AU2002354093A1 - Plasma processing device - Google Patents
Plasma processing deviceInfo
- Publication number
- AU2002354093A1 AU2002354093A1 AU2002354093A AU2002354093A AU2002354093A1 AU 2002354093 A1 AU2002354093 A1 AU 2002354093A1 AU 2002354093 A AU2002354093 A AU 2002354093A AU 2002354093 A AU2002354093 A AU 2002354093A AU 2002354093 A1 AU2002354093 A1 AU 2002354093A1
- Authority
- AU
- Australia
- Prior art keywords
- processing device
- plasma processing
- plasma
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001374439 | 2001-12-07 | ||
| JP2001-374439 | 2001-12-07 | ||
| PCT/JP2002/012736 WO2003049170A1 (en) | 2001-12-07 | 2002-12-05 | Plasma processing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2002354093A1 true AU2002354093A1 (en) | 2003-06-17 |
Family
ID=19182995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2002354093A Abandoned AU2002354093A1 (en) | 2001-12-07 | 2002-12-05 | Plasma processing device |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU2002354093A1 (en) |
| WO (1) | WO2003049170A1 (en) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2078735T3 (en) * | 1991-05-21 | 1995-12-16 | Materials Research Corp | SOFT ENGRAVING MODULE USING TOOLS AND PLASMA ECR GENERATOR FOR THE SAME. |
| JPH07130495A (en) * | 1993-11-05 | 1995-05-19 | Tokyo Electron Ltd | Magnetron type plasma processing device |
| JP2000306845A (en) * | 1999-04-19 | 2000-11-02 | Tokyo Electron Ltd | Magnetron plasma processing apparatus and processing method |
-
2002
- 2002-12-05 WO PCT/JP2002/012736 patent/WO2003049170A1/en not_active Ceased
- 2002-12-05 AU AU2002354093A patent/AU2002354093A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO2003049170A1 (en) | 2003-06-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |