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AU2001292551A1 - Multiple chamber plasma reactor - Google Patents

Multiple chamber plasma reactor

Info

Publication number
AU2001292551A1
AU2001292551A1 AU2001292551A AU9255101A AU2001292551A1 AU 2001292551 A1 AU2001292551 A1 AU 2001292551A1 AU 2001292551 A AU2001292551 A AU 2001292551A AU 9255101 A AU9255101 A AU 9255101A AU 2001292551 A1 AU2001292551 A1 AU 2001292551A1
Authority
AU
Australia
Prior art keywords
plasma reactor
multiple chamber
chamber plasma
reactor
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001292551A
Inventor
Maolin Long
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001292551A1 publication Critical patent/AU2001292551A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
AU2001292551A 2000-08-10 2001-08-07 Multiple chamber plasma reactor Abandoned AU2001292551A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22421400P 2000-08-10 2000-08-10
US60224214 2000-08-10
PCT/US2001/024569 WO2002015225A2 (en) 2000-08-10 2001-08-07 Multiple chamber plasma reactor

Publications (1)

Publication Number Publication Date
AU2001292551A1 true AU2001292551A1 (en) 2002-02-25

Family

ID=22839728

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001292551A Abandoned AU2001292551A1 (en) 2000-08-10 2001-08-07 Multiple chamber plasma reactor

Country Status (2)

Country Link
AU (1) AU2001292551A1 (en)
WO (1) WO2002015225A2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW519716B (en) * 2000-12-19 2003-02-01 Tokyo Electron Ltd Wafer bias drive for a plasma source
AU2009292608B2 (en) * 2008-09-26 2010-10-21 Ngk Insulators, Ltd. Film forming apparatus

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5226056A (en) * 1989-01-10 1993-07-06 Nihon Shinku Gijutsu Kabushiki Kaisha Plasma ashing method and apparatus therefor
DE4005956C1 (en) * 1990-02-26 1991-06-06 Siegfried Dipl.-Ing. Dr. 5135 Selfkant De Straemke
GB9321489D0 (en) * 1993-10-19 1993-12-08 Central Research Lab Ltd Plasma processing
DE9407482U1 (en) * 1994-05-05 1994-10-06 Balzers und Leybold Deutschland Holding AG, 63450 Hanau Functional device for a vacuum system for the treatment of disc-shaped workpieces

Also Published As

Publication number Publication date
WO2002015225A2 (en) 2002-02-21
WO2002015225A3 (en) 2002-06-27

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