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AU2001259509A1 - Polymers for photoresist compositions for microlithography - Google Patents

Polymers for photoresist compositions for microlithography

Info

Publication number
AU2001259509A1
AU2001259509A1 AU2001259509A AU5950901A AU2001259509A1 AU 2001259509 A1 AU2001259509 A1 AU 2001259509A1 AU 2001259509 A AU2001259509 A AU 2001259509A AU 5950901 A AU5950901 A AU 5950901A AU 2001259509 A1 AU2001259509 A1 AU 2001259509A1
Authority
AU
Australia
Prior art keywords
microlithography
polymers
photoresist compositions
photoresist
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001259509A
Inventor
Michael Fryd
Mookkan Periyasamy
Frank Leonard Schadt Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of AU2001259509A1 publication Critical patent/AU2001259509A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
AU2001259509A 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography Abandoned AU2001259509A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US20196100P 2000-05-05 2000-05-05
US60201961 2000-05-05
PCT/US2001/014520 WO2001086352A2 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography

Publications (1)

Publication Number Publication Date
AU2001259509A1 true AU2001259509A1 (en) 2001-11-20

Family

ID=22748003

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001259509A Abandoned AU2001259509A1 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography

Country Status (4)

Country Link
EP (1) EP1279069A2 (en)
JP (1) JP2003532932A (en)
AU (1) AU2001259509A1 (en)
WO (1) WO2001086352A2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003186198A (en) * 2001-12-19 2003-07-03 Sony Corp Resist material and exposure method
JP2003186197A (en) * 2001-12-19 2003-07-03 Sony Corp Resist material and exposure method
TWI307819B (en) 2002-05-28 2009-03-21 Arch Spec Chem Inc Acetal protected polymers and photoresist compositions thereof
US7495135B2 (en) 2003-12-04 2009-02-24 International Business Machines Corporation Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
US7297811B2 (en) 2003-12-04 2007-11-20 International Business Machines Corporation Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use
US7820369B2 (en) 2003-12-04 2010-10-26 International Business Machines Corporation Method for patterning a low activation energy photoresist
US7193023B2 (en) 2003-12-04 2007-03-20 International Business Machines Corporation Low activation energy photoresists
JP5472217B2 (en) * 2011-06-29 2014-04-16 信越化学工業株式会社 Method for producing photoacid generator using 2,2-bis (fluoroalkyl) oxirane
US8968990B2 (en) * 2011-09-15 2015-03-03 Tokyo Ohka Kogyo Co., Ltd. Method of forming resist pattern
BR112015022649B1 (en) 2013-03-14 2020-05-19 Prec Planting Llc monitoring and control system for an agricultural implantation that has a plurality of row units
WO2019070617A1 (en) 2017-10-02 2019-04-11 Precision Planting Llc Systems and apparatuses for soil and seed monitoring

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4327360B2 (en) * 1998-09-23 2009-09-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Photoresist, polymer and microlithography methods
CN1251022C (en) * 1998-10-27 2006-04-12 纳幕尔杜邦公司 Photoresists and associated processes for microlitho graphy
WO2001037047A2 (en) * 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography

Also Published As

Publication number Publication date
WO2001086352A2 (en) 2001-11-15
WO2001086352A3 (en) 2002-03-28
EP1279069A2 (en) 2003-01-29
JP2003532932A (en) 2003-11-05

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