NL7116297A - - Google Patents
Info
- Publication number
- NL7116297A NL7116297A NL7116297A NL7116297A NL7116297A NL 7116297 A NL7116297 A NL 7116297A NL 7116297 A NL7116297 A NL 7116297A NL 7116297 A NL7116297 A NL 7116297A NL 7116297 A NL7116297 A NL 7116297A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/354—Introduction of auxiliary energy into the plasma
- C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1476071A CH551497A (de) | 1971-10-06 | 1971-10-06 | Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7116297A true NL7116297A (de) | 1973-04-10 |
Family
ID=4403604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7116297A NL7116297A (de) | 1971-10-06 | 1971-11-26 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US3839182A (de) |
| CH (1) | CH551497A (de) |
| FR (1) | FR2155589A5 (de) |
| GB (1) | GB1405489A (de) |
| NL (1) | NL7116297A (de) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH631743A5 (de) * | 1977-06-01 | 1982-08-31 | Balzers Hochvakuum | Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage. |
| US4111783A (en) * | 1977-11-08 | 1978-09-05 | Bell Telephone Laboratories, Incorporated | Triode sputtering system |
| JPS57134559A (en) * | 1981-02-12 | 1982-08-19 | Toyota Central Res & Dev Lab Inc | Physical vapor deposition device |
| US4556471A (en) * | 1983-10-14 | 1985-12-03 | Multi-Arc Vacuum Systems Inc. | Physical vapor deposition apparatus |
| US5084151A (en) * | 1985-11-26 | 1992-01-28 | Sorin Biomedica S.P.A. | Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon |
| US5133845A (en) * | 1986-12-12 | 1992-07-28 | Sorin Biomedica, S.P.A. | Method for making prosthesis of polymeric material coated with biocompatible carbon |
| EP0357824B1 (de) * | 1988-09-08 | 1993-04-07 | Joshin Uramoto | Zerstäubungsverfahren mittels eines bandförmigen Plasmaflusses und Gerät zur Handhabung dieses Verfahrens |
| US4943325A (en) * | 1988-10-19 | 1990-07-24 | Black & Veatch, Engineers-Architects | Reflector assembly |
| US4936960A (en) * | 1989-01-03 | 1990-06-26 | Advanced Energy Industries, Inc. | Method and apparatus for recovery from low impedance condition during cathodic arc processes |
| US4963238A (en) * | 1989-01-13 | 1990-10-16 | Siefkes Jerry D | Method for removal of electrical shorts in a sputtering system |
| EP0381912B1 (de) * | 1989-02-09 | 1994-03-09 | Balzers Aktiengesellschaft | Verfahren zum Zentrieren eines Elektronenstrahles |
| US5250779A (en) * | 1990-11-05 | 1993-10-05 | Balzers Aktiengesellschaft | Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field |
| CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
| WO1996031899A1 (en) | 1995-04-07 | 1996-10-10 | Advanced Energy Industries, Inc. | Adjustable energy quantum thin film plasma processing system |
| WO2001004379A1 (de) * | 1999-07-13 | 2001-01-18 | Unaxis Balzers Aktiengesellschaft | Anlage und verfahren zur vakuumbehandlung bzw. zur pulverherstellung |
| US20090065045A1 (en) * | 2007-09-10 | 2009-03-12 | Zenith Solar Ltd. | Solar electricity generation system |
| US9893223B2 (en) | 2010-11-16 | 2018-02-13 | Suncore Photovoltaics, Inc. | Solar electricity generation system |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL130959C (de) * | 1965-12-17 | |||
| FR1534917A (fr) * | 1967-06-22 | 1968-08-02 | Alcatel Sa | Perfectionnements à l'obtention de dépôts par pulvérisation cathodique |
| US3708418A (en) * | 1970-03-05 | 1973-01-02 | Rca Corp | Apparatus for etching of thin layers of material by ion bombardment |
| US3711398A (en) * | 1971-02-18 | 1973-01-16 | P Clarke | Sputtering apparatus |
-
1971
- 1971-10-06 CH CH1476071A patent/CH551497A/de not_active IP Right Cessation
- 1971-11-26 NL NL7116297A patent/NL7116297A/xx unknown
-
1972
- 1972-09-29 US US00293503A patent/US3839182A/en not_active Expired - Lifetime
- 1972-10-03 GB GB4550572A patent/GB1405489A/en not_active Expired
- 1972-10-04 FR FR7235267A patent/FR2155589A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2246983B2 (de) | 1975-11-20 |
| CH551497A (de) | 1974-07-15 |
| FR2155589A5 (de) | 1973-05-18 |
| DE2246983A1 (de) | 1973-04-12 |
| US3839182A (en) | 1974-10-01 |
| GB1405489A (en) | 1975-09-10 |