MXPA98002860A - Coloid metalic oxides presenting gruposisocianato bloquea - Google Patents
Coloid metalic oxides presenting gruposisocianato bloqueaInfo
- Publication number
- MXPA98002860A MXPA98002860A MXPA/A/1998/002860A MX9802860A MXPA98002860A MX PA98002860 A MXPA98002860 A MX PA98002860A MX 9802860 A MX9802860 A MX 9802860A MX PA98002860 A MXPA98002860 A MX PA98002860A
- Authority
- MX
- Mexico
- Prior art keywords
- isocyanate groups
- metal oxides
- colloidal metal
- carbon atoms
- blocked isocyanate
- Prior art date
Links
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 24
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 24
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 239000006120 scratch resistant coating Substances 0.000 claims abstract description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 21
- 239000012948 isocyanate Substances 0.000 claims description 18
- 150000002513 isocyanates Chemical class 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 15
- 238000006243 chemical reaction Methods 0.000 claims description 14
- 239000002981 blocking agent Substances 0.000 claims description 11
- 239000002966 varnish Substances 0.000 claims description 8
- 150000004756 silanes Chemical class 0.000 claims description 7
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229920001169 thermoplastic Polymers 0.000 claims description 4
- 239000004416 thermosoftening plastic Substances 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- HMFHBZSHGGEWLO-KKQCNMDGSA-N beta-D-xylofuranose Chemical compound OC[C@H]1O[C@@H](O)[C@H](O)[C@H]1O HMFHBZSHGGEWLO-KKQCNMDGSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000002360 preparation method Methods 0.000 abstract description 6
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 28
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 25
- -1 alkyl radical Chemical class 0.000 description 25
- 239000011248 coating agent Substances 0.000 description 16
- 229910052814 silicon oxide Inorganic materials 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 10
- 125000005370 alkoxysilyl group Chemical group 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 8
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229920000515 polycarbonate Polymers 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 238000000576 coating method Methods 0.000 description 7
- 239000004417 polycarbonate Substances 0.000 description 7
- 150000003254 radicals Chemical class 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 125000005442 diisocyanate group Chemical group 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 239000005056 polyisocyanate Substances 0.000 description 6
- 229920001228 polyisocyanate Polymers 0.000 description 6
- SDXAWLJRERMRKF-UHFFFAOYSA-N 3,5-dimethyl-1h-pyrazole Chemical compound CC=1C=C(C)NN=1 SDXAWLJRERMRKF-UHFFFAOYSA-N 0.000 description 5
- 239000005058 Isophorone diisocyanate Substances 0.000 description 5
- 125000000217 alkyl group Chemical group 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 5
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000003678 scratch resistant effect Effects 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000000377 silicon dioxide Substances 0.000 description 4
- 235000012239 silicon dioxide Nutrition 0.000 description 4
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 4
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- CXOFVDLJLONNDW-UHFFFAOYSA-N Phenytoin Chemical compound N1C(=O)NC(=O)C1(C=1C=CC=CC=1)C1=CC=CC=C1 CXOFVDLJLONNDW-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 238000006748 scratching Methods 0.000 description 3
- 230000002393 scratching effect Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- WHIVNJATOVLWBW-PLNGDYQASA-N (nz)-n-butan-2-ylidenehydroxylamine Chemical compound CC\C(C)=N/O WHIVNJATOVLWBW-PLNGDYQASA-N 0.000 description 2
- GFNDFCFPJQPVQL-UHFFFAOYSA-N 1,12-diisocyanatododecane Chemical compound O=C=NCCCCCCCCCCCCN=C=O GFNDFCFPJQPVQL-UHFFFAOYSA-N 0.000 description 2
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical class O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 2
- AZYRZNIYJDKRHO-UHFFFAOYSA-N 1,3-bis(2-isocyanatopropan-2-yl)benzene Chemical compound O=C=NC(C)(C)C1=CC=CC(C(C)(C)N=C=O)=C1 AZYRZNIYJDKRHO-UHFFFAOYSA-N 0.000 description 2
- OVBFMUAFNIIQAL-UHFFFAOYSA-N 1,4-diisocyanatobutane Chemical compound O=C=NCCCCN=C=O OVBFMUAFNIIQAL-UHFFFAOYSA-N 0.000 description 2
- CDMDQYCEEKCBGR-UHFFFAOYSA-N 1,4-diisocyanatocyclohexane Chemical compound O=C=NC1CCC(N=C=O)CC1 CDMDQYCEEKCBGR-UHFFFAOYSA-N 0.000 description 2
- AHBNSOZREBSAMG-UHFFFAOYSA-N 1,5-diisocyanato-2-methylpentane Chemical compound O=C=NCC(C)CCCN=C=O AHBNSOZREBSAMG-UHFFFAOYSA-N 0.000 description 2
- ATOUXIOKEJWULN-UHFFFAOYSA-N 1,6-diisocyanato-2,2,4-trimethylhexane Chemical compound O=C=NCCC(C)CC(C)(C)CN=C=O ATOUXIOKEJWULN-UHFFFAOYSA-N 0.000 description 2
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 description 2
- NSPMIYGKQJPBQR-UHFFFAOYSA-N 4H-1,2,4-triazole Chemical compound C=1N=CNN=1 NSPMIYGKQJPBQR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- UKLDJPRMSDWDSL-UHFFFAOYSA-L [dibutyl(dodecanoyloxy)stannyl] dodecanoate Chemical compound CCCCCCCCCCCC(=O)O[Sn](CCCC)(CCCC)OC(=O)CCCCCCCCCCC UKLDJPRMSDWDSL-UHFFFAOYSA-L 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 2
- 125000004448 alkyl carbonyl group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- DCXYFEDJOCDNAF-UHFFFAOYSA-M asparaginate Chemical compound [O-]C(=O)C(N)CC(N)=O DCXYFEDJOCDNAF-UHFFFAOYSA-M 0.000 description 2
- 235000003704 aspartic acid Nutrition 0.000 description 2
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- VEZUQRBDRNJBJY-UHFFFAOYSA-N cyclohexanone oxime Chemical compound ON=C1CCCCC1 VEZUQRBDRNJBJY-UHFFFAOYSA-N 0.000 description 2
- 230000032798 delamination Effects 0.000 description 2
- 239000012975 dibutyltin dilaurate Substances 0.000 description 2
- OSXYHAQZDCICNX-UHFFFAOYSA-N dichloro(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Cl)(Cl)C1=CC=CC=C1 OSXYHAQZDCICNX-UHFFFAOYSA-N 0.000 description 2
- KORSJDCBLAPZEQ-UHFFFAOYSA-N dicyclohexylmethane-4,4'-diisocyanate Chemical compound C1CC(N=C=O)CCC1CC1CCC(N=C=O)CC1 KORSJDCBLAPZEQ-UHFFFAOYSA-N 0.000 description 2
- BEPAFCGSDWSTEL-UHFFFAOYSA-N dimethyl malonate Chemical compound COC(=O)CC(=O)OC BEPAFCGSDWSTEL-UHFFFAOYSA-N 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 2
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 150000003077 polyols Chemical class 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 150000003333 secondary alcohols Chemical class 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 229920002994 synthetic fiber Polymers 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- FZENGILVLUJGJX-NSCUHMNNSA-N (E)-acetaldehyde oxime Chemical compound C\C=N\O FZENGILVLUJGJX-NSCUHMNNSA-N 0.000 description 1
- JHNRZXQVBKRYKN-VQHVLOKHSA-N (ne)-n-(1-phenylethylidene)hydroxylamine Chemical compound O\N=C(/C)C1=CC=CC=C1 JHNRZXQVBKRYKN-VQHVLOKHSA-N 0.000 description 1
- OHTRJOZKRSVAOX-UHFFFAOYSA-N 1,3-diisocyanato-2-methylcyclohexane Chemical compound CC1C(N=C=O)CCCC1N=C=O OHTRJOZKRSVAOX-UHFFFAOYSA-N 0.000 description 1
- MKZPMOFOBNHBSL-UHFFFAOYSA-N 1-isocyanato-1-methylcyclohexane Chemical compound O=C=NC1(C)CCCCC1 MKZPMOFOBNHBSL-UHFFFAOYSA-N 0.000 description 1
- LFSYUSUFCBOHGU-UHFFFAOYSA-N 1-isocyanato-2-[(4-isocyanatophenyl)methyl]benzene Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=CC=C1N=C=O LFSYUSUFCBOHGU-UHFFFAOYSA-N 0.000 description 1
- KHXVVWQPIQVNRH-UHFFFAOYSA-N 1-isocyanato-3-(isocyanatomethyl)-1-methylcyclohexane Chemical compound O=C=NC1(C)CCCC(CN=C=O)C1 KHXVVWQPIQVNRH-UHFFFAOYSA-N 0.000 description 1
- SNTWKPAKVQFCCF-UHFFFAOYSA-N 2,3-dihydro-1h-triazole Chemical compound N1NC=CN1 SNTWKPAKVQFCCF-UHFFFAOYSA-N 0.000 description 1
- VZDIRINETBAVAV-UHFFFAOYSA-N 2,4-diisocyanato-1-methylcyclohexane Chemical compound CC1CCC(N=C=O)CC1N=C=O VZDIRINETBAVAV-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- QWGRWMMWNDWRQN-UHFFFAOYSA-N 2-methylpropane-1,3-diol Chemical compound OCC(C)CO QWGRWMMWNDWRQN-UHFFFAOYSA-N 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 1
- VJAVYPBHLPJLSN-UHFFFAOYSA-N 3-dimethoxysilylpropan-1-amine Chemical compound CO[SiH](OC)CCCN VJAVYPBHLPJLSN-UHFFFAOYSA-N 0.000 description 1
- CCTFMNIEFHGTDU-UHFFFAOYSA-N 3-methoxypropyl acetate Chemical compound COCCCOC(C)=O CCTFMNIEFHGTDU-UHFFFAOYSA-N 0.000 description 1
- TZZGHGKTHXIOMN-UHFFFAOYSA-N 3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCCC[Si](OC)(OC)OC TZZGHGKTHXIOMN-UHFFFAOYSA-N 0.000 description 1
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 description 1
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 description 1
- MGYGFNQQGAQEON-UHFFFAOYSA-N 4-tolyl isocyanate Chemical compound CC1=CC=C(N=C=O)C=C1 MGYGFNQQGAQEON-UHFFFAOYSA-N 0.000 description 1
- FPJPAIQDDFIEKJ-UHFFFAOYSA-N 4-trimethoxysilylbutanenitrile Chemical compound CO[Si](OC)(OC)CCCC#N FPJPAIQDDFIEKJ-UHFFFAOYSA-N 0.000 description 1
- RWLABQFVLGAPQD-UHFFFAOYSA-N C(=NO)C=NO.C=C.C=C Chemical compound C(=NO)C=NO.C=C.C=C RWLABQFVLGAPQD-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- 238000005684 Liebig rearrangement reaction Methods 0.000 description 1
- 239000004425 Makrolon Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910002808 Si–O–Si Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 238000007259 addition reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000005024 alkenyl aryl group Chemical group 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- 125000005025 alkynylaryl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 239000011260 aqueous acid Substances 0.000 description 1
- 125000005018 aryl alkenyl group Chemical group 0.000 description 1
- 125000005015 aryl alkynyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 235000013877 carbamide Nutrition 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- ZWTJVXCCMKLQKS-UHFFFAOYSA-N diethoxy(ethyl)silicon Chemical compound CCO[Si](CC)OCC ZWTJVXCCMKLQKS-UHFFFAOYSA-N 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 150000002009 diols Chemical class 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 125000000468 ketone group Chemical group 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 description 1
- DNYZBFWKVMKMRM-UHFFFAOYSA-N n-benzhydrylidenehydroxylamine Chemical compound C=1C=CC=CC=1C(=NO)C1=CC=CC=C1 DNYZBFWKVMKMRM-UHFFFAOYSA-N 0.000 description 1
- WHIVNJATOVLWBW-UHFFFAOYSA-N n-butan-2-ylidenehydroxylamine Chemical compound CCC(C)=NO WHIVNJATOVLWBW-UHFFFAOYSA-N 0.000 description 1
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 description 1
- SQDFHQJTAWCFIB-UHFFFAOYSA-N n-methylidenehydroxylamine Chemical compound ON=C SQDFHQJTAWCFIB-UHFFFAOYSA-N 0.000 description 1
- OEIJHBUUFURJLI-UHFFFAOYSA-N octane-1,8-diol Chemical compound OCCCCCCCCO OEIJHBUUFURJLI-UHFFFAOYSA-N 0.000 description 1
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 1
- 229960003493 octyltriethoxysilane Drugs 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000020477 pH reduction Effects 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 1
- XUWHAWMETYGRKB-UHFFFAOYSA-N piperidin-2-one Chemical compound O=C1CCCCN1 XUWHAWMETYGRKB-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- BCNZYOJHNLTNEZ-UHFFFAOYSA-N tert-butyldimethylsilyl chloride Chemical compound CC(C)(C)[Si](C)(C)Cl BCNZYOJHNLTNEZ-UHFFFAOYSA-N 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- XYJRNCYWTVGEEG-UHFFFAOYSA-N trimethoxy(2-methylpropyl)silane Chemical compound CO[Si](OC)(OC)CC(C)C XYJRNCYWTVGEEG-UHFFFAOYSA-N 0.000 description 1
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 1
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- QLNOVKKVHFRGMA-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical group [CH2]CC[Si](OC)(OC)OC QLNOVKKVHFRGMA-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 150000003672 ureas Chemical class 0.000 description 1
- 238000005292 vacuum distillation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Abstract
The invention relates to colloidal metal oxides, which have blocked isocyanate groups and to their use for the preparation of scratch-resistant coatings on substrates of any type.
Description
COLOID METAL OXIDES PRESENTING BLOCKED ISOCIA-NATO GROUPS. Field of the invention. The invention relates to colloidal metal oxides, which have blocked isocyanate groups, and to their use for the production of scratch-resistant coatings on substrates of any type. There is a great need for scratch-resistant coatings for sensitive surfaces. Especially the thermoplastics, which are characterized by high dimensional toughness, transparency and stability, often have only a low resistance to scratches and chemicals. Description of the prior art. To improve the scratch resistance in the thermoplastics, thermosetting silicone varnishes are preferably used, which are preferably crosslinked by means of a condensation reaction to give Si-O-Si bonds. Parallel to this, other crosslinking mechanisms can also be developed. Such coating systems are often based on condensation products - partial hydrolysis of alkyl- or aryltrial-coxysilane, which are usually combined with colloidal silica sols. Such coating systems are described, for example, in US Pat. Nos. 3 790 527, 3 887 514, 4 243 720, 4 278 804, 4 419 405,
4 624 870, 4 680 232, 4 006 271, 4 476 281 in DE-A 4 011 045, 4 122 743, 4 020 316, 3 917 535, 3 706 714,
3 407 087, 3 836 815, 2 914 427, 3 135 241, 3 134 777, 3 100 532, 3 151 350 in DE-A 3 005 541, 3 014 411, 2 834 606, 2 947 879, 3 016 021. Varnishes often have only a slight elasticity, which allows only thin layer sensors in the range below 10 μm. In addition, the low organic content conditions poor adhesion, which, in most cases, requires the application of a base coat, as well as incompatibilities with organic binders. In addition, a long chilling time is often required for the condensation crosslinking, which may require several hours depending on the sensitivity to the temperature of the substrate. Detailed description of the invention. The task now was to develop a scratch-resistant elastic coating system, which could be applied with high layer thicknesses and which, without a base layer, had good adhesion to the substrate, without having to accept losses relative to the substrate. other properties such as scratch resistance and stability with respect to chemicals. It has now surprisingly been found that colloidal metal oxides, which have blocked isocyanate groups, can be used for scratch-resistant coatings and provide, without a base coat, hard coatings with high resistance to chemicals and excellent adhesion to the substrate. . The application can be carried out according to the usual coating techniques for blocked isocyanates. The subject of the invention are colloidal metal oxides, which have blocked isocyanate groups, which can be obtained by the reaction of A) silanes containing blocked isocyanate groups of the formula (I)
XYZSÍ- (CH2) n-NR-CO-NH-Q (I),
wherein R means an organic radical with 1 to 40 carbon atoms or hydrogen, XYZ means organic radicals, the same or different, inert below 100 ° C versus isocyanate groups, with 1 to 30 carbon atoms, with the condition that at least one of these residues means an alkoxy group with 1 to 4 carbon atoms, and n means the numbers 2, 3 or 4, and Q means an organic residue, which has at least one isocyanate group, reacted with a blocking agent, with B) colloidal metal oxides selected from the group consisting of Al, Si, Ti, Ta, W, Hf, Zr, Sn and Y. The compounds of the formula (I) are preferably used according to the invention, which, R means an alkyl moiety with 1 to 20 carbon atoms straight or branched, that present a slight tendency to crystallization. Very particularly preferred are compounds of the formula (I), in which R means -CH (COOR1) CH2COOR2, and R1 and R2 mean identical or different organic radicals, alkyl having 1 to 18 carbon atoms and aryl-alkyl with 6 to 14 carbon atoms, inert against the isocyanate below 100 ° C. These compounds have a slight tendency to crystallization and have the advantage that the preparation can be perfectly controlled without solvents. Preference is given to using polyisocyanates and esters of aspartic acid of the formula (II) XYZY- (CH2) n-NH-CH (COOR1) CH2COOR2 (II),
in which R1 and R2 and n have the indicated meaning. Its synthesis has been described, for example, in
EP-AS 596 360. According to the reaction temperature, the formation of idantoin with dissociation of alcohol can also occur, as described, for example, in US Pat. No. 3,449,599. Another object of the invention is the use of metal oxides , modified according to the invention, as components or as an intermediate for the production of polyurethane synthetic materials, if appropriate foamed, varnishes or coating agents. The colloidal metal oxide according to the invention can be used alone or in part, for example, as a hardener against the components which are reactive with the isocyanate. Colloidal metal oxides will be used as components of the coating agent according to the invention. The expression "colloidal metal oxide" in the meaning of the invention should encompass a broad plurality of finely divided oxides of the elements aluminum, silicon, titanium, zirconium, tantalum, tungsten, hafnium, tin and yttrium in any solvent.
Preference will be given to colloidal silicon oxide. In this case, it is generally a dispersion of particles of silicon dioxide (SiO2) of submicron size in an aqueous or other solvent. The colloidal silicon oxide can be obtained in various forms. Organic solutions of colloidal silica sols will be used in a particularly preferred manner. In this case, as a rule, it is a 30-40% solution of colloidal silicon oxide in isopropanol with a water content of < 1% and with a particle size of 10-12 nm. You can also find application of aqueous solutions of colloidal silicon oxide. Acid forms (ie, dispersions with a low sodium content) will preferably be used for the purpose of the present invention. The alkaline colloidal silicon oxide can be transformed into acid colloidal silicon oxide by acidification. A perfectly suitable aqueous acid colloidal silicon oxide is, for example, Nalcoag 1034A *, obtainable from Nalco Chemical Company, Chicago 111 *, Nalcoag 1034A *. It is an aqueous dispersion, of high purity, of colloidal silicon oxide with a small Na content, a pH value of 3.1 and an SiO2 content of 34% by weight. Of a comparable and equally suitable quality is the LUDOX TMA® dispersion of the DuPont company, which also has a pH value of 3.1 and contains 34% by weight of SiO2. The silanes containing blocked isocyanate groups of the formula (I) are prepared by reaction of alkoxysilyl aminofunctional compounds of the formula (III)
XYZSÍ- (CH2) n-NHR (III)
wherein n means the numbers 2, 3 or 4, preferably 3 and R means hydrogen or preferably a linear or branched alkyl radical having 1 to 4 carbon atoms. Examples of alkoxysilyl aminofunctional compounds which can be used are 3-amino-propyldimethoxysilane, amino-propyltriethoxysilane or 3-aminopropyl-methyl-diethoxysilane. Examples of alkoxysilyl compounds preferably employed with secondary amino functions are N-methyl-3-amino-propyltrimethoxysilane, N-butyl-3-aminopropyltrimethoxysilane or N-phenyl-3-aminopropyltrimethoxysilane. The alkoxysilyl amino-functional compounds which are used with particular preference according to the invention are those described in EP-A 596 360 of formula (II):
XYZSi- (CH2) n-NH-CH (COOR1) CH2COOR2 (II),
wherein R1 and R2 mean identical or different organic radicals, inert below 100 ° C, relative to the isocyanate groups, preferably they mean the same or different alkyl radicals with 1 to 4 carbon atoms, particularly preferably radicals respectively methyl or ethyl radicals, X is preferably an alkoxy group with 1 to 4 carbon atoms, particularly preferably methoxy or ethoxy, Y and Z are preferably identical or different radicals and represent alkyl or alkoxy groups with 1 to 4 carbon atoms. carbonphenoxy or ethoxy are particularly preferred, so that X = Y = Z, and n means 2 or 3 or 4, preferably means 3. These compounds represent binding members between the inorganic part and the polyurethane part, since the conversion with isocyanates allows a perfectly controllable reaction without, as occurs for example in the case of aminosilanes, insoluble ureas are formed. According to the conduct of the reaction, the formation of idantoin with alcohol dissociation may occur as described in US-A 3 549 599. Examples of such compounds are N- (3-trimetho-xisylpropyl) diethyl asparaginate, N- (3-triethoxysilyl-propyl) diethyl asparaginate, N- (3-trimethoxysilylpropro) dimethyl asparaginate, N- (3-triethoxysilylpropyl) as-dimethyl para-pentate, N- (3-trimethoxysilylpropyl) aspara-ginate dibutyl, N- (3-triethoxysilylpropyl) dibutyl asparaginate, among which N- (3-trimethoxysilylpropyl) asparaginate dimethyl, N- (3-triethoxysilylpropyl) asparaginate dimethyl, N- (3-trimethoxysilylpropyl) are particularly preferred. ) diethyl asparaginate and N- (3-triethoxysilylpropyl) diethyl asparaginate. By way of other components, hydrolysable silanes can be used concomitantly. Preference is given to the silanes of the formula (IV)
SiXnR14.n (IV),
wherein the X groups, which may be the same or different, mean hydrogen, halogen, alkoxy, acyl xi, alkylcarbonyl, alkoxycarbonyl with 1 to 4 carbon atoms respectively, or NR22 (R2 = H and / or alkyl with 1 to 4 carbon atoms) and the radicals R 1, which may be the same or different, mean hydrogen, alkyl having 1 to 4 carbon atoms, alkenyl with 2 to 6 carbon atoms, alkynyl with 2 to 6 carbon atoms, aryl with 6 to 24 carbon atoms, arylalkyl with 7 to 30 carbon atoms, arylalkenyl, alkenylaryl, arylalkynyl or alkynylaryl with 8 to 30 carbon atoms respectively, these residues may be interrupted by 0 or S atoms or by the group -NR2 and being able to carry one or more substituents from the group consisting of halogen and by the optionally substituted groups, amino, amido, aldehyde, keto, alkylcarbonyl, carboxy, mercapto, cyano, hydroxy, alkoxy, alkoxycarbonyl, sulphonic, phosphonic, acryloxy, methacryloxy, epoxy or vinyl and n has the value 1, 2 or 3, and / or an oligomer derived therefrom, in an amount of 25 to 95% in moles, based on the total number of moles of the starting components (monomers). Examples of such silanes are tetrametoxisila-not, tetraethoxysilane, methyltrichlorosilane, metiltrimeto-xisilano, methyltriethoxysilane, ethyltrichlorosilane, ethyl triethoxysilane, isobutyltrimethoxysilane, octiltrimetoxi-silane, octyltriethoxysilane, octadeciltrimetilsilano, vi-niltrietoxisilano, vinyl-tris (2-methoxyethoxy) silane, vi -niltriclorosilano, allyltrimethoxysilane, aliltrietoxisi-Lano, propyltrimethoxysilane, phenyltrimethoxysilane, phenyl triethoxysilane, dimethyldichlorosilane, dimetildimetoxisi-Lano, di ethyldiethoxysilane, diphenyldichlorosilane, diphenyldichlorosilane, diphenyldimethoxysilane, difenildietoxi silane, t-butyldimethylchlorosilane, alildimetilclorosi-Lano, 3-chloropropyl trimethoxysilane, 3-cyanopropyl-tri-methoxysilane, [3- (trimethoxysilyl) -propyl] methacrylate, 3- [2,3-epoxy-propoxy) propyl] -trimethoxysilane, 3- [2, 3- (epoxy-propoxy) -propyl] -triethoxysilane, 3-aminopro-p-trimethoxysilane, 3-aminopropyl-triethoxysilane, 3-aminopropyl-methyldiethoxysilane, 3-aminopropyl-methyldim ethoxy-silane, N- [3- (trimethoxysilyl) -propyl] -ethylenediamine, 1N- [3- (trimethoxysilyl) -propyl] -diethylenetriamine, [2- (3,4-epoxycyclohexyl) -ethyl] -trimethoxysilane, N- (3-trimethoxy-silyl-propyl) -aniline, bis- (3-trimethoxysilyl-propyl) amine, 3-mercaptopropyl-trimethoxysilane, N- (3-trimethoxysilyl-propyl) -urea. These silanes are partly commercial products and can be prepared according to known methods. See W. Noli, "Chemie und Technologie der Silicone", Verlag Chemie GmbH, Weinheim / Bergstrasse (1968). Other constituent components are compounds of any type that contain isocyanate groups. Preferred are diisocyanates, known per se, such as, for example, those described in "Methoden der organischen Chemie" (Houben-Weyl), volume 14/2, Georg Thieme Verlag, Stuttgart 1963, pages 61 to 70, and Sief in Liebigs Annalen der Chemie, 562, pages 75 to 136. The diisocyanates to be used preferably according to the invention are 4,4'-diisocyanatodicyclohexylmethane, 3-isocyanatomethyl-3,3,5-trimethylcyclohexylisocyanate ( isophorone diisocyanate = IPDI), tetra-methylene diisocyanate, hexamethylene diisocyanate (HDI), 2-methyl-pentamethylene diisocyanate, 2, 2,4-trimethylhexa-methylene diisocyanate (THDI), dodecamethylene diisocyanate, 1,4-diisocyanato-cyclohexane, 4,4'-diisocyanato-3,3'-dimethyl-dicyclohexylmethane, 4,4'-diisocyanatodi-cyclohexylpropane- (2,2), 3-isocyanatomethyl-1-methyl-isocyanatocyclohexane (IMCI), 1, 3 -diisocyanate-4-methylcyclohexane, 1,3-diisocyanato-2-methyl-cyclohexane, a £, c., a £ 'a'-tetramethyl-m- or -p-xylylene-diisocyanate (TMXDI) as the mixtures constituted by these compounds, diisocyanates easily obtainable industrially such as 2,4- and 2,6-diisocyanatotoluene or 4-diisocyanate, 4'- and, if appropriate, 2,4'-diisocyanatodiphenylmethane, 3,4-diisocyanato-4-methyl-diphenylmethane and its isomers or mixtures of these isomers. The sterically hindered phenylene diisocyanates can be used by alkyl substituents, such as, for example, l-methyl-3,5-diethyl-2,4-diisocyanatobenzene, l-methyl-3,5-diethyl-2,6-diisocyanatobenzene, and arbitrary mixtures of these two diisocyanates, 1, 3, 5-triisopro-pyl-2,4-diisocyanatobenzene or alkyl-substituted phenylene diisocyanates of the type described, for example, in US-A 3 105 845 or DE-A 3 317 649. The diisocyanates to be used with particular preference are 4,4'-diisocyanatodicyclohexylmethane, 3-isocyanatomethyl-3, 3, 5-trimethylcyclohexylisocyanate (isophorone diisocyanate = IPDI), tetramethylene diisocyanate, hexamethylene diisocyanate (HDI), 2-methyl-pentamethylene diisocyanate, 2,2,4-trimethylhexa-methylene diisocyanate (THDI), dodecamethylene diisocyanate, 1,4-diisocyanato-cyclohexane, 4,4'-diisocyanato-3, 3'-dimethyl -dicyclohexylmethane, 4,4'-diisocyanatodi-cyclohexylpropane- (2,2), 3- or 4-isocyanate 1-methyl-1-isocyanatocyclohexane (IMCI), 4-isocyanatomethyl-1, 8-diisocyanatoctane, 1,3-diisocyanato-4-methyl-cyclohexane, 1,3-diisocyanate-2 methyl-cyclohexa-no, a, a, a ', a'-tetramethyl-m- or -p-xylylene-diisocyanate (TMXDI) as well as the mixtures constituted by these compounds. Hexamethylene diisocyanate (HDI) is very particularly preferred. It is also possible to employ or use concomitantly various accessible polyisocyanates from the aforementioned diisocyanates, such as those described, for example, in J. prakt. Chem. 1994, 336, 185-200. Other constituent components to be used concomitantly, if appropriate, are compounds of any type, common in the chemistry of polyurethanes, reagents against isocyanate groups, such as, for example, polyester polyols, polycarbonate or polyether polyols or else diols of low molecular weight such as, for example, ethylene glycol, propylene glycol, 1,4- and 1,3-butanediol, 1,6-hexanediol, 1,8-octanediol, neopenitylglycol, 2-methyl-1,3-dihydroxypropane, glycerin, trimethylolpropane , diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol with the aforementioned molecular weight range, dipropylene glycol, tripropylene glycol or arbitrary mixtures of such alcohols. According to the invention, the concomitant use of blocking agents is essential. By this step isocyanate groups are protected against the reactive solvents with respect to the isocyanate, which will be used subsequently for the crosslinking reaction. Suitable blocking agents are, in particular, compounds with preferably a group reactive towards the isocyanate, which are involved in an addition reaction with organic isocyanates. Suitable blocking agents of this type are, for example, secondary or tertiary alcohols, such as isopropanol or t. butanol, CH-acid compounds, such as for example diethyl malonate, acetylacetone, ethyl acetoacetate, oxy acetates, such as for example formaldoxime, acetaldoxime, methyl ethylketoxime, cyclohexanone oxime, acetophenone oxime, benzo-phenone oxime, or diethylene glyoxime, lactams, such as for example caprolactam, valerolactam, butyrolactam, phenols such as phenol, o-methylphenol, N-alkylamides, such as for example N-methylacetamide, imides, such as phthalimide, secondary amines, such as for example diisopropylamine, imidazole, pyrazole, , 5-dimethylpyrazole, 1,2,4-triazole and 2,5-dimethyl-l, 2,4-triazole. Preference is given according to the invention to blocking agents such butanone oxime, 3,5-dimethylpyrazole, caprolactam, diethyl malonate, dimethyl malonate, ethyl acetoacetate, 1,2,4-triazole and imidazole. Especially preferred are blocking agents which enable a low set temperature such as, for example, diethyl malonate., dimethyl malonate, butanone oxime and 3,5-dimethylpyrazole, which also conditions a yellowish bass. The production can be carried out according to various variants. The preferred variant consists in the reaction of an alkoxysilyl functional prepolymer with the colloidal metal oxide in an alcoholic solution with the addition of water and optionally of catalysts. In this case, a prepolymer is first prepared from a polyisocyanate or a mixture of polyisocyanates, the alkoxysilyl functional amine and a blocking agent and, if appropriate, chain extenders employed concomitantly, of the type indicated above. The preparation can be carried out by adding the blocking agent and the alkoxysilyl functional amine to the polyisocyanate, optionally prolonged. The reaction is carried out in such a way that, in the first place, from 0.1 to 0.9 equivalents of NCO, preferably from 0.3 to 0.7 equivalents of NCO, are reacted with a blocking agent, from 0 to 100. ° C, preferably at 20 to 70 ° C and then the remaining NCO groups are saturated, at 0 to 80 ° C, preferably at 20 to 70 ° C, with the alkoxysilyl-functional amine. Of course, it is also possible to react the polyisocyanate firstly, if appropriate previously with polyols, with the alkoxysilyl functional amine and then with the blocking agent. Likewise, the reaction with a mixture of both components is also possible. Solvents of any kind can be used concomitantly. The use of the esters of aspartic acid, alcosilil-functional, has proved to be a great advantage in the preparation, since the reaction develops especially without having to resort to solvents, under perfectly controllable conditions. Above all at high temperatures, which are generally above 60 ° C, the formation of idantoin can occur in this case, which can be an advantage in certain cases. The preparation of the modified colloidal metal oxide can be carried out by mixing the aforementioned prepolymer with the dissolved colloidal metal oxide and optionally with the silane. If a metal oxide dissolved in organic products is used, at least a quantity of water should be added such that the hydrolysis of the alkoxysilyl group can be carried out. If colloidal aqueous solutions of the metal oxide are used, at least a quantity of organic solvent will have to be added such that the polymer can be dissolved. It has been observed within the scope of the present invention that at least 20% of a secondary alcohol has to be added to prevent gel formation. If necessary, a catalyst for acceleration can be added. In this case, the addition of acids such as hydrochloric acid, sulfuric acid or trifluoroacetic acid is preferred. To complete the reaction, it can be stirred for a long time at room temperature or it can also be heated to reflux. To increase the solids content, the solvent and / or excess water can be removed by distillation. Solutions prepared in this way of colloidal metal oxides, containing blocked isocyanate groups, can be combined with at least difunctional substances, of any type, reactive with isocyanate groups, for the preparation of coating agents. The proportion of blocked isocyanate groups with respect to the groups reactive towards the isocyanate groups will usually be chosen between 0.5 and 1.5, preferably between 0.8 and 1.2. Of course, the hardeners described here can also be used concomitantly, also as additives in formulations of any type, which contain groups reactive towards the isocyanate groups. Another object of the invention is the use of colloidal metal oxides which have blocked isocyanate groups as coating agents resistant to scratching for any type of substrate. The coating agents obtained can be used for the coating of any type of substrates to improve the resistance to scratches, resistance to wear by friction or stability against chemical products. Preferred substrates are thermoplastic synthetic materials such as polycarbonate, polybutylene terephthalate, polymethyl methacrylate, polyethenetene or polyvinyl chloride, with polycarbonate being particularly preferred. The application of the coating agent can be carried out by any type of process such as dipping, spraying and watering. The hardening is carried out by heating under the conditions necessary for the blocked isocyanates and can obviously be accelerated by the addition of suitable catalysts. Examples Obtaining colloidal metal oxides, which have blocked isocyanate groups: Example 1. 84 g (0.5 mol) of hexamethylene diisocyanate are prepared and first reacted with 48 g (0.5 mol) of 3.5 -dimethylpyrazole. Subsequently, 176 g (0.5 mol) of N- (3-trimetho-xysilylpropyl) -dashtyl derivative (prepared according to EP 596 360, Example 5) are added dropwise at 50 ° C. To the prepolymer, heated at 50 ° C, 2050 g of Organosol (Bayer AG, 29.3% colloidal solution of silicon oxide in isopropanol) are added and cooled to room temperature. 20 g of water are added, adjusted to a pH value of 3.1 with trifluoroacetic acid and stirred for 48 hours at room temperature. Then, 1457 g of methoxypropyl acetate are added for the partial exchange of isopropanol by a solvent with a higher boiling point and a solids content of 56% is adjusted by elimination by vacuum distillation at 40 ° C and 70 mbar. The solution of this modified colloidal metal oxide has a blocked isocyanate content of 1.29%. EXAMPLE 2 84 g (0.5 mol) of hexamethylene diisocyanate are prepared and first reacted with 48 g (0.5 mol) of 3,5-dimethylpyrazole. Subsequently, 176 g (0.5 mol) of N- (3-trimethoxysilylpropyl) diastereoseparaginate at 50 ° C are added dropwise. To the prepolymer heated to 50 ° C is added 2.050 g of Organo-sol (Bayer AG, 29.3% colloidal solution of silicon oxide in isopropanol) and cooled to room temperature. 20 g of water are added, a pH value of 3.1 is adjusted with trifluoroacetic acid and stirred for 48 hours at room temperature. Next, 70 mbar isopropanol is distilled off to a solids content of 53%. The solution has a blocked isocyanate content of 1.23%. Example 3. 84 g (0.5 mol) of hexamethyldiisocyanate are placed and reacted first with 48 g (0.5 mol) of 3,5-dimethylpyrazole. Subsequently, 176 g (0.5 mol) of N- (3-trimethoxy-propyl) propyl-diethyl agatinate are added dropwise at 50 ° C. To the prepolymer, heated to 50 ° C, is added 2,563 g of Organosol (Bayer AG, 29.3% colloidal solution of silicon oxide in isopropanol) and cooled to room temperature. 20 g of water are added, adjusted to a pH value of 3.1 with trifluoroacetic acid and stirred for 48 hours at room temperature. The isopropanol is then distilled off at 70 mbar to a solids content of 55%. The solution has a blocked isocyanate content of 1.03%. Example 4. 111 g (0.5 mol) of 3-isocyanato-methyl-3,3,5-trimethylcyclohexyl isocyanate (isophoronadiisocyanate = IPDI) are initially introduced and are reacted with 48 g (0.5 g). moles) of 3,5-dimethylpyrazole. Subsequently, 176 g (0.5 mol) of N- (3-trimethoxysilylpropyl) -saltyrant diasaturase at 50 ° C are added dropwise. To the prepolymer, heated to 50 ° C, is added 2.050 g of Organosol (Bayer AG, colloidal solution to 29.3 of silicon oxide in isopropanol) and cooled to room temperature. 20 g of water are added, a pH value of 3.1 is adjusted with trifluoroacetic acid and stirred for 48 hours at room temperature. Then isopropanol is distilled off at 70 mbar to a solids content of 55%. The solution has a blocked isocyanate content of 1,2. 3 %. Application examples Example 5. To 325 g of the blocked isocyanate of Example 1, 20 g of a caprolactone polyester, initiated on 1,6-hexanediol, with an average molecular weight of 400 d, 72 g of acetone as well as 1.7 g are added. of dilatile of dibu-tilestaño and 0,1% (referred to the solid matter) of extender Baysilone * OL 17 (commercial product of the firm Bayer AG). The coating agent is applied by surface spraying on a polycarbonate plate, previously cleaned with isopropanol (100 x 100 x 3 mm) with a wet film thickness of 50 μm. The thickness of the coating of the scratch-resistant varnish is 20 μm. The hardening takes place after drying for 30 minutes at room temperature by heating for 1 hour at 120 ° C. Example 6. 342 g of the blocked isocyanate of Example 2, 20 g of a caprolactone polyester, initiated on 1,6-hexanediol, with an average molecular weight of 400 d, as well as 1.8 g of dibutyltin dilaurate and 0.1% (based on solid matter) of Baysilone * OL 17. The coating agent is applied by surface spraying on a polycarbonate plate, previously cleaned with isopropanol (100 x 100 x 3 mm) with a wet film thickness 60 μm. The thickness of the scratch-resistant varnish layer is 30 μm. Hardening is carried out after 30 minutes of drying at room temperature, by heating for 1 hour at 120 ° C. Example 7. 20 g of a caprolactone polyester, initiated on 1,6-hexanediol, with an average molecular weight of 400 d, 92 g of acetone as well as 2.1 g of anhydrous, are added to 409 g of the blocked isocyanate of example 1. Diastilene dilaurate and 0.1% (based on solid matter) of Baysilone * OL 17. The coating agent is applied by surface spraying on a polycarbonate plate, previously cleaned with isopropanol (100 x 100 x 3 mm) with a wet film thickness of 50 μm. The thickness of the scratch-resistant varnish layer is 20 μm. Hardening is carried out after drying for 30 minutes at room temperature, by heating for 1 hour at 120 ° C. Example 8. To 341 g of the blocked isocyanate of Example 1, 20 g of a caprolactone polyester, initiated on 1,6-hexanediol, with an average molecular weight of 400 d, 75 g of acetone as well as dibutyltin dilaurate and 0.1% (based on solid matter) of Baysilone * OL 17. The coating agent is applied by surface spraying on a polycarbonate sheet, previously cleaned with isopropanol (100 x 100 x 3 mm Makrolon *, from the Firm Bayer AG) with a wet film thickness of 130 μm. The film thickness of the scratch-resistant varnish is 40 μm. Hardening is carried out after drying for 30 minutes at room temperature, by heating for 1 hour at 120 ° C. Results: Ex. Drying Eßpß- Resis- Estabi- Adhßrßn- Toughness at tem- perature after pendulum septure Secon- ture of the cut-off fronts Kónig ambient / layer scratches to the ace- in DIN 53157 form co mured 120 mm grit ° C ethyl lia lx / 4x [minutes] 5 30/60 20 1 0 0/0 223 6 30/360 30 2 0 0/0 192 7 30/60 20 1 0 0/0 130 8 30/60 40 2 0 0/0 206 Evaluation of scratch resistance after three scrapes with a sample of steel wool with a fineness of (0000): 0 = absence of traces, 1 = hardly any traces are observed, 2 = slightly scratched 3 = scratched moderate 4 = strongly scratched. Determination of the stability against the chemical products after the action of ethyl acetate: 0 = absence of traces, 1 = remaining edges 2 = hardly scratching 3 = scratching 4 = slight swelling, 5 = swelling. Determination of the adhesion according to the grid-cut method in accordance with DIN 53 151. 0 = no delamination until 5 = total delamination. It is noted that in relation to this date, the best method known by the applicant to carry out the aforementioned invention, is that which is clear from the present description of the invention. Having described the invention as above, the content of the following is claimed as property:
Claims (1)
1. RESOLUTION OF THE INVENTION The invention relates to colloidal metal oxides, which have blocked isocyanate groups and to their use for the production of scratch-resistant coatings on substrates of any type.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19715426.3 | 1997-04-14 | ||
| DE19715426A DE19715426A1 (en) | 1997-04-14 | 1997-04-14 | Colloidal metal oxides containing blocked isocyanate groups |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| MX9802860A MX9802860A (en) | 1998-12-31 |
| MXPA98002860A true MXPA98002860A (en) | 1999-02-01 |
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