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AU2002223792A1 - Optical recording materials - Google Patents

Optical recording materials

Info

Publication number
AU2002223792A1
AU2002223792A1 AU2002223792A AU2379202A AU2002223792A1 AU 2002223792 A1 AU2002223792 A1 AU 2002223792A1 AU 2002223792 A AU2002223792 A AU 2002223792A AU 2379202 A AU2379202 A AU 2379202A AU 2002223792 A1 AU2002223792 A1 AU 2002223792A1
Authority
AU
Australia
Prior art keywords
optical recording
recording materials
materials
optical
recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002223792A
Inventor
Robin James Thomas Clabburn
Rifak Iqbal
Stephen Moratti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Durand Technology Ltd
Original Assignee
Durand Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0027580A external-priority patent/GB0027580D0/en
Priority claimed from GB0029403A external-priority patent/GB0029403D0/en
Priority claimed from GB0109809A external-priority patent/GB0109809D0/en
Application filed by Durand Technology Ltd filed Critical Durand Technology Ltd
Publication of AU2002223792A1 publication Critical patent/AU2002223792A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
    • C09K2323/02—Alignment layer characterised by chemical composition
    • C09K2323/027—Polyimide
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Polymerisation Methods In General (AREA)
AU2002223792A 2000-11-10 2001-11-09 Optical recording materials Abandoned AU2002223792A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
GB0027580 2000-11-10
GB0027580A GB0027580D0 (en) 2000-11-10 2000-11-10 Improvements in or relating to optical recording materials
GB0029403A GB0029403D0 (en) 2000-12-01 2000-12-01 Improvements in or relating to optical recording materials
GB0029403 2000-12-01
GB0109809 2001-04-20
GB0109809A GB0109809D0 (en) 2001-04-20 2001-04-20 Improvements in or relating to optical recording materials
PCT/GB2001/004978 WO2002039184A1 (en) 2000-11-10 2001-11-09 Optical recording materials

Publications (1)

Publication Number Publication Date
AU2002223792A1 true AU2002223792A1 (en) 2002-05-21

Family

ID=27255969

Family Applications (3)

Application Number Title Priority Date Filing Date
AU2002223792A Abandoned AU2002223792A1 (en) 2000-11-10 2001-11-09 Optical recording materials
AU2002223793A Abandoned AU2002223793A1 (en) 2000-11-10 2001-11-09 Optical recording materials
AU2002214143A Abandoned AU2002214143A1 (en) 2000-11-10 2001-11-09 Optical recording materials

Family Applications After (2)

Application Number Title Priority Date Filing Date
AU2002223793A Abandoned AU2002223793A1 (en) 2000-11-10 2001-11-09 Optical recording materials
AU2002214143A Abandoned AU2002214143A1 (en) 2000-11-10 2001-11-09 Optical recording materials

Country Status (5)

Country Link
US (2) US20040067323A1 (en)
EP (2) EP1344108B1 (en)
JP (2) JP4535309B2 (en)
AU (3) AU2002223792A1 (en)
WO (3) WO2002039184A1 (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0128381D0 (en) * 2001-11-27 2002-01-16 Durand Technology Ltd Printed UV cured light management films
GB0130726D0 (en) * 2001-12-21 2002-02-06 Durand Technology Ltd Improvements in or relating to security or authentication markings or the like
GB0224800D0 (en) * 2002-10-24 2002-12-04 Microsharp Corp Ltd Apparatus for producing approximately collimated light and method of curing a photopolymerisable layer using the apparatus
US7211368B2 (en) * 2003-01-07 2007-05-01 3 Birds, Inc. Stereolithography resins and methods
GB0306058D0 (en) * 2003-03-17 2003-04-23 Microsharp Corp Ltd Optically coded security markings
US7190387B2 (en) * 2003-09-11 2007-03-13 Bright View Technologies, Inc. Systems for fabricating optical microstructures using a cylindrical platform and a rastered radiation beam
US7192692B2 (en) * 2003-09-11 2007-03-20 Bright View Technologies, Inc. Methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers
JPWO2005078532A1 (en) * 2004-02-13 2007-10-18 東亞合成株式会社 Volume hologram recording material and volume hologram recording medium
US8076386B2 (en) * 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
DE102006011949A1 (en) 2006-03-15 2007-09-20 Epg (Engineered Nanoproducts Germany) Ag Process for the production of defect-free microoptical light guide elements of large width
ATE460686T1 (en) * 2006-12-20 2010-03-15 Agfa Graphics Nv FLEXO PRINTING FORM PRELIMINARY FOR LASER ENGRAVING
RU2009141372A (en) * 2007-04-11 2011-05-20 Байер МатириальСайенс АГ (DE) PREFERRED MEMORIAL MEDIA FOR HOLOGRAPHIC APPLICATIONS
TWI489205B (en) * 2009-11-03 2015-06-21 Bayer Materialscience Ag Photopolymer formulation comprising different writing comonomers
KR20120020012A (en) * 2010-08-27 2012-03-07 삼성전자주식회사 Organic-inorganic hybrid material and stamp for nanoimprint manufactured from the same
US8821781B2 (en) 2011-06-23 2014-09-02 Disney Enterprises, Inc. Fabricating objects with integral and contoured rear projection
JP5977955B2 (en) * 2012-02-16 2016-08-24 株式会社巴川製紙所 Anisotropic optical film and method for producing the same
US9114601B2 (en) 2012-03-01 2015-08-25 Kyle P. Baldwin Clean flexographic printing plate and method of making the same
JP6039911B2 (en) * 2012-03-27 2016-12-07 株式会社巴川製紙所 Anisotropic optical film for polarizing plate and method for producing the same
US20140116615A1 (en) * 2012-10-25 2014-05-01 Central Glass Company, Limited Adhesive Composition, Bonding Method Using Adhesive Composition, and Separation Method After Bonding
US9128460B2 (en) * 2012-11-08 2015-09-08 Samsung Electronics Co., Ltd. Photopolymer composition for recording hologram, and photopolymer layer and hologram recording media including the same
DE102014203166A1 (en) * 2014-02-21 2015-08-27 Mühlbauer Technology Gmbh Polymerizable dental material
KR102009421B1 (en) 2017-04-25 2019-08-12 주식회사 엘지화학 Photopolymer composition
CN114585506A (en) * 2020-09-14 2022-06-03 法国圣戈班玻璃厂 Composite glass pane for holographic head-up display
CN114531874A (en) * 2020-09-14 2022-05-24 法国圣戈班玻璃厂 Method and apparatus for coating curved glass sheets with photosensitive material
CN114531858A (en) * 2020-09-14 2022-05-24 法国圣戈班玻璃厂 Method for producing a composite glass pane with a hologram

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE755251A (en) * 1969-08-25 1971-02-25 Du Pont HOLOGRAPHIC RECORDING IN PHOTOPOLY-MERISABLE LAYERS
JPH0690589B2 (en) 1984-12-14 1994-11-14 ソニー株式会社 Hologram recording medium
EP0294122B1 (en) 1987-06-01 1993-01-27 Sar Realisations Limited Display system utilising light transmitting screen and method of manufacturing same
US4836102A (en) * 1987-10-01 1989-06-06 Fusion Systems Corporation Ink transfer with partial curing
US4942112A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Photopolymerizable compositions and elements for refractive index imaging
US4942102A (en) * 1988-01-15 1990-07-17 E. I. Du Pont De Nemours And Company Holographic optical elements having a reflection hologram formed in a photopolymer
US4963471A (en) * 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5149592A (en) * 1990-05-09 1992-09-22 Avery Dennison Corporation Ultraviolet radiation curable clearcoat
EP0530269B1 (en) * 1990-05-21 1997-07-23 Nashua Corporation Microlens screens of photopolymerisable materials and methods of making the same
GB2272306B (en) * 1992-11-09 1996-11-20 Fujitsu Ltd Coupling of optical parts using a refractive index imaging material
JPH0777637A (en) * 1993-09-08 1995-03-20 Fujitsu Ltd Optical element coupling method and refractive index image forming material
JP2849021B2 (en) * 1993-04-12 1999-01-20 日本ペイント株式会社 Photosensitive composition for volume hologram recording
EP0801767B1 (en) * 1993-06-15 1999-08-25 Nashua Corporation Method of manufacturing a randomised mask for use in making a diffusion screen
TW291543B (en) * 1993-09-28 1996-11-21 Sharp Kk
JP3370762B2 (en) * 1993-11-04 2003-01-27 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Film composition and laminated structure containing the composition
US5702846A (en) 1994-10-03 1997-12-30 Nippon Paint Co. Ltd. Photosensitive composition for volume hologram recording
JP3532675B2 (en) * 1994-10-03 2004-05-31 日本ペイント株式会社 Photosensitive composition for volume hologram recording, recording medium using the same, and method for forming volume hologram
JPH08101499A (en) * 1994-10-03 1996-04-16 Nippon Paint Co Ltd Photosensitive composition for volume hologram recording, recording medium using the composition and volume hologram forming method
EP0853774B1 (en) * 1995-10-06 2001-11-07 Polaroid Corporation Holographic medium and process
GB9520912D0 (en) 1995-10-12 1995-12-13 Nashua Corp Improvements in or relating to projection screens and the like
US5932342A (en) * 1996-11-14 1999-08-03 Nashua Corporation Optical diffusers obtained by fluid phase mixing of incompatible materials
JP3626302B2 (en) * 1996-12-10 2005-03-09 Ｊｓｒ株式会社 Photocurable resin composition
JP4534260B2 (en) * 1997-07-22 2010-09-01 株式会社ニコン Exposure method, exposure apparatus, manufacturing method thereof, and optical cleaning method
EP1777255A3 (en) * 1999-06-11 2007-07-11 Sydney Hyman Image making medium
US6744502B2 (en) * 2001-09-28 2004-06-01 Pe Corporation (Ny) Shaped illumination geometry and intensity using a diffractive optical element

Also Published As

Publication number Publication date
JP4535309B2 (en) 2010-09-01
AU2002223793A1 (en) 2002-05-21
AU2002214143A1 (en) 2002-05-21
WO2002039184A1 (en) 2002-05-16
JP2004525394A (en) 2004-08-19
US20040219457A1 (en) 2004-11-04
EP1344108A1 (en) 2003-09-17
EP1336131A1 (en) 2003-08-20
EP1344108B1 (en) 2018-07-11
JP2004526174A (en) 2004-08-26
US7232651B2 (en) 2007-06-19
WO2002039185A1 (en) 2002-05-16
WO2002039183A1 (en) 2002-05-16
US20040067323A1 (en) 2004-04-08

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