AU2001282579A1 - Compound semiconductor multilayer structure and bipolar transistor using the same - Google Patents
Compound semiconductor multilayer structure and bipolar transistor using the sameInfo
- Publication number
- AU2001282579A1 AU2001282579A1 AU2001282579A AU8257901A AU2001282579A1 AU 2001282579 A1 AU2001282579 A1 AU 2001282579A1 AU 2001282579 A AU2001282579 A AU 2001282579A AU 8257901 A AU8257901 A AU 8257901A AU 2001282579 A1 AU2001282579 A1 AU 2001282579A1
- Authority
- AU
- Australia
- Prior art keywords
- same
- compound semiconductor
- bipolar transistor
- multilayer structure
- semiconductor multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 150000001875 compounds Chemical class 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/80—Heterojunction BJTs
- H10D10/821—Vertical heterojunction BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
- H10D62/8161—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
- H10D62/8162—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
- H10D62/8164—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/854—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs further characterised by the dopants
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Bipolar Transistors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000-272840 | 2000-09-08 | ||
| JP2000272840A JP2002083816A (en) | 2000-09-08 | 2000-09-08 | Compound semiconductor heterojunction structure |
| US23773000P | 2000-10-05 | 2000-10-05 | |
| US60237730 | 2000-10-05 | ||
| JP2000362534A JP2002164533A (en) | 2000-11-29 | 2000-11-29 | Compound semiconductor laminated structure and bipolar transistor using the same |
| JP2000-362534 | 2000-11-29 | ||
| US25489700P | 2000-12-13 | 2000-12-13 | |
| US60254897 | 2000-12-13 | ||
| PCT/JP2001/007536 WO2002021599A2 (en) | 2000-09-08 | 2001-08-31 | Compound semiconductor multilayer structure and bipolar transistor using the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001282579A1 true AU2001282579A1 (en) | 2002-03-22 |
Family
ID=27481599
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001282579A Abandoned AU2001282579A1 (en) | 2000-09-08 | 2001-08-31 | Compound semiconductor multilayer structure and bipolar transistor using the same |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6876013B2 (en) |
| AU (1) | AU2001282579A1 (en) |
| DE (1) | DE10196596B4 (en) |
| WO (1) | WO2002021599A2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6955858B2 (en) * | 2001-12-07 | 2005-10-18 | North Carolina State University | Transition metal doped ferromagnetic III-V nitride material films and methods of fabricating the same |
| TWI281833B (en) | 2004-10-28 | 2007-05-21 | Kyocera Corp | Heater, wafer heating apparatus and method for manufacturing heater |
| JP2007335508A (en) * | 2006-06-13 | 2007-12-27 | Nec Electronics Corp | Field effect transistor and manufacturing method thereof |
| US11393683B2 (en) | 2009-10-14 | 2022-07-19 | Utica Leaseco, Llc | Methods for high growth rate deposition for forming different cells on a wafer |
| US20190272994A1 (en) * | 2009-10-14 | 2019-09-05 | Alta Devices, Inc. | High growth rate deposition for group iii/v materials |
| WO2012051324A1 (en) * | 2010-10-12 | 2012-04-19 | Alliance For Sustainable Energy, Llc | High bandgap iii-v alloys for high efficiency optoelectronics |
| JP6303998B2 (en) * | 2014-11-28 | 2018-04-04 | 三菱電機株式会社 | Manufacturing method of avalanche photodiode |
| JP6852703B2 (en) * | 2018-03-16 | 2021-03-31 | 信越半導体株式会社 | Carbon concentration evaluation method |
| TWI803556B (en) * | 2018-12-28 | 2023-06-01 | 晶元光電股份有限公司 | Semiconductor stack, semiconductor device and method for manufacturing the same |
| US20230317851A1 (en) * | 2022-04-01 | 2023-10-05 | Intel Corporation | Transistor body-induced body leakage mitigation at low temperature |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08162471A (en) * | 1994-12-01 | 1996-06-21 | Furukawa Electric Co Ltd:The | Heterojunction bipolar transistor |
| JP3537246B2 (en) * | 1995-11-14 | 2004-06-14 | 三菱電機株式会社 | Method for manufacturing compound semiconductor device |
| JP3227083B2 (en) * | 1996-01-24 | 2001-11-12 | 日本電信電話株式会社 | Method for manufacturing bipolar transistor |
-
2001
- 2001-08-31 US US10/363,315 patent/US6876013B2/en not_active Expired - Fee Related
- 2001-08-31 WO PCT/JP2001/007536 patent/WO2002021599A2/en not_active Ceased
- 2001-08-31 AU AU2001282579A patent/AU2001282579A1/en not_active Abandoned
- 2001-08-31 DE DE10196596T patent/DE10196596B4/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6876013B2 (en) | 2005-04-05 |
| WO2002021599A3 (en) | 2002-06-20 |
| DE10196596B4 (en) | 2009-03-05 |
| US20030183816A1 (en) | 2003-10-02 |
| WO2002021599A2 (en) | 2002-03-14 |
| DE10196596T1 (en) | 2003-07-10 |
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