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AU2002354093A1 - Plasma processing device - Google Patents

Plasma processing device

Info

Publication number
AU2002354093A1
AU2002354093A1 AU2002354093A AU2002354093A AU2002354093A1 AU 2002354093 A1 AU2002354093 A1 AU 2002354093A1 AU 2002354093 A AU2002354093 A AU 2002354093A AU 2002354093 A AU2002354093 A AU 2002354093A AU 2002354093 A1 AU2002354093 A1 AU 2002354093A1
Authority
AU
Australia
Prior art keywords
processing device
plasma processing
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002354093A
Inventor
Toshihiro Hayami
Daisuke Hayashi
Hiroo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002354093A1 publication Critical patent/AU2002354093A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32623Mechanical discharge control means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3266Magnetic control means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
AU2002354093A 2001-12-07 2002-12-05 Plasma processing device Abandoned AU2002354093A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001374439 2001-12-07
JP2001-374439 2001-12-07
PCT/JP2002/012736 WO2003049170A1 (en) 2001-12-07 2002-12-05 Plasma processing device

Publications (1)

Publication Number Publication Date
AU2002354093A1 true AU2002354093A1 (en) 2003-06-17

Family

ID=19182995

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002354093A Abandoned AU2002354093A1 (en) 2001-12-07 2002-12-05 Plasma processing device

Country Status (2)

Country Link
AU (1) AU2002354093A1 (en)
WO (1) WO2003049170A1 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2078735T3 (en) * 1991-05-21 1995-12-16 Materials Research Corp SOFT ENGRAVING MODULE USING TOOLS AND PLASMA ECR GENERATOR FOR THE SAME.
JPH07130495A (en) * 1993-11-05 1995-05-19 Tokyo Electron Ltd Magnetron type plasma processing device
JP2000306845A (en) * 1999-04-19 2000-11-02 Tokyo Electron Ltd Magnetron plasma processing apparatus and processing method

Also Published As

Publication number Publication date
WO2003049170A1 (en) 2003-06-12

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase