AU2001273598A1 - Carbonate-based photoresist stripping compositions - Google Patents

Carbonate-based photoresist stripping compositions

Info

Publication number: AU2001273598A1
Authority: AU; Australia
Prior art keywords: carbonate; photoresist stripping; based photoresist; stripping compositions; compositions
Prior art date: 2000-06-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

AU2001273598A

Inventor

James R. Machac Jr.

Edward T. Marquis

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Huntsman Petrochemical LLC

Original Assignee

Huntsman Specialty Chemicals Corp

Huntsman Petrochemical LLC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2000-06-29

Filing date

2001-06-14

Publication date

2002-01-14

2001-06-14 Application filed by Huntsman Specialty Chemicals Corp, Huntsman Petrochemical LLC filed Critical Huntsman Specialty Chemicals Corp

2002-01-14 Publication of AU2001273598A1 publication Critical patent/AU2001273598A1/en

Status Abandoned legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Cleaning Or Drying Semiconductors (AREA)

AU2001273598A 2000-06-29 2001-06-14 Carbonate-based photoresist stripping compositions Abandoned AU2001273598A1 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US60646500A	2000-06-29	2000-06-29
US09606465		2000-06-29
PCT/US2001/041033 WO2002003143A2 (en)	2000-06-29	2001-06-14	Alkylene carbonate-based photoresist stripping compositions

Publications (1)

Publication Number	Publication Date
AU2001273598A1 true AU2001273598A1 (en)	2002-01-14

Family

ID=24428087

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
AU2001273598A Abandoned AU2001273598A1 (en)	2000-06-29	2001-06-14	Carbonate-based photoresist stripping compositions

Country Status (3)

Country	Link
US (2)	US6475708B2 (en)
AU (1)	AU2001273598A1 (en)
WO (1)	WO2002003143A2 (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20040050406A1 (en) *	2002-07-17	2004-03-18	Akshey Sehgal	Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
US20040094507A1 (en) *	2002-11-14	2004-05-20	Goodner Michael D.	Stripping cross-linked photoresists
CN100334508C (en) *	2003-01-10	2007-08-29	吉埈仍	Photoresist demoulding coposition and model forming method by using said composition
US20040255974A1 (en) *	2003-06-23	2004-12-23	Burress Jeffrey P.	Equipment cleaner
US7413848B2 (en) *	2005-07-27	2008-08-19	United Microelectronics Corp.	Method of removing photoresist and photoresist rework method
EP1752193A1 (en) *	2005-08-13	2007-02-14	Dr. Straetmans Chemische Produkte GmbH	Use of one or more cyclic 1,2-alkylene carbonates as stabilizer and activity enhancer for preservatives, corresponding composition
US20070179072A1 (en) *	2006-01-30	2007-08-02	Rao Madhukar B	Cleaning formulations
JP5632536B2 (en) *	2010-05-27	2014-11-26	アクゾノーベルケミカルズインターナショナルベスローテンフエンノートシャップＡｋｚｏＮｏｂｅｌＣｈｅｍｉｃａｌｓＩｎｔｅｒｎａｔｉｏｎａｌＢ．Ｖ．	Agricultural formulation comprising acylmorpholine and polar aprotic cosolvent
JP5657318B2 (en) *	2010-09-27	2015-01-21	富士フイルム株式会社	Semiconductor substrate cleaning agent, cleaning method using the same, and semiconductor device manufacturing method
DE102012217306B4 (en) *	2012-09-25	2017-01-12	Vacuumschmelze Gmbh & Co. Kg	Detergents, their use and methods of removing cured casting resins, adhesives, mounting foams, paint films and paint residues
CN103543620B (en) *	2013-11-11	2016-07-06	深圳市星扬化工有限公司	A kind of printed circuit board development film removes liquid
WO2019222127A1 (en) *	2018-05-16	2019-11-21	Huntsman Petrochemical Llc	Quaternary ammonium hydroxides of polyamines

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US2991254A (en) *	1958-02-11	1961-07-04	Sun Oil Co	Composition for engine deposit removal
JPS5133229B2 (en) *	1973-09-13	1976-09-18
US4438192A (en)	1983-02-14	1984-03-20	The Dow Chemical Company	Photoresist stripper composition and method of use
US4483917A (en)	1983-02-14	1984-11-20	The Dow Chemical Company	Photoresist stripper composition and method of use
US4791043A (en)	1983-12-20	1988-12-13	Hmc Patents Holding Co., Inc.	Positive photoresist stripping composition
US4948697A (en)	1985-10-28	1990-08-14	Hoechst Celanese Corporation	Positive photoresist with a solvent mixture of propylene glycol alkyl ether and propylene glycol alkyl ether acetate
US4806458A (en)	1985-10-28	1989-02-21	Hoechst Celanese Corporation	Composition containing a mixture of hexa-alkyl disilazane and propylene glycol alkyl ether and/or propylene glycol alkyl ether acetate
GB8712731D0 (en) *	1987-05-30	1987-07-01	Ciba Geigy Ag	Metallic patterns
US4824763A (en)	1987-07-30	1989-04-25	Ekc Technology, Inc.	Triamine positive photoresist stripping composition and prebaking process
US4822723A (en) *	1987-11-30	1989-04-18	Hoechst Celanese Corporation	Developer compositions for heavy-duty lithographic printing plates
US5690747A (en) *	1988-05-20	1997-11-25	The Boeing Company	Method for removing photoresist with solvent and ultrasonic agitation
US4940651A (en)	1988-12-30	1990-07-10	International Business Machines Corporation	Method for patterning cationic curable photoresist
US5102777A (en)	1990-02-01	1992-04-07	Ardrox Inc.	Resist stripping
US5268260A (en) *	1991-10-22	1993-12-07	International Business Machines Corporation	Photoresist develop and strip solvent compositions and method for their use
JPH0627684A (en) *	1992-07-10	1994-02-04	Tokyo Ohka Kogyo Co Ltd	Rinse for lithography and production of semiconductor device using the same
US5354492A (en) *	1992-09-04	1994-10-11	Cook Composites And Polymers Company	Aqueous cleaning solutions for removing uncured urethane resin systems from the surfaces of processing equipment
US5310428A (en) *	1992-12-22	1994-05-10	Inernational Business Machines Corporation	Solvent stabilization process and method of recovering solvent
EP0699746A4 (en) *	1993-05-17	1996-09-11	Toshiba Kk	CLEANING AGENT AND METHOD AND APPARATUS FOR CLEANING
JP2679618B2 (en) *	1994-04-26	1997-11-19	日本電気株式会社	Stripping liquid composition and stripping and cleaning method
US5721204A (en) *	1996-02-29	1998-02-24	Gage Products Company	Paint stripping composition
US6169061B1 (en)	1997-05-23	2001-01-02	Huntsman Petrochemical Corporation	Paint and coating remover
WO1998053016A1 (en) *	1997-05-23	1998-11-26	Huntsman Petrochemical Corporation	Paint and coating remover
US6187108B1 (en) *	1999-02-25	2001-02-13	Huntsman Petrochemical Corporation	Alkylene carbonate-based cleaners
US6207224B1 (en) *	1999-10-06	2001-03-27	E. I. Du Pont De Nemours And Company	Process for coating thermoplastic substrates with a coating composition containing a non-aggressive solvent
US6420327B1 (en) *	2000-08-09	2002-07-16	Huntsman Petrochemical Corporation	Carbonate-based coating removers

2001
- 2001-06-14 WO PCT/US2001/041033 patent/WO2002003143A2/en not_active Ceased
- 2001-06-14 AU AU2001273598A patent/AU2001273598A1/en not_active Abandoned
- 2001-09-05 US US09/946,313 patent/US6475708B2/en not_active Expired - Fee Related
2002
- 2002-06-06 US US10/164,793 patent/US6586164B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
WO2002003143A3 (en)	2002-04-25
US6586164B2 (en)	2003-07-01
WO2002003143A2 (en)	2002-01-10
US6475708B2 (en)	2002-11-05
US20020155393A1 (en)	2002-10-24
US20020068244A1 (en)	2002-06-06

Publication	Publication Date	Title
EP1400858A4 (en)	2006-06-28	Photoresist stripper composition
AU2001274180A1 (en)	2001-12-17	Photosensitive composition for making photoresist
AU2001283989A1 (en)	2002-02-25	Surface-active photoinitiators
AU2001256797A1 (en)	2001-11-07	Resist stripper composition
GB2363856B (en)	2003-09-03	Photoresist composition
AU2002224919A1 (en)	2002-06-24	Surface-active photoinitiators
AU2001288946A1 (en)	2002-03-26	Photoresist composition
AU6599300A (en)	2001-03-19	Photoresist remover composition
AUPQ875700A0 (en)	2000-08-03	Combination compositions
AU2002231669A1 (en)	2002-06-24	Surface-active photoinitiators
AU2001243246A1 (en)	2001-10-03	High speed photoresist stripping chamber
AU2002214324A1 (en)	2002-08-08	Medicinal compositions
AU2001273598A1 (en)	2002-01-14	Carbonate-based photoresist stripping compositions
AU2001220281A1 (en)	2002-05-27	Rollerboard for road-skiing
AU2001289588A1 (en)	2002-04-02	Phospholipase from zygoascus hellenicus
AU2002254232A1 (en)	2002-10-08	Photoresist composition
AU2001262793A1 (en)	2001-12-24	Photoresist remover composition
AU2001214419A1 (en)	2002-06-11	Fragrance compositions
AU2002232383A1 (en)	2002-04-29	Compositions for microlithography
AU2001296527A1 (en)	2002-04-15	Resist stripping process
AU2002239405A1 (en)	2002-06-11	Tetrapartate prodrugs
AU2000278051A1 (en)	2001-09-03	Stabilized emulsion compositions
AU2001235764A1 (en)	2001-09-03	Compositions
AU2002219815A1 (en)	2002-05-27	Chrystal compositions comprising topoisomerase i
AU2001247226A1 (en)	2001-10-03	High speed stripping for damaged photoresist