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NL2020970A - A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus - Google Patents

A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus

Info

Publication number
NL2020970A
NL2020970A NL2020970A NL2020970A NL2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A NL 2020970 A NL2020970 A NL 2020970A
Authority
NL
Netherlands
Prior art keywords
substrate support
cleaning
treatment tool
projections
lithographic device
Prior art date
Application number
NL2020970A
Other languages
English (en)
Inventor
Guan Tiannan
Lindeijer Tjarco
Dirk Scholten Bert
Schreuder André
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2020970A publication Critical patent/NL2020970A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

A system for cleaning a substrate support comprising a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system comprising: a treatment tool arranged for relative movement in a second direction orthogonal to the 5 first direction and a third direction orthogonal to the first direction and the second direction over the terminal surfaces of the projections thereby to remove matter from the substrate support; a controller adapted to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another. 10
NL2020970A 2017-06-08 2018-05-23 A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus NL2020970A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP17175095 2017-06-08

Publications (1)

Publication Number Publication Date
NL2020970A true NL2020970A (nl) 2018-12-13

Family

ID=59034540

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2020970A NL2020970A (nl) 2017-06-08 2018-05-23 A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus

Country Status (3)

Country Link
US (1) US20200103770A1 (nl)
NL (1) NL2020970A (nl)
WO (1) WO2018224303A1 (nl)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4080285A1 (en) 2021-04-21 2022-10-26 ASML Netherlands B.V. Surface treatment device
WO2022223277A1 (en) * 2021-04-21 2022-10-27 Asml Netherlands B.V. Surface treatment device and method
EP4318133A1 (en) 2022-08-05 2024-02-07 ASML Netherlands B.V. System, apparatus and method for selective surface treatment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2868652B2 (ja) * 1991-09-24 1999-03-10 キヤノン株式会社 半導体露光装置
JP3441956B2 (ja) * 1998-02-16 2003-09-02 キヤノン株式会社 露光装置、クリーニング用砥石およびデバイス製造方法
EP1507172A1 (en) * 2003-08-12 2005-02-16 ASML Netherlands B.V. Lithographic apparatus and apparatus adjustment method
WO2016081951A1 (en) 2014-11-23 2016-05-26 M Cubed Technologies Wafer pin chuck fabrication and repair

Also Published As

Publication number Publication date
US20200103770A1 (en) 2020-04-02
WO2018224303A1 (en) 2018-12-13

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