AU2001263382A1 - Semiconductor component and method of manufacturing - Google Patents
Semiconductor component and method of manufacturingInfo
- Publication number
- AU2001263382A1 AU2001263382A1 AU2001263382A AU6338201A AU2001263382A1 AU 2001263382 A1 AU2001263382 A1 AU 2001263382A1 AU 2001263382 A AU2001263382 A AU 2001263382A AU 6338201 A AU6338201 A AU 6338201A AU 2001263382 A1 AU2001263382 A1 AU 2001263382A1
- Authority
- AU
- Australia
- Prior art keywords
- manufacturing
- semiconductor component
- semiconductor
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/01—Manufacture or treatment
- H10D10/021—Manufacture or treatment of heterojunction BJTs [HBT]
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60503700A | 2000-06-27 | 2000-06-27 | |
| US09605037 | 2000-06-27 | ||
| PCT/US2001/016689 WO2002001624A1 (en) | 2000-06-27 | 2001-05-23 | Semiconductor component and method of manufacturing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2001263382A1 true AU2001263382A1 (en) | 2002-01-08 |
Family
ID=24422001
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2001263382A Abandoned AU2001263382A1 (en) | 2000-06-27 | 2001-05-23 | Semiconductor component and method of manufacturing |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU2001263382A1 (en) |
| WO (1) | WO2002001624A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1439570A1 (en) | 2003-01-14 | 2004-07-21 | Interuniversitair Microelektronica Centrum ( Imec) | SiGe strain relaxed buffer for high mobility devices and a method of fabricating it |
| DE102004033149B4 (en) * | 2004-07-08 | 2006-09-28 | Infineon Technologies Ag | A method of fabricating a dual gate transistor, a memory cell, a vertical transistor, and buried word or bit lines, each using a buried etch stop layer |
| JP4946247B2 (en) * | 2006-08-04 | 2012-06-06 | 信越半導体株式会社 | Epitaxial substrate and liquid phase epitaxial growth method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19755979A1 (en) * | 1996-12-09 | 1999-06-10 | Inst Halbleiterphysik Gmbh | Silicon germanium heterobipolar transistor |
| US6492711B1 (en) * | 1999-06-22 | 2002-12-10 | Matsushita Electric Industrial Co., Ltd. | Heterojunction bipolar transistor and method for fabricating the same |
-
2001
- 2001-05-23 AU AU2001263382A patent/AU2001263382A1/en not_active Abandoned
- 2001-05-23 WO PCT/US2001/016689 patent/WO2002001624A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| WO2002001624A1 (en) | 2002-01-03 |
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