AU2002327115A1 - Photosensitive resin composition for photoresist - Google Patents

Photosensitive resin composition for photoresist

Info

Publication number: AU2002327115A1
Authority: AU; Australia
Prior art keywords: photoresist; resin composition; photosensitive resin; photosensitive; composition
Prior art date: 2001-08-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2002327115A

Inventor

Joon-Yeon Cho

Byung-Uk Kim

Kyong-Il Kwon

Soo-Jung Park

Jae-Won Yoo

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Dongjin Semichem Co Ltd

Original Assignee

Dongjin Semichem Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-08-20

Filing date

2002-08-20

Publication date

2003-03-03

2002-08-20 Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd

2003-03-03 Publication of AU2002327115A1 publication Critical patent/AU2002327115A1/en

Status Abandoned legal-status Critical Current

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
KR2001/50089		2001-08-20

Publications (1)

Publication Number	Publication Date
AU2002327115A1 true AU2002327115A1 (en)	2003-03-03

Family

ID=

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