AU2001293260A1 - Electrode for glow-discharge atmospheric plasma treatment - Google Patents
Electrode for glow-discharge atmospheric plasma treatmentInfo
- Publication number
- AU2001293260A1 AU2001293260A1 AU2001293260A AU9326001A AU2001293260A1 AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1 AU 2001293260 A AU2001293260 A AU 2001293260A AU 9326001 A AU9326001 A AU 9326001A AU 2001293260 A1 AU2001293260 A1 AU 2001293260A1
- Authority
- AU
- Australia
- Prior art keywords
- glow
- electrode
- plasma treatment
- atmospheric plasma
- discharge atmospheric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000009832 plasma treatment Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
- H01J37/32449—Gas control, e.g. control of the gas flow
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
- H05H1/2425—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being flush with the dielectric
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09660003 | 2000-09-12 | ||
| US09/660,003 US6441553B1 (en) | 1999-02-01 | 2000-09-12 | Electrode for glow-discharge atmospheric-pressure plasma treatment |
| PCT/US2001/042079 WO2002023960A1 (en) | 2000-09-12 | 2001-09-06 | Electrode for glow-discharge atmospheric plasma treatment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001293260A1 true AU2001293260A1 (en) | 2002-03-26 |
Family
ID=24647726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001293260A Abandoned AU2001293260A1 (en) | 2000-09-12 | 2001-09-06 | Electrode for glow-discharge atmospheric plasma treatment |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6441553B1 (en) |
| EP (1) | EP1323338A4 (en) |
| JP (1) | JP2004509432A (en) |
| AU (1) | AU2001293260A1 (en) |
| WO (1) | WO2002023960A1 (en) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7067405B2 (en) * | 1999-02-01 | 2006-06-27 | Sigma Laboratories Of Arizona, Inc. | Atmospheric glow discharge with concurrent coating deposition |
| US6774018B2 (en) * | 1999-02-01 | 2004-08-10 | Sigma Laboratories Of Arizona, Inc. | Barrier coatings produced by atmospheric glow discharge |
| JP2001288572A (en) * | 2000-01-31 | 2001-10-19 | Canon Inc | Apparatus and method for forming deposited film |
| KR100421480B1 (en) * | 2001-06-01 | 2004-03-12 | 엘지.필립스 엘시디 주식회사 | Method for Processing Surface of Organic Isolation Film and Method of Fabricating Thin Film Transistor Substate using the same |
| EP2194566B1 (en) * | 2001-10-22 | 2012-05-09 | Shibaura Mechatronics Corporation | Method for judging arc of glow discharger and high-frequency arc discharge suppressor |
| US7887889B2 (en) * | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
| DE10211976A1 (en) * | 2002-03-19 | 2003-10-02 | Bosch Gmbh Robert | Method and device at least for the sterilization of containers and / or their closing elements |
| DE50307658D1 (en) * | 2002-04-29 | 2007-08-23 | Fh Hildesheim Holzminden Goe | METHOD AND DEVICE FOR TREATING THE OUTER SURFACE OF A METAL WIRE, ESPECIALLY AS A COATING TREATMENT |
| US7288204B2 (en) | 2002-07-19 | 2007-10-30 | Fuji Photo Film B.V. | Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) |
| US6909237B1 (en) * | 2002-07-25 | 2005-06-21 | The Regents Of The University Of California | Production of stable, non-thermal atmospheric pressure rf capacitive plasmas using gases other than helium or neon |
| CN1754409B (en) * | 2002-08-30 | 2010-07-28 | 积水化学工业株式会社 | Plasma treatment device |
| EP1403902A1 (en) * | 2002-09-30 | 2004-03-31 | Fuji Photo Film B.V. | Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) |
| JP4233348B2 (en) * | 2003-02-24 | 2009-03-04 | シャープ株式会社 | Plasma process equipment |
| US20040258547A1 (en) * | 2003-04-02 | 2004-12-23 | Kurt Burger | Pump piston and/or elements sealing the pump piston, in particular a sealing ring of elastomeric material, and a device and method for coating an object of elastomeric material |
| WO2004090931A2 (en) * | 2003-04-10 | 2004-10-21 | Bae Systems Plc | Method and apparatus for treating a surface using a plasma discharge |
| KR101002335B1 (en) | 2003-10-08 | 2010-12-17 | 엘지디스플레이 주식회사 | Atmospheric Pressure Plasma Treatment Equipment |
| EP1689908B1 (en) * | 2003-11-20 | 2012-09-05 | Apit Corp. SA | Plasma thin-film deposition apparatus |
| US20060054279A1 (en) * | 2004-09-10 | 2006-03-16 | Yunsang Kim | Apparatus for the optimization of atmospheric plasma in a processing system |
| DE102004043967B4 (en) * | 2004-09-11 | 2010-01-07 | Roth & Rau Ag | Arrangement and method for plasma treatment of a substrate |
| US7855513B2 (en) * | 2004-09-28 | 2010-12-21 | Old Dominion University Research Foundation | Device and method for gas treatment using pulsed corona discharges |
| DE102004049783B4 (en) * | 2004-10-12 | 2009-03-19 | Je Plasmaconsult Gmbh | Apparatus for processing goods with the aid of an electrical discharge |
| SK287455B6 (en) | 2006-06-08 | 2010-10-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Ho | Equipment and method of cleaning, etching, activating and subsequently treating the surface of glass, the surface of glass covered with metal oxides and the surface of other materials coated with SiO2 |
| EP2074645A2 (en) * | 2006-10-03 | 2009-07-01 | Dow Global Technologies Inc. | Improved atmospheric pressure plasma electrode |
| EP2074644A1 (en) * | 2006-10-03 | 2009-07-01 | Dow Global Technologies Inc. | Improved plasma electrode |
| SK51082006A3 (en) * | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Apparatus and treatment method of surface of metals and metalloids, oxides of metals and oxides of metalloids and nitrides of metalloids |
| EP1944406A1 (en) | 2007-01-10 | 2008-07-16 | Nederlandse Organisatie voor Toegepast-Natuuurwetenschappelijk Onderzoek TNO | Method and apparatus for treating an elongated object with plasma |
| ITBO20070306A1 (en) | 2007-04-26 | 2008-10-27 | Tecnotessile Societa Naz Di Ricerca ... | ELECTRODE AND ITS APPARATUS FOR THE GENERATION OF PLASMA AT ATMOSPHERIC PRESSURE. |
| JP5543915B2 (en) * | 2007-05-21 | 2014-07-09 | ルブリゾル アドバンスド マテリアルズ， インコーポレイテッド | Polyurethane polymer |
| WO2008147184A2 (en) * | 2007-05-25 | 2008-12-04 | Fujifilm Manufacturing Europe B.V. | Atmospheric pressure glow discharge plasma method and system using heated substrate |
| US20100255216A1 (en) * | 2007-11-29 | 2010-10-07 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
| US20090142511A1 (en) * | 2007-11-29 | 2009-06-04 | Haley Jr Robert P | Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate |
| KR100974566B1 (en) * | 2008-08-08 | 2010-08-06 | 한국생산기술연구원 | Atmospheric pressure plasma device |
| EP2180768A1 (en) * | 2008-10-23 | 2010-04-28 | TNO Nederlandse Organisatie voor Toegepast Wetenschappelijk Onderzoek | Apparatus and method for treating an object |
| US9120073B2 (en) * | 2009-06-05 | 2015-09-01 | Eon Labs, Llc | Distributed dielectric barrier discharge reactor |
| KR20120116968A (en) | 2010-01-06 | 2012-10-23 | 다우 글로벌 테크놀로지스 엘엘씨 | Moisture resistant photovoltaic devices with elastomeric, polysiloxane protection layer |
| DE102011000261A1 (en) * | 2011-01-21 | 2012-07-26 | Hochschule für angewandte Wissenschaft und Kunst Fachhochschule Hildesheim/Holzminden/Göttingen | Dielectric coplanar discharge source for surface treatment under atmospheric pressure |
| KR102124042B1 (en) * | 2013-02-18 | 2020-06-18 | 삼성디스플레이 주식회사 | Vapor deposition apparatus and method for manufacturing organic light emitting display apparatus |
| JP6123796B2 (en) * | 2013-03-15 | 2017-05-10 | 東レ株式会社 | Plasma CVD apparatus and plasma CVD method |
| US9666415B2 (en) * | 2015-02-11 | 2017-05-30 | Ford Global Technologies, Llc | Heated air plasma treatment |
| DE102015108884A1 (en) | 2015-06-04 | 2016-12-08 | Hochschule für Angewandte Wissenschaft und Kunst - Hildesheim/Holzminden/Göttingen | Apparatus for the plasma treatment of in particular band-shaped objects |
| US10882021B2 (en) | 2015-10-01 | 2021-01-05 | Ion Inject Technology Llc | Plasma reactor for liquid and gas and method of use |
| US10010854B2 (en) | 2015-10-01 | 2018-07-03 | Ion Inject Technology Llc | Plasma reactor for liquid and gas |
| US12296313B2 (en) | 2015-10-01 | 2025-05-13 | Milton Roy, Llc | System and method for formulating medical treatment effluents |
| US11452982B2 (en) | 2015-10-01 | 2022-09-27 | Milton Roy, Llc | Reactor for liquid and gas and method of use |
| US10187968B2 (en) | 2015-10-08 | 2019-01-22 | Ion Inject Technology Llc | Quasi-resonant plasma voltage generator |
| US10046300B2 (en) | 2015-12-09 | 2018-08-14 | Ion Inject Technology Llc | Membrane plasma reactor |
| CN109790313A (en) | 2016-09-30 | 2019-05-21 | 简·探针公司 | Composition on plasma-treated surface |
| JP7052796B2 (en) * | 2017-07-28 | 2022-04-12 | 住友電気工業株式会社 | Shower head and its manufacturing method |
| JP2021132148A (en) * | 2020-02-20 | 2021-09-09 | 東京エレクトロン株式会社 | Stage, plasma processing apparatus and plasma processing method |
| KR20230167120A (en) | 2021-04-09 | 2023-12-07 | 어플라이드 머티어리얼스, 인코포레이티드 | Pre- and post-treatment of electrode surfaces |
| JP7589661B2 (en) * | 2021-09-10 | 2024-11-26 | ウシオ電機株式会社 | Dielectric barrier discharge plasma generator |
Family Cites Families (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4626876A (en) * | 1984-01-25 | 1986-12-02 | Ricoh Company, Ltd. | Solid state corona discharger |
| US5456972A (en) | 1993-05-28 | 1995-10-10 | The University Of Tennessee Research Corporation | Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| US5414324A (en) | 1993-05-28 | 1995-05-09 | The University Of Tennessee Research Corporation | One atmosphere, uniform glow discharge plasma |
| US5403453A (en) | 1993-05-28 | 1995-04-04 | The University Of Tennessee Research Corporation | Method and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure |
| US5669583A (en) | 1994-06-06 | 1997-09-23 | University Of Tennessee Research Corporation | Method and apparatus for covering bodies with a uniform glow discharge plasma and applications thereof |
| US5387842A (en) * | 1993-05-28 | 1995-02-07 | The University Of Tennessee Research Corp. | Steady-state, glow discharge plasma |
| US5558843A (en) | 1994-09-01 | 1996-09-24 | Eastman Kodak Company | Near atmospheric pressure treatment of polymers using helium discharges |
| JPH08279495A (en) * | 1995-02-07 | 1996-10-22 | Seiko Epson Corp | Plasma processing apparatus and method |
| US5714308A (en) | 1996-02-13 | 1998-02-03 | Eastman Kodak Company | Atmospheric pressure glow discharge treatment of polymeric supports to promote adhesion for photographic applications |
| CA2205817C (en) * | 1996-05-24 | 2004-04-06 | Sekisui Chemical Co., Ltd. | Treatment method in glow-discharge plasma and apparatus thereof |
| US6110540A (en) * | 1996-07-12 | 2000-08-29 | The Boc Group, Inc. | Plasma apparatus and method |
| US5789145A (en) | 1996-07-23 | 1998-08-04 | Eastman Kodak Company | Atmospheric pressure glow discharge treatment of base material for photographic applications |
| US6423924B1 (en) * | 1998-03-10 | 2002-07-23 | Tepla Ag | Method for treating the surface of a material or an object and implementing device |
| EP0997926B1 (en) * | 1998-10-26 | 2006-01-04 | Matsushita Electric Works, Ltd. | Plasma treatment apparatus and method |
| US6118218A (en) * | 1999-02-01 | 2000-09-12 | Sigma Technologies International, Inc. | Steady-state glow-discharge plasma at atmospheric pressure |
-
2000
- 2000-09-12 US US09/660,003 patent/US6441553B1/en not_active Expired - Lifetime
-
2001
- 2001-09-06 EP EP01973707A patent/EP1323338A4/en not_active Withdrawn
- 2001-09-06 WO PCT/US2001/042079 patent/WO2002023960A1/en not_active Ceased
- 2001-09-06 AU AU2001293260A patent/AU2001293260A1/en not_active Abandoned
- 2001-09-06 JP JP2002526807A patent/JP2004509432A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004509432A (en) | 2004-03-25 |
| EP1323338A4 (en) | 2008-08-20 |
| WO2002023960A1 (en) | 2002-03-21 |
| US6441553B1 (en) | 2002-08-27 |
| EP1323338A1 (en) | 2003-07-02 |
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