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WO2025261062A1 - Display substrate and display apparatus - Google Patents

Display substrate and display apparatus

Info

Publication number
WO2025261062A1
WO2025261062A1 PCT/CN2025/096293 CN2025096293W WO2025261062A1 WO 2025261062 A1 WO2025261062 A1 WO 2025261062A1 CN 2025096293 W CN2025096293 W CN 2025096293W WO 2025261062 A1 WO2025261062 A1 WO 2025261062A1
Authority
WO
WIPO (PCT)
Prior art keywords
sub
pixel
pixels
light
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/CN2025/096293
Other languages
French (fr)
Chinese (zh)
Inventor
汪锐
胡明
张手强
邱海军
郭建
黄智�
曾超
朱磊
郝学光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Chongqing BOE Display Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Chongqing BOE Display Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Chongqing BOE Display Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Publication of WO2025261062A1 publication Critical patent/WO2025261062A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/352Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels the areas of the RGB subpixels being different
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • G09F9/33Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
    • G09F9/335Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes being organic light emitting diodes [OLED]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/30Devices specially adapted for multicolour light emission
    • H10K59/35Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels
    • H10K59/353Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels characterised by the geometrical arrangement of the RGB subpixels

Definitions

  • This disclosure relates to a display substrate and a display device.
  • LCDs liquid crystal displays
  • FEDs field emission displays
  • ELs electroluminescent displays
  • organic light-emitting diode displays organic light-emitting diode displays
  • OLEDs are self-emissive devices. Unlike traditional light-emitting devices, they do not require a backlight. OLEDs are injection-type light-emitting devices, and their basic structure consists of an organic thin film layer sandwiched between two electrodes (at least one of which is transparent) to form a sandwich structure. Due to their self-emissive nature, OLED displays offer faster response times, superior color purity and brightness, higher contrast, and wider viewing angles.
  • This disclosure provides a display substrate and a display device.
  • the plurality of sub-pixels includes a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels, wherein the area of the light-emitting region of each first sub-pixel and the area of the light-emitting region of each second sub-pixel are not greater than the area of the light-emitting region of each third sub-pixel.
  • the plurality of sub-pixels includes a plurality of sub-pixel groups, each sub-pixel group including at least two first sub-pixels, at least two second sub-pixels, and at least two third sub-pixels.
  • the at least two third sub-pixels are arranged along a first direction, and the light-emitting areas of the at least two third sub-pixels are configured to correspond to the same mask opening.
  • the included angle between the two sides connected by at least one contour angle of the light-emitting areas of the two outermost third sub-pixels located in the first direction, or the included angle between the extensions of the two sides is 100 to 170 degrees.
  • At least two adjacent sub-pixel groups arranged in the first direction include a first sub-pixel group and a second sub-pixel group.
  • the third sub-pixels in the first sub-pixel group and the third sub-pixels in the second sub-pixel group are staggered in a second direction, and the second direction intersects the first direction.
  • the plurality of sub-pixel groups are arranged in an array along the first direction and the second direction, and in each sub-pixel group, the number of the first sub-pixel, the number of the second sub-pixel, and the number of the third sub-pixel are all equal; in the same sub-pixel group, the first sub-pixel and the second sub-pixel are arranged along the first direction, and the first sub-pixel and the third sub-pixel are arranged along the second direction; the third sub-pixel in the first sub-pixel group and the first sub-pixel in the second sub-pixel group are arranged along the first direction.
  • the distance between the light-emitting areas of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group is a first distance
  • the distance between the light-emitting areas of the first sub-pixel and the second sub-pixel located in the first sub-pixel group and the second sub-pixel group is a second distance
  • the first distance is not less than the second distance
  • the included angle between two sides or the included angle between the extensions of at least one of the contour angles of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group respectively is 100 to 170 degrees.
  • the display substrate further includes: a plurality of gate lines, wherein the angle between the extension direction of at least one gate line and the first direction is not greater than 3 degrees.
  • the display substrate further includes: a plurality of gate lines, wherein the extension direction of at least one gate line forms an angle of 30 to 60 degrees with the first direction.
  • the size of the light-emitting area of the first sub-pixel and the light-emitting area of the second sub-pixel in the first direction is smaller than the size of the light-emitting area of the third sub-pixel in the first direction; the first sub-pixel and the third sub-pixel are arranged alternately along the second direction.
  • the light-emitting areas of sub-pixels in two adjacent sub-pixel groups arranged along the second direction are symmetrically distributed with respect to a first dividing line located between the two adjacent sub-pixel groups and extending along the first direction, and at least four third sub-pixels in two adjacent sub-pixel groups arranged along the second direction that are located on both sides of the first dividing line and are adjacent to it are configured to correspond to the same mask opening.
  • the same sub-pixel group includes N third sub-pixels, and the N/2th third sub-pixel arranged along the first direction and the (N/2+1)th third sub-pixel are separated by a second dividing line extending along the second direction, where N is an even number; in the same sub-pixel group, the light-emitting areas of the sub-pixels are symmetrically distributed with respect to the second dividing line.
  • the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and the extension directions of the sides adjacent to the first side in both the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel intersect with the first direction.
  • the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and in the same sub-pixel group, the distance between the first side of the light-emitting area of at least two adjacent third sub-pixels and the center line extending along the first direction in the light-emitting area of the first sub-pixel is different.
  • the extension directions of the edges adjacent to the first edge in the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel both intersect with the extension direction of the first edge.
  • the first side of one of the at least two adjacent third sub-pixels is close to the first sub-pixel and the second sub-pixel in its sub-pixel group, and the first side of the other of the at least two adjacent third sub-pixels is far away from the first sub-pixel and the second sub-pixel in its sub-pixel group.
  • the light-emitting area of the third sub-pixel further includes a second side and a third side connected to each other, the angle between the second side and the side of the light-emitting area of the first sub-pixel adjacent to it is no greater than 5 degrees, the angle between the third side and the side of the light-emitting area of the second sub-pixel adjacent to it is no greater than 5 degrees, and the first side and the second side are located on both sides of the center of the light-emitting area of the third sub-pixel in the second direction.
  • At least some sub-pixels include a light-emitting functional layer, a first electrode, a second electrode, and a pixel circuit.
  • the first electrode is located between the light-emitting functional layer and the substrate and is electrically connected to the pixel circuit.
  • the second electrode is located on the side of the light-emitting functional layer away from the first electrode.
  • the first electrode of the third sub-pixel is symmetrically distributed with respect to the first dividing line.
  • the first electrode of at least one of the first sub-pixel and the second sub-pixel is symmetrically distributed with respect to the first dividing line.
  • the first electrode includes a main electrode and a connecting electrode connected to each other.
  • the connecting electrode does not overlap with the light-emitting area of the sub-pixel.
  • the connecting electrode of the third sub-pixel is located between its main electrode and the main electrode of the second sub-pixel
  • the connecting electrode of the second sub-pixel is located between its main electrode and the main electrode of the first sub-pixel
  • the connecting electrode of the first sub-pixel is located between its main electrode and the main electrode of the third sub-pixel.
  • At least two first sub-pixels and at least two second sub-pixels correspond to the same mask opening.
  • At least two first sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening
  • at least two second sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening.
  • Another embodiment of this disclosure provides a display device including any of the above-described display substrates.
  • Figure 1 is a schematic diagram of a pixel arrangement structure and its metal mask opening.
  • Figure 2 is a schematic diagram of a partial pixel arrangement structure in a display substrate provided according to an example of an embodiment of the present disclosure.
  • Figure 3 is a schematic diagram of the mask used to form the pixel arrangement structure shown in Figure 2.
  • Figure 4 is a schematic diagram of the light-emitting area of the third sub-pixel in another example of the display substrate shown in Figure 2.
  • Figures 5 to 7 show pixel arrangement structures provided according to different examples of embodiments of the present disclosure.
  • Figure 8 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.
  • Figure 9 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 8.
  • Figure 10 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 8.
  • Figure 11 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.
  • Figure 12 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 11.
  • Figure 13 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 11.
  • Figure 14 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.
  • Figure 15 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 14.
  • Figure 16 is a schematic diagram of the equivalent circuit of a pixel circuit.
  • Figures 17A to 17F are schematic diagrams of different film layers in a display substrate.
  • Figure 17G is a structural diagram of the stacked first electrode layer and the fourth conductive pattern layer.
  • Figure 18 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to an embodiment of the present disclosure.
  • Figures 19A and 19B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.
  • Figure 19C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 19A and 19B.
  • Figures 20A and 20B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.
  • Figure 20C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 20A and 20B.
  • Figures 21A and 21B are schematic diagrams of partial layer structures of a display substrate provided according to another example of an embodiment of the present disclosure.
  • Figure 22 is a schematic block diagram of a display device provided according to another embodiment of the present disclosure.
  • the light-emitting mechanism of organic light-emitting diode (OLED) devices can be divided into five steps.
  • the first step is carrier injection: under the action of an electric field, electrons and holes are injected from the cathode and anode into the light-emitting functional layer sandwiched between the two electrodes, respectively.
  • the second step is carrier transport: the injected electrons and holes are injected from the electron transport layer and hole transport layer into the light-emitting layer, respectively.
  • the third step is carrier recombination: electron-hole recombination generates excitons.
  • the fourth step is exciton migration: excitons migrate under the action of an electric field, transfer energy to the light-emitting layer, and excite electrons to transition from the ground state to the excited state.
  • the fifth step is electroluminescence: the energy of the excited state transitions through radiation, generating photons and releasing energy.
  • OLEDs Organic light-emitting diodes
  • subpixels in display devices are formed by depositing organic materials onto an array substrate.
  • the organic material is deposited onto the anode within an opening in the pixel limiting layer (PDL) on the array substrate.
  • the opening in the PDL defines the actual light-emitting area of the subpixel.
  • RGB pixel structures such as Strip RGB pixel structures, where red and green subpixels are arranged in one column and blue subpixels in another
  • the PDL gap is typically reduced to increase the pixel opening area to improve the lifespan of blue subpixels, given their larger light-emitting area.
  • the PDL gap is too small, it can cause color mixing and other defects, resulting in yield loss.
  • FMM fine metal mask
  • an organic light-emitting diode (OLED) display substrate involves fabricating sub-pixels arranged in a matrix on a substrate. These matrix-arranged sub-pixels form a pixel arrangement, such as a pixel arrangement comprising multiple pixel units, each pixel unit including three sub-pixels, such as a blue sub-pixel, a green sub-pixel, and a red sub-pixel. Each blue sub-pixel is fabricated using an opening in a photomask, such as a 1-in-1 arrangement.
  • the area of the light-emitting region of the blue sub-pixel is larger than the areas of the light-emitting regions of the red and green sub-pixels, and the red and green sub-pixels are on the same side, while the blue sub-pixel occupies a separate side.
  • This pixel arrangement has a very low lifetime and aperture ratio, making it difficult to meet the current development trend of the display industry, which demands increasingly higher display resolutions.
  • Figure 1 is a schematic diagram of a pixel arrangement structure and its metal mask opening.
  • the pixel arrangement structure includes a pixel-limited opening 001 corresponding to a red subpixel, a pixel-limited opening 002 corresponding to a green subpixel, and a pixel-limited opening 003 corresponding to a blue subpixel.
  • the emitting area of one red subpixel corresponds to one mask opening 004
  • the emitting area of one green subpixel corresponds to one mask opening 005
  • the emitting area of one blue subpixel corresponds to one mask opening 006.
  • the distances PG1 between pixel-limited openings 001 and 002, PG2 between pixel-limited openings 001 and 003, and PG3 between pixel-limited openings 002 and 003 are approximately equal and can all be referred to as the pixel gap (PDL Gap).
  • PDL Gap pixel gap
  • the minimum distance Rib1 between adjacent mask openings 006 is limited by the size of the mask strip, which is constrained by the mask manufacturing process and cannot be too small; it is generally greater than 25 micrometers. Therefore, Rib1 limits the size of the mask openings.
  • a pixel arrangement that forms the light-emitting areas of two sub-pixels by using the same opening of a photomask, such as forming the light-emitting areas of two blue sub-pixels, such as using a 2B in 1 pixel arrangement, is beneficial to increasing the area of the pixel-defined opening to improve the lifespan of the display substrate.
  • the PDL Gap is 20 micrometers
  • the pixel pitch is 100 micrometers
  • the Rib1 is 25 micrometers
  • the aperture ratio of the red, green, and blue sub-pixels is 1:1.7:2.15.
  • the aperture ratio of the red sub-pixels is 8.04%
  • the aperture ratio of the green sub-pixels is 13.66%
  • the aperture ratio of the blue sub-pixels is 17.28%
  • the total aperture ratio is 38.98%.
  • the above aperture ratio refers to the ratio of the area of the light-emitting area (such as the effective light-emitting area defined by the pixel-defined aperture) to the area of the display area.
  • the display substrate includes a substrate and a plurality of sub-pixels located on the substrate.
  • the plurality of sub-pixels includes a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels, wherein the area of the light-emitting region of each first sub-pixel and the area of the light-emitting region of each second sub-pixel are not greater than the area of the light-emitting region of each third sub-pixel.
  • the plurality of sub-pixels includes a plurality of sub-pixel groups, each sub-pixel group including at least two first sub-pixels, at least two second sub-pixels, and at least two third sub-pixels, wherein the at least two third sub-pixels are arranged along a first direction and the light-emitting regions of the at least two third sub-pixels are configured to correspond to the same mask opening; in at least one sub-pixel group, the included angle between the two sides connecting at least one contour angle of the light-emitting regions of the two outermost third sub-pixels located in the first direction, or the included angle between the extensions of the two sides, is 100 to 170 degrees; at least two adjacent sub-pixel groups arranged in the first direction include a first sub-pixel group and a second sub-pixel group, wherein the third sub-pixels in the first sub-pixel group and the third sub-pixels in the second sub-pixel group are staggered in a second direction, and the second direction intersects the first direction.
  • the mask opening size is increased to increase the pixel aperture ratio, while the mask strip width of the mask is not reduced, thus reducing the manufacturing difficulty of the mask, reducing the risk of color mixing, and improving the image quality. This can meet the requirements of high resolution and long lifespan.
  • Figure 2 is a schematic diagram of a partial pixel arrangement structure in a display substrate according to an example embodiment of the present disclosure.
  • Figure 3 is a schematic diagram of a mask forming the pixel arrangement structure shown in Figure 2.
  • the display substrate includes a substrate 01 and a plurality of sub-pixels 100 located on the substrate 01.
  • the plurality of sub-pixels 100 includes a plurality of first sub-pixels 110, a plurality of second sub-pixels 120, and a plurality of third sub-pixels 130.
  • the area of the light-emitting region of each first sub-pixel 110 and the area of the light-emitting region of each second sub-pixel 120 are not greater than the area of the light-emitting region of each third sub-pixel 130.
  • the first sub-pixels 110, second sub-pixels 120, and third sub-pixels 130 may be sub-pixels 100 that emit different colors of light.
  • the third sub-pixel 130 may be a blue sub-pixel that emits blue light
  • one of the first sub-pixels 110 and second sub-pixels 120 may be a red sub-pixel that emits red light
  • the other of the first sub-pixels 110 and second sub-pixels 120 may be a green sub-pixel that emits green light.
  • the areas of the light-emitting regions of the red and green sub-pixels are both smaller than the area of the light-emitting region of the blue sub-pixel.
  • the first sub-pixel 110 may be a red sub-pixel
  • the second sub-pixel 120 may be a green sub-pixel.
  • the aforementioned light-emitting area can be a region defined by an opening in a pixel-defining layer (PDL as shown in Figure 18), in which a light-emitting layer is formed, and electrodes located on both sides of the light-emitting layer drive the portion of the light-emitting layer located within the light-emitting area to emit light.
  • a pixel-defining layer PDL as shown in Figure 18
  • the plurality of sub-pixels 100 includes a plurality of sub-pixel groups 10, such as the plurality of sub-pixels 100 arranged in an array of sub-pixel groups 10.
  • Each sub-pixel group 10 includes at least two first sub-pixels 110, at least two second sub-pixels 120, and at least two third sub-pixels 130, the at least two third sub-pixels 130 being arranged along a first direction and the light-emitting areas of the at least two third sub-pixels 130 being configured to correspond to the same mask opening.
  • the first direction can be the X direction shown in the figures.
  • FIG. 2 and 3 schematically show that the same sub-pixel group 10 includes two third sub-pixels 130 arranged along the first direction, such as the two third sub-pixels 130 forming a light-emitting layer using the same mask opening 530, such as forming the light-emitting layer of the blue sub-pixel 100 using a 2-bin-1 method, but it is not limited to this.
  • the same sub-pixel group 10 may also include three third sub-pixels 130, four third sub-pixels 130, or more third sub-pixels 130 arranged along the first direction.
  • the mask opening size By setting the light-emitting areas of at least two third sub-pixels to correspond to the same mask opening, so that the at least two third sub-pixels form a light-emitting layer by the same mask opening, it is beneficial to increase the mask opening size to increase the pixel aperture ratio, thereby meeting the requirements of higher pixel density, such as higher pixels per inch (PPI), high resolution, and long lifespan.
  • PPI pixels per inch
  • each first sub-pixel 110 uses a mask opening 510 to form a light-emitting layer
  • each second sub-pixel 120 uses a mask opening 520 to form a light-emitting layer.
  • the included angle ⁇ between the two sides connecting the at least two outermost contour angles of the light-emitting areas of the two outermost third sub-pixels 130 in the first direction, or the included angle ⁇ between the extensions of the two sides is 100 to 170 degrees.
  • the aforementioned contour angle can be referred to as a chamfer, such as a straight chamfer or a rounded chamfer.
  • the contour angle when the above-mentioned contour angle is a straight chamfer, the contour angle is formed by two straight sides, and the size of the contour angle is the included angle ⁇ between the two straight sides.
  • it can be 120 to 150 degrees, or 110 to 140 degrees, or 130 to 160 degrees, or 132 to 137 degrees, or 135 degrees.
  • the embodiments disclosed herein will not be listed one by one.
  • the included angle ⁇ can be any angle between 100 and 170 degrees.
  • the two third subpixels 130 located at the outermost edge in the first direction are these two subpixels 100.
  • the aforementioned "at least one contour angle that is far away from each other" can refer to the angle at which the upper third subpixel 130 is far away from the light-emitting area of the lower third subpixel 130, and/or the angle at which the lower third subpixel 130 is far away from the light-emitting area of the upper third subpixel 130.
  • the light-emitting area of the same third subpixel 130 may include one chamfer, or may include two or more chamfers.
  • the light-emitting area of at least some of the third subpixels 130 in at least some subpixel groups 10 includes at least one chamfer.
  • the light-emitting area of each third subpixel 130 in each subpixel group 10 includes two chamfers.
  • a subpixel group includes at least three third subpixels 130
  • the two third subpixels 130 located at the outermost edge are the uppermost third subpixel 130 and the lowermost third subpixel 130.
  • the light-emitting area of the third subpixel 130 located on the non-edge may include a chamfer or may not include a chamfer.
  • Figure 4 is a schematic diagram of the light-emitting area of the third sub-pixel in another example of the display substrate shown in Figure 2.
  • the outline angle of the light-emitting area of the third sub-pixel 130 can be a rounded chamfer.
  • the included angle ⁇ between the extension lines of the two sides forming the rounded chamfer in the light-emitting area is 100 to 170 degrees, such as 120 to 150 degrees, or 110 to 140 degrees, or 130 to 160 degrees, or 132 to 137 degrees, or 135 degrees.
  • the embodiments disclosed herein will not be listed one by one.
  • the included angle ⁇ can be any angle between 100 and 170 degrees.
  • At least two adjacent sub-pixel groups 10 arranged in the first direction include a first sub-pixel group 11 and a second sub-pixel group 12.
  • the third sub-pixel 130 in the first sub-pixel group 11 and the third sub-pixel 130 in the second sub-pixel group 12 are staggered in the second direction, and the second direction intersects with the first direction.
  • the second direction can be the Y direction shown in the figure.
  • the angle between the first and second directions can be 80 to 100 degrees, such as when the first and second directions are perpendicular.
  • the first and second directions can be interchanged.
  • the sub-pixel group 10 arranged along the first direction can be called a column of sub-pixel groups or a row of sub-pixel groups.
  • the same column of sub-pixel groups or the same row of sub-pixel groups only some of the sub-pixel groups 10 are arranged adjacently, including the first sub-pixel group 11 and the second sub-pixel group 12, or any adjacent sub-pixel groups 10 include the first sub-pixel group 11 and the second sub-pixel group 12, such as the first sub-pixel group 11 and the second sub-pixel group 12 being arranged alternately in the first direction.
  • At least a portion of the orthographic projection of the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 onto a straight line extending along the Y direction does not overlap with the orthographic projection of the light-emitting area of the third sub-pixel 130 in the second sub-pixel group 12 onto the same straight line.
  • a straight line extending along the X direction and passing through the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 does not pass through the light-emitting area of the third sub-pixel 130 in the second sub-pixel group 12.
  • the width Rib of the mask strip between two adjacent mask openings in the mask template used to form the third sub-pixel 130 is such that the direction of the minimum width of the mask strip intersects with the first direction.
  • the mask openings used to form two adjacent third sub-pixels 130 are arranged along the first direction, i.e., as shown in FIG1
  • the mask openings used to form two adjacent third sub-pixels 130 in the display substrate provided in this disclosure are staggered in the second direction.
  • the limiting direction of the minimum width Rib of the mask strip can be set to oblique rather than longitudinal or transverse (such as one of the first direction and the second direction being transverse and the other being longitudinal), which is beneficial to increase the size of Rib.
  • the mask strip width (Rib) of the mask template can be maintained. Maintaining or increasing the mask strip width helps reduce the manufacturing difficulty of the mask, lowers the risk of color mixing, prevents color shift, and improves display quality.
  • the mask strip width (Rib) meets the minimum manufacturing requirements and can even be larger, while also being suitable for mesh stretching.
  • the size of the mask opening 530 used to form the third sub-pixel 130 in the first direction can be increased, thereby further increasing the aperture ratio of the sub-pixel 100.
  • the aperture ratio of the first sub-pixel 110 is 8.49%
  • the aperture ratio of the second sub-pixel 120 is 14.44%
  • the aperture ratio of the third sub-pixel 130 is 18.26%
  • the total aperture ratio is 41.19%.
  • the pixel arrangement structure shown in Figure 2 has an increased aperture ratio of 5.67% compared to the pixel arrangement structure shown in Figure 1.
  • the pixel arrangement structure shown in Figure 2 without changing the pixel pitch and PDL gap, allows for the increase of Rib and the size of the mask opening. This is achieved by setting the contour angle of the mask opening used to form the light-emitting area of the third sub-pixel 130 to a chamfer, such as a straight chamfer or a rounded chamfer, while simultaneously staggering the distribution of mask openings in adjacent rows or columns. This increases the overall aperture ratio of sub-pixel 100, which not only facilitates the realization of high PPI products and improves product lifespan but also reduces the manufacturing difficulty of the mask template.
  • the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2 ⁇ 1.8):(2.3 ⁇ 2.8).
  • the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 ⁇ m and 37.41 ⁇ m, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 ⁇ m and 37.41 ⁇ m, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 ⁇ m and 22.59 ⁇ m, respectively.
  • multiple sub-pixel groups 10 are arranged in an array along a first direction and a second direction.
  • the number of first sub-pixels 110, the number of second sub-pixels 120, and the number of third sub-pixels 130 are all equal.
  • the number of first sub-pixels 110, second sub-pixels 120, and third sub-pixels 130 can all be two, but it is not limited to this; it can also be three or more, depending on product requirements.
  • the first sub-pixel 110 and the second sub-pixel 120 are arranged along a first direction
  • the first sub-pixel 110 and the third sub-pixel 130 are arranged along a second direction.
  • the second sub-pixel 120 and the third sub-pixel 130 are arranged along the second direction.
  • the third sub-pixel 130 in the first sub-pixel group 11 and the first sub-pixel 110 in the second sub-pixel group 12 are arranged along a first direction.
  • the orthographic projection of the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 onto a straight line extending along the Y direction overlaps with the orthographic projection of the light-emitting area of the first sub-pixel 110 in the second sub-pixel group 12 onto the same straight line.
  • the same straight line extending along the X direction passes through the light-emitting areas of the third sub-pixel 130 in the first sub-pixel group 11 and the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 in the second sub-pixel group 12.
  • the dimensions of the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 in the first direction are both smaller than the dimension of the light-emitting area of the third sub-pixel 130 in the first direction; the first sub-pixel 110 and the third sub-pixel 130 are arranged alternately along the second direction.
  • the second sub-pixel 120 and the third sub-pixel 130 are arranged alternately along the second direction.
  • the sum of the dimension of the light-emitting area of the first sub-pixel 110 in the first direction, the dimension of the light-emitting area of the second sub-pixel 120 in the first direction, and the dimension of the interval between them can be greater than the dimension of the light-emitting area of the third sub-pixel 130 in the first direction.
  • the distance between the light-emitting areas of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12 is the first distance D1
  • the distance between the light-emitting areas of the closest first sub-pixel 110 and the second sub-pixel 120 located in the first sub-pixel group 11 and the second sub-pixel group 12 is the second distance D2.
  • the first distance D1 is not less than the second distance D2.
  • the first distance D1 is greater than the second distance D2.
  • the distance between the light-emitting areas refers to the minimum distance between the edges of the two light-emitting areas that are close to each other.
  • the two third sub-pixels 130 that are located in the two sub-pixel groups 10 and are closest to each other refer to the two third sub-pixels 130 that have no other third sub-pixels 130 between them, or even no other sub-pixels 100.
  • the two third sub-pixels 130 can be the bottom third sub-pixel 130 in the first sub-pixel group 11 and the top third sub-pixel 130 in the second sub-pixel group 12.
  • the phrase “the first sub-pixel 110 and the second sub-pixel 120 that are closest to each other” can refer to the two sub-pixels 100 that have no other first sub-pixels 110 and the second sub-pixel 120 between them, or even no other sub-pixels 100.
  • the phrase “the first sub-pixel 110 and the second sub-pixel 120 that are closest to each other” can refer to the first sub-pixel 110 in the first sub-pixel group 11 and the second sub-pixel 120 in the second sub-pixel group 12, or the second sub-pixel 120 in the first sub-pixel group 11 and the first sub-pixel 110 in the second sub-pixel group 12.
  • the mask strip width Rib in the mask used to form the light-emitting layer of the third sub-pixel can meet the minimum process manufacturing requirements, or even be larger, and adapt to mesh stretching.
  • the two contour edges E1 and E2 of the light-emitting areas of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12 are opposite to each other and parallel to each other, which is beneficial to the uniformity of the mask strip width and the stability of the mesh.
  • the included angle between the two sides connecting at least one of the contour angles of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12, or the included angle between the extensions of the two sides is 100 to 170 degrees.
  • the two closest contour angles ⁇ 1 and ⁇ 2 of the two third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12, respectively, are both chamfered.
  • both contour angles ⁇ 1 and ⁇ 2 are between 100 and 170 degrees.
  • the two contour angles ⁇ 1 and ⁇ 2 may not be equal.
  • the difference between the two contour angles ⁇ 1 and ⁇ 2 is no greater than 10 degrees.
  • the two contour angles ⁇ 1 and ⁇ 2 may be equal.
  • the shape of the light-emitting area of the first sub-pixel 110 and the second sub-pixel 120 can both be a standard rectangle or a rounded rectangle, and the shape of the light-emitting area of the third sub-pixel 130 can be a hexagon.
  • the area of the light-emitting region of the first sub-pixel 110 can be larger than the area of the light-emitting region of the second sub-pixel 120, but it is not limited thereto; the area of the light-emitting region of the first sub-pixel 110 can also be smaller than the area of the light-emitting region of the second sub-pixel 120.
  • the distance between the vertex of the chamfer ⁇ of the third sub-pixel 130 or the intersection of the two extended lines forming the chamfer ⁇ and the light-emitting area of the nearest sub-pixel 100 located at the outermost edge of the sub-pixel group 10 is the first sub-distance
  • the distance between the other non-chamfered corners of the third sub-pixel 130 and the light-emitting area of the nearest sub-pixel 100 is the second sub-distance.
  • the first sub-distance is greater than the second sub-distance.
  • the distance between the third sub-pixel 130 and the second sub-pixel 120, which are located in adjacent first sub-pixel groups 11 and 12 respectively, is less than the first distance D1.
  • the distance between the third sub-pixel 130 and the second sub-pixel 120, which are located in adjacent first sub-pixel groups 11 and 12 respectively, is not greater than the second distance D2.
  • Figures 5 to 7 show pixel arrangement structures provided according to different examples of embodiments of the present disclosure.
  • Figure 5 schematically shows a 6-row, 4-column subpixel group 10, with first subpixel groups 11 in rows 1 and 4, and second subpixel groups 12 in rows 2, 3, 5, and 6. Both first subpixel groups 11 and 12 have two third subpixels 130.
  • Figure 5 can also be viewed as including a 4-row, 4-column subpixel group 10, with first subpixel groups 11 in rows 1 and 3, each including two third subpixels 130, and second subpixel groups 12 in rows 2 and 4, each including four third subpixels 130.
  • Figure 6 schematically shows four rows of subpixel groups 10.
  • the first and third rows contain first subpixel groups 11, and the second and fourth rows contain second subpixel groups 12.
  • Both the first and second subpixel groups 11 and 12 include four third subpixels 130.
  • Figure 6 schematically shows that the light-emitting area of each third subpixel 130 in each subpixel group includes a chamfer ⁇ , but this is not a limitation; it is also possible that only the uppermost and lowermost third subpixels 130 in each subpixel group have light-emitting areas with a chamfer ⁇ .
  • the four third subpixels 130 in each subpixel group 10 can form a light-emitting layer using the same mask opening.
  • Figure 7 schematically shows four rows of subpixel groups 10.
  • the first and third rows have second subpixel groups 12, and the second and fourth rows have first subpixel groups 11.
  • Both the first and second subpixel groups 11 and 12 include three third subpixels 130.
  • only the uppermost and lowermost third subpixels 130 have a chamfered ⁇ in their light-emitting areas.
  • the three third subpixels 130 in each subpixel group form a light-emitting layer using the same mask opening.
  • At most two third sub-pixels 130 are adjacent, such as having at most two third sub-pixels 130 between two adjacent first sub-pixels 110.
  • at most two first sub-pixels 110 are adjacent, such as having at most two first sub-pixels 110 between two adjacent third sub-pixels 130.
  • at most two second sub-pixels 120 are adjacent, such as having at most two second sub-pixels 120 between two adjacent third sub-pixels 130.
  • Figure 8 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.
  • Figure 9 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 8.
  • the light-emitting areas of sub-pixels 100 in two adjacent sub-pixel groups 10 arranged along the second direction are symmetrically distributed with respect to the first dividing line LB1 located between the two adjacent sub-pixel groups 10 and extending along the first direction.
  • at least four third sub-pixels 130 located on both sides of and adjacent to the first dividing line LB1 in the two adjacent sub-pixel groups 10 arranged along the second direction are configured to correspond to the same mask opening.
  • the pixel arrangement structure shown in Figure 8 differs from the pixel arrangement structure shown in Figure 2 in that the two adjacent columns of sub-pixel groups 10 arranged along the first direction are mirror images of each other with respect to the first dividing line.
  • the aperture ratio of the first sub-pixel 110 is 9.92%
  • the aperture ratio of the second sub-pixel 120 is 16.86%
  • the aperture ratio of the third sub-pixel 130 is 21.32%
  • the total aperture ratio is 48.09%.
  • the pixel arrangement structure shown in Figure 8 has an increased aperture ratio of 23.37% compared to the pixel arrangement structure shown in Figure 1.
  • the pixel arrangement structure shown in Figure 8 without changing the pixel pitch and PDL gap, allows for the following improvements: by setting the contour angle of the mask opening used to form the light-emitting area of the third sub-pixel 130 to a chamfer, such as a straight chamfer or a rounded chamfer, while simultaneously staggering the distribution of mask openings in adjacent rows or columns, and mirroring the sub-pixels 100 in adjacent sub-pixel groups 10 arranged along the second direction, it is beneficial to increase the Rib and the size of the mask opening, thereby increasing the overall aperture ratio of the sub-pixels 100. This not only facilitates the realization of higher PPI products and improves product lifespan but also further reduces the manufacturing difficulty of the mask template.
  • the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2 ⁇ 1.8):(2.3 ⁇ 2.8).
  • the dimensions of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 ⁇ m and 37.41 ⁇ m, respectively; the dimensions of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 ⁇ m and 37.41 ⁇ m, respectively; and the dimensions of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 ⁇ m and 22.59 ⁇ m, respectively.
  • the first sub-pixel 110 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line.
  • the second sub-pixel 120 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line.
  • the third sub-pixel 130 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line.
  • Figure 8 schematically shows that the contour angles of the light-emitting areas of two adjacent third sub-pixels 130 arranged along the second direction (no other sub-pixels 100 are set between the two adjacent third sub-pixels 130) are chamfered when they are close to each other.
  • the light-emitting areas of the two adjacent third sub-pixels 130 may only have chamfered contour angles when they are far apart from each other, and the contour angles when they are close to each other may be angles less than 100 degrees, such as right angles.
  • the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are close to each other can all be set to less than 100 degrees, such as right angles.
  • the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are located at the outermost edge in both the first and second directions can be set to chamfers of 100 to 170 degrees.
  • Figure 9 schematically shows that the light-emitting layer of each first sub-pixel 110 is formed using a mask opening 510, the light-emitting layer of each second sub-pixel 120 is formed using a mask opening 520, and the light-emitting layers of the four third sub-pixels 130 are formed using a mask opening 530.
  • Figure 10 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 8.
  • At least two first sub-pixels 110 located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening 510
  • at least two second sub-pixels 120 located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening 520.
  • Figure 11 shows a pixel arrangement structure according to another example of an embodiment of the present disclosure.
  • Figure 12 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 11.
  • the light-emitting areas of sub-pixels 100 in two adjacent sub-pixel groups 10 arranged along the second direction are symmetrically distributed with respect to a first dividing line LB1 located between the two adjacent sub-pixel groups 10 and extending along the first direction.
  • At least four third sub-pixels 130 located on both sides of and adjacent to the first dividing line in two adjacent sub-pixel groups 10 arranged along the second direction are configured to correspond to the same mask opening.
  • Each sub-pixel group 10 includes N third sub-pixels 130, and a second dividing line LB2 extending along the second direction is included between the N/2th third sub-pixel 130 and the (N/2+1)th third sub-pixel 130 arranged along the first direction.
  • N is an even number.
  • Figure 11 schematically shows N as 2, but is not limited to this; N can be 4, 6, or other even numbers.
  • the pixel arrangement structure shown in Figure 11 differs from that shown in Figure 8 in that the light-emitting areas of the sub-pixels 100 arranged along the second direction are mirror images of the second dividing line.
  • the light-emitting areas of two adjacent sub-pixel groups 10 arranged along the first direction are symmetrically distributed along the first dividing line and the second dividing line.
  • the aperture ratio of the first sub-pixel 110 is 10.88%
  • the aperture ratio of the second sub-pixel 120 is 18.49%
  • the aperture ratio of the third sub-pixel 130 is 23.39%
  • the total aperture ratio is 52.75%.
  • the pixel arrangement structure shown in Figure 11 has an aperture ratio that is 35.33% higher than that shown in Figure 1.
  • the pixel arrangement structure shown in Figure 11 has a smaller mask strip width Rib for the mask used to form the light-emitting layer of the third sub-pixel 130, which is beneficial for increasing the aperture ratio of the sub-pixel 100 without affecting the mask fabrication process.
  • the pixel arrangement structure shown in Figure 11 Compared to the pixel arrangement structure shown in Figure 1, where the same mask opening is used to form the light-emitting layers of two blue sub-pixels, the pixel arrangement structure shown in Figure 11, without changing the pixel pitch and PDL gap, achieves a different result.
  • a chamfer such as a straight chamfer or a rounded chamfer
  • the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2 ⁇ 1.8):(2.3 ⁇ 2.8).
  • the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 ⁇ m and 37.41 ⁇ m, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 ⁇ m and 37.41 ⁇ m, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 ⁇ m and 22.59 ⁇ m, respectively.
  • the light-emitting area of the first sub-pixel 110 arranged along the first direction is symmetrically distributed with respect to the second dividing line
  • the light-emitting area of the second sub-pixel 120 arranged along the first direction is symmetrically distributed with respect to the second dividing line
  • the light-emitting area of the third sub-pixel 130 arranged along the first direction is symmetrically distributed with respect to the second dividing line.
  • Figure 11 schematically shows that the contour angles of the light-emitting areas of two adjacent third sub-pixels 130 arranged along the second direction (no other sub-pixels 100 are set between the two adjacent third sub-pixels 130) are chamfered when they are close to each other.
  • the light-emitting areas of the two adjacent third sub-pixels 130 may only have chamfered contour angles when they are far apart from each other, and the contour angles when they are close to each other may be angles less than 100 degrees, such as right angles.
  • the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are close to each other can all be set to less than 100 degrees, such as right angles.
  • the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are located at the outermost edge in both the first and second directions can be set to chamfers of 100 to 170 degrees.
  • Figure 12 schematically shows that the light-emitting layer of each first sub-pixel 110 is formed using a mask opening 510, the light-emitting layer of each second sub-pixel 120 is formed using a mask opening 520, and the light-emitting layers of the four third sub-pixels 130 are formed using a mask opening 530.
  • Figure 13 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 11.
  • At least two first sub-pixels 110 and at least two second sub-pixels 120 correspond to the same mask opening.
  • two first sub-pixels 110 correspond to the same mask opening or two second sub-pixels 120 correspond to the same mask opening.
  • first sub-pixels 110 correspond to the same mask opening
  • two second sub-pixels 120 correspond to the same mask opening
  • two first sub-pixels 110 correspond to the same mask opening
  • four second sub-pixels 120 correspond to the same mask opening.
  • two first sub-pixels 110 or two second sub-pixels 120 correspond to the same mask opening
  • four third sub-pixels 130 correspond to the same mask opening.
  • two first sub-pixels 110 correspond to the same mask opening, and four second sub-pixels 120 correspond to the same mask opening; or two second sub-pixels 120 correspond to the same mask opening, and four first sub-pixels 110 correspond to the same mask opening.
  • Figure 14 shows a pixel arrangement structure according to another example of an embodiment of the present disclosure.
  • Figure 15 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 14.
  • the main difference between the pixel arrangement structure shown in Figure 14 and the pixel arrangement structure shown in Figure 2 is that the shape of the light-emitting area of each sub-pixel 100 is different.
  • the light-emitting area of the third sub-pixel 130 includes at least one first side 1011 extending along a first direction, and the extension directions of the sides 1021 and 1031 adjacent to the first side 1011 in the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 both intersect with the first direction.
  • Figure 14 schematically shows that the light-emitting area of the third sub-pixel 130 includes one first side 1011 extending along the first direction, but it is not limited to this.
  • the light-emitting area of the third sub-pixel 130 may also include two or three first sides 1011 extending along the first direction, etc., which can be set according to product requirements.
  • the extension directions of the edge 1021 in the light-emitting area of the first sub-pixel 110 that is adjacent to the first edge 1011 and the edge 1031 in the light-emitting area of the second sub-pixel 120 that is adjacent to the first edge 1011 both intersect with the extension direction of the first edge.
  • spacers can be provided between the first edge 1011 of the light-emitting area of the third sub-pixel 130 and the edge 1021 of the light-emitting area of the adjacent first sub-pixel 110 and the edge 1031 of the light-emitting area of the second sub-pixel 120 to support the fine metal mask.
  • the light-emitting area of the third sub-pixel 130 includes at least one first side 1011 extending along the first direction.
  • the distance between the first side 1011 of the light-emitting area of at least two adjacent third sub-pixels 130 and the center line extending along the first direction in the light-emitting area of the first sub-pixel 110 is different.
  • the same sub-pixel group 10 includes two third sub-pixels 130.
  • the straight line containing the first side 1011 in the light-emitting area of one third sub-pixel 130 does not pass through the first side 1011 in the light-emitting area of the other third sub-pixel 130.
  • the embodiments of this disclosure are not limited to the same sub-pixel group 10 including two third sub-pixels 130.
  • it may include three or more third sub-pixels 130, wherein the first side 1011 of two adjacent third sub-pixels 130 can be set in the manner described above.
  • the first side 1011 of one of at least two adjacent third sub-pixels 130 is close to the first sub-pixel 110 and the second sub-pixel 120 in its sub-pixel group 10, while the first side 1011 of the other of the aforementioned at least two adjacent third sub-pixels 130 is far away from the first sub-pixel 110 and the second sub-pixel 120 in its sub-pixel group 10.
  • the light-emitting area of the third sub-pixel 130 also includes a second side 1012 and a third side 1013 connected to each other.
  • the angle between the second side 1012 and the edge of the light-emitting area of the first sub-pixel 110 adjacent to it is no greater than 5 degrees
  • the angle between the third side 1013 and the edge of the light-emitting area of the second sub-pixel 120 adjacent to it is no greater than 5 degrees.
  • the first side 1011 and the second side 1012 are located on both sides of the center of the light-emitting area of the third sub-pixel 130 in the second direction.
  • the second side 1012 of the light-emitting area of the third sub-pixel 130 is parallel to the side of the light-emitting area of the first sub-pixel 110 that is adjacent to it, and the third side 1013 of the light-emitting area of the third sub-pixel 130 is parallel to the side of the light-emitting area of the second sub-pixel 120 that is adjacent to it.
  • the light-emitting area of the third sub-pixel 130 also includes a fourth side 1014 and a fifth side 1015 connected to both ends of the first side 1011, respectively.
  • the angle between the fourth side 1014 and the edge of the light-emitting area of the adjacent first sub-pixel 110 is no greater than 5 degrees
  • the angle between the fifth side 1015 and the edge of the light-emitting area of the adjacent second sub-pixel 120 is no greater than 5 degrees.
  • the fourth side 1014 is parallel to the edge of the light-emitting area of the adjacent first sub-pixel 110
  • the fifth side 1015 is parallel to the edge of the light-emitting area of the adjacent second sub-pixel 120.
  • the light-emitting layers of the two third sub-pixels 130 are formed by the same mask opening 530
  • the light-emitting layers of the two first sub-pixels 110 are formed by two mask openings 510
  • the light-emitting layers of the two second sub-pixels 120 are formed by two mask openings 520.
  • the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2 ⁇ 1.8):(2.3 ⁇ 2.8).
  • the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 53.81 micrometers and 50 micrometers, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 60 micrometers and 53.81 micrometers, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 137.58 micrometers and 91.96 micrometers, respectively.
  • Figure 14 schematically shows the same pixel arrangement as that shown in Figure 2, but it is not limited to this.
  • the pixel arrangement shown in Figure 14 can also adopt the pixel arrangement shown in Figures 5 to 7, Figure 8 or Figure 11 to further increase the aperture ratio and improve the product life.
  • Figure 16 is an equivalent circuit diagram of a pixel circuit.
  • the pixel circuit may include eight transistors (first transistor T1 to eighth transistor T8) and one storage capacitor C.
  • the pixel circuit is connected to nine signal lines (first scan signal line S1, second scan signal line S2, third scan signal line S3, light emission signal line EM, first initial signal line INIT1, second initial signal line INIT2, third initial signal line INIT3, data signal line DATA, and first power supply line VDD).
  • a pixel circuit may include a first node N1, a second node N2, a third node N3, and a fourth node N4.
  • the first node N1 is connected to the second terminal of the first transistor T1, the first terminal of the second transistor T2, the gate electrode of the third transistor T3, and the first terminal of the storage capacitor C, respectively;
  • the second node N2 is connected to the first terminal of the third transistor T3, the second terminal of the fourth transistor T4, the second terminal of the fifth transistor T5, and the second terminal of the eighth transistor T8, respectively;
  • the third node N3 is connected to the second terminal of the second transistor T2, the second terminal of the third transistor T3, and the first terminal of the sixth transistor T6, respectively; and the fourth node N4 is connected to the second terminal of the sixth transistor T6 and the second terminal of the seventh transistor T7, respectively.
  • the first end of the storage capacitor C is connected to the first node N1, and the second end of the storage capacitor C is connected to the first power line VDD.
  • the first transistor T1 can be called the first initialization transistor.
  • the gate electrode of the first transistor T1 is connected to the third scan signal line S3, the first electrode of the first transistor T1 is connected to the first initial signal line INIT1, and the second electrode of the first transistor T1 is connected to the first node N1.
  • the second transistor T2 can be called a compensation transistor.
  • the gate electrode of the second transistor T2 is connected to the first scan signal line S1, the first electrode of the second transistor T2 is connected to the first node N1, and the second electrode of the second transistor T2 is connected to the third node N3.
  • the third transistor T3 can be called the driving transistor.
  • the gate electrode of the third transistor T3 is connected to the first node N1
  • the first electrode of the third transistor T3 is connected to the second node N2
  • the second electrode of the third transistor T3 is connected to the third node N3.
  • the fourth transistor T4 can be called a data writing transistor.
  • the gate electrode of the fourth transistor T4 is connected to the first scan signal line S1, the first electrode of the fourth transistor T4 is connected to the data signal line DATA, and the second electrode of the fourth transistor T4 is connected to the second node N2.
  • the fifth transistor T5 can be called the first light-emitting control transistor.
  • the gate electrode of the fifth transistor T5 is connected to the light-emitting signal line EM, the first electrode of the fifth transistor T5 is connected to the first power supply line VDD, and the second electrode of the fifth transistor T5 is connected to the second node N2.
  • the sixth transistor T6 can be called the second light-emitting control transistor.
  • the gate electrode of the sixth transistor T6 is connected to the light-emitting signal line EM.
  • the first electrode of the sixth transistor T6 is connected to the third node N3.
  • the second electrode of the sixth transistor T6 is connected to the fourth node N4.
  • the seventh transistor T7 can be called the second initialization transistor.
  • the gate electrode of the seventh transistor T7 is connected to the second scan signal line S2
  • the first electrode of the seventh transistor T7 is connected to the second initial signal line INIT2
  • the second electrode of the seventh transistor T7 is connected to the fourth node N4.
  • the eighth transistor T8 can be called the third initialization transistor.
  • the gate electrode of the eighth transistor T8 is connected to the second scan signal line S2, the first electrode of the eighth transistor T8 is connected to the third initial signal line INIT3, and the second electrode of the eighth transistor T8 is connected to the second node N2.
  • the first electrode of the light-emitting device EL is connected to the fourth node N4, and the second electrode of the light-emitting device EL is connected to the second power line VSS.
  • the light-emitting device EL can be an OLED, including a stacked first electrode (anode), an organic light-emitting layer, and a second electrode (cathode), or it can be a QLED, including a stacked first electrode (anode), a quantum dot light-emitting layer, and a second electrode (cathode).
  • the signal of the first power line VDD is a continuously supplied high-level signal
  • the signal of the second power line VSS is a continuously supplied low-level signal
  • transistors T1 through T8 can be either P-type or N-type transistors. Using the same type of transistor in the pixel circuit simplifies the manufacturing process, reduces the complexity of the display panel manufacturing, and improves product yield. In some possible implementations, transistors T1 through T8 may include both P-type and N-type transistors.
  • transistors T1 through T8 can be low-temperature polycrystalline silicon (LTPS) transistors, oxide transistors, or a combination of both.
  • the active layer of the LTPS transistor is made of LTPS, while the active layer of the oxide transistor is made of oxide.
  • LTPS transistors offer advantages such as high mobility and fast charging, while oxide transistors offer advantages such as low leakage current. Integrating LTPS and oxide transistors onto a single display substrate forms a low-temperature polycrystalline oxide (LTPO) display substrate. This leverages the advantages of both to achieve low-frequency driving, thereby reducing power consumption and improving display quality.
  • LTPO low-temperature polycrystalline oxide
  • Figures 17A to 17F are schematic diagrams of different film layers in a display substrate.
  • the semiconductor layer includes the active layers of the first transistor T1 to the eighth transistor T8 and the first initial signal line 041.
  • the active layers of the first transistor T1 to the seventh transistor T7 and the first initial signal line 041 are interconnected as a single structure, while the active layer of the eighth transistor T8 can be disposed separately.
  • the circled positions of the first transistor T1 to the eighth transistor T8 in Figure 17A indicate the positions where the semiconductor layer and the gate metal layer are stacked.
  • the first conductive pattern layer includes a first gate electrode 021, a second gate electrode 022, a fourth gate electrode 024, a second scan signal line 032, a light emission signal line 034, and a first electrode 081 of a storage capacitor.
  • the first conductive pattern layer is located on the side of the semiconductor layer away from the substrate, and an insulating layer is disposed between the first conductive pattern layer and the semiconductor layer.
  • the orthographic projection of the first electrode 081 on the substrate at least partially overlaps with the orthographic projection of the active layer of the third transistor T3 on the substrate.
  • the first electrode 081 can simultaneously serve as an electrode of a storage capacitor and a gate electrode of the third transistor T3.
  • the orthographic projection of the first gate electrode 021 on the substrate at least partially overlaps with the orthographic projection of the active layer of the first transistor on the substrate, and the region where the first gate electrode 021 overlaps with the active layer of the first transistor can serve as the gate electrode of the first transistor T1 in a dual-gate structure.
  • the first gate electrode 21 is configured to be connected to a subsequently formed third scan signal line.
  • the orthographic projection of the second gate electrode 022 on the substrate at least partially overlaps with the orthographic projection of the active layer of the second transistor on the substrate.
  • the region where the second gate electrode 022 overlaps with the active layer of the second transistor can serve as the gate electrode of the second transistor T2 with a dual-gate structure.
  • the second gate electrode 022 is configured to be connected to a subsequently formed first scan signal line.
  • the orthographic projection of the fourth gate electrode 024 on the substrate at least partially overlaps with the orthographic projection of the active layer of the fourth transistor on the substrate.
  • the region where the fourth gate electrode 024 overlaps with the active layer of the fourth transistor can serve as the gate electrode of the fourth transistor T4.
  • the fourth gate electrode 024 is configured to be connected to a subsequently formed first scan signal line.
  • the region where the second scan signal line 032 overlaps with the active layer of the seventh transistor can be used as the gate electrode of the seventh transistor T7
  • the region where the second scan signal line 032 overlaps with the active layer of the eighth transistor can be used as the gate electrode of the eighth transistor T8.
  • the light-emitting signal line 034 can be located between the first electrode plate 081 and the second scan signal line 032.
  • the area where the light-emitting signal line 034 overlaps with the active layer of the fifth transistor can be used as the gate electrode of the fifth transistor T5.
  • the area where the light-emitting signal line 034 overlaps with the active layer of the sixth transistor can be used as the gate electrode of the sixth transistor T6.
  • the second conductive pattern layer includes a second electrode 082 for a storage capacitor and a shielding electrode 035.
  • the second conductive pattern layer is located on the side of the first conductive pattern layer away from the semiconductor layer, and an insulating layer is disposed between the second conductive pattern layer and the first conductive pattern layer.
  • the orthographic projection of the second electrode plate 082 on the substrate at least partially overlaps with the orthographic projection of the first electrode plate 081 on the substrate.
  • the second electrode plate 082 can serve as another electrode plate of a storage capacitor, and the first electrode plate 081 and the second electrode plate 082 constitute the storage capacitor of the pixel circuit.
  • the second electrode plate 082 can be provided with a board-level connecting strip 083. Since the second electrode plate 082 in each circuit unit is connected to the subsequently formed first power line, by connecting the second electrode plates 082 of adjacent circuit units to each other, the second electrode plate 082 and the board-level connecting strip 083 can be multiplexed as power signal lines. This ensures that multiple second electrode plates in a unit row have the same potential, which is beneficial to improving the uniformity of the panel, avoiding display defects in the display substrate, and ensuring the display effect of the display substrate.
  • the second electrode plate 082 is provided with an opening 084, the opening 084 exposes the insulating layer covering the first electrode plate 081, and the orthographic projection of the first electrode plate 081 on the substrate includes the orthographic projection of the opening 084 on the substrate.
  • the opening 084 is configured to accommodate a via formed subsequently. The via is located in the opening 084 and exposes the first electrode plate 081, so that the connecting electrode 312 formed subsequently is connected to the first electrode plate 081.
  • the orthographic projection of the shielding electrode 035 on the substrate at least partially overlaps with the orthographic projection of the active layer (the node between the two gate electrodes) of the second transistor T2 on the substrate.
  • the shielding electrode 035 is configured to shield the effects of data voltage transitions on the first transistor T1 and the second transistor T2, preventing data voltage transitions from affecting the normal operation of the pixel circuit and improving the display effect.
  • the third conductive pattern layer includes a first scan signal line 031, a third scan signal line 033, a second initial signal line 042, a third initial signal line 043, a power connection line 044, an auxiliary scan signal line 045, a first connecting electrode 051, a second connecting electrode 052, a third connecting electrode 053, a fourth connecting electrode 054, and a fifth connecting electrode 055.
  • the third conductive pattern layer is located on the side of the second conductive pattern layer away from the first conductive pattern layer, and an insulating layer is provided between the third conductive pattern layer and the second conductive pattern layer.
  • the first scan signal line 031 is connected to the second gate electrode 022 (also the fourth gate electrode 024) in each circuit unit through a via in each circuit unit, so that the first scan signal line 031 writes the first scan signal into the gate electrode of the second transistor T2 and the gate electrode of the fourth transistor T4 respectively.
  • the third scan signal line 033 can be located on the side of the first scan signal line 031 away from the second electrode plate 082.
  • the third scan signal line 033 is connected to the first gate electrode 021 in each circuit unit through a via in each circuit unit, thereby realizing that the third scan signal line 033 writes the third scan signal to the gate electrode of the first transistor T1.
  • the second initial signal line 042 can be located on one side of the second electrode plate 082.
  • the second initial signal line 042 is connected to the first region of the active layer of the seventh transistor in each circuit unit through a via in each circuit unit, thereby realizing that the second initial signal line 042 writes the second initial signal into the first electrode of the seventh transistor T7.
  • the third initial signal line 043 can be located on the side of the second initial signal line 042 away from the second electrode plate 082.
  • the third initial signal line 043 is connected to the first region of the active layer of the eighth transistor in each circuit unit through a via in each circuit unit, thereby realizing that the third initial signal line 043 writes the third initial signal into the first electrode of the eighth transistor.
  • the power connection line 044 can be located between the first scan signal line 031 and the light emission signal line 034.
  • the orthographic projection of the power connection line 044 on the substrate at least partially overlaps with the orthographic projection of the second electrode plate 082 on the substrate.
  • the power connection line 044 is connected to the second electrode plate 082 in each circuit unit through a via in each circuit unit. Since the power connection line 044 is configured to connect to the subsequently formed first power line, the first power line writes the first power signal into the second electrode plate 082 of the storage capacitor.
  • the orthographic projection of the auxiliary scanning signal line 045 on the substrate and the orthographic projection of the second scanning signal line 032 on the substrate at least partially overlap.
  • the auxiliary scanning signal line 045 is connected to the second scanning connection block through a via, and then connected to the second scanning signal line 032. Therefore, the second scanning signal line 032 and the auxiliary scanning signal line 045 constitute a double-layer structure of scanning signal lines, which can effectively reduce the resistance of the scanning signal lines and reduce the voltage drop of the scanning signal.
  • the first end of the first connecting electrode 051 is connected to the second region of the active layer of the first transistor (which is also the first region of the second active layer) through a via, and the second end of the first connecting electrode 051 is connected to the first electrode plate 081 through a via.
  • the first electrode plate 081 also serves as the gate electrode of the third transistor T3
  • the first connecting electrode 051 makes the second electrode of the first transistor T1, the first electrode of the second transistor T2, the gate electrode of the third transistor T3, and the first electrode plate 081 have the same potential, forming the first node N1 of the pixel circuit.
  • the first end of the second connection electrode 052 is connected to the first region of the active layer of the third transistor (which is also the second region of the active layer of the fourth transistor and the second region of the active layer of the fifth transistor) through a via, and the second end of the second connection electrode 052 is connected to the second region of the active layer of the eighth transistor through a via.
  • the second connection electrode 052 makes the first electrode of the third transistor T3, the second electrode of the fourth transistor T4, the second electrode of the fifth transistor T5, and the second electrode of the eighth transistor T8 have the same potential, forming the second node N2 of the pixel circuit.
  • the third connection electrode 053 is configured to connect to a subsequently formed data signal line.
  • the third connection electrode 053 can be referred to as a data connection electrode.
  • the fourth conductive pattern layer includes a data line 061, an anode connection electrode 312062, and a first power line 071.
  • the fourth conductive pattern layer is located on the side of the third conductive pattern layer away from the second conductive pattern layer, and an insulating layer is provided between the fourth conductive pattern layer and the third conductive pattern layer.
  • data line 061 is connected to the third connection electrode 053, which serves as a data connection electrode, via a via. Since the third connection electrode 053 is connected to the first region of the active layer of the fourth transistor, data line 061 can write data signals to the first electrode of the fourth transistor T4.
  • the anode connection electrode 062 is configured to be connected to the subsequently formed anode, that is, the anode connection electrode 062 is electrically connected to the first electrode 310 of the sub-pixel 100.
  • the first power line 071 is electrically connected to the power connection line 044 to form a mesh-like interconnected structure on the display substrate for transmitting the first power signal.
  • This not only effectively reduces the resistance of the first power line 071 and reduces the voltage drop of the first power signal, but also effectively improves the uniformity of the first power signal in the display substrate, thereby improving display uniformity and enhancing display quality.
  • the first electrode layer includes the anode of each sub-pixel 100, such as the first electrode 310 of the first sub-pixel 110, the second electrode 320 of the second sub-pixel 120, and the first electrode 310 of the third sub-pixel 130.
  • the first electrode 310 layer is located on the side of the fourth conductive pattern layer away from the second conductive pattern layer, and an insulating layer is provided between the first electrode 310 layer and the fourth conductive pattern layer.
  • the first electrode 310 is electrically connected to the anode connection electrode 312 in the fourth conductive layer.
  • the arrangement pattern of the sub-pixels 100 shown in Figure 17F can be the same as the arrangement pattern of the sub-pixels 100 shown in Figures 2 to 6.
  • Figure 17G is a structural diagram showing the stacking of the first electrode layer and the fourth conductive pattern layer.
  • Figure 18 is a partial cross-sectional structural diagram of a display substrate provided according to an embodiment of the present disclosure.
  • At least a portion of the sub-pixel 100 includes a light-emitting functional layer 330, a first electrode 310, a second electrode 320, and a pixel circuit.
  • the first electrode 310 is located between the light-emitting functional layer 330 and the substrate 01 and is electrically connected to the pixel circuit.
  • the second electrode 320 is located on the side of the light-emitting functional layer 330 away from the first electrode 310.
  • the pixel circuit can be the pixel circuit shown in FIG16 to FIG17G.
  • the light-emitting functional layer 330 may include a light-emitting layer and functional layers, such as a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).
  • HIL hole injection layer
  • HTL hole transport layer
  • ETL electron transport layer
  • EIL electron injection layer
  • the first electrode 310 may be an anode
  • the second electrode 320 may be a cathode.
  • the cathode may be formed of a material with high conductivity and low work function; for example, the cathode may be made of a metallic material.
  • the anode may be formed of a transparent conductive material with a high work function.
  • Figure 18 does not show the specific film layer between the anode connection electrode 062 and the substrate 01, but uses film layer 006 for general illustration.
  • Film layer 006 includes the aforementioned semiconductor layer, first conductive pattern layer, second conductive pattern layer, third conductive pattern layer, and insulating layer between adjacent layers.
  • a planarization layer PLN is provided between the fourth conductive pattern layer and the first electrode 310.
  • other film layers (not shown), such as encapsulation layers, are also provided on the side of the second electrode 310 away from the substrate 01.
  • the first electrode 310 includes a main electrode 311 and a connecting electrode 312 connected to each other.
  • the connecting electrode 312 does not overlap with the light-emitting area of the sub-pixel 100.
  • the main electrode 311 overlaps with the light-emitting area and has a shape substantially the same as the light-emitting area, while the connecting electrode 312 is used for electrical connection to the pixel circuit.
  • the main electrode 311 and the connecting electrode 312 are integrally formed.
  • the main electrode 311 of the first sub-pixel 110 and the second sub-pixel 120 is quadrilateral in shape, such as a rectangle, while the main electrode 311 of the third sub-pixel 130 is hexagonal in shape.
  • the connecting electrode 312 of each sub-pixel 100 is quadrilateral in shape.
  • the display substrate includes multiple data lines 061, and the angle between the extension direction of at least one data line 061 and a first direction, such as the X direction, is 87 to 93 degrees.
  • the angle between each data line 061 and the first direction is 87 to 93 degrees.
  • the angle between each data line 061 and the first direction is 89 to 91 degrees.
  • the angle between each data line 061 and the first direction is 90 degrees, that is, the data line 061 is perpendicular to the first direction.
  • gate line 031 i.e., the first scan signal line 031
  • the angle between the extension direction of gate line 031 and the first direction is not greater than 2 degrees.
  • the angle between the extension direction of gate line 031 and the first direction is not greater than 1 degree.
  • the extension direction of gate line 031 is parallel to the first direction.
  • the connecting electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120
  • the connecting electrode 312 of the second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110
  • the connecting electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130
  • the distance between the connecting electrode 312 of the second sub-pixel 120 and the main electrode 311 of the third sub-pixel 130 is greater than the size of the main electrode 311 of the second sub-pixel 120 in the second direction.
  • the first electrode 310 of the third sub-pixel 130 located in the same sub-pixel group 10 has a different shape.
  • the first electrode 310 of each first sub-pixel 110 has the same shape.
  • the first electrode 310 of each second sub-pixel 120 has the same shape.
  • the edge of the main electrode 311 of the third sub-pixel 130 in the first sub-pixel group 11 that is far from the connecting electrode 312 and extends along the X direction is the first electrode edge E01.
  • the edge of the main electrode 311 of the first sub-pixel 110 in the second sub-pixel group 12 that is far from the connecting electrode 312 and extends along the X direction is the second electrode edge E02.
  • the edge of the main electrode 311 of the second sub-pixel 120 in the second sub-pixel group 12 that is far from the connecting electrode 312 and extends along the X direction is the third electrode edge E03.
  • the first electrode edge E01, the second electrode edge E02, and the third electrode edge E03 are located on the same straight line.
  • the edge of the main electrode 311 of the third sub-pixel 130 extending away from the connecting electrode 312 and along the X direction is the fourth electrode edge E04; in the first sub-pixel group 11, the edge of the main electrode 311 of the first sub-pixel 110 extending away from the connecting electrode 312 and along the X direction is the fifth electrode edge E05; and in the first sub-pixel group 11, the edge of the main electrode 311 of the second sub-pixel 120 extending close to the connecting electrode 312 and along the X direction is the sixth electrode edge E06.
  • the fourth electrode edge E04, the fifth electrode edge E05, and the sixth electrode edge E06 are located on the same straight line.
  • the length of the anode connection electrode 062 connected to the first electrode 310 of different first sub-pixels 110 can be the same or different.
  • the length of the anode connection electrode 062 connected to the first electrode 310 of different second sub-pixels 120 can be the same or different.
  • the length of the anode connection electrode 062 connected to the first electrode 310 of different third sub-pixels 130 can be the same or different.
  • the length and position of the anode connection electrode 062 are jointly determined by the positions of the first electrode 310 of the sub-pixel 100 and the transistor.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.
  • Figures 19A and 19B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.
  • Figure 19C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 19A and 19B.
  • the structural layers preceding the fourth conductive pattern layer in the display substrate shown in Figures 19A to 19C may have the same features as the corresponding structural layers shown in Figures 17A to 17G, and will not be described again here.
  • Figure 19B and Figure 17F lie in their pixel arrangement structure.
  • the difference between the fourth conductive pattern layer shown in Figure 19A and the fourth conductive pattern layer shown in Figure 17E lies in the length and shape of the anode connecting electrode.
  • the length of the anode connecting electrode is related to the pixel arrangement structure.
  • the arrangement pattern of sub-pixels 100 shown in Figure 19B can be the same as that shown in Figure 8.
  • the first electrode 310 of the second sub-pixel 120 located in the same sub-pixel group 10 has the same shape.
  • the first electrode 310 of the second sub-pixel 120 located in the first sub-pixel group 11 has a different shape than the first electrode 310 of the second sub-pixel 120 located in the second sub-pixel group 12.
  • the first electrode 310 of the first sub-pixel 110 located in the same sub-pixel group 10 has the same shape.
  • the first electrode 310 of the first sub-pixel 110 located in different sub-pixel groups 10 has the same shape.
  • the first electrode 310 of the third sub-pixel 130 located in the same sub-pixel group 10 has a different shape.
  • connection electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120, the connection electrode 312 of the second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110, and the connection electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130.
  • the first electrode 310 of the third sub-pixel 130 is symmetrically distributed with respect to the first dividing line LB1.
  • the first electrode 310 of at least one of the first sub-pixel 110 and the second sub-pixel 120 is symmetrically distributed with respect to the first dividing line LB1.
  • the first electrode 310 of the first sub-pixel 110 is symmetrically distributed with respect to the first dividing line LB1.
  • connection electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120, and the connection electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12.
  • the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.
  • Figures 20A and 20B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.
  • Figure 20C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 20A and 20B.
  • the structural layers preceding the fourth conductive pattern layer in the display substrate shown in Figures 20A to 20C may have the same features as the corresponding structural layers shown in Figures 17A to 17G, and will not be described again here.
  • the difference between Figure 20B and Figure 17F lies in their pixel arrangement structure.
  • the difference between the fourth conductive pattern layer shown in Figure 20A and the fourth conductive pattern layer shown in Figure 17E lies in the length and shape of the anode connecting electrode.
  • the length of the anode connecting electrode 062 is related to the pixel arrangement structure.
  • the arrangement pattern of sub-pixels 100 shown in Figure 20B can be the same as that of sub-pixels 100 shown in Figure 11.
  • the first electrodes 310 of the four third sub-pixels 130 are symmetrically distributed with respect to the first dividing line LB1
  • the first electrodes 310 of the four first sub-pixels 110 are symmetrically distributed with respect to the first dividing line LB1.
  • the distance between the connecting electrodes 312 of two third sub-pixels 130 is smaller than the dimension of the main electrode 311 of the third sub-pixel 130 in the first direction.
  • the connecting electrode 312 of one second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110, and the connecting electrode 312 of another second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130.
  • two first sub-pixels 110 are located between two second sub-pixels 120, and the two connecting electrodes 312 of the two third sub-pixels 130 are provided between the two connecting electrodes 312 of the first sub-pixels 110 and the two connecting electrodes 312 of the second sub-pixels 120; in the second sub-pixel group 12, two second sub-pixels 120 are located between two first sub-pixels 110, and the two connecting electrodes 312 of the two third sub-pixels 130 are located between the two connecting electrodes 312 of the two first sub-pixels 110.
  • the shape of the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the shape of the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.
  • the length of the anode connecting electrode connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12.
  • the length of the anode connecting electrode connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12.
  • the length of the anode connecting electrode connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.
  • the shapes of the anode connection electrodes connected to the first electrodes 310 of different second sub-pixels 120 are different in the same sub-pixel group.
  • Figures 21A and 21B are schematic diagrams of partial layer structures of a display substrate provided according to another example of an embodiment of the present disclosure.
  • Figure 21A is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer.
  • Figure 21B is a stack-up diagram of the third conductive pattern layer and the first electrode layer.
  • the display substrate includes multiple gate lines 031, namely first scan signal lines 031.
  • At least one gate line 031 extends at an angle of 30 to 60 degrees to the first direction.
  • the angle between the extension direction of each gate line 031 and the first direction is 30 to 60 degrees.
  • the angle between the extension direction of the gate line 031 and the first direction is 45 degrees.
  • the angle between the extension direction of the gate line 031 and the first direction is 35 to 55 degrees.
  • the angle between the extension direction of the gate line 031 and the first direction is 37 to 50 degrees.
  • the angle between the extension direction of the gate line and the first direction can also be other angles besides the above-mentioned angles within the range of 30 to 60 degrees, which will not be listed here.
  • the X direction shown in Figures 21A and 21B is the first direction
  • the W direction is the X direction shown in Figures 2 to 3, Figures 5 to 15, Figures 17A to 17G, and Figures 19A to 20C.
  • the film layer between the fourth conductive pattern layer and the substrate in the display substrate shown in Figures 21A and 21B can have the same characteristics as the corresponding film layers shown in Figures 17A to 17G, and will not be described again here.
  • the opening of the sub-pixel 100 in the display substrate is set at an angle, which is beneficial to improve the oblique jaggedness, so as to optimize the image quality and improve the image quality uniformity of the display substrate.
  • the angle between the extension direction of data line 061 and the first direction is 89 to 91 degrees, such as when the extension direction of data line 061 is perpendicular to the first direction.
  • the angle between the extension direction of data line 061 and the extension direction of the gate line is 30 to 60 degrees.
  • the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2 ⁇ 1.8):(2.3 ⁇ 2.8).
  • the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 50 micrometers and 53.81 micrometers, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 60 micrometers and 53.81 micrometers, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 137.58 micrometers and 91.96 micrometers, respectively.
  • Figure 21A schematically shows that the pixel arrangement structure can be the same as that shown in Figure 17F, but with a different orientation. This example is not limited to this; the tilted pixel arrangement structure can adopt the pixel arrangement structure shown in any of the examples in Figures 2 to 15.
  • FIG 22 is a schematic block diagram of a display device according to another embodiment of the present disclosure.
  • a display device provided in an embodiment of the present disclosure includes any of the above-described display substrates.
  • the display substrate provided in this embodiment can be an organic light-emitting diode (OLED) display substrate.
  • OLED organic light-emitting diode
  • the display substrate may or may not have a color filter layer.
  • the display device also includes a cover plate located on the light-emitting side of the display substrate.
  • the display device can be an organic light-emitting diode display device or other display device, as well as any product or component with display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, or navigator that includes the display device.
  • This embodiment is not limited to this.

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Abstract

A display substrate and a display apparatus. The display substrate includes first sub-pixels (110), second sub-pixels (120), and third sub-pixels (130). The display substrate includes a plurality of sub-pixel groups (10). Each sub-pixel group (10) includes at least two first sub-pixels (110), at least two second sub-pixels (120), and at least two third sub-pixels (130), wherein the third sub-pixels (130) are arranged in a first direction, and light-emitting regions of the at least two third sub-pixels (130) are configured to correspond to the same mask opening; in the sub-pixel group (10), the included angle between two sides or the included angle between extension lines of the two sides connected by at least one contour corner of light-emitting regions of two third sub-pixels (130) located at the outermost edge in the first direction is 100-170 degrees; and adjacent sub-pixel groups (10) arranged in the first direction include a first sub-pixel group (11) and a second sub-pixel group (12), and third sub-pixels (130) in the first sub-pixel group (11) and third sub-pixels (130) in the second sub-pixel group (12) are staggered in a second direction. Thus, the difficulty of a mask manufacturing process is reduced while increasing a pixel aperture ratio.

Description

显示基板以及显示装置Display substrate and display device

本申请要求于2024年6月21日递交的中国专利申请第202410813636.1号的优先权,在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。This application claims priority to Chinese Patent Application No. 202410813636.1, filed on June 21, 2024, the disclosure of which is incorporated herein by reference in its entirety.

技术领域Technical Field

本公开实施例涉及一种显示基板以及显示装置。This disclosure relates to a display substrate and a display device.

背景技术Background Technology

阴极射线管的出现使上个世纪进入了平板显示领域,随着技术的发展,各种显示器进入人们的视野,如液晶显示器(LCD)、场发射显示器(FED)、等离子体显示器,电致发光(EL)显示器、有机发光二极管显示器等。The advent of cathode ray tubes ushered in the field of flat panel displays in the last century. With the development of technology, various displays have come into view, such as liquid crystal displays (LCDs), field emission displays (FEDs), plasma displays, electroluminescent displays (ELs), and organic light-emitting diode displays.

有机发光二极管((Organic Light-Emitting Diode,OLED)是自主发光的器件,与传统的发光器件不同,不需要向有机发光二极管器件提供背光源,有机发光二极管属于注入型发光器件,其基本结构是将有机薄膜层夹在两个电极(至少其中一个电极为透明电极)间形成夹层式结构。OLED显示器件因自主发光的特性,具有反应速度更快、色纯度和亮度更优、对比度更高、视角更广等特点。Organic light-emitting diodes (OLEDs) are self-emissive devices. Unlike traditional light-emitting devices, they do not require a backlight. OLEDs are injection-type light-emitting devices, and their basic structure consists of an organic thin film layer sandwiched between two electrodes (at least one of which is transparent) to form a sandwich structure. Due to their self-emissive nature, OLED displays offer faster response times, superior color purity and brightness, higher contrast, and wider viewing angles.

发明内容Summary of the Invention

本公开提供一种显示基板以及显示装置。This disclosure provides a display substrate and a display device.

本公开实施例提供一种显示基板,包括:衬底基板以及位于衬底基板上的多个子像素。所述多个子像素包括多个第一子像素、多个第二子像素以及多个第三子像素,各第一子像素的发光区的面积和各第二子像素的发光区的面积均不大于各第三子像素的发光区的面积。所述多个子像素包括多个子像素组,每个子像素组包括至少两个第一子像素、至少两个第二子像素以及至少两个第三子像素,所述至少两个第三子像素沿第一方向排列且所述至少两个第三子像素的发光区被配置为对应同一个掩模开口;至少一个子像素组中,所述至少两个第三子像素的发光区中位于在所述第一方向上最边缘的两个第三子像素的发光区的彼此远离的至少一个轮廓角所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度;在所述第一方向上排列的至少相邻两个子像素组包括第一子像素组和第二子像素组,所述第一子像素组中的所述第三子像素和所述第二子像素组中的所述第三子像素在第二方向上错开分布,所述第二方向与所述第一方向相交。This disclosure provides a display substrate, including a substrate and a plurality of sub-pixels located on the substrate. The plurality of sub-pixels includes a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels, wherein the area of the light-emitting region of each first sub-pixel and the area of the light-emitting region of each second sub-pixel are not greater than the area of the light-emitting region of each third sub-pixel. The plurality of sub-pixels includes a plurality of sub-pixel groups, each sub-pixel group including at least two first sub-pixels, at least two second sub-pixels, and at least two third sub-pixels. The at least two third sub-pixels are arranged along a first direction, and the light-emitting areas of the at least two third sub-pixels are configured to correspond to the same mask opening. In at least one sub-pixel group, the included angle between the two sides connected by at least one contour angle of the light-emitting areas of the two outermost third sub-pixels located in the first direction, or the included angle between the extensions of the two sides, is 100 to 170 degrees. At least two adjacent sub-pixel groups arranged in the first direction include a first sub-pixel group and a second sub-pixel group. The third sub-pixels in the first sub-pixel group and the third sub-pixels in the second sub-pixel group are staggered in a second direction, and the second direction intersects the first direction.

例如,根据本公开实施例,所述多个子像素组沿所述第一方向和所述第二方向阵列排布,每个子像素组中,所述第一子像素的数量、所述第二子像素的数量以及所述第三子像素的数量均相等;同一个子像素组中,所述第一子像素和所述第二子像素沿所述第一方向排列,且所述第一子像素和所述第三子像素沿所述第二方向排列;所述第一子像素组中的所述第三子像素与所述第二子像素组中的所述第一子像素沿所述第一方向排列。For example, according to an embodiment of this disclosure, the plurality of sub-pixel groups are arranged in an array along the first direction and the second direction, and in each sub-pixel group, the number of the first sub-pixel, the number of the second sub-pixel, and the number of the third sub-pixel are all equal; in the same sub-pixel group, the first sub-pixel and the second sub-pixel are arranged along the first direction, and the first sub-pixel and the third sub-pixel are arranged along the second direction; the third sub-pixel in the first sub-pixel group and the first sub-pixel in the second sub-pixel group are arranged along the first direction.

例如,根据本公开实施例,分别位于所述第一子像素组和所述第二子像素组且距离最近的两个第三子像素的发光区之间的距离为第一距离,分别位于所述第一子像素组和所述第二子像素组且距离最近的所述第一子像素与所述第二子像素的发光区之间的距离为第二距离,所述第一距离不小于所述第二距离。For example, according to an embodiment of this disclosure, the distance between the light-emitting areas of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group is a first distance, and the distance between the light-emitting areas of the first sub-pixel and the second sub-pixel located in the first sub-pixel group and the second sub-pixel group is a second distance, wherein the first distance is not less than the second distance.

例如,根据本公开实施例,分别位于所述第一子像素组和所述第二子像素组中且距离最近的两个第三子像素的彼此靠近的轮廓角中的至少一个所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度。For example, according to an embodiment of this disclosure, the included angle between two sides or the included angle between the extensions of at least one of the contour angles of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group respectively is 100 to 170 degrees.

例如,根据本公开实施例,显示基板还包括:多条栅线,至少一条栅线的延伸方向与所述第一方向之间的夹角不大于3度。For example, according to an embodiment of this disclosure, the display substrate further includes: a plurality of gate lines, wherein the angle between the extension direction of at least one gate line and the first direction is not greater than 3 degrees.

例如,根据本公开实施例,显示基板还包括:多条栅线,至少一条栅线的延伸方向与所述第一方向的夹角为30~60度。For example, according to an embodiment of this disclosure, the display substrate further includes: a plurality of gate lines, wherein the extension direction of at least one gate line forms an angle of 30 to 60 degrees with the first direction.

例如,根据本公开实施例,所述第一子像素的发光区和所述第二子像素的发光区在所述第一方向上的尺寸均小于所述第三子像素的发光区在所述第一方向上的尺寸;所述第一子像素和所述第三子像素沿所述第二方向交替排列。For example, according to an embodiment of this disclosure, the size of the light-emitting area of the first sub-pixel and the light-emitting area of the second sub-pixel in the first direction is smaller than the size of the light-emitting area of the third sub-pixel in the first direction; the first sub-pixel and the third sub-pixel are arranged alternately along the second direction.

例如,根据本公开实施例,沿所述第二方向排列的相邻两个子像素组中的子像素的发光区相对于位于所述相邻两个子像素组之间且沿所述第一方向延伸的第一分隔线对称分布,且沿所述第二方向排列的相邻两个子像素组中的位于所述第一分隔线两侧且与其紧邻的至少四个第三子像素被配置为对应同一个掩模开口。For example, according to an embodiment of this disclosure, the light-emitting areas of sub-pixels in two adjacent sub-pixel groups arranged along the second direction are symmetrically distributed with respect to a first dividing line located between the two adjacent sub-pixel groups and extending along the first direction, and at least four third sub-pixels in two adjacent sub-pixel groups arranged along the second direction that are located on both sides of the first dividing line and are adjacent to it are configured to correspond to the same mask opening.

例如,根据本公开实施例,同一子像素组中包括N个第三子像素,沿所述第一方向排列的第N/2个第三子像素与第(N/2+1)个第三子像素之间包括沿所述第二方向延伸的第二分隔线,N为偶数;同一子像素组中,子像素的发光区相对于所述第二分隔线对称分布。For example, according to an embodiment of this disclosure, the same sub-pixel group includes N third sub-pixels, and the N/2th third sub-pixel arranged along the first direction and the (N/2+1)th third sub-pixel are separated by a second dividing line extending along the second direction, where N is an even number; in the same sub-pixel group, the light-emitting areas of the sub-pixels are symmetrically distributed with respect to the second dividing line.

例如,根据本公开实施例,所述第三子像素的发光区包括沿所述第一方向延伸的至少一条第一边,且所述第一子像素的发光区和所述第二子像素的发光区中与所述第一边紧邻的边的延伸方向均与所述第一方向相交。For example, according to an embodiment of this disclosure, the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and the extension directions of the sides adjacent to the first side in both the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel intersect with the first direction.

例如,根据本公开实施例,所述第三子像素的发光区包括沿所述第一方向延伸的至少一条第一边,同一子像素组中,至少相邻的两个第三子像素的发光区的第一边与所述第一子像素的发光区中沿所述第一方向延伸的中心线之间的距离不同。For example, according to an embodiment of this disclosure, the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and in the same sub-pixel group, the distance between the first side of the light-emitting area of at least two adjacent third sub-pixels and the center line extending along the first direction in the light-emitting area of the first sub-pixel is different.

例如,根据本公开实施例,同一子像素组中,所述第一子像素的发光区和所述第二子像素的发光区中与所述第一边紧邻的边的延伸方向均与所述第一边的延伸方向相交。For example, according to an embodiment of this disclosure, in the same sub-pixel group, the extension directions of the edges adjacent to the first edge in the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel both intersect with the extension direction of the first edge.

例如,根据本公开实施例,同一子像素组中,所述至少相邻的两个第三子像素之一的第一边靠近其所在子像素组中的所述第一子像素和所述第二子像素,所述至少相邻的两个第三子像素中的另一个的第一边远离其所在子像素组中的所述第一子像素和所述第二子像素。For example, according to an embodiment of this disclosure, in the same sub-pixel group, the first side of one of the at least two adjacent third sub-pixels is close to the first sub-pixel and the second sub-pixel in its sub-pixel group, and the first side of the other of the at least two adjacent third sub-pixels is far away from the first sub-pixel and the second sub-pixel in its sub-pixel group.

例如,根据本公开实施例,所述第三子像素的发光区还包括彼此连接的第二边和第三边,所述第二边和与其紧邻的所述第一子像素的发光区的边之间的角度不大于5度,所述第三边和与其紧邻的所述第二子像素的发光区的边之间的角度不大于5度,且所述第一边和所述第二边位于所述第三子像素的发光区的中心在所述第二方向上的两侧。For example, according to an embodiment of this disclosure, the light-emitting area of the third sub-pixel further includes a second side and a third side connected to each other, the angle between the second side and the side of the light-emitting area of the first sub-pixel adjacent to it is no greater than 5 degrees, the angle between the third side and the side of the light-emitting area of the second sub-pixel adjacent to it is no greater than 5 degrees, and the first side and the second side are located on both sides of the center of the light-emitting area of the third sub-pixel in the second direction.

例如,根据本公开实施例,至少部分子像素包括发光功能层、第一电极、第二电极以及像素电路,所述第一电极位于所述发光功能层与所述衬底基板之间且与所述像素电路电连接,所述第二电极位于所述发光功能层远离所述第一电极的一侧;沿所述第二方向排列的相邻两个子像素组中,所述第三子像素的第一电极相对于所述第一分隔线对称分布。For example, according to an embodiment of this disclosure, at least some sub-pixels include a light-emitting functional layer, a first electrode, a second electrode, and a pixel circuit. The first electrode is located between the light-emitting functional layer and the substrate and is electrically connected to the pixel circuit. The second electrode is located on the side of the light-emitting functional layer away from the first electrode. In two adjacent sub-pixel groups arranged along the second direction, the first electrode of the third sub-pixel is symmetrically distributed with respect to the first dividing line.

例如,根据本公开实施例,沿所述第二方向排列的相邻两个子像素组中,所述第一子像素和所述第二子像素至少之一的第一电极相对于所述第一分隔线对称分布。For example, according to an embodiment of this disclosure, in two adjacent sub-pixel groups arranged along the second direction, the first electrode of at least one of the first sub-pixel and the second sub-pixel is symmetrically distributed with respect to the first dividing line.

例如,根据本公开实施例,所述第一电极包括彼此连接的主体电极以及连接电极,沿垂直于所述衬底基板的方向,所述连接电极与所述子像素的发光区没有交叠;同一子像素组中,所述第三子像素的连接电极位于其主体电极与所述第二子像素的主体电极之间,所述第二子像素的连接电极位于其主体电极与所述第一子像素的主体电极之间,所述第一子像素的连接电极位于其主体电极与所述第三子像素的主体电极之间。For example, according to an embodiment of this disclosure, the first electrode includes a main electrode and a connecting electrode connected to each other. Along a direction perpendicular to the substrate, the connecting electrode does not overlap with the light-emitting area of the sub-pixel. In the same sub-pixel group, the connecting electrode of the third sub-pixel is located between its main electrode and the main electrode of the second sub-pixel, the connecting electrode of the second sub-pixel is located between its main electrode and the main electrode of the first sub-pixel, and the connecting electrode of the first sub-pixel is located between its main electrode and the main electrode of the third sub-pixel.

例如,根据本公开实施例,同一个子像素组中,至少两个第一子像素和至少两个第二子像素的至少一种对应同一个掩模开口。For example, according to embodiments of this disclosure, in the same sub-pixel group, at least two first sub-pixels and at least two second sub-pixels correspond to the same mask opening.

例如,根据本公开实施例,沿所述第二方向排列的相邻两个子像素组中,位于所述第一分隔线两侧且与其紧邻的至少两个第一子像素被配置为对应同一个掩模开口,且位于所述第一分隔线两侧且与其紧邻的至少两个第二子像素被配置为对应同一个掩模开口。For example, according to an embodiment of this disclosure, in two adjacent sub-pixel groups arranged along the second direction, at least two first sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening, and at least two second sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening.

本公开另一实施例提供一种显示装置,包括上述任一显示基板。Another embodiment of this disclosure provides a display device including any of the above-described display substrates.

附图说明Attached Figure Description

为了更清楚地说明本公开实施例的技术方案,下面将对实施例的附图作简单地介绍,显而易见地,下面描述中的附图仅仅涉及本公开的一些实施例,而非对本公开的限制。To more clearly illustrate the technical solutions of the embodiments of this disclosure, the accompanying drawings of the embodiments will be briefly described below. Obviously, the drawings described below only relate to some embodiments of this disclosure and are not intended to limit this disclosure.

图1为一种像素排列结构及其金属掩模开口的示意图。Figure 1 is a schematic diagram of a pixel arrangement structure and its metal mask opening.

图2为根据本公开实施例的一示例提供的显示基板中局部像素排列结构示意图。Figure 2 is a schematic diagram of a partial pixel arrangement structure in a display substrate provided according to an example of an embodiment of the present disclosure.

图3为形成图2所示像素排列结构的掩模板示意图。Figure 3 is a schematic diagram of the mask used to form the pixel arrangement structure shown in Figure 2.

图4为图2所示显示基板在另一示例中的第三子像素的发光区的示意图。Figure 4 is a schematic diagram of the light-emitting area of the third sub-pixel in another example of the display substrate shown in Figure 2.

图5至图7为根据本公开实施例的不同示例提供的像素排布结构。Figures 5 to 7 show pixel arrangement structures provided according to different examples of embodiments of the present disclosure.

图8为根据本公开实施例的另一示例提供的像素排布结构。Figure 8 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.

图9为形成图8所示像素排布结构的一种掩模板示意图。Figure 9 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 8.

图10为形成图8所示像素排布结构的另一种掩模板示意图。Figure 10 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 8.

图11为根据本公开实施例的另一示例提供的像素排布结构。Figure 11 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.

图12为形成图11所示像素排布结构的一种掩模板示意图。Figure 12 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 11.

图13为形成图11所示像素排布结构的另一种掩模板示意图。Figure 13 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 11.

图14为根据本公开实施例的另一示例提供的像素排布结构。Figure 14 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure.

图15为形成图14所示像素排布结构的一种掩模板示意图。Figure 15 is a schematic diagram of a mask template for forming the pixel arrangement structure shown in Figure 14.

图16为一种像素电路的等效电路示意图。Figure 16 is a schematic diagram of the equivalent circuit of a pixel circuit.

图17A至图17F为显示基板中不同膜层的示意图。Figures 17A to 17F are schematic diagrams of different film layers in a display substrate.

图17G为第一电极层与第四导电图案层层叠的结构图。Figure 17G is a structural diagram of the stacked first electrode layer and the fourth conductive pattern layer.

图18为根据本公开实施例提供的显示基板的局部截面结构示意图。Figure 18 is a schematic diagram of a partial cross-sectional structure of a display substrate provided according to an embodiment of the present disclosure.

图19A和图19B为根据本公开实施例的一示例提供的第四导电图案层以及第一电极层的示意图。Figures 19A and 19B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.

图19C为图19A和图19B所示第四导电图案层和第一电极层的层叠图。Figure 19C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 19A and 19B.

图20A和图20B为根据本公开实施例的一示例提供的第四导电图案层以及第一电极层的示意图。Figures 20A and 20B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure.

图20C为图20A和图20B所示第四导电图案层和第一电极层的层叠图。Figure 20C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 20A and 20B.

图21A和图21B为根据本公开实施例的另一示例提供的显示基板的局部层结构示意图。Figures 21A and 21B are schematic diagrams of partial layer structures of a display substrate provided according to another example of an embodiment of the present disclosure.

图22为根据本公开另一实施例提供的显示装置的示意框图。Figure 22 is a schematic block diagram of a display device provided according to another embodiment of the present disclosure.

具体实施方式Detailed Implementation

为使本公开实施例的目的、技术方案和优点更加清楚,下面将结合本公开实施例的附图,对本公开实施例的技术方案进行清楚、完整地描述。显然,所描述的实施例是本公开的一部分实施例,而不是全部的实施例。基于所描述的本公开的实施例,本领域普通技术人员在无需创造性劳动的前提下所获得的所有其它实施例,都属于本公开保护的范围。To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this disclosure. Based on the described embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

除非另外定义,本公开使用的技术术语或者科学术语应当为本公开所属领域内具有一般技能的人士所理解的通常意义。本公开中使用的“第一”、“第二”以及类似的词语并不表示任何顺序、数量或者重要性,而只是用来区分不同的组成部分。“包括”或者“包含”等类似的词语意指出现该词前面的元件或者物件涵盖出现在该词后面列举的元件或者物件及其等同,而不排除其他元件或者物件。Unless otherwise defined, the technical or scientific terms used in this disclosure shall have the ordinary meaning understood by one of ordinary skill in the art to which this disclosure pertains. The terms “first,” “second,” and similar terms used in this disclosure do not indicate any order, quantity, or importance, but are merely used to distinguish different components. Terms such as “comprising” or “including” mean that an element or object preceding the word encompasses the elements or objects listed following the word and their equivalents, without excluding other elements or objects.

本公开实施例中使用的“平行”、“垂直”以及“相同”等特征均包括严格意义的“平行”、“垂直”、“相同”等特征,以及“大致平行”、“大致垂直”、“大致相同”等包含一定误差的情况,考虑到测量和与特定量的测量相关的误差(例如,测量系统的限制),表示在本领域的普通技术人员所确定的对于特定值的可接受的偏差范围内。例如,“大致”能够表示在一个或多个标准偏差内,或者在所述值的10%或者5%内。在本公开实施例的下文中没有特别指出一个成分的数量时,意味着该成分可以是一个也可以是多个,或可理解为至少一个。“至少一个”指一个或多个,“多个”指至少两个。The features such as "parallel," "perpendicular," and "identical" used in the embodiments of this disclosure include features in the strict sense of "parallel," "perpendicular," and "identical," as well as cases where "approximately parallel," "approximately perpendicular," and "approximately identical" include a certain degree of error. Taking into account measurement and errors associated with the measurement of a specific quantity (e.g., limitations of the measurement system), they represent the acceptable deviation range for a specific value as determined by a person skilled in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of said value. Unless otherwise specified in the following embodiments of this disclosure, the quantity of a component is implied to mean that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "more" means at least two.

有机发光二极管器件的发光机理可以包括五步,第一步是载流子注入:在电场作用下,电子和空穴分别从阴极和阳极向夹在两个电极之间的发光功能层注入;第二步是载流子传输:注入的电子和空穴分别从电子传输层和空穴传输层向发光层注入;第三步是载流子的复合:电子-空穴复合产生激子;第四步是激子的迁移:激子在电场作用下迁移,能量传递给发光层,并激发电子从基态跃迁到激发态;第五步是电致发光:激发态能量通过辐射跃迁,产生光子,释放出能量。The light-emitting mechanism of organic light-emitting diode (OLED) devices can be divided into five steps. The first step is carrier injection: under the action of an electric field, electrons and holes are injected from the cathode and anode into the light-emitting functional layer sandwiched between the two electrodes, respectively. The second step is carrier transport: the injected electrons and holes are injected from the electron transport layer and hole transport layer into the light-emitting layer, respectively. The third step is carrier recombination: electron-hole recombination generates excitons. The fourth step is exciton migration: excitons migrate under the action of an electric field, transfer energy to the light-emitting layer, and excite electrons to transition from the ground state to the excited state. The fifth step is electroluminescence: the energy of the excited state transitions through radiation, generating photons and releasing energy.

有机发光二极管,如显示装置中的子像素是通过将有机材料蒸镀到阵列基板上形成的,有机材料蒸镀在阵列基板上的像素限定层(PDL)的开口内的阳极上,像素限定层的开口用于限定子像素的实际发光面积的尺寸。对于红绿蓝(RGB)像素结构,如Strip RGB像素结构,其中红色子像素与绿色子像素沿一方向排列为一列,蓝色子像素排列为另一列,由于蓝色子像素的发光面积较大,为了提高蓝色子像素的寿命,通常会减小像素限定层间距(PDL Gap)来增大像素的开口面积;但当PDL Gap过小时,会引起混色等不良,造成良率损失。对于高分辨率产品,PDL Gap减小以及PDL开口尺寸较小,都会增加精细金属掩模板(FMM Mask)制作的难度,因此可通过调整像素排布提升开口率。Organic light-emitting diodes (OLEDs), such as subpixels in display devices, are formed by depositing organic materials onto an array substrate. The organic material is deposited onto the anode within an opening in the pixel limiting layer (PDL) on the array substrate. The opening in the PDL defines the actual light-emitting area of the subpixel. For RGB pixel structures, such as Strip RGB pixel structures, where red and green subpixels are arranged in one column and blue subpixels in another, the PDL gap is typically reduced to increase the pixel opening area to improve the lifespan of blue subpixels, given their larger light-emitting area. However, if the PDL gap is too small, it can cause color mixing and other defects, resulting in yield loss. For high-resolution products, reducing the PDL gap and the size of the PDL openings increases the difficulty of fabricating the fine metal mask (FMM). Therefore, adjusting the pixel arrangement can improve the aperture ratio.

在研究中,本申请的发明人发现:制作有机发光二极管显示基板包括在衬底基板上制作如矩阵排列的子像素,矩阵排列的子像素形成像素排布,如像素排布包括多个像素单元,每个像素单元包括三个子像素,如蓝色子像素、绿色子像素以及红色子像素,每个蓝色子像素被掩模板的一个开口制作,如1B in 1。蓝色子像素的发光区的面积大于红色子像素的发光区的面积和绿色子像素的发光区的面积,且红色子像素和绿色子像素在同一侧,蓝色子像素单独占一侧,这种像素排布的寿命和开口率很低,很难满足目前对显示分辨率要求越来越高的显示行业的发展趋势。In their research, the inventors of this application discovered that fabricating an organic light-emitting diode (OLED) display substrate involves fabricating sub-pixels arranged in a matrix on a substrate. These matrix-arranged sub-pixels form a pixel arrangement, such as a pixel arrangement comprising multiple pixel units, each pixel unit including three sub-pixels, such as a blue sub-pixel, a green sub-pixel, and a red sub-pixel. Each blue sub-pixel is fabricated using an opening in a photomask, such as a 1-in-1 arrangement. The area of the light-emitting region of the blue sub-pixel is larger than the areas of the light-emitting regions of the red and green sub-pixels, and the red and green sub-pixels are on the same side, while the blue sub-pixel occupies a separate side. This pixel arrangement has a very low lifetime and aperture ratio, making it difficult to meet the current development trend of the display industry, which demands increasingly higher display resolutions.

图1为一种像素排列结构及其金属掩模开口的示意图。Figure 1 is a schematic diagram of a pixel arrangement structure and its metal mask opening.

如图1所示,像素排列结构包括红色子像素对应的像素限定开口001、绿色子像素对应的像素限定开口002以及蓝色子像素对应的像素限定开口003。一个红色子像素的发光区对应一个掩模开口004,一个绿色子像素的发光区对应一个掩模开口005,一个蓝色子像素的发光区对应一个掩模开口006。像素限定开口001与像素限定开口002之间的距离PG1、像素限定开口001与像素限定开口003之间的距离PG2以及像素限定开口002与像素限定开口003之间的距离PG3基本相等,如均可以称为像素限定间距(PDL Gap)。当像素限定开口越大时,像素限定间距越小,混色风险越高。As shown in Figure 1, the pixel arrangement structure includes a pixel-limited opening 001 corresponding to a red subpixel, a pixel-limited opening 002 corresponding to a green subpixel, and a pixel-limited opening 003 corresponding to a blue subpixel. The emitting area of one red subpixel corresponds to one mask opening 004, the emitting area of one green subpixel corresponds to one mask opening 005, and the emitting area of one blue subpixel corresponds to one mask opening 006. The distances PG1 between pixel-limited openings 001 and 002, PG2 between pixel-limited openings 001 and 003, and PG3 between pixel-limited openings 002 and 003 are approximately equal and can all be referred to as the pixel gap (PDL Gap). The larger the pixel-limited opening, the smaller the pixel gap, and the higher the risk of color mixing.

如图1所示,相邻掩模开口006之间的最小距离Rib1,如掩模板的掩模条的尺寸受到掩模板制作工艺的限制,不能太小,一般要大于25微米,由此Rib1会限制掩模开口的尺寸。图1所示像素排列结构由于受到掩模开口尺寸以及掩模条尺寸的限制很难满足显示装置的高分辨率以及高寿命的需求。As shown in Figure 1, the minimum distance Rib1 between adjacent mask openings 006 is limited by the size of the mask strip, which is constrained by the mask manufacturing process and cannot be too small; it is generally greater than 25 micrometers. Therefore, Rib1 limits the size of the mask openings. The pixel arrangement structure shown in Figure 1, due to the limitations of the mask opening size and mask strip size, struggles to meet the high resolution and long lifespan requirements of display devices.

一种通过采用掩模板的同一开口形成两个子像素的发光区,如形成两个蓝色子像素的发光区的像素排布,如采用2B in 1的像素排布有利于提高像素限定开口的面积以提高显示基板的使用寿命。A pixel arrangement that forms the light-emitting areas of two sub-pixels by using the same opening of a photomask, such as forming the light-emitting areas of two blue sub-pixels, such as using a 2B in 1 pixel arrangement, is beneficial to increasing the area of the pixel-defined opening to improve the lifespan of the display substrate.

例如,在图1所示显示基板的像素排列结构中,将蓝色子像素设置为2B in 1的像素排布后,PDL Gap为20微米,像素节距(pixel pitch)为100微米,Rib1为25微米,红色子像素、绿色子像素以及蓝色子像素的开口比例为1:1.7:2.15,红色子像素的开口率为8.04%,绿色子像素的开口率为13.66%,蓝色子像素的开口率为17.28%,总开口率为38.98%。上述开口率指发光区(如像素限定开口限定的有效发光区)的面积与显示区的面积之比。For example, in the pixel arrangement structure of the display substrate shown in Figure 1, after setting the blue sub-pixels to a 2-in-1 pixel arrangement, the PDL Gap is 20 micrometers, the pixel pitch is 100 micrometers, the Rib1 is 25 micrometers, and the aperture ratio of the red, green, and blue sub-pixels is 1:1.7:2.15. The aperture ratio of the red sub-pixels is 8.04%, the aperture ratio of the green sub-pixels is 13.66%, the aperture ratio of the blue sub-pixels is 17.28%, and the total aperture ratio is 38.98%. The above aperture ratio refers to the ratio of the area of the light-emitting area (such as the effective light-emitting area defined by the pixel-defined aperture) to the area of the display area.

本公开提供一种显示基板以及显示装置。显示基板包括衬底基板以及位于衬底基板上的多个子像素。多个子像素包括多个第一子像素、多个第二子像素以及多个第三子像素,各第一子像素的发光区的面积和各第二子像素的发光区的面积均不大于各第三子像素的发光区的面积。多个子像素包括多个子像素组,每个子像素组包括至少两个第一子像素、至少两个第二子像素以及至少两个第三子像素,至少两个第三子像素沿第一方向排列且至少两个第三子像素的发光区被配置为对应同一个掩模开口;至少一个子像素组中,至少两个第三子像素的发光区中位于在第一方向上最边缘的两个第三子像素的发光区的至少一个轮廓角所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度;在第一方向上排列的至少相邻两个子像素组包括第一子像素组和第二子像素组,第一子像素组中的第三子像素和第二子像素组中的第三子像素在第二方向上错开分布,第二方向与第一方向相交。This disclosure provides a display substrate and a display device. The display substrate includes a substrate and a plurality of sub-pixels located on the substrate. The plurality of sub-pixels includes a plurality of first sub-pixels, a plurality of second sub-pixels, and a plurality of third sub-pixels, wherein the area of the light-emitting region of each first sub-pixel and the area of the light-emitting region of each second sub-pixel are not greater than the area of the light-emitting region of each third sub-pixel. The plurality of sub-pixels includes a plurality of sub-pixel groups, each sub-pixel group including at least two first sub-pixels, at least two second sub-pixels, and at least two third sub-pixels, wherein the at least two third sub-pixels are arranged along a first direction and the light-emitting regions of the at least two third sub-pixels are configured to correspond to the same mask opening; in at least one sub-pixel group, the included angle between the two sides connecting at least one contour angle of the light-emitting regions of the two outermost third sub-pixels located in the first direction, or the included angle between the extensions of the two sides, is 100 to 170 degrees; at least two adjacent sub-pixel groups arranged in the first direction include a first sub-pixel group and a second sub-pixel group, wherein the third sub-pixels in the first sub-pixel group and the third sub-pixels in the second sub-pixel group are staggered in a second direction, and the second direction intersects the first direction.

通过将至少两个第三子像素的发光区设置为对应同一个掩模开口以使得该至少两个第三子像素由同一个掩模开口形成发光层的同时,将不同子像素组中第三子像素错开排布且对第三子像素的发光区的轮廓角进行设置,以在提高掩模开口尺寸以增大像素开口率的同时,不减少掩模板的掩模条宽度而降低掩模板的工艺制作难度,降低混色风险,提高画质,可以满足高分辨率以及高寿命的需求。By setting the light-emitting areas of at least two third sub-pixels to correspond to the same mask opening so that the at least two third sub-pixels form a light-emitting layer from the same mask opening, while the third sub-pixels in different sub-pixel groups are staggered and the contour angle of the light-emitting area of the third sub-pixels is set, the mask opening size is increased to increase the pixel aperture ratio, while the mask strip width of the mask is not reduced, thus reducing the manufacturing difficulty of the mask, reducing the risk of color mixing, and improving the image quality. This can meet the requirements of high resolution and long lifespan.

下面结合附图对本公开实施例提供的显示基板以及显示装置进行描述。The display substrate and display device provided in the embodiments of this disclosure are described below with reference to the accompanying drawings.

图2为根据本公开实施例的一示例提供的显示基板中局部像素排列结构示意图。图3为形成图2所示像素排列结构的掩模板示意图。Figure 2 is a schematic diagram of a partial pixel arrangement structure in a display substrate according to an example embodiment of the present disclosure. Figure 3 is a schematic diagram of a mask forming the pixel arrangement structure shown in Figure 2.

如图2所示,显示基板包括衬底基板01以及位于衬底基板01上的多个子像素100。多个子像素100包括多个第一子像素110、多个第二子像素120以及多个第三子像素130,各第一子像素110的发光区的面积和各第二子像素120的发光区的面积均不大于各第三子像素130的发光区的面积。例如,第一子像素110、第二子像素120以及第三子像素130为发出不同颜色光的子像素100。例如,第三子像素130为发出蓝光的蓝色子像素,第一子像素110和第二子像素120之一为发出红光的红色子像素,第一子像素110和第二子像素120的另一个为发出绿光的绿色子像素,红色子像素和绿色子像素的发光区的面积均小于蓝色子像素的发光区的面积。例如,第一子像素110可以为红色子像素,第二子像素120可以为绿色子像素。但不限于此,第一子像素110和第二子像素120的颜色可以互换。上述发光区可以为像素限定层(如图18所示PDL)中的开口限定的区域,发光层形成在该区域中,且位于发光层两侧的电极驱动该发光层位于发光区内的部分发光。As shown in Figure 2, the display substrate includes a substrate 01 and a plurality of sub-pixels 100 located on the substrate 01. The plurality of sub-pixels 100 includes a plurality of first sub-pixels 110, a plurality of second sub-pixels 120, and a plurality of third sub-pixels 130. The area of the light-emitting region of each first sub-pixel 110 and the area of the light-emitting region of each second sub-pixel 120 are not greater than the area of the light-emitting region of each third sub-pixel 130. For example, the first sub-pixels 110, second sub-pixels 120, and third sub-pixels 130 may be sub-pixels 100 that emit different colors of light. For example, the third sub-pixel 130 may be a blue sub-pixel that emits blue light, one of the first sub-pixels 110 and second sub-pixels 120 may be a red sub-pixel that emits red light, and the other of the first sub-pixels 110 and second sub-pixels 120 may be a green sub-pixel that emits green light. The areas of the light-emitting regions of the red and green sub-pixels are both smaller than the area of the light-emitting region of the blue sub-pixel. For example, the first sub-pixel 110 may be a red sub-pixel, and the second sub-pixel 120 may be a green sub-pixel. However, this is not the only limitation; the colors of the first sub-pixel 110 and the second sub-pixel 120 can be interchanged. The aforementioned light-emitting area can be a region defined by an opening in a pixel-defining layer (PDL as shown in Figure 18), in which a light-emitting layer is formed, and electrodes located on both sides of the light-emitting layer drive the portion of the light-emitting layer located within the light-emitting area to emit light.

如图2和图3所示,多个子像素100包括多个子像素组10,如多个子像素100排列为阵列排布的多个子像素组10。每个子像素组10包括至少两个第一子像素110、至少两个第二子像素120以及至少两个第三子像素130,该至少两个第三子像素130沿第一方向排列且该至少两个第三子像素130的发光区被配置为对应同一个掩模开口。例如,第一方向可以为图中所示X方向。As shown in Figures 2 and 3, the plurality of sub-pixels 100 includes a plurality of sub-pixel groups 10, such as the plurality of sub-pixels 100 arranged in an array of sub-pixel groups 10. Each sub-pixel group 10 includes at least two first sub-pixels 110, at least two second sub-pixels 120, and at least two third sub-pixels 130, the at least two third sub-pixels 130 being arranged along a first direction and the light-emitting areas of the at least two third sub-pixels 130 being configured to correspond to the same mask opening. For example, the first direction can be the X direction shown in the figures.

例如,如图2和图3所示,同一个子像素组10中,沿第一方向排列的多个第三子像素130采用同一个掩模开口530形成发光层。图2和图3示意性地示出同一个子像素组10包括沿第一方向排列的两个第三子像素130,如两个第三子像素130采用同一个掩模开口530形成发光层,如采用2Bin 1方式形成蓝色子像素100的发光层,但不限于此,同一个子像素组10还可以包括沿第一方向排列的三个第三子像素130、四个第三子像素130或者更多个第三子像素130。For example, as shown in Figures 2 and 3, in the same sub-pixel group 10, multiple third sub-pixels 130 arranged along the first direction form a light-emitting layer using the same mask opening 530. Figures 2 and 3 schematically show that the same sub-pixel group 10 includes two third sub-pixels 130 arranged along the first direction, such as the two third sub-pixels 130 forming a light-emitting layer using the same mask opening 530, such as forming the light-emitting layer of the blue sub-pixel 100 using a 2-bin-1 method, but it is not limited to this. The same sub-pixel group 10 may also include three third sub-pixels 130, four third sub-pixels 130, or more third sub-pixels 130 arranged along the first direction.

通过将至少两个第三子像素的发光区设置为对应同一个掩模开口以使得该至少两个第三子像素由同一个掩模开口形成发光层,有利于提高掩模开口尺寸以增大像素开口率,实现满足更高像素密度,如更高每英寸像素数(Pixel Per Inch,PPI),高分辨率以及高寿命的需求。By setting the light-emitting areas of at least two third sub-pixels to correspond to the same mask opening, so that the at least two third sub-pixels form a light-emitting layer by the same mask opening, it is beneficial to increase the mask opening size to increase the pixel aperture ratio, thereby meeting the requirements of higher pixel density, such as higher pixels per inch (PPI), high resolution, and long lifespan.

例如,如图2和图3所示,同一子像素组10中,每个第一子像素110采用一个掩模开口510形成发光层,每个第二子像素120采用一个掩模开口520形成发光层。For example, as shown in Figures 2 and 3, in the same sub-pixel group 10, each first sub-pixel 110 uses a mask opening 510 to form a light-emitting layer, and each second sub-pixel 120 uses a mask opening 520 to form a light-emitting layer.

如图2所示,至少一个子像素组10中,上述至少两个第三子像素130的发光区中位于在第一方向上最边缘的两个第三子像素130的发光区的彼此远离的至少一个轮廓角所连接的两条边之间的夹角或者两条边的延长线之间的夹角α为100~170度。例如,上述轮廓角为可以称为倒角,如可以包括直线倒角或者圆倒角。As shown in Figure 2, in at least one sub-pixel group 10, the included angle α between the two sides connecting the at least two outermost contour angles of the light-emitting areas of the two outermost third sub-pixels 130 in the first direction, or the included angle α between the extensions of the two sides, is 100 to 170 degrees. For example, the aforementioned contour angle can be referred to as a chamfer, such as a straight chamfer or a rounded chamfer.

例如,如图2所示,上述轮廓角为直线倒角时,该轮廓角由两条直边形成,该轮廓角的大小即为两条直边之间的夹角α,如可以为120~150度,或者110~140度,或者130~160度,或者132~137度,或者135度,本公开实施例不再一一例举,该夹角α可以为在100~170度的任意角度。For example, as shown in Figure 2, when the above-mentioned contour angle is a straight chamfer, the contour angle is formed by two straight sides, and the size of the contour angle is the included angle α between the two straight sides. For example, it can be 120 to 150 degrees, or 110 to 140 degrees, or 130 to 160 degrees, or 132 to 137 degrees, or 135 degrees. The embodiments disclosed herein will not be listed one by one. The included angle α can be any angle between 100 and 170 degrees.

例如,如图2所示,以一个子像素组10包括两个第三子像素130为例,在第一方向上位于最边缘的两个第三子像素130即为这两个子像素100,以X方向的箭头所指方向为向上,上述“彼此远离的至少一个轮廓角”可以指该轮廓角位于上面的第三子像素130远离下面的第三子像素130的发光区的角度,和/或位于下面的第三子像素130远离上面的第三子像素130的发光区的角度。例如,同一个第三子像素130的发光区可以包括一个倒角,或者包括两个或者更多个倒角。例如,至少部分子像素组10中的至少部分第三子像素130的发光区包括至少一个倒角。例如,每个子像素组10中的每个第三子像素130的发光区包括两个倒角。For example, as shown in Figure 2, taking a subpixel group 10 comprising two third subpixels 130 as an example, the two third subpixels 130 located at the outermost edge in the first direction are these two subpixels 100. Taking the direction pointed to by the arrow in the X direction as upward, the aforementioned "at least one contour angle that is far away from each other" can refer to the angle at which the upper third subpixel 130 is far away from the light-emitting area of the lower third subpixel 130, and/or the angle at which the lower third subpixel 130 is far away from the light-emitting area of the upper third subpixel 130. For example, the light-emitting area of the same third subpixel 130 may include one chamfer, or may include two or more chamfers. For example, the light-emitting area of at least some of the third subpixels 130 in at least some subpixel groups 10 includes at least one chamfer. For example, the light-emitting area of each third subpixel 130 in each subpixel group 10 includes two chamfers.

当然,本公开实施例不限于此,一个子像素组包括至少三个第三子像素130时,上述位于最边缘的两个第三子像素130即为最上面的第三子像素130和最下面的第三子像素130,位于非边缘的第三子像素130的发光区可以包括倒角,也可以不包括倒角。Of course, the embodiments disclosed herein are not limited to this. When a subpixel group includes at least three third subpixels 130, the two third subpixels 130 located at the outermost edge are the uppermost third subpixel 130 and the lowermost third subpixel 130. The light-emitting area of the third subpixel 130 located on the non-edge may include a chamfer or may not include a chamfer.

图4为图2所示显示基板在另一示例中的第三子像素的发光区的示意图。Figure 4 is a schematic diagram of the light-emitting area of the third sub-pixel in another example of the display substrate shown in Figure 2.

例如,如图4所示,第三子像素130的发光区的轮廓角可以为圆倒角,发光区中形成该圆倒角的两条边的延长线之间的夹角α为100~170度,如可以为120~150度,或者110~140度,或者130~160度,或者132~137度,或者135度,本公开实施例不再一一例举,该夹角α可以为在100~170度的任意角度。For example, as shown in Figure 4, the outline angle of the light-emitting area of the third sub-pixel 130 can be a rounded chamfer. The included angle α between the extension lines of the two sides forming the rounded chamfer in the light-emitting area is 100 to 170 degrees, such as 120 to 150 degrees, or 110 to 140 degrees, or 130 to 160 degrees, or 132 to 137 degrees, or 135 degrees. The embodiments disclosed herein will not be listed one by one. The included angle α can be any angle between 100 and 170 degrees.

如图2所示,在第一方向上排列的至少相邻两个子像素组10包括第一子像素组11和第二子像素组12,第一子像素组11中的第三子像素130和第二子像素组12中的第三子像素130在第二方向上错开分布,第二方向与第一方向相交。As shown in Figure 2, at least two adjacent sub-pixel groups 10 arranged in the first direction include a first sub-pixel group 11 and a second sub-pixel group 12. The third sub-pixel 130 in the first sub-pixel group 11 and the third sub-pixel 130 in the second sub-pixel group 12 are staggered in the second direction, and the second direction intersects with the first direction.

例如,如图2所示,第二方向可以为图中所示Y方向。例如,第一方向与第二方向之间的夹角可以为80~100度,如第一方向与第二方向垂直。例如,第一方向与第二方向可以互换。For example, as shown in Figure 2, the second direction can be the Y direction shown in the figure. For example, the angle between the first and second directions can be 80 to 100 degrees, such as when the first and second directions are perpendicular. For example, the first and second directions can be interchanged.

例如,如图2所示,沿第一方向排列子像素组10可以称为一列子像素组或者一行子像素组,同一列子像素组或者同一行子像素组中,仅部分相邻设置的子像素组10包括上述第一子像素组11和第二子像素组12,或者任意相邻设置的子像素组10包括上述第一子像素组11和第二子像素组12,如第一子像素组11和第二子像素组12在第一方向上交替排列。For example, as shown in Figure 2, the sub-pixel group 10 arranged along the first direction can be called a column of sub-pixel groups or a row of sub-pixel groups. In the same column of sub-pixel groups or the same row of sub-pixel groups, only some of the sub-pixel groups 10 are arranged adjacently, including the first sub-pixel group 11 and the second sub-pixel group 12, or any adjacent sub-pixel groups 10 include the first sub-pixel group 11 and the second sub-pixel group 12, such as the first sub-pixel group 11 and the second sub-pixel group 12 being arranged alternately in the first direction.

例如,如图2所示,第一子像素组11中的第三子像素130的发光区在沿Y方向延伸的直线上的正投影的至少部分与第二子像素组12中的第三子像素130的发光区在该直线上的正投影不交叠。例如,沿X方向延伸且经过第一子像素组11中第三子像素130的发光区的直线不经过第二子像素组12中第三子像素130的发光区。For example, as shown in FIG2, at least a portion of the orthographic projection of the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 onto a straight line extending along the Y direction does not overlap with the orthographic projection of the light-emitting area of the third sub-pixel 130 in the second sub-pixel group 12 onto the same straight line. For example, a straight line extending along the X direction and passing through the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 does not pass through the light-emitting area of the third sub-pixel 130 in the second sub-pixel group 12.

例如,如图3所示,由于第一子像素组11中的第三子像素130和第二子像素组12中的第三子像素130在第二方向上错开分布,用于形成第三子像素130的掩模板中相邻两个掩模开口之间的掩模条的宽度Rib,如掩模条的最小宽度的方向与第一方向相交。相对于用于形成相邻两个第三子像素130的掩模开口沿第一方向排列的情况,即如图1所示的情况,用于形成本公开提供的显示基板中的相邻两个第三子像素130的掩模开口在第二方向上错开分布,可以将掩模条的最小宽度Rib的限制方向设置为斜向而非纵向或横向(如上述第一方向和第二方向之一为横向,另一个为纵向),有利于增加Rib的尺寸。For example, as shown in FIG3, since the third sub-pixel 130 in the first sub-pixel group 11 and the third sub-pixel 130 in the second sub-pixel group 12 are staggered in the second direction, the width Rib of the mask strip between two adjacent mask openings in the mask template used to form the third sub-pixel 130 is such that the direction of the minimum width of the mask strip intersects with the first direction. Compared with the case where the mask openings used to form two adjacent third sub-pixels 130 are arranged along the first direction, i.e., as shown in FIG1, the mask openings used to form two adjacent third sub-pixels 130 in the display substrate provided in this disclosure are staggered in the second direction. The limiting direction of the minimum width Rib of the mask strip can be set to oblique rather than longitudinal or transverse (such as one of the first direction and the second direction being transverse and the other being longitudinal), which is beneficial to increase the size of Rib.

将不同子像素组中第三子像素错开排布的同时,对同一子像素组中位于最边缘的第三子像素的发光区的边缘轮廓角进行设置,可以不减少掩模板的掩模条宽度Rib,如保持掩模条宽度或者增大掩模条宽度,有利于降低掩模板的工艺制作难度,降低混色风险,防止色偏,提高显示画质。掩模条宽度Rib满足最低工艺制作要求,甚至尺寸更大,且适应张网。By staggering the third subpixels in different subpixel groups and setting the edge contour angle of the light-emitting area of the outermost third subpixel in the same subpixel group, the mask strip width (Rib) of the mask template can be maintained. Maintaining or increasing the mask strip width helps reduce the manufacturing difficulty of the mask, lowers the risk of color mixing, prevents color shift, and improves display quality. The mask strip width (Rib) meets the minimum manufacturing requirements and can even be larger, while also being suitable for mesh stretching.

例如,如图2和图3所示,通过将位于子像素组10边缘的第三子像素130的边缘轮廓角设置为倒角的同时,且将分别位于相邻设置的第一子像素组11和第二子像素组12的第三子像素130错开分布的情况下,可以增加用于形成第三子像素130的掩模开口530在第一方向上的尺寸,从而进一步增加子像素100的开口率。For example, as shown in Figures 2 and 3, by setting the edge contour angle of the third sub-pixel 130 located at the edge of the sub-pixel group 10 to a chamfer, and by staggering the distribution of the third sub-pixel 130 located in the adjacent first sub-pixel group 11 and second sub-pixel group 12, the size of the mask opening 530 used to form the third sub-pixel 130 in the first direction can be increased, thereby further increasing the aperture ratio of the sub-pixel 100.

例如,图2所示显示基板中的像素排布结构中,PDL Gap为20微米,像素节距(pixel pitch)为100微米,Rib为26.9微米的情况下,第一子像素110的开口率为8.49%,第二子像素120的开口率为14.44%,第三子像素130的开口率为18.26%,总开口率为41.19%。图2所示像素排布结构相对于图1所示像素排布结构的开口率增加5.67%。相对于图1所示像素排布结构中采用同一个掩模开口形成两个蓝色子像素的发光层的情况,图2所示像素排布结构中像素节距以及PDL Gap没有改变的情况下,通过在用于形成第三子像素130的发光区的掩模开口的轮廓角设置为倒角,如直线倒角或者圆倒角的同时,将相邻两行或两列掩模开口错开分布,有利于增大Rib,且增大掩模开口的尺寸,进而增大子像素100整体开口率,不仅便于实现高PPI产品,提升产品寿命,还可以降低掩模板的制作工艺难度。For example, in the pixel arrangement structure of the display substrate shown in Figure 2, with a PDL gap of 20 micrometers, a pixel pitch of 100 micrometers, and a Rib of 26.9 micrometers, the aperture ratio of the first sub-pixel 110 is 8.49%, the aperture ratio of the second sub-pixel 120 is 14.44%, the aperture ratio of the third sub-pixel 130 is 18.26%, and the total aperture ratio is 41.19%. The pixel arrangement structure shown in Figure 2 has an increased aperture ratio of 5.67% compared to the pixel arrangement structure shown in Figure 1. Compared to the pixel arrangement structure shown in Figure 1, where the same mask opening is used to form the light-emitting layers of two blue sub-pixels, the pixel arrangement structure shown in Figure 2, without changing the pixel pitch and PDL gap, allows for the increase of Rib and the size of the mask opening. This is achieved by setting the contour angle of the mask opening used to form the light-emitting area of the third sub-pixel 130 to a chamfer, such as a straight chamfer or a rounded chamfer, while simultaneously staggering the distribution of mask openings in adjacent rows or columns. This increases the overall aperture ratio of sub-pixel 100, which not only facilitates the realization of high PPI products and improves product lifespan but also reduces the manufacturing difficulty of the mask template.

例如,如图2所示,第一子像素110的开口率、第二子像素120的开口率以及第三子像素130的开口率之比可以为1:(1.2~1.8):(2.3~2.8)。例如,第一子像素110的发光区在X方向和Y方向上的尺寸可以分别为22.22微米和37.41微米,第二子像素120的发光区在X方向和Y方向上的尺寸可以分别为37.78微米和37.41微米,第三子像素130的发光区在X方向和Y方向上的尺寸可以分别为85微米和22.59微米。For example, as shown in Figure 2, the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2~1.8):(2.3~2.8). For instance, the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 μm and 37.41 μm, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 μm and 37.41 μm, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 μm and 22.59 μm, respectively.

在一些示例中,如图2所示,多个子像素组10沿第一方向和第二方向阵列排布,每个子像素组10中,第一子像素110的数量、第二子像素120的数量以及第三子像素130的数量均相等。例如,每个子像素组10中,第一子像素110、第二子像素120以及第三子像素130的数量可以为均为两个,但不限于此,还可以为三个或者更多个,可以根据产品需求进行设置。In some examples, as shown in Figure 2, multiple sub-pixel groups 10 are arranged in an array along a first direction and a second direction. In each sub-pixel group 10, the number of first sub-pixels 110, the number of second sub-pixels 120, and the number of third sub-pixels 130 are all equal. For example, in each sub-pixel group 10, the number of first sub-pixels 110, second sub-pixels 120, and third sub-pixels 130 can all be two, but it is not limited to this; it can also be three or more, depending on product requirements.

在一些示例中,如图2所示,同一个子像素组10中,第一子像素110和第二子像素120沿第一方向排列,且第一子像素110和第三子像素130沿第二方向排列。例如,第二子像素120和第三子像素130沿第二方向排列。In some examples, as shown in Figure 2, within the same sub-pixel group 10, the first sub-pixel 110 and the second sub-pixel 120 are arranged along a first direction, and the first sub-pixel 110 and the third sub-pixel 130 are arranged along a second direction. For example, the second sub-pixel 120 and the third sub-pixel 130 are arranged along the second direction.

在一些示例中,如图2所示,第一子像素组11中的第三子像素130与第二子像素组12中的第一子像素110沿第一方向排列。例如,第一子像素组11中的第三子像素130的发光区在沿Y方向延伸的直线上的正投影与第二子像素组12中的第一子像素110的发光区在该直线上的正投影交叠。例如,沿X方向延伸的同一条直线经过第一子像素组11中的第三子像素130的发光区和第二子像素组12中的第一子像素110和第二子像素120的发光区。In some examples, as shown in Figure 2, the third sub-pixel 130 in the first sub-pixel group 11 and the first sub-pixel 110 in the second sub-pixel group 12 are arranged along a first direction. For example, the orthographic projection of the light-emitting area of the third sub-pixel 130 in the first sub-pixel group 11 onto a straight line extending along the Y direction overlaps with the orthographic projection of the light-emitting area of the first sub-pixel 110 in the second sub-pixel group 12 onto the same straight line. For example, the same straight line extending along the X direction passes through the light-emitting areas of the third sub-pixel 130 in the first sub-pixel group 11 and the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 in the second sub-pixel group 12.

在一些示例中,如图2所示,第一子像素110的发光区和第二子像素120的发光区在第一方向上的尺寸均小于第三子像素130的发光区在第一方向上的尺寸;第一子像素110和第三子像素130沿第二方向交替排列。例如,第二子像素120和第三子像素130沿第二方向交替排列。例如,第一子像素110的发光区在第一方向上的尺寸以及第二子像素120的发光区在第一方向上的尺寸以及两者之间的间隔的尺寸之和可以大于第三子像素130的发光区在第一方向上的尺寸。In some examples, as shown in Figure 2, the dimensions of the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 in the first direction are both smaller than the dimension of the light-emitting area of the third sub-pixel 130 in the first direction; the first sub-pixel 110 and the third sub-pixel 130 are arranged alternately along the second direction. For example, the second sub-pixel 120 and the third sub-pixel 130 are arranged alternately along the second direction. For example, the sum of the dimension of the light-emitting area of the first sub-pixel 110 in the first direction, the dimension of the light-emitting area of the second sub-pixel 120 in the first direction, and the dimension of the interval between them can be greater than the dimension of the light-emitting area of the third sub-pixel 130 in the first direction.

例如,如图2所示,以沿Y方向排列的子像素组10为一行子像素组,则同一行子像素组中不同子像素100的相对位置关系相同。For example, as shown in Figure 2, if the sub-pixel group 10 arranged along the Y direction is a row of sub-pixel groups, then the relative positional relationship of different sub-pixels 100 in the same row of sub-pixel groups is the same.

在一些示例中,如图2所示,分别位于第一子像素组11和第二子像素组12且距离最近的两个第三子像素130的发光区之间的距离为第一距离D1,分别位于第一子像素组11和第二子像素组12且距离最近的第一子像素110与第二子像素120的发光区之间的距离为第二距离D2,第一距离D1不小于第二距离D2。例如,第一距离D1大于第二距离D2。In some examples, as shown in Figure 2, the distance between the light-emitting areas of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12 is the first distance D1, and the distance between the light-emitting areas of the closest first sub-pixel 110 and the second sub-pixel 120 located in the first sub-pixel group 11 and the second sub-pixel group 12 is the second distance D2. The first distance D1 is not less than the second distance D2. For example, the first distance D1 is greater than the second distance D2.

例如,如图2所示,上述发光区之间的距离指两个发光区的彼此靠近的边缘之间的最小距离。例如,上述分别位于两个子像素组10且距离最近的两个第三子像素130指这两个第三子像素130之间没有其他第三子像素130,甚至没有其他子像素100。例如,这两个第三子像素130可以为第一子像素组11中最下面的第三子像素130和第二子像素组12中最上面的第三子像素130。例如,上述“距离最近的第一子像素110和第二子像素120”可以指这两个子像素100之间没有其他第一子像素110和第二子像素120,甚至没有其他子像素100。例如,上述“距离最近的第一子像素110和第二子像素120”可以指第一子像素组11中的第一子像素110与第二子像素组12中的第二子像素120,或者第一子像素组11中的第二子像素120与第二子像素组12中的第一子像素110。For example, as shown in Figure 2, the distance between the light-emitting areas refers to the minimum distance between the edges of the two light-emitting areas that are close to each other. For example, the two third sub-pixels 130 that are located in the two sub-pixel groups 10 and are closest to each other refer to the two third sub-pixels 130 that have no other third sub-pixels 130 between them, or even no other sub-pixels 100. For example, the two third sub-pixels 130 can be the bottom third sub-pixel 130 in the first sub-pixel group 11 and the top third sub-pixel 130 in the second sub-pixel group 12. For example, the phrase "the first sub-pixel 110 and the second sub-pixel 120 that are closest to each other" can refer to the two sub-pixels 100 that have no other first sub-pixels 110 and the second sub-pixel 120 between them, or even no other sub-pixels 100. For example, the phrase "the first sub-pixel 110 and the second sub-pixel 120 that are closest to each other" can refer to the first sub-pixel 110 in the first sub-pixel group 11 and the second sub-pixel 120 in the second sub-pixel group 12, or the second sub-pixel 120 in the first sub-pixel group 11 and the first sub-pixel 110 in the second sub-pixel group 12.

通过对分别位于不同子像素组中的相邻两个第三子像素的发光区之间的距离与相邻第一子像素与第二子像素的发光区之间距离大小关系的设置,有利于保证用于形成第三子像素的发光层的掩模板中掩模条宽度Rib可满足最低工艺制作要求,甚至尺寸更大,且适应张网。By setting the relationship between the distance between the light-emitting areas of two adjacent third sub-pixels located in different sub-pixel groups and the distance between the light-emitting areas of adjacent first and second sub-pixels, it is beneficial to ensure that the mask strip width Rib in the mask used to form the light-emitting layer of the third sub-pixel can meet the minimum process manufacturing requirements, or even be larger, and adapt to mesh stretching.

例如,如图2所示,分别位于第一子像素组11和第二子像素组12中且距离最近的两个第三子像素130的发光区的两条轮廓边E1和E2彼此相对且互相平行,有利于掩模条宽度的均一性以及张网稳定性。For example, as shown in Figure 2, the two contour edges E1 and E2 of the light-emitting areas of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12 are opposite to each other and parallel to each other, which is beneficial to the uniformity of the mask strip width and the stability of the mesh.

在一些示例中,如图2所示,分别位于第一子像素组11和第二子像素组12中且距离最近的两个第三子像素130的彼此靠近的轮廓角中的至少一个所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度。通过将分别位于两个子像素组10中的两个第三子像素130的彼此靠近的至少一个轮廓角设置为倒角,有利于保证用于形成第三子像素130的发光层的掩模板中掩模条宽度Rib可满足最低工艺制作要求,甚至尺寸更大,且适应张网。In some examples, as shown in Figure 2, the included angle between the two sides connecting at least one of the contour angles of the two closest third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12, or the included angle between the extensions of the two sides, is 100 to 170 degrees. By setting at least one contour angle of the two closest third sub-pixels 130 located in the two sub-pixel groups 10 to be chamfered, it is beneficial to ensure that the mask strip width Rib in the mask used to form the light-emitting layer of the third sub-pixel 130 meets the minimum process fabrication requirements, or even has a larger size, and is suitable for mesh stretching.

例如,如图2所示,分别位于第一子像素组11和第二子像素组12中且距离最近的两个第三子像素130的彼此靠近的两个轮廓角α1和α2均为倒角。例如,两个轮廓角α1和α2均为100~170度。例如,两个轮廓角α1和α2可以不相等。例如,两个轮廓角α1和α2的差值不大于10度。例如,两个轮廓角α1和α2可以相等。For example, as shown in Figure 2, the two closest contour angles α1 and α2 of the two third sub-pixels 130 located in the first sub-pixel group 11 and the second sub-pixel group 12, respectively, are both chamfered. For example, both contour angles α1 and α2 are between 100 and 170 degrees. For example, the two contour angles α1 and α2 may not be equal. For example, the difference between the two contour angles α1 and α2 is no greater than 10 degrees. For example, the two contour angles α1 and α2 may be equal.

例如,如图2所示,第一子像素110和第二子像素120的发光区的形状可以均为标准矩形或者圆角矩形,第三子像素130的发光区的形状可以为六边形。For example, as shown in Figure 2, the shape of the light-emitting area of the first sub-pixel 110 and the second sub-pixel 120 can both be a standard rectangle or a rounded rectangle, and the shape of the light-emitting area of the third sub-pixel 130 can be a hexagon.

例如,如图2所示,第一子像素110的发光区的面积可以大于第二子像素120的发光区的面积,但不限于此,第一子像素110的发光区的面积也可以小于第二子像素120的发光区的面积。For example, as shown in Figure 2, the area of the light-emitting region of the first sub-pixel 110 can be larger than the area of the light-emitting region of the second sub-pixel 120, but it is not limited thereto; the area of the light-emitting region of the first sub-pixel 110 can also be smaller than the area of the light-emitting region of the second sub-pixel 120.

例如,如图2所示,第三子像素130的倒角α的顶点或者形成圆倒角α的两边延长线的交点和与其距离最近的且位于子像素组10最边缘的子像素100的发光区之间的距离为第一子距离,第三子像素130其他非倒角和与其距离最近的子像素100的发光区之间的距离为第二子距离,第一子距离大于第二子距离。For example, as shown in Figure 2, the distance between the vertex of the chamfer α of the third sub-pixel 130 or the intersection of the two extended lines forming the chamfer α and the light-emitting area of the nearest sub-pixel 100 located at the outermost edge of the sub-pixel group 10 is the first sub-distance, and the distance between the other non-chamfered corners of the third sub-pixel 130 and the light-emitting area of the nearest sub-pixel 100 is the second sub-distance. The first sub-distance is greater than the second sub-distance.

例如,如图2所示,分别位于相邻的第一子像素组11和第二子像素组12中的第三子像素130和第二子像素120之间的距离小于第一距离D1。例如,分别位于相邻的第一子像素组11和第二子像素组12中的第三子像素130和第二子像素120之间的距离不大于第二距离D2。For example, as shown in Figure 2, the distance between the third sub-pixel 130 and the second sub-pixel 120, which are located in adjacent first sub-pixel groups 11 and 12 respectively, is less than the first distance D1. For example, the distance between the third sub-pixel 130 and the second sub-pixel 120, which are located in adjacent first sub-pixel groups 11 and 12 respectively, is not greater than the second distance D2.

图5至图7为根据本公开实施例的不同示例提供的像素排布结构。Figures 5 to 7 show pixel arrangement structures provided according to different examples of embodiments of the present disclosure.

例如,图5示意性地示出6行4列子像素组10,第1行和第4行设置有第一子像素组11,第2行、第3行、第5行以及第6行设置有第二子像素组12,第一子像素组11和第二子像素组12均设置有两个第三子像素130。但不限于此,图5还可以被视为包括4行4列子像素组10,第1行和第3行设置有第一子像素组11,第一子像素组11包括两个第三子像素130,第2行和第4行设置有第二子像素组12,第二子像素组12包括四个第三子像素130。For example, Figure 5 schematically shows a 6-row, 4-column subpixel group 10, with first subpixel groups 11 in rows 1 and 4, and second subpixel groups 12 in rows 2, 3, 5, and 6. Both first subpixel groups 11 and 12 have two third subpixels 130. However, it is not limited to this; Figure 5 can also be viewed as including a 4-row, 4-column subpixel group 10, with first subpixel groups 11 in rows 1 and 3, each including two third subpixels 130, and second subpixel groups 12 in rows 2 and 4, each including four third subpixels 130.

例如,图6示意性地示出4行子像素组10,第1行和第3行设置有第一子像素组11,第2行和第4行设置有第二子像素组12,第一子像素组11和第二子像素组12均包括四个第三子像素130。图6示意性地示出每个子像素组中的每个第三子像素130的发光区均包括倒角α,但不限于此,还可以每个子像素组中仅最上面的第三子像素130和最下面的第三子像素130的发光区包括倒角α。例如,各子像素组10中的四个第三子像素130采用同一个掩模开口形成发光层。For example, Figure 6 schematically shows four rows of subpixel groups 10. The first and third rows contain first subpixel groups 11, and the second and fourth rows contain second subpixel groups 12. Both the first and second subpixel groups 11 and 12 include four third subpixels 130. Figure 6 schematically shows that the light-emitting area of each third subpixel 130 in each subpixel group includes a chamfer α, but this is not a limitation; it is also possible that only the uppermost and lowermost third subpixels 130 in each subpixel group have light-emitting areas with a chamfer α. For example, the four third subpixels 130 in each subpixel group 10 can form a light-emitting layer using the same mask opening.

例如,图7示意性地示出4行子像素组10,第1行和第3行设置有第二子像素组12,第2行和第4行设置有第一子像素组11,第一子像素组11和第二子像素组12均包括三个第三子像素130,且每个子像素组中仅最上面的第三子像素130和最下面的第三子像素130的发光区包括倒角α。例如,各子像素组中的三个第三子像素130采用同一个掩模开口形成发光层。For example, Figure 7 schematically shows four rows of subpixel groups 10. The first and third rows have second subpixel groups 12, and the second and fourth rows have first subpixel groups 11. Both the first and second subpixel groups 11 and 12 include three third subpixels 130. In each subpixel group, only the uppermost and lowermost third subpixels 130 have a chamfered α in their light-emitting areas. For example, the three third subpixels 130 in each subpixel group form a light-emitting layer using the same mask opening.

例如,如图5至图7所示,沿第二方向排列的子像素100中,最多两个第三子像素130紧邻,如相邻两个第一子像素110之间最多设置两个第三子像素130。例如,沿第二方向排列的子像素100中,最多两个第一子像素110紧邻,如相邻两个第三子像素130之间最多设置两个第一子像素110。例如,沿第二方向排列的子像素100中,最多两个第二子像素120紧邻,如相邻两个第三子像素130之间最多设置两个第二子像素120。For example, as shown in Figures 5 to 7, among the sub-pixels 100 arranged along the second direction, at most two third sub-pixels 130 are adjacent, such as having at most two third sub-pixels 130 between two adjacent first sub-pixels 110. Similarly, among the sub-pixels 100 arranged along the second direction, at most two first sub-pixels 110 are adjacent, such as having at most two first sub-pixels 110 between two adjacent third sub-pixels 130. Likewise, among the sub-pixels 100 arranged along the second direction, at most two second sub-pixels 120 are adjacent, such as having at most two second sub-pixels 120 between two adjacent third sub-pixels 130.

图8为根据本公开实施例的另一示例提供的像素排布结构。图9为形成图8所示像素排布结构的一种掩模板示意图。Figure 8 shows a pixel arrangement structure provided according to another example of an embodiment of the present disclosure. Figure 9 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 8.

在一些示例中,如图8和图9所示,沿第二方向排列的相邻两个子像素组10中的子像素100的发光区相对于位于相邻两个子像素组10之间且沿第一方向延伸的第一分隔线LB1对称分布,且沿第二方向排列的相邻两个子像素组10中的位于第一分隔线LB1两侧且与其紧邻的至少四个第三子像素130被配置为对应同一个掩模开口。图8所示像素排列结构与图2所示像素排列结构的不同之处在于沿第一方向排列的相邻两列子像素组10相对于第一分隔线镜像排布。In some examples, as shown in Figures 8 and 9, the light-emitting areas of sub-pixels 100 in two adjacent sub-pixel groups 10 arranged along the second direction are symmetrically distributed with respect to the first dividing line LB1 located between the two adjacent sub-pixel groups 10 and extending along the first direction. Furthermore, at least four third sub-pixels 130 located on both sides of and adjacent to the first dividing line LB1 in the two adjacent sub-pixel groups 10 arranged along the second direction are configured to correspond to the same mask opening. The pixel arrangement structure shown in Figure 8 differs from the pixel arrangement structure shown in Figure 2 in that the two adjacent columns of sub-pixel groups 10 arranged along the first direction are mirror images of each other with respect to the first dividing line.

例如,如图8和图9所示,像素排布结构中,PDL Gap为20微米,像素节距(pixel pitch)为100微米,Rib为32.9微米的情况下,第一子像素110的开口率为9.92%,第二子像素120的开口率为16.86%,第三子像素130的开口率为21.32%,总开口率为48.09%。图8所示像素排布结构相对于图1所示像素排布结构的开口率增加23.37%。For example, as shown in Figures 8 and 9, in a pixel arrangement structure with a PDL gap of 20 micrometers, a pixel pitch of 100 micrometers, and a Rib of 32.9 micrometers, the aperture ratio of the first sub-pixel 110 is 9.92%, the aperture ratio of the second sub-pixel 120 is 16.86%, the aperture ratio of the third sub-pixel 130 is 21.32%, and the total aperture ratio is 48.09%. The pixel arrangement structure shown in Figure 8 has an increased aperture ratio of 23.37% compared to the pixel arrangement structure shown in Figure 1.

相对于图1所示像素排布结构中采用同一个掩模开口形成两个蓝色子像素的发光层的情况,图8所示像素排布结构中像素节距以及PDL Gap没有改变的情况下,通过在用于形成第三子像素130的发光区的掩模开口的轮廓角设置为倒角,如直线倒角或者圆倒角的同时,将相邻两行或两列掩模开口错开分布,且将沿第二方向排列的相邻子像素组10中的子像素100镜像排布,有利于增大Rib,且增大掩模开口的尺寸,进而增大子像素100整体开口率,不仅便于实现更高PPI产品,提升产品寿命,还可以进一步降低掩模板的制作工艺难度。Compared to the pixel arrangement structure shown in Figure 1, where the same mask opening is used to form the light-emitting layers of two blue sub-pixels, the pixel arrangement structure shown in Figure 8, without changing the pixel pitch and PDL gap, allows for the following improvements: by setting the contour angle of the mask opening used to form the light-emitting area of the third sub-pixel 130 to a chamfer, such as a straight chamfer or a rounded chamfer, while simultaneously staggering the distribution of mask openings in adjacent rows or columns, and mirroring the sub-pixels 100 in adjacent sub-pixel groups 10 arranged along the second direction, it is beneficial to increase the Rib and the size of the mask opening, thereby increasing the overall aperture ratio of the sub-pixels 100. This not only facilitates the realization of higher PPI products and improves product lifespan but also further reduces the manufacturing difficulty of the mask template.

例如,如图8所示,第一子像素110的开口率、第二子像素120的开口率以及第三子像素130的开口率之比可以为1:(1.2~1.8):(2.3~2.8)。例如,第一子像素110的发光区在X方向和Y方向上的尺寸可以分别为22.22微米和37.41微米,第二子像素120的发光区在X方向和Y方向上的尺寸可以分别为37.78微米和37.41微米,第三子像素130的发光区在X方向和Y方向上的尺寸可以分别为85微米和22.59微米。For example, as shown in Figure 8, the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2~1.8):(2.3~2.8). For example, the dimensions of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 μm and 37.41 μm, respectively; the dimensions of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 μm and 37.41 μm, respectively; and the dimensions of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 μm and 22.59 μm, respectively.

例如,如图8所示,沿第二方向排列的相邻两个子像素组10中的第一子像素110相对于第一分隔线对称分布。例如,沿第二方向排列的相邻两个子像素组10中的第二子像素120相对于第一分隔线对称分布。例如,沿第二方向排列的相邻两个子像素组10中的第三子像素130相对于第一分隔线对称分布。For example, as shown in Figure 8, the first sub-pixel 110 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line. For example, the second sub-pixel 120 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line. For example, the third sub-pixel 130 in two adjacent sub-pixel groups 10 arranged along the second direction is symmetrically distributed with respect to the first dividing line.

例如,图8示意性地示出沿第二方向排列的相邻两个第三子像素130(该相邻两个第三子像素130之间没有设置其他子像素100)的发光区的彼此靠近的轮廓角均为倒角,但不限于此,该相邻两个第三子像素130的发光区可以仅彼此远离的轮廓角为倒角,彼此靠近的轮廓角可以为一般小于100度的角度,如直角。For example, Figure 8 schematically shows that the contour angles of the light-emitting areas of two adjacent third sub-pixels 130 arranged along the second direction (no other sub-pixels 100 are set between the two adjacent third sub-pixels 130) are chamfered when they are close to each other. However, it is not limited to this. The light-emitting areas of the two adjacent third sub-pixels 130 may only have chamfered contour angles when they are far apart from each other, and the contour angles when they are close to each other may be angles less than 100 degrees, such as right angles.

例如,如图8所示,彼此相邻的四个第三子像素130的发光区中彼此靠近的轮廓角可以均设置为小于100度,如直角。例如,彼此相邻的四个第三子像素130的发光区中可以仅在第一方向上和在第二方向上均位于最边缘的轮廓角设置为100~170度的倒角。For example, as shown in Figure 8, the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are close to each other can all be set to less than 100 degrees, such as right angles. For example, the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are located at the outermost edge in both the first and second directions can be set to chamfers of 100 to 170 degrees.

例如,图9示意性地示出每个第一子像素110的发光层采用一个掩模开口510形成,每个第二子像素120的发光层采用一个掩模开口520形成,四个第三子像素130的发光层采用一个掩模开口530形成。For example, Figure 9 schematically shows that the light-emitting layer of each first sub-pixel 110 is formed using a mask opening 510, the light-emitting layer of each second sub-pixel 120 is formed using a mask opening 520, and the light-emitting layers of the four third sub-pixels 130 are formed using a mask opening 530.

图10为形成图8所示像素排布结构的另一种掩模板示意图。Figure 10 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 8.

在一些示例中,如图8和图10所示,沿第二方向排列的相邻两个子像素组10中,位于第一分隔线两侧且与其紧邻的至少两个第一子像素110被配置为对应同一个掩模开口510,且位于第一分隔线两侧且与其紧邻的至少两个第二子像素120被配置为对应同一个掩模开口520。In some examples, as shown in Figures 8 and 10, in two adjacent sub-pixel groups 10 arranged along the second direction, at least two first sub-pixels 110 located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening 510, and at least two second sub-pixels 120 located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening 520.

通过在将四个第三子像素设置为对应同一个掩模开口的同时,将至少两个第一子像素设置为对应同一个掩模开口,且将至少两个第二子像素设置为对应同一个掩模开口,有利于进一步提高显示装置的整体开口率,且降低形成对应各颜色子像素的掩模板的工艺制作难度,且适应张网。By setting four third sub-pixels to correspond to the same mask opening, setting at least two first sub-pixels to correspond to the same mask opening, and setting at least two second sub-pixels to correspond to the same mask opening, it is beneficial to further improve the overall aperture ratio of the display device, reduce the manufacturing difficulty of forming the mask template corresponding to each color sub-pixel, and adapt to mesh printing.

图11为根据本公开实施例的另一示例提供的像素排布结构。图12为形成图11所示像素排布结构的一种掩模板示意图。Figure 11 shows a pixel arrangement structure according to another example of an embodiment of the present disclosure. Figure 12 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 11.

在一些示例中,如图11和图12所示,沿第二方向排列的相邻两个子像素组10中的子像素100的发光区相对于位于相邻两个子像素组10之间且沿第一方向延伸的第一分隔线LB1对称分布,且沿第二方向排列的相邻两个子像素组10中的位于第一分隔线两侧且与其紧邻的至少四个第三子像素130被配置为对应同一个掩模开口。同一子像素组10中包括N个第三子像素130,沿第一方向排列的第N/2个第三子像素130与第(N/2+1)个第三子像素130之间包括沿第二方向延伸的第二分隔线LB2;同一子像素组10中,子像素100的发光区相对于第二分隔线LB2对称分布,N为偶数。图11示意性地示出N为2,但不限于此,N可以为4,6或者其他偶数。In some examples, as shown in Figures 11 and 12, the light-emitting areas of sub-pixels 100 in two adjacent sub-pixel groups 10 arranged along the second direction are symmetrically distributed with respect to a first dividing line LB1 located between the two adjacent sub-pixel groups 10 and extending along the first direction. At least four third sub-pixels 130 located on both sides of and adjacent to the first dividing line in two adjacent sub-pixel groups 10 arranged along the second direction are configured to correspond to the same mask opening. Each sub-pixel group 10 includes N third sub-pixels 130, and a second dividing line LB2 extending along the second direction is included between the N/2th third sub-pixel 130 and the (N/2+1)th third sub-pixel 130 arranged along the first direction. In the same sub-pixel group 10, the light-emitting areas of sub-pixels 100 are symmetrically distributed with respect to the second dividing line LB2, and N is an even number. Figure 11 schematically shows N as 2, but is not limited to this; N can be 4, 6, or other even numbers.

图11所示像素排列结构与图8所示像素排列结构的不同之处在于沿第二方向排列的子像素100的发光区相对于第二分隔线镜像排布,如沿第一方向排列的相邻两个子像素组10的发光区沿第一分隔线和第二分隔线均对称分布。The pixel arrangement structure shown in Figure 11 differs from that shown in Figure 8 in that the light-emitting areas of the sub-pixels 100 arranged along the second direction are mirror images of the second dividing line. For example, the light-emitting areas of two adjacent sub-pixel groups 10 arranged along the first direction are symmetrically distributed along the first dividing line and the second dividing line.

例如,如图11和图12所示,像素排布结构中,PDL Gap为20微米,像素节距(pixel pitch)为100微米,Rib为26.2微米的情况下,第一子像素110的开口率为10.88%,第二子像素120的开口率为18.49%,第三子像素130的开口率为23.39%,总开口率为52.75%。图11所示像素排布结构相对于图1所示像素排布结构的开口率增加35.33%。图11所示像素排布结构相对于图8所示像素排布结构中,用于形成第三子像素130的发光层的掩模板的掩模条宽度Rib缩小,有利于在不影响掩模板制备工艺的情况下,提高子像素100的开口率。For example, as shown in Figures 11 and 12, in the pixel arrangement structure with a PDL gap of 20 micrometers, a pixel pitch of 100 micrometers, and a Rib of 26.2 micrometers, the aperture ratio of the first sub-pixel 110 is 10.88%, the aperture ratio of the second sub-pixel 120 is 18.49%, the aperture ratio of the third sub-pixel 130 is 23.39%, and the total aperture ratio is 52.75%. The pixel arrangement structure shown in Figure 11 has an aperture ratio that is 35.33% higher than that shown in Figure 1. Compared to the pixel arrangement structure shown in Figure 8, the pixel arrangement structure shown in Figure 11 has a smaller mask strip width Rib for the mask used to form the light-emitting layer of the third sub-pixel 130, which is beneficial for increasing the aperture ratio of the sub-pixel 100 without affecting the mask fabrication process.

相对于图1所示像素排布结构中采用同一个掩模开口形成两个蓝色子像素的发光层的情况,图11所示像素排布结构中像素节距以及PDL Gap没有改变的情况下,通过在用于形成第三子像素130的发光区的掩模开口的轮廓角设置为倒角,如直线倒角或者圆倒角的同时,将相邻两行或两列掩模开口错开分布,且将第二方向排列的相邻子像素组10中的子像素100镜像排布的同时,将同一子像素组10中的子像素100设置在沿第一方向镜像排布,有利于增大掩模开口的尺寸,进而增大子像素100整体开口率,不仅便于实现更高PPI产品,提升产品寿命,还可以进一步降低掩模板的制作工艺难度。Compared to the pixel arrangement structure shown in Figure 1, where the same mask opening is used to form the light-emitting layers of two blue sub-pixels, the pixel arrangement structure shown in Figure 11, without changing the pixel pitch and PDL gap, achieves a different result. By setting the contour angle of the mask opening used to form the light-emitting area of the third sub-pixel 130 to a chamfer, such as a straight chamfer or a rounded chamfer, while staggering the distribution of mask openings in adjacent rows or columns, and mirroring the sub-pixels 100 in adjacent sub-pixel groups 10 arranged in the second direction, while mirroring the sub-pixels 100 in the same sub-pixel group 10 along the first direction, it is beneficial to increase the size of the mask opening, thereby increasing the overall aperture ratio of the sub-pixels 100. This not only facilitates the realization of higher PPI products and improves product lifespan, but also further reduces the manufacturing difficulty of the mask template.

例如,如图11所示,第一子像素110的开口率、第二子像素120的开口率以及第三子像素130的开口率之比可以为1:(1.2~1.8):(2.3~2.8)。例如,第一子像素110的发光区在X方向和Y方向上的尺寸可以分别为22.22微米和37.41微米,第二子像素120的发光区在X方向和Y方向上的尺寸可以分别为37.78微米和37.41微米,第三子像素130的发光区在X方向和Y方向上的尺寸可以分别为85微米和22.59微米。For example, as shown in Figure 11, the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2~1.8):(2.3~2.8). For example, the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 22.22 μm and 37.41 μm, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 37.78 μm and 37.41 μm, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 85 μm and 22.59 μm, respectively.

例如,如图11所示,同一子像素组10中,沿第一方向排列的第一子像素110的发光区相对于第二分隔线对称分布,沿第一方向排列的第二子像素120的发光区相对于第二分隔线对称分布,沿第一方向排列的第三子像素130的发光区相对于第二分隔线对称分布。For example, as shown in Figure 11, in the same sub-pixel group 10, the light-emitting area of the first sub-pixel 110 arranged along the first direction is symmetrically distributed with respect to the second dividing line, the light-emitting area of the second sub-pixel 120 arranged along the first direction is symmetrically distributed with respect to the second dividing line, and the light-emitting area of the third sub-pixel 130 arranged along the first direction is symmetrically distributed with respect to the second dividing line.

例如,图11示意性地示出沿第二方向排列的相邻两个第三子像素130(该相邻两个第三子像素130之间没有设置其他子像素100)的发光区的彼此靠近的轮廓角均为倒角,但不限于此,该相邻两个第三子像素130的发光区可以仅彼此远离的轮廓角为倒角,彼此靠近的轮廓角可以为一般小于100度的角度,如直角。For example, Figure 11 schematically shows that the contour angles of the light-emitting areas of two adjacent third sub-pixels 130 arranged along the second direction (no other sub-pixels 100 are set between the two adjacent third sub-pixels 130) are chamfered when they are close to each other. However, it is not limited to this. The light-emitting areas of the two adjacent third sub-pixels 130 may only have chamfered contour angles when they are far apart from each other, and the contour angles when they are close to each other may be angles less than 100 degrees, such as right angles.

例如,如图11所示,彼此相邻的四个第三子像素130的发光区中彼此靠近的轮廓角可以均设置为小于100度,如直角。例如,彼此相邻的四个第三子像素130的发光区中可以仅在第一方向上和在第二方向上均位于最边缘的轮廓角设置为100~170度的倒角。For example, as shown in Figure 11, the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are close to each other can all be set to less than 100 degrees, such as right angles. For example, the contour angles of the light-emitting areas of four adjacent third sub-pixels 130 that are located at the outermost edge in both the first and second directions can be set to chamfers of 100 to 170 degrees.

例如,图12示意性地示出每个第一子像素110的发光层采用一个掩模开口510形成,每个第二子像素120的发光层采用一个掩模开口520形成,四个第三子像素130的发光层采用一个掩模开口530形成。For example, Figure 12 schematically shows that the light-emitting layer of each first sub-pixel 110 is formed using a mask opening 510, the light-emitting layer of each second sub-pixel 120 is formed using a mask opening 520, and the light-emitting layers of the four third sub-pixels 130 are formed using a mask opening 530.

图13为形成图11所示像素排布结构的另一种掩模板示意图。Figure 13 is a schematic diagram of another mask template for forming the pixel arrangement structure shown in Figure 11.

在一些示例中,如图11和图13所示,同一个子像素组10中,至少两个第一子像素110和至少两个第二子像素120的至少一种对应同一个掩模开口。In some examples, as shown in Figures 11 and 13, in the same sub-pixel group 10, at least two first sub-pixels 110 and at least two second sub-pixels 120 correspond to the same mask opening.

例如,如图11和图13所示,同一个子像素组10中,两个第一子像素110对应同一个掩模开口或者两个第二子像素120对应同一个掩模开口。For example, as shown in Figures 11 and 13, in the same sub-pixel group 10, two first sub-pixels 110 correspond to the same mask opening or two second sub-pixels 120 correspond to the same mask opening.

例如,如图11和图13所示,沿第二方向排列的多个子像素组10中,四个第一子像素110对应同一个掩模开口,两个第二子像素120对应同一个掩模开口;或者,两个第一子像素110对应同一个掩模开口,四个第二子像素120对应同一个掩模开口。例如,沿第二方向排列的相邻两个子像素组10中,两个第一子像素110或者两个第二子像素120对应同一个掩模开口,四个第三子像素130对应同一个掩模开口。例如,沿第二方向排列的相邻两个子像素组10中,两个第一子像素110对应同一个掩模开口,四个第二子像素120对应同一个掩模开口;或者两个第二子像素120对应同一个掩模开口,四个第一子像素110对应同一个掩模开口。For example, as shown in Figures 11 and 13, in a plurality of sub-pixel groups 10 arranged along the second direction, four first sub-pixels 110 correspond to the same mask opening, and two second sub-pixels 120 correspond to the same mask opening; or, two first sub-pixels 110 correspond to the same mask opening, and four second sub-pixels 120 correspond to the same mask opening. For example, in two adjacent sub-pixel groups 10 arranged along the second direction, two first sub-pixels 110 or two second sub-pixels 120 correspond to the same mask opening, and four third sub-pixels 130 correspond to the same mask opening. For example, in two adjacent sub-pixel groups 10 arranged along the second direction, two first sub-pixels 110 correspond to the same mask opening, and four second sub-pixels 120 correspond to the same mask opening; or two second sub-pixels 120 correspond to the same mask opening, and four first sub-pixels 110 correspond to the same mask opening.

通过在将四个第三子像素设置为对应同一个掩模开口的同时,将至少两个第一子像素设置为对应同一个掩模开口,且将至少两个第二子像素设置为对应同一个掩模开口,有利于进一步提高显示装置的整体开口率,且降低形成对应各颜色子像素的掩模板的工艺制作难度,且适应张网。By setting four third sub-pixels to correspond to the same mask opening, setting at least two first sub-pixels to correspond to the same mask opening, and setting at least two second sub-pixels to correspond to the same mask opening, it is beneficial to further improve the overall aperture ratio of the display device, reduce the manufacturing difficulty of forming the mask template corresponding to each color sub-pixel, and adapt to mesh printing.

图14为根据本公开实施例的另一示例提供的像素排布结构。图15为形成图14所示像素排布结构的一种掩模板示意图。图14所示像素排布结构与图2所示像素排布结构的主要区别在于各子像素100的发光区的形状不同。Figure 14 shows a pixel arrangement structure according to another example of an embodiment of the present disclosure. Figure 15 is a schematic diagram of a mask for forming the pixel arrangement structure shown in Figure 14. The main difference between the pixel arrangement structure shown in Figure 14 and the pixel arrangement structure shown in Figure 2 is that the shape of the light-emitting area of each sub-pixel 100 is different.

在一些示例中,如图14所示,第三子像素130的发光区包括沿第一方向延伸的至少一条第一边1011,且第一子像素110的发光区和第二子像素120的发光区中与第一边1011紧邻的边1021和1031的延伸方向均与第一方向相交。例如,图14示意性地示出第三子像素130的发光区包括沿第一方向延伸的一条第一边1011,但不限于此,第三子像素130的发光区还可以包括沿第一方向延伸的两条第一边1011或者三条第一边1011等,可以根据产品需求进行设置。In some examples, as shown in Figure 14, the light-emitting area of the third sub-pixel 130 includes at least one first side 1011 extending along a first direction, and the extension directions of the sides 1021 and 1031 adjacent to the first side 1011 in the light-emitting areas of the first sub-pixel 110 and the second sub-pixel 120 both intersect with the first direction. For example, Figure 14 schematically shows that the light-emitting area of the third sub-pixel 130 includes one first side 1011 extending along the first direction, but it is not limited to this. The light-emitting area of the third sub-pixel 130 may also include two or three first sides 1011 extending along the first direction, etc., which can be set according to product requirements.

通过对第三子像素的发光区的边及其紧邻的第一子像素以及第三子像素的发光区的边的延伸方向的设置,有利于在改善混色,防止色偏,增加环境光对比度(Ambient Contrast Ratio,ACR),防止反射,从而提高显示画质。By setting the extension direction of the edge of the light-emitting area of the third sub-pixel and the edge of the light-emitting area of the adjacent first sub-pixel and the third sub-pixel, it is beneficial to improve color mixing, prevent color shift, increase ambient light contrast ratio (ACR), prevent reflection, and thus improve display quality.

在一些示例中,如图14所示,同一子像素组10中,第一子像素110的发光区中与第一边1011紧邻的边1021和第二子像素120的发光区中与第一边1011紧邻的边1031的延伸方向均与第一边的延伸方向相交。In some examples, as shown in Figure 14, in the same sub-pixel group 10, the extension directions of the edge 1021 in the light-emitting area of the first sub-pixel 110 that is adjacent to the first edge 1011 and the edge 1031 in the light-emitting area of the second sub-pixel 120 that is adjacent to the first edge 1011 both intersect with the extension direction of the first edge.

例如,如图14所示,第三子像素130的发光区的第一边1011和与其紧邻的第一子像素110的发光区的边1021以及第二子像素120的发光区的边1031之间可以设置隔垫物(PS)以支撑精细金属掩模板。For example, as shown in Figure 14, spacers (PS) can be provided between the first edge 1011 of the light-emitting area of the third sub-pixel 130 and the edge 1021 of the light-emitting area of the adjacent first sub-pixel 110 and the edge 1031 of the light-emitting area of the second sub-pixel 120 to support the fine metal mask.

在一些示例中,如图14所示,第三子像素130的发光区包括沿第一方向延伸的至少一条第一边1011,同一子像素组10中,至少相邻的两个第三子像素130的发光区的第一边1011与第一子像素110的发光区中沿第一方向延伸的中心线之间的距离不同。In some examples, as shown in FIG14, the light-emitting area of the third sub-pixel 130 includes at least one first side 1011 extending along the first direction. In the same sub-pixel group 10, the distance between the first side 1011 of the light-emitting area of at least two adjacent third sub-pixels 130 and the center line extending along the first direction in the light-emitting area of the first sub-pixel 110 is different.

通过对同一子像素中不同第三子像素的发光区中第一边的位置设置,有利于改善显示不均的问题。By setting the position of the first side in the light-emitting area of different third sub-pixels within the same sub-pixel, it is beneficial to improve the problem of uneven display.

例如,如图14所示,同一子像素组10包括两个第三子像素130,一个第三子像素130的发光区中第一边1011所在直线不经过另一个第三子像素130的发光区中第一边1011。当然,本公开实施例不限于同一子像素组10包括两个第三子像素130,如包括三个或者三个以上第三子像素130,其中相邻的两个第三子像素130中第一边1011可以按照上述方式设置。For example, as shown in Figure 14, the same sub-pixel group 10 includes two third sub-pixels 130. The straight line containing the first side 1011 in the light-emitting area of one third sub-pixel 130 does not pass through the first side 1011 in the light-emitting area of the other third sub-pixel 130. Of course, the embodiments of this disclosure are not limited to the same sub-pixel group 10 including two third sub-pixels 130. For example, it may include three or more third sub-pixels 130, wherein the first side 1011 of two adjacent third sub-pixels 130 can be set in the manner described above.

在一些示例中,如图14所示,同一子像素组10中,至少相邻的两个第三子像素130之一的第一边1011靠近其所在子像素组10中的第一子像素110和第二子像素120,上述至少相邻的两个第三子像素130中的另一个的第一边1011远离其所在子像素组10中的第一子像素110和第二子像素120。In some examples, as shown in Figure 14, in the same sub-pixel group 10, the first side 1011 of one of at least two adjacent third sub-pixels 130 is close to the first sub-pixel 110 and the second sub-pixel 120 in its sub-pixel group 10, while the first side 1011 of the other of the aforementioned at least two adjacent third sub-pixels 130 is far away from the first sub-pixel 110 and the second sub-pixel 120 in its sub-pixel group 10.

例如,如图14所示,同一子像素组10包括两个第三子像素130,两个第三子像素130之一的发光区中的第一边1011靠近其所在子像素组10中的第一子像素110的发光区,两个第三子像素130中的另一个的发光区中的第一边1011靠近相邻子像素组10中的第一子像素110的发光区。For example, as shown in Figure 14, the same sub-pixel group 10 includes two third sub-pixels 130. The first side 1011 of the light-emitting area of one of the two third sub-pixels 130 is close to the light-emitting area of the first sub-pixel 110 in the sub-pixel group 10 to which it belongs. The first side 1011 of the light-emitting area of the other of the two third sub-pixels 130 is close to the light-emitting area of the first sub-pixel 110 in the adjacent sub-pixel group 10.

在一些示例中,如图14所示,第三子像素130的发光区还包括彼此连接的第二边1012和第三边1013,第二边1012和与其紧邻的第一子像素110的发光区的边之间的角度不大于5度,第三边1013和与其紧邻的第二子像素120的发光区的边之间的角度不大于5度,且第一边1011和第二边1012位于第三子像素130的发光区的中心在第二方向上的两侧。In some examples, as shown in Figure 14, the light-emitting area of the third sub-pixel 130 also includes a second side 1012 and a third side 1013 connected to each other. The angle between the second side 1012 and the edge of the light-emitting area of the first sub-pixel 110 adjacent to it is no greater than 5 degrees, and the angle between the third side 1013 and the edge of the light-emitting area of the second sub-pixel 120 adjacent to it is no greater than 5 degrees. The first side 1011 and the second side 1012 are located on both sides of the center of the light-emitting area of the third sub-pixel 130 in the second direction.

通过对第三子像素的发光区的边及其紧邻的第一子像素以及第三子像素的发光区的边的延伸方向的设置,有利于在改善混色,防止色偏,By setting the extension direction of the edge of the light-emitting area of the third sub-pixel and the edge of the light-emitting area of its adjacent first sub-pixel, it is beneficial to improve color mixing and prevent color shift.

例如,如图14所示,第三子像素130的发光区的第二边1012和与其紧邻的第一子像素110的发光区的边平行,第三子像素130的发光区的第三边1013和与其紧邻的第二子像素120的发光区的边平行。For example, as shown in Figure 14, the second side 1012 of the light-emitting area of the third sub-pixel 130 is parallel to the side of the light-emitting area of the first sub-pixel 110 that is adjacent to it, and the third side 1013 of the light-emitting area of the third sub-pixel 130 is parallel to the side of the light-emitting area of the second sub-pixel 120 that is adjacent to it.

例如,如图14所示,第三子像素130的发光区还包括分别与第一边1011的两端连接的第四边1014和第五边1015,第四边1014和与其紧邻的第一子像素110的发光区的边之间的角度不大于5度,第五边1015和与其紧邻的第二子像素120的发光区的边之间的角度不大于5度。例如,第四边1014和与其紧邻的第一子像素110的发光区的边平行,第五边1015和与其紧邻的第二子像素120的发光区的边平行。For example, as shown in Figure 14, the light-emitting area of the third sub-pixel 130 also includes a fourth side 1014 and a fifth side 1015 connected to both ends of the first side 1011, respectively. The angle between the fourth side 1014 and the edge of the light-emitting area of the adjacent first sub-pixel 110 is no greater than 5 degrees, and the angle between the fifth side 1015 and the edge of the light-emitting area of the adjacent second sub-pixel 120 is no greater than 5 degrees. For example, the fourth side 1014 is parallel to the edge of the light-emitting area of the adjacent first sub-pixel 110, and the fifth side 1015 is parallel to the edge of the light-emitting area of the adjacent second sub-pixel 120.

例如,如图15所示,同一子像素组10中,两个第三子像素130的发光层由同一个掩模开口530形成,两个第一子像素110的发光层由两个掩模开口510形成,两个第二子像素120的发光层由两个掩模开口520形成。For example, as shown in Figure 15, in the same sub-pixel group 10, the light-emitting layers of the two third sub-pixels 130 are formed by the same mask opening 530, the light-emitting layers of the two first sub-pixels 110 are formed by two mask openings 510, and the light-emitting layers of the two second sub-pixels 120 are formed by two mask openings 520.

例如,图14所示像素排布结构的开口率大于60%,有利于提升产品寿命。For example, the aperture ratio of the pixel arrangement structure shown in Figure 14 is greater than 60%, which is beneficial to improving product lifespan.

例如,如图14所示,第一子像素110的开口率、第二子像素120的开口率以及第三子像素130的开口率之比可以为1:(1.2~1.8):(2.3~2.8)。例如,第一子像素110的发光区在X方向和Y方向上的尺寸可以分别为53.81微米和50微米,第二子像素120的发光区在X方向和Y方向上的尺寸可以分别为60微米和53.81微米,第三子像素130的发光区在X方向和Y方向上的尺寸可以分别为137.58微米和91.96微米。For example, as shown in Figure 14, the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2~1.8):(2.3~2.8). For example, the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 53.81 micrometers and 50 micrometers, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 60 micrometers and 53.81 micrometers, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 137.58 micrometers and 91.96 micrometers, respectively.

图14示意性地示出像素排列方式与图2所示像素排列方式相同,但不限于此,图14所示像素排列方式还可以采用图5至图7、图8或图11所示像素排列方式,以进一步增大开口率,提升产品的寿命。Figure 14 schematically shows the same pixel arrangement as that shown in Figure 2, but it is not limited to this. The pixel arrangement shown in Figure 14 can also adopt the pixel arrangement shown in Figures 5 to 7, Figure 8 or Figure 11 to further increase the aperture ratio and improve the product life.

图16为一种像素电路的等效电路示意图。如图16所示,像素电路可以包括8个晶体管(第一晶体管T1至第八晶体管T8)和1个存储电容C,像素电路分别与9条信号线(第一扫描信号线S1、第二扫描信号线S2、第三扫描信号线S3、发光信号线EM、第一初始信号线INIT1、第二初始信号线INIT2、第三初始信号线INIT3、数据信号线DATA和第一电源线VDD)连接。Figure 16 is an equivalent circuit diagram of a pixel circuit. As shown in Figure 16, the pixel circuit may include eight transistors (first transistor T1 to eighth transistor T8) and one storage capacitor C. The pixel circuit is connected to nine signal lines (first scan signal line S1, second scan signal line S2, third scan signal line S3, light emission signal line EM, first initial signal line INIT1, second initial signal line INIT2, third initial signal line INIT3, data signal line DATA, and first power supply line VDD).

例如,像素电路可以包括第一节点N1、第二节点N2、第三节点N3和第四节点N4。例如,第一节点N1分别与第一晶体管T1的第二极、第二晶体管T2的第一极、第三晶体管T3的栅电极和存储电容C的第一端连接,第二节点N2分别与第三晶体管T3的第一极、第四晶体管T4的第二极、第五晶体管T5的第二极和第八晶体管T8的第二极连接,第三节点N3分别与第二晶体管T2的第二极、第三晶体管T3的第二极和第六晶体管T6的第一极连接,第四节点N4分别与第六晶体管T6的第二极和第七晶体管T7的第二极连接。For example, a pixel circuit may include a first node N1, a second node N2, a third node N3, and a fourth node N4. For example, the first node N1 is connected to the second terminal of the first transistor T1, the first terminal of the second transistor T2, the gate electrode of the third transistor T3, and the first terminal of the storage capacitor C, respectively; the second node N2 is connected to the first terminal of the third transistor T3, the second terminal of the fourth transistor T4, the second terminal of the fifth transistor T5, and the second terminal of the eighth transistor T8, respectively; the third node N3 is connected to the second terminal of the second transistor T2, the second terminal of the third transistor T3, and the first terminal of the sixth transistor T6, respectively; and the fourth node N4 is connected to the second terminal of the sixth transistor T6 and the second terminal of the seventh transistor T7, respectively.

例如,存储电容C的第一端与第一节点N1连接,存储电容C的第二端与第一电源线VDD连接。For example, the first end of the storage capacitor C is connected to the first node N1, and the second end of the storage capacitor C is connected to the first power line VDD.

例如,第一晶体管T1可以称为第一初始化晶体管,第一晶体管T1的栅电极与第三扫描信号线S3连接,第一晶体管T1的第一极与第一初始信号线INIT1连接,第一晶体管T1的第二极与第一节点N1连接。For example, the first transistor T1 can be called the first initialization transistor. The gate electrode of the first transistor T1 is connected to the third scan signal line S3, the first electrode of the first transistor T1 is connected to the first initial signal line INIT1, and the second electrode of the first transistor T1 is connected to the first node N1.

例如,第二晶体管T2可以称为补偿晶体管,第二晶体管T2的栅电极与第一扫描信号线S1连接,第二晶体管T2的第一极与第一节点N1连接,第二晶体管T2的第二极与第三节点N3连接。For example, the second transistor T2 can be called a compensation transistor. The gate electrode of the second transistor T2 is connected to the first scan signal line S1, the first electrode of the second transistor T2 is connected to the first node N1, and the second electrode of the second transistor T2 is connected to the third node N3.

例如,第三晶体管T3可以称为驱动晶体管,第三晶体管T3的栅电极与第一节点N1连接,第三晶体管T3的第一极与第二节点N2连接,第三晶体管T3的第二极与第三节点N3连接。For example, the third transistor T3 can be called the driving transistor. The gate electrode of the third transistor T3 is connected to the first node N1, the first electrode of the third transistor T3 is connected to the second node N2, and the second electrode of the third transistor T3 is connected to the third node N3.

例如,第四晶体管T4可以称为数据写入晶体管,第四晶体管T4的栅电极与第一扫描信号线S1连接,第四晶体管T4的第一极与数据信号线DATA连接,第四晶体管T4的第二极与第二节点N2连接。For example, the fourth transistor T4 can be called a data writing transistor. The gate electrode of the fourth transistor T4 is connected to the first scan signal line S1, the first electrode of the fourth transistor T4 is connected to the data signal line DATA, and the second electrode of the fourth transistor T4 is connected to the second node N2.

例如,第五晶体管T5可以称为第一发光控制晶体管,第五晶体管T5的栅电极与发光信号线EM连接,第五晶体管T5的第一极与第一电源线VDD连接,第五晶体管T5的第二极与第二节点N2连接。For example, the fifth transistor T5 can be called the first light-emitting control transistor. The gate electrode of the fifth transistor T5 is connected to the light-emitting signal line EM, the first electrode of the fifth transistor T5 is connected to the first power supply line VDD, and the second electrode of the fifth transistor T5 is connected to the second node N2.

例如,第六晶体管T6可以称为第二发光控制晶体管,第六晶体管T6的栅电极与发光信号线EM连接,第六晶体管T6的第一极与第三节点N3连接,第六晶体管T6的第二极与第四节点N4连接。For example, the sixth transistor T6 can be called the second light-emitting control transistor. The gate electrode of the sixth transistor T6 is connected to the light-emitting signal line EM. The first electrode of the sixth transistor T6 is connected to the third node N3. The second electrode of the sixth transistor T6 is connected to the fourth node N4.

例如,第七晶体管T7可以称为第二初始化晶体管,第七晶体管T7的栅电极与第二扫描信号线S2连接,第七晶体管T7的第一极与第二初始信号线INIT2连接,第七晶体管T7的第二极与第四节点N4连接。For example, the seventh transistor T7 can be called the second initialization transistor. The gate electrode of the seventh transistor T7 is connected to the second scan signal line S2, the first electrode of the seventh transistor T7 is connected to the second initial signal line INIT2, and the second electrode of the seventh transistor T7 is connected to the fourth node N4.

例如,第八晶体管T8可以称为第三初始化晶体管,第八晶体管T8的栅电极与第二扫描信号线S2连接,第八晶体管T8的第一极与第三初始信号线INIT3连接,第八晶体管T8的第二极与第二节点N2连接。For example, the eighth transistor T8 can be called the third initialization transistor. The gate electrode of the eighth transistor T8 is connected to the second scan signal line S2, the first electrode of the eighth transistor T8 is connected to the third initial signal line INIT3, and the second electrode of the eighth transistor T8 is connected to the second node N2.

例如,发光器件EL的第一极与第四节点N4连接,发光器件EL的第二极与第二电源线VSS连接。发光器件EL可以是OLED,包括叠设的第一极(阳极)、有机发光层和第二极(阴极),或者可以是QLED,包括叠设的第一极(阳极)、量子点发光层和第二极(阴极)。For example, the first electrode of the light-emitting device EL is connected to the fourth node N4, and the second electrode of the light-emitting device EL is connected to the second power line VSS. The light-emitting device EL can be an OLED, including a stacked first electrode (anode), an organic light-emitting layer, and a second electrode (cathode), or it can be a QLED, including a stacked first electrode (anode), a quantum dot light-emitting layer, and a second electrode (cathode).

例如,第一电源线VDD的信号为持续提供的高电平信号,第二电源线VSS的信号为持续提供的低电平信号。For example, the signal of the first power line VDD is a continuously supplied high-level signal, and the signal of the second power line VSS is a continuously supplied low-level signal.

例如,第一晶体管T1至第八晶体管T8可以是P型晶体管,或者可以是N型晶体管。像素电路中采用相同类型的晶体管可以简化工艺流程,减少显示面板的工艺难度,提高产品的良率。在一些可能的实现方式中,第一晶体管T1至第八晶体管T8可以包括P型晶体管和N型晶体管。For example, transistors T1 through T8 can be either P-type or N-type transistors. Using the same type of transistor in the pixel circuit simplifies the manufacturing process, reduces the complexity of the display panel manufacturing, and improves product yield. In some possible implementations, transistors T1 through T8 may include both P-type and N-type transistors.

例如,第一晶体管T1至第八晶体管T8可以采用低温多晶硅晶体管,或者可以采用氧化物晶体管,或者可以采用低温多晶硅晶体管和氧化物晶体管。低温多晶硅晶体管的有源层采用低温多晶硅(Low Temperature Poly-Silicon,简称LTPS),氧化物晶体管的有源层采用氧化物半导体(Oxide)。低温多晶硅晶体管具有迁移率高、充电快等优点,氧化物晶体管具有漏电流低等优点,将低温多晶硅晶体管和氧化物晶体管集成在一个显示基板上,形成低温多晶氧化物(Low Temperature Polycrystalline Oxide,简称LTPO)显示基板,可以利用两者的优势,实现低频驱动,以降低功耗,从而提高显示品质。For example, transistors T1 through T8 can be low-temperature polycrystalline silicon (LTPS) transistors, oxide transistors, or a combination of both. The active layer of the LTPS transistor is made of LTPS, while the active layer of the oxide transistor is made of oxide. LTPS transistors offer advantages such as high mobility and fast charging, while oxide transistors offer advantages such as low leakage current. Integrating LTPS and oxide transistors onto a single display substrate forms a low-temperature polycrystalline oxide (LTPO) display substrate. This leverages the advantages of both to achieve low-frequency driving, thereby reducing power consumption and improving display quality.

图17A至图17F为显示基板中不同膜层的示意图。Figures 17A to 17F are schematic diagrams of different film layers in a display substrate.

例如,如图17A所示,半导体层包括第一晶体管T1至第八晶体管T8的有源层以及第一初始信号线041,且第一晶体管T1至第七晶体管T7的有源层以及第一初始信号线041为相互连接的一体结构,第八晶体管T8的有源层可以单独设置。图17A所示第一晶体管T1至第八晶体管T8圈出来的位置为半导体层与栅极金属层层叠的位置。For example, as shown in Figure 17A, the semiconductor layer includes the active layers of the first transistor T1 to the eighth transistor T8 and the first initial signal line 041. The active layers of the first transistor T1 to the seventh transistor T7 and the first initial signal line 041 are interconnected as a single structure, while the active layer of the eighth transistor T8 can be disposed separately. The circled positions of the first transistor T1 to the eighth transistor T8 in Figure 17A indicate the positions where the semiconductor layer and the gate metal layer are stacked.

例如,如图17B所示,第一导电图案层包括第一栅电极021、第二栅电极022、第四栅电极024、第二扫描信号线032、发光信号线034和存储电容的第一极板081。例如,第一导电图案层位于半导体层远离衬底基板的一侧,且第一导电图案层与半导体层之间设置有绝缘层。For example, as shown in FIG17B, the first conductive pattern layer includes a first gate electrode 021, a second gate electrode 022, a fourth gate electrode 024, a second scan signal line 032, a light emission signal line 034, and a first electrode 081 of a storage capacitor. For example, the first conductive pattern layer is located on the side of the semiconductor layer away from the substrate, and an insulating layer is disposed between the first conductive pattern layer and the semiconductor layer.

例如,如图17B所示,第一极板081在衬底基板上的正投影与第三晶体管T3的有源层在衬底基板上的正投影至少部分交叠。例如,第一极板081可以同时作为存储电容的一个极板和第三晶体管T3的栅电极。例如,第一栅电极021在衬底基板上的正投影与第一晶体管的有源层在衬底基板上的正投影至少部分交叠,第一栅电极021与第一晶体管的有源层相重叠的区域可以作为双栅结构的第一晶体管T1的栅电极。在示例性实施方式中,第一栅电极21被配置为与后续形成的第三扫描信号线连接。For example, as shown in FIG17B, the orthographic projection of the first electrode 081 on the substrate at least partially overlaps with the orthographic projection of the active layer of the third transistor T3 on the substrate. For example, the first electrode 081 can simultaneously serve as an electrode of a storage capacitor and a gate electrode of the third transistor T3. For example, the orthographic projection of the first gate electrode 021 on the substrate at least partially overlaps with the orthographic projection of the active layer of the first transistor on the substrate, and the region where the first gate electrode 021 overlaps with the active layer of the first transistor can serve as the gate electrode of the first transistor T1 in a dual-gate structure. In an exemplary embodiment, the first gate electrode 21 is configured to be connected to a subsequently formed third scan signal line.

例如,如图17B所示,第二栅电极022在衬底基板上的正投影与第二晶体管的有源层在衬底基板上的正投影至少部分交叠,第二栅电极022与第二晶体管的有源层相重叠的区域可以作为双栅结构的第二晶体管T2的栅电极。例如,第二栅电极022被配置为与后续形成的第一扫描信号线连接。For example, as shown in FIG17B, the orthographic projection of the second gate electrode 022 on the substrate at least partially overlaps with the orthographic projection of the active layer of the second transistor on the substrate. The region where the second gate electrode 022 overlaps with the active layer of the second transistor can serve as the gate electrode of the second transistor T2 with a dual-gate structure. For example, the second gate electrode 022 is configured to be connected to a subsequently formed first scan signal line.

例如,如图17B所示,第四栅电极024在衬底基板上的正投影与第四晶体管的有源层在衬底基板上的正投影至少部分交叠,第四栅电极024与第四晶体管的有源层相重叠的区域可以作为第四晶体管T4的栅电极。例如,第四栅电极024被配置为与后续形成的第一扫描信号线连接。For example, as shown in FIG17B, the orthographic projection of the fourth gate electrode 024 on the substrate at least partially overlaps with the orthographic projection of the active layer of the fourth transistor on the substrate. The region where the fourth gate electrode 024 overlaps with the active layer of the fourth transistor can serve as the gate electrode of the fourth transistor T4. For example, the fourth gate electrode 024 is configured to be connected to a subsequently formed first scan signal line.

例如,如图17B所示,第二扫描信号线032与第七晶体管的有源层相重叠的区域可以作为第七晶体管T7的栅电极,第二扫描信号线032与第八晶体管的有源层相重叠的区域可以作为第八晶体管T8的栅电极。For example, as shown in Figure 17B, the region where the second scan signal line 032 overlaps with the active layer of the seventh transistor can be used as the gate electrode of the seventh transistor T7, and the region where the second scan signal line 032 overlaps with the active layer of the eighth transistor can be used as the gate electrode of the eighth transistor T8.

例如,如图17B所示,发光信号线034可以位于第一极板081与第二扫描信号线032之间,发光信号线034与第五晶体管的有源层相重叠的区域可以作为第五晶体管T5的栅电极,发光信号线034与第六晶体管的有源层相重叠的区域可以作为第六晶体管T6的栅电极。For example, as shown in Figure 17B, the light-emitting signal line 034 can be located between the first electrode plate 081 and the second scan signal line 032. The area where the light-emitting signal line 034 overlaps with the active layer of the fifth transistor can be used as the gate electrode of the fifth transistor T5. The area where the light-emitting signal line 034 overlaps with the active layer of the sixth transistor can be used as the gate electrode of the sixth transistor T6.

例如,如图17C所示,第二导电图案层包括存储电容的第二极板082和屏蔽电极035。例如,第二导电图案层位于第一导电图案层远离半导体层的一侧,且第二导电图案层与第一导电图案层之间设置有绝缘层。For example, as shown in FIG17C, the second conductive pattern layer includes a second electrode 082 for a storage capacitor and a shielding electrode 035. For example, the second conductive pattern layer is located on the side of the first conductive pattern layer away from the semiconductor layer, and an insulating layer is disposed between the second conductive pattern layer and the first conductive pattern layer.

例如,如图17B和图17C所示,第二极板082在衬底基板上的正投影与第一极板081在衬底基板上的正投影至少部分交叠,第二极板082可以作为存储电容的另一个极板,第一极板081和第二极板082构成像素电路的存储电容。例如,第二极板082可以设置有板级连接条083。由于每个电路单元中的第二极板082与后续形成的第一电源线连接,通过将相邻电路单元的第二极板082相互连接,第二极板082和板级连接条083可以复用为电源信号线,可以保证一单元行中的多个第二极板具有相同的电位,有利于提高面板的均一性,避免显示基板的显示不良,保证显示基板的显示效果。For example, as shown in Figures 17B and 17C, the orthographic projection of the second electrode plate 082 on the substrate at least partially overlaps with the orthographic projection of the first electrode plate 081 on the substrate. The second electrode plate 082 can serve as another electrode plate of a storage capacitor, and the first electrode plate 081 and the second electrode plate 082 constitute the storage capacitor of the pixel circuit. For example, the second electrode plate 082 can be provided with a board-level connecting strip 083. Since the second electrode plate 082 in each circuit unit is connected to the subsequently formed first power line, by connecting the second electrode plates 082 of adjacent circuit units to each other, the second electrode plate 082 and the board-level connecting strip 083 can be multiplexed as power signal lines. This ensures that multiple second electrode plates in a unit row have the same potential, which is beneficial to improving the uniformity of the panel, avoiding display defects in the display substrate, and ensuring the display effect of the display substrate.

例如,如图17C所示,第二极板082上设置有开口084,开口084暴露出覆盖第一极板081的绝缘层,且第一极板081在衬底基板上的正投影包含开口084在衬底基板上的正投影,开口084被配置为容置后续形成的过孔,过孔位于开口084内并暴露出第一极板081,使后续形成的连接电极312与第一极板081连接。For example, as shown in FIG17C, the second electrode plate 082 is provided with an opening 084, the opening 084 exposes the insulating layer covering the first electrode plate 081, and the orthographic projection of the first electrode plate 081 on the substrate includes the orthographic projection of the opening 084 on the substrate. The opening 084 is configured to accommodate a via formed subsequently. The via is located in the opening 084 and exposes the first electrode plate 081, so that the connecting electrode 312 formed subsequently is connected to the first electrode plate 081.

例如,如图17C所示,屏蔽电极035在衬底基板上的正投影与第二晶体管T2的两个栅电极之间的有源层(两个栅电极之间的节点)在衬底基板上的正投影至少部分交叠。例如,屏蔽电极035被配置为屏蔽数据电压跳变对第一晶体管T1和第二晶体管T2的影响,避免数据电压跳变影响像素电路的正常工作,提高显示效果。For example, as shown in Figure 17C, the orthographic projection of the shielding electrode 035 on the substrate at least partially overlaps with the orthographic projection of the active layer (the node between the two gate electrodes) of the second transistor T2 on the substrate. For example, the shielding electrode 035 is configured to shield the effects of data voltage transitions on the first transistor T1 and the second transistor T2, preventing data voltage transitions from affecting the normal operation of the pixel circuit and improving the display effect.

例如,如图17D所示,第三导电图案层包括第一扫描信号线031、第三扫描信号线033、第二初始信号线042、第三初始信号线043、电源连接线044、辅助扫描信号线045、第一连接电极051、第二连接电极052、第三连接电极053、第四连接电极054和第五连接电极055。例如,第三导电图案层位于第二导电图案层远离第一导电图案层的一侧,且第三导电图案层与第二导电图案层之间设置有绝缘层。For example, as shown in Figure 17D, the third conductive pattern layer includes a first scan signal line 031, a third scan signal line 033, a second initial signal line 042, a third initial signal line 043, a power connection line 044, an auxiliary scan signal line 045, a first connecting electrode 051, a second connecting electrode 052, a third connecting electrode 053, a fourth connecting electrode 054, and a fifth connecting electrode 055. For example, the third conductive pattern layer is located on the side of the second conductive pattern layer away from the first conductive pattern layer, and an insulating layer is provided between the third conductive pattern layer and the second conductive pattern layer.

例如,如图17D所示,第一扫描信号线031通过每个电路单元中的过孔与每个电路单元中的第二栅电极022(也是第四栅电极024)连接,实现了第一扫描信号线031将第一扫描信号分别写入第二晶体管T2的栅电极和第四晶体管T4的栅电极。For example, as shown in Figure 17D, the first scan signal line 031 is connected to the second gate electrode 022 (also the fourth gate electrode 024) in each circuit unit through a via in each circuit unit, so that the first scan signal line 031 writes the first scan signal into the gate electrode of the second transistor T2 and the gate electrode of the fourth transistor T4 respectively.

例如,如图17D所示,第三扫描信号线033可以位于第一扫描信号线031远离第二极板082的一侧,第三扫描信号线033通过每个电路单元中的过孔与每个电路单元中的第一栅电极021连接,实现了第三扫描信号线033将第三扫描信号写入第一晶体管T1的栅电极。For example, as shown in Figure 17D, the third scan signal line 033 can be located on the side of the first scan signal line 031 away from the second electrode plate 082. The third scan signal line 033 is connected to the first gate electrode 021 in each circuit unit through a via in each circuit unit, thereby realizing that the third scan signal line 033 writes the third scan signal to the gate electrode of the first transistor T1.

例如,如图17D所示,第二初始信号线042可以位于第二极板082的一侧,第二初始信号线042通过每个电路单元中的过孔与每个电路单元中的第七晶体管的有源层的第一区连接,实现了第二初始信号线042将第二初始信号写入第七晶体管T7的第一极。For example, as shown in Figure 17D, the second initial signal line 042 can be located on one side of the second electrode plate 082. The second initial signal line 042 is connected to the first region of the active layer of the seventh transistor in each circuit unit through a via in each circuit unit, thereby realizing that the second initial signal line 042 writes the second initial signal into the first electrode of the seventh transistor T7.

例如,如图17D所示,第三初始信号线043可以位于第二初始信号线042远离第二极板082的一侧,第三初始信号线043通过每个电路单元中的过孔与每个电路单元中的第八晶体管的有源层的第一区连接,实现了第三初始信号线043将第三初始信号写入第八晶体管的第一极。For example, as shown in Figure 17D, the third initial signal line 043 can be located on the side of the second initial signal line 042 away from the second electrode plate 082. The third initial signal line 043 is connected to the first region of the active layer of the eighth transistor in each circuit unit through a via in each circuit unit, thereby realizing that the third initial signal line 043 writes the third initial signal into the first electrode of the eighth transistor.

例如,如图17D所示,电源连接线044可以位于第一扫描信号线031与发光信号线034之间,电源连接线044在衬底基板上的正投影与第二极板082在衬底基板上的正投影至少部分交叠,电源连接线044通过每个电路单元中的过孔与每个电路单元中的第二极板082连接。由于电源连接线044被配置为与后续形成的第一电源线连接,因而实现了第一电源线将第一电源信号写入存储电容的第二极板082。For example, as shown in Figure 17D, the power connection line 044 can be located between the first scan signal line 031 and the light emission signal line 034. The orthographic projection of the power connection line 044 on the substrate at least partially overlaps with the orthographic projection of the second electrode plate 082 on the substrate. The power connection line 044 is connected to the second electrode plate 082 in each circuit unit through a via in each circuit unit. Since the power connection line 044 is configured to connect to the subsequently formed first power line, the first power line writes the first power signal into the second electrode plate 082 of the storage capacitor.

例如,如图17D所示,辅助扫描信号线045在衬底基板上的正投影与第二扫描信号线032在衬底基板上的正投影至少部分交叠,辅助扫描信号线045通过过孔与第二扫描连接块连接,进而与第二扫描信号线032连接,因而第二扫描信号线032和辅助扫描信号线045构成双层结构的扫描信号线,可以有效减小扫描信号线的电阻,可以减小扫描信号的压降。For example, as shown in Figure 17D, the orthographic projection of the auxiliary scanning signal line 045 on the substrate and the orthographic projection of the second scanning signal line 032 on the substrate at least partially overlap. The auxiliary scanning signal line 045 is connected to the second scanning connection block through a via, and then connected to the second scanning signal line 032. Therefore, the second scanning signal line 032 and the auxiliary scanning signal line 045 constitute a double-layer structure of scanning signal lines, which can effectively reduce the resistance of the scanning signal lines and reduce the voltage drop of the scanning signal.

例如,如图17D所示,第一连接电极051的第一端通过过孔与第一晶体管的有源层的第二区(也是第二有源层的第一区)连接,第一连接电极051的第二端通过过孔与第一极板081连接。例如,由于第一极板081同时作为第三晶体管T3的栅电极,因而第一连接电极051使得第一晶体管T1的第二极、第二晶体管T2的第一极、第三晶体管T3的栅电极和第一极板081具有相同的电位,形成像素电路的第一节点N1。For example, as shown in Figure 17D, the first end of the first connecting electrode 051 is connected to the second region of the active layer of the first transistor (which is also the first region of the second active layer) through a via, and the second end of the first connecting electrode 051 is connected to the first electrode plate 081 through a via. For example, since the first electrode plate 081 also serves as the gate electrode of the third transistor T3, the first connecting electrode 051 makes the second electrode of the first transistor T1, the first electrode of the second transistor T2, the gate electrode of the third transistor T3, and the first electrode plate 081 have the same potential, forming the first node N1 of the pixel circuit.

例如,如图17D所示,第二连接电极052的第一端通过过孔与第三晶体管的有源层的第一区(也是第四晶体管的有源层的第二区和第五晶体管的有源层的第二区)连接,第二连接电极052的第二端通过过孔与第八晶体管的有源层的第二区连接。例如,第二连接电极052使得第三晶体管T3的第一极、第四晶体管T4的第二极、第五晶体管T5的第二极和第八晶体管T8的第二极具有相同的电位,形成像素电路的第二节点N2。For example, as shown in Figure 17D, the first end of the second connection electrode 052 is connected to the first region of the active layer of the third transistor (which is also the second region of the active layer of the fourth transistor and the second region of the active layer of the fifth transistor) through a via, and the second end of the second connection electrode 052 is connected to the second region of the active layer of the eighth transistor through a via. For example, the second connection electrode 052 makes the first electrode of the third transistor T3, the second electrode of the fourth transistor T4, the second electrode of the fifth transistor T5, and the second electrode of the eighth transistor T8 have the same potential, forming the second node N2 of the pixel circuit.

例如,如图17D所示,第三连接电极053被配置为与后续形成的数据信号线连接。例如,第三连接电极053可以称为数据连接电极。For example, as shown in Figure 17D, the third connection electrode 053 is configured to connect to a subsequently formed data signal line. For example, the third connection electrode 053 can be referred to as a data connection electrode.

例如,如图17E所示,第四导电图案层包括数据线061、阳极连接电极312062以及第一电源线071。例如,第四导电图案层位于第三导电图案层远离第二导电图案层的一侧,且第四导电图案层与第三导电图案层之间设置有绝缘层。For example, as shown in Figure 17E, the fourth conductive pattern layer includes a data line 061, an anode connection electrode 312062, and a first power line 071. For example, the fourth conductive pattern layer is located on the side of the third conductive pattern layer away from the second conductive pattern layer, and an insulating layer is provided between the fourth conductive pattern layer and the third conductive pattern layer.

例如,如图17D和图17E所示,数据线061通过过孔与作为数据连接电极的第三连接电极053连接。由于第三连接电极053与第四晶体管的有源层的第一区连接,因而实现了数据线061可以将数据信号写入第四晶体管T4的第一极。For example, as shown in Figures 17D and 17E, data line 061 is connected to the third connection electrode 053, which serves as a data connection electrode, via a via. Since the third connection electrode 053 is connected to the first region of the active layer of the fourth transistor, data line 061 can write data signals to the first electrode of the fourth transistor T4.

例如,如图17E所示,阳极连接电极062被配置为与后续形成的阳极连接,即阳极连接电极062与子像素100的第一电极310电连接。For example, as shown in Figure 17E, the anode connection electrode 062 is configured to be connected to the subsequently formed anode, that is, the anode connection electrode 062 is electrically connected to the first electrode 310 of the sub-pixel 100.

例如,如图17D和图17E所示,第一电源线071与电源连接线044电连接,以在显示基板上形成网状的传输第一电源信号的网状连通结构,不仅可以有效降低第一电源线071的电阻,减小第一电源信号的压降,而且可以有效提升显示基板中第一电源信号的均一性,有效提升显示均一性,提高了显示品质和显示质量。For example, as shown in Figures 17D and 17E, the first power line 071 is electrically connected to the power connection line 044 to form a mesh-like interconnected structure on the display substrate for transmitting the first power signal. This not only effectively reduces the resistance of the first power line 071 and reduces the voltage drop of the first power signal, but also effectively improves the uniformity of the first power signal in the display substrate, thereby improving display uniformity and enhancing display quality.

例如,如图17F所示,第一电极层包括各子像素100的阳极,如第一子像素110的第一电极310、第二子像素120的第二电极320以及第三子像素130的第一电极310。例如,第一电极310层位于第四导电图案层远离第二导电图案层的一侧,且第一电极310层与第四导电图案层之间设置有绝缘层,第一电极310与第四导电层中的阳极连接电极312电连接。图17F所示子像素100的排布规律可以与图2至图6所示子像素100的排布规律相同。For example, as shown in Figure 17F, the first electrode layer includes the anode of each sub-pixel 100, such as the first electrode 310 of the first sub-pixel 110, the second electrode 320 of the second sub-pixel 120, and the first electrode 310 of the third sub-pixel 130. For example, the first electrode 310 layer is located on the side of the fourth conductive pattern layer away from the second conductive pattern layer, and an insulating layer is provided between the first electrode 310 layer and the fourth conductive pattern layer. The first electrode 310 is electrically connected to the anode connection electrode 312 in the fourth conductive layer. The arrangement pattern of the sub-pixels 100 shown in Figure 17F can be the same as the arrangement pattern of the sub-pixels 100 shown in Figures 2 to 6.

图17G为第一电极层与第四导电图案层层叠的结构图。图18为根据本公开实施例提供的显示基板的局部截面结构示意图。Figure 17G is a structural diagram showing the stacking of the first electrode layer and the fourth conductive pattern layer. Figure 18 is a partial cross-sectional structural diagram of a display substrate provided according to an embodiment of the present disclosure.

在一些示例中,如图18所示,至少部分子像素100包括发光功能层330、第一电极310、第二电极320以及像素电路,第一电极310位于发光功能层330与衬底基板01之间且与像素电路电连接,第二电极320位于发光功能层330远离第一电极310的一侧。该像素电路可以为图16至图17G所示的像素电路。In some examples, as shown in FIG18, at least a portion of the sub-pixel 100 includes a light-emitting functional layer 330, a first electrode 310, a second electrode 320, and a pixel circuit. The first electrode 310 is located between the light-emitting functional layer 330 and the substrate 01 and is electrically connected to the pixel circuit. The second electrode 320 is located on the side of the light-emitting functional layer 330 away from the first electrode 310. The pixel circuit can be the pixel circuit shown in FIG16 to FIG17G.

例如,如图18所示,发光功能层330可以包括发光层以及功能层,如功能层可以包括空穴注入层(HIL)、空穴传输层(HTL)、电子传输层(ETL)和电子注入层(EIL)等。例如,第一电极310可以为阳极,第二电极320可以为阴极。例如,阴极可由高导电性和低功函数的材料形成,例如,阴极可采用金属材料制成。例如,阳极可由具有高功函数的透明导电材料形成。For example, as shown in Figure 18, the light-emitting functional layer 330 may include a light-emitting layer and functional layers, such as a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). For example, the first electrode 310 may be an anode, and the second electrode 320 may be a cathode. For example, the cathode may be formed of a material with high conductivity and low work function; for example, the cathode may be made of a metallic material. For example, the anode may be formed of a transparent conductive material with a high work function.

例如,图18没有示出阳极连接电极062与衬底基板01之间的具体膜层,以膜层006来统一示意,如膜层006包括上述半导体层、第一导电图案层、第二导电图案层、第三导电图案层以及相邻层之间的绝缘层。例如,第四导电图案层与第一电极310之间设置有平坦层PLN。例如,第二电极310远离衬底基板01的一侧还设置有其他膜层(未示出),如封装层等。For example, Figure 18 does not show the specific film layer between the anode connection electrode 062 and the substrate 01, but uses film layer 006 for general illustration. Film layer 006 includes the aforementioned semiconductor layer, first conductive pattern layer, second conductive pattern layer, third conductive pattern layer, and insulating layer between adjacent layers. For example, a planarization layer PLN is provided between the fourth conductive pattern layer and the first electrode 310. For example, other film layers (not shown), such as encapsulation layers, are also provided on the side of the second electrode 310 away from the substrate 01.

例如,如图17F、图17G以及图18所示,第一电极310包括彼此连接的主体电极311以及连接电极312,沿垂直于衬底基板01的方向,连接电极312与子像素100的发光区没有交叠。例如,上述主体电极311为与发光区交叠,且与发光区形状基本相同的结构,连接电极312为用于与像素电路电连接的结构。例如,主体电极311与连接电极312为一体化设置的结构。例如,第一子像素110和第二子像素120的主体电极311的形状均为四边形,如矩形,第三子像素130的主体电极311的形状为六边形。例如,各子像素100的连接电极312的形状均为四边形。但不限于此,主体电极311和连接电极312的形状可以根据产品需求进行设置。For example, as shown in Figures 17F, 17G, and 18, the first electrode 310 includes a main electrode 311 and a connecting electrode 312 connected to each other. Along a direction perpendicular to the substrate 01, the connecting electrode 312 does not overlap with the light-emitting area of the sub-pixel 100. For example, the main electrode 311 overlaps with the light-emitting area and has a shape substantially the same as the light-emitting area, while the connecting electrode 312 is used for electrical connection to the pixel circuit. For example, the main electrode 311 and the connecting electrode 312 are integrally formed. For example, the main electrode 311 of the first sub-pixel 110 and the second sub-pixel 120 is quadrilateral in shape, such as a rectangle, while the main electrode 311 of the third sub-pixel 130 is hexagonal in shape. For example, the connecting electrode 312 of each sub-pixel 100 is quadrilateral in shape. However, this is not a limitation; the shapes of the main electrode 311 and the connecting electrode 312 can be set according to product requirements.

例如,如图17G所示,显示基板包括多条数据线061,且至少一条数据线061的延伸方向与第一方向,如X方向的夹角为87~93度。例如,每条数据线061与第一方向的夹角均为87~93度。例如,每条数据线061与第一方向的夹角均为89~91度。例如,每条数据线061与第一方向的夹角均为90度,即数据线061与第一方向垂直。For example, as shown in Figure 17G, the display substrate includes multiple data lines 061, and the angle between the extension direction of at least one data line 061 and a first direction, such as the X direction, is 87 to 93 degrees. For example, the angle between each data line 061 and the first direction is 87 to 93 degrees. For example, the angle between each data line 061 and the first direction is 89 to 91 degrees. For example, the angle between each data line 061 and the first direction is 90 degrees, that is, the data line 061 is perpendicular to the first direction.

在一些示例中,如图17D至图17G所示,栅线031,即第一扫描信号线031。至少一条栅线0的延伸方向与第一方向之间的夹角不大于3度。例如,栅线031的延伸方向与第一方向之间的夹角不大于2度。如,栅线031的延伸方向与第一方向之间的夹角不大于1度。例如,栅线031的延伸方向与第一方向平行。In some examples, as shown in Figures 17D to 17G, gate line 031, i.e., the first scan signal line 031, has an angle between its extension direction and the first direction of at least one gate line 031 not exceeding 3 degrees. For example, the angle between the extension direction of gate line 031 and the first direction is not greater than 2 degrees. For example, the angle between the extension direction of gate line 031 and the first direction is not greater than 1 degree. For example, the extension direction of gate line 031 is parallel to the first direction.

例如,如图17F所示,同一子像素组10中,第三子像素130的连接电极312位于其主体电极311与第二子像素120的主体电极311之间,第二子像素120的连接电极312位于其主体电极311与第一子像素110的主体电极311之间,第一子像素110的连接电极312位于其主体电极311与第三子像素130的主体电极311之间,第二子像素120的连接电极312与第三子像素130的主体电极311之间的距离大于第二子像素120的主体电极311在第二方向上的尺寸。For example, as shown in FIG17F, in the same sub-pixel group 10, the connecting electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120, the connecting electrode 312 of the second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110, the connecting electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130, and the distance between the connecting electrode 312 of the second sub-pixel 120 and the main electrode 311 of the third sub-pixel 130 is greater than the size of the main electrode 311 of the second sub-pixel 120 in the second direction.

例如,如图17F所示,位于同一子像素组10中的第三子像素130的第一电极310的形状不同。例如,各第一子像素110的第一电极310的形状相同。例如,各第二子像素120的第一电极310的形状相同。For example, as shown in FIG17F, the first electrode 310 of the third sub-pixel 130 located in the same sub-pixel group 10 has a different shape. For example, the first electrode 310 of each first sub-pixel 110 has the same shape. For example, the first electrode 310 of each second sub-pixel 120 has the same shape.

例如,如图17F所示,第一子像素组11中第三子像素130的主体电极311远离连接电极312且沿X方向延伸的边缘为第一电极边缘E01,第二子像素组12中第一子像素110的主体电极311远离连接电极312且沿X方向延伸的边缘为第二电极边缘E02,第二子像素组12中第二子像素120的主体电极311远离连接电极312且沿X方向延伸的边缘为第三电极边缘E03,第一电极边缘E01、第二电极边缘E02以及第三电极边缘E03位于同一直线上。例如,第二子像素组12中第三子像素130的主体电极311远离连接电极312且沿X方向延伸的边缘为第四电极边缘E04,第一子像素组11中第一子像素110的主体电极311远离连接电极312且沿X方向延伸的边缘为第五电极边缘E05,第一子像素组11中第二子像素120的主体电极311靠近连接电极312且沿X方向延伸的边缘为第六电极边缘E06,第四电极边缘E04、第五电极边缘E05以及第六电极边缘E06位于同一直线上。通过对第一子像素组11和第二子像素组12中第一电极310相位位置关系的设置,有利于增大像素开口率。For example, as shown in Figure 17F, the edge of the main electrode 311 of the third sub-pixel 130 in the first sub-pixel group 11 that is far from the connecting electrode 312 and extends along the X direction is the first electrode edge E01. The edge of the main electrode 311 of the first sub-pixel 110 in the second sub-pixel group 12 that is far from the connecting electrode 312 and extends along the X direction is the second electrode edge E02. The edge of the main electrode 311 of the second sub-pixel 120 in the second sub-pixel group 12 that is far from the connecting electrode 312 and extends along the X direction is the third electrode edge E03. The first electrode edge E01, the second electrode edge E02, and the third electrode edge E03 are located on the same straight line. For example, in the second sub-pixel group 12, the edge of the main electrode 311 of the third sub-pixel 130 extending away from the connecting electrode 312 and along the X direction is the fourth electrode edge E04; in the first sub-pixel group 11, the edge of the main electrode 311 of the first sub-pixel 110 extending away from the connecting electrode 312 and along the X direction is the fifth electrode edge E05; and in the first sub-pixel group 11, the edge of the main electrode 311 of the second sub-pixel 120 extending close to the connecting electrode 312 and along the X direction is the sixth electrode edge E06. The fourth electrode edge E04, the fifth electrode edge E05, and the sixth electrode edge E06 are located on the same straight line. By setting the phase position relationship of the first electrode 310 in the first sub-pixel group 11 and the second sub-pixel group 12, it is beneficial to increase the pixel aperture ratio.

例如,如图17G所示,与不同第一子像素110的第一电极310连接的阳极连接电极062的长度可以相同,也可以不同。例如,与不同第二子像素120的第一电极310连接的阳极连接电极062的长度可以相同,也可以不同。例如,与不同第三子像素130的第一电极310连接的阳极连接电极062的长度可以相同,也可以不同。阳极连接电极062的长度以及位置由子像素100的第一电极310以及晶体管的位置共同决定。For example, as shown in Figure 17G, the length of the anode connection electrode 062 connected to the first electrode 310 of different first sub-pixels 110 can be the same or different. For example, the length of the anode connection electrode 062 connected to the first electrode 310 of different second sub-pixels 120 can be the same or different. For example, the length of the anode connection electrode 062 connected to the first electrode 310 of different third sub-pixels 130 can be the same or different. The length and position of the anode connection electrode 062 are jointly determined by the positions of the first electrode 310 of the sub-pixel 100 and the transistor.

例如,如图17G所示,与第一子像素组11中第一子像素110的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第一子像素110的第一电极310连接的阳极连接电极062的长度。例如,与第一子像素组11中第二子像素120的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第二子像素120的第一电极310连接的阳极连接电极062的长度。例如,与第一子像素组11中第三子像素130的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第三子像素130的第一电极310连接的阳极连接电极062的长度。For example, as shown in Figure 17G, the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12. For example, the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12. For example, the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.

图19A和图19B为根据本公开实施例的一示例提供的第四导电图案层以及第一电极层的示意图。图19C为图19A和图19B所示第四导电图案层和第一电极层的层叠图。图19A至图19C所示显示基板中第四导电图案层之前的结构层可以与图17A至图17G所示相应结构层具有相同的特征,在此不再赘述。Figures 19A and 19B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure. Figure 19C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 19A and 19B. The structural layers preceding the fourth conductive pattern layer in the display substrate shown in Figures 19A to 19C may have the same features as the corresponding structural layers shown in Figures 17A to 17G, and will not be described again here.

图19B与图17F的不同之处在于像素排布结构不同,图19A所示的第四导电图案层与图17E所示第四导电图案层的区别在于阳极连接电极的长度以及形状不同,阳极连接电极的长度与像素排布结构相关。图19B所示子像素100的排布规律可以与图8所示子像素100的排布规律相同。The difference between Figure 19B and Figure 17F lies in their pixel arrangement structure. Similarly, the difference between the fourth conductive pattern layer shown in Figure 19A and the fourth conductive pattern layer shown in Figure 17E lies in the length and shape of the anode connecting electrode. The length of the anode connecting electrode is related to the pixel arrangement structure. The arrangement pattern of sub-pixels 100 shown in Figure 19B can be the same as that shown in Figure 8.

例如,如图19B所示,位于同一子像素组10中的第二子像素120的第一电极310的形状相同。例如,位于第一子像素组11中的第二子像素120的第一电极310与位于第二子像素组12中的第二子像素120的第一电极310的形状不同。例如,位于同一子像素组10中的第一子像素110的第一电极310的形状相同。例如,位于不同子像素组10中的第一子像素110的第一电极310的形状相同。例如,同一子像素组10中的第三子像素130的第一电极310的形状不同。For example, as shown in FIG19B, the first electrode 310 of the second sub-pixel 120 located in the same sub-pixel group 10 has the same shape. For example, the first electrode 310 of the second sub-pixel 120 located in the first sub-pixel group 11 has a different shape than the first electrode 310 of the second sub-pixel 120 located in the second sub-pixel group 12. For example, the first electrode 310 of the first sub-pixel 110 located in the same sub-pixel group 10 has the same shape. For example, the first electrode 310 of the first sub-pixel 110 located in different sub-pixel groups 10 has the same shape. For example, the first electrode 310 of the third sub-pixel 130 located in the same sub-pixel group 10 has a different shape.

在一些示例中,如图19B所示,同一子像素组10中,第三子像素130的连接电极312位于其主体电极311与第二子像素120的主体电极311之间,第二子像素120的连接电极312位于其主体电极311与第一子像素110的主体电极311之间,第一子像素110的连接电极312位于其主体电极311与第三子像素130的主体电极311之间。In some examples, as shown in FIG19B, in the same sub-pixel group 10, the connection electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120, the connection electrode 312 of the second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110, and the connection electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130.

在一些示例中,如图19B所示,沿第二方向,如Y方向,排列的相邻两个子像素组10中,第三子像素130的第一电极310相对于第一分隔线LB1对称分布。In some examples, as shown in Figure 19B, in two adjacent sub-pixel groups 10 arranged along a second direction, such as the Y direction, the first electrode 310 of the third sub-pixel 130 is symmetrically distributed with respect to the first dividing line LB1.

在一些示例中,如图19B所示,沿第二方向,如Y方向,排列的相邻两个子像素组10中,第一子像素110和第二子像素120至少之一的第一电极310相对于第一分隔线LB1对称分布。例如,沿第二方向排列的相邻两个子像素组10中,第一子像素110的第一电极310相对于第一分隔线LB1对称分布。In some examples, as shown in FIG19B, in two adjacent sub-pixel groups 10 arranged along a second direction, such as the Y direction, the first electrode 310 of at least one of the first sub-pixel 110 and the second sub-pixel 120 is symmetrically distributed with respect to the first dividing line LB1. For example, in two adjacent sub-pixel groups 10 arranged along the second direction, the first electrode 310 of the first sub-pixel 110 is symmetrically distributed with respect to the first dividing line LB1.

例如,如图19B所示,同一子像素组10中,第三子像素130的连接电极312位于其主体电极311与第二子像素120的主体电极311之间,第一子像素110的连接电极312位于其主体电极311与第三子像素130的主体电极311之间。For example, as shown in FIG19B, in the same sub-pixel group 10, the connection electrode 312 of the third sub-pixel 130 is located between its main electrode 311 and the main electrode 311 of the second sub-pixel 120, and the connection electrode 312 of the first sub-pixel 110 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130.

例如,如图19C所示,与第一子像素组11中第一子像素110的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第一子像素110的第一电极310连接的阳极连接电极062的长度。例如,与第一子像素组11中第二子像素120的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第二子像素120的第一电极310连接的阳极连接电极062的长度。例如,与第一子像素组11中第三子像素130的第一电极310连接的阳极连接电极062的长度不同于与第二子像素组12中第三子像素130的第一电极310连接的阳极连接电极062的长度。For example, as shown in FIG19C, the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12. For example, the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12. For example, the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode 062 connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.

图20A和图20B为根据本公开实施例的一示例提供的第四导电图案层以及第一电极层的示意图。图20C为图20A和图20B所示第四导电图案层和第一电极层的层叠图。图20A至图20C所示显示基板中第四导电图案层之前的结构层可以与图17A至图17G所示相应结构层具有相同的特征,在此不再赘述。Figures 20A and 20B are schematic diagrams of a fourth conductive pattern layer and a first electrode layer provided according to an example of an embodiment of the present disclosure. Figure 20C is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer shown in Figures 20A and 20B. The structural layers preceding the fourth conductive pattern layer in the display substrate shown in Figures 20A to 20C may have the same features as the corresponding structural layers shown in Figures 17A to 17G, and will not be described again here.

图20B与图17F的不同之处在于像素排布结构不同,图20A所示的第四导电图案层与图17E所示第四导电图案层的区别在于阳极连接电极的长度以及形状不同,阳极连接电极062的长度与像素排布结构相关。图20B所示子像素100的排布规律可以与图11所示子像素100的排布规律相同。The difference between Figure 20B and Figure 17F lies in their pixel arrangement structure. The difference between the fourth conductive pattern layer shown in Figure 20A and the fourth conductive pattern layer shown in Figure 17E lies in the length and shape of the anode connecting electrode. The length of the anode connecting electrode 062 is related to the pixel arrangement structure. The arrangement pattern of sub-pixels 100 shown in Figure 20B can be the same as that of sub-pixels 100 shown in Figure 11.

例如,如图20B所示,沿第二方向排列的相邻两个子像素组10中,四个第三子像素130的第一电极310相对于第一分隔线LB1对称分布,四个第一子像素110的第一电极310相对于第一分隔线LB1对称分布。For example, as shown in Figure 20B, in two adjacent sub-pixel groups 10 arranged along the second direction, the first electrodes 310 of the four third sub-pixels 130 are symmetrically distributed with respect to the first dividing line LB1, and the first electrodes 310 of the four first sub-pixels 110 are symmetrically distributed with respect to the first dividing line LB1.

例如,如图20B所示,第一子像素组11中,两个第三子像素130的连接电极312之间的距离小于第三子像素130的主体电极311在第一方向上的尺寸。例如,同一子像素组10中,一个第二子像素120的连接电极312位于其主体电极311与第一子像素110的主体电极311之间,另一个第二子像素120的连接电极312位于其主体电极311与第三子像素130的主体电极311之间。通过对不同子像素100的连接电极312位置的布局,可以在实现较大开口率的同时,防止不同子像素100的第一电极310发生干涉。For example, as shown in Figure 20B, in the first sub-pixel group 11, the distance between the connecting electrodes 312 of two third sub-pixels 130 is smaller than the dimension of the main electrode 311 of the third sub-pixel 130 in the first direction. For example, in the same sub-pixel group 10, the connecting electrode 312 of one second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the first sub-pixel 110, and the connecting electrode 312 of another second sub-pixel 120 is located between its main electrode 311 and the main electrode 311 of the third sub-pixel 130. By arranging the positions of the connecting electrodes 312 of different sub-pixels 100, a larger aperture ratio can be achieved while preventing interference between the first electrodes 310 of different sub-pixels 100.

例如,如图20B所示,第一子像素组11中,两个第一子像素110位于两个第二子像素120之间,两个第三子像素130的两个连接电极312之间设置有两个第一子像素110的连接电极312以及两个第二子像素120的连接电极312;第二子像素组12中,两个第二子像素120位于两个第一子像素110之间,两个第三子像素130的两个连接电极312位于两个第一子像素110的两个连接电极312之间。For example, as shown in Figure 20B, in the first sub-pixel group 11, two first sub-pixels 110 are located between two second sub-pixels 120, and the two connecting electrodes 312 of the two third sub-pixels 130 are provided between the two connecting electrodes 312 of the first sub-pixels 110 and the two connecting electrodes 312 of the second sub-pixels 120; in the second sub-pixel group 12, two second sub-pixels 120 are located between two first sub-pixels 110, and the two connecting electrodes 312 of the two third sub-pixels 130 are located between the two connecting electrodes 312 of the two first sub-pixels 110.

例如,如图20B所示,第一子像素组11中的第三子像素130的第一电极310的形状与第二子像素组12中的第三子像素130的第一电极310的形状不同。For example, as shown in Figure 20B, the shape of the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the shape of the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.

例如,如图20C所示,与第一子像素组11中第一子像素110的第一电极310连接的阳极连接电极的长度不同于与第二子像素组12中第一子像素110的第一电极310连接的阳极连接电极的长度。例如,与第一子像素组11中第二子像素120的第一电极310连接的阳极连接电极的长度不同于与第二子像素组12中第二子像素120的第一电极310连接的阳极连接电极的长度。例如,与第一子像素组11中第三子像素130的第一电极310连接的阳极连接电极的长度不同于与第二子像素组12中第三子像素130的第一电极310连接的阳极连接电极的长度。For example, as shown in FIG20C, the length of the anode connecting electrode connected to the first electrode 310 of the first sub-pixel 110 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the first sub-pixel 110 in the second sub-pixel group 12. For example, the length of the anode connecting electrode connected to the first electrode 310 of the second sub-pixel 120 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the second sub-pixel 120 in the second sub-pixel group 12. For example, the length of the anode connecting electrode connected to the first electrode 310 of the third sub-pixel 130 in the first sub-pixel group 11 is different from the length of the anode connecting electrode connected to the first electrode 310 of the third sub-pixel 130 in the second sub-pixel group 12.

例如,如图20C所示,同一子像素组中,与不同第二子像素120的第一电极310连接的阳极连接电极的形状不同。For example, as shown in Figure 20C, the shapes of the anode connection electrodes connected to the first electrodes 310 of different second sub-pixels 120 are different in the same sub-pixel group.

图21A和图21B为根据本公开实施例的另一示例提供的显示基板的局部层结构示意图。图21A为第四导电图案层和第一电极层的层叠图。图21B为第三导电图案层与第一电极层的层叠图。Figures 21A and 21B are schematic diagrams of partial layer structures of a display substrate provided according to another example of an embodiment of the present disclosure. Figure 21A is a stack-up diagram of the fourth conductive pattern layer and the first electrode layer. Figure 21B is a stack-up diagram of the third conductive pattern layer and the first electrode layer.

在一些示例中,如图21A和图21B所示,显示基板包括多条栅线031,即第一扫描信号线031。至少一条栅线031的延伸方向与第一方向的夹角为30~60度。例如,每条栅线031的延伸方向与第一方向的夹角均为30~60度。例如,栅线031的延伸方向与第一方向的夹角为45度。例如,栅线031的延伸方向与第一方向的夹角为35~55度。例如,栅线031的延伸方向与第一方向的夹角为37~50度。栅线的延伸方向与第一方向的夹角还可以为30~60度中除上述角度外的其他角度,在此不再一一例举。In some examples, as shown in Figures 21A and 21B, the display substrate includes multiple gate lines 031, namely first scan signal lines 031. At least one gate line 031 extends at an angle of 30 to 60 degrees to the first direction. For example, the angle between the extension direction of each gate line 031 and the first direction is 30 to 60 degrees. For example, the angle between the extension direction of the gate line 031 and the first direction is 45 degrees. For example, the angle between the extension direction of the gate line 031 and the first direction is 35 to 55 degrees. For example, the angle between the extension direction of the gate line 031 and the first direction is 37 to 50 degrees. The angle between the extension direction of the gate line and the first direction can also be other angles besides the above-mentioned angles within the range of 30 to 60 degrees, which will not be listed here.

图21A和图21B所示X方向为第一方向,W方向为图2至图3、图5至图15、图17A至图17G以及图19A至图20C所示的X方向。The X direction shown in Figures 21A and 21B is the first direction, and the W direction is the X direction shown in Figures 2 to 3, Figures 5 to 15, Figures 17A to 17G, and Figures 19A to 20C.

图21A和图21B所示显示基板中第四导电图案层与衬底基板之间的膜层可以与图17A至图17G所示相应膜层具有相同的特征,在此不再赘述。The film layer between the fourth conductive pattern layer and the substrate in the display substrate shown in Figures 21A and 21B can have the same characteristics as the corresponding film layers shown in Figures 17A to 17G, and will not be described again here.

图21A至图21B所示显示基板中,以栅线的延伸方向为水平方向,第三子像素130的发光区的延伸方向为第一方向为例,则显示基板中子像素100的开口倾斜设置,有利于改善斜向锯齿,以达到优化画质,提升显示基板的画质均一性的效果。In the display substrate shown in Figures 21A and 21B, taking the extension direction of the gate line as the horizontal direction and the extension direction of the light-emitting area of the third sub-pixel 130 as the first direction, the opening of the sub-pixel 100 in the display substrate is set at an angle, which is beneficial to improve the oblique jaggedness, so as to optimize the image quality and improve the image quality uniformity of the display substrate.

例如,如图21A所示,数据线061的延伸方向与第一方向的夹角为89~91度,如数据线061的延伸方向与第一方向垂直。例如,数据线061的延伸方向与栅线的延伸方向之间的夹角为30~60度。For example, as shown in Figure 21A, the angle between the extension direction of data line 061 and the first direction is 89 to 91 degrees, such as when the extension direction of data line 061 is perpendicular to the first direction. For example, the angle between the extension direction of data line 061 and the extension direction of the gate line is 30 to 60 degrees.

例如,如图21A至图21B所示,第一子像素110的开口率、第二子像素120的开口率以及第三子像素130的开口率之比可以为1:(1.2~1.8):(2.3~2.8)。例如,第一子像素110的发光区在X方向和Y方向上的尺寸可以分别为50微米和53.81微米,第二子像素120的发光区在X方向和Y方向上的尺寸可以分别为60微米和53.81微米,第三子像素130的发光区在X方向和Y方向上的尺寸可以分别为137.58微米和91.96微米。For example, as shown in Figures 21A and 21B, the ratio of the aperture ratio of the first sub-pixel 110, the second sub-pixel 120, and the third sub-pixel 130 can be 1:(1.2~1.8):(2.3~2.8). For example, the size of the light-emitting area of the first sub-pixel 110 in the X and Y directions can be 50 micrometers and 53.81 micrometers, respectively; the size of the light-emitting area of the second sub-pixel 120 in the X and Y directions can be 60 micrometers and 53.81 micrometers, respectively; and the size of the light-emitting area of the third sub-pixel 130 in the X and Y directions can be 137.58 micrometers and 91.96 micrometers, respectively.

图21A示意性地示出像素排列结构可以与图17F所示像素排列结构相同,但方向不同。本示例不限于此,倾斜设置的像素排列结构可以采用图2至图15中任一示例所示的像素排列结构。Figure 21A schematically shows that the pixel arrangement structure can be the same as that shown in Figure 17F, but with a different orientation. This example is not limited to this; the tilted pixel arrangement structure can adopt the pixel arrangement structure shown in any of the examples in Figures 2 to 15.

图22为根据本公开另一实施例提供的显示装置的示意框图。如图22所示,本公开实施例提供的一种显示装置包括上述任一种显示基板。Figure 22 is a schematic block diagram of a display device according to another embodiment of the present disclosure. As shown in Figure 22, a display device provided in an embodiment of the present disclosure includes any of the above-described display substrates.

例如,本公开实施例提供的显示基板可以为有机发光二极管显示基板。例如,显示基板可以设置彩膜层,也可以不设置彩膜层。For example, the display substrate provided in this embodiment can be an organic light-emitting diode (OLED) display substrate. For example, the display substrate may or may not have a color filter layer.

例如,该显示装置还包括位于显示基板出光侧的盖板。For example, the display device also includes a cover plate located on the light-emitting side of the display substrate.

例如,该显示装置可以为有机发光二极管显示装置等显示器件以及包括该显示装置的电视、数码相机、手机、手表、平板电脑、笔记本电脑、导航仪等任何具有显示功能的产品或者部件,本实施例不限于此。For example, the display device can be an organic light-emitting diode display device or other display device, as well as any product or component with display function, such as a television, digital camera, mobile phone, watch, tablet computer, laptop computer, or navigator that includes the display device. This embodiment is not limited to this.

有以下几点需要说明:The following points need to be explained:

(1)本公开的实施例附图中,只涉及到与本公开实施例涉及到的结构,其他结构可参考通常设计。(1) The accompanying drawings of the embodiments of this disclosure only involve the structures involved in the embodiments of this disclosure, and other structures can be referred to the general design.

(2)在不冲突的情况下,本公开的同一实施例及不同实施例中的特征可以相互组合。(2) Where there is no conflict, features of the same embodiment and different embodiments of this disclosure may be combined with each other.

以上所述仅是本公开的示范性实施方式,而非用于限制本公开的保护范围,本公开的保护范围由所附的权利要求确定。The above description is merely an exemplary embodiment of this disclosure and is not intended to limit the scope of protection of this disclosure, which is determined by the appended claims.

Claims (20)

一种显示基板,包括:A display substrate, comprising: 衬底基板;Substrate; 多个子像素,位于所述衬底基板上,所述多个子像素包括多个第一子像素、多个第二子像素以及多个第三子像素,各第一子像素的发光区的面积和各第二子像素的发光区的面积均不大于各第三子像素的发光区的面积,Multiple sub-pixels are located on the substrate. The multiple sub-pixels include multiple first sub-pixels, multiple second sub-pixels, and multiple third sub-pixels. The area of the light-emitting region of each first sub-pixel and the area of the light-emitting region of each second sub-pixel are not greater than the area of the light-emitting region of each third sub-pixel. 其中,所述多个子像素包括多个子像素组,每个子像素组包括至少两个第一子像素、至少两个第二子像素以及至少两个第三子像素,所述至少两个第三子像素沿第一方向排列且所述至少两个第三子像素的发光区被配置为对应同一个掩模开口;The plurality of sub-pixels include a plurality of sub-pixel groups, each sub-pixel group including at least two first sub-pixels, at least two second sub-pixels and at least two third sub-pixels, wherein the at least two third sub-pixels are arranged along a first direction and the light-emitting areas of the at least two third sub-pixels are configured to correspond to the same mask opening; 至少一个子像素组中,所述至少两个第三子像素的发光区中位于在所述第一方向上最边缘的两个第三子像素的发光区的彼此远离的至少一个轮廓角所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度;In at least one sub-pixel group, the included angle between the two sides connecting the two contour angles of the light-emitting areas of the two outermost third sub-pixels in the first direction, or the included angle between the extensions of the two sides, is 100 to 170 degrees. 在所述第一方向上排列的至少相邻两个子像素组包括第一子像素组和第二子像素组,所述第一子像素组中的所述第三子像素和所述第二子像素组中的所述第三子像素在第二方向上错开分布,所述第二方向与所述第一方向相交。At least two adjacent sub-pixel groups arranged in the first direction include a first sub-pixel group and a second sub-pixel group, wherein the third sub-pixel in the first sub-pixel group and the third sub-pixel in the second sub-pixel group are staggered in the second direction, and the second direction intersects the first direction. 根据权利要求1所述的显示基板,其中,所述多个子像素组沿所述第一方向和所述第二方向阵列排布,每个子像素组中,所述第一子像素的数量、所述第二子像素的数量以及所述第三子像素的数量均相等;According to the display substrate of claim 1, the plurality of sub-pixel groups are arranged in an array along the first direction and the second direction, and in each sub-pixel group, the number of the first sub-pixel, the number of the second sub-pixel, and the number of the third sub-pixel are all equal; 同一个子像素组中,所述第一子像素和所述第二子像素沿所述第一方向排列,且所述第一子像素和所述第三子像素沿所述第二方向排列;In the same sub-pixel group, the first sub-pixel and the second sub-pixel are arranged along the first direction, and the first sub-pixel and the third sub-pixel are arranged along the second direction; 所述第一子像素组中的所述第三子像素与所述第二子像素组中的所述第一子像素沿所述第一方向排列。The third sub-pixel in the first sub-pixel group and the first sub-pixel in the second sub-pixel group are arranged along the first direction. 根据权利要求1或2所述的显示基板,其中,分别位于所述第一子像素组和所述第二子像素组且距离最近的两个第三子像素的发光区之间的距离为第一距离,分别位于所述第一子像素组和所述第二子像素组且距离最近的所述第一子像素与所述第二子像素的发光区之间的距离为第二距离,所述第一距离不小于所述第二距离。According to claim 1 or 2, the distance between the light-emitting areas of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group is a first distance, and the distance between the light-emitting areas of the first sub-pixel and the second sub-pixel located in the first sub-pixel group and the second sub-pixel group is a second distance, wherein the first distance is not less than the second distance. 根据权利要求1-3任一项所述的显示基板,其中,分别位于所述第一子像素组和所述第二子像素组中且距离最近的两个第三子像素的彼此靠近的轮廓角中的至少一个所连接的两条边之间的夹角或者两条边的延长线之间的夹角为100~170度。The display substrate according to any one of claims 1-3, wherein the included angle between two sides or the included angle between the extensions of at least one of the contour angles of the two closest third sub-pixels located in the first sub-pixel group and the second sub-pixel group respectively is 100 to 170 degrees. 根据权利要求1-4任一项所述的显示基板,还包括:The display substrate according to any one of claims 1-4 further comprises: 多条栅线,Multiple grid lines 其中,至少一条栅线的延伸方向与所述第一方向之间的夹角不大于3度。Wherein, the angle between the extension direction of at least one grid line and the first direction is no greater than 3 degrees. 根据权利要求1-4任一项所述的显示基板,还包括:The display substrate according to any one of claims 1-4 further comprises: 多条栅线,Multiple grid lines 其中,至少一条栅线的延伸方向与所述第一方向的夹角为30~60度。In this case, the angle between the extension direction of at least one grid line and the first direction is 30 to 60 degrees. 根据权利要求2所述的显示基板,其中,所述第一子像素的发光区和所述第二子像素的发光区在所述第一方向上的尺寸均小于所述第三子像素的发光区在所述第一方向上的尺寸;According to claim 2, the size of the light-emitting area of the first sub-pixel and the light-emitting area of the second sub-pixel in the first direction is smaller than the size of the light-emitting area of the third sub-pixel in the first direction. 所述第一子像素和所述第三子像素沿所述第二方向交替排列。The first sub-pixel and the third sub-pixel are arranged alternately along the second direction. 根据权利要求2所述的显示基板,其中,沿所述第二方向排列的相邻两个子像素组中的子像素的发光区相对于位于所述相邻两个子像素组之间且沿所述第一方向延伸的第一分隔线对称分布,且沿所述第二方向排列的相邻两个子像素组中的位于所述第一分隔线两侧且与其紧邻的至少四个第三子像素被配置为对应同一个掩模开口。According to claim 2, the light-emitting areas of the sub-pixels in two adjacent sub-pixel groups arranged along the second direction are symmetrically distributed with respect to a first dividing line located between the two adjacent sub-pixel groups and extending along the first direction, and at least four third sub-pixels in two adjacent sub-pixel groups arranged along the second direction, located on both sides of the first dividing line and adjacent to it, are configured to correspond to the same mask opening. 根据权利要求8所述的显示基板,其中,同一子像素组中包括N个第三子像素,沿所述第一方向排列的第N/2个第三子像素与第(N/2+1)个第三子像素之间包括沿所述第二方向延伸的第二分隔线,N为偶数;According to claim 8, the display substrate includes N third sub-pixels in the same sub-pixel group, and the N/2th third sub-pixel and the (N/2+1)th third sub-pixel arranged along the first direction are separated by a second dividing line extending along the second direction, where N is an even number; 同一子像素组中,子像素的发光区相对于所述第二分隔线对称分布。Within the same sub-pixel group, the light-emitting areas of the sub-pixels are symmetrically distributed relative to the second dividing line. 根据权利要求1-9任一项所述的显示基板,其中,所述第三子像素的发光区包括沿所述第一方向延伸的至少一条第一边,且所述第一子像素的发光区和所述第二子像素的发光区中与所述第一边紧邻的边的延伸方向均与所述第一方向相交。According to any one of claims 1-9, the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and the extending directions of the sides adjacent to the first side in both the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel intersect with the first direction. 根据权利要求1-8任一项所述的显示基板,其中,所述第三子像素的发光区包括沿所述第一方向延伸的至少一条第一边,同一子像素组中,至少相邻的两个第三子像素的发光区的第一边与所述第一子像素的发光区中沿所述第一方向延伸的中心线之间的距离不同。The display substrate according to any one of claims 1-8, wherein the light-emitting area of the third sub-pixel includes at least one first side extending along the first direction, and in the same sub-pixel group, the distance between the first side of the light-emitting area of at least two adjacent third sub-pixels and the center line extending along the first direction in the light-emitting area of the first sub-pixel is different. 根据权利要求11所述的显示基板,其中,同一子像素组中,所述第一子像素的发光区和所述第二子像素的发光区中与所述第一边紧邻的边的延伸方向均与所述第一边的延伸方向相交。According to the display substrate of claim 11, in the same sub-pixel group, the extending directions of the edges adjacent to the first edge in the light-emitting areas of the first sub-pixel and the light-emitting areas of the second sub-pixel all intersect with the extending direction of the first edge. 根据权利要求11或12所述的显示基板,其中,同一子像素组中,所述至少相邻的两个第三子像素之一的第一边靠近其所在子像素组中的所述第一子像素和所述第二子像素,所述至少相邻的两个第三子像素中的另一个的第一边远离其所在子像素组中的所述第一子像素和所述第二子像素。The display substrate according to claim 11 or 12, wherein, in the same sub-pixel group, the first side of one of the at least two adjacent third sub-pixels is close to the first sub-pixel and the second sub-pixel in its sub-pixel group, and the first side of the other of the at least two adjacent third sub-pixels is far away from the first sub-pixel and the second sub-pixel in its sub-pixel group. 根据权利要求11-13任一项所述的显示基板,其中,所述第三子像素的发光区还包括彼此连接的第二边和第三边,所述第二边和与其紧邻的所述第一子像素的发光区的边之间的角度不大于5度,所述第三边和与其紧邻的所述第二子像素的发光区的边之间的角度不大于5度,且所述第一边和所述第二边位于所述第三子像素的发光区的中心在所述第二方向上的两侧。According to any one of claims 11-13, the light-emitting area of the third sub-pixel further includes a second side and a third side connected to each other, the angle between the second side and the side of the light-emitting area of the first sub-pixel adjacent to it is not greater than 5 degrees, the angle between the third side and the side of the light-emitting area of the second sub-pixel adjacent to it is not greater than 5 degrees, and the first side and the second side are located on both sides of the center of the light-emitting area of the third sub-pixel in the second direction. 根据权利要求8所述的显示基板,其中,至少部分子像素包括发光功能层、第一电极、第二电极以及像素电路,所述第一电极位于所述发光功能层与所述衬底基板之间且与所述像素电路电连接,所述第二电极位于所述发光功能层远离所述第一电极的一侧;According to claim 8, the display substrate, wherein at least a portion of the sub-pixels include a light-emitting functional layer, a first electrode, a second electrode, and a pixel circuit, wherein the first electrode is located between the light-emitting functional layer and the substrate and is electrically connected to the pixel circuit, and the second electrode is located on the side of the light-emitting functional layer away from the first electrode. 沿所述第二方向排列的相邻两个子像素组中,所述第三子像素的第一电极相对于所述第一分隔线对称分布。In two adjacent sub-pixel groups arranged along the second direction, the first electrode of the third sub-pixel is symmetrically distributed with respect to the first dividing line. 根据权利要求15所述的显示基板,其中,沿所述第二方向排列的相邻两个子像素组中,所述第一子像素和所述第二子像素至少之一的第一电极相对于所述第一分隔线对称分布。According to the display substrate of claim 15, in two adjacent sub-pixel groups arranged along the second direction, the first electrode of at least one of the first sub-pixel and the second sub-pixel is symmetrically distributed with respect to the first dividing line. 根据权利要求15或16所述的显示基板,其中,所述第一电极包括彼此连接的主体电极以及连接电极,沿垂直于所述衬底基板的方向,所述连接电极与所述子像素的发光区没有交叠;According to the display substrate of claim 15 or 16, the first electrode includes a main electrode and a connecting electrode connected to each other, and the connecting electrode does not overlap with the light-emitting area of the sub-pixel in a direction perpendicular to the substrate. 同一子像素组中,所述第三子像素的连接电极位于其主体电极与所述第二子像素的主体电极之间,所述第二子像素的连接电极位于其主体电极与所述第一子像素的主体电极之间,所述第一子像素的连接电极位于其主体电极与所述第三子像素的主体电极之间。In the same sub-pixel group, the connection electrode of the third sub-pixel is located between its main electrode and the main electrode of the second sub-pixel, the connection electrode of the second sub-pixel is located between its main electrode and the main electrode of the first sub-pixel, and the connection electrode of the first sub-pixel is located between its main electrode and the main electrode of the third sub-pixel. 根据权利要求2所述的显示基板,其中,同一个子像素组中,至少两个第一子像素和至少两个第二子像素的至少一种对应同一个掩模开口。According to claim 2, in the same sub-pixel group, at least two first sub-pixels and at least two second sub-pixels correspond to the same mask opening. 根据权利要求9所述的显示基板,其中,沿所述第二方向排列的相邻两个子像素组中,位于所述第一分隔线两侧且与其紧邻的至少两个第一子像素被配置为对应同一个掩模开口,且位于所述第一分隔线两侧且与其紧邻的至少两个第二子像素被配置为对应同一个掩模开口。According to claim 9, in the display substrate, in two adjacent sub-pixel groups arranged along the second direction, at least two first sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening, and at least two second sub-pixels located on both sides of the first dividing line and adjacent to it are configured to correspond to the same mask opening. 一种显示装置,包括权利要求1-19任一项所述的显示基板。A display device comprising the display substrate as described in any one of claims 1-19.
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