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WO2025127019A1 - Solid electrolytic capacitor and method for manufacturing same - Google Patents

Solid electrolytic capacitor and method for manufacturing same Download PDF

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Publication number
WO2025127019A1
WO2025127019A1 PCT/JP2024/043559 JP2024043559W WO2025127019A1 WO 2025127019 A1 WO2025127019 A1 WO 2025127019A1 JP 2024043559 W JP2024043559 W JP 2024043559W WO 2025127019 A1 WO2025127019 A1 WO 2025127019A1
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Prior art keywords
conductive polymer
polymer composition
electrolytic capacitor
solid electrolytic
conductive layer
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French (fr)
Japanese (ja)
Inventor
真吾 小野寺
望 藤井
徹 板東
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Idemitsu Kosan Co Ltd
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Idemitsu Kosan Co Ltd
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Publication of WO2025127019A1 publication Critical patent/WO2025127019A1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/022Electrolytes; Absorbents
    • H01G9/025Solid electrolytes
    • H01G9/028Organic semiconducting electrolytes, e.g. TCNQ
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/004Details
    • H01G9/04Electrodes or formation of dielectric layers thereon
    • H01G9/048Electrodes or formation of dielectric layers thereon characterised by their structure
    • H01G9/052Sintered electrodes

Definitions

  • the present invention relates to a solid electrolytic capacitor and a method for manufacturing the same.
  • Patent Document 1 discloses a tantalum capacitor in which a conductive polymer layer, a carbon layer, and a silver layer are formed in this order on a tantalum sintered body having a dielectric oxide layer (Patent Document 1).
  • Patent Document 1 had the problem that the tantalum capacitor had low resistance to moisture and heat, limiting the environments in which it could be used.
  • the object of the present invention is to provide a solid electrolytic capacitor with excellent resistance to moist heat and a method for manufacturing the same.
  • the present invention provides the following solid electrolytic capacitors, etc.
  • the inorganic particles contain at least one selected from the group consisting of silica, titania, alumina, and zirconia.
  • the solid electrolytic capacitor according to any one of 4 to 6 above, wherein the content of the thixotropy-imparting agent in the second conductive layer as a whole is 0.01 to 50 mass %. 8.
  • the thickener is a polyether compound or a cellulose compound.
  • the content of the thickener in the second conductive layer is 0.001 to 5 mass %.
  • the second conductive layer is formed from a conductive polymer composition that satisfies the following conditions (P1) and (P2): (P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa ⁇ s or more.
  • valve metal is selected from the group consisting of aluminum, tantalum, niobium, titanium, hafnium, zirconium, zinc, tungsten, bismuth, and antimony. 13.
  • a method for producing a solid electrolytic capacitor comprising the following steps (A-1) or (A-2), (B), and (C):
  • (A-1) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer and a solvent;
  • (A-2) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound;
  • (B) A step of removing the porous body from the first conductive polymer composition used in the step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition;
  • (C) A step of immersing a part or the whole of the porous body after the step (B) in a second conductive polymer composition containing a conductive
  • P1 The viscosity at a shear rate of 10 (1/s) is 1 Pa ⁇ s or more.
  • P2 After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa ⁇ s or more and satisfies the following formula (P2-1).
  • the present invention provides a solid electrolytic capacitor with excellent resistance to moist heat and a method for manufacturing the same.
  • FIG. 1 is a schematic diagram of a solid electrolytic capacitor according to one embodiment of the present invention.
  • FIG. 2 is an enlarged schematic view of a cross section of a solid electrolytic capacitor according to one embodiment of the present invention.
  • x to y represents a numerical range of "not less than x and not more than y.”
  • the upper and lower limits described in relation to the numerical ranges can be combined in any combination.
  • a solid electrolytic capacitor includes a porous body made of a valve metal, a dielectric layer formed on the surface of the porous body, and two or more conductive layers covering the dielectric layer, the two or more conductive layers including a first conductive layer formed on the surface of the dielectric layer and a second conductive layer laminated on the first conductive layer, the second conductive layer including a polyaniline complex in which polyaniline is doped with a proton donor.
  • the solid electrolytic capacitor according to one aspect of the present invention has the above-mentioned configuration, and therefore has excellent resistance to moist heat.
  • FIG. 1 is a schematic diagram of a solid electrolytic capacitor according to one embodiment of the present invention
  • FIG. 2 is an enlarged schematic diagram of a cross section of the solid electrolytic capacitor.
  • a solid electrolytic capacitor 100 in one embodiment includes an anode body 110 including a porous body 111 made of a valve metal and a dielectric layer 112 formed on the surface of the porous body, a first conductive layer 120 covering the dielectric layer, a second conductive layer 130 laminated on the first conductive layer, a carbon layer 140 laminated on the second conductive layer, and a silver layer 150 laminated on the carbon layer.
  • the solid electrolytic capacitor according to the aspect of the present invention may include a wire 160 including a valve metal. The wire 160 penetrates at least a portion of the porous body 111.
  • the first conductive layer 120 is also called an inner solid electrolyte layer, an inner coating layer, an inner layer, or the like.
  • the second conductive layer 130 is also called an outer coating layer, an outer layer, or the like.
  • the porous body is made of a valve metal and is a material having pores, preferably having a large number of pores with diameters of about 1 nm to 10 ⁇ m.
  • a porous body By using a porous body, the surface area of the valve metal can be increased, which in turn increases the capacitance of the capacitor, making it possible to realize a small-sized capacitor with large capacitance.
  • the shape of the porous body is not particularly limited, and may be, for example, a molded body or a film (foil) having a certain thickness.
  • the length, width and thickness of the porous body which is a molded article are not particularly limited, and are, for example, independently 15 ⁇ m or more and 5 mm or less.
  • the thickness of the porous body serving as the membrane (foil) is not particularly limited, and is, for example, 15 ⁇ m or more and 300 ⁇ m or less.
  • Porous structures include, but are not limited to, tunnel-like pits, spongy pits, or gaps between densely packed powder particles.
  • the porous body may contain only one of these structures, or two or more of them.
  • the method for manufacturing the porous body is not particularly limited, but for example, a metal powder made of a valve metal may be sintered to form a porous body, or a film (foil) made of a valve metal may be etched to form a large number of holes.
  • the porous body is a sintered body made of valve metal, which is obtained by sintering a compact containing a valve metal powder and a binder.
  • a sintered body made of a valve metal can be produced by mixing and stirring a valve metal powder, a binder, and a solvent in a certain ratio, compressing the mixed powder into a rectangular parallelepiped, and then sintering this at high temperature and high vibration.
  • Valve metals include metals such as aluminum, tantalum, niobium, titanium, hafnium, zirconium, zinc, tungsten, bismuth, and antimony, with aluminum or tantalum being preferred. These metals may be used alone or in combination of two or more.
  • binders include, for example, cellulosic binders.
  • cellulose-based binder include one or more types selected from the group consisting of nitrocellulose, methylcellulose, ethylcellulose, and hydroxypropylcellulose.
  • One type of binder may be used alone, or two or more types may be used in combination.
  • the dielectric layer is formed on the surface of the porous body.
  • the dielectric layer comprises an oxide of a valve metal contained in a porous body.
  • the method for producing the dielectric layer is not particularly limited, but examples thereof include anodic oxidation, in which an oxide film grows on the surface layer by passing a current through a porous body as an anode in an electrolytic solution.
  • the electrolytic solution include, for example, phosphates, borates, citrates, adipates, etc.
  • the electrolytic solution may be used alone or in combination of two or more kinds.
  • the thickness of the dielectric layer is designed according to the required withstand voltage, capacitance, etc., but is preferably 1 nm or more and 500 nm or less, and more preferably 10 nm or more and 100 nm or less.
  • the porous body made of valve metal and the dielectric layer formed on the surface of the porous body are collectively referred to as the anode body.
  • the submerged capacity of the anode body is, for example, preferably 100 ⁇ F or more and 2000 ⁇ F or less, and more preferably 500 ⁇ F or more and 1500 ⁇ F or less.
  • the submerged capacity of the anode body can be measured by the method described in the Examples.
  • a first conductive layer (hereinafter also referred to as the "internal solid electrolyte layer”) covers the dielectric layer.
  • the material constituting the first conductive layer is not particularly limited as long as it is a material capable of forming a conductive layer, but for example, it is preferable that the first conductive layer contains a conductive polymer.
  • the first conductive layer includes one or more selected from the group consisting of polyaniline, polyaniline derivatives, polythiophene, polythiophene derivatives, polypyrrole, and polypyrrole derivatives.
  • the polythiophene may be a polythiophene doped with a polyanion such as polystyrene sulfonic acid, or a self-doped polythiophene.
  • These conductive polymers may be polymerized after the monomer is impregnated into the anode body, or the polymer may be impregnated into the anode body.
  • These conductive polymers may be used alone or in combination of two or more.
  • the first conductive layer comprises polyaniline or a polyaniline derivative.
  • the polyaniline preferably has a weight average molecular weight of 10,000 or more, more preferably 20,000 or more, even more preferably 30,000 to 1,000,000, still more preferably 40,000 to 1,000,000, and particularly preferably 52,000 to 1,000,000.
  • a conductive polymer having a larger molecular weight is generally preferred from the viewpoint of increasing the strength of the resulting electrolyte layer, but a larger molecular weight leads to a higher viscosity, which may make it difficult to impregnate the inside of the pores of a porous body.
  • the weight average molecular weight of polyaniline is measured by the method described in the Examples.
  • the polyaniline is preferably an unsubstituted polyaniline.
  • the aryl group has a substituent
  • substituents include linear or branched hydrocarbon groups such as a methyl group, an ethyl group, a hexyl group, and an octyl group; alkoxy groups such as a methoxy group and an ethoxy group; aryloxy groups such as a phenoxy group; and halogenated hydrocarbons such as a trifluoromethyl group ( -CF3 group).
  • the first conductive layer comprises a polyaniline composite in which polyaniline is doped with a proton donor, which tends to improve solubility in a solvent.
  • the doping of polyaniline with the proton donor can be confirmed by ultraviolet, visible, near infrared spectroscopy or X-ray photoelectron spectroscopy.
  • the proton donor can be used without any particular limitation as long as it has sufficient acidity to generate carriers in polyaniline.
  • the proton donor may be, for example, a Bronsted acid or a salt thereof.
  • it is an organic acid or a salt thereof, and more preferably, it is a proton donor represented by the following formula (I).
  • M in formula (I) is a hydrogen atom, an organic free radical, or an inorganic free radical.
  • organic free radicals include pyridinium, imidazolium, and anilinium groups
  • inorganic free radicals include lithium, sodium, potassium, cesium, ammonium, calcium, magnesium, and iron.
  • X in formula (I) is an anionic group such as, for example, a -SO 3 - group, a -PO 3 2- group, a -PO 4 (OH) - group, a -OPO 3 2- group, a -OPO 2 (OH) - group, a -COO - group, etc., and is preferably a -SO 3 - group.
  • a in formula (I) is a substituted or unsubstituted hydrocarbon group (having, for example, 1 to 20 carbon atoms).
  • the hydrocarbon group is a linear or cyclic saturated aliphatic hydrocarbon group, a linear or cyclic unsaturated aliphatic hydrocarbon group, or an aromatic hydrocarbon group.
  • Examples of the chain-like saturated aliphatic hydrocarbon group include linear or branched alkyl groups (having, for example, 1 to 20 carbon atoms).
  • cyclic saturated aliphatic hydrocarbon group examples include cycloalkyl groups (having, for example, 3 to 20 carbon atoms) such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group.
  • the cyclic saturated aliphatic hydrocarbon group may be a group in which a plurality of cyclic saturated aliphatic hydrocarbon groups are condensed, such as a norbornyl group, an adamantyl group, and a condensed adamantyl group.
  • Examples of the chain unsaturated aliphatic hydrocarbon include linear or branched alkenyl groups.
  • Examples of the cyclic unsaturated aliphatic hydrocarbon group (having, for example, 3 to 20 carbon atoms) include a cyclic alkenyl group.
  • Examples of the aromatic hydrocarbon group include a phenyl group, a naphthyl group, and an anthracenyl group.
  • the substituent is an alkyl group (e.g., 1 to 20 carbon atoms), a cycloalkyl group (e.g., 3 to 20 carbon atoms), a vinyl group, an allyl group, an aryl group (e.g., 6 to 20 carbon atoms), an alkoxy group (e.g., 1 to 20 carbon atoms), a halogen atom, a hydroxy group, an amino group, an imino group, a nitro group, a silyl group, or an ester bond-containing group.
  • alkyl group e.g., 1 to 20 carbon atoms
  • a cycloalkyl group e.g., 3 to 20 carbon atoms
  • a vinyl group e.g., an allyl group, an aryl group (e.g., 6 to 20 carbon atoms), an alkoxy group (e.g., 1 to 20 carbon atoms)
  • a halogen atom e.g.
  • R 1 is a hydrocarbon group which may contain a substituent, a silyl group, an alkylsilyl group, a -(R 2 O)x-R 3 group, or a -(OSiR 3 2 )x-OR 3 group.
  • R2 is an alkylene group
  • R3 is a hydrocarbon group
  • x is an integer of 1 or more. When x is 2 or more, multiple R 2s may be the same or different, and multiple R 3s may be the same or different.
  • Examples of the hydrocarbon group (having, for example, 1 to 20 carbon atoms) for R1 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, a dodecyl group, a pentadecyl group, an eicosanyl group, etc.
  • the hydrocarbon group may be linear or branched.
  • the substituent of the hydrocarbon group is an alkyl group (having, for example, 1 to 20 carbon atoms), a cycloalkyl group (having, for example, 3 to 20 carbon atoms), a vinyl group, an allyl group, an aryl group (having, for example, 6 to 20 carbon atoms), an alkoxy group (having, for example, 1 to 20 carbon atoms), a halogen atom, a hydroxy group, an amino group, an imino group, a nitro group, or an ester bond-containing group.
  • the hydrocarbon group of R3 is the same as that of R1 .
  • Examples of the alkylene group (having, for example, 1 to 20 carbon atoms) for R2 include a methylene group, an ethylene group, and a propylene group.
  • n is an integer of 1 or more. When n is 2 or more, multiple Rs may be the same or different.
  • m is the valence of M/the valence of X.
  • the compound represented by formula (I) is preferably a dialkylbenzenesulfonic acid, a dialkylnaphthalenesulfonic acid, or a compound containing two or more ester bonds.
  • the compound containing two or more ester bonds is more preferably a sulfophthalic acid ester or a compound represented by the following formula (II).
  • R 4 , R 5 and R 6 are each independently a hydrogen atom, a hydrocarbon group or an R 9 3 Si- group. Each of the three R 9s is independently a hydrocarbon group.
  • examples of the hydrocarbon group include linear or branched alkyl groups having 1 to 24 carbon atoms, aryl groups containing an aromatic ring (having, for example, 6 to 20 carbon atoms), and alkylaryl groups (having, for example, 7 to 20 carbon atoms).
  • the hydrocarbon group for R 9 is the same as for R 4 , R 5 , and R 6 .
  • R 7 and R 8 are each independently a hydrocarbon group or a —(R 10 O) q —R 11 group.
  • R 10 is a hydrocarbon group or a silylene group.
  • R 11 is a hydrogen atom, a hydrocarbon group, or R 12 3 Si—.
  • q is an integer of 1 or more.
  • the three R 12 are each independently a hydrocarbon group.
  • R7 and R8 are hydrocarbon groups
  • examples of the hydrocarbon group include linear or branched alkyl groups having 1 to 24 carbon atoms, preferably 4 or more carbon atoms, aryl groups containing an aromatic ring (having, for example, 6 to 20 carbon atoms), and alkylaryl groups (having, for example, 7 to 20 carbon atoms).
  • Specific examples include a butyl group, a pentyl group, a hexyl group, an octyl group, a decyl group, and the like, all of which may be linear or branched.
  • R7 and R8 when R10 is a hydrocarbon group, examples of the hydrocarbon group include a linear or branched alkylene group having 1 to 24 carbon atoms, an arylene group containing an aromatic ring (having, for example, 6 to 20 carbon atoms), an alkylarylene group (having, for example, 7 to 20 carbon atoms), or an arylalkylene group (having, for example, 7 to 20 carbon atoms).
  • R 7 and R 8 when R 11 and R 12 are hydrocarbon groups, the hydrocarbon groups are the same as those in the cases of R 4 , R 5 and R 6 , and q is preferably 1-10.
  • the compound represented by the above formula (II) is more preferably a sulfosuccinic acid derivative represented by the following formula (III).
  • M is the same as in formula (I).
  • m' is the valence of M.
  • R 13 and R 14 are each independently a hydrocarbon group or a -(R 15 O) r -R 16 group.
  • R 15 is a hydrocarbon group or a silylene group
  • R 16 is a hydrogen atom, a hydrocarbon group or an R 17 3 Si- group
  • r is an integer of 1 or more.
  • Each of the three R 17s independently represents a hydrocarbon group. When r is 2 or more, multiple R 15 may be the same or different.
  • R 13 and R 14 are hydrocarbon groups
  • the hydrocarbon groups are the same as those for R 7 and R 8 .
  • R 15 is a hydrocarbon group
  • the hydrocarbon group is the same as R 10 above.
  • R 16 and R 17 are hydrocarbon groups
  • the hydrocarbon groups are the same as those for R 4 , R 5 and R 6 above. It is preferable that r is an integer from 1 to 10.
  • R 13 and R 14 are the -(R 15 O) r -R 16 group are the same as those of -(R 10 O) q -R 11 in R 7 and R 8 .
  • the hydrocarbon group of R 13 and R 14 is the same as that of R 7 and R 8 , and a butyl group, a hexyl group, a 2-ethylhexyl group, or a decyl group is preferred.
  • the compound represented by formula (I) is preferably di(2-ethylhexyl)sulfosuccinic acid or sodium di(2-ethylhexyl)sulfosuccinate.
  • the above-mentioned proton donor can control the electrical conductivity and solubility in a solvent of the polyaniline composite by changing its structure (Patent No. 3384566).
  • the optimal proton donor can be selected depending on the required characteristics for each application.
  • the doping ratio of the proton donor to the polyaniline is preferably 0.30 or more and 0.65 or less, more preferably 0.32 or more and 0.60 or less, further preferably 0.33 or more and 0.57 or less, and particularly preferably 0.34 or more and 0.55 or less. Usually, when the doping ratio is 0.30 or more, the solubility of the polyaniline complex in an organic solvent is sufficient.
  • the doping ratio is defined as (the number of moles of the proton donor doped in the polyaniline)/(the number of moles of the monomer unit of the polyaniline).
  • a doping ratio of 0.5 for a polyaniline complex containing unsubstituted polyaniline and a proton donor means that one proton donor is doped for every two monomer unit molecules of polyaniline.
  • the doping ratio can be calculated if the molar numbers of the proton donor and the polyaniline monomer unit in the polyaniline composite can be measured.
  • the proton donor is an organic sulfonic acid
  • the molar number of sulfur atoms derived from the proton donor and the molar number of nitrogen atoms derived from the polyaniline monomer unit are quantified by organic elemental analysis, and the doping ratio can be calculated by taking the ratio of these values.
  • the polyaniline complex preferably contains unsubstituted polyaniline and sulfonic acid as a proton donor, and satisfies the following formula (1). 0.32 ⁇ S5 / N5 ⁇ 0.60 (1) (In the formula, S5 is the total number of moles of sulfur atoms contained in the polyaniline complex, and N5 is the total number of moles of nitrogen atoms contained in the polyaniline complex. The number of moles of nitrogen atoms and sulfur atoms is a value measured by, for example, organic elemental analysis.
  • the method for producing the polyaniline composite is not particularly limited, but it can be produced, for example, by the production method described below.
  • a surfactant e.g., a nonionic emulsifier
  • a water-immiscible organic solvent e.g., a hydrocarbon solvent (preferably toluene, xylene)
  • an acidic aqueous solution e.g., an aqueous phosphoric acid solution
  • the reaction liquid having two liquid phases of the water-immiscible organic solvent and water is stirred
  • a polymerization initiator e.g., ammonium persulfate
  • the water-immiscible organic solvent phase is separated by standing to obtain a polyaniline complex water-immiscible organic solvent solution.
  • This solution is transferred to an evaporator to evaporate and remove the volatile matter to obtain a polyaniline complex (protonated polyaniline).
  • the second conductive layer (hereinafter also referred to as the "external coating layer”) is laminated on the first conductive layer. As shown in FIG. 1, the first conductive layer impregnates the inside of the pores of the anode body, while the second conductive layer further coats the anode body and the first conductive layer from the outside.
  • the second conductive layer includes a polyaniline complex in which polyaniline is doped with a proton donor.
  • the polyaniline complex in which polyaniline is doped with a proton donor may be used alone or in combination of two or more kinds.
  • the items described in the first conductive layer can be applied.
  • the proton donor used in the second conductive layer is preferably a compound represented by the above formulas (I) to (III), and in particular, di(2-ethylhexyl)sulfosuccinic acid and sodium di(2-ethylhexyl)sulfosuccinate are preferred.
  • the ponianiline complex doped with these proton donors has high solubility in organic solvents, making it easy to prepare the conductive polymer composition used in forming the second conductive layer. Specifically, it is possible to expand the options for solvents used in the conductive polymer composition. In addition, it is easy to adjust the viscosity (concentration) of the conductive polymer composition, making it easy to adjust the thickness of the second conductive layer.
  • high solubility in organic solvents means high hydrophobicity, which is expected to lead to improved moist heat resistance of the capacitor.
  • the second conductive layer further comprises a thixotropic agent.
  • the thixotropy-imparting agent can be blended, for example, in the conductive polymer composition for forming the second conductive layer.
  • the second conductive layer can be formed by immersing the porous body on which the first conductive layer has been formed in the conductive polymer composition, thereby making it possible to incorporate the thixotropy-imparting agent in the second conductive layer.
  • the conductive polymer composition has a property of increasing viscosity when the shear force is small and decreasing viscosity when the shear force is large.
  • the conductive polymer composition containing a thixotropy-imparting agent flows and has good usability when an anode body having a first conductive layer formed thereon is immersed in the composition, and increases in viscosity when the anode body is removed from the composition, facilitating the formation of a second conductive layer having a certain thickness.
  • the thixotropy-imparting agent can be any material capable of imparting thixotropy without any particular limitation.
  • inorganic particles carbon nanotubes, carbon powder, fluororesin powder, etc. are listed.
  • inorganic particles are preferred.
  • examples of inorganic particles include silica, titania, alumina, and zirconia.
  • the surfaces of the inorganic particles may be modified with a silane coupling agent or the like, if necessary.
  • the thixotropic agent may be used alone or in combination of two or more.
  • the average particle size of the inorganic particles is not particularly limited as long as it is within a range capable of imparting thixotropy, and is, for example, 1 to 100 nm, preferably 1 to 50 nm, and more preferably 2 to 40 nm.
  • the average particle size of the inorganic particles can be determined by calculating the specific surface area by the BET method and converting the specific surface area. The calculation of the specific surface area by the BET method is performed under the conditions described in JIS Z8830 (2013).
  • the content of the thixotropy-imparting agent in the entire second conductive layer is 0.01 to 50 mass %, preferably 0.1 to 40 mass %, and more preferably 1 to 20 mass %.
  • the second conductive layer further comprises a thickener.
  • the thickener can be blended, for example, in the conductive polymer composition for forming the second conductive layer, in the same manner as the thixotropy-imparting agent.
  • the second conductive layer can be formed by immersing the porous body on which the first conductive layer has been formed in the conductive polymer composition, thereby making it possible to incorporate the thickener into the second conductive layer.
  • the second conductive layer can be easily formed with a desired thickness, particularly in the case of producing a rectangular capacitor, whereby the second conductive layer can be easily formed with a desired thickness at the side edge portion and the side flat portion.
  • the side edge portion refers to the corner portion of the side (the portion where adjacent side surfaces intersect) when the surface that was on the lower side during dipping in forming the second conductive layer of the rectangular capacitor is taken as the bottom surface.
  • the flat side surface portion refers to the surface portion of the side surface when the surface that was on the lower side during dipping in forming the second conductive layer of the rectangular capacitor is regarded as the bottom surface.
  • the thickness of the second conductive layer at the side edge portion (side edge thickness) and the thickness of the second conductive layer at the side flat portion (side flat thickness) can be measured by the method described in the examples.
  • the conductive polymer composition for forming the second conductive layer contains a thickener, it becomes easier to reduce the number of dipping steps required to obtain a second conductive layer with the desired thickness.
  • Thickeners include polyether compounds and cellulose compounds.
  • polyether compounds examples include polyethylene oxide (EO)-polypropylene oxide (PO) copolymers (e.g., EP1550H (manufactured by Meisei Chemical Industry Co., Ltd.)).
  • EO polyethylene oxide
  • PO polypropylene oxide
  • cellulose compounds include cellulose ethers (e.g., ethyl cellulose, methyl cellulose), hydroxyethyl cellulose, and hydroxypropyl methyl cellulose.
  • cellulose ethers are preferably used from the viewpoint of high thickening effect and easy availability.
  • ethyl cellulose is preferably used.
  • cellulose compounds include EC-N300 (manufactured by Ashland), N200 (manufactured by Ashland), and Klucel G (manufactured by Ashland).
  • a single thickener may be used, or two or more may be combined.
  • the content of the thickener relative to the entire second conductive layer is, for example, 0.001% by weight or more, 0.002% by weight or more, 0.005% by weight or more, 0.01% by weight or more, 0.02% by weight or more, 0.05% by weight or more, 0.1% by weight or more, 0.2% by weight or more, or 0.3% by weight or more.
  • the content of the thickener relative to the entire second conductive layer is, for example, 10% by mass or less, 5% by mass or less, 3% by mass or less, 2% by mass or less, or 1% by mass or less.
  • the content of the thickener relative to the entire second conductive layer is 0.001 to 10 mass %, 0.001 to 5 mass %, 0.01 to 5 mass %, 0.1 to 5 mass %, or 0.3 to 1 mass %.
  • the second conductive layer includes a thixotropic agent and a thickener.
  • the second conductive layer is formed from a conductive polymer composition that satisfies the following conditions (P1) and (P2).
  • P1 The viscosity at a shear rate of 10 (1/s) is 1 Pa ⁇ s or more.
  • P2 After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa ⁇ s or more and satisfies the following formula (P2-1).
  • the second conductive layer satisfies conditions (P1) and (P2), when the porous body on which the first conductive layer is formed is immersed to form the second conductive layer, a thick second conductive layer can be easily formed even with a small number of dipping operations.
  • the conductive polymer composition used to form the second conductive layer has a viscosity at a shear rate of 10 (1/s) of 1 Pa ⁇ s or more, and may be 2 Pa ⁇ s or more, or 5 Pa ⁇ s or more.
  • the conductive polymer composition used to form the second conductive layer has a viscosity of 10 Pa ⁇ s or more immediately after applying shear at a shear rate of 10 (1/s) for 30 seconds and then reducing the shear rate to 0.0001 (1/s), and may be 50 Pa ⁇ s or more, 100 Pa ⁇ s or more, or 500 Pa ⁇ s or more.
  • the conductive polymer composition used to form the second conductive layer satisfies formula (P2-1), and may also satisfy the following formula (P2-2), or may also satisfy the following formula (P2-3).
  • a layer of silver (Ag) is laminated to the carbon layer.
  • the solid electrolytic capacitor according to this embodiment can be manufactured, for example, by the manufacturing method of the present invention described below.
  • a method for producing a solid electrolytic capacitor according to one aspect of the present invention includes the following steps (A-1) or (A-2), (B), and (C).
  • A-1) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer and a solvent
  • A-2) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound
  • B A step of removing the porous body from the first conductive polymer composition used in the step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition
  • C A step of immersing a part or the whole of the porous body after the step (B) in a second conductive
  • steps (A-1) or (A-2) and (B) are steps for forming a first conductive layer on the surface of the anode body.
  • step (C) is a step for forming a second conductive layer.
  • a method for producing a solid electrolytic capacitor according to one aspect of the present invention includes steps (A-1), (B), and (C). In one embodiment, a method for producing a solid electrolytic capacitor according to one aspect of the present invention includes steps (A-2), (B), and (C).
  • the step of forming the first layer includes any one of steps (A-1) and (A-2).
  • a part or the whole of a porous body having an oxide of a valve metal is immersed in a first conductive polymer composition containing a conductive polymer and a solvent.
  • a part or the whole of the porous body having an oxide of a valve metal is immersed in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound.
  • the first conductive polymer composition in step (A-1) contains a conductive polymer and a solvent.
  • the first conductive polymer composition in step (A-2) contains a conductive polymer, a solvent, and a phenolic compound.
  • component (a) examples include polyaniline, polyaniline derivatives, polythiophene, and polythiophene derivatives. These may be used alone or in combination of two or more.
  • polyaniline, polyaniline derivatives, polythiophene, and polythiophene derivatives can be those described in the solid electrolytic capacitor according to one embodiment of the present invention.
  • the first conductive polymer composition contains polyaniline or a polyaniline derivative.
  • the weight average molecular weight of the polyaniline and polyaniline derivative used in the first conductive polymer composition is smaller than the weight average molecular weight of the polyaniline and polyaniline derivative used in the second conductive polymer composition described below.
  • the weight average molecular weight of the polyaniline and polyaniline derivative used in the first conductive polymer composition is 100,000 or less.
  • the first conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with a proton donor. In one embodiment, the first conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with sulfosuccinic acid.
  • the solvent (hereinafter also referred to as “component (b)" is not particularly limited as long as it dissolves or disperses the conductive polymer. It is particularly preferable that the solvent (component (b)) dissolves the conductive polymer. However, the solvent does not include the component (c) described below.
  • the solvent is preferably an organic solvent, examples of which include aromatic hydrocarbons, aliphatic hydrocarbons, alcohols, ketones, ethers, and esters. These may be used alone or in combination of two or more.
  • the organic solvent may be a water-soluble organic solvent, or may be an organic solvent that is substantially not miscible with water (a water-immiscible organic solvent).
  • a water-soluble organic solvent a highly polar organic solvent can be used, and it may be either a protic polar solvent or an aprotic polar solvent.
  • water-soluble organic solvent examples include alcohols such as methanol, ethanol, isopropyl alcohol, 1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, 1-butanol, 2-butanol, 2-pentanol, benzyl alcohol, and alkoxyalcohols (e.g., 1-methoxy-2-propanol, 3-methoxy-1-butanol, and 3-methoxy-3-methylbutanol); ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ethers such as tetrahydrofuran, 4-methyltetrahydropyran, dioxane, diethyl ether, and ethylene glycol mono-tert-butyl ether; and aprotic polar solvents such as N-methylpyrrolidone.
  • alcohols such as methanol, ethanol, isopropyl alcohol, 1-propan
  • a low-polarity organic solvent can be used, and examples thereof include hydrocarbon solvents such as hexane, benzene, toluene, xylene, ethylbenzene, tetralin, etc.; halogen-containing solvents such as methylene chloride, chloroform, carbon tetrachloride, dichloroethane, tetrachloroethane, etc.; ester solvents such as ethyl acetate, isobutyl acetate, n-butyl acetate, ethyl lactate, methyl lactate, etc.; ketone solvents such as methyl isobutyl ketone (MIBK), methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.; and ether solvents such as cyclopentyl methyl ether, etc. Furthermore, an isoparaffin-based solvents such as hexane, benzen
  • toluene, xylene, methyl isobutyl ketone, chloroform, trichloroethane, and ethyl acetate are preferred because they have excellent solubility for conductive polymers.
  • polyaniline complexes can be dissolved even in alcoholic solvents such as isopropyl alcohol, 1-butanol, 2-butanol, 2-pentanol, benzyl alcohol, and alkoxy alcohols.
  • Alcohols are preferable from the viewpoint of reducing the environmental impact compared to aromatic solvents such as toluene.
  • the mixed organic solvent may contain one or more water-immiscible organic solvents, and may contain one or more water-soluble organic solvents.
  • the concentration of component (a) relative to the total amount of the solvent (component (b)) [component (a) x 100/(component (a) + component (b))] may be 0.01 mass% or more, 0.03 mass% or more, 0.05 mass% or more, or 2.0 mass% or more. It is usually 15.0 mass% or less, 13.0 mass% or less, 12.0 mass% or less, 10.0 mass% or less, 9.0 mass% or less, or 8.0 mass% or less.
  • the concentration of component (a) is usually 0.3 to 20 mass % relative to the conductive polymer composition, preferably 0.5 to 20 mass %, more preferably 1 to 15 mass %, even more preferably 1 to 10 mass %, and even more preferably 1 to 7 mass %.
  • the amount of component (b) is not limited and can be adjusted appropriately depending on the amount of other components, but can be, for example, 200 to 20,000 parts by mass, 300 to 17,000 parts by mass, 500 to 12,000 parts by mass, 500 to 5,000 parts by mass, or 500 to 1,500 parts by mass per 100 parts by mass of component (a).
  • the phenolic compound (component (c)) is not particularly limited and is a compound represented by ArOH (wherein Ar is an aryl group or a substituted aryl group). Note that component (c) is a component different from component (b).
  • phenolic compounds include substituted phenols such as phenol, o-, m-, or p-cresol, o-, m-, or p-ethylphenol, o-, m-, or p-propylphenol, o-, m-, or p-butylphenol, o-, m-, or p-chlorophenol, salicylic acid, hydroxybenzoic acid, and hydroxynaphthalene; polyhydric phenolic compounds such as catechol and resorcinol; and polymeric compounds such as phenolic resins, polyphenols, and poly(hydroxystyrene).
  • substituted phenols such as phenol, o-, m-, or p-cresol, o-, m-, or p-ethylphenol, o-, m-, or p-propylphenol, o-, m-, or p-butylphenol, o-, m-, or
  • a phenolic compound represented by the following formula (C1) can be used.
  • n is an integer of 1 to 5.
  • the multiple R 21 may be the same or different.
  • R 21 is an alkyl group having 2 to 10 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkylaryl group having 7 to 20 carbon atoms, or an arylalkyl group having 7 to 20 carbon atoms.
  • alkyl group represented by R21 examples include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, and tertiary amyl.
  • the alkenyl group includes the above-mentioned alkyl groups each having an unsaturated bond in the molecule.
  • Cycloalkyl groups include cyclopentane, cyclohexane, and the like.
  • Alkylthio groups include methylthio, ethylthio, and the like.
  • Aryl groups include phenyl, naphthyl, and the like.
  • alkylaryl group and the arylalkyl group include the substituents obtained by combining the above-mentioned alkyl group and aryl group.
  • R 21 is preferably a methyl group or an ethyl group.
  • phenolic compounds represented by formula (C1) include 4-tert-amylphenol, 2-isopropylphenol, 4-isopropyl-3-methylphenol, 2-isopropyl-5-methylphenol (thymol), 5-isopropyl-2-methylphenol (carbacrol), and 4-(1,1.3,3-tetramethylbutyl)phenol.
  • the content of component (c) is preferably 10 to 5000 parts by mass, more preferably 10 to 2000 parts by mass, and more preferably 10 to 1000 parts by mass, per 100 parts by mass of component (a).
  • the content of component (c) may be 100 to 10,000 parts by mass per 100 parts by mass of component (a).
  • the use of such a phenolic compound is preferable because it improves the electrical conductivity and improves the solubility in alcohol.
  • component (c) in the conductive polymer composition is 1 to 80% by mass, more preferably 5 to 60% by mass, and even more preferably 10 to 40% by mass.
  • Use of the phenolic compound is preferable because it improves the electrical conductivity and improves the solubility in alcohol.
  • component (c) may be mixed with component (b) to be used as a mixed solvent. In this case, the concentration of component (a) in the solvent is calculated based on the combined mass of components (b) and (c).
  • the conductive polymer composition may further contain (d) a heat resistance stabilizer (hereinafter also referred to as "component (d)").
  • the heat resistance stabilizer (component (d)) may be an acidic substance or a salt of an acidic substance. However, component (d) does not include component (c).
  • the acidic substance may be either an organic acid, which is an acid of an organic compound, or an inorganic acid, which is an acid of an inorganic compound, and is preferably an organic acid.
  • the acidic substance is preferably an organic acid containing one or more sulfonic acid groups.
  • the above-mentioned organic acid having a sulfonic acid group is preferably a cyclic, linear or branched alkylsulfonic acid, a substituted or unsubstituted aromatic sulfonic acid, or a polysulfonic acid, each of which has one or more sulfonic acid groups.
  • the alkylsulfonic acid include methanesulfonic acid, ethanesulfonic acid, and di(2-ethylhexyl)sulfosuccinic acid.
  • the alkyl group is preferably a linear or branched alkyl group having 1 to 18 carbon atoms.
  • aromatic sulfonic acid examples include those having 6 to 20 carbon atoms, such as sulfonic acids having a benzene ring, sulfonic acids having a naphthalene skeleton, and sulfonic acids having an anthracene skeleton.
  • aromatic sulfonic acid examples include substituted or unsubstituted benzenesulfonic acid, substituted or unsubstituted naphthalenesulfonic acid, and substituted or unsubstituted anthracenesulfonic acid.
  • the substituent may be, for example, one or more selected from the group consisting of an alkyl group (e.g., one having 1 to 20 carbon atoms), an alkoxy group (e.g., one having 1 to 20 carbon atoms), a hydroxy group, a nitro group, a carboxy group, and an acyl group.
  • aromatic sulfonic acid examples include compounds represented by the following formula (D1) or (D2).
  • D1 l is 1 or more
  • m is an integer of 0 or more and 5 or less
  • n is an integer of 0 or more and 5 or less. When one of m and n is 0, the other is 1 or more.
  • l is preferably an integer of 1 to 3.
  • m is preferably an integer of 1 to 3.
  • n is preferably an integer of 0 to 3.
  • q is preferably 1 to 3.
  • p is preferably 0 to 3.
  • R is preferably an alkyl group having 1 to 20 carbon atoms, a carboxy group, or a hydroxyl group.
  • Aromatic sulfonic acids include 4-sulfophthalic acid, 5-sulfoisophthalic acid, 5-sulfosalicylic acid, 1-naphthalenesulfonic acid, 2-naphthalenesulfonic acid, 2-hydroxy-6-naphthalenesulfonic acid, 1,5-naphthalenedisulfonic acid, 2,6-naphthalenedisulfonic acid, p-phenolsulfonic acid, toluenesulfonic acid, p-xylene-2-sulfonic acid, 4,4'-biphenyldisulfonic acid, dibenzofuran-2-sulfonic acid, flavianic acid, (+)-10-camphorsulfonic acid, monoisopropylnaphthalenesulfonic acid, 1-pyrenesulfonic acid, etc.
  • 4-sulfophthalic acid, 5-sulfosalicylic acid, 5-sulfoisophthalic acid, 2-naphthalenesulfonic acid, dibenzofuran-2-sulfonic acid, flavianic acid, 2-hydroxy-6-naphthalenesulfonic acid, and 1-pyrenesulfonic acid are preferred.
  • salts of acidic substances include salts of the compounds listed above.
  • counter ions of the salts include sodium, lithium, potassium, cesium, ammonium, calcium, barium, etc.
  • Component (d) may be a hydrate.
  • component (d) is preferably 0.1 to 1000 parts by mass, more preferably 1 to 100 parts by mass, even more preferably 1 to 30 parts by mass, and even more preferably 2 to 8 parts by mass, per 100 parts by mass of component (a).
  • the conductive polymer composition may contain an additive (hereinafter, also referred to as "component (e)”) as necessary.
  • component (e) does not include any of the above components (a) to (d).
  • the additives include an adhesion imparting agent, a filler, a rheology control agent, a binder resin, and the like.
  • adhesion imparting agent examples include silane coupling agents such as isocyanate silane and glycidyl silane, and polymer coupling agents such as acidic polyester.
  • silane coupling agents such as isocyanate silane and glycidyl silane
  • polymer coupling agents such as acidic polyester.
  • adhesion promoter for example, "BYK-4510" (manufactured by BYK Additives & Instruments) can be used.
  • the filler examples include alumina, silica, titania, and zirconia.
  • the method of immersing the porous body having an oxide of a valve metal in the first conductive polymer composition is not particularly limited, and the entire porous body may be immersed in the conductive polymer composition in a single insertion operation, or the porous body may be immersed in the conductive polymer composition stepwise or continuously.
  • Stepwise immersion means that the porous body is moved in a number of separate steps to gradually immerse the porous body in the conductive polymer composition.
  • stepwise immersion means that the immersion operation is carried out step by step, and after a series of stepwise immersion operations, the porous body is removed from the conductive polymer composition in step (B).
  • the porous body When the porous body is moved in several separate steps to gradually immerse the porous body in the conductive polymer composition, first, a portion of the porous body from the lower end to a predetermined height is immersed in the conductive polymer composition and maintained in the immersed state for, for example, 1 to 30 minutes, preferably 1 to 10 minutes. Next, the porous body is moved so that a portion of the non-immersed portion is further immersed in the conductive polymer composition, and the immersion state is maintained for, for example, 1 to 20 minutes, preferably 1 to 10 minutes.
  • the solid electrolytic capacitor according to one aspect of the present invention can be used as a circuit element mounted on an electric/electronic circuit board, particularly as a circuit element mounted on an automobile or the like.
  • a solution prepared by dissolving 39.3 g of APS (ammonium persulfate) in 90.2 g of an 8.5 mass% aqueous phosphoric acid solution was added using a dropping funnel while stirring the reaction solution, and the mixture was stirred for 4 hours while maintaining the internal temperature of the solution at 5° C. After stopping the stirring, the contents were transferred to a separating funnel, and the aqueous phase and the toluene phase (organic phase) were allowed to stand and separated.
  • APS ammonium persulfate
  • the toluene phase (organic phase) was washed once with 180.3 g of an 8.5 mass % aqueous phosphoric acid solution and five times with 328.0 g of ion-exchanged water to obtain a polyaniline complex toluene solution.
  • polyaniline complex 1 protonated polyaniline.
  • Mw weight-average molecular weight
  • the weight average molecular weights of the polyanilines in the Polyaniline Composite 1 and the Polyaniline Composite 2 described below were measured as follows. 1.65 to 1.85 g of lithium bromide was dissolved in 2000 mL of NMP (N-methyl-2-pyrrolidone) to prepare a 0.01 M lithium bromide NMP solution. 14 ⁇ L of triethylamine was added to 10 mL of this 0.01 M lithium bromide NMP solution, and the solution was stirred to dissolve the triethylamine and obtain a homogeneous solution. 50 ⁇ L of the polyaniline complex toluene solution was then dropped and mixed by stirring, and the mixture was passed through a 0.45 ⁇ M filter to prepare a sample for gel permeation chromatography (GPC) measurement.
  • GPC gel permeation chromatography
  • the weight average molecular weight obtained by the above method is a value calculated in terms of polystyrene (PS).
  • PSD polystyrene
  • the doping ratio of the proton donor (sodium di-2-ethylhexyl sulfosuccinate) to the polyaniline was 0.36.
  • the toluene phase (organic phase) was washed once with 59.4 g of an 8.5 mass % phosphoric acid aqueous solution and three times with 108.14 g of ion-exchanged water to obtain a polyaniline complex toluene solution.
  • polyaniline composite 2 (protonated polyaniline).
  • the weight average molecular weight (Mw) of polyaniline in polyaniline composite 2 was 112,000.
  • the doping ratio of the proton donor (sodium di-2-ethylhexyl sulfosuccinate) to polyaniline was 0.36.
  • Example 1 (1) Preparation of Conductive Polymer Composition D (First Conductive Polymer Composition) for Forming First Conductive Layer 49 g of 1-propanol (component (b), boiling point 97° C., manufactured by Tokyo Chemical Industry Co., Ltd.), 49 g of p-tert-amylphenol (component (c), manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 42 g of Kyowazole C900 (component (b), manufactured by KH Neochem Corporation) were mixed with stirring until homogenous, to prepare a mixed solvent ⁇ . 7 g of the polyaniline composite 1 (component (a)) obtained in Production Example 1 was dissolved in 133 g of the mixed solvent ⁇ to obtain a polyaniline composite solution A (polyaniline composite concentration: 5 mass %).
  • a conductive polymer composition D (first conductive polymer composition) for forming a first conductive layer.
  • the anode body was immersed in conductive polymer composition D up to 1 ⁇ 3 of the height from the bottom end side and held for 2 minutes.
  • the anode body was immersed in conductive polymer composition D up to 2 ⁇ 3 of the height from the bottom end side and held for 2 minutes.
  • the entire anode body was immersed in conductive polymer composition D and held for 1 minute. In this manner, the second immersion of the anode body was performed.
  • the anode body was pulled out from the conductive polymer composition D and dried at 40° C. for 7 minutes, and then further dried at 140° C. for 5 minutes to form an internal solid electrolyte layer (first conductive layer).
  • conductive polymer composition G second conductive polymer composition
  • the anode body was pulled out of the conductive polymer composition G and dried at 100°C for a specified time of 30 to 60 minutes, and then dried at 150°C for a specified time of 30 to 60 minutes to coat the outside of the anode body.
  • This process of immersing the conductive polymer composition for forming the second conductive layer and drying it is called dipping, and dipping was performed three times.
  • anode body was immersed in a 4-sulfophthalic acid solution (4-sulfophthalic acid concentration: 1% by mass) prepared by dissolving 4-sulfophthalic acid (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) in isopropyl alcohol, and was kept therein for 10 minutes.
  • the anode body was then pulled out of the 4-sulfophthalic acid solution and dried at 150° C. for 60 minutes to obtain an anode body having an inner solid electrolyte layer (first conductive layer) and an outer coating layer (second conductive layer).
  • the anode body (having the first conductive layer and the second conductive layer) obtained in (4) above was immersed in a carbon paste: FUAE (solvent: ketone-based, manufactured by Nippon Graphite Industries Co., Ltd.) as an undiluted solution for 10 seconds, and then dried at 150° C. for 30 minutes.
  • FUAE solvent: ketone-based, manufactured by Nippon Graphite Industries Co., Ltd.
  • a silver paste H9113-6 (granular, manufactured by Namics Corporation) was diluted 1.2 times with a dilution solvent: diethylene glycol monobutyl ether (manufactured by Tokyo Chemical Industry Co., Ltd.), and the diluted solution was stirred and mixed to obtain a silver paste solution, in which the anode body obtained in (5) above was immersed for 10 seconds, dried at 100° C. for 30 minutes, and then further dried at 150° C. for 30 minutes to obtain a capacitor.
  • a dilution solvent diethylene glycol monobutyl ether
  • Example 2 A capacitor was manufactured and evaluated in the same manner as in Example 1, except that in forming the outer coating layer (second conductive layer), the dipping was performed once. The evaluation results are shown in Table 1.
  • Example 3 A capacitor was manufactured and evaluated in the same manner as in Example 1, except that in forming the outer coating layer (second conductive layer), a conductive polymer composition G' obtained by adding 0.564 g of heat resistance stabilizer solution B and 0.075 g of adhesion imparting solution F to 7.5 g of polyaniline complex solution E (polyaniline complex concentration: 10 mass %) and mixing them under stirring was used instead of the conductive polymer composition G.
  • the evaluation results are shown in Table 1.
  • Comparative Example 1 A capacitor was produced and evaluated in the same manner as in Example 2, except that in forming the outer coating layer (second conductive layer), PEDOT/PSS (ethylene glycol-added product, manufactured by Sigma-Aldrich) was used without dilution instead of the conductive polymer composition G. The evaluation results are shown in Table 1.
  • PEDOT/PSS ethylene glycol-added product, manufactured by Sigma-Aldrich
  • the submerged capacity of the anode body was measured using 10% by mass phosphoric acid as the electrolyte and a platinum black electrode as the counter electrode.
  • the submerged capacity of the anode body was 50 ⁇ F.
  • Example 4 Formation of Internal Solid Electrolyte Layer (First Conductive Layer) An internal solid electrolyte layer (first conductive layer) was formed in the same manner as in Example 1, except that the anode body obtained in Production Example 4 was used instead of the anode body obtained in Production Example 3.
  • the polyaniline composite/fine silica mixed solution J was measured using an Anton Paar rheometer MCR302 with a P-PTD200/H-PTD200 for temperature control, with parallel plates of 25 mm diameter and a gap of 1 mm.
  • the viscosity was 9 Pa ⁇ s at a shear rate of 10 (1/s), and after applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate was reduced to 0.0001 (1/s) was 1500 Pa ⁇ s, with a viscosity change of 11 times after 5 minutes.
  • conductive polymer composition K second conductive polymer composition
  • the capacitors of Examples 4 to 6 which contain both a thixotropic agent (silica) and a thickener (ethyl cellulose), have thicker side edge portions and flat side portions, even when dipping is performed only once or twice, compared to the capacitors of Examples 8 and 10, which contain only one of a thixotropic agent (silica) and a thickener (ethyl cellulose).
  • Example 6 when comparing Example 6, in which the amount of thickener (ethyl cellulose) added is 0.36 mass%, with Example 9, in which the amount of thickener (ethyl cellulose) added is 0.18 mass%, it was found that while the amount of thixotropy-imparting agent (silica) added is both 1.8 mass%, the capacitor in Example 6 had thicker side edge portions and side flat portions even with fewer dipping cycles.

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Abstract

A solid electrolytic capacitor according to the present invention comprises: a porous body made of a valve metal; a dielectric layer formed on a surface of the porous body; and two or more conductive layers covering the dielectric layer. The two or more conductive layers include a first conductive layer formed on a surface of the dielectric layer, and a second conductive layer laminated on the first conductive layer. The second conductive layer contains a polyaniline composite in which a polyaniline is doped with a proton donor.

Description

固体電解コンデンサ及びその製造方法Solid electrolytic capacitor and method of manufacturing same

 本発明は、固体電解コンデンサ及びその製造方法に関する。 The present invention relates to a solid electrolytic capacitor and a method for manufacturing the same.

 アルミ電解コンデンサ、タンタルコンデンサ等の固体電解コンデンサでは、固体電解質層の材料として導電性高分子が使用されている。固体電解コンデンサの外層は、一般的に、導電性高分子層、カーボン層、銀ペースト層の3層の積層構造を有する。コンデンサ素子内部に貯められた電荷は、この各層を通って外部に取り出される。
 特許文献1には、誘電体酸化層を有するタンタル焼結体上に、導電性高分子層、カーボン層、及び銀層をこの順で形成したタンタルキャパシタ(タンタルコンデンサ)が開示されている(特許文献1)。
In solid electrolytic capacitors such as aluminum electrolytic capacitors and tantalum capacitors, conductive polymers are used as the material for the solid electrolyte layer. The outer layer of a solid electrolytic capacitor generally has a three-layered structure consisting of a conductive polymer layer, a carbon layer, and a silver paste layer. The electric charge stored inside the capacitor element is taken out through each of these layers.
Patent Document 1 discloses a tantalum capacitor in which a conductive polymer layer, a carbon layer, and a silver layer are formed in this order on a tantalum sintered body having a dielectric oxide layer (Patent Document 1).

特開2023-99299号公報JP 2023-99299 A

 しかし、特許文献1に開示されたような従来の構成では、タンタルコンデンサの耐湿熱性が低く、使用可能な環境が制限されるという問題があった。 However, the conventional configuration disclosed in Patent Document 1 had the problem that the tantalum capacitor had low resistance to moisture and heat, limiting the environments in which it could be used.

 そこで、本発明者らは、鋭意検討した結果、固体電解コンデンサの各層に特定の構成を採用することで、耐湿熱性にすぐれる固体電解コンデンサが得られることを見出し、本発明を完成した。 As a result of extensive research, the inventors discovered that by adopting a specific configuration for each layer of a solid electrolytic capacitor, a solid electrolytic capacitor with excellent resistance to moist heat could be obtained, and thus completed the present invention.

 本発明の目的は、耐湿熱性にすぐれる固体電解コンデンサ及びその製造方法を提供することである。 The object of the present invention is to provide a solid electrolytic capacitor with excellent resistance to moist heat and a method for manufacturing the same.

 本発明によれば、以下の固体電解コンデンサ等が提供される。 The present invention provides the following solid electrolytic capacitors, etc.

1.弁金属からなる多孔質体と、前記多孔質体の表面に形成された誘電体層と、前記誘電体層を被覆する2以上の導電層と、を含み、
 前記2以上の導電層は、前記誘電体層の表面に形成された第1の導電層と、前記第1の導電層に積層された第2の導電層と、を有し、
 前記第2の導電層が、ポニアニリンがプロトン供与体でドープされているポリアニリン複合体を含む、固体電解コンデンサ。
2.前記誘電体層が、前記弁金属の酸化物からなる、前記1に記載の固体電解コンデンサ。
3.前記ポリアニリン複合体が、スルホコハク酸でドープされている、前記1又は2記載の固体電解コンデンサ。
4.前記第2の導電層が、さらにチキソトロピー性付与剤を含む、前記1~3のいずれかに記載の固体電解コンデンサ。
5.前記チキソトロピー性付与剤が、無機粒子を含む、前記4に記載の固体電解コンデンサ。
6.前記無機粒子が、シリカ、チタニア、アルミナ、及びジルコニアからなる群から選択される1以上を含む、前記5に記載の固体電解コンデンサ。
7.前記第2の導電層全体に対する、前記チキソトロピー性付与剤の含有率が、0.01~50質量%である、前記4~6のいずれかに記載の固体電解コンデンサ。
8.前記第2の導電層が、さらに増粘剤を含む、前記1~7のいずれかに記載の固体電解コンデンサ。
9.前記増粘剤が、ポリエーテル系化合物又はセルロース系化合物である、前記8に記載の固体電解コンデンサ。
10.前記第2の導電層全体に対する、前記増粘剤の含有率が、0.001~5質量%である、前記8又は9に記載の固体電解コンデンサ。
11.前記第2の導電層が、以下の条件(P1)及び(P2)を満たす導電性高分子組成物から形成される、前記1~10のいずれかに記載の固体電解コンデンサ。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。

Figure JPOXMLDOC01-appb-M000003
12.前記弁金属が、アルミニウム、タンタル、ニオブ、チタン、ハフニウム、ジルコニウム、亜鉛、タングステン、ビスマス、及びアンチモンからなる群から選択される、前記1~11のいずれかに記載の固体電解コンデンサ。
13.以下の工程(A-1)又は(A-2)と、工程(B)と、工程(C)とを含む、固体電解コンデンサの製造方法。
(A-1)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子及び溶媒を含む第1の導電性高分子組成物に浸漬する工程
(A-2)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子、溶媒、及びフェノール性化合物を含む第1の導電性高分子組成物に浸漬する工程
(B)前記多孔質体を、前記工程(A-1)又は(A-2)で用いた第1の導電性高分子組成物から取り出して、前記第1の導電性高分子組成物に含まれる溶媒の沸点以下の温度下で保持する工程
(C)前記工程(B)を経た後の前記多孔質体の一部又は全体を、前記第1の導電性高分子組成物と同一又は異なる導電性高分子、チキソトロピー性付与剤、及び溶媒を含む第2の導電性高分子組成物に浸漬し、乾燥する工程
14.前記第2の導電性高分子組成物全体に対する、前記チキソトロピー性付与剤の含有率が、0.2~5質量%である、前記13に記載の固体電解コンデンサの製造方法。
15.前記第2の導電性高分子組成物が、以下の条件(P1)及び(P2)を満たす、前記13又は14に記載の固体電解コンデンサの製造方法。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。
Figure JPOXMLDOC01-appb-M000004
16.前記13~15のいずれかに記載の固体電解コンデンサの製造方法により得られた固体電解コンデンサ。 1. A porous body made of a valve metal, a dielectric layer formed on the surface of the porous body, and two or more conductive layers covering the dielectric layer,
the two or more conductive layers include a first conductive layer formed on a surface of the dielectric layer and a second conductive layer laminated on the first conductive layer,
The second conductive layer comprises a polyaniline composite in which the polyaniline is doped with a proton donor.
2. The solid electrolytic capacitor according to 1 above, wherein the dielectric layer is made of an oxide of the valve metal.
3. The solid electrolytic capacitor according to 1 or 2 above, wherein the polyaniline complex is doped with sulfosuccinic acid.
4. The solid electrolytic capacitor according to any one of 1 to 3 above, wherein the second conductive layer further contains a thixotropy-imparting agent.
5. The solid electrolytic capacitor according to 4 above, wherein the thixotropy-imparting agent contains inorganic particles.
6. The solid electrolytic capacitor according to 5 above, wherein the inorganic particles contain at least one selected from the group consisting of silica, titania, alumina, and zirconia.
7. The solid electrolytic capacitor according to any one of 4 to 6 above, wherein the content of the thixotropy-imparting agent in the second conductive layer as a whole is 0.01 to 50 mass %.
8. The solid electrolytic capacitor according to any one of 1 to 7 above, wherein the second conductive layer further contains a thickener.
9. The solid electrolytic capacitor according to 8 above, wherein the thickener is a polyether compound or a cellulose compound.
10. The solid electrolytic capacitor according to 8 or 9 above, wherein the content of the thickener in the second conductive layer is 0.001 to 5 mass %.
11. The solid electrolytic capacitor according to any one of 1 to 10 above, wherein the second conductive layer is formed from a conductive polymer composition that satisfies the following conditions (P1) and (P2):
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000003
12. The solid electrolytic capacitor according to any one of 1 to 11 above, wherein the valve metal is selected from the group consisting of aluminum, tantalum, niobium, titanium, hafnium, zirconium, zinc, tungsten, bismuth, and antimony.
13. A method for producing a solid electrolytic capacitor, comprising the following steps (A-1) or (A-2), (B), and (C):
(A-1) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer and a solvent; (A-2) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound; (B) A step of removing the porous body from the first conductive polymer composition used in the step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition; (C) A step of immersing a part or the whole of the porous body after the step (B) in a second conductive polymer composition containing a conductive polymer, a thixotropy-imparting agent, and a solvent, the same or different from the first conductive polymer composition, and drying the second conductive polymer composition; 14. The method for producing a solid electrolytic capacitor according to the above item 13, wherein the content of the thixotropy-imparting agent relative to the entire second conductive polymer composition is 0.2 to 5 mass %.
15. The method for producing a solid electrolytic capacitor as described in 13 or 14 above, wherein the second conductive polymer composition satisfies the following conditions (P1) and (P2):
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000004
16. A solid electrolytic capacitor obtained by the method for producing a solid electrolytic capacitor according to any one of 13 to 15 above.

 本発明によれば、耐湿熱性にすぐれる固体電解コンデンサ及びその製造方法が提供できる。 The present invention provides a solid electrolytic capacitor with excellent resistance to moist heat and a method for manufacturing the same.

図1は、本発明の一態様にかかる固体電解コンデンサの模式図である。FIG. 1 is a schematic diagram of a solid electrolytic capacitor according to one embodiment of the present invention. 図2は、本発明の一態様にかかる固体電解コンデンサの断面の拡大模式図である。FIG. 2 is an enlarged schematic view of a cross section of a solid electrolytic capacitor according to one embodiment of the present invention.

 以下、本発明の固体電解コンデンサ及びその製造方法について詳述する。
 尚、本明細書において、「x~y」は「x以上、y以下」の数値範囲を表すものとする。数値範囲に関して記載された上限値及び下限値は任意に組み合わせることができる。
The solid electrolytic capacitor and the method for producing the same of the present invention will be described in detail below.
In this specification, "x to y" represents a numerical range of "not less than x and not more than y." The upper and lower limits described in relation to the numerical ranges can be combined in any combination.

[固体電解コンデンサ]
 本発明の一態様にかかる固体電解コンデンサは、弁金属からなる多孔質体と、前記多孔質体の表面に形成された誘電体層と、前記誘電体層を被覆する2以上の導電層と、を含む。そして、前記2以上の導電層は、前記誘電体層の表面に形成された第1の導電層と、前記第1の導電層に積層された第2の導電層と、を有し、前記第2の導電層が、ポニアニリンがプロトン供与体でドープされているポリアニリン複合体を含む。
[Solid electrolytic capacitor]
A solid electrolytic capacitor according to one embodiment of the present invention includes a porous body made of a valve metal, a dielectric layer formed on the surface of the porous body, and two or more conductive layers covering the dielectric layer, the two or more conductive layers including a first conductive layer formed on the surface of the dielectric layer and a second conductive layer laminated on the first conductive layer, the second conductive layer including a polyaniline complex in which polyaniline is doped with a proton donor.

 本発明の一態様にかかる固体電解コンデンサは、上記構成を有することにより、耐湿熱性にすぐれる。 The solid electrolytic capacitor according to one aspect of the present invention has the above-mentioned configuration, and therefore has excellent resistance to moist heat.

 図1は、本発明の一態様にかかる固体電解コンデンサの模式図であり、図2は、該固体電解コンデンサの断面の拡大模式図である。
 一実施形態における本発明の一態様にかかる固体電解コンデンサ100は、弁金属からなる多孔質体111と、多孔質体の表面に形成された誘電体層112とからなる陽極体110と、誘電体層を被覆する第1の導電層120と、第1の導電層に積層された第2の導電層130と、第2の導電層に積層されたカーボン層140と、カーボン層に積層された銀層150と、を含む。
 本発明の一態様にかかる固体電解コンデンサは、弁金属を含むワイヤー160を含んでもよい。ワイヤー160は、多孔質体111の少なくとも一部を貫通する。
FIG. 1 is a schematic diagram of a solid electrolytic capacitor according to one embodiment of the present invention, and FIG. 2 is an enlarged schematic diagram of a cross section of the solid electrolytic capacitor.
A solid electrolytic capacitor 100 according to one aspect of the present invention in one embodiment includes an anode body 110 including a porous body 111 made of a valve metal and a dielectric layer 112 formed on the surface of the porous body, a first conductive layer 120 covering the dielectric layer, a second conductive layer 130 laminated on the first conductive layer, a carbon layer 140 laminated on the second conductive layer, and a silver layer 150 laminated on the carbon layer.
The solid electrolytic capacitor according to the aspect of the present invention may include a wire 160 including a valve metal. The wire 160 penetrates at least a portion of the porous body 111.

 第1の導電層120は、内部固体電解質層、内部コーティング層、インナー層等とも呼ばれる。
 第2の導電層130は、外部コーティング層、アウター層等とも呼ばれる。
The first conductive layer 120 is also called an inner solid electrolyte layer, an inner coating layer, an inner layer, or the like.
The second conductive layer 130 is also called an outer coating layer, an outer layer, or the like.

 以下、本発明の一態様にかかる固体電解コンデンサを構成する各部材について説明する。 The following describes each component that constitutes a solid electrolytic capacitor according to one embodiment of the present invention.

[多孔質体]
 多孔質体は、弁金属からなる。多孔質体は細孔が存在する材料であり、好ましくは直径1nm~10μm程度の細孔を多数有する。
 多孔質体を用いることにより、弁金属の表面積を大きくすることができる。その結果として、コンデンサの容量を増大することができ、小型大容量のコンデンサを実現できる。
[Porous body]
The porous body is made of a valve metal and is a material having pores, preferably having a large number of pores with diameters of about 1 nm to 10 μm.
By using a porous body, the surface area of the valve metal can be increased, which in turn increases the capacitance of the capacitor, making it possible to realize a small-sized capacitor with large capacitance.

 多孔質体の形状は特に制限されず、例えば成形体又は膜(箔)であって、一定の厚さを有するものである。
 成形体である多孔質体の長さ、幅、及び厚みは特に限定されず、例えば、それぞれ独立に、15μm以上、5mm以下である。
 膜(箔)である多孔質体の厚みは特に限定されず、例えば、15μm以上、300μm以下である。
The shape of the porous body is not particularly limited, and may be, for example, a molded body or a film (foil) having a certain thickness.
The length, width and thickness of the porous body which is a molded article are not particularly limited, and are, for example, independently 15 μm or more and 5 mm or less.
The thickness of the porous body serving as the membrane (foil) is not particularly limited, and is, for example, 15 μm or more and 300 μm or less.

 細孔の構造としては、トンネル状のピット、海綿状のピット、又は密集した粉体間の空隙等が挙げられるが、これらに限定されない。多孔質体は、これらの構造を、1種のみを含んでもよく、2種以上を含んでもよい。 Porous structures include, but are not limited to, tunnel-like pits, spongy pits, or gaps between densely packed powder particles. The porous body may contain only one of these structures, or two or more of them.

 多孔質体の製造方法は、特に限定されないが、例えば、弁金属からなる金属粉末を焼結して多孔質体としてもよく、弁金属からなる膜(箔)に対してエッチングにより多数の孔を形成してもよい。 The method for manufacturing the porous body is not particularly limited, but for example, a metal powder made of a valve metal may be sintered to form a porous body, or a film (foil) made of a valve metal may be etched to form a large number of holes.

 一実施形態において、多孔質体は、弁金属粉末及びバインダーを含む成形体を焼結してなる、弁金属からなる焼結体である。
 弁金属からなる焼結体は、弁金属粉末、バインダー、及び溶剤を一定の比率で混合撹拌し、混合パウダーを圧縮して直方体に成形した後、これを高温及び高振動下で焼結することによって製造することができる。
In one embodiment, the porous body is a sintered body made of valve metal, which is obtained by sintering a compact containing a valve metal powder and a binder.
A sintered body made of a valve metal can be produced by mixing and stirring a valve metal powder, a binder, and a solvent in a certain ratio, compressing the mixed powder into a rectangular parallelepiped, and then sintering this at high temperature and high vibration.

 弁金属としては、アルミニウム、タンタル、ニオブ、チタン、ハフニウム、ジルコニウム、亜鉛、タングステン、ビスマス、及びアンチモン等の金属が挙げられ、アルミニウム又はタンタルが好ましい。
 これらの金属は、1種を単独で用いてもよく、2種以上を併用してもよい。
Valve metals include metals such as aluminum, tantalum, niobium, titanium, hafnium, zirconium, zinc, tungsten, bismuth, and antimony, with aluminum or tantalum being preferred.
These metals may be used alone or in combination of two or more.

 バインダーの例としては、例えば、セルロース系バインダーが挙げられる。
 セルロース系バインダーの例としては、ニトロセルロース、メチルセルロース、エチルセルロース、及びヒドロキシプロピルセルロースからなる群から選択される1種以上が挙げられる
 バインダーは、1種を単独で用いてもよく、2種以上を併用してもよい。
Examples of binders include, for example, cellulosic binders.
Examples of the cellulose-based binder include one or more types selected from the group consisting of nitrocellulose, methylcellulose, ethylcellulose, and hydroxypropylcellulose. One type of binder may be used alone, or two or more types may be used in combination.

[誘電体層]
 誘電体層は、多孔質体の表面に形成される。
 一実施形態において、誘電体層は、多孔質体に含まれる弁金属の酸化物からなる。
[Dielectric layer]
The dielectric layer is formed on the surface of the porous body.
In one embodiment, the dielectric layer comprises an oxide of a valve metal contained in a porous body.

 誘電体層の製造方法は、特に限定されないが、電解溶液中で多孔質体を陽極として通電させることで、表層に酸化皮膜を成長させるアノード酸化等が挙げられる。
 電解溶液の例としては、例えば、リン酸塩、ホウ酸塩、クエン酸塩、アジピン酸塩等が挙げられる。電解溶液は、1種を単独で用いてもよく、2種以上を併用してもよい。
The method for producing the dielectric layer is not particularly limited, but examples thereof include anodic oxidation, in which an oxide film grows on the surface layer by passing a current through a porous body as an anode in an electrolytic solution.
Examples of the electrolytic solution include, for example, phosphates, borates, citrates, adipates, etc. The electrolytic solution may be used alone or in combination of two or more kinds.

 誘電体層の厚みは、要求される耐電圧や静電容量等に合わせて設計されるが、例えば、1nm以上500nm以下であることが好ましく、10nm以上100nm以下であることがより好ましい。 The thickness of the dielectric layer is designed according to the required withstand voltage, capacitance, etc., but is preferably 1 nm or more and 500 nm or less, and more preferably 10 nm or more and 100 nm or less.

[陽極体]
 本明細書において、弁金属からなる多孔質体と、多孔質体の表面に形成された誘電体層とを合わせて陽極体と呼ぶ。
 陽極体の液中容量は、例えば、100μF以上2000μF以下であることが好ましく、500μF以上1500μF以下であることがより好ましい。
 陽極体の液中容量は、実施例に記載した方法で測定できる。
[Anode body]
In this specification, the porous body made of valve metal and the dielectric layer formed on the surface of the porous body are collectively referred to as the anode body.
The submerged capacity of the anode body is, for example, preferably 100 μF or more and 2000 μF or less, and more preferably 500 μF or more and 1500 μF or less.
The submerged capacity of the anode body can be measured by the method described in the Examples.

[第1の導電層]
 第1の導電層(以下、「内部固体電解質層」ともいう。)は、誘電体層を被覆する。
[First conductive layer]
A first conductive layer (hereinafter also referred to as the "internal solid electrolyte layer") covers the dielectric layer.

 第1の導電層を構成する材料としては、導電性を有する層を形成可能な材料であれば特に限定されないが、例えば、第1の導電層は、導電性高分子を含むことが好ましい。 The material constituting the first conductive layer is not particularly limited as long as it is a material capable of forming a conductive layer, but for example, it is preferable that the first conductive layer contains a conductive polymer.

 一実施形態において、第1の導電層は、ポリアニリン、ポリアニリン誘導体、ポリチオフェン、ポリチオフェン誘導体、ポリピロール、及びポリピロール誘導体からなる群から選択される1以上を含む。ここでポリチオフェンとしては、ポリスチレンスルホン酸のようなポリアニオンでドープされたポリチオフェン、あるいは自己ドープ型のポリチオフェン等を用いることができる。 In one embodiment, the first conductive layer includes one or more selected from the group consisting of polyaniline, polyaniline derivatives, polythiophene, polythiophene derivatives, polypyrrole, and polypyrrole derivatives. Here, the polythiophene may be a polythiophene doped with a polyanion such as polystyrene sulfonic acid, or a self-doped polythiophene.

 これらの導電性高分子は、陽極体内部にモノマーを含浸させてから重合してもよく、ポリマーを陽極体に含浸させてもよい。 These conductive polymers may be polymerized after the monomer is impregnated into the anode body, or the polymer may be impregnated into the anode body.

 これらの導電性高分子は、1種を単独で用いてもよく、2種以上を併用してもよい。 These conductive polymers may be used alone or in combination of two or more.

 一実施形態において、第1の導電層は、ポリアニリン又はポリアニリン誘導体を含む。
 ポリアニリンは、好ましくは重量平均分子量が10,000以上であり、より好ましくは20,000以上であり、さらに好ましくは30,000以上1,000,000以下であり、よりさらに好ましくは40,000以上1,000,000以下であり、特に好ましくは52,000以上1,000,000以下である。
In one embodiment, the first conductive layer comprises polyaniline or a polyaniline derivative.
The polyaniline preferably has a weight average molecular weight of 10,000 or more, more preferably 20,000 or more, even more preferably 30,000 to 1,000,000, still more preferably 40,000 to 1,000,000, and particularly preferably 52,000 to 1,000,000.

 例えば、固体電解コンデンサの固体電解質層に用いる場合、得られる電解質層の強度を高くできる観点から、一般に、導電性高分子の分子量が大きいほど好ましい。一方、分子量が大きいと粘度が高くなるため、多孔質体の細孔内部に含浸させることが困難となるおそれがある。
 ポリアニリンの重量平均分子量は、実施例に記載の方法により測定する。
For example, when used in a solid electrolyte layer of a solid electrolytic capacitor, a conductive polymer having a larger molecular weight is generally preferred from the viewpoint of increasing the strength of the resulting electrolyte layer, but a larger molecular weight leads to a higher viscosity, which may make it difficult to impregnate the inside of the pores of a porous body.
The weight average molecular weight of polyaniline is measured by the method described in the Examples.

 ポリアニリンは、汎用性及び経済性の観点から、好ましくは無置換のポリアニリンである。
 置換基を有する場合の置換基としては、例えばメチル基、エチル基、ヘキシル基、オクチル基等の直鎖又は分岐の炭化水素基;メトキシ基、エトキシ基等のアルコキシ基;フェノキシ基等のアリールオキシ基;トリフルオロメチル基(-CF基)等のハロゲン化炭化水素が挙げられる。
From the viewpoints of versatility and economy, the polyaniline is preferably an unsubstituted polyaniline.
When the aryl group has a substituent, examples of the substituent include linear or branched hydrocarbon groups such as a methyl group, an ethyl group, a hexyl group, and an octyl group; alkoxy groups such as a methoxy group and an ethoxy group; aryloxy groups such as a phenoxy group; and halogenated hydrocarbons such as a trifluoromethyl group ( -CF3 group).

 一実施形態において、第1の導電層は、ポリアニリンがプロトン供与体でドープされているポリアニリン複合体を含む。ポリアニリン複合体を用いることにより、溶媒への溶解性が向上しやすい。
 プロトン供与体がポリアニリンにドープしていることは、紫外・可視・近赤外分光法やX線光電子分光法によって確認することができる。プロトン供与体は、ポリアニリンにキャリアを発生させるのに十分な酸性を有していれば、特に制限なく使用できる。
In one embodiment, the first conductive layer comprises a polyaniline composite in which polyaniline is doped with a proton donor, which tends to improve solubility in a solvent.
The doping of polyaniline with the proton donor can be confirmed by ultraviolet, visible, near infrared spectroscopy or X-ray photoelectron spectroscopy. The proton donor can be used without any particular limitation as long as it has sufficient acidity to generate carriers in polyaniline.

 プロトン供与体としては、例えばブレンステッド酸、又はそれらの塩が挙げられる。好ましくは有機酸、又はそれらの塩であり、さらに好ましくは下記式(I)で示されるプロトン供与体である。
   M(XARn)m   (I)
The proton donor may be, for example, a Bronsted acid or a salt thereof. Preferably, it is an organic acid or a salt thereof, and more preferably, it is a proton donor represented by the following formula (I).
M(XARn)m(I)

 式(I)のMは、水素原子、有機遊離基、又は無機遊離基である。
 有機遊離基としては、例えば、ピリジニウム基、イミダゾリウム基、アニリニウム基が挙げられる。また、無機遊離基としては、例えば、リチウム、ナトリウム、カリウム、セシウム、アンモニウム、カルシウム、マグネシウム、鉄等が挙げられる。
 式(I)のXは、アニオン基であり、例えば-SO 基、-PO 2-基、-PO(OH)基、-OPO 2-基、-OPO(OH)基、-COO基等が挙げられ、好ましくは-SO 基である。
M in formula (I) is a hydrogen atom, an organic free radical, or an inorganic free radical.
Examples of organic free radicals include pyridinium, imidazolium, and anilinium groups, while examples of inorganic free radicals include lithium, sodium, potassium, cesium, ammonium, calcium, magnesium, and iron.
X in formula (I) is an anionic group such as, for example, a -SO 3 - group, a -PO 3 2- group, a -PO 4 (OH) - group, a -OPO 3 2- group, a -OPO 2 (OH) - group, a -COO - group, etc., and is preferably a -SO 3 - group.

 式(I)のAは、置換もしくは無置換の炭化水素基(炭素数は例えば1~20)である。
 炭化水素基は、鎖状もしくは環状の飽和脂肪族炭化水素基、鎖状もしくは環状の不飽和脂肪族炭化水素基、又は芳香族炭化水素基である。
 鎖状の飽和脂肪族炭化水素基としては、直鎖もしくは分岐状のアルキル基(炭素数は例えば1~20)が挙げられる。
 環状の飽和脂肪族炭化水素基としては、シクロペンチル基、シクロヘキシル基、シクロヘプチル基、シクロオクチル基等のシクロアルキル基(炭素数は例えば3~20)が挙げられる。
 環状の飽和脂肪族炭化水素基は、複数の環状の飽和脂肪族炭化水素基が縮合していてもよい。例えば、ノルボルニル基、アダマンチル基、縮合したアダマンチル基等が挙げられる。
 鎖状の不飽和脂肪族炭化水素(炭素数は例えば2~20)としては、直鎖又は分岐状のアルケニル基が挙げられる。
 環状の不飽和脂肪族炭化水素基(炭素数は例えば3~20)としては、環状アルケニル基が挙げられる。
 芳香族炭化水素基(炭素数は例えば6~20)としては、フェニル基、ナフチル基、アントラセニル基等が挙げられる。
A in formula (I) is a substituted or unsubstituted hydrocarbon group (having, for example, 1 to 20 carbon atoms).
The hydrocarbon group is a linear or cyclic saturated aliphatic hydrocarbon group, a linear or cyclic unsaturated aliphatic hydrocarbon group, or an aromatic hydrocarbon group.
Examples of the chain-like saturated aliphatic hydrocarbon group include linear or branched alkyl groups (having, for example, 1 to 20 carbon atoms).
Examples of the cyclic saturated aliphatic hydrocarbon group include cycloalkyl groups (having, for example, 3 to 20 carbon atoms) such as a cyclopentyl group, a cyclohexyl group, a cycloheptyl group, and a cyclooctyl group.
The cyclic saturated aliphatic hydrocarbon group may be a group in which a plurality of cyclic saturated aliphatic hydrocarbon groups are condensed, such as a norbornyl group, an adamantyl group, and a condensed adamantyl group.
Examples of the chain unsaturated aliphatic hydrocarbon (having, for example, 2 to 20 carbon atoms) include linear or branched alkenyl groups.
Examples of the cyclic unsaturated aliphatic hydrocarbon group (having, for example, 3 to 20 carbon atoms) include a cyclic alkenyl group.
Examples of the aromatic hydrocarbon group (having, for example, 6 to 20 carbon atoms) include a phenyl group, a naphthyl group, and an anthracenyl group.

 Aが置換の炭化水素基である場合の置換基は、アルキル基(炭素数は、例えば、1~20)、シクロアルキル基(炭素数は、例えば、3~20)、ビニル基、アリル基、アリール基(炭素数は、例えば、6~20)、アルコキシ基(炭素、数は、例えば1~20)、ハロゲン原子、ヒドロキシ基、アミノ基、イミノ基、ニトロ基、シリル基、又はエステル結合含有基である。 When A is a substituted hydrocarbon group, the substituent is an alkyl group (e.g., 1 to 20 carbon atoms), a cycloalkyl group (e.g., 3 to 20 carbon atoms), a vinyl group, an allyl group, an aryl group (e.g., 6 to 20 carbon atoms), an alkoxy group (e.g., 1 to 20 carbon atoms), a halogen atom, a hydroxy group, an amino group, an imino group, a nitro group, a silyl group, or an ester bond-containing group.

 式(I)のRは、Aと結合しており、-H、-R、-OR、-COR、-COOR、-(C=O)-(COR)、又は-(C=O)-(COOR)で表わされる置換基である。
 Rは、置換基を含んでもよい炭化水素基、シリル基、アルキルシリル基、-(RO)x-R基、又は-(OSiR )x-OR基である。
 Rはアルキレン基、Rは炭化水素基であり、xは1以上の整数である。
 xが2以上の場合、複数のRは互いに同一でも異なってもよく、複数のRは互いに同一でも異なってもよい。
R in formula (I) is bonded to A and is a substituent represented by -H, -R 1 , -OR 1 , -COR 1 , -COOR 1 , -(C=O)-(COR 1 ), or -(C=O)-(COOR 1 ).
R 1 is a hydrocarbon group which may contain a substituent, a silyl group, an alkylsilyl group, a -(R 2 O)x-R 3 group, or a -(OSiR 3 2 )x-OR 3 group.
R2 is an alkylene group, R3 is a hydrocarbon group, and x is an integer of 1 or more.
When x is 2 or more, multiple R 2s may be the same or different, and multiple R 3s may be the same or different.

 Rの炭化水素基(炭素数は例えば1~20)としては、メチル基、エチル基、プロピル基、ブチル基、ペンチル基、ヘキシル基、ヘプチル基、オクチル基、ノニル基、デシル基、ドデシル基、ペンタデシル基、エイコサニル基等が挙げられる。炭化水素基は直鎖状であってもよく、また、分岐状であってもよい。
 炭化水素基の置換基は、アルキル基(炭素数は例えば1~20)、シクロアルキル基(炭素数は例えば3~20)、ビニル基、アリル基、アリール基(炭素数は例えば6~20)、アルコキシ基(炭素数は例えば1~20)、ハロゲン原子、ヒドロキシ基、アミノ基、イミノ基、ニトロ基、又はエステル結合含有基である。Rの炭化水素基もRと同様である。
Examples of the hydrocarbon group (having, for example, 1 to 20 carbon atoms) for R1 include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, a dodecyl group, a pentadecyl group, an eicosanyl group, etc. The hydrocarbon group may be linear or branched.
The substituent of the hydrocarbon group is an alkyl group (having, for example, 1 to 20 carbon atoms), a cycloalkyl group (having, for example, 3 to 20 carbon atoms), a vinyl group, an allyl group, an aryl group (having, for example, 6 to 20 carbon atoms), an alkoxy group (having, for example, 1 to 20 carbon atoms), a halogen atom, a hydroxy group, an amino group, an imino group, a nitro group, or an ester bond-containing group. The hydrocarbon group of R3 is the same as that of R1 .

 Rのアルキレン基(炭素数は例えば1~20)としては、例えば、メチレン基、エチレン基、プロピレン基等が挙げられる。
 式(I)のnは1以上の整数である。nが2以上の場合、複数のRは互いに同一でも異なってもよい。
 式(I)のmは、Mの価数/Xの価数である。
Examples of the alkylene group (having, for example, 1 to 20 carbon atoms) for R2 include a methylene group, an ethylene group, and a propylene group.
In formula (I), n is an integer of 1 or more. When n is 2 or more, multiple Rs may be the same or different.
In formula (I), m is the valence of M/the valence of X.

 式(I)で示される化合物としては、ジアルキルベンゼンスルフォン酸、ジアルキルナフタレンスルフォン酸、又はエステル結合を2以上含有する化合物が好ましい。
 上記エステル結合を2以上含有する化合物は、スルホフタル酸エステル、又は下式(II)で表される化合物がより好ましい。
The compound represented by formula (I) is preferably a dialkylbenzenesulfonic acid, a dialkylnaphthalenesulfonic acid, or a compound containing two or more ester bonds.
The compound containing two or more ester bonds is more preferably a sulfophthalic acid ester or a compound represented by the following formula (II).

Figure JPOXMLDOC01-appb-C000005
Figure JPOXMLDOC01-appb-C000005

 式(II)中、M及びXは、式(I)と同様である。Xは、-SO 基が好ましい。
 R、R、及びRは、それぞれ独立に、水素原子、炭化水素基又はR Si-基である。3つのRは、それぞれ独立に、炭化水素基である。
 R、R、及びRが炭化水素基である場合の炭化水素基としては、炭素数1~24の直鎖もしくは分岐状のアルキル基、芳香環を含むアリール基(炭素数は例えば6~20)、アルキルアリール基(炭素数は例えば7~20)等が挙げられる。
 Rの炭化水素基としては、R、R、及びRの場合と同様である。
In formula (II), M and X are the same as those in formula (I), and X is preferably a -SO 3 - group.
R 4 , R 5 and R 6 are each independently a hydrogen atom, a hydrocarbon group or an R 9 3 Si- group. Each of the three R 9s is independently a hydrocarbon group.
When R 4 , R 5 , and R 6 are hydrocarbon groups, examples of the hydrocarbon group include linear or branched alkyl groups having 1 to 24 carbon atoms, aryl groups containing an aromatic ring (having, for example, 6 to 20 carbon atoms), and alkylaryl groups (having, for example, 7 to 20 carbon atoms).
The hydrocarbon group for R 9 is the same as for R 4 , R 5 , and R 6 .

 式(II)のR及びRは、それぞれ独立に、炭化水素基又は-(R10O)-R11基である。
 R10は、炭化水素基又はシリレン基である。
 R11は、水素原子、炭化水素基、又はR12 Si-である。
 qは1以上の整数である。
 3つのR12は、それぞれ独立に、炭化水素基である。
In formula (II), R 7 and R 8 are each independently a hydrocarbon group or a —(R 10 O) q —R 11 group.
R 10 is a hydrocarbon group or a silylene group.
R 11 is a hydrogen atom, a hydrocarbon group, or R 12 3 Si—.
q is an integer of 1 or more.
The three R 12 are each independently a hydrocarbon group.

 R及びRが炭化水素基である場合の炭化水素基としては、炭素数1~24、好ましくは炭素数4以上の直鎖もしくは分岐状のアルキル基、芳香環を含むアリール基(炭素数は例えば6~20)、アルキルアリール基(炭素数は例えば7~20)等が挙げられる。
 具体例としては、例えば、いずれも直鎖又は分岐状の、ブチル基、ペンチル基、ヘキシル基、オクチル基、デシル基等が挙げられる。
When R7 and R8 are hydrocarbon groups, examples of the hydrocarbon group include linear or branched alkyl groups having 1 to 24 carbon atoms, preferably 4 or more carbon atoms, aryl groups containing an aromatic ring (having, for example, 6 to 20 carbon atoms), and alkylaryl groups (having, for example, 7 to 20 carbon atoms).
Specific examples include a butyl group, a pentyl group, a hexyl group, an octyl group, a decyl group, and the like, all of which may be linear or branched.

 R及びRにおける、R10が炭化水素基である場合の炭化水素基としては、例えば炭素数1~24の直鎖もしくは分岐状のアルキレン基、芳香環を含むアリーレン基(炭素数は例えば6~20)、アルキルアリーレン基(炭素数は例えば7~20)、又はアリールアルキレン基(炭素数は例えば7~20)である。
 また、R及びRにおける、R11及びR12が炭化水素基である場合の炭化水素基としては、R、R、及びRの場合と同様であり、qは、1~10であることが好ましい。
In R7 and R8 , when R10 is a hydrocarbon group, examples of the hydrocarbon group include a linear or branched alkylene group having 1 to 24 carbon atoms, an arylene group containing an aromatic ring (having, for example, 6 to 20 carbon atoms), an alkylarylene group (having, for example, 7 to 20 carbon atoms), or an arylalkylene group (having, for example, 7 to 20 carbon atoms).
In addition, in R 7 and R 8 , when R 11 and R 12 are hydrocarbon groups, the hydrocarbon groups are the same as those in the cases of R 4 , R 5 and R 6 , and q is preferably 1-10.

 R及びRが-(R10O)-R11基である場合の式(II)で表される化合物の具体例としては、下記式で表される2つの化合物が挙げられる。

Figure JPOXMLDOC01-appb-C000006
(式中、Xは式(I)と同様である。) Specific examples of the compound represented by formula (II) in which R 7 and R 8 are —(R 10 O) q —R 11 groups include the two compounds represented by the following formulae.
Figure JPOXMLDOC01-appb-C000006
(In the formula, X is the same as in formula (I).)

 上記式(II)で表される化合物は、下記式(III)で示されるスルホコハク酸誘導体であることがさらに好ましい。

Figure JPOXMLDOC01-appb-C000007
The compound represented by the above formula (II) is more preferably a sulfosuccinic acid derivative represented by the following formula (III).
Figure JPOXMLDOC01-appb-C000007

 式(III)中、Mは、式(I)と同様である。
 m’は、Mの価数である。
 R13及びR14は、それぞれ独立に、炭化水素基又は-(R15O)-R16基である。
 R15は炭化水素基又はシリレン基であり、R16は水素原子、炭化水素基又はR17 Si-基であり、rは1以上の整数である。
 3つのR17はそれぞれ独立に炭化水素基である。
 rが2以上の場合、複数のR15は互いに同一でも異なってもよい。
In formula (III), M is the same as in formula (I).
m' is the valence of M.
R 13 and R 14 are each independently a hydrocarbon group or a -(R 15 O) r -R 16 group.
R 15 is a hydrocarbon group or a silylene group, R 16 is a hydrogen atom, a hydrocarbon group or an R 17 3 Si- group, and r is an integer of 1 or more.
Each of the three R 17s independently represents a hydrocarbon group.
When r is 2 or more, multiple R 15 may be the same or different.

 R13及びR14が炭化水素基である場合の炭化水素基としては、R及びRと同様である。
 R13及びR14において、R15が炭化水素基である場合の炭化水素基としては、上記R10と同様である。
 また、R13及びR14において、R16及びR17が炭化水素基である場合の炭化水素基としては、上記R、R、及びRと同様である。
 rは、1~10であることが好ましい。
When R 13 and R 14 are hydrocarbon groups, the hydrocarbon groups are the same as those for R 7 and R 8 .
In R 13 and R 14 , when R 15 is a hydrocarbon group, the hydrocarbon group is the same as R 10 above.
In addition, in R 13 and R 14 , when R 16 and R 17 are hydrocarbon groups, the hydrocarbon groups are the same as those for R 4 , R 5 and R 6 above.
It is preferable that r is an integer from 1 to 10.

 R13及びR14が-(R15O)-R16基である場合の具体例としては、R及びRにおける-(R10O)-R11と同様である。
 R13及びR14の炭化水素基としては、R及びRと同様であり、ブチル基、ヘキシル基、2-エチルヘキシル基、デシル基が好ましい。
Specific examples when R 13 and R 14 are the -(R 15 O) r -R 16 group are the same as those of -(R 10 O) q -R 11 in R 7 and R 8 .
The hydrocarbon group of R 13 and R 14 is the same as that of R 7 and R 8 , and a butyl group, a hexyl group, a 2-ethylhexyl group, or a decyl group is preferred.

 式(I)で示される化合物としては、ジ(2-エチルヘキシル)スルホコハク酸、ジ(2-エチルヘキシル)スルホコハク酸ナトリウムが好ましい。 The compound represented by formula (I) is preferably di(2-ethylhexyl)sulfosuccinic acid or sodium di(2-ethylhexyl)sulfosuccinate.

 上記プロトン供与体は、その構造を変えることにより、ポリアニリン複合体の導電性や、溶媒への溶解性をコントロールできることが知られている(特許第3384566号)。本実施形態では、用途毎の要求特性によって最適なプロトン供与体を選択できる。 It is known that the above-mentioned proton donor can control the electrical conductivity and solubility in a solvent of the polyaniline composite by changing its structure (Patent No. 3384566). In this embodiment, the optimal proton donor can be selected depending on the required characteristics for each application.

 ポリアニリンに対するプロトン供与体のドープ率は、好ましくは0.30以上0.65以下であり、より好ましくは0.32以上0.60以下であり、さらに好ましくは0.33以上0.57以下であり、特に好ましくは0.34以上0.55以下である。通常、ドープ率が0.30以上であれば、ポリアニリン複合体の有機溶媒への溶解性は十分となる。
 ドープ率は(ポリアニリンにドープしているプロトン供与体のモル数)/(ポリアニリンのモノマーユニットのモル数)で定義される。例えば無置換ポリアニリンとプロトン供与体を含むポリアニリン複合体のドープ率が0.5であることは、ポリアニリンのモノマーユニット分子2個に対し、プロトン供与体が1個ドープしていることを意味する。
 尚、ドープ率は、ポリアニリン複合体中のプロトン供与体とポリアニリンのモノマーユニットのモル数が測定できれば算出可能である。例えば、プロトン供与体が有機スルホン酸の場合、プロトン供与体由来の硫黄原子のモル数と、ポリアニリンのモノマーユニット由来の窒素原子のモル数を、有機元素分析法により定量し、これらの値の比を取ることでドープ率を算出できる。
The doping ratio of the proton donor to the polyaniline is preferably 0.30 or more and 0.65 or less, more preferably 0.32 or more and 0.60 or less, further preferably 0.33 or more and 0.57 or less, and particularly preferably 0.34 or more and 0.55 or less. Usually, when the doping ratio is 0.30 or more, the solubility of the polyaniline complex in an organic solvent is sufficient.
The doping ratio is defined as (the number of moles of the proton donor doped in the polyaniline)/(the number of moles of the monomer unit of the polyaniline). For example, a doping ratio of 0.5 for a polyaniline complex containing unsubstituted polyaniline and a proton donor means that one proton donor is doped for every two monomer unit molecules of polyaniline.
The doping ratio can be calculated if the molar numbers of the proton donor and the polyaniline monomer unit in the polyaniline composite can be measured. For example, when the proton donor is an organic sulfonic acid, the molar number of sulfur atoms derived from the proton donor and the molar number of nitrogen atoms derived from the polyaniline monomer unit are quantified by organic elemental analysis, and the doping ratio can be calculated by taking the ratio of these values.

 ポリアニリン複合体は、無置換ポリアニリンとプロトン供与体であるスルホン酸とを含み、下記式(1)を満たすことが好ましい。
  0.32≦S/N≦0.60   (1)
(式中、Sはポリアニリン複合体に含まれる硫黄原子のモル数の合計であり、Nはポリアニリン複合体に含まれる窒素原子のモル数の合計である。
 尚、上記窒素原子及び硫黄原子のモル数は、例えば有機元素分析法により測定した値である。)
The polyaniline complex preferably contains unsubstituted polyaniline and sulfonic acid as a proton donor, and satisfies the following formula (1).
0.32≦ S5 / N5 ≦0.60 (1)
(In the formula, S5 is the total number of moles of sulfur atoms contained in the polyaniline complex, and N5 is the total number of moles of nitrogen atoms contained in the polyaniline complex.
The number of moles of nitrogen atoms and sulfur atoms is a value measured by, for example, organic elemental analysis.

 ポリアニリン複合体を製造する方法は格別限定されないが、例えば、以下に説明する製造方法により製造することができる。
 例えば、上述のプロトン供与体、上述のポリアニリンに対応するアニリン、必要に応じて界面活性剤(例えば非イオン乳化剤)を水不混和性有機溶媒(例えば炭化水素系溶媒(好ましくはトルエン、キシレン))に溶解させ、そこに酸性水溶液(例えば、リン酸水溶液)を加え、水不混和性有機溶媒と水の2つの液相を有する反応液を撹拌し、重合開始剤(例えば過硫酸アンモニウム)を投入し、重合を行う。
 重合後、静置により水不混和性有機溶媒相を分離することで、ポリアニリン複合体水不混和性有機溶媒溶液を得ることができる。この溶液をエバポレーターに移し、揮発分を蒸発留去し、ポリアニリン複合体(プロトネーションされたポリアニリン)を得ることができる。
The method for producing the polyaniline composite is not particularly limited, but it can be produced, for example, by the production method described below.
For example, the above-mentioned proton donor, aniline corresponding to the above-mentioned polyaniline, and optionally a surfactant (e.g., a nonionic emulsifier) are dissolved in a water-immiscible organic solvent (e.g., a hydrocarbon solvent (preferably toluene, xylene)), an acidic aqueous solution (e.g., an aqueous phosphoric acid solution) is added thereto, the reaction liquid having two liquid phases of the water-immiscible organic solvent and water is stirred, and a polymerization initiator (e.g., ammonium persulfate) is added to carry out polymerization.
After the polymerization, the water-immiscible organic solvent phase is separated by standing to obtain a polyaniline complex water-immiscible organic solvent solution. This solution is transferred to an evaporator to evaporate and remove the volatile matter to obtain a polyaniline complex (protonated polyaniline).

[第2の導電層]
 第2の導電層(以下、「外部コーティング層」ともいう。)は、第1の導電層に積層され、図1に示すように、第1の導電層が陽極体の細孔内部に含浸しているのに対し、第2の導電層は、陽極体と第1の導電層とを、さらに外側からコーティングする。
[Second Conductive Layer]
The second conductive layer (hereinafter also referred to as the "external coating layer") is laminated on the first conductive layer. As shown in FIG. 1, the first conductive layer impregnates the inside of the pores of the anode body, while the second conductive layer further coats the anode body and the first conductive layer from the outside.

 第2の導電層は、ポニアニリンがプロトン供与体でドープされているポリアニリン複合体を含む。ポニアニリンがプロトン供与体でドープされているポリアニリン複合体は、1種を単独で用いてもよく、2種以上を併用してもよい。
 ポリアニリン、プロトン供与体、及びポリアニリン複合体としては、第1の導電層において説明した事項を適用できる。
The second conductive layer includes a polyaniline complex in which polyaniline is doped with a proton donor. The polyaniline complex in which polyaniline is doped with a proton donor may be used alone or in combination of two or more kinds.
For the polyaniline, the proton donor, and the polyaniline complex, the items described in the first conductive layer can be applied.

 一実施形態において、第2の導電層に使用するプロトン供与体は、上記式(I)~(III)で示される化合物が好ましく、特に、ジ(2-エチルヘキシル)スルホコハク酸、ジ(2-エチルヘキシル)スルホコハク酸ナトリウムが好ましい。これらのプロトン供与体でドープされているポニアニリン複合体は有機溶剤への溶解性が高いため、第2の導電層の形成時に使用する導電性高分子組成物の調製が容易となる。具体的には、導電性高分子組成物で使用する溶剤の選択肢を広げることができる。また、導電性高分子組成物の粘度(濃度)調整が容易であるため、第2の導電層の厚さの調整が容易となる。さらに有機溶剤への溶解性が高いということは、すなわち疎水性が高いことを意味し、このことはコンデンサの耐湿熱性向上に繋がることが期待できる。 In one embodiment, the proton donor used in the second conductive layer is preferably a compound represented by the above formulas (I) to (III), and in particular, di(2-ethylhexyl)sulfosuccinic acid and sodium di(2-ethylhexyl)sulfosuccinate are preferred. The ponianiline complex doped with these proton donors has high solubility in organic solvents, making it easy to prepare the conductive polymer composition used in forming the second conductive layer. Specifically, it is possible to expand the options for solvents used in the conductive polymer composition. In addition, it is easy to adjust the viscosity (concentration) of the conductive polymer composition, making it easy to adjust the thickness of the second conductive layer. Furthermore, high solubility in organic solvents means high hydrophobicity, which is expected to lead to improved moist heat resistance of the capacitor.

 一実施形態において、第2の導電層は、さらにチキソトロピー性付与剤を含む。
 チキソトロピー性付与剤は、例えば、第2の導電層を形成するための導電性高分子組成物に配合することができる。この導電性高分子組成物に、第1の導電層を形成した多孔質体を浸漬して第2の導電層を形成することで、チキソトロピー性付与剤を第2の導電層に含有させることができる。
 チキソトロピー性付与剤を含有すると、導電性高分子組成物は、剪断力が小さいときは粘度が高くなり、かつ、剪断力が大きいときは粘度が低くなる性質を有する。すなわち、チキソトロピー性付与剤を含有する導電性高分子組成物は、第1の導電層を形成した陽極体を浸漬する際には流動して良好な使用性を有し、陽極体を組成物から取り出した際には粘度が高くなり、一定の厚みを有する第2の導電層を形成しやすくなる。
In one embodiment, the second conductive layer further comprises a thixotropic agent.
The thixotropy-imparting agent can be blended, for example, in the conductive polymer composition for forming the second conductive layer. The second conductive layer can be formed by immersing the porous body on which the first conductive layer has been formed in the conductive polymer composition, thereby making it possible to incorporate the thixotropy-imparting agent in the second conductive layer.
When a thixotropy-imparting agent is contained, the conductive polymer composition has a property of increasing viscosity when the shear force is small and decreasing viscosity when the shear force is large. That is, the conductive polymer composition containing a thixotropy-imparting agent flows and has good usability when an anode body having a first conductive layer formed thereon is immersed in the composition, and increases in viscosity when the anode body is removed from the composition, facilitating the formation of a second conductive layer having a certain thickness.

 チキソトロピー性付与剤としては、チキソトロピー性を付与可能な材料であれば特に制限なく使用できる。例えば、無機粒子、カーボンナノチューブ、カーボン粉末、及びフッ素樹脂パウダー等が挙げられる。チキソトロピー性付与剤としては、無機粒子が好ましい。
 無機粒子としては、シリカ、チタニア、アルミナ、ジルコニア等が挙げられる。
 無機粒子の表面は、必要に応じてシランカップリング剤等によって表面が改質されていてもよい。
The thixotropy-imparting agent can be any material capable of imparting thixotropy without any particular limitation. For example, inorganic particles, carbon nanotubes, carbon powder, fluororesin powder, etc. are listed. As the thixotropy-imparting agent, inorganic particles are preferred.
Examples of inorganic particles include silica, titania, alumina, and zirconia.
The surfaces of the inorganic particles may be modified with a silane coupling agent or the like, if necessary.

 チキソトロピー性付与剤は、1種を単独で用いてもよく、2種以上を組み合わせてもよい。 The thixotropic agent may be used alone or in combination of two or more.

 無機粒子の平均粒子径は、チキソトロピー性を付与できる範囲であれば特に限定されないが、例えば1~100nm、好ましくは1~50nm、より好ましくは2~40nmである。
 無機粒子の平均粒子径は、BET法により比表面積を算出し、当該比表面積から換算して求めることができる。BET法による比表面積の算出は、JIS Z8830(2013)に記載の条件で行う。
The average particle size of the inorganic particles is not particularly limited as long as it is within a range capable of imparting thixotropy, and is, for example, 1 to 100 nm, preferably 1 to 50 nm, and more preferably 2 to 40 nm.
The average particle size of the inorganic particles can be determined by calculating the specific surface area by the BET method and converting the specific surface area. The calculation of the specific surface area by the BET method is performed under the conditions described in JIS Z8830 (2013).

 一実施形態において、第2の導電層全体に対する、チキソトロピー性付与剤の含有率は、0.01~50質量%であり、好ましくは0.1~40質量%、より好ましくは1~20質量%である。 In one embodiment, the content of the thixotropy-imparting agent in the entire second conductive layer is 0.01 to 50 mass %, preferably 0.1 to 40 mass %, and more preferably 1 to 20 mass %.

 一実施形態において、第2の導電層は、さらに増粘剤を含む。
 増粘剤は、チキソトロピー性付与剤と同様に、例えば、第2の導電層を形成するための導電性高分子組成物に配合することができる。この導電性高分子組成物に、第1の導電層を形成した多孔質体を浸漬して第2の導電層を形成することで、増粘剤を第2の導電層に含有させることができる。
 第2の導電層を形成するための導電性高分子組成物が増粘剤を含有すると、所望の厚みを有する第2の導電層を形成しやすくなる。特に、角型コンデンサを製造する場合に、側面エッジ部と側面フラット部において、所望の厚みを有する第2の導電層を形成しやすくなる。
In one embodiment, the second conductive layer further comprises a thickener.
The thickener can be blended, for example, in the conductive polymer composition for forming the second conductive layer, in the same manner as the thixotropy-imparting agent. The second conductive layer can be formed by immersing the porous body on which the first conductive layer has been formed in the conductive polymer composition, thereby making it possible to incorporate the thickener into the second conductive layer.
When the conductive polymer composition for forming the second conductive layer contains a thickener, the second conductive layer can be easily formed with a desired thickness, particularly in the case of producing a rectangular capacitor, whereby the second conductive layer can be easily formed with a desired thickness at the side edge portion and the side flat portion.

 側面エッジ部とは、角型コンデンサの第2の導電層の形成において、ディッピングを行う際に下側であった面を底面とした場合の側面の角の部分(隣接する側面同士が交わる部分)を意味する。
 側面フラット部とは、角型コンデンサの第2の導電層の形成において、ディッピングを行う際に下側であった面を底面とした場合の側面の面の部分を意味する。
The side edge portion refers to the corner portion of the side (the portion where adjacent side surfaces intersect) when the surface that was on the lower side during dipping in forming the second conductive layer of the rectangular capacitor is taken as the bottom surface.
The flat side surface portion refers to the surface portion of the side surface when the surface that was on the lower side during dipping in forming the second conductive layer of the rectangular capacitor is regarded as the bottom surface.

 側面エッジ部における第2の導電層の厚さ(側面エッジ部厚さ)と、側面フラット部における第2の導電層の厚さ(側面フラット部厚さ)とは、実施例に記載の方法で測定できる。 The thickness of the second conductive layer at the side edge portion (side edge thickness) and the thickness of the second conductive layer at the side flat portion (side flat thickness) can be measured by the method described in the examples.

 また、第2の導電層を形成するための導電性高分子組成物が増粘剤を含有すると、所望の厚みを有する第2の導電層を得るために必要なディッピング回数を低減しやすくなる。 In addition, if the conductive polymer composition for forming the second conductive layer contains a thickener, it becomes easier to reduce the number of dipping steps required to obtain a second conductive layer with the desired thickness.

 増粘剤としては、ポリエーテル系化合物及びセルロース系化合物等が挙げられる。 Thickeners include polyether compounds and cellulose compounds.

 ポリエーテル系化合物としては、ポリエチレンオキサイド(EO)-ポリプロピレンオキサイド(PO)共重合体(例えば、EP1550H(明成化学工業株式会社製))等が挙げられる。 Examples of polyether compounds include polyethylene oxide (EO)-polypropylene oxide (PO) copolymers (e.g., EP1550H (manufactured by Meisei Chemical Industry Co., Ltd.)).

 セルロース系化合物としては、例えば、セルロースエーテル(例えば、エチルセルロース、メチルセルロース)、ヒドロキシエチルセルロース、又はヒドロキシプロピチルメチルセルロース等を例示できる。これらの中でも、増粘効果の高さ及び入手し易さの観点から、セルロースエーテルを好適に用いることができる。セルロースエーテルの中ではエチルセルロースを好適に用いることができる。 Examples of cellulose compounds include cellulose ethers (e.g., ethyl cellulose, methyl cellulose), hydroxyethyl cellulose, and hydroxypropyl methyl cellulose. Among these, cellulose ethers are preferably used from the viewpoint of high thickening effect and easy availability. Among cellulose ethers, ethyl cellulose is preferably used.

 また、市販のセルロース系化合物としては、EC-N300(Ashland(アシュランド)社製)、N200(Ashland(アシュランド)社製)、Klucel G(Ashland(アシュランド)社製)等が挙げられる。 Commercially available cellulose compounds include EC-N300 (manufactured by Ashland), N200 (manufactured by Ashland), and Klucel G (manufactured by Ashland).

 増粘剤は、1種を単独で用いてもよく、2種以上を組み合わせてもよい。 A single thickener may be used, or two or more may be combined.

 一実施形態において、第2の導電層全体に対する、増粘剤の含有率は、例えば0.001質量%以上、0.002質量%以上、0.005質量%以上、0.01質量%以上、0.02質量%以上、0.05質量%以上、0.1質量%以上、0.2質量%以上、又は0.3質量%以上である。
 一実施形態において、第2の導電層全体に対する、増粘剤の含有率は、例えば10質量%以下、5質量%以下、3質量%以下、2質量%以下、又は1質量%以下である。
 一実施形態において、第2の導電層全体に対する、増粘剤の含有率は、0.001~10質量%、0.001~5質量%、0.01~5質量%、0.1~5質量%、又は0.3~1質量%である。
In one embodiment, the content of the thickener relative to the entire second conductive layer is, for example, 0.001% by weight or more, 0.002% by weight or more, 0.005% by weight or more, 0.01% by weight or more, 0.02% by weight or more, 0.05% by weight or more, 0.1% by weight or more, 0.2% by weight or more, or 0.3% by weight or more.
In one embodiment, the content of the thickener relative to the entire second conductive layer is, for example, 10% by mass or less, 5% by mass or less, 3% by mass or less, 2% by mass or less, or 1% by mass or less.
In one embodiment, the content of the thickener relative to the entire second conductive layer is 0.001 to 10 mass %, 0.001 to 5 mass %, 0.01 to 5 mass %, 0.1 to 5 mass %, or 0.3 to 1 mass %.

 一実施形態において、第2の導電層は、チキソトロピー性付与剤と増粘剤とを含む。 In one embodiment, the second conductive layer includes a thixotropic agent and a thickener.

 一実施形態において、第2の導電層は、以下の条件(P1)及び(P2)を満たす導電性高分子組成物から形成される。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。

Figure JPOXMLDOC01-appb-M000008
In one embodiment, the second conductive layer is formed from a conductive polymer composition that satisfies the following conditions (P1) and (P2).
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000008

 第2の導電層が条件(P1)及び(P2)を満たすと、第1の導電層を形成した多孔質体を浸漬して第2の導電層を形成する際に、少ないディッピング回数であっても厚い第2の導電層を形成しやすい。 If the second conductive layer satisfies conditions (P1) and (P2), when the porous body on which the first conductive layer is formed is immersed to form the second conductive layer, a thick second conductive layer can be easily formed even with a small number of dipping operations.

 一実施形態において、第2の導電層の形成に用いられる導電性高分子組成物は、せん断速度10(1/s)のときの粘度が1Pa・s以上であり、2Pa・s以上又は5Pa・s以上であってもよい。 In one embodiment, the conductive polymer composition used to form the second conductive layer has a viscosity at a shear rate of 10 (1/s) of 1 Pa·s or more, and may be 2 Pa·s or more, or 5 Pa·s or more.

 一実施形態において、第2の導電層の形成に用いられる導電性高分子組成物は、せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、50Pa・s以上、100Pa・s以上、又は500Pa・s以上であってもよい。 In one embodiment, the conductive polymer composition used to form the second conductive layer has a viscosity of 10 Pa·s or more immediately after applying shear at a shear rate of 10 (1/s) for 30 seconds and then reducing the shear rate to 0.0001 (1/s), and may be 50 Pa·s or more, 100 Pa·s or more, or 500 Pa·s or more.

 一実施形態において、第2の導電層の形成に用いられる導電性高分子組成物は、式(P2-1)を満たし、下記式(P2-2)を満たしてもよく、下記式(P2-3)を満たしてもよい。

Figure JPOXMLDOC01-appb-M000009
Figure JPOXMLDOC01-appb-M000010
In one embodiment, the conductive polymer composition used to form the second conductive layer satisfies formula (P2-1), and may also satisfy the following formula (P2-2), or may also satisfy the following formula (P2-3).
Figure JPOXMLDOC01-appb-M000009
Figure JPOXMLDOC01-appb-M000010

 以下、本発明の一態様にかかる固体電解コンデンサで用いることができる部材、及び各層を構成しうる材料等について説明する。 The following describes the components that can be used in the solid electrolytic capacitor according to one embodiment of the present invention, as well as the materials that can form each layer.

[カーボン層]
 カーボン層は、第2の導電層に積層される。カーボン層は、主成分として炭素材料を含む。カーボン層中の炭素材料の含有量は、例えば、60質量%以上であり、70質量%以上が好ましい。炭素材料の含有量がこのような範囲である場合、第2の導電層と銀層とのそれぞれの間で高い密着性を確保しやすい。
[Carbon layer]
The carbon layer is laminated on the second conductive layer. The carbon layer contains a carbon material as a main component. The content of the carbon material in the carbon layer is, for example, 60 mass% or more, and preferably 70 mass% or more. When the content of the carbon material is in such a range, it is easy to ensure high adhesion between the second conductive layer and the silver layer.

 炭素材料としては、活性炭、カーボンブラック、カーボンナノホーン、グラフェン、無定形炭素、天然黒鉛、人造黒鉛、黒鉛化ケッチェンブラック、メソポーラス炭素、カーボンナノチューブ、カーボンナノファイバ等が挙げられる。
 これらの炭素材料は、1種を単独で用いてもよく、2種以上を組み合わせて用いてもよい。
Examples of carbon materials include activated carbon, carbon black, carbon nanohorns, graphene, amorphous carbon, natural graphite, artificial graphite, graphitized ketjen black, mesoporous carbon, carbon nanotubes, and carbon nanofibers.
These carbon materials may be used alone or in combination of two or more.

 カーボン層は、公知のバインダーや添加剤等の他の成分を含んでもよい。
 カーボン層中の炭素粒子の含有量の上限は、他の成分の含有量に応じて決定でき、特に制限されないが、例えば、99質量%以下である。
The carbon layer may contain other components such as known binders and additives.
The upper limit of the content of carbon particles in the carbon layer can be determined depending on the contents of other components, and is not particularly limited, but is, for example, 99 mass % or less.

 カーボン層は、例えば、カーボンペーストを第2の導電層の表面に塗布して乾燥させる方法等によって形成される。
 カーボンペーストの塗布は、例えば、浸漬法、スポンジ転写、スクリーン印刷、スプレー塗布、ディスペンサ、インクジェット印刷等により行うことができる。
The carbon layer is formed, for example, by a method of applying a carbon paste onto the surface of the second conductive layer and drying it.
The carbon paste can be applied by, for example, a dipping method, sponge transfer, screen printing, spray application, a dispenser, inkjet printing, or the like.

 カーボンペーストは、炭素材料と、分散媒と、を含む。分散媒としては、水、有機媒体、又はこれらの混合物等が挙げられる。カーボンペーストは、公知のバインダーや添加剤等の他の成分を含んでもよい。 The carbon paste contains a carbon material and a dispersion medium. Examples of the dispersion medium include water, an organic medium, or a mixture of these. The carbon paste may contain other components such as known binders and additives.

 一実施形態において、カーボン層は、上述した炭素材料が分散した分散媒に、上述した第1の導電層及び第2の導電層を有する陽極体を含浸した後、有機溶媒を揮発させるために所定の温度で乾燥することで積層される。 In one embodiment, the carbon layer is laminated by impregnating the anode body having the first conductive layer and the second conductive layer described above with a dispersion medium in which the carbon material described above is dispersed, and then drying at a predetermined temperature to volatilize the organic solvent.

[銀層]
 銀(Ag)層は、カーボン層に積層される。
[Silver layer]
A layer of silver (Ag) is laminated to the carbon layer.

 銀層は、主成分として銀を含む。銀層中の銀の含有量は、例えば、60質量%以上であり、70質量%以上が好ましい。銀の含有量がこのような範囲である場合、十分な導電性が得られやすい。 The silver layer contains silver as a main component. The silver content in the silver layer is, for example, 60% by mass or more, and preferably 70% by mass or more. When the silver content is within this range, sufficient conductivity is easily obtained.

 銀層は、公知のバインダーや添加剤等の他の成分を含んでもよい。
 銀層中の銀の含有量の上限は、他の成分の含有量に応じて決定でき、特に制限されないが、例えば、99質量%以下である。
The silver layer may contain other components such as known binders and additives.
The upper limit of the silver content in the silver layer can be determined depending on the contents of other components, and is not particularly limited, but is, for example, 99 mass % or less.

 銀層は、例えば、銀ペーストをカーボン層の表面に塗布して乾燥させる方法等によって積層される。銀ペーストとしては、銀を溶媒に分散させた形態のものを使用することができる。 The silver layer is laminated, for example, by applying silver paste to the surface of the carbon layer and drying it. The silver paste that can be used is in the form of silver dispersed in a solvent.

 溶媒に分散することができる限り、銀の形状は限定されないが、例えば板状銀、粒状銀等が挙げられる。
 溶媒としては、銀を分散することができる限り、特に限定されず、公知のものを使用することができる。例えば、芳香族系炭化水素、脂肪族炭化水素、アルコール、ケトン、エーテル、エステル等が挙げられる。また、後述する(b)溶媒において挙げられた具体例を適用できる。
 銀ペーストの塗布は、例えば、浸漬法、スポンジ転写、スクリーン印刷、スプレー塗布、ディスペンサ、インクジェット印刷等により行うことができる。
As long as it can be dispersed in a solvent, the shape of the silver is not limited, and examples thereof include plate-like silver, granular silver, and the like.
The solvent is not particularly limited as long as it can disperse silver, and any known solvent can be used. Examples include aromatic hydrocarbons, aliphatic hydrocarbons, alcohols, ketones, ethers, esters, etc. In addition, specific examples of the solvent (b) described below can be used.
The silver paste can be applied by, for example, a dipping method, sponge transfer, screen printing, spray application, a dispenser, inkjet printing, or the like.

 一実施形態において、銀層は、銀が分散した有機溶媒に、上述した第1の導電層、第2の導電層、及びカーボン層を有する陽極体を含浸した後、有機溶媒を揮発させるために所定の温度で乾燥することで積層される。 In one embodiment, the silver layer is laminated by impregnating the anode body having the above-mentioned first conductive layer, second conductive layer, and carbon layer with an organic solvent in which silver is dispersed, and then drying at a predetermined temperature to volatilize the organic solvent.

 本実施形態に係る固体電解コンデンサは、例えば、以下で説明する本発明の製造方法により製造できる。 The solid electrolytic capacitor according to this embodiment can be manufactured, for example, by the manufacturing method of the present invention described below.

[固体電解コンデンサの製造方法]
 本発明の一態様にかかる固体電解コンデンサの製造方法は、以下の工程(A-1)又は(A-2)と、工程(B)と、工程(C)とを含む。
(A-1)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子及び溶媒を含む第1の導電性高分子組成物に浸漬する工程
(A-2)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子、溶媒、及びフェノール性化合物を含む第1の導電性高分子組成物に浸漬する工程
(B)前記多孔質体を、前記工程(A-1)又は(A-2)で用いた第1の導電性高分子組成物から取り出して、前記第1の導電性高分子組成物に含まれる溶媒の沸点以下の温度下で保持する工程
(C)前記工程(B)を経た後の前記多孔質体の一部又は全体を、前記第1の導電性高分子組成物と同一又は異なる導電性高分子、チキソトロピー性付与剤、及び溶媒を含む第2の導電性高分子組成物に浸漬し、乾燥する工程
[Method of manufacturing solid electrolytic capacitor]
A method for producing a solid electrolytic capacitor according to one aspect of the present invention includes the following steps (A-1) or (A-2), (B), and (C).
(A-1) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer and a solvent; (A-2) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound; (B) A step of removing the porous body from the first conductive polymer composition used in the step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition; (C) A step of immersing a part or the whole of the porous body after the step (B) in a second conductive polymer composition containing a conductive polymer, a thixotropy-imparting agent, and a solvent that is the same as or different from the first conductive polymer composition, and drying the second conductive polymer composition.

 上記工程(A-1)又は(A-2)及び工程(B)は、上述した陽極体の表面に第1の導電層を形成する工程である。上記工程(C)は第2の導電層を形成する工程である。 The above steps (A-1) or (A-2) and (B) are steps for forming a first conductive layer on the surface of the anode body. The above step (C) is a step for forming a second conductive layer.

 一実施形態において、本発明の一態様にかかる固体電解コンデンサの製造方法は、工程(A-1)、(B)、及び(C)を含む。
 一実施形態において、本発明の一態様にかかる固体電解コンデンサの製造方法は、工程(A-2)、(B)、及び(C)を含む。
In one embodiment, a method for producing a solid electrolytic capacitor according to one aspect of the present invention includes steps (A-1), (B), and (C).
In one embodiment, a method for producing a solid electrolytic capacitor according to one aspect of the present invention includes steps (A-2), (B), and (C).

[第1の層の形成工程]
<工程(A-1)及び(A-2)>
 第1の層の形成工程は、工程(A-1)及び(A-2)のいずれかを含む。
 工程(A-1)では、弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子及び溶媒を含む第1の導電性高分子組成物に浸漬する。
 工程(A-2)では、弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子、溶媒、及びフェノール性化合物を含む第1の導電性高分子組成物に浸漬する。
[First layer formation process]
<Steps (A-1) and (A-2)>
The step of forming the first layer includes any one of steps (A-1) and (A-2).
In the step (A-1), a part or the whole of a porous body having an oxide of a valve metal is immersed in a first conductive polymer composition containing a conductive polymer and a solvent.
In the step (A-2), a part or the whole of the porous body having an oxide of a valve metal is immersed in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound.

 多孔質体及び弁金属としては、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。
 工程(A-1)における第1の導電性高分子組成物は、導電性高分子及び溶媒を含む。
 工程(A-2)における第1の導電性高分子組成物は、導電性高分子、溶媒、及びフェノール性化合物を含む。
As for the porous body and the valve metal, the matters explained in the solid electrolytic capacitor according to one aspect of the present invention can be applied.
The first conductive polymer composition in step (A-1) contains a conductive polymer and a solvent.
The first conductive polymer composition in step (A-2) contains a conductive polymer, a solvent, and a phenolic compound.

[(a)導電性高分子]
 導電性高分子(以下、「成分(a)」ともいう)としては、ポリアニリン、ポリアニリン誘導体、ポリチオフェン、及びポリチオフェン誘導体等が挙げられる。
 これらは、1種を単独で用いてもよく、2種以上を併用してもよい。
[(a) Conductive polymer]
Examples of the conductive polymer (hereinafter also referred to as "component (a)") include polyaniline, polyaniline derivatives, polythiophene, and polythiophene derivatives.
These may be used alone or in combination of two or more.

 ポリアニリン、ポリアニリン誘導体、ポリチオフェン、及びポリチオフェン誘導体としては、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。 The polyaniline, polyaniline derivatives, polythiophene, and polythiophene derivatives can be those described in the solid electrolytic capacitor according to one embodiment of the present invention.

 一実施形態において、第1の導電性高分子組成物は、ポリアニリン又はポリアニリン誘導体を含む。第1の導電性高分子組成物を、陽極体の細孔内部に含浸させ、第1の導電層を誘電体層表面に被覆させるため、第1の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量は、後述する第2の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量よりも小さいことが好ましい。例えば、第1の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量は、100,000以下であることが好ましい。 In one embodiment, the first conductive polymer composition contains polyaniline or a polyaniline derivative. In order to impregnate the pores of the anode body with the first conductive polymer composition and to coat the surface of the dielectric layer with the first conductive layer, it is preferable that the weight average molecular weight of the polyaniline and polyaniline derivative used in the first conductive polymer composition is smaller than the weight average molecular weight of the polyaniline and polyaniline derivative used in the second conductive polymer composition described below. For example, it is preferable that the weight average molecular weight of the polyaniline and polyaniline derivative used in the first conductive polymer composition is 100,000 or less.

 一実施形態において、第1の導電性高分子組成物は、ポリアニリンがプロトン供与体でドープされているポリアニリン複合体を含む。
 一実施形態において、第1の導電性高分子組成物は、ポリアニリンがスルホコハク酸でドープされているポリアニリン複合体を含む。
In one embodiment, the first conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with a proton donor.
In one embodiment, the first conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with sulfosuccinic acid.

[(b)溶媒]
 溶媒(以下、「成分(b)」ともいう)は、導電性高分子を溶解又は分散するものであれば特に制限はない。溶媒(成分(b))は、導電性高分子を溶解するものが特に好ましい。但し、後述する成分(c)は含まない。
(b) Solvent
The solvent (hereinafter also referred to as "component (b)") is not particularly limited as long as it dissolves or disperses the conductive polymer. It is particularly preferable that the solvent (component (b)) dissolves the conductive polymer. However, the solvent does not include the component (c) described below.

 溶媒は有機溶媒が好ましい。例えば、芳香族系炭化水素、脂肪族炭化水素、アルコール、ケトン、エーテル、エステルが挙げられる。
 これらは1種を単独で用いてもよく、また、2種以上を組み合わせて用いてもよい。
The solvent is preferably an organic solvent, examples of which include aromatic hydrocarbons, aliphatic hydrocarbons, alcohols, ketones, ethers, and esters.
These may be used alone or in combination of two or more.

 有機溶媒は、水溶性有機溶媒でもよく、また、実質的に水に混和しない有機溶媒(水不混和性有機溶媒)でもよい。
 水溶性有機溶媒としては高極性有機溶媒が使用でき、プロトン性極性溶媒でも非プロトン性極性溶媒でもよい。
 水溶性有機溶媒としては、例えば、メタノール、エタノール、イソプロピルアルコール、1-プロパノール、1-エトキシ-2-プロパノール、2-エトキシ-1-プロパノール、1-ブタノール、2-ブタノール、2-ペンタノール、ベンジルアルコール、アルコキシアルコール(例えば1-メトキシ-2-プロパノール、3-メトキシ-1-ブタノール、3-メトキシ-3-メチルブタノール)等のアルコール類;アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類;テトラヒドロフラン、4-メチルテトラヒドロピラン、ジオキサン、ジエチルエーテル、エチレングリコールモノ-tert-ブチルエーテル等のエーテル類;Nメチルピロリドン等の非プロトン性極性溶媒等が挙げられる。
The organic solvent may be a water-soluble organic solvent, or may be an organic solvent that is substantially not miscible with water (a water-immiscible organic solvent).
As the water-soluble organic solvent, a highly polar organic solvent can be used, and it may be either a protic polar solvent or an aprotic polar solvent.
Examples of the water-soluble organic solvent include alcohols such as methanol, ethanol, isopropyl alcohol, 1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, 1-butanol, 2-butanol, 2-pentanol, benzyl alcohol, and alkoxyalcohols (e.g., 1-methoxy-2-propanol, 3-methoxy-1-butanol, and 3-methoxy-3-methylbutanol); ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone; ethers such as tetrahydrofuran, 4-methyltetrahydropyran, dioxane, diethyl ether, and ethylene glycol mono-tert-butyl ether; and aprotic polar solvents such as N-methylpyrrolidone.

 水不混和性有機溶媒としては、低極性有機溶媒が使用でき、例えば、ヘキサン、ベンゼン、トルエン、キシレン、エチルベンゼン、テトラリン等の炭化水素系溶媒;塩化メチレン、クロロホルム、四塩化炭素、ジクロロエタン、テトラクロロエタン等の含ハロゲン系溶媒;酢酸エチル、酢酸イソブチル、酢酸n-ブチル、乳酸エチル、乳酸メチル等のエステル系溶媒;メチルイソブチルケトン(MIBK)、メチルエチルケトン、シクロペンタノン、シクロヘキサノン等のケトン類溶媒;シクロペンチルメチルエーテル等のエーテル類溶媒等が挙げられる。
 また、炭化水素系溶媒として1種又は2種以上のイソパラフィンを含むイソパラフィン系溶媒を用いてもよい。
As the water-immiscible organic solvent, a low-polarity organic solvent can be used, and examples thereof include hydrocarbon solvents such as hexane, benzene, toluene, xylene, ethylbenzene, tetralin, etc.; halogen-containing solvents such as methylene chloride, chloroform, carbon tetrachloride, dichloroethane, tetrachloroethane, etc.; ester solvents such as ethyl acetate, isobutyl acetate, n-butyl acetate, ethyl lactate, methyl lactate, etc.; ketone solvents such as methyl isobutyl ketone (MIBK), methyl ethyl ketone, cyclopentanone, cyclohexanone, etc.; and ether solvents such as cyclopentyl methyl ether, etc.
Furthermore, an isoparaffin-based solvent containing one or more types of isoparaffin may be used as the hydrocarbon-based solvent.

 また、市販の溶媒としては、例えば「キョーワゾールC900」(KHネオケム株式会社製)を用いることもできる。 Also, a commercially available solvent such as "Kyowasol C900" (manufactured by KH Neochem Co., Ltd.) can be used.

 これらのうち、導電性高分子の溶解性に優れる点でトルエン、キシレン、メチルイソブチルケトン、クロロホルム、トリクロロエタン、及び酢酸エチルが好ましい。 Of these, toluene, xylene, methyl isobutyl ketone, chloroform, trichloroethane, and ethyl acetate are preferred because they have excellent solubility for conductive polymers.

 尚、ポリアニリン複合体の場合は、溶媒がイソプロピルアルコール、1-ブタノール、2-ブタノール、2-ペンタノール、ベンジルアルコール、アルコキシアルコール等のアルコール類であっても溶解することができる。アルコールは、トルエン等の芳香族に比べて環境負荷低減の観点から好ましい。 In addition, polyaniline complexes can be dissolved even in alcoholic solvents such as isopropyl alcohol, 1-butanol, 2-butanol, 2-pentanol, benzyl alcohol, and alkoxy alcohols. Alcohols are preferable from the viewpoint of reducing the environmental impact compared to aromatic solvents such as toluene.

 溶媒として有機溶媒を用いる場合、水不混和性有機溶媒と水溶性有機溶媒を99~1:1~99(質量比)で混合した混合有機溶媒を用いることにより、保存時のゲル等の発生を防止でき、長期保存できることから好ましい。
 混合有機溶媒は、水不混和性有機溶媒を1種又は2種以上含んでもよく、水溶性有機溶媒を1種又は2種以上含んでもよい。
When an organic solvent is used as the solvent, it is preferable to use a mixed organic solvent obtained by mixing a water-immiscible organic solvent and a water-soluble organic solvent in a ratio of 99 to 1:1 to 99 (mass ratio), since this can prevent the generation of gels or the like during storage and allows long-term storage.
The mixed organic solvent may contain one or more water-immiscible organic solvents, and may contain one or more water-soluble organic solvents.

 溶媒(成分(b))との合計量に対する成分(a)の濃度[成分(a)×100/(成分(a)+成分(b))]は、0.01質量%以上であってもよく、0.03質量%以上であってもよく、0.05質量%以上であってもよく、2.0質量%以上であってもよい。また、通常15.0質量%以下であり、13.0質量%以下であってもよく、12.0質量%以下であってもよく、10.0質量%以下であってもよく、9.0質量%以下であってもよく、8.0質量%以下であってもよい。 The concentration of component (a) relative to the total amount of the solvent (component (b)) [component (a) x 100/(component (a) + component (b))] may be 0.01 mass% or more, 0.03 mass% or more, 0.05 mass% or more, or 2.0 mass% or more. It is usually 15.0 mass% or less, 13.0 mass% or less, 12.0 mass% or less, 10.0 mass% or less, 9.0 mass% or less, or 8.0 mass% or less.

 導電性高分子組成物が、さらに後述する成分(c)を含む場合、成分(a)の濃度は、導電性高分子組成物に対して、通常0.3~20質量%であり、好ましくは0.5~20質量%であり、より好ましくは1~15質量%であり、さらに好ましくは1~10質量%であり、さらに好ましくは1~7質量%である。 When the conductive polymer composition further contains component (c) described below, the concentration of component (a) is usually 0.3 to 20 mass % relative to the conductive polymer composition, preferably 0.5 to 20 mass %, more preferably 1 to 15 mass %, even more preferably 1 to 10 mass %, and even more preferably 1 to 7 mass %.

 成分(b)の含有量は、他の成分の量により適宜調整でき限定されないが、例えば、成分(a)100質量部に対して200~20000質量部、300~17000質量部、500~12000質量部、500~5000質量部、又は500~1500質量部とできる。 The amount of component (b) is not limited and can be adjusted appropriately depending on the amount of other components, but can be, for example, 200 to 20,000 parts by mass, 300 to 17,000 parts by mass, 500 to 12,000 parts by mass, 500 to 5,000 parts by mass, or 500 to 1,500 parts by mass per 100 parts by mass of component (a).

[(c)フェノール性化合物]
 フェノール性化合物(成分(c))は特に限定されず、ArOH(ここで、Arはアリール基又は置換アリール基である)で示される化合物である。尚、成分(c)は、成分(b)とは異なる成分である。
[(c) Phenolic Compound]
The phenolic compound (component (c)) is not particularly limited and is a compound represented by ArOH (wherein Ar is an aryl group or a substituted aryl group). Note that component (c) is a component different from component (b).

 フェノール性化合物の例としては、具体的には、フェノール、o-,m-,もしくはp-クレゾール、o-,m-,もしくはp-エチルフェノール、o-,m-,もしくはp-プロピルフェノール、o-,m-,もしくはp-ブチルフェノール、o-,m-,もしくはp-クロロフェノール、サリチル酸、ヒドロキシ安息香酸、ヒドロキシナフタレン等の置換フェノール類;カテコール、レゾルシノール等の多価フェノール性化合物;及びフェノール樹脂、ポリフェノール、ポリ(ヒドロキシスチレン)等の高分子化合物等が挙げられる。 Specific examples of phenolic compounds include substituted phenols such as phenol, o-, m-, or p-cresol, o-, m-, or p-ethylphenol, o-, m-, or p-propylphenol, o-, m-, or p-butylphenol, o-, m-, or p-chlorophenol, salicylic acid, hydroxybenzoic acid, and hydroxynaphthalene; polyhydric phenolic compounds such as catechol and resorcinol; and polymeric compounds such as phenolic resins, polyphenols, and poly(hydroxystyrene).

 また、下記式(C1)で表されるフェノール性化合物を用いることができる。

Figure JPOXMLDOC01-appb-C000011
(式中、nは1~5の整数である。nが2以上である場合、複数のR21はそれぞれ、同じであってもよく、また、異なっていてもよい。
 R21は、炭素数2~10のアルキル基、炭素数2~20のアルケニル基、炭素数1~20のアルキルチオ基、炭素数3~10のシクロアルキル基、炭素数6~20のアリール基、炭素数7~20のアルキルアリール基、又は炭素数7~20のアリールアルキル基である。) Furthermore, a phenolic compound represented by the following formula (C1) can be used.
Figure JPOXMLDOC01-appb-C000011
(In the formula, n is an integer of 1 to 5. When n is 2 or more, the multiple R 21 may be the same or different.
R 21 is an alkyl group having 2 to 10 carbon atoms, an alkenyl group having 2 to 20 carbon atoms, an alkylthio group having 1 to 20 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, an aryl group having 6 to 20 carbon atoms, an alkylaryl group having 7 to 20 carbon atoms, or an arylalkyl group having 7 to 20 carbon atoms.

 上記R21のアルキル基としては、メチル、エチル、プロピル、イソプロピル、ブチル、イソブチル、ターシャルブチル、ターシャルアミル等が挙げられる。
 アルケニル基としては、上述したアルキル基の分子内に不飽和結合を有する置換基が挙げられる。
 シクロアルキル基としては、シクロペンタン、シクロヘキサン等が挙げられる。
 アルキルチオ基としては、メチルチオ、エチルチオ等が挙げられる。
 アリール基としては、フェニル、ナフチル等が挙げられる。
 アルキルアリール基、及びアリールアルキル基としては、上述したアルキル基とアリール基を組み合わせて得られる置換基等が挙げられる。
 これらの基のうち、R21としては、メチル基又はエチル基が好ましい。
Examples of the alkyl group represented by R21 include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, and tertiary amyl.
The alkenyl group includes the above-mentioned alkyl groups each having an unsaturated bond in the molecule.
Cycloalkyl groups include cyclopentane, cyclohexane, and the like.
Alkylthio groups include methylthio, ethylthio, and the like.
Aryl groups include phenyl, naphthyl, and the like.
Examples of the alkylaryl group and the arylalkyl group include the substituents obtained by combining the above-mentioned alkyl group and aryl group.
Of these groups, R 21 is preferably a methyl group or an ethyl group.

 式(C1)で表されるフェノール性化合物の例としては、具体的には、4-tert-アミルフェノール、2-イソプロピルフェノール、4-イソプロピル-3-メチルフェノール、2-イソプロピル-5-メチルフェノール(チモール)、5-イソプロピル-2-メチルフェノール(カルバクロール)、及び4-(1,1.3,3-テトラメチルブチル)フェノール等が挙げられる。 Specific examples of phenolic compounds represented by formula (C1) include 4-tert-amylphenol, 2-isopropylphenol, 4-isopropyl-3-methylphenol, 2-isopropyl-5-methylphenol (thymol), 5-isopropyl-2-methylphenol (carbacrol), and 4-(1,1.3,3-tetramethylbutyl)phenol.

 成分(c)の含有量は、好ましくは成分(a)100質量部に対して10~5000質量部であり、より好ましくは10~2000質量部であり、より好ましくは10~1000質量部である。
 また、成分(c)の含有量は、成分(a)100質量部に対して100~10000質量部であってもよい。
 当該フェノール性化合物を用いることにより、導電性が向上したり、アルコールへの溶解性が向上したりするため好ましい。
The content of component (c) is preferably 10 to 5000 parts by mass, more preferably 10 to 2000 parts by mass, and more preferably 10 to 1000 parts by mass, per 100 parts by mass of component (a).
The content of component (c) may be 100 to 10,000 parts by mass per 100 parts by mass of component (a).
The use of such a phenolic compound is preferable because it improves the electrical conductivity and improves the solubility in alcohol.

 成分(c)の含有量は、導電性高分子組成物中に1~80質量%、より好ましくは5~60質量%、さらに好ましくは10~40質量%である。当該フェノール性化合物を用いることにより、導電性が向上したり、アルコールへの溶解性が向上したりするため好ましい。
 また、成分(c)を成分(b)と混合し、混合溶媒として用いてもよい。この場合、成分(a)の溶媒に対する濃度は、成分(b)と成分(c)を合わせた質量に対して計算する。
The content of component (c) in the conductive polymer composition is 1 to 80% by mass, more preferably 5 to 60% by mass, and even more preferably 10 to 40% by mass. Use of the phenolic compound is preferable because it improves the electrical conductivity and improves the solubility in alcohol.
Also, component (c) may be mixed with component (b) to be used as a mixed solvent. In this case, the concentration of component (a) in the solvent is calculated based on the combined mass of components (b) and (c).

[(d)耐熱安定化剤]
 導電性高分子組成物は、さらに、(d)耐熱安定化剤(以下、「成分(d)」ともいう)を含んでもよい。
[(d) Heat resistance stabilizer]
The conductive polymer composition may further contain (d) a heat resistance stabilizer (hereinafter also referred to as "component (d)").

 耐熱安定化剤(成分(d))としては、酸性物質又は酸性物質の塩が挙げられる。但し、成分(d)は成分(c)を含まない。 The heat resistance stabilizer (component (d)) may be an acidic substance or a salt of an acidic substance. However, component (d) does not include component (c).

 酸性物質は、有機化合物の酸である有機酸、無機化合物の酸である無機酸のいずれでもよく、好ましくは有機酸である。
 酸性物質としては、好ましくはスルホン酸基を1つ以上含む有機酸である。
The acidic substance may be either an organic acid, which is an acid of an organic compound, or an inorganic acid, which is an acid of an inorganic compound, and is preferably an organic acid.
The acidic substance is preferably an organic acid containing one or more sulfonic acid groups.

 上記スルホン酸基を有する有機酸は、好ましくはスルホン酸基を1つ以上有する、環状、鎖状又は分岐のアルキルスルホン酸、置換又は無置換の芳香族スルホン酸、又はポリスルホン酸である。
 上記アルキルスルホン酸としては、例えば、メタンスルホン酸、エタンスルホン酸、ジ(2-エチルヘキシル)スルホコハク酸が挙げられる。ここで、アルキル基は好ましくは炭素数が1~18の直鎖又は分岐のアルキル基である。
 上記芳香族スルホン酸としては、炭素数6~20のものが挙げられ、例えば、ベンゼン環を有するスルホン酸、ナフタレン骨格を有するスルホン酸、アントラセン骨格を有するスルホン酸が挙げられる。また、上記芳香族スルホン酸としては、置換又は無置換のベンゼンスルホン酸、置換又は無置換のナフタレンスルホン酸及び置換又は無置換のアントラセンスルホン酸が挙げられる。
The above-mentioned organic acid having a sulfonic acid group is preferably a cyclic, linear or branched alkylsulfonic acid, a substituted or unsubstituted aromatic sulfonic acid, or a polysulfonic acid, each of which has one or more sulfonic acid groups.
Examples of the alkylsulfonic acid include methanesulfonic acid, ethanesulfonic acid, and di(2-ethylhexyl)sulfosuccinic acid. The alkyl group is preferably a linear or branched alkyl group having 1 to 18 carbon atoms.
Examples of the aromatic sulfonic acid include those having 6 to 20 carbon atoms, such as sulfonic acids having a benzene ring, sulfonic acids having a naphthalene skeleton, and sulfonic acids having an anthracene skeleton. Examples of the aromatic sulfonic acid include substituted or unsubstituted benzenesulfonic acid, substituted or unsubstituted naphthalenesulfonic acid, and substituted or unsubstituted anthracenesulfonic acid.

 置換基としては、例えば、アルキル基(例えば炭素数1~20のもの)、アルコキシ基(例えば炭素数1~20のもの)、ヒドロキシ基、ニトロ基、カルボキシ基、アシル基からなる群から選択される置換基であり、1以上置換していてもよい。 The substituent may be, for example, one or more selected from the group consisting of an alkyl group (e.g., one having 1 to 20 carbon atoms), an alkoxy group (e.g., one having 1 to 20 carbon atoms), a hydroxy group, a nitro group, a carboxy group, and an acyl group.

 具体的に、芳香族スルホン酸として、下記式(D1)又は(D2)で表される化合物が挙げられる。

Figure JPOXMLDOC01-appb-C000012
(式(D1)中、lは1以上であり、mは0以上5以下の整数であり、nは0以上5以下の整数である。m又はnの一方が0の場合、他方は1以上である。)
Figure JPOXMLDOC01-appb-C000013
(式(D2)中、qは1以上であり、pは0以上7以下の整数であり、Rは、それぞれ独立に炭素数1~20のアルキル基、カルボキシ基、水酸基、ニトロ基、シアノ基、アミノ基である。) Specific examples of the aromatic sulfonic acid include compounds represented by the following formula (D1) or (D2).
Figure JPOXMLDOC01-appb-C000012
(In formula (D1), l is 1 or more, m is an integer of 0 or more and 5 or less, and n is an integer of 0 or more and 5 or less. When one of m and n is 0, the other is 1 or more.)
Figure JPOXMLDOC01-appb-C000013
(In formula (D2), q is 1 or more, p is an integer of 0 to 7, and R each independently represents an alkyl group having 1 to 20 carbon atoms, a carboxy group, a hydroxyl group, a nitro group, a cyano group, or an amino group.)

 lは1~3が好ましい。mは1~3が好ましい。nは0~3が好ましい。
 qは1~3が好ましい。pは0~3が好ましい。Rは炭素数1~20のアルキル基、カルボキシ基、水酸基が好ましい。
l is preferably an integer of 1 to 3. m is preferably an integer of 1 to 3. n is preferably an integer of 0 to 3.
q is preferably 1 to 3. p is preferably 0 to 3. R is preferably an alkyl group having 1 to 20 carbon atoms, a carboxy group, or a hydroxyl group.

 芳香族スルホン酸としては、4-スルホフタル酸、5-スルホイソフタル酸、5-スルホサリチル酸、1-ナフタレンスルホン酸、2-ナフタレンスルホン酸、2-ヒドロキシ-6-ナフタレンスルホン酸、1,5-ナフタレンジスルホン酸、2,6-ナフタレンジスルホン酸、p-フェノールスルホン酸、トルエンスルホン酸、p-キシレン-2-スルホン酸、4,4’-ビフェニルジスルホン酸、ジベンゾフラン-2-スルホン酸、フラビアン酸、(+)-10-カンファースルホン酸、モノイソプロピルナフタレンスルホン酸、1-ピレンスルホン酸等が挙げられる。これらの中でも、耐熱性向上の観点から、4-スルホフタル酸、5-スルホサリチル酸、5-スルホイソフタル酸、2-ナフタレンスルホン酸、ジベンゾフラン-2-スルホン酸、フラビアン酸、2-ヒドロキシ-6-ナフタレンスルホン酸及び1-ピレンスルホン酸が好ましい。 Aromatic sulfonic acids include 4-sulfophthalic acid, 5-sulfoisophthalic acid, 5-sulfosalicylic acid, 1-naphthalenesulfonic acid, 2-naphthalenesulfonic acid, 2-hydroxy-6-naphthalenesulfonic acid, 1,5-naphthalenedisulfonic acid, 2,6-naphthalenedisulfonic acid, p-phenolsulfonic acid, toluenesulfonic acid, p-xylene-2-sulfonic acid, 4,4'-biphenyldisulfonic acid, dibenzofuran-2-sulfonic acid, flavianic acid, (+)-10-camphorsulfonic acid, monoisopropylnaphthalenesulfonic acid, 1-pyrenesulfonic acid, etc. Among these, from the viewpoint of improving heat resistance, 4-sulfophthalic acid, 5-sulfosalicylic acid, 5-sulfoisophthalic acid, 2-naphthalenesulfonic acid, dibenzofuran-2-sulfonic acid, flavianic acid, 2-hydroxy-6-naphthalenesulfonic acid, and 1-pyrenesulfonic acid are preferred.

 酸性物質の塩としては、上記に挙げた化合物の塩が挙げられる。塩の対イオンとしては、ナトリウム、リチウム、カリウム、セシウム、アンモニウム、カルシウム、バリウム等が挙げられる。
 成分(d)は水和物であってもよい。
Examples of the salts of acidic substances include salts of the compounds listed above. Examples of the counter ions of the salts include sodium, lithium, potassium, cesium, ammonium, calcium, barium, etc.
Component (d) may be a hydrate.

 成分(d)の含有量は、好ましくは成分(a)100質量部に対して0.1~1000質量部であり、より好ましくは1~100質量部であり、さらに好ましくは1~30質量部であり、さらに好ましくは2~8質量部である。 The content of component (d) is preferably 0.1 to 1000 parts by mass, more preferably 1 to 100 parts by mass, even more preferably 1 to 30 parts by mass, and even more preferably 2 to 8 parts by mass, per 100 parts by mass of component (a).

[(e)添加剤]
 導電性高分子組成物は、上記成分の他に、必要に応じて、添加剤(以下、「成分(e)」ともいう)を含んでもよい。但し、成分(e)は、上述した成分(a)~(d)に該当するものを含まない。
 添加剤としては、密着性付与剤、フィラー、レオロジーコントロール剤、及びバインダー樹脂等が挙げられる。
[(e) Additives]
In addition to the above components, the conductive polymer composition may contain an additive (hereinafter, also referred to as "component (e)") as necessary. However, component (e) does not include any of the above components (a) to (d).
The additives include an adhesion imparting agent, a filler, a rheology control agent, a binder resin, and the like.

 密着性付与剤としては、イソシアネートシラン、グリシジルシラン等のシランカップリング剤や、酸性ポリエステル等のポリマーカップリング剤等が挙げられる。
 市販密着性付与剤としては、例えば「BYK-4510」(BYK Additives&Instruments製)を用いることができる。
 フィラーとしては、アルミナ、シリカ、チタニア、及びジルコニア等が挙げられる。
Examples of the adhesion imparting agent include silane coupling agents such as isocyanate silane and glycidyl silane, and polymer coupling agents such as acidic polyester.
As a commercially available adhesion promoter, for example, "BYK-4510" (manufactured by BYK Additives & Instruments) can be used.
Examples of the filler include alumina, silica, titania, and zirconia.

 導電性高分子組成物は、本質的に、成分(a)及び(b)並びに、任意に成分(c)、成分(d)、及び成分(e)からなってもよい。この場合、不可避不純物を含んでもよい。導電性高分子組成物の、例えば、70質量%以上、80質量%以上、90質量%以上、98質量%以上、99質量%以上、99.5質量%以上が、成分(a)及び(b)、並びに、任意に成分(c)、成分(d)、及び成分(e)であってもよい。また、導電性高分子組成物は、成分(a)及び(b)、並びに、任意に成分(c)、成分(d)、及び成分(e)のみからなってもよい。 The conductive polymer composition may essentially consist of components (a) and (b), and optionally components (c), (d), and (e). In this case, it may contain unavoidable impurities. For example, 70% by mass or more, 80% by mass or more, 90% by mass or more, 98% by mass or more, 99% by mass or more, or 99.5% by mass or more of the conductive polymer composition may be components (a) and (b), and optionally components (c), (d), and (e). The conductive polymer composition may also consist only of components (a) and (b), and optionally components (c), (d), and (e).

 弁金属の酸化物を有する多孔質体の第1の導電性高分子組成物への浸漬方法は、特に限定されず、一回の投入動作によって、多孔質体の全体を導電性高分子組成物に浸漬してもよく、導電性高分子組成物に多孔質体を段階的に又は連続的に浸漬してもよい。
 「段階的に浸漬する」とは、多孔質体を複数回に分けて移動させて、導電性高分子組成物に段階的に、多孔質体を浸漬することを意味する。つまり、「段階的に浸漬する」とは、浸漬動作を段階的に行うことを意味し、段階的な一連の浸漬動作の後に工程(B)における導電性高分子組成物からの取り出しを行う。
 「連続的に浸漬する」とは、多孔質体を所定の速度で連続的に移動させて、導電性高分子組成物に徐々に浸漬することを意味する。
 導電性高分子組成物に多孔質体を段階的に又は連続的に浸漬することで、多孔質体の細孔内部に導電性高分子を円滑に含浸させることができる。
The method of immersing the porous body having an oxide of a valve metal in the first conductive polymer composition is not particularly limited, and the entire porous body may be immersed in the conductive polymer composition in a single insertion operation, or the porous body may be immersed in the conductive polymer composition stepwise or continuously.
"Stepwise immersion" means that the porous body is moved in a number of separate steps to gradually immerse the porous body in the conductive polymer composition. In other words, "stepwise immersion" means that the immersion operation is carried out step by step, and after a series of stepwise immersion operations, the porous body is removed from the conductive polymer composition in step (B).
The term "continuously immersed" means that the porous body is moved continuously at a predetermined speed and gradually immersed in the conductive polymer composition.
By immersing the porous body in the conductive polymer composition stepwise or continuously, the conductive polymer can be smoothly impregnated into the pores of the porous body.

 一回の投入動作によって、多孔質体の全体を導電性高分子組成物に浸漬する場合、導電性高分子組成物中で多孔質体を保持する時間(以下、単に浸漬時間という)は、通常1~30分間であり、好ましくは1~10分間である。 When the entire porous body is immersed in the conductive polymer composition in a single pouring operation, the time for which the porous body is held in the conductive polymer composition (hereinafter simply referred to as the immersion time) is usually 1 to 30 minutes, and preferably 1 to 10 minutes.

 多孔質体を複数回に分けて移動して、導電性高分子組成物に段階的に多孔質体を浸漬する場合、先ず多孔質体の下端から所定の高さまでの部位を導電性高分子組成物に浸漬して、例えば1~30分間、好ましくは1~10分間浸漬状態を保持する。
 次いで、多孔質体を移動させて、非浸漬部のうちの一部を、さらに導電性高分子組成物に浸漬して、例えば1~20分間、好ましくは1~10分間浸漬状態を保持する。
When the porous body is moved in several separate steps to gradually immerse the porous body in the conductive polymer composition, first, a portion of the porous body from the lower end to a predetermined height is immersed in the conductive polymer composition and maintained in the immersed state for, for example, 1 to 30 minutes, preferably 1 to 10 minutes.
Next, the porous body is moved so that a portion of the non-immersed portion is further immersed in the conductive polymer composition, and the immersion state is maintained for, for example, 1 to 20 minutes, preferably 1 to 10 minutes.

 多孔質体を浸漬する導電性高分子組成物の温度は、特に限定されず、通常は常温(例えば、15~30℃、あるいは25℃)である。 The temperature of the conductive polymer composition into which the porous body is immersed is not particularly limited, and is usually room temperature (e.g., 15 to 30°C, or 25°C).

<工程(B)>
 工程(B)は、多孔質体を、工程(A-1)又は(A-2)で用いた第1の導電性高分子組成物から取り出して、第1の導電性高分子組成物に含まれる溶媒の沸点以下の温度下で保持する工程である。これにより、多孔質体の細孔の開口部に形成された液膜が消滅し、液封状態が解消できる。したがって、細孔内部への導電性高分子組成物の充填量を増やすことができる。
<Process (B)>
Step (B) is a step of removing the porous body from the first conductive polymer composition used in step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition. This causes the liquid film formed at the openings of the pores in the porous body to disappear, and the liquid-sealed state can be eliminated. Therefore, the amount of the conductive polymer composition filled into the inside of the pores can be increased.

 工程(B)において、保持温度は第1の導電性高分子組成物に含まれる溶媒の沸点以下の温度であり、溶媒の種類によって適宜選択すればよいが、例えば常温である。保持時間は、通常30秒~5分であり、好ましくは1分~2分である。 In step (B), the holding temperature is a temperature below the boiling point of the solvent contained in the first conductive polymer composition and may be appropriately selected depending on the type of solvent, for example, room temperature. The holding time is usually 30 seconds to 5 minutes, and preferably 1 minute to 2 minutes.

 一実施形態においては、工程(C)の前に、工程(A)及び工程(B)のサイクルを、複数回繰り返して行ってもよい。
 工程(C)の前に、工程(A)及び工程(B)のサイクルを、複数回繰り返して行う場合、一連のサイクルで形成された複数の層を合わせて内部固体電解質層(第1の導電層)という。
In one embodiment, a cycle of steps (A) and (B) may be repeated multiple times prior to step (C).
When a cycle of steps (A) and (B) is repeated multiple times before step (C), the multiple layers formed in a series of cycles are collectively referred to as an internal solid electrolyte layer (first conductive layer).

 一実施形態において、上記工程(B)後、工程(C)の前に乾燥工程(B1)を設けてもよい。乾燥工程における温度は、第1の導電性高分子組成物に含まれる溶媒の沸点以下である必要はない。乾燥温度は、通常30~200℃であり、好ましくは100~180℃である。乾燥時間は、通常10~120分であり、好ましくは30~90分である。
 乾燥工程(B1)の前に、工程(A)及び工程(B)のサイクルを、複数回繰り返してもよい。
In one embodiment, a drying step (B1) may be performed after the step (B) and before the step (C). The temperature in the drying step does not need to be equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition. The drying temperature is usually 30 to 200° C., and preferably 100 to 180° C. The drying time is usually 10 to 120 minutes, and preferably 30 to 90 minutes.
Prior to the drying step (B1), the cycle of steps (A) and (B) may be repeated multiple times.

[第2の導電層の形成工程]
<工程(C)>
 工程(C)は、工程(B)を経た後の多孔質体の一部又は全体を、前記第1の導電性高分子組成物と同一又は異なる導電性高分子、チキソトロピー性付与剤、及び溶媒を含む第2の導電性高分子組成物に浸漬及び乾燥して、第2の導電層を形成する工程である。
[Step of forming second conductive layer]
<Process (C)>
Step (C) is a step of immersing a part or the whole of the porous body after step (B) in a second conductive polymer composition containing a conductive polymer that is the same as or different from the first conductive polymer composition, a thixotropy imparting agent, and a solvent, and drying the second conductive polymer composition to form a second conductive layer.

 導電性高分子、溶媒、及び浸漬については、上述した工程(A)において説明した事項を適用できる。 The conductive polymer, solvent, and immersion can be the same as those described in step (A) above.

 チキソトロピー性付与剤については、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。 The matters described in the solid electrolytic capacitor according to one embodiment of the present invention can be applied to the thixotropy-imparting agent.

 第2の導電性高分子組成物全体に対する、チキソトロピー性付与剤の含有率は、第2の導電性高分子組成物にチキソトロピー性を付与することができる範囲であれば特に限定されない。当業者であれば、第2の導電性高分子組成物の組成に合わせてチキソトロピー性付与剤の含有率を適宜選択することができる。
 一実施形態において、第2の導電性高分子組成物全体に対する、チキソトロピー性付与剤の含有率は、0.2~5質量%(好ましくは0.3~4質量%、より好ましくは0.4~3質量%)である。
The content of the thixotropy-imparting agent in the entire second conductive polymer composition is not particularly limited as long as it is within a range that can impart thixotropy to the second conductive polymer composition. A person skilled in the art can appropriately select the content of the thixotropy-imparting agent in accordance with the composition of the second conductive polymer composition.
In one embodiment, the content of the thixotropy-imparting agent relative to the entire second conductive polymer composition is 0.2 to 5 mass % (preferably 0.3 to 4 mass %, more preferably 0.4 to 3 mass %).

 一実施形態において、第2の導電性高分子組成物は、ポリアニリン又はポリアニリン誘導体を含む。第2の導電性高分子組成物は、陽極体の細孔内部に含浸させる必要がないため、第2の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量は、第1の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量よりも大きくできる。これにより、コーティング層としての機能に必要な強度や耐熱性等を付与できる。例えば、第2の導電性高分子組成物で使用するポリアニリン及びポリアニリン誘導体の重量平均分子量は、100,000以上であることが好ましい。 In one embodiment, the second conductive polymer composition contains polyaniline or a polyaniline derivative. Since the second conductive polymer composition does not need to be impregnated into the pores of the anode body, the weight average molecular weight of the polyaniline and polyaniline derivative used in the second conductive polymer composition can be larger than the weight average molecular weight of the polyaniline and polyaniline derivative used in the first conductive polymer composition. This makes it possible to impart strength, heat resistance, etc. necessary for functioning as a coating layer. For example, the weight average molecular weight of the polyaniline and polyaniline derivative used in the second conductive polymer composition is preferably 100,000 or more.

 一実施形態において、第2の導電性高分子組成物は、ポリアニリンがプロトン供与体でドープされているポリアニリン複合体を含む。
 一実施形態において、第2の導電性高分子組成物は、ポリアニリンがスルホコハク酸でドープされているポリアニリン複合体を含む。
In one embodiment, the second conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with a proton donor.
In one embodiment, the second conductive polymer composition comprises a polyaniline composite in which the polyaniline is doped with sulfosuccinic acid.

 一実施形態において、第2の導電性高分子組成物は、さらに増粘剤を含む。 In one embodiment, the second conductive polymer composition further comprises a thickener.

 増粘剤については、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。 As for the thickener, the matters described in the solid electrolytic capacitor according to one embodiment of the present invention can be applied.

 一実施形態において、第2の導電性高分子組成物は、以下の条件(P1)及び(P2)を満たす。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。

Figure JPOXMLDOC01-appb-M000014
In one embodiment, the second conductive polymer composition satisfies the following conditions (P1) and (P2).
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000014

 尚、第2の導電性高分子組成物が条件(P1)及び(P2)を満たすことは、工程(C)とは別に確認すればよい。 It is sufficient to confirm that the second conductive polymer composition satisfies the conditions (P1) and (P2) separately from step (C).

 工程(C)において、乾燥温度は特に限定されず、溶媒の種類によって適宜選択すればよい。乾燥温度は、通常30~200℃であり、好ましくは100~180℃である。乾燥時間は、通常10~120分であり、好ましくは30~90分である。 In step (C), the drying temperature is not particularly limited and may be appropriately selected depending on the type of solvent. The drying temperature is usually 30 to 200°C, preferably 100 to 180°C. The drying time is usually 10 to 120 minutes, preferably 30 to 90 minutes.

 本発明の一態様にかかる固体電解コンデンサの製造方法は、工程(C)の後に、カーボン層の形成工程(D)と、銀層の形成工程(E)とを含んでもよい。 The method for manufacturing a solid electrolytic capacitor according to one embodiment of the present invention may include, after step (C), a step (D) of forming a carbon layer and a step (E) of forming a silver layer.

[カーボン層形成工程]
 工程(D)は、工程(C)を経た後の多孔質体の一部又は全体を、カーボンペーストを含む液に浸漬し、乾燥する工程である。
 カーボンペーストとしては、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。
[Carbon layer forming process]
Step (D) is a step of immersing a part or the whole of the porous body after step (C) in a liquid containing a carbon paste and drying it.
As for the carbon paste, the matters described in the solid electrolytic capacitor according to one aspect of the present invention can be applied.

 カーボン層形成工程において、浸漬時間は、通常5秒~1分間であり、好ましくは10~30秒間である。
 乾燥温度は、通常30~200℃であり、好ましくは100~180℃である。乾燥時間は、通常10~120分であり、好ましくは30~90分である。
In the carbon layer forming step, the immersion time is usually 5 seconds to 1 minute, and preferably 10 to 30 seconds.
The drying temperature is usually 30 to 200° C., and preferably 100 to 180° C. The drying time is usually 10 to 120 minutes, and preferably 30 to 90 minutes.

[銀層形成工程]
 工程(E)は、工程(D)を経た後の多孔質体の一部又は全体を、銀ペーストを含む液に浸漬し、乾燥する工程である。
 銀ペーストとしては、本発明の一態様にかかる固体電解コンデンサにおいて説明した事項を適用できる。
[Silver layer formation process]
Step (E) is a step of immersing a part or the whole of the porous body after step (D) in a liquid containing silver paste and drying it.
As for the silver paste, the matters described in the solid electrolytic capacitor according to one aspect of the present invention can be applied.

 銀層形成工程において、浸漬時間は、通常5秒~1分間であり、好ましくは10~30秒間である。
 乾燥温度は、通常30~200℃であり、好ましくは100~180℃である。乾燥時間は、通常10~120分であり、好ましくは30~90分である。
In the silver layer forming step, the immersion time is usually from 5 seconds to 1 minute, and preferably from 10 to 30 seconds.
The drying temperature is usually 30 to 200° C., and preferably 100 to 180° C. The drying time is usually 10 to 120 minutes, and preferably 30 to 90 minutes.

 本発明の一態様にかかる固体電解コンデンサは、電気・電子回路基板に実装される回路素子、特に、自動車等に搭載される回路素子として用いることができる。 The solid electrolytic capacitor according to one aspect of the present invention can be used as a circuit element mounted on an electric/electronic circuit board, particularly as a circuit element mounted on an automobile or the like.

 一実施形態においては、工程(C)を複数回繰り返してもよい。この場合、一連のサイクルで形成された複数の層を合わせて外部コーティング層(第2の導電層)という。 In one embodiment, step (C) may be repeated multiple times. In this case, the multiple layers formed in a series of cycles are collectively referred to as the outer coating layer (second conductive layer).

 本発明の一態様にかかる固体電解コンデンサは、電気・電子回路基板に実装される回路素子、特に、自動車等に搭載される回路素子として用いることができる。 The solid electrolytic capacitor according to one aspect of the present invention can be used as a circuit element mounted on an electric/electronic circuit board, particularly as a circuit element mounted on an automobile or the like.

製造例1(ポリアニリン複合体1の製造)
 1,000mLセパラブルフラスコに「ネオコールSWC」(ジ-2-エチルヘキシルスルホコハク酸ナトリウム、第一工業製薬株式会社製)32.4g、アニリン13.3g、「ソルボンT-20」(ポリオキシエチレンソルビタン脂肪酸エステル構造を有する非イオン乳化剤、東邦化学工業株式会社製)0.9gを入れ、トルエン320.4gにて溶解させた。そこに8.5質量%リン酸水溶液450gを加え、トルエンと水の2つの液相を有する反応液を撹拌し、反応液の内温を5℃まで冷却した。
Production Example 1 (Production of Polyaniline Composite 1)
A 1,000 mL separable flask was charged with 32.4 g of "Neocol SWC" (di-2-ethylhexyl sodium sulfosuccinate, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), 13.3 g of aniline, and 0.9 g of "Sorbon T-20" (a nonionic emulsifier having a polyoxyethylene sorbitan fatty acid ester structure, manufactured by Toho Chemical Industry Co., Ltd.), and dissolved in 320.4 g of toluene. 450 g of an 8.5 mass % aqueous phosphoric acid solution was added thereto, and the reaction liquid having two liquid phases, toluene and water, was stirred and the internal temperature of the reaction liquid was cooled to 5°C.

 反応液の内温が5℃に到達した時点で、反応液を撹拌しながら、滴下漏斗を用いて、APS(過硫酸アンモニウム)39.3gを8.5質量%リン酸水溶液90.2gに溶解した溶液を添加し、溶液内温を5℃に保ったまま、4時間撹拌した。
 撹拌停止後、分液漏斗に内容物を移し、水相とトルエン相(有機相)を静置分離した。分離後、トルエン相(有機相)を8.5質量%リン酸水溶液180.3gで1回、イオン交換水328.0gで5回洗浄することにより、ポリアニリン複合体トルエン溶液を得た。
When the internal temperature of the reaction solution reached 5° C., a solution prepared by dissolving 39.3 g of APS (ammonium persulfate) in 90.2 g of an 8.5 mass% aqueous phosphoric acid solution was added using a dropping funnel while stirring the reaction solution, and the mixture was stirred for 4 hours while maintaining the internal temperature of the solution at 5° C.
After stopping the stirring, the contents were transferred to a separating funnel, and the aqueous phase and the toluene phase (organic phase) were allowed to stand and separated. After separation, the toluene phase (organic phase) was washed once with 180.3 g of an 8.5 mass % aqueous phosphoric acid solution and five times with 328.0 g of ion-exchanged water to obtain a polyaniline complex toluene solution.

 この溶液をエバポレーターに移し、60℃の湯浴で加温し、減圧することにより、揮発分を蒸発留去し、ポリアニリン複合体1(プロトネ-ションされたポリアニリン)を得た。ポリアニリン複合体1のポリアニリンの重量平均分子量(Mw)は73,000であった。 The solution was transferred to an evaporator, heated in a 60°C water bath, and reduced pressure to evaporate and remove the volatiles, yielding polyaniline complex 1 (protonated polyaniline). The weight-average molecular weight (Mw) of the polyaniline in polyaniline complex 1 was 73,000.

 ポリアニリン複合体1及び後述するポリアニリン複合体2のポリアニリンの重量平均分子量は、以下のようにして測定した。
 NMP(N-メチル-2-ピロリドン)2000mLに対し、臭化リチウム1.65~1.85gを溶解し、0.01M臭化リチウムのNMP溶液を調製した。この0.01M臭化リチウムのNMP溶液10mLに、14μLのトリエチルアミンを添加し、撹拌して溶解させ、均一な溶液にした。さらに、ポリアニリン複合体トルエン溶液を50μL滴下し、撹拌して混合した後、0.45μMフィルタ-を通し、ゲルパ-ミエ-ションクロマトグラフ(GPC)測定用サンプルを調製した。
The weight average molecular weights of the polyanilines in the Polyaniline Composite 1 and the Polyaniline Composite 2 described below were measured as follows.
1.65 to 1.85 g of lithium bromide was dissolved in 2000 mL of NMP (N-methyl-2-pyrrolidone) to prepare a 0.01 M lithium bromide NMP solution. 14 μL of triethylamine was added to 10 mL of this 0.01 M lithium bromide NMP solution, and the solution was stirred to dissolve the triethylamine and obtain a homogeneous solution. 50 μL of the polyaniline complex toluene solution was then dropped and mixed by stirring, and the mixture was passed through a 0.45 μM filter to prepare a sample for gel permeation chromatography (GPC) measurement.

 GPC測定用サンプルを用いて、GPC測定は、GPCカラム(昭和電工株式会社製「ShodexKF-806M」、2本連結)を用いて行い、以下の測定条件で行った。
溶媒:0.01M LiBr含有NMP
流量:0.70ML/分
カラム温度:60℃
注入量:100μL
UV検出波長:270nM
Using a sample for GPC measurement, the GPC measurement was carried out using a GPC column (Shodex KF-806M manufactured by Showa Denko KK, two columns connected) under the following measurement conditions.
Solvent: 0.01M LiBr in NMP
Flow rate: 0.70 mL/min Column temperature: 60° C.
Injection volume: 100μL
UV detection wavelength: 270 nM

 上記方法で得られた重量平均分子量は、ポリスチレン(PS)換算値である。
 ポリアニリンに対するプロトン供与体(ジ-2-エチルヘキシルスルホコハク酸ナトリウム)のドープ率は0.36であった。
The weight average molecular weight obtained by the above method is a value calculated in terms of polystyrene (PS).
The doping ratio of the proton donor (sodium di-2-ethylhexyl sulfosuccinate) to the polyaniline was 0.36.

製造例2(ポリアニリン複合体2の製造)
 1,000mLセパラブルフラスコに「ネオコ-ルSWC」(ジ-2-エチルヘキシルスルホコハク酸ナトリウム、第一工業製薬株式会社製)10.13g、アニリン4.17g、「ソルボンT-20」(ポリオキシエチレンソルビタン脂肪酸エステル構造を有する非イオン乳化剤、東邦化学工業株式会社製)0.32gを入れ、トルエン238.37gにて溶解させた。そこに17質量%リン酸水溶液353.70gを加え、トルエンと水の2つの液相を有する反応液を撹拌し、反応液の内温を-2℃まで冷却した。
Production Example 2 (Production of Polyaniline Composite 2)
A 1,000 mL separable flask was charged with 10.13 g of "Neocol SWC" (di-2-ethylhexyl sodium sulfosuccinate, manufactured by Daiichi Kogyo Seiyaku Co., Ltd.), 4.17 g of aniline, and 0.32 g of "Sorbon T-20" (a nonionic emulsifier having a polyoxyethylene sorbitan fatty acid ester structure, manufactured by Toho Chemical Industry Co., Ltd.), and dissolved in 238.37 g of toluene. 353.70 g of a 17% by mass aqueous phosphoric acid solution was added thereto, and the reaction liquid having two liquid phases, toluene and water, was stirred and the internal temperature of the reaction liquid was cooled to -2°C.

 反応液の内温が-2℃に到達した時点で、反応液を撹拌しながら、滴下漏斗を用いて、APS(過硫酸アンモニウム)12.3gを17質量%リン酸水溶液48gに溶解した溶液を添加し、溶液内温を-2℃に保ったまま18時間撹拌した。
 撹拌停止後、分液漏斗に内容物を移し、水相とトルエン相(有機相)を静置分離した。分離後、トルエン相(有機相)を8.5質量%リン酸水溶液59.4gで1回、イオン交換水108.14gで3回洗浄することにより、ポリアニリン複合体トルエン溶液を得た。
When the internal temperature of the reaction solution reached −2° C., a solution prepared by dissolving 12.3 g of APS (ammonium persulfate) in 48 g of a 17% by mass aqueous phosphoric acid solution was added using a dropping funnel while stirring the reaction solution, and the solution was stirred for 18 hours while maintaining the internal temperature at −2° C.
After stopping the stirring, the contents were transferred to a separating funnel and the aqueous phase and the toluene phase (organic phase) were allowed to stand and separated. After separation, the toluene phase (organic phase) was washed once with 59.4 g of an 8.5 mass % phosphoric acid aqueous solution and three times with 108.14 g of ion-exchanged water to obtain a polyaniline complex toluene solution.

 この溶液をエバポレーターに移し、60℃の湯浴で加温し、減圧することにより、揮発分を蒸発留去し、ポリアニリン複合体2(プロトネーションされたポリアニリン)を得た。ポリアニリン複合体2のポリアニリンの重量平均分子量(Mw)は112,000であった。
 ポリアニリンに対するプロトン供与体(ジ-2-エチルヘキシルスルホコハク酸ナトリウム)のド-プ率は0.36であった。
This solution was transferred to an evaporator, heated in a water bath at 60° C., and reduced pressure to evaporate and remove the volatile matter, thereby obtaining polyaniline composite 2 (protonated polyaniline). The weight average molecular weight (Mw) of polyaniline in polyaniline composite 2 was 112,000.
The doping ratio of the proton donor (sodium di-2-ethylhexyl sulfosuccinate) to polyaniline was 0.36.

製造例3(陽極体)
 250,000μFV/gの比容量を有するタンタル粉末から作られたペレット状のタンタル粉末焼結体(1.71mm×3.01mm×2.89mmの多孔質体)20個に、0.5%リン酸電解質中で8.8Vまで電圧を印加してアノード酸化し、タンタル粉末焼結体(多孔質体)の表面に誘電体(タンタルの酸化物)を形成して、タンタルコンデンサの陽極体を得た。
 陽極体の液中容量を、電解液として10質量%リン酸を用い、対極に白金黒電極を用いて測定した。陽極体の液中容量は961μFであった。
Production Example 3 (Anode Body)
A voltage of up to 8.8 V was applied to 20 pellet-shaped tantalum powder sintered compacts (porous bodies of 1.71 mm × 3.01 mm × 2.89 mm) made from tantalum powder having a specific capacitance of 250,000 μFV/g in a 0.5% phosphoric acid electrolyte to subject them to anodization, forming a dielectric (tantalum oxide) on the surface of the tantalum powder sintered compact (porous body), thereby obtaining an anode body for a tantalum capacitor.
The submerged capacity of the anode body was measured using 10% by mass phosphoric acid as the electrolyte and a platinum black electrode as the counter electrode, and was found to be 961 μF.

実施例1
(1)第1の導電層形成用の導電性高分子組成物D(第1の導電性高分子組成物)の調製
 1-プロパノール(成分(b)、沸点97℃、東京化成工業株式会社製)49g、p-tert-アミルフェノール(成分(c)、富士フイルム和光純薬株式会社製)49g、及びキョーワゾールC900(成分(b)、KHネオケム株式会社製)42gを均一になるまで撹拌しながら混合して、混合溶剤αを調製した。
 133gの混合溶剤αに、製造例1で得たポリアニリン複合体1(成分(a))7gを溶解し、ポリアニリン複合体溶液A(ポリアニリン複合体濃度:5質量%)を得た。
Example 1
(1) Preparation of Conductive Polymer Composition D (First Conductive Polymer Composition) for Forming First Conductive Layer 49 g of 1-propanol (component (b), boiling point 97° C., manufactured by Tokyo Chemical Industry Co., Ltd.), 49 g of p-tert-amylphenol (component (c), manufactured by FUJIFILM Wako Pure Chemical Industries, Ltd.), and 42 g of Kyowazole C900 (component (b), manufactured by KH Neochem Corporation) were mixed with stirring until homogenous, to prepare a mixed solvent α.
7 g of the polyaniline composite 1 (component (a)) obtained in Production Example 1 was dissolved in 133 g of the mixed solvent α to obtain a polyaniline composite solution A (polyaniline composite concentration: 5 mass %).

 2-ナフタレンスルホン酸水和物(成分(d)、東京化成工業株式会社製)10gを、イソプロピルアルコ-ル(成分(b)、沸点82.5℃、富士フイルム和光純薬株式会社製)90gに溶解し、耐熱安定化剤溶液Bを調整した。
 BYK-4510(成分(e)、BYK Additives&Instruments製)20gを、混合溶剤α 100gに溶解し、密着性付与溶液Cを調製した。
10 g of 2-naphthalenesulfonic acid hydrate (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) was dissolved in 90 g of isopropyl alcohol (component (b), boiling point 82.5° C., manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.) to prepare a heat stabilizer solution B.
An adhesion-imparting solution C was prepared by dissolving 20 g of BYK-4510 (component (e), manufactured by BYK Additives & Instruments) in 100 g of the mixed solvent α.

 ポリアニリン複合体溶液A(ポリアニリン複合体濃度:5質量%)21gに耐熱安定化剤溶液B 0.237gと密着性付与溶液C 0.105gとを添加し、撹拌しながら混合することで、第1の導電層形成用の導電性高分子組成物D(第1の導電性高分子組成物)を得た。 0.237 g of heat-resistant stabilizer solution B and 0.105 g of adhesion-imparting solution C were added to 21 g of polyaniline complex solution A (polyaniline complex concentration: 5% by mass), and mixed with stirring to obtain a conductive polymer composition D (first conductive polymer composition) for forming a first conductive layer.

(2)内部固体電解質層(第1の導電層)の形成
[浸漬1回目]
 製造例3で得た陽極体を、金属バーに固定して吊り下げ、陽極体の下端側から1/3の高さまでを導電性高分子組成物Dに浸漬し、2分間保持した。次いで、陽極体の下端側から2/3の高さまでを導電性高分子組成物Dに浸漬し、2分間保持した。次いで、陽極体全体を導電性高分子組成物Dに浸漬し、1分間保持した。以上により、陽極体の1回目の浸漬を行った。
 次いで、導電性高分子組成物Dから陽極体を引き上げ、陽極体全体を空気中に晒した状態で、室温下で1分間保持した。
(2) Formation of Internal Solid Electrolyte Layer (First Conductive Layer) [First Immersion]
The anode body obtained in Production Example 3 was fixed to a metal bar and hung, and the anode body was immersed up to ⅓ of the height from the bottom end side in conductive polymer composition D and held for 2 minutes. Next, the anode body was immersed up to ⅔ of the height from the bottom end side in conductive polymer composition D and held for 2 minutes. Next, the entire anode body was immersed in conductive polymer composition D and held for 1 minute. In this manner, the first immersion of the anode body was completed.
Next, the anode body was pulled out from conductive polymer composition D and was held at room temperature for 1 minute in a state where the entire anode body was exposed to air.

[浸漬2回目]
 次いで、陽極体の下端側から1/3の高さまでを導電性高分子組成物Dに浸漬し、2分間保持した。次いで、陽極体の下端側から2/3の高さまでを導電性高分子組成物Dに浸漬し、2分間保持した。次いで、陽極体全体を導電性高分子組成物Dに浸漬し、1分間保持した。以上により、陽極体の2回目の浸漬を行った。
 次いで、導電性高分子組成物Dから陽極体を引き上げて取り出し、40℃で7分間乾燥した後、さらに140℃で5分間乾燥して、内部固体電解質層(第1の導電層)を形成した。
[Second immersion]
Next, the anode body was immersed in conductive polymer composition D up to ⅓ of the height from the bottom end side and held for 2 minutes. Next, the anode body was immersed in conductive polymer composition D up to ⅔ of the height from the bottom end side and held for 2 minutes. Next, the entire anode body was immersed in conductive polymer composition D and held for 1 minute. In this manner, the second immersion of the anode body was performed.
Next, the anode body was pulled out from the conductive polymer composition D and dried at 40° C. for 7 minutes, and then further dried at 140° C. for 5 minutes to form an internal solid electrolyte layer (first conductive layer).

(3)第2の導電層形成用の導電性高分子組成物G(第2の導電性高分子組成物)の調製
 1-エトキシ-2-プロパノール(成分(b)、東京化成工業株式会社製)30g、1-プロパノール30g、p-tert-アミルフェノ-ル40gを均一になるまで撹拌しながら混合して、混合溶剤εを調製した。
 90gの混合溶剤εに、製造例2で得たポリアニリン複合体2(成分(a))10gを溶解し、ポリアニリン複合体溶液E(ポリアニリン複合体濃度:10質量%)を得た。
(3) Preparation of Conductive Polymer Composition G for Forming Second Conductive Layer (Second Conductive Polymer Composition) 30 g of 1-ethoxy-2-propanol (component (b), manufactured by Tokyo Chemical Industry Co., Ltd.), 30 g of 1-propanol, and 40 g of p-tert-amylphenol were mixed with stirring until the mixture became uniform, to prepare a mixed solvent ε.
10 g of the polyaniline composite 2 (component (a)) obtained in Production Example 2 was dissolved in 90 g of the mixed solvent ε to obtain a polyaniline composite solution E (polyaniline composite concentration: 10 mass %).

 10gのポリアニリン複合体溶液Eに、微粒シリカ:AEROSIL380(日本アエロジル株式会社製)を2質量部(0.2g)添加して、ホモディスパー(PRIMIX製ホモディスパー2.5型)を用いて1000rpmで5分間撹拌混合して、ポリアニリン複合体/微粒シリカ混合溶液Hを調整した。 2 parts by mass (0.2 g) of fine silica: AEROSIL 380 (manufactured by Nippon Aerosil Co., Ltd.) was added to 10 g of polyaniline complex solution E, and the mixture was stirred and mixed at 1000 rpm for 5 minutes using a homodisper (PRIMIX homodisper 2.5 type) to prepare polyaniline complex/fine silica mixed solution H.

 BYK-4510(成分(e)、BYK Additives&Instruments製)20gを混合溶剤ε 100gに溶解し、密着性付与溶液Fを調製した。 20 g of BYK-4510 (component (e), manufactured by BYK Additives & Instruments) was dissolved in 100 g of mixed solvent ε to prepare adhesion imparting solution F.

 ポリアニリン複合体/微粒シリカ混合溶液H(ポリアニリン複合体濃度:10質量%)7.5gに耐熱安定化剤溶液B 0.564gと密着性付与溶液F 0.075gを添加し、撹拌しながら混合することで、第2の導電層形成用の導電性高分子組成物G(第2の導電性高分子組成物)を得た。 0.564 g of heat resistance stabilizer solution B and 0.075 g of adhesion imparting solution F were added to 7.5 g of polyaniline complex/fine silica mixed solution H (polyaniline complex concentration: 10% by mass), and mixed with stirring to obtain conductive polymer composition G (second conductive polymer composition) for forming a second conductive layer.

(4)外部コーティング層(第2の導電層)の形成
 まず、イソプロピルアルコ-ルに4-スルホフタル酸(成分(d)、東京化成工業株式会社製)を溶解した4-スルホフタル酸溶液(4-スルホフタル酸濃度:1質量%)に、上記(2)で得られた陽極体の全体を浸漬し、10分間保持した。
 次いで、4-スルホフタル酸溶液から陽極体を引き上げて取り出し、150℃で60分間乾燥した。
 次いで、第2の導電層形成用の導電性高分子組成物Gに、陽極体の全体を浸漬し、5分間保持した。
(4) Formation of Outer Coating Layer (Second Conductive Layer) First, the anode body obtained in (2) above was entirely immersed in a 4-sulfophthalic acid solution (4-sulfophthalic acid concentration: 1% by mass) prepared by dissolving 4-sulfophthalic acid (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) in isopropyl alcohol, and held for 10 minutes.
The anode element was then pulled out from the 4-sulfophthalic acid solution and dried at 150° C. for 60 minutes.
Next, the entire anode body was immersed in conductive polymer composition G for forming a second conductive layer and held there for 5 minutes.

 次いで、導電性高分子組成物Gから陽極体を引き上げて取り出し、100℃で30~60分間の所定時間乾燥した後、さらに150℃で30~60分間の所定時間乾燥して、陽極体の外部コーティングを行った。この第2の導電層形成用の導電性高分子組成物を浸漬して乾燥する工程をディッピングと呼び、ディッピング回数を3回行った。 Then, the anode body was pulled out of the conductive polymer composition G and dried at 100°C for a specified time of 30 to 60 minutes, and then dried at 150°C for a specified time of 30 to 60 minutes to coat the outside of the anode body. This process of immersing the conductive polymer composition for forming the second conductive layer and drying it is called dipping, and dipping was performed three times.

 次いで、イソプロピルアルコ-ルに4-スルホフタル酸(成分(d)、東京化成工業株式会社製)を溶解した4-スルホフタル酸溶液(4-スルホフタル酸濃度:1質量%)に、陽極体の全体を浸漬し、10分間保持した。
 次いで、4-スルホフタル酸溶液から陽極体を引き上げて取り出し、150℃で60分間乾燥して、内部固体電解質層(第1の導電層)と外部コーティング層(第2の導電層)とを有する陽極体を得た。
Next, the entire anode body was immersed in a 4-sulfophthalic acid solution (4-sulfophthalic acid concentration: 1% by mass) prepared by dissolving 4-sulfophthalic acid (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) in isopropyl alcohol, and was kept therein for 10 minutes.
The anode body was then pulled out of the 4-sulfophthalic acid solution and dried at 150° C. for 60 minutes to obtain an anode body having an inner solid electrolyte layer (first conductive layer) and an outer coating layer (second conductive layer).

(5)カーボン層の形成
 カーボンペースト:FUAE(溶媒:ケトン系、日本黒鉛工業株式会社製)を原液のまま、上記(4)で得られた陽極体(第1の導電層と第2の導電層とを有する)を10秒間浸漬した後、150℃で30分間乾燥した。
(5) Formation of Carbon Layer The anode body (having the first conductive layer and the second conductive layer) obtained in (4) above was immersed in a carbon paste: FUAE (solvent: ketone-based, manufactured by Nippon Graphite Industries Co., Ltd.) as an undiluted solution for 10 seconds, and then dried at 150° C. for 30 minutes.

(6)銀層の形成
 次いで、銀ペースト:H9113-6(粒状、ナミックス株式会社製)を、希釈溶媒:ジエチレングリコールモノブチルエーテル(東京化成工業株式会社製)で1.2倍に希釈し、撹拌混合して得られた銀ペ-スト溶液に、上記(5)で得られた陽極体を10秒間浸漬した後、100℃で30分間乾燥した後、さらに150℃で30分間乾燥し、コンデンサを得た。
(6) Formation of Silver Layer Next, a silver paste: H9113-6 (granular, manufactured by Namics Corporation) was diluted 1.2 times with a dilution solvent: diethylene glycol monobutyl ether (manufactured by Tokyo Chemical Industry Co., Ltd.), and the diluted solution was stirred and mixed to obtain a silver paste solution, in which the anode body obtained in (5) above was immersed for 10 seconds, dried at 100° C. for 30 minutes, and then further dried at 150° C. for 30 minutes to obtain a capacitor.

<電気特性の評価>
 上記で得られたコンデンサについて、熱処理前後で、周波数120Hzにおける静電容量(Cap)及び誘電損失(tanδ)、並びに周波数100kHzにおける等価直列抵抗(ESR)を、LCRメ-タ-「Precision LCR Meter E4980A」(Agilent Technologies Japan,Ltd.製)を用いて測定した。評価結果を表1に示す。
<Evaluation of Electrical Characteristics>
The capacitance (Cap) and dielectric loss (tan δ) at a frequency of 120 Hz, and the equivalent series resistance (ESR) at a frequency of 100 kHz were measured for the capacitor obtained above before and after the heat treatment using an LCR meter "Precision LCR Meter E4980A" (manufactured by Agilent Technologies Japan, Ltd.). The evaluation results are shown in Table 1.

<耐湿熱性の評価>
 上記で得られたコンデンサについて、温度85%、湿度95%RH(Relative Humidity:相対湿度)の環境下に3日間曝露した後に、素子を100℃で30分乾燥させたのちに、LCRメ-タ-「Precision LCR Meter E4980A」を用いてCapとESRを測定し、耐湿熱性を評価した。評価結果を表1に示す。
 表1において、曝露前対比でCapとESRの値の変動が30%以内だった場合をOとした。曝露前対比でCapとESRの値の変動が30%超だった場合、又はCapとESRの値が測定不能であった場合を×とした。
<Evaluation of wet heat resistance>
The capacitor obtained above was exposed to an environment of 85% temperature and 95% RH (Relative Humidity) for 3 days, and then the element was dried at 100°C for 30 minutes. Then, the Cap and ESR were measured using an LCR meter "Precision LCR Meter E4980A" to evaluate the wet heat resistance. The evaluation results are shown in Table 1.
In Table 1, the case where the change in the Cap and ESR values compared to before exposure was within 30% was marked as O. The case where the change in the Cap and ESR values compared to before exposure was more than 30% or the Cap and ESR values were not measurable was marked as ×.

実施例2
 実施例1において、外部コーティング層(第2の導電層)の形成において、ディッピング回数を1回とした以外は、実施例1と同様にしてコンデンサを製造し、評価した。評価結果を表1に示す。
Example 2
A capacitor was manufactured and evaluated in the same manner as in Example 1, except that in forming the outer coating layer (second conductive layer), the dipping was performed once. The evaluation results are shown in Table 1.

実施例3
 実施例1において、外部コーティング層(第2の導電層)の形成において、導電性高分子組成物Gの代わりに、ポリアニリン複合体溶液E(ポリアニリン複合体濃度:10質量%)7.5gに耐熱安定化剤溶液B 0.564gと密着性付与溶液F 0.075gを添加し、撹拌しながら混合して得た導電性高分子組成物G’を用いたこと以外は、実施例1と同様にしてコンデンサを製造し、評価した。評価結果を表1に示す。
Example 3
A capacitor was manufactured and evaluated in the same manner as in Example 1, except that in forming the outer coating layer (second conductive layer), a conductive polymer composition G' obtained by adding 0.564 g of heat resistance stabilizer solution B and 0.075 g of adhesion imparting solution F to 7.5 g of polyaniline complex solution E (polyaniline complex concentration: 10 mass %) and mixing them under stirring was used instead of the conductive polymer composition G. The evaluation results are shown in Table 1.

比較例1
 実施例2において、外部コーティング層(第2の導電層)の形成において、導電性高分子組成物Gの代わりに、PEDOT/PSS(エチレングリコール添加品、Sigma-Aldrich製)を希釈せずに使用したこと以外は、実施例2と同様にしてコンデンサを製造し、評価した。評価結果を表1に示す。
Comparative Example 1
A capacitor was produced and evaluated in the same manner as in Example 2, except that in forming the outer coating layer (second conductive layer), PEDOT/PSS (ethylene glycol-added product, manufactured by Sigma-Aldrich) was used without dilution instead of the conductive polymer composition G. The evaluation results are shown in Table 1.

Figure JPOXMLDOC01-appb-T000015
Figure JPOXMLDOC01-appb-T000015

製造例4(陽極体)
 EIA規格準拠品で、EIA表記が1206(JIS表記で3216)のCV積が120kCVであるタンタル粉末焼結体(多孔質体)を、0.5%リン酸電解質中で30Vまで電圧を印加してアノード酸化し、タンタル粉末焼結体(多孔質体)の表面に誘電体(タンタルの酸化物)を形成して、タンタルコンデンサの陽極体を得た。
 陽極体の液中容量を、電解液として10質量%リン酸を用い、対極に白金黒電極を用いて測定した。陽極体の液中容量は50μFであった。
Production Example 4 (Anode Body)
A tantalum powder sintered compact (porous body), which is an EIA standard compliant product with an EIA designation of 1206 (JIS designation of 3216) and a CV product of 120 kCV, was anodized by applying a voltage of up to 30 V in a 0.5% phosphoric acid electrolyte to form a dielectric (tantalum oxide) on the surface of the tantalum powder sintered compact (porous body), thereby obtaining an anode body for a tantalum capacitor.
The submerged capacity of the anode body was measured using 10% by mass phosphoric acid as the electrolyte and a platinum black electrode as the counter electrode. The submerged capacity of the anode body was 50 μF.

実施例4
(1)内部固体電解質層(第1の導電層)の形成
 製造例3で得られた陽極体に代えて製造例4で得られた陽極体を用いたこと以外は、実施例1と同様にして、内部固体電解質層(第1の導電層)を形成した。
Example 4
(1) Formation of Internal Solid Electrolyte Layer (First Conductive Layer) An internal solid electrolyte layer (first conductive layer) was formed in the same manner as in Example 1, except that the anode body obtained in Production Example 4 was used instead of the anode body obtained in Production Example 3.

(2)第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)の調製
 1-エトキシ-2-プロパノール(成分(b)、東京化成工業株式会社製)30g、1-プロパノール30g、p-tert-アミルフェノ-ル40gを均一になるまで撹拌しながら混合して、混合溶剤εを調製した。
 90gの混合溶剤εに、製造例2で得たポリアニリン複合体2(成分(a))10gとエチルセルロースAqualon EC-N300(Ashland Inc.製)0.4gを室温で溶解し、ポリアニリン複合体溶液I(ポリアニリン複合体濃度:10質量%)を得た。
 10gのポリアニリン複合体溶液Iに、微粒シリカ:AEROSIL380(日本アエロジル株式会社製)を4質量部(0.4g)添加して、ホモディスパー(PRIMIX製ホモディスパー2.5型)を用いて3000rpmで5分間撹拌混合して、ポリアニリン複合体/微粒シリカ混合溶液Jを調整した。
(2) Preparation of Conductive Polymer Composition K for Forming Second Conductive Layer (Second Conductive Polymer Composition) 30 g of 1-ethoxy-2-propanol (component (b), manufactured by Tokyo Chemical Industry Co., Ltd.), 30 g of 1-propanol, and 40 g of p-tert-amylphenol were mixed with stirring until the mixture became uniform, to prepare a mixed solvent ε.
10 g of the polyaniline composite 2 (component (a)) obtained in Production Example 2 and 0.4 g of ethyl cellulose Aqualon EC-N300 (manufactured by Ashland Inc.) were dissolved in 90 g of the mixed solvent ε at room temperature to obtain a polyaniline composite solution I (polyaniline composite concentration: 10 mass %).
To 10 g of the polyaniline composite solution I, 4 parts by mass (0.4 g) of fine silica: AEROSIL 380 (manufactured by Nippon Aerosil Co., Ltd.) was added, and the mixture was stirred and mixed at 3,000 rpm for 5 minutes using a Homo Disper (PRIMIX Homo Disper 2.5 type) to prepare a polyaniline composite/fine silica mixed solution J.

 ポリアニリン複合体/微粒シリカ混合溶液Jは、アントンパール社製のレオメーターMCR302を用いて、温調にP-PTD200/H-PTD200を用いて、直径25mmのパラレルプレート、ギャップ1mmの条件で、せん断速度10(1/s)のときの粘度が9Pa・sであり、せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が1500Pa・sであり、5分後の粘度変化が11倍であった。 The polyaniline composite/fine silica mixed solution J was measured using an Anton Paar rheometer MCR302 with a P-PTD200/H-PTD200 for temperature control, with parallel plates of 25 mm diameter and a gap of 1 mm. The viscosity was 9 Pa·s at a shear rate of 10 (1/s), and after applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate was reduced to 0.0001 (1/s) was 1500 Pa·s, with a viscosity change of 11 times after 5 minutes.

 BYK-4510(成分(e)、BYK Additives&Instruments製)20gを混合溶剤ε 100gに溶解し、密着性付与溶液Fを調製した。 20 g of BYK-4510 (component (e), manufactured by BYK Additives & Instruments) was dissolved in 100 g of mixed solvent ε to prepare adhesion imparting solution F.

 ポリアニリン複合体/微粒シリカ混合溶液J(ポリアニリン複合体濃度:10質量%)7.5gに耐熱安定化剤溶液B 0.564gと密着性付与溶液F 0.075gを添加し、撹拌しながら混合することで、第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)を得た。 0.564 g of heat resistance stabilizer solution B and 0.075 g of adhesion imparting solution F were added to 7.5 g of polyaniline complex/fine silica mixed solution J (polyaniline complex concentration: 10% by mass) and mixed with stirring to obtain conductive polymer composition K (second conductive polymer composition) for forming a second conductive layer.

(3)外部コーティング層(第2の導電層)の形成
 まず、イソプロピルアルコ-ルに4-スルホフタル酸(成分(d)、東京化成工業株式会社製)を溶解した4-スルホフタル酸溶液(4-スルホフタル酸濃度:1質量%)に、上記(1)で得られた陽極体の全体を浸漬し、180分間保持した。
 次いで、4-スルホフタル酸溶液から陽極体を引き上げて取り出し、100℃で18時間乾燥した。
 次いで、第2の導電層形成用の導電性高分子組成物Kに、陽極体の全体を浸漬し、5分間保持した。
(3) Formation of Outer Coating Layer (Second Conductive Layer) First, the anode body obtained in (1) above was entirely immersed in a 4-sulfophthalic acid solution (4-sulfophthalic acid concentration: 1% by mass) prepared by dissolving 4-sulfophthalic acid (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) in isopropyl alcohol, and held for 180 minutes.
The anode element was then removed from the 4-sulfophthalic acid solution and dried at 100° C. for 18 hours.
Next, the entire anode body was immersed in conductive polymer composition K for forming a second conductive layer and held there for 5 minutes.

 次いで、導電性高分子組成物Kから陽極体を引き上げ速度1秒(引き上げ始めてから陽極体全体が導電性高分子組成物Kの外に出るまでに1秒かかる速度)で引き上げて取り出し、100℃で30~60分間の所定時間乾燥した後、さらに150℃で30~60分間の所定時間乾燥して、陽極体の外部コーティングを行った。この第2の導電層形成用の導電性高分子組成物を浸漬して乾燥する工程をディッピングと呼び、ディッピング回数を1回行った。 Then, the anode body was removed from the conductive polymer composition K at a pulling speed of 1 second (a speed at which it takes 1 second for the entire anode body to come out of the conductive polymer composition K after starting to pull it up), and dried at 100°C for a specified time of 30 to 60 minutes, and then dried at 150°C for a specified time of 30 to 60 minutes to coat the outside of the anode body. This process of immersing the conductive polymer composition for forming the second conductive layer and drying it is called dipping, and dipping was performed once.

 次いで、イソプロピルアルコ-ルに4-スルホフタル酸(成分(d)、東京化成工業株式会社製)を溶解した4-スルホフタル酸溶液(4-スルホフタル酸濃度:1質量%)に、陽極体の全体を浸漬し、180分間保持した。
 次いで、4-スルホフタル酸溶液から陽極体を引き上げて取り出し、75℃で18時間乾燥して、内部固体電解質層(第1の導電層)と外部コーティング層(第2の導電層)とを有する陽極体を得た。
Next, the entire anode body was immersed in a 4-sulfophthalic acid solution (4-sulfophthalic acid concentration: 1% by mass) prepared by dissolving 4-sulfophthalic acid (component (d), manufactured by Tokyo Chemical Industry Co., Ltd.) in isopropyl alcohol, and was kept therein for 180 minutes.
The anode body was then pulled out of the 4-sulfophthalic acid solution and dried at 75° C. for 18 hours to obtain an anode body having an inner solid electrolyte layer (first conductive layer) and an outer coating layer (second conductive layer).

(4)カーボン層の形成
 カーボンペースト:FUAE(溶媒:ケトン系、日本黒鉛工業株式会社製)を原液のまま、上記(3)で得られた陽極体(第1の導電層と第2の導電層とを有する)を10秒間浸漬した後、150℃で30分間乾燥した。
(4) Formation of Carbon Layer The anode body (having the first conductive layer and the second conductive layer) obtained in (3) above was immersed in a carbon paste: FUAE (solvent: ketone-based, manufactured by Nippon Graphite Industries Co., Ltd.) as an undiluted solution for 10 seconds, and then dried at 150° C. for 30 minutes.

(5)銀層の形成
 次いで、銀ペースト:EC209A(板状+粒状、三ツ星ベルト株式会社製)を、希釈溶媒:N-メチルピロリドン(東京化成工業株式会社製)で1.1倍に希釈し、撹拌混合して得られた銀ペ-スト溶液に、上記(4)で得られた陽極体を10秒間浸漬した後、100℃で30分間乾燥した後、さらに150℃で180分間乾燥し、コンデンサを得た。
(5) Formation of Silver Layer Next, a silver paste: EC209A (plate-like + granular, manufactured by Mitsuboshi Belting Co., Ltd.) was diluted 1.1 times with a dilution solvent: N-methylpyrrolidone (manufactured by Tokyo Chemical Industry Co., Ltd.), and the diluted solution was stirred and mixed to obtain a silver paste solution, in which the anode body obtained in (4) above was immersed for 10 seconds, dried at 100° C. for 30 minutes, and then further dried at 150° C. for 180 minutes to obtain a capacitor.

実施例5
 実施例4において、外部コーティング層(第2の導電層)の形成において、ディッピング回数を2回とした以外は、実施例4と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。
Example 5
A capacitor was manufactured and evaluated in the same manner as in Example 4, except that in forming the outer coating layer (second conductive layer), the dipping was performed twice. The evaluation results are shown in Table 2.

実施例6
 実施例5において、第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)の調製において、ポリアニリン複合体溶液Iに添加する微粒シリカの量を2質量部(0.2g)とした以外は、実施例5と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。ポリアニリン複合体/微粒シリカ混合溶液J
Example 6
A capacitor was manufactured and evaluated in the same manner as in Example 5, except that in the preparation of conductive polymer composition K (second conductive polymer composition) for forming the second conductive layer, the amount of fine silica added to the polyaniline complex solution I was 2 parts by mass (0.2 g). The evaluation results are shown in Table 2. Polyaniline complex/fine silica mixed solution J

実施例7
 実施例4において、外部コーティング層(第2の導電層)の形成において、導電性高分子組成物Kから陽極体を引き上げるときの引き上げ速度30秒とした以外は、実施例4と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。
Example 7
A capacitor was produced and evaluated in the same manner as in Example 4, except that in forming the outer coating layer (second conductive layer), the anode body was pulled up from the conductive polymer composition K at a pulling speed of 30 seconds. The evaluation results are shown in Table 2.

実施例8
 実施例4において、第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)の調製において、エチルセルロースを添加せず、外部コーティング層(第2の導電層)の形成において、ディッピング回数を3回とした以外は、実施例4と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。
Example 8
A capacitor was manufactured and evaluated in the same manner as in Example 4, except that in the preparation of the conductive polymer composition K (second conductive polymer composition) for forming the second conductive layer, ethyl cellulose was not added, and in the formation of the outer coating layer (second conductive layer), the number of dipping steps was set to three. The evaluation results are shown in Table 2.

実施例9
 実施例4において、第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)の調製において、混合溶剤εに溶解するエチルセルロースの量を0.2gとし、外部コーティング層(第2の導電層)の形成において、ディッピング回数を3回とした以外は、実施例4と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。
Example 9
A capacitor was manufactured and evaluated in the same manner as in Example 4, except that in preparing the conductive polymer composition K (second conductive polymer composition) for forming the second conductive layer, the amount of ethyl cellulose dissolved in the mixed solvent ε was 0.2 g, and in forming the outer coating layer (second conductive layer), the number of dipping operations was 3. The evaluation results are shown in Table 2.

実施例10
 実施例4において、第2の導電層形成用の導電性高分子組成物K(第2の導電性高分子組成物)の調製において、微粒シリカを添加せず、外部コーティング層(第2の導電層)の形成において、ディッピング回数を3回とした以外は、実施例4と同様にしてコンデンサを製造し、評価した。評価結果を表2に示す。
Example 10
A capacitor was manufactured and evaluated in the same manner as in Example 4, except that in the preparation of the conductive polymer composition K (second conductive polymer composition) for forming the second conductive layer, fine silica was not added, and in the formation of the outer coating layer (second conductive layer), the number of dipping steps was set to three. The evaluation results are shown in Table 2.

<側面エッジ部厚さの評価>
 上記で得られたコンデンサについて、ディッピングを行う際に下側であった面を底面とし、底面-上面間の方向において、底面側から1/3の位置において、底面に平行な面でコンデンサを切断し、断面を光学顕微鏡で観察することで、側面エッジ部厚さと、側面フラット部厚さを測定した。評価結果を表2に示す。
<Evaluation of side edge thickness>
The surface of the capacitor obtained above that was the bottom surface during dipping was set as the bottom surface, and the capacitor was cut along a surface parallel to the bottom surface at a position 1/3 of the way from the bottom surface side in the bottom-top direction, and the thickness of the side edge portion and the side flat portion were measured by observing the cross section with an optical microscope. The evaluation results are shown in Table 2.

<耐湿熱性の評価>
 上記で得られたコンデンサについて、実施例1と同様にして、耐湿熱性を評価した。評価結果を表2に示す。
<Evaluation of wet heat resistance>
The moist heat resistance of the capacitor obtained above was evaluated in the same manner as in Example 1. The evaluation results are shown in Table 2.

Figure JPOXMLDOC01-appb-T000016
Figure JPOXMLDOC01-appb-T000016

 実施例4~10のコンデンサは、いずれも耐湿熱性を有していた。 All of the capacitors in Examples 4 to 10 had moist heat resistance.

 引き上げ速度1秒である実施例4~6のコンデンサは、引き上げ速度30秒である実施例7のコンデンサと比較して、側面エッジ部と側面フラット部が厚いことがわかった。 The capacitors in Examples 4 to 6, which had a pull-up speed of 1 second, were found to have thicker side edge portions and flat side portions than the capacitor in Example 7, which had a pull-up speed of 30 seconds.

 また、チキソトロピー性付与剤(シリカ)と増粘剤(エチルセルロース)を両方含む実施例4~6のコンデンサは、チキソトロピー性付与剤(シリカ)と増粘剤(エチルセルロース)の一方のみを含む実施例8及び10のコンデンサと比較して、ディッピング回数が1回又は2回であっても、側面エッジ部と側面フラット部が厚いことがわかった。 In addition, it was found that the capacitors of Examples 4 to 6, which contain both a thixotropic agent (silica) and a thickener (ethyl cellulose), have thicker side edge portions and flat side portions, even when dipping is performed only once or twice, compared to the capacitors of Examples 8 and 10, which contain only one of a thixotropic agent (silica) and a thickener (ethyl cellulose).

 さらに、増粘剤(エチルセルロース)の添加量が0.36質量%である実施例6と、増粘剤(エチルセルロース)の添加量が0.18質量%である実施例9を比べると、チキソトロピー性付与剤(シリカ)の添加量は1.8質量%で共通するところ、実施例6のコンデンサはより少ないディッピング回数であっても側面エッジ部と側面フラット部が厚いことがわかった。 Furthermore, when comparing Example 6, in which the amount of thickener (ethyl cellulose) added is 0.36 mass%, with Example 9, in which the amount of thickener (ethyl cellulose) added is 0.18 mass%, it was found that while the amount of thixotropy-imparting agent (silica) added is both 1.8 mass%, the capacitor in Example 6 had thicker side edge portions and side flat portions even with fewer dipping cycles.

 上記に本発明の実施形態及び/又は実施例を幾つか詳細に説明したが、当業者は、本発明の新規な教示及び効果から実質的に離れることなく、これら例示である実施形態及び/又は実施例に多くの変更を加えることが容易である。従って、これらの多くの変更は本発明の範囲に含まれる。
 この明細書に記載の文献、及び本願のパリ条約による優先権の基礎となる出願の内容を全て援用する。
Although some embodiments and/or examples of the present invention have been described in detail above, those skilled in the art can easily make many modifications to these exemplary embodiments and/or examples without substantially departing from the novel teachings and advantages of the present invention, and therefore many such modifications are within the scope of the present invention.
The contents of all documents cited in this specification and of the application from which this application claims priority under the Paris Convention are incorporated by reference in their entirety.

Claims (16)

 弁金属からなる多孔質体と、前記多孔質体の表面に形成された誘電体層と、前記誘電体層を被覆する2以上の導電層と、を含み、
 前記2以上の導電層は、前記誘電体層の表面に形成された第1の導電層と、前記第1の導電層に積層された第2の導電層と、を有し、
 前記第2の導電層が、ポニアニリンがプロトン供与体でドープされているポリアニリン複合体を含む、固体電解コンデンサ。
The present invention includes a porous body made of a valve metal, a dielectric layer formed on a surface of the porous body, and two or more conductive layers covering the dielectric layer,
the two or more conductive layers include a first conductive layer formed on a surface of the dielectric layer and a second conductive layer laminated on the first conductive layer,
The second conductive layer comprises a polyaniline composite in which the polyaniline is doped with a proton donor.
 前記誘電体層が、前記弁金属の酸化物からなる、請求項1に記載の固体電解コンデンサ。 The solid electrolytic capacitor of claim 1, wherein the dielectric layer is made of an oxide of the valve metal.  前記ポリアニリン複合体が、スルホコハク酸でドープされている、請求項1又は2記載の固体電解コンデンサ。 The solid electrolytic capacitor according to claim 1 or 2, wherein the polyaniline complex is doped with sulfosuccinic acid.  前記第2の導電層が、さらにチキソトロピー性付与剤を含む、請求項1~3のいずれかに記載の固体電解コンデンサ。 The solid electrolytic capacitor according to any one of claims 1 to 3, wherein the second conductive layer further contains a thixotropic agent.  前記チキソトロピー性付与剤が、無機粒子を含む、請求項4に記載の固体電解コンデンサ。 The solid electrolytic capacitor according to claim 4, wherein the thixotropy-imparting agent contains inorganic particles.  前記無機粒子が、シリカ、チタニア、アルミナ、及びジルコニアからなる群から選択される1以上を含む、請求項5に記載の固体電解コンデンサ。 The solid electrolytic capacitor according to claim 5, wherein the inorganic particles include one or more selected from the group consisting of silica, titania, alumina, and zirconia.  前記第2の導電層全体に対する、前記チキソトロピー性付与剤の含有率が、0.01~50質量%である、請求項4~6のいずれかに記載の固体電解コンデンサ。 The solid electrolytic capacitor according to any one of claims 4 to 6, wherein the content of the thixotropy-imparting agent in the entire second conductive layer is 0.01 to 50 mass %.  前記第2の導電層が、さらに増粘剤を含む、請求項1~7のいずれかに記載の固体電解コンデンサ。 The solid electrolytic capacitor according to any one of claims 1 to 7, wherein the second conductive layer further contains a thickener.  前記増粘剤が、ポリエーテル系化合物又はセルロース系化合物である、請求項8に記載の固体電解コンデンサ。 The solid electrolytic capacitor according to claim 8, wherein the thickener is a polyether compound or a cellulose compound.  前記第2の導電層全体に対する、前記増粘剤の含有率が、0.001~5質量%である、請求項8又は9に記載の固体電解コンデンサ。 The solid electrolytic capacitor according to claim 8 or 9, wherein the content of the thickener in the entire second conductive layer is 0.001 to 5 mass %.  前記第2の導電層が、以下の条件(P1)及び(P2)を満たす導電性高分子組成物から形成される、請求項1~10のいずれかに記載の固体電解コンデンサ。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。
Figure JPOXMLDOC01-appb-M000001
11. The solid electrolytic capacitor according to claim 1, wherein the second conductive layer is formed from a conductive polymer composition that satisfies the following conditions (P1) and (P2):
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000001
 前記弁金属が、アルミニウム、タンタル、ニオブ、チタン、ハフニウム、ジルコニウム、亜鉛、タングステン、ビスマス、及びアンチモンからなる群から選択される、請求項1~11のいずれかに記載の固体電解コンデンサ。 The solid electrolytic capacitor according to any one of claims 1 to 11, wherein the valve metal is selected from the group consisting of aluminum, tantalum, niobium, titanium, hafnium, zirconium, zinc, tungsten, bismuth, and antimony.  以下の工程(A-1)又は(A-2)と、工程(B)と、工程(C)とを含む、固体電解コンデンサの製造方法。
(A-1)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子及び溶媒を含む第1の導電性高分子組成物に浸漬する工程
(A-2)弁金属の酸化物を有する多孔質体の一部又は全体を、導電性高分子、溶媒、及びフェノール性化合物を含む第1の導電性高分子組成物に浸漬する工程
(B)前記多孔質体を、前記工程(A-1)又は(A-2)で用いた第1の導電性高分子組成物から取り出して、前記第1の導電性高分子組成物に含まれる溶媒の沸点以下の温度下で保持する工程
(C)前記工程(B)を経た後の前記多孔質体の一部又は全体を、前記第1の導電性高分子組成物と同一又は異なる導電性高分子、チキソトロピー性付与剤、及び溶媒を含む第2の導電性高分子組成物に浸漬し、乾燥する工程
A method for producing a solid electrolytic capacitor, comprising the following steps (A-1) or (A-2), (B), and (C):
(A-1) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer and a solvent; (A-2) A step of immersing a part or the whole of a porous body having an oxide of a valve metal in a first conductive polymer composition containing a conductive polymer, a solvent, and a phenolic compound; (B) A step of removing the porous body from the first conductive polymer composition used in the step (A-1) or (A-2) and holding it at a temperature equal to or lower than the boiling point of the solvent contained in the first conductive polymer composition; (C) A step of immersing a part or the whole of the porous body after the step (B) in a second conductive polymer composition containing a conductive polymer, a thixotropy-imparting agent, and a solvent that is the same as or different from the first conductive polymer composition, and drying the second conductive polymer composition.
 前記第2の導電性高分子組成物全体に対する、前記チキソトロピー性付与剤の含有率が、0.2~5質量%である、請求項13に記載の固体電解コンデンサの製造方法。 The method for producing a solid electrolytic capacitor according to claim 13, wherein the content of the thixotropy-imparting agent in the entire second conductive polymer composition is 0.2 to 5 mass %.  前記第2の導電性高分子組成物が、以下の条件(P1)及び(P2)を満たす、請求項13又は14に記載の固体電解コンデンサの製造方法。
 (P1)せん断速度10(1/s)のときの粘度が1Pa・s以上である。
 (P2)せん断速度10(1/s)で30秒間せん断を印加した後、0.0001(1/s)のせん断速度としたときの直後の粘度が10Pa・s以上であり、かつ下記式(P2-1)を満たす。
Figure JPOXMLDOC01-appb-M000002
15. The method for producing a solid electrolytic capacitor according to claim 13, wherein the second conductive polymer composition satisfies the following conditions (P1) and (P2):
(P1) The viscosity at a shear rate of 10 (1/s) is 1 Pa·s or more.
(P2) After applying shear at a shear rate of 10 (1/s) for 30 seconds, the viscosity immediately after the shear rate is reduced to 0.0001 (1/s) is 10 Pa·s or more and satisfies the following formula (P2-1).
Figure JPOXMLDOC01-appb-M000002
 請求項13~15のいずれかに記載の固体電解コンデンサの製造方法により得られた固体電解コンデンサ。 A solid electrolytic capacitor obtained by the method for producing a solid electrolytic capacitor according to any one of claims 13 to 15.
PCT/JP2024/043559 2023-12-15 2024-12-10 Solid electrolytic capacitor and method for manufacturing same Pending WO2025127019A1 (en)

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US20010018788A1 (en) * 1999-08-31 2001-09-06 Alexander Bluvstein Method for making conductive polymer capacitor
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