MX2012002891A - Sustrato protector para un dispositivo que recolecta o emite radiacion. - Google Patents
Sustrato protector para un dispositivo que recolecta o emite radiacion.Info
- Publication number
- MX2012002891A MX2012002891A MX2012002891A MX2012002891A MX2012002891A MX 2012002891 A MX2012002891 A MX 2012002891A MX 2012002891 A MX2012002891 A MX 2012002891A MX 2012002891 A MX2012002891 A MX 2012002891A MX 2012002891 A MX2012002891 A MX 2012002891A
- Authority
- MX
- Mexico
- Prior art keywords
- collects
- layer
- emits radiation
- protective substrate
- barrier layer
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 title abstract 2
- 230000001681 protective effect Effects 0.000 title 1
- 230000004888 barrier function Effects 0.000 abstract 3
- 229920000642 polymer Polymers 0.000 abstract 2
- 230000003667 anti-reflective effect Effects 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
- C23C16/345—Silicon nitride
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02S—GENERATION OF ELECTRIC POWER BY CONVERSION OF INFRARED RADIATION, VISIBLE LIGHT OR ULTRAVIOLET LIGHT, e.g. USING PHOTOVOLTAIC [PV] MODULES
- H02S40/00—Components or accessories in combination with PV modules, not provided for in groups H02S10/00 - H02S30/00
- H02S40/20—Optical components
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/16—Photovoltaic cells having only PN heterojunction potential barriers
- H10F10/167—Photovoltaic cells having only PN heterojunction potential barriers comprising Group I-III-VI materials, e.g. CdS/CuInSe2 [CIS] heterojunction photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/30—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules comprising thin-film photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F19/00—Integrated devices, or assemblies of multiple devices, comprising at least one photovoltaic cell covered by group H10F10/00, e.g. photovoltaic modules
- H10F19/80—Encapsulations or containers for integrated devices, or assemblies of multiple devices, having photovoltaic cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
- H10K50/8445—Encapsulations multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/86—Arrangements for improving contrast, e.g. preventing reflection of ambient light
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2101/00—Properties of the organic materials covered by group H10K85/00
- H10K2101/40—Interrelation of parameters between multiple constituent active layers or sublayers, e.g. HOMO values in adjacent layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/24992—Density or compression of components
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Laminated Bodies (AREA)
- Photovoltaic Devices (AREA)
- Electroluminescent Light Sources (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Este sustrato (11) para un dispositivo (50) que recolecta o emite radiación comprende una capa de polímero transparente (1) y una capa de barrera (2) en al menos un lado (1A) de la capa de polímero. La capa de barrera (2) consiste de una multicapa antireflejante de al menos dos capas transparentes delgadas (21,22,23,24) que tienen tanto índices de refracción, alternativamente, inferior y superior, como densidades, alternativamente, inferior y superior, en donde cada capa delgada (21,22,23,24) de la multicapa constituyente de la capa de barrera (2) es una capa de óxido, nitruro u oxinitruro.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0956206A FR2949775B1 (fr) | 2009-09-10 | 2009-09-10 | Substrat de protection pour dispositif collecteur ou emetteur de rayonnement |
| US25493209P | 2009-10-26 | 2009-10-26 | |
| PCT/EP2010/062998 WO2011029786A1 (en) | 2009-09-10 | 2010-09-03 | Protective substrate for a device that collects or emits radiation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| MX2012002891A true MX2012002891A (es) | 2012-08-23 |
Family
ID=42062308
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| MX2012002891A MX2012002891A (es) | 2009-09-10 | 2010-09-03 | Sustrato protector para un dispositivo que recolecta o emite radiacion. |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US8766280B2 (es) |
| EP (1) | EP2476148A1 (es) |
| JP (1) | JP2013504776A (es) |
| CN (1) | CN102714279A (es) |
| AU (1) | AU2010294304B2 (es) |
| BR (1) | BR112012005451A2 (es) |
| FR (1) | FR2949775B1 (es) |
| MX (1) | MX2012002891A (es) |
| WO (1) | WO2011029786A1 (es) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2949775B1 (fr) | 2009-09-10 | 2013-08-09 | Saint Gobain Performance Plast | Substrat de protection pour dispositif collecteur ou emetteur de rayonnement |
| FR2949776B1 (fr) | 2009-09-10 | 2013-05-17 | Saint Gobain Performance Plast | Element en couches pour l'encapsulation d'un element sensible |
| TWI531276B (zh) * | 2010-10-21 | 2016-04-21 | 行政院原子能委員會核能研究所 | 有機電激發光元件之封裝方法及其結構 |
| FR2973940A1 (fr) * | 2011-04-08 | 2012-10-12 | Saint Gobain | Element en couches pour l’encapsulation d’un element sensible |
| FR2973939A1 (fr) | 2011-04-08 | 2012-10-12 | Saint Gobain | Element en couches pour l’encapsulation d’un element sensible |
| FR2973946B1 (fr) * | 2011-04-08 | 2013-03-22 | Saint Gobain | Dispositif électronique a couches |
| US9633819B2 (en) * | 2011-05-13 | 2017-04-25 | Fibics Incorporated | Microscopy imaging method and system |
| FR2980394B1 (fr) * | 2011-09-26 | 2013-10-18 | Commissariat Energie Atomique | Structure multicouche offrant une etancheite aux gaz amelioree |
| US9761830B1 (en) * | 2012-05-14 | 2017-09-12 | Eclipse Energy Systems, Inc. | Environmental protection film for thin film devices |
| KR20150097796A (ko) * | 2012-12-31 | 2015-08-26 | 생-고뱅 퍼포먼스 플라스틱스 코포레이션 | 유연성 기재 상의 박막 규소질화물 장벽 층들 |
| KR102072805B1 (ko) * | 2013-04-15 | 2020-02-04 | 삼성디스플레이 주식회사 | 유기발광표시장치 및 그의 제조방법 |
| WO2014172337A1 (en) * | 2013-04-17 | 2014-10-23 | Saint-Gobain Performance Plastics Corporation | Multilayer laminate for photovoltaic applications |
| US9110230B2 (en) | 2013-05-07 | 2015-08-18 | Corning Incorporated | Scratch-resistant articles with retained optical properties |
| US9703011B2 (en) * | 2013-05-07 | 2017-07-11 | Corning Incorporated | Scratch-resistant articles with a gradient layer |
| US9366784B2 (en) | 2013-05-07 | 2016-06-14 | Corning Incorporated | Low-color scratch-resistant articles with a multilayer optical film |
| US9178178B2 (en) * | 2013-05-16 | 2015-11-03 | Samsung Display Co., Ltd. | Organic light-emitting diode display having improved adhesion and damage resistance characteristics, an electronic device including the same, and method of manufacturing the organic light-emitting diode display |
| US9831466B2 (en) * | 2013-06-29 | 2017-11-28 | Aixtron Se | Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier |
| JP2015133247A (ja) * | 2014-01-14 | 2015-07-23 | 日東電工株式会社 | 有機エレクトロルミネッセンス装置 |
| US11267973B2 (en) | 2014-05-12 | 2022-03-08 | Corning Incorporated | Durable anti-reflective articles |
| WO2015172847A1 (en) * | 2014-05-16 | 2015-11-19 | Applied Materials, Inc. | Barrier layer stack, method for manufacturing a barrier layer stack, and ultra-high barrier layer and antireflection system |
| JP2016001526A (ja) * | 2014-06-11 | 2016-01-07 | 株式会社ジャパンディスプレイ | 表示装置 |
| US9790593B2 (en) | 2014-08-01 | 2017-10-17 | Corning Incorporated | Scratch-resistant materials and articles including the same |
| KR102404726B1 (ko) * | 2015-06-24 | 2022-05-31 | 삼성전자주식회사 | 유기 전자 소자 및 그 제조 방법 |
| EP3300520B1 (en) | 2015-09-14 | 2020-11-25 | Corning Incorporated | High light transmission and scratch-resistant anti-reflective articles |
| CN105552247B (zh) * | 2015-12-08 | 2018-10-26 | 上海天马微电子有限公司 | 复合基板、柔性显示装置及其制备方法 |
| JP2017208254A (ja) * | 2016-05-19 | 2017-11-24 | 株式会社ジャパンディスプレイ | 表示装置及びその製造方法 |
| JP6805099B2 (ja) * | 2017-09-08 | 2020-12-23 | 株式会社Joled | 有機el表示パネル、有機el表示装置、およびその製造方法 |
| US10998514B2 (en) | 2017-12-01 | 2021-05-04 | Samsung Electronics Co., Ltd. | Photoelectric devices and image sensors and electronic devices |
| CN109935717B (zh) * | 2017-12-15 | 2021-05-25 | 京东方科技集团股份有限公司 | 封装结构及封装方法、电致发光器件、显示装置 |
| KR101932900B1 (ko) | 2017-12-29 | 2018-12-28 | 주식회사 테스 | 발광소자의 보호막 증착방법 |
| JP2019163493A (ja) * | 2018-03-19 | 2019-09-26 | 住友金属鉱山株式会社 | 透明酸化物積層膜、透明酸化物積層膜の製造方法、及び透明樹脂基板 |
| US11337311B2 (en) * | 2018-07-06 | 2022-05-17 | Ppg Industries Ohio, Inc. | Aircraft window with variable power density heater film |
| CN114085037B (zh) | 2018-08-17 | 2023-11-10 | 康宁股份有限公司 | 具有薄的耐久性减反射结构的无机氧化物制品 |
| CN109509844A (zh) * | 2018-10-26 | 2019-03-22 | 武汉华星光电半导体显示技术有限公司 | Oled显示面板 |
| US20220009824A1 (en) | 2020-07-09 | 2022-01-13 | Corning Incorporated | Anti-glare substrate for a display article including a textured region with primary surface features and secondary surface features imparting a surface roughness that increases surface scattering |
| EP4120378A1 (en) * | 2021-07-12 | 2023-01-18 | Samsung Display Co., Ltd. | Display device and method of manufacturing the same |
| KR20250050172A (ko) * | 2023-10-05 | 2025-04-15 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
| KR20250056281A (ko) * | 2023-10-18 | 2025-04-28 | 삼성디스플레이 주식회사 | 표시 장치 및 이의 제조 방법 |
| CN119530734A (zh) * | 2024-11-19 | 2025-02-28 | 兰州空间技术物理研究所 | 一种柔性材料表面低应力耐湿热红外辐射散热薄膜及其制备方法 |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0782996B2 (ja) * | 1986-03-28 | 1995-09-06 | キヤノン株式会社 | 結晶の形成方法 |
| JPH07111484B2 (ja) * | 1989-06-26 | 1995-11-29 | 松下電器産業株式会社 | プラスチック製光学部品の反射防止膜とその形成方法 |
| FR2673633B1 (fr) * | 1991-03-06 | 1993-06-11 | Air Liquide | Revetement multicouche pour substrat polycarbonate. |
| US5254904A (en) * | 1991-05-21 | 1993-10-19 | U.S. Philips Corporation | Antireflective coating layer in particular for a cathode ray tube |
| US5234748A (en) * | 1991-06-19 | 1993-08-10 | Ford Motor Company | Anti-reflective transparent coating with gradient zone |
| FR2748743B1 (fr) * | 1996-05-14 | 1998-06-19 | Saint Gobain Vitrage | Vitrage a revetement antireflet |
| JPH11218603A (ja) * | 1997-11-27 | 1999-08-10 | Sony Corp | 反射防止膜およびその製造方法 |
| US6335479B1 (en) * | 1998-10-13 | 2002-01-01 | Dai Nippon Printing Co., Ltd. | Protective sheet for solar battery module, method of fabricating the same and solar battery module |
| JP2000211053A (ja) * | 1999-01-22 | 2000-08-02 | Sony Corp | 光学薄膜デバイス |
| AU7451600A (en) * | 1999-09-30 | 2001-04-30 | Nikon Corporation | Optical device with multilayer thin film and aligner with the device |
| US6573652B1 (en) | 1999-10-25 | 2003-06-03 | Battelle Memorial Institute | Encapsulated display devices |
| US20100330748A1 (en) | 1999-10-25 | 2010-12-30 | Xi Chu | Method of encapsulating an environmentally sensitive device |
| FR2800998B1 (fr) * | 1999-11-17 | 2002-04-26 | Saint Gobain Vitrage | Substrat transparent comportant un revetement antireflet |
| US20030186064A1 (en) | 2000-09-29 | 2003-10-02 | Kenji Murata | Transparent laminate having low emissivity |
| US20020090521A1 (en) * | 2000-09-29 | 2002-07-11 | Tatsuji Nakajima | Silica layers and antireflection film using same |
| US7071613B2 (en) | 2001-10-10 | 2006-07-04 | Lg.Philips Lcd Co., Ltd. | Organic electroluminescent device |
| JP4016178B2 (ja) * | 2001-11-06 | 2007-12-05 | ソニー株式会社 | 表示装置及び反射防止用基体 |
| US6589658B1 (en) * | 2001-11-29 | 2003-07-08 | Guardian Industries Corp. | Coated article with anti-reflective layer(s) system |
| CN1176565C (zh) | 2002-11-25 | 2004-11-17 | 清华大学 | 一种有机电致发光器件的封装层及其制备方法和应用 |
| JP2004198590A (ja) | 2002-12-17 | 2004-07-15 | Konica Minolta Holdings Inc | 薄膜有するを物品、その製造方法及び低反射体並びに透明導電性体 |
| US7807225B2 (en) * | 2003-01-31 | 2010-10-05 | Sharp Laboratories Of America, Inc. | High density plasma non-stoichiometric SiOxNy films |
| JP2004345223A (ja) * | 2003-05-22 | 2004-12-09 | Dainippon Printing Co Ltd | 光学機能性フィルム、および画像表示装置 |
| FR2858975B1 (fr) | 2003-08-20 | 2006-01-27 | Saint Gobain | Substrat transparent revetu d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
| JP4703108B2 (ja) * | 2003-09-10 | 2011-06-15 | 三星モバイルディスプレイ株式會社 | 発光素子基板およびそれを用いた発光素子 |
| US6842288B1 (en) * | 2003-10-30 | 2005-01-11 | 3M Innovative Properties Company | Multilayer optical adhesives and articles |
| US20050093437A1 (en) * | 2003-10-31 | 2005-05-05 | Ouyang Michael X. | OLED structures with strain relief, antireflection and barrier layers |
| EP1719192A2 (en) | 2004-02-20 | 2006-11-08 | OC Oerlikon Balzers AG | Diffusion barrier layer and method for manufacturing a diffusion barrier layer |
| US20050207016A1 (en) * | 2004-03-15 | 2005-09-22 | Fuji Photo Film Co., Ltd. | Antireflection film, polarizing plate and liquid crystal display |
| KR101279914B1 (ko) | 2004-06-25 | 2013-07-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 밀봉 필름의 차수 성능 개선 방법 및 장치 |
| JP4837271B2 (ja) * | 2004-10-04 | 2011-12-14 | 株式会社アルバック | 反射防止膜の形成方法 |
| JP2006338947A (ja) | 2005-05-31 | 2006-12-14 | Sanyo Electric Co Ltd | 保護膜形成方法および保護膜 |
| JP2007017668A (ja) * | 2005-07-07 | 2007-01-25 | Konica Minolta Holdings Inc | 光学フィルム |
| JP2007038529A (ja) | 2005-08-03 | 2007-02-15 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体、ガスバリア性樹脂基材および有機エレクトロルミネッセンスデバイス |
| WO2007037525A1 (en) * | 2005-09-28 | 2007-04-05 | Fujifilm Corporation | Antireflection film, polarizing plate and image display |
| US8153282B2 (en) * | 2005-11-22 | 2012-04-10 | Guardian Industries Corp. | Solar cell with antireflective coating with graded layer including mixture of titanium oxide and silicon oxide |
| WO2007081057A1 (en) * | 2006-01-16 | 2007-07-19 | Fujifilm Corporation | Curable composition and cured product, laminate film and antireflective film using the same and polarizing plate and image display device using the antireflective film |
| JP5135753B2 (ja) * | 2006-02-01 | 2013-02-06 | セイコーエプソン株式会社 | 光学物品 |
| US20070212498A1 (en) * | 2006-02-24 | 2007-09-13 | Fujifilm Corporation | Optical film, antireflection film, polarizing plate, display apparatus and method for manufacturing optical film |
| US20100326429A1 (en) * | 2006-05-19 | 2010-12-30 | Cumpston Brian H | Hermetically sealed cylindrical solar cells |
| JP2007277631A (ja) | 2006-04-06 | 2007-10-25 | Konica Minolta Holdings Inc | ガスバリア性薄膜積層体の製造方法、ガスバリア性薄膜積層体、ガスバリア性樹脂基材及び有機エレクトロルミネッセンスデバイス |
| EP2047302A1 (de) * | 2006-07-28 | 2009-04-15 | ILFORD Imaging Switzerland GmbH | Flexible materialien fuer optische anwendungen |
| US20080049431A1 (en) * | 2006-08-24 | 2008-02-28 | Heather Debra Boek | Light emitting device including anti-reflection layer(s) |
| JP5559542B2 (ja) | 2006-11-06 | 2014-07-23 | エージェンシー フォー サイエンス,テクノロジー アンド リサーチ | ナノ粒子カプセル封入バリアスタック |
| US7781031B2 (en) | 2006-12-06 | 2010-08-24 | General Electric Company | Barrier layer, composite article comprising the same, electroactive device, and method |
| JP2008216429A (ja) * | 2007-03-01 | 2008-09-18 | Toppan Printing Co Ltd | 防眩フィルム |
| JP5139153B2 (ja) | 2007-09-19 | 2013-02-06 | 富士フイルム株式会社 | ガスバリア性フィルムおよびこれを用いた有機デバイス |
| US8586189B2 (en) | 2007-09-19 | 2013-11-19 | Fujifilm Corporation | Gas-barrier film and organic device comprising same |
| JP5417698B2 (ja) | 2007-09-21 | 2014-02-19 | 凸版印刷株式会社 | 機能性フィルムの製造方法 |
| WO2009046060A2 (en) * | 2007-10-01 | 2009-04-09 | Davis, Joseph And Negley | Apparatus and methods to produce electrical energy by enhanced down-conversion of photons |
| US8987039B2 (en) | 2007-10-12 | 2015-03-24 | Air Products And Chemicals, Inc. | Antireflective coatings for photovoltaic applications |
| US20090096106A1 (en) | 2007-10-12 | 2009-04-16 | Air Products And Chemicals, Inc. | Antireflective coatings |
| JP2009133000A (ja) * | 2007-10-30 | 2009-06-18 | Fujifilm Corp | シリコン窒化物膜及びそれを用いたガスバリア膜、薄膜素子 |
| DE102008031405A1 (de) | 2008-07-02 | 2010-01-07 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung eines organischen elektronischen Bauelements und organisches elektronisches Bauelement |
| WO2009098793A1 (ja) | 2008-02-07 | 2009-08-13 | Fuji Electric Holdings Co., Ltd. | 有機elディスプレイおよびその製造方法 |
| US20090199901A1 (en) * | 2008-02-08 | 2009-08-13 | Applied Materials, Inc. | Photovoltaic device comprising a sputter deposited passivation layer as well as a method and apparatus for producing such a device |
| KR20090126863A (ko) * | 2008-06-05 | 2009-12-09 | 삼성전자주식회사 | 광학적 기능성을 갖는 다층 봉지 박막의 형성방법 및 그에 의해 제조된 다층 봉지 박막 |
| KR101084267B1 (ko) | 2009-02-26 | 2011-11-16 | 삼성모바일디스플레이주식회사 | 유기 발광 표시 장치 및 그 제조 방법 |
| DE102009024411A1 (de) | 2009-03-24 | 2010-09-30 | Osram Opto Semiconductors Gmbh | Dünnschichtverkapselung für ein optoelektronisches Bauelement, Verfahren zu dessen Herstellung und optoelektronisches Bauelement |
| FR2949776B1 (fr) | 2009-09-10 | 2013-05-17 | Saint Gobain Performance Plast | Element en couches pour l'encapsulation d'un element sensible |
| FR2949775B1 (fr) | 2009-09-10 | 2013-08-09 | Saint Gobain Performance Plast | Substrat de protection pour dispositif collecteur ou emetteur de rayonnement |
| JP2011100111A (ja) * | 2009-10-09 | 2011-05-19 | Seiko Epson Corp | 光学物品、光学物品の製造方法、電子機器 |
| FR2973939A1 (fr) | 2011-04-08 | 2012-10-12 | Saint Gobain | Element en couches pour l’encapsulation d’un element sensible |
| FR2973940A1 (fr) | 2011-04-08 | 2012-10-12 | Saint Gobain | Element en couches pour l’encapsulation d’un element sensible |
-
2009
- 2009-09-10 FR FR0956206A patent/FR2949775B1/fr not_active Expired - Fee Related
-
2010
- 2010-09-03 JP JP2012528330A patent/JP2013504776A/ja active Pending
- 2010-09-03 MX MX2012002891A patent/MX2012002891A/es not_active Application Discontinuation
- 2010-09-03 WO PCT/EP2010/062998 patent/WO2011029786A1/en not_active Ceased
- 2010-09-03 BR BR112012005451A patent/BR112012005451A2/pt not_active IP Right Cessation
- 2010-09-03 US US13/395,406 patent/US8766280B2/en not_active Expired - Fee Related
- 2010-09-03 AU AU2010294304A patent/AU2010294304B2/en not_active Ceased
- 2010-09-03 EP EP10750119A patent/EP2476148A1/en not_active Withdrawn
- 2010-09-03 CN CN2010800509219A patent/CN102714279A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| FR2949775B1 (fr) | 2013-08-09 |
| JP2013504776A (ja) | 2013-02-07 |
| FR2949775A1 (fr) | 2011-03-11 |
| AU2010294304B2 (en) | 2013-08-29 |
| CN102714279A (zh) | 2012-10-03 |
| AU2010294304A1 (en) | 2012-03-29 |
| US8766280B2 (en) | 2014-07-01 |
| WO2011029786A1 (en) | 2011-03-17 |
| BR112012005451A2 (pt) | 2016-04-12 |
| US20120228641A1 (en) | 2012-09-13 |
| EP2476148A1 (en) | 2012-07-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| MX2012002891A (es) | Sustrato protector para un dispositivo que recolecta o emite radiacion. | |
| EP2355190A3 (en) | Passivated light emitting device | |
| BRPI0917927A2 (pt) | composição adesiva fotossensível e um filme adesivo, folha adesiva, padrão de adesivo, wafer semicondutor com camada adesiva e dispositivo semicondutor que utiliza a composição adesiva fotossensível | |
| GB2522816A (en) | Light emitting device reflective bank structure | |
| DK2153065T3 (da) | Beskyttelsesbarriere til turbineblad | |
| BRPI0911852A2 (pt) | pilha de primeira e segunda camada, um painel e artigo resistente a balística que compreende a pilha ou o painel | |
| TWI456242B (zh) | 放射線檢測器 | |
| DE602007005402D1 (de) | Mehrschichtige pharmazeutische formulierungen mit einer schnell auflösenden zwischenschicht | |
| JP2012033510A5 (ja) | 発光装置 | |
| MX2015016221A (es) | Acristalamiento con una baja emisividad y antisolar. | |
| EP2365546A3 (en) | Light emitting device and light emitting device package | |
| WO2012125321A3 (en) | Oled light extraction films having nanoparticles and periodic structures | |
| EP2369648A3 (en) | Light-emitting device | |
| EP2647685A4 (en) | LAYER COMPOSITION, ADHESIVE AND SEMICONDUCTOR COMPOSITION WITH LAYER COMPOSITION OR ADHESIVE | |
| JP2013138020A5 (ja) | 発光装置 | |
| MX381029B (es) | Elemento en capas transparente. | |
| EP2418701A3 (en) | Light emitting device and lighting system | |
| EP2765627A3 (en) | Organic light emitting diode device and manufacturing method thereof | |
| EP2372796A3 (en) | Light emitting diode package and light unit having the same | |
| MXPA02012638A (es) | Peliculas de barrera de alta humedad. | |
| EP2211393A3 (en) | Light emitting device | |
| GT201200282A (es) | "fumigacion agricola mediante una pelicula de multiples capas con una barrera de vapor de policloruro de vinilideno" | |
| EP2403018A3 (en) | Light-emitting device using a superluminescent diode and corresponding projector | |
| WO2012021884A3 (en) | Photovoltaic device | |
| JP2016119454A5 (es) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA | Abandonment or withdrawal |