WO2025258552A1 - Semiconductor module and method for manufacturing semiconductor module - Google Patents
Semiconductor module and method for manufacturing semiconductor moduleInfo
- Publication number
- WO2025258552A1 WO2025258552A1 PCT/JP2025/020760 JP2025020760W WO2025258552A1 WO 2025258552 A1 WO2025258552 A1 WO 2025258552A1 JP 2025020760 W JP2025020760 W JP 2025020760W WO 2025258552 A1 WO2025258552 A1 WO 2025258552A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- chip
- cube
- semiconductor module
- substrate
- frame body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B80/00—Assemblies of multiple devices comprising at least one memory device covered by this subclass
Definitions
- One embodiment of the present invention relates to a semiconductor module and a method for manufacturing a semiconductor module.
- electronic computers used in data centers and other locations include semiconductor modules that mount multiple stacked memory chips, multiple IC (Integrated Circuit) chips including processing circuits, and multiple IC chips including image processing circuits on a single package substrate. These semiconductor modules enable electronic computers to increase memory capacity and process large volumes of data during data communications between each IC chip and each memory chip.
- IC Integrated Circuit
- Patent Documents 1 to 4 and Non-Patent Document 1 disclose examples of stacked chips in which multiple chips are stacked, or methods for mounting stacked chips.
- Patent Documents 2 and 3 also disclose technology for contactless communication between two chips.
- Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 disclose technology for forming wiring on the sidewalls of stacked chips as an example of a method for mounting stacked chips.
- the semiconductor module uses multiple through electrodes, multiple bumps, etc. to mount a stacked memory chip in which multiple memory chips are stacked, multiple IC chips including an arithmetic processing circuit, and multiple IC chips including an image processing circuit on a single package substrate.
- this semiconductor module includes multiple IC chips mounted on a single package substrate, if a stacked memory chip fails, it is difficult to replace only the stacked memory chip. Furthermore, when multiple IC chips are mounted on a single package substrate, the package substrate may warp. If the package substrate warps, poor connection may occur between the multiple IC chips and the package substrate, or between the package substrate and the motherboard. This reduces the long-term reliability of the semiconductor module. Furthermore, the techniques for forming wiring on the sidewalls of stacked chips disclosed in Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 include a new process for forming wiring on the sidewalls of the stacked chips.
- Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 increase the manufacturing costs of the semiconductor module due to the additional process. Furthermore, the techniques described in Patent Documents 2 and 3 include a new process for forming wiring for contactless communication (e.g., wireless communication, inductor communication) on the sidewalls of the stacked chips or the bottom surface of the stacked memory chips. Therefore, the techniques described in Patent Documents 2 and 3 increase the manufacturing costs due to the additional process for wireless communication.
- contactless communication e.g., wireless communication, inductor communication
- one embodiment of the present invention aims to provide a semiconductor module that can suppress a decline in long-term reliability. Furthermore, one embodiment of the present invention aims to provide a semiconductor module that can suppress manufacturing costs.
- a semiconductor module includes a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction, a frame body arranged on the first surface along a third direction intersecting the first direction and the second direction, and a first cube chip attached to the frame body, arranged on the first surface along the third direction, and including a plurality of stacked IC chips.
- the first substrate may include a first inductor arranged parallel to and spaced apart from the first surface
- the IC chip may include a second inductor arranged parallel to and spaced apart from the first surface, and the first inductor may communicate with the second inductor in a non-contact manner.
- the IC chip may include a plurality of memory cell arrays electrically connected to the second inductor.
- the frame body may include a first inclined portion
- the first cube chip may include a second inclined portion
- the angle between the first surface and the first inclined portion may be the same as the angle between the first surface and the second inclined portion
- the first cube chip includes a stacked memory chip including the plurality of IC chips, a first electrode electrically connected to the stacked memory chip, and a structure
- the stacked memory chip includes at least a first outermost surface, which are the two outermost surfaces in the third direction, and a second outermost surface opposite the first outermost surface, and a third outermost surface, which are parallel to the third direction and the first direction and are the two outermost surfaces in the second direction, and a fourth outermost surface opposite the third outermost surface
- the first electrode is electrically connected to the third outermost surface
- the structure includes the second inclined portion and may be provided so as to contact the third outermost surface other than the surface to which the first electrode is connected.
- the first electrode may be electrically connected to a power supply unit including a plurality of terminals to which a power supply voltage is supplied.
- the first cube chip may include a second electrode electrically connected to the second outermost surface, and a ground voltage may be supplied to the second electrode.
- the device may further include a heat spreader, which is electrically connected to the second electrode and supplies the ground voltage to the second electrode.
- the structure may include resin or metal.
- the frame body may be configured by combining a first frame body, a second frame body, a third frame body, and a fourth frame body in a rectangular shape.
- the frame body may include a first L-shaped frame body, a second L-shaped frame body, a third L-shaped frame body, and a fourth L-shaped frame body spaced apart from one another and provided at the four corners of a rectangle.
- the frame body may include a first L-shaped frame body and a second L-shaped frame body spaced apart from each other and located at two diagonal corners of a rectangle.
- a second cube chip attached to the frame, disposed on the first surface, adjacent to the first cube chip, and stacked with a plurality of IC chips different from the plurality of IC chips; and a connecting member connecting the first cube chip and the second cube chip, wherein each of the first cube chip and the second cube chip has a first outermost surface and a second outermost surface opposite the first outermost surface, which are the two outermost surfaces in the third direction, and two outermost surfaces parallel to the third direction and the first direction and in the second direction.
- the cube chip may include a third outermost surface and a fourth outermost surface opposite the third outermost surface, which are outer surfaces, and a fifth outermost surface and a sixth outermost surface opposite the fifth outermost surface, which are two outermost surfaces parallel to the third direction and the second direction and in the first direction, and the fifth outermost surface of the first cube chip may be in contact with the sixth outermost surface of the second cube chip, and the connecting member may be in contact with at least the sixth outermost surface, the third outermost surface, and the fourth outermost surface of the first cube chip, and the third outermost surface and the fourth outermost surface of the second cube chip.
- Each of the first cube chip and the second cube chip may include a first electrode in contact with the third outermost surface and a second electrode in contact with the fourth outermost surface, and the connection member may be in contact with the first electrode and the second electrode and supply a power supply voltage to the first electrode and the second electrode.
- the first cube chip includes an electrode provided on a surface that is pressed against the first surface and a surface different from the surface that is pressed against the first surface, and the surface that is pressed against the first surface is disposed at a predetermined position on the first substrate via the frame, and the first cube chip is not electrically or mechanically connected to the first substrate, but may be electrically connected to an external circuit via the electrode.
- One embodiment of the present invention is a method for manufacturing a semiconductor module including a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction; a frame body arranged on the first surface along a third direction intersecting the first direction and the second direction; and a cube chip including a plurality of stacked IC chips attached to the frame body and arranged on the first surface along the third direction, the manufacturing method including forming the frame body on the first surface, and rotating the cube chip to place it on the frame body and the first surface so that a first inclined portion included in the frame body and a second inclined portion included in the cube chip are fitted together.
- the method may further include vibrating the first substrate to position the cube chip on the frame and the first surface.
- FIG. 1 is a perspective view showing a configuration of a semiconductor module according to a first embodiment of the present invention
- 2 is an end view showing the cross-sectional structure of the end portion of the semiconductor module taken along line A1-A2 shown in FIG. 1
- 2 is an end view showing the cross-sectional structure of the end portion of the semiconductor module taken along line B1-B2 shown in FIG. 1
- FIG. 2 is a perspective view showing a plurality of inductors included in the cube chip and a plurality of inductors included in the first substrate according to the first embodiment of the present invention.
- FIG. 10 is a flowchart showing an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view illustrating an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view illustrating an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view illustrating an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view illustrating an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view illustrating an example of a method for manufacturing a frame body according to a second embodiment of the present invention.
- FIG. 10 is a perspective view showing the configuration of a frame body according to a third embodiment of the present invention.
- FIG. 10 is a perspective view showing the configuration of a frame body according to a third embodiment of the present invention.
- FIG. 10 is an end view showing an enlarged view of a part of the end cross-sectional structure of the configuration of a semiconductor module according to a fourth embodiment of the present invention.
- FIG. 10 is an end view showing an enlarged view of a part of the end cross-sectional structure of the configuration of a semiconductor module according to a fourth embodiment of the present invention.
- FIG. 10 is an end view showing an enlarged view of a part of the end cross-sectional structure of the configuration of a semiconductor module according to a fourth embodiment of the present invention.
- 13 is a flowchart showing an example of a method for forming electrodes included in a cube chip according to a fifth embodiment of the present invention.
- FIG. 13 is a perspective view illustrating an example of a method for forming an electrode according to a fifth embodiment of the present invention.
- 13A to 13C are plan views illustrating an example of a method for forming an electrode according to a fifth embodiment of the present invention.
- FIG. 13 is a perspective view illustrating an example of a method for forming an electrode according to a fifth embodiment of the present invention.
- FIG. 13 is a perspective view illustrating an example of a method for forming an electrode according to a fifth embodiment of the present invention.
- 13 is a flowchart showing an example of a method for forming electrodes included in a cube chip according to a sixth embodiment of the present invention.
- FIG. 13 is a perspective view illustrating an example of a method for forming an electrode according to a sixth embodiment of the present invention.
- FIG. 13 is a plan view illustrating an example of a method for forming an electrode according to a sixth embodiment of the present invention.
- FIG. 13 is a perspective view illustrating an example of a method for forming an electrode according to a sixth embodiment of the present invention.
- FIG. 13 is a flowchart illustrating an example of a method for manufacturing a semiconductor module according to a seventh embodiment of the present invention.
- 13 is a flowchart illustrating an example of a method for manufacturing a semiconductor module according to a seventh embodiment of the present invention.
- FIG. 13 is a plan view showing an example of the configuration of a semiconductor module according to an eighth embodiment of the present invention.
- FIG. 13 is a plan view showing an example of the configuration of a semiconductor module according to a ninth embodiment of the present invention.
- 30 is an end view showing the cross-sectional structure of the end portion of the semiconductor module taken along line C1-C2 shown in FIG. 29.
- FIG. 22 is a plan view showing an example of the configuration of a semiconductor module according to a tenth embodiment of the present invention.
- FIG. 33 is an end view showing the cross-sectional structure of the end portion of the semiconductor module taken along line E1-E2 shown in FIG. 32.
- 20 is a flowchart illustrating an example of a method for manufacturing a semiconductor module according to a tenth embodiment of the present invention.
- 13A and 13B are end views for explaining an example of a method for manufacturing a semiconductor module according to a tenth embodiment of the present invention.
- 13A and 13B are end views for explaining an example of a method for manufacturing a semiconductor module according to a tenth embodiment of the present invention.
- 13A and 13B are end views for explaining an example of a method for manufacturing a semiconductor module according to a tenth embodiment of the present invention.
- FIG. 23 is an end view showing the cross-sectional structure of an end portion of a semiconductor module according to an eleventh embodiment of the present invention.
- 22 is a flowchart showing an example of a method for manufacturing a semiconductor module according to an eleventh embodiment of the present invention.
- 12A to 12C are end views for explaining an example of a method for manufacturing a semiconductor module according to an eleventh embodiment of the present invention.
- FIG. 12A to 12C are end views for explaining an example of a method for manufacturing a semiconductor module according to an eleventh embodiment of the present invention.
- FIG. 23 is an end view showing the cross-sectional structure of an end portion of a semiconductor module according to a twelfth embodiment of the present invention.
- a component or region when a component or region is said to be "above (or below)" another component or region, unless otherwise specified, this includes not only the case where it is directly above (or below) the other component or region, but also the case where it is above (or below) the other component or region, i.e., the case where another component is included between the two components above (or below) the other component or region.
- the first direction D1 intersects the second direction D2
- the third direction D3 intersects the first direction D1 and the second direction D2 (D1D2 plane).
- the terms “identical” and “matching” when the terms “identical” and “matching” are used, the terms “identical” and “matching” may include a margin of error within the design range. Furthermore, in one embodiment of the present invention, when a margin of error within the design range is included, the terms “approximately identical” and “approximately matching” may be used.
- Figure 1 is a perspective view showing the configuration of the semiconductor module 10.
- Figure 2 is an end view showing the cross-sectional structure of the end of the semiconductor module 10 taken along line A1-A2 shown in Figure 1.
- Figure 3 is an end view showing the cross-sectional structure of the end of the semiconductor module 10 taken along line B1-B2 shown in Figure 1.
- the semiconductor module 10 includes a cube chip 100, a frame 200, and a first substrate 300.
- the semiconductor module 10 may also include an insulating film 40 and an insulating film 210, and may also include a thermally conductive sheet 800 (see Figure 15) and a metal film 900 (see Figure 15).
- the frame 200 is provided on the first surface 304 of the first substrate 300
- the cube chip 100 is provided on the first substrate 300 so as to be attachable to the frame 200 and detachable from the frame 200.
- the semiconductor module 10 may be mounted on a motherboard (not shown) using a plurality of bumps (not shown). As a result, for example, if the cube chip 100 malfunctions, the cube chip 100 can be removed from the semiconductor module 10 and a cube chip 100 that is not malfunctioning can be attached. In other words, the semiconductor module 10 has a configuration that allows the cube chip 100 to be replaced.
- the cube chip 100 includes an IC chip 110 that includes a memory cell array 115 (see FIG. 7), and functions as a memory device. Furthermore, the cube chip 100 includes an inductor 172, and the first substrate 300 includes an inductor 372, with the inductor 172 being capable of non-contact inductive communication with the inductor 372. In other words, the cube chip 100 can transmit, receive, and store (memorize) signals (e.g., data) with the first substrate 300 using non-contact inductive communication, rather than transmitting and receiving signals via a signal path routed over a long distance using wiring, through electrodes, bumps, etc.
- signals e.g., data
- the semiconductor module 10 includes a configuration that allows the cube chip 100 to be attached and detached, enabling long-term use, and the manufacturing process for the semiconductor module 10 can eliminate the need for processes that involve routing wiring, through-electrodes, bumps, and the like over long distances. Therefore, the semiconductor module 10 can reduce manufacturing costs and maintain reliability without compromising long-term reliability.
- the cube chip 100 includes stacked memory chips 30, side power supply wiring 162 and side ground wiring 163 electrically connected to the stacked memory chips 30, and structures 50 and 50A in contact with the stacked memory chips 30.
- the cube chip 100 also includes a first outermost surface (first surface 146) and a second outermost surface (second surface 148) opposite the first outermost surface, which are two outermost surfaces in the third direction D3, a third outermost surface (third surface 145) and a fourth outermost surface (fourth surface 147) parallel to the third direction D3 and the first direction D1 and which are two outermost surfaces in the second direction D2, and a fifth outermost surface (fifth surface 142) and a sixth outermost surface (sixth surface 144) parallel to the third direction D3 and the second direction D2 and which are two outermost surfaces in the first direction D1.
- the stacked memory chip 30 includes multiple IC chips 110, each including multiple power supply wiring 164, multiple ground wiring 165, multiple signal transmission wiring 166 (see Figure 7), and multiple inductors 172.
- the stacked memory chip 30 also includes a first outermost surface (first surface 46) and a second outermost surface (second surface 48) opposite the first outermost surface, which are the two outermost surfaces in the third direction D3; a third outermost surface (third surface 45) and a fourth outermost surface (fourth surface 47) parallel to the third direction D3 and the first direction D1, which are the two outermost surfaces in the second direction D2; and a fifth outermost surface (fifth surface 42) and a sixth outermost surface (sixth surface 44) parallel to the third direction D3 and the second direction D2, which are the two outermost surfaces in the first direction D1.
- the first surface 46, second surface 48, third surface 45, fourth surface 47, fifth surface 42, and sixth surface 44 of the stacked memory chip 30 are parallel to the first surface 146, second surface 148, third surface 145, fourth surface 147, fifth surface 142, and sixth surface 144 of the cube chip 100.
- the first surface 46 is parallel to the first surface 146
- the second surface 48 is parallel to the second surface 148.
- the third surfaces 45 to 44 and the third surfaces 145 to 144 are also parallel to their corresponding surfaces, as are the first surface 46 and the first surface 146, and the second surface 48 and the second surface 148.
- a portion of the first surface 146 is the first surface 46.
- the first surfaces 146 other than the first surfaces 146 that contact the structure 50A are the first surfaces 46.
- the multiple IC chips 110 include IC chip 110n (see Figure 5) and IC chip 110n+1 (see Figure 5) arranged adjacent to IC chip 110n.
- the IC chips are expressed as IC chip 110.
- the IC chips are expressed as IC chip 110n, IC chip 110n+1, etc.
- the multiple power supply wirings 164 are exposed on the third surface 45 and the fourth surface 47 and are electrically connected to the side surface power supply wirings 162.
- the multiple ground wirings 165 are exposed on the second surface 48 and are electrically connected to the side surface ground wirings 163.
- the multiple inductors 172 are arranged parallel to the first surface 46 for each IC chip and spaced apart from the first surface 46, and are arranged side by side in the second direction D2 for each IC chip. Note that the inductors 172 may be arranged across multiple IC chips.
- the side power supply wiring 162 contacts the third surface 45 and the fourth surface 47 and is provided on the third surface 45 and the fourth surface 47.
- the side power supply wiring 162 also contacts the third surface 145 and the fourth surface 147.
- the side ground wiring 163 contacts the second surface 48 and is provided on the second surface 48.
- the side ground wiring 163 also contacts the second surface 148.
- the side power supply wiring 162 has the function of supplying a power supply voltage to multiple power supply wirings 164, and the side ground wiring 163 has the function of supplying a ground voltage to multiple ground wirings 165.
- the power supply voltage is voltage VDD and the ground voltage is voltage VSS.
- voltage VDD is a power supply voltage such as 1V or 3V
- voltage VSS is 0V, for example.
- the side power supply wiring 162 and the side ground wiring 163 are not electrically connected to the first substrate 300 but are electrically connected to an external device (not shown). That is, the power supply voltage and ground voltage are supplied to the cube chip 100 via the side power supply wiring 162 and side ground wiring 163 that are independent of the first substrate 300, without passing through the first substrate 300.
- the structure 50 is provided in contact with a portion of the third surface 45 other than the third surface 45 to which the side surface power supply wiring 162 contacts, is provided in contact with a portion of the fourth surface 47 other than the fourth surface 47 to which the side surface power supply wiring 162 contacts, and is provided in contact with portions of the fifth surface 42 and the sixth surface 44.
- the structure 50 is also provided in contact with a second surface 48 other than the second surface 48 to which the side surface ground wiring 163 contacts.
- the structure 50 is provided to cover the corner where the second surface 48, the third surface 45, and the fifth surface 42 contact, a portion of the fifth surface 42, and the corner where the second surface 48, the fifth surface 42, and the fourth surface 47 contact.
- the structure 50 is arranged to cover the corner where the fourth surface 47 and the sixth surface 44 meet, a portion of the sixth surface 44, and the corner where the second surface 48, the sixth surface 44, and the third surface 45 meet.
- the structure 50A includes a second inclined portion 51, and is provided in contact with the third surface 45 other than the third surface 45 with which the side power supply wiring 162 covered by the structure 50 is in contact, and is provided in contact with the fourth surface 47 other than the fourth surface 47 with which the side power supply wiring 162 covered by the structure 50 is in contact, and is provided in contact with the fifth surface 42 and the sixth surface 44 other than the portions of the fifth surface 42 and the sixth surface 44 covered by the structure 50.
- structures 50 and 50A are spaced apart, but structures 50 and 50A are in contact on the third surface 145 side in the second direction D2 (not shown). Also, in the end view shown in Figure 3, structure 50 is in contact with third surface 145 and fourth surface 147, and is uniformly provided on third surface 145 and fourth surface 147.
- the structures 50 and 50A cover and contact the surfaces of the stacked memory chip 30 that do not have side wiring (e.g., side ground wiring 163 and side power supply wiring 162).
- the structures 50 and 50A include a sealing material.
- the sealing material includes a resin material such as epoxy, a hardener, a filler, and additives.
- the structures 50 and 50A function to suppress moisture absorption and the intrusion of impurities into the stacked memory chip 30, as well as to protect against physical impact.
- the structure 50A is fitted into the frame body 200 and functions as a member for fixing the cube chip 100 to the frame body 200 and the first substrate 300.
- the structure 50A may also include metal.
- the cube chip 100 is fitted into the frame 200 and is provided on the first surface 304 of the first substrate 300.
- the cube chip 100 is fitted into the frame 200 so that the second inclined portion 51 is parallel to the first inclined portion 41 of the frame 200.
- the angle between the first surface 304 and the second inclined portion 51 is angle ⁇ .
- the angle ⁇ is designed so that the length (width) of the first surface 146 along the first direction D1 is the length of the first surface 146 ⁇ 2 ⁇ m. Both ends of the length of the first surface 146 correspond to the ends of the second inclined portion 51, and the angle ⁇ at one end of the second inclined portion 51 is designed so that the length of the first surface 146 is ⁇ 1 ⁇ m.
- the positional accuracy of the cube chip 100 may be expressed as ⁇ 2 ⁇ m with respect to the length (width) of the frame body 200 along the first direction D1, or as ⁇ 1 ⁇ m with respect to one end of the length (width) of the frame body 200.
- the frame 200 includes a first inclined portion 41 , and is in contact with and provided on the first surface 304 of the first substrate 300 .
- the shape of the frame body 200 is trapezoidal, and the length of the side tangent to the first surface 304 is longer than the side opposite the first surface 304 in the third direction D3.
- the angle ⁇ between the first surface 304 and the first inclined portion 41 is the same as the angle ⁇ between the first surface 304 and the second inclined portion 51.
- the first inclined portion 41 and the second inclined portion 51 may be configured to interlock with each other.
- the first inclined portion 41 may include a structure that is recessed more upward than downward along the third direction D3
- the second inclined portion 51 may include a structure that is recessed more downward than upward along the third direction D3, and the first inclined portion 41 may be configured to interlock with the second inclined portion 51.
- the frame body 200 has the function of fitting the cube chip 100 and fixing the cube chip 100 onto the first substrate 300.
- the frame body 200 may be configured to allow an IC chip to be attached and detached, similar to an IC socket.
- the frame body 200 is configured to allow the cube chip 100 to be attached and to allow the cube chip 100 to be detached.
- the first substrate 300 includes at least a plurality of inductors 372, a control circuit (see, for example, FIG. 4 ) capable of controlling the plurality of inductors 372, and a multilayer wiring structure in which wiring and insulating layers are alternately stacked.
- the first substrate 300 includes a first surface 304, a second surface 302, and a plurality of wiring layers 326, 328, 330, 332, and 334.
- the wiring layers 326, 328, 330, 332, and 334 are arranged parallel to the first direction D1 and the second direction D2, and are stacked in this order from the side closest to the first surface 304 along the third direction D3.
- the plurality of wiring layers 326 includes a wiring 327 and an inductor 372.
- the plurality of wiring layers 328, 330, 332, and 334 include a plurality of wirings 329, a plurality of wirings 331, a plurality of wirings 333, and a plurality of wirings 335.
- the wiring 327 and the inductor 372 are electrically connected to the wiring 329, the wiring 329 is electrically connected to the wiring 331, the wiring 331 is electrically connected to the wiring 333, and the wiring 333 is electrically connected to the wiring 335.
- the insulating layers alternately stacked with the wiring are not shown.
- the number of layers in the multilayer wiring structure of the first substrate 300 is not limited to the number of layers (five layers) shown in Figures 2 and 3.
- the number of layers in the multilayer wiring structure of the first substrate 300 can be changed as appropriate based on the application or specifications of the semiconductor module 10, etc.
- the wiring 335 may be exposed on the second surface 302 and function as an electrode.
- the wiring 335 of the semiconductor module 10 may be electrically connected to a motherboard (not shown) by a bump (not shown) or the like.
- the motherboard may be a substrate on which the semiconductor module 10, a CPU (Central Processing Unit) including multiple arithmetic circuits and capable of arithmetic processing, and a GPU (Graphics Processing Unit) including multiple arithmetic circuits and capable of image processing or video processing are mounted.
- the semiconductor module 10 may include a CPU including multiple arithmetic circuits and capable of arithmetic processing, or a GPU including multiple arithmetic circuits and capable of image processing or video processing.
- the first substrate 300 has the function of fixing and supporting the frame body 200 and the cube chip 100, and the function of communicating with the cube chip 100 via inductor.
- the first substrate 300 may also have the function of connecting the cube chip 100 to an external device, etc.
- the semiconductor module 10 may include an insulating film 40 and an insulating film 210 as shown in FIG. 2 or FIG.
- the insulating film 40 is provided so as to contact the first surface 146.
- the first surface 146 is an important surface for the cube chip 100 to perform inductive communication with the first substrate 300, and the insulating film 40 has the function of coating the first surface 146 and protecting the first surface 146.
- the insulating film 40 also has the function of preventing the cube chip 100 from contacting the first substrate 300 and insulating the cube chip 100 from the first substrate 300.
- the insulating film 40 may be provided so as to contact the second inclined portion 51.
- the insulating film 210 contacts the first inclined portion 41, the first surface 304, the second inclined portion 51, and the insulating film 40, and is provided between the first inclined portion 41 and the first surface 304 and the second inclined portion 51 and the insulating film 40.
- the insulating film 210 prevents the cube chip 100 from contacting the first substrate 300, and functions to insulate the cube chip 100 from the first substrate 300.
- the insulating film 40 and the insulating film 210 may be made of resin, which may be a fluororesin such as Teflon (registered trademark).
- the semiconductor module 10 shown in Figures 2 and 3 includes, as an example, both the insulating film 40 and the insulating film 210.
- the cube chip 100 and the first substrate 300 only need to be insulated from each other and have a configuration that allows them to be attached and detached from each other, and the semiconductor module 10 may include either the insulating film 40 or the insulating film 210.
- the semiconductor module 10 may include a thermally conductive sheet 800 (see FIG. 15) and a metal film 900 (see FIG. 15).
- the thermally conductive sheet 800 or the metal film 900 may function as a heat spreader, or may be a heat spreader itself.
- the thermally conductive sheet 800 and the metal film 900 have the function of releasing heat generated by the semiconductor module 10 to the outside of the semiconductor module 10.
- FIG. 10 is a block diagram showing the functional block configuration of the semiconductor module 10. Configurations that are the same as or similar to those in Figures 1 to 3 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 3 may be omitted.
- the semiconductor module 10 includes a cube chip 100 and a first substrate 300.
- the cube chip 100 includes multiple magnetically coupled chip-to-chip interfaces (Through Chip Interface-IO (TCI-IO)) 112 and multiple memory modules 111.
- TCI-IO Through Chip Interface-IO
- the multiple TCI-IOs 112 are electrically connected to the memory modules 111.
- the cube chip 100 (stacked memory chip 30) includes a function for storing received data and a function for transmitting stored data.
- the TCI-IO 112 includes an inductor 172 (second inductor), a transmitting/receiving circuit 114, and a parallel-serial conversion circuit 113.
- the inductor 172 is electrically connected to the transmitting/receiving circuit 114 using terminals A and B.
- the transmitting/receiving circuit 114 is electrically connected to the parallel-serial conversion circuit 113.
- the parallel-serial conversion circuit 113 is electrically connected to the memory module 111.
- Inductor 172 has the function of performing non-contact inductor communication with inductor 372 (first inductor) on the first substrate 300.
- the transmitter/receiver circuit 114 has the function of amplifying signals (e.g., control signals and data signals) received by the inductor 172, and the function of removing noise from the received signals (e.g., control signals and data signals). Furthermore, for example, the transmitter/receiver circuit 114 has the function of transmitting desired signals (e.g., control signals and data signals) converted using the parallel-to-serial conversion circuit 113 over radio waves.
- the signals received by the inductor 172 include a large number of parallel signals (parallel signals) from the first board 300.
- the desired signals include a large number of parallel signals (parallel signals) from the memory module 111.
- the parallel-serial conversion circuit 113 converts a large number of parallel signals from the first board 300 into serial signals (serial signals) by parallel-serial conversion.
- the serial signals are transferred at high speed using a single signal path (wiring).
- the parallel-serial conversion circuit 113 converts the serial signals into parallel signals just before the memory module 111, returning them to a large number of parallel signals, and then transmits the large number of parallel signals to the memory module 111.
- the parallel-serial conversion circuit 113 performs step 2 followed by step 1.
- the parallel-serial conversion circuit 113 is called, for example, a SerDes circuit (Serialize and Deserialize Circuit).
- memory module 111 includes the functionality of generating a large number of parallel signals to be transmitted, and the functionality of controlling a large number of parallel signals received and storing them in memory cell array 115 (see Figure 7).
- the first board 300 includes multiple TCI-IOs 312 and multiple TCI-IO control modules 311.
- the multiple TCI-IOs 312 are electrically connected to the multiple TCI-IO control modules 311.
- the TCI-IO 312 includes an inductor 372, a transmitting/receiving circuit 314, and a parallel-to-serial conversion circuit 313.
- the inductor 372 is electrically connected to the transmitting/receiving circuit 314 using terminals C and D.
- the transmitting/receiving circuit 314 is electrically connected to the parallel-to-serial conversion circuit 313.
- the parallel-to-serial conversion circuit 313 is electrically connected to the TCI-IO control module 311.
- the configurations and functions of the inductor 372, the transmitter/receiver circuit 314, and the parallel-serial conversion circuit 313 are similar to the configurations and functions of the inductor 172, the transmitter/receiver circuit 114, and the parallel-serial conversion circuit 113.
- the TCI-IO control module 311 may include a CPU or GPU.
- the TCI-IO control module 311 may have the function of reading a control program stored in a DRAM (Dynamic Random Access Memory) (not shown) included in an external device, expanding the control program, executing processing based on the control program, and sending instructions (commands) to each IC chip 110 to execute processing based on the control program.
- DRAM Dynamic Random Access Memory
- FIG. 5 is a perspective view showing a plurality of inductors 172 included in the cube chip 100 and a plurality of inductors 372 included in the first substrate 300, and is a perspective view showing the configurations of the inductors 172 and 272. Configurations that are the same as or similar to those in Figs. 1 to 4 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 4 may be omitted.
- the cube chip 100 includes a plurality of inductors 172 arranged parallel to the third surface 145, which is parallel to the second direction D2 and the third direction D3, and spaced apart from the first surface 146 and the third surface 145.
- the multiple inductors 172 are arranged along the second direction D2.
- Each of the multiple inductors 172 includes terminal A, terminal B, a first portion 172a, a second portion 172b, a third portion 172c, a fourth portion 172e, and a fifth portion 172d.
- the fifth portion 172d extends in the second direction D2, and one end of the fifth portion 172d is electrically connected to terminal A, and the other end of the fifth portion 172d is electrically connected to one end of the fourth portion 172e.
- the fourth portion 172e extends in the third direction D3, and the other end of the fourth portion 172e is electrically connected to one end of the first portion 172a.
- the first portion 172a extends in the second direction D2, and the other end of the first portion 172a is electrically connected to one end of the second portion 172b.
- the second portion 172b extends in the third direction D3, and the other end of the second portion 172b is electrically connected to one end of the third portion 172c.
- the third portion 172c extends in the second direction D2, and the other end of the third portion 172c is electrically connected to terminal B.
- the fifth portion 372d extends in the second direction D2, and one end of the fifth portion 372d is electrically connected to terminal C, and the other end of the fifth portion 372d is electrically connected to one end of the fourth portion 372e.
- the fourth portion 372e extends in the first direction D1, and the other end of the fourth portion 372e is electrically connected to one end of the first portion 372a.
- the first portion 372a extends in the second direction D2, and the other end of the first portion 372a is electrically connected to one end of the second portion 372b.
- the second portion 372b extends in the first direction D1, and the other end of the second portion 372b is electrically connected to one end of the third portion 372c.
- the third portion 372c extends in the second direction D2, and the other end of the third portion 372c is electrically connected to terminal D.
- inductor 172 is arranged opposite inductor 372 at a 90-degree angle.
- first portion 172a of inductor 172 and first portion 372a of inductor 372 overlap and are arranged parallel and opposite to each other.
- Magnetic field coupling between one inductor 172 and one inductor 372 facing each other among the multiple inductors 172 and multiple inductors 372 enables one-to-one, non-contact communication between the inductors.
- communication between inductors due to magnetic field coupling is called inductor communication, signal communication, data communication, etc.
- the shapes of inductors 172 and 372 are not limited to the rectangular shapes shown in FIG. 5 and may be any shape that allows inductor communication.
- inductor 172 and inductor 372 are arranged opposite each other at 90 degrees, and are capable of one-to-one communication through magnetic field coupling.
- a magnetic field is generated by first portion 172a of inductor 172 and first portion 272a of inductor 372.
- effective inductor communication is performed by first portion 172a of inductor 172 and first portion 372a of inductor 372.
- First portion 172a mainly functions to perform inductor communication with first portion 372a.
- the second portion 372b, third portion 372c, fourth portion 372e, and fifth portion 372d of inductor 372, excluding first portion 372a mainly function to supply current to first portion 372a.
- the magnetic field shown in FIG. 5 is an example, and the magnetic field that is actually generated is not limited to the magnetic field shown in FIG. 5.
- Inductor 372 has the same configuration and function as inductor 172. Note that in semiconductor module 10, viewing a surface parallel to second direction D2 and third direction D3 from first direction D1 may be referred to as a front view, and viewing a surface parallel to first direction D1 and second direction D3 from third direction D3 may be referred to as a plan view.
- the first portion 172a, second portion 172b, third portion 172c, fourth portion 172e, and fifth portion 172d of the inductor 172 are provided so as to face and be parallel to the first portion 372a, second portion 372b, third portion 372c, fourth portion 372e, and fifth portion 372d of the inductor 372.
- the cube chip 100 can transmit and receive signals to and from the first substrate 300 using non-contact inductor communication, rather than transmitting and receiving signals via signal paths routed long distances using wiring, through-electrodes, bumps, etc.
- the manufacturing process for semiconductor module 10 can reduce the need for long-distance wiring by using wiring, through electrodes, bumps, etc., thereby reducing manufacturing costs and preventing a decrease in manufacturing yield. Furthermore, semiconductor module 10 can reduce the need for long-distance wiring by using wiring, through electrodes, bumps, etc., thereby reducing the resistance and parasitic capacitance caused by wiring. As a result, inductor communication using semiconductor module 10 can reduce the power consumption of semiconductor module 10.
- the IC chip 110 includes a first surface 102 parallel to the second direction D2 and the third direction D3, a second surface 104 opposite the first surface 102 in the first direction D1, a transistor layer 130, and a wiring layer 150.
- the first surface 102 is the surface opposite the surface on which the wiring layer 150 is arranged relative to the transistor layer 130
- the second surface 104 is the surface opposite the surface on which the wiring layer 150 is arranged relative to the transistor layer 130.
- the transistor layer 130 includes a semiconductor substrate 173, an isolation region 174, an activation region 175, a transistor 176, an insulating layer 177, and part of the wiring 178.
- the semiconductor substrate 173 is a Si substrate or Si-wafer, and is called a semiconductor substrate.
- a through electrode (not shown) that penetrates the semiconductor substrate 173 and the isolation region 174 may be provided.
- the wiring layer 150 includes a multilayer wiring structure in which wiring and insulating layers are alternately stacked.
- the wiring layer 150 includes a portion of the wiring 178, insulating layer 179, the wiring 180, insulating layer 181, insulating layer 182, and the wiring 183.
- the wiring 183 may be a through electrode.
- wiring 178 penetrates insulating layer 177 and is electrically connected to the source or drain of transistor 176.
- wiring 180 penetrates insulating layer 179 and is electrically connected to wiring 178.
- wiring 183 is electrically connected to wiring 180.
- inductor 172 is formed using wiring 183, and transceiver circuit 114, parallel-serial conversion circuit 113, and memory module 111 are formed using wiring 178, wiring 180, wiring 183, and transistor 176.
- the connections of each wiring shown in FIG. 6 are merely examples, and the connections of each wiring are not limited to the configuration shown in FIG. 6. The connections of each wiring can be changed as appropriate based on the application or specifications of semiconductor module 10.
- the multiple power supply wiring 164 and the multiple ground wiring 165 include the configuration described in "1-1-1. Configuration of the cube chip 100," and detailed description here will be omitted.
- the multiple signal transmission wiring 166 is electrically connected to the TCI-IO 112.
- the multiple signal transmission wiring 166 is connected to the first substrate 300 and an external circuit (not shown) via inductor communication, and receives control signals such as address signals and enable signals for controlling the IC chip 110, as well as signals including data, from the first substrate 300 and the external circuit.
- a frame mold 400 is temporarily fixed to the first substrate 300 (S11 shown in Figure 8). Specifically, as shown in Figure 9, the first substrate 300 is prepared, and the frame mold 400 is temporarily fixed onto the first surface 304 of the first substrate 300.
- the frame mold 400 is a mold for forming the frame body 200.
- the frame mold 400 may be configured to be attachable to and detachable from the first substrate 300 after the frame body 200 has been formed.
- the frame mold 400 may be formed from resin or metal.
- Step 13 (S13) shown in FIG. 8 is a step of temporarily fixing the cube chip 100 to the frame mold 400.
- the cube chip 100 is aligned inside the frame mold 400 and removably fixed on the first surface 304.
- the first surface 146 of the cube chip 100 is removably fixed on the first surface 304 so as to face the first surface 304.
- the structure that allows for attachment and detachment on the first surface 304 may be an adhesive film, adhesive layer, or the like that can attach and detach the cube chip 100 and the first substrate 300.
- the cube chip 100 is removably fixed on the first surface 304 so as to face the first surface 304 using a low-adhesion member.
- Step 15 (S15) shown in Figure 8 is a step of applying resin to form the frame body 200.
- resin to form the frame body 200 is applied between the cube chip 100 and the frame mold 400.
- the resin is applied using a dispensing device.
- the resin is a UV (Ultra Violet) curable resin.
- the resin is not limited to UV curable resin, and any resin that can be provided on the first substrate 300 as the frame body 200 and can fix the cube chip 100 can be used.
- Step 17 (S17) shown in Figure 8 is a step of hardening the resin applied in S15 to form the frame body 200.
- the resin used to form the frame body 200 is a UV-curable resin
- the resin is hardened using UV.
- Step 19 (S19) shown in FIG. 8 is a step of removing the cube chip 100 and frame mold 400 from the first substrate 300. Specifically, as shown in FIG. 12, the cube chip 100 and frame mold 400 are removed from the first substrate 300, and the frame body 200 is formed on the first substrate 300.
- the frame body 200 is configured by combining a first frame body 200L, a second frame body 200U, a third frame body 200R, and a fourth frame body 200D in a rectangular or square shape.
- the frame body 200 is formed.
- Figure 13 is a perspective view showing the configuration of frame body 202.
- Figure 14 is a perspective view showing the configuration of frame body 204. Configurations that are the same as or similar to those in Figures 1 to 12 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 12 may be omitted.
- the frame body 202 includes a first L-shaped frame body 202LD, a second L-shaped frame body 202LU, a third L-shaped frame body 202RU, and a fourth L-shaped frame body 202RD.
- the first L-shaped frame body 202LD, the second L-shaped frame body 202LU, the third L-shaped frame body 202RU, and the fourth L-shaped frame body 202RD are spaced apart from each other and arranged on the first substrate 300 at the four corners of a rectangle.
- first L-shaped frame body 202LD and the third L-shaped frame body 202RU are provided at two diagonal corners on one side of a rectangle
- the second L-shaped frame body 202LU and the fourth L-shaped frame body 202RD are provided at two diagonal corners on the other side of the same rectangle where the first L-shaped frame body 202LD and the third L-shaped frame body 202RU are provided.
- the amount of material forming the frame body 202 is less than the amount of material forming the frame body 200.
- the frame body 202 is a frame body that can reduce manufacturing costs.
- the frame body 202 which is formed with a small amount of material, can fit around the four corners of the cube chip 100 and fix it to the first substrate 300 using the first L-shaped frame body 202LD, second L-shaped frame body 202LU, third L-shaped frame body 202RU, and fourth L-shaped frame body 202RD. Therefore, the frame body 202, like the frame body 200, can compensate for positional deviation of the cube chip 100 in the second direction D2 and the first direction D1.
- the frame 204 includes a first L-shaped frame 204LD and a second L-shaped frame 204RU.
- the first L-shaped frame 204LD and the second L-shaped frame 204RU are spaced apart from each other and are provided on the first substrate 300 at two corners of a rectangle.
- the frame 14 does not include an L-shaped member located at one of the diagonal corners of the rectangular frame 202 shown in FIG. 13. Therefore, the amount of material forming the frame 204 is less than the amount of material forming the frame 202.
- the frame 204 is a frame that can further reduce manufacturing costs.
- the frame 204 formed with a small amount of material can fit around the two diagonal corners of the cube chip 100 using the first L-shaped frame 204LD and the second L-shaped frame 204RU, and can be fixed to the first substrate 300. Therefore, like the frame 200 and the frame 202, the frame 204 can compensate for positional deviations of the cube chip 100 in the second direction D2 and the first direction D1.
- FIG. 15 is an end view showing an enlarged portion of the cross-sectional structure of the end portion of the configuration of the semiconductor module 10A.
- FIG. 16 is an end view showing an enlarged portion of the cross-sectional structure of the end portion of the semiconductor module 10A after deformation. Configurations that are the same as or similar to those in FIGS. 1 to 14 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 14 may be omitted.
- the semiconductor module 10A differs from the semiconductor module 10 in the following configuration (1).
- the semiconductor module 10A includes a plurality of cube chips (e.g., cube chips 100A and 100B), a plurality of frames (e.g., frames 200A and 200B) to which the plurality of cube chips can be attached and detached, a plurality of inductors 372 corresponding to each of the plurality of cube chips, a power supply unit 700, a heat conduction sheet 800, and a metal film 900.
- semiconductor module 10A other than that shown in (1) is the same as that of semiconductor module 10. Therefore, differences from semiconductor module 10 will be mainly described here.
- each of the cube chips 100A and 100B is the same as the configuration of the cube chip 100
- the configuration of each of the frame bodies 200A and 200B is the same as the configuration of the frame body 200
- the configuration of each of the multiple inductors 372 corresponding to each of the multiple cube chips is the same as the configuration of the inductors 372 in the semiconductor module 10.
- the configuration of the second substrate 300A is the same as that of the first substrate 300, except for the configuration indicated by (1) in the semiconductor module 10A. Reference numerals for identical components have been omitted, and configurations similar to those in the semiconductor module 10 will be explained as necessary.
- the insulating films 40 and 210 have been omitted.
- Cube chip 100A is removably fitted to frame 200A and is provided on second substrate 300A (first surface 304A).
- Cube chip 100B is removably fitted to frame 200B and is provided on second substrate 300A (first surface 304A).
- the power supply unit 700 includes a support unit 701 that includes a plurality of pogo pins 702.
- the support unit 701 has the function of supporting the plurality of pogo pins 702.
- each of the plurality of pogo pins 702 is a connector composed of a terminal portion, a tubular member connected to the terminal portion, an elastic member inserted into the tubular member, and the like.
- the power supply unit 700 is sometimes called a pogo pin crimping mechanism.
- each of the multiple pogo pins 702 is pressed against a metal film or the like and comes into contact with the metal film. At this time, each of the multiple pogo pins 702 comes into contact with the metal film due to the expansion and contraction of the elastic member.
- a power supply unit 700 is provided between the fourth surface 147 of cube chip 100A and the third surface 145 of cube chip 100B, and on the third surface 145 of cube chip 100A and the fourth surface 147 of cube chip 100B.
- the power supply unit 700 electrically connects the side power supply wiring 162 of cube chips 100A and 100B by crimping a plurality of pogo pins 702 to each of the side power supply wiring 162 of cube chips 100A and 100B.
- the power supply unit 700 can supply a power supply voltage VDD to the cube chips 100A and 100B from an external device (external circuit) outside the semiconductor module 10A via the plurality of pogo pins 702.
- the metal film 900 is provided so as to contact the second surfaces 148 of the cube chips 100A and 100B. As a result, the metal film 900 is electrically connected to the side surface ground wiring 163 of each of the cube chips 100A and 100B.
- the thermally conductive sheet 800 is electrically connected to the metal film 900, which is electrically connected to the cube chips 100A and 100B. As a result, the thermally conductive sheet 800 can supply a ground voltage to the cube chips 100A and 100B from an external device outside the semiconductor module 10A via the metal film 900.
- the thermally conductive sheet 800 and metal film 900 have the functions of supplying voltage to the cube chips 100A and 100B, and dissipating heat generated by the semiconductor module 10A to the outside of the semiconductor module 10.
- a heat sink may be disposed on the thermally conductive sheet 800 and metal film 900.
- the substrate or chip may become warped, potentially causing the circuits to malfunction.
- the cube chip 100A or cube chip 100B will only be slightly displaced from the position where it was originally attached to the second substrate 300A in accordance with the warping of the second substrate 300A, and the cube chip 100A or cube chip 100B will not be detached from the frame 200A or frame 200B.
- each of the multiple pogo pins 702 maintains an electrical connection to the cube chip 100A or cube chip 100B due to the expansion and contraction of the elastic member. In other words, the power supply to the cube chip 100A or cube chip 100B is maintained.
- the semiconductor module 10A can dissipate heat or generated heat to the outside of the semiconductor module 10A, preventing malfunctions caused by heat or generated heat, and reducing the effects of deformation of the semiconductor module 10A's structure. As a result, the semiconductor module 10A has excellent long-term reliability.
- FIG. 17 is a flowchart showing an example of a method for forming electrodes included in a cube chip 100.
- FIGS. 18 to 21 are perspective views for explaining an example of a method for forming electrodes. Configurations that are the same as or similar to those in FIGS. 1 to 16 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 16 may be omitted.
- the method for forming the electrodes included in the cube chip 100 includes steps 21 (S21) to 25 (S25).
- multiple IC chips 110 are stacked (S21 shown in Figure 17).
- S21 shown in Figure 17 For example, as shown in Figure 18, eight IC chips 110 (eight layers, eight sheets) are stacked to form a stacked memory chip 30.
- each of the multiple IC chips 110 includes a transistor layer 130 and a wiring layer 150. Although detailed explanation will be omitted here, as explained in “1-1-1. Structure of the cube chip 100," multiple ground wirings 165 are exposed on the second surfaces 48 of the multiple IC chips 110, as shown in FIG. 19.
- stacking (bonding) of IC chips 110 together can be achieved using techniques such as fusion bonding and silicon direct bonding (SDB). Fusion bonding and silicon direct bonding are techniques used in the relevant technical field, and detailed explanations will be omitted here.
- F2F bonding For example, joining two IC chips 110 together so that the semiconductor substrates 173 included in each transistor layer 130 face each other is called B2B joining (Back to Back Fusion).
- B2B joining Back to Back Fusion
- joining two IC chips 110 together so that the wiring layer 150 faces the semiconductor substrate 173 included in the transistor layer 130 is called F2B joining (Face to Back Fusion).
- the number of IC chips 110 stacked, their bonding, and their mounting structure can be changed as appropriate depending on the specifications and applications of the cube chip 100.
- Step 23 (S23) shown in FIG. 17 is a step of applying resin to the side surfaces of the stacked memory chips 30.
- the resin is an insulating film 56.
- the insulating film 56 is a sealing material similar to that of the structure 50.
- the side surfaces of the stacked memory chips 30 are the second surface 48, the third surface 45, the fourth surface 47, the fifth surface 42, and the sixth surface 44, excluding a portion of the second surface 48.
- the insulating film 56 is not applied to the first surface 46 and a portion of the second surface 48 of the stacked memory chips 30.
- the insulating film 56 is formed using a coating device such as a dispenser.
- the surfaces formed by S23 are the surfaces of the cube chip 100.
- the first surface 446, second surface 448, third surface 445, fourth surface 447, fifth surface 442, and 444 of the cube chip 100 are parallel to the first surface 46, second surface 48, third surface 45, fourth surface 47, fifth surface 42, and sixth surface 44 of the stacked memory chip 30.
- the first surface 446 is parallel to the first surface 46
- the second surface 448 is parallel to the second surface 48.
- the third surfaces 445 to 444 and the third surfaces 45 to 44 are also parallel to their corresponding surfaces, as are the first surface 446 and the first surface 46, and the second surface 448 and the second surface 48.
- the first surface 446 is the first surface 46 because the insulating film 56 is not applied to the first surface 46.
- the electrodes (side surface ground wiring 465) included in the cube chip 100 are formed.
- the electrode (side surface ground wiring 465) is a thick metal film that functions to protect the stacked memory chips 30 and the stacked memory chips 30 from physical impact.
- the side surface ground wiring 465 is a thick metal film that can sufficiently reduce the resistance value of the side surface ground wiring 465 and can sufficiently suppress voltage drops in the ground voltage.
- the cube chip 100 is a chip with excellent long-term reliability
- the semiconductor module 10 is a module with excellent long-term reliability.
- the stacked memory chip 30 includes the same configuration as that described in the "Fifth Embodiment.” Therefore, configurations similar to those described in the "Fifth Embodiment” will be described as necessary.
- the stacked memory chip 30 according to the sixth embodiment includes the same configuration as that described in the "Fifth Embodiment” as well as the configuration shown in FIG. 23. Although detailed description will be omitted here, as explained in “1-1-1. Configuration of the cube chip 100," multiple power supply wiring 164 is exposed on the third surface 45 of the multiple IC chips 110, as shown in FIG. 23. Furthermore, although not shown, the multiple power supply wiring 164 is also exposed on the fourth surface 47.
- Step 33 (S33) shown in FIG. 22 is a step of forming electrodes on the top and side surfaces.
- the top surface is the second surface 48 of the stacked memory chip 30, and the electrodes are side surface ground wiring 565.
- the side surface is the third surface 45, and the electrodes are multiple side surface power supply wiring 564.
- the side ground wiring 565 is formed in a solid state on the second surface 48 of the stacked memory chip 30.
- the side ground wiring 565 is electrically connected to a plurality of ground wirings 165 exposed on the second surface 48 of the stacked memory chip 30.
- a plurality of side power supply wirings 564 are formed on the third surface 45 of the stacked memory chip 30.
- the side power supply wiring 564 is electrically connected to a plurality of power supply wirings 164 exposed on the third surface 45 of the stacked memory chip 30.
- the plurality of side power supply wirings 564 are also electrically connected to a plurality of power supply wirings 164 exposed on the fourth surface 47.
- the side surface ground wiring 565 and the multiple side surface power supply wirings 564 are formed using electrolytic plating (plating method), as in the "fifth embodiment.”
- the side surface ground wiring 565 and the multiple side surface power supply wirings 564 include a conductor containing the same material as the multiple side surface ground wirings 465, and include a thick metal film.
- Step 35 (S35) shown in FIG. 22 is a step of applying resin to the bottom surface and surfaces other than the surface on which electrodes are formed.
- the resin is an insulating film 58.
- the insulating film 58 is formed using the same sealing material and apparatus as the insulating film 56.
- the bottom surface of the stacked memory chip 30 is the first surface 46.
- the surfaces of the stacked memory chip 30 other than the surface on which electrodes are formed are the second surfaces 48 other than the second surface 48 on which electrodes are formed, the third surfaces 45 other than the third surface 45 on which electrodes are formed, the fourth surfaces 47 other than the fourth surface 47 on which electrodes are formed, the fifth surface 42, and the sixth surface 44.
- the insulating film 58 formed on the second surface 48 may contact and overlap a portion of the side surface ground wiring 565, and the insulating film 58 formed on the third surface 45 and fourth surface 47 may contact and overlap a portion of the side surface power supply wiring 564.
- FIG. 26 and 27 are flowcharts showing an example of a method for manufacturing a semiconductor module 10. Configurations that are the same as or similar to those in Figures 1 to 25 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 25 may be omitted.
- Step 43 (S43) shown in Figure 26 is a step of temporarily aligning the cube chip 100 and the frame body 200.
- the second inclined portion 51 of the cube chip 100 is aligned with the first inclined portion 41 of the frame body 200.
- the cube chip 100 is not pressed against the frame body 200 and is not fitted together.
- the cube chip 100 is not electrically or mechanically connected to the first substrate 300.
- the cube chip 100 is pressed onto the first surface 304 of the first substrate 300.
- the first surface 146 of the cube chip 100 and the first surface 46 of the stacked memory chip 30 may correspond to the surface pressed onto the first surface 304 of the first substrate 300, or a portion of the insulating film 40 provided on the first surface 146 of the cube chip 100 and the first surface 46 of the stacked memory chip 30 may correspond to the surface pressed onto the first surface 304 of the first substrate 300.
- the cube chip 100 is electrically connected to an external device (external circuit) outside the semiconductor module 10 via the side power supply wiring 162 (see FIG. 2) provided on the third surface 145.
- the third surface 145 is a surface different from the surface pressed onto the first surface 304 of the first substrate 300.
- the cube chip 100 is attached to and removed from the frame body 200 and first substrate 300 in a clean room of class 100 or higher. Furthermore, the attachment of the cube chip 100 to and removal of the cube chip 100 from the frame body 200 and first substrate 300 are performed with a reduced number of particles, using an air blower or the like. As a result, particles of several microns can be reduced, preventing a reduction in the quality of inductor communication between inductor 172 and inductor 372.
- the cube chip 100 is fitted into the frame body 200 and connected (contacted) to the top of the first substrate 300.
- the method for manufacturing the semiconductor module 10 shown in FIG. 26 makes it possible to removably connect the cube chip 100 to the frame body 200 and the first substrate 300.
- the method for manufacturing the semiconductor module 10 may include steps 51 (S51) to 55 (S55). Steps S51 and 53 (S53) are similar to steps S41 and S43, and therefore will not be described here.
- step 55 shows step 55 (S55) in which the first substrate 300 and frame body 200 are vibrated to attach the cube chip 100 to the frame body 200.
- the cube chip 100 is removed from the frame body 200 and first substrate 300.
- the cube chip 100 shown in FIG. 21 is placed on the frame body 200 and first substrate 300 shown in FIG. 12 so that the second inclined portion 51 is parallel to the first inclined portion 41.
- the frame body 200 and first substrate 300 are vibrated to fit the cube chip 100 into the frame body 200.
- the frame body 200 and the first substrate 300 may be vibrated to fit the cube chip 100 into the frame body 200, and then the cube chip 100 may be pressure-bonded to the frame body 200 to fit the cube chip 100 into the frame body 200.
- the cube chip 100 is fitted into the frame body 200 and connected (contacted) to the top of the first substrate 300.
- the method for manufacturing the semiconductor module 10 shown in Figure 27 makes it possible to removably connect the cube chip 100 to the frame body 200 and the first substrate 300.
- FIG. 28 is a plan view showing an example of the configuration of the semiconductor module 10B. Configurations that are the same as or similar to those in Figs. 1 to 27 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 27 may be omitted.
- the semiconductor module 10B differs from the semiconductor module 10 in the following configurations (1) and (2).
- Three or more cube chips 100 for example, cube chips 100C and 100D
- three or more frames 200 for example, frames 200C and 200F
- the third substrate 300B includes three or more cube chips 100 (for example, cube chips 100C and 100D) and three or more frame bodies 200 (for example, frame bodies 200C and 200F).
- semiconductor module 10B other than the configurations shown in (1) and (2) is the same as that of semiconductor module 10.
- cube chips 100C and 100D include the same configuration as cube chip 100
- frame bodies 200C and 200F include the same configuration as frame body 200.
- each of the multiple cube chips 100 is fitted into a corresponding frame body 200.
- cube chip 100C is fitted into frame body 200C
- cube chip 100D is fitted into frame body 200F.
- the third substrate 300B includes multiple inductors 372 corresponding to the multiple inductors 172 of each of the multiple cube chips, including cube chips 100C and 100D.
- the semiconductor module 10B can include multiple cube chips 100 on a single substrate (third substrate 300B). As a result, the semiconductor module 10B can have a large memory capacity. Furthermore, like the semiconductor module 10A, the semiconductor module 10B may be supplied with a power supply voltage using the power supply unit 700, and may be supplied with a ground voltage and dissipate heat to the outside using the thermal conduction sheet 800 and metal film 900. Therefore, the semiconductor module 10B has the same effects as the semiconductor module 10 and the semiconductor module 10A.
- FIG. 29 is a plan view showing an example of the configuration of the semiconductor module 10C.
- FIG. 30 is an end view showing the cross-sectional structure of the end portion of the semiconductor module 10C taken along line C1-C2 shown in FIG. 29. Configurations that are the same as or similar to those in FIGS. 1 to 28 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 28 may be omitted.
- the semiconductor module 10C differs from the semiconductor module 10B in the following configurations (1) to (3).
- (1) Includes a connecting member 750.
- a plurality of cube chips 100 (for example, four cube chips including cube chips 100E and 100F) are bundled with a connecting member 750 and fitted into one frame 200E.
- the fourth substrate 300C includes a plurality of (for example, six) cube chips 100 bundled by the connection members 750 fitted into one frame 200E.
- semiconductor module 10C other than those shown in (1) to (3) is the same as that of semiconductor module 10B.
- the fourth substrate 300C includes a plurality of inductors 372 corresponding to the respective inductors 172 of the plurality of cube chips including the cube chips 100E and 100F.
- cube chips 100E and 100F have a configuration similar to that of the cube chip 100 shown in FIG. 24.
- frame body 200E has a configuration in which the first frame body 200L and the third frame body 200R of the frame body 200 shown in FIG. 12 extend in the second direction D2.
- each of the cube chips 100E and 100F includes a side power supply wiring 162 in contact with the third surface 145 and a side power supply wiring 162 in contact with the fourth surface 147.
- the fifth surface 142 of the cube chip 100E contacts the sixth surface 144 of the cube chip 100F.
- the connecting member 750 contacts at least the sixth surface 144, third surface 145, and fourth surface 147 of the cube chip 100E, as well as the third surface 145 and fourth surface 147 of the cube chip 100F.
- connection member 750 contacts the side power supply wiring 162 that contacts the third surface 145 of each of the cube chips 100E and 100F and the side power supply wiring 162 that contacts the fourth surface 147 of each of the cube chips 100E and 100F, and supplies power supply voltage to the side power supply wiring 162 that contacts the third surface 145 of each of the cube chips 100E and 100F and the side power supply wiring 162 that contacts the fourth surface 147 of each of the cube chips 100E and 100F.
- the semiconductor module 10C can include multiple frame bodies 200E, which can bundle multiple cube chips 100, on a single substrate (fourth substrate 300C). As a result, the semiconductor module 10C can shorten the installation time compared to when multiple cube chips 100 are installed one by one on the frame body 200.
- connection member 750 has the function of bundling multiple cube chips 100 together and the function of supplying power supply voltage to the multiple cube chips 100. Therefore, the semiconductor module 10C can reduce manufacturing costs and suppress a decrease in yield compared to when multiple cube chips 100 are attached one by one to the frame 200 and power supply voltage is supplied to each cube chip 100 individually.
- the semiconductor module 10C has a configuration that can reduce misalignment between the cube chips 100 and the frame body 200 compared to when multiple cube chips 100 are attached to the frame body 200 one by one. Therefore, the semiconductor module 10C can reduce damage to the cube chips 100 due to misalignment, and has a configuration that is excellent in long-term reliability.
- the semiconductor module 10C can include multiple frame bodies 200E, which can bundle multiple cube chips 100, on a single substrate (fourth substrate 300C).
- the semiconductor module 10C can have a large memory capacity and has the same effects as the semiconductor module 10B.
- FIG. 31 is a plan view showing an example of the configuration of the semiconductor module 10D.
- FIG. 32 is an end view showing the end cross-sectional structure of the semiconductor module 10D taken along line E1-E2 shown in FIG. 31.
- FIG. 33 is a flowchart showing an example of a manufacturing method for the semiconductor module 10D.
- FIGS. 34 to 38 are end views for explaining an example of a manufacturing method for the semiconductor module 10D. Configurations that are the same as or similar to those in FIGS. 1 to 30 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 30 may be omitted. Note that the configuration of the semiconductor module 10D described with reference to FIGS. 31 to 38 is merely an example and does not limit the configuration of the semiconductor module 10D.
- Semiconductor module 10D includes cube chips 100G-100J, first substrates 300G and 300H, bump layer 80, underfill (UF) materials 84A-84C, a semiconductor chip 600, a fifth substrate 60, and a molding material 90.
- semiconductor module 10D includes four cube chips 100G-100J and one semiconductor chip 600, but the number of cube chips 100G-100J and semiconductor chips 600 is not limited to the configuration described in the tenth embodiment. The number of cube chips 100G-100J and semiconductor chips 600 can be selected appropriately depending on the specifications and application of semiconductor module 10D.
- each of the cube chips 100G to 100J has a configuration similar to that of the cube chip 100. Therefore, the configuration of the multiple cube chips 100G to 100J will be described as necessary.
- the multiple cube chips 100G to 100J are attached to their corresponding frame bodies 200 and provided on a first substrate 300.
- the cube chip 100G is attached to the frame body 200G and provided on a first substrate 300G
- the cube chip 100H is attached to the frame body 200H and provided on a first substrate 300H.
- each of the multiple cube chips 100G to 100J may include an insulating film 40 and an insulating film 210, similar to the cube chip 100.
- Each of the first substrates 300G and 300H has a configuration similar to that of the first substrate 300. Therefore, the configurations of the first substrates 300G and 300H will be described as necessary.
- the first substrate 300G is electrically connected to the fifth substrate 60 via the bump layer 80 (plurality of bumps 82).
- the semiconductor chip 600 may be a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), or may include both a CPU and a GPU.
- CPU Central Processing Unit
- GPU Graphics Processing Unit
- the semiconductor chip 600 includes a CPU, the semiconductor chip 600 includes multiple arithmetic circuits and is capable of arithmetic processing. Furthermore, if the semiconductor chip 600 includes a GPU, the semiconductor chip 600 includes multiple arithmetic circuits and is capable of image processing and video processing. For example, the semiconductor chip 600 has the function of reading a control program stored in a dynamic random access memory (DRAM) (not shown) included in an external device via the bump layer 80 and the fifth substrate 60, unpacking the control program, and executing processing based on the control program, as well as transmitting commands to each IC chip 110 to execute processing based on the control program.
- DRAM dynamic random access memory
- the bump layer 80 includes a plurality of bumps 82.
- the plurality of bumps 82 correspond to output terminals of the cube chips 100G to 100J and the semiconductor chip 600.
- Each of the cube chips 100G to 100J and the semiconductor chip 600 is electrically connected to the plurality of bumps 82, and is electrically connected to the fifth substrate 60.
- the UF material 84 (84A-84C) is an insulating adhesive.
- the UF material 84A can secure the electrically connected cube chip 100G, first substrate 300G, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
- the UF material 84B can secure the electrically connected cube chip 100H, first substrate 300H, bump layer 80 (bumps 82), and fifth substrate 60 to one another
- the UF material 84C can secure the electrically connected semiconductor chip 600, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
- the fifth substrate 60 includes a multilayer wiring structure in which wiring and insulating layers are alternately stacked.
- the fifth substrate 60 is a printed circuit board capable of high-density interconnect (HDI).
- the fifth substrate 60 may be an organic laminate substrate, a silicon interposer in which wiring is formed on a silicon substrate (e.g., Si-wafer), an active interposer in which active elements are added to a silicon interposer, a silicon bridge-embedded substrate in which a silicon chip with wiring is embedded in an organic substrate, a glass core substrate in which wiring is formed using glass as a core material, or an RDL (Redistribution Layer) interposer in which wiring is formed in an insulating film.
- a silicon interposer in which wiring is formed on a silicon substrate (e.g., Si-wafer)
- an active interposer in which active elements are added to a silicon interposer
- a silicon bridge-embedded substrate in which a silicon chip with wiring is embedded in an
- the number of layers in the multilayer wiring structure of the fifth substrate 60 is not limited to the number of layers (five) shown in FIG. 32 .
- the number of layers in the multilayer wiring structure of the fifth substrate 60 can be changed as appropriate based on the application or specifications of the semiconductor module 10D.
- the fifth substrate 60 includes a first surface 62, a second surface 64, and multiple wiring layers 66, 68, 70, 72, and 74.
- the wiring layers 66, 68, 70, 72, and 74 are arranged parallel to the first direction D1 and the second direction D2, and are stacked in this order in the third direction D3.
- the multiple wiring layers 66 and 74 include multiple electrodes 67 and multiple electrodes 75.
- the multiple wiring layers 68, 70, and 72 include multiple wires 69, multiple wires 71, and multiple wires 73.
- the multiple electrodes 67 are exposed on the first surface 62, and the multiple electrodes 75 are exposed on the second surface 64.
- the electrode 67 is electrically connected to the wire 69
- the wire 69 is electrically connected to the wire 71
- the wire 71 is electrically connected to the wire 73
- the wire 73 is electrically connected to the electrode 75.
- the insulating layers stacked alternately with the wires are not shown in Figure 32.
- the fifth substrate 60 has a function of connecting each of the cube chips 100G to 100J to the semiconductor chip 600.
- the cube chip 100G is connected to the semiconductor chip 600 via electrodes 67, wirings 69, wirings 71, and bumps 82. Note that the example shown in FIG. 32 is just an example, and the connection between each of the cube chips 100G to 100J and the semiconductor chip 600 is not limited to the example shown in FIG. 32 .
- Each of the cube chips 100G to 100J and the semiconductor chip 600 may be connected via a plurality of electrodes 67, a plurality of wirings 69, a plurality of wirings 71, or a plurality of wirings 73, and each of the cube chips 100G to 100J may be connected via a plurality of electrodes 67, a plurality of wirings 69, a plurality of wirings 71, or a plurality of wirings 73.
- the fifth substrate 60 also functions to connect the cube chips 100G-100J and the semiconductor chip 600 to external devices, etc.
- the fifth substrate 60 also functions to electrically connect the plurality of bumps 82 to the electrodes 75 corresponding to each bump 82.
- the length (pitch) between two adjacent bumps 82 is shorter than the length (pitch) between two adjacent electrodes 75.
- the fifth substrate 60 also functions to widen the pitch of the bumps 82 to the pitch of the electrodes 75. In other words, the fifth substrate 60 also functions to rewire the bumps 82 so that the pitch of the bumps 82 matches the pitch of the electrodes 75.
- the semiconductor module 10 can be easily electrically connected to a motherboard (not shown).
- the molding material 90 is an insulating resin material.
- the insulating resin material includes a resin material such as epoxy, a curing agent, a filler, an additive, etc.
- the molding material 90 is provided on the fifth substrate 60 so as to contact and surround the cube chip 100G fixed by the UF material 84A, the first substrate 300G and the bumps 82, the cube chip 100H fixed by the UF material 84B, the first substrate 300H and the bumps 82, and the semiconductor chip 600 and the bumps 82 fixed by the UF material 84C.
- the molding material 90 can fix the cube chip 100G fixed by the UF material 84A, the first substrate 300G and the bumps 82, the cube chip 100H fixed by the UF material 84B, the first substrate 300H and the bumps 82, and the semiconductor chip 600 fixed by the UF material 84C to one another on the fifth substrate 60.
- the molding material 90 can suppress vibrations and shocks that the semiconductor module 10D receives from the outside, as well as the intrusion of moisture into the semiconductor module 10D from the outside.
- the molding material 90 allows the semiconductor module 10D to efficiently discharge heat generated inside the semiconductor module 10D to the outside.
- the fifth substrate 60 may be an interposer.
- Semiconductor module 10D is small in scale and has a configuration that allows multiple cube chips (e.g., cube chips 100G-100J) to be attached and detached. Therefore, even if a cube chip in semiconductor module 10D fails, the user can simply remove the failed cube chip and replace it with a non-failed cube chip.
- cube chips e.g., cube chips 100G-100J
- the semiconductor module 10D has a configuration that allows multiple cube chips (e.g., cube chips 100G-100J) to be attached and detached, and is small in scale, even if the fifth substrate 60 warps, the effect of the warping of the fifth substrate 60 on the multiple cube chips is minor. For example, by removing and reattaching the multiple cube chips, it is possible to adjust the positions of the multiple cube chips relative to the frame 200G, and the effects of substrate warping can be suppressed.
- multiple cube chips e.g., cube chips 100G-100J
- the method for manufacturing the semiconductor module 10D includes steps 60 (S60) to 66 (S66).
- chips are mounted on the substrates (S60 shown in FIG. 33). Specifically, as shown in FIG. 34, the first surface 302G of the first substrate 300G is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), the first surface 302H of the first substrate 300H is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), and the first surface 602 of the semiconductor chip 600 is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82).
- the third substrate on which the cube chips 100I and 100J are provided is also mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), similar to the first substrates 300G and 300H.
- first surface 302G, first surface 302H, and first surface 602 are parallel to first surface 32, which is an imaginary surface.
- explanations related to cube chips 100I and 100J and the third substrate on which cube chips 100I and 100J are provided are similar to those related to cube chips 100G and 100H and first substrates 300G and 300H on which cube chips 100G and 100H are provided, and will be explained as necessary.
- Step 61 (S61) is a step in which the first substrates 300G and 300H and the semiconductor chip 600 are fixed together using UF materials 84 (84A-84C).
- UF material 84A fixes the first substrate 300G, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
- UF material 84B fixes the first substrate 300H, bump layer 80 (bumps 82), and fifth substrate 60 to one another
- UF material 84C fixes the semiconductor chip 600, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
- step 62 the cube molds 92 are mounted and temporarily bonded using adhesive 94. Specifically, as shown in FIG. 35, two cube molds 92 are temporarily bonded to first substrates 300G and 300H using adhesive 94.
- the cube molds 92 have the same shape as cube chips 100G to 100J.
- Step 63 (S63) is a step in which each chip (first substrate 300G, first substrate 300H, and semiconductor chip 600), UF materials 84A-84C, and multiple cube molds 92 are sealed using molding material 90. Specifically, as shown in FIG. 36, first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92 are covered and sealed with molding material 90.
- molding material 90 contacts first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92, as well as the surface of fifth substrate 60 on which first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92 are not provided.
- Step 64 is a step of grinding the molding material 90.
- the surface 96 of the molding material 90 provided in S63 is ground by back-grinding in the direction of the black arrow, which is a virtual line parallel to the third direction D3.
- a ground surface 98 of the molding material 90 is exposed.
- the multiple cube dies 92 are ground in the same manner as the molding material 90, exposing the surfaces of the multiple cube dies 92. For example, after chips are mounted on a substrate or after a pattern is formed on a substrate, the entire substrate can be ground by back-grinding to reduce the thickness of the substrate on which the chips are mounted or the substrate on which the pattern is formed.
- Step 65 is a step of removing the cube mold 92 with its surface exposed. Specifically, as shown in FIG. 38 , the cube mold 92 with its surface exposed is removed from the molding material 90. At this time, the adhesive 94 may also be removed in the same manner as the molding material 90, and the adhesive 94 may remain on the first substrates 300G and 300H. By S65, frame bodies 200G and 200H are formed, to which the cube chips 100G and 100H can be attached.
- Step 66 (S66) is a step of attaching the plurality of cube chips 100G and 100H. Specifically, as shown in Fig. 32, the cube chip 100G is attached to a frame 200G and a first substrate 300G, and the cube chip 100H is attached to a frame 200H and a first substrate 300H.
- the semiconductor module 10D is manufactured by the manufacturing method of the semiconductor module 10D.
- chips are typically mounted on a substrate using a molding material.
- the molding material 90 is used to secure the first substrate 300G, the second substrate 300H, and the semiconductor chip 600 on the fifth substrate 60, and to form the frame bodies 200G and 200H.
- the chips can be secured and the frame bodies 200G and 200H can be formed using a general process. Therefore, the manufacturing method of the semiconductor module 10D can reduce manufacturing costs.
- FIG. 39 is an end view showing an example of the cross-sectional structure of an end portion of the semiconductor module 10E.
- FIG. 40 is a flowchart showing an example of a manufacturing method for the semiconductor module 10E.
- FIGS. 41 and 42 are end views for explaining an example of a manufacturing method for the semiconductor module 10E. Configurations that are the same as or similar to those in FIGS. 1 to 38 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 38 may be omitted. Note that the configuration of the semiconductor module 10E described with reference to FIGS. 39 to 42 is an example and does not limit the configuration of the semiconductor module 10E.
- the semiconductor module 10E includes a cube chip 100K, a first substrate 300D, a plurality of bumps 82, a UF material 84D, a fifth substrate 60A, and a resin 99.
- the cube chip 100K, the first substrate 300D, the UF material 84D, the plurality of bumps 82, and the fifth substrate 60A each have the same configuration as the cube chip 100, the first substrate 300, the UF materials 84A to 84C, the plurality of bumps 82, and the fifth substrate 60. Therefore, the configurations of the cube chip 100K, the first substrate 300D, the UF material 84D, the plurality of bumps 82, and the fifth substrate 60A will be described as necessary.
- the resin 99 is an adhesive such as a thermoplastic resin or wax.
- the resin 99 is a thermoplastic resin, which is an adhesive containing an epoxy resin or an acrylic polymer.
- the resin 99 is provided between the cube chip 100K and the second surface 304D of the first substrate 300D so as to contact the cube chip 100K and the first substrate 300D.
- the cube chip 100K includes an inductor 172, and the first substrate 300D includes an inductor 372, and the inductor 172 is capable of non-contact inductive communication with the inductor 372.
- the side surface power supply wiring 162 in the cube chip 100K is divided into three in the third direction D3.
- structures 50 are provided between adjacent side surface power supply wirings 162, and the three divided side surface power supply wirings 162 are spaced apart from each other.
- the first substrate 300D is connected to a plurality of bumps 82, each of which is connected to a corresponding one of the electrodes 67, and the first substrate 300D is connected to the fifth substrate 60A.
- the UF material 84D surrounds the first substrate 300D, the plurality of bumps 82, and the plurality of electrodes 67, and is provided between the first surface 302D of the first substrate 300D and the first surface 62A of the fifth substrate 60A so as to be in contact with the first surface 302D and the first surface 62A.
- the cube chip 100K bonded to the first substrate 300D and the first substrate 300D are fixed to the fifth substrate 60A by the UF material 84D.
- the method for manufacturing the semiconductor module 10D includes steps 70 (S70) to 75 (S75).
- the temperature is raised to above the softening temperature of the resin 99, and the cube chip 100K is mounted on the first substrate 300D (S70 shown in Figure 40). Specifically, the temperature of the entire semiconductor module 10E is raised to above the softening temperature of the resin 99, and the cube chip 100K is mounted on the first substrate 300D on which the resin 99 is provided.
- the softening temperature of the resin 99 is 150 degrees.
- Step 71 (S71) is a step of supplying power to the cube chip 100K and the first substrate 300D.
- a plurality of pogo pins 702 in a power supply unit 700 are pressure-bonded to the side power wiring 162 of the cube chip 100K.
- the power supply unit 700 supplies voltages (e.g., power supply voltages VDD and VSS) from an external device (external circuit) outside the semiconductor module 10E to the cube chip 100K and the first substrate 300D via the plurality of pogo pins 702.
- the power supply unit 700 may supply a plurality of power supply voltages (e.g., power supply voltages VDD1 and VDD2), and some electrodes may be changed to signal lines, and signals (e.g., control signals and data signals) rather than DC (Direct Current) power may be input/output to the signal lines via the pogo pins 702.
- power supply voltages e.g., power supply voltages VDD1 and VDD2
- signals e.g., control signals and data signals
- DC Direct Current
- Step 72 (S72) is a step in which wireless communication (inductor communication) is performed between the cube chip 100K and the first substrate 300D. Specifically, as shown in Fig. 41 , power is supplied to each of the cube chip 100K and the first substrate 300D, causing the cube chip 100K and the first substrate 300D to operate, and inductor communication (wireless communication) between the inductor 172 and the inductor 372 to be performed in a contactless manner.
- wireless communication inductor communication
- Step 73 is a step of fixing the cube chip 100K while moving it, while maintaining good quality of wireless communication (inductor communication) between the cube chip 100K and the first substrate 300D.
- the cube chip 100K can move on the second surface 90B of the resin 99 in parallel with the second direction D2.
- wireless communication between the cube chip 100K and the first substrate 300D is possible, and the quality of the wireless communication can be monitored.
- step S73 includes causing the cube chip 100K to perform inductor communication between the inductor 172 and the inductor 372 facing each other, moving the cube chip 100K along the second surface 90B of the resin 99 in parallel to the second direction D2, moving the cube chip 100K to cause inductor communication between the inductor 172 and the inductor 372 facing each other in a plurality of states where the positional relationship between the cube chip 100K and the first substrate 300D is different, monitoring and acquiring data related to the strength of communication in a plurality of states where the positional relationship between the cube chip 100K and the first substrate 300D is different, and determining a state where the quality of wireless communication (inductor communication) is good, moving the cube chip 100K to be positioned at a position corresponding to that state, and fixing the cube chip 100K.
- the first substrate 300D analyzes all the acquired data and determines a state where the strength of communication between the inductor 172 and the inductor 372 facing each other is greatest (highest) as a state where the quality of wireless communication (inductor communication) is good.
- the first substrate 300D determines whether the quality of wireless communication (inductor communication) is good, and instructs the external circuit to move the cube chip 100K so that it is positioned at a position corresponding to the determined quality and fix the cube chip 100K. That is, S73 includes fixing the cube chip 100K at a position where the optimal communication state is achieved by so-called active alignment.
- Step 74 is a step in which the temperature is lowered to below the softening temperature of the resin 99, and the cube chip 100K is placed on the first substrate 300D. Since the quality of wireless communication between the cube chip 100K and the first substrate 300D is good and the power supply is stopped in S73, the resin 99 is hardened by lowering the temperature of the entire semiconductor module 10E to below 150°C. As the resin 99 hardens, the cube chip 100K is fixed onto the first substrate 300D.
- Step 75 (S75) is a step of stopping the supply of power to the cube chip 100K and the first substrate 300D. Furthermore, stopping the supply of power to the cube chip 100K and the first substrate 300D stops wireless communication between the cube chip 100K and the first substrate 300D. Note that the manufacturing method for the semiconductor module 10E does not need to include S75, and S75 may be executed after the manufacturing method for the semiconductor module 10E is completed, or S75 may be executed as needed.
- the semiconductor module 10E is manufactured by the manufacturing method of the semiconductor module 10E.
- Replacing the cube chip 100K with a non-faulty cube chip includes executing S70 to soften the resin 99 by the manufacturing method of the semiconductor module 10E, and removing the cube chip 100K by moving it over the second surface 90B of the resin 99 along the imaginary line indicated by the black arrow parallel to the second direction D2, as shown in FIG.
- the manufacturing method of the semiconductor module 10E can fix the cube chip 100K in a position that provides optimal communication through active alignment, thereby enabling optimal wireless communication between the cube chip 100K and the first substrate 300D.
- the semiconductor module 10E does not include a frame body 200, and has a configuration in which the cube chip 100K can be attached and detached using a resin 99.
- the resin 99 is provided between the cube chip 100K and the first substrate 300D by a process commonly used in semiconductor processes, and therefore the manufacturing method of the semiconductor module 10E does not require a special process for providing the resin 99. Therefore, the manufacturing method of the semiconductor module 10E can reduce manufacturing costs.
- FIG. 43 is an end view showing an example of the cross-sectional structure of the end portion of the semiconductor module 10F. Configurations that are the same as or similar to those in FIGS. 1 to 42 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 42 may be omitted. Note that the configuration of the semiconductor module 10F described with reference to FIG. 43 is one example and does not limit the configuration of the semiconductor module 10F.
- the semiconductor module 10F differs from the semiconductor module 10E in the following configurations (1) and (2).
- the resin 95 has the same configuration as the resin 99, but as shown in FIG. 43, the resin 95 has a smaller contact area with the cube chip 100K and the first substrate 300D than the resin 99.
- the portion excluding the portion where the cube chip 100K and the first substrate 300D contact the resin 99 includes a non-contact region 97 where the cube chip 100K is separated from the first substrate 300D.
- the configuration of semiconductor module 10F other than the configuration shown in (1) and (2) is the same as that of semiconductor module 10E. Therefore, a description of the configuration of semiconductor module 10F other than the configuration shown in (1) and (2) will be omitted.
- the non-contact area 97 may be referred to as an unbonded area.
- the semiconductor module 10F can be manufactured using the same manufacturing method as the semiconductor module 10E.
- the resin 95 is provided approximately in the center of the cube chip 100K (first surface 102K) and the first substrate 300D (second surface 304D) in the second direction D2.
- the non-contact region 97 is provided to surround the resin 95 in the second direction D2.
- the semiconductor module 10F can suppress the concentration of stress during thermal cycles including S70 and S74 more than when resin is provided between the cube chip 100K and the first substrate 300D.
- the long-term reliability of the semiconductor module 10F is higher than that of a semiconductor module in which resin is provided between the cube chip 100K and the first substrate 300D.
- a semiconductor module comprising:
- the frame body includes a first inclined portion
- the cube chip includes a second sloped portion
- an angle formed between the first surface and the first inclined portion is the same as an angle formed between the first surface and the second inclined portion
- a method for manufacturing a semiconductor module comprising:
- a first substrate including a first inductor and including a first surface parallel to a first direction and a second direction intersecting the first direction; a cube chip disposed on the first surface along the third direction and including a second inductor and a plurality of stacked IC chips; a resin in contact with the first substrate and the cube chip and provided between the first substrate and the cube chip; a second substrate including a multilayer wiring structure; a bump layer including a plurality of bumps electrically connecting the first substrate onto the second substrate; an underfill material that fixes the first substrate and the bump layer to the second substrate; Including, the first inductor communicates with the second inductor in a non-contact manner; Semiconductor module.
- the first substrate further includes an unbonded region provided between the first substrate and the cube chip, the first substrate being spaced apart from the cube chip; The unbonded region surrounds the resin. 6.
- a method for manufacturing a semiconductor module according to claim 6, comprising: The manufacturing method includes: raising the temperature of the semiconductor module to a temperature equal to or higher than the softening temperature of the resin, and mounting the cube chip on the first substrate; supplying power to the cube chip and the first substrate; moving the cube chip over the resin; causing the first inductor and the second inductor to communicate with each other in a non-contact manner; acquiring a communication strength in a state where the communication strength is strong in non-contact communication between the first inductor and the second inductor; lowering the temperature of the semiconductor module below the softening temperature to fix the cube chip onto the first substrate;
- a method for manufacturing a semiconductor module comprising:
- semiconductor modules or various configurations of semiconductor modules exemplified as embodiments of the present invention may be combined as appropriate, provided they are not mutually inconsistent. Furthermore, the semiconductor modules or various configurations of semiconductor modules exemplified as embodiments of the present invention may be interchanged as appropriate, provided they are not mutually inconsistent. Furthermore, technical matters common to each embodiment are included in each embodiment even if not explicitly stated. Furthermore, semiconductor modules disclosed in this specification and drawings, to which a person skilled in the art has appropriately added, deleted, or modified components, or to which processes have been added, omitted, or conditions have been changed, are also included within the scope of the present invention, as long as they comprise the essence of the present invention.
- 10 Semiconductor module, 10A: Semiconductor module, 10B: Semiconductor module, 10C: Semiconductor module, 10D: Semiconductor module, 10E: Semiconductor module, 10F: Semiconductor module, 30: Stacked memory chip, 32: First surface, 40: Insulating film, 41: First inclined portion, 42: Fifth surface, 44: Sixth surface, 45: Third surface, 46: First surface, 47: Fourth surface, 48: Second surface, 50: Structure, 50A: Structure, 51: Second inclined portion, 56: Insulating film, 58: Insulating film, 60: Fifth Substrate, 60A: fifth substrate, 62: first surface, 62A: first surface, 64: second surface, 66: wiring layer, 67: electrode, 68: wiring layer, 69: wiring, 70: wiring layer, 71: wiring, 72: wiring layer, 73: wiring, 74: wiring layer, 75: electrode, 80: bump layer, 82: bump, 84: UF material, 84A: UF material,
Landscapes
- Semiconductor Integrated Circuits (AREA)
Abstract
Description
本発明の実施形態の一つは、半導体モジュール及び半導体モジュールの製造方法に関する。 One embodiment of the present invention relates to a semiconductor module and a method for manufacturing a semiconductor module.
近年、データセンタなどの電子計算機は、複数のメモリチップが積層された積層メモリチップ、演算処理回路を含む複数のIC(Integrated Circuit、集積回路)チップ、画像処理回路を含む複数のICチップなどを一つのパッケージ基板に実装した半導体モジュールを含む。電子計算機は、当該半導体モジュールにより、メモリの大容量化を図ると共に、各ICチップと各メモリチップとの間で実行されるデータ通信において大容量のデータを処理することができる。 In recent years, electronic computers used in data centers and other locations include semiconductor modules that mount multiple stacked memory chips, multiple IC (Integrated Circuit) chips including processing circuits, and multiple IC chips including image processing circuits on a single package substrate. These semiconductor modules enable electronic computers to increase memory capacity and process large volumes of data during data communications between each IC chip and each memory chip.
例えば、特許文献1~4、非特許文献1には、複数のチップが積層された積層チップ又は積層チップの実装方法の例が開示されている。また、特許文献2及び3には、2つのチップ間の通信を非接触で行う技術が開示されている。さらに、特許文献1~4、非特許文献1~3には、積層チップの実装方法の一例として、積層チップの側壁に配線を形成する技術が開示されている。 For example, Patent Documents 1 to 4 and Non-Patent Document 1 disclose examples of stacked chips in which multiple chips are stacked, or methods for mounting stacked chips. Patent Documents 2 and 3 also disclose technology for contactless communication between two chips. Furthermore, Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 disclose technology for forming wiring on the sidewalls of stacked chips as an example of a method for mounting stacked chips.
例えば、当該半導体モジュールは、複数のメモリチップが積層された積層メモリチップ、演算処理回路を含む複数のICチップ、画像処理回路を含む複数のICチップなどを一つのパッケージ基板に実装するために、複数の貫通電極、複数のバンプなどを用いる。 For example, the semiconductor module uses multiple through electrodes, multiple bumps, etc. to mount a stacked memory chip in which multiple memory chips are stacked, multiple IC chips including an arithmetic processing circuit, and multiple IC chips including an image processing circuit on a single package substrate.
例えば、当該半導体モジュールは一つのパッケージ基板に実装された複数のICチップを含むため、積層メモリチップが故障すると、積層メモリチップのみを交換することは困難である。また、複数のICチップなどが一つのパッケージ基板に実装されると、パッケージ基板が反る可能性がある。パッケージ基板が反った場合には、複数のICチップとパッケージ基板との接続不良、又は、パッケージ基板マザー基板との接続不良が発生する可能性がある。すなわち、当該半導体モジュールの長期信頼性が低下する。さらに、特許文献1~4及び非特許文献1~3に開示される積層チップの側壁に配線を形成する技術は、積層チップの側壁に配線を形成するための新たな工程を含む。よって、特許文献1~4及び非特許文献1~3では、半導体モジュールの新たな工程による製造費用が増加する。また、特許文献2及び3に記載の技術は、積層チップの側壁又は積層メモリチップの底面に、非接触での通信(例えば、無線通信、インダクタ通信)のための配線を形成するための新たな工程を含む。よって、特許文献2及び3に記載の技術では、無線通信ための新たな工程による製造費用が増加する。 For example, because this semiconductor module includes multiple IC chips mounted on a single package substrate, if a stacked memory chip fails, it is difficult to replace only the stacked memory chip. Furthermore, when multiple IC chips are mounted on a single package substrate, the package substrate may warp. If the package substrate warps, poor connection may occur between the multiple IC chips and the package substrate, or between the package substrate and the motherboard. This reduces the long-term reliability of the semiconductor module. Furthermore, the techniques for forming wiring on the sidewalls of stacked chips disclosed in Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 include a new process for forming wiring on the sidewalls of the stacked chips. Therefore, Patent Documents 1 to 4 and Non-Patent Documents 1 to 3 increase the manufacturing costs of the semiconductor module due to the additional process. Furthermore, the techniques described in Patent Documents 2 and 3 include a new process for forming wiring for contactless communication (e.g., wireless communication, inductor communication) on the sidewalls of the stacked chips or the bottom surface of the stacked memory chips. Therefore, the techniques described in Patent Documents 2 and 3 increase the manufacturing costs due to the additional process for wireless communication.
このような問題に鑑み、本発明の実施形態の一つは、長期信頼性の低下が抑制可能な半導体モジュールを提供することを目的の一つとする。また、本発明の実施形態の一つは、製造費用が抑制可能な半導体モジュールを提供することを目的の一つとする。 In light of these problems, one embodiment of the present invention aims to provide a semiconductor module that can suppress a decline in long-term reliability. Furthermore, one embodiment of the present invention aims to provide a semiconductor module that can suppress manufacturing costs.
本発明の実施形態の一つに係る半導体モジュールは、第1方向及び前記第1方向に交差する第2方向に平行な第1面を含む第1基板と、前記第1方向及び前記第2方向に交差する第3方向に沿って前記第1面の上に配置された枠体と、前記枠体に取付けられると共に、前記第3方向に沿って前記第1面の上に配置され、積層された複数のICチップを含む第1キューブチップと、を含む。 A semiconductor module according to one embodiment of the present invention includes a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction, a frame body arranged on the first surface along a third direction intersecting the first direction and the second direction, and a first cube chip attached to the frame body, arranged on the first surface along the third direction, and including a plurality of stacked IC chips.
前記第1基板は、前記第1面に平行、かつ、前記第1面から離隔して設けられた第1インダクタを含み、前記ICチップは、前記第1面に平行、かつ、前記第1面から離隔して設けられた第2インダクタを含み、前記第1インダクタは前記第2インダクタと非接触で通信してよい。 The first substrate may include a first inductor arranged parallel to and spaced apart from the first surface, and the IC chip may include a second inductor arranged parallel to and spaced apart from the first surface, and the first inductor may communicate with the second inductor in a non-contact manner.
前記ICチップは、前記第2インダクタに電気的に接続された複数のメモリセルアレイを含んでよい。 The IC chip may include a plurality of memory cell arrays electrically connected to the second inductor.
前記枠体は第1傾斜部を含み、前記第1キューブチップは第2傾斜部を含み、前記第1面と前記第1傾斜部とのなす角度は、前記第1面と前記第2傾斜部とのなす角度と同一であってよい。 The frame body may include a first inclined portion, the first cube chip may include a second inclined portion, and the angle between the first surface and the first inclined portion may be the same as the angle between the first surface and the second inclined portion.
前記第1キューブチップは、前記複数のICチップを含む積層メモリチップと、前記積層メモリチップに電気的に接続される第1電極と、構造体とを含み、前記積層メモリチップは、少なくとも、前記第3方向の2つの最外面である第1最外面及び前記第1最外面と反対側の第2最外面と、前記第3方向及び前記第1方向に平行かつ前記第2方向の2つの最外面である第3最外面及び前記第3最外面と反対側の第4最外面と、を含み、前記第1電極は前記第3最外面に電気的に接続され、前記構造体は前記第2傾斜部を含み、前記第1電極が接続される以外の前記第3最外面に接するように設けられてよい。 The first cube chip includes a stacked memory chip including the plurality of IC chips, a first electrode electrically connected to the stacked memory chip, and a structure, and the stacked memory chip includes at least a first outermost surface, which are the two outermost surfaces in the third direction, and a second outermost surface opposite the first outermost surface, and a third outermost surface, which are parallel to the third direction and the first direction and are the two outermost surfaces in the second direction, and a fourth outermost surface opposite the third outermost surface, and the first electrode is electrically connected to the third outermost surface, and the structure includes the second inclined portion and may be provided so as to contact the third outermost surface other than the surface to which the first electrode is connected.
前記第1電極は、電源電圧が供給される複数の端子を含む電源供給部と電気的に接続されてよい。 The first electrode may be electrically connected to a power supply unit including a plurality of terminals to which a power supply voltage is supplied.
前記第1キューブチップは、前記第2最外面に電気的に接続された第2電極を含み、前記第2電極には接地電圧が供給されてよい。 The first cube chip may include a second electrode electrically connected to the second outermost surface, and a ground voltage may be supplied to the second electrode.
ヒートスプレッダをさらに含み、前記ヒートスプレッダは、第2電極に電気的に接続され、前記第2電極に前記接地電圧を供給してよい。 The device may further include a heat spreader, which is electrically connected to the second electrode and supplies the ground voltage to the second electrode.
前記構造体は、樹脂又は金属を含んでよい。 The structure may include resin or metal.
前記枠体は、第1枠体、第2枠体、第3枠体及び第4枠体を四角形状に組み合わせて構成されてよい。 The frame body may be configured by combining a first frame body, a second frame body, a third frame body, and a fourth frame body in a rectangular shape.
前記枠体は、互いに離隔して四角形の四つの隅に設けられた第1L字状枠体、第2L字状枠体、第3L字状枠体及び第4L字状枠体を含んでよい。 The frame body may include a first L-shaped frame body, a second L-shaped frame body, a third L-shaped frame body, and a fourth L-shaped frame body spaced apart from one another and provided at the four corners of a rectangle.
前記枠体は、互いに離隔して四角形の対角の二つの隅に設けられた第1L字状枠体及び第2L字状枠体を含んでよい。 The frame body may include a first L-shaped frame body and a second L-shaped frame body spaced apart from each other and located at two diagonal corners of a rectangle.
前記枠体に取付けられ、前記第1面の上に配置されると共に、前記第1キューブチップに隣接し、前記複数のICチップとは異なる複数のICチップが積層された第2キューブチップと、前記第1キューブチップ及び前記第2キューブチップを接続する接続部材と、をさらに含み、前記第1キューブチップ及び前記第2キューブチップのそれぞれは、前記第3方向の2つの最外面である第1最外面及び前記第1最外面と反対側の第2最外面と、前記第3方向及び前記第1方向に平行かつ前記第2方向の2つの最外面である第3最外面及び前記第3最外面と反対側の第4最外面と、前記第3方向及び前記第2方向に平行かつ前記第1方向の2つの最外面である第5最外面及び前記第5最外面と反対側の第6最外面と、を含み、前記第1キューブチップの前記第5最外面は、前記第2キューブチップの前記第6最外面に接し、前記接続部材は、少なくとも、前記第1キューブチップの前記第6最外面、前記第3最外面及び前記第4最外面、並びに、前記第2キューブチップの前記第3最外面及び前記第4最外面に接してよい。 Further comprising: a second cube chip attached to the frame, disposed on the first surface, adjacent to the first cube chip, and stacked with a plurality of IC chips different from the plurality of IC chips; and a connecting member connecting the first cube chip and the second cube chip, wherein each of the first cube chip and the second cube chip has a first outermost surface and a second outermost surface opposite the first outermost surface, which are the two outermost surfaces in the third direction, and two outermost surfaces parallel to the third direction and the first direction and in the second direction. The cube chip may include a third outermost surface and a fourth outermost surface opposite the third outermost surface, which are outer surfaces, and a fifth outermost surface and a sixth outermost surface opposite the fifth outermost surface, which are two outermost surfaces parallel to the third direction and the second direction and in the first direction, and the fifth outermost surface of the first cube chip may be in contact with the sixth outermost surface of the second cube chip, and the connecting member may be in contact with at least the sixth outermost surface, the third outermost surface, and the fourth outermost surface of the first cube chip, and the third outermost surface and the fourth outermost surface of the second cube chip.
前記第1キューブチップ及び前記第2キューブチップのそれぞれは、前記第3最外面に接する第1電極、及び、前記第4最外面に接する第2電極を含み、前記接続部材は、前記第1電極及び前記第2電極に接し、前記第1電極及び前記第2電極に電源電圧を供給してよい。 Each of the first cube chip and the second cube chip may include a first electrode in contact with the third outermost surface and a second electrode in contact with the fourth outermost surface, and the connection member may be in contact with the first electrode and the second electrode and supply a power supply voltage to the first electrode and the second electrode.
前記第1キューブチップは、前記第1面に圧着される面、及び、前記第1面に圧着される面とは異なる面に設けられた電極を含み、前記第1面に圧着される面が前記枠体を介して前記第1基板の所定の位置に配置され、前記第1キューブチップは、前記第1基板と電気的かつ機械的に接続されておらず、前記電極を介して外部回路と電気的に接続されてよい。 The first cube chip includes an electrode provided on a surface that is pressed against the first surface and a surface different from the surface that is pressed against the first surface, and the surface that is pressed against the first surface is disposed at a predetermined position on the first substrate via the frame, and the first cube chip is not electrically or mechanically connected to the first substrate, but may be electrically connected to an external circuit via the electrode.
本発明の実施形態の一つは、前第1方向及び前記第1方向に交差する第2方向に平行な第1面を含む第1基板と、前記第1方向及び前記第2方向に交差する第3方向に沿って、前記第1面の上に配置された枠体と、前記枠体に取付けられると共に、前記第3方向に沿って前記第1面の上に配置され、積層された複数のICチップを含むキューブチップと、を含む半導体モジュールの製造方法であって、前記製造方法は、前記第1面の上に前記枠体を形成すること、及び、前記枠体に含まれる第1傾斜部と、前記キューブチップに含まれる第2傾斜部とが嵌合するように、前記キューブチップを回転させて前記枠体及び前記第1面の上に配置すること、を含む。 One embodiment of the present invention is a method for manufacturing a semiconductor module including a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction; a frame body arranged on the first surface along a third direction intersecting the first direction and the second direction; and a cube chip including a plurality of stacked IC chips attached to the frame body and arranged on the first surface along the third direction, the manufacturing method including forming the frame body on the first surface, and rotating the cube chip to place it on the frame body and the first surface so that a first inclined portion included in the frame body and a second inclined portion included in the cube chip are fitted together.
前記第1基板を振動させて、前記キューブチップを前記枠体及び前記第1面の上に配置すること、をさらに含んでよい。 The method may further include vibrating the first substrate to position the cube chip on the frame and the first surface.
以下、本発明の実施形態を、図面などを参照しながら説明する。但し、本発明は多くの異なる態様で実施することが可能であり、以下に例示する実施形態の記載内容に限定して解釈されるものではない。図面は説明をより明確にするため、実際の態様に比べ、各部の幅、厚さ、形状などについて模式的に表される場合があるが、あくまで一例であって、本発明の解釈を限定するものではない。また、本明細書と各図において、既出の図に関して前述したものと同様の要素には、同一の符号(又は数字の後にa、bなどを付した符号)を付して、詳細な説明を適宜省略することがある。さらに各要素に対する「第1」、「第2」と付記された文字は、各要素を区別するために用いられる便宜的な標識であり、特段の説明がない限りそれ以上の意味を有しない。 Embodiments of the present invention will be described below with reference to the drawings. However, the present invention can be implemented in many different forms, and should not be construed as being limited to the description of the embodiments exemplified below. To clarify the explanation, the drawings may show the width, thickness, shape, etc. of each part schematically compared to the actual form, but these are merely examples and do not limit the interpretation of the present invention. Furthermore, in this specification and each figure, elements similar to those previously described with reference to the previous figures will be given the same reference numerals (or reference numerals with a, b, etc. suffixed to the numeral), and detailed explanations may be omitted as appropriate. Furthermore, the letters "first" and "second" attached to each element are convenient labels used to distinguish between elements, and have no further meaning unless otherwise specified.
本発明の実施形態の一つにおいて、ある部材又は領域が他の部材又は領域の「上に(又は下に)」あるとする場合、特段の限定がない限りこれは他の部材又は領域の直上(又は直下)にある場合のみでなく他の部材又は領域の上方(又は下方)にある場合を含み、すなわち、他の部材又は領域の上方(又は下方)において間に別の構成要素が含まれている場合も含む。 In one embodiment of the present invention, when a component or region is said to be "above (or below)" another component or region, unless otherwise specified, this includes not only the case where it is directly above (or below) the other component or region, but also the case where it is above (or below) the other component or region, i.e., the case where another component is included between the two components above (or below) the other component or region.
本発明の実施形態の一つにおいて、第1方向D1は第2方向D2に交差し、第3方向D3は第1方向D1及び第2方向D2(D1D2平面)に交差する。 In one embodiment of the present invention, the first direction D1 intersects the second direction D2, and the third direction D3 intersects the first direction D1 and the second direction D2 (D1D2 plane).
本発明の実施形態の一つにおいて、同一及び一致という表記を用いている場合、同一及び一致には、設計の範囲での誤差が含まれてよい。また、本発明の実施形態の一つにおいて、設計の範囲での誤差が含まれる場合、略同一及び略一致という表現を用いる場合がある。 In one embodiment of the present invention, when the terms "identical" and "matching" are used, the terms "identical" and "matching" may include a margin of error within the design range. Furthermore, in one embodiment of the present invention, when a margin of error within the design range is included, the terms "approximately identical" and "approximately matching" may be used.
<第1実施形態>
第1実施形態に係る半導体モジュール10を、図1~図8を参照して説明する。
First Embodiment
A semiconductor module 10 according to a first embodiment will be described with reference to FIGS.
<1-1.半導体モジュール10の概要>
はじめに、半導体モジュール10の概要を図1~図3を参照して説明する。図1は半導体モジュール10の構成を示す斜視図である。図2は図1に示されるA1-A2に沿った半導体モジュール10の端部断面構造を示す端面図である。図3は図1に示されるB1-B2に沿った半導体モジュール10の端部断面構造を示す端面図である。
<1-1. Overview of the semiconductor module 10>
First, an overview of the semiconductor module 10 will be described with reference to Figures 1 to 3. Figure 1 is a perspective view showing the configuration of the semiconductor module 10. Figure 2 is an end view showing the cross-sectional structure of the end of the semiconductor module 10 taken along line A1-A2 shown in Figure 1. Figure 3 is an end view showing the cross-sectional structure of the end of the semiconductor module 10 taken along line B1-B2 shown in Figure 1.
図1~図3に示されるように、半導体モジュール10は、キューブチップ100、枠体200及び第1基板300を含む。また、半導体モジュール10は、絶縁膜40及び絶縁膜210を含んでよく、熱伝導シート800(図15を参照)及び金属膜900(図15を参照)を含んでもよい。 As shown in Figures 1 to 3, the semiconductor module 10 includes a cube chip 100, a frame 200, and a first substrate 300. The semiconductor module 10 may also include an insulating film 40 and an insulating film 210, and may also include a thermally conductive sheet 800 (see Figure 15) and a metal film 900 (see Figure 15).
詳細は後述されるが、枠体200が第1基板300の第1面304の上に設けられ、キューブチップ100が枠体200に取付け可能であると共に枠体200から取外し可能に、第1基板300の上に設けられる。また、例えば、半導体モジュール10が複数のバンプ(図示は省略)によりマザー基板(図示は省略)に実装されてもよい。その結果、例えば、キューブチップ100が動作不良を起こした場合には、キューブチップ100を半導体モジュール10から取外し、動作不良の無いキューブチップ100を取付けることができる。すなわち、半導体モジュール10は、キューブチップ100を交換可能な構成を有する。 Although details will be described later, the frame 200 is provided on the first surface 304 of the first substrate 300, and the cube chip 100 is provided on the first substrate 300 so as to be attachable to the frame 200 and detachable from the frame 200. Furthermore, for example, the semiconductor module 10 may be mounted on a motherboard (not shown) using a plurality of bumps (not shown). As a result, for example, if the cube chip 100 malfunctions, the cube chip 100 can be removed from the semiconductor module 10 and a cube chip 100 that is not malfunctioning can be attached. In other words, the semiconductor module 10 has a configuration that allows the cube chip 100 to be replaced.
また、詳細は後述されるが、キューブチップ100は、メモリセルアレイ115(図7を参照)を含むICチップ110を含み、記憶装置としての機能を有する。さらに、キューブチップ100はインダクタ172を含み、第1基板300はインダクタ372を含み、インダクタ172はインダクタ372と非接触でインダクタ通信可能である。すなわち、キューブチップ100は、第1基板300とは、配線、貫通電極及びバンプなどを用いて長い距離を引き回した信号経路により信号を送受信するのではなく、非接触のインダクタ通信を用いて信号(例えば、データ)を送受信し、格納(記憶)することができる。 Furthermore, as will be described in detail later, the cube chip 100 includes an IC chip 110 that includes a memory cell array 115 (see FIG. 7), and functions as a memory device. Furthermore, the cube chip 100 includes an inductor 172, and the first substrate 300 includes an inductor 372, with the inductor 172 being capable of non-contact inductive communication with the inductor 372. In other words, the cube chip 100 can transmit, receive, and store (memorize) signals (e.g., data) with the first substrate 300 using non-contact inductive communication, rather than transmitting and receiving signals via a signal path routed over a long distance using wiring, through electrodes, bumps, etc.
その結果、半導体モジュール10は、キューブチップ100を着脱可能な構成を含み、長期的に使用可能であると共に、半導体モジュール10の製造工程は、配線、貫通電極及びバンプなどを用いて長い距離を引き回す工程を抑制可能である。よって、半導体モジュール10は、製造費用を抑制可能であると共に、長期的な信頼性を損なうことなく、信頼性を維持することができる。 As a result, the semiconductor module 10 includes a configuration that allows the cube chip 100 to be attached and detached, enabling long-term use, and the manufacturing process for the semiconductor module 10 can eliminate the need for processes that involve routing wiring, through-electrodes, bumps, and the like over long distances. Therefore, the semiconductor module 10 can reduce manufacturing costs and maintain reliability without compromising long-term reliability.
<1-1-1.キューブチップ100の構成>
図1~図3に示されるように、キューブチップ100は、積層メモリチップ30、積層メモリチップ30に電気的に接続される側面電源配線162及び側面接地配線163、並びに、積層メモリチップ30に接する構造体50及び50Aを含む。また、キューブチップ100は、第3方向D3の2つの最外面である第1最外面(第1面146)及び第1最外面と反対側の第2最外面(第2面148)、第3方向D3及び第1方向D1に平行であって第2方向D2の2つの最外面である第3最外面(第3面145)及び第3最外面と反対側の第4最外面(第4面147)、並びに、第3方向D3及び第2方向D2に平行であって第1方向D1の2つの最外面である第5最外面(第5面142)及び第5最外面と反対側の第6最外面(第6面144)とを含む。
<1-1-1. Configuration of cube chip 100>
1 to 3 , the cube chip 100 includes stacked memory chips 30, side power supply wiring 162 and side ground wiring 163 electrically connected to the stacked memory chips 30, and structures 50 and 50A in contact with the stacked memory chips 30. The cube chip 100 also includes a first outermost surface (first surface 146) and a second outermost surface (second surface 148) opposite the first outermost surface, which are two outermost surfaces in the third direction D3, a third outermost surface (third surface 145) and a fourth outermost surface (fourth surface 147) parallel to the third direction D3 and the first direction D1 and which are two outermost surfaces in the second direction D2, and a fifth outermost surface (fifth surface 142) and a sixth outermost surface (sixth surface 144) parallel to the third direction D3 and the second direction D2 and which are two outermost surfaces in the first direction D1.
積層メモリチップ30は、複数の電源配線164、複数の接地配線165、複数の信号伝送配線166(図7を参照)、及び、複数のインダクタ172を含む複数のICチップ110を含む。 The stacked memory chip 30 includes multiple IC chips 110, each including multiple power supply wiring 164, multiple ground wiring 165, multiple signal transmission wiring 166 (see Figure 7), and multiple inductors 172.
また、積層メモリチップ30は、第3方向D3の2つの最外面である第1最外面(第1面46)及び第1最外面と反対側の第2最外面(第2面48)、第3方向D3及び第1方向D1に平行であって第2方向D2の2つの最外面である第3最外面(第3面45)及び第3最外面と反対側の第4最外面(第4面47)、並びに、第3方向D3及び第2方向D2に平行であって第1方向D1の2つの最外面である第5最外面(第5面42)及び第5最外面と反対側の第6最外面(第6面44)とを含む。 The stacked memory chip 30 also includes a first outermost surface (first surface 46) and a second outermost surface (second surface 48) opposite the first outermost surface, which are the two outermost surfaces in the third direction D3; a third outermost surface (third surface 45) and a fourth outermost surface (fourth surface 47) parallel to the third direction D3 and the first direction D1, which are the two outermost surfaces in the second direction D2; and a fifth outermost surface (fifth surface 42) and a sixth outermost surface (sixth surface 44) parallel to the third direction D3 and the second direction D2, which are the two outermost surfaces in the first direction D1.
図2又は図3に示されるように、積層メモリチップ30の第1面46、第2面48、第3面45、第4面47、第5面42及び第6面44は、キューブチップ100の第1面146、第2面148、第3面145、第4面147、第5面142及び第6面144に平行である。例えば、第1面46は第1面146に平行であり、第2面48は第2面148に平行である。第3面45~第6面44及び第3面145~第6面144も、第1面46と第1面146、第2面48と第2面148と同様に、それぞれに対応する面に平行である。第1面146の一部が第1面46である。例えば、第1面146のうち構造体50Aと接する第1面146以外の第1面146が第1面46である。 2 or 3, the first surface 46, second surface 48, third surface 45, fourth surface 47, fifth surface 42, and sixth surface 44 of the stacked memory chip 30 are parallel to the first surface 146, second surface 148, third surface 145, fourth surface 147, fifth surface 142, and sixth surface 144 of the cube chip 100. For example, the first surface 46 is parallel to the first surface 146, and the second surface 48 is parallel to the second surface 148. The third surfaces 45 to 44 and the third surfaces 145 to 144 are also parallel to their corresponding surfaces, as are the first surface 46 and the first surface 146, and the second surface 48 and the second surface 148. A portion of the first surface 146 is the first surface 46. For example, the first surfaces 146 other than the first surfaces 146 that contact the structure 50A are the first surfaces 46.
詳細は後述されるが、例えば、複数のICチップ110は、ICチップ110n(図5を参照)及びICチップ110nに隣接して配置された110n+1(図5を参照)を含む。複数のICチップ110のそれぞれが区別されない場合、ICチップは、ICチップ110と表現される。複数のICチップ110のそれぞれが区別される場合、ICチップは、ICチップ110n、ICチップ110n+1などと表現される。 Details will be provided later, but for example, the multiple IC chips 110 include IC chip 110n (see Figure 5) and IC chip 110n+1 (see Figure 5) arranged adjacent to IC chip 110n. When the multiple IC chips 110 are not distinguished from one another, the IC chips are expressed as IC chip 110. When the multiple IC chips 110 are distinguished from one another, the IC chips are expressed as IC chip 110n, IC chip 110n+1, etc.
図2に示されるように、複数の電源配線164は、第3面45及び第4面47に露出し、側面電源配線162と電気的に接続される。複数の接地配線165は、第2面48に露出し、側面接地配線163と電気的に接続される。複数のインダクタ172は、一つのICチップ毎に第1面46に平行に配置されると共に第1面46から離隔するように設けられ、かつ、一つのICチップ毎に第2方向D2に並んで配置される。なお、インダクタ172は、複数のICチップに渡って設けられてもよい。 As shown in FIG. 2, the multiple power supply wirings 164 are exposed on the third surface 45 and the fourth surface 47 and are electrically connected to the side surface power supply wirings 162. The multiple ground wirings 165 are exposed on the second surface 48 and are electrically connected to the side surface ground wirings 163. The multiple inductors 172 are arranged parallel to the first surface 46 for each IC chip and spaced apart from the first surface 46, and are arranged side by side in the second direction D2 for each IC chip. Note that the inductors 172 may be arranged across multiple IC chips.
図2に示されるように、側面電源配線162は第3面45及び第4面47に接すると共に第3面45及び第4面47の上に設けられる。また、側面電源配線162は第3面145及び第4面147に接する。側面接地配線163は第2面48に接すると共に第2面48の上に設けられる。また、側面接地配線163は第2面148に接する。側面電源配線162は複数の電源配線164に電源電圧を供給する機能を有し、側面接地配線163は複数の接地配線165に接地電圧を供給する機能を有する。例えば、電源電圧は電圧VDDであり、接地電圧は電圧VSSである。例えば、電圧VDDは、1V、3Vなどの電源電圧であり、電圧VSSは0Vなどである。例えば、側面電源配線162及び側面接地配線163は、第1基板300と電気的に接続されず、外部装置(図示は省略)に電気的に接続される。すなわち、電源電圧及び接地電圧は、第1基板300を経由することなく、第1基板300から独立した側面電源配線162及び側面接地配線163を経由して、キューブチップ100に供給される。 2, the side power supply wiring 162 contacts the third surface 45 and the fourth surface 47 and is provided on the third surface 45 and the fourth surface 47. The side power supply wiring 162 also contacts the third surface 145 and the fourth surface 147. The side ground wiring 163 contacts the second surface 48 and is provided on the second surface 48. The side ground wiring 163 also contacts the second surface 148. The side power supply wiring 162 has the function of supplying a power supply voltage to multiple power supply wirings 164, and the side ground wiring 163 has the function of supplying a ground voltage to multiple ground wirings 165. For example, the power supply voltage is voltage VDD and the ground voltage is voltage VSS. For example, voltage VDD is a power supply voltage such as 1V or 3V, and voltage VSS is 0V, for example. For example, the side power supply wiring 162 and the side ground wiring 163 are not electrically connected to the first substrate 300 but are electrically connected to an external device (not shown). That is, the power supply voltage and ground voltage are supplied to the cube chip 100 via the side power supply wiring 162 and side ground wiring 163 that are independent of the first substrate 300, without passing through the first substrate 300.
構造体50は、側面電源配線162が接する第3面45以外の第3面45の一部に接すると共に設けられ、側面電源配線162が接する第4面47以外の第4面47の一部に接すると共に設けられ、第5面42及び第6面44の一部に接すると共に設けられる。また、構造体50は、側面接地配線163が接する第2面48以外の第2面48に接すると共に設けられる。例えば、図2又は図3に示されるように、構造体50は、第2面48と第3面45と第5面42が接する角部、第5面42の一部、及び、第2面48と第5面42と第4面47とが接する角部、を覆うように設けられる。また、図示は省略するが、構造体50は、第4面47と第6面44とが接する角部、第6面44の一部、及び、第2面48と第6面44と第3面45とが接する角部、を覆うように設けられる。 The structure 50 is provided in contact with a portion of the third surface 45 other than the third surface 45 to which the side surface power supply wiring 162 contacts, is provided in contact with a portion of the fourth surface 47 other than the fourth surface 47 to which the side surface power supply wiring 162 contacts, and is provided in contact with portions of the fifth surface 42 and the sixth surface 44. The structure 50 is also provided in contact with a second surface 48 other than the second surface 48 to which the side surface ground wiring 163 contacts. For example, as shown in Figures 2 and 3, the structure 50 is provided to cover the corner where the second surface 48, the third surface 45, and the fifth surface 42 contact, a portion of the fifth surface 42, and the corner where the second surface 48, the fifth surface 42, and the fourth surface 47 contact. Although not shown, the structure 50 is arranged to cover the corner where the fourth surface 47 and the sixth surface 44 meet, a portion of the sixth surface 44, and the corner where the second surface 48, the sixth surface 44, and the third surface 45 meet.
例えば、図2又は図3に示されるように、構造体50Aは、第2傾斜部51を含み、構造体50により覆われる側面電源配線162が接する第3面45以外の第3面45に接すると共に設けられ、構造体50により覆われる側面電源配線162が接する第4面47以外の第4面47に接すると共に設けられ、構造体50により覆われる第5面42及び第6面44の一部以外の第5面42及び第6面44に接すると共に設けられる。 For example, as shown in FIG. 2 or 3, the structure 50A includes a second inclined portion 51, and is provided in contact with the third surface 45 other than the third surface 45 with which the side power supply wiring 162 covered by the structure 50 is in contact, and is provided in contact with the fourth surface 47 other than the fourth surface 47 with which the side power supply wiring 162 covered by the structure 50 is in contact, and is provided in contact with the fifth surface 42 and the sixth surface 44 other than the portions of the fifth surface 42 and the sixth surface 44 covered by the structure 50.
例えば、図2に示される端面視では、構造体50及び50Aは離隔しているが、第2方向D2に対して第3面145側では構造体50及び50Aは接する(図示は省略)。また、図3に示される端面視では、構造体50は第3面145及び第4面147に接し、第3面145及び第4面147に一様に設けられる。 For example, in the end view shown in Figure 2, structures 50 and 50A are spaced apart, but structures 50 and 50A are in contact on the third surface 145 side in the second direction D2 (not shown). Also, in the end view shown in Figure 3, structure 50 is in contact with third surface 145 and fourth surface 147, and is uniformly provided on third surface 145 and fourth surface 147.
構造体50及び50Aは、側面配線(例えば、側面接地配線163及び側面電源配線162)が設けられていない積層メモリチップ30の面を覆うと共に当該面に接する。例えば、構造体50及び50Aは封止材料を含む。例えば、封止材料は、エポキシなどの樹脂材料、硬化剤、充填剤(フィラー)及び添加剤などを含む。構造体50及び50Aは、積層メモリチップ30内への水分の吸湿及び不純物などの侵入を抑制すると共に、物理的な衝撃から保護する機能を有する。また、構造体50Aは枠体200に嵌合されると共にキューブチップ100を枠体200及び第1基板300に固定するための部材としての機能を有する。なお、構造体50Aは金属を含んでもよい。 The structures 50 and 50A cover and contact the surfaces of the stacked memory chip 30 that do not have side wiring (e.g., side ground wiring 163 and side power supply wiring 162). For example, the structures 50 and 50A include a sealing material. For example, the sealing material includes a resin material such as epoxy, a hardener, a filler, and additives. The structures 50 and 50A function to suppress moisture absorption and the intrusion of impurities into the stacked memory chip 30, as well as to protect against physical impact. Furthermore, the structure 50A is fitted into the frame body 200 and functions as a member for fixing the cube chip 100 to the frame body 200 and the first substrate 300. The structure 50A may also include metal.
キューブチップ100は、枠体200に嵌合され、第1基板300の第1面304の上に設けられる。第2傾斜部51が、枠体200の第1傾斜部41と平行になるように、キューブチップ100は枠体200に嵌合する。第1面304と第2傾斜部51とのなす角度は角度αである。 The cube chip 100 is fitted into the frame 200 and is provided on the first surface 304 of the first substrate 300. The cube chip 100 is fitted into the frame 200 so that the second inclined portion 51 is parallel to the first inclined portion 41 of the frame 200. The angle between the first surface 304 and the second inclined portion 51 is angle α.
例えば、角度αは、第1方向D1に沿った第1面146の長さ(幅)が第1面146の長さ±2μmになるように設計される。第1面146の長さの両端は第2傾斜部51の端部に対応し、第2傾斜部51の一方の端部側の角度αは、第1面146の長さ±1μmになるように設計される。換言すると、例えば、キューブチップ100の位置精度は、第1方向D1に沿った枠体200の長さ(幅)に対して±2μmであると表してよく、キューブチップ100の位置精度は枠体200の長さ(幅)の一方の端部に対して±1μmであると表してもよい。 For example, the angle α is designed so that the length (width) of the first surface 146 along the first direction D1 is the length of the first surface 146 ±2 μm. Both ends of the length of the first surface 146 correspond to the ends of the second inclined portion 51, and the angle α at one end of the second inclined portion 51 is designed so that the length of the first surface 146 is ±1 μm. In other words, for example, the positional accuracy of the cube chip 100 may be expressed as ±2 μm with respect to the length (width) of the frame body 200 along the first direction D1, or as ±1 μm with respect to one end of the length (width) of the frame body 200.
<1-1-2.枠体200の構成>
図1、図2又は図3に示されるように、枠体200は、第1傾斜部41を含み、第1基板300の第1面304に接すると共に第1面304の上に設けられる。
<1-1-2. Configuration of frame body 200>
As shown in FIG. 1 , FIG. 2 or FIG. 3 , the frame 200 includes a first inclined portion 41 , and is in contact with and provided on the first surface 304 of the first substrate 300 .
例えば、図2及び図3に示される端面視において、枠体200の形状は台形状であり、第1面304に接する辺の長さが、第3方向D3に対して第1面304と反対側の辺より長い。また、第1面304と第1傾斜部41とのなす角度αは、第1面304と第2傾斜部51とのなす角度αと同一である。また、第1傾斜部41と第2傾斜部51とは互いにかみ合う形状であってもよい。例えば、第1傾斜部41は、第3方向D3に沿って下方より上方がへこんだ構造を含み、第2傾斜部51は、第3方向D3に沿って上方より下方がへこんだ構造を含み、第1傾斜部41が第2傾斜部51とかみ合うように構成されてよい。 For example, in the end view shown in Figures 2 and 3, the shape of the frame body 200 is trapezoidal, and the length of the side tangent to the first surface 304 is longer than the side opposite the first surface 304 in the third direction D3. The angle α between the first surface 304 and the first inclined portion 41 is the same as the angle α between the first surface 304 and the second inclined portion 51. The first inclined portion 41 and the second inclined portion 51 may be configured to interlock with each other. For example, the first inclined portion 41 may include a structure that is recessed more upward than downward along the third direction D3, and the second inclined portion 51 may include a structure that is recessed more downward than upward along the third direction D3, and the first inclined portion 41 may be configured to interlock with the second inclined portion 51.
枠体200は、キューブチップ100を嵌合すると共に、キューブチップ100を第1基板300の上に固定する機能を有する。例えば、枠体200は、ICソケットと同様にICチップを着脱可能に構成されてよい。すなわち、枠体200は、キューブチップ100を取付けられると共に、キューブチップ100を取外し可能に構成される。 The frame body 200 has the function of fitting the cube chip 100 and fixing the cube chip 100 onto the first substrate 300. For example, the frame body 200 may be configured to allow an IC chip to be attached and detached, similar to an IC socket. In other words, the frame body 200 is configured to allow the cube chip 100 to be attached and to allow the cube chip 100 to be detached.
<1-1-3.第1基板300の構成>
図2又は図3に示されるように、第1基板300は、少なくとも、複数のインダクタ372、複数のインダクタ372を制御可能な制御回路(例えば、図4を参照)、及び、配線と絶縁層とが交互に積層された多層配線構造を含む。例えば、第1基板300は、第1面304、第2面302、複数の配線層326、328、330、332及び334を含む。配線層326、328、330、332及び334は、第1方向D1及び第2方向D2に平行に配置されると共に、第3方向D3に沿って第1面304に近い方からこの順序で積層される。複数の配線層326は、配線327及びインダクタ372を含む。複数の配線層328、330、332及び334は、複数の配線329、複数の配線331、複数の配線333及び複数の配線335を含む。配線327及びインダクタ372は配線329に電気的に接続され、配線329は配線331に電気的に接続され、配線331は配線333に電気的に接続され、配線333は配線335に電気的に接続される。図1において、配線と交互に積層された絶縁層の図示は省略される。
<1-1-3. Configuration of first substrate 300>
As shown in FIG. 2 or 3 , the first substrate 300 includes at least a plurality of inductors 372, a control circuit (see, for example, FIG. 4 ) capable of controlling the plurality of inductors 372, and a multilayer wiring structure in which wiring and insulating layers are alternately stacked. For example, the first substrate 300 includes a first surface 304, a second surface 302, and a plurality of wiring layers 326, 328, 330, 332, and 334. The wiring layers 326, 328, 330, 332, and 334 are arranged parallel to the first direction D1 and the second direction D2, and are stacked in this order from the side closest to the first surface 304 along the third direction D3. The plurality of wiring layers 326 includes a wiring 327 and an inductor 372. The plurality of wiring layers 328, 330, 332, and 334 include a plurality of wirings 329, a plurality of wirings 331, a plurality of wirings 333, and a plurality of wirings 335. The wiring 327 and the inductor 372 are electrically connected to the wiring 329, the wiring 329 is electrically connected to the wiring 331, the wiring 331 is electrically connected to the wiring 333, and the wiring 333 is electrically connected to the wiring 335. In FIG. 1 , the insulating layers alternately stacked with the wiring are not shown.
また、第1基板300の多層配線構造の積層数は、図2及び図3に示された積層数(5層)に限定されるものではない。第1基板300の多層配線構造の積層数は、半導体モジュール10の用途又は仕様などに基づき、適宜変更可能である。 Furthermore, the number of layers in the multilayer wiring structure of the first substrate 300 is not limited to the number of layers (five layers) shown in Figures 2 and 3. The number of layers in the multilayer wiring structure of the first substrate 300 can be changed as appropriate based on the application or specifications of the semiconductor module 10, etc.
また、例えば、配線335は第2面302に露出し電極として機能してもよい。半導体モジュール10の配線335は、バンプ(図示は省略)などにより、マザー基板(図示は省略)に電気的に接続されてもよい。例えば、マザー基板は、半導体モジュール10、複数の演算回路を含み演算処理が可能であるCPU(Central Processing Unit)、及び、複数の演算回路を含み画像処理又は映像処理が可能であるGPU(Graphics Processing Unit)が実装された基板であってよい。半導体モジュール10が、複数の演算回路を含み演算処理が可能であるCPU、又は、複数の演算回路を含み画像処理又は映像処理が可能であるGPUを含んでもよい。 Furthermore, for example, the wiring 335 may be exposed on the second surface 302 and function as an electrode. The wiring 335 of the semiconductor module 10 may be electrically connected to a motherboard (not shown) by a bump (not shown) or the like. For example, the motherboard may be a substrate on which the semiconductor module 10, a CPU (Central Processing Unit) including multiple arithmetic circuits and capable of arithmetic processing, and a GPU (Graphics Processing Unit) including multiple arithmetic circuits and capable of image processing or video processing are mounted. The semiconductor module 10 may include a CPU including multiple arithmetic circuits and capable of arithmetic processing, or a GPU including multiple arithmetic circuits and capable of image processing or video processing.
第1基板300は、枠体200及びキューブチップ100を固定すると共に支持する機能、及び、キューブチップ100とインダクタ通信する機能を有する。また、第1基板300は、キューブチップ100を、外部装置などと接続する機能を有してもよい。 The first substrate 300 has the function of fixing and supporting the frame body 200 and the cube chip 100, and the function of communicating with the cube chip 100 via inductor. The first substrate 300 may also have the function of connecting the cube chip 100 to an external device, etc.
<1-1-4.その他の構成>
「1-1.半導体モジュール10の概要」で説明したとおり、半導体モジュール10は、図2又は図3に示されるような絶縁膜40及び絶縁膜210を含んでよい。
<1-1-4. Other configurations>
As explained in "1-1. Overview of the Semiconductor Module 10," the semiconductor module 10 may include an insulating film 40 and an insulating film 210 as shown in FIG. 2 or FIG.
例えば、絶縁膜40が第1面146に接するように設けられる。例えば、第1面146はキューブチップ100が第1基板300とインダクタ通信をするための重要な面であり、絶縁膜40は、第1面146をコーティングし、第1面146を保護する機能を有する。また、絶縁膜40は、キューブチップ100が第1基板300と接することを抑制し、キューブチップ100と第1基板300とを絶縁する機能を有する。絶縁膜40は第2傾斜部51に接するように設けられてもよい。 For example, the insulating film 40 is provided so as to contact the first surface 146. For example, the first surface 146 is an important surface for the cube chip 100 to perform inductive communication with the first substrate 300, and the insulating film 40 has the function of coating the first surface 146 and protecting the first surface 146. The insulating film 40 also has the function of preventing the cube chip 100 from contacting the first substrate 300 and insulating the cube chip 100 from the first substrate 300. The insulating film 40 may be provided so as to contact the second inclined portion 51.
例えば、絶縁膜210が、第1傾斜部41、第1面304、第2傾斜部51及び絶縁膜40に接し、第1傾斜部41及び第1面304と、第2傾斜部51及び絶縁膜40との間に設けられる。絶縁膜210は、キューブチップ100が第1基板300と接することを抑制し、キューブチップ100と第1基板300とを絶縁する機能を有する。 For example, the insulating film 210 contacts the first inclined portion 41, the first surface 304, the second inclined portion 51, and the insulating film 40, and is provided between the first inclined portion 41 and the first surface 304 and the second inclined portion 51 and the insulating film 40. The insulating film 210 prevents the cube chip 100 from contacting the first substrate 300, and functions to insulate the cube chip 100 from the first substrate 300.
例えば、絶縁膜40及び絶縁膜210は樹脂であってよく、当該樹脂はテフロン(登録商標)などのフッ素樹脂であってよい。 For example, the insulating film 40 and the insulating film 210 may be made of resin, which may be a fluororesin such as Teflon (registered trademark).
図2及び図3に示される半導体モジュール10は、一例として、絶縁膜40及び絶縁膜210の両方を含む。キューブチップ100及び第1基板300は、互いに絶縁され、互いに着脱可能な構成を含んでいればよく、半導体モジュール10は、絶縁膜40及び絶縁膜210の何れか一方を含んでよい。 The semiconductor module 10 shown in Figures 2 and 3 includes, as an example, both the insulating film 40 and the insulating film 210. The cube chip 100 and the first substrate 300 only need to be insulated from each other and have a configuration that allows them to be attached and detached from each other, and the semiconductor module 10 may include either the insulating film 40 or the insulating film 210.
また、「1-1.半導体モジュール10の概要」で説明したとおり、半導体モジュール10は、熱伝導シート800(図15を参照)及び金属膜900(図15を参照)を含んでもよい。熱伝導シート800又は金属膜900はヒートスプレッダとしての機能を有してよく、ヒートスプレッダであってもよい。例えば、熱伝導シート800及び金属膜900は、半導体モジュール10が発生する熱を半導体モジュール10の外部に放出する機能を有する。 Furthermore, as explained in "1-1. Overview of Semiconductor Module 10," the semiconductor module 10 may include a thermally conductive sheet 800 (see FIG. 15) and a metal film 900 (see FIG. 15). The thermally conductive sheet 800 or the metal film 900 may function as a heat spreader, or may be a heat spreader itself. For example, the thermally conductive sheet 800 and the metal film 900 have the function of releasing heat generated by the semiconductor module 10 to the outside of the semiconductor module 10.
<1-2.半導体モジュール10の機能ブロック構成>
次に、半導体モジュール10の機能ブロック構成を図2~図4を参照して説明する。図4は半導体モジュール10の機能ブロック構成を示すブロック図である。図1~図3と同一又は類似する構成は必要に応じて説明され、図1~図3と同一又は類似する構成の説明は省略される場合がある。
<1-2. Functional Block Configuration of Semiconductor Module 10>
Next, the functional block configuration of the semiconductor module 10 will be described with reference to Figures 2 to 4. Figure 4 is a block diagram showing the functional block configuration of the semiconductor module 10. Configurations that are the same as or similar to those in Figures 1 to 3 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 3 may be omitted.
図2、図3又は図4に示されるように、半導体モジュール10は、キューブチップ100及び第1基板300を含む。 As shown in Figures 2, 3, and 4, the semiconductor module 10 includes a cube chip 100 and a first substrate 300.
キューブチップ100は、複数の磁界結合チップ間インターフェース(Through Chip Interface-IO(TCI-IO))112及び複数のメモリモジュール111を含む。複数のTCI-IO112はメモリモジュール111に電気的に接続される。例えば、キューブチップ100(積層メモリチップ30)は、受信したデータを格納する機能、格納したデータを送信する機能を含む。 The cube chip 100 includes multiple magnetically coupled chip-to-chip interfaces (Through Chip Interface-IO (TCI-IO)) 112 and multiple memory modules 111. The multiple TCI-IOs 112 are electrically connected to the memory modules 111. For example, the cube chip 100 (stacked memory chip 30) includes a function for storing received data and a function for transmitting stored data.
TCI-IO112は、インダクタ172(第2インダクタ)、送受信回路114及び並列直列変換回路113を含む。インダクタ172は端子A及び端子Bを用いて送受信回路114に電気的に接続される。送受信回路114は並列直列変換回路113に電気的に接続される。並列直列変換回路113はメモリモジュール111に電気的に接続される。 The TCI-IO 112 includes an inductor 172 (second inductor), a transmitting/receiving circuit 114, and a parallel-serial conversion circuit 113. The inductor 172 is electrically connected to the transmitting/receiving circuit 114 using terminals A and B. The transmitting/receiving circuit 114 is electrically connected to the parallel-serial conversion circuit 113. The parallel-serial conversion circuit 113 is electrically connected to the memory module 111.
インダクタ172は、第1基板300のインダクタ372(第1インダクタ)との間で非接触でインダクタ通信する機能を有する。 Inductor 172 has the function of performing non-contact inductor communication with inductor 372 (first inductor) on the first substrate 300.
例えば、送受信回路114は、インダクタ172によって受信された信号(例えば、制御信号及びデータ信号)を増幅する機能、及び、受信された信号(例えば、制御信号及びデータ信号)からノイズを除去する機能を有する。また、例えば、送受信回路114は、並列直列変換回路113を用いて変換された所望の信号(例えば、制御信号及びデータ信号)を電波に載せる機能を有する。インダクタ172によって受信された信号は、第1基板300からの多数の並列信号(パラレル信号)を含む。前記所望の信号は、メモリモジュール111からの多数の並列信号(パラレル信号)を含む。 For example, the transmitter/receiver circuit 114 has the function of amplifying signals (e.g., control signals and data signals) received by the inductor 172, and the function of removing noise from the received signals (e.g., control signals and data signals). Furthermore, for example, the transmitter/receiver circuit 114 has the function of transmitting desired signals (e.g., control signals and data signals) converted using the parallel-to-serial conversion circuit 113 over radio waves. The signals received by the inductor 172 include a large number of parallel signals (parallel signals) from the first board 300. The desired signals include a large number of parallel signals (parallel signals) from the memory module 111.
例えば、並列直列変換回路113は、ステップ1にて、第1基板300からの多数の並列信号を並列直列変換して、直列信号(シリアル信号)に変換する。直列信号は一つの信号経路(配線)を使用して高速転送される。並列直列変換回路113は、ステップ2にて、メモリモジュール111の直前で、前記直列信号を直列並列変換して、多数の並列信号に戻したのち、前記多数の並列信号をメモリモジュール111に送信する。例えば、メモリモジュール111から第1基板300に信号(例えば、制御信号及びデータ信号)を送信する場合には、並列直列変換回路113は、ステップ2に続けてステップ1を実行する。並列直列変換回路113は、例えば、SerDes回路(Serializ・BR>・@and Deserialize Circuit)と呼ばれる。 For example, in step 1, the parallel-serial conversion circuit 113 converts a large number of parallel signals from the first board 300 into serial signals (serial signals) by parallel-serial conversion. The serial signals are transferred at high speed using a single signal path (wiring). In step 2, the parallel-serial conversion circuit 113 converts the serial signals into parallel signals just before the memory module 111, returning them to a large number of parallel signals, and then transmits the large number of parallel signals to the memory module 111. For example, when transmitting signals (e.g., control signals and data signals) from the memory module 111 to the first board 300, the parallel-serial conversion circuit 113 performs step 2 followed by step 1. The parallel-serial conversion circuit 113 is called, for example, a SerDes circuit (Serialize and Deserialize Circuit).
例えば、メモリモジュール111は、送信する多数の並列信号を生成する機能、受信した多数の並列信号を制御し、メモリセルアレイ115(図7を参照)に格納する機能を含む。 For example, memory module 111 includes the functionality of generating a large number of parallel signals to be transmitted, and the functionality of controlling a large number of parallel signals received and storing them in memory cell array 115 (see Figure 7).
第1基板300は、複数のTCI-IO312及び複数のTCI-IO制御モジュール311を含む。複数のTCI-IO312は複数のTCI-IO制御モジュール311に電気的に接続される。 The first board 300 includes multiple TCI-IOs 312 and multiple TCI-IO control modules 311. The multiple TCI-IOs 312 are electrically connected to the multiple TCI-IO control modules 311.
TCI-IO312は、インダクタ372、送受信回路314、及び並列直列変換回路313を含む。インダクタ372は端子C及び端子Dを用いて送受信回路314に電気的に接続される。送受信回路314は並列直列変換回路313に電気的に接続される。例えば、並列直列変換回路313はTCI-IO制御モジュール311に電気的に接続される。 The TCI-IO 312 includes an inductor 372, a transmitting/receiving circuit 314, and a parallel-to-serial conversion circuit 313. The inductor 372 is electrically connected to the transmitting/receiving circuit 314 using terminals C and D. The transmitting/receiving circuit 314 is electrically connected to the parallel-to-serial conversion circuit 313. For example, the parallel-to-serial conversion circuit 313 is electrically connected to the TCI-IO control module 311.
インダクタ372、送受信回路314及び並列直列変換回路313の構成及び機能などは、インダクタ172、送受信回路114及び並列直列変換回路113の構成及び機能などと同様である。 The configurations and functions of the inductor 372, the transmitter/receiver circuit 314, and the parallel-serial conversion circuit 313 are similar to the configurations and functions of the inductor 172, the transmitter/receiver circuit 114, and the parallel-serial conversion circuit 113.
例えば、TCI-IO制御モジュール311は、CPU又はGPUを含んでもよい。例えば、TCI-IO制御モジュール311は、外部装置に含まれるDRAM(Dynamic Random Access Memory)(図示は省略)に格納された制御プログラムを読み出し、当該制御プログラムを展開して、当該制御プログラムに基づく処理を実行すると共に、当該制御プログラムに基づく処理を実行するように各ICチップ110に命令(コマンド)を送信する機能を有してよい。 For example, the TCI-IO control module 311 may include a CPU or GPU. For example, the TCI-IO control module 311 may have the function of reading a control program stored in a DRAM (Dynamic Random Access Memory) (not shown) included in an external device, expanding the control program, executing processing based on the control program, and sending instructions (commands) to each IC chip 110 to execute processing based on the control program.
<1-3.インダクタ通信の概要>
次に、インダクタ通信の概要を、図5を参照して説明する。図5はキューブチップ100に含まれる複数のインダクタ172及び第1基板300に含まれる複数のインダクタ372を示す斜視図であり、インダクタ172とインダクタ272の構成を示す斜視図である。図1~図4と同一又は類似する構成は必要に応じて説明され、図1~図4と同一又は類似する構成の説明は省略される場合がある。
<1-3. Overview of inductor communication>
Next, an overview of inductor communication will be described with reference to Fig. 5. Fig. 5 is a perspective view showing a plurality of inductors 172 included in the cube chip 100 and a plurality of inductors 372 included in the first substrate 300, and is a perspective view showing the configurations of the inductors 172 and 272. Configurations that are the same as or similar to those in Figs. 1 to 4 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 4 may be omitted.
「1-1-1.キューブチップ100の構成」で説明したとおり、キューブチップ100は、第2方向D2及び第3方向D3に平行な第3面145に平行に、かつ、第1面146及び第3面145と離隔して設けられた複数のインダクタ172を含む。複数のインダクタ172は第2方向D2に沿って配置される。 As explained in "1-1-1. Configuration of the cube chip 100," the cube chip 100 includes a plurality of inductors 172 arranged parallel to the third surface 145, which is parallel to the second direction D2 and the third direction D3, and spaced apart from the first surface 146 and the third surface 145. The multiple inductors 172 are arranged along the second direction D2.
複数のインダクタ172のそれぞれは、端子A、端子B、第1部分172a、第2部分172b、第3部分172c、第4部分172e、及び第5部分172dを含む。 Each of the multiple inductors 172 includes terminal A, terminal B, a first portion 172a, a second portion 172b, a third portion 172c, a fourth portion 172e, and a fifth portion 172d.
第5部分172dは、第2方向D2に延在し、第5部分172dの一方の端は端子Aに電気的に接続され、第5部分172dの他方の端は第4部分172eの一方の端に電気的に接続される。第4部分172eは、第3方向D3に延在し、第4部分172eの他方の端は第1部分172aの一方の端に電気的に接続される。第1部分172aは、第2方向D2に延在し、第1部分172aの他方の端は第2部分172bの一方の端に電気的に接続される。第2部分172bは、第3方向D3に延在し、第2部分172bの他方の端は第3部分172cの一方の端に電気的に接続される。第3部分172cは、第2方向D2に延在し、第3部分172cの他方の端は端子Bに電気的に接続される。 The fifth portion 172d extends in the second direction D2, and one end of the fifth portion 172d is electrically connected to terminal A, and the other end of the fifth portion 172d is electrically connected to one end of the fourth portion 172e. The fourth portion 172e extends in the third direction D3, and the other end of the fourth portion 172e is electrically connected to one end of the first portion 172a. The first portion 172a extends in the second direction D2, and the other end of the first portion 172a is electrically connected to one end of the second portion 172b. The second portion 172b extends in the third direction D3, and the other end of the second portion 172b is electrically connected to one end of the third portion 172c. The third portion 172c extends in the second direction D2, and the other end of the third portion 172c is electrically connected to terminal B.
第1基板300は、複数のインダクタ172が配置された位置に平行であると共に、第1基板300の第1面304に平行に、かつ、第1面304と離隔して設けられた複数のインダクタ372を含む。複数のインダクタ372は第1方向D1及び第2方向D2に沿ってマトリクス状に配置される。複数のインダクタ372のそれぞれは、端子C、端子D、第1部分372a、第2部分372b、第3部分372c、第4部分372e、及び第5部分372dを含む。 The first substrate 300 includes a plurality of inductors 372 that are parallel to the positions where the plurality of inductors 172 are arranged, parallel to the first surface 304 of the first substrate 300, and spaced apart from the first surface 304. The plurality of inductors 372 are arranged in a matrix along the first direction D1 and the second direction D2. Each of the plurality of inductors 372 includes a terminal C, a terminal D, a first portion 372a, a second portion 372b, a third portion 372c, a fourth portion 372e, and a fifth portion 372d.
第5部分372dは、第2方向D2に延在し、第5部分372dの一方の端は端子Cに電気的に接続され、第5部分372dの他方の端は第4部分372eの一方の端に電気的に接続される。第4部分372eは、第1方向D1に延在し、第4部分372eの他方の端は第1部分372aの一方の端に電気的に接続される。第1部分372aは、第2方向D2に延在し、第1部分372aの他方の端は第2部分372bの一方の端に電気的に接続される。第2部分372bは、第1方向D1に延在し、第2部分372bの他方の端は第3部分372cの一方の端に電気的に接続される。第3部分372cは、第2方向D2に延在し、第3部分372cの他方の端は端子Dに電気的に接続される。 The fifth portion 372d extends in the second direction D2, and one end of the fifth portion 372d is electrically connected to terminal C, and the other end of the fifth portion 372d is electrically connected to one end of the fourth portion 372e. The fourth portion 372e extends in the first direction D1, and the other end of the fourth portion 372e is electrically connected to one end of the first portion 372a. The first portion 372a extends in the second direction D2, and the other end of the first portion 372a is electrically connected to one end of the second portion 372b. The second portion 372b extends in the first direction D1, and the other end of the second portion 372b is electrically connected to one end of the third portion 372c. The third portion 372c extends in the second direction D2, and the other end of the third portion 372c is electrically connected to terminal D.
ICチップ110n及び110n+1は第1基板300に垂直に立った状態であるため、インダクタ172はインダクタ372に対して、90度で対向して配置される。第3方向D3から第1方向D1及び第2方向D2に平行な面を見た場合には、インダクタ172の第1部分172aとインダクタ372の第1部分372aとは重畳し、互いに平行に対向して配置される。複数のインダクタ172と複数のインダクタ372のうち、互いに対向する一つのインダクタ172と一つのインダクタ372とが磁界結合することにより、互いのインダクタが1対1で非接触で通信可能である。例えば、磁界結合することに伴う互いのインダクタ同士の通信は、インダクタ通信、信号通信、データ通信などと呼ばれる。インダクタ172の形状及びインダクタ372の形状は、図5に示される四角形状に限定されるものではなく、インダクタ通信可能な形状であればよい。 Because IC chips 110n and 110n+1 are standing perpendicular to the first substrate 300, inductor 172 is arranged opposite inductor 372 at a 90-degree angle. When viewed from the third direction D3 on a surface parallel to the first direction D1 and the second direction D2, first portion 172a of inductor 172 and first portion 372a of inductor 372 overlap and are arranged parallel and opposite to each other. Magnetic field coupling between one inductor 172 and one inductor 372 facing each other among the multiple inductors 172 and multiple inductors 372 enables one-to-one, non-contact communication between the inductors. For example, communication between inductors due to magnetic field coupling is called inductor communication, signal communication, data communication, etc. The shapes of inductors 172 and 372 are not limited to the rectangular shapes shown in FIG. 5 and may be any shape that allows inductor communication.
例えば、インダクタ172とインダクタ372とは、互いに90度で対向して設けられ、磁界結合することにより1対1で通信可能である。図5に示される例では、磁界が、インダクタ172の第1部分172a及びインダクタ372の第1部分272aにより発生される。より具体的には、実効的なインダクタ通信は、インダクタ172の第1部分172a及びインダクタ372の第1部分372aにより実行される。第1部分172aは、主に、第1部分372aと、インダクタ通信を行う機能を有する。インダクタ172の第1部分172aを除く第2部分172b、第3部分172c、第4部分172e及び第5部分172dは、主に、第1部分172aに電流を供給する機能を有する。インダクタ172と同様に、インダクタ372の第1部分372aを除く第2部分372b、第3部分372c、第4部分372e、及び第5部分372dは、主に、第1部分372aに電流を供給する機能を有する。なお、図5に示される磁界は一例であって、実際に発生される磁界は図5に示される磁界に限定されるものではない。 For example, inductor 172 and inductor 372 are arranged opposite each other at 90 degrees, and are capable of one-to-one communication through magnetic field coupling. In the example shown in FIG. 5, a magnetic field is generated by first portion 172a of inductor 172 and first portion 272a of inductor 372. More specifically, effective inductor communication is performed by first portion 172a of inductor 172 and first portion 372a of inductor 372. First portion 172a mainly functions to perform inductor communication with first portion 372a. Second portion 172b, third portion 172c, fourth portion 172e, and fifth portion 172d of inductor 172, excluding first portion 172a, mainly function to supply current to first portion 172a. Similar to inductor 172, the second portion 372b, third portion 372c, fourth portion 372e, and fifth portion 372d of inductor 372, excluding first portion 372a, mainly function to supply current to first portion 372a. Note that the magnetic field shown in FIG. 5 is an example, and the magnetic field that is actually generated is not limited to the magnetic field shown in FIG. 5.
インダクタ372はインダクタ172と同様の構成及び機能を有する。なお、半導体モジュール10では、第1方向D1から、第2方向D2及び第3方向D3に平行な面を見ることを正面視と呼ぶ場合があり、第3方向D3から、第1方向D1及び第2方向に平行な面を見ることを平面視と呼ぶ場合がある。 Inductor 372 has the same configuration and function as inductor 172. Note that in semiconductor module 10, viewing a surface parallel to second direction D2 and third direction D3 from first direction D1 may be referred to as a front view, and viewing a surface parallel to first direction D1 and second direction D3 from third direction D3 may be referred to as a plan view.
また、インダクタ172が複数のICチップ110にわたって設けられる場合には、インダクタ172の第1部分172a、第2部分172b、第3部分172c、第4部分172e及び第5部分172dが、インダクタ372の第1部分372a、第2部分372b、第3部分372c、第4部分372e及び第5部分372dに平行に対向するように設けられる。 Furthermore, when the inductor 172 is provided across multiple IC chips 110, the first portion 172a, second portion 172b, third portion 172c, fourth portion 172e, and fifth portion 172d of the inductor 172 are provided so as to face and be parallel to the first portion 372a, second portion 372b, third portion 372c, fourth portion 372e, and fifth portion 372d of the inductor 372.
以上説明したとおり、キューブチップ100は、第1基板300と、配線、貫通電極及びバンプなどを用いて長い距離を引き回した信号経路により信号を送受信するのではなく、非接触のインダクタ通信を用いて信号を送受信することができる。 As explained above, the cube chip 100 can transmit and receive signals to and from the first substrate 300 using non-contact inductor communication, rather than transmitting and receiving signals via signal paths routed long distances using wiring, through-electrodes, bumps, etc.
その結果、半導体モジュール10の製造工程は、配線、貫通電極及びバンプなどを用いて長い距離の配線引き回しを抑制可能であり、製造費用を抑制可能であると共に製造歩留まりの低下を抑制可能である。また、半導体モジュール10は、配線、貫通電極及びバンプなどを用いて長い距離の配線引き回しを抑制可能であり、配線の引き回しによる抵抗及び寄生容量を抑制可能である。その結果、半導体モジュール10を用いたインダクタ通信は、半導体モジュール10の消費電力を抑制可能である。 As a result, the manufacturing process for semiconductor module 10 can reduce the need for long-distance wiring by using wiring, through electrodes, bumps, etc., thereby reducing manufacturing costs and preventing a decrease in manufacturing yield. Furthermore, semiconductor module 10 can reduce the need for long-distance wiring by using wiring, through electrodes, bumps, etc., thereby reducing the resistance and parasitic capacitance caused by wiring. As a result, inductor communication using semiconductor module 10 can reduce the power consumption of semiconductor module 10.
<1-4.ICチップ110の概要>
次に、ICチップ110の概要を、図6を参照して説明する。図6はICチップ110の端部断面構造の一部を拡大した端面図である。図1~図5と同一又は類似する構成は必要に応じて説明され、図1~図5と同一又は類似する構成の説明は省略される場合がある。
<1-4. Overview of IC chip 110>
Next, an overview of the IC chip 110 will be described with reference to Fig. 6. Fig. 6 is an end view showing an enlarged portion of the end cross-sectional structure of the IC chip 110. Configurations that are the same as or similar to those in Figs. 1 to 5 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 5 may be omitted.
図6に示されるように、ICチップ110は、第2方向D2及び第3方向D3に平行な第1面102、第1方向D1に対して第1面102と反対側の第2面104、トランジスタ層130及び配線層150を含む。第1面102はトランジスタ層130に対して配線層150が配置される面と反対側の面であり、第2面104は配線層150に対してトランジスタ層130が配置される面と反対側の面である。 As shown in FIG. 6, the IC chip 110 includes a first surface 102 parallel to the second direction D2 and the third direction D3, a second surface 104 opposite the first surface 102 in the first direction D1, a transistor layer 130, and a wiring layer 150. The first surface 102 is the surface opposite the surface on which the wiring layer 150 is arranged relative to the transistor layer 130, and the second surface 104 is the surface opposite the surface on which the wiring layer 150 is arranged relative to the transistor layer 130.
例えば、トランジスタ層130は、半導体基板173、素子分離領域174、活性化領域175、トランジスタ176、絶縁層177、及び、配線178の一部を含む。例えば、半導体基板173は、Si基板、Si‐waferであり、半導体基板と呼ばれる。なお、半導体基板173及び素子分離領域174を貫通する貫通電極(図示は省略)が設けられてもよい。 For example, the transistor layer 130 includes a semiconductor substrate 173, an isolation region 174, an activation region 175, a transistor 176, an insulating layer 177, and part of the wiring 178. For example, the semiconductor substrate 173 is a Si substrate or Si-wafer, and is called a semiconductor substrate. Note that a through electrode (not shown) that penetrates the semiconductor substrate 173 and the isolation region 174 may be provided.
例えば、配線層150は、配線と絶縁層とが交互に積層された多層配線構造を含む。例えば、配線層150は、配線178の一部、絶縁層179、配線180、絶縁層181、絶縁層182及び配線183を含む。配線183は貫通電極であってもよい。 For example, the wiring layer 150 includes a multilayer wiring structure in which wiring and insulating layers are alternately stacked. For example, the wiring layer 150 includes a portion of the wiring 178, insulating layer 179, the wiring 180, insulating layer 181, insulating layer 182, and the wiring 183. The wiring 183 may be a through electrode.
例えば、配線178は、絶縁層177を貫通して設けられ、トランジスタ176のソース又はドレインに電気的に接続される。例えば、配線180は、絶縁層179を貫通して設けられ、配線178に電気的に接続される。例えば、配線183は配線180に電気的に接続される。また、例えば、インダクタ172は配線183を用いて形成され、送受信回路114、並列直列変換回路113及びメモリモジュール111は、配線178、配線180、配線183及びトランジスタ176を用いて形成される。図6に示される各配線の接続は、一例であって、各配線の接続は図6に示される構成に限定されるものではない。各配線の接続は、半導体モジュール10の用途又は仕様などに基づき、適宜変更可能である。 For example, wiring 178 penetrates insulating layer 177 and is electrically connected to the source or drain of transistor 176. For example, wiring 180 penetrates insulating layer 179 and is electrically connected to wiring 178. For example, wiring 183 is electrically connected to wiring 180. Also, for example, inductor 172 is formed using wiring 183, and transceiver circuit 114, parallel-serial conversion circuit 113, and memory module 111 are formed using wiring 178, wiring 180, wiring 183, and transistor 176. The connections of each wiring shown in FIG. 6 are merely examples, and the connections of each wiring are not limited to the configuration shown in FIG. 6. The connections of each wiring can be changed as appropriate based on the application or specifications of semiconductor module 10.
また、例えば、第1基板300は、ICチップ110と同様の構成を有してよい。例えば、第1面304及び第2面302が第1面102及び第2面104に対応付けられ、配線327~配線335が配線層150に対応付けられ、配線335と第2面302との間の構成がトランジスタ層130に対応付けられてよい。また、第1基板300は、トランジスタ層130を貫通する貫通電極(図示は省略)を含み、貫通電極が配線335に電気的に接続され、半導体モジュール10が外部装置と電気的に接続されてよい。 Furthermore, for example, the first substrate 300 may have a configuration similar to that of the IC chip 110. For example, the first surface 304 and the second surface 302 may correspond to the first surface 102 and the second surface 104, the wiring 327 to the wiring 335 may correspond to the wiring layer 150, and the configuration between the wiring 335 and the second surface 302 may correspond to the transistor layer 130. Furthermore, the first substrate 300 may include a through electrode (not shown) that penetrates the transistor layer 130, and the through electrode may be electrically connected to the wiring 335, electrically connecting the semiconductor module 10 to an external device.
<1-5.積層メモリチップ30の機能ブロック構成>
次に、積層メモリチップ30の機能ブロック構成を図7を参照して説明する。図7は積層メモリチップ30の機能ブロック構成を示すブロック図である。図1~図6と同一又は類似する構成は必要に応じて説明され、図1~図6と同一又は類似する構成の説明は省略される場合がある。
<1-5. Functional Block Configuration of Stacked Memory Chip 30>
Next, the functional block configuration of the stacked memory chip 30 will be described with reference to Fig. 7. Fig. 7 is a block diagram showing the functional block configuration of the stacked memory chip 30. Configurations that are the same as or similar to those in Figs. 1 to 6 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 6 may be omitted.
積層メモリチップ30は、複数のメモリモジュール111を含む。複数のメモリモジュール111のそれぞれはメモリセルアレイ115を含む。 The stacked memory chip 30 includes multiple memory modules 111. Each of the multiple memory modules 111 includes a memory cell array 115.
例えば、複数のメモリモジュール111のそれぞれは、受信した信号に含まれるデータをメモリセルアレイ115へ格納する機能、メモリセルアレイ115からデータを読み出し、当該データを含む信号を送信する機能を含む。複数のメモリモジュール111は、複数の電源配線164、複数の接地配線165及び複数の信号伝送配線166に電気的に接続される。 For example, each of the multiple memory modules 111 has the function of storing data contained in a received signal in the memory cell array 115, and the function of reading data from the memory cell array 115 and transmitting a signal containing that data. The multiple memory modules 111 are electrically connected to multiple power supply wiring 164, multiple ground wiring 165, and multiple signal transmission wiring 166.
複数の電源配線164及び複数の接地配線165は、「1-1-1.キューブチップ100の構成」で説明した構成を含み、ここでの詳細な説明は省略される。 The multiple power supply wiring 164 and the multiple ground wiring 165 include the configuration described in "1-1-1. Configuration of the cube chip 100," and detailed description here will be omitted.
例えば、複数の信号伝送配線166はTCI-IO112に電気的に接続される。複数の信号伝送配線166は、インダクタ通信により、第1基板300及び外部回路(図示は省略)に接続され、第1基板300及び外部回路から、ICチップ110を制御するためのアドレス信号、イネーブル信号などの制御信号、及び、データを含む信号が供給される。 For example, the multiple signal transmission wiring 166 is electrically connected to the TCI-IO 112. The multiple signal transmission wiring 166 is connected to the first substrate 300 and an external circuit (not shown) via inductor communication, and receives control signals such as address signals and enable signals for controlling the IC chip 110, as well as signals including data, from the first substrate 300 and the external circuit.
メモリセルアレイ115は複数のメモリセル(図示は省略)を含む。複数のメモリセルアレイ115のそれぞれは、例えば、SRAM(Static Random Access Memory)であり、複数のメモリセルのそれぞれは、SRAMセルである。SRAM、SRAMセル、SRAM用のメモリモジュール111は、SRAMの技術分野において使用される技術を採用することができる。よって、詳細な説明は、ここでは省略する。なお、複数のメモリセルアレイ115及び複数のメモリセルは、SRAM以外のメモリセルアレイ及びメモリセルであってよい。 The memory cell array 115 includes a plurality of memory cells (not shown). Each of the plurality of memory cell arrays 115 is, for example, an SRAM (Static Random Access Memory), and each of the plurality of memory cells is an SRAM cell. The SRAM, SRAM cells, and SRAM memory module 111 can employ technology used in the SRAM technical field. Therefore, a detailed description will be omitted here. Note that the plurality of memory cell arrays 115 and the plurality of memory cells may be memory cell arrays and memory cells other than SRAM.
<第2実施形態>
第2実施形態に係る枠体200の製造方法を、図8~図12を参照して説明する。図8は枠体200の製造方法の一例を示すフローチャートである。図9~図12は枠体200の製造方法の一例を説明するための斜視図である。図1~図7と同一又は類似する構成は必要に応じて説明され、図1~図7と同一又は類似する構成の説明は省略される場合がある。
Second Embodiment
A method for manufacturing the frame body 200 according to the second embodiment will be described with reference to Figures 8 to 12. Figure 8 is a flowchart showing an example of a method for manufacturing the frame body 200. Figures 9 to 12 are perspective views for explaining an example of a method for manufacturing the frame body 200. Configurations that are the same as or similar to those in Figures 1 to 7 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 7 may be omitted.
図8に示されるように、枠体200の製造方法はステップ11(S11)~ステップ19(S19)を含む。 As shown in Figure 8, the manufacturing method for the frame body 200 includes steps 11 (S11) to 19 (S19).
枠体200の製造方法が開始されると、第1基板300に枠型400が仮固定される(図8に示されるS11)。具体的には、図9に示されるように、第1基板300が準備され、枠型400が第1基板300の第1面304の上に仮固定される。枠型400は、枠体200を形成するための型である。枠型400は、枠体200を形成ののちに第1基板300に取付け及び取外し可能な構成であればよい。例えば、枠型400は、樹脂で形成されてよく、金属で形成されてもよい。 When the manufacturing method for the frame body 200 begins, a frame mold 400 is temporarily fixed to the first substrate 300 (S11 shown in Figure 8). Specifically, as shown in Figure 9, the first substrate 300 is prepared, and the frame mold 400 is temporarily fixed onto the first surface 304 of the first substrate 300. The frame mold 400 is a mold for forming the frame body 200. The frame mold 400 may be configured to be attachable to and detachable from the first substrate 300 after the frame body 200 has been formed. For example, the frame mold 400 may be formed from resin or metal.
図8に示されるステップ13(S13)は、枠型400に、キューブチップ100を仮固定するステップである。具体的には、図10に示されるように、キューブチップ100は、枠型400内側に位置合わせされて、第1面304の上に取付け及び取外し可能に固定される。このとき、キューブチップ100の第1面146が、第1面304と対向するように、第1面304の上に取付け及び取外し可能に固定される。また、第1面304の上に取付け及び取外し可能な構成は、キューブチップ100と第1基板300とを取付け及び取外し可能な接着膜、接着層などであってよい。例えば、キューブチップ100は、低粘着性の部材を用いて、第1面304と対向するように、第1面304の上に取付け及び取外し可能に固定される。 Step 13 (S13) shown in FIG. 8 is a step of temporarily fixing the cube chip 100 to the frame mold 400. Specifically, as shown in FIG. 10, the cube chip 100 is aligned inside the frame mold 400 and removably fixed on the first surface 304. At this time, the first surface 146 of the cube chip 100 is removably fixed on the first surface 304 so as to face the first surface 304. The structure that allows for attachment and detachment on the first surface 304 may be an adhesive film, adhesive layer, or the like that can attach and detach the cube chip 100 and the first substrate 300. For example, the cube chip 100 is removably fixed on the first surface 304 so as to face the first surface 304 using a low-adhesion member.
図8に示されるステップ15(S15)は、枠体200を形成するための樹脂を塗布するステップである。具体的には、図11に示されるように、キューブチップ100と枠型400との間に、枠体200を形成するための樹脂が塗布される。例えば、当該樹脂は、ディスペンス装置を用いて塗布される。例えば、樹脂はUV(Ultra Violet)硬化樹脂である。なお、樹脂はUV硬化樹脂に限定されるものではなく、枠体200として第1基板300の上に設けられ、キューブチップ100を固定可能な樹脂であればよい。 Step 15 (S15) shown in Figure 8 is a step of applying resin to form the frame body 200. Specifically, as shown in Figure 11, resin to form the frame body 200 is applied between the cube chip 100 and the frame mold 400. For example, the resin is applied using a dispensing device. For example, the resin is a UV (Ultra Violet) curable resin. Note that the resin is not limited to UV curable resin, and any resin that can be provided on the first substrate 300 as the frame body 200 and can fix the cube chip 100 can be used.
図8に示されるステップ17(S17)は、S15で塗布された枠体200を形成するための樹脂を硬化するステップである。例えば、枠体200を形成するための樹脂が、UV硬化樹脂の場合には、当該樹脂は、UVを用いて硬化される。 Step 17 (S17) shown in Figure 8 is a step of hardening the resin applied in S15 to form the frame body 200. For example, if the resin used to form the frame body 200 is a UV-curable resin, the resin is hardened using UV.
図8に示されるステップ19(S19)は、キューブチップ100及び枠型400を、第1基板300から除去するステップである。具体的には、図12に示されるように、キューブチップ100及び枠型400が、第1基板300から取外されて、枠体200が第1基板300の上に形成される。枠体200は、第1枠体200L、第2枠体200U、第3枠体200R及び第4枠体200Dを四角形状又はロの字状に組み合わせて構成される。 Step 19 (S19) shown in FIG. 8 is a step of removing the cube chip 100 and frame mold 400 from the first substrate 300. Specifically, as shown in FIG. 12, the cube chip 100 and frame mold 400 are removed from the first substrate 300, and the frame body 200 is formed on the first substrate 300. The frame body 200 is configured by combining a first frame body 200L, a second frame body 200U, a third frame body 200R, and a fourth frame body 200D in a rectangular or square shape.
以上説明したとおり、枠体200が形成される。 As described above, the frame body 200 is formed.
<第3実施形態>
第3実施形態に係る枠体の構成を、図13及び図14を参照して説明する。図13は枠体202の構成を示す斜視図である。図14は枠体204の構成を示す斜視図である。図1~図12と同一又は類似する構成は必要に応じて説明され、図1~図12と同一又は類似する構成の説明は省略される場合がある。
Third Embodiment
The configuration of the frame body according to the third embodiment will be described with reference to Figures 13 and 14. Figure 13 is a perspective view showing the configuration of frame body 202. Figure 14 is a perspective view showing the configuration of frame body 204. Configurations that are the same as or similar to those in Figures 1 to 12 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 12 may be omitted.
図13に示されるように、枠体202は、第1L字状枠体202LD、第2L字状枠体202LU、第3L字状枠体202RU及び第4L字状枠体202RDを含む。第1L字状枠体202LD、第2L字状枠体202LU、第3L字状枠体202RU及び第4L字状枠体202RDは、互いに離隔して第1基板300の上に設けられ、互いに離隔して四角形の四つの隅に設けられる。例えば、第1L字状枠体202LDと第3L字状枠体202RUとは、四角形の一方の対角の二つの隅に設けられ、第2L字状枠体202LUと第4L字状枠体202RDとは、第1L字状枠体202LDと第3L字状枠体202RUとが設けられる同一の四角形のもう一方の対角の二つの隅に設けられる。 As shown in Figure 13, the frame body 202 includes a first L-shaped frame body 202LD, a second L-shaped frame body 202LU, a third L-shaped frame body 202RU, and a fourth L-shaped frame body 202RD. The first L-shaped frame body 202LD, the second L-shaped frame body 202LU, the third L-shaped frame body 202RU, and the fourth L-shaped frame body 202RD are spaced apart from each other and arranged on the first substrate 300 at the four corners of a rectangle. For example, the first L-shaped frame body 202LD and the third L-shaped frame body 202RU are provided at two diagonal corners on one side of a rectangle, and the second L-shaped frame body 202LU and the fourth L-shaped frame body 202RD are provided at two diagonal corners on the other side of the same rectangle where the first L-shaped frame body 202LD and the third L-shaped frame body 202RU are provided.
図13に示される枠体202は、図12に示される枠体200の四角形の各辺の一部を含まない。よって、枠体202を形成する部材の量は、枠体200を形成する部材の量より少ない。例えば、枠体202は製造費用を低減可能な枠体である。また、少ない部材の量で形成された枠体202は、第1L字状枠体202LD、第2L字状枠体202LU、第3L字状枠体202RU及び第4L字状枠体202RDにより、キューブチップ100の四隅周辺を嵌合すると共に、第1基板300上に固定することができる。よって、枠体202は、枠体200と同様に、第2方向D2及び第1方向D1に対するキューブチップ100の位置ずれを補償することができる。 13 does not include part of each side of the rectangular frame body 200 shown in FIG. 12. Therefore, the amount of material forming the frame body 202 is less than the amount of material forming the frame body 200. For example, the frame body 202 is a frame body that can reduce manufacturing costs. Furthermore, the frame body 202, which is formed with a small amount of material, can fit around the four corners of the cube chip 100 and fix it to the first substrate 300 using the first L-shaped frame body 202LD, second L-shaped frame body 202LU, third L-shaped frame body 202RU, and fourth L-shaped frame body 202RD. Therefore, the frame body 202, like the frame body 200, can compensate for positional deviation of the cube chip 100 in the second direction D2 and the first direction D1.
図14に示されるように、枠体204は、第1L字状枠体204LD及び第2L字状枠体204RUを含む。第1L字状枠体204LD及び第2L字状枠体204RUは、互いに離隔して第1基板300の上に設けられ、互いに離隔して四角形の二つの隅に設けられる。 As shown in FIG. 14, the frame 204 includes a first L-shaped frame 204LD and a second L-shaped frame 204RU. The first L-shaped frame 204LD and the second L-shaped frame 204RU are spaced apart from each other and are provided on the first substrate 300 at two corners of a rectangle.
図14に示される枠体204は、図13に示される枠体202の四角形の四隅の一方の対角に位置するL字状部材を含まない。よって、枠体204を形成する部材の量は、枠体202を形成する部材の量より少ない。例えば、枠体204は、製造費用を、さらに低減可能な枠体である。また、少ない部材の量で形成された枠体204は、第1L字状枠体204LD及び第2L字状枠体204RUにより、キューブチップ100の対角の二つの隅周辺を嵌合すると共に、第1基板300上に固定することができる。よって、枠体204は、枠体200及び枠体202と同様に、第2方向D2及び第1方向D1に対するキューブチップ100の位置ずれを補償することができる。 14 does not include an L-shaped member located at one of the diagonal corners of the rectangular frame 202 shown in FIG. 13. Therefore, the amount of material forming the frame 204 is less than the amount of material forming the frame 202. For example, the frame 204 is a frame that can further reduce manufacturing costs. Furthermore, the frame 204 formed with a small amount of material can fit around the two diagonal corners of the cube chip 100 using the first L-shaped frame 204LD and the second L-shaped frame 204RU, and can be fixed to the first substrate 300. Therefore, like the frame 200 and the frame 202, the frame 204 can compensate for positional deviations of the cube chip 100 in the second direction D2 and the first direction D1.
<第4実施形態>
第4実施形態に係る半導体モジュール10Aの構成を、図15及び図16を参照して説明する。図15は、半導体モジュール10Aの構成の端部断面構造の一部を拡大した端面図である。図16は、半導体モジュール10Aの変形のあとの端部断面構造の一部を拡大した端面図である。図1~図14と同一又は類似する構成は必要に応じて説明され、図1~図14と同一又は類似する構成の説明は省略される場合がある。
Fourth Embodiment
The configuration of a semiconductor module 10A according to the fourth embodiment will be described with reference to FIGS. 15 and 16. FIG. 15 is an end view showing an enlarged portion of the cross-sectional structure of the end portion of the configuration of the semiconductor module 10A. FIG. 16 is an end view showing an enlarged portion of the cross-sectional structure of the end portion of the semiconductor module 10A after deformation. Configurations that are the same as or similar to those in FIGS. 1 to 14 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 14 may be omitted.
半導体モジュール10Aは、以下の(1)に示される構成が、半導体モジュール10と異なる。
(1)半導体モジュール10Aは、複数のキューブチップ(例えば、キューブチップ100A及び100B)、複数のキューブチップが取付け及び取外し可能な複数の枠体(例えば、枠体200A及び200B)、複数のキューブチップのそれぞれに対応する複数のインダクタ372、電源供給部700、熱伝導シート800及び金属膜900を含む。
The semiconductor module 10A differs from the semiconductor module 10 in the following configuration (1).
(1) The semiconductor module 10A includes a plurality of cube chips (e.g., cube chips 100A and 100B), a plurality of frames (e.g., frames 200A and 200B) to which the plurality of cube chips can be attached and detached, a plurality of inductors 372 corresponding to each of the plurality of cube chips, a power supply unit 700, a heat conduction sheet 800, and a metal film 900.
半導体モジュール10Aにおける(1)に示される構成以外の構成は、半導体モジュール10と同様の構成である。よって、ここでは、半導体モジュール10と異なる点が主に説明される。 The configuration of semiconductor module 10A other than that shown in (1) is the same as that of semiconductor module 10. Therefore, differences from semiconductor module 10 will be mainly described here.
例えば、キューブチップ100A及び100Bのそれぞれの構成はキューブチップ100の構成と同様であり、枠体200A及び200Bのそれぞれの構成は枠体200の構成と同様であり、複数のキューブチップのそれぞれに対応する複数のインダクタ372のそれぞれの構成は、半導体モジュール10のインダクタ372の構成と同様である。また、第2基板300Aの構成は、半導体モジュール10Aにおける(1)に示される構成以外の構成は第1基板300と同様である。同一の構成要素の符号は省略され、半導体モジュール10と同様の構成は必要に応じて説明される。また、絶縁膜40及び210は省略されている。 For example, the configuration of each of the cube chips 100A and 100B is the same as the configuration of the cube chip 100, the configuration of each of the frame bodies 200A and 200B is the same as the configuration of the frame body 200, and the configuration of each of the multiple inductors 372 corresponding to each of the multiple cube chips is the same as the configuration of the inductors 372 in the semiconductor module 10. Furthermore, the configuration of the second substrate 300A is the same as that of the first substrate 300, except for the configuration indicated by (1) in the semiconductor module 10A. Reference numerals for identical components have been omitted, and configurations similar to those in the semiconductor module 10 will be explained as necessary. Furthermore, the insulating films 40 and 210 have been omitted.
キューブチップ100Aは、枠体200Aに取付け及び取外し可能に嵌合され、第2基板300A(第1面304A)の上に設けられる。キューブチップ100Bは、枠体200Bに取付け及び取外し可能に嵌合され、第2基板300A(第1面304A)の上に設けられる。 Cube chip 100A is removably fitted to frame 200A and is provided on second substrate 300A (first surface 304A). Cube chip 100B is removably fitted to frame 200B and is provided on second substrate 300A (first surface 304A).
電源供給部700は複数のポゴピン702を含む支持部701を含む。支持部701は複数のポゴピン702を支持する機能を有する。例えば、複数のポゴピン702のそれぞれは、端子部、端子部に接続された筒状部材、筒状部材に挿通された弾性部材などから構成されるコネクタである。電源供給部700は、ポゴピン圧着機構と呼ばれる場合もある。 The power supply unit 700 includes a support unit 701 that includes a plurality of pogo pins 702. The support unit 701 has the function of supporting the plurality of pogo pins 702. For example, each of the plurality of pogo pins 702 is a connector composed of a terminal portion, a tubular member connected to the terminal portion, an elastic member inserted into the tubular member, and the like. The power supply unit 700 is sometimes called a pogo pin crimping mechanism.
例えば、複数のポゴピン702のそれぞれは、金属膜などに圧着されて金属膜に当接する。このとき、複数のポゴピン702のそれぞれは、弾性部材の伸縮により、金属膜に当接する。 For example, each of the multiple pogo pins 702 is pressed against a metal film or the like and comes into contact with the metal film. At this time, each of the multiple pogo pins 702 comes into contact with the metal film due to the expansion and contraction of the elastic member.
電源供給部700が、キューブチップ100Aの第4面147と100Bの第3面145との間、キューブチップ100Aの第3面145及びキューブチップ100Bの第4面147に設けられる。電源供給部700は、キューブチップ100A及び100Bの側面電源配線162に複数のポゴピン702のそれぞれを圧着して、キューブチップ100A及び100Bの側面電源配線162を電気的に接続する。その結果、電源供給部700は、半導体モジュール10Aの外部の外部装置(外部回路)から複数のポゴピン702を経由してキューブチップ100A及び100Bに電源電圧VDDを供給することができる。 A power supply unit 700 is provided between the fourth surface 147 of cube chip 100A and the third surface 145 of cube chip 100B, and on the third surface 145 of cube chip 100A and the fourth surface 147 of cube chip 100B. The power supply unit 700 electrically connects the side power supply wiring 162 of cube chips 100A and 100B by crimping a plurality of pogo pins 702 to each of the side power supply wiring 162 of cube chips 100A and 100B. As a result, the power supply unit 700 can supply a power supply voltage VDD to the cube chips 100A and 100B from an external device (external circuit) outside the semiconductor module 10A via the plurality of pogo pins 702.
金属膜900がキューブチップ100A及び100Bのそれぞれの第2面148に接するように設けられる。その結果、金属膜900がキューブチップ100A及び100Bのそれぞれの側面接地配線163と電気的に接続される。熱伝導シート800が、キューブチップ100A及び100Bに電気的に接続された金属膜900に電気的に接続される。その結果、熱伝導シート800は、半導体モジュール10Aの外部の外部装置から金属膜900を経由してキューブチップ100A及び100Bに接地電圧を供給することができる。 The metal film 900 is provided so as to contact the second surfaces 148 of the cube chips 100A and 100B. As a result, the metal film 900 is electrically connected to the side surface ground wiring 163 of each of the cube chips 100A and 100B. The thermally conductive sheet 800 is electrically connected to the metal film 900, which is electrically connected to the cube chips 100A and 100B. As a result, the thermally conductive sheet 800 can supply a ground voltage to the cube chips 100A and 100B from an external device outside the semiconductor module 10A via the metal film 900.
熱伝導シート800及び金属膜900は、キューブチップ100A及び100Bに電圧を供給する機能と、半導体モジュール10Aが発生する熱を半導体モジュール10の外部に放出する機能とを兼ね備えている。熱伝導シート800及び金属膜900は、ヒートシンクが配置されてもよい。 The thermally conductive sheet 800 and metal film 900 have the functions of supplying voltage to the cube chips 100A and 100B, and dissipating heat generated by the semiconductor module 10A to the outside of the semiconductor module 10. A heat sink may be disposed on the thermally conductive sheet 800 and metal film 900.
例えば、第2基板300A、キューブチップ100A又はキューブチップ100Bが動作することにより、第2基板300A、キューブチップ100A又はキューブチップ100Bが発熱すると、各基板又はチップが沿ってしまい、各回路が誤動作する可能性がある。 For example, if the second substrate 300A, cube chip 100A, or cube chip 100B generates heat due to operation of the second substrate 300A, cube chip 100A, or cube chip 100B, the substrate or chip may become warped, potentially causing the circuits to malfunction.
一方、図16に示されるように、圧着などの熱又は各基板やチップの発熱により、半導体モジュール10Aの第2基板300Aが、第3方向D3に沿って長さBE反った場合を仮定する。キューブチップ100A又はキューブチップ100Bは、第2基板300Aに接触し固定されていて、接着されていない。 On the other hand, as shown in Figure 16, assume that the second substrate 300A of the semiconductor module 10A warps by a length BE along the third direction D3 due to heat from crimping or heat generated by each substrate or chip. The cube chip 100A or cube chip 100B is in contact with and fixed to the second substrate 300A, but is not bonded.
第2基板300Aが反った場合においても、第2基板300Aの反りに応じて、キューブチップ100A又はキューブチップ100Bが第2基板300Aの初めに取付けられた位置から僅かにずれるだけであり、キューブチップ100A又はキューブチップ100Bが枠体200A又は枠体200Bから取外されることは無い。 Even if the second substrate 300A warps, the cube chip 100A or cube chip 100B will only be slightly displaced from the position where it was originally attached to the second substrate 300A in accordance with the warping of the second substrate 300A, and the cube chip 100A or cube chip 100B will not be detached from the frame 200A or frame 200B.
また、複数のポゴピン702のそれぞれは、弾性部材の伸縮により、キューブチップ100A又はキューブチップ100Bに電気的に接続した状態を維持する。すなわち、キューブチップ100A又はキューブチップ100Bへの電源供給は維持される。 Furthermore, each of the multiple pogo pins 702 maintains an electrical connection to the cube chip 100A or cube chip 100B due to the expansion and contraction of the elastic member. In other words, the power supply to the cube chip 100A or cube chip 100B is maintained.
また、複数のインダクタ172と複数のインダクタ372との位置ずれは僅かであり、複数のインダクタ172と複数のインダクタ372とのインダクタ通信も可能である。 Furthermore, there is only a slight misalignment between the multiple inductors 172 and the multiple inductors 372, and inductor communication between the multiple inductors 172 and the multiple inductors 372 is also possible.
よって、半導体モジュール10Aは、熱又は発熱を半導体モジュール10Aの外部に放出することができ、熱又は発熱による誤動作を抑制可能であり、半導体モジュール10Aの構造の変形の影響を抑制可能である。その結果、半導体モジュール10Aは、長期的な信頼性に優れている。 As a result, the semiconductor module 10A can dissipate heat or generated heat to the outside of the semiconductor module 10A, preventing malfunctions caused by heat or generated heat, and reducing the effects of deformation of the semiconductor module 10A's structure. As a result, the semiconductor module 10A has excellent long-term reliability.
<第5実施形態>
第5実施形態に係るキューブチップ100に含まれる電極の形成方法を、図17~図21を参照して説明する。図17はキューブチップ100に含まれる電極の形成方法の一例を示すフローチャートである。図18~図21は電極の形成方法の一例を説明するための斜視図である。図1~図16と同一又は類似する構成は必要に応じて説明され、図1~図16と同一又は類似する構成の説明は省略される場合がある。
Fifth Embodiment
A method for forming electrodes included in a cube chip 100 according to the fifth embodiment will be described with reference to FIGS. 17 to 21. FIG. 17 is a flowchart showing an example of a method for forming electrodes included in a cube chip 100. FIGS. 18 to 21 are perspective views for explaining an example of a method for forming electrodes. Configurations that are the same as or similar to those in FIGS. 1 to 16 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 16 may be omitted.
図17に示されるように、キューブチップ100に含まれる電極の形成方法はステップ21(S21)~ステップ25(S25)を含む。 As shown in Figure 17, the method for forming the electrodes included in the cube chip 100 includes steps 21 (S21) to 25 (S25).
キューブチップ100に含まれる電極の形成方法が開始されると、複数のICチップ110が積層される(図17に示されるS21)。例えば、図18に示されるように、8個(8層、8枚)のICチップ110が積層され、積層メモリチップ30が形成される。 When the method for forming the electrodes included in the cube chip 100 begins, multiple IC chips 110 are stacked (S21 shown in Figure 17). For example, as shown in Figure 18, eight IC chips 110 (eight layers, eight sheets) are stacked to form a stacked memory chip 30.
ここでの詳細な説明は省略されるが、「1-1-1.キューブチップ100の構成」で説明したとおり、積層メモリチップ30は、第1面46、第2面48、第3面45、第4面47、第5面42及び第6面44を含み、「1-4.ICチップ110の概要」で説明したとおり、複数のICチップ110のそれぞれはトランジスタ層130及び配線層150を含む。また、ここでの詳細な説明は省略されるが、「1-1-1.キューブチップ100の構成」で説明したとおり、複数の接地配線165が、図19に示されるように、複数のICチップ110の第2面48に露出している。 Although detailed explanation will be omitted here, as explained in "1-1-1. Structure of the cube chip 100," the stacked memory chip 30 includes a first surface 46, a second surface 48, a third surface 45, a fourth surface 47, a fifth surface 42, and a sixth surface 44, and as explained in "1-4. Overview of the IC chip 110," each of the multiple IC chips 110 includes a transistor layer 130 and a wiring layer 150. Although detailed explanation will be omitted here, as explained in "1-1-1. Structure of the cube chip 100," multiple ground wirings 165 are exposed on the second surfaces 48 of the multiple IC chips 110, as shown in FIG. 19.
例えば、ICチップ110同士の積層(接合)は、溶着(フュージョンボンディング(Fusion Bonding)、シリコン直接接合(Silicon Direct Bonding(SDB))などの技術を用いることができる。溶着、シリコン直接接合は、当該技術分野において使用される技術であり、詳細な説明はここでは省略する。例えば、ICチップ110同士が、互いの配線層150が対向するように接合することを、F2F接合(Face to Face Fusion)と呼ぶ。例えば、ICチップ110同士が、互いのトランジスタ層130に含まれる半導体基板173を対向するように接合することを、B2B接合(Back to Back Fusion)と呼ぶ。例えば、ICチップ110同士が、配線層150とトランジスタ層130に含まれる半導体基板173とを対向するように接合することを、F2B接合(Face to Back Fusion)と呼ぶ。 For example, stacking (bonding) of IC chips 110 together can be achieved using techniques such as fusion bonding and silicon direct bonding (SDB). Fusion bonding and silicon direct bonding are techniques used in the relevant technical field, and detailed explanations will be omitted here. For example, bonding IC chips 110 together so that their wiring layers 150 face each other is called F2F bonding ( For example, joining two IC chips 110 together so that the semiconductor substrates 173 included in each transistor layer 130 face each other is called B2B joining (Back to Back Fusion). For example, joining two IC chips 110 together so that the wiring layer 150 faces the semiconductor substrate 173 included in the transistor layer 130 is called F2B joining (Face to Back Fusion).
ICチップ110の積層数、接合及び実装構造は、キューブチップ100の仕様、用途などに応じて、適宜変更可能である。 The number of IC chips 110 stacked, their bonding, and their mounting structure can be changed as appropriate depending on the specifications and applications of the cube chip 100.
図17に示されるステップ23(S23)は、積層メモリチップ30の側面に樹脂を塗布するステップである。例えば、図20に示されるように、樹脂は絶縁膜56である。例えば、絶縁膜56は、構造体50と同様の封止材料である。また、積層メモリチップ30の側面は、第2面48の一部を除く第2面48、第3面45、第4面47、第5面42及び第6面44である。積層メモリチップ30の第2面48の一部及び第1面46には絶縁膜56は塗布されない。 Step 23 (S23) shown in FIG. 17 is a step of applying resin to the side surfaces of the stacked memory chips 30. For example, as shown in FIG. 20, the resin is an insulating film 56. For example, the insulating film 56 is a sealing material similar to that of the structure 50. The side surfaces of the stacked memory chips 30 are the second surface 48, the third surface 45, the fourth surface 47, the fifth surface 42, and the sixth surface 44, excluding a portion of the second surface 48. The insulating film 56 is not applied to the first surface 46 and a portion of the second surface 48 of the stacked memory chips 30.
例えば、絶縁膜56は、ディスペンサなどの塗布装置を用いて形成される。 For example, the insulating film 56 is formed using a coating device such as a dispenser.
S23により形成された面は、キューブチップ100の面である。図18又は図20を参照すると、キューブチップ100の第1面446、第2面448、第3面445、第4面447、第5面442及び第444は、積層メモリチップ30の第1面46、第2面48、第3面45、第4面47、第5面42及び第6面44に平行である。例えば、第1面446は第1面46に平行であり、第2面448は第2面48に平行である。第3面445~第6面444及び第3面45~第6面44も、第1面446と第1面46、第2面448と第2面48と同様に、それぞれに対応する面に平行である。なお、絶縁膜56が第1面46に塗布されないため、第1面446は第1面46である。 The surfaces formed by S23 are the surfaces of the cube chip 100. Referring to FIG. 18 or 20, the first surface 446, second surface 448, third surface 445, fourth surface 447, fifth surface 442, and 444 of the cube chip 100 are parallel to the first surface 46, second surface 48, third surface 45, fourth surface 47, fifth surface 42, and sixth surface 44 of the stacked memory chip 30. For example, the first surface 446 is parallel to the first surface 46, and the second surface 448 is parallel to the second surface 48. The third surfaces 445 to 444 and the third surfaces 45 to 44 are also parallel to their corresponding surfaces, as are the first surface 446 and the first surface 46, and the second surface 448 and the second surface 48. Note that the first surface 446 is the first surface 46 because the insulating film 56 is not applied to the first surface 46.
図17に示されるステップ25(S25)は、上面に電極を形成するステップである。図21に示されるように、上面はキューブチップ100の第2面448であり、電極は複数の側面接地配線465である。複数の側面接地配線465はキューブチップ100の第2面448に形成される。複数の側面接地配線465は積層メモリチップ30の第2面48に露出した複数の接地配線165に電気的に接続される。複数の側面接地配線465の一部は、第2面448に形成された絶縁膜56の一部に接すると共に重畳してよい。 Step 25 (S25) shown in FIG. 17 is a step of forming an electrode on the upper surface. As shown in FIG. 21, the upper surface is the second surface 448 of the cube chip 100, and the electrode is a plurality of side surface ground wirings 465. The plurality of side surface ground wirings 465 are formed on the second surface 448 of the cube chip 100. The plurality of side surface ground wirings 465 are electrically connected to the plurality of ground wirings 165 exposed on the second surface 48 of the stacked memory chip 30. Some of the plurality of side surface ground wirings 465 may contact and overlap part of the insulating film 56 formed on the second surface 448.
例えば、複数の側面接地配線465は、電界めっき(めっき法)を用いて形成される。複数の側面接地配線465は、金属を材料とする導電体を含む。例えば、金属を材料とする導電体は、銅、銀、ニッケルなどを含む導電体を含んでよく、金、錫、ニッケルなどを含む導電体を含んでもよい。複数の側面接地配線465は、電界めっき(めっき法)により、厚い金属膜を含む。 For example, the multiple side ground wirings 465 are formed using electrolytic plating (plating method). The multiple side ground wirings 465 include conductors made of metal. For example, the conductors made of metal may include conductors containing copper, silver, nickel, etc., or conductors containing gold, tin, nickel, etc. The multiple side ground wirings 465 include a thick metal film formed by electrolytic plating (plating method).
以上説明したとおり、キューブチップ100に含まれる電極(側面接地配線465)が形成される。 As described above, the electrodes (side surface ground wiring 465) included in the cube chip 100 are formed.
積層メモリチップ30の角は、積層メモリチップ30の搬送などによる物理的な衝撃により、容易にチッピングする。例えば、積層メモリチップ30の角は、第2面48と第5面42と第3面45とが交差する部分であり、第2面48と第3面45と第6面44とが交差する部分である。 The corners of the stacked memory chips 30 are easily chipped due to physical impacts caused by transporting the stacked memory chips 30. For example, the corners of the stacked memory chips 30 are the intersections of the second surface 48, the fifth surface 42, and the third surface 45, and the intersections of the second surface 48, the third surface 45, and the sixth surface 44.
絶縁膜56は、構造体50及び50Aと同様に、積層メモリチップ30及び積層メモリチップ30を含むキューブチップ100を物理的な衝撃から保護する機能を有すると共に、積層メモリチップ30及び積層メモリチップ30を含むキューブチップ100内への水分の吸湿及び不純物などの侵入を抑制する機能を有する。 Like structures 50 and 50A, insulating film 56 functions to protect stacked memory chips 30 and cube chips 100 including stacked memory chips 30 from physical impact, and also functions to prevent moisture absorption and intrusion of impurities into stacked memory chips 30 and cube chips 100 including stacked memory chips 30.
また、電極(側面接地配線465)は厚い金属膜であり、積層メモリチップ30及び積層メモリチップ30を物理的な衝撃から保護する機能を有する。また、側面接地配線465は厚い金属膜であり、側面接地配線465の抵抗値を十分に低下可能であると共に、接地電圧の電圧降下を十分に抑制可能である。その結果、キューブチップ100は長期的な信頼性に優れたチップであり、半導体モジュール10は長期的な信頼性に優れたモジュールである。 Furthermore, the electrode (side surface ground wiring 465) is a thick metal film that functions to protect the stacked memory chips 30 and the stacked memory chips 30 from physical impact. Furthermore, the side surface ground wiring 465 is a thick metal film that can sufficiently reduce the resistance value of the side surface ground wiring 465 and can sufficiently suppress voltage drops in the ground voltage. As a result, the cube chip 100 is a chip with excellent long-term reliability, and the semiconductor module 10 is a module with excellent long-term reliability.
<第6実施形態>
第6実施形態に係るキューブチップ100に含まれる電極の形成方法を、図18、図22~図25を参照して説明する。図22はキューブチップ100に含まれる電極の形成方法の一例を示すフローチャートである。図23~図25は電極の形成方法の一例を説明するための斜視図である。図1~図21と同一又は類似する構成は必要に応じて説明され、図1~図21と同一又は類似する構成の説明は省略される場合がある。
Sixth Embodiment
A method for forming electrodes included in a cube chip 100 according to the sixth embodiment will be described with reference to Fig. 18 and Figs. 22 to 25. Fig. 22 is a flowchart showing an example of a method for forming electrodes included in a cube chip 100. Figs. 23 to 25 are perspective views for explaining an example of a method for forming electrodes. Configurations that are the same as or similar to those in Figs. 1 to 21 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 21 may be omitted.
図22に示されるように、キューブチップ100に含まれる電極の形成方法はステップ31(S31)~ステップ35(S35)を含む。 As shown in Figure 22, the method for forming the electrodes included in the cube chip 100 includes steps 31 (S31) to 35 (S35).
キューブチップ100に含まれる電極の形成方法が開始されると、複数のICチップ110が積層される(図22に示されるS31)。例えば、図18に示されるように、8個(8層、8枚)のICチップ110が積層され、積層メモリチップ30が形成される。 When the method for forming the electrodes included in the cube chip 100 begins, multiple IC chips 110 are stacked (S31 shown in Figure 22). For example, as shown in Figure 18, eight IC chips 110 (eight layers, eight sheets) are stacked to form a stacked memory chip 30.
積層メモリチップ30は、「第5実施形態」で説明した構成と同様の構成を含む。よって、「第5実施形態」で説明した構成と同様の構成は、必要に応じて説明される。第6実施形態に係る積層メモリチップ30は、「第5実施形態」で説明した構成と同様の構成に、図23で示される構成を含む。ここでの詳細な説明は省略されるが、「1-1-1.キューブチップ100の構成」で説明したとおり、複数の電源配線164が、図23に示されるように、複数のICチップ110の第3面45に露出している。また、図示は省略されるが、複数の電源配線164は第4面47にも露出している。 The stacked memory chip 30 includes the same configuration as that described in the "Fifth Embodiment." Therefore, configurations similar to those described in the "Fifth Embodiment" will be described as necessary. The stacked memory chip 30 according to the sixth embodiment includes the same configuration as that described in the "Fifth Embodiment" as well as the configuration shown in FIG. 23. Although detailed description will be omitted here, as explained in "1-1-1. Configuration of the cube chip 100," multiple power supply wiring 164 is exposed on the third surface 45 of the multiple IC chips 110, as shown in FIG. 23. Furthermore, although not shown, the multiple power supply wiring 164 is also exposed on the fourth surface 47.
図22に示されるステップ33(S33)は、上面及び側面に電極を形成するステップである。図24に示されるように、上面は積層メモリチップ30の第2面48であり、電極は側面接地配線565である。また、図24に示されるように、側面は第3面45であり、電極は複数の側面電源配線564である。 Step 33 (S33) shown in FIG. 22 is a step of forming electrodes on the top and side surfaces. As shown in FIG. 24, the top surface is the second surface 48 of the stacked memory chip 30, and the electrodes are side surface ground wiring 565. Also, as shown in FIG. 24, the side surface is the third surface 45, and the electrodes are multiple side surface power supply wiring 564.
例えば、側面接地配線565は積層メモリチップ30の第2面48にべた状に形成される。側面接地配線565は積層メモリチップ30の第2面48に露出した複数の接地配線165に電気的に接続される。複数の側面電源配線564は積層メモリチップ30の第3面45に形成される。側面電源配線564は積層メモリチップ30の第3面45に露出した複数の電源配線164に電気的に接続される。図示は省略されるが、複数の側面電源配線564は第4面47に露出した複数の電源配線164にも電気的に接続される。 For example, the side ground wiring 565 is formed in a solid state on the second surface 48 of the stacked memory chip 30. The side ground wiring 565 is electrically connected to a plurality of ground wirings 165 exposed on the second surface 48 of the stacked memory chip 30. A plurality of side power supply wirings 564 are formed on the third surface 45 of the stacked memory chip 30. The side power supply wiring 564 is electrically connected to a plurality of power supply wirings 164 exposed on the third surface 45 of the stacked memory chip 30. Although not shown in the figure, the plurality of side power supply wirings 564 are also electrically connected to a plurality of power supply wirings 164 exposed on the fourth surface 47.
例えば、側面接地配線565及び複数の側面電源配線564は、「第5実施形態」と同様に、電界めっき(めっき法)を用いて形成される。側面接地配線565及び複数の側面電源配線564は、複数の側面接地配線465と同様の材料含む導電体を含み、厚い金属膜を含む。 For example, the side surface ground wiring 565 and the multiple side surface power supply wirings 564 are formed using electrolytic plating (plating method), as in the "fifth embodiment." The side surface ground wiring 565 and the multiple side surface power supply wirings 564 include a conductor containing the same material as the multiple side surface ground wirings 465, and include a thick metal film.
図22に示されるステップ35(S35)は、底面、及び、電極が形成される面以外の面に樹脂を塗布するステップである。例えば、図25に示されるように、樹脂は絶縁膜58である。例えば、絶縁膜58は、絶縁膜56と同様の封止材料を用いて、同様の装置を用いて形成される。また、積層メモリチップ30の底面は第1面46である。積層メモリチップ30の電極が形成される面以外の面は、電極が形成される第2面48以外の第2面48、電極が形成される第3面45以外の第3面45、電極が形成される第4面47以外の第4面47、第5面42及び第6面44である。 Step 35 (S35) shown in FIG. 22 is a step of applying resin to the bottom surface and surfaces other than the surface on which electrodes are formed. For example, as shown in FIG. 25, the resin is an insulating film 58. For example, the insulating film 58 is formed using the same sealing material and apparatus as the insulating film 56. The bottom surface of the stacked memory chip 30 is the first surface 46. The surfaces of the stacked memory chip 30 other than the surface on which electrodes are formed are the second surfaces 48 other than the second surface 48 on which electrodes are formed, the third surfaces 45 other than the third surface 45 on which electrodes are formed, the fourth surfaces 47 other than the fourth surface 47 on which electrodes are formed, the fifth surface 42, and the sixth surface 44.
なお、第2面48に形成される絶縁膜58は側面接地配線565の一部に接すると共に重畳してよく、第3面45及び第4面47に形成される絶縁膜58は側面電源配線564の一部に接すると共に重畳してよい。 The insulating film 58 formed on the second surface 48 may contact and overlap a portion of the side surface ground wiring 565, and the insulating film 58 formed on the third surface 45 and fourth surface 47 may contact and overlap a portion of the side surface power supply wiring 564.
以上説明したとおり、キューブチップ100に含まれる電極(側面接地配線565及び側面電源配線564)及び樹脂(絶縁膜58)が形成される。 As described above, the electrodes (side surface ground wiring 565 and side surface power supply wiring 564) and resin (insulating film 58) included in the cube chip 100 are formed.
第6実施形態に係るキューブチップ100に含まれる電極の形成方法を用いることにより、第5実施形態に係るキューブチップ100に含まれる電極の形成方法と同様の作用効果を奏することができる。 By using the method for forming the electrodes included in the cube chip 100 according to the sixth embodiment, it is possible to achieve the same effects as the method for forming the electrodes included in the cube chip 100 according to the fifth embodiment.
・BR>ヱ謔V実施形態>
本発明の第7実施形態に係る半導体モジュール10の製造方法を、図26及び図27を参照して説明する。図26及び図27は半導体モジュール10の製造方法の一例を示すフローチャートである。図1~図25と同一又は類似する構成は必要に応じて説明され、図1~図25と同一又は類似する構成の説明は省略される場合がある。
・BR>E-V implementation form>
A method for manufacturing a semiconductor module 10 according to a seventh embodiment of the present invention will be described with reference to Figures 26 and 27. Figures 26 and 27 are flowcharts showing an example of a method for manufacturing a semiconductor module 10. Configurations that are the same as or similar to those in Figures 1 to 25 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figures 1 to 25 may be omitted.
例えば、図26に示されるように、半導体モジュール10の製造方法はステップ41(S41)~ステップ45(S45)を含む。 For example, as shown in FIG. 26, the method for manufacturing the semiconductor module 10 includes steps 41 (S41) to 45 (S45).
半導体モジュール10の製造方法が開始されると、キューブチップ100に含まれる第2傾斜部51が形成される(図26に示されるS41)。第2傾斜部51を形成したのちに、絶縁膜40が第1面146に形成されてよい。また、絶縁膜210が枠体200の第1傾斜部41及び第1基板300の第1面304に形成されてもよい。 When the manufacturing method for the semiconductor module 10 begins, the second inclined portion 51 included in the cube chip 100 is formed (S41 shown in FIG. 26). After forming the second inclined portion 51, the insulating film 40 may be formed on the first surface 146. In addition, the insulating film 210 may be formed on the first inclined portion 41 of the frame body 200 and the first surface 304 of the first substrate 300.
図26に示されるステップ43(S43)は、キューブチップ100と枠体200とを仮位置合わせするステップである。例えば、キューブチップ100の第2傾斜部51を枠体200の第1傾斜部41に合わせる。このとき、キューブチップ100を枠体200と圧着せずに、嵌合させない。例えば、キューブチップ100が枠内200で動いてしまう場合には、S41に戻って、第2傾斜部51の角度αを調整してよい。 Step 43 (S43) shown in Figure 26 is a step of temporarily aligning the cube chip 100 and the frame body 200. For example, the second inclined portion 51 of the cube chip 100 is aligned with the first inclined portion 41 of the frame body 200. At this time, the cube chip 100 is not pressed against the frame body 200 and is not fitted together. For example, if the cube chip 100 moves within the frame body 200, you can return to S41 and adjust the angle α of the second inclined portion 51.
図26に示されるステップ45(S45)は、キューブチップ100を回転させ、枠体200に取付けるステップである。例えば、S43で仮位置合わせののちに、キューブチップ100を枠体200及び第1基板300から取外す。そののち、例えば、図21に示されるキューブチップ100を、第3方向D3に沿って第2方向D2から第1方向D1に時計周りに回転させると共に、第2傾斜部51が第1傾斜部41に平行になるように、図21に示されるキューブチップ100が、図12に示される枠体200に取付けられる。すなわち、キューブチップ100の第1面146(例えば、図1及び図2を参照)及び積層メモリチップ30の第1面46(例えば、図2を参照)が、枠体200を介して、枠体200の内側の所定の位置(第1基板300の第1面304)に配置される。また、キューブチップ100が枠体200に取付けられたのち、キューブチップ100が枠体200に圧着され、キューブチップ100が枠体200に嵌合される。 26 shows step 45 (S45), which rotates the cube chip 100 and attaches it to the frame 200. For example, after the temporary alignment in S43, the cube chip 100 is removed from the frame 200 and the first substrate 300. Then, for example, the cube chip 100 shown in FIG. 21 is rotated clockwise along the third direction D3 from the second direction D2 to the first direction D1, and the cube chip 100 shown in FIG. 21 is attached to the frame 200 shown in FIG. 12 so that the second inclined portion 51 is parallel to the first inclined portion 41. That is, the first surface 146 (see, for example, FIGS. 1 and 2) of the cube chip 100 and the first surface 46 (see, for example, FIG. 2) of the stacked memory chip 30 are positioned at predetermined positions inside the frame 200 (the first surface 304 of the first substrate 300) via the frame 200. Furthermore, after the cube chip 100 is attached to the frame 200, the cube chip 100 is pressure-bonded to the frame 200, and the cube chip 100 is fitted into the frame 200.
このとき、キューブチップ100は、第1基板300と電気的かつ機械的に接続されておらず、例えば、キューブチップ100が第1基板300の第1面304に圧着される。例えば、キューブチップ100の第1面146及び積層メモリチップ30の第1面46が第1基板300の第1面304に圧着される面に相当してよく、キューブチップ100の第1面146及び積層メモリチップ30の第1面46に設けられた絶縁膜40の一部の面が第1基板300の第1面304に圧着される面に相当してもよい。なお、例えば、「第4実施形態」で説明したとおり、キューブチップ100は、第3面145に設けられた側面電源配線162(図2を参照)を介して、半導体モジュール10の外部の外部装置(外部回路)と電気的に接続される。第3面145は、第1基板300の第1面304に圧着される面とは異なる面である。 At this time, the cube chip 100 is not electrically or mechanically connected to the first substrate 300. For example, the cube chip 100 is pressed onto the first surface 304 of the first substrate 300. For example, the first surface 146 of the cube chip 100 and the first surface 46 of the stacked memory chip 30 may correspond to the surface pressed onto the first surface 304 of the first substrate 300, or a portion of the insulating film 40 provided on the first surface 146 of the cube chip 100 and the first surface 46 of the stacked memory chip 30 may correspond to the surface pressed onto the first surface 304 of the first substrate 300. Note that, for example, as described in the "Fourth Embodiment," the cube chip 100 is electrically connected to an external device (external circuit) outside the semiconductor module 10 via the side power supply wiring 162 (see FIG. 2) provided on the third surface 145. The third surface 145 is a surface different from the surface pressed onto the first surface 304 of the first substrate 300.
例えば、数μmのパーティクルがインダクタ172又はインダクタ372に重畳している場合には、数μmのパーティクルがインダクタ通信の妨げになるため、インダクタ通信の品質が低下する。よって、例えば、キューブチップ100は、クラス100以上のクリーンルーム内で、枠体200及び第1基板300に取付けられると共に、枠体200及び第1基板300から取外される。また、キューブチップ100を枠体200及び第1基板300に取付けること、及び、キューブチップ100を枠体200及び第1基板300から取外すことは、エアーブローなどを用いて、パーティクルの個数を減らした状態で実行される。その結果、数μmのパーティクルを低減することができるため、インダクタ172とインダクタ372とのインダクタ通信の品質の低下が抑制される。 For example, if particles of several microns are superimposed on inductor 172 or inductor 372, the particles of several microns will interfere with inductor communication, reducing the quality of inductor communication. Therefore, for example, the cube chip 100 is attached to and removed from the frame body 200 and first substrate 300 in a clean room of class 100 or higher. Furthermore, the attachment of the cube chip 100 to and removal of the cube chip 100 from the frame body 200 and first substrate 300 are performed with a reduced number of particles, using an air blower or the like. As a result, particles of several microns can be reduced, preventing a reduction in the quality of inductor communication between inductor 172 and inductor 372.
以上説明したとおり、キューブチップ100が、枠体200に嵌合され、第1基板300の上に接続(接触)される。図26に示される半導体モジュール10の製造方法により、キューブチップ100を枠体200及び第1基板300に取外し可能に接続させることができる。 As explained above, the cube chip 100 is fitted into the frame body 200 and connected (contacted) to the top of the first substrate 300. The method for manufacturing the semiconductor module 10 shown in FIG. 26 makes it possible to removably connect the cube chip 100 to the frame body 200 and the first substrate 300.
また、例えば、図27示されるように、半導体モジュール10の製造方法はステップ51(S51)~ステップ55(S55)を含んでもよい。S51及びステップ53(S53)は、S41及びS43と同様であり、ここでの説明は省略される。 Furthermore, for example, as shown in FIG. 27, the method for manufacturing the semiconductor module 10 may include steps 51 (S51) to 55 (S55). Steps S51 and 53 (S53) are similar to steps S41 and S43, and therefore will not be described here.
図27に示されるステップ55(S55)は、第1基板300及び枠体200を振動させて、キューブチップ100を枠体200に取付けるステップである。例えば、S43で仮位置合わせののちに、キューブチップ100を枠体200及び第1基板300から取外す。そののち、例えば、図21に示されるキューブチップ100を、第2傾斜部51が第1傾斜部41に平行になるように、図12に示される枠体200及び第1基板300に載置する。キューブチップ100が枠体200及び第1基板300に載置されたのち、枠体200及び第1基板300を振動させて、キューブチップ100が枠体200に嵌合される。枠体200及び第1基板300を振動させて、キューブチップ100が枠体200に嵌合されたのち、キューブチップ100を枠体200に圧着して、キューブチップ100を枠体200に嵌合させてもよい。 27 shows step 55 (S55) in which the first substrate 300 and frame body 200 are vibrated to attach the cube chip 100 to the frame body 200. For example, after temporary alignment in S43, the cube chip 100 is removed from the frame body 200 and first substrate 300. Thereafter, for example, the cube chip 100 shown in FIG. 21 is placed on the frame body 200 and first substrate 300 shown in FIG. 12 so that the second inclined portion 51 is parallel to the first inclined portion 41. After the cube chip 100 is placed on the frame body 200 and first substrate 300, the frame body 200 and first substrate 300 are vibrated to fit the cube chip 100 into the frame body 200. The frame body 200 and the first substrate 300 may be vibrated to fit the cube chip 100 into the frame body 200, and then the cube chip 100 may be pressure-bonded to the frame body 200 to fit the cube chip 100 into the frame body 200.
以上説明したとおり、キューブチップ100が、枠体200に嵌合され、第1基板300の上に接続(接触)される。図27に示される半導体モジュール10の製造方法により、キューブチップ100を枠体200及び第1基板300に取外し可能に接続させることができる。 As explained above, the cube chip 100 is fitted into the frame body 200 and connected (contacted) to the top of the first substrate 300. The method for manufacturing the semiconductor module 10 shown in Figure 27 makes it possible to removably connect the cube chip 100 to the frame body 200 and the first substrate 300.
なお、S41において、キューブチップ100を、第3方向D3に沿って第2方向D2から第1方向D1に時計周りに回転させると共に、第2傾斜部51が第1傾斜部41に平行になるように、キューブチップ100が枠体200に取付けられたのちに、S51において、枠体200及び第1基板300を振動させて、キューブチップ100を枠体200に嵌合させてもよい。また、枠体200及び第1基板300を振動させて、キューブチップ100が枠体200に嵌合されたのち、キューブチップ100を枠体200に圧着して、キューブチップ100を枠体200に嵌合させてもよい。図26及び図27に示される半導体モジュール10の製造方法を組み合わせることにより、キューブチップ100を枠体200及び第1基板300に取外し可能に接続させることができる。 In S41, the cube chip 100 may be rotated clockwise from the second direction D2 to the first direction D1 along the third direction D3, and the cube chip 100 may be attached to the frame body 200 so that the second inclined portion 51 is parallel to the first inclined portion 41. Then, in S51, the frame body 200 and the first substrate 300 may be vibrated to fit the cube chip 100 into the frame body 200. Alternatively, the frame body 200 and the first substrate 300 may be vibrated to fit the cube chip 100 into the frame body 200, and then the cube chip 100 may be pressure-bonded to the frame body 200 to fit the cube chip 100 into the frame body 200. By combining the manufacturing methods for the semiconductor module 10 shown in FIGS. 26 and 27, the cube chip 100 can be removably connected to the frame body 200 and the first substrate 300.
<第8実施形態>
第8実施形態に係る半導体モジュール10Bを、図28を参照して説明する。図28は半導体モジュール10Bの構成の一例を示す平面図である。図1~図27と同一又は類似する構成は必要に応じて説明され、図1~図27と同一又は類似する構成の説明は省略される場合がある。
Eighth Embodiment
A semiconductor module 10B according to the eighth embodiment will be described with reference to Fig. 28. Fig. 28 is a plan view showing an example of the configuration of the semiconductor module 10B. Configurations that are the same as or similar to those in Figs. 1 to 27 will be described as necessary, and descriptions of configurations that are the same as or similar to those in Figs. 1 to 27 may be omitted.
半導体モジュール10Bは、以下の(1)及び(2)に示される構成が、半導体モジュール10と異なる。
(1)3個以上のキューブチップ100(例えば、キューブチップ100C及び100D)及び3個以上の枠体200(例えば、枠体200C及び200F)を含む。
(2)3個以上のキューブチップ100(例えば、キューブチップ100C及び100D)及び3個以上の枠体200(例えば、枠体200C及び200F)が設けられた第3基板300Bを含む。
The semiconductor module 10B differs from the semiconductor module 10 in the following configurations (1) and (2).
(1) Three or more cube chips 100 (for example, cube chips 100C and 100D) and three or more frames 200 (for example, frames 200C and 200F) are included.
(2) The third substrate 300B includes three or more cube chips 100 (for example, cube chips 100C and 100D) and three or more frame bodies 200 (for example, frame bodies 200C and 200F).
半導体モジュール10Bにおける(1)及び(2)に示される構成以外の構成は、半導体モジュール10と同様の構成である。例えば、キューブチップ100C及び100Dはキューブチップ100と同様の構成を含み、枠体200C及び200Fは枠体200と同様の構成を含む。 The configuration of semiconductor module 10B other than the configurations shown in (1) and (2) is the same as that of semiconductor module 10. For example, cube chips 100C and 100D include the same configuration as cube chip 100, and frame bodies 200C and 200F include the same configuration as frame body 200.
また、キューブチップ100C及び100Dを含む複数のキューブチップ100のそれぞれは、それぞれに対応する枠体200に嵌合される。例えば、キューブチップ100Cは枠体200Cに嵌合され、キューブチップ100Dは枠体200Fに嵌合される。第3基板300Bは、キューブチップ100C及び100Dを含む複数のキューブチップのそれぞれの複数のインダクタ172に対応した複数のインダクタ372を含む。 Furthermore, each of the multiple cube chips 100, including cube chips 100C and 100D, is fitted into a corresponding frame body 200. For example, cube chip 100C is fitted into frame body 200C, and cube chip 100D is fitted into frame body 200F. The third substrate 300B includes multiple inductors 372 corresponding to the multiple inductors 172 of each of the multiple cube chips, including cube chips 100C and 100D.
以上説明したとおり、半導体モジュール10Bは、一つの基板(第3基板300B)の上に複数のキューブチップ100を含むことができる。その結果、半導体モジュール10Bは、メモリの大容量化が可能である。また、半導体モジュール10Bは、半導体モジュール10Aと同様に、電源供給部700を用いて電源電圧が供給されてよく、熱伝導シート800及び金属膜900を用いて接地電圧が供給されると共に熱が外部に放出されてもよい。よって、半導体モジュール10Bは、半導体モジュール10及び半導体モジュール10Aと同様の作用効果を有する。 As explained above, the semiconductor module 10B can include multiple cube chips 100 on a single substrate (third substrate 300B). As a result, the semiconductor module 10B can have a large memory capacity. Furthermore, like the semiconductor module 10A, the semiconductor module 10B may be supplied with a power supply voltage using the power supply unit 700, and may be supplied with a ground voltage and dissipate heat to the outside using the thermal conduction sheet 800 and metal film 900. Therefore, the semiconductor module 10B has the same effects as the semiconductor module 10 and the semiconductor module 10A.
<第9実施形態>
第9実施形態に係る半導体モジュール10Cを、図29及び図30を参照して説明する。図29は半導体モジュール10Cの構成の一例を示す平面図である。図30は、図29に示されるC1-C2線に沿った半導体モジュール10Cの端部断面構造を示す端面図である。図1~図28と同一又は類似する構成は必要に応じて説明され、図1~図28と同一又は類似する構成の説明は省略される場合がある。
Ninth Embodiment
A semiconductor module 10C according to the ninth embodiment will be described with reference to FIGS. 29 and 30. FIG. 29 is a plan view showing an example of the configuration of the semiconductor module 10C. FIG. 30 is an end view showing the cross-sectional structure of the end portion of the semiconductor module 10C taken along line C1-C2 shown in FIG. 29. Configurations that are the same as or similar to those in FIGS. 1 to 28 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 28 may be omitted.
半導体モジュール10Cは、以下の(1)~(3)に示される構成が、半導体モジュール10Bと異なる。
(1)接続部材750を含む。
(2)複数のキューブチップ100(例えば、キューブチップ100E及び100Fを含む4個のキューブチップ)が、接続部材750に束ねられ、一つの枠体200Eに嵌合される。
(3)一つの枠体200Eに嵌合された、接続部材750に束ねられた複数のキューブチップ100が、複数個(例えば、6個)設けられた第4基板300Cを含む。
The semiconductor module 10C differs from the semiconductor module 10B in the following configurations (1) to (3).
(1) Includes a connecting member 750.
(2) A plurality of cube chips 100 (for example, four cube chips including cube chips 100E and 100F) are bundled with a connecting member 750 and fitted into one frame 200E.
(3) The fourth substrate 300C includes a plurality of (for example, six) cube chips 100 bundled by the connection members 750 fitted into one frame 200E.
半導体モジュール10Cにおける(1)~(3)に示される構成以外の構成は、半導体モジュール10Bと同様の構成である。 The configuration of semiconductor module 10C other than those shown in (1) to (3) is the same as that of semiconductor module 10B.
また、第4基板300Cは、キューブチップ100E及び100Fを含む複数のキューブチップのそれぞれの複数のインダクタ172に対応した複数のインダクタ372を含む。 Furthermore, the fourth substrate 300C includes a plurality of inductors 372 corresponding to the respective inductors 172 of the plurality of cube chips including the cube chips 100E and 100F.
例えば、キューブチップ100E及び100Fは、図24に示されるキューブチップ100と同様の構成を含む。また、枠体200Eは、図12に示される枠体200の第1枠体200L及び第3枠体200Rが第2方向D2に延伸した構成を含む。 For example, cube chips 100E and 100F have a configuration similar to that of the cube chip 100 shown in FIG. 24. Furthermore, frame body 200E has a configuration in which the first frame body 200L and the third frame body 200R of the frame body 200 shown in FIG. 12 extend in the second direction D2.
図24、図29及び図30を参照すると、キューブチップ100E及び100Fのそれぞれは、第3面145に接する側面電源配線162、及び、第4面147に接する側面電源配線162を含む。 Referring to Figures 24, 29, and 30, each of the cube chips 100E and 100F includes a side power supply wiring 162 in contact with the third surface 145 and a side power supply wiring 162 in contact with the fourth surface 147.
また、キューブチップ100Eの第5面142は、キューブチップ100Fの第6面144に接する。接続部材750は、少なくとも、キューブチップ100Eの第6面144、第3面145及び第4面147、並びに、キューブチップ100Fの第3面145及び第4面147に接する。 Furthermore, the fifth surface 142 of the cube chip 100E contacts the sixth surface 144 of the cube chip 100F. The connecting member 750 contacts at least the sixth surface 144, third surface 145, and fourth surface 147 of the cube chip 100E, as well as the third surface 145 and fourth surface 147 of the cube chip 100F.
また、接続部材750は、キューブチップ100E及び100Fのそれぞれの第3面145に接する側面電源配線162、及び、キューブチップ100E及び100Fのそれぞれ第4面147に接する側面電源配線162に接し、キューブチップ100E及び100Fのそれぞれの第3面145に接する側面電源配線162、及び、キューブチップ100E及び100Fのそれぞれ第4面147に接する側面電源配線162に電源電圧を供給する。 Furthermore, the connection member 750 contacts the side power supply wiring 162 that contacts the third surface 145 of each of the cube chips 100E and 100F and the side power supply wiring 162 that contacts the fourth surface 147 of each of the cube chips 100E and 100F, and supplies power supply voltage to the side power supply wiring 162 that contacts the third surface 145 of each of the cube chips 100E and 100F and the side power supply wiring 162 that contacts the fourth surface 147 of each of the cube chips 100E and 100F.
以上説明したとおり、半導体モジュール10Cは、一つの基板(第4基板300C)の上に、複数のキューブチップ100を束ねて設けることが可能な枠体200Eを複数個含むことができる。その結果、半導体モジュール10Cは、複数のキューブチップ100を一つずつ枠体200に取付ける場合より、取付け時間を短縮することができる。 As explained above, the semiconductor module 10C can include multiple frame bodies 200E, which can bundle multiple cube chips 100, on a single substrate (fourth substrate 300C). As a result, the semiconductor module 10C can shorten the installation time compared to when multiple cube chips 100 are installed one by one on the frame body 200.
また、接続部材750は、複数のキューブチップ100を束ねる機能と、複数のキューブチップ100に電源電圧を供給する機能を兼ね備えている。よって、半導体モジュール10Cは、複数のキューブチップ100を一つずつ枠体200に取付けると共にそれぞれのキューブチップ100に個別に電源電圧を供給する場合より、製造費用を削減可能であると共に歩留まりの低下を抑制可能である。 Furthermore, the connection member 750 has the function of bundling multiple cube chips 100 together and the function of supplying power supply voltage to the multiple cube chips 100. Therefore, the semiconductor module 10C can reduce manufacturing costs and suppress a decrease in yield compared to when multiple cube chips 100 are attached one by one to the frame 200 and power supply voltage is supplied to each cube chip 100 individually.
また、半導体モジュール10Cは、複数のキューブチップ100を一つずつ枠体200に取付ける場合より、キューブチップ100と枠体200との位置ずれを抑制可能な構成を有する。よって、半導体モジュール10Cは、位置ずれによるキューブチップ100の破損を抑制可能であり、長期的な信頼性に優れた構成を有する。 Furthermore, the semiconductor module 10C has a configuration that can reduce misalignment between the cube chips 100 and the frame body 200 compared to when multiple cube chips 100 are attached to the frame body 200 one by one. Therefore, the semiconductor module 10C can reduce damage to the cube chips 100 due to misalignment, and has a configuration that is excellent in long-term reliability.
また、半導体モジュール10Cは、一つの基板(第4基板300C)の上に、複数のキューブチップ100を束ねて設けることが可能な枠体200Eを複数個含むことができる。その結果、半導体モジュール10Cは、半導体モジュール10Bと同様に、メモリの大容量化が可能であり、半導体モジュール10Bと同様の作用効果を有する。 Furthermore, the semiconductor module 10C can include multiple frame bodies 200E, which can bundle multiple cube chips 100, on a single substrate (fourth substrate 300C). As a result, like the semiconductor module 10B, the semiconductor module 10C can have a large memory capacity and has the same effects as the semiconductor module 10B.
<第10実施形態>
第10実施形態に係る半導体モジュール10Dを、図31~図38を参照して説明する。図31は半導体モジュール10Dの構成の一例を示す平面図である。図32は、図31に示されるE1-E2線に沿った半導体モジュール10Dの端部断面構造を示す端面図である。図33は半導体モジュール10Dの製造方法の一例を示すフローチャートである。図34~図38は半導体モジュール10Dの製造方法の一例を説明するための端面図である。図1~図30と同一又は類似する構成は必要に応じて説明され、図1~図30と同一又は類似する構成の説明は省略される場合がある。なお、図31~図38を参照して説明される半導体モジュール10Dの構成は、一例であって、半導体モジュール10Dの構成を限定するものではない。
Tenth Embodiment
A semiconductor module 10D according to a tenth embodiment will be described with reference to FIGS. 31 to 38. FIG. 31 is a plan view showing an example of the configuration of the semiconductor module 10D. FIG. 32 is an end view showing the end cross-sectional structure of the semiconductor module 10D taken along line E1-E2 shown in FIG. 31. FIG. 33 is a flowchart showing an example of a manufacturing method for the semiconductor module 10D. FIGS. 34 to 38 are end views for explaining an example of a manufacturing method for the semiconductor module 10D. Configurations that are the same as or similar to those in FIGS. 1 to 30 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 30 may be omitted. Note that the configuration of the semiconductor module 10D described with reference to FIGS. 31 to 38 is merely an example and does not limit the configuration of the semiconductor module 10D.
<10-1.半導体モジュール10Dの構成>
はじめに、図31及び図32を参照して、半導体モジュール10Dの構成の一例を説明する。
<10-1. Configuration of Semiconductor Module 10D>
First, an example of the configuration of a semiconductor module 10D will be described with reference to FIGS.
半導体モジュール10Dは、キューブチップ100G~100J、第1基板300G及び300H、バンプ層80、アンダーフィル(Under Fill、UF)材84A~84C、半導体チップ600、第5基板60、及び、モールド材90を含む。一例として、半導体モジュール10Dは、4つのキューブチップ100G~100J及び1つの半導体チップ600を含むが、キューブチップ100G~100J及び半導体チップ600の個数は、第10実施形態で説明される構成に限定されない。キューブチップ100G~100J及び半導体チップ600の個数は、半導体モジュール10Dの仕様、用途などにより適宜選択可能である。 Semiconductor module 10D includes cube chips 100G-100J, first substrates 300G and 300H, bump layer 80, underfill (UF) materials 84A-84C, a semiconductor chip 600, a fifth substrate 60, and a molding material 90. As an example, semiconductor module 10D includes four cube chips 100G-100J and one semiconductor chip 600, but the number of cube chips 100G-100J and semiconductor chips 600 is not limited to the configuration described in the tenth embodiment. The number of cube chips 100G-100J and semiconductor chips 600 can be selected appropriately depending on the specifications and application of semiconductor module 10D.
キューブチップ100G~100Jのそれぞれは、キューブチップ100と同様の構成を有する。よって、複数のキューブチップ100G~100Jの構成は必要に応じて説明される。複数のキューブチップ100G~100Jは、それぞれに対応する枠体200に取付けられると共に第1基板300の上に設けられる。例えば、図33に示されるように、キューブチップ100Gは枠体200Gに取付けられると共に第1基板300Gの上に設けられ、キューブチップ100Hは枠体200Hに取付けられると共に第1基板300Hの上に設けられる。なお、図示は省略されるが、複数のキューブチップ100G~100Jのそれぞれは、キューブチップ100と同様に絶縁膜40及び絶縁膜210を含んでよい。
Each of the cube chips 100G to 100J has a configuration similar to that of the cube chip 100. Therefore, the configuration of the multiple cube chips 100G to 100J will be described as necessary. The multiple cube chips 100G to 100J are attached to their corresponding frame bodies 200 and provided on a first substrate 300. For example, as shown in FIG. 33 , the cube chip 100G is attached to the frame body 200G and provided on a first substrate 300G, and the cube chip 100H is attached to the frame body 200H and provided on a first substrate 300H. Although not shown, each of the multiple cube chips 100G to 100J may include an insulating film 40 and an insulating film 210, similar to the cube chip 100.
第1基板300G及び300Hのそれぞれは、第1基板300と同様の構成を有する。よって、第1基板300G及び300Hの構成は必要に応じて説明される。第1基板300Gはバンプ層80(複数のバンプ82)を介して第5基板60に電気的に接続される。
Each of the first substrates 300G and 300H has a configuration similar to that of the first substrate 300. Therefore, the configurations of the first substrates 300G and 300H will be described as necessary. The first substrate 300G is electrically connected to the fifth substrate 60 via the bump layer 80 (plurality of bumps 82).
例えば、半導体チップ600は、CPU(Central Processing Unit)であってよく、GPU(Graphics Processing Unit)であってよく、CPU及びGPUの両方を備えていてもよい。 For example, the semiconductor chip 600 may be a CPU (Central Processing Unit), a GPU (Graphics Processing Unit), or may include both a CPU and a GPU.
半導体チップ600がCPUを含む場合には、半導体チップ600は、複数の演算回路を含み、演算処理が可能である。また、半導体チップ600がGPUを含む場合には、半導体チップ600は、複数の演算回路を含み、画像処理や映像処理が可能である。例えば、半導体チップ600は、バンプ層80、第5基板60及びを介して、外部装置に含まれるDRAM(Dynamic Random Access Memory)(図示は省略)に格納された制御プログラムを読み出し、当該制御プログラムを展開して、当該制御プログラムに基づく処理を実行すると共に、当該制御プログラムに基づく処理を実行するように各ICチップ110に命令(コマンド)を送信する機能を有する。
If the semiconductor chip 600 includes a CPU, the semiconductor chip 600 includes multiple arithmetic circuits and is capable of arithmetic processing. Furthermore, if the semiconductor chip 600 includes a GPU, the semiconductor chip 600 includes multiple arithmetic circuits and is capable of image processing and video processing. For example, the semiconductor chip 600 has the function of reading a control program stored in a dynamic random access memory (DRAM) (not shown) included in an external device via the bump layer 80 and the fifth substrate 60, unpacking the control program, and executing processing based on the control program, as well as transmitting commands to each IC chip 110 to execute processing based on the control program.
バンプ層80は複数のバンプ82を含む。例えば、複数のバンプ82は、キューブチップ100G~100J及び半導体チップ600のそれぞれの出力端子に相当する。キューブチップ100G~100J及び半導体チップ600のそれぞれは、複数のバンプ82に電気的に接続され、第5基板60と電気的に接続される。
The bump layer 80 includes a plurality of bumps 82. For example, the plurality of bumps 82 correspond to output terminals of the cube chips 100G to 100J and the semiconductor chip 600. Each of the cube chips 100G to 100J and the semiconductor chip 600 is electrically connected to the plurality of bumps 82, and is electrically connected to the fifth substrate 60.
例えば、UF材84(84A~84C)は、絶縁性の接着剤である。例えば、UF材84Aは、電気的に接続されたキューブチップ100G、第1基板300G、バンプ層80(バンプ82)及び第5基板60を、互いに固定することができる。UF材84Aと同様に、UF材84Bは、電気的に接続されたキューブチップ100H、第1基板300H、バンプ層80(バンプ82)及び第5基板60を、互いに固定することができ、UF材84Cは、電気的に接続された半導体チップ600、バンプ層80(バンプ82)及び第5基板60を、互いに固定することができる。 For example, the UF material 84 (84A-84C) is an insulating adhesive. For example, the UF material 84A can secure the electrically connected cube chip 100G, first substrate 300G, bump layer 80 (bumps 82), and fifth substrate 60 to one another. Like the UF material 84A, the UF material 84B can secure the electrically connected cube chip 100H, first substrate 300H, bump layer 80 (bumps 82), and fifth substrate 60 to one another, and the UF material 84C can secure the electrically connected semiconductor chip 600, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
第5基板60は、第1基板300と同様に、配線と絶縁層とが交互に積層された多層配線構造を含む。例えば、第5基板60は、高密度相互接続(High-density interconnect (HDI))が可能なプリント基板である。具体的には、第5基板60は、有機ラミネート基板、シリコン基板(例えば、Si-wafer)上に配線を形成したシリコンインターポーザ、シリコンインターポーザに能動素子を加えたアクティブインターポーザ、配線付きシリコンチップを有機基板に埋め込んだシリコンブリッジ内蔵基板、ガラスをコア材として配線を形成したガラスコア基板、絶縁膜中に配線を形成したRDL(Redistribution Layer)インターポーザなどが用いられる。また、図2及び図3に示された半導体モジュール10と同様に、第5基板60の多層配線構造の積層数は、図32に示された積層数(5層)に限定されない。第5基板60の多層配線構造の積層数は、半導体モジュール10と同様に、半導体モジュール10Dの用途又は仕様などに基づき、適宜変更可能である。
Like the first substrate 300, the fifth substrate 60 includes a multilayer wiring structure in which wiring and insulating layers are alternately stacked. For example, the fifth substrate 60 is a printed circuit board capable of high-density interconnect (HDI). Specifically, the fifth substrate 60 may be an organic laminate substrate, a silicon interposer in which wiring is formed on a silicon substrate (e.g., Si-wafer), an active interposer in which active elements are added to a silicon interposer, a silicon bridge-embedded substrate in which a silicon chip with wiring is embedded in an organic substrate, a glass core substrate in which wiring is formed using glass as a core material, or an RDL (Redistribution Layer) interposer in which wiring is formed in an insulating film. Furthermore, like the semiconductor module 10 shown in FIGS. 2 and 3 , the number of layers in the multilayer wiring structure of the fifth substrate 60 is not limited to the number of layers (five) shown in FIG. 32 . As with the semiconductor module 10, the number of layers in the multilayer wiring structure of the fifth substrate 60 can be changed as appropriate based on the application or specifications of the semiconductor module 10D.
一例として、第5基板60は、第1面62、第2面64、複数の配線層66、68、70、72及び74を含む。配線層66、68、70、72及び74は、第1方向D1及び第2方向D2に平行に配置されると共に、第3方向D3に、この順序で積層される。複数の配線層66及び74は、複数の電極67及び複数の電極75を含む。複数の配線層68、70及び72は、複数の配線69、複数の配線71及び複数の配線73を含む。複数の電極67は第1面62に露出し、複数の電極75は第2面64に露出している。電極67は配線69に電気的に接続され、配線69は配線71に電気的に接続され、配線71は配線73に電気的に接続され、配線73は電極75に電気的に接続される。配線と交互に積層された絶縁層の図示は図32では省略される。 As an example, the fifth substrate 60 includes a first surface 62, a second surface 64, and multiple wiring layers 66, 68, 70, 72, and 74. The wiring layers 66, 68, 70, 72, and 74 are arranged parallel to the first direction D1 and the second direction D2, and are stacked in this order in the third direction D3. The multiple wiring layers 66 and 74 include multiple electrodes 67 and multiple electrodes 75. The multiple wiring layers 68, 70, and 72 include multiple wires 69, multiple wires 71, and multiple wires 73. The multiple electrodes 67 are exposed on the first surface 62, and the multiple electrodes 75 are exposed on the second surface 64. The electrode 67 is electrically connected to the wire 69, the wire 69 is electrically connected to the wire 71, the wire 71 is electrically connected to the wire 73, and the wire 73 is electrically connected to the electrode 75. The insulating layers stacked alternately with the wires are not shown in Figure 32.
例えば、第5基板60は、キューブチップ100G~100Jのそれぞれと半導体チップ600とを互いに接続する機能を有する。一例として図32に示されるように、キューブチップ100Gは、電極67、配線69、配線71及びバンプ82を介して、半導体チップ600と接続される。なお、図32に示される例は一例であって、キューブチップ100G~100Jのそれぞれと半導体チップ600との接続は、図32に示される例に限定されない。キューブチップ100G~100Jのそれぞれと半導体チップ600とが、複数の電極67、複数の配線69、複数の配線71又は複数の配線73を介して、接続されてよく、キューブチップ100G~100Jのそれぞれが、複数の電極67、複数の配線69、複数の配線71又は複数の配線73を介して接続されてもよい。
For example, the fifth substrate 60 has a function of connecting each of the cube chips 100G to 100J to the semiconductor chip 600. As an example, as shown in FIG. 32 , the cube chip 100G is connected to the semiconductor chip 600 via electrodes 67, wirings 69, wirings 71, and bumps 82. Note that the example shown in FIG. 32 is just an example, and the connection between each of the cube chips 100G to 100J and the semiconductor chip 600 is not limited to the example shown in FIG. 32 . Each of the cube chips 100G to 100J and the semiconductor chip 600 may be connected via a plurality of electrodes 67, a plurality of wirings 69, a plurality of wirings 71, or a plurality of wirings 73, and each of the cube chips 100G to 100J may be connected via a plurality of electrodes 67, a plurality of wirings 69, a plurality of wirings 71, or a plurality of wirings 73.
また、第5基板60は、キューブチップ100G~100J及び半導体チップ600を、外部装置などと接続する機能を有する。また、第5基板60は、複数のバンプ82と各バンプ82に対応する電極75とを電極的に接続する機能を有する。隣接する二つのバンプ82間の長さ(ピッチ)は、隣接する二つの電極75間の長さ(ピッチ)より短い。第5基板60は、バンプ82のピッチを、電極75のピッチに広げる機能を有する。すなわち、第5基板60は、バンプ82のピッチを、電極75のピッチに合わせるように、再配線する機能を有する。その結果、半導体モジュール10は、マザー基板(図示は省略)に電気的に接続し易くなる。
The fifth substrate 60 also functions to connect the cube chips 100G-100J and the semiconductor chip 600 to external devices, etc. The fifth substrate 60 also functions to electrically connect the plurality of bumps 82 to the electrodes 75 corresponding to each bump 82. The length (pitch) between two adjacent bumps 82 is shorter than the length (pitch) between two adjacent electrodes 75. The fifth substrate 60 also functions to widen the pitch of the bumps 82 to the pitch of the electrodes 75. In other words, the fifth substrate 60 also functions to rewire the bumps 82 so that the pitch of the bumps 82 matches the pitch of the electrodes 75. As a result, the semiconductor module 10 can be easily electrically connected to a motherboard (not shown).
例えば、モールド材90は、絶縁性の樹脂材料である。例えば、絶縁性の樹脂材料は、エポキシなどの樹脂材料、硬化剤、充填剤(フィラー)及び添加剤などを含む。例えば、モールド材90は、UF材84Aにより固定されたキューブチップ100G、第1基板300G及びバンプ82、UF材84Bにより固定されたキューブチップ100H、第1基板300H及びバンプ82、並びに、UF材84Cにより固定された半導体チップ600及びバンプ82に接すると共に取り囲むように、第5基板60に設けられる。モールド材90は、UF材84Aにより固定されたキューブチップ100G、第1基板300G及びバンプ82、UF材84Bにより固定されたキューブチップ100H、第1基板300H及びバンプ82、並びに、UF材84Cにより固定された半導体チップ600及びバンプ82を、第5基板60上に、互いに固定することができる。その結果、モールド材90は、半導体モジュール10Dが外部から受ける振動及び衝撃、並びに、半導体モジュール10Dへの外部からの水分の侵入を抑制することができる。また、半導体モジュール10Dはモールド材90によって半導体モジュール10Dの内部で発生した熱を効率的に外部に排出することができる。
For example, the molding material 90 is an insulating resin material. For example, the insulating resin material includes a resin material such as epoxy, a curing agent, a filler, an additive, etc. For example, the molding material 90 is provided on the fifth substrate 60 so as to contact and surround the cube chip 100G fixed by the UF material 84A, the first substrate 300G and the bumps 82, the cube chip 100H fixed by the UF material 84B, the first substrate 300H and the bumps 82, and the semiconductor chip 600 and the bumps 82 fixed by the UF material 84C. The molding material 90 can fix the cube chip 100G fixed by the UF material 84A, the first substrate 300G and the bumps 82, the cube chip 100H fixed by the UF material 84B, the first substrate 300H and the bumps 82, and the semiconductor chip 600 fixed by the UF material 84C to one another on the fifth substrate 60. As a result, the molding material 90 can suppress vibrations and shocks that the semiconductor module 10D receives from the outside, as well as the intrusion of moisture into the semiconductor module 10D from the outside. Furthermore, the molding material 90 allows the semiconductor module 10D to efficiently discharge heat generated inside the semiconductor module 10D to the outside.
例えば、図31に示されるように、半導体モジュール10Dの規模が小さい場合には、第5基板60は、インターポーザであってもよい場合がある。
For example, as shown in FIG. 31, when the scale of the semiconductor module 10D is small, the fifth substrate 60 may be an interposer.
半導体モジュール10Dは、複数のキューブチップ(例えば、キューブチップ100G~100J)が取付け及び取外し可能な構成を有し、規模が小さい。よって、ユーザは、半導体モジュール10Dにおけるキューブチップが故障した場合であっても、故障したキューブチップを取外して、故障していないキューブチップに交換することができる。 Semiconductor module 10D is small in scale and has a configuration that allows multiple cube chips (e.g., cube chips 100G-100J) to be attached and detached. Therefore, even if a cube chip in semiconductor module 10D fails, the user can simply remove the failed cube chip and replace it with a non-failed cube chip.
また、半導体モジュール10Dは、複数のキューブチップ(例えば、キューブチップ100G~100J)が取付け及び取外し可能な構成を有し、規模が小さいため、仮に第5基板60が反ったとしても、第5基板60の反りが複数のキューブチップなどの与える影響は軽微である。例えば、複数のキューブチップを取外して、再度取付けることにより、枠体200Gに対する複数のキューブチップの位置を調整することが可能であり、基板の反りの影響を抑制することができる。 Furthermore, because the semiconductor module 10D has a configuration that allows multiple cube chips (e.g., cube chips 100G-100J) to be attached and detached, and is small in scale, even if the fifth substrate 60 warps, the effect of the warping of the fifth substrate 60 on the multiple cube chips is minor. For example, by removing and reattaching the multiple cube chips, it is possible to adjust the positions of the multiple cube chips relative to the frame 200G, and the effects of substrate warping can be suppressed.
<10-2.半導体モジュール10Dの製造方法>
次に、図33~図38を参照して、半導体モジュール10Dの製造方法の一例を説明する。
<10-2. Manufacturing Method of Semiconductor Module 10D>
Next, an example of a method for manufacturing the semiconductor module 10D will be described with reference to FIGS.
図33に示されるように、半導体モジュール10Dの製造方法はステップ60(S60)~ステップ66(S66)を含む。 As shown in Figure 33, the method for manufacturing the semiconductor module 10D includes steps 60 (S60) to 66 (S66).
半導体モジュール10Dの製造方法が開始されると、基板にチップが搭載される(図33に示されるS60)。具体的には、図34に示されるように、第1基板300Gの第1面302Gがバンプ層80(複数のバンプ82)を介して第5基板60の上に搭載され(電気的に接続され)、第1基板300Hの第1面302Hがバンプ層80(複数のバンプ82)を介して第5基板60の上に搭載され(電気的に接続され)、半導体チップ600の第1面602がバンプ層80(複数のバンプ82)を介して第5基板60の上に搭載される(電気的に接続される)。図示は省略されるが、キューブチップ100I及び100Jが設けられる第3の基板も、第1基板300G及び300Hと同様に、バンプ層80(複数のバンプ82)を介して第5基板60の上に搭載される(電気的に接続される)。例えば、第1面302G、第1面302H及び第1面602は、仮想的な面である第1面32に平行である。以降の説明において、キューブチップ100I及び100J、並びに、キューブチップ100I及び100Jが設けられる第3の基板に関連する説明は、キューブチップ100G及び100H、並びに、キューブチップ100G及び100Hが設けられる第1基板300G及び300Hと同様であり、必要に応じて説明される。 When the manufacturing method for the semiconductor module 10D begins, chips are mounted on the substrates (S60 shown in FIG. 33). Specifically, as shown in FIG. 34, the first surface 302G of the first substrate 300G is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), the first surface 302H of the first substrate 300H is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), and the first surface 602 of the semiconductor chip 600 is mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82). Although not shown, the third substrate on which the cube chips 100I and 100J are provided is also mounted on (electrically connected to) the fifth substrate 60 via the bump layer 80 (multiple bumps 82), similar to the first substrates 300G and 300H. For example, first surface 302G, first surface 302H, and first surface 602 are parallel to first surface 32, which is an imaginary surface. In the following explanation, explanations related to cube chips 100I and 100J and the third substrate on which cube chips 100I and 100J are provided are similar to those related to cube chips 100G and 100H and first substrates 300G and 300H on which cube chips 100G and 100H are provided, and will be explained as necessary.
ステップ61(S61)は、UF材84(84A~84C)を用いて、第1基板300G及び300H、並びに、半導体チップ600を、固定するステップである。具体的には、図34に示されるように、UF材84Aは、第1基板300G、バンプ層80(バンプ82)及び第5基板60を、互いに固定する。UF材84Aと同様に、UF材84Bは、第1基板300H、バンプ層80(バンプ82)及び第5基板60を、互いに固定し、UF材84Cは、半導体チップ600、バンプ層80(バンプ82)及び第5基板60を、互いに固定する。 Step 61 (S61) is a step in which the first substrates 300G and 300H and the semiconductor chip 600 are fixed together using UF materials 84 (84A-84C). Specifically, as shown in FIG. 34, UF material 84A fixes the first substrate 300G, bump layer 80 (bumps 82), and fifth substrate 60 to one another. Like UF material 84A, UF material 84B fixes the first substrate 300H, bump layer 80 (bumps 82), and fifth substrate 60 to one another, and UF material 84C fixes the semiconductor chip 600, bump layer 80 (bumps 82), and fifth substrate 60 to one another.
ステップ62(S62)は、キューブ型92を搭載し、接着剤94を用いて、キューブ型92を仮接着する。具体的には、図35に示されるように、2つのキューブ型92がそれぞれ、接着剤94を用いて、第1基板300Gと300Hとに仮接着される。なお、キューブ型92、キューブチップ100G~100Jと同様の形状を有する。 In step 62 (S62), the cube molds 92 are mounted and temporarily bonded using adhesive 94. Specifically, as shown in FIG. 35, two cube molds 92 are temporarily bonded to first substrates 300G and 300H using adhesive 94. The cube molds 92 have the same shape as cube chips 100G to 100J.
ステップ63(S63)は、モールド材90を用いて、各チップ(第1基板300G、第1基板300H、及び、半導体チップ600)、UF材84A~84C、及び、複数のキューブ型92を封止するステップである。具体的には、図36に示されるように、第1基板300G、第1基板300H、半導体チップ600、UF材84A~84C、及び、複数のキューブ型92が、モールド材90で覆われ、封止される。このとき、モールド材90は、第1基板300G、第1基板300H、半導体チップ600、UF材84A~84C、及び、複数のキューブ型92に接すると共に、第1基板300G、第1基板300H、半導体チップ600、UF材84A~84C、及び、複数のキューブ型92が設けられていない第5基板60の表面と接する。 Step 63 (S63) is a step in which each chip (first substrate 300G, first substrate 300H, and semiconductor chip 600), UF materials 84A-84C, and multiple cube molds 92 are sealed using molding material 90. Specifically, as shown in FIG. 36, first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92 are covered and sealed with molding material 90. At this time, molding material 90 contacts first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92, as well as the surface of fifth substrate 60 on which first substrate 300G, first substrate 300H, semiconductor chip 600, UF materials 84A-84C, and multiple cube molds 92 are not provided.
ステップ64(S64)は、モールド材90を研削するステップである。具体的には、図37に示されるように、S63で設けられたモールド材90の表面96が、バックグラインドによって、第3方向D3に平行な仮想線である黒矢印の方向に研削される。その結果、モールド材90の研削面98が露出する。また、複数のキューブ型92がモールド材90と同様に研削され、複数のキューブ型92の表面が露出する。例えば、バックグラインドによって、基板にチップが搭載されたのち、又は、基板にパターンが形成されたのち、当該基板の全体を研削し、チップが搭載された基板やパターンが形成された基板の厚さを薄くすることができる。
Step 64 (S64) is a step of grinding the molding material 90. Specifically, as shown in FIG. 37 , the surface 96 of the molding material 90 provided in S63 is ground by back-grinding in the direction of the black arrow, which is a virtual line parallel to the third direction D3. As a result, a ground surface 98 of the molding material 90 is exposed. Furthermore, the multiple cube dies 92 are ground in the same manner as the molding material 90, exposing the surfaces of the multiple cube dies 92. For example, after chips are mounted on a substrate or after a pattern is formed on a substrate, the entire substrate can be ground by back-grinding to reduce the thickness of the substrate on which the chips are mounted or the substrate on which the pattern is formed.
ステップ65(S65)は、表面が露出されたキューブ型92を取外すステップである。具体的には、図38に示されるように、表面が露出されたキューブ型92が、モールド材90から取外される。このとき、接着剤94もモールド材90と同様に取外されてよく、接着剤94は第1基板300G及び300Hの上に残っていてもよい。S65により、キューブチップ100G及び100Hを取付けることが可能な、枠体200G及び200Hが形成される。
Step 65 (S65) is a step of removing the cube mold 92 with its surface exposed. Specifically, as shown in FIG. 38 , the cube mold 92 with its surface exposed is removed from the molding material 90. At this time, the adhesive 94 may also be removed in the same manner as the molding material 90, and the adhesive 94 may remain on the first substrates 300G and 300H. By S65, frame bodies 200G and 200H are formed, to which the cube chips 100G and 100H can be attached.
ステップ66(S66)は、複数のキューブチップ100G及び100Hを取付けるステップである。具体的には、図32に示されるように、キューブチップ100Gが枠体200G及び第1基板300Gに取付けられ、キューブチップ100Hが枠体200H及び第1基板300Hに取付けられる。
Step 66 (S66) is a step of attaching the plurality of cube chips 100G and 100H. Specifically, as shown in Fig. 32, the cube chip 100G is attached to a frame 200G and a first substrate 300G, and the cube chip 100H is attached to a frame 200H and a first substrate 300H.
以上説明したように、半導体モジュール10Dの製造方法によって、半導体モジュール10Dが製造される。
As described above, the semiconductor module 10D is manufactured by the manufacturing method of the semiconductor module 10D.
例えば、一般的に、チップは、モールド材を用いて、基板上に実装される。本発明の第10実施形態に係る半導体モジュール10Dは、当該モールド材90を用いて、第1基板300G、第1基板300H、及び、半導体チップ600を第5基板60の上に固定すると共に、枠体200G及び200Hを形成することができる。すなわち、特別な工程を追加することを無しに、一般的な工程を用いて、各チップを固定すると共に枠体200G及び200Hを形成することができる。よって、半導体モジュール10Dの製造方法は、製造に要するコストを抑制可能である。
For example, chips are typically mounted on a substrate using a molding material. In the semiconductor module 10D according to the tenth embodiment of the present invention, the molding material 90 is used to secure the first substrate 300G, the second substrate 300H, and the semiconductor chip 600 on the fifth substrate 60, and to form the frame bodies 200G and 200H. In other words, without adding any special processes, the chips can be secured and the frame bodies 200G and 200H can be formed using a general process. Therefore, the manufacturing method of the semiconductor module 10D can reduce manufacturing costs.
<第11実施形態>
第11実施形態に係る半導体モジュール10Eを、図39~図42を参照して説明する。図39は半導体モジュール10Eの端部断面構造の一例を示す端面図である。図40は半導体モジュール10Eの製造方法の一例を示すフローチャートである。図41及び図42は、半導体モジュール10Eの製造方法の一例を説明するための端面図である。図1~図38と同一又は類似する構成は必要に応じて説明され、図1~図38と同一又は類似する構成の説明は省略される場合がある。なお、図39~図42を参照して説明される半導体モジュール10Eの構成は、一例であって、半導体モジュール10Eの構成を限定するものではない。
Eleventh Embodiment
A semiconductor module 10E according to an eleventh embodiment will be described with reference to FIGS. 39 to 42. FIG. 39 is an end view showing an example of the cross-sectional structure of an end portion of the semiconductor module 10E. FIG. 40 is a flowchart showing an example of a manufacturing method for the semiconductor module 10E. FIGS. 41 and 42 are end views for explaining an example of a manufacturing method for the semiconductor module 10E. Configurations that are the same as or similar to those in FIGS. 1 to 38 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 38 may be omitted. Note that the configuration of the semiconductor module 10E described with reference to FIGS. 39 to 42 is an example and does not limit the configuration of the semiconductor module 10E.
<11-1.半導体モジュール10Eの構成>
はじめに、図39を参照して、半導体モジュール10Eの構成の一例を説明する。
<11-1. Configuration of Semiconductor Module 10E>
First, an example of the configuration of a semiconductor module 10E will be described with reference to FIG.
半導体モジュール10Eは、キューブチップ100K、第1基板300D、複数のバンプ82、UF材84D、第5基板60A、及び、樹脂99を含む。 The semiconductor module 10E includes a cube chip 100K, a first substrate 300D, a plurality of bumps 82, a UF material 84D, a fifth substrate 60A, and a resin 99.
キューブチップ100K、第1基板300D、UF材84D、複数のバンプ82及び第5基板60Aのそれぞれは、キューブチップ100、第1基板300、UF材84A~84C、複数のバンプ82及び第5基板60と同様の構成を有する。よって、キューブチップ100K、第1基板300D、UF材84D、複数のバンプ82及び第5基板60Aのそれぞれの構成は必要に応じて説明される。
The cube chip 100K, the first substrate 300D, the UF material 84D, the plurality of bumps 82, and the fifth substrate 60A each have the same configuration as the cube chip 100, the first substrate 300, the UF materials 84A to 84C, the plurality of bumps 82, and the fifth substrate 60. Therefore, the configurations of the cube chip 100K, the first substrate 300D, the UF material 84D, the plurality of bumps 82, and the fifth substrate 60A will be described as necessary.
樹脂99は、熱可塑性樹脂、又は、ワックスなどの、接着剤である。一例として、樹脂99は、熱可塑性樹脂であり、熱可塑性樹脂はエポキシ樹脂やアクリルポリマーなどを含む接着剤である。樹脂99は、キューブチップ100Kと第1基板300Dの第2面304Dとの間に、キューブチップ100K及び第1基板300Dに接するように設けられる。 The resin 99 is an adhesive such as a thermoplastic resin or wax. As an example, the resin 99 is a thermoplastic resin, which is an adhesive containing an epoxy resin or an acrylic polymer. The resin 99 is provided between the cube chip 100K and the second surface 304D of the first substrate 300D so as to contact the cube chip 100K and the first substrate 300D.
キューブチップ100及び第1基板300と同様に、キューブチップ100Kはインダクタ172を含み、第1基板300Dはインダクタ372を含み、インダクタ172はインダクタ372と非接触でインダクタ通信可能である。また、例えば、キューブチップ100Kにおける側面電源配線162は、第3方向D3に3分割されている。3分割された側面電源配線162のうち、隣り合う側面電源配線162の間は構造体50が設けられ、3分割された側面電源配線162は互いに離隔している。
Like the cube chip 100 and the first substrate 300, the cube chip 100K includes an inductor 172, and the first substrate 300D includes an inductor 372, and the inductor 172 is capable of non-contact inductive communication with the inductor 372. Also, for example, the side surface power supply wiring 162 in the cube chip 100K is divided into three in the third direction D3. Of the three divided side surface power supply wirings 162, structures 50 are provided between adjacent side surface power supply wirings 162, and the three divided side surface power supply wirings 162 are spaced apart from each other.
第1基板300Dは複数のバンプ82に接続され、複数のバンプ82のそれぞれは複数のバンプ82のそれぞれに対応する複数の電極67に接続され、第1基板300Dは第5基板60Aと接続される。 The first substrate 300D is connected to a plurality of bumps 82, each of which is connected to a corresponding one of the electrodes 67, and the first substrate 300D is connected to the fifth substrate 60A.
UF材84Dが、第1基板300D、複数のバンプ82及び複数の電極67を取り囲むと共に、第1基板300Dの第1面302Dと第5基板60Aの第1面62Aとの間に、第1面302D及び第1面62Aに接するように設けられる。UF材84Dにより、第1基板300Dに接着されたキューブチップ100K、及び、第1基板300Dは、第5基板60Aに固定される。
The UF material 84D surrounds the first substrate 300D, the plurality of bumps 82, and the plurality of electrodes 67, and is provided between the first surface 302D of the first substrate 300D and the first surface 62A of the fifth substrate 60A so as to be in contact with the first surface 302D and the first surface 62A. The cube chip 100K bonded to the first substrate 300D and the first substrate 300D are fixed to the fifth substrate 60A by the UF material 84D.
<11-2.半導体モジュール10Eの製造方法>
次に、図39~図42を参照して、半導体モジュール10Eの製造方法の一例を説明する。
<11-2. Manufacturing Method of Semiconductor Module 10E>
Next, an example of a method for manufacturing the semiconductor module 10E will be described with reference to FIGS.
図40に示されるように、半導体モジュール10Dの製造方法はステップ70(S70)~ステップ75(S75)を含む。 As shown in Figure 40, the method for manufacturing the semiconductor module 10D includes steps 70 (S70) to 75 (S75).
半導体モジュール10Eの製造方法が開始されると、樹脂99の軟化温度以上に、温度を昇温して、キューブチップ100Kが第1基板300Dの上に搭載される(図40に示されるS70)。具体的には、半導体モジュール10Eの全体を樹脂99の軟化温度以上に昇温して、キューブチップ100Kが、樹脂99が設けられた第1基板300Dの上に搭載される。例えば、樹脂99の軟化温度は150度である。 When the manufacturing method for the semiconductor module 10E begins, the temperature is raised to above the softening temperature of the resin 99, and the cube chip 100K is mounted on the first substrate 300D (S70 shown in Figure 40). Specifically, the temperature of the entire semiconductor module 10E is raised to above the softening temperature of the resin 99, and the cube chip 100K is mounted on the first substrate 300D on which the resin 99 is provided. For example, the softening temperature of the resin 99 is 150 degrees.
ステップ71(S71)は、キューブチップ100K及び第1基板300Dに電源を供給するステップである。具体的には、図41に示されるように、電源供給部700における複数のポゴピン702を、キューブチップ100Kの側面電源配線162に圧着する。電源供給部700は、半導体モジュール10Eの外部の外部装置(外部回路)から複数のポゴピン702を経由してキューブチップ100K及び第1基板300Dに電圧(例えば、電源電圧VDD及び電圧VSS)を供給する。電源供給部700は、複数の電源電圧(例えば、電源電圧VDD1及びVDD2)を供給してよく、一部の電極を信号線に変更して、当該信号線に、ポゴピン702経由で、DC(Diredt Current)電源ではなく信号(例えば、制御信号やデータ信号)の入出力をしてもよい。
Step 71 (S71) is a step of supplying power to the cube chip 100K and the first substrate 300D. Specifically, as shown in FIG. 41 , a plurality of pogo pins 702 in a power supply unit 700 are pressure-bonded to the side power wiring 162 of the cube chip 100K. The power supply unit 700 supplies voltages (e.g., power supply voltages VDD and VSS) from an external device (external circuit) outside the semiconductor module 10E to the cube chip 100K and the first substrate 300D via the plurality of pogo pins 702. The power supply unit 700 may supply a plurality of power supply voltages (e.g., power supply voltages VDD1 and VDD2), and some electrodes may be changed to signal lines, and signals (e.g., control signals and data signals) rather than DC (Direct Current) power may be input/output to the signal lines via the pogo pins 702.
ステップ72(S72)は、キューブチップ100Kと第1基板300Dとで無線通信(インダクタ通信)が実行されるステップである。具体的には、図41に示されるように、電源がキューブチップ100K及び第1基板300Dのそれぞれに供給されることにより、キューブチップ100K及び第1基板300Dが動作し、インダクタ172とインダクタ372とのインダクタ通信(無線通信)が、非接触で実行される。
Step 72 (S72) is a step in which wireless communication (inductor communication) is performed between the cube chip 100K and the first substrate 300D. Specifically, as shown in Fig. 41 , power is supplied to each of the cube chip 100K and the first substrate 300D, causing the cube chip 100K and the first substrate 300D to operate, and inductor communication (wireless communication) between the inductor 172 and the inductor 372 to be performed in a contactless manner.
ステップ73(S73)は、キューブチップ100Kを移動させながら、キューブチップ100Kと第1基板300Dとの無線通信(インダクタ通信)の品質がよい状態で、キューブチップ100Kを固定するステップである。例えば、樹脂99が軟化した状態の場合には、キューブチップ100Kが、第2方向D2に平行に、樹脂99の第2面90Bの上を移動可能である。また、電源が、キューブチップ100K及び第1基板300Dに供給された状態は、キューブチップ100Kと第1基板300Dとで無線通信が実行可能な状態であり、無線通信の品質をモニターすることができる。よって、S73は、キューブチップ100Kを、互いに対向するインダクタ172とインダクタ372とでインダクタ通信を実行させること、第2方向D2に平行に樹脂99の第2面90Bに沿って移動させること、キューブチップ100Kを移動させて、キューブチップ100Kと第1基板300Dとの位置関係が異なる複数の状態で互いに対向するインダクタ172とインダクタ372とでインダクタ通信を実行させること、キューブチップ100Kと第1基板300Dとの位置関係が異なる複数の状態で通信の強度に関連するデータをモニターすると共に取得すること、及び、無線通信(インダクタ通信)の品質がよい状態を判定して、当該状態に対応する位置に配置されるようにキューブチップ100Kを移動させてキューブチップ100Kを固定すること、を含む。例えば、第1基板300Dは、取得した全ての前記データを解析し、互いに対向するインダクタ172とインダクタ372との通信の強度が最も大きな(高い)状態を無線通信(インダクタ通信)の品質がよい状態とする。第1基板300Dは、無線通信(インダクタ通信)の品質がよい状態を判定して、当該状態に対応する位置に配置されるようにキューブチップ100Kを移動させてキューブチップ100Kを固定するように、外部回路に指示をする。すなわち、S73は、所謂、アクティブアライメントにより、最適な通信状態になる位置でキューブチップ100Kを固定することを含む。
Step 73 (S73) is a step of fixing the cube chip 100K while moving it, while maintaining good quality of wireless communication (inductor communication) between the cube chip 100K and the first substrate 300D. For example, when the resin 99 is softened, the cube chip 100K can move on the second surface 90B of the resin 99 in parallel with the second direction D2. Furthermore, when power is supplied to the cube chip 100K and the first substrate 300D, wireless communication between the cube chip 100K and the first substrate 300D is possible, and the quality of the wireless communication can be monitored. Therefore, step S73 includes causing the cube chip 100K to perform inductor communication between the inductor 172 and the inductor 372 facing each other, moving the cube chip 100K along the second surface 90B of the resin 99 in parallel to the second direction D2, moving the cube chip 100K to cause inductor communication between the inductor 172 and the inductor 372 facing each other in a plurality of states where the positional relationship between the cube chip 100K and the first substrate 300D is different, monitoring and acquiring data related to the strength of communication in a plurality of states where the positional relationship between the cube chip 100K and the first substrate 300D is different, and determining a state where the quality of wireless communication (inductor communication) is good, moving the cube chip 100K to be positioned at a position corresponding to that state, and fixing the cube chip 100K. For example, the first substrate 300D analyzes all the acquired data and determines a state where the strength of communication between the inductor 172 and the inductor 372 facing each other is greatest (highest) as a state where the quality of wireless communication (inductor communication) is good. The first substrate 300D determines whether the quality of wireless communication (inductor communication) is good, and instructs the external circuit to move the cube chip 100K so that it is positioned at a position corresponding to the determined quality and fix the cube chip 100K. That is, S73 includes fixing the cube chip 100K at a position where the optimal communication state is achieved by so-called active alignment.
ステップ74(S74)は、樹脂99の軟化温度以下に、温度を降下させて、キューブチップ100Kを第1基板300Dの上にるステップである。S73により、キューブチップ100Kと第1基板300Dとの無線通信の品質がよい状態で、電源の供給が停止されているため、その状態で、半導体モジュール10Eの全体の温度を150度未満に降下することにより、樹脂99を硬化させる。樹脂99が硬化することにより、キューブチップ100Kが第1基板300Dの上に固着される。
Step 74 (S74) is a step in which the temperature is lowered to below the softening temperature of the resin 99, and the cube chip 100K is placed on the first substrate 300D. Since the quality of wireless communication between the cube chip 100K and the first substrate 300D is good and the power supply is stopped in S73, the resin 99 is hardened by lowering the temperature of the entire semiconductor module 10E to below 150°C. As the resin 99 hardens, the cube chip 100K is fixed onto the first substrate 300D.
ステップ75(S75)は、キューブチップ100K及び第1基板300Dへの電源の供給を停止するステップである。また、キューブチップ100K及び第1基板300Dへの電源の供給が停止されることで、キューブチップ100Kと第1基板300Dとの無線通信が停止される。なお、半導体モジュール10Eの製造方法は、S75を含まなくてよく、S75は半導体モジュール10Eの製造方法の終了後に実行されてよく、S75は必要に応じて実行されてよい。
Step 75 (S75) is a step of stopping the supply of power to the cube chip 100K and the first substrate 300D. Furthermore, stopping the supply of power to the cube chip 100K and the first substrate 300D stops wireless communication between the cube chip 100K and the first substrate 300D. Note that the manufacturing method for the semiconductor module 10E does not need to include S75, and S75 may be executed after the manufacturing method for the semiconductor module 10E is completed, or S75 may be executed as needed.
以上説明したように、半導体モジュール10Eの製造方法によって、半導体モジュール10Eが製造される。
As described above, the semiconductor module 10E is manufactured by the manufacturing method of the semiconductor module 10E.
また、例えば、キューブチップ100Kが故障した場合には、ユーザは、キューブチップ100Kを故障の無いキューブチップに交換することができる。キューブチップ100Kを故障の無いキューブチップに交換することは、半導体モジュール10Eの製造方法によって、S70を実行させて、樹脂99を軟化させること、及び、図42に示されるように、第2方向D2に平行な仮想線である黒矢印に沿って、樹脂99の第2面90Bの上を移動させて、キューブチップ100Kを取外すこと、を含む。
Furthermore, for example, if the cube chip 100K breaks down, the user can replace the cube chip 100K with a non-faulty cube chip. Replacing the cube chip 100K with a non-faulty cube chip includes executing S70 to soften the resin 99 by the manufacturing method of the semiconductor module 10E, and removing the cube chip 100K by moving it over the second surface 90B of the resin 99 along the imaginary line indicated by the black arrow parallel to the second direction D2, as shown in FIG.
以上説明したように、半導体モジュール10Eの製造方法は、アクティブアライメントにより、最適な通信状態になる位置でキューブチップ100Kキューブチップ100Kを固定することができるため、キューブチップ100Kと第1基板300Dとの最適な無線通信が可能である。
As described above, the manufacturing method of the semiconductor module 10E can fix the cube chip 100K in a position that provides optimal communication through active alignment, thereby enabling optimal wireless communication between the cube chip 100K and the first substrate 300D.
また、半導体モジュール10Eは、枠体200を含まずに、樹脂99を用いてキューブチップ100Kを取付け及び取外し可能な構成を有する。樹脂99は、半導体プロセスで一般的に用いられている工程により、キューブチップ100Kと第1基板300Dとの間に設けられるため、半導体モジュール10Eの製造方法は、樹脂99を設けるための特別な工程を必要としない。よって、半導体モジュール10Eの製造方法は、製造に要するコストを抑制可能である。
Furthermore, the semiconductor module 10E does not include a frame body 200, and has a configuration in which the cube chip 100K can be attached and detached using a resin 99. The resin 99 is provided between the cube chip 100K and the first substrate 300D by a process commonly used in semiconductor processes, and therefore the manufacturing method of the semiconductor module 10E does not require a special process for providing the resin 99. Therefore, the manufacturing method of the semiconductor module 10E can reduce manufacturing costs.
<第12実施形態>
第12実施形態に係る半導体モジュール10Fを、図43を参照して説明する。図43は半導体モジュール10Fの端部断面構造の一例を示す端面図である。図1~図42と同一又は類似する構成は必要に応じて説明され、図1~図42と同一又は類似する構成の説明は省略される場合がある。なお、図43を参照して説明される半導体モジュール10Fの構成は、一例であって、半導体モジュール10Fの構成を限定するものではない。
Twelfth Embodiment
A semiconductor module 10F according to a twelfth embodiment will be described with reference to FIG. 43. FIG. 43 is an end view showing an example of the cross-sectional structure of the end portion of the semiconductor module 10F. Configurations that are the same as or similar to those in FIGS. 1 to 42 will be described as necessary, and descriptions of configurations that are the same as or similar to those in FIGS. 1 to 42 may be omitted. Note that the configuration of the semiconductor module 10F described with reference to FIG. 43 is one example and does not limit the configuration of the semiconductor module 10F.
半導体モジュール10Fは、以下の(1)及び(2)に示される構成が、半導体モジュール10Eと異なる。
(1)樹脂95が樹脂99と同様の構成を有するが、図43に示されるように、樹脂95は樹脂99よりキューブチップ100K及び第1基板300Dとの接触面積が小さい。
(2)図43に示されるように、キューブチップ100Kと第1基板300Dとの間において、キューブチップ100K及び第1基板300Dが樹脂99と接触する部分を除く部分は、キューブチップ100Kが第1基板300Dと離隔した非接触領域97を含む。
The semiconductor module 10F differs from the semiconductor module 10E in the following configurations (1) and (2).
(1) The resin 95 has the same configuration as the resin 99, but as shown in FIG. 43, the resin 95 has a smaller contact area with the cube chip 100K and the first substrate 300D than the resin 99.
(2) As shown in FIG. 43, between the cube chip 100K and the first substrate 300D, the portion excluding the portion where the cube chip 100K and the first substrate 300D contact the resin 99 includes a non-contact region 97 where the cube chip 100K is separated from the first substrate 300D.
半導体モジュール10Fにおける(1)及び(2)に示される構成以外の構成は、半導体モジュール10Eと同様の構成である。よって、半導体モジュール10Fにおける(1)及び(2)に示される構成以外の構成の説明は省略される。 The configuration of semiconductor module 10F other than the configuration shown in (1) and (2) is the same as that of semiconductor module 10E. Therefore, a description of the configuration of semiconductor module 10F other than the configuration shown in (1) and (2) will be omitted.
非接触領域97は、未接合領域と表記される場合がある。 The non-contact area 97 may be referred to as an unbonded area.
半導体モジュール10Fの製造方法は、半導体モジュール10Eの製造方法と同様の製造方法を用いることができる。 The semiconductor module 10F can be manufactured using the same manufacturing method as the semiconductor module 10E.
図43に示されるように、断面視において、第2方向D2に対して、樹脂95は、キューブチップ100K(第1面102K)及び第1基板300D(第2面304D)の概ね中央部に設けられる。また、断面視において、第2方向D2に対して、非接触領域97は、樹脂95を取り囲むように設けられる。その結果、例えば、半導体モジュール10Fの製造方法におけるS70では、樹脂95が軟化温度以上になると、キューブチップ100Kは、非接触領域97では、樹脂95の影響を受けずに独立に移動可能である。 As shown in FIG. 43, in a cross-sectional view, the resin 95 is provided approximately in the center of the cube chip 100K (first surface 102K) and the first substrate 300D (second surface 304D) in the second direction D2. Also, in a cross-sectional view, the non-contact region 97 is provided to surround the resin 95 in the second direction D2. As a result, for example, in S70 of the manufacturing method of the semiconductor module 10F, when the resin 95 reaches or exceeds its softening temperature, the cube chip 100K can move independently in the non-contact region 97 without being affected by the resin 95.
例えば、半導体モジュール10Fが、キューブチップ100Kと第1基板300Dとの間に非接触領域97を含むことにより、半導体モジュール10Fは、樹脂がキューブチップ100Kと第1基板300Dとの間に設けられている場合より、S70及びS74を含む熱サイクルにおける応力の集中を抑制することができる。その結果、半導体モジュール10Fの長期的な信頼性は、樹脂がキューブチップ100Kと第1基板300Dとの間に設けられている半導体モジュールより、高い。 For example, by including a non-contact region 97 between the cube chip 100K and the first substrate 300D, the semiconductor module 10F can suppress the concentration of stress during thermal cycles including S70 and S74 more than when resin is provided between the cube chip 100K and the first substrate 300D. As a result, the long-term reliability of the semiconductor module 10F is higher than that of a semiconductor module in which resin is provided between the cube chip 100K and the first substrate 300D.
(付記)
なお、本発明は上記の実施形態に限られたものではなく、本発明の趣旨を逸脱しない範囲で適宜変更することが可能である。例えば、本発明に係る一つの実施形態は以下の構成であってよい。
(Additional Note)
The present invention is not limited to the above-described embodiment, and can be modified as appropriate without departing from the spirit of the present invention. For example, one embodiment of the present invention may have the following configuration.
(付記1)
第1方向及び前記第1方向に交差する第2方向に平行な第1面を含む第1基板と、
前記第1方向及び前記第2方向に交差する第3方向に沿って、前記第1面の上に配置された枠体と、
前記枠体に取付けられると共に、前記第3方向に沿って前記第1面の上に配置され、積層された複数のICチップを含むキューブチップと、
複数の論理回路を含む半導体チップと、 多層配線構造を含む第2基板と、
前記第1基板及び前記半導体チップを、前記第2基板の上に電気的に接続する複数のバンプを含むバンプ層と、
前記第1基板及び前記バンプ層、並びに、前記半導体チップ及び前記バンプ層を、前記第2基板に固定するアンダーフィル材と、
前記枠体を含み、前記第1基板と前記半導体チップとの間に設けられると共に、前記第1基板の一部及び前記半導体チップの一部を取り囲むように、前記第2基板の上に設けられるモールド材と、
を含む、半導体モジュール。
(Appendix 1)
a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction;
a frame disposed on the first surface along a third direction intersecting the first direction and the second direction;
a cube chip attached to the frame and arranged on the first surface along the third direction and including a plurality of stacked IC chips;
a semiconductor chip including a plurality of logic circuits; a second substrate including a multilayer wiring structure;
a bump layer including a plurality of bumps that electrically connect the first substrate and the semiconductor chip to the second substrate;
an underfill material that fixes the first substrate and the bump layer, and the semiconductor chip and the bump layer, to the second substrate;
a molding material including the frame, the molding material being provided between the first substrate and the semiconductor chip, and being provided on the second substrate so as to surround a portion of the first substrate and a portion of the semiconductor chip;
12. A semiconductor module comprising:
(付記2)
前記枠体は第1傾斜部を含み、
前記キューブチップは第2傾斜部を含み、
前記第1面と前記第1傾斜部とのなす角度は、前記第1面と前記第2傾斜部とのなす角度と同一である、
付記1に記載の半導体モジュール。
(Appendix 2)
the frame body includes a first inclined portion,
the cube chip includes a second sloped portion;
an angle formed between the first surface and the first inclined portion is the same as an angle formed between the first surface and the second inclined portion;
2. The semiconductor module of claim 1.
(付記3)
前記第2傾斜部は、絶縁膜に覆われる、
付記2に記載の半導体モジュール。
(Appendix 3)
the second inclined portion is covered with an insulating film;
3. The semiconductor module of claim 2.
(付記4)
付記1に記載の半導体モジュールの製造方法であって、
前記製造方法は、
前記第1基板及び前記半導体チップを、前記バンプ層を用いて、前記第2基板の上に搭載することと、
前記アンダーフィル材を用いて、前記第1基板、前記半導体チップ及び前記バンプ層を前記第2基板の上に固定することと、
前記キューブチップと同じ形状を有するキューブ型を前記第1基板の上に仮接着することと、
前記モールド材を用いて、前記キューブ型、前記第1基板、前記半導体チップ、前記バンプ層、及び、前記アンダーフィル材を覆い、前記キューブ型、前記第1基板、前記半導体チップ、前記バンプ層、及び、前記アンダーフィル材を前記第2基板上に固定することと、
前記モールド材を研削し、前記モールド材を薄くし、前記キューブ型の表面を露出させることと、
前記キューブ型を取外すことと、
前記キューブ型を取外すことによって形成された前記枠体に、前記キューブチップを取付けることと、
を含む、半導体モジュールの製造方法。
(Appendix 4)
A method for manufacturing the semiconductor module according to claim 1,
The manufacturing method includes:
Mounting the first substrate and the semiconductor chip on the second substrate using the bump layer;
using the underfill material to fix the first substrate, the semiconductor chip, and the bump layer onto the second substrate;
temporarily adhering a cube mold having the same shape as the cube chip onto the first substrate;
using the molding material to cover the cube, the first substrate, the semiconductor chip, the bump layer, and the underfill material, and fix the cube, the first substrate, the semiconductor chip, the bump layer, and the underfill material onto the second substrate;
grinding the molding material to thin the molding material and expose the surface of the cube;
removing the cube;
attaching the cube chip to the frame formed by removing the cube mold;
A method for manufacturing a semiconductor module, comprising:
(付記5)
第1インダクタを含み、第1方向及び前記第1方向に交差する第2方向に平行な第1面を含む第1基板と、
前記第3方向に沿って前記第1面の上に配置され、第2のインダクタ及び積層された複数のICチップを含むキューブチップと、
前記第1基板及び前記キューブチップに接すると共に、前記第1基板と前記キューブチップとの間に設けられた樹脂と、 多層配線構造を含む第2基板と、
前記第1基板を前記第2基板の上に電気的に接続する複数のバンプを含むバンプ層と、
前記第1基板及び前記バンプ層を前記第2基板に固定するアンダーフィル材と、
を含み、
前記第1インダクタは、前記第2インダクタと非接触で通信する、
半導体モジュール。
(Appendix 5)
a first substrate including a first inductor and including a first surface parallel to a first direction and a second direction intersecting the first direction;
a cube chip disposed on the first surface along the third direction and including a second inductor and a plurality of stacked IC chips;
a resin in contact with the first substrate and the cube chip and provided between the first substrate and the cube chip; a second substrate including a multilayer wiring structure;
a bump layer including a plurality of bumps electrically connecting the first substrate onto the second substrate;
an underfill material that fixes the first substrate and the bump layer to the second substrate;
Including,
the first inductor communicates with the second inductor in a non-contact manner;
Semiconductor module.
(付記6)
前記第1基板と前記キューブチップとの間に設けられ、前記第1基板が前記キューブチップと離隔した未接合領域をさらに含み、
前記未接合領域は、前記樹脂を取り囲む、
付記5に記載の半導体モジュール。
(Appendix 6)
the first substrate further includes an unbonded region provided between the first substrate and the cube chip, the first substrate being spaced apart from the cube chip;
The unbonded region surrounds the resin.
6. The semiconductor module of claim 5.
(付記7)
付記6に記載の半導体モジュールの製造方法であって、
前記製造方法は、
前記半導体モジュールを、前記樹脂の軟化温度以上に昇温して、前記キューブチップを前記第1基板の上に搭載することと、
前記キューブチップ及び前記第1基板に、電源を供給することと、
前記キューブチップを前記樹脂の上を移動させることと、
前記第1インダクタと前記第2インダクタとを非接触で通信させることと、
前記第1インダクタと前記第2インダクタとの非接触での通信において、通信強度が強い状態で、前記通信強度を取得することと、
前記半導体モジュールを、前記軟化温度より低い温度に降下させて、前記キューブチップを前記第1基板の上に固着することと、
を含む、半導体モジュールの製造方法。
(Appendix 7)
A method for manufacturing a semiconductor module according to claim 6, comprising:
The manufacturing method includes:
raising the temperature of the semiconductor module to a temperature equal to or higher than the softening temperature of the resin, and mounting the cube chip on the first substrate;
supplying power to the cube chip and the first substrate;
moving the cube chip over the resin;
causing the first inductor and the second inductor to communicate with each other in a non-contact manner;
acquiring a communication strength in a state where the communication strength is strong in non-contact communication between the first inductor and the second inductor;
lowering the temperature of the semiconductor module below the softening temperature to fix the cube chip onto the first substrate;
A method for manufacturing a semiconductor module, comprising:
(付記8)
前記半導体モジュールを前記樹脂の軟化温度以上に昇温して、前記キューブチップを前記樹脂の上を移動させて取外すこと、
を含む、付記7に記載の半導体モジュール。
(Appendix 8)
raising the temperature of the semiconductor module to a temperature equal to or higher than the softening temperature of the resin, and moving the cube chip on the resin to remove it;
8. The semiconductor module of claim 7, comprising:
本発明の実施形態として例示した半導体モジュール又は半導体モジュールの各種構成は相互に矛盾しない限り適宜組み合わせることが可能である。また、本発明の実施形態として例示した半導体モジュール又は半導体モジュールの各種構成は相互に矛盾しない限り、適宜入れ替えて実施することが可能である。また、各実施形態に共通する技術事項については、明示の記載がなくても各実施形態に含まれる。また、本明細書及び図面に開示された半導体モジュールを基にして、当業者が適宜構成要素の追加、削除もしくは設計変更を行ったもの、又は、工程の追加、省略もしくは条件変更を行ったものも、本発明の要旨を備えている限り、本発明の範囲に含まれる。 The semiconductor modules or various configurations of semiconductor modules exemplified as embodiments of the present invention may be combined as appropriate, provided they are not mutually inconsistent. Furthermore, the semiconductor modules or various configurations of semiconductor modules exemplified as embodiments of the present invention may be interchanged as appropriate, provided they are not mutually inconsistent. Furthermore, technical matters common to each embodiment are included in each embodiment even if not explicitly stated. Furthermore, semiconductor modules disclosed in this specification and drawings, to which a person skilled in the art has appropriately added, deleted, or modified components, or to which processes have been added, omitted, or conditions have been changed, are also included within the scope of the present invention, as long as they comprise the essence of the present invention.
本明細書に開示された実施形態の態様によりもたらされる作用効果とは異なる他の作用効果であっても、本明細書の記載から明らかなもの、又は、当業者において容易に予測し得るものについては、当然に本発明によりもたらされるものと解される。 Even if there are other effects and advantages different from those brought about by the embodiments disclosed in this specification, if they are clear from the description in this specification or can be easily predicted by a person skilled in the art, they are naturally understood to be brought about by the present invention.
10:半導体モジュール、10A:半導体モジュール、10B:半導体モジュール、10C:半導体モジュール、10D:半導体モジュール、10E:半導体モジュール、10F:半導体モジュール、30:積層メモリチップ、32:第1面、40:絶縁膜、41:第1傾斜部、42:第5面、44:第6面、45:第3面、46:第1面、47:第4面、48:第2面、50:構造体、50A:構造体、51:第2傾斜部、56:絶縁膜、58:絶縁膜、60:第5基板、60A:第5基板、62:第1面、62A:第1面、64:第2面、66:配線層、67:電極、68:配線層、69:配線、70:配線層、71:配線、72:配線層、73:配線、74:配線層、75:電極、80:バンプ層、82:バンプ、84:UF材、84A:UF材、84B:UF材、84C:UF材、84D:UF材、90:モールド材、90B:第2面、92:キューブ型、94:接着剤、95:樹脂、96:表面、97:非接触領域、98:研削面、99:樹脂、100:キューブチップ、100A:キューブチップ、100B:キューブチップ、100C:キューブチップ、100D:キューブチップ、100E:キューブチップ、100F:キューブチップ、100G:キューブチップ、100H:キューブチップ、100I:キューブチップ、100J:キューブチップ、100K:キューブチップ、102:第1面、102K:第1面、104:第2面、110:ICチップ、110n:ICチップ、111:メモリモジュール、112:TCI-IO、113:並列直列変換回路、114:送受信回路、115:メモリセルアレイ、130:トランジスタ層、142:第5面、144:第6面、145:第3面、146:第1面、147:第4面、148:第2面、150:配線層、162:側面電源配線、163:側面接地配線、164:電源配線、165:接地配線、166:信号伝送配線、172:インダクタ、172a:第1部分、172b:第2部分、172c:第3部分、172d:第5部分、172e:第4部分、173:半導体基板、174:素子分離領域、175:活性化領域、176:トランジスタ、177:絶縁層、178:配線、179:絶縁層、180:配線、181:絶縁層、182:絶縁層、183:配線、200:枠体、200A:枠体、200B:枠体、200C:枠体、200D:第4枠体、200E:枠体、200F:枠体、200G:枠体、200H:枠体、200L:第1枠体、200R:第3枠体、200U:第2枠体、202:枠体、202LD:第1L字状枠体、202LU:第2L字状枠体、202RD:第4L字状枠体、202RU:第3L字状枠体、204:枠体、204LD:第1L字状枠体、204RU:第2L字状枠体、210:絶縁膜、272:インダクタ、272a:第1部分、300:第1基板、300A:第2基板、300B:第3基板、300C:第4基板、300D:第1基板、300G:第1基板、300H:第1基板、302:第2面、304:第1面、302A:第2面、304A:第1面、302D:第1面、302G:第1面、302H:第1面、304D:第2面、311:TCI-IO制御モジュール、312:TCI-IO、313:並列直列変換回路、314:送受信回路、326:配線層、327:配線、328:配線層、329:配線、330:配線層、331:配線、332:配線層、333:配線、334:配線層、335:配線、372:インダクタ、372a:第1部分、372b:第2部分、372c:第3部分、372d:第5部分、372e:第4部分、400:枠型、442:第5面、444:第6面、445:第3面、446:第1面、447:第4面、448:第2面、465:側面接地配線、564:側面電源配線、565:側面接地配線、600:半導体チップ、602:第1面、700:電源供給部、701:支持部、702:ポゴピン、750:接続部材、800:熱伝導シート、900:金属膜 10: Semiconductor module, 10A: Semiconductor module, 10B: Semiconductor module, 10C: Semiconductor module, 10D: Semiconductor module, 10E: Semiconductor module, 10F: Semiconductor module, 30: Stacked memory chip, 32: First surface, 40: Insulating film, 41: First inclined portion, 42: Fifth surface, 44: Sixth surface, 45: Third surface, 46: First surface, 47: Fourth surface, 48: Second surface, 50: Structure, 50A: Structure, 51: Second inclined portion, 56: Insulating film, 58: Insulating film, 60: Fifth Substrate, 60A: fifth substrate, 62: first surface, 62A: first surface, 64: second surface, 66: wiring layer, 67: electrode, 68: wiring layer, 69: wiring, 70: wiring layer, 71: wiring, 72: wiring layer, 73: wiring, 74: wiring layer, 75: electrode, 80: bump layer, 82: bump, 84: UF material, 84A: UF material, 84B: UF material, 84C: UF material, 84D: UF material, 90: molding material, 90B: second surface, 92: cube shape, 94: adhesive, 95: resin, 96: surface, 97: non-contact area, 98: Grinding surface, 99: resin, 100: cube chip, 100A: cube chip, 100B: cube chip, 100C: cube chip, 100D: cube chip, 100E: cube chip, 100F: cube chip, 100G: cube chip, 100H: cube chip, 100I: cube chip, 100J: cube chip, 100K: cube chip, 102: first surface, 102K: first surface, 104: second surface, 110: IC chip, 110n: IC chip , 111: memory module, 112: TCI-IO, 113: parallel-serial conversion circuit, 114: transceiver circuit, 115: memory cell array, 130: transistor layer, 142: fifth surface, 144: sixth surface, 145: third surface, 146: first surface, 147: fourth surface, 148: second surface, 150: wiring layer, 162: side power supply wiring, 163: side ground wiring, 164: power supply wiring, 165: ground wiring, 166: signal transmission wiring, 172: inductor, 172a: first part, 172b: second part, 1 72c: third portion, 172d: fifth portion, 172e: fourth portion, 173: semiconductor substrate, 174: element isolation region, 175: activation region, 176: transistor, 177: insulating layer, 178: wiring, 179: insulating layer, 180: wiring, 181: insulating layer, 182: insulating layer, 183: wiring, 200: frame, 200A: frame, 200B: frame, 200C: frame, 200D: fourth frame, 200E: frame, 200F: frame, 200G: frame, 200H: frame, 200L: first frame, 200 R: third frame, 200U: second frame, 202: frame, 202LD: first L-shaped frame, 202LU: second L-shaped frame, 202RD: fourth L-shaped frame, 202RU: third L-shaped frame, 204: frame, 204LD: first L-shaped frame, 204RU: second L-shaped frame, 210: insulating film, 272: inductor, 272a: first part, 300: first substrate, 300A: second substrate, 300B: third substrate, 300C: fourth substrate, 300D: first substrate, 300G: first substrate, 300H: first substrate Plate, 302: second surface, 304: first surface, 302A: second surface, 304A: first surface, 302D: first surface, 302G: first surface, 302H: first surface, 304D: second surface, 311: TCI-IO control module, 312: TCI-IO, 313: parallel-serial conversion circuit, 314: transmitter/receiver circuit, 326: wiring layer, 327: wiring, 328: wiring layer, 329: wiring, 330: wiring layer, 331: wiring, 332: wiring layer, 333: wiring, 334: wiring layer, 335: wiring, 372: inductor, 3 72a: First part, 372b: Second part, 372c: Third part, 372d: Fifth part, 372e: Fourth part, 400: Frame, 442: Fifth surface, 444: Sixth surface, 445: Third surface, 446: First surface, 447: Fourth surface, 448: Second surface, 465: Side ground wiring, 564: Side power wiring, 565: Side ground wiring, 600: Semiconductor chip, 602: First surface, 700: Power supply unit, 701: Support, 702: Pogo pin, 750: Connection member, 800: Thermal conduction sheet, 900: Metal film
Claims (17)
前記第1方向及び前記第2方向に交差する第3方向に沿って、前記第1面の上に配置された枠体と、
前記枠体に取付けられると共に、前記第3方向に沿って前記第1面の上に配置され、積層された複数のICチップを含む第1キューブチップ、を含む、
半導体モジュール。 a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction;
a frame disposed on the first surface along a third direction intersecting the first direction and the second direction;
a first cube chip attached to the frame and arranged on the first surface along the third direction, the first cube chip including a plurality of stacked IC chips;
Semiconductor module.
前記ICチップは、前記第1面に平行、かつ、前記第1面から離隔して設けられた第2インダクタを含み、
前記第1インダクタは前記第2インダクタと非接触で通信する、
請求項1に記載の半導体モジュール。 the first substrate includes a first inductor provided parallel to the first surface and spaced apart from the first surface;
the IC chip includes a second inductor provided parallel to the first surface and spaced apart from the first surface;
the first inductor is in contactless communication with the second inductor;
The semiconductor module according to claim 1 .
請求項2に記載の半導体モジュール。 the IC chip includes a plurality of memory cell arrays electrically connected to the first inductor;
The semiconductor module according to claim 2 .
前記第1キューブチップは第2傾斜部を含み、
前記第1面と前記第1傾斜部とのなす角度は、前記第1面と前記第2傾斜部とのなす角度と同一である、
請求項1に記載の半導体モジュール。 the frame body includes a first inclined portion,
the first cube chip includes a second sloped portion;
an angle formed between the first surface and the first inclined portion is the same as an angle formed between the first surface and the second inclined portion;
The semiconductor module according to claim 1 .
前記積層メモリチップは、少なくとも、前記第3方向の2つの最外面である第1最外面及び前記第1最外面と反対側の第2最外面と、前記第3方向及び前記第1方向に平行かつ前記第2方向の2つの最外面である第3最外面及び前記第3最外面と反対側の第4最外面と、を含み、
前記第1電極は前記第3最外面に電気的に接続され、
前記構造体は前記第2傾斜部を含み、前記第1電極が接続される以外の前記第3最外面に接するように設けられる、
請求項4に記載の半導体モジュール。 the first cube chip includes a stacked memory chip including the plurality of IC chips, a first electrode electrically connected to the stacked memory chip, and a structure;
the stacked memory chips include at least a first outermost surface and a second outermost surface opposite to the first outermost surface, which are two outermost surfaces in the third direction, and a third outermost surface and a fourth outermost surface opposite to the third outermost surface, which are parallel to the third direction and the first direction and are two outermost surfaces in the second direction,
the first electrode is electrically connected to the third outermost surface;
the structure includes the second inclined portion and is provided so as to be in contact with the third outermost surface other than the surface to which the first electrode is connected;
The semiconductor module according to claim 4 .
請求項5に記載の半導体モジュール。 the first electrode is electrically connected to a power supply unit including a plurality of terminals to which a power supply voltage is supplied;
The semiconductor module according to claim 5 .
前記第2電極には接地電圧が供給される、
請求項5に記載の半導体モジュール。 the first cube chip includes a second electrode electrically connected to the second outermost surface;
A ground voltage is supplied to the second electrode.
The semiconductor module according to claim 5 .
前記ヒートスプレッダは、第2電極に電気的に接続され、前記第2電極に前記接地電圧を供給する、
請求項7に記載の半導体モジュール。 further comprising a heat spreader;
the heat spreader is electrically connected to a second electrode and supplies the ground voltage to the second electrode;
The semiconductor module according to claim 7 .
請求項5に記載の半導体モジュール。 The structure includes a resin or a metal.
The semiconductor module according to claim 5 .
請求項1に記載の半導体モジュール。 The frame body is configured by combining a first frame body, a second frame body, a third frame body, and a fourth frame body in a quadrangular shape.
The semiconductor module according to claim 1 .
請求項1に記載の半導体モジュール。 The frame body includes a first L-shaped frame body, a second L-shaped frame body, a third L-shaped frame body, and a fourth L-shaped frame body that are spaced apart from each other and provided at four corners of a rectangle.
The semiconductor module according to claim 1 .
請求項1に記載の半導体モジュール。 The frame body includes a first L-shaped frame body and a second L-shaped frame body spaced apart from each other and provided at two diagonal corners of a rectangle.
The semiconductor module according to claim 1 .
前記第1キューブチップ及び前記第2キューブチップを接続する接続部材と、をさらに含み、
前記第1キューブチップ及び前記第2キューブチップのそれぞれは、前記第3方向の2つの最外面である第1最外面及び前記第1最外面と反対側の第2最外面と、前記第3方向及び前記第1方向に平行かつ前記第2方向の2つの最外面である第3最外面及び前記第3最外面と反対側の第4最外面と、前記第3方向及び前記第2方向に平行かつ前記第1方向の2つの最外面である第5最外面及び前記第5最外面と反対側の第6最外面と、を含み、
前記第1キューブチップの前記第5最外面は、前記第2キューブチップの前記第6最外面に接し、
前記接続部材は、少なくとも、前記第1キューブチップの前記第6最外面、前記第3最外面及び前記第4最外面、並びに、前記第2キューブチップの前記第3最外面及び前記第4最外面に接する、
請求項1に記載の半導体モジュール。 a second cube chip attached to the frame, disposed on the first surface, adjacent to the first cube chip, and having a plurality of IC chips stacked thereon that are different from the plurality of IC chips;
a connecting member connecting the first cube chip and the second cube chip,
each of the first cube chip and the second cube chip includes a first outermost surface which is the two outermost surfaces in the third direction and a second outermost surface opposite to the first outermost surface; a third outermost surface which is parallel to the third direction and the first direction and which is the two outermost surfaces in the second direction and a fourth outermost surface opposite to the third outermost surface; a fifth outermost surface which is parallel to the third direction and the second direction and which is the two outermost surfaces in the first direction and a sixth outermost surface opposite to the fifth outermost surface;
the fifth outermost surface of the first cube chip is in contact with the sixth outermost surface of the second cube chip;
the connecting member contacts at least the sixth outermost surface, the third outermost surface, and the fourth outermost surface of the first cube chip, and the third outermost surface and the fourth outermost surface of the second cube chip;
The semiconductor module according to claim 1 .
前記接続部材は、前記第1電極及び前記第2電極に接し、前記第1電極及び前記第2電極に電源電圧を供給する、
請求項13に記載の半導体モジュール。 each of the first cube chip and the second cube chip includes a first electrode in contact with the third outermost surface and a second electrode in contact with the fourth outermost surface;
the connection member is in contact with the first electrode and the second electrode and supplies a power supply voltage to the first electrode and the second electrode.
The semiconductor module according to claim 13 .
前記第1面に圧着される面が前記枠体を介して前記第1基板の所定の位置に配置され、
前記第1キューブチップは、前記第1基板と電気的かつ機械的に接続されておらず、前記電極を介して外部回路と電気的に接続される、
請求項1に記載の半導体モジュール。 the first cube chip includes an electrode provided on a surface that is pressed against the first surface and a surface that is different from the surface that is pressed against the first surface,
a surface to be pressure-bonded to the first surface is disposed at a predetermined position on the first substrate via the frame;
the first cube chip is not electrically or mechanically connected to the first substrate, and is electrically connected to an external circuit via the electrodes;
The semiconductor module according to claim 1 .
前記第1方向及び前記第2方向に交差する第3方向に沿って、前記第1面の上に配置された枠体と、
前記枠体に取付けられると共に、前記第3方向に沿って前記第1面の上に配置され、積層された複数のICチップを含むキューブチップと、を含む半導体モジュールの製造方法であって、
前記製造方法は、
前記第1面の上に前記枠体を形成すること、及び、
前記枠体に含まれる第1傾斜部と、前記キューブチップに含まれる第2傾斜部とが嵌合するように、前記キューブチップを回転させて前記枠体及び前記第1面の上に配置すること、
を含む、半導体モジュールの製造方法。 a first substrate including a first surface parallel to a first direction and a second direction intersecting the first direction;
a frame disposed on the first surface along a third direction intersecting the first direction and the second direction;
a cube chip attached to the frame, arranged on the first surface along the third direction, and including a plurality of stacked IC chips,
The manufacturing method includes:
forming the frame on the first surface; and
rotating the cube chip and placing it on the frame and the first surface so that a first inclined portion included in the frame and a second inclined portion included in the cube chip are fitted together;
A method for manufacturing a semiconductor module, comprising:
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024093966 | 2024-06-10 | ||
| JP2024-093966 | 2024-06-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2025258552A1 true WO2025258552A1 (en) | 2025-12-18 |
Family
ID=98050838
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2025/020760 Pending WO2025258552A1 (en) | 2024-06-10 | 2025-06-09 | Semiconductor module and method for manufacturing semiconductor module |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2025258552A1 (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2893862Y (en) * | 2006-01-26 | 2007-04-25 | 宏亿国际股份有限公司 | Improvement of a memory module |
| WO2009113372A1 (en) * | 2008-03-13 | 2009-09-17 | 日本電気株式会社 | Semiconductor device |
| WO2021199447A1 (en) * | 2020-04-03 | 2021-10-07 | ウルトラメモリ株式会社 | Memory unit, semiconductor module, dimm module, and manufacturing method for same |
| CN117673013A (en) * | 2022-08-10 | 2024-03-08 | 长鑫存储技术有限公司 | Semiconductor structures and methods of manufacturing semiconductor structures |
| WO2024057707A1 (en) * | 2022-09-12 | 2024-03-21 | 先端システム技術研究組合 | Semiconductor module and method for producing same |
-
2025
- 2025-06-09 WO PCT/JP2025/020760 patent/WO2025258552A1/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2893862Y (en) * | 2006-01-26 | 2007-04-25 | 宏亿国际股份有限公司 | Improvement of a memory module |
| WO2009113372A1 (en) * | 2008-03-13 | 2009-09-17 | 日本電気株式会社 | Semiconductor device |
| WO2021199447A1 (en) * | 2020-04-03 | 2021-10-07 | ウルトラメモリ株式会社 | Memory unit, semiconductor module, dimm module, and manufacturing method for same |
| CN117673013A (en) * | 2022-08-10 | 2024-03-08 | 长鑫存储技术有限公司 | Semiconductor structures and methods of manufacturing semiconductor structures |
| WO2024057707A1 (en) * | 2022-09-12 | 2024-03-21 | 先端システム技術研究組合 | Semiconductor module and method for producing same |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI466268B (en) | Proximity communication package for processor, cache and memory | |
| TWI479630B (en) | Enhanced stacked microelectronic assembly with central contacts and its system, module and configuration | |
| US6762488B2 (en) | Light thin stacked package semiconductor device and process for fabrication thereof | |
| US8592952B2 (en) | Semiconductor chip and semiconductor package with stack chip structure | |
| US7732906B2 (en) | Semiconductor device | |
| KR101801307B1 (en) | Embedded chip packages | |
| US11450583B2 (en) | Semiconductor packages | |
| CN109979889A (en) | Semiconductor package part | |
| TW201526122A (en) | Technique for controlling the position of a stacked wafer | |
| TW202220130A (en) | Semiconductor device capable of suppressing interference between bonding pins and wires | |
| TW579560B (en) | Semiconductor device and its manufacturing method | |
| US20250286031A1 (en) | Semiconductor module | |
| US20030015803A1 (en) | High-density multichip module and method for manufacturing the same | |
| TWI515865B (en) | Multi-wafer stacked package structure and manufacturing method thereof | |
| WO2025258552A1 (en) | Semiconductor module and method for manufacturing semiconductor module | |
| KR102816598B1 (en) | Semiconductor package and method of manufacturing the same | |
| US11139283B2 (en) | Abstracted NAND logic in stacks | |
| TWI819440B (en) | Electronic package and manufacturing method thereof | |
| CN111769101B (en) | Packaging structure and packaging method based on multiple transfer boards | |
| CN116053245A (en) | Three-dimensional chip packaging structure, chip packaging method, chip and electronic device | |
| WO2024127812A1 (en) | Semiconductor module | |
| CN113363229A (en) | Semiconductor package and method of manufacturing the same | |
| KR20010025861A (en) | Stack type chip scale semiconductor package | |
| KR20240178336A (en) | Circuit board and package substrate having the same | |
| WO2025253863A1 (en) | Semiconductor module |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 25821898 Country of ref document: EP Kind code of ref document: A1 |