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AU2000259171A1 - Fluorinated solvent compositions containing hydrogen fluoride - Google Patents

Fluorinated solvent compositions containing hydrogen fluoride

Info

Publication number
AU2000259171A1
AU2000259171A1 AU2000259171A AU5917100A AU2000259171A1 AU 2000259171 A1 AU2000259171 A1 AU 2000259171A1 AU 2000259171 A AU2000259171 A AU 2000259171A AU 5917100 A AU5917100 A AU 5917100A AU 2000259171 A1 AU2000259171 A1 AU 2000259171A1
Authority
AU
Australia
Prior art keywords
compositions containing
hydrogen fluoride
containing hydrogen
fluorinated solvent
solvent compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000259171A
Inventor
Frederick E. Behr
Michael J. Parent
Paul E. Rajtar
Lawrence A. Zazzera
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of AU2000259171A1 publication Critical patent/AU2000259171A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/24—Organic compounds containing halogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5018—Halogenated solvents
    • H10P70/234—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Detergent Compositions (AREA)
  • Weting (AREA)
AU2000259171A 2000-03-31 2000-07-06 Fluorinated solvent compositions containing hydrogen fluoride Abandoned AU2000259171A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09541453 2000-03-31
US09/541,453 US6310018B1 (en) 2000-03-31 2000-03-31 Fluorinated solvent compositions containing hydrogen fluoride
PCT/US2000/018516 WO2001075955A1 (en) 2000-03-31 2000-07-06 Fluorinated solvent compositions containing hydrogen fluoride

Publications (1)

Publication Number Publication Date
AU2000259171A1 true AU2000259171A1 (en) 2001-10-15

Family

ID=24159658

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000259171A Abandoned AU2000259171A1 (en) 2000-03-31 2000-07-06 Fluorinated solvent compositions containing hydrogen fluoride

Country Status (6)

Country Link
US (2) US6310018B1 (en)
EP (1) EP1269527A1 (en)
JP (1) JP4786111B2 (en)
KR (2) KR20070020150A (en)
AU (1) AU2000259171A1 (en)
WO (1) WO2001075955A1 (en)

Families Citing this family (87)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6552090B1 (en) * 1997-09-15 2003-04-22 3M Innovative Properties Company Perfluoroalkyl haloalkyl ethers and compositions and applications thereof
US6100198A (en) * 1998-02-27 2000-08-08 Micron Technology, Inc. Post-planarization, pre-oxide removal ozone treatment
US6303986B1 (en) 1998-07-29 2001-10-16 Silicon Light Machines Method of and apparatus for sealing an hermetic lid to a semiconductor die
US6872984B1 (en) 1998-07-29 2005-03-29 Silicon Light Machines Corporation Method of sealing a hermetic lid to a semiconductor die at an angle
US6956878B1 (en) 2000-02-07 2005-10-18 Silicon Light Machines Corporation Method and apparatus for reducing laser speckle using polarization averaging
US6310018B1 (en) * 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride
US6372700B1 (en) * 2000-03-31 2002-04-16 3M Innovative Properties Company Fluorinated solvent compositions containing ozone
TWI259202B (en) * 2000-06-01 2006-08-01 Asahi Kasei Corp Cleaning method and cleaning apparatus
US6387723B1 (en) * 2001-01-19 2002-05-14 Silicon Light Machines Reduced surface charging in silicon-based devices
TWI242805B (en) * 2001-02-15 2005-11-01 United Microelectronics Corp Post metal etch cleaning method
US7177081B2 (en) 2001-03-08 2007-02-13 Silicon Light Machines Corporation High contrast grating light valve type device
US6707591B2 (en) 2001-04-10 2004-03-16 Silicon Light Machines Angled illumination for a single order light modulator based projection system
US6865346B1 (en) 2001-06-05 2005-03-08 Silicon Light Machines Corporation Fiber optic transceiver
US6782205B2 (en) 2001-06-25 2004-08-24 Silicon Light Machines Method and apparatus for dynamic equalization in wavelength division multiplexing
US6747781B2 (en) 2001-06-25 2004-06-08 Silicon Light Machines, Inc. Method, apparatus, and diffuser for reducing laser speckle
US6829092B2 (en) 2001-08-15 2004-12-07 Silicon Light Machines, Inc. Blazed grating light valve
US6930364B2 (en) 2001-09-13 2005-08-16 Silicon Light Machines Corporation Microelectronic mechanical system and methods
US6696364B2 (en) * 2001-10-19 2004-02-24 Stmicroelectronics S.R.L. Method for manipulating MEMS devices, integrated on a wafer semiconductor and intended to be diced one from the other, and relevant support
US6956995B1 (en) 2001-11-09 2005-10-18 Silicon Light Machines Corporation Optical communication arrangement
JP4042412B2 (en) * 2002-01-11 2008-02-06 ソニー株式会社 Cleaning and drying method
US6800238B1 (en) 2002-01-15 2004-10-05 Silicon Light Machines, Inc. Method for domain patterning in low coercive field ferroelectrics
US6728023B1 (en) 2002-05-28 2004-04-27 Silicon Light Machines Optical device arrays with optimized image resolution
US6767751B2 (en) 2002-05-28 2004-07-27 Silicon Light Machines, Inc. Integrated driver process flow
US7054515B1 (en) 2002-05-30 2006-05-30 Silicon Light Machines Corporation Diffractive light modulator-based dynamic equalizer with integrated spectral monitor
US6841079B2 (en) * 2002-05-31 2005-01-11 3M Innovative Properties Company Fluorochemical treatment for silicon articles
US6822797B1 (en) 2002-05-31 2004-11-23 Silicon Light Machines, Inc. Light modulator structure for producing high-contrast operation using zero-order light
US6699829B2 (en) * 2002-06-07 2004-03-02 Kyzen Corporation Cleaning compositions containing dichloroethylene and six carbon alkoxy substituted perfluoro compounds
US6829258B1 (en) 2002-06-26 2004-12-07 Silicon Light Machines, Inc. Rapidly tunable external cavity laser
US6908201B2 (en) 2002-06-28 2005-06-21 Silicon Light Machines Corporation Micro-support structures
US6813059B2 (en) 2002-06-28 2004-11-02 Silicon Light Machines, Inc. Reduced formation of asperities in contact micro-structures
US6714337B1 (en) 2002-06-28 2004-03-30 Silicon Light Machines Method and device for modulating a light beam and having an improved gamma response
US7057795B2 (en) 2002-08-20 2006-06-06 Silicon Light Machines Corporation Micro-structures with individually addressable ribbon pairs
US6801354B1 (en) 2002-08-20 2004-10-05 Silicon Light Machines, Inc. 2-D diffraction grating for substantially eliminating polarization dependent losses
US7018937B2 (en) * 2002-08-29 2006-03-28 Micron Technology, Inc. Compositions for removal of processing byproducts and method for using same
US20040058551A1 (en) * 2002-09-23 2004-03-25 Meagley Robert P. Fluorous cleaning solution for lithographic processing
US6712480B1 (en) 2002-09-27 2004-03-30 Silicon Light Machines Controlled curvature of stressed micro-structures
US6890452B2 (en) * 2002-11-08 2005-05-10 3M Innovative Properties Company Fluorinated surfactants for aqueous acid etch solutions
US7169323B2 (en) * 2002-11-08 2007-01-30 3M Innovative Properties Company Fluorinated surfactants for buffered acid etch solutions
US6928207B1 (en) 2002-12-12 2005-08-09 Silicon Light Machines Corporation Apparatus for selectively blocking WDM channels
US6884338B2 (en) 2002-12-16 2005-04-26 3M Innovative Properties Company Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
US7147767B2 (en) 2002-12-16 2006-12-12 3M Innovative Properties Company Plating solutions for electrochemical or chemical deposition of copper interconnects and methods therefor
US6858124B2 (en) 2002-12-16 2005-02-22 3M Innovative Properties Company Methods for polishing and/or cleaning copper interconnects and/or film and compositions therefor
US6987600B1 (en) 2002-12-17 2006-01-17 Silicon Light Machines Corporation Arbitrary phase profile for better equalization in dynamic gain equalizer
US7057819B1 (en) 2002-12-17 2006-06-06 Silicon Light Machines Corporation High contrast tilting ribbon blazed grating
US20040118621A1 (en) * 2002-12-18 2004-06-24 Curtis Marc D. Live hydraulics for utility vehicles
US6934070B1 (en) 2002-12-18 2005-08-23 Silicon Light Machines Corporation Chirped optical MEM device
US6927891B1 (en) 2002-12-23 2005-08-09 Silicon Light Machines Corporation Tilt-able grating plane for improved crosstalk in 1×N blaze switches
US7068372B1 (en) 2003-01-28 2006-06-27 Silicon Light Machines Corporation MEMS interferometer-based reconfigurable optical add-and-drop multiplexor
US7286764B1 (en) 2003-02-03 2007-10-23 Silicon Light Machines Corporation Reconfigurable modulator-based optical add-and-drop multiplexer
US6947613B1 (en) 2003-02-11 2005-09-20 Silicon Light Machines Corporation Wavelength selective switch and equalizer
US6922272B1 (en) 2003-02-14 2005-07-26 Silicon Light Machines Corporation Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices
US6922273B1 (en) 2003-02-28 2005-07-26 Silicon Light Machines Corporation PDL mitigation structure for diffractive MEMS and gratings
US7391973B1 (en) 2003-02-28 2008-06-24 Silicon Light Machines Corporation Two-stage gain equalizer
US6806997B1 (en) 2003-02-28 2004-10-19 Silicon Light Machines, Inc. Patterned diffractive light modulator ribbon for PDL reduction
US7027202B1 (en) 2003-02-28 2006-04-11 Silicon Light Machines Corp Silicon substrate as a light modulator sacrificial layer
US6829077B1 (en) 2003-02-28 2004-12-07 Silicon Light Machines, Inc. Diffractive light modulator with dynamically rotatable diffraction plane
US7042611B1 (en) 2003-03-03 2006-05-09 Silicon Light Machines Corporation Pre-deflected bias ribbons
WO2005001015A1 (en) * 2003-06-27 2005-01-06 Asahi Glass Company, Limited Cleaning/rinsing method
JP2005101711A (en) * 2003-09-22 2005-04-14 Renesas Technology Corp Solid-state imaging device and manufacturing method thereof
EP1680806A4 (en) * 2003-10-28 2008-07-30 Sachem Inc CLEANING SOLUTIONS AND ETCHING AGENTS, AND METHODS OF USE
US6930367B2 (en) * 2003-10-31 2005-08-16 Robert Bosch Gmbh Anti-stiction technique for thin film and wafer-bonded encapsulated microelectromechanical systems
US7071154B2 (en) * 2003-12-18 2006-07-04 3M Innovative Properties Company Azeotrope-like compositions and their use
US7514012B2 (en) * 2004-01-27 2009-04-07 Texas Instruments Incorporated Pre-oxidization of deformable elements of microstructures
JP2005217262A (en) * 2004-01-30 2005-08-11 Matsushita Electric Ind Co Ltd Method for manufacturing compound semiconductor device
US8119537B2 (en) * 2004-09-02 2012-02-21 Micron Technology, Inc. Selective etching of oxides to metal nitrides and metal oxides
US20060054595A1 (en) * 2004-09-10 2006-03-16 Honeywell International Inc. Selective hafnium oxide etchant
US7394103B2 (en) * 2004-09-13 2008-07-01 Uchicago Argonne, Llc All diamond self-aligned thin film transistor
JP4559250B2 (en) * 2005-02-16 2010-10-06 シチズンファインテックミヨタ株式会社 Actuator and manufacturing method thereof
US7449355B2 (en) * 2005-04-27 2008-11-11 Robert Bosch Gmbh Anti-stiction technique for electromechanical systems and electromechanical device employing same
US7713885B2 (en) * 2005-05-11 2010-05-11 Micron Technology, Inc. Methods of etching oxide, reducing roughness, and forming capacitor constructions
US20070129273A1 (en) * 2005-12-07 2007-06-07 Clark Philip G In situ fluoride ion-generating compositions and uses thereof
US20070170528A1 (en) 2006-01-20 2007-07-26 Aaron Partridge Wafer encapsulated microelectromechanical structure and method of manufacturing same
US7654010B2 (en) * 2006-02-23 2010-02-02 Tokyo Electron Limited Substrate processing system, substrate processing method, and storage medium
US8084367B2 (en) * 2006-05-24 2011-12-27 Samsung Electronics Co., Ltd Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods
DE102006030588A1 (en) * 2006-07-03 2008-01-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Liquid-jet-guided etching process for removing material from solids and its use
JP2008066351A (en) * 2006-09-05 2008-03-21 Dainippon Screen Mfg Co Ltd Substrate processing equipment
US20080125342A1 (en) * 2006-11-07 2008-05-29 Advanced Technology Materials, Inc. Formulations for cleaning memory device structures
JP4803821B2 (en) * 2007-03-23 2011-10-26 大日本スクリーン製造株式会社 Substrate processing equipment
US20090029274A1 (en) * 2007-07-25 2009-01-29 3M Innovative Properties Company Method for removing contamination with fluorinated compositions
US20090253268A1 (en) * 2008-04-03 2009-10-08 Honeywell International, Inc. Post-contact opening etchants for post-contact etch cleans and methods for fabricating the same
JP5960439B2 (en) * 2012-01-27 2016-08-02 スリーエム イノベイティブ プロパティズ カンパニー Dust removal cleaning liquid and cleaning method using the same
JP2016164977A (en) * 2015-02-27 2016-09-08 キヤノン株式会社 Liquid material for nanoimprint, method for producing liquid material for nanoimprint, method for producing cured product pattern, method for producing optical component, method for producing circuit board, and method for producing electronic component
US11361972B2 (en) * 2019-04-18 2022-06-14 Micron Technology, Inc. Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide
KR20220002981A (en) 2019-04-24 2022-01-07 에보니크 오퍼레이션즈 게엠베하 Liquid Dispersion of Enhanced Thermal Conductivity Containing Inorganic Particles
EP3966286A1 (en) * 2019-05-10 2022-03-16 3M Innovative Properties Company Hydrofluorothioethers and methods of using same
WO2021144678A1 (en) * 2020-01-15 2021-07-22 3M Innovative Properties Company Hydrofluorethers and methods of using same
WO2025090723A1 (en) * 2023-10-25 2025-05-01 Versum Materials Us, Llc Hydrofluorocarbon compounds and their use in integrated circuit manufacturing processes

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1037857A (en) 1963-07-11 1966-08-03 Pennsalt Chemicals Corp Method and composition for cleaning resin coated substrates
DE1298514B (en) 1965-12-02 1969-07-03 Hoechst Ag Process for the preparation of perfluoroalkyl-alkyl-ethers
FR2287432A1 (en) 1974-10-10 1976-05-07 Poudres & Explosifs Ste Nale Fluoroethers from silver fluoride complexes - used as hypnotics and anaesthetics, in prepn. of thermostable polymers, and as plant protection agents
US4055458A (en) * 1975-08-07 1977-10-25 Bayer Aktiengesellschaft Etching glass with HF and fluorine-containing surfactant
JPS6039176A (en) * 1983-08-10 1985-02-28 Daikin Ind Ltd Etching agent composition
JPS63283028A (en) * 1986-09-29 1988-11-18 Hashimoto Kasei Kogyo Kk Treating agent for fine working surface
JP2999591B2 (en) 1991-07-22 2000-01-17 徳三 助川 Method for manufacturing GaAs device having high-purity intrinsic layer
JPH0629235A (en) * 1992-07-09 1994-02-04 Mitsubishi Electric Corp Manufacture of semiconductor device
DE69418458T2 (en) * 1993-02-04 2000-01-27 Daikin Industries, Ltd. WETNESS CONNECTION FOR SEMICONDUCTORS WITH EXCELLENT HUMIDIFICATION PROPERTIES
JP2589930B2 (en) 1993-03-05 1997-03-12 工業技術院長 Methyl 1,1,2,2,3,3-hexafluoropropyl ether, method for producing the same, and detergent containing the same
US5658962A (en) 1994-05-20 1997-08-19 Minnesota Mining And Manufacturing Company Omega-hydrofluoroalkyl ethers, precursor carboxylic acids and derivatives thereof, and their preparation and application
US5478436A (en) * 1994-12-27 1995-12-26 Motorola, Inc. Selective cleaning process for fabricating a semiconductor device
US5925611A (en) 1995-01-20 1999-07-20 Minnesota Mining And Manufacturing Company Cleaning process and composition
US5571447A (en) * 1995-03-20 1996-11-05 Ashland Inc. Stripping and cleaning composition
US5603750A (en) 1995-08-14 1997-02-18 Minnesota Mining And Manufacturing Company Fluorocarbon fluids as gas carriers to aid in precious and base metal heap leaching operations
US5750797A (en) 1996-04-15 1998-05-12 Minnesota Mining And Manufacturing Company Process for the production of hydrofluoroethers
US6001796A (en) 1996-07-03 1999-12-14 Alliedsignal Inc. Azeotrope-like compositions of 1,1,1,3,3-pentafluoropropane and hydrogen fluoride
CN1125963C (en) 1997-09-23 2003-10-29 格雷·W·费雷尔 Improved chemical drying and cleaning system
FR2768717B1 (en) 1997-09-24 1999-11-12 Solvay PROCESS FOR SEPARATING HYDROGEN FLUORIDE FROM ITS MIXTURES WITH A HYDROFLUOROALCANE CONTAINING FROM 3 TO 6 CARBON ATOMS
US6046368A (en) 1998-03-17 2000-04-04 3M Innovative Properties Company Catalytic process for making hydrofluoroethers
JPH11340183A (en) * 1998-05-27 1999-12-10 Morita Kagaku Kogyo Kk Cleaning solution for semiconductor device and method for manufacturing semiconductor device using the same
JP4107720B2 (en) * 1998-07-07 2008-06-25 スリーエム カンパニー Method for cleaning contaminants in semiconductor manufacturing equipment
US6310018B1 (en) * 2000-03-31 2001-10-30 3M Innovative Properties Company Fluorinated solvent compositions containing hydrogen fluoride

Also Published As

Publication number Publication date
WO2001075955A1 (en) 2001-10-11
JP2003529675A (en) 2003-10-07
KR20070020150A (en) 2007-02-16
US6492309B1 (en) 2002-12-10
US6310018B1 (en) 2001-10-30
KR20030007484A (en) 2003-01-23
KR100785131B1 (en) 2007-12-11
JP4786111B2 (en) 2011-10-05
EP1269527A1 (en) 2003-01-02

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