NL2008178A - Lithographic apparatus and stage system. - Google Patents

Lithographic apparatus and stage system.

Info

Publication number: NL2008178A
Authority: NL; Netherlands
Prior art keywords: lithographic apparatus; stage system; stage; lithographic
Prior art date: 2011-02-25

Application number

NL2008178A

Other languages

English (en)

Inventor

Jan-Gerard Cornelis Toorn

Marcel Baggen

Stefan Kruijswijk

Jeroen Starreveld

Mark Baggen

Michael Vervoordeldonk

Original Assignee

Asml Netherlands Bv

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2011-02-25

Filing date

2012-01-25

Publication date

2012-08-28

2012-01-25 Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv

2012-08-28 Publication of NL2008178A publication Critical patent/NL2008178A/nl

Classifications

- H10P76/204—
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

Health & Medical Sciences (AREA)
General Physics & Mathematics (AREA)
Physics & Mathematics (AREA)
Toxicology (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Atmospheric Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Control Of Position Or Direction (AREA)

NL2008178A 2011-02-25 2012-01-25 Lithographic apparatus and stage system. NL2008178A (nl)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US201161446857P	2011-02-25	2011-02-25

Publications (1)

Publication Number	Publication Date
NL2008178A true NL2008178A (nl)	2012-08-28

Family

ID=46876783

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
NL2008178A NL2008178A (nl)	2011-02-25	2012-01-25	Lithographic apparatus and stage system.

Country Status (6)

Country	Link
US (1)	US9097990B2 (nl)
JP (1)	JP5690294B2 (nl)
KR (1)	KR101380266B1 (nl)
CN (1)	CN102707573B (nl)
NL (1)	NL2008178A (nl)
TW (1)	TWI474131B (nl)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US9704369B2 (en) *	2008-06-27	2017-07-11	Barron Associates, Inc.	Autonomous fall monitor using an altimeter with opposed sensing ports
WO2013113632A2 (en)	2012-02-03	2013-08-08	Asml Netherlands B.V.	A stage system and a lithographic apparatus
WO2013113568A2 (en)	2012-02-03	2013-08-08	Asml Netherlands B.V.	Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder
JP6218459B2 (ja) *	2013-07-02	2017-10-25	キヤノン株式会社	除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
US10114299B2 (en)	2014-06-05	2018-10-30	Asml Netherlands B.V.	Lithographic apparatus
NL2015027A (en) *	2014-08-15	2016-07-08	Asml Netherlands Bv	Lithographic apparatus and method.
JP2018513419A (ja)	2015-04-17	2018-05-24	エーエスエムエルネザーランズビー．ブイ．	リソグラフィ装置
CN111435222B (zh) *	2019-01-14	2021-04-02	上海微电子装备（集团）股份有限公司	一种运动台随动压力补偿装置、光刻机系统及其驱动方法
CN113049173B (zh) *	2019-12-27	2022-07-01	上海微电子装备（集团）股份有限公司	一种高频响精密测力装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3443692A (en) *	1966-04-14	1969-05-13	Reserve Mining Co	Maximizing control system
US6123503A (en) *	1998-07-30	2000-09-26	Belanger, Inc.	Dryer nozzle assembly
JP4107788B2 (ja) *	2000-01-31	2008-06-25	日信工業株式会社	車両用アクチュエータの保持構造
JP2003280744A (ja) *	2002-03-19	2003-10-02	Canon Inc	振動制御装置及びその制御方法、並びに、該振動制御装置を有する露光装置及び半導体デバイスの製造方法
US7239370B2 (en) *	2002-12-23	2007-07-03	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7126674B2 (en) *	2004-06-14	2006-10-24	Asml Netherlands B.V.	Positioning device and device manufacturing method
US7446849B2 (en) *	2004-07-22	2008-11-04	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7265813B2 (en) *	2004-12-28	2007-09-04	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US7649613B2 (en) *	2006-03-03	2010-01-19	Asml Netherlands B.V.	Lithographic apparatus, method of controlling a component of a lithographic apparatus and device manufacturing method
US7348752B1 (en) *	2006-09-20	2008-03-25	Asml Netherlands B.V.	Stage apparatus and lithographic apparatus
US8908144B2 (en) *	2006-09-27	2014-12-09	Asml Netherlands B.V.	Lithographic apparatus and device manufacturing method
US8384881B2 (en) *	2007-09-28	2013-02-26	Asml Netherlands B.V.	Lithographic apparatus, stage apparatus and device manufacturing method
NL1036290A1 (nl) *	2007-12-19	2009-06-22	Asml Netherlands Bv	Lithographic apparatus.
NL1036511A1 (nl) *	2008-02-13	2009-08-14	Asml Netherlands Bv	Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
EP2221668B1 (en) *	2009-02-24	2021-04-14	ASML Netherlands B.V.	Lithographic apparatus and positioning assembly

2012
- 2012-01-25 NL NL2008178A patent/NL2008178A/nl unknown
- 2012-02-14 CN CN201210033005.5A patent/CN102707573B/zh active Active
- 2012-02-17 JP JP2012032609A patent/JP5690294B2/ja active Active
- 2012-02-20 TW TW101105488A patent/TWI474131B/zh active
- 2012-02-23 US US13/403,706 patent/US9097990B2/en active Active
- 2012-02-24 KR KR1020120018863A patent/KR101380266B1/ko active Active

Also Published As

Publication number	Publication date
KR101380266B1 (ko)	2014-04-01
US9097990B2 (en)	2015-08-04
JP2012178561A (ja)	2012-09-13
JP5690294B2 (ja)	2015-03-25
KR20120098468A (ko)	2012-09-05
CN102707573B (zh)	2016-06-01
TW201241580A (en)	2012-10-16
CN102707573A (zh)	2012-10-03
TWI474131B (zh)	2015-02-21
US20120242271A1 (en)	2012-09-27

Publication	Publication Date	Title
IL220933A (en)	2016-12-29	Lithographic apparatus and device manufacturing method
PL2919994T3 (pl)	2017-09-29	System i metoda drukowania
BR112013033167A2 (pt)	2017-01-31	método, e, aparelho
BR112012018101A2 (pt)	2018-06-05	aparelho, e método.
BR112013019637A2 (pt)	2018-07-17	sistemas, aparelho e métodos para implantação de implantes
DK2549029T3 (da)	2023-09-18	Platformsystem
IL235964A0 (en)	2015-01-29	Photon source, metrology apparatus, lithographic system and device manufacturing method
BR112015009932A2 (pt)	2017-07-11	método e sistema.
DK3313074T3 (da)	2021-10-25	Anordning til billedbehandling, fremgangsmåde til billedbehandling
EP3591057C0 (en)	2023-06-07	Inducible coexpression system
BR112013021971A2 (pt)	2018-06-26	sistema médico e método.
BR112014000317A2 (pt)	2018-06-19	conjunto e sistema
BR112012016424A2 (pt)	2018-06-05	aparelho, e método.
BR112014026864A2 (pt)	2017-06-27	sistema, e método
NL2008178A (nl)	2012-08-28	Lithographic apparatus and stage system.
BR112014000348A2 (pt)	2017-02-14	aparelho de processamento de imagem, e, método de processamento de imagem
BR112014032838A2 (pt)	2017-06-27	método , e aparelho.
BR112013019088A2 (pt)	2017-11-21	sistema , método e mecanismo de andaime
BR112014007864A2 (pt)	2017-06-13	sistema, e método
BR112014012552A2 (pt)	2017-06-13	aparelho, e método
BR112014006670A2 (pt)	2017-04-04	aparelho, e método
BR112014001557A2 (pt)	2017-06-27	dispositivo, método e sistema para fazer música
BR112014015717A2 (pt)	2017-06-13	sistema, e método
BR112015013155A2 (pt)	2017-07-11	método, e sistema
BR112013008135A2 (pt)	2016-08-09	sistema, aparelho, e método