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AU2002309361A1 - Plasma reactor - Google Patents

Plasma reactor

Info

Publication number
AU2002309361A1
AU2002309361A1 AU2002309361A AU2002309361A AU2002309361A1 AU 2002309361 A1 AU2002309361 A1 AU 2002309361A1 AU 2002309361 A AU2002309361 A AU 2002309361A AU 2002309361 A AU2002309361 A AU 2002309361A AU 2002309361 A1 AU2002309361 A1 AU 2002309361A1
Authority
AU
Australia
Prior art keywords
plasma reactor
reactor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002309361A
Inventor
Andrei F. Alexandrov
Gleb E. Bugrov
Sergei G. Kondranin
Elena A. Kralkina
Vladimir B. Pavlov
Anri A. Rukhadze
Konstantin V. Vavilin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasma Tech Co Ltd
Original Assignee
Plasma Tech Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Tech Co Ltd filed Critical Plasma Tech Co Ltd
Publication of AU2002309361A1 publication Critical patent/AU2002309361A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Chemical Vapour Deposition (AREA)
AU2002309361A 2001-05-30 2002-05-17 Plasma reactor Abandoned AU2002309361A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
RU2001114393 2001-05-30
RU2001114393A RU2196395C1 (en) 2001-05-30 2001-05-30 Plasma reactor and plasma generating device (alternatives)
PCT/RU2002/000236 WO2002097854A2 (en) 2001-05-30 2002-05-17 Plasma reactor

Publications (1)

Publication Number Publication Date
AU2002309361A1 true AU2002309361A1 (en) 2002-12-09

Family

ID=20250089

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002309361A Abandoned AU2002309361A1 (en) 2001-05-30 2002-05-17 Plasma reactor

Country Status (3)

Country Link
AU (1) AU2002309361A1 (en)
RU (1) RU2196395C1 (en)
WO (1) WO2002097854A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2466614A3 (en) * 2006-05-16 2013-05-22 Oerlikon Trading AG, Trübbach Arc source and magnet assembly
DE102008022181B4 (en) * 2008-05-05 2019-05-02 Arianegroup Gmbh Ion engine
RU2441354C1 (en) * 2010-06-17 2012-01-27 Государственное образовательное учреждение высшего профессионального образования "Северо-Кавказский государственный технический университет" Plasma generator
RU2670249C1 (en) * 2017-12-22 2018-10-19 Открытое акционерное общество "Научно-исследовательский институт точного машиностроения" Reactor for plasma processing of semiconductor structures
RU2677323C1 (en) * 2018-02-26 2019-01-16 Общество с ограниченной ответственностью "ПлазЭйр" Plasma air activator

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5280154A (en) * 1992-01-30 1994-01-18 International Business Machines Corporation Radio frequency induction plasma processing system utilizing a uniform field coil
AU5017293A (en) * 1992-09-01 1994-03-29 University Of North Carolina At Chapel Hill, The High pressure magnetically assisted inductively coupled plasma
FR2707449B1 (en) * 1993-07-05 1995-08-11 Cit Alcatel Plasma reactor for a deposition or etching process.
US5430355A (en) * 1993-07-30 1995-07-04 Texas Instruments Incorporated RF induction plasma source for plasma processing
RU2113073C1 (en) * 1994-02-24 1998-06-10 Сибирский химический комбинат Device for initiating discharge in high-frequency inductance plasmatron
ATE181637T1 (en) * 1994-10-31 1999-07-15 Applied Materials Inc PLASMA REACTORS FOR SEMICONDUCTOR DISC TREATMENT
US5688357A (en) * 1995-02-15 1997-11-18 Applied Materials, Inc. Automatic frequency tuning of an RF power source of an inductively coupled plasma reactor
US5731565A (en) * 1995-07-27 1998-03-24 Lam Research Corporation Segmented coil for generating plasma in plasma processing equipment
TW376547B (en) * 1997-03-27 1999-12-11 Matsushita Electric Industrial Co Ltd Method and apparatus for plasma processing
US6164241A (en) * 1998-06-30 2000-12-26 Lam Research Corporation Multiple coil antenna for inductively-coupled plasma generation systems

Also Published As

Publication number Publication date
WO2002097854A2 (en) 2002-12-05
RU2196395C1 (en) 2003-01-10
WO2002097854A3 (en) 2003-07-31

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase