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AU2001252770A1 - Electron-beam lithography - Google Patents

Electron-beam lithography

Info

Publication number
AU2001252770A1
AU2001252770A1 AU2001252770A AU5277001A AU2001252770A1 AU 2001252770 A1 AU2001252770 A1 AU 2001252770A1 AU 2001252770 A AU2001252770 A AU 2001252770A AU 5277001 A AU5277001 A AU 5277001A AU 2001252770 A1 AU2001252770 A1 AU 2001252770A1
Authority
AU
Australia
Prior art keywords
electron
beam lithography
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001252770A
Inventor
Pieter Willem Herman De Jager
Quirinus Antonius Gerardus Van Vlimmeren
Gerardus Johannes Verhaart
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
ODME International BV
Original Assignee
Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
ODME International BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO, ODME International BV filed Critical Nederlandse Organisatie voor Toegepast Natuurwetenschappelijk Onderzoek TNO
Publication of AU2001252770A1 publication Critical patent/AU2001252770A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H10P76/00—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
  • Manufacturing Optical Record Carriers (AREA)
AU2001252770A 2000-05-11 2001-05-01 Electron-beam lithography Abandoned AU2001252770A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL1015155A NL1015155C2 (en) 2000-05-11 2000-05-11 Electron beam lithography.
NL1015155 2000-05-11
PCT/NL2001/000328 WO2001086649A1 (en) 2000-05-11 2001-05-01 Electron-beam lithography

Publications (1)

Publication Number Publication Date
AU2001252770A1 true AU2001252770A1 (en) 2001-11-20

Family

ID=19771350

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001252770A Abandoned AU2001252770A1 (en) 2000-05-11 2001-05-01 Electron-beam lithography

Country Status (6)

Country Link
US (1) US6835943B2 (en)
EP (1) EP1290685A1 (en)
KR (1) KR20030025226A (en)
AU (1) AU2001252770A1 (en)
NL (1) NL1015155C2 (en)
WO (1) WO2001086649A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004005872A (en) * 2002-04-09 2004-01-08 Matsushita Electric Ind Co Ltd Method for manufacturing optical disk master, optical disk and method for manufacturing the same
US6915374B2 (en) * 2003-02-19 2005-07-05 Dell Products L.P. Method and system for setting optical drive write strategies
JP5226943B2 (en) * 2006-08-31 2013-07-03 株式会社リコー Drawing method, drawing apparatus, and information recording medium
JP2011511465A (en) * 2008-02-05 2011-04-07 ニル・テクノロジー・エーピーエス Method for performing electron beam lithography
KR101769493B1 (en) * 2011-12-23 2017-08-30 주식회사 원익아이피에스 Substrate processing apparatus and substrate processing system

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6034754B2 (en) * 1976-02-18 1985-08-10 松下電器産業株式会社 hologram recording device
JPS5472980A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Electron-beam drawing unit
US5216219A (en) * 1991-05-10 1993-06-01 Pioneer Electronic Corporation Disk manufacturing apparatus
ATE198386T1 (en) * 1993-12-24 2001-01-15 Koninkl Philips Electronics Nv METHOD FOR PRODUCING AN OPTICAL INFORMATION CARRIER, DEVICE FOR CARRYING OUT THE METHOD, AND OPTICAL INFORMATION CARRIER PRODUCED BY THIS METHOD
US5561008A (en) * 1995-01-27 1996-10-01 Lucent Technologies Inc. Process for device fabrication using projection lithography and an apparatus therefor
US5942760A (en) * 1997-11-03 1999-08-24 Motorola Inc. Method of forming a semiconductor device utilizing scalpel mask, and mask therefor
JPH11288532A (en) * 1998-03-31 1999-10-19 Sony Corp Exposure apparatus, exposure method, and recording medium
JP4196425B2 (en) * 1998-03-31 2008-12-17 ソニー株式会社 Disc master production device
US6051346A (en) * 1998-04-29 2000-04-18 Lucent Technologies Inc. Process for fabricating a lithographic mask

Also Published As

Publication number Publication date
US20030155532A1 (en) 2003-08-21
EP1290685A1 (en) 2003-03-12
KR20030025226A (en) 2003-03-28
WO2001086649A1 (en) 2001-11-15
NL1015155C2 (en) 2001-11-13
US6835943B2 (en) 2004-12-28

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