WO2025210050A1

WO2025210050A1 - Precursor container

Info

Publication number: WO2025210050A1
Application number: PCT/EP2025/058905
Authority: WO
Inventors: Charles M. BIRTCHER; Ryan STERNBERG; Robert Eschbach
Original assignee: Merck Patent GmbH
Current assignee: Merck Patent GmbH
Priority date: 2024-04-05
Filing date: 2025-04-02
Publication date: 2025-10-09
Anticipated expiration: 2026-10-05

Abstract

An integrated showerhead-filtration system for a precursor container is disclosed. The integrated showerhead-filtration system may include an annular-shaped filtration medium, a diverter, and a showerhead. A lower side of the annular-shaped filtration medium may engage a top side of the diverter, and the bottom side of the diverter may engage an upper end of the showerhead. A carrier gas may be passed through a first aperture of the annular-shaped filtration medium, through a neck of the diverter and into a first-annularly-shaped-chamber, and through a bore of the showerhead into a hollow of the precursor container storing a precursor material, thereby creating a mixture of carrier gas and precursor material. The mixture may be passed through a port of the diverter into a second-annularly-shaped-chamber and through the annular-shaped filtration medium to create a filtered carrier gas-precursor material mixture.

Description

PRECURSOR CONTAINER

TECHNICAL FIELD

[0001] This disclosure relates to a precursor container used in semiconductor manufacturing processes, and more particularly to an integrated showerhead-filtration system for use with a precursor container used in semiconductor manufacturing processes.

BACKGROUND

[0002] Semiconductor manufacturing precursor materials are most often stored as liquids or solids inside a precursor container. Solid precursor materials often require a filter between the precursor itself, and the manufacturing tool, in order to remove particles of the solid precursor that become entrained in the carrier gas delivering the precursor to the manufacturing tool. Failure to remove these particles of solid precursor can lead to defects in the semiconductor device being manufactured. Filtration systems currently used inside the precursor container to remove the above-described in particles often corrode due to exposure to the precursor, or the filtration media utilized often have too high of a pressure drop. The present disclosure is directed to overcoming one or more problems set forth above, and/or other problems associated with the prior art container and filtration systems.

SUMMARY OF THE INVENTION

[0003] In accordance with a first aspect of the present application, an integrated showerheadfiltration system for a precursor container having a central axis defined both therethrough is disclosed.

[0004] In accordance with a second aspect of this disclosure, a precursor container configured to be used in a semiconductor manufacturing process having a central axis defined therethrough is described. [0005] In an accordance with a final aspect of this disclosure, a method of operating a precursor container to create a filtered carrier gas-precursor material mixture to be used in a semiconductor manufacturing process is defined.

BRIEF DESCRIPTION OF THE DRAWINGS

[0006] FIG. 1 is an exploded, perspective view of a precursor container used in semiconductor manufacturing processes having an integrated showerhead-filtration system manufactured in accordance with this application.

[0007] FIG. 2 is an exploded, top down, perspective view of the precursor container having the integrated showerhead-filtration system manufactured in accordance with FIG. 1.

[0008] FIG. 3 is an exploded, bottom up, perspective view of the precursor container having the integrated showerhead-filtration system manufactured in accordance with FIG. 1.

[0009] FIG. 4 is an exploded, perspective view of the integrated showerhead-filtration system manufactured in accordance with FIG. 1.

[0010] FIG. 5 is a cross-sectional view of a diverter manufactured in accordance with FIG. 1 along line 4 - 4 of FIG. 4.

[0011] FIG. 6 is a partial cut-away view of the precursor container used in semiconductor manufacturing processes having the integrated showerhead-filtration system manufactured in accordance with FIG. 1.

[0012] FIG. 7 is a flowchart depicting sample sequence of steps that may be used while operating the precursor container having the integrated showerhead-filtration system manufactured in accordance with FIG. 1.

DETAILED DESCRIPTION

[0013] Example embodiments will now be described more fully with reference to the accompanying drawings. [0014] Example embodiments are provided so that this disclosure will be thorough, and will fully convey the scope to those who are skilled in the art. Numerous specific details are set forth such as examples of specific compositions, components, devices, and methods, to provide a thorough understanding of embodiments of the present disclosure. It will be apparent to those skilled in the art that specific details need not be employed, that example embodiments may be embodied in many different forms and that neither should be construed to limit the scope of the disclosure. In some example embodiments, well-known processes, well-known device structures, and well-known technologies are not described in detail.

[0015] The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting. As used herein, the singular forms “a,” “an,” and “the” may be intended to include the plural forms as well, unless the context clearly indicates otherwise. The terms “comprises,” “comprising,” “including,” and “having,” are inclusive and therefore specify the presence of stated features, elements, compositions, steps, integers, operations, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. Although the open-ended term “comprising,” is to be understood as a non-restrictive term used to describe and claim various embodiments set forth herein, in certain aspects, the term may alternatively be understood to instead be a more limiting and restrictive term, such as “consisting of’ or “consisting essentially of.” Thus, for any given embodiment reciting compositions, materials, components, elements, features, integers, operations, and/or process steps, the present disclosure also specifically includes embodiments consisting of, or consisting essentially of, such recited compositions, materials, components, elements, features, integers, operations, and/or process steps. In the case of “consisting of,” the alternative embodiment excludes any additional compositions, materials, components, elements, features, integers, operations, and/or process steps, while in the case of “consisting essentially of,” any additional compositions, materials, components, elements, features, integers, operations, and/or process steps that materially affect the basic and novel characteristics are excluded from such an embodiment, but any compositions, materials, components, elements, features, integers, operations, and/or process steps that do not materially affect the basic and novel characteristics can be included in the embodiment. [0016] Any method steps, processes, and operations described herein are not to be construed as necessarily requiring their performance in the particular order discussed or illustrated, unless specifically identified as an order of performance. It is also to be understood that additional or alternative steps may be employed, unless otherwise indicated.

[0017] When a component, element, or layer is referred to as being “on,” “engaged to,” “connected to,” or “coupled to” another element or layer, it may be directly on, engaged, connected or coupled to the other component, element, or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being “directly on,” “directly engaged to,” “directly connected to,” or “directly coupled to” another element or layer, there may be no intervening elements or layers present. Other words used to describe the relationship between elements should be interpreted in a like fashion (e.g., “between” versus “directly between,” “adjacent” versus “directly adjacent,” etc.). As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.

[0018] Although the terms first, second, third, etc. may be used herein to describe various steps, elements, components, regions, layers and/or sections, these steps, elements, components, regions, layers and/or sections should not be limited by these terms, unless otherwise indicated. These terms may be only used to distinguish one step, element, component, region, layer or section from another step, element, component, region, layer or section. Terms such as “first,” “second,” and other numerical terms when used herein do not imply a sequence or order unless clearly indicated by the context. Thus, a first step, element, component, region, layer or section discussed below could be termed a second step, element, component, region, layer or section without departing from the teachings of the example embodiments.

[0019] Spatially or temporally relative terms, such as “before,” “after,” “inner,” “outer,” “beneath,” “below,” “lower,” “above,” “upper,” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. Spatially or temporally relative terms may be intended to encompass different orientations of the device or system in use or operation in addition to the orientation depicted in the figures.

[0020] Throughout this disclosure, the numerical values represent approximate measures or limits to ranges to encompass minor deviations from the given values and embodiments having about the value mentioned as well as those having exactly the value mentioned. Other than in the working examples provided at the end of the detailed description, all numerical values of parameters (e.g., of quantities or conditions) in this specification, including the appended claims, are to be understood as being modified in all instances by the term “about” whether or not “about” actually appears before the numerical value. “About” indicates that the stated numerical value allows some slight imprecision (with some approach to exactness in the value; approximately or reasonably close to the value; nearly). If the imprecision provided by “about” is not otherwise understood in the art with this ordinary meaning, then “about” as used herein indicates at least variations that may arise from ordinary methods of measuring and using such parameters. For example, “about” may comprise a variation of less than or equal to 5%, optionally less than or equal to 4%, optionally less than or equal to 3%, optionally less than or equal to 2%, optionally less than or equal to 1%, optionally less than or equal to 0.5%, and in certain aspects, optionally less than or equal to 0.1%.

[0021] In addition, disclosure of ranges includes disclosure of all values and further divided ranges within the entire range, including endpoints and sub-ranges given for the ranges. Thus, ranges are, unless specified otherwise, inclusive of endpoints and include disclosure of all distinct values and further divided ranges within the entire range. Disclosure of values and ranges of values for specific parameters (such as temperatures, molecular weights, weight percentages, etc.) are not exclusive of other values and ranges of values useful herein. It is envisioned that two or more specific exemplified values for a given parameter may define endpoints for a range of values that may be claimed for the parameter. For example, if Parameter X is exemplified herein to have value A and also exemplified to have value Z, it is envisioned that Parameter X may have a range of values from about A to about Z. Similarly, it is envisioned that disclosure of two or more ranges of values for a parameter (whether such ranges are nested, overlapping or distinct) subsume all possible combination of ranges for the value that might be claimed using endpoints of the disclosed ranges. For example, if Parameter X is exemplified herein to have values in the range of 1-10, or 2-9, or 3-8, it is also envisioned that Parameter X may have other ranges of values including 1-9, 1-8, 1-3, 1-2, 2-10, 2-8, 2-3, 3- 10, and 3-9.

[0022] As used herein, the terms “composition” and “material” are used interchangeably to refer broadly to a substance containing at least the preferred chemical constituents, elements, or compounds, but which may also comprise additional elements, compounds, or substances, including trace amounts of impurities, unless otherwise indicated.

[0023] Various aspects of the disclosure will now be described with reference to the drawings disclosed herein, if applicable, with like reference numbers referring to like elements, unless specified otherwise. As described above, solid precursor materials often require a filter between the precursor itself, and the manufacturing tool, in order to remove particles of the solid precursor that become entrained in the carrier gas delivering the precursor to the manufacturing tool. Failure to remove these particles of solid precursor can lead to defects in the semiconductor device being manufactured. The filtration systems currently used inside precursor containers to remove the above-described particles often corrode due to exposure to the precursor, or the filtration media utilized often have too high of a pressure drop. Turning now to FIGS. 1-4 and 6, in a first instance of this disclosure an integrated showerhead-filtration system 10 for a precursor container 12 having a central axis 14 defined through both the integrated showerhead-filtration system 10 and the precursor container 12 that resolves problems with currently known filtration systems, is depicted. As seen there, and further shown in FIG. 4, the integrated showerheadfiltration system 10 may be comprised of an annular-shaped filtration medium 16, a diverter 26 and a showerhead 64. The filtration medium 16 described in this disclosure may be comprised of materials that corrode less easily than materials used with current filtration systems. Moreover, the novel and non-obvious design of the integrated showerhead-filtration system 10 provides a filtration medium 16 having a larger surface area than media used with current filtration systems, and so exhibits lower pressure drop than current media too.

[0024] While referring to FIG. 4, the annular-shaped filtration medium 16 may have an upper side 18 and a lower side 20 opposite the upper side 18. It may also include a first-inner-edge 22 defining an inner radius of the annular-shaped filtration medium 16 between the central axis 14 and the first-inner-edge 22. While the first-inner-edge 22 is depicted as being circularly shaped, its shape is not limited to a circle. The first-inner-edge 22 may be triagonal, square, pentagonal, hexagonal, heptagonal, octagonal, and the like, in shape. A first-outer-edge 24 may define an outer radius of the annular-shaped filtration medium 16 between the central axis 14 and the first- outer-edge 24. While the first-outer-edge 24 is depicted as being circularly shaped, its shape is not limited to a circle. The first-outer-edge 24 may be triagonal, square, pentagonal, hexagonal, heptagonal, octagonal, and the like, in shape. A first-aperture 25 may be defined between the upper side 18 and the lower side 20 between the central axis 14 and the first-inner-edge 22.

[0025] The annular-shaped filtration medium 16 may have a thickness that is defined between the upper side 18 and the lower side 20. Such medium 16 is configured to remove particles of precursor that become entrained in the carrier gas delivering the precursor to the manufacturing tool. As such the medium 16 is, more often than not, comprised of a porous material that allows passage of a carrier gas, or the carrier gas mixed with vaporized precursor material, through both its lower side 20 and upper side 18. Additionally, this medium 16 made of porous material simultaneously prohibits, or stops, passage of non-vaporized precursor material particles that have been entrained in the carrier gas between its lower side 20 and upper side 18. As a filtration material, the porosity of the porous material may be sized as is appropriate to permit passage of the carrier gas, or the carrier gas mixed with vaporized precursor material, and prohibit or stop passage of any non-vaporized precursor material particles that have been entrained in the carrier gas. Generally, the porosity of the medium 16 ranges between about 1 nanometer and about 100 micrometers. In a preferred embodiment the porosity of the medium 16 ranges between about 1 micrometer and about 10 micrometers. In an additional embodiment, the porosity of the medium 16 ranges between about 1 nanometer and about 100 nanometers when the process is less sensitive to pressure drop. The medium 16 may be comprised of a metal, a metal alloy, or a polymeric material, including but not limited to, nickel, nickel alloys such as Hastelloy, stainless steel, nickel -chromium alloys such as Inconel or Monel, or a fluoropolymer such as Teflon.

[0026] Now, and while referring to FIGS. 4 and 5, the diverter 26 may have a top side 28 and a bottom side 30 opposite the top side 28. The diverter 26 can also include an outer wall 32 that extends between the top side 28 and the bottom side 30 and has a first-thickness 34. While the outer wall 32 is depicted as being circularly shaped, its shape is not limited to a circle. The outer wall 32 may be triagonal, square, pentagonal, hexagonal, heptagonal, octagonal, and the like, in shape. The first-thickness 34 may be defined between the central axis 14, a second-outer-edge 36 and a second-inner-edge 38. The diverter 26 also includes a floor 40 positioned between the top side 28 and bottom side 30 has a second-thickness 42 that is defined between an upper-floor- wall 44 and a bottom-floor-wall 46. [0027] The diverter may further include a first-neck 48 that extends between the bottom-floor- wall 46 and the top side 28 having a third-thickness 50. The third-thickness 50 is defined between the central axis 14 a third-outer-edge 52 and a third-inner-edge 54. While the first-neck 48 is depicted as being circularly shaped, its shape is not limited to a circle. The first-neck 48 may be triagonal, square, pentagonal, hexagonal, heptagonal, octagonal, and the like, in shape. The diverter 26 further includes a second-aperture 56 defined between the central axis 14 and the third-inner-edge 54 that is configured to convey a carrier gas toward the interior of the precursor container 12, and further comprises a first-annularly-shaped-chamber 58 configured to receive the carrier gas through the second-aperture 56 and is defined as a volume extending between the bottom side 30, the second-inner-edge 38, the bottom-floor-wall 46 and the third-inner-edge 54 of the first-neck 48. The diverter 26 is also defined as comprising a second-annularly-shaped- chamber 60. The second-annularly-shaped-chamber 60 is configured to receive a mixture of the carrier gas and a precursor material through a port 62 defined through the outer wall 32 that is positioned above the floor 40 toward the top side 28 of the diverter 26. The second-annularly- shaped-chamber 60 is defined as the volume extending between the top side 28, the second inner edge 38, the upper-floor-wall 44 and the third-outer-edge 52 of the diverter 26.

[0028] While referring to FIG. 4, the showerhead 64 is generally circular in shape and may include an upper end 66, a lower end 68 opposite the upper end 66, a bore 67, and have a thickness defined between the upper end 66 and the lower end 68. While the showerhead 64 is depicted as being circularly shaped, its shape is not limited to a circle. The showerhead 64 may be triagonal, square, pentagonal, hexagonal, heptagonal, octagonal, and the like, in shape The bore 67 may extend between the upper end 66 and the lower end 68 and is configured to convey the carrier gas from the second-annularly-shaped-chamber 60 to the remainder of the precursor container 12. The showerhead 64 may include more than one bore 67, and these additional bores 67 may also extend between the upper end 66 and the lower end 68 and are configured to convey the carrier gas from the second-annularly-shaped-chamber 60 to the remainder of the precursor container 12. Moreover, the multiple bores may be positioned across the showerhead 64 in a repeating, or non-repeating pattern. The showerhead 64 may be defined as a device that splits a stream of carrier gas into a plurality of carrier gas streams across its surface area via the more than one bore 67. The bore 67, or the more than one bore 67, may not exhibit a perfectly cylindrical shape extending between the upper end 66 and the lower end 68, and as such the diameter of the bores 67 are calculated in equivalent diameters. The equivalent diameter of the bore 67, or the more than one bore 67, generally ranges between about 0.001 inch and about 0.500 inch.

[0029] In addition, and while reviewing FIGS. 4-6, it is seen that the top side 28 of the diverter 26 may be configured to sealingly engage against the lower side 20 of the annular-shaped filtration medium 16. It is also seen that the bottom side 30 of the diverter 26 may be configured to sealingly engage against the upper end 66 of the showerhead 64. Turning now to FIGS. 1-6, the diverter 26 may be further sealed against the showerhead 64 by a first-annular-shaped- pliable-seal 70 positioned between the bottom side 30 of the diverter 26 and the upper end 66 of the showerhead 64. The first-annular-shaped-pliable-seal 70 may be configured to seal the juncture between the diverter 26 and the showerhead 64. In addition, as seen in these same FIGS., the showerhead 64 may be reversibly attached to the diverter 26 with a fastener 72.

[0030] As mentioned before, the integrated showerhead-filtration system 10 is configured to be used with a precursor container 12. As such, in a second in aspect of the current disclosure a precursor container 12 configured to be used in a semiconductor manufacturing process having a central axis 14 defined therethrough is disclosed. While referring to FIGS. 1-6, the container 12 may comprise a lid 74, a bottom 92 and the integrated showerhead-filtration system 10 described above. Turning specifically to FIGS. 1-3 and 6, the lid 74 comprises an upper surface 76, a first- lower surface 78 opposite the upper surface 76 and an inlet port 80. The inlet port 80 may be configured to transport carrier gas and it extends between the upper surface 76 and the first- lower surface 78.

[0031] The lid 74 further comprises a third-annularly-shaped-chamber 82. The chamber 82 and is defined as the volume extending between the first-lower surface 78, a second-lower surface 84 positioned between the upper surface 76, and the first-lower surface 78, an inner-chamber edge 86 and an outer-chamber edge 88, and between an outlet port 90 extending between the upper surface 76 and the second-lower surface 84. The third-annularly-shaped-chamber 82 is configured to convey a mixture of the carrier gas and precursor material that exits the upper side 18 of the annular-shaped filtration medium 16. The port 90 is configured to convey the mixture of the carrier gas and precursor material out of the precursor container 12 toward the manufacturing tool. Additionally, the bottom 92 includes a hollow 94 configured to store the precursor material.

[0032] The integrated showerhead-filtration system 10 includes the annular-shaped filtration medium 16. The medium may have an upper side 18 and a lower side 20 opposite the upper side 18. It may also include a first-inner-edge 22 defining an inner radius of the annular-shaped filtration medium 16 between the central axis 14 and the first-inner-edge 22. A first-outer-edge 24 may define an outer radius of the annular-shaped filtration medium 16 between the central axis 14 and the first-outer-edge 24. A first-aperture 25 may be defined between the upper side 18 and the lower side 20 between the central axis 14 and the first-inner-edge 22.

[0033] The annular-shaped filtration medium 16 may have a thickness that is defined between the upper side 18 and the lower side 20. Such medium 16 is configured to remove particles of precursor that become entrained in the carrier gas delivering the precursor to the manufacturing tool. As such the medium 16 is, more often than not, comprised of a porous material that allows passage of a carrier gas, or the carrier gas mixed with vaporized precursor material, through both its lower side 20 and upper side 18. Additionally, this medium 16 made of porous material simultaneously prohibits, or stops, passage of non-vaporized precursor material particles that have been entrained in the carrier gas between its lower side 20 and upper side 18. As a filtration material, the porosity of the porous material may be sized as is appropriate to permit passage of the carrier gas, or the carrier gas mixed with vaporized precursor material, and prohibit or stop passage of any non-vaporized precursor material particles that have been entrained in the carrier gas. Generally, the porosity of the medium 16 ranges between about 1 nanometer and about 100 micrometers. In a preferred embodiment the porosity of the medium 16 ranges between 1 micrometer and 10 micrometers. In an additional embodiment, the porosity of the medium 16 ranges between about 1 nanometer and about 100 nanometers when the process is less sensitive to pressure drop. The medium 16 may be comprised of a metal, a metal alloy, or a polymeric material, including but not limited to, nickel, nickel alloys such as Hastelloy, stainless steel, nickel-chromium alloys such as Inconel or Monel, or a fluoropolymer such as Teflon.

[0034] Now, and while referring to FIGS. 4 and 5, the diverter 26 may have a top side 28 and a bottom side 30 opposite the top side 28. The diverter 26 can also include an outer wall 32 that extends between the top side 28 and the bottom side 30 and has a first-thickness 34. The first- thickness 34 may be defined between the central axis 14, a second-outer-edge 36 and a second- inner-edge 38. The diverter 26 also includes a floor 40 positioned between the top side 28 and bottom side 30 has a second-thickness 42 that is defined between an upper-floor-wall 44 and a bottom-floor-wall 46.

[0035] The diverter may further include a first-neck 48 that extends between the bottom-floor- wall 46 and the top side 28 having a third-thickness 50. The third-thickness 50 is defined between the central axis 14 a third-outer-edge 52 and a third-inner-edge 54. The diverter 26 further includes a second-aperture 56 defined between the central axis 14 and the third-inner- edge 54 that is configured to convey a carrier gas toward the interior of the precursor container 12, and further comprises a first-annularly-shaped-chamber 58 configured to receive the carrier gas through the second-aperture 56 and is defined as a volume extending between the bottom side 30, the second-inner-edge 38, the bottom-floor-wall 46 and the third-inner-edge 54 of the first-neck 48. The diverter 26 is also defined as comprising a second-annularly-shaped-chamber 60. The second-annularly-shaped-chamber 60 is configured to receive a mixture of the carrier gas and a precursor material through a port 62 defined through the outer wall 32 that is positioned above the floor 40 toward the top side 28 of the diverter 26. The second-annularly- shaped-chamber 60 is defined as the volume extending between the top side 28, the second inner edge 38, the upper-floor-wall 44 and the third-outer-edge 52 of the diverter 26.

[0036] While referring to FIG. 4, the showerhead 64 is generally circular in shape and may include an upper end 66, a lower end 68 opposite the upper end 66, a bore 67, and have a thickness defined between the upper end 66 and the lower end 68. The bore 67 may extend between the upper end 66 and the lower end 68 and is configured to convey the carrier gas from the second-annularly-shaped-chamber 60 to the remainder of the precursor container 12. The showerhead 64 may include more than one bore 67, and these additional bores 67 may also extend between the upper end 66 and the lower end 68 and are configured to convey the carrier gas from the second-annularly-shaped-chamber 60 to the remainder of the precursor container 12. Moreover, the multiple bores may be positioned across the showerhead 64 in a repeating, or non-repeating pattern. The showerhead 64 may be defined as a device that splits a stream of carrier gas into a plurality of carrier gas streams across its surface area via the more than one bore 67. The bore 67, or the more than one bore 67, may not exhibit a perfectly cylindrical shape extending between the upper end 66 and the lower end 68, and as such the diameter of the bores 67 are calculated in equivalent diameters. The equivalent diameter of the bore 67, or the more than one bore 67, generally ranges between about 0.001 inch and about 0.500 inch. .

[0037] In addition, and while reviewing FIGS. 4-6, it is seen that the top side 28 of the diverter 26 may be configured to sealingly engage against the lower side 20 of the annular-shaped filtration medium 16. It is also seen that the bottom side 30 of the diverter 26 may be configured to sealingly engage against the upper end 66 of the showerhead 64. Turning now to FIGS. 1-6, the diverter 26 may be further sealed against the showerhead 64 by a first-annular-shaped- pliable-seal 70 positioned between the bottom side 30 of the diverter 26 and the upper end 66 of the showerhead 64. The first-annular-shaped-pliable-seal 70 may be configured to seal the juncture between the diverter 26 and the showerhead 64. In addition, as seen in these same FIGS., the showerhead 64 may be reversibly attached to the diverter 26 with a fastener 72.

[0038] Turning now to FIG. 6, the upper side 18 of the annular-shaped filtration medium 16 is configured to fit into a channel 96 located on the underside 98 of the lid 74. Additionally, and while looking at FIGS. 1-6, it is seen that the container 12 may further include a second-annularshaped-pliable seal 100 positioned between the upper side 18 of the annular-shaped filtration medium 16 and the underside 98 of the lid 14. The second-annular-shaped-pliable-seal 100 may be configured to seal the juncture between the medium 16 and the lid 74 about the outer edge 24 of the medium 16. Additionally, the container may comprise a third-annular-shaped-pliable-seal 102 positioned between the upper side 18 of the medium 16 and the underside 98 of the lid 74. The third-annular-shaped-pliable-seal 102 smaller in diameter than the second-annular-shaped- pliable-seal 100 and is configured to seal the juncture between the medium 16 and the underside 98 lid 74 about the first-inner-edge 22 of the medium 16. The container 12 may also include a fourth-annular-shaped-pliable-seal 106 positioned between the top side 28 of the diverter 26 and the underside 98 of the lid 74. The fourth-annular-shaped-pliable-seal 106 is smaller in diameter than the third-annular-shaped-pliable-seal 102 and is configured to seal the juncture between the top side 28 of the neck 48 of the diverter 26 and the underside 98 of the lid 74 about the third- thickness 50 of the neck 48. In some instances, first-annular-shaped-pliable-seal 70, the second- annular-shaped-pliable-seal 100, the third-annular-shaped-pliable-seal 102 and the fourth- annular-shaped-pliable-seal are made of polymeric materials, while in other instances these seals may be made from metals. Finally, as is demonstrated in FIGS 1, 2 and 6, the diverter 26 and the annular-shaped filtration medium 16 may be reversibly attached to the lid 74 with one or more fastener 104.

INDUSTRIAL APPLICABILITY

[0039] In operation, the integrated showerhead-filtration system for a precursor container finds usefulness in many processes, including but not limited to, its use in a semiconductor manufacturing process. Accordingly in a third aspect of the present disclosure, a method of operating a precursor container 12 manufactured in accordance with this described. More specifically, and turning now to FIG. 7, a flowchart depicting a sample sequence of steps that may be used to create a filtered carrier gas-precursor material mixture to be used in a semiconductor manufacturing process, is disclosed. As seen there, in a step 108, a carrier gas may move through an inlet port 80 past a first-aperture 25 of an annular-shaped filtration medium 16 and through a first-neck 48 of a diverter 26 into a first-annularly-shaped-chamber 58. In an additional step 110, the carrier gas may move from the first-annularly-shaped-chamber 58 through a bore 67 of a showerhead 64 and into a hollow 94 of a bottom 92 that is configured to store a precursor material. The carrier gas and the precursor material may mix with each other to create the carrier gas-precursor material mixture in step 112. In an additional step 114, the carrier gas-precursor material mixture created in step 112 may move through a port 62 of the diverter 26 into a second-annularly-shaped-chamber 60 and subsequently through the annularshaped filtration medium 16 to trap particles of any precursor material entrained in the carrier gas-precursor material mixture to create the filtered carrier gas-precursor material mixture and continues to move into the third-annularly-shaped-chamber 82 of the lid 74. In another step of the method of operation of the precursor container 12, the filtered carrier gas-precursor material mixture may move thorough the outlet port 90 and subsequently be used in a semiconductor manufacturing process.

[0040] The lid 74 in such process may further comprise an upper surface 76, a first-lower surface 78 opposite the upper surface 76, and an inlet port 80 configured to transport carrier gas extending between the upper surface 76 and the first-lower surface 78. The lid 74 in this process may additionally include a third-annularly-shaped-chamber 82 defined as the volume between the first-lower surface 78, have a second-lower surface 84 positioned between the upper surface 76 and the first-lower surface 78. It 74 may also include an inner-chamber edge 86 and an outerchamber edge 88 and the outlet port 90 extends between the upper surface 76 and the second- lower surface 84 configured to convey a mixture of the carrier gas and precursor material.

[0041] The annular-shaped filtration medium 16 in such process may be further defined as comprising an upper side 18, a lower side 20 opposite the upper side 18, having a first-inner- edge 22 defining an inner radius of the annular-shaped filtration medium 16 between a central axis 14 and the first-inner-edge 22. The medium 16 may also include a first-outer-edge 24 defining an outer radius of the annular-shaped filtration medium 16 between the central axis 14 and the first-outer-edge 24, and the first-aperture 25 is defined between the upper side 18 and the lower side 20 and further defined between the central axis 14 and the first-inner-edge 22.

[0042] The diverter 26 described in this process may be further defined as comprising a top side 28, a bottom side 30 opposite the top side 28, an outer wall 32 extending between the top side 28 and the bottom side 30 having a first-thickness 34 defined between the central axis 14 a second- outer-edge 36 and a second-inner-edge 38. The diverter may further comprise a floor 40 positioned between the top side 28 and bottom side 30 having a second-thickness 42 defined between an upper-floor-wall 44 and a bottom-floor-wall 46, and wherein the first-neck 48 extends between the bottom-floor-wall 46 and the top side 28 and having a third-thickness 50 defined between the central axis 14 a third-outer-edge 52 and a third-inner-edge 54. The diverter 26 may further include a second-aperture 56 defined between the central axis 14 and the third- inner-edge 54 configured to convey a carrier gas toward the interior of the precursor container 12, and the first-annularly-shaped-chamber 58 is configured to receive the carrier gas through the second-aperture 56and may be defined as a volume extending between the bottom side 30, the second-inner-edge 38, the bottom-floor-wall 46 and the third-inner-edge 54 of the first-neck 48. The second-annularly-shaped-chamber 60 of the diverter 26 may be configured to receive a mixture of the carrier gas and a precursor material through the port 62 that is defined as the volume extending between the top side 28, the second inner edge 38, the upper-floor-wall 44 and the third-outer-edge 52.

[0043] Finally, the showerhead 64 used in this process is generally circular in shape and may further include an upper end 66, a lower end 68 opposite the upper end 66, and have a thickness defined between the upper end 66 and the lower end 68. The bore 67 may extend between the upper end 66 and the lower end 68 and be configured to convey the carrier gas from the second- annularly-shaped-chamber 60 to the remainder of the precursor container 12 such as the hollow 94 of the bottom 92.

[0044] The above description is meant to be representative only, and thus modifications may be made to the aspects of the invention disclosed herein without departing from the scope of the disclosure. Thus, these modifications fall within the scope of the present disclosure and are intended to fall within the appended claims.

Claims

What is claimed is:

1. An integrated showerhead -filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough, comprising: an annular-shaped filtration medium (16) having an upper side (18), a lower side (20) opposite the upper side (18), a first-inner-edge (22) defining an inner radius of the annular-shaped filtration medium (16) between the central axis (14) and the first-inner- edge (22), a first-outer-edge (24) defining an outer radius of the annular-shaped filtration medium (16) between the central axis (14) and the first-outer-edge (24), and a first- aperture (25) defined between the upper side (18) and the lower side (20) defined between the central axis (14) and the first-inner-edge (22); a diverter (26) having a top side (28), a bottom side (30) opposite the top side (28), an outer wall (32) extending between the top side (28) and the bottom side (30) having a first-thickness (34) defined between the central axis (14) a second-outer-edge (36) and a second-inner-edge (38), a floor (40) positioned between the top side (28) and bottom side (30) having a second-thickness (42) defined between an upper-floor- wall (44) and a bottom-floor-wall (46), a first-neck (48) extending between the bottom-floor-wall (46) and the top side (28) having a third-thickness (50) defined between the central axis (14) a third-outer-edge (52) and a third-inner-edge (54), a second-aperture (56) defined between the central axis (14) and the third-inner-edge (54) configured to convey a carrier gas toward the interior of the precursor container (12), a first-annularly-shaped-chamber (58) configured to receive the carrier gas through the second-aperture (56) defined as a volume extending between the bottom side (30), the second-inner-edge (38) the bottom- floor-wall (46) and the third-inner-edge (54) of the first-neck (48), and a second- annularly-shaped-chamber (60) configured to receive a mixture of the carrier gas and a precursor material through a port (62) defined as the volume extending between the top side (28), the second inner edge (38), the upper-floor- wall (44) and the third-outer-edge

(52); and a showerhead (64) having an upper end (66), a lower end (68) opposite the upper end (66), a bore (67) extending between the upper end (66) and the lower end (68) configured to convey the carrier gas from the second-annularly-shaped-chamber (60) to the remainder of the precursor container (12).

2. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 1, wherein the top side (28) of the diverter (26) is configured to sealingly engage against the lower side (20) of the annular-shaped filtration medium (16).

3. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 1, wherein the bottom side (30) of the diverter (26) is configured to sealingly engage against the upper end (66) of the showerhead (64).

4. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 3, further comprising a first- annular-shaped-pliable-seal (70) positioned between the bottom side (30) of the diverter (26) and the upper end (66) of the showerhead (64).

5. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 1, wherein the showerhead (64) is reversibly attached to the diverter (26) with a fastener (72).

6. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 1, wherein the showerhead further comprises more than one bore (67) extending between the upper end (66) and the lower end (68) configured to convey the carrier gas from the second-annularly-shaped-chamber (60) to the remainder of the precursor container (12).

7. The integrated showerhead-filtration system (10) for a precursor container (12) having a central axis (14) defined both therethrough according to claim 6, wherein the more than one bores (67) are laid out in a showerhead-style pattern.

8. A precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough, comprising: a lid (74) having an upper surface (76), a first-lower surface (78) opposite the upper surface (76), an inlet port (80) configured to transport carrier gas extending between the upper surface (76) and the first-lower surface (78), a third-annularly-shaped-chamber (82) defined as the volume between the first-lower surface (78), a second-lower surface (84) positioned between the upper surface (76) and the first-lower surface (78), an inner- chamber edge (86) and an outer-chamber edge (88), and an outlet port (90) extending between the upper surface (76) and the second-lower surface (84) configured to convey a mixture of the carrier gas and a precursor material; a bottom (92) having a hollow (94) configured to store the precursor material; and an integrated showerhead-filtration system (10), comprising: an annular-shaped filtration medium (16) having an upper side (18), a lower side (20) opposite the upper side (18), a first-inner-edge (22) defining an inner radius of the annular-shaped filtration medium (16) between the central axis (14) and the first-inner-edge (22), a first-outer-edge (24) defining an outer radius of the annular-shaped filtration medium (16) between the central axis (14) and the first- outer-edge (24), and a first-aperture (25) defined between the upper side (18) and the lower side (20) defined between the central axis (14) and the first-inner-edge a diverter (26) having a top side (28), a bottom side (30) opposite the top side (28), an outer wall (32) extending between the top side (28) and the bottom side (30) having a first-thickness (34) defined between the central axis (14) a second- outer-edge (36) and a second-inner-edge (38), a floor (40) positioned between the top side (28) and bottom side (30) having a second-thickness (42) defined between an upper-floor-wall (44) and a bottom-floor-wall (46), a first-neck (48) extending between the bottom-floor-wall (46) and the top side (28) having a third- thickness (50) defined between the central axis (14) a third-outer-edge (52) and a third-inner-edge (54), a second-aperture (56) defined between the central axis (14) and the third-inner-edge (54) configured to convey a carrier gas toward the interior of the precursor container (12), a first-annularly-shaped-chamber (58) configured to receive the carrier gas through the second-aperture (56) defined as a volume extending between the bottom side (30), the second-inner-edge (38) the bottom-floor-wall (46) and the third-inner-edge (54) of the first-neck (48), and a second-annularly-shaped-chamber (60) configured to receive a mixture of the carrier gas and a precursor material through a port (62) defined as the volume extending between the top side (28), the second inner edge (38), the upper-floor- wall (44) and the third-outer-edge (52); and a showerhead (64) having an upper end (66), a lower end (68) opposite the upper end (66), a bore (67) extending between the upper end (66) and the lower end (68) configured to convey the carrier gas from the second-annularly-shaped-chamber (60) to the remainder of the precursor container (12).

9. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the top side (28) of the diverter (26) is configured to sealingly engage against the lower side (20) of the annularshaped filtration medium (16).

10. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the bottom side (30) of the diverter (26) is configured to sealingly engage against the upper end (66) of the showerhead (64).

11. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 10, further comprising a first-annular-shaped-pliable-seal (70) positioned between the bottom side (30) of the diverter (26) and the upper end (66) of the showerhead (64).

12. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the showerhead (64) is reversibly attached to the diverter (26) with a fastener (72).

13. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the showerhead further comprises more than one bore (67) extending between the upper end (66) and the lower end (68) configured to convey the carrier gas from the second-annularly-shaped- chamber (60) to the remainder of the precursor container (12).

14. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 13, wherein the more than one bores (67) are laid out in a showerhead-style pattern.

15. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the upper side (18) of the annular-shaped filtration medium (16) is configured to fit into a channel (96) on an underside (98) of the lid (74).

16. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 15, further comprising a second-annular-shaped-pliable-seal (100) positioned between the upper side (18) of the annular-shaped filtration medium (16) and the underside (98) of the lid (74), and further comprising a third-annular-shaped-pliable-seal (102) positioned between the upper side (18) of the annular-shaped filtration medium (16) and the underside (98) of the lid (74) that is smaller in diameter than the second-annular-shaped-pliable-seal (100).

17. The precursor container (12) configured to be used in a semiconductor manufacturing process having a central axis (14) defined therethrough according to claim 8, wherein the diverter (26) and the annular-shaped filtration medium (16) is reversibly attached to the lid (74) with a fastener (104).

18. A method of operating a precursor container (12) to create a filtered carrier gas-precursor material mixture to be used in a semiconductor manufacturing process, comprising: moving a carrier gas through an inlet port (80) past a first-aperture (25) of an annularshaped filtration medium (16) and through a first-neck (48) of a diverter (26) into a first- annularly-shaped-chamber (58); moving the gas from the first-annularly-shaped-chamber (58) through a bore (67) of a showerhead (64) and into a hollow (94) of a bottom (92) that is configured to store a precursor material; mixing the carrier gas and the precursor material to create the carrier gas-precursor material mixture; moving the carrier gas-precursor material mixture through a port (62) of the diverter (26) into a second-annularly-shaped-chamber (60) and subsequently through the annularshaped filtration medium (16) to any particles of any precursor material entrained in the carrier gas-precursor material mixture to create the filtered carrier gas-precursor material mixture, and into the third-annularly-shaped-chamber (82) of the lid (74); moving the filtered carrier gas-precursor material mixture thorough the outlet port (90) to be used in a semiconductor manufacturing process.

19. The method of operating a precursor container (12) to create a filtered carrier gas-precursor material mixture to be used in a semiconductor manufacturing process according to claim 18, wherein the lid (74) further comprises: an upper surface (76), a first-lower surface (78) opposite the upper surface (76), an inlet port (80) configured to transport carrier gas extending between the upper surface (76) and the first-lower surface (78), a third-annularly-shaped-chamber (82) defined as the volume between the first-lower surface (78), a second-lower surface (84) positioned between the upper surface (76) and the first-lower surface (78), an inner-chamber edge (86) and an outer-chamber edge (88), and an outlet port (90) extending between the upper surface (76) and the second-lower surface (84) configured to convey a mixture of the carrier gas and a precursor material.

20. The method of operating a precursor container (12) to create a filtered carrier gas-precursor material mixture to be used in a semiconductor manufacturing process according to claim 19, wherein the annular-shaped filtration medium (16) further comprises: an upper side (18), a lower side (20) opposite the upper side (18), a first-inner-edge (22) defining an inner radius of the annular-shaped filtration medium (16) between the central axis (14) and the first-inner-edge (22), a first-outer-edge (24) defining an outer radius of the annular-shaped filtration medium (16) between the central axis (14) and the first- outer-edge (24), and the first-aperture (25) is defined between the upper side (18) and the lower side (20) defined between the central axis (14) and the first-inner-edge (22); wherein the diverter (26) further comprises: a top side (28), a bottom side (30) opposite the top side (28), an outer wall (32) extending between the top side (28) and the bottom side (30) having a first-thickness (34) defined between the central axis (14) a second-outer-edge (36) and a second-inner-edge (38), a floor (40) positioned between the top side (28) and bottom side (30) having a second- thickness (42) defined between an upper-floor-wall (44) and a bottom-floor-wall (46), the first-neck (48) extends between the bottom-floor-wall (46) and the top side (28) having a third-thickness (50) defined between the central axis (14) a third-outer-edge (52) and a third-inner-edge (54), a second-aperture (56) defined between the central axis (14) and the third-inner-edge (54) configured to convey a carrier gas toward the interior of the precursor container (12), the first-annularly-shaped-chamber (58) is configured to receive the carrier gas through the second-aperture (56) defined as a volume extending between the bottom side (30), the second-inner-edge (38) the bottom -floor- wall (46) and the third- inner-edge (54) of the first-neck (48), and the second-annularly-shaped-chamber (60) is configured to receive a mixture of the carrier gas and a precursor material through the port (62) defined as the volume extending between the top side (28), the second inner edge (38), the upper-floor- wall (44) and the third-outer-edge (52); and wherein the showerhead further comprises: an upper end (66), a lower end (68) opposite the upper end (66), the bore (67) extends between the upper end (66) and the lower end (68)and is configured to convey the carrier gas from the second-annularly-shaped-chamber (60) to the remainder of the precursor container (12).