AU2002366929A1 - Gas purging method and exposure system, and device production method - Google Patents

Gas purging method and exposure system, and device production method

Info

Publication number: AU2002366929A1
Authority: AU; Australia
Prior art keywords: exposure system; device production; gas purging; production method; purging method
Prior art date: 2001-12-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2002366929A

Inventor

Naomasa Shiraishi

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-12-21

Filing date

2002-12-24

Publication date

2003-07-09

2002-12-24 Application filed by Nikon Corp filed Critical Nikon Corp

2003-07-09 Publication of AU2002366929A1 publication Critical patent/AU2002366929A1/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

Health & Medical Sciences (AREA)
Epidemiology (AREA)
Public Health (AREA)
Life Sciences & Earth Sciences (AREA)
Atmospheric Sciences (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Toxicology (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

AU2002366929A 2001-12-21 2002-12-24 Gas purging method and exposure system, and device production method Abandoned AU2002366929A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
JP2001390668		2001-12-21
JP2001-390668		2001-12-21
PCT/JP2002/013425 WO2003054936A1 (en)	2001-12-21	2002-12-24	Gas purging method and exposure system, and device production method

Publications (1)

Publication Number	Publication Date
AU2002366929A1 true AU2002366929A1 (en)	2003-07-09

Family

ID=19188433

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2002366929A Abandoned AU2002366929A1 (en)	2001-12-21	2002-12-24	Gas purging method and exposure system, and device production method

Country Status (4)

Country	Link
JP (1)	JPWO2003054936A1 (en)
AU (1)	AU2002366929A1 (en)
TW (1)	TWI222668B (en)
WO (1)	WO2003054936A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US8057929B2 (en) *	2003-10-20	2011-11-15	GM Global Technology Operations LLC	Regenerative compressor motor control for a fuel cell power system
US7057702B2 (en) *	2004-06-23	2006-06-06	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
JP2011258999A (en) *	2005-01-31	2011-12-22	Nikon Corp	Exposure device and device manufacturing method
TWI417980B (en) *	2009-02-04	2013-12-01	Hoya Corp	Stage cleaner, writing apparatus and substrate processing apparatus
WO2011016254A1 (en) *	2009-08-07	2011-02-10	株式会社ニコン	Moving body apparatus, exposure apparatus, exposure method, and device manufacturing method
CN108398858B (en) *	2018-03-20	2019-05-10	李笛	A kind of gas isolator and partition method
DE102023201942A1 (en) *	2023-03-03	2024-09-05	Carl Zeiss Smt Gmbh	Peltier module, assembly and device for mask inspection

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS60133728A (en) *	1983-12-21	1985-07-16	Seiko Epson Corp	Far ultraviolet ray projecting exposure device
US6970228B1 (en) *	1999-07-16	2005-11-29	Nikon Corporation	Exposure method and system
JP2001068400A (en) *	1999-08-27	2001-03-16	Nikon Corp	Light-absorbing substance detection method, and exposure method and apparatus
EP1098225A3 (en) *	1999-11-05	2002-04-10	Asm Lithography B.V.	Lithographic projection apparatus with purge gas system and method using the same
JP2002151400A (en) *	2000-11-15	2002-05-24	Canon Inc	Exposure apparatus, maintenance method thereof, semiconductor device manufacturing method and semiconductor manufacturing factory using the same
JP2002373853A (en) *	2001-06-15	2002-12-26	Canon Inc	Exposure equipment

2002
- 2002-12-20 TW TW091136791A patent/TWI222668B/en not_active IP Right Cessation
- 2002-12-24 WO PCT/JP2002/013425 patent/WO2003054936A1/en not_active Ceased
- 2002-12-24 AU AU2002366929A patent/AU2002366929A1/en not_active Abandoned
- 2002-12-24 JP JP2003555564A patent/JPWO2003054936A1/en active Pending

Also Published As

Publication number	Publication date
TW200307979A (en)	2003-12-16
TWI222668B (en)	2004-10-21
JPWO2003054936A1 (en)	2005-04-28
WO2003054936A1 (en)	2003-07-03

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Legal Events

Date	Code	Title	Description
2004-09-16	MK6	Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase