AU1955395A - Tantalum compounds - Google Patents
Tantalum compoundsInfo
- Publication number
- AU1955395A AU1955395A AU19553/95A AU1955395A AU1955395A AU 1955395 A AU1955395 A AU 1955395A AU 19553/95 A AU19553/95 A AU 19553/95A AU 1955395 A AU1955395 A AU 1955395A AU 1955395 A AU1955395 A AU 1955395A
- Authority
- AU
- Australia
- Prior art keywords
- tantalum compounds
- tantalum
- compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 150000003482 tantalum compounds Chemical class 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/405—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/005—Compounds of elements of Group 5 of the Periodic Table without metal-carbon linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9406060 | 1994-03-26 | ||
| GB9406060A GB9406060D0 (en) | 1994-03-26 | 1994-03-26 | Volatile tantalum compounds |
| GB9423750A GB9423750D0 (en) | 1994-11-24 | 1994-11-24 | Tantalum compounds |
| GB9423750 | 1994-11-24 | ||
| PCT/GB1995/000644 WO1995026355A1 (en) | 1994-03-26 | 1995-03-23 | Tantalum compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU1955395A true AU1955395A (en) | 1995-10-17 |
Family
ID=26304592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU19553/95A Abandoned AU1955395A (en) | 1994-03-26 | 1995-03-23 | Tantalum compounds |
Country Status (2)
| Country | Link |
|---|---|
| AU (1) | AU1955395A (en) |
| WO (1) | WO1995026355A1 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3223800B2 (en) | 1996-07-25 | 2001-10-29 | 三菱マテリアル株式会社 | Tantalum compound |
| GB9809207D0 (en) * | 1998-04-29 | 1998-07-01 | Bp Chem Int Ltd | Novel catalysts for olefin polymerisation |
| US20020009861A1 (en) * | 1998-06-12 | 2002-01-24 | Pravin K. Narwankar | Method and apparatus for the formation of dielectric layers |
| WO2000032608A1 (en) * | 1998-11-26 | 2000-06-08 | Infineon Technologies Ag | Complex compound of an element of sub-group iv |
| US7112485B2 (en) | 2002-08-28 | 2006-09-26 | Micron Technology, Inc. | Systems and methods for forming zirconium and/or hafnium-containing layers |
| US6784049B2 (en) | 2002-08-28 | 2004-08-31 | Micron Technology, Inc. | Method for forming refractory metal oxide layers with tetramethyldisiloxane |
| US7030042B2 (en) | 2002-08-28 | 2006-04-18 | Micron Technology, Inc. | Systems and methods for forming tantalum oxide layers and tantalum precursor compounds |
| US7041609B2 (en) | 2002-08-28 | 2006-05-09 | Micron Technology, Inc. | Systems and methods for forming metal oxides using alcohols |
| JP4823069B2 (en) | 2004-11-02 | 2011-11-24 | 株式会社Adeka | Metal compound, thin film forming raw material, and thin film manufacturing method |
| WO2011148890A1 (en) * | 2010-05-24 | 2011-12-01 | 昭和電工株式会社 | Organotantalum complex compound and method for producing same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58203443A (en) * | 1982-05-24 | 1983-11-26 | Hitachi Ltd | Composition for correcting white spot defects on photomasks |
| US4525468A (en) * | 1982-09-30 | 1985-06-25 | E. I. Du Pont De Nemours And Company | Olefin polymerization catalyst |
-
1995
- 1995-03-23 WO PCT/GB1995/000644 patent/WO1995026355A1/en not_active Ceased
- 1995-03-23 AU AU19553/95A patent/AU1955395A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| WO1995026355A1 (en) | 1995-10-05 |
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