[go: up one dir, main page]

MX2009002181A - Metodo para la formacion de articulo recubierto con oxido de zinc. - Google Patents

Metodo para la formacion de articulo recubierto con oxido de zinc.

Info

Publication number
MX2009002181A
MX2009002181A MX2009002181A MX2009002181A MX2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A MX 2009002181 A MX2009002181 A MX 2009002181A
Authority
MX
Mexico
Prior art keywords
zinc oxide
forming
coated article
oxide coated
substrate
Prior art date
Application number
MX2009002181A
Other languages
English (en)
Inventor
Michael B Abrams
Roman Y Korotkov
Gary S Silverman
Ryan Smith
Original Assignee
Pilkington Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pilkington Group Ltd filed Critical Pilkington Group Ltd
Publication of MX2009002181A publication Critical patent/MX2009002181A/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Glass (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)

Abstract

La invención descrita y reivindicada en la presente es concerniente con un proceso de deposición de vapor químico para depositar un recubrimiento de óxido de zinc sobre un sustrato al agregar dos corrientes precursoras gaseosas a una superficie de sustrato y mezclar las corrientes precursoras gaseosas en la superficie de sustrato por un tiempo suficientemente corto para formar un recubrimiento de óxido de zinc a una velocidad de deposición mayor de 5 nm/segundo.
MX2009002181A 2006-08-29 2007-05-03 Metodo para la formacion de articulo recubierto con oxido de zinc. MX2009002181A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US84091406P 2006-08-29 2006-08-29
PCT/US2007/010669 WO2008027087A1 (en) 2006-08-29 2007-05-03 Method of forming a zinc oxide coated article

Publications (1)

Publication Number Publication Date
MX2009002181A true MX2009002181A (es) 2009-04-22

Family

ID=38577550

Family Applications (1)

Application Number Title Priority Date Filing Date
MX2009002181A MX2009002181A (es) 2006-08-29 2007-05-03 Metodo para la formacion de articulo recubierto con oxido de zinc.

Country Status (11)

Country Link
US (1) US7732013B2 (es)
EP (1) EP2059627B1 (es)
JP (2) JP2010502832A (es)
KR (1) KR101383946B1 (es)
CN (1) CN101553601B (es)
AU (1) AU2007290844B2 (es)
BR (1) BRPI0716387A2 (es)
MX (1) MX2009002181A (es)
MY (1) MY147893A (es)
RU (1) RU2447031C2 (es)
WO (1) WO2008027087A1 (es)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI123645B (fi) * 2010-04-20 2013-08-30 Beneq Oy Aerosoliavusteinen kaasukasvatusjärjestelmä
US20120240634A1 (en) * 2011-03-23 2012-09-27 Pilkington Group Limited Method of depositing zinc oxide coatings by chemical vapor deposition
KR101225739B1 (ko) * 2011-04-22 2013-01-23 삼성코닝정밀소재 주식회사 광전지용 산화아연계 투명 도전막 및 그 제조방법
CN104379806B (zh) * 2012-03-16 2017-06-09 皮尔金顿集团有限公司 用于沉积氧化锌涂层的化学气相沉积工艺、用于形成导电玻璃制品的方法以及由此制成的涂覆玻璃制品
KR101466842B1 (ko) * 2012-11-28 2014-11-28 코닝정밀소재 주식회사 투명전극용 산화아연계 박막 제조방법
WO2021200219A1 (ja) * 2020-04-01 2021-10-07 株式会社Adeka 亜鉛化合物、薄膜形成用原料、薄膜及びその製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH640571A5 (fr) * 1981-03-06 1984-01-13 Battelle Memorial Institute Procede et dispositif pour deposer sur un substrat une couche de matiere minerale.
JPH0682625B2 (ja) * 1985-06-04 1994-10-19 シーメンス ソーラー インダストリーズ，エル．ピー． 酸化亜鉛膜の蒸着方法
US5698262A (en) * 1996-05-06 1997-12-16 Libbey-Owens-Ford Co. Method for forming tin oxide coating on glass
US6238738B1 (en) * 1996-08-13 2001-05-29 Libbey-Owens-Ford Co. Method for depositing titanium oxide coatings on flat glass
US6071561A (en) * 1997-08-13 2000-06-06 President And Fellows Of Harvard College Chemical vapor deposition of fluorine-doped zinc oxide
US6268019B1 (en) * 1998-06-04 2001-07-31 Atofina Chemicals, Inc. Preparation of fluorine modified, low haze, titanium dioxide films
JP2001023907A (ja) * 1999-07-07 2001-01-26 Mitsubishi Heavy Ind Ltd 成膜装置
WO2005072947A1 (en) * 2004-01-23 2005-08-11 Arkema Inc. Solar control films composed of metal oxide heterostructures, and method of making same

Also Published As

Publication number Publication date
RU2009111377A (ru) 2010-10-10
JP2010502832A (ja) 2010-01-28
JP2013053066A (ja) 2013-03-21
EP2059627B1 (en) 2015-08-05
AU2007290844B2 (en) 2011-08-04
RU2447031C2 (ru) 2012-04-10
US7732013B2 (en) 2010-06-08
CN101553601A (zh) 2009-10-07
BRPI0716387A2 (pt) 2013-01-01
KR20090061635A (ko) 2009-06-16
WO2008027087A1 (en) 2008-03-06
CN101553601B (zh) 2012-12-12
EP2059627A1 (en) 2009-05-20
US20080057200A1 (en) 2008-03-06
MY147893A (en) 2013-01-31
KR101383946B1 (ko) 2014-04-10
JP6039402B2 (ja) 2016-12-07
AU2007290844A1 (en) 2008-03-06

Similar Documents

Publication Publication Date Title
TW200606168A (en) Copper (I) compounds useful as deposition precursors of copper thin films
WO2010055423A8 (en) Tellurium precursors for film deposition
WO2008057625A3 (en) Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
WO2008142653A3 (en) New cobalt precursors for semiconductor applications
MX2012001920A (es) Sintesis de rocio termico directo de componentes de bateria de ion li.
MX349614B (es) Metodos y aparatos para elaborar recubrimientos utilizando deposicion de rocio ultrasonico.
WO2011041135A3 (en) Method of making coated metal articles
WO2007140424A3 (en) Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen
WO2010065874A3 (en) High concentration nitrogen-containing germanium telluride based memory devices and processes of making
WO2010039363A3 (en) Methods for forming silicon nitride based film or silicon carbon based film
MY147893A (en) Method of forming a zinc oxide coated article
GB201216405D0 (en) Multilayer coated wear-resistant member and method for making the same
EP2053143A3 (en) High quality silicon oxide films by remote plasma cvd from disilane precursors
MX2009002182A (es) Metodo de fabricacion de recubrimientos de oxido de zinc impurificado de baja resistividad y articulos formados mediante el mismo.
SG134217A1 (en) Thermal barrier coating compositions, processes for applying same and articles coated with same
TW200940738A (en) Method for forming a titanium-containing layer on a substrate using an ALD process
WO2007147020A3 (en) Cobalt precursors useful for forming cobalt-containing films on substrates
GB2479322A (en) Composition and method for low temperature deposition of ruthenium
TW200617197A (en) Deposition of ruthenium and/or ruthenium oxide films
WO2011034751A3 (en) Hot wire chemical vapor deposition (cvd) inline coating tool
WO2013019285A3 (en) Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus
WO2009122113A3 (fr) Procede de production de nanostructures sur un substrat d'oxyde metallique, et dispositif forme de couches minces
MY148287A (en) Method of making a low-resistivity, doped zinc oxide coated glass article and the coated glass article made thereby
WO2010057652A8 (de) Nonodrähte auf substratoberflächen, verfahren zu deren herstellung sowie deren verwendung
WO2013136052A3 (en) Chemical vapor deposition process for depositing zinc oxide coatings, method for forming a conductive glass article and the coated glass articles produced thereby

Legal Events

Date Code Title Description
FG Grant or registration