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MX2009002182A - Metodo de fabricacion de recubrimientos de oxido de zinc impurificado de baja resistividad y articulos formados mediante el mismo. - Google Patents

Metodo de fabricacion de recubrimientos de oxido de zinc impurificado de baja resistividad y articulos formados mediante el mismo.

Info

Publication number
MX2009002182A
MX2009002182A MX2009002182A MX2009002182A MX2009002182A MX 2009002182 A MX2009002182 A MX 2009002182A MX 2009002182 A MX2009002182 A MX 2009002182A MX 2009002182 A MX2009002182 A MX 2009002182A MX 2009002182 A MX2009002182 A MX 2009002182A
Authority
MX
Mexico
Prior art keywords
containing compound
zinc oxide
doped zinc
low resistivity
articles formed
Prior art date
Application number
MX2009002182A
Other languages
English (en)
Inventor
Kevin D Sanderson
Liang Ye
Michael B Abrams
Roman Y Korotkov
Gary S Silverman
Ryan Smith
Guillermo Benito Gutierrez
Original Assignee
Pilkington Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington Group Ltd filed Critical Pilkington Group Ltd
Publication of MX2009002182A publication Critical patent/MX2009002182A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/214—Al2O3
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/228—Other specific oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/24—Doped oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Se describe un artículo de vidrio recubierto con óxido de zinc impurificado de baja resistividad que es formado al proporcionar un sustrato de vidrio caliente que tiene una superficie sobre la cual un recubrimiento va a ser depositado, la superficie está a una temperatura de por lo menos 400ºC. Un compuesto que contiene zinc, un compuesto que contiene oxígeno y un compuesto que contiene aluminio o galio son dirigidos a la superficie sobre la cual el recubrimiento va a ser depositado. El compuesto que contiene zinc, el compuesto que contiene oxígeno y el compuesto que contiene aluminio o galio son mezclados conjuntamente por un tiempo suficiente que se forma un recubrimiento de óxido de zinc impurificado con aluminio o galio sobre la superficie a una velocidad de deposición mayor que 5 nm/segundo.
MX2009002182A 2006-08-29 2007-05-03 Metodo de fabricacion de recubrimientos de oxido de zinc impurificado de baja resistividad y articulos formados mediante el mismo. MX2009002182A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US84091506P 2006-08-29 2006-08-29
PCT/US2007/010621 WO2008027085A1 (en) 2006-08-29 2007-05-03 Method of making low resistivity doped zinc oxide coatings and the articles formed thereby

Publications (1)

Publication Number Publication Date
MX2009002182A true MX2009002182A (es) 2009-04-22

Family

ID=38650023

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009002182A MX2009002182A (es) 2006-08-29 2007-05-03 Metodo de fabricacion de recubrimientos de oxido de zinc impurificado de baja resistividad y articulos formados mediante el mismo.

Country Status (10)

Country Link
US (1) US8163342B2 (es)
EP (1) EP2061729A1 (es)
JP (1) JP5541921B2 (es)
KR (1) KR101429785B1 (es)
CN (1) CN101547873A (es)
AU (1) AU2007290842B2 (es)
BR (1) BRPI0716386A2 (es)
MX (1) MX2009002182A (es)
RU (1) RU2445281C2 (es)
WO (1) WO2008027085A1 (es)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010151430A1 (en) * 2009-06-22 2010-12-29 Arkema Inc. Chemical vapor deposition using n,o polydentate ligand complexes of metals
WO2011047114A1 (en) * 2009-10-15 2011-04-21 Arkema Inc. Deposition of doped zno films on polymer substrates by uv-assisted chemical vapor deposition
KR101642708B1 (ko) * 2010-01-19 2016-07-28 삼성전자주식회사 화상형성장치와 그 프리뷰 이미지 디스플레이방법, 및 서버와 그 프리뷰 이미지 제공방법
US8815420B2 (en) 2010-09-17 2014-08-26 Guardian Industries Corp. Coated article having zinc oxide seed layer with reduced stress under functional layer and method of making the same
US8808882B2 (en) 2010-09-17 2014-08-19 Guardian Industries Corp. Coated article having boron doped zinc oxide based seed layer with enhanced durability under functional layer and method of making the same
US20120240634A1 (en) * 2011-03-23 2012-09-27 Pilkington Group Limited Method of depositing zinc oxide coatings by chemical vapor deposition
EP2688851B1 (en) 2011-03-23 2019-01-23 Pilkington Group Limited Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus
CN104379806B (zh) * 2012-03-16 2017-06-09 皮尔金顿集团有限公司 用于沉积氧化锌涂层的化学气相沉积工艺、用于形成导电玻璃制品的方法以及由此制成的涂覆玻璃制品
KR20140046617A (ko) 2012-10-09 2014-04-21 삼성코닝정밀소재 주식회사 산화아연 전구체 및 이를 이용한 산화아연계 박막 증착방법
RU2529443C2 (ru) * 2012-10-31 2014-09-27 Олег Петрович Ксенофонтов Способ изготовления стекловидной композиции
CN109913812A (zh) * 2017-12-13 2019-06-21 湘潭宏大真空技术股份有限公司 一种用于制备cigs薄膜的磁控溅射法
US10519595B2 (en) 2017-12-29 2019-12-31 Industrial Technology Research Institute Composite textile
CN113354297A (zh) * 2021-06-02 2021-09-07 中国科学院宁波材料技术与工程研究所 抗菌化合物材料、抗菌玻璃及制备方法与应用

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH640571A5 (fr) * 1981-03-06 1984-01-13 Battelle Memorial Institute Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.
JPH0682625B2 (ja) * 1985-06-04 1994-10-19 シーメンス ソーラー インダストリーズ，エル．ピー． 酸化亜鉛膜の蒸着方法
US4928627A (en) * 1985-12-23 1990-05-29 Atochem North America, Inc. Apparatus for coating a substrate
JPH01249634A (ja) * 1988-03-30 1989-10-04 Nippon Sheet Glass Co Ltd 導電性ガラスおよびその製造方法
US4990286A (en) * 1989-03-17 1991-02-05 President And Fellows Of Harvard College Zinc oxyfluoride transparent conductor
FR2684095B1 (fr) * 1991-11-26 1994-10-21 Saint Gobain Vitrage Int Produit a substrat en verre muni d'une couche a basse emissivite.
JP3485918B2 (ja) * 1991-12-26 2004-01-13 アトフィナ・ケミカルズ・インコーポレイテッド ガラス基体の被覆法
US6238738B1 (en) * 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6268019B1 (en) * 1998-06-04 2001-07-31 Atofina Chemicals, Inc. Preparation of fluorine modified, low haze, titanium dioxide films
JP3904378B2 (ja) * 2000-08-02 2007-04-11 ローム株式会社 酸化亜鉛透明導電膜
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WO2005072947A1 (en) * 2004-01-23 2005-08-11 Arkema Inc. Solar control films composed of metal oxide heterostructures, and method of making same
GB0518383D0 (en) 2005-09-09 2005-10-19 Pilkington Plc Deposition process

Also Published As

Publication number Publication date
US20080057225A1 (en) 2008-03-06
AU2007290842A1 (en) 2008-03-06
WO2008027085A1 (en) 2008-03-06
JP2010502831A (ja) 2010-01-28
JP5541921B2 (ja) 2014-07-09
KR20090057067A (ko) 2009-06-03
CN101547873A (zh) 2009-09-30
RU2445281C2 (ru) 2012-03-20
KR101429785B1 (ko) 2014-08-18
BRPI0716386A2 (pt) 2013-01-01
US8163342B2 (en) 2012-04-24
AU2007290842B2 (en) 2012-08-23
EP2061729A1 (en) 2009-05-27
RU2009111380A (ru) 2010-10-10

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