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AR025067A2 - Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo - Google Patents

Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo

Info

Publication number
AR025067A2
AR025067A2 ARP000104072A ARP000104072A AR025067A2 AR 025067 A2 AR025067 A2 AR 025067A2 AR P000104072 A ARP000104072 A AR P000104072A AR P000104072 A ARP000104072 A AR P000104072A AR 025067 A2 AR025067 A2 AR 025067A2
Authority
AR
Argentina
Prior art keywords
electrode
coating
vapor
switching
ionizing
Prior art date
Application number
ARP000104072A
Other languages
English (en)
Original Assignee
Coca Cola Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Coca Cola Co filed Critical Coca Cola Co
Publication of AR025067A2 publication Critical patent/AR025067A2/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

Un método para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor que usa una conmutacion entre los electrodosde ánodo y cátodo. El método comprende las etapas de formar un vacío dentro de una celda devacío ; suministrar un vapor de revestimiento a la celda de vacío;hacer pasar el vapor de revestimiento a través de una separacion entre un primer electrodo dispuesto en la celda de vacío y un segundo electrodo dispuesto enla celda de vacío;suministrar en ergía eléctrica al primer electrodo y al segundo electrodo de modo que el primer electrodo y el segundo electrodo quedencargados con carga opuesta y creen una descarga de arco eléctrico entre el primer electrodo y el segundoelectrodo; y conmutar la polaridad entre el primerelectrodo y el segundo electrodo mientras la energía eléctrica es suministrada al primer electrodo y el segundo electrodo. La figura muestra una disposicion deevaporador en la que el vapor esenergizado a un estado de plasma por medio del arco generado por un par de electrodos de corriente continua, cuya polaridadrelativa alterna periodicamente.
ARP000104072A 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo AR025067A2 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/128,456 US6251233B1 (en) 1998-08-03 1998-08-03 Plasma-enhanced vacuum vapor deposition system including systems for evaporation of a solid, producing an electric arc discharge and measuring ionization and evaporation

Publications (1)

Publication Number Publication Date
AR025067A2 true AR025067A2 (es) 2002-11-06

Family

ID=22435473

Family Applications (5)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor
ARP000104072A AR025067A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa una conmutacion entre electrodos de anodo y catodo
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica

Family Applications Before (3)

Application Number Title Priority Date Filing Date
ARP990103620A AR016735A1 (es) 1998-08-03 1999-07-22 Metodo para producir una descarga de arco electrico, metodo para revestir por deposicion de vapor en vacio, electrodo alimentado continuamente, aparato ydispositivo de descarga de arco electrico y disposicion de revestimiento por deposicion de vapor
ARP000104070A AR025065A2 (es) 1998-08-03 2000-08-07 Metodo y disposicion para fusionar y evaporar un material solido, disposicion de revestimiento por deposicion de vapor con vacio, y disposicion parafusionar y evaporar continuamente un material solido
ARP000104069A AR025064A2 (es) 1998-08-03 2000-08-07 Disposicion de revestimiento por deposicion de vapor, metodo para medir el grado de ionizacion y metodo para medir la velocidad de evaporacion de unevaporador en la disposicion de revestimiento por deposicion de vapor

Family Applications After (1)

Application Number Title Priority Date Filing Date
ARP000104071A AR025066A2 (es) 1998-08-03 2000-08-07 Metodo para ionizar un vapor de revestimiento en una disposicion de revestimiento por deposicion de vapor, y disposicion de revestimiento por deposicion devapor que usa un catodo con una campana anodica

Country Status (12)

Country Link
US (3) US6251233B1 (es)
EP (1) EP1109944A2 (es)
JP (1) JP2002522637A (es)
KR (1) KR20010083127A (es)
CN (1) CN1348509A (es)
AR (5) AR016735A1 (es)
AU (1) AU4990699A (es)
BR (1) BR9912722A (es)
CA (1) CA2338352A1 (es)
CO (2) CO5111049A1 (es)
IL (1) IL140811A0 (es)
WO (1) WO2000008226A2 (es)

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WO2000008226A3 (en) 2000-12-07
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WO2000008226A2 (en) 2000-02-17
BR9912722A (pt) 2001-05-02
CN1348509A (zh) 2002-05-08
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AR016735A1 (es) 2001-07-25
CO5111064A1 (es) 2001-12-26
US20030007786A1 (en) 2003-01-09
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EP1109944A2 (en) 2001-06-27
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