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WO2025169837A1 - Optical element and light source device - Google Patents

Optical element and light source device

Info

Publication number
WO2025169837A1
WO2025169837A1 PCT/JP2025/003035 JP2025003035W WO2025169837A1 WO 2025169837 A1 WO2025169837 A1 WO 2025169837A1 JP 2025003035 W JP2025003035 W JP 2025003035W WO 2025169837 A1 WO2025169837 A1 WO 2025169837A1
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
optical
light
region
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
PCT/JP2025/003035
Other languages
French (fr)
Japanese (ja)
Inventor
真澄 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Publication of WO2025169837A1 publication Critical patent/WO2025169837A1/en
Pending legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21LIGHTING
    • F21SNON-PORTABLE LIGHTING DEVICES; SYSTEMS THEREOF; VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLE EXTERIORS
    • F21S2/00Systems of lighting devices, not provided for in main groups F21S4/00 - F21S10/00 or F21S19/00, e.g. of modular construction
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01SRADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
    • G01S7/00Details of systems according to groups G01S13/00, G01S15/00, G01S17/00
    • G01S7/48Details of systems according to groups G01S13/00, G01S15/00, G01S17/00 of systems according to group G01S17/00
    • G01S7/481Constructional features, e.g. arrangements of optical elements
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00Simple or compound lenses
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/02Diffusing elements; Afocal elements
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00Projectors or projection-type viewers; Accessories therefor
    • G03B21/14Details

Definitions

  • This disclosure relates to optical elements and light source devices.
  • Optical elements such as lens arrays that diffuse incident light and emit diffused light are known.
  • Light source devices that include such optical elements are also known.
  • Patent Document 1 discloses an optical element that includes an optical region in which optical elements are arranged on a portion of at least one surface of a flat substrate, and a peripheral region in which no optical elements are arranged, which is arranged around the optical region on the surface of the substrate where the optical region is arranged.
  • One aspect of the present disclosure aims to increase the light extraction efficiency of diffused light and reduce light with locally high luminous intensity.
  • FIG. 1 is a schematic top view showing the overall configuration of an optical element according to a first embodiment.
  • FIG. 2 is a schematic cross-sectional view of the optical element taken along line II-II in FIG. 5A and 5B are schematic diagrams showing the relationship between the inclination of the surface and the diffusion angle in the boundary region of the optical element according to the first embodiment.
  • FIG. 2 is a diagram showing an example of the area ratio between the substrate and the optical region in the optical element according to the first embodiment.
  • 10A and 10B are diagrams showing other examples of the area ratio between the substrate and the optical region in the optical element according to the first embodiment.
  • 1 is a top view photograph showing an optical element according to Example 1.
  • FIG. 1 is a top view photograph showing an optical element according to Example 1.
  • FIG. 7 is a diagram showing a cross-sectional shape of the optical element taken along line VII-VII in FIG. 6.
  • FIG. 8 is an enlarged view of region VIII in FIG. 7.
  • FIG. 9 is a diagram showing the first derivative of FIG. 8 .
  • FIG. 8 is a diagram showing the probability density of the diffusion angle of light incident on region VII in FIG. 7 .
  • 10 is a top view photograph showing an optical element according to Example 2.
  • 12 is a diagram showing a cross-sectional shape of the optical element taken along line XII-XII in FIG. 11.
  • FIG. 13 is an enlarged view of region XIII in FIG. 12.
  • FIG. 14 is a diagram showing the first derivative of FIG. 13 .
  • FIG. 10 is a perspective view showing the behavior of light incident on a boundary region of an optical element according to Example 3.
  • 10A and 10B are side views showing the behavior of light incident on a boundary region of an optical element according to Example 3.
  • 10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 10 degrees.
  • FIG. 10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 20 degrees.
  • FIG. 10 is a perspective view showing the behavior of light incident on a boundary region of an optical element according to Example 3.
  • 10A and 10B are side views showing the behavior of light incident on a boundary region of an optical element according to Example 3.
  • 10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example
  • FIG. 10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 30 degrees.
  • FIG. FIG. 10 is a perspective view showing the behavior of light incident on a boundary region of the optical element according to Example 1.
  • 10 is a side view showing the behavior of light incident on a boundary region of the optical element according to Example 1.
  • FIG. 10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 1 at a first surface incident angle of 10 degrees.
  • FIG. 10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of the optical element according to Example 1 at a first surface incident angle of 20 degrees.
  • FIG. 10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of the optical element according to Example 1 at a first surface incident angle of 30 degrees.
  • FIG. FIG. 10 is a schematic perspective view of a light source device according to a second embodiment.
  • 10A and 10B are diagrams illustrating a first example of diffused light emitted from a light source device according to a second embodiment.
  • 10A and 10B are diagrams illustrating a second example of diffused light emitted from the light source device according to the second embodiment.
  • 10A and 10B are diagrams illustrating a third example of diffused light emitted from the light source device according to the second embodiment.
  • 10A and 10B are diagrams showing a first example of an intensity profile of diffused light emitted from a light source device according to a second embodiment.
  • 10A and 10B are diagrams showing a second example of the intensity profile of diffused light emitted from the light source device according to the second embodiment.
  • directions may be represented using a Cartesian coordinate system having an X-axis, a Y-axis, and a Z-axis.
  • the X-direction along the X-axis indicates a specific direction within the plane of the first surface of the optical element according to the embodiment.
  • the Y-direction along the Y-axis indicates a direction perpendicular to the X-direction within the plane of the first surface.
  • the Z-direction along the Z-axis indicates a direction perpendicular to the first surface.
  • the direction in which the arrow points in the X direction is referred to as the +X direction, and the direction opposite to the +X direction is referred to as the -X direction.
  • the direction in which the arrow points in the Y direction is referred to as the +Y direction, and the direction opposite to the +Y direction is referred to as the -Y direction.
  • the direction in which the arrow points in the Z direction is referred to as the +Z direction, and the direction opposite to the +Z direction is referred to as the -Z direction.
  • light traveling in the +Z direction is incident on the optical element and emitted from the optical element.
  • a top view refers to viewing the optical element of the embodiment in the direction in which the light travels, i.e., the +Z direction.
  • these directional expressions do not limit the directions in the embodiments of the present disclosure.
  • substantially parallel means that the absolute value of the angular deviation from the parallel state is between 0 and 10 degrees.
  • substantially perpendicular means that the absolute value of the angular deviation from the perpendicular state is between 0 and 10 degrees.
  • FIG. 1 is a schematic top view showing an example of the overall configuration of an optical element 100 according to the first embodiment.
  • Figure 2 is a schematic cross-sectional view of the optical element 100 taken along line II-II in Figure 1.
  • the optical element 100 has a substrate 1 including a first surface 1a and a second surface 1b located opposite the first surface 1a.
  • the substrate 1 includes an optical region 10 in which optical elements 11-1 to 11-4 are arranged in a portion of the first surface 1a.
  • the substrate 1 also includes a peripheral region 12, which is provided around the optical region 10 on the surface of the substrate 1 where the optical region 10 is provided, and in which no optical elements 11 are arranged.
  • the optical elements 11 are lens elements.
  • a first anti-reflection film 13a is provided on the surface of the optical region 10 and the peripheral region 12 on the first surface 1a of the substrate 1.
  • a second anti-reflection film 13b is provided on the surface of the second surface 1b of the substrate 1.
  • boundary region 110 is defined as the cross-sectional region from vertex 11T-1 of optical element 11-1, through which optical axis 11C-1 passes, to end 12E in peripheral region 12 closest to optical element 11-1.
  • the average absolute value of the surface inclination a in boundary region 110 is 1.00 or less, and the variation ⁇ is 0.10 or greater.
  • represents the standard deviation.
  • Optical axis 11C-1 refers to the axis that passes through the center of optical element 11-1 and is aligned with the traveling direction of light. In the example shown in FIG. 2, the traveling direction of light is along the Z axis. Vertex 11T-1 and end 12E are not included in boundary region 110.
  • optical element 11 is a generic notation when optical elements 11-1 to 11-4 are not distinguished from one another.
  • the reference numeral for optical element 11 is written alongside the reference numerals for optical elements 11-1 to 11-4 to indicate that optical element 11 is a generic notation for optical elements 11-1 to 11-4.
  • the boundary region between the optical region and the peripheral region is formed by a plane that is approximately perpendicular to the second surface on the side from which light is emitted from the optical element.
  • the boundary region is a plane with an infinite slope, since the boundary region is a plane that is approximately perpendicular to the second surface.
  • light that enters the boundary region passes through the interior of the substrate of the optical element and is then totally reflected by the second surface on the side from which light is emitted, resulting in an increase in the amount of light that returns in the direction of incidence.
  • the surface inclination a in the boundary region 110 has an average absolute value of 1.00 or less and a variation ⁇ of 0.10 or more.
  • the surface in the boundary region 110 is a smoothly curved surface that satisfies the conditions that the average absolute value is 1.00 or less and the variation ⁇ is 0.10 or more. By satisfying this condition, the surface inclination a in the boundary region 110 is no longer uniform, and light incident on the boundary region 110 is refracted at various refraction angles.
  • the light incident on the boundary region 110 is refracted at various refraction angles, light that has passed through the interior of the substrate 1 is incident on the second surface 1b at various angles, thereby reducing the light that is totally reflected at the second surface 1b and reducing the light that returns in the direction of incidence.
  • the light extraction efficiency of the diffused light emitted from the optical element 100 is increased.
  • light incident on the boundary region 110 is refracted at various refraction angles, thereby reducing localized concentration of light incident on the boundary region 110 and emitted from the optical element 100, and reducing light with locally high luminous intensity emitted from the optical element 100.
  • this embodiment increases the light extraction efficiency of diffused light and reduces light with locally high luminous intensity. Furthermore, by reducing light with locally high luminous intensity, an optical element 100 with high safety from the perspective of eye safety can be provided. In particular, when light incident on the optical element is light that tends to be highly luminous, such as laser light, reducing light with locally high luminous intensity can achieve significant effects from the perspective of eye safety.
  • the average absolute value of the surface inclination a in the boundary region 110 is preferably 0.90 or less, more preferably 0.80 or less, and even more preferably 0.70 or less. From the perspective of increasing the diffusion angle ⁇ , the average absolute value of the inclination a is preferably 0.2 or more, and even more preferably 0.3 or more.
  • the variation ⁇ is preferably 0.20 or more, more preferably 0.30 or more, and even more preferably 0.40 or more.
  • a peripheral region 12 is provided around the optical region 10. This allows a bonding material to be applied to the peripheral region 12 when bonding the optical element 100 to another member, reducing the infiltration of part of the optical region 10 with the bonding material. By reducing the area that is infiltrated by the bonding material and does not provide the desired optical properties, the optical region 10 can be used more effectively.
  • chipping and other defects can be prevented from occurring in the optical region 10 when multiple optical elements 100 are formed on a single substrate and the substrate is cut to obtain a large number of optical elements 100. Preventing chipping and other defects improves the quality of each of the multiple optical elements 100 obtained, and prevents a decrease in the mechanical strength of the optical region 10 due to defects in the optical region 10.
  • the optical region 10 is recessed relative to the peripheral region 12 in the substrate 1.
  • the optical element 11 shown in FIGS. 1 and 2 has a concave surface recessed relative to the peripheral region 12. Because the optical region 10 is recessed relative to the peripheral region 12, when the optical element 100 comes into contact with other components, the peripheral region 12 comes into contact with the other components preferentially. This reduces contact of the optical element 11 placed in the optical region 10 with other components, thereby reducing damage to the optical element 11 due to contact or friction with other components.
  • the optical element 11 is not limited to being concave, and may be convex.
  • the apex of the convex surface is not limited to being located lower than the peripheral region 12 in the direction along the optical axis 11C-1, and may be located higher.
  • the optical region 10 includes a plurality of optical elements 11, which are arranged two-dimensionally without exposing any flat surfaces.
  • the optical element 100 can reduce high-intensity light that passes through the flat surfaces and travels straight ahead. This makes it possible to provide an optical element 100 that is highly safe from an eye-safe perspective.
  • the distance Ds connecting the vertices 11T-1 and 11T-2 of adjacent optical elements 11-1 and 11-2 among the multiple optical elements 11 is 10 ⁇ m or more and 200 ⁇ m or less.
  • the distance Ds By setting the distance Ds to 10 ⁇ m or more, it is easier to process adjacent optical elements 11-1 and 11-2 compared to when the distance Ds is less than 10 ⁇ m, thereby facilitating the manufacture of optical element 100.
  • the distance Ds to 200 ⁇ m or less, the amount of processing required for each of optical elements 11-1 and 11-2 to connect the ends of optical element 11-1 and 11-2 can be reduced compared to when the distance Ds is greater than 200 ⁇ m.
  • optical element 100 By reducing the amount of processing required for each of optical elements 11-1 and 11-2, the manufacturing efficiency of optical element 100 can be improved. Furthermore, by reducing the amount of processing required for each of optical elements 11-1 and 11-2, it is possible to prevent the thickness of optical element 100, i.e., the length of optical element 100 in the Z direction, from becoming thin, thereby increasing the mechanical strength of optical element 100.
  • the depth Dp between the vertex 11T-1 of the optical element 11-1 and the end 12E of the peripheral region 12 in the direction along the optical axis 11C-1 is 3 ⁇ m or more and 100 ⁇ m or less. Setting the depth Dp to 3 ⁇ m or more makes it easier to process the optical element 11-1 compared to when the depth Dp is less than 3 ⁇ m, thereby facilitating the manufacture of the optical element 100. Furthermore, setting the depth Dp to 100 ⁇ m or less reduces the amount of processing required for the optical element 11-1 compared to when the depth Dp is greater than 100 ⁇ m. Reducing the amount of processing required for the optical element 11-1 increases the manufacturing efficiency of the optical element 100. Furthermore, reducing the amount of processing required for the optical element 11-1 prevents the optical element 100 from becoming thinner, thereby increasing the mechanical strength of the optical element 100. While the above example describes the optical element 11-1, similar effects can be achieved with other optical elements 11.
  • the substrate 1 can be made of a material including a glass material or a resin material.
  • the glass material or resin material used for the substrate 1 can be selected appropriately depending on the intended use of the optical element 100.
  • the optical elements 11 can be formed on the substrate 1 using an etching method, a molding method, or the like, and placed in the optical region 10.
  • the substrate 1 may include an optical region 10 on at least one of the first surface 1a and the second surface 1b.
  • the optical region 10 is not limited to four optical elements 11-1 to 11-4, but may include at least one optical element 11.
  • a cross section including the optical axis 11C of the optical element 11-1 closest to the peripheral region 12 may be any cross section of the optical element 100, as long as it includes the optical axis 11C of the optical element 11-1 closest to the peripheral region 12.
  • the incident surface is not limited to the first surface 1a, but may be the second surface 1b.
  • the exit surface is not limited to the second surface 1b, but may be the first surface 1a.
  • the first anti-reflection film 13a reduces light reflected from the first surface 1a of the substrate 1.
  • the second anti-reflection film 13b reduces light reflected from the second surface 1b of the substrate 1.
  • the first anti-reflection film 13a and the second anti-reflection film 13b can each be constructed to include a dielectric film material such as magnesium fluoride.
  • the optical element 100 does not necessarily have to include the first anti-reflection film 13a and the second anti-reflection film 13b.
  • FIG. 3 is a schematic diagram showing an example of the relationship between the inclination a of the surface in the boundary region 110 of the optical element 100 and the diffusion angle ⁇ .
  • FIG. 3 is an enlarged view of the optical element 11-1 in FIG. 2.
  • the light L indicated by the thick line represents a light ray incident on the boundary region 110 of the optical element 11-1.
  • the light L incident on the boundary region 110 from a direction perpendicular to a plane parallel to the second surface 1b is refracted at the surface of the boundary region 110, passes through the inside of the base material 1, and then is emitted from the second surface 1b of the optical element 100.
  • the inclination a represents the inclination of the surface at position Po1 in the boundary region 110 where light L is incident.
  • the inclination angle a' represents the angle of the inclination of the surface at position Po1 in the boundary region 110 with respect to a plane parallel to the second surface 1b.
  • the normal angle ⁇ represents the angle of the normal (-1/a) to the surface at position Po1 in the boundary region 110 with respect to a plane parallel to the second surface 1b.
  • the refraction angle ⁇ represents the angle of light L with respect to the normal (-1/a) to the surface at position Po1 in the boundary region 110.
  • the second surface incident angle ⁇ represents the angle of light L, which enters the interior of the base material 1 through position Po1, passes through the interior of the base material 1, and then enters position Po2 on the second surface 1b, with respect to the normal to the second surface 1b.
  • the diffusion angle ⁇ represents the angle of light L, which exits position Po2 on the second surface 1b, with respect to the normal to the second surface 1b.
  • the refraction angle ⁇ is expressed by the following formula (2), where n is the refractive index of the substrate 1 and ⁇ is the constant of the circumference of a circle.
  • the second surface incident angle ⁇ is expressed by the following equation (3):
  • the diffusion angle ⁇ is expressed by the following equation (4):
  • Table 1 shows the correspondence between the tilt a, tilt angle a', normal angle ⁇ , refraction angle ⁇ , second surface incident angle ⁇ , and diffusion angle ⁇ obtained using the above equations (1) to (4) when the refractive index n of substrate 1 is 1.52.
  • the critical angle is 41.14 degrees. Therefore, if the second surface incident angle ⁇ is less than 41.14 degrees, light L that passes through the interior of the substrate 1 and is incident on the second surface 1b is refracted at the second surface 1b and emitted from the second surface 1b. On the other hand, if the second surface incident angle ⁇ is 41.14 degrees or greater, light L is totally reflected by the second surface 1b.
  • light incident on an optical element 11 arranged on the first surface 1a may be refracted by the optical element 11 and then incident on an adjacent optical element 11.
  • the second surface incident angle ⁇ is 27.4 degrees or less and the slope a is 2.0 degrees or less.
  • a slope a of 2.0 or less corresponds to a slope angle a' of 63.4 degrees or less.
  • the optical element 100 can reduce the amount of returned light caused by total reflection at the second surface 1b and increase the light extraction efficiency of the diffused light emitted from the optical element 100.
  • the diffusion angle ⁇ is uniquely determined by the surface inclination a in the boundary region 110, regardless of the direction of light incident on the boundary region 110. If the surface inclination a in the boundary region 110 were approximately constant regardless of position, the light emitted from the optical element 100 would be locally concentrated, and light with locally high luminous intensity would be more likely to be included in the diffused light. In contrast, in the optical element 100, by changing the surface inclination a in the boundary region 110 depending on the position, it is possible to reduce the local concentration of light emitted from the optical element 100 and reduce light with locally high luminous intensity.
  • the FWHM be 20 degrees or greater when parallel light with an emission peak wavelength of 300 nm or greater and 1000 nm or less is incident.
  • the diffused light emitted from optical element 100 can be spread and irradiated onto the irradiation surface.
  • FWHM full width at half maximum m refers to the maximum angular region enclosed by an intensity of 0.5 when the average intensity in the diffusion angle range of -10° to +10° is normalized to 1 in the one-dimensional direction in which the distance of the two-dimensional image projected onto a plane parallel to the surface of the element is at its maximum, and the relative intensity is plotted as a function of the diffusion angle.
  • the following effects can be achieved when incorporating optical element 100 into a device: (1) When incorporating optical element 100 into a projector, the device can be made more compact. (2) When incorporating optical element 100 into a sensing device, information from a wider field of view can be captured at once. (3) When incorporating optical element 100 into a lighting device, the illumination range over a short distance can be expanded.
  • the total light transmittance of the diffused light is preferably 93% or more.
  • the total light transmittance of the diffused light emitted from the optical element 100 can be set to 93% or more, thereby reducing the attenuation of light that passes through the optical element 100. This makes it possible to reduce the power consumption of devices such as projectors and sensing devices when the optical element 100 is incorporated into such devices. Furthermore, when the optical element 100 is incorporated into a lighting device, it can provide brighter illumination with the same amount of power.
  • Figure 4 is a diagram showing an example of the area ratio between the substrate 1 and the optical region 10 in the optical element 100.
  • Figure 5 is a diagram showing another example of the area ratio between the substrate 1 and the optical region 10 in the optical element 100.
  • the substrate 1 has a substantially rectangular outer edge shape when viewed from above.
  • the optical region 10 also has a substantially rectangular outer edge shape when viewed from above.
  • the width of the substrate 1 in the X direction is b
  • the width of the optical region 10 in the X direction is b x (1 - P)
  • the width of the substrate 1 in the Y direction is c
  • the width of the optical region 10 in the Y direction is c(1 - Q).
  • P satisfies 0 ⁇ P ⁇ 1
  • Q satisfies 0 ⁇ Q ⁇ 1.
  • the area ratio of the optical region 10 to the area of the substrate 1 can be expressed as 1 - P - Q + P x Q.
  • Table 2 shows the correspondence between P, Q, and the area ratio of the optical region 10 to the area of the substrate 1.
  • the substrate 1 has a substantially circular outer edge shape in top view.
  • the optical zone 10 also has a substantially circular outer edge shape in top view.
  • the radius of the substrate 1 is d, and the radius of the optical zone 10 is d x (1 - R), where R satisfies 0 ⁇ R ⁇ 1.
  • the ratio of the area of the optical zone 10 to the area of the substrate 1 can be expressed as 1 - 2 x R + R2 .
  • Table 3 shows the correspondence between R and the area ratio of the optical region 10 to the area of the substrate 1.
  • the area ratio of the optical region 10 to the area of the substrate 1 be 0.0625 or more and 0.9025 or less.
  • the area of the optical region 10 is too large relative to the area of the substrate 1, when bonding the optical element 100 to another component, the area on the substrate 1 to which the bonding material is applied will be narrow, and good bonding strength may not be obtained.
  • the optical element 100 by setting the area ratio of the optical region 10 to the area of the substrate 1 to 0.9025 or less, good bonding strength can be obtained when bonding the optical element 100 to another component.
  • the area of the optical region 10 is too small relative to the area of the substrate 1, it will be difficult for light to enter the optical region 10, and the desired optical characteristics may not be obtained in the diffused light emitted from the optical element 100.
  • the optical element 100 by setting the area ratio of the optical region 10 to the area of the substrate 1 to 0.0625 or greater, it is possible to obtain the desired optical characteristics in the diffused light emitted from the optical element 100.
  • Examples and Comparative Examples Examples and comparative examples will be described below, but the present disclosure is not limited to these examples. Examples 1 and 2 shown below are examples, and Example 3 is a comparative example.
  • Example 1 In Example 1, the optical element 100 shown in the following FIGS. 6 to 10 was fabricated, and the optical element 100 was evaluated based on the results of measurements using a confocal microscope.
  • the substrate 1 used had a refractive index of 1.52.
  • the center-to-center distance between adjacent optical elements 11 is, for example, 40.0 ⁇ 1.0 ⁇ m.
  • the depth Dp of the optical elements 11 is 10.0 ⁇ 2.0 ⁇ m.
  • Figure 6 is a top view photograph showing the optical element 100 according to Example 1.
  • Figure 7 is a diagram showing the cross-sectional shape of the optical element 100 taken along line VII-VII in Figure 6.
  • Figure 8 is an enlarged view of region VIII in Figure 7.
  • Figure 9 is a diagram showing the first derivative of Figure 8.
  • Figure 10 is a diagram showing the probability density of the diffusion angle in region VIII in Figure 7.
  • Figure 6 shows a photograph of the optical region 10 of the optical element 100 according to Example 1 taken from above using a confocal microscope.
  • Figure 7 shows the results of measuring the cross-sectional shape of the optical element 100 taken along line VII-VII in Figure 6 using a confocal microscope.
  • Figure 8 shows the cross-sectional shape of region VIII in Figure 7, i.e., the boundary region 110 in Figure 6.
  • the first derivative dZ/dX in Figure 9 shows the calculation results for the slope a at each position in the cross-sectional shape of the boundary region 110 in Figure 8.
  • Figure 10 shows the calculation results for the probability density of the diffusion angle ⁇ when light incident on the boundary region 110 shown in Figures 7 to 9 is emitted from the optical element 100.
  • the boundary region 110 shown in Figure 6 has a smoothly curved, concave, aspherical shape.
  • the first derivative dZ/dX gradually changes depending on the position X, as shown in Figure 9.
  • the surface slope a gradually changes in the boundary region 110 shown in Figure 6.
  • the surface slope a is not constant, so the refraction angle ⁇ of light incident on the boundary region 110 is not constant. Because the refraction angle ⁇ is not constant, the diffusion angle ⁇ varies, as shown in Figure 10.
  • the optical element of Example 1 can reduce local concentration of light emitted from the optical element 100 and reduce light with locally high luminous intensity.
  • Table 4 shows the average, maximum, minimum, and standard deviation of the tilt a and the diffusion angle ⁇ for the optical element 100 of Example 1.
  • Example 1 satisfies the above-mentioned condition that "the average absolute value of the slope a in the boundary region 110 is 1.00 or less, and the variation ⁇ of the slope a is 0.10 or more.”
  • Example 2 In Example 2, the optical element 100 shown in the following FIGS. 11 to 15 was fabricated, and the optical element 100 was evaluated based on the results of measurements using a confocal microscope.
  • the substrate 1 used had a refractive index of 1.52.
  • the center-to-center distance between adjacent optical elements 11 is, for example, 22.5 ⁇ 2.5 ⁇ m.
  • the depth Dp of the optical elements 11 is 5.0 ⁇ 2.0 ⁇ m.
  • FIG. 11 shows a photograph of the optical region 10 of the optical element 100 according to Example 2 taken from above using a confocal microscope.
  • Figure 12 shows the results of measuring the cross-sectional shape of the optical element 100 taken along line XII-XII in Figure 11 using a confocal microscope.
  • Figure 13 shows the cross-sectional shape of region XIII in Figure 12, i.e., the boundary region 110 in Figure 11.
  • the first-order differential dZ/dX in Figure 14 shows the calculation results for the slope a at each position in the cross-sectional shape of the boundary region 110 in Figure 13.
  • Figure 15 shows the calculation results for the probability density of the diffusion angle ⁇ when light incident on the boundary region 110 shown in Figures 11 to 14 is emitted from the optical element 100.
  • FIG. 16 is a perspective view showing the behavior of light Li incident on boundary region 110X of optical element 100X according to Example 3.
  • FIG. 17 is a side view showing the behavior of light Li incident on boundary region 110X of optical element 100X according to Example 3.
  • FIG. 18 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle ⁇ of 10 degrees.
  • FIG. 19 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle ⁇ of 20 degrees.
  • FIG. 20 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle ⁇ of 30 degrees.
  • the optical element 100X of the third example has a substrate 1X including a first surface 1aX and a second surface 1bX located opposite the first surface 1aX.
  • the substrate 1X includes an optical region 10X in which an optical element 11X is arranged in a part of the first surface 1aX.
  • the substrate 1X also includes a peripheral region 12X on the surface of the substrate 1X on which the optical region 10X is arranged, which is arranged around the optical region 10X and in which no optical element 11X is arranged.
  • the optical element 11X included in the optical region 10X is a lens element.
  • the optical region 10X includes a boundary region 110X defined in the same manner as the boundary region 110 described above.
  • the boundary region 110X is a plane that is approximately perpendicular to the second surface 1bX.
  • the boundary region 110X is a plane that is approximately perpendicular to the second surface 1bX, and the boundary region 110X is a plane with an infinite slope a.
  • the light extraction efficiency from optical element 100X is 67.2% in the example shown in Figure 18, 44.7% in the example shown in Figure 19, and 0.19% in the example shown in Figure 20.
  • the light Lt shown in Figures 18 and 19 is light with a locally high luminous intensity that is generated by the local concentration of light incident on the boundary region between the optical region and the peripheral region.
  • optical element 100X there is a large amount of returned light due to total reflection, and the light extraction efficiency of the diffused light emitted from optical element 100X decreases.
  • optical element 100X light incident on the boundary region between the optical region and the peripheral region is locally concentrated, causing light with locally high luminous intensity to be emitted from the optical element.
  • FIG. 21 is a perspective view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1.
  • FIG. 22 is a side view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1.
  • FIG. 23 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle ⁇ of 10 degrees.
  • FIG. 21 is a perspective view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1.
  • FIG. 22 is a side view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1.
  • FIG. 23 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle ⁇ of 10 degrees.
  • FIG. 24 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle ⁇ of 20 degrees.
  • FIG. 25 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle ⁇ of 30 degrees.
  • light Li incident on boundary region 110 at a first surface incident angle ⁇ is refracted at boundary region 110, passes through the interior of substrate 1 in optical element 100, and then much of the light is emitted through second surface 1b without being totally reflected at second surface 1b. Reducing total reflection at second surface 1b reduces the amount of returning light, and as shown in FIGS. 23 to 25, more diffused light Ls reaches the irradiation surface S.
  • the light extraction efficiency from optical element 100 is 96.1% in the example shown in FIG. 23, 96.3% in the example shown in FIG. 24, and 96.6% in the example shown in FIG. 20.
  • the diffused light Ls shown in FIGS. 23 to 25 spreads after being emitted from optical element 100 and then irradiates the irradiation surface S. Diffused light Ls does not include light with locally high luminous intensity.
  • the optical element 100 according to Example 1 can increase the light extraction efficiency of diffused light emitted from the optical element 100 and reduce light with locally high luminous intensity. While the examples shown in Figures 21 to 25 show the optical element 100 according to Example 1, similar results can also be obtained with the optical element 100 according to Example 2.
  • Second Embodiment A light source device 200 according to the second embodiment will be described. Note that the same names and symbols as those in the already described embodiments indicate the same or similar members or configurations, and detailed descriptions thereof will be omitted as appropriate.
  • FIG. 26 is a schematic perspective view showing an example of a light source device 200 according to the second embodiment.
  • the light source device 200 has a light source 150 and an optical element 100 arranged on the emission side of the light source 150.
  • the optical element 100 diffuses light L0 from the light source 150.
  • the light source device 200 emits diffused light Ls by the optical element 100.
  • the light source device 200 emits diffused light Ls whose outer edge has a substantially rectangular shape with a longitudinal direction when viewed in the +Z direction.
  • the light source device 200 includes the optical element 100, which increases the light extraction efficiency of the diffused light Ls emitted from the light source device 200 and reduces light with locally high luminous intensity.
  • the optical element 100 is arranged with the first surface 1a, on which the optical region 10 is arranged, facing the light source 150.
  • the light source device 200 is used for sensing or lighting applications. In sensing applications, for example, in LiDAR (Light Detection and Ranging), the light source device 200 can be used as a light projecting device that projects diffused light for measurement into a measurement range. In lighting applications, for example, in a projection device such as a projector, the light source device 200 can be used as an illumination device that illuminates a spatial modulator such as a liquid crystal panel with diffused light.
  • a spatial modulator such as a liquid crystal panel with diffused light.
  • the light source device 200 can increase the light extraction efficiency of the diffused light Ls emitted from the light source device 200 and reduce light with locally high luminous intensity. Therefore, using the light source device 200 for sensing applications can improve the accuracy of sensing devices such as LiDAR. Furthermore, by using the light source device 200 for lighting purposes, the quality of images projected by a projection device such as a projector can be improved.

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Abstract

The present invention increases the light extraction efficiency of diffused light and reduces light having locally high luminous intensity. An optical element (100) comprises a base material (1) including a first surface (1a) and a second surface (1b) positioned at a side opposite of the first surface. The base material (1) comprises, on at least a portion of the first surface (1a) and the second surface (1b): an optical region (10) in which at least one optical element (11) is disposed; and a peripheral region (12) in which the optical element (11) is not disposed, the peripheral region (12) being provided surrounding the optical region on the surface of the base material on which the optical region is provided. The optical element (11) is a lens element, and if one cross-sectional region of the at least one optical element, the cross-sectional region including the optical axis of the optical element closest to the peripheral region, and extending from the vertex of the optical element through which the optical axis passes to the end closest to the optical element in the peripheral region, is defined as a boundary region (110), the slope of the surface in the boundary region (110) has an average absolute value of 1.00 or less and a variation σ of 0.10 or greater.

Description

光学素子、及び光源装置Optical element and light source device

 本開示は、光学素子、及び光源装置に関する。 This disclosure relates to optical elements and light source devices.

 入射される光を拡散し、拡散光を出射するレンズアレイ等の光学素子が知られている。また、該光学素子を有する光源装置が知られている。 Optical elements such as lens arrays that diffuse incident light and emit diffused light are known. Light source devices that include such optical elements are also known.

 例えば、特許文献1には、平板状の基材部の少なくとも片面の一部に光学要素が配置された光学領域と、基材部の光学領域が設けられた面における、光学領域の周囲に設けられ、光学要素が配置されない周辺領域と、を備える光学素子が開示されている。 For example, Patent Document 1 discloses an optical element that includes an optical region in which optical elements are arranged on a portion of at least one surface of a flat substrate, and a peripheral region in which no optical elements are arranged, which is arranged around the optical region on the surface of the substrate where the optical region is arranged.

国際公開第2022/202514号International Publication No. 2022/202514

 しかしながら、特許文献1に記載された光学素子では、光学領域と周辺領域の境界領域に入射された光が光学素子で全反射され、入射された方向に戻る光が多くなることで、光学素子から出射される拡散光の光取り出し効率が低下する場合がある。また、特許文献1に記載された光学素子では、光学領域と周辺領域の境界領域に入射された光が局所集中することにより、局所的に光度が高い光が光学素子から出射される場合がある。 However, with the optical element described in Patent Document 1, light incident on the boundary region between the optical region and the peripheral region is totally reflected by the optical element, and an increase in the amount of light returning in the direction of incidence can reduce the light extraction efficiency of diffused light emitted from the optical element. Furthermore, with the optical element described in Patent Document 1, light incident on the boundary region between the optical region and the peripheral region can be locally concentrated, resulting in light with locally high luminous intensity being emitted from the optical element.

 本開示の一態様は、拡散光の光取り出し効率を高くするとともに、局所的に光度が高い光を低減することを目的とする。 One aspect of the present disclosure aims to increase the light extraction efficiency of diffused light and reduce light with locally high luminous intensity.

 本開示の一態様に係る光学素子は、第1面と前記第1面とは反対側に位置する第2面とを含む基材を有し、前記基材は、前記第1面及び前記第2面の少なくとも一方の面の一部に、少なくとも1つの光学要素が配置された光学領域と、前記基材の前記光学領域が設けられた面における、前記光学領域の周囲に設けられ、前記光学要素が配置されない周辺領域と、を含み、前記光学要素はレンズ要素であり、少なくとも1つの前記光学要素のうち、前記周辺領域に最も近い前記光学要素の光軸を含む一断面において、前記光軸が通る前記光学要素の頂点から、前記周辺領域における前記光学要素に最も近い端部まで、の断面領域を境界領域と定義すると、前記境界領域における面の傾斜は、平均の絶対値が1.00以下であり、かつ、ばらつきσが0.10以上である。 An optical element according to one aspect of the present disclosure has a substrate including a first surface and a second surface located opposite the first surface, the substrate including an optical region in which at least one optical element is arranged in a portion of at least one of the first and second surfaces, and a peripheral region in which the optical element is not arranged, the optical element being a lens element, and in a cross section including the optical axis of the optical element closest to the peripheral region, the cross-sectional region extending from the vertex of the optical element through which the optical axis passes to the end of the peripheral region closest to the optical element being defined as a boundary region, the average absolute value of the slope of the surface in the boundary region being 1.00 or less and the variation σ being 0.10 or more.

 本開示の一態様によれば、拡散光の光取り出し効率を高くするとともに、局所的に光度が高い光を低減できる。 According to one aspect of the present disclosure, it is possible to increase the light extraction efficiency of diffused light and reduce light with locally high luminous intensity.

第1実施形態に係る光学素子の全体構成を示す模式的上面図である。1 is a schematic top view showing the overall configuration of an optical element according to a first embodiment. 図1におけるII-II線に沿った光学素子の模式的断面図である。FIG. 2 is a schematic cross-sectional view of the optical element taken along line II-II in FIG. 第1実施形態に係る光学素子の境界領域における面の傾斜と拡散角との関係を示す模式図である。5A and 5B are schematic diagrams showing the relationship between the inclination of the surface and the diffusion angle in the boundary region of the optical element according to the first embodiment. 第1実施形態に係る光学素子における基材と光学領域の面積比の一例を示す図である。FIG. 2 is a diagram showing an example of the area ratio between the substrate and the optical region in the optical element according to the first embodiment. 第1実施形態に係る光学素子における基材と光学領域の面積比の他の例を示す図である。10A and 10B are diagrams showing other examples of the area ratio between the substrate and the optical region in the optical element according to the first embodiment. 例1に係る光学素子を示す上面写真である。1 is a top view photograph showing an optical element according to Example 1. 図6におけるVII-VII線に沿った光学素子の断面形状を示す図である。FIG. 7 is a diagram showing a cross-sectional shape of the optical element taken along line VII-VII in FIG. 6. 図7におけるVIII領域の拡大図である。FIG. 8 is an enlarged view of region VIII in FIG. 7. 図8の一次微分を示す図である。FIG. 9 is a diagram showing the first derivative of FIG. 8 . 図7のVII領域に入射される光の拡散角の確率密度を示す図である。FIG. 8 is a diagram showing the probability density of the diffusion angle of light incident on region VII in FIG. 7 . 例2に係る光学素子を示す上面写真である。10 is a top view photograph showing an optical element according to Example 2. 図11におけるXII-XII線に沿った光学素子の断面形状を示す図である。12 is a diagram showing a cross-sectional shape of the optical element taken along line XII-XII in FIG. 11. 図12におけるXIII領域の拡大図である。FIG. 13 is an enlarged view of region XIII in FIG. 12. 図13の一次微分を示す図である。FIG. 14 is a diagram showing the first derivative of FIG. 13 . 図12のXIII領域に入射される光の拡散角の確率密度を示す図である。FIG. 13 is a diagram showing the probability density of the diffusion angle of light incident on region XIII in FIG. 12 . 例3に係る光学素子の境界領域に入射された光の振る舞いを示す斜視図である。FIG. 10 is a perspective view showing the behavior of light incident on a boundary region of an optical element according to Example 3. 例3に係る光学素子の境界領域に入射された光の振る舞いを示す側面図である。10A and 10B are side views showing the behavior of light incident on a boundary region of an optical element according to Example 3. 例3に係る光学素子の境界領域に第1面入射角が10度で光が入射されたときに照射面に照射される光を示す図である。10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 10 degrees. FIG. 例3に係る光学素子の境界領域に第1面入射角が20度で光が入射されたときに照射面に照射される光を示す図である。10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 20 degrees. FIG. 例3に係る光学素子の境界領域に第1面入射角が30度で光が入射されたときに照射面に照射される光を示す図である。10 is a diagram showing light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 3 at a first surface incident angle of 30 degrees. FIG. 例1に係る光学素子の境界領域に入射された光の振る舞いを示す斜視図である。FIG. 10 is a perspective view showing the behavior of light incident on a boundary region of the optical element according to Example 1. 例1に係る光学素子の境界領域に入射された光の振る舞いを示す側面図である。10 is a side view showing the behavior of light incident on a boundary region of the optical element according to Example 1. FIG. 例1に係る光学素子の境界領域に第1面入射角が10度で光が入射されたときに照射面に照射される拡散光を示す図である。10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of an optical element according to Example 1 at a first surface incident angle of 10 degrees. FIG. 例1に係る光学素子の境界領域に第1面入射角が20度で光が入射されたときに照射面に照射される拡散光を示す図である。10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of the optical element according to Example 1 at a first surface incident angle of 20 degrees. FIG. 例1に係る光学素子の境界領域に第1面入射角が30度で光が入射されたときに照射面に照射される拡散光を示す図である。10 is a diagram showing diffused light irradiated onto an irradiation surface when light is incident on a boundary region of the optical element according to Example 1 at a first surface incident angle of 30 degrees. FIG. 第2実施形態に係る光源装置の模式的斜視図である。FIG. 10 is a schematic perspective view of a light source device according to a second embodiment. 第2実施形態に係る光源装置から出射される拡散光の第一例を示す図である。10A and 10B are diagrams illustrating a first example of diffused light emitted from a light source device according to a second embodiment. 第2実施形態に係る光源装置から出射される拡散光の第二例を示す図である。10A and 10B are diagrams illustrating a second example of diffused light emitted from the light source device according to the second embodiment. 第2実施形態に係る光源装置から出射される拡散光の第三例を示す図である。10A and 10B are diagrams illustrating a third example of diffused light emitted from the light source device according to the second embodiment. 第2実施形態に係る光源装置から出射される拡散光の強度プロファイルの第一例を示す図である。10A and 10B are diagrams showing a first example of an intensity profile of diffused light emitted from a light source device according to a second embodiment. 第2実施形態に係る光源装置から出射される拡散光の強度プロファイルの第二例を示す図である。10A and 10B are diagrams showing a second example of the intensity profile of diffused light emitted from the light source device according to the second embodiment.

 以下、図面を参照して本開示を実施するための形態について詳細に説明する。但し、以下に示す形態は、本開示の技術思想を具現化するための光学素子を例示するものであって、以下に限定するものではない。なお、各図面が示す部材の大きさ、位置関係等は、説明を明確にするため誇張していることがある。各図面において、同一構成部分には同一符号を付し、重複した説明を適宜省略する。 Below, embodiments for implementing the present disclosure will be described in detail with reference to the drawings. However, the embodiments shown below are examples of optical elements that embody the technical concepts of the present disclosure, and are not limited to the following. Note that the size, positional relationships, etc. of components shown in each drawing may be exaggerated for clarity. In each drawing, identical components are designated by the same reference numerals, and duplicate explanations will be omitted where appropriate.

 以下に示す図面において、方向を表すために、X軸、Y軸およびZ軸を備える直交座標を用いる場合がある。X軸に沿うX方向は、実施形態に係る光学素子の第1面の面内における所定方向を示す。Y軸に沿うY方向は、上記第1面の面内においてX方向と直交する方向を示す。Z軸に沿うZ方向は上記第1面に直交する方向を示す。 In the drawings shown below, directions may be represented using a Cartesian coordinate system having an X-axis, a Y-axis, and a Z-axis. The X-direction along the X-axis indicates a specific direction within the plane of the first surface of the optical element according to the embodiment. The Y-direction along the Y-axis indicates a direction perpendicular to the X-direction within the plane of the first surface. The Z-direction along the Z-axis indicates a direction perpendicular to the first surface.

 X方向で矢印が向いている方向を+X方向、+X方向の反対方向を-X方向と表記する。Y方向で矢印が向いている方向を+Y方向、+Y方向の反対方向を-Y方向と表記する。Z方向で矢印が向いている方向を+Z方向、+Z方向の反対方向を-Z方向と表記する。実施形態では、+Z方向に進む光が光学素子に入射され、光学素子から出射されるものとする。本明細書において、上面視とは、光が進む方向、すなわち+Z方向に実施形態に係る光学素子を見ることをいう。但し、これらの方向表現は、本開示の実施形態の方向を限定するものではない。 The direction in which the arrow points in the X direction is referred to as the +X direction, and the direction opposite to the +X direction is referred to as the -X direction. The direction in which the arrow points in the Y direction is referred to as the +Y direction, and the direction opposite to the +Y direction is referred to as the -Y direction. The direction in which the arrow points in the Z direction is referred to as the +Z direction, and the direction opposite to the +Z direction is referred to as the -Z direction. In the embodiment, light traveling in the +Z direction is incident on the optical element and emitted from the optical element. In this specification, a top view refers to viewing the optical element of the embodiment in the direction in which the light travels, i.e., the +Z direction. However, these directional expressions do not limit the directions in the embodiments of the present disclosure.

 本明細書および特許請求の範囲において、略平行とは平行状態からの角度のずれ量の絶対値が0度以上10度以下であることをいう。また、略直交とは直交状態からの角度のずれ量の絶対値が0度以上10度以下であることをいう。 In this specification and claims, "substantially parallel" means that the absolute value of the angular deviation from the parallel state is between 0 and 10 degrees. Furthermore, "substantially perpendicular" means that the absolute value of the angular deviation from the perpendicular state is between 0 and 10 degrees.

 [第1実施形態]
 <第1実施形態に係る光学素子の構成>
 図1~図2を参照して、第1実施形態に係る光学素子の全体構成について説明する。図1は、第1実施形態に係る光学素子100の全体構成の一例を示す模式的上面図である。図2は、図1におけるII-II線に沿った光学素子100の模式的断面図である。
[First embodiment]
<Configuration of Optical Element According to First Embodiment>
The overall configuration of an optical element according to the first embodiment will be described with reference to Figures 1 and 2. Figure 1 is a schematic top view showing an example of the overall configuration of an optical element 100 according to the first embodiment. Figure 2 is a schematic cross-sectional view of the optical element 100 taken along line II-II in Figure 1.

 図2に示すように、光学素子100は、第1面1aと、第1面1aとは反対側に位置する第2面1bと、を含む基材1を有する。図1及び図2に示すように、基材1は、第1面1aの一部に、光学要素11-1~光学要素11-4が配置された光学領域10を含む。基材1は、基材1の光学領域10が設けられた面における、光学領域10の周囲に設けられ、光学要素11が配置されない周辺領域12を含む。光学要素11は、レンズ要素である。図2に示す例では、基材1の第1面1aにおける光学領域10及び周辺領域12のそれぞれの表面には、第1反射防止膜13aが設けられている。また、基材1の第2面1bの表面には、第2反射防止膜13bが設けられている。 As shown in FIG. 2, the optical element 100 has a substrate 1 including a first surface 1a and a second surface 1b located opposite the first surface 1a. As shown in FIGS. 1 and 2, the substrate 1 includes an optical region 10 in which optical elements 11-1 to 11-4 are arranged in a portion of the first surface 1a. The substrate 1 also includes a peripheral region 12, which is provided around the optical region 10 on the surface of the substrate 1 where the optical region 10 is provided, and in which no optical elements 11 are arranged. The optical elements 11 are lens elements. In the example shown in FIG. 2, a first anti-reflection film 13a is provided on the surface of the optical region 10 and the peripheral region 12 on the first surface 1a of the substrate 1. Furthermore, a second anti-reflection film 13b is provided on the surface of the second surface 1b of the substrate 1.

 図2において、光学要素11-1~光学要素11-4のうち、周辺領域12に最も近い光学要素11-1の光軸11C-1を含む一断面において、光軸11C-1が通る光学要素11-1の頂点11T-1から、周辺領域12における光学要素11-1に最も近い端部12Eまで、の断面領域を境界領域110と定義する。本実施形態では、境界領域110における面の傾斜aは、平均の絶対値が1.00以下であり、かつ、ばらつきσが0.10以上である。なお、σは標準偏差を表す。光軸11C-1は、光学要素11-1の中心を通る、光の進行方向に沿った軸を意味する。図2に示す例では、光の進行方向は、Z軸に沿う方向である。頂点11T-1及び端部12Eは、境界領域110に含まれない。 In FIG. 2, in a cross section including the optical axis 11C-1 of optical element 11-1, which is closest to peripheral region 12 among optical elements 11-1 to 11-4, boundary region 110 is defined as the cross-sectional region from vertex 11T-1 of optical element 11-1, through which optical axis 11C-1 passes, to end 12E in peripheral region 12 closest to optical element 11-1. In this embodiment, the average absolute value of the surface inclination a in boundary region 110 is 1.00 or less, and the variation σ is 0.10 or greater. σ represents the standard deviation. Optical axis 11C-1 refers to the axis that passes through the center of optical element 11-1 and is aligned with the traveling direction of light. In the example shown in FIG. 2, the traveling direction of light is along the Z axis. Vertex 11T-1 and end 12E are not included in boundary region 110.

 図2に示す例では、第1面1aは、光が入射される入射面に対応し、第2面1bは、入射面から入射された光が基材1の内部を通った後、出射される出射面に対応する。図2に示す光学素子100は、第1面1aから入射される光を光学領域10で拡散し、指向性が少ない拡散光を第2面1bから出射する。 In the example shown in Figure 2, the first surface 1a corresponds to the incident surface where light is incident, and the second surface 1b corresponds to the exit surface where light incident from the incident surface is emitted after passing through the interior of the substrate 1. The optical element 100 shown in Figure 2 diffuses light incident from the first surface 1a in the optical region 10, and emits diffused light with low directionality from the second surface 1b.

 図1及び図2において、光学要素11は、光学要素11-1~光学要素11-4を区別しないときの総称表記である。図1及び図2に示す例では、光学要素11が光学要素11-1~光学要素11-4の総称表記であることを示す目的で、光学要素11の符号と、光学要素11-1~光学要素11-4それぞれの符号と、を併記している。 In Figures 1 and 2, optical element 11 is a generic notation when optical elements 11-1 to 11-4 are not distinguished from one another. In the example shown in Figures 1 and 2, the reference numeral for optical element 11 is written alongside the reference numerals for optical elements 11-1 to 11-4 to indicate that optical element 11 is a generic notation for optical elements 11-1 to 11-4.

 ここで、例えば、特許文献1に記載された光学素子では、光学領域と周辺領域の境界領域は、光学素子から光が出射される側の第2面に略直交する平面で構成されている。境界領域が第2面に略直交する平面である点において、特許文献1に記載された光学素子では、境界領域は、傾斜が無限大の平面である。傾斜が無限大の平面である境界領域を含む光学素子では、境界領域に入射された光が光学素子における基材の内部を透過した後、光が出射される側の第2面で全反射され、入射された方向への戻り光が多くなる場合がある。戻り光が多くなると、光学素子から出射される拡散光の光取り出し効率が低下する。また、傾斜が無限大の平面である境界領域を含む光学素子では、光学領域と周辺領域の境界領域に入射された光が局所集中することにより、局所的に光度が高い光が光学素子から出射される場合がある。局所的に光度が高い光は、人の目への害を低減するアイセーフの観点において、好ましくない場合がある。 Here, for example, in the optical element described in Patent Document 1, the boundary region between the optical region and the peripheral region is formed by a plane that is approximately perpendicular to the second surface on the side from which light is emitted from the optical element. In the optical element described in Patent Document 1, the boundary region is a plane with an infinite slope, since the boundary region is a plane that is approximately perpendicular to the second surface. In an optical element including a boundary region that is a plane with an infinite slope, light that enters the boundary region passes through the interior of the substrate of the optical element and is then totally reflected by the second surface on the side from which light is emitted, resulting in an increase in the amount of light that returns in the direction of incidence. This increase in returned light reduces the light extraction efficiency of the diffused light that is emitted from the optical element. Furthermore, in an optical element including a boundary region that is a plane with an infinite slope, light that enters the boundary region between the optical region and the peripheral region may be locally concentrated, resulting in light with locally high luminous intensity being emitted from the optical element. Light with locally high luminous intensity may be undesirable from the perspective of eye safety, which aims to reduce harm to the human eyes.

 本実施形態に係る光学素子100は、境界領域110における面の傾斜aは、平均の絶対値が1.00以下であり、かつ、ばらつきσが0.10以上である。例えば、境界領域110における面は、平均の絶対値が1.00以下であり、かつ、ばらつきσが0.10以上であるという条件を満たす滑らかな曲面である。この条件を満たすことにより、境界領域110における面の傾斜aは一様な傾斜ではなくなるため、境界領域110に入射される光は、多様な屈折角で屈折する。境界領域110に入射される光が多様な屈折角で屈折することで、基材1の内部を通った光は第2面1bへ多様な角度で入射されるため、第2面1bで全反射される光を低減し、入射された方向への戻り光を低減できる。戻り光を低減することで、光学素子100から出射される拡散光の光取り出し効率が高くなる。また、光学素子100では、境界領域110に入射される光が多様な屈折角で屈折することにより、境界領域110に入射され、光学素子100から出射される光が局所集中することを低減し、局所的に光度が高い光が光学素子100から出射されることを低減できる。以上より、本実施形態では、拡散光の光取り出し効率を高くするとともに、局所的に光度が高い光を低減できる。また、局所的に光度が高い光を低減することで、アイセーフの観点において安全性が高い光学素子100を提供できる。特に、光学素子に入射される光がレーザ光等の光度が高くなりやすい光である場合に、局所的に光度が高い光を低減することで、アイセーフの観点において顕著な効果を得ることができる。 In the optical element 100 of this embodiment, the surface inclination a in the boundary region 110 has an average absolute value of 1.00 or less and a variation σ of 0.10 or more. For example, the surface in the boundary region 110 is a smoothly curved surface that satisfies the conditions that the average absolute value is 1.00 or less and the variation σ is 0.10 or more. By satisfying this condition, the surface inclination a in the boundary region 110 is no longer uniform, and light incident on the boundary region 110 is refracted at various refraction angles. Because the light incident on the boundary region 110 is refracted at various refraction angles, light that has passed through the interior of the substrate 1 is incident on the second surface 1b at various angles, thereby reducing the light that is totally reflected at the second surface 1b and reducing the light that returns in the direction of incidence. By reducing the returned light, the light extraction efficiency of the diffused light emitted from the optical element 100 is increased. Furthermore, in the optical element 100, light incident on the boundary region 110 is refracted at various refraction angles, thereby reducing localized concentration of light incident on the boundary region 110 and emitted from the optical element 100, and reducing light with locally high luminous intensity emitted from the optical element 100. As described above, this embodiment increases the light extraction efficiency of diffused light and reduces light with locally high luminous intensity. Furthermore, by reducing light with locally high luminous intensity, an optical element 100 with high safety from the perspective of eye safety can be provided. In particular, when light incident on the optical element is light that tends to be highly luminous, such as laser light, reducing light with locally high luminous intensity can achieve significant effects from the perspective of eye safety.

 境界領域110における面の傾斜aは、平均の絶対値が0.90以下であることが好ましく、0.80以下であることがより好ましく、0.70以下であることがさらに好ましい。傾斜aは、拡散角γを増加させる観点から平均の絶対値が0.2以上であることが好ましく、0.3以上であることがより好ましい。ばらつきσは0.20以上であることが好ましく、0.30以上であることがより好ましく、0.40以上であることがさらに好ましい。 The average absolute value of the surface inclination a in the boundary region 110 is preferably 0.90 or less, more preferably 0.80 or less, and even more preferably 0.70 or less. From the perspective of increasing the diffusion angle γ, the average absolute value of the inclination a is preferably 0.2 or more, and even more preferably 0.3 or more. The variation σ is preferably 0.20 or more, more preferably 0.30 or more, and even more preferably 0.40 or more.

 光学素子100では、光学領域10の周囲に周辺領域12が設けられている。これにより、光学素子100を他の部材に接合するときに、周辺領域12に接合部材を塗布できるため、光学領域10の一部が接合部材により浸潤することを低減できる。接合部材により浸潤され、所望の光学特性が得られない領域を低減することで、光学領域10を有効活用できる。 In the optical element 100, a peripheral region 12 is provided around the optical region 10. This allows a bonding material to be applied to the peripheral region 12 when bonding the optical element 100 to another member, reducing the infiltration of part of the optical region 10 with the bonding material. By reducing the area that is infiltrated by the bonding material and does not provide the desired optical properties, the optical region 10 can be used more effectively.

 また、光学領域10の周囲に周辺領域12が設けられていることで、1つの基板に複数の光学素子100を形成し、基板を切断して複数の光学素子100を多数個取りするときに、チッピング等の欠損が光学領域10に生じることを防止できる。チッピング等の欠損を防止することで、多数個取りされる複数の光学素子100それぞれの品質を高くするとともに、光学領域10の欠損に伴う光学領域10の機械的強度の低下を防止できる。 Furthermore, by providing the peripheral region 12 around the optical region 10, chipping and other defects can be prevented from occurring in the optical region 10 when multiple optical elements 100 are formed on a single substrate and the substrate is cut to obtain a large number of optical elements 100. Preventing chipping and other defects improves the quality of each of the multiple optical elements 100 obtained, and prevents a decrease in the mechanical strength of the optical region 10 due to defects in the optical region 10.

 図1及び図2に示す光学素子100では、基材1において、光学領域10は、周辺領域12に対して窪んでいる。図1及び図2に示す光学要素11は、周辺領域12に対して窪んでいる凹面である。光学領域10が周辺領域12に対して窪んでいることにより、光学素子100が他の部材等と接触するときに周辺領域12が優先的に他の部材等と接触する。これにより、光学領域10に配置される光学要素11に他の部材等が接触することを低減し、他の部材等との接触や摩擦による光学要素11の損傷を低減できる。但し、光学要素11は、凹面に限定されるものではなく、凸面であってもよい。また、凸面の頂点は、光軸11C-1に沿う方向において、周辺領域12よりも低い位置にあることに限定されるものではなく、高い位置にあってもよい。 In the optical element 100 shown in FIGS. 1 and 2, the optical region 10 is recessed relative to the peripheral region 12 in the substrate 1. The optical element 11 shown in FIGS. 1 and 2 has a concave surface recessed relative to the peripheral region 12. Because the optical region 10 is recessed relative to the peripheral region 12, when the optical element 100 comes into contact with other components, the peripheral region 12 comes into contact with the other components preferentially. This reduces contact of the optical element 11 placed in the optical region 10 with other components, thereby reducing damage to the optical element 11 due to contact or friction with other components. However, the optical element 11 is not limited to being concave, and may be convex. Furthermore, the apex of the convex surface is not limited to being located lower than the peripheral region 12 in the direction along the optical axis 11C-1, and may be located higher.

 図1及び図2に示す例では、光学領域10は複数の光学要素11を含み、複数の光学要素11は、平坦面を露出することなく二次元的に並んでいる。平坦面を露出しないことにより、光学素子100では、平坦面を透過して直進する光度が高い光を低減できる。これにより、アイセーフの観点において安全性が高い光学素子100を提供できる。 In the example shown in Figures 1 and 2, the optical region 10 includes a plurality of optical elements 11, which are arranged two-dimensionally without exposing any flat surfaces. By not exposing any flat surfaces, the optical element 100 can reduce high-intensity light that passes through the flat surfaces and travels straight ahead. This makes it possible to provide an optical element 100 that is highly safe from an eye-safe perspective.

 図1及び図2に示す例では、複数の光学要素11のうち、隣接する光学要素11-1及び光学要素11-2の頂点11T-1及び頂点11T-2を結ぶ距離Dsが10μm以上かつ200μm以下である。距離Dsを10μm以上にすることにより、距離Dsが10μm未満である場合と比較して、隣接する光学要素11-1及び光学要素11-2を加工しやすくなるため、光学素子100の製造を容易にすることができる。また、距離Dsを200μm以下とすることにより、距離Dsが200μmより大きい場合と比較して、光学要素11-1の端部と光学要素11-2の端部を繋げるための光学要素11-1及び光学要素11-2それぞれの加工量を削減できる。光学要素11-1及び光学要素11-2それぞれの加工量を削減することにより、光学素子100の製造効率を高くすることができる。また、光学要素11-1及び光学要素11-2それぞれの加工量を削減することにより、光学素子100の厚み、すなわちZ方向における光学素子100の長さ、が薄くなることを抑制し、光学素子100の機械強度を高くすることができる。 In the example shown in Figures 1 and 2, the distance Ds connecting the vertices 11T-1 and 11T-2 of adjacent optical elements 11-1 and 11-2 among the multiple optical elements 11 is 10 μm or more and 200 μm or less. By setting the distance Ds to 10 μm or more, it is easier to process adjacent optical elements 11-1 and 11-2 compared to when the distance Ds is less than 10 μm, thereby facilitating the manufacture of optical element 100. Furthermore, by setting the distance Ds to 200 μm or less, the amount of processing required for each of optical elements 11-1 and 11-2 to connect the ends of optical element 11-1 and 11-2 can be reduced compared to when the distance Ds is greater than 200 μm. By reducing the amount of processing required for each of optical elements 11-1 and 11-2, the manufacturing efficiency of optical element 100 can be improved. Furthermore, by reducing the amount of processing required for each of optical elements 11-1 and 11-2, it is possible to prevent the thickness of optical element 100, i.e., the length of optical element 100 in the Z direction, from becoming thin, thereby increasing the mechanical strength of optical element 100.

 図2に示す例では、光学要素11-1の頂点11T-1と周辺領域12の端部12Eとの光軸11C-1に沿う方向における深さDpは、3μm以上かつ100μm以下である。深さDpを3μm以上にすることにより、深さDpが3μm未満である場合と比較して、光学要素11-1を加工しやすくなるため、光学素子100の製造を容易にすることができる。また、深さDpを100μm以下にすることにより、深さDpが100μmより大きい場合と比較して、光学要素11-1の加工量を削減できる。光学要素11-1の加工量を削減することにより、光学素子100の製造効率を高くすることができる。また、光学要素11-1の加工量を削減することにより、光学素子100の厚みが薄くなることを抑制し、光学素子100の機械強度を高くすることができる。なお、上記の例では、光学要素11-1を説明したが、他の光学要素11においても同様の効果が得られる。 In the example shown in FIG. 2, the depth Dp between the vertex 11T-1 of the optical element 11-1 and the end 12E of the peripheral region 12 in the direction along the optical axis 11C-1 is 3 μm or more and 100 μm or less. Setting the depth Dp to 3 μm or more makes it easier to process the optical element 11-1 compared to when the depth Dp is less than 3 μm, thereby facilitating the manufacture of the optical element 100. Furthermore, setting the depth Dp to 100 μm or less reduces the amount of processing required for the optical element 11-1 compared to when the depth Dp is greater than 100 μm. Reducing the amount of processing required for the optical element 11-1 increases the manufacturing efficiency of the optical element 100. Furthermore, reducing the amount of processing required for the optical element 11-1 prevents the optical element 100 from becoming thinner, thereby increasing the mechanical strength of the optical element 100. While the above example describes the optical element 11-1, similar effects can be achieved with other optical elements 11.

 基材1は、ガラス材料又は樹脂材料等を含んで構成できる。基材1に用いるガラス材料及び樹脂材料は、光学素子100の用途等に応じて適宜選択可能である。光学要素11は、基材1にエッチング加工法又は成形加工法等を用いて基材1に形成し、光学領域10に配置できる。 The substrate 1 can be made of a material including a glass material or a resin material. The glass material or resin material used for the substrate 1 can be selected appropriately depending on the intended use of the optical element 100. The optical elements 11 can be formed on the substrate 1 using an etching method, a molding method, or the like, and placed in the optical region 10.

 基材1は、第1面1a及び第2面1bの少なくとも一方の面に光学領域10を含んでもよい。光学領域10は、4つの光学要素11-1~光学要素11-4に限定されず、少なくとも1つの光学要素11を含んでよい。周辺領域12に最も近い光学要素11-1の光軸11Cを含む一断面は、周辺領域12に最も近い光学要素11-1の光軸11Cを含むものであれば、光学素子100の任意の断面であってよい。入射面は、第1面1aに限定されず、第2面1bであってもよい。出射面は、第2面1bに限定されず、第1面1aであってもよい。 The substrate 1 may include an optical region 10 on at least one of the first surface 1a and the second surface 1b. The optical region 10 is not limited to four optical elements 11-1 to 11-4, but may include at least one optical element 11. A cross section including the optical axis 11C of the optical element 11-1 closest to the peripheral region 12 may be any cross section of the optical element 100, as long as it includes the optical axis 11C of the optical element 11-1 closest to the peripheral region 12. The incident surface is not limited to the first surface 1a, but may be the second surface 1b. The exit surface is not limited to the second surface 1b, but may be the first surface 1a.

 第1反射防止膜13aは、基材1の第1面1aでの反射光を低減する。第2反射防止膜13bは、基材1の第2面1bでの反射光を低減する。第1反射防止膜13a及び第2反射防止膜13bのそれぞれは、フッ化マグネシウム等の誘電体膜材料を含んで構成可能である。但し、光学素子100は、第1反射防止膜13a及び第2反射防止膜13bを必ずしも備えなくてよい。 The first anti-reflection film 13a reduces light reflected from the first surface 1a of the substrate 1. The second anti-reflection film 13b reduces light reflected from the second surface 1b of the substrate 1. The first anti-reflection film 13a and the second anti-reflection film 13b can each be constructed to include a dielectric film material such as magnesium fluoride. However, the optical element 100 does not necessarily have to include the first anti-reflection film 13a and the second anti-reflection film 13b.

 <境界領域110における面の傾斜aと拡散角γとの関係>
 図3は、光学素子100の境界領域110における面の傾斜aと拡散角γとの関係の一例を示す模式図である。図3は、図2における光学要素11-1を拡大表示している。図3において、太い線で示した光Lは、光学要素11-1の境界領域110に入射される光線を表している。図3に示す例では、第2面1bに平行な面に対して垂直な方向から境界領域110に入射された光Lは、境界領域110の面で屈折して基材1の内部を透過した後、光学素子100の第2面1bから出射されている。
<Relationship between the surface inclination a and the diffusion angle γ in the boundary region 110>
3 is a schematic diagram showing an example of the relationship between the inclination a of the surface in the boundary region 110 of the optical element 100 and the diffusion angle γ. FIG. 3 is an enlarged view of the optical element 11-1 in FIG. 2. In FIG. 3, the light L indicated by the thick line represents a light ray incident on the boundary region 110 of the optical element 11-1. In the example shown in FIG. 3, the light L incident on the boundary region 110 from a direction perpendicular to a plane parallel to the second surface 1b is refracted at the surface of the boundary region 110, passes through the inside of the base material 1, and then is emitted from the second surface 1b of the optical element 100.

 図3に示す例では、傾斜aは、境界領域110において、光Lが入射される位置Po1での面の傾斜を表している。傾斜角a'は、境界領域110の位置Po1における面の傾斜の、第2面1bと平行な面に対する角度を表している。法線角θは、境界領域110の位置Po1における面の法線(-1/a)の、第2面1bと平行な面に対する角度を表している。屈折角βは、境界領域110の位置Po1における面の法線(-1/a)に対する光Lの角度を表している。第2面入射角εは、位置Po1を通って基材1の内部に入射され、基材1の内部を通った後、第2面1bの位置Po2に入射される光Lの、第2面1bの法線に対する角度を表している。拡散角γは、第2面1bの位置Po2から出射される光Lの、第2面1bの法線に対する角度を表している。 In the example shown in FIG. 3, the inclination a represents the inclination of the surface at position Po1 in the boundary region 110 where light L is incident. The inclination angle a' represents the angle of the inclination of the surface at position Po1 in the boundary region 110 with respect to a plane parallel to the second surface 1b. The normal angle θ represents the angle of the normal (-1/a) to the surface at position Po1 in the boundary region 110 with respect to a plane parallel to the second surface 1b. The refraction angle β represents the angle of light L with respect to the normal (-1/a) to the surface at position Po1 in the boundary region 110. The second surface incident angle ε represents the angle of light L, which enters the interior of the base material 1 through position Po1, passes through the interior of the base material 1, and then enters position Po2 on the second surface 1b, with respect to the normal to the second surface 1b. The diffusion angle γ represents the angle of light L, which exits position Po2 on the second surface 1b, with respect to the normal to the second surface 1b.

 法線角θは、次の式(1)により表される。 The normal angle θ is expressed by the following equation (1):

 屈折角βは、次の式(2)により表される。なお、nは基材1の屈折率である。πは円周率である。 The refraction angle β is expressed by the following formula (2), where n is the refractive index of the substrate 1 and π is the constant of the circumference of a circle.

 第2面入射角εは、次の式(3)により表される。 The second surface incident angle ε is expressed by the following equation (3):

 拡散角γは、次の式(4)により表される。 The diffusion angle γ is expressed by the following equation (4):

 表1に、基材1の屈折率nを1.52とし、上記の式(1)~式(4)を用いて得られる傾斜a、傾斜角a'、法線角θ、屈折角β、第2面入射角ε及び拡散角γの対応関係を示す。 Table 1 shows the correspondence between the tilt a, tilt angle a', normal angle θ, refraction angle β, second surface incident angle ε, and diffusion angle γ obtained using the above equations (1) to (4) when the refractive index n of substrate 1 is 1.52.

 基材1の屈折率nが1.52のとき、臨界角は41.14度になる。従って、第2面入射角εが41.14度未満であれば、基材1の内部を通って第2面1bに入射される光Lは、第2面1bで屈折して第2面1bから出射される。一方、第2面入射角εが41.14度以上であれば、光Lは第2面1bで全反射される。 When the refractive index n of the substrate 1 is 1.52, the critical angle is 41.14 degrees. Therefore, if the second surface incident angle ε is less than 41.14 degrees, light L that passes through the interior of the substrate 1 and is incident on the second surface 1b is refracted at the second surface 1b and emitted from the second surface 1b. On the other hand, if the second surface incident angle ε is 41.14 degrees or greater, light L is totally reflected by the second surface 1b.

 複数の光学要素11が並ぶ光学素子100では、第1面1aに配置される光学要素11に入射される光は、光学要素11で屈折した後、隣接する光学要素11に入射する場合がある。光学要素11に入射される光が隣接する光学要素11に入射する場合を考慮すると、第2面1bに平行な面に対して垂直な方向から光学要素11に光が入射される場合には、第2面入射角εは27.4度以下であり、かつ傾斜aは2.0以下であることが好ましい。傾斜aが2.0以下であることは、傾斜角a'が63.4度以下であることに対応する。また、隣接する光学要素11に入射する場合を考慮すると、第2面1bに平行な面に対して交差する方向から光学要素11に光が入射される場合には、屈折角βは36.0度以下であることが好ましい。以上の条件を満たすことにより、光学素子100では、第2面1bで全反射されることによる戻り光を低減し、光学素子100から出射される拡散光の光取り出し効率を高くすることができる。 In an optical element 100 in which multiple optical elements 11 are arranged, light incident on an optical element 11 arranged on the first surface 1a may be refracted by the optical element 11 and then incident on an adjacent optical element 11. Considering the case where light incident on an optical element 11 also enters an adjacent optical element 11, if the light is incident on the optical element 11 from a direction perpendicular to a plane parallel to the second surface 1b, it is preferable that the second surface incident angle ε is 27.4 degrees or less and the slope a is 2.0 degrees or less. A slope a of 2.0 or less corresponds to a slope angle a' of 63.4 degrees or less. Furthermore, considering the case where light is incident on an adjacent optical element 11, if the light is incident on the optical element 11 from a direction intersecting the plane parallel to the second surface 1b, it is preferable that the refraction angle β is 36.0 degrees or less. By satisfying the above conditions, the optical element 100 can reduce the amount of returned light caused by total reflection at the second surface 1b and increase the light extraction efficiency of the diffused light emitted from the optical element 100.

 また、拡散角γは、境界領域110に入射される光の方向によらず、境界領域110における面の傾斜aによって一意に決定される。境界領域110における面の傾斜aが位置によらずほぼ一定であると、光学素子100から出射される光が局所集中し、局所的に光度が高い光が拡散光に含まれやすくなる。これに対し、光学素子100では、境界領域110における面の傾斜aを位置に応じて変化させることで、光学素子100から出射される光が局所集中することを低減し、局所的に光度が高い光を低減できる。 Furthermore, the diffusion angle γ is uniquely determined by the surface inclination a in the boundary region 110, regardless of the direction of light incident on the boundary region 110. If the surface inclination a in the boundary region 110 were approximately constant regardless of position, the light emitted from the optical element 100 would be locally concentrated, and light with locally high luminous intensity would be more likely to be included in the diffused light. In contrast, in the optical element 100, by changing the surface inclination a in the boundary region 110 depending on the position, it is possible to reduce the local concentration of light emitted from the optical element 100 and reduce light with locally high luminous intensity.

 光学素子100では、発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときにおけるFWHMは、20度以上であることが好ましい。この条件を満足することにより、光学素子100から出射される拡散光を広げて照射面に照射できる。なお、FWHM(full width at half maximu m)とは、素子の面に平行な平面に投影された二次元像の距離が最大となる一次元方向において、拡散角度が-10°から+10°の範囲の平均強度を1として規格化し、拡散角度の関数として、相対強度をプロットしたときに強度0.5で挟まれる最大の角度領域のことを指す。 For optical element 100, it is preferable that the FWHM be 20 degrees or greater when parallel light with an emission peak wavelength of 300 nm or greater and 1000 nm or less is incident. By satisfying this condition, the diffused light emitted from optical element 100 can be spread and irradiated onto the irradiation surface. Note that FWHM (full width at half maximum m) refers to the maximum angular region enclosed by an intensity of 0.5 when the average intensity in the diffusion angle range of -10° to +10° is normalized to 1 in the one-dimensional direction in which the distance of the two-dimensional image projected onto a plane parallel to the surface of the element is at its maximum, and the relative intensity is plotted as a function of the diffusion angle.

 発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときにおけるFWHMを20度以上とすることにより、光学素子100をデバイスに組み込むときに、例えば、以下の効果が得られる。(1)プロジェクタに光学素子100を組み込む場合、デバイスを小型化できる。(2)センシング装置に光学素子100を組み込む場合、より広い視野の情報を一度に取り込める。(3)照明装置に光学素子100を組み込む場合、短距離における照明範囲を拡大できる。 By setting the FWHM to 20 degrees or more when parallel light with an emission peak wavelength of 300 nm or more and 1000 nm or less is incident, the following effects can be achieved when incorporating optical element 100 into a device: (1) When incorporating optical element 100 into a projector, the device can be made more compact. (2) When incorporating optical element 100 into a sensing device, information from a wider field of view can be captured at once. (3) When incorporating optical element 100 into a lighting device, the illumination range over a short distance can be expanded.

 光学素子100では、発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときにおける拡散光の全光線透過率は、93%以上であることが好ましい。この条件を満足することにより、光学素子100から出射される拡散光を明るくすることができる。 When parallel light with an emission peak wavelength of 300 nm or more and 1000 nm or less is incident on the optical element 100, the total light transmittance of the diffused light is preferably 93% or more. By satisfying this condition, the diffused light emitted from the optical element 100 can be made brighter.

 発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときに、光学素子100から出射される拡散光の全光線透過率を93%以上とすることにより、光学素子100を通過した光の減衰を低減させることができる。これにより、例えば、プロジェクタ及びセンシング装置等のデバイスに光学素子100を組み込む場合にデバイスの消費電力を抑えることができる。また、照明装置に光学素子100を組み込む場合に、同じ電力でより明るく照らすことができる。 When parallel light having an emission peak wavelength of 300 nm or more and 1000 nm or less is incident, the total light transmittance of the diffused light emitted from the optical element 100 can be set to 93% or more, thereby reducing the attenuation of light that passes through the optical element 100. This makes it possible to reduce the power consumption of devices such as projectors and sensing devices when the optical element 100 is incorporated into such devices. Furthermore, when the optical element 100 is incorporated into a lighting device, it can provide brighter illumination with the same amount of power.

 次に、図4及び図5を参照して、光学素子100における基材1と光学領域10の面積比について説明する。図4は、光学素子100における基材1と光学領域10の面積比の一例を示す図である。図5は、光学素子100における基材1と光学領域10の面積比の他の例を示す図である。 Next, the area ratio between the substrate 1 and the optical region 10 in the optical element 100 will be described with reference to Figures 4 and 5. Figure 4 is a diagram showing an example of the area ratio between the substrate 1 and the optical region 10 in the optical element 100. Figure 5 is a diagram showing another example of the area ratio between the substrate 1 and the optical region 10 in the optical element 100.

 図4に示す光学素子100では、基材1は、上面視において、略矩形の外縁形状を有する。また、光学領域10は、上面視において、略矩形の外縁形状を有する。X方向における基材1の幅をbとし、X方向における光学領域10の幅をb×(1-P)とし、Y方向における基材1の幅をcとし、Y方向における光学領域10の幅をc(1-Q)とする。なお、Pは0<P<1を満足し、Qは0<Q<1を満足する。このとき、基材1の面積に対する光学領域10の面積比は、1-P-Q+P×Qと記述できる。 In the optical element 100 shown in FIG. 4, the substrate 1 has a substantially rectangular outer edge shape when viewed from above. The optical region 10 also has a substantially rectangular outer edge shape when viewed from above. The width of the substrate 1 in the X direction is b, the width of the optical region 10 in the X direction is b x (1 - P), the width of the substrate 1 in the Y direction is c, and the width of the optical region 10 in the Y direction is c(1 - Q). Note that P satisfies 0 < P < 1, and Q satisfies 0 < Q < 1. In this case, the area ratio of the optical region 10 to the area of the substrate 1 can be expressed as 1 - P - Q + P x Q.

 表2に、Pと、Qと、基材1の面積に対する光学領域10の面積比と、の対応関係を示す。 Table 2 shows the correspondence between P, Q, and the area ratio of the optical region 10 to the area of the substrate 1.

 図5に示す光学素子100では、基材1は、上面視において、略円形の外縁形状を有する。また、光学領域10は、上面視において、略円形の外縁形状を有する。基材1の半径をdとし、光学領域10の半径をd×(1-R)とする。なお、Rは0<R<1を満足する。このとき、基材1の面積に対する光学領域10の割合は、1-2×R+Rと記述できる。 In the optical element 100 shown in Fig. 5, the substrate 1 has a substantially circular outer edge shape in top view. The optical zone 10 also has a substantially circular outer edge shape in top view. The radius of the substrate 1 is d, and the radius of the optical zone 10 is d x (1 - R), where R satisfies 0 < R < 1. In this case, the ratio of the area of the optical zone 10 to the area of the substrate 1 can be expressed as 1 - 2 x R + R2 .

 表3に、Rと、基材1の面積に対する光学領域10の面積比と、の対応関係を示す。 Table 3 shows the correspondence between R and the area ratio of the optical region 10 to the area of the substrate 1.

 図4及び図5のそれぞれに示す光学素子100では、基材1の面積に対する光学領域10の面積比を、0.0625以上0.9025以下とすることが好ましい。例えば、基材1の面積に対して光学領域10の面積が大きすぎると、光学素子100を他の部材に接合するときに、基材1に接合材を塗布する領域が狭くなり、良好な接合強度が得られない場合がある。光学素子100では、基材1の面積に対する光学領域10の面積比を0.9025以下とすることにより、光学素子100を他の部材に接合するときに良好な接合強度を得ることができる。一方、基材1の面積に対して光学領域10の面積が小さすぎると、光学領域10に光が入射されづらくなり、光学素子100から出射される拡散光において、所望の光学特性が得られない場合がある。光学素子100では、基材1の面積に対する光学領域10の面積比を0.0625以上とすることにより、光学素子100から出射される拡散光において、所望の光学特性を得ることができる。 In the optical element 100 shown in each of Figures 4 and 5, it is preferable that the area ratio of the optical region 10 to the area of the substrate 1 be 0.0625 or more and 0.9025 or less. For example, if the area of the optical region 10 is too large relative to the area of the substrate 1, when bonding the optical element 100 to another component, the area on the substrate 1 to which the bonding material is applied will be narrow, and good bonding strength may not be obtained. In the optical element 100, by setting the area ratio of the optical region 10 to the area of the substrate 1 to 0.9025 or less, good bonding strength can be obtained when bonding the optical element 100 to another component. On the other hand, if the area of the optical region 10 is too small relative to the area of the substrate 1, it will be difficult for light to enter the optical region 10, and the desired optical characteristics may not be obtained in the diffused light emitted from the optical element 100. In the optical element 100, by setting the area ratio of the optical region 10 to the area of the substrate 1 to 0.0625 or greater, it is possible to obtain the desired optical characteristics in the diffused light emitted from the optical element 100.

 <実施例、比較例>
 以下、実施例及び比較例について説明するが、本開示は、これらの例に何ら限定されない。以下に示す例1及び例2は実施例であり、例3は比較例である。
Examples and Comparative Examples
Examples and comparative examples will be described below, but the present disclosure is not limited to these examples. Examples 1 and 2 shown below are examples, and Example 3 is a comparative example.

 (例1)
 例1では、以下の図6~図10に示す光学素子100を製作し、共焦点顕微鏡による測定結果に基づいて、光学素子100を評価した。基材1には、屈折率が1.52のものを用いた。図6~図10に示す光学素子100において、それぞれがレンズ要素である複数の光学要素11のうち、隣り合う光学要素11の中心間距離は、例えば、40.0±1.0μmである。また、図6~図10に示す光学素子100において、光学要素11の深さDpは、10.0±2.0μmである。
(Example 1)
In Example 1, the optical element 100 shown in the following FIGS. 6 to 10 was fabricated, and the optical element 100 was evaluated based on the results of measurements using a confocal microscope. The substrate 1 used had a refractive index of 1.52. In the optical element 100 shown in FIGS. 6 to 10, of the multiple optical elements 11, each of which is a lens element, the center-to-center distance between adjacent optical elements 11 is, for example, 40.0±1.0 μm. Furthermore, in the optical element 100 shown in FIGS. 6 to 10, the depth Dp of the optical elements 11 is 10.0±2.0 μm.

 図6は、例1に係る光学素子100を示す上面写真である。図7は、図6におけるVII-VII線に沿った光学素子100の断面形状を示す図である。図8は、図7におけるVIII領域の拡大図である。図9は、図8の一次微分を示す図である。図10は、図7のVIII領域における拡散角の確率密度を示す図である。 Figure 6 is a top view photograph showing the optical element 100 according to Example 1. Figure 7 is a diagram showing the cross-sectional shape of the optical element 100 taken along line VII-VII in Figure 6. Figure 8 is an enlarged view of region VIII in Figure 7. Figure 9 is a diagram showing the first derivative of Figure 8. Figure 10 is a diagram showing the probability density of the diffusion angle in region VIII in Figure 7.

 図6は、例1に係る光学素子100の光学領域10を、共焦点顕微鏡により上方から撮影した写真を示している。図7は、図6におけるVII-VII線に沿った光学素子100の断面形状を、共焦点顕微鏡により測定した結果を示している。図8は、図7におけるVIII領域、すなわち図6における境界領域110の断面形状を示している。図9の一次微分dZ/dXは、図8の境界領域110の断面形状における位置ごとでの傾斜aの計算結果を示している。図10は、図7~図9に示す境界領域110に入射された光が光学素子100から出射されるときの拡散角γの確率密度の計算結果を表している。 Figure 6 shows a photograph of the optical region 10 of the optical element 100 according to Example 1 taken from above using a confocal microscope. Figure 7 shows the results of measuring the cross-sectional shape of the optical element 100 taken along line VII-VII in Figure 6 using a confocal microscope. Figure 8 shows the cross-sectional shape of region VIII in Figure 7, i.e., the boundary region 110 in Figure 6. The first derivative dZ/dX in Figure 9 shows the calculation results for the slope a at each position in the cross-sectional shape of the boundary region 110 in Figure 8. Figure 10 shows the calculation results for the probability density of the diffusion angle γ when light incident on the boundary region 110 shown in Figures 7 to 9 is emitted from the optical element 100.

 図7~図9に示すように、図6に示す境界領域110は、滑らかな曲線を描く凹の非球面形状を有する。図6に示す境界領域110では、図9に示すように、位置Xに応じて一次微分dZ/dXが徐々に変化している。つまり、図6に示す境界領域110では、面の傾斜aが徐々に変化している。図6に示す境界領域110では、面の傾斜aが一定でないため、境界領域110に入射される光の屈折角βは一定にならない。屈折角βが一定でないことにより、図10に示すように拡散角γがばらつく。これにより、例1に係る光学素子では、光学素子100から出射される光の局所集中を低減し、局所的に光度が高い光を低減できる。 As shown in Figures 7 to 9, the boundary region 110 shown in Figure 6 has a smoothly curved, concave, aspherical shape. In the boundary region 110 shown in Figure 6, the first derivative dZ/dX gradually changes depending on the position X, as shown in Figure 9. In other words, the surface slope a gradually changes in the boundary region 110 shown in Figure 6. In the boundary region 110 shown in Figure 6, the surface slope a is not constant, so the refraction angle β of light incident on the boundary region 110 is not constant. Because the refraction angle β is not constant, the diffusion angle γ varies, as shown in Figure 10. As a result, the optical element of Example 1 can reduce local concentration of light emitted from the optical element 100 and reduce light with locally high luminous intensity.

 表4に、例1に係る光学素子100における傾斜a及び拡散角γそれぞれの、平均値、最大値、最小値及び標準偏差を示す。 Table 4 shows the average, maximum, minimum, and standard deviation of the tilt a and the diffusion angle γ for the optical element 100 of Example 1.

 表4に示すように、例1に係る光学素子100では、境界領域110における傾斜aの平均の絶対値は0.54となり、また傾斜aのばらつきσは0.36となった。従って、例1は、上述した「境界領域110における傾斜aの平均の絶対値は1.00以下であり、かつ傾斜aのばらつきσは0.10以上である」という条件を満足している。 As shown in Table 4, in the optical element 100 of Example 1, the average absolute value of the slope a in the boundary region 110 was 0.54, and the variation σ of the slope a was 0.36. Therefore, Example 1 satisfies the above-mentioned condition that "the average absolute value of the slope a in the boundary region 110 is 1.00 or less, and the variation σ of the slope a is 0.10 or more."

 (例2)
 例2では、以下の図11~図15に示す光学素子100を製作し、共焦点顕微鏡による測定結果に基づいて、光学素子100を評価した。基材1には、屈折率が1.52のものを用いた。図11~図15に示す光学素子100において、それぞれがレンズ要素である複数の光学要素11のうち、隣り合う光学要素11の中心間距離は、例えば、22.5±2.5μmである。また、図11~図15に示す光学素子100において、光学要素11の深さDpは、5.0±2.0μmである。
(Example 2)
In Example 2, the optical element 100 shown in the following FIGS. 11 to 15 was fabricated, and the optical element 100 was evaluated based on the results of measurements using a confocal microscope. The substrate 1 used had a refractive index of 1.52. In the optical element 100 shown in FIGS. 11 to 15, of the multiple optical elements 11, each of which is a lens element, the center-to-center distance between adjacent optical elements 11 is, for example, 22.5±2.5 μm. Furthermore, in the optical element 100 shown in FIGS. 11 to 15, the depth Dp of the optical elements 11 is 5.0±2.0 μm.

 図11は、例2に係る光学素子100を示す上面写真である。図12は、図11におけるXII-XII線に沿った光学素子100の断面形状を示す図である。図13は、図12におけるXIII領域の拡大図である。図14は、図13の一次微分を示す図である。図15は、図12のXIII領域における拡散角の確率密度を示す図である。 Figure 11 is a top view photograph showing the optical element 100 according to Example 2. Figure 12 is a diagram showing the cross-sectional shape of the optical element 100 taken along line XII-XII in Figure 11. Figure 13 is an enlarged view of region XIII in Figure 12. Figure 14 is a diagram showing the first derivative of Figure 13. Figure 15 is a diagram showing the probability density of the diffusion angle in region XIII in Figure 12.

 第2例に係る光学素子100の基材1には、屈折率が1.52のものを用いた。図11は、例2に係る光学素子100の光学領域10を、共焦点顕微鏡により上方から撮影した写真を示している。図12は、図11におけるXII-XII線に沿った光学素子100の断面形状を、共焦点顕微鏡により測定した結果を示している。図13は、図12におけるXIII領域、すなわち図11における境界領域110の断面形状を示している。図14の一次微分dZ/dXは、図13の境界領域110の断面形状における位置ごとでの傾斜aの計算結果を示している。図15は、図11~図14に示す境界領域110に入射された光が光学素子100から出射されるときの拡散角γの確率密度の計算結果を表している。 The substrate 1 of the optical element 100 according to Example 2 had a refractive index of 1.52. Figure 11 shows a photograph of the optical region 10 of the optical element 100 according to Example 2 taken from above using a confocal microscope. Figure 12 shows the results of measuring the cross-sectional shape of the optical element 100 taken along line XII-XII in Figure 11 using a confocal microscope. Figure 13 shows the cross-sectional shape of region XIII in Figure 12, i.e., the boundary region 110 in Figure 11. The first-order differential dZ/dX in Figure 14 shows the calculation results for the slope a at each position in the cross-sectional shape of the boundary region 110 in Figure 13. Figure 15 shows the calculation results for the probability density of the diffusion angle γ when light incident on the boundary region 110 shown in Figures 11 to 14 is emitted from the optical element 100.

 図12~図14に示すように、図11に示す境界領域110は、略線形な傾斜面を有する。但し、図11に示す境界領域110は、図14に示すように、微視的には位置Xに応じて一次微分dZ/dXが周期的に変化している。また、図11に示すように、境界領域110は、微視的には周期性を有する形状を含む。図11に示す境界領域110では、面の傾斜aが微視的には一定でないため、境界領域110に入射される光の屈折角βは一定にならない。屈折角βが一定でないことにより、図15に示すように拡散角γがばらつく。これにより、例2に係る光学素子100では、光学素子100から出射される光の局所集中を低減し、局所的に光度が高い光を低減できる。 As shown in Figures 12 to 14, the boundary region 110 shown in Figure 11 has a substantially linear inclined surface. However, as shown in Figure 14, the boundary region 110 shown in Figure 11 has a first derivative dZ/dX that changes periodically depending on the position X microscopically. Also, as shown in Figure 11, the boundary region 110 includes a shape that is periodic microscopically. In the boundary region 110 shown in Figure 11, the inclination a of the surface is not constant microscopically, so the refraction angle β of light incident on the boundary region 110 is not constant. Because the refraction angle β is not constant, the diffusion angle γ varies, as shown in Figure 15. As a result, the optical element 100 of Example 2 can reduce local concentration of light emitted from the optical element 100 and reduce light with locally high luminous intensity.

 図11及び図14に示すように、第2例に係る光学素子100では、境界領域110は、位置Xに応じて表面の高さZが周期的に変化する形状を含む。境界領域110が位置Xに応じて表面の高さZが周期的に変化する形状を含むことで、図15に示すように拡散角γの確率密度は、正規分布に近づく。拡散角γの確率密度が正規分布に近づくことで、第2例に係る光学素子100では、位置Xに応じて周期的に高さZが変化する形状が光拡散面として作用する。これにより、第2例に係る光学素子100では、境界領域110に入射される光に対する拡散効果を高めることができる。 As shown in Figures 11 and 14, in the optical element 100 of the second example, the boundary region 110 includes a shape in which the surface height Z changes periodically depending on the position X. Because the boundary region 110 includes a shape in which the surface height Z changes periodically depending on the position X, the probability density of the diffusion angle γ approaches a normal distribution, as shown in Figure 15. Because the probability density of the diffusion angle γ approaches a normal distribution, in the optical element 100 of the second example, the shape in which the height Z changes periodically depending on the position X acts as a light diffusion surface. As a result, in the optical element 100 of the second example, the diffusion effect on light incident on the boundary region 110 can be enhanced.

 表5に、例2に係る光学素子100における傾斜a及び拡散角γそれぞれの、平均値、最大値、最小値及び標準偏差を示す。 Table 5 shows the average, maximum, minimum, and standard deviation of the tilt a and the diffusion angle γ for the optical element 100 of Example 2.

 表5に示すように、例2に係る光学素子100では、境界領域110における傾斜aの平均の絶対値は0.68となり、また傾斜aのばらつきσは0.62となった。従って例2は、上述した「境界領域110における傾斜aの平均の絶対値は1.00以下であり、かつ傾斜aのばらつきσは0.10以上である」という条件を満足している。 As shown in Table 5, in the optical element 100 of Example 2, the average absolute value of the slope a in the boundary region 110 was 0.68, and the variation σ of the slope a was 0.62. Therefore, Example 2 satisfies the above-mentioned condition that "the average absolute value of the slope a in the boundary region 110 is 1.00 or less, and the variation σ of the slope a is 0.10 or more."

 (例3)
 例3では、光線追跡シミュレーションにより、光学素子100Xを評価した。光線追跡シミュレーションには、Zemax OpticStudio 18.4.1を用いた。光学素子100Xにおける基材1Xの屈折率は1.52とした。その他の光学素子100Xの諸元には、主に特許文献1に記載された光学素子の諸元を用いた。
(Example 3)
In Example 3, the optical element 100X was evaluated by ray tracing simulation. Zemax OpticStudio 18.4.1 was used for the ray tracing simulation. The refractive index of the substrate 1X in the optical element 100X was set to 1.52. Other specifications of the optical element 100X were mainly those of the optical element described in Patent Document 1.

 図16~図20を参照して、第3例に係る光学素子100Xについて説明する。図16は、例3に係る光学素子100Xの境界領域110Xに入射された光Liの振る舞いを示す斜視図である。図17は、例3に係る光学素子100Xの境界領域110Xに入射された光Liの振る舞いを示す側面図である。図18は、例3に係る光学素子100Xの境界領域110Xに第1面入射角αが10度で光Liが入射されたときに照射面Sに照射される光Ltを示す図である。図19は、例3に係る光学素子100Xの境界領域110Xに第1面入射角αが20度で光Liが入射されたときに照射面Sに照射される光Ltを示す図である。図20は、例3に係る光学素子100Xの境界領域110Xに第1面入射角αが30度で光Liが入射されたときに照射面Sに照射される光Ltを示す図である。 16 to 20, an optical element 100X according to Example 3 will be described. FIG. 16 is a perspective view showing the behavior of light Li incident on boundary region 110X of optical element 100X according to Example 3. FIG. 17 is a side view showing the behavior of light Li incident on boundary region 110X of optical element 100X according to Example 3. FIG. 18 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle α of 10 degrees. FIG. 19 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle α of 20 degrees. FIG. 20 is a diagram showing light Lt irradiated onto the irradiation surface S when light Li is incident on boundary region 110X of optical element 100X according to Example 3 at a first surface incident angle α of 30 degrees.

 図17に示すように、第3例に係る光学素子100Xは、第1面1aXと、第1面1aXとは反対側に位置する第2面1bXと、を含む基材1Xを有する。基材1Xは、第1面1aXの一部に、光学要素11Xが配置された光学領域10Xを含む。また、基材1Xは、基材1Xの光学領域10Xが設けられた面における、光学領域10Xの周囲に設けられ、光学要素11Xが配置されない周辺領域12Xを含む。光学領域10Xに含まれる光学要素11Xは、レンズ要素である。光学領域10Xは、上述した境界領域110と同様に定義される境界領域110Xを含む。光学素子100Xでは、境界領域110Xは、第2面1bXに略直交する平面である。境界領域110Xが第2面1bXに略直交する平面である点において、光学素子100Xでは、境界領域110Xは、傾斜aが無限大の平面である。 As shown in FIG. 17, the optical element 100X of the third example has a substrate 1X including a first surface 1aX and a second surface 1bX located opposite the first surface 1aX. The substrate 1X includes an optical region 10X in which an optical element 11X is arranged in a part of the first surface 1aX. The substrate 1X also includes a peripheral region 12X on the surface of the substrate 1X on which the optical region 10X is arranged, which is arranged around the optical region 10X and in which no optical element 11X is arranged. The optical element 11X included in the optical region 10X is a lens element. The optical region 10X includes a boundary region 110X defined in the same manner as the boundary region 110 described above. In the optical element 100X, the boundary region 110X is a plane that is approximately perpendicular to the second surface 1bX. In the optical element 100X, the boundary region 110X is a plane that is approximately perpendicular to the second surface 1bX, and the boundary region 110X is a plane with an infinite slope a.

 図17に示すように、境界領域110Xに第1面入射角αで入射された光Liは、境界領域110Xで屈折し、光学素子100Xにおける基材1Xの内部を透過し、その多くが第2面1bXで全反射されている。第2面1bXで反射された戻り光Lrは、光学素子100Xに光Liが入射した側に戻されている。傾斜aが無限大の平面である境界領域110Xを含む光学素子100Xでは、境界領域110Xに入射された光Liは第2面1bXで全反射されやすい。この結果、戻り光Lrが多くなり、図18~図20に示すように、照射面Sに到達する光Ltが少なくなる。光学素子100Xからの光取り出し効率は、図18に示す例では67.2%、図19に示す例では44.7%、図20に示す例では0.19%である。また、図18及び図19に示す光Ltは、光学領域と周辺領域の境界領域に入射された光が局所集中することにより生じた局所的に光度が高い光である。 17, light Li incident on boundary region 110X at a first surface incident angle α is refracted at boundary region 110X, passes through the interior of substrate 1X in optical element 100X, and much of it is totally reflected at second surface 1bX. Return light Lr reflected at second surface 1bX is returned to the side of optical element 100X from which light Li entered. In optical element 100X including boundary region 110X which is a plane with an infinite slope a, light Li incident on boundary region 110X is likely to be totally reflected at second surface 1bX. As a result, the amount of return light Lr increases, and as shown in Figures 18 to 20, less light Lt reaches the irradiation surface S. The light extraction efficiency from optical element 100X is 67.2% in the example shown in Figure 18, 44.7% in the example shown in Figure 19, and 0.19% in the example shown in Figure 20. Furthermore, the light Lt shown in Figures 18 and 19 is light with a locally high luminous intensity that is generated by the local concentration of light incident on the boundary region between the optical region and the peripheral region.

 以上のように、光学素子100Xでは、全反射による戻り光が多くなり、光学素子100Xから出射される拡散光の光取り出し効率が低下する。光学素子100Xでは、光学領域と周辺領域の境界領域に入射された光が局所集中することにより、局所的に光度が高い光が光学素子から出射される。 As described above, in optical element 100X, there is a large amount of returned light due to total reflection, and the light extraction efficiency of the diffused light emitted from optical element 100X decreases. In optical element 100X, light incident on the boundary region between the optical region and the peripheral region is locally concentrated, causing light with locally high luminous intensity to be emitted from the optical element.

 (例1に係る光学素子100のシミュレーションによる評価結果)
 例1に係る光学素子100を光線追跡シミュレーションにより評価した。光線追跡シミュレーションには、Zemax OpticStudio 18.4.1を用いた。
(Evaluation Results of the Optical Element 100 According to Example 1 by Simulation)
The optical element 100 according to Example 1 was evaluated by ray tracing simulation. Zemax OpticStudio 18.4.1 was used for the ray tracing simulation.

 図21~図25を参照して、例1に係る光学素子100のシミュレーションによる評価結果について説明する。図21は、例1に係る光学素子100の境界領域110に入射された光Liの振る舞いを示す斜視図である。図22は、例1に係る光学素子100の境界領域110に入射された光Liの振る舞いを示す側面図である。図23は、例1に係る光学素子100の境界領域110に第1面入射角αが10度で光Liが入射されたときに照射面Sに照射される拡散光Lsを示す図である。図24は、例1に係る光学素子100の境界領域110に第1面入射角αが20度で光Liが入射されたときに照射面Sに照射される拡散光Lsを示す図である。図25は、例1に係る光学素子100の境界領域110に第1面入射角αが30度で光Liが入射されたときに照射面Sに照射される拡散光Lsを示す図である。 21 to 25, the evaluation results of the simulation of the optical element 100 according to Example 1 will be described. FIG. 21 is a perspective view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1. FIG. 22 is a side view showing the behavior of light Li incident on the boundary region 110 of the optical element 100 according to Example 1. FIG. 23 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle α of 10 degrees. FIG. 24 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle α of 20 degrees. FIG. 25 is a diagram showing diffused light Ls irradiated onto the irradiation surface S when light Li is incident on the boundary region 110 of the optical element 100 according to Example 1 at a first surface incident angle α of 30 degrees.

 図22に示すように、境界領域110に第1面入射角αで入射された光Liは、境界領域110で屈折し、光学素子100における基材1の内部を透過した後、多くが第2面1bで全反射されることなく、第2面1bを通って出射される。第2面1bでの全反射が低減されることにより、戻り光が少なくなり、図23~図25に示すように、照射面Sに到達する拡散光Lsが多くなる。光学素子100からの光取り出し効率は、図23に示す例では96.1%、図24に示す例では96.3%、図20に示す例では96.6%である。また、図23~図25に示す拡散光Lsは、光学素子100から出射された後、広がって照射面Sに照射されている。拡散光Lsには局所的に光度が高い光は含まれていない。 As shown in FIG. 22, light Li incident on boundary region 110 at a first surface incident angle α is refracted at boundary region 110, passes through the interior of substrate 1 in optical element 100, and then much of the light is emitted through second surface 1b without being totally reflected at second surface 1b. Reducing total reflection at second surface 1b reduces the amount of returning light, and as shown in FIGS. 23 to 25, more diffused light Ls reaches the irradiation surface S. The light extraction efficiency from optical element 100 is 96.1% in the example shown in FIG. 23, 96.3% in the example shown in FIG. 24, and 96.6% in the example shown in FIG. 20. Furthermore, the diffused light Ls shown in FIGS. 23 to 25 spreads after being emitted from optical element 100 and then irradiates the irradiation surface S. Diffused light Ls does not include light with locally high luminous intensity.

 以上のように、例1に係る光学素子100では、光学素子100から出射される拡散光の光取り出し効率を高くするとともに、局所的に光度が高い光を低減できる。なお、図21~図25に示した例では、例1に係る光学素子100を示したが、例2に係る光学素子100でも同様の結果が得られる。 As described above, the optical element 100 according to Example 1 can increase the light extraction efficiency of diffused light emitted from the optical element 100 and reduce light with locally high luminous intensity. While the examples shown in Figures 21 to 25 show the optical element 100 according to Example 1, similar results can also be obtained with the optical element 100 according to Example 2.

 [第2実施形態]
 第2実施形態に係る光源装置200について説明する。なお、既に説明した実施形態と同一の名称、符号については、同一もしくは同質の部材又は構成を示しており、詳細説明を適宜省略する。
Second Embodiment
A light source device 200 according to the second embodiment will be described. Note that the same names and symbols as those in the already described embodiments indicate the same or similar members or configurations, and detailed descriptions thereof will be omitted as appropriate.

 図26は、第2実施形態に係る光源装置200の一例を示す模式的斜視図である。図26に示すように、光源装置200は、光源150と、光源150の出射側に配置される光学素子100と、を有する。光学素子100は、光源150からの光L0を拡散する。光源装置200は、光学素子100による拡散光Lsを出射する。図26に示す例では、光源装置200は、+Z方向に視たときの外縁形状が長手方向を有する略矩形である拡散光Lsを出射している。 FIG. 26 is a schematic perspective view showing an example of a light source device 200 according to the second embodiment. As shown in FIG. 26, the light source device 200 has a light source 150 and an optical element 100 arranged on the emission side of the light source 150. The optical element 100 diffuses light L0 from the light source 150. The light source device 200 emits diffused light Ls by the optical element 100. In the example shown in FIG. 26, the light source device 200 emits diffused light Ls whose outer edge has a substantially rectangular shape with a longitudinal direction when viewed in the +Z direction.

 本実施形態では、光源装置200が光学素子100を有することにより、光源装置200から出射される拡散光Lsの光取り出し効率を高くするとともに、局所的に光度が高い光を低減できる。 In this embodiment, the light source device 200 includes the optical element 100, which increases the light extraction efficiency of the diffused light Ls emitted from the light source device 200 and reduces light with locally high luminous intensity.

 図26に示す光源装置200では、光学素子100は、光学領域10が配置された第1面1aを光源150側にして配置されている。光源装置200は、センシング用途又は照明用途に用いられる。センシング用途では、例えば、LiDAR(Light Detection And Ranging)において、測定範囲に測定用の拡散光を投光する投光装置として、光源装置200を用いることができる。照明用途では、例えば、プロジェクタ等の投影装置において、液晶パネル等の空間変調器を拡散光で照明する照明装置として、光源装置200を用いることができる。光源装置200は、光源装置200から出射される拡散光Lsの光取り出し効率を高くするとともに、局所的に光度が高い光を低減できる。そのため、センシング用途で光源装置200を用いることにより、LiDAR等のセンシング装置の精度を高くすることができる。また照明用途で光源装置200を用いることにより、プロジェクタ等の投影装置において投影される画像の質を高くすることができる。 In the light source device 200 shown in FIG. 26, the optical element 100 is arranged with the first surface 1a, on which the optical region 10 is arranged, facing the light source 150. The light source device 200 is used for sensing or lighting applications. In sensing applications, for example, in LiDAR (Light Detection and Ranging), the light source device 200 can be used as a light projecting device that projects diffused light for measurement into a measurement range. In lighting applications, for example, in a projection device such as a projector, the light source device 200 can be used as an illumination device that illuminates a spatial modulator such as a liquid crystal panel with diffused light. The light source device 200 can increase the light extraction efficiency of the diffused light Ls emitted from the light source device 200 and reduce light with locally high luminous intensity. Therefore, using the light source device 200 for sensing applications can improve the accuracy of sensing devices such as LiDAR. Furthermore, by using the light source device 200 for lighting purposes, the quality of images projected by a projection device such as a projector can be improved.

 光源150には、半導体レーザを使用できる。但し、光源150は半導体レーザに限定されるものではなく、固体レーザ等の半導体レーザ以外のレーザ光源や、発光ダイオード等のレーザ光源以外の光源を用いることもできる。光源150から出射される光の発光ピーク波長は、光源装置200の用途に応じて適宜選択可能である。 A semiconductor laser can be used as the light source 150. However, the light source 150 is not limited to a semiconductor laser, and laser light sources other than semiconductor lasers, such as solid-state lasers, and light sources other than laser light sources, such as light-emitting diodes, can also be used. The emission peak wavelength of the light emitted from the light source 150 can be selected appropriately depending on the application of the light source device 200.

 +Z方向に視たときの拡散光Lsの外縁形状は、光学素子100の光学領域10に配置される光学要素11の、+Z方向に視たときの外縁形状に沿ったものになる。光源装置200は、+Z方向に視たときの光学要素11の外縁形状に応じて、様々な外縁形状の拡散光Lsを照射できる。図27は、光源装置200から出射される拡散光Lsの第一例を示す図である。図28は、光源装置200から出射される拡散光Lsの第二例を示す図である。図29は、光源装置200から出射される拡散光Lsの第三例を示す図である。 The outer edge shape of the diffused light Ls when viewed in the +Z direction follows the outer edge shape of the optical elements 11 arranged in the optical region 10 of the optical element 100 when viewed in the +Z direction. The light source device 200 can emit diffused light Ls with various outer edge shapes depending on the outer edge shape of the optical elements 11 when viewed in the +Z direction. Figure 27 is a diagram showing a first example of diffused light Ls emitted from the light source device 200. Figure 28 is a diagram showing a second example of diffused light Ls emitted from the light source device 200. Figure 29 is a diagram showing a third example of diffused light Ls emitted from the light source device 200.

 図27に示す第一例は、+Z方向に視たときの外縁形状が略正方形である拡散光Lsを示している。図28に示す第二例は、+Z方向に視たときの外縁形状がX方向を長手とする略長方形である拡散光Lsを示している。図29に示す第三例は、+Z方向に視たときの外縁形状が略正六角形である拡散光Lsを示している。これらの他、光源装置200は、+Z方向に視たときの光学要素11の外縁形状に応じて、外縁形状が略円形、略楕円形、又は略多角形等の拡散光Lsを照射できる。 The first example shown in Figure 27 shows diffused light Ls whose outer edge shape when viewed in the +Z direction is approximately square. The second example shown in Figure 28 shows diffused light Ls whose outer edge shape when viewed in the +Z direction is approximately rectangular with the X direction as its longitudinal axis. The third example shown in Figure 29 shows diffused light Ls whose outer edge shape when viewed in the +Z direction is approximately regular hexagonal. In addition to these, the light source device 200 can emit diffused light Ls whose outer edge shape is approximately circular, approximately elliptical, approximately polygonal, etc., depending on the outer edge shape of the optical element 11 when viewed in the +Z direction.

 図30及び図31は、光源装置200から出射される拡散光Lsの強度プロファイルを示す図である。拡散光Lsの強度プロファイルは、拡散光Lsの進行方向に略直交する線分の経路に沿って等間隔に配置された点から取得した強度値の集合を意味する。図30及び図31において、横軸は角度、縦軸は強度をそれぞれ表している。図30は、フラットトップ型の拡散光Lsの強度プロファイルを示している。図31は、1/cosθ型の拡散光Lsの強度プロファイルを示している。拡散光Lsの強度プロファイルは、光学要素11の形状又は配置等に応じて適宜決定できる。 Figures 30 and 31 are diagrams showing the intensity profile of diffused light Ls emitted from light source device 200. The intensity profile of diffused light Ls refers to a collection of intensity values obtained from points spaced equally along a line segment path that is approximately perpendicular to the direction of travel of diffused light Ls. In Figures 30 and 31, the horizontal axis represents angle and the vertical axis represents intensity. Figure 30 shows the intensity profile of flat-top diffused light Ls. Figure 31 shows the intensity profile of 1/cosθ diffused light Ls. The intensity profile of diffused light Ls can be determined appropriately depending on the shape or arrangement of the optical element 11, etc.

 以上、好ましい実施形態について詳説したが、上述した実施形態に制限されることはなく、特許請求の範囲に記載された範囲を逸脱することなく、上述した実施形態に種々の変形および置換を加えることができる。 Although the preferred embodiments have been described in detail above, the present invention is not limited to the above-described embodiments, and various modifications and substitutions can be made to the above-described embodiments without departing from the scope of the claims.

 実施形態の説明で用いた序数、数量等の数字は、全て本開示の技術を具体的に説明するために例示するものであり、本開示は例示された数字に制限されない。また、構成要素間の接続関係は、本開示の技術を具体的に説明するために例示するものであり、本開示の機能を実現する接続関係をこれに限定するものではない。 All ordinal numbers, quantitative numbers, and other figures used in the description of the embodiments are provided as examples to specifically explain the technology of the present disclosure, and the present disclosure is not limited to the illustrated figures. Furthermore, the interconnections between components are provided as examples to specifically explain the technology of the present disclosure, and do not limit the interconnections that realize the functions of the present disclosure.

 本開示に係る光学素子及び光源装置は、光学素子から出射される拡散光の光取り出し効率を高くするとともに、局所的に光度が高い光を低減できるため、プロジェクタ等の投影装置、LiDAR等のセンシング装置等に利用できる。但し、これらに限定されるものではなく、実施形態に係る光学素子及び光源装置は、光学的手法を用いる多様な分野に適用可能である。 The optical element and light source device according to the present disclosure can increase the light extraction efficiency of diffused light emitted from the optical element and reduce light with locally high luminous intensity, making it suitable for use in projection devices such as projectors, sensing devices such as LiDAR, and the like. However, the optical element and light source device according to the embodiment are not limited to these, and can be applied to a variety of fields that use optical techniques.

 この出願は、2024年2月7日に出願された日本出願特願2024-17281号を基礎とする優先権を主張し、その開示の全てをここに取り込む。 This application claims priority based on Japanese Patent Application No. 2024-17281, filed February 7, 2024, the disclosure of which is incorporated herein in its entirety.

1   基材
1a  第1面
1b  第2面
10  光学領域
11、11-1~11-4 光学要素
11C-1、11C-2 光軸
11T-1、11T-2 頂点
110 境界領域
12  周辺領域
12E 端部
13a 第1反射防止膜
13b 第2反射防止膜
100 光学素子
150 光源
200 光源装置
a   傾斜
a'  傾斜角
b   X方向における基材の幅
c   Y方向における基材の幅
d   半径
Dp  深さ
Ds  距離
Li  入射光
Lr  戻り光
Ls  拡散光
Lt  光
Po1、Po2 位置
S   照射面
α   第1面入射角
β   屈折角
ε   第2面入射角
θ   法線角
1 Substrate 1a First surface 1b Second surface 10 Optical region 11, 11-1 to 11-4 Optical element 11C-1, 11C-2 Optical axis 11T-1, 11T-2 Vertex 110 Boundary region 12 Peripheral region 12E End 13a First anti-reflection film 13b Second anti-reflection film 100 Optical element 150 Light source 200 Light source device a Inclination a' Inclination angle b Width of substrate in X direction c Width of substrate in Y direction d Radius Dp Depth Ds Distance Li Incident light Lr Return light Ls Diffused light Lt Light Po1, Po2 Position S Irradiation surface α First surface incident angle β Refraction angle ε Second surface incident angle θ Normal angle

Claims (10)

 第1面と前記第1面とは反対側に位置する第2面とを含む基材を有し、
 前記基材は、
 前記第1面及び前記第2面の少なくとも一方の面の一部に、少なくとも1つの光学要素が配置された光学領域と、
 前記基材の前記光学領域が設けられた面における、前記光学領域の周囲に設けられ、前記光学要素が配置されない周辺領域と、を含み、
 前記光学要素はレンズ要素であり、
 少なくとも1つの前記光学要素のうち、前記周辺領域に最も近い前記光学要素の光軸を含む一断面において、前記光軸が通る前記光学要素の頂点から、前記周辺領域における前記光学要素に最も近い端部まで、の断面領域を境界領域と定義すると、
 前記境界領域における面の傾斜は、平均の絶対値が1.00以下であり、かつ、ばらつきσが0.10以上である、光学素子。
a substrate including a first surface and a second surface opposite the first surface;
The substrate is
an optical region in which at least one optical element is arranged on a part of at least one of the first surface and the second surface;
a peripheral region on the surface of the base material on which the optical region is provided, the peripheral region being provided around the optical region and in which the optical element is not disposed;
the optical element is a lens element;
In a cross section including the optical axis of the optical element closest to the peripheral region among at least one of the optical elements, a cross-sectional area from the vertex of the optical element through which the optical axis passes to an end of the peripheral region closest to the optical element is defined as a boundary region.
An optical element, wherein the average absolute value of the surface inclination in the boundary region is 1.00 or less and the variation σ is 0.10 or more.
 前記基材において、前記光学領域は、前記周辺領域に対して窪んでいる、請求項1に記載の光学素子。 The optical element of claim 1, wherein the optical region is recessed relative to the peripheral region in the substrate.  前記光学領域は複数の前記光学要素を含み、
 複数の前記光学要素は、平坦面を露出することなく二次元的に並んでいる、請求項1又は請求項2に記載の光学素子。
the optical region includes a plurality of the optical elements;
3. The optical element according to claim 1, wherein the plurality of optical elements are arranged two-dimensionally without exposing any flat surface.
 前記基材の面積に対する前記光学領域の面積比は、0.0625以上0.9025以下である、請求項1又は請求項2に記載の光学素子。 The optical element described in claim 1 or claim 2, wherein the area ratio of the optical region to the area of the substrate is 0.0625 or more and 0.9025 or less.  複数の前記光学要素のうち、隣接する前記光学要素の前記頂点を結ぶ距離が10μm以上かつ200μm以下である、請求項3に記載の光学素子。 The optical element described in claim 3, wherein the distance between the vertices of adjacent optical elements among the plurality of optical elements is 10 μm or more and 200 μm or less.  前記光学要素の頂点と前記周辺領域の前記端部との前記光軸に沿う方向における深さは3μm以上かつ100μm以下である、請求項1又は請求項2に記載の光学素子。 An optical element according to claim 1 or 2, wherein the depth in the direction along the optical axis between the vertex of the optical element and the edge of the peripheral region is 3 μm or more and 100 μm or less.  発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときにおけるFWHMは、20度以上である、請求項1又は請求項2に記載の光学素子。 The optical element described in claim 1 or 2, wherein the FWHM when parallel light having an emission peak wavelength of 300 nm or more and 1000 nm or less is incident is 20 degrees or more.  発光ピーク波長が300nm以上かつ1000nm以下の平行光を入射したときに、前記光学素子から出射される拡散光の全光線透過率は、93%以上である、請求項1又は請求項2に記載の光学素子。 The optical element described in claim 1 or 2, wherein when parallel light having an emission peak wavelength of 300 nm or more and 1000 nm or less is incident, the total light transmittance of the diffused light emitted from the optical element is 93% or more.  光源と、
 前記光源の出射側に配置される請求項1又は請求項2に記載の光学素子と、を有し、
 前記光学素子は、前記光源からの光を拡散し、
 前記光学素子による拡散光を出射する、光源装置。
A light source and
the optical element according to claim 1 or 2, which is disposed on the output side of the light source;
the optical element diffuses the light from the light source;
A light source device that emits diffused light by the optical element.
 前記光学素子は、前記光学領域が配置された面を光源側にして配置され、
 センシング用途又は照明用途に用いられる、請求項9に光源装置。
the optical element is disposed such that the surface on which the optical region is disposed faces the light source,
The light source device according to claim 9, which is used for sensing or lighting purposes.
PCT/JP2025/003035 2024-02-07 2025-01-30 Optical element and light source device Pending WO2025169837A1 (en)

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JP2024-017281 2024-02-07

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016117452A1 (en) * 2015-01-19 2016-07-28 旭硝子株式会社 Optical device and optical member
JP2016191839A (en) * 2015-03-31 2016-11-10 旭硝子株式会社 Optical element, projection device, and measurement device
WO2022009615A1 (en) * 2020-07-08 2022-01-13 日本板硝子株式会社 Lighting device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016117452A1 (en) * 2015-01-19 2016-07-28 旭硝子株式会社 Optical device and optical member
JP2016191839A (en) * 2015-03-31 2016-11-10 旭硝子株式会社 Optical element, projection device, and measurement device
WO2022009615A1 (en) * 2020-07-08 2022-01-13 日本板硝子株式会社 Lighting device

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