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AU2001282579A1 - Compound semiconductor multilayer structure and bipolar transistor using the same - Google Patents

Compound semiconductor multilayer structure and bipolar transistor using the same

Info

Publication number
AU2001282579A1
AU2001282579A1 AU2001282579A AU8257901A AU2001282579A1 AU 2001282579 A1 AU2001282579 A1 AU 2001282579A1 AU 2001282579 A AU2001282579 A AU 2001282579A AU 8257901 A AU8257901 A AU 8257901A AU 2001282579 A1 AU2001282579 A1 AU 2001282579A1
Authority
AU
Australia
Prior art keywords
same
compound semiconductor
bipolar transistor
multilayer structure
semiconductor multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001282579A
Inventor
Taichi Okano
Takashi Udagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000272840A external-priority patent/JP2002083816A/en
Priority claimed from JP2000362534A external-priority patent/JP2002164533A/en
Application filed by Showa Denko KK filed Critical Showa Denko KK
Publication of AU2001282579A1 publication Critical patent/AU2001282579A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/40AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/80Heterojunction BJTs
    • H10D10/821Vertical heterojunction BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/81Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
    • H10D62/815Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
    • H10D62/8161Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
    • H10D62/8162Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
    • H10D62/8164Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/854Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs further characterised by the dopants

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Bipolar Transistors (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AU2001282579A 2000-09-08 2001-08-31 Compound semiconductor multilayer structure and bipolar transistor using the same Abandoned AU2001282579A1 (en)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2000-272840 2000-09-08
JP2000272840A JP2002083816A (en) 2000-09-08 2000-09-08 Compound semiconductor heterojunction structure
US23773000P 2000-10-05 2000-10-05
US60237730 2000-10-05
JP2000362534A JP2002164533A (en) 2000-11-29 2000-11-29 Compound semiconductor laminated structure and bipolar transistor using the same
JP2000-362534 2000-11-29
US25489700P 2000-12-13 2000-12-13
US60254897 2000-12-13
PCT/JP2001/007536 WO2002021599A2 (en) 2000-09-08 2001-08-31 Compound semiconductor multilayer structure and bipolar transistor using the same

Publications (1)

Publication Number Publication Date
AU2001282579A1 true AU2001282579A1 (en) 2002-03-22

Family

ID=27481599

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001282579A Abandoned AU2001282579A1 (en) 2000-09-08 2001-08-31 Compound semiconductor multilayer structure and bipolar transistor using the same

Country Status (4)

Country Link
US (1) US6876013B2 (en)
AU (1) AU2001282579A1 (en)
DE (1) DE10196596B4 (en)
WO (1) WO2002021599A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6955858B2 (en) * 2001-12-07 2005-10-18 North Carolina State University Transition metal doped ferromagnetic III-V nitride material films and methods of fabricating the same
TWI281833B (en) 2004-10-28 2007-05-21 Kyocera Corp Heater, wafer heating apparatus and method for manufacturing heater
JP2007335508A (en) * 2006-06-13 2007-12-27 Nec Electronics Corp Field effect transistor and manufacturing method thereof
US11393683B2 (en) 2009-10-14 2022-07-19 Utica Leaseco, Llc Methods for high growth rate deposition for forming different cells on a wafer
US20190272994A1 (en) * 2009-10-14 2019-09-05 Alta Devices, Inc. High growth rate deposition for group iii/v materials
WO2012051324A1 (en) * 2010-10-12 2012-04-19 Alliance For Sustainable Energy, Llc High bandgap iii-v alloys for high efficiency optoelectronics
JP6303998B2 (en) * 2014-11-28 2018-04-04 三菱電機株式会社 Manufacturing method of avalanche photodiode
JP6852703B2 (en) * 2018-03-16 2021-03-31 信越半導体株式会社 Carbon concentration evaluation method
TWI803556B (en) * 2018-12-28 2023-06-01 晶元光電股份有限公司 Semiconductor stack, semiconductor device and method for manufacturing the same
US20230317851A1 (en) * 2022-04-01 2023-10-05 Intel Corporation Transistor body-induced body leakage mitigation at low temperature

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08162471A (en) * 1994-12-01 1996-06-21 Furukawa Electric Co Ltd:The Heterojunction bipolar transistor
JP3537246B2 (en) * 1995-11-14 2004-06-14 三菱電機株式会社 Method for manufacturing compound semiconductor device
JP3227083B2 (en) * 1996-01-24 2001-11-12 日本電信電話株式会社 Method for manufacturing bipolar transistor

Also Published As

Publication number Publication date
US6876013B2 (en) 2005-04-05
WO2002021599A3 (en) 2002-06-20
DE10196596B4 (en) 2009-03-05
US20030183816A1 (en) 2003-10-02
WO2002021599A2 (en) 2002-03-14
DE10196596T1 (en) 2003-07-10

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