-22	Nikon Corp	Illuminating equipment and aligner
JP4238390B2 (en) *	1998-02-27	2009-03-18	株式会社ニコン	LIGHTING APPARATUS, EXPOSURE APPARATUS PROVIDED WITH THE ILLUMINATION APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE EXPOSURE APPARATUS
JP2000162414A (en) *	1998-09-22	2000-06-16	Nikon Corp	Method for manufacturing a reflecting mirror, reflection type illumination device, or semiconductor exposure device
JP2001332472A (en) *	2000-05-19	2001-11-30	Canon Inc	X-ray exposure equipment
JP2002311216A (en) *	2001-04-19	2002-10-23	Nikon Corp	Method of manufacturing reflector, reflection type illumination device or semiconductor exposure device

2003
- 2003-12-26 AU AU2003296167A patent/AU2003296167A1/en not_active Abandoned
- 2003-12-26 WO PCT/JP2003/017043 patent/WO2004068564A1/en not_active Ceased
- 2003-12-26 JP JP2005515525A patent/JPWO2004068564A1/en active Pending

Also Published As

Publication number	Publication date
WO2004068564A1 (en)	2004-08-12
JPWO2004068564A1 (en)	2006-05-25

Similar Documents

Publication	Publication Date	Title
AU2003289126A1 (en)	2004-06-23	Illumination optical system, exposure system, and exposure method
SG10201405231YA (en)	2014-09-26	Projection optical system, exposure apparatus, and exposure method
AU2003289007A1 (en)	2004-06-30	Optical device and projection exposure apparatus using such optical device
AU2003256081A1 (en)	2004-03-11	Projection optical system and method for photolithography and exposure apparatus and method using same
AU2002354091A1 (en)	2003-06-23	Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
AU2001284694A1 (en)	2002-02-13	Illumination device and method for laser projector
AU2003265989A1 (en)	2004-04-23	Illumination system for optical inspection
AU2003291766A1 (en)	2004-07-29	Illumination apparatus and illumination method for an imaging apparatus
IL181136A0 (en)	2007-07-04	Projection optical system, exposure apparatus, and exposure method
AU2002225629A1 (en)	2003-07-24	System and method for inspection using white light intererometry
AU2002248784A1 (en)	2002-11-05	Methods and apparatus for positioning optical prisms
AU2003236640A1 (en)	2003-12-02	Illumination system for microlithography
AU2003255441A1 (en)	2005-03-29	Illuminating device for a microlithographic projection illumination system
AU2002344559A1 (en)	2003-06-10	Projection optical system, exposure device, and exposure method
AU2003244222A1 (en)	2004-02-02	Optical integrator, illumination optical device, exposure apparatus, and exposure method
AU2003221102A1 (en)	2003-10-27	Projection optical system, exposure system and exposure method
AU2002359699A1 (en)	2003-06-30	Apparatus and method for slide illumination
AU2003246548A1 (en)	2004-01-23	Optical device comprising an light source
EP1835527A4 (en)	2011-01-05	Projection optical system, exposure apparatus, exposure system, and exposure method
AU2003300059A1 (en)	2004-07-22	Apparatus and method for illuminating optical platen
EP1811544A4 (en)	2009-11-11	Lighting optical device, exposure system, and exposure method
EP1688786A4 (en)	2010-11-03	Reflector, light source device and projection display apparatus
AU2003275689A1 (en)	2004-05-25	Light source for image writing device, and production method for light source
EP1441257A3 (en)	2006-04-19	Illumination apparatus, projection exposure apparatus, and device fabricating method
AU6022400A (en)	2001-02-13	Exposure method, exposure system, light source, and method of device manufacture

Legal Events

Date	Code	Title	Description
2005-09-15	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase