WO2025164387A1 - Resin composition, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and wiring board - Google Patents
Resin composition, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and wiring boardInfo
- Publication number
- WO2025164387A1 WO2025164387A1 PCT/JP2025/001470 JP2025001470W WO2025164387A1 WO 2025164387 A1 WO2025164387 A1 WO 2025164387A1 JP 2025001470 W JP2025001470 W JP 2025001470W WO 2025164387 A1 WO2025164387 A1 WO 2025164387A1
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- WO
- WIPO (PCT)
- Prior art keywords
- group
- resin composition
- styrene
- resin
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
- B32B15/088—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin comprising polyamides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/26—Layered products comprising a layer of synthetic resin characterised by the use of special additives using curing agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/34—Layered products comprising a layer of synthetic resin comprising polyamides
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/24—Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L23/00—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers
- C08L23/02—Compositions of homopolymers or copolymers of unsaturated aliphatic hydrocarbons having only one carbon-to-carbon double bond; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L23/04—Homopolymers or copolymers of ethene
- C08L23/08—Copolymers of ethene
- C08L23/0807—Copolymers of ethene with unsaturated hydrocarbons only containing four or more carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L25/00—Compositions of, homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Compositions of derivatives of such polymers
- C08L25/02—Homopolymers or copolymers of hydrocarbons
- C08L25/04—Homopolymers or copolymers of styrene
- C08L25/08—Copolymers of styrene
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
Definitions
- the present invention relates to a resin composition, a prepreg, a resin-coated film, a resin-coated metal foil, a metal-clad laminate, and a wiring board.
- the wiring boards used in various electronic devices are required to be high-frequency compatible, such as server boards for communication infrastructure equipment applications such as network equipment, servers, and AI (artificial intelligence) processors, and millimeter-wave radar boards for automotive applications.
- the substrate materials used to form the insulating layers of wiring boards used in various electronic devices are required to have low relative permittivity and dielectric dissipation factor in order to increase signal transmission speeds and reduce loss during signal transmission. Examples of substrate materials used to form the insulating layers of such wiring boards include the resin compositions described in Patent Documents 1 and 2.
- Patent Document 1 describes a resin composition containing high-molecular-weight components such as a maleimide compound, an allyl group-containing benzoxazine compound, and a thermoplastic resin. Patent Document 1 discloses that it is possible to obtain a cured product that has a small dielectric tangent value, excellent adhesion to conductive materials after environmental resistance testing, and improved brittleness.
- Patent Document 2 describes a resin composition containing a maleimide compound having an indane structure in the molecule and a styrene-based polymer that is solid at 25°C. Patent Document 2 discloses that a cured product can be obtained that has low dielectric properties, excellent adhesion to metal foil, a high glass transition temperature, and in which increases in the relative dielectric constant and dielectric loss tangent due to temperature are sufficiently suppressed.
- Wiring boards are also required to be free of warping. For this reason, it is necessary to suppress warping of the insulating layers provided on wiring boards. Therefore, resin compositions used as substrate materials for forming the insulating layers of wiring boards are required to produce cured products with a low coefficient of thermal expansion.
- the present invention was made in light of these circumstances, and aims to provide a resin composition that produces a cured product with a low coefficient of thermal expansion. It also aims to provide prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are obtained using the resin composition.
- One aspect of the present invention is a resin composition
- a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner
- a curing agent (B) having in its molecule a carbon-carbon unsaturated bond
- a styrene-based polymer (C) that has in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, and that is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more.
- FIG. 1 is a schematic cross-sectional view showing an example of a prepreg according to an embodiment of the present invention.
- FIG. 2 is a schematic cross-sectional view showing an example of a metal-clad laminate according to an embodiment of the present invention.
- FIG. 3 is a schematic cross-sectional view showing an example of a wiring board according to an embodiment of the present invention.
- FIG. 4 is a schematic cross-sectional view showing an example of a resin-coated metal foil according to an embodiment of the present invention.
- FIG. 5 is a schematic cross-sectional view showing an example of a resin-coated film according to an embodiment of the present invention.
- the wiring boards used in these products are also required to have finer conductor wiring, more multi-layered conductor wiring layers, thinner surfaces, and higher performance mechanical properties.
- warping occurs in semiconductor packages that mount semiconductor chips on wiring boards, making them more susceptible to mounting defects.
- the insulating layer must have a low thermal expansion coefficient (coefficient of thermal expansion). Therefore, substrate materials used to form the insulating layers of wiring boards must be able to produce cured products with a low thermal expansion coefficient.
- a resin composition according to an embodiment of the present invention comprises a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner; a curing agent (B) having in its molecule a carbon-carbon unsaturated bond; and a styrene-based polymer (C) having in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, which is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more.
- a cured product having a low coefficient of thermal expansion is obtained. This is believed to be due to the fact that the inclusion of the styrene-based polymer (C) in a resin composition comprising the maleimide compound (A) and the curing agent (B) can reduce the coefficient of thermal expansion of the cured product obtained by curing the resin composition.
- the maleimide compound (A) has at least one of an indane structure and an arylene structure bonded to a meta-position in the molecule, and specifically includes at least one selected from the group consisting of a maleimide compound (A1) having an indane structure in the molecule, a maleimide compound (A2) having an arylene structure bonded to a meta-position in the molecule, and a maleimide compound (A3) having an indane structure and an arylene structure bonded to a meta-position in the molecule.
- the maleimide compound (A1) is not particularly limited as long as it is a maleimide compound having an indane structure in the molecule.
- the maleimide compound (A1) has not only the indane structure but also a maleimide group in the molecule.
- Examples of the indane structure include an indane structure represented by the following formula (1). That is, specific examples of the maleimide compound (A1) include a maleimide compound (A1-1) having a structure represented by the following formula (1) in the molecule as the indane structure, and more specific examples include a maleimide compound (A1-1-1) represented by the following formula (4).
- each Rb is independent. That is, each Rb may be the same group or different groups. For example, when r is 2 or 3, two or three Rb's bonded to the same benzene ring may be the same group or different groups.
- Rb represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group (alkoxy group) having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group (thiol group).
- r represents an integer of 0 to 3.
- each Ra is independent. That is, each Ra may be the same group or different groups. For example, when q is 2 to 4, 2 to 4 Ra bonded to the same benzene ring may be the same group or different groups.
- Ra represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group.
- Rb's are the same as Rb's in formula (1), and each independently represents an alkyl group having 1 to 10 carbon atoms, an alkyloxy group having 1 to 10 carbon atoms, an alkylthio group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an arylthio group having 6 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a halogen atom, a nitro group, a hydroxyl group, or a mercapto group.
- q represents 0 to 4.
- r represents 0 to 3.
- n represents 0.95 to 10.
- r is the average value of the degree of substitution of Rb, and a smaller value is preferable, specifically 0. In other words, it is preferable that a hydrogen atom be bonded to a position on the benzene ring where Rb can be bonded.
- the maleimide compound (A1) having such an r is easy to synthesize. This is thought to be due to reduced steric hindrance and increased electron density in the aromatic ring.
- Rb is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms.
- Ra is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms.
- an alkyl group having 1 to 4 carbon atoms a cycloalkyl group having 3 to 6 carbon atoms, or an aryl group having 6 to 10 carbon atoms improves solubility in solvents and suppresses a decrease in the reactivity of the maleimide group, resulting in a suitable cured product. This is thought to be due to a decrease in planarity near the maleimide group and a decrease in crystallinity.
- Ra and Rb include the following groups:
- the alkyl group having 1 to 10 carbon atoms is not particularly limited, and examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
- the alkyloxy group having 1 to 10 carbon atoms is not particularly limited, and examples include a methyloxy group, an ethyloxy group, a propyloxy group, a hexyloxy group, and a decyloxy group.
- the alkylthio group having 1 to 10 carbon atoms is not particularly limited, and examples include a methylthio group, an ethylthio group, a propylthio group, a hexylthio group, and a decylthio group.
- the aryl group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenyl group and a naphthyl group.
- the aryloxy group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenyloxy group and a naphthyloxy group.
- the arylthio group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenylthio group and a naphthylthio group.
- the cycloalkyl group having 3 to 10 carbon atoms is not particularly limited, and examples include a cyclopropyl group, a cyclobutyl group, a cyclohexyl group, and a cyclooctyl group.
- halogen atom examples include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
- q is the average value of the degree of substitution of Ra, and is preferably 2 to 3, and more preferably 2.
- the maleimide compound (A1) with such a q is easy to synthesize. This is thought to be because, particularly when q is 2, steric hindrance is reduced and the electron density of the aromatic ring is increased.
- n is the average number of repeats, and as described above, is 0.95 to 10, preferably 0.98 to 8, more preferably 1 to 7, and even more preferably 1.1 to 6.
- the content of the maleimide compound in which n, the average number of repeats (degree of polymerization), is 0, is preferably 32 mass% or less based on the total amount of the maleimide compound (A1).
- the molecular weight distribution (Mw/Mn) of the maleimide compound (A1) obtained by GPC measurement is preferably 1 to 4, more preferably 1.1 to 3.8, even more preferably 1.2 to 3.6, and particularly preferably 1.3 to 3.4.
- the molecular weight distribution is obtained by gel permeation chromatography (GPC) measurement.
- maleimide compound (A1) commercially available products can be used, such as the solid content of NE-X-9470S manufactured by DIC Corporation.
- the maleimide compound (A2) is not particularly limited as long as it is a maleimide compound having an arylene structure in the molecule that is bonded in a meta-oriented manner.
- the maleimide compound (A2) has not only the arylene structure but also a maleimide group in the molecule.
- Examples of the arylene structure include an arylene structure in which a structure containing a maleimide group is bonded in the meta-position (an arylene structure in which a structure containing a maleimide group is substituted at the meta-position).
- the arylene structure is an arylene group bonded in a meta-oriented manner, such as a group represented by the following formula (5).
- Examples of the arylene structure include m-arylene groups such as m-phenylene and m-naphthylene groups, and more specifically, a group represented by the following formula (5):
- maleimide compound (A2) examples include a maleimide compound (A2-1) represented by the following formula (2), and more specifically, a maleimide compound (A2-1-2) represented by the following formula (6):
- Ar represents an arylene group oriented and bonded at the meta position.
- R A , R B , R C , and R D are each independent. That is, R A , R B , R C , and R D may be the same group or different groups.
- R A , R B , R C , and R D represent a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a phenyl group, and preferably a hydrogen atom.
- R E and R F are each independent. That is, R E and R F may be the same group or different groups.
- R E and R F represent an aliphatic hydrocarbon group. s represents 1 to 5.
- the arylene group is not particularly limited as long as it is an arylene group oriented and bonded at the meta position, and examples include m-arylene groups such as m-phenylene and m-naphthylene, and more specifically, groups represented by formula (5) above.
- alkyl group having 1 to 5 carbon atoms examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, and a neopentyl group.
- the aliphatic hydrocarbon group is a divalent group and may be acyclic or cyclic.
- Examples of the aliphatic hydrocarbon group include alkylene groups, and more specifically, methylene groups, methylmethylene groups, and dimethylmethylene groups. Among these, the dimethylmethylene group is preferred.
- the repeating number s is preferably 1 to 5. This s is the average value of the repeating number (degree of polymerization).
- s represents 1 to 5. This s is the same as s in formula (2) and is the average value of the number of repetitions (degree of polymerization).
- the maleimide compound (A2-1) represented by formula (2) and the maleimide compound (A2-1-1) represented by formula (6) may contain a monofunctional compound where s is 0, as long as s, the average number of repeating units (degree of polymerization), is 1 to 5, or may contain a polyfunctional compound such as a heptafunctional or octafunctional compound where s is 6 or more.
- maleimide compound (A2) commercially available products can be used, such as the solid content of MIR-5000-60T manufactured by Nippon Kayaku Co., Ltd.
- the maleimide compounds exemplified above may be used alone or in combination of two or more.
- the maleimide compound (A2) the maleimide compound (A2-1) represented by formula (2) may be used alone, or two or more types of the maleimide compound (A2-1) represented by formula (2) may be used in combination.
- a maleimide compound (A1) represented by formula (2) other than the maleimide compound (A2-1-1) represented by formula (6) may be used in combination with the maleimide compound (A2-1-1) represented by formula (6).
- the maleimide compound (A3) is not particularly limited as long as it is a maleimide compound having an indane structure and an arylene structure bonded in a meta-oriented manner in the molecule.
- the maleimide compound (A3) has not only the arylene structure and the indane structure, but also a maleimide group in the molecule.
- the indane structure is the same as the indane structure in the maleimide compound (A1)
- the arylene structure is the same as the arylene structure bonded in a meta-oriented manner in the maleimide compound (A2).
- Specific examples of the maleimide compound (A3) include maleimide compounds represented by the following formulas (7) to (9):
- n 0.95 to 10.
- n 0.95 to 10.
- n 0.95 to 10.
- the maleimide compound (A) may be used alone or in combination of two or more.
- the content of the maleimide compound (A1) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A).
- the content of the maleimide compound (A2) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A).
- the content of the maleimide compound (A3) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A).
- the curing agent (B) is not particularly limited as long as it is a curing agent having a carbon-carbon unsaturated bond in the molecule.
- it may be a compound different from the maleimide compound (A) that can react with the maleimide compound (A) to cure the resin composition.
- the curing agent (B) include benzoxazine compounds (B1) having an alkenyl group in the molecule, hydrocarbon compounds (B2) having a carbon-carbon unsaturated double bond in the molecule, polybutadiene compounds (B3) having an epoxy group in the molecule, and other curing agents (B4) [curing agents (B4) having a carbon-carbon unsaturated bond in the molecule other than the benzoxazine compounds (B1), the hydrocarbon compounds (B2), and the polybutadiene compounds (B3) having an epoxy group in the molecule].
- These curing agents (B) may be used alone or in combination of two or more.
- the benzoxazine compound (B1) is not particularly limited as long as it is a benzoxazine compound having an alkenyl group in the molecule.
- the benzoxazine compound (B1) contains not only an alkenyl group but also a benzoxazine group in the molecule.
- the alkenyl group is not particularly limited, but examples thereof include alkenyl groups having 2 to 6 carbon atoms. Specific examples of the alkenyl group include vinyl groups, allyl groups, propenyl groups, and butenyl groups. Of these, allyl groups and propenyl groups are preferred, and allyl groups are more preferred.
- the curing agent (B) is preferably a benzoxazine compound having an allyl group in the molecule.
- benzoxazine group examples include a benzoxazine group represented by the following formula (10) and a benzoxazine group represented by the following formula (11).
- benzoxazine compound (B1) examples include not only a benzoxazine compound (B1-1) having a benzoxazine group represented by the following formula (10) in the molecule, and a benzoxazine compound (B1-2) having a benzoxazine group represented by the following formula (11) in the molecule, but also a benzoxazine compound (B1-3) having a benzoxazine group represented by the following formula (10) and a benzoxazine group represented by the following formula (11) in the molecule.
- R1 represents an allyl group, and a represents 1 to 4.
- a represents the average value of the degree of substitution of R1 , and is 1 to 4, and is preferably 1.
- R2 represents an allyl group.
- benzoxazine compound (B1) examples include the benzoxazine compound (B1-1) represented by the following formula (12):
- R 3 and R 4 represent an allyl group
- Y represents an alkylene group
- b and c each independently represent 1 to 4.
- the alkylene group is not particularly limited, and examples include methylene, ethylene, propylene, butylene, pentylene, hexylene, heptylene, octane, icosane, and hexatriacontane groups. Of these, the methylene group is preferred.
- b is the average value of the degree of substitution of R3 and is 1 to 4, preferably 1.
- c is the average value of the degree of substitution of R4 and is 1 to 4, preferably 1.
- benzoxazine compound (B1) commercially available products can be used, such as ALPd manufactured by Shikoku Chemicals Corporation.
- benzoxazine compound (B1) the benzoxazine compounds exemplified above may be used alone or in combination of two or more.
- the hydrocarbon compound (B2) is not particularly limited as long as it is a hydrocarbon compound having a carbon-carbon unsaturated double bond in the molecule.
- the carbon-carbon unsaturated group is not particularly limited, but examples thereof include alkenyl groups. Examples of the alkenyl group include alkenyl groups having 2 to 6 carbon atoms, specifically vinyl groups, allyl groups, propenyl groups, and butenyl groups, with allyl groups and propenyl groups being preferred.
- hydrocarbon compound (B2) examples include divinylbenzenes such as o-divinylbenzene, m-divinylbenzene, and p-divinylbenzene, hydrocarbon compounds (B2-1) represented by the following formula (3), and hydrocarbon compounds (B2-2) represented by the following formula (14).
- X represents a hydrocarbon group having 6 or more carbon atoms and containing at least one selected from an aromatic cyclic group and an aliphatic cyclic group, and m represents 1 to 10.
- the aromatic cyclic group is not particularly limited, but examples thereof include a phenylene group, a xylylene group, a naphthylene group, a tolylene group, and a biphenylene group.
- the aliphatic cyclic group is not particularly limited, but examples thereof include a group containing an indane structure and a group containing a cycloolefin structure.
- X is preferably an aromatic cyclic group, and more preferably a xylylene group.
- the number of carbon atoms in the hydrocarbon group is not particularly limited as long as it is 6 or more, but is preferably 6 to 20. More specific examples of the hydrocarbon compound (B2-1) include hydrocarbon compounds (B2-1-1) represented by the following formula (13).
- m 1 to 10.
- e 1 to 20.
- e is preferably 1 to 20, more preferably 1 to 12, and even more preferably 1 to 6.
- Specific examples of the hydrocarbon compound (B2-2) include a compound represented by formula (14) where e is 1 [bis-(4-vinylphenyl)methane (BVPM)], a compound represented by formula (14) where e is 2 [1,2-bis(vinylphenyl)ethane (BVPE)], and a compound represented by formula (14) where e is 6 [1,6-bis(4-vinylphenyl)hexane (BVPH)].
- the hydrocarbon compound (B2) is preferably the hydrocarbon compound (B2-1) represented by formula (3), and more preferably the hydrocarbon compound (B2-1-1) represented by formula (13).
- the polybutadiene compound (B3) having an epoxy group in the molecule is not particularly limited, and examples thereof include epoxidized polybutadiene, i.e., a compound in which epoxy groups have been introduced into the molecule by epoxidizing at least a portion of the carbon-carbon double bonds contained in polybutadiene, and a compound in which both terminals of polybutadiene have been glycidyl-etherified.
- the epoxidation is carried out, for example, by adding one oxygen atom to the carbon-carbon double bond contained in polybutadiene (polybutadiene before epoxidation) using an epoxidizing agent to form a three-membered ring epoxy group.
- a compound in which both terminals of polybutadiene have been glycidyl-etherified can be obtained by adding epichlorohydrin to polybutadiene having hydroxyl groups at both terminals.
- the carbon-carbon double bond configuration of the polybutadiene (before epoxidation) may be any of cis-1,4, trans-1,4, cis-1,2, and trans-1,2. Furthermore, there are no particular limitations on the ratio of these.
- the epoxidizing agent is not particularly limited as long as it can epoxidize the carbon-carbon double bonds contained in polybutadiene.
- examples of the epoxidizing agent include percarboxylic acids such as peracetic acid, performic acid, perbenzoic acid, trifluoroperacetic acid, and perpropionic acid, organic hydroperoxides such as t-butyl hydroperoxide and cumene hydroperoxide, and hydrogen peroxide.
- the polybutadiene compound having epoxy groups in its molecule preferably has an oxirane oxygen concentration of 1 to 10% by mass, and more preferably 5 to 9% by mass. If the oxirane oxygen concentration is too low, the effect of adding the polybutadiene compound having epoxy groups in its molecule, namely, the effect of improving the adhesion of the cured resin composition to metal foil, tends to be insufficient. Furthermore, if the oxirane oxygen concentration is too high, the epoxy groups tend to become too numerous, which tends to deteriorate the low dielectric properties.
- a resin composition By using a polybutadiene compound having epoxy groups in its molecule whose oxirane oxygen concentration is within the above range, a resin composition can be obtained that, when cured, results in a cured product with low dielectric properties and high adhesion to metal foil.
- the concentration of oxirane oxygen is an indicator of the content of epoxy groups contained in the polybutadiene compound having epoxy groups in its molecules, and can be measured, for example, by the hydrogen bromide-glacial acetic acid solution method.
- the other curing agent (B4) is not particularly limited as long as it is a curing agent having a carbon-carbon unsaturated bond in the molecule other than the benzoxazine compound (B1), the hydrocarbon compound (B2), and the polybutadiene compound (B3) having an epoxy group in the molecule.
- the other curing agent (B4) include polyphenylene ether compounds, methacrylate compounds, acrylate compounds, vinyl compounds, and allyl compounds, each of which has a carbon-carbon unsaturated double bond in the molecule.
- the polyphenylene ether compound is not particularly limited as long as it is a polyphenylene ether compound having a carbon-carbon unsaturated double bond in the molecule.
- the polyphenylene ether compound include polyphenylene ether compounds having a terminal carbon-carbon unsaturated double bond. More specifically, examples include polyphenylene ether compounds having a substituent having a carbon-carbon unsaturated double bond at the molecular end, such as modified polyphenylene ether compounds whose ends have been modified with a substituent having a carbon-carbon unsaturated double bond.
- the substituent having a carbon-carbon unsaturated double bond include a vinylbenzyl group (ethenylbenzyl group), an acryloyl group, and a methacryloyl group.
- the methacrylate compound is a compound having a methacryloyl group in the molecule, and examples thereof include monofunctional methacrylate compounds having one methacryloyl group in the molecule, and polyfunctional methacrylate compounds having two or more methacryloyl groups in the molecule.
- Examples of the monofunctional methacrylate compounds include methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate.
- Examples of the polyfunctional methacrylate compounds include dimethacrylate compounds such as tricyclodecane dimethanol dimethacrylate (DCP).
- the acrylate compound is a compound having an acryloyl group in the molecule, and examples thereof include monofunctional acrylate compounds having one acryloyl group in the molecule, and polyfunctional acrylate compounds having two or more acryloyl groups in the molecule.
- monofunctional acrylate compounds include methyl acrylate, ethyl acrylate, propyl acrylate, and butyl acrylate.
- polyfunctional acrylate compounds include diacrylate compounds such as tricyclodecane dimethanol diacrylate.
- the vinyl compound is a compound that has a vinyl group in its molecule, and examples include monofunctional vinyl compounds (monovinyl compounds) that have one vinyl group in their molecule, and polyfunctional vinyl compounds that have two or more vinyl groups in their molecule.
- monofunctional vinyl compounds include vinylbenzene compounds that have a skeleton containing a phosphorus atom in their molecule, such as 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (DOPO).
- the allyl compound is a compound having an allyl group in the molecule, and examples include triallyl isocyanurate compounds such as triallyl isocyanurate (TAIC), diallyl bisphenol compounds, and diallyl phthalate (DAP).
- triallyl isocyanurate compounds such as triallyl isocyanurate (TAIC), diallyl bisphenol compounds, and diallyl phthalate (DAP).
- the curing agents exemplified above may be used alone or in combination of two or more.
- the styrene-based polymer (C) is not particularly limited as long as it has an ethylene structural unit and a butylene structural unit in its molecule, the butylene structural unit accounts for 50 mol% or more of the total of the ethylene structural units and the butylene structural units, and is a solid styrene-based polymer at 25°C.
- Examples of the styrene-based polymer (C) include a styrene-based polymer that has the ethylene structural unit and the butylene structural unit in its molecule as described above, is solid at 25°C, and can be used as a resin contained in a resin composition used to form an insulating layer provided in a metal-clad laminate, a wiring board, or the like.
- the resin composition used to form an insulating layer provided in a metal-clad laminate, a wiring board, or the like may be a resin composition used to form a resin layer provided in a resin-coated film, a resin-coated metal foil, or the like, or may be a resin composition contained in a prepreg.
- the content of the butylene structural unit is 50 mol% or more, preferably 50 to 80 mol%, and more preferably 60 to 75 mol%, of the total of the ethylene structural units and the butylene structural units.
- the effect of the styrene-based polymer (C) i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition, can be more suitably exhibited.
- the styrene-based polymer (C) include a styrene-based polymer further containing a structural unit derived from a monomer containing styrene in the molecule.
- styrene-based copolymer examples include copolymers obtained by copolymerizing one or more of the styrene-containing monomers (styrene-based monomers) with one or more other monomers copolymerizable with the styrene-based monomer.
- the styrene-based copolymer may be a random copolymer or a block copolymer.
- Examples of the block copolymer include a binary copolymer of a structural unit (repeating unit) derived from the styrene-based monomer and a structural unit (repeating unit) derived from the other copolymerizable monomer, and a terpolymer of a structural unit (repeating unit) derived from the styrene-based monomer, a structural unit (repeating unit) derived from the other copolymerizable monomer, and a structural unit (repeating unit) derived from the styrene-based monomer.
- the styrene-based polymer (C) may be a hydrogenated styrene-based copolymer obtained by hydrogenating the styrene-based copolymer.
- the styrene-based polymer (C) is at least partially hydrogenated.
- the styrene-based monomer is not particularly limited, but examples include styrene, styrene derivatives, styrene in which some of the hydrogen atoms on the benzene ring have been substituted with alkyl groups, styrene in which some of the hydrogen atoms on the vinyl group have been substituted with alkyl groups, vinyltoluene, ⁇ -methylstyrene, butylstyrene, dimethylstyrene, and isopropenyltoluene. These styrene-based monomers may be used alone or in combination of two or more.
- the structural unit derived from the styrene-based monomer is not particularly limited, and examples thereof include a structural unit (repeating unit) represented by the following formula (15). That is, examples of the styrene-based polymer (C) include polymers having a structural unit represented by the following formula (15) in the molecule.
- R 5 to R 7 each independently represent a hydrogen atom or an alkyl group
- R 8 represents any group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group.
- the alkyl group is not particularly limited, and is preferably, for example, an alkyl group having 1 to 18 carbon atoms, and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
- the alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
- the styrene-based polymer (C) preferably contains at least one structural unit represented by formula (15), and may contain a combination of two or more different structural units represented by formula (15).
- the styrene-based polymer (C) may also contain a combination of a structural unit represented by formula (15) and a structural unit other than the structural unit represented by formula (15).
- the content of the structural units derived from the styrene-containing monomer is preferably 20% by mass or less, and more preferably 5 to 20% by mass, relative to the styrene-based polymer (C).
- the effect of the styrene-based polymer (C) i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition, can be more effectively achieved. This is thought to be due to the following: If the content of the structural units derived from the styrene-containing monomer is too high, it is thought that the reduction in the thermal expansion coefficient of the cured product of the resin composition cannot be fully achieved.
- the content of the structural units derived from the styrene-containing monomer is within the above range, it is thought that the effect of the styrene-based polymer (C) can be effectively achieved. Furthermore, it is preferable that the content of the structural units derived from the styrene-containing monomer be 20% by mass or less relative to the styrene-based polymer (C); however, if the content of the structural units derived from the styrene-containing monomer is too low, the ethylene structural units and butylene structures will be too high, making it difficult to achieve the effects of the styrene-based polymer (C), and therefore it is more preferable that the content be 5% by mass or more.
- the ethylene structural unit is not particularly limited, and examples thereof include those having an ethylene structure among the structural units (repeating units) derived from the other copolymerizable monomers.
- the ethylene structural unit is a structure derived from a 1,4-bond of a conjugated diene monomer (conjugated dienes), and the atom or group bonded to the carbon of the -C-C- bond of the main chain is a hydrogen atom or a methyl group.
- conjugated diene monomer examples include 1,3-butadiene, 2-methyl-1,3-butadiene (isoprene), 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 2-methyl-1,3-pentadiene, 1,3-hexadiene, and 1,3-cyclohexadiene.
- specific examples of the ethylene structural unit include structural units having an ethylene structure among the structural units derived from the conjugated dienes, and more specific examples include structural units (1,4-addition structural units) having an ethylene structure among structural units (repeating units) derived from 1,3-butadiene.
- Examples of the ethylene structural unit include structural units represented by the following formula (16) in which all of R 9 to R 12 are hydrogen atoms or methyl groups, structural units represented by the following formula (17) in which all of R 13 to R 20 are hydrogen atoms or methyl groups, and structural units represented by the following formula (18) in which all of R 21 to R 26 are hydrogen atoms or methyl groups. More specific examples of the ethylene structural unit include structural units represented by the following formula (22) and formulas (29) to (32).
- the butylene structural unit is not particularly limited, and examples thereof include those having a butylene structure among the structural units (repeating units) derived from the other copolymerizable monomers.
- the butylene structural unit is at least one of a structure derived from a 1,2-bond of a conjugated diene monomer (conjugated dienes) and a structure derived from a 3,4-bond of a conjugated diene monomer (conjugated dienes), and at least one of the atoms or groups bonded to the carbon of the -C-C- bond of the main chain is a side chain having two or more carbon atoms.
- the butylene structural unit include structural units having a butylene structure among the structural units derived from the conjugated dienes, and more specific examples include structural units having a butylene structure (at least one of a 1,2-addition structural unit and a 3,4-addition structural unit) among the structural units (repeating units) derived from 1,3-butadiene.
- the butylene structural unit may be, for example, a hydrogenated structural unit.
- Examples of the butylene structural unit include a structural unit represented by the following formula (16) in which at least one of R 9 to R 12 is a side chain having 2 or more carbon atoms, a structural unit represented by the following formula (17) in which at least one of R 13 to R 20 is a side chain having 2 or more carbon atoms, and a structural unit represented by the following formula (18) in which at least one of R 21 to R 26 is a side chain having 2 or more carbon atoms. More specific examples of the ethylene structural unit include structural units represented by the following formulas (23) to (28).
- the styrene-based polymer (C) contains, in its molecule, a first structural unit (ethylene structural unit) derived from a 1,4-bond of a conjugated diene monomer, and a second structural unit (butylene structural unit) of at least one of a structural unit derived from a 1,2-bond of a conjugated diene monomer and a structural unit derived from a 3,4-bond of a conjugated diene monomer, and the second structural unit accounts for 50 mol % or more of the total of the first structural unit and the second structural unit.
- R 9 to R 12 each independently represent a group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group.
- the alkyl group is not particularly limited, and is preferably, for example, an alkyl group having 1 to 18 carbon atoms, and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
- the alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
- R 9 to R 12 each independently represent a hydrogen atom or a methyl group.
- at least one of R 9 to R 12 represents a side chain having two or more carbon atoms, specifically, a group selected from the group consisting of an alkyl group, an alkenyl group, and an isopropenyl group having two or more carbon atoms.
- R 13 to R 20 each independently represent a group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group.
- the alkyl group is not particularly limited, and is preferably, for example, an alkyl group having 1 to 18 carbon atoms, and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
- the alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
- R 13 to R 20 each independently represent a hydrogen atom or a methyl group.
- at least one of R 13 to R 20 represents a side chain having two or more carbon atoms, specifically, a group selected from the group consisting of an alkyl group, an alkenyl group, and an isopropenyl group having two or more carbon atoms.
- R 21 to R 26 each independently represent a group selected from the group consisting of a hydrogen atom, an alkyl group, an alkenyl group, and an isopropenyl group.
- the alkyl group is not particularly limited, and is preferably, for example, an alkyl group having 1 to 18 carbon atoms, and more preferably an alkyl group having 1 to 10 carbon atoms. Specific examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
- the alkenyl group is preferably an alkenyl group having 1 to 10 carbon atoms.
- R 21 to R 26 each independently represent a hydrogen atom or a methyl group.
- at least one of R 21 to R 26 represents a side chain having two or more carbon atoms, specifically, a group selected from the group consisting of an alkyl group, an alkenyl group, and an isopropenyl group having two or more carbon atoms.
- examples of the structural unit represented by formula (15) include structural units represented by the following formulas (19) to (21). Furthermore, the structural unit represented by formula (15) may also be a structure in which the structural units represented by formulas (19) to (21) below are respectively repeated.
- the structural unit represented by the formula (16) includes structural units represented by the following formulas (22) to (28).
- the structural unit represented by the formula (16) may also be a structure in which the structural units represented by the following formulas (22) to (28) are respectively repeated.
- the structural unit represented by the formula (17) includes structural units represented by the following formulas (29) and (30).
- the structural unit represented by the formula (17) may also be a structure in which structural units represented by the following formulas (31) and (32) are respectively repeated.
- the structural unit represented by the formula (17) may be one of these alone or a combination of two or more different types.
- examples of the structural unit represented by formula (18) include structural units represented by the following formulas (31) and (32).
- the structural unit represented by formula (18) may also be a structure in which the structural units represented by formula (31) and formula (32) are respectively repeated.
- the structural unit represented by formula (18) may be one of these alone or a combination of two or more different types.
- the styrene polymer (C) may contain a structural unit derived from another copolymerizable monomer other than the ethylene structural unit and the butylene structural unit as the structural unit (repeating unit) derived from the other copolymerizable monomer.
- another copolymerizable monomer include, but are not limited to, olefins such as ⁇ -pinene, ⁇ -pinene, and dipentene, and non-conjugated dienes such as 1,4-hexadiene and 3-methyl-1,4-hexadiene.
- styrene-based polymer (C) examples include methylstyrene (ethylene/butylene) methylstyrene copolymer, methylstyrene (ethylene-ethylene/propylene) methylstyrene copolymer, styrene-isoprene copolymer, styrene-isoprene styrene copolymer, styrene (ethylene/butylene) styrene copolymer, styrene (ethylene-ethylene/propylene) styrene copolymer, styrene-butadiene styrene copolymer, and styrene (butadiene/butylene) styrene copolymer.
- methylstyrene (ethylene/butylene) methylstyrene copolymer examples include methylstyrene (ethylene/butylene) methyl
- the styrene-based polymer (C) may be a styrene-based polymer in which at least a portion of the styrene-based copolymer is hydrogenated.
- the styrene-based polymer (C) is preferably a styrene-based polymer in which at least a portion of the styrene-based polymer is acid-modified, and more preferably a styrene-based polymer in which at least a portion of the styrene-based polymer is acid-modified with maleic anhydride.
- the use of such an acid-modified styrene-based polymer can increase the glass transition temperature.
- the acid value of the styrene-based polymer (C) is preferably 2 mg CH 3 ONa/g or more, more preferably 2 to 10 mg CH 3 ONa/g.
- the styrene-based polymer (C) is preferably a styrene-based polymer acid-modified with maleic anhydride so as to have an acid value of 2 mg CH 3 ONa/g or more, and more preferably a styrene-based polymer acid-modified with maleic anhydride so as to have an acid value of 2 to 10 mg CH 3 ONa/g.
- the effect of the styrene-based polymer (C), i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition can be more suitably exhibited. More specifically, the effect of reducing the thermal expansion coefficient in a high temperature range (e.g., 210 to 260°C) can be more suitably exhibited. This is thought to be due to the increased compatibility of the styrene-based polymer (C) with the maleimide compound (A).
- the acid value is the amount (mg) of sodium methoxide (CH 3 ONa) required to neutralize the free acid in 1 g of sample.
- the styrene polymer (C) preferably has a weight-average molecular weight of 10,000 to 300,000, and more preferably 10,000 to 200,000. If the molecular weight is too low, the glass transition temperature of the cured product of the resin composition tends to decrease, and the heat resistance tends to decrease. If the molecular weight is too high, the viscosity of the resin composition when made into a varnish or when heated and molded tends to become too high.
- the weight-average molecular weight may be measured using a general molecular weight measurement method, and specific examples include values measured using gel permeation chromatography (GPC).
- the styrene-based polymer (C) may be any of the above-exemplified styrene-based polymers used alone or in combination of two or more.
- the resin composition may contain a maleimide compound (D) other than the maleimide compound (A).
- the maleimide compound (D) is not particularly limited as long as it is a maleimide compound other than the maleimide compound (A1), the maleimide compound (A2), and the maleimide compound (A3).
- the maleimide compound (D) is a maleimide compound that has a maleimide group in the molecule and does not have either the arylene structure bonded to the meta position or the indane structure in the molecule. Examples of the maleimide compound (D) include maleimide compounds having one or more maleimide groups in the molecule, and modified maleimide compounds.
- maleimide compound (D) examples include phenylmaleimide compounds such as 4,4'-diphenylmethane bismaleimide, phenylmethane maleimide, m-phenylene bismaleimide, bisphenol A diphenyl ether bismaleimide, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, and biphenylaralkyl polymaleimide compounds, as well as N-alkyl bismaleimide compounds having an aliphatic skeleton.
- phenylmaleimide compounds such as 4,4'-diphenylmethane bismaleimide, phenylmethane maleimide, m-phenylene bismaleimide, bisphenol A diphenyl ether bismaleimide, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl
- modified maleimide compound examples include modified maleimide compounds in which a portion of the molecule is modified with an amine compound, and modified maleimide compounds in which a portion of the molecule is modified with a silicone compound.
- maleimide compound (D) commercially available products may be used.
- the solid content of MIR-3000-70MT manufactured by Nippon Kayaku Co., Ltd., BMI-2300, BMI-4000, and BMI-5100 manufactured by Daiwa Kasei Kogyo Co., Ltd., BMI, BMI-70, and BMI-80 manufactured by K.I. Kasei Co., Ltd., and BMI-689, BMI-1500, BMI-3000J, and BMI-5000 manufactured by Designer Molecules Inc. may be used.
- the resin composition may contain an inorganic filler (E) as needed, as long as the effects of the present invention are not impaired. Furthermore, it is preferable to contain the inorganic filler (E) in order to improve the heat resistance, etc., of the cured product of the resin composition.
- the inorganic filler (E) is not particularly limited as long as it is an inorganic filler that can be used as an inorganic filler contained in a resin composition.
- Examples of the inorganic filler (E) include metal oxide fillers, metal hydroxide fillers, molybdate fillers, nitride fillers, titanate fillers, magnesium carbonate fillers such as anhydrous magnesium carbonate fillers, calcium carbonate fillers, quartz glass fillers, talc fillers, aluminum borate fillers, and barium sulfate fillers.
- Examples of the metal oxide fillers include silica fillers, alumina fillers, titanium oxide fillers, magnesium oxide fillers, and mica fillers.
- Examples of the silica fillers include crushed silica, spherical silica such as fused spherical silica, and silica particles.
- Examples of the metal hydroxide filler include magnesium hydroxide filler and aluminum hydroxide filler.
- Examples of the molybdate filler include zinc molybdate filler, calcium molybdate filler, and magnesium molybdate filler.
- Examples of the nitride filler include aluminum nitride filler and boron nitride filler.
- Examples of the titanate filler include barium titanate filler, strontium titanate filler, calcium titanate filler, and aluminum titanate filler.
- metal hydroxide fillers such as silica filler, magnesium hydroxide filler, and aluminum hydroxide filler, aluminum oxide filler, boron nitride filler, strontium titanate filler, calcium titanate filler, and zinc molybdate filler are preferred, with silica filler being more preferred.
- the inorganic fillers may be used alone or in combination of two or more. When two or more kinds of the inorganic fillers are used in combination, a silica filler may be used in combination with one or more inorganic fillers other than the silica filler, and a silica filler and a zinc molybdate filler are preferably used in combination.
- the inorganic filler may be, for example, a talc filler carrying molybdate in the molybdate filler.
- the inorganic filler (E) may be a surface-treated or untreated inorganic filler.
- Examples of the surface treatment include treatment with a silane coupling agent.
- the silane coupling agent is not particularly limited, and examples include silane coupling agents having at least one functional group selected from the group consisting of vinyl groups, styryl groups, methacryloyl groups, acryloyl groups, phenylamino groups, isocyanurate groups, ureido groups, mercapto groups, isocyanate groups, epoxy groups, and acid anhydride groups.
- this silane coupling agent has at least one reactive functional group selected from vinyl groups, styryl groups, methacryloyl groups, acryloyl groups, phenylamino groups, isocyanurate groups, ureido groups, mercapto groups, isocyanate groups, epoxy groups, and acid anhydride groups, and further includes compounds having a hydrolyzable group such as a methoxy group or an ethoxy group.
- the silane coupling agent has a vinyl group, and examples thereof include vinyltriethoxysilane and vinyltrimethoxysilane.
- the silane coupling agent has a styryl group, and examples thereof include p-styryltrimethoxysilane and p-styryltriethoxysilane.
- the silane coupling agent has a methacryloyl group, and examples thereof include 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, and 3-methacryloxypropylethyldiethoxysilane.
- the silane coupling agent has an acryloyl group, and examples thereof include 3-acryloxypropyltrimethoxysilane and 3-acryloxypropyltriethoxysilane.
- Examples of the silane coupling agent include those having a phenylamino group, such as N-phenyl-3-aminopropyltrimethoxysilane and N-phenyl-3-aminopropyltriethoxysilane.
- the average particle size of the inorganic filler (E) is not particularly limited, but is preferably 0.05 to 10 ⁇ m, and more preferably 0.1 to 8 ⁇ m. Note that the average particle size here refers to the volume average particle size.
- the volume average particle size can be measured, for example, by laser diffraction.
- the content of the styrene polymer (C) is 12% by mass or more, preferably 12 to 40% by mass, more preferably 12 to 30% by mass, and even more preferably 12 to 25% by mass, based on the total amount of the maleimide compound (A), the curing agent (B), and the styrene polymer (C), ...
- the content of the maleimide compound (A) is preferably 20 to 50 mass %, and more preferably 25 to 45 mass %, of the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
- the content of the curing agent (B) is preferably 5 to 40 mass% and more preferably 5 to 30 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
- the resin composition may contain the maleimide compound (D).
- the total content of the maleimide compound (A) and the maleimide compound (D) is preferably 20 to 60% by mass, and more preferably 30 to 55% by mass, based on the total of the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D).
- the resin composition may contain the inorganic filler (E).
- the content of the inorganic filler (E) is preferably 100 to 300 parts by mass, and more preferably 100 to 250 parts by mass, per 100 parts by mass of the organic components (other than the inorganic filler (E) in the resin composition).
- the content of the inorganic filler (E) is preferably 100 to 300 parts by mass, and more preferably 100 to 250 parts by mass, per 100 parts by mass of the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
- the inclusion of the inorganic filler is preferable in terms of increasing the glass transition temperature and storage modulus of the resin composition.
- the resin composition may contain components (other components) other than the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C), as long as the effects of the present invention are not impaired.
- the resin composition may contain the maleimide compound (D) and the inorganic filler (E) as the other components.
- the other components include, in addition to the maleimide compound (D) and the inorganic filler (E), organic components other than the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D), flame retardants, reaction initiators, curing accelerators, catalysts, polymerization retarders, polymerization inhibitors, dispersants, leveling agents, coupling agents, defoamers, antioxidants, heat stabilizers, antistatic agents, UV absorbers, dyes and pigments, and additives such as lubricants.
- organic components other than the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D) flame retardants, reaction initiators, curing accelerators, catalysts, polymerization retarders, polymerization inhibitors, dispersants, leveling agents, coupling agents, defoamers, antioxidants, heat stabilizers, antistatic agents, UV absorbers, dyes
- the resin composition according to this embodiment may contain organic components other than the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D).
- the organic components may be, for example, compounds that react with at least one of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C), or compounds that do not react with them.
- Specific examples of the organic components include oxazine compounds other than the oxazine compound (B1) (other oxazine compounds), epoxy compounds, cyanate ester compounds, and active ester compounds.
- the other oxazine compounds are not particularly limited as long as they have an oxazine group in the molecule and are oxazine compounds other than the oxazine compound (B1).
- the other oxazine compounds include benzoxazine compounds having a phenolphthalein structure in the molecule (phenolphthalein-type benzoxazine compounds), bisphenol F-type benzoxazine compounds, and diaminodiphenylmethane (DDM)-type benzoxazine compounds.
- oxazine compounds include 3,3'-(methylene-1,4-diphenylene)bis(3,4-dihydro-2H-1,3-benzoxazine) (P-d-type benzoxazine compound) and 2,2-bis(3,4-dihydro-2H-3-phenyl-1,3-benzoxazine)methane (F-a-type benzoxazine compound).
- the epoxy compound is a compound that has an epoxy group in its molecule, and specific examples include bisphenol-type epoxy compounds such as bisphenol A-type epoxy compounds, phenol novolac-type epoxy compounds, cresol novolac-type epoxy compounds, dicyclopentadiene-type epoxy compounds, bisphenol A novolac-type epoxy compounds, biphenyl aralkyl-type epoxy compounds, polybutadiene compounds that have an epoxy group in their molecule, and naphthalene ring-containing epoxy compounds.
- the epoxy compound also includes epoxy resins, which are polymers of the above epoxy compounds.
- the cyanate ester compound is a compound having a cyanate group in the molecule, and examples include 2,2-bis(4-cyanatephenyl)propane, bis(3,5-dimethyl-4-cyanatephenyl)methane, and 2,2-bis(4-cyanatephenyl)ethane.
- the active ester compound is a compound having a highly reactive ester group in the molecule, and examples include benzenecarboxylic acid active ester, benzenedicarboxylic acid active ester, benzenetricarboxylic acid active ester, benzenetetracarboxylic acid active ester, naphthalenecarboxylic acid active ester, naphthalenedicarboxylic acid active ester, naphthalenetricarboxylic acid active ester, naphthalenetetracarboxylic acid active ester, fluorenecarboxylic acid active ester, fluorenedicarboxylic acid active ester, fluorenetricarboxylic acid active ester, and fluorenetetracarboxylic acid active ester.
- the resin composition according to this embodiment may contain a flame retardant.
- a flame retardant By including a flame retardant, the flame retardancy of the cured resin composition can be enhanced.
- the flame retardant is not particularly limited. Specifically, in fields where halogen-based flame retardants such as bromine-based flame retardants are used, preferred examples include ethylene dipentabromobenzene, ethylene bistetrabromoimide, decabromodiphenyl oxide, tetradecabromodiphenoxybenzene, and bromostyrene-based compounds that react with the polymerizable compounds, all of which have melting points of 300°C or higher.
- a halogen-based flame retardant can suppress the elimination of halogens at high temperatures, thereby preventing a decrease in heat resistance.
- phosphorus-containing flame retardants phosphorus-based flame retardants
- the phosphorus-based flame retardant is not particularly limited, but examples thereof include phosphate ester-based flame retardants, phosphazene-based flame retardants, bisdiphenylphosphine oxide-based flame retardants, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (DOPO)-based flame retardants, and phosphinate-based flame retardants.
- DOPO 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide
- phosphate ester-based flame retardants include condensed phosphate esters of dixylenyl phosphate.
- phosphazene-based flame retardants include phenoxyphosphazene.
- bisdiphenylphosphine oxide-based flame retardants include xylylenebisdiphenylphosphine oxide.
- DOPO-based flame retardants include hydrocarbons having two DOPO groups in the molecule (DOPO derivative compounds) and DOPO having a reactive functional group.
- phosphinate-based flame retardants include metal phosphinates of aluminum dialkylphosphinates. As the flame retardant, each of the exemplified flame retardants may be used alone or in combination of two or more.
- the resin composition according to this embodiment may contain a reaction initiator.
- the reaction initiator is not particularly limited as long as it can accelerate the curing reaction of the resin composition, and examples thereof include peroxides and organic azo compounds.
- peroxides include ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene (PBP), 2,5-dimethyl-2,5-di(t-butylperoxy)-3-hexyne, and benzoyl peroxide.
- organic azo compounds include azobisisobutyronitrile. If necessary, a metal carboxylate or the like can be used in combination. This further accelerates the curing reaction.
- ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene is preferred. Because ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene has a relatively high reaction initiation temperature, it can suppress acceleration of the curing reaction when curing is not required, such as during prepreg drying, thereby suppressing a decrease in the shelf life of the resin composition. Furthermore, ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene has low volatility and does not evaporate during prepreg drying or storage, providing good stability. Furthermore, the reaction initiators may be used alone or in combination of two or more.
- the resin composition according to this embodiment may contain a curing accelerator.
- the curing accelerator is not particularly limited as long as it can accelerate the curing reaction of the resin composition.
- Specific examples of the curing accelerator include imidazoles and their derivatives, organophosphorus compounds, amines such as secondary amines and tertiary amines, quaternary ammonium salts, organoboron compounds, and metal soaps.
- Examples of the imidazoles include 2-ethyl-4-methylimidazole (2E4MZ), 2-methylimidazole, 2-phenyl-4-methylimidazole, 2-phenylimidazole, and 1-benzyl-2-methylimidazole.
- organophosphorus compounds include triphenylphosphine, diphenylphosphine, phenylphosphine, tributylphosphine, and trimethylphosphine.
- organophosphorus compounds include triphenylphosphine, diphenylphosphine, phenylphosphine, tributylphosphine, and trimethylphosphine.
- amines include dimethylbenzylamine, triethylenediamine, triethanolamine, and 1,8-diaza-bicyclo(5,4,0)undecene-7 (DBU).
- DBU 1,8-diaza-bicyclo(5,4,0)undecene-7
- quaternary ammonium salts include tetrabutylammonium bromide.
- organoboron compounds examples include tetraphenylboron salts such as 2-ethyl-4-methylimidazole tetraphenylborate, and tetra-substituted phosphonium tetra-substituted borates such as tetraphenylphosphonium ethyltriphenylborate.
- the metal soap refers to a fatty acid metal salt, and may be either a linear fatty acid metal salt or a cyclic fatty acid metal salt. Specific examples of the metal soap include linear fatty acid metal salts and cyclic fatty acid metal salts having 6 to 10 carbon atoms.
- examples include aliphatic metal salts composed of linear fatty acids such as stearic acid, lauric acid, ricinoleic acid, and octylic acid, or cyclic fatty acids such as naphthenic acid, and metals such as lithium, magnesium, calcium, barium, copper, and zinc.
- linear fatty acids such as stearic acid, lauric acid, ricinoleic acid, and octylic acid
- cyclic fatty acids such as naphthenic acid
- metals such as lithium, magnesium, calcium, barium, copper, and zinc.
- zinc octylate is one example.
- the curing accelerators may be used alone or in combination of two or more.
- the resin composition according to this embodiment may contain a silane coupling agent.
- the silane coupling agent may be contained in the resin composition, or may be contained as a silane coupling agent that has been pre-surface-treated on an inorganic filler contained in the resin composition.
- the silane coupling agent is preferably contained as a silane coupling agent that has been pre-surface-treated on an inorganic filler. It is more preferable to contain the silane coupling agent as a silane coupling agent that has been pre-surface-treated on an inorganic filler, and further to contain the silane coupling agent in the resin composition.
- the silane coupling agent may be contained as a silane coupling agent that has been pre-surface-treated on a fibrous base material.
- the silane coupling agent include the same silane coupling agents as those used to surface-treat the inorganic filler, as described above.
- the resin composition according to this embodiment is a resin composition that produces a cured product with a low coefficient of thermal expansion. As a result, wiring boards equipped with an insulating layer formed using the resin composition according to this embodiment are less likely to warp.
- the resin composition is used to produce a prepreg, as described below, and also to form a resin layer provided in a resin-coated metal foil and a resin-coated film, and an insulating layer provided in a metal-clad laminate and a wiring board.
- the method for producing the resin composition is not particularly limited, and examples thereof include a method of mixing the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and, if necessary, components other than the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C) so as to achieve a predetermined content, etc.
- the method described below, etc. can be used.
- prepregs, metal-clad laminates, wiring boards, resin-coated metal foils, and resin-coated films can be obtained as follows.
- FIG. 1 is a schematic cross-sectional view showing an example of a prepreg 1 according to an embodiment of the present invention.
- the prepreg 1 comprises the resin composition or a semi-cured resin composition 2, and a fibrous base material 3.
- This prepreg 1 comprises the resin composition or a semi-cured resin composition 2, and the fibrous base material 3 present in the resin composition or the semi-cured resin composition 2.
- a semi-cured product refers to a resin composition that has been partially cured to the extent that it can be further cured.
- a semi-cured product is a resin composition that has been semi-cured (B-staged). For example, when a resin composition is heated, the viscosity initially gradually decreases, and then curing begins, causing the viscosity to gradually increase. In such a case, semi-cured refers to the state between when the viscosity begins to increase and when the composition is completely cured.
- the prepreg obtained using the resin composition according to this embodiment may comprise a semi-cured product of the resin composition as described above, or may comprise the uncured resin composition itself. That is, it may be a prepreg comprising a semi-cured product of the resin composition (the resin composition in B stage) and a fibrous base material, or a prepreg comprising the resin composition before curing (the resin composition in A stage) and a fibrous base material. Furthermore, the resin composition or semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried.
- the resin composition 2 When producing the prepreg, the resin composition 2 is often prepared in a varnish form and used to impregnate the fibrous base material 3, which is the base material for forming the prepreg.
- the resin composition 2 is usually a resin varnish prepared in a varnish form.
- a varnish-like resin composition (resin varnish) is prepared, for example, as follows.
- each component that is soluble in an organic solvent is added to the organic solvent and dissolved. Heating may be used if necessary. Then, any components that are insoluble in the organic solvent are added as needed, and the mixture is dispersed using a ball mill, bead mill, planetary mixer, roll mill, or the like until the desired dispersion state is achieved, thereby preparing a varnish-like resin composition.
- the organic solvent used here is not particularly limited, as long as it dissolves the organic components and resin components in the resin composition and does not inhibit the curing reaction. Specific examples include toluene and methyl ethyl ketone (MEK).
- the fibrous substrate include glass cloth, aramid cloth, polyester cloth, glass nonwoven fabric, aramid nonwoven fabric, polyester nonwoven fabric, pulp paper, and linter paper. Using glass cloth results in a laminate with excellent mechanical strength, and flattened glass cloth is particularly preferred.
- Specific examples of the flattening process include a method in which glass cloth is continuously pressed with a press roll at an appropriate pressure to compress the yarns flat.
- the thickness of commonly used fibrous substrates is, for example, 0.01 mm or more and 0.3 mm or less.
- the glass fibers constituting the glass cloth are not particularly limited, but examples include Q glass, NE glass, E glass, S glass, T glass, L glass, and L2 glass.
- the surface of the fibrous substrate may be treated with a silane coupling agent.
- the silane coupling agent is not particularly limited, but examples include silane coupling agents having at least one group selected from the group consisting of vinyl groups, acryloyl groups, methacryloyl groups, styryl groups, amino groups, and epoxy groups in the molecule.
- the method for producing the prepreg is not particularly limited, as long as it is capable of producing the prepreg.
- the resin composition according to the present embodiment described above is often prepared in the form of a varnish, as described above, and used as a resin varnish.
- Specific methods for producing prepreg 1 include impregnating fibrous base material 3 with resin composition 2, for example, resin composition 2 prepared in the form of a varnish, and then drying.
- resin composition 2 is impregnated into the fibrous base material 3 by immersion, coating, or the like. Impregnation can be repeated multiple times as needed. Furthermore, by repeating the impregnation process using multiple resin compositions with different compositions and concentrations, it is possible to adjust the final composition and impregnation amount to the desired level.
- the fibrous substrate 3 impregnated with the resin composition (resin varnish) 2 is heated under the desired heating conditions, for example, at 40°C to 180°C for 1 minute to 10 minutes.
- a prepreg 1 in an uncured (A-stage) or semi-cured (B-stage) state is obtained.
- the organic solvent can be volatilized from the resin varnish, reducing or eliminating the organic solvent.
- FIG. 2 is a schematic cross-sectional view showing an example of a metal-clad laminate 11 according to an embodiment of the present invention.
- the metal-clad laminate 11 has an insulating layer 12 containing a cured product of the resin composition and a metal foil 13 disposed on the insulating layer 12.
- the metal-clad laminate 11 include a metal-clad laminate composed of an insulating layer 12 containing a cured product of the prepreg 1 shown in FIG. 1 and a metal foil 13 laminated together with the insulating layer 12.
- the insulating layer 12 may be composed of either a cured product of the resin composition or a cured product of the prepreg.
- the thickness of the metal foil 13 varies depending on the performance required of the final wiring board and is not particularly limited.
- the thickness of the metal foil 13 can be appropriately set depending on the desired purpose, and is preferably 0.2 to 70 ⁇ m, for example.
- Examples of the metal foil 13 include copper foil and aluminum foil. If the metal foil is thin, it may be a carrier-supported copper foil equipped with a release layer and carrier to improve handling.
- the method for manufacturing the metal-clad laminate 11 is not particularly limited, as long as it can be used to manufacture the metal-clad laminate 11.
- a method for manufacturing the metal-clad laminate 11 using the prepreg 1 is exemplified. This method involves stacking one or more prepregs 1, then stacking a metal foil 13 such as copper foil on both sides or one side of the prepreg 1, and then heat-pressing and molding the metal foil 13 and the prepreg 1 to form an integrated laminate.
- the metal-clad laminate 11 is obtained by laminating the metal foil 13 on the prepreg 1 and then heat-pressing and molding the laminate.
- the heat-pressing conditions can be appropriately set depending on the thickness of the metal-clad laminate 11, the type of resin composition contained in the prepreg 1, and other factors.
- the temperature can be 170 to 230°C
- the pressure can be 2 to 7 MPa
- the time can be 60 to 150 minutes.
- the metal-clad laminate may also be manufactured without using a prepreg. For example, a method may be used in which a varnish-like resin composition is applied to a metal foil, a layer containing the resin composition is formed on the metal foil, and then heating and pressurizing is performed.
- FIG. 3 is a schematic cross-sectional view showing an example of a wiring board 21 according to an embodiment of the present invention.
- the wiring board 21 has an insulating layer 12 containing a cured product of the resin composition, and wiring 14 provided on the insulating layer 12.
- Examples of the wiring board 21 include a wiring board composed of an insulating layer 12 formed by curing the prepreg 1 shown in FIG. 1, and wiring 14 laminated together with the insulating layer 12 and formed by partially removing the metal foil 13.
- the insulating layer 12 may be made of a cured product of the resin composition, or a cured product of the prepreg.
- the method for manufacturing the wiring board 21 is not particularly limited, as long as it can be used to manufacture the wiring board 21.
- Specific examples include a method of manufacturing the wiring board 21 using the prepreg 1.
- Examples of this method include a method of manufacturing the wiring board 21 in which wiring is provided as a circuit on the surface of the insulating layer 12 by etching the metal foil 13 on the surface of the metal-clad laminate 11 manufactured as described above. That is, the wiring board 21 is obtained by forming a circuit by partially removing the metal foil 13 on the surface of the metal-clad laminate 11.
- other methods for forming circuits include circuit formation using a semi-additive process (SAP) or a modified semi-additive process (MSAP).
- FIG. 4 is a schematic cross-sectional view showing an example of a resin-coated metal foil 31 according to this embodiment.
- the resin-coated metal foil 31 comprises a resin layer 32 containing the resin composition or a semi-cured product of the resin composition, and a metal foil 13.
- This resin-coated metal foil 31 has the metal foil 13 on the surface of the resin layer 32. That is, this resin-coated metal foil 31 comprises the resin layer 32 and the metal foil 13 laminated together with the resin layer 32.
- the resin-coated metal foil 31 may also comprise another layer between the resin layer 32 and the metal foil 13.
- the resin layer 32 may contain a semi-cured product of the resin composition as described above, or may contain the uncured resin composition. That is, the resin-coated metal foil 31 may comprise a resin layer containing a semi-cured product of the resin composition (the resin composition in B stage) and a metal foil, or may be a resin-coated metal foil comprising a resin layer containing the resin composition before curing (the resin composition in A stage) and a metal foil. Furthermore, the resin layer only needs to contain the resin composition or a semi-cured product of the resin composition, and may or may not contain a fibrous substrate. Furthermore, the resin composition or the semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried. Furthermore, the fibrous substrate can be the same as the fibrous substrate of a prepreg.
- the metal foil can be any metal foil used in metal-clad laminates or resin-coated metal foils, without limitation.
- Examples of the metal foil include copper foil and aluminum foil.
- the resin-coated metal foil 31 may be provided with a cover film or the like, if necessary.
- a cover film By providing a cover film, it is possible to prevent the intrusion of foreign matter.
- the cover film is not particularly limited, but examples include polyolefin film, polyester film, polymethylpentene film, and films formed by providing these films with a release agent layer.
- the method for producing the resin-coated metal foil 31 is not particularly limited, as long as it can produce the resin-coated metal foil 31.
- methods for producing the resin-coated metal foil 31 include a method in which the varnish-like resin composition (resin varnish) is applied to the metal foil 13 and heated.
- the varnish-like resin composition is applied to the metal foil 13 using, for example, a bar coater.
- the applied resin composition is heated, for example, at a temperature of 40°C to 180°C for 0.1 to 10 minutes.
- the heated resin composition is formed on the metal foil 13 as an uncured resin layer 32. Note that the heating volatilizes the organic solvent from the resin varnish, thereby reducing or removing the organic solvent.
- FIG. 5 is a schematic cross-sectional view showing an example of a resin-coated film 41 according to this embodiment.
- the resin-coated film 41 comprises a resin layer 42 containing the resin composition or a semi-cured product of the resin composition, and a support film 43.
- This resin-coated film 41 comprises the resin layer 42 and the support film 43 laminated together with the resin layer 42.
- the resin-coated film 41 may also comprise another layer between the resin layer 42 and the support film 43.
- the resin layer 42 may contain a semi-cured product of the resin composition as described above, or may contain the uncured resin composition. That is, the resin-coated film 41 may comprise a resin layer containing a semi-cured product of the resin composition (the resin composition in B-stage) and a support film, or may be a resin-coated film comprising a resin layer containing the resin composition before curing (the resin composition in A-stage) and a support film.
- the resin layer may contain the resin composition or a semi-cured product of the resin composition, and may or may not contain a fibrous substrate.
- the resin composition or the semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried.
- the fibrous substrate may be the same as the fibrous substrate of a prepreg.
- the support film 43 can be any support film used for resin-coated films, without limitation.
- support films include electrically insulating films such as polyester film, polyethylene terephthalate (PET) film, polyimide film, polyparabanic acid film, polyether ether ketone film, polyphenylene sulfide film, polyamide film, polycarbonate film, and polyarylate film.
- the resin-coated film 41 may be provided with a cover film or the like, if necessary. By providing a cover film, it is possible to prevent the intrusion of foreign matter.
- the cover film is not particularly limited, but examples include polyolefin film, polyester film, and polymethylpentene film.
- the support film and cover film may be subjected to surface treatments such as matte treatment, corona treatment, release treatment, and roughening treatment, as needed.
- the method for producing the resin-coated film 41 is not particularly limited as long as it can produce the resin-coated film 41.
- methods for producing the resin-coated film 41 include a method in which the varnish-like resin composition (resin varnish) is applied to a support film 43 and heated.
- the varnish-like resin composition is applied to the support film 43 using, for example, a bar coater.
- the applied resin composition is heated, for example, at a temperature of 40°C to 180°C for 0.1 minutes to 10 minutes.
- the heated resin composition is formed on the support film 43 as an uncured resin layer 42. The heating volatilizes the organic solvent from the resin varnish, thereby reducing or eliminating the organic solvent.
- the resin composition according to this embodiment is a resin composition that yields a cured product with a low thermal expansion coefficient.
- a prepreg comprising the resin composition or a semi-cured product of the resin composition is a prepreg that yields a cured product with a low thermal expansion coefficient.
- Resin-coated metal foils and resin-coated films that include a resin layer containing the resin composition or a semi-cured product of the resin composition are resin-coated metal foils and resin-coated films that include a resin layer that yields an insulating layer containing a cured product with a low thermal expansion coefficient.
- Metal-clad laminates and wiring boards that include an insulating layer containing a cured product of the resin composition are metal-clad laminates and wiring boards that include an insulating layer containing a cured product with a low thermal expansion coefficient.
- the prepregs, resin-coated metal foils, resin-coated films, and metal-clad laminates can be suitably used to manufacture wiring boards that include an insulating layer containing a cured product with a low thermal expansion coefficient.
- the prepregs, resin-coated metal foils, resin-coated films, and metal-clad laminates can also be used, for example, to manufacture multilayer wiring boards.
- a multilayer wiring board can be produced, for example, by laminating it on a wiring board and then peeling off the support film, or by laminating it on a wiring board after peeling off the support film.
- a multilayer wiring board can be produced, for example, by laminating it on a wiring board. In this way, by using the resin-coated film and resin-coated metal foil, etc., a multilayer wiring board having an insulating layer containing a cured material with a low thermal expansion coefficient can be produced.
- a wiring board obtained using the prepreg, the resin-coated metal foil, the resin-coated film, and a metal-clad laminate has an insulating layer containing a cured material with a low thermal expansion coefficient.
- the resin composition according to a first aspect of the present invention comprises a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner; a curing agent (B) having in its molecule a carbon-carbon unsaturated bond; and a styrene-based polymer (C) that has in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, and is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more.
- the resin composition according to the second aspect of the present invention is the resin composition according to the first aspect of the present invention, wherein the styrene-based polymer (C) contains 20% by mass or less of structural units derived from a monomer containing styrene.
- the resin composition according to the third aspect of the present invention is the resin composition according to the first or second aspect of the present invention, further comprising a maleimide compound (D) other than the maleimide compound (A).
- a resin composition according to a fourth aspect of the present invention is a resin composition according to any one of the first to third aspects of the present invention, in which the content of the styrene polymer (C) is 20 to 60 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene polymer (C).
- a resin composition according to a fifth aspect of the present invention is a resin composition according to any one of the first to fourth aspects of the present invention, in which the content of the maleimide compound (A) is 20 to 50 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
- a resin composition according to a sixth aspect of the present invention is a resin composition according to any one of the first to fifth aspects of the present invention, in which the content of the curing agent (B) is 5 to 40 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
- a resin composition according to a seventh aspect of the present invention is the resin composition according to any one of the first to sixth aspects of the present invention, wherein the styrene polymer (C) has an acid value of 2 mg CH 3 ONa/g or more.
- the resin composition according to an eighth aspect of the present invention is a resin composition according to any one of the first to seventh aspects of the present invention, wherein the maleimide compound (A) contains a maleimide compound (A1-1) having a structure represented by formula (1) in the molecule as the indane structure.
- a resin composition according to a ninth aspect of the present invention is a resin composition according to any one of the first to seventh aspects of the present invention, in which the maleimide compound (A) contains a maleimide compound (A2-1) represented by the formula (2).
- a resin composition according to a tenth aspect of the present invention is a resin composition according to any one of the first to ninth aspects of the present invention, wherein the curing agent (B) includes at least one selected from the group consisting of a benzoxazine compound (B1) having an alkenyl group in the molecule, a hydrocarbon compound (B2) having a carbon-carbon unsaturated double bond in the molecule, and a polybutadiene compound (B3) having an epoxy group in the molecule.
- the curing agent (B) includes at least one selected from the group consisting of a benzoxazine compound (B1) having an alkenyl group in the molecule, a hydrocarbon compound (B2) having a carbon-carbon unsaturated double bond in the molecule, and a polybutadiene compound (B3) having an epoxy group in the molecule.
- the resin composition according to an eleventh aspect of the present invention is the resin composition according to the tenth aspect of the present invention, wherein the hydrocarbon compound (B2) contains a hydrocarbon compound (B-2) represented by the formula (3).
- the resin composition according to the twelfth aspect of the present invention is a resin composition according to any one of the first to eleventh aspects of the present invention, further comprising an inorganic filler (E).
- the prepreg according to the thirteenth aspect of the present invention is a prepreg comprising a resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a fibrous base material.
- the resin-coated film according to the fourteenth aspect of the present invention is a resin-coated film comprising a resin layer containing the resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a support film.
- the resin-coated metal foil according to the fifteenth aspect of the present invention is a resin-coated metal foil comprising a resin layer containing the resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a metal foil.
- the metal-clad laminate according to the sixteenth aspect of the present invention is a metal-clad laminate comprising an insulating layer containing a cured product of the resin composition according to any one of the first to twelfth aspects of the present invention, and a metal foil.
- the metal-clad laminate according to the seventeenth aspect of the present invention is a metal-clad laminate comprising an insulating layer containing a cured product of the prepreg according to the thirteenth aspect of the present invention and a metal foil.
- the wiring board according to the eighteenth aspect of the present invention is a wiring board comprising an insulating layer containing a cured product of the resin composition according to any one of the first to twelfth aspects of the present invention, and wiring.
- the wiring board according to the 19th aspect of the present invention is a wiring board comprising an insulating layer containing a cured product of the prepreg according to the 13th aspect of the present invention, and wiring.
- the present invention provides a resin composition that produces a cured product with a low coefficient of thermal expansion.
- the present invention also provides prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are produced using the resin composition.
- Maleimide compound 1 A maleimide compound having an arylene structure substituted at the meta position in the molecule (solid content in MIR-5000-60T (a toluene solution of a maleimide compound) manufactured by Nippon Kayaku Co., Ltd., a maleimide compound represented by the formula (6) above, maleimide equivalent: 260 g/mol)
- Maleimide compound 2 A maleimide compound having an indane structure and an arylene structure bonded to the meta position in the molecule (solid content in NE-X-9470S manufactured by DIC Corporation, a maleimide compound represented by the formula (7)).
- Hydrocarbon compound A hydrocarbon compound represented by the formula (13).
- the solvent was distilled off under heating and reduced pressure to obtain 13 parts by mass of a liquid olefin compound having a styrene structure as a functional group (Mn: 432, Mw: 575).
- the repeating unit d was 1.7. Furthermore, in the 1 H-NMR data (DMSO-d 6 ) of the obtained compound, signals derived from vinyl groups were observed at 5.10-5.30 ppm, 5.50-5.85 ppm, and 6.60-6.80 ppm.
- the resulting compound was the hydrocarbon compound represented by formula (13).
- the weight average molecular weight (Mw) and number average molecular weight (Mn) used in Synthesis Example 1 and Synthesis Example 2 were determined by the following analytical method.
- GPC DGU-20A3R, LC-20AD, SIL-20AHT, RID-20A, SPD-20A, CTO-2, CBM-20A (all manufactured by Shimadzu Corporation)
- Benzoxazine compound a benzoxazine compound having an allyl group in the molecule (a benzoxazine compound represented by the formula (12) above, in which R3 and R4 are allyl groups, X is a methylene group, and b and c are 1, ALPd manufactured by Shikoku Chemicals Corporation).
- Epoxidized polybutadiene a polybutadiene compound having an epoxy group in the molecule (JP-100 manufactured by Nippon Soda Co., Ltd., an epoxidized polybutadiene in which an epoxy group has been introduced by oxidizing the vinyl group of 1,2-polybutadiene; oxirane oxygen concentration: 7.7% by mass)
- P1500 styrene-based polymer (Tuftec P1500 manufactured by Asahi Kasei Corporation,
- PBP ⁇ , ⁇ '-di(t-butylperoxy)diisopropylbenzene (PBP) (Perbutyl P manufactured by NOF Corporation)
- Silica Silica particles surface-treated with a silane coupling agent having a phenylamino group in the molecule (SC2500-SXJ manufactured by Admatechs Co., Ltd.)
- Zinc molybdate Zinc molybdate filler (Z4SX-A1 manufactured by Admatechs Co., Ltd.)
- prepreg was obtained as follows:
- the resulting varnish was impregnated into a fibrous substrate (glass cloth: #2118 type T-glass manufactured by Nitto Boseki Co., Ltd.), which was then heated and dried at 130°C for 3 minutes to produce a prepreg.
- the content of the components that make up the resin through the curing reaction (resin content) relative to the prepreg was adjusted to approximately 43% by mass. Furthermore, the thickness after curing was adjusted to be 103 ⁇ m.
- the evaluation substrate metal-clad laminate
- the evaluation substrate was obtained as follows.
- the evaluation substrate prepared as described above was evaluated using the method described below.
- Tg Glass transition temperature
- the copper foil was removed from the evaluation substrate (metal-clad laminate) by etching to prepare an unclad plate, which was used as a test specimen.
- the Tg of the cured resin composition was measured using a Seiko Instruments Inc. viscoelasticity spectrometer "DMS6100.”
- Dynamic mechanical analysis (DMA) was performed using a bending module at a frequency of 10 Hz.
- the temperature at which tan ⁇ reached a maximum when the temperature was increased from room temperature to 340°C at a heating rate of 5°C/min was defined as Tg (°C).
- a glass transition temperature of 270°C or higher was deemed to be "passed.”
- Thermal expansion coefficient (50 to 100°C) An unclad plate obtained by etching the copper foil from the evaluation substrate (metal-clad laminate) was used as a test specimen.
- the thermal expansion coefficient in the plane direction (tensile direction, Y direction) of the evaluation substrate at a temperature below the glass transition temperature of the cured resin composition was measured by the TMA method (thermo-mechanical analysis). Specifically, a TMA device ("TMA6000" manufactured by SII NanoTechnology Inc.) was used for the measurement in compression mode.
- the test specimen was pulled in the Y direction with a load of 10 g, and the temperature was raised from 30 ° C to 320 ° C at a heating rate of 10 ° C / min, and then cooled to room temperature. Then, the test specimen was pulled in the Y direction with a load of 10 g, and the temperature was raised from 30 ° C to 320 ° C at a heating rate of 10 ° C / min. A temperature displacement chart was obtained during this temperature increase. The average thermal expansion coefficient from 50 to 100 ° C was calculated from the temperature displacement chart obtained at this time. The lower this average coefficient of thermal expansion (Y-CTE 50-100°C), the better the result. In this test, a value of 4.0 ppm/°C or less was judged to be "pass.”
- the metal foil (copper foil) was peeled off from the evaluation substrate (metal-clad laminate), and the peel strength at this time was measured in accordance with JIS C 6481 (1996). Specifically, the copper foil was peeled off from the evaluation substrate at a rate of 50 mm/min using a tensile tester, and the peel strength at this time (N/mm) was measured.
- the present invention provides a resin composition that produces a cured product with a low coefficient of thermal expansion.
- the present invention also provides prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are produced using the resin composition.
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Abstract
Description
本発明は、樹脂組成物、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及び配線板に関する。 The present invention relates to a resin composition, a prepreg, a resin-coated film, a resin-coated metal foil, a metal-clad laminate, and a wiring board.
各種電子機器は、情報処理量の増大及び情報通信の高速化等に伴い、搭載される半導体デバイスの、高集積化、配線の高密度化、及び多層化等の実装技術が進展している。また、各種電子機器に用いられる配線板としては、例えば、ネットワーク機器、サーバ、及びAI(人工知能)プロセッサ等の通信インフラ機器用途におけるサーバ基板及び車載用途におけるミリ波レーダ基板等の、高周波対応の配線板であることが求められる。各種電子機器において用いられる配線板の絶縁層を構成するための基板材料には、信号の伝送速度を高め、信号伝送時の損失を低減させるために、比誘電率及び誘電正接が低いことが求められる。このような配線板の絶縁層を構成するための基板材料としては、例えば、特許文献1及び2に記載の樹脂組成物等が挙げられる。 In response to the increasing volume of information processed and the increasing speed of information communication, various electronic devices are undergoing advances in packaging technologies, such as higher integration, higher density wiring, and multi-layering of the semiconductor devices installed. Furthermore, the wiring boards used in various electronic devices are required to be high-frequency compatible, such as server boards for communication infrastructure equipment applications such as network equipment, servers, and AI (artificial intelligence) processors, and millimeter-wave radar boards for automotive applications. The substrate materials used to form the insulating layers of wiring boards used in various electronic devices are required to have low relative permittivity and dielectric dissipation factor in order to increase signal transmission speeds and reduce loss during signal transmission. Examples of substrate materials used to form the insulating layers of such wiring boards include the resin compositions described in Patent Documents 1 and 2.
特許文献1には、マレイミド化合物、アリル基含有ベンゾオキサジン化合物、及び熱可塑性樹脂等の高分子量成分を含む樹脂組成物が記載されている。特許文献1によれば、誘電正接の値が小さく、耐環境試験後における導電性材料との間の密着性に優れ、かつ、脆さが改善された硬化物を得ることができる旨が開示されている。 Patent Document 1 describes a resin composition containing high-molecular-weight components such as a maleimide compound, an allyl group-containing benzoxazine compound, and a thermoplastic resin. Patent Document 1 discloses that it is possible to obtain a cured product that has a small dielectric tangent value, excellent adhesion to conductive materials after environmental resistance testing, and improved brittleness.
特許文献2には、インダン構造を分子中に有するマレイミド化合物と、25℃で固体のスチレン系重合体とを含有する樹脂組成物が記載されている。特許文献2によれば、低誘電特性及び金属箔との密着性に優れ、ガラス転移温度が高く、さらに、温度上昇による、比誘電率及び誘電正接の上昇を充分に抑制した硬化物が得られる旨が開示されている。 Patent Document 2 describes a resin composition containing a maleimide compound having an indane structure in the molecule and a styrene-based polymer that is solid at 25°C. Patent Document 2 discloses that a cured product can be obtained that has low dielectric properties, excellent adhesion to metal foil, a high glass transition temperature, and in which increases in the relative dielectric constant and dielectric loss tangent due to temperature are sufficiently suppressed.
配線板には、反りが発生しないことも求められる。このため、配線板に備えられる絶縁層の反りが抑制されることが求められる。よって、配線板の絶縁層を構成するための基板材料としての樹脂組成物には、熱膨張率の低い硬化物が得られることが求められる。 Wiring boards are also required to be free of warping. For this reason, it is necessary to suppress warping of the insulating layers provided on wiring boards. Therefore, resin compositions used as substrate materials for forming the insulating layers of wiring boards are required to produce cured products with a low coefficient of thermal expansion.
本発明は、かかる事情に鑑みてなされた発明であって、熱膨張率の低い硬化物が得られる樹脂組成物を提供することを目的とする。また、本発明は、前記樹脂組成物を用いて得られる、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及び配線板を提供することを目的とする。 The present invention was made in light of these circumstances, and aims to provide a resin composition that produces a cured product with a low coefficient of thermal expansion. It also aims to provide prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are obtained using the resin composition.
本発明の一局面は、インダン構造、及びメタ位に配向して結合されているアリーレン構造の少なくとも一方を分子中に有するマレイミド化合物(A)と、炭素-炭素不飽和結合を分子中に有する硬化剤(B)と、エチレン構造単位とブチレン構造単位とを分子中に有し、前記ブチレン構造単位が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であって、25℃で固体のスチレン系重合体(C)とを含み、前記スチレン系重合体(C)の含有量が、12質量%以上である樹脂組成物である。 One aspect of the present invention is a resin composition comprising: a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner; a curing agent (B) having in its molecule a carbon-carbon unsaturated bond; and a styrene-based polymer (C) that has in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, and that is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more.
上記並びにその他の本発明の目的、特徴、及び利点は、以下の詳細な説明と添付図面から明らかになるだろう。 These and other objects, features, and advantages of the present invention will become apparent from the following detailed description and accompanying drawings.
電子機器は、特に携帯通信端末やノート型PC等の小型携帯機器において、多機能化、高性能化、薄型化・小型化が急速に進んでいる。これに伴い、これらの製品に用いられる配線板においても、導体配線の微細化、導体配線層の多層化、薄型化、機械特性等の高性能化が要求されている。特に、配線板の薄型化及び大型化が進むにつれ、配線板に半導体チップを搭載した半導体パッケージに反りが発生し、実装不良が発生しやすくなるという問題がある。配線板に半導体チップを搭載した半導体パッケージの反りを抑制するために、前記絶縁層には、熱膨張係数(熱膨張率)の低いことが求められる。よって、配線板の絶縁層を構成するための基板材料には、熱膨張係数の低い硬化物が得られることが求められる。 Electronic devices, particularly small portable devices such as mobile communication terminals and notebook PCs, are rapidly becoming more multifunctional, high-performance, thin, and compact. Accordingly, the wiring boards used in these products are also required to have finer conductor wiring, more multi-layered conductor wiring layers, thinner surfaces, and higher performance mechanical properties. In particular, as wiring boards become thinner and larger, warping occurs in semiconductor packages that mount semiconductor chips on wiring boards, making them more susceptible to mounting defects. To prevent warping in semiconductor packages that mount semiconductor chips on wiring boards, the insulating layer must have a low thermal expansion coefficient (coefficient of thermal expansion). Therefore, substrate materials used to form the insulating layers of wiring boards must be able to produce cured products with a low thermal expansion coefficient.
本発明者等は、種々検討した結果、熱膨張率の低い硬化物が得られる樹脂組成物を提供するといった上記目的は、以下の本発明により達成されることを見出した。 After extensive investigation, the inventors have discovered that the above-mentioned object of providing a resin composition that produces a cured product with a low coefficient of thermal expansion can be achieved by the present invention described below.
以下、本発明に係る実施形態について説明するが、本発明は、これらに限定されるものではない。 The following describes embodiments of the present invention, but the present invention is not limited to these.
[樹脂組成物]
本発明の実施形態に係る樹脂組成物は、インダン構造、及びメタ位に配向して結合されているアリーレン構造の少なくとも一方を分子中に有するマレイミド化合物(A)と、炭素-炭素不飽和結合を分子中に有する硬化剤(B)と、エチレン構造単位とブチレン構造単位とを分子中に有し、前記ブチレン構造単位が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であって、25℃で固体のスチレン系重合体(C)とを含み、前記スチレン系重合体(C)の含有量が、12質量%以上である樹脂組成物である。前記樹脂組成物は、硬化させることによって、熱膨張率の低い硬化物が得られる。このことは、前記マレイミド化合物(A)及び前記硬化剤(B)を含む樹脂組成物に、前記スチレン系重合体(C)を含有させることによって、前記樹脂組成物を硬化させて得られる硬化物の熱膨張率を低下させることができることによると考えられる。
[Resin composition]
A resin composition according to an embodiment of the present invention comprises a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner; a curing agent (B) having in its molecule a carbon-carbon unsaturated bond; and a styrene-based polymer (C) having in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, which is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more. When the resin composition is cured, a cured product having a low coefficient of thermal expansion is obtained. This is believed to be due to the fact that the inclusion of the styrene-based polymer (C) in a resin composition comprising the maleimide compound (A) and the curing agent (B) can reduce the coefficient of thermal expansion of the cured product obtained by curing the resin composition.
(マレイミド化合物(A))
前記マレイミド化合物(A)は、上述したように、インダン構造、及びメタ位に配向して結合されているアリーレン構造の少なくとも一方を分子中に有する。前記マレイミド化合物(A)は、具体的には、インダン構造を分子中に有するマレイミド化合物(A1)、メタ位に配向して結合されているアリーレン構造を分子中に有するマレイミド化合物(A2)、及び、インダン構造とメタ位に配向して結合されているアリーレン構造とを分子中に有するマレイミド化合物(A3)からなる群から選ばれる少なくとも1種を含む。
(Maleimide Compound (A))
As described above, the maleimide compound (A) has at least one of an indane structure and an arylene structure bonded to a meta-position in the molecule, and specifically includes at least one selected from the group consisting of a maleimide compound (A1) having an indane structure in the molecule, a maleimide compound (A2) having an arylene structure bonded to a meta-position in the molecule, and a maleimide compound (A3) having an indane structure and an arylene structure bonded to a meta-position in the molecule.
(インダン構造を分子中に有するマレイミド化合物(A1))
前記マレイミド化合物(A1)は、インダン構造を分子中に有するマレイミド化合物であれば、特に限定されない。なお、前記マレイミド化合物(A1)は、前記インダン構造だけではなく、マレイミド基も分子中に有する。前記インダン構造は、例えば、下記式(1)で表されるインダン構造等が挙げられる。すなわち、前記マレイミド化合物(A1)としては、具体的には、前記インダン構造として、下記式(1)で表される構造を分子中に有するマレイミド化合物(A1-1)等が挙げられ、より具体的には、下記式(4)で表されるマレイミド化合物(A1-1-1)等が挙げられる。
(Maleimide compound (A1) having an indane structure in the molecule)
The maleimide compound (A1) is not particularly limited as long as it is a maleimide compound having an indane structure in the molecule. The maleimide compound (A1) has not only the indane structure but also a maleimide group in the molecule. Examples of the indane structure include an indane structure represented by the following formula (1). That is, specific examples of the maleimide compound (A1) include a maleimide compound (A1-1) having a structure represented by the following formula (1) in the molecule as the indane structure, and more specific examples include a maleimide compound (A1-1-1) represented by the following formula (4).
rは、Rbの置換度の平均値であり、小さいほうが好ましく、具体的には0であることが好ましい。すなわち、Rbが結合されうるベンゼン環において、Rbが結合されうる位置には、水素原子が結合されていることが好ましい。このようなrの前記マレイミド化合物(A1)は、合成しやすい。このことは、立体障害が小さくなり、芳香族環状の電子密度が高まることによると考えられる。また、前記rが1~3である場合には、Rbは、上記の中でも、炭素数1~4のアルキル基、炭素数3~6のシクロアルキル基、及び炭素数6~10のアリール基からなる群から選択される少なくとも1種であることが好ましい。また、Raは、上記の中でも、炭素数1~4のアルキル基、炭素数3~6のシクロアルキル基、及び炭素数6~10のアリール基からなる群から選択される少なくとも1種であることが好ましい。炭素数1~4のアルキル基、炭素数3~6のシクロアルキル基、及び炭素数6~10のアリール基であることによって、溶剤に溶解しやくなるとともに、マレイミド基の反応性の低下を抑制することができ、好適な硬化物が得られる。このことは、マレイミド基近傍の平面性の低下、及び結晶性の低下等によると考えられる。 r is the average value of the degree of substitution of Rb, and a smaller value is preferable, specifically 0. In other words, it is preferable that a hydrogen atom be bonded to a position on the benzene ring where Rb can be bonded. The maleimide compound (A1) having such an r is easy to synthesize. This is thought to be due to reduced steric hindrance and increased electron density in the aromatic ring. Furthermore, when r is 1 to 3, Rb is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms. Furthermore, Ra is preferably at least one selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, and an aryl group having 6 to 10 carbon atoms. Being an alkyl group having 1 to 4 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms, or an aryl group having 6 to 10 carbon atoms improves solubility in solvents and suppresses a decrease in the reactivity of the maleimide group, resulting in a suitable cured product. This is thought to be due to a decrease in planarity near the maleimide group and a decrease in crystallinity.
Ra及びRbで示される基は、具体的には、以下の基等が挙げられる。 Specific examples of groups represented by Ra and Rb include the following groups:
前記炭素数1~10のアルキル基は、特に限定されず、例えば、メチル基、エチル基、プロピル基、ヘキシル基、及びデシル基等が挙げられる。 The alkyl group having 1 to 10 carbon atoms is not particularly limited, and examples include a methyl group, an ethyl group, a propyl group, a hexyl group, and a decyl group.
前記炭素数1~10のアルキルオキシ基は、特に限定されず、例えば、メチルオキシ基、エチルオキシ基、プロピルオキシ基、ヘキシルオキシ基、及びデシルオキシ基等が挙げられる。 The alkyloxy group having 1 to 10 carbon atoms is not particularly limited, and examples include a methyloxy group, an ethyloxy group, a propyloxy group, a hexyloxy group, and a decyloxy group.
前記炭素数1~10のアルキルチオ基は、特に限定されず、例えば、メチルチオ基、エチルチオ基、プロピルチオ基、ヘキシルチオ基、及びデシルチオ基等が挙げられる。 The alkylthio group having 1 to 10 carbon atoms is not particularly limited, and examples include a methylthio group, an ethylthio group, a propylthio group, a hexylthio group, and a decylthio group.
前記炭素数6~10のアリール基は、特に限定されず、例えば、フェニル基、及びナフチル基等が挙げられる。 The aryl group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenyl group and a naphthyl group.
前記炭素数6~10のアリールオキシ基は、特に限定されず、例えば、フェニルオキシ基、及びナフチルオキシ基等が挙げられる。 The aryloxy group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenyloxy group and a naphthyloxy group.
前記炭素数6~10のアリールチオ基は、特に限定されず、例えば、フェニルチオ基、及びナフチルチオ基等が挙げられる。 The arylthio group having 6 to 10 carbon atoms is not particularly limited, and examples include a phenylthio group and a naphthylthio group.
前記炭素数3~10のシクロアルキル基は、特に限定されず、例えば、シクロプロピル基、シクロブチル基、シクロヘキシル基、及びシクロオクチル基等が挙げられる。 The cycloalkyl group having 3 to 10 carbon atoms is not particularly limited, and examples include a cyclopropyl group, a cyclobutyl group, a cyclohexyl group, and a cyclooctyl group.
前記ハロゲン原子は、フッ素原子、塩素原子、臭素原子、及びヨウ素原子等が挙げられる。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
qは、Raの置換度の平均値であり、2~3であることが好ましく、2であることがより好ましい。このようなqの前記マレイミド化合物(A1)は、合成しやすい。このことは、特にqが2のとき、立体障害が小さくなり、芳香族環状の電子密度が高まることによると考えられる。 q is the average value of the degree of substitution of Ra, and is preferably 2 to 3, and more preferably 2. The maleimide compound (A1) with such a q is easy to synthesize. This is thought to be because, particularly when q is 2, steric hindrance is reduced and the electron density of the aromatic ring is increased.
nは、繰り返し数の平均値であり、上述したように、0.95~10であり、0.98~8であることが好ましく、1~7であることがより好ましく、1.1~6であることがさらに好ましい。前記式(1)で表されるインダン構造を分子中に有するマレイミド化合物(A1-1)及び前記式(4)で表されるマレイミド化合物(A1-1-1)は、繰り返し数(重合度)の平均値であるnが0である前記マレイミド化合物の含有量が、前記マレイミド化合物(A1)全量に対して、32質量%以下であることが好ましい。 n is the average number of repeats, and as described above, is 0.95 to 10, preferably 0.98 to 8, more preferably 1 to 7, and even more preferably 1.1 to 6. In the maleimide compound (A1-1) having an indane structure represented by formula (1) in the molecule and the maleimide compound (A1-1-1) represented by formula (4), the content of the maleimide compound in which n, the average number of repeats (degree of polymerization), is 0, is preferably 32 mass% or less based on the total amount of the maleimide compound (A1).
前記マレイミド化合物(A1)は、GPC測定により得られる分子量分布(Mw/Mn)が、1~4であることが好ましく、1.1~3.8であることがより好ましく、1.2~3.6であることがさらに好ましく、1.3~3.4であることが特に好ましい。なお、前記分子量分布は、ゲルパーミエーションクロマトグラフィー(GPC)測定により得られる。 The molecular weight distribution (Mw/Mn) of the maleimide compound (A1) obtained by GPC measurement is preferably 1 to 4, more preferably 1.1 to 3.8, even more preferably 1.2 to 3.6, and particularly preferably 1.3 to 3.4. The molecular weight distribution is obtained by gel permeation chromatography (GPC) measurement.
前記マレイミド化合物(A1)としては、市販品を使用することもでき、例えば、DIC株式会社製のNE-X-9470S中の固形分等を用いてもよい。 As the maleimide compound (A1), commercially available products can be used, such as the solid content of NE-X-9470S manufactured by DIC Corporation.
(メタ位に配向して結合されているアリーレン構造を分子中に有するマレイミド化合物(A2))
前記マレイミド化合物(A2)は、メタ位に配向して結合されているアリーレン構造を分子中に有するマレイミド化合物であれば、特に限定されない。なお、前記マレイミド化合物(A2)は、前記アリーレン構造だけではなく、マレイミド基も分子中に有する。前記アリーレン構造としては、マレイミド基を含む構造がメタ位に結合されているアリーレン構造(マレイミド基を含む構造がメタ位で置換されているアリーレン構造)等が挙げられる。前記アリーレン構造は、下記式(5)で表される基のような、前記メタ位に配向して結合されているアリーレン基である。前記アリーレン構造としては、例えば、m-フェニレン基及びm-ナフチレン基等の、m-アリーレン基等が挙げられ、より具体的には、下記式(5)で表される基等が挙げられる。
(Maleimide Compound (A2) Having an Arylene Structure in the Molecule Oriented at the Meta Position)
The maleimide compound (A2) is not particularly limited as long as it is a maleimide compound having an arylene structure in the molecule that is bonded in a meta-oriented manner. The maleimide compound (A2) has not only the arylene structure but also a maleimide group in the molecule. Examples of the arylene structure include an arylene structure in which a structure containing a maleimide group is bonded in the meta-position (an arylene structure in which a structure containing a maleimide group is substituted at the meta-position). The arylene structure is an arylene group bonded in a meta-oriented manner, such as a group represented by the following formula (5). Examples of the arylene structure include m-arylene groups such as m-phenylene and m-naphthylene groups, and more specifically, a group represented by the following formula (5):
前記アリーレン基は、メタ位に配向して結合されているアリーレン基であれば、特に限定されず、例えば、m-フェニレン基及びm-ナフチレン基等の、m-アリーレン基等が挙げられ、より具体的には、前記式(5)で表される基等が挙げられる。 The arylene group is not particularly limited as long as it is an arylene group oriented and bonded at the meta position, and examples include m-arylene groups such as m-phenylene and m-naphthylene, and more specifically, groups represented by formula (5) above.
前記炭素数1~5のアルキル基としては、例えば、メチル基、エチル基、プロピル基、イソプロピル基、n-ブチル基、sec-ブチル基、イソブチル基、tert-ブチル基、ペンチル基、及びネオペンチル基等が挙げられる。 Examples of the alkyl group having 1 to 5 carbon atoms include a methyl group, an ethyl group, a propyl group, an isopropyl group, an n-butyl group, a sec-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, and a neopentyl group.
前記脂肪族炭化水素基は、二価の基であって、非環式であっても、環式であってもよい。前記脂肪族炭化水素基としては、例えば、アルキレン基等が挙げられ、より具体的には、メチレン基、メチルメチレン基、及びジメチルメチレン基等が挙げられる。この中でも、ジメチルメチレン基が好ましい。 The aliphatic hydrocarbon group is a divalent group and may be acyclic or cyclic. Examples of the aliphatic hydrocarbon group include alkylene groups, and more specifically, methylene groups, methylmethylene groups, and dimethylmethylene groups. Among these, the dimethylmethylene group is preferred.
前記式(2)で表されるマレイミド化合物(A2-1)は、繰り返し数であるsが、1~5であることが好ましい。このsは、繰り返し数(重合度)の平均値である。 In the maleimide compound (A2-1) represented by the formula (2), the repeating number s is preferably 1 to 5. This s is the average value of the repeating number (degree of polymerization).
前記式(2)で表されるマレイミド化合物(A2-1)及び前記式(6)で表されるマレイミド化合物(A2-1-1)は、繰り返し数(重合度)の平均値であるsが1~5になるのであれば、sが0で表される1官能体を含んでいてもよく、また、sが6以上で表される7官能体や8官能体等の多官能体を含んでいてもよい。 The maleimide compound (A2-1) represented by formula (2) and the maleimide compound (A2-1-1) represented by formula (6) may contain a monofunctional compound where s is 0, as long as s, the average number of repeating units (degree of polymerization), is 1 to 5, or may contain a polyfunctional compound such as a heptafunctional or octafunctional compound where s is 6 or more.
前記マレイミド化合物(A2)としては、市販品を使用することもでき、例えば、日本化薬株式会社製のMIR-5000-60T中の固形分等を用いてもよい。 As the maleimide compound (A2), commercially available products can be used, such as the solid content of MIR-5000-60T manufactured by Nippon Kayaku Co., Ltd.
前記マレイミド化合物(A2)としては、前記例示したマレイミド化合物を単独で用いてもよいし、2種以上組わせて用いてもよい。例えば、前記マレイミド化合物(A2)として、式(2)で表されるマレイミド化合物(A2-1)を単独で用いてもよく、式(2)で表されるマレイミド化合物(A2-1)を2種以上組み合わせて用いてもよい。式(2)で表されるマレイミド化合物(A2-1)を2種以上組み合わせて用いる場合、例えば、式(6)で表されるマレイミド化合物(A2-1-1)以外の、式(2)で表されるマレイミド化合物(A1)と、式(6)で表されるマレイミド化合物(A2-1-1)との併用等が挙げられる。 As the maleimide compound (A2), the maleimide compounds exemplified above may be used alone or in combination of two or more. For example, as the maleimide compound (A2), the maleimide compound (A2-1) represented by formula (2) may be used alone, or two or more types of the maleimide compound (A2-1) represented by formula (2) may be used in combination. When two or more types of the maleimide compound (A2-1) represented by formula (2) are used in combination, for example, a maleimide compound (A1) represented by formula (2) other than the maleimide compound (A2-1-1) represented by formula (6) may be used in combination with the maleimide compound (A2-1-1) represented by formula (6).
(インダン構造とメタ位に配向して結合されているアリーレン構造とを分子中に有するマレイミド化合物(A3))
前記マレイミド化合物(A3)は、インダン構造とメタ位に配向して結合されているアリーレン構造とを分子中に有するマレイミド化合物であれば、特に限定されない。なお、前記マレイミド化合物(A3)は、前記アリーレン構造及び前記インダン構造だけではなく、マレイミド基も分子中に有する。前記インダン構造は、前記マレイミド化合物(A1)における、前記インダン構造と同様であり、前記アリーレン構造は、前記マレイミド化合物(A2)における、前記メタ位に配向して結合されているアリーレン構造と同様である。前記マレイミド化合物(A3)としては、具体的には、下記式(7)~(9)で表されるマレイミド化合物等が挙げられる。
(Maleimide Compound (A3) Having an Indane Structure and an Arylene Structure Bonded at the Meta Position in the Molecule)
The maleimide compound (A3) is not particularly limited as long as it is a maleimide compound having an indane structure and an arylene structure bonded in a meta-oriented manner in the molecule. The maleimide compound (A3) has not only the arylene structure and the indane structure, but also a maleimide group in the molecule. The indane structure is the same as the indane structure in the maleimide compound (A1), and the arylene structure is the same as the arylene structure bonded in a meta-oriented manner in the maleimide compound (A2). Specific examples of the maleimide compound (A3) include maleimide compounds represented by the following formulas (7) to (9):
前記マレイミド化合物(A)としては、これらを単独で用いてもよいし、2種以上を組み合わせて用いてもよい。また、前記マレイミド化合物(A1)の含有量は、前記マレイミド化合物(A)100質量部に対して、40~100質量部であることが好ましく、50~100質量部であることがより好ましい。また、前記マレイミド化合物(A2)の含有量は、前記マレイミド化合物(A)100質量部に対して、40~100質量部であることが好ましく、50~100質量部であることがより好ましい。また、前記マレイミド化合物(A3)の含有量は、前記マレイミド化合物(A)100質量部に対して、40~100質量部であることが好ましく、50~100質量部であることがより好ましい。 The maleimide compound (A) may be used alone or in combination of two or more. The content of the maleimide compound (A1) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A). The content of the maleimide compound (A2) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A). The content of the maleimide compound (A3) is preferably 40 to 100 parts by mass, more preferably 50 to 100 parts by mass, per 100 parts by mass of the maleimide compound (A).
(硬化剤(B))
前記硬化剤(B)は、炭素-炭素不飽和結合を分子中に有する硬化剤であれば、特に限定されず、例えば、前記マレイミド化合物(A)とは異なる化合物であって、前記マレイミド化合物(A)と反応して、前記樹脂組成物を硬化させることができる化合物等が挙げられる。前記硬化剤(B)としては、具体的には、アルケニル基を分子内に有するベンゾオキサジン化合物(B1)、炭素-炭素不飽和二重結合を分子中に有する炭化水素系化合物(B2)、エポキシ基を分子中に有するポリブタジエン化合物(B3)、及び、他の硬化剤(B4)[前記ベンゾオキサジン化合物(B1)、前記炭化水素系化合物(B2)、及び前記エポキシ基を分子中に有するポリブタジエン化合物(B3)以外の、炭素-炭素不飽和結合を分子中に有する硬化剤(B4)]等が挙げられる。前記硬化剤(B)としては、これらを単独で用いてもよいし、2種以上を組み合わせて用いてもよい。
(Curing agent (B))
The curing agent (B) is not particularly limited as long as it is a curing agent having a carbon-carbon unsaturated bond in the molecule. For example, it may be a compound different from the maleimide compound (A) that can react with the maleimide compound (A) to cure the resin composition. Specific examples of the curing agent (B) include benzoxazine compounds (B1) having an alkenyl group in the molecule, hydrocarbon compounds (B2) having a carbon-carbon unsaturated double bond in the molecule, polybutadiene compounds (B3) having an epoxy group in the molecule, and other curing agents (B4) [curing agents (B4) having a carbon-carbon unsaturated bond in the molecule other than the benzoxazine compounds (B1), the hydrocarbon compounds (B2), and the polybutadiene compounds (B3) having an epoxy group in the molecule]. These curing agents (B) may be used alone or in combination of two or more.
(アルケニル基を分子内に有するベンゾオキサジン化合物(B1))
前記ベンゾオキサジン化合物(B1)は、アルケニル基を分子内に有するベンゾオキサジン化合物であれば、特に限定されない。なお、前記ベンゾオキサジン化合物(B1)は、アルケニル基だけではなく、ベンゾオキサジン基も分子内に有する。前記アルケニル基としては、特に限定されないが、例えば、炭素数2~6のアルケニル基等が挙げられる。前記アルケニル基としては、具体的には、ビニル基、アリル基、プロペニル基、及びブテニル基等が挙げられ、この中でも、アリル基及びプロペニル基が好ましく、アリル基がより好ましい。前記硬化剤(B)としては、アリル基を分子内に有するベンゾオキサジン化合物が好ましい。前記ベンゾオキサジン基としては、例えば、下記式(10)で表されるベンゾオキサジン基、及び下記式(11)で表されるベンゾオキサジン基等が挙げられる。前記ベンゾオキサジン化合物(B1)としては、下記式(10)で表されるベンゾオキサジン基を分子中に有するベンゾオキサジン化合物(B1-1)、及び下記式(11)で表されるベンゾオキサジン基を分子中に有するベンゾオキサジン化合物(B1-2)だけではなく、下記式(10)で表されるベンゾオキサジン基と下記式(11)で表されるベンゾオキサジン基とを分子中に有するベンゾオキサジン化合物(B1-3)等が挙げられる。
(Benzoxazine Compound (B1) Having an Alkenyl Group in the Molecule)
The benzoxazine compound (B1) is not particularly limited as long as it is a benzoxazine compound having an alkenyl group in the molecule. The benzoxazine compound (B1) contains not only an alkenyl group but also a benzoxazine group in the molecule. The alkenyl group is not particularly limited, but examples thereof include alkenyl groups having 2 to 6 carbon atoms. Specific examples of the alkenyl group include vinyl groups, allyl groups, propenyl groups, and butenyl groups. Of these, allyl groups and propenyl groups are preferred, and allyl groups are more preferred. The curing agent (B) is preferably a benzoxazine compound having an allyl group in the molecule. Examples of the benzoxazine group include a benzoxazine group represented by the following formula (10) and a benzoxazine group represented by the following formula (11). Examples of the benzoxazine compound (B1) include not only a benzoxazine compound (B1-1) having a benzoxazine group represented by the following formula (10) in the molecule, and a benzoxazine compound (B1-2) having a benzoxazine group represented by the following formula (11) in the molecule, but also a benzoxazine compound (B1-3) having a benzoxazine group represented by the following formula (10) and a benzoxazine group represented by the following formula (11) in the molecule.
前記ベンゾオキサジン化合物(B1)としては、具体的には、前記ベンゾオキサジン化合物(B1-1)として、下記式(12)で表されるベンゾオキサジン化合物(B1-1-1)等が挙げられる。 Specific examples of the benzoxazine compound (B1) include the benzoxazine compound (B1-1) represented by the following formula (12):
前記アルキレン基は、特に限定されず、例えば、メチレン基、エチレン基、プロピレン基、ブチレン基、ペンチレン基、ヘキシレン基、ヘプチレン基、オクタン基、イコサン基、及びヘキサトリアコンタン基等が挙げられる。この中でも、メチレン基が好ましい。 The alkylene group is not particularly limited, and examples include methylene, ethylene, propylene, butylene, pentylene, hexylene, heptylene, octane, icosane, and hexatriacontane groups. Of these, the methylene group is preferred.
bは、R3の置換度の平均値であって、1~4であり、1であることが好ましい。また、cは、R4の置換度の平均値であって、1~4であり、1であることが好ましい。 b is the average value of the degree of substitution of R3 and is 1 to 4, preferably 1. Furthermore, c is the average value of the degree of substitution of R4 and is 1 to 4, preferably 1.
前記ベンゾオキサジン化合物(B1)としては、市販品を使用することもでき、例えば、四国化成工業株式会社製のALPd等を用いてもよい。 As the benzoxazine compound (B1), commercially available products can be used, such as ALPd manufactured by Shikoku Chemicals Corporation.
前記ベンゾオキサジン化合物(B1)としては、前記例示したベンゾオキサジン化合物を単独で用いてもよいし、2種以上組わせて用いてもよい。 As the benzoxazine compound (B1), the benzoxazine compounds exemplified above may be used alone or in combination of two or more.
(炭素-炭素不飽和二重結合を分子中に有する炭化水素系化合物(B2))
前記炭化水素系化合物(B2)は、炭素-炭素不飽和二重結合を分子中に有する炭化水素系化合物であれば、特に限定されない。前記炭素-炭素不飽和基としては、特に限定されないが、例えば、アルケニル基等が挙げられる。前記アルケニル基としては、例えば、炭素数2~6のアルケニル基等が挙げられ、具体的には、ビニル基、アリル基、プロペニル基、及びブテニル基等が挙げられ、この中でも、アリル基及びプロペニル基が好ましい。前記炭化水素系化合物(B2)としては、例えば、o-ジビニルベンゼン、m-ジビニルベンゼン、及びp-ジビニルベンゼン等のジビニルベンゼン、下記式(3)で表される炭化水素系化合物(B2-1)、及び下記式(14)で表される炭化水素系化合物(B2-2)等が挙げられる。
(Hydrocarbon Compound (B2) Having a Carbon-Carbon Unsaturated Double Bond in the Molecule)
The hydrocarbon compound (B2) is not particularly limited as long as it is a hydrocarbon compound having a carbon-carbon unsaturated double bond in the molecule. The carbon-carbon unsaturated group is not particularly limited, but examples thereof include alkenyl groups. Examples of the alkenyl group include alkenyl groups having 2 to 6 carbon atoms, specifically vinyl groups, allyl groups, propenyl groups, and butenyl groups, with allyl groups and propenyl groups being preferred. Examples of the hydrocarbon compound (B2) include divinylbenzenes such as o-divinylbenzene, m-divinylbenzene, and p-divinylbenzene, hydrocarbon compounds (B2-1) represented by the following formula (3), and hydrocarbon compounds (B2-2) represented by the following formula (14).
前記芳香族環状基としては、特に限定されないが、例えば、フェニレン基、キシリレン基、ナフチレン基、トリレン基、及びビフェニレン基等が挙げられる。前記脂肪族環状基としては、特に限定されないが、例えば、インダン構造を含む基、及びシクロオレフィン構造を含む基等が挙げられる。Xは、この中でも、前記芳香族環状基が好ましく、キシリレン基がより好ましい。前記炭化水素基の炭素数は、6以上であれば特に限定されないが、6~20であることが好ましい。前記炭化水素系化合物(B2-1)としては、より具体的には、下記式(13)で表される炭化水素系化合物(B2-1-1)等が挙げられる。 The aromatic cyclic group is not particularly limited, but examples thereof include a phenylene group, a xylylene group, a naphthylene group, a tolylene group, and a biphenylene group. The aliphatic cyclic group is not particularly limited, but examples thereof include a group containing an indane structure and a group containing a cycloolefin structure. Among these, X is preferably an aromatic cyclic group, and more preferably a xylylene group. The number of carbon atoms in the hydrocarbon group is not particularly limited as long as it is 6 or more, but is preferably 6 to 20. More specific examples of the hydrocarbon compound (B2-1) include hydrocarbon compounds (B2-1-1) represented by the following formula (13).
前記炭化水素系化合物(B2-2)において、eが1~20であることが好ましく、1~12であることがより好ましく、1~6であることがさらに好ましい。前記炭化水素系化合物(B2-2)としては、具体的には、前記式(14)で表され、eが1である化合物[ビス-(4-ビニルフェニル)メタン(BVPM)]、前記式(14)で表され、eが2である化合物[1,2-ビス(ビニルフェニル)エタン(BVPE)]、及び前記式(14)で表され、eが6である化合物[1,6-ビス(4-ビニルフェニル)ヘキサン(BVPH)]等が挙げられる。 In the hydrocarbon compound (B2-2), e is preferably 1 to 20, more preferably 1 to 12, and even more preferably 1 to 6. Specific examples of the hydrocarbon compound (B2-2) include a compound represented by formula (14) where e is 1 [bis-(4-vinylphenyl)methane (BVPM)], a compound represented by formula (14) where e is 2 [1,2-bis(vinylphenyl)ethane (BVPE)], and a compound represented by formula (14) where e is 6 [1,6-bis(4-vinylphenyl)hexane (BVPH)].
前記炭化水素系化合物(B2)としては、上記例示の中でも、前記式(3)で表される炭化水素系化合物(B2-1)が好ましく、前記式(13)で表される炭化水素系化合物(B2-1-1)がより好ましい。 Among the above examples, the hydrocarbon compound (B2) is preferably the hydrocarbon compound (B2-1) represented by formula (3), and more preferably the hydrocarbon compound (B2-1-1) represented by formula (13).
(エポキシ基を分子中に有するポリブタジエン化合物(B3))
前記エポキシ基を分子中に有するポリブタジエン化合物(B3)は、特に限定されず、例えば、エポキシ化ポリブタジエン、すなわち、ポリブタジエンに含まれる炭素-炭素二重結合の少なくとも一部がエポキシ化されることによって、分子中にエポキシ基が導入された化合物、及びポリブタジエンの両末端がグリシジルエーテル化された化合物等が挙げられる。なお、前記エポキシ化は、例えば、ポリブタジエン(エポキシ化する前のポリブタジエン)に含まれる炭素-炭素二重結合に対して、エポキシ化剤によって酸素1原子を付加させて3員環のエポキシ基にすること等によって行われる。また、ポリブタジエンの両末端がグリシジルエーテル化された化合物は、両末端が水酸基であるポリブタジエンにエピクロルヒドリンを付加させることによって得られる。
(Polybutadiene compound (B3) having epoxy groups in the molecule)
The polybutadiene compound (B3) having an epoxy group in the molecule is not particularly limited, and examples thereof include epoxidized polybutadiene, i.e., a compound in which epoxy groups have been introduced into the molecule by epoxidizing at least a portion of the carbon-carbon double bonds contained in polybutadiene, and a compound in which both terminals of polybutadiene have been glycidyl-etherified. The epoxidation is carried out, for example, by adding one oxygen atom to the carbon-carbon double bond contained in polybutadiene (polybutadiene before epoxidation) using an epoxidizing agent to form a three-membered ring epoxy group. A compound in which both terminals of polybutadiene have been glycidyl-etherified can be obtained by adding epichlorohydrin to polybutadiene having hydroxyl groups at both terminals.
前記ポリブタジエン(エポキシ化する前のポリブタジエン)は、炭素-炭素二重結合の立体構造が、シス-1,4、トランス-1,4、シス-1,2、及びトランス-1,2のいずれであってもよい。また、これらの比率は、特に限定されない。 The carbon-carbon double bond configuration of the polybutadiene (before epoxidation) may be any of cis-1,4, trans-1,4, cis-1,2, and trans-1,2. Furthermore, there are no particular limitations on the ratio of these.
前記エポキシ化剤は、ポリブタジエンに含まれる炭素-炭素二重結合をエポキシ化させることができれば、特に限定されない。前記エポキシ化剤としては、例えば、過酢酸、過ギ酸、過安息香酸、トリフルオロ過酢酸、及び過プロピオン酸等の過カルボン酸、t-ブチルヒドロパーオキサイド及びクメンヒドロペルオキシド等の有機ヒドロペルオキシド、及び過酸化水素等が挙げられる。 The epoxidizing agent is not particularly limited as long as it can epoxidize the carbon-carbon double bonds contained in polybutadiene. Examples of the epoxidizing agent include percarboxylic acids such as peracetic acid, performic acid, perbenzoic acid, trifluoroperacetic acid, and perpropionic acid, organic hydroperoxides such as t-butyl hydroperoxide and cumene hydroperoxide, and hydrogen peroxide.
前記分子中にエポキシ基を有するポリブタジエン化合物は、オキシラン酸素の濃度が1~10質量%であることが好ましく、5~9質量%であることがより好ましい。前記オキシラン酸素の濃度が低すぎると、前記分子中にエポキシ基を有するポリブタジエン化合物を添加することにより奏する効果、前記樹脂組成物の硬化物の、金属箔に対する接着性を高めるという効果を充分に得られない傾向がある。また、前記オキシラン酸素の濃度が高すぎると、前記エポキシ基が多くなりすぎ、低誘電特性が悪化する傾向がある。前記オキシラン酸素の濃度が上記範囲内である前記分子中にエポキシ基を有するポリブタジエン化合物を用いることによって、硬化させると、誘電特性が低く、かつ、金属箔との接着性の高い硬化物となる樹脂組成物が得られる。 The polybutadiene compound having epoxy groups in its molecule preferably has an oxirane oxygen concentration of 1 to 10% by mass, and more preferably 5 to 9% by mass. If the oxirane oxygen concentration is too low, the effect of adding the polybutadiene compound having epoxy groups in its molecule, namely, the effect of improving the adhesion of the cured resin composition to metal foil, tends to be insufficient. Furthermore, if the oxirane oxygen concentration is too high, the epoxy groups tend to become too numerous, which tends to deteriorate the low dielectric properties. By using a polybutadiene compound having epoxy groups in its molecule whose oxirane oxygen concentration is within the above range, a resin composition can be obtained that, when cured, results in a cured product with low dielectric properties and high adhesion to metal foil.
なお、オキシラン酸素の濃度は、前記分子中にエポキシ基を有するポリブタジエン化合物に含まれるエポキシ基の含有率の指標となり、例えば、臭化水素-氷酢酸溶液法等によって測定することができる。 The concentration of oxirane oxygen is an indicator of the content of epoxy groups contained in the polybutadiene compound having epoxy groups in its molecules, and can be measured, for example, by the hydrogen bromide-glacial acetic acid solution method.
(他の硬化剤(B4))
前記他の硬化剤(B4)は、前記ベンゾオキサジン化合物(B1)、前記炭化水素系化合物(B2)、及び前記エポキシ基を分子中に有するポリブタジエン化合物(B3)以外の、炭素-炭素不飽和結合を分子中に有する硬化剤であれば、特に限定されない。前記他の硬化剤(B4)としては、例えば、炭素-炭素不飽和二重結合を分子内に有するポリフェニレンエーテル化合物、メタクリレート化合物、アクリレート化合物、ビニル化合物、及びアリル化合物等が挙げられる。
(Other curing agents (B4))
The other curing agent (B4) is not particularly limited as long as it is a curing agent having a carbon-carbon unsaturated bond in the molecule other than the benzoxazine compound (B1), the hydrocarbon compound (B2), and the polybutadiene compound (B3) having an epoxy group in the molecule. Examples of the other curing agent (B4) include polyphenylene ether compounds, methacrylate compounds, acrylate compounds, vinyl compounds, and allyl compounds, each of which has a carbon-carbon unsaturated double bond in the molecule.
前記ポリフェニレンエーテル化合物は、炭素-炭素不飽和二重結合を分子内に有するポリフェニレンエーテル化合物であれば、特に限定されない。前記ポリフェニレンエーテル化合物としては、例えば、炭素-炭素不飽和二重結合を末端に有するポリフェニレンエーテル化合物等が挙げられ、より具体的には、炭素-炭素不飽和二重結合を有する置換基により末端変性された変性ポリフェニレンエーテル化合物等の、炭素-炭素不飽和二重結合を有する置換基を分子末端に有するポリフェニレンエーテル化合物等が挙げられる。前記炭素-炭素不飽和二重結合を有する置換基としては、例えば、ビニルベンジル基(エテニルベンジル基)、アクリロイル基及びメタクリロイル基等が挙げられる。 The polyphenylene ether compound is not particularly limited as long as it is a polyphenylene ether compound having a carbon-carbon unsaturated double bond in the molecule. Examples of the polyphenylene ether compound include polyphenylene ether compounds having a terminal carbon-carbon unsaturated double bond. More specifically, examples include polyphenylene ether compounds having a substituent having a carbon-carbon unsaturated double bond at the molecular end, such as modified polyphenylene ether compounds whose ends have been modified with a substituent having a carbon-carbon unsaturated double bond. Examples of the substituent having a carbon-carbon unsaturated double bond include a vinylbenzyl group (ethenylbenzyl group), an acryloyl group, and a methacryloyl group.
前記メタクリレート化合物は、分子中にメタクリロイル基を有する化合物であり、例えば、分子中にメタクリロイル基を1個有する単官能メタクリレート化合物、及び分子中にメタクリロイル基を2個以上有する多官能メタクリレート化合物等が挙げられる。前記単官能メタクリレート化合物としては、例えば、メチルメタクリレート、エチルメタクリレート、プロピルメタクリレート、及びブチルメタクリレート等が挙げられる。前記多官能メタクリレート化合物としては、例えば、トリシクロデカンジメタノールジメタクリレート(DCP)等のジメタクリレート化合物等が挙げられる。 The methacrylate compound is a compound having a methacryloyl group in the molecule, and examples thereof include monofunctional methacrylate compounds having one methacryloyl group in the molecule, and polyfunctional methacrylate compounds having two or more methacryloyl groups in the molecule. Examples of the monofunctional methacrylate compounds include methyl methacrylate, ethyl methacrylate, propyl methacrylate, and butyl methacrylate. Examples of the polyfunctional methacrylate compounds include dimethacrylate compounds such as tricyclodecane dimethanol dimethacrylate (DCP).
前記アクリレート化合物は、分子中にアクリロイル基を有する化合物であり、例えば、分子中にアクリロイル基を1個有する単官能アクリレート化合物、及び分子中にアクリロイル基を2個以上有する多官能アクリレート化合物等が挙げられる。前記単官能アクリレート化合物としては、例えば、メチルアクリレート、エチルアクリレート、プロピルアクリレート、及びブチルアクリレート等が挙げられる。前記多官能アクリレート化合物としては、例えば、トリシクロデカンジメタノールジアクリレート等のジアクリレート化合物等が挙げられる。 The acrylate compound is a compound having an acryloyl group in the molecule, and examples thereof include monofunctional acrylate compounds having one acryloyl group in the molecule, and polyfunctional acrylate compounds having two or more acryloyl groups in the molecule. Examples of monofunctional acrylate compounds include methyl acrylate, ethyl acrylate, propyl acrylate, and butyl acrylate. Examples of polyfunctional acrylate compounds include diacrylate compounds such as tricyclodecane dimethanol diacrylate.
前記ビニル化合物は、分子中にビニル基を有する化合物であり、例えば、分子中にビニル基を1個有する単官能ビニル化合物(モノビニル化合物)、及び分子中にビニル基を2個以上有する多官能ビニル化合物が挙げられる。前記単官能ビニル化合物としては、例えば、9,10-ジヒドロ-9-オキサ-10-フォスファフェナントレン-10-オキサイド(DOPO)等の、リン原子を有する骨格を分子中に有するビニルベンゼン化合物等が挙げられる。 The vinyl compound is a compound that has a vinyl group in its molecule, and examples include monofunctional vinyl compounds (monovinyl compounds) that have one vinyl group in their molecule, and polyfunctional vinyl compounds that have two or more vinyl groups in their molecule. Examples of monofunctional vinyl compounds include vinylbenzene compounds that have a skeleton containing a phosphorus atom in their molecule, such as 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (DOPO).
前記アリル化合物は、分子中にアリル基を有する化合物であり、例えば、トリアリルイソシアヌレート(TAIC)等のトリアリルイソシアヌレート化合物、ジアリルビスフェノール化合物、及びジアリルフタレート(DAP)等が挙げられる。 The allyl compound is a compound having an allyl group in the molecule, and examples include triallyl isocyanurate compounds such as triallyl isocyanurate (TAIC), diallyl bisphenol compounds, and diallyl phthalate (DAP).
前記硬化剤(B)としては、前記例示した硬化剤を単独で用いてもよいし、2種以上組わせて用いてもよい。 As the curing agent (B), the curing agents exemplified above may be used alone or in combination of two or more.
(スチレン系重合体(C))
前記スチレン系重合体(C)は、エチレン構造単位とブチレン構造単位とを分子中に有し、前記ブチレン構造単位が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であって、25℃で固体のスチレン系重合体であれば、特に限定されない。前記スチレン系重合体(C)としては、前記エチレン構造単位及び前記ブチレン構造単位を上記のように分子中に有し、25℃で固体であって、金属張積層板及び配線板等に備えられる絶縁層を形成するために用いられる樹脂組成物等に含まれる樹脂として用いることができるスチレン系重合体等が挙げられる。金属張積層板及び配線板等に備えられる絶縁層を形成するために用いられる樹脂組成物とは、樹脂付きフィルム及び樹脂付き金属箔等に備えられる樹脂層を形成するために用いられる樹脂組成物であってもよいし、プリプレグに含まれる樹脂組成物であってもよい。前記ブチレン構造単位の含有量が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であり、50~80モル%であることが好ましく、60~75モル%であることがより好ましい。前記ブチレン構造単位の含有量が前記範囲内であると、前記スチレン系重合体(C)による効果、すなわち、前記樹脂組成物の硬化物の熱膨張率を低下させる効果をより好適に奏することができる。前記スチレン系重合体(C)としては、例えば、スチレンを含む単量体由来の構造単位を分子中にさらに含むスチレン系重合体等が挙げられる。
(Styrene-based polymer (C))
The styrene-based polymer (C) is not particularly limited as long as it has an ethylene structural unit and a butylene structural unit in its molecule, the butylene structural unit accounts for 50 mol% or more of the total of the ethylene structural units and the butylene structural units, and is a solid styrene-based polymer at 25°C. Examples of the styrene-based polymer (C) include a styrene-based polymer that has the ethylene structural unit and the butylene structural unit in its molecule as described above, is solid at 25°C, and can be used as a resin contained in a resin composition used to form an insulating layer provided in a metal-clad laminate, a wiring board, or the like. The resin composition used to form an insulating layer provided in a metal-clad laminate, a wiring board, or the like may be a resin composition used to form a resin layer provided in a resin-coated film, a resin-coated metal foil, or the like, or may be a resin composition contained in a prepreg. The content of the butylene structural unit is 50 mol% or more, preferably 50 to 80 mol%, and more preferably 60 to 75 mol%, of the total of the ethylene structural units and the butylene structural units. When the content of the butylene structural unit is within the above range, the effect of the styrene-based polymer (C), i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition, can be more suitably exhibited. Examples of the styrene-based polymer (C) include a styrene-based polymer further containing a structural unit derived from a monomer containing styrene in the molecule.
前記スチレン系共重合体としては、例えば、前記スチレンを含む単量体(スチレン系単量体)の1種以上と、前記スチレン系単量体と共重合可能な他の単量体の1種以上とを共重合させて得られる共重合体等が挙げられる。前記スチレン系共重合体は、ランダム共重合体であっても、ブロック共重合体であってもよい。前記ブロック共重合体としては、前記スチレン系単量体由来の構造単位(繰り返し単位)と前記共重合可能な他の単量体由来の構造単位(繰り返し単位)との二元共重合体、及び、前記スチレン系単量体由来の構造(繰り返し単位)と前記共重合可能な他の単量体由来の構造単位(繰り返し単位)と前記スチレン系単量体由来の構造単位(繰り返し単位)との三元共重合体等が挙げられる。前記スチレン系重合体(C)は、前記スチレン系共重合体を水添した水添スチレン系共重合体であってもよい。また、前記スチレン系重合体(C)は、少なくとも一部が水添されていることが好ましい。少なくとも一部が水添されているスチレン系重合体を含有することによって、誘電正接、及び熱膨張係数が低く、靭性にも優れた硬化物となる樹脂組成物が得られる。 Examples of the styrene-based copolymer include copolymers obtained by copolymerizing one or more of the styrene-containing monomers (styrene-based monomers) with one or more other monomers copolymerizable with the styrene-based monomer. The styrene-based copolymer may be a random copolymer or a block copolymer. Examples of the block copolymer include a binary copolymer of a structural unit (repeating unit) derived from the styrene-based monomer and a structural unit (repeating unit) derived from the other copolymerizable monomer, and a terpolymer of a structural unit (repeating unit) derived from the styrene-based monomer, a structural unit (repeating unit) derived from the other copolymerizable monomer, and a structural unit (repeating unit) derived from the styrene-based monomer. The styrene-based polymer (C) may be a hydrogenated styrene-based copolymer obtained by hydrogenating the styrene-based copolymer. Preferably, the styrene-based polymer (C) is at least partially hydrogenated. By including an at least partially hydrogenated styrene-based polymer, a resin composition can be obtained that exhibits a low dielectric loss tangent and thermal expansion coefficient and exhibits excellent toughness as a cured product.
前記スチレン系単量体としては、特に限定されないが、例えば、スチレン、スチレン誘導体、スチレンにおけるベンゼン環の水素原子の一部がアルキル基で置換されたもの、スチレンにおけるビニル基の水素原子の一部がアルキル基で置換されたもの、ビニルトルエン、α-メチルスチレン、ブチルスチレン、ジメチルスチレン、及びイソプロぺニルトルエン等が挙げられる。前記スチレン系単量体は、これらを単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 The styrene-based monomer is not particularly limited, but examples include styrene, styrene derivatives, styrene in which some of the hydrogen atoms on the benzene ring have been substituted with alkyl groups, styrene in which some of the hydrogen atoms on the vinyl group have been substituted with alkyl groups, vinyltoluene, α-methylstyrene, butylstyrene, dimethylstyrene, and isopropenyltoluene. These styrene-based monomers may be used alone or in combination of two or more.
前記スチレン系単量体由来の構造単位としては、特に限定されず、例えば、下記式(15)で表される構造単位(繰り返し単位)等が挙げられる。すなわち、前記スチレン系重合体(C)としては、下記式(15)で表される構造単位を分子中に有する重合体等が挙げられる。 The structural unit derived from the styrene-based monomer is not particularly limited, and examples thereof include a structural unit (repeating unit) represented by the following formula (15). That is, examples of the styrene-based polymer (C) include polymers having a structural unit represented by the following formula (15) in the molecule.
前記スチレン系重合体(C)は、前記式(15)で表される構造単位を少なくとも1種含んでいることが好ましく、前記式(15)で表される構造単位のうちの異なる2種以上を組み合わせて含んでいてもよい。また、前記スチレン系重合体(C)は、前記式(15)で表される構造単位と、前記式(15)で表される構造単位以外の構造単位とを組み合わせて含んでいてもよい。 The styrene-based polymer (C) preferably contains at least one structural unit represented by formula (15), and may contain a combination of two or more different structural units represented by formula (15). The styrene-based polymer (C) may also contain a combination of a structural unit represented by formula (15) and a structural unit other than the structural unit represented by formula (15).
前記スチレンを含む単量体由来の構造単位の含有量が、前記スチレン系重合体(C)に対して、20質量%以下であることが好ましく、5~20質量%であることがより好ましい。前記スチレンを含む単量体由来の構造単位の含有量が前記範囲内であると、前記スチレン系重合体(C)による効果、すなわち、前記樹脂組成物の硬化物の熱膨張率を低下させる効果をより好適に奏することができる。このことは、以下のことによると考えられる。前記スチレンを含む単量体由来の構造単位の含有量が多すぎると、前記樹脂組成物の硬化物の熱膨張率の低下を充分に発揮できなくなると考えられる。よって、前記スチレンを含む単量体由来の構造単位の含有量が前記範囲内であると、前記スチレン系重合体(C)による効果を好適に奏することができると考えられる。また、前記スチレンを含む単量体由来の構造単位の含有量が、前記スチレン系重合体(C)に対して、20質量%以下であれば好ましいが、前記スチレンを含む単量体由来の構造単位の含有量が少なすぎるのも、前記エチレン構造単位及び前記ブチレン構造が多くなりすぎて、前記スチレン系重合体(C)による効果を奏しにくくなるので、この点から、5質量%以上であることがより好ましい。 The content of the structural units derived from the styrene-containing monomer is preferably 20% by mass or less, and more preferably 5 to 20% by mass, relative to the styrene-based polymer (C). When the content of the structural units derived from the styrene-containing monomer is within this range, the effect of the styrene-based polymer (C), i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition, can be more effectively achieved. This is thought to be due to the following: If the content of the structural units derived from the styrene-containing monomer is too high, it is thought that the reduction in the thermal expansion coefficient of the cured product of the resin composition cannot be fully achieved. Therefore, when the content of the structural units derived from the styrene-containing monomer is within the above range, it is thought that the effect of the styrene-based polymer (C) can be effectively achieved. Furthermore, it is preferable that the content of the structural units derived from the styrene-containing monomer be 20% by mass or less relative to the styrene-based polymer (C); however, if the content of the structural units derived from the styrene-containing monomer is too low, the ethylene structural units and butylene structures will be too high, making it difficult to achieve the effects of the styrene-based polymer (C), and therefore it is more preferable that the content be 5% by mass or more.
前記エチレン構造単位としては、特には限定されないが、例えば、前記共重合可能な他の単量体由来の構造単位(繰り返し単位)の中で、エチレン構造を有するもの等が挙げられる。前記エチレン構造単位は、共役ジエン単量体(共役ジエン類)の1,4-結合に由来する構造であり、主鎖の-C-C-結合の炭素に結合される原子又は基は、水素原子又はメチル基である。前記共役ジエン単量体としては、具体的には、1,3-ブタジエン、2-メチル-1,3-ブタジエン(イソプレン)、2,3-ジメチル-1,3-ブタジエン、1,3-ペンタジエン、2-メチル-1,3-ペンタジエン、1,3-ヘキサジエン、及び1,3-シクロヘキサジエン等が挙げられる。よって、前記エチレン構造単位としては、具体的には、前記共役ジエン類に由来の構造単位のうち、エチレン構造を有する構造単位等が挙げられ、より具体的には、1,3-ブタジエン由来の構造単位(繰り返し単位)のうち、エチレン構造を有する構造単位(1,4-付加の構造単位)等が挙げられる。前記エチレン構造単位としては、例えば、下記式(16)で表される構造単位のうち、R9~R12の全てが、水素原子又はメチル基である構造単位、下記式(17)で表される構造単位のうち、R13~R20の全てが、水素原子又はメチル基である構造単位、及び下記式(18)で表される構造単位のうち、R21~R26の全てが、水素原子又はメチル基である構造単位等が挙げられる。前記エチレン構造単位としては、より具体的には、下記式(22)、及び式(29)~式(32)で表される構造単位等が挙げられる。 The ethylene structural unit is not particularly limited, and examples thereof include those having an ethylene structure among the structural units (repeating units) derived from the other copolymerizable monomers. The ethylene structural unit is a structure derived from a 1,4-bond of a conjugated diene monomer (conjugated dienes), and the atom or group bonded to the carbon of the -C-C- bond of the main chain is a hydrogen atom or a methyl group. Specific examples of the conjugated diene monomer include 1,3-butadiene, 2-methyl-1,3-butadiene (isoprene), 2,3-dimethyl-1,3-butadiene, 1,3-pentadiene, 2-methyl-1,3-pentadiene, 1,3-hexadiene, and 1,3-cyclohexadiene. Therefore, specific examples of the ethylene structural unit include structural units having an ethylene structure among the structural units derived from the conjugated dienes, and more specific examples include structural units (1,4-addition structural units) having an ethylene structure among structural units (repeating units) derived from 1,3-butadiene. Examples of the ethylene structural unit include structural units represented by the following formula (16) in which all of R 9 to R 12 are hydrogen atoms or methyl groups, structural units represented by the following formula (17) in which all of R 13 to R 20 are hydrogen atoms or methyl groups, and structural units represented by the following formula (18) in which all of R 21 to R 26 are hydrogen atoms or methyl groups. More specific examples of the ethylene structural unit include structural units represented by the following formula (22) and formulas (29) to (32).
前記ブチレン構造単位としては、特には限定されないが、例えば、前記共重合可能な他の単量体由来の構造単位(繰り返し単位)の中で、ブチレン構造を有するもの等が挙げられる。前記ブチレン構造単位は、共役ジエン単量体(共役ジエン類)の1,2-結合に由来する構造及び共役ジエン単量体(共役ジエン類)の3,4-結合に由来する構造の少なくとも一方であり、主鎖の-C-C-結合の炭素に結合される原子又は基のうち、少なくとも1つは、炭素数が2以上の側鎖である。よって、前記ブチレン構造単位としては、具体的には、前記共役ジエン類に由来の構造単位のうち、ブチレン構造を有する構造単位等が挙げられ、より具体的には、1,3-ブタジエン由来の構造単位(繰り返し単位)のうち、ブチレン構造を有する構造単位(1,2-付加の構造単位及び3,4-付加の構造単位の少なくとも一方)等が挙げられる。前記ブチレン構造単位としては、例えば、水添された構造単位であってもよい。前記ブチレン構造単位としては、例えば、下記式(16)で表される構造単位のうち、R9~R12の少なくとも1つは、炭素数が2以上の側鎖である構造単位、下記式(17)で表される構造単位のうち、R13~R20の少なくとも1つは、炭素数が2以上の側鎖である構造単位、及び下記式(18)で表される構造単位のうち、R21~R26の少なくとも1つは、炭素数が2以上の側鎖である構造単位等が挙げられる。前記エチレン構造単位としては、より具体的には、下記式(23)~式(28)で表される構造単位等が挙げられる。 The butylene structural unit is not particularly limited, and examples thereof include those having a butylene structure among the structural units (repeating units) derived from the other copolymerizable monomers. The butylene structural unit is at least one of a structure derived from a 1,2-bond of a conjugated diene monomer (conjugated dienes) and a structure derived from a 3,4-bond of a conjugated diene monomer (conjugated dienes), and at least one of the atoms or groups bonded to the carbon of the -C-C- bond of the main chain is a side chain having two or more carbon atoms. Therefore, specific examples of the butylene structural unit include structural units having a butylene structure among the structural units derived from the conjugated dienes, and more specific examples include structural units having a butylene structure (at least one of a 1,2-addition structural unit and a 3,4-addition structural unit) among the structural units (repeating units) derived from 1,3-butadiene. The butylene structural unit may be, for example, a hydrogenated structural unit. Examples of the butylene structural unit include a structural unit represented by the following formula (16) in which at least one of R 9 to R 12 is a side chain having 2 or more carbon atoms, a structural unit represented by the following formula (17) in which at least one of R 13 to R 20 is a side chain having 2 or more carbon atoms, and a structural unit represented by the following formula (18) in which at least one of R 21 to R 26 is a side chain having 2 or more carbon atoms. More specific examples of the ethylene structural unit include structural units represented by the following formulas (23) to (28).
前記スチレン系重合体(C)は、共役ジエン単量体の1,4-結合に由来する第1構造単位(エチレン構造単位)と、共役ジエン単量体の1,2-結合に由来する構造単位及び共役ジエン単量体の3,4-結合に由来する構造単位の少なくとも一方の第2構造単位(ブチレン構造単位)とを分子中に含み、前記第2構造単位が、前記第1構造単位及び前記第2構造単位の合計に対して、50モル%以上である。 The styrene-based polymer (C) contains, in its molecule, a first structural unit (ethylene structural unit) derived from a 1,4-bond of a conjugated diene monomer, and a second structural unit (butylene structural unit) of at least one of a structural unit derived from a 1,2-bond of a conjugated diene monomer and a structural unit derived from a 3,4-bond of a conjugated diene monomer, and the second structural unit accounts for 50 mol % or more of the total of the first structural unit and the second structural unit.
前記式(15)で表される構造単位としては、より具体的には、下記式(19)~(21)で表される構造単位等が挙げられる。また、前記式(15)で表される構造単位としては、下記式(19)~(21)で表される構造単位を、それぞれ繰り返した構造等であってもよい。 More specifically, examples of the structural unit represented by formula (15) include structural units represented by the following formulas (19) to (21). Furthermore, the structural unit represented by formula (15) may also be a structure in which the structural units represented by formulas (19) to (21) below are respectively repeated.
前記スチレン系重合体(C)としては、例えば、メチルスチレン(エチレン/ブチレン)メチルスチレン共重合体、メチルスチレン(エチレン-エチレン/プロピレン)メチルスチレン共重合体、スチレンイソプレン共重合体、スチレンイソプレンスチレン共重合体、スチレン(エチレン/ブチレン)スチレン共重合体、スチレン(エチレン-エチレン/プロピレン)スチレン共重合体、スチレンブタジエンスチレン共重合体、及びスチレン(ブタジエン/ブチレン)スチレン共重合体等が挙げられる。また、前記スチレン系重合体(C)は、前記スチレン系共重合体の少なくとも一部が水添されているスチレン系重合体であってもよい。また、前記スチレン系重合体(C)としては、前記スチレン系重合体の少なくとも一部を酸変性したスチレン系重合体であることが好ましく、前記スチレン系重合体の少なくとも一部を無水マレイン酸で酸変性したスチレン系重合体であることがより好ましい。このような酸変性したスチレン系重合体を用いると、ガラス転移温度を高くすることができる。このことは、前記スチレン系重合体(C)の、前記マレイミド化合物(A)との相溶性が高くなることによると考えられる。また、前記スチレン系重合体(C)の酸価が、2mgCH3ONa/g以上であることが好ましく、2~10mgCH3ONa/gであることがより好ましい。具体的には、前記スチレン系重合体(C)は、酸価が2mgCH3ONa/g以上となるように、無水マレイン酸で酸変性したスチレン系重合体であることが好ましく、酸価が2~10mgCH3ONa/gとなるように、無水マレイン酸で酸変性したスチレン系重合体であることがより好ましい。前記スチレン系重合体(C)の酸価が前記範囲内であると、前記スチレン系重合体(C)による効果、すなわち、前記樹脂組成物の硬化物の熱膨張率を低下させる効果もより好適に奏することができる。より具体的には、高温域(例えば、210~260℃等)での熱膨張率を低下させる効果をより好適に奏することができる。このことは、前記スチレン系重合体(C)の、前記マレイミド化合物(A)との相溶性が高くなることによると考えられる。よって、前記スチレンを含む単量体由来の構造単位の含有量が比較的少ない、例えば、5~20質量%であっても、前記樹脂組成物の硬化物の熱膨張率を低下させる効果をより好適に奏することができる。ここで、酸価とは、試料1g中の遊離酸を中和するのに要するナトリウムメトキシド(CH3ONa)の量(mg)である。 Examples of the styrene-based polymer (C) include methylstyrene (ethylene/butylene) methylstyrene copolymer, methylstyrene (ethylene-ethylene/propylene) methylstyrene copolymer, styrene-isoprene copolymer, styrene-isoprene styrene copolymer, styrene (ethylene/butylene) styrene copolymer, styrene (ethylene-ethylene/propylene) styrene copolymer, styrene-butadiene styrene copolymer, and styrene (butadiene/butylene) styrene copolymer. The styrene-based polymer (C) may be a styrene-based polymer in which at least a portion of the styrene-based copolymer is hydrogenated. The styrene-based polymer (C) is preferably a styrene-based polymer in which at least a portion of the styrene-based polymer is acid-modified, and more preferably a styrene-based polymer in which at least a portion of the styrene-based polymer is acid-modified with maleic anhydride. The use of such an acid-modified styrene-based polymer can increase the glass transition temperature. This is thought to be due to the increased compatibility of the styrene-based polymer (C) with the maleimide compound (A). The acid value of the styrene-based polymer (C) is preferably 2 mg CH 3 ONa/g or more, more preferably 2 to 10 mg CH 3 ONa/g. Specifically, the styrene-based polymer (C) is preferably a styrene-based polymer acid-modified with maleic anhydride so as to have an acid value of 2 mg CH 3 ONa/g or more, and more preferably a styrene-based polymer acid-modified with maleic anhydride so as to have an acid value of 2 to 10 mg CH 3 ONa/g. When the acid value of the styrene-based polymer (C) is within the above range, the effect of the styrene-based polymer (C), i.e., the effect of reducing the thermal expansion coefficient of the cured product of the resin composition, can be more suitably exhibited. More specifically, the effect of reducing the thermal expansion coefficient in a high temperature range (e.g., 210 to 260°C) can be more suitably exhibited. This is thought to be due to the increased compatibility of the styrene-based polymer (C) with the maleimide compound (A). Therefore, even if the content of structural units derived from the styrene-containing monomer is relatively low, for example, 5 to 20 mass %, the effect of reducing the thermal expansion coefficient of the cured product of the resin composition can be more suitably achieved. Here, the acid value is the amount (mg) of sodium methoxide (CH 3 ONa) required to neutralize the free acid in 1 g of sample.
前記スチレン系重合体(C)は、重量平均分子量が10000~300000であることが好ましく、10000~200000であることがより好ましい。前記分子量が低すぎると、前記樹脂組成物の硬化物のガラス転移温度が低下したり、耐熱性が低下する傾向がある。また、前記分子量が高すぎると、前記樹脂組成物をワニス状にしたときの粘度や、加熱成形時の前記樹脂組成物の粘度が高くなりすぎる傾向がある。なお、重量平均分子量は、一般的な分子量測定方法で測定したものであればよく、具体的には、ゲルパーミエーションクロマトグラフィー(GPC)を用いて測定した値等が挙げられる。 The styrene polymer (C) preferably has a weight-average molecular weight of 10,000 to 300,000, and more preferably 10,000 to 200,000. If the molecular weight is too low, the glass transition temperature of the cured product of the resin composition tends to decrease, and the heat resistance tends to decrease. If the molecular weight is too high, the viscosity of the resin composition when made into a varnish or when heated and molded tends to become too high. The weight-average molecular weight may be measured using a general molecular weight measurement method, and specific examples include values measured using gel permeation chromatography (GPC).
前記スチレン系重合体(C)は、上記例示のスチレン系重合体を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 The styrene-based polymer (C) may be any of the above-exemplified styrene-based polymers used alone or in combination of two or more.
(マレイミド化合物(D))
前記樹脂組成物には、前記マレイミド化合物(A)以外のマレイミド化合物(D)を含んでいてもよい。前記マレイミド化合物(D)としては、前記マレイミド化合物(A1)、前記マレイミド化合物(A2)、及び前記マレイミド化合物(A3)以外のマレイミド化合物であれば、特に限定されない。前記マレイミド化合物(D)としては、分子中にマレイミド基を有し、かつ、前記メタ位に配向して結合されているアリーレン構造及び前記インダン構造のいずれも分子中に有しないマレイミド化合物である。前記マレイミド化合物(D)としては、例えば、分子中にマレイミド基を1個以上有するマレイミド化合物、及び変性マレイミド化合物等が挙げられる。前記マレイミド化合物(D)としては、例えば、4,4’-ジフェニルメタンビスマレイミド、フェニルメタンマレイミド、m-フェニレンビスマレイミド、ビスフェノールAジフェニルエーテルビスマレイミド、3,3’-ジメチル-5,5’-ジエチル-4,4’-ジフェニルメタンビスマレイミド、4-メチル-1,3-フェニレンビスマレイミド、ビフェニルアラルキル型ポリマレイミド化合物等のフェニルマレイミド化合物、及び脂肪族骨格を有するN-アルキルビスマレイミド化合物等が挙げられる。前記変性マレイミド化合物としては、例えば、分子中の一部がアミン化合物で変性された変性マレイミド化合物、分子中の一部がシリコーン化合物で変性された変性マレイミド化合物等が挙げられる。前記マレイミド化合物(D)としては、市販品を使用することもでき、例えば、日本化薬株式会社製のMIR-3000-70MT中の固形分、大和化成工業株式会社製の、BMI-2300、BMI-4000、BMI-5100、ケイ・アイ化成株式会社製の、BMI、BMI-70、BMI-80、及びDesigner Molecules Inc.製の、BMI-689、BMI-1500、BMI-3000J、BMI-5000等を用いてもよい。
(Maleimide Compound (D))
The resin composition may contain a maleimide compound (D) other than the maleimide compound (A). The maleimide compound (D) is not particularly limited as long as it is a maleimide compound other than the maleimide compound (A1), the maleimide compound (A2), and the maleimide compound (A3). The maleimide compound (D) is a maleimide compound that has a maleimide group in the molecule and does not have either the arylene structure bonded to the meta position or the indane structure in the molecule. Examples of the maleimide compound (D) include maleimide compounds having one or more maleimide groups in the molecule, and modified maleimide compounds. Examples of the maleimide compound (D) include phenylmaleimide compounds such as 4,4'-diphenylmethane bismaleimide, phenylmethane maleimide, m-phenylene bismaleimide, bisphenol A diphenyl ether bismaleimide, 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide, 4-methyl-1,3-phenylene bismaleimide, and biphenylaralkyl polymaleimide compounds, as well as N-alkyl bismaleimide compounds having an aliphatic skeleton. Examples of the modified maleimide compound include modified maleimide compounds in which a portion of the molecule is modified with an amine compound, and modified maleimide compounds in which a portion of the molecule is modified with a silicone compound. As the maleimide compound (D), commercially available products may be used. For example, the solid content of MIR-3000-70MT manufactured by Nippon Kayaku Co., Ltd., BMI-2300, BMI-4000, and BMI-5100 manufactured by Daiwa Kasei Kogyo Co., Ltd., BMI, BMI-70, and BMI-80 manufactured by K.I. Kasei Co., Ltd., and BMI-689, BMI-1500, BMI-3000J, and BMI-5000 manufactured by Designer Molecules Inc. may be used.
(無機充填材(E))
前記樹脂組成物には、本発明の効果を損なわない範囲で、必要に応じて、無機充填材(E)を含んでいてもよい。また、前記樹脂組成物の硬化物の耐熱性等を高めることができる点から、前記無機充填材(E)を含有することが好ましい。前記無機充填材(E)は、樹脂組成物に含有される無機充填材として使用できる無機充填材であれば、特に限定されない。前記無機充填材(E)としては、例えば、金属酸化物フィラー、金属水酸化物フィラー、モリブデン酸塩フィラー、窒化物フィラー、チタン酸塩フィラー、無水炭酸マグネシウムフィラー等の炭酸マグネシウムフィラー、炭酸カルシウムフィラー、石英ガラスフィラー、タルクフィラー、ホウ酸アルミニウムフィラー、及び硫酸バリウムフィラー等が挙げられる。前記金属酸化物フィラーとしては、例えば、シリカフィラー、アルミナフィラー、酸化チタンフィラー、酸化マグネシウムフィラー、及びマイカフィラー等が挙げられる。前記シリカフィラーとしては、例えば、破砕状シリカ、溶融球状シリカ等の球状シリカ、及びシリカ粒子等が挙げられる。前記金属水酸化物フィラーとしては、例えば、水酸化マグネシウムフィラー及び水酸化アルミニウムフィラー等が挙げられる。前記モリブデン酸塩フィラーとしては、例えば、モリブデン酸亜鉛フィラー、モリブデン酸カルシウムフィラー、及びモリブデン酸マグネシウムフィラー等が挙げられる。前記窒化物フィラーとしては、例えば、窒化アルミニウムフィラー及び窒化ホウ素フィラー等が挙げられる。前記チタン酸塩フィラーとしては、例えば、チタン酸バリウムフィラー、チタン酸ストロンチウムフィラー、チタン酸カルシウムフィラー、及びチタン酸アルミニウムフィラー等が挙げられる。この中でも、シリカフィラー、水酸化マグネシウムフィラー及び水酸化アルミニウムフィラー等の金属水酸化物フィラー、酸化アルミニウムフィラー、窒化ホウ素フィラー、チタン酸ストロンチウムフィラー、チタン酸カルシウムフィラー、及びモリブデン酸亜鉛フィラー等が好ましく、シリカフィラーがより好ましい。また、前記無機充填材は、単独で用いてもよいし、2種以上を組み合わせて用いてもよい。2種以上の前記無機充填材を組み合わせて用いる場合、シリカフィラーと、シリカフィラー以外の無機充填材の1種以上とを組み合わせて用いてもよく、シリカフィラーとモリブデン酸亜鉛フィラーとを組み合わせて用いることが好ましい。また、前記無機充填材としては、例えば、前記モリブデン酸塩フィラーにおけるモリブテン酸塩を担持したタルクフィラー等であってもよい。
(Inorganic filler (E))
The resin composition may contain an inorganic filler (E) as needed, as long as the effects of the present invention are not impaired. Furthermore, it is preferable to contain the inorganic filler (E) in order to improve the heat resistance, etc., of the cured product of the resin composition. The inorganic filler (E) is not particularly limited as long as it is an inorganic filler that can be used as an inorganic filler contained in a resin composition. Examples of the inorganic filler (E) include metal oxide fillers, metal hydroxide fillers, molybdate fillers, nitride fillers, titanate fillers, magnesium carbonate fillers such as anhydrous magnesium carbonate fillers, calcium carbonate fillers, quartz glass fillers, talc fillers, aluminum borate fillers, and barium sulfate fillers. Examples of the metal oxide fillers include silica fillers, alumina fillers, titanium oxide fillers, magnesium oxide fillers, and mica fillers. Examples of the silica fillers include crushed silica, spherical silica such as fused spherical silica, and silica particles. Examples of the metal hydroxide filler include magnesium hydroxide filler and aluminum hydroxide filler. Examples of the molybdate filler include zinc molybdate filler, calcium molybdate filler, and magnesium molybdate filler. Examples of the nitride filler include aluminum nitride filler and boron nitride filler. Examples of the titanate filler include barium titanate filler, strontium titanate filler, calcium titanate filler, and aluminum titanate filler. Among these, metal hydroxide fillers such as silica filler, magnesium hydroxide filler, and aluminum hydroxide filler, aluminum oxide filler, boron nitride filler, strontium titanate filler, calcium titanate filler, and zinc molybdate filler are preferred, with silica filler being more preferred. The inorganic fillers may be used alone or in combination of two or more. When two or more kinds of the inorganic fillers are used in combination, a silica filler may be used in combination with one or more inorganic fillers other than the silica filler, and a silica filler and a zinc molybdate filler are preferably used in combination. In addition, the inorganic filler may be, for example, a talc filler carrying molybdate in the molybdate filler.
前記無機充填材(E)は、表面処理された無機充填材であってもよいし、表面処理されていない無機充填材であってもよい。また、前記表面処理としては、例えば、シランカップリング剤による処理等が挙げられる。 The inorganic filler (E) may be a surface-treated or untreated inorganic filler. Examples of the surface treatment include treatment with a silane coupling agent.
前記シランカップリング剤としては、特に限定されず、例えば、ビニル基、スチリル基、メタクリロイル基、アクリロイル基、フェニルアミノ基、イソシアヌレート基、ウレイド基、メルカプト基、イソシアネート基、エポキシ基、及び酸無水物基からなる群から選ばれる少なくとも1種の官能基を有するシランカップリング剤等が挙げられる。すなわち、このシランカップリング剤は、反応性官能基として、ビニル基、スチリル基、メタクリロイル基、アクリロイル基、フェニルアミノ基、イソシアヌレート基、ウレイド基、メルカプト基、イソシアネート基、エポキシ基、及び酸無水物基のうち、少なくとも1つを有し、さらに、メトキシ基やエトキシ基等の加水分解性基を有する化合物等が挙げられる。 The silane coupling agent is not particularly limited, and examples include silane coupling agents having at least one functional group selected from the group consisting of vinyl groups, styryl groups, methacryloyl groups, acryloyl groups, phenylamino groups, isocyanurate groups, ureido groups, mercapto groups, isocyanate groups, epoxy groups, and acid anhydride groups. In other words, this silane coupling agent has at least one reactive functional group selected from vinyl groups, styryl groups, methacryloyl groups, acryloyl groups, phenylamino groups, isocyanurate groups, ureido groups, mercapto groups, isocyanate groups, epoxy groups, and acid anhydride groups, and further includes compounds having a hydrolyzable group such as a methoxy group or an ethoxy group.
前記シランカップリング剤としては、ビニル基を有するものとして、例えば、ビニルトリエトキシシラン、及びビニルトリメトキシシラン等が挙げられる。前記シランカップリング剤としては、スチリル基を有するものとして、例えば、p-スチリルトリメトキシシラン、及びp-スチリルトリエトキシシラン等が挙げられる。前記シランカップリング剤としては、メタクリロイル基を有するものとして、例えば、3-メタクリロキシプロピルトリメトキシシラン、3-メタクリロキシプロピルメチルジメトキシシラン、3-メタクリロキシプロピルトリエトキシシラン、3-メタクリロキシプロピルメチルジエトキシシラン、及び3-メタクリロキシプロピルエチルジエトキシシラン等が挙げられる。前記シランカップリング剤としては、アクリロイル基を有するものとして、例えば、3-アクリロキシプロピルトリメトキシシラン、及び3-アクリロキシプロピルトリエトキシシラン等が挙げられる。前記シランカップリング剤としては、フェニルアミノ基を有するものとして、例えば、N-フェニル-3-アミノプロピルトリメトキシシラン及びN-フェニル-3-アミノプロピルトリエトキシシラン等が挙げられる。 The silane coupling agent has a vinyl group, and examples thereof include vinyltriethoxysilane and vinyltrimethoxysilane. The silane coupling agent has a styryl group, and examples thereof include p-styryltrimethoxysilane and p-styryltriethoxysilane. The silane coupling agent has a methacryloyl group, and examples thereof include 3-methacryloxypropyltrimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropylmethyldiethoxysilane, and 3-methacryloxypropylethyldiethoxysilane. The silane coupling agent has an acryloyl group, and examples thereof include 3-acryloxypropyltrimethoxysilane and 3-acryloxypropyltriethoxysilane. Examples of the silane coupling agent include those having a phenylamino group, such as N-phenyl-3-aminopropyltrimethoxysilane and N-phenyl-3-aminopropyltriethoxysilane.
前記無機充填材(E)の平均粒子径は、特に限定されず、例えば、0.05~10μmであることが好ましく、0.1~8μmであることがより好ましい。なお、ここで平均粒子径とは、体積平均粒子径のことを指す。体積平均粒子径は、例えば、レーザ回折法等によって測定することができる。 The average particle size of the inorganic filler (E) is not particularly limited, but is preferably 0.05 to 10 μm, and more preferably 0.1 to 8 μm. Note that the average particle size here refers to the volume average particle size. The volume average particle size can be measured, for example, by laser diffraction.
(含有量)
前記スチレン系重合体(C)の含有量は、前記樹脂組成物に対して、12質量%以上であり、12~40質量%であることが好ましく、12~30質量%であることがより好ましく、12~25質量%であることがさらに好ましい。また、前記スチレン系重合体(C)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)の合計に対して、20~60質量%であることが好ましく、30~55質量%であることがより好ましい。
(Content)
The content of the styrene polymer (C) is 12% by mass or more, preferably 12 to 40% by mass, more preferably 12 to 30% by mass, and even more preferably 12 to 25% by mass, based on the total amount of the maleimide compound (A), the curing agent (B), and the styrene polymer (C), ...
前記マレイミド化合物(A)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)の合計に対して、20~50質量%であることが好ましく、25~45質量%であることがより好ましい。 The content of the maleimide compound (A) is preferably 20 to 50 mass %, and more preferably 25 to 45 mass %, of the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
前記硬化剤(B)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)の合計に対して、5~40質量%であることが好ましく、5~30質量%であることがより好ましい。 The content of the curing agent (B) is preferably 5 to 40 mass% and more preferably 5 to 30 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
前記マレイミド化合物(A)、前記ラジカル重合性化合物(B)、及び前記スチレン系重合体(C)の含有量が、上記範囲内になるように含有させることによって、熱膨張係数のより低い硬化物となる樹脂組成物が得られる。 By incorporating the maleimide compound (A), the radical polymerizable compound (B), and the styrene-based polymer (C) in amounts within the above ranges, a resin composition can be obtained that will result in a cured product with a lower thermal expansion coefficient.
前記樹脂組成物には、上述したように、前記マレイミド化合物(D)を含有してもよい。前記樹脂組成物に前記マレイミド化合物(D)を含む場合は、前記マレイミド化合物(A)と前記マレイミド化合物(D)との合計含有量は、前記マレイミド化合物(A)、前記硬化剤(B)、前記スチレン系重合体(C)、及び前記マレイミド化合物(D)の合計に対して、20~60質量%であることが好ましく、30~55質量%であることがより好ましい。 As described above, the resin composition may contain the maleimide compound (D). When the resin composition contains the maleimide compound (D), the total content of the maleimide compound (A) and the maleimide compound (D) is preferably 20 to 60% by mass, and more preferably 30 to 55% by mass, based on the total of the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D).
前記樹脂組成物には、上述したように、前記無機充填材(E)を含有してもよい。前記樹脂組成物に前記無機充填材(E)を含む場合は、前記無機充填材(E)の含有量は、有機成分(前記樹脂組成物における前記無機充填材(E)以外)100質量部に対して、100~300質量部であることが好ましく、100~250質量部であることがより好ましい。また、前記無機充填材(E)の含有量は、前記マレイミド化合物(A)、前記硬化剤(B)、及び前記スチレン系重合体(C)の合計100質量部に対して、100~300質量部であることが好ましく、100~250質量部であることがより好ましい。前記無機充填剤を含むことは、前記樹脂組成物のガラス転移温度や貯蔵弾性率を高くする点で好ましい。 As described above, the resin composition may contain the inorganic filler (E). When the resin composition contains the inorganic filler (E), the content of the inorganic filler (E) is preferably 100 to 300 parts by mass, and more preferably 100 to 250 parts by mass, per 100 parts by mass of the organic components (other than the inorganic filler (E) in the resin composition). Furthermore, the content of the inorganic filler (E) is preferably 100 to 300 parts by mass, and more preferably 100 to 250 parts by mass, per 100 parts by mass of the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C). The inclusion of the inorganic filler is preferable in terms of increasing the glass transition temperature and storage modulus of the resin composition.
(その他の成分)
前記樹脂組成物には、本発明の効果を損なわない範囲で、前記マレイミド化合物(A)、前記硬化剤(B)、及び前記スチレン系重合体(C)以外の成分(その他の成分)を含有してもよい。前記樹脂組成物には、前記その他の成分として、上述したように、前記マレイミド化合物(D)及び前記無機充填材(E)を含有してもよい。前記その他の成分としては、前記マレイミド化合物(D)及び前記無機充填材(E)以外として、例えば、前記マレイミド化合物(A)、前記硬化剤(B)、前記スチレン系重合体(C)、及び前記マレイミド化合物(D)以外の有機成分、難燃剤、反応開始剤、硬化促進剤、触媒、重合遅延剤、重合禁止剤、分散剤、レベリング剤、カップリング剤、消泡剤、酸化防止剤、熱安定剤、帯電防止剤、紫外線吸収剤、染料や顔料、及び滑剤等の添加剤等が挙げられる。
(Other ingredients)
The resin composition may contain components (other components) other than the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C), as long as the effects of the present invention are not impaired. As described above, the resin composition may contain the maleimide compound (D) and the inorganic filler (E) as the other components. Examples of the other components include, in addition to the maleimide compound (D) and the inorganic filler (E), organic components other than the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D), flame retardants, reaction initiators, curing accelerators, catalysts, polymerization retarders, polymerization inhibitors, dispersants, leveling agents, coupling agents, defoamers, antioxidants, heat stabilizers, antistatic agents, UV absorbers, dyes and pigments, and additives such as lubricants.
本実施形態に係る樹脂組成物には、上述したように、前記マレイミド化合物(A)、前記硬化剤(B)、前記スチレン系重合体(C)、及び前記マレイミド化合物(D)以外の有機成分を含有してもよい。前記有機成分としては、例えば、前記マレイミド化合物(A)、前記硬化剤(B)、及び前記スチレン系重合体(C)の少なくともいずれか1種と反応する化合物であってもよいし、反応しない化合物であってもよい。前記有機成分としては、具体的には、前記オキサジン化合物(B1)以外のオキサジン化合物(他のオキサジン化合物)、エポキシ化合物、シアン酸エステル化合物、及び活性エステル化合物等が挙げられる。 As described above, the resin composition according to this embodiment may contain organic components other than the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and the maleimide compound (D). The organic components may be, for example, compounds that react with at least one of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C), or compounds that do not react with them. Specific examples of the organic components include oxazine compounds other than the oxazine compound (B1) (other oxazine compounds), epoxy compounds, cyanate ester compounds, and active ester compounds.
前記他のオキサジン化合物としては、オキサジン基を分子内に有し、かつ、前記オキサジン化合物(B1)以外のオキサジン化合物であれば、特に限定されない。前記他のオキサジン化合物としては、例えば、分子内にフェノールフタレイン構造を有するベンゾオキサジン化合物(フェノールフタレイン型ベンゾオキサジン化合物)、ビスフェノールF型ベンゾオキサジン化合物、及びジアミノジフェニルメタン(DDM)型ベンゾオキサジン化合物等が挙げられる。前記他のオキサジン化合物としては、より具体的には、3,3’-(メチレン-1,4-ジフェニレン)ビス(3,4-ジヒドロ-2H-1,3-ベンゾオキサジン)(P-d型ベンゾオキサジン化合物)、及び2,2-ビス(3,4-ジヒドロ-2H-3-フェニル-1,3-ベンゾオキサジン)メタン(F-a型ベンゾオキサジン化合物)等が挙げられる。 The other oxazine compounds are not particularly limited as long as they have an oxazine group in the molecule and are oxazine compounds other than the oxazine compound (B1). Examples of the other oxazine compounds include benzoxazine compounds having a phenolphthalein structure in the molecule (phenolphthalein-type benzoxazine compounds), bisphenol F-type benzoxazine compounds, and diaminodiphenylmethane (DDM)-type benzoxazine compounds. More specific examples of the other oxazine compounds include 3,3'-(methylene-1,4-diphenylene)bis(3,4-dihydro-2H-1,3-benzoxazine) (P-d-type benzoxazine compound) and 2,2-bis(3,4-dihydro-2H-3-phenyl-1,3-benzoxazine)methane (F-a-type benzoxazine compound).
前記エポキシ化合物は、分子中にエポキシ基を有する化合物であり、具体的には、ビスフェノールA型エポキシ化合物等のビスフェノール型エポキシ化合物、フェノールノボラック型エポキシ化合物、クレゾールノボラック型エポキシ化合物、ジシクロペンタジエン型エポキシ化合物、ビスフェノールAノボラック型エポキシ化合物、ビフェニルアラルキル型エポキシ化合物、分子内にエポキシ基を有するポリブタジエン化合物、及びナフタレン環含有エポキシ化合物等が挙げられる。また、前記エポキシ化合物としては、前記各エポキシ化合物の重合体であるエポキシ樹脂も含まれる。 The epoxy compound is a compound that has an epoxy group in its molecule, and specific examples include bisphenol-type epoxy compounds such as bisphenol A-type epoxy compounds, phenol novolac-type epoxy compounds, cresol novolac-type epoxy compounds, dicyclopentadiene-type epoxy compounds, bisphenol A novolac-type epoxy compounds, biphenyl aralkyl-type epoxy compounds, polybutadiene compounds that have an epoxy group in their molecule, and naphthalene ring-containing epoxy compounds. The epoxy compound also includes epoxy resins, which are polymers of the above epoxy compounds.
前記シアン酸エステル化合物は、分子中にシアナト基を有する化合物であり、例えば、2,2-ビス(4-シアネートフェニル)プロパン、ビス(3,5-ジメチル-4-シアネートフェニル)メタン、及び2,2-ビス(4-シアネートフェニル)エタン等が挙げられる。 The cyanate ester compound is a compound having a cyanate group in the molecule, and examples include 2,2-bis(4-cyanatephenyl)propane, bis(3,5-dimethyl-4-cyanatephenyl)methane, and 2,2-bis(4-cyanatephenyl)ethane.
前記活性エステル化合物は、分子中に反応活性の高いエステル基を有する化合物であり、例えば、ベンゼンカルボン酸活性エステル、ベンゼンジカルボン酸活性エステル、ベンゼントリカルボン酸活性エステル、ベンゼンテトラカルボン酸活性エステル、ナフタレンカルボン酸活性エステル、ナフタレンジカルボン酸活性エステル、ナフタレントリカルボン酸活性エステル、ナフタレンテトラカルボン酸活性エステル、フルオレンカルボン酸活性エステル、フルオレンジカルボン酸活性エステル、フルオレントリカルボン酸活性エステル、及びフルオレンテトラカルボン酸活性エステル等が挙げられる。 The active ester compound is a compound having a highly reactive ester group in the molecule, and examples include benzenecarboxylic acid active ester, benzenedicarboxylic acid active ester, benzenetricarboxylic acid active ester, benzenetetracarboxylic acid active ester, naphthalenecarboxylic acid active ester, naphthalenedicarboxylic acid active ester, naphthalenetricarboxylic acid active ester, naphthalenetetracarboxylic acid active ester, fluorenecarboxylic acid active ester, fluorenedicarboxylic acid active ester, fluorenetricarboxylic acid active ester, and fluorenetetracarboxylic acid active ester.
本実施形態に係る樹脂組成物には、上述したように、難燃剤を含有してもよい。難燃剤を含有することによって、樹脂組成物の硬化物の難燃性を高めることができる。前記難燃剤は、特に限定されない。具体的には、臭素系難燃剤等のハロゲン系難燃剤を使用する分野では、例えば、融点が300℃以上のエチレンジペンタブロモベンゼン、エチレンビステトラブロモイミド、デカブロモジフェニルオキサイド、テトラデカブロモジフェノキシベンゼン、及び前記重合性化合物と反応するブロモスチレン系化合物が好ましい。ハロゲン系難燃剤を使用することにより、高温時におけるハロゲンの脱離が抑制でき、耐熱性の低下を抑制できると考えられる。また、ハロゲンフリーが要求される分野では、リンを含有する難燃剤(リン系難燃剤)が用いられることもある。前記リン系難燃剤としては、特に限定されないが、例えば、リン酸エステル系難燃剤、ホスファゼン系難燃剤、ビスジフェニルホスフィンオキサイド系難燃剤、9,10-ジヒドロ-9-オキサ-10-フォスファフェナントレン-10-オキサイド(DOPO)系難燃剤、及びホスフィン酸塩系難燃剤が挙げられる。リン酸エステル系難燃剤の具体例としては、ジキシレニルホスフェートの縮合リン酸エステルが挙げられる。ホスファゼン系難燃剤の具体例としては、フェノキシホスファゼンが挙げられる。ビスジフェニルホスフィンオキサイド系難燃剤の具体例としては、キシリレンビスジフェニルホスフィンオキサイドが挙げられる。DOPO系難燃剤の具体例としては、例えば、DOPO基を分子中に2つ有する炭化水素(DOPO誘導体化合物)、及び反応性官能基を有するDOPO等が挙げられる。ホスフィン酸塩系難燃剤の具体例としては、例えば、ジアルキルホスフィン酸アルミニウム塩のホスフィン酸金属塩が挙げられる。前記難燃剤としては、例示した各難燃剤を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 As described above, the resin composition according to this embodiment may contain a flame retardant. By including a flame retardant, the flame retardancy of the cured resin composition can be enhanced. The flame retardant is not particularly limited. Specifically, in fields where halogen-based flame retardants such as bromine-based flame retardants are used, preferred examples include ethylene dipentabromobenzene, ethylene bistetrabromoimide, decabromodiphenyl oxide, tetradecabromodiphenoxybenzene, and bromostyrene-based compounds that react with the polymerizable compounds, all of which have melting points of 300°C or higher. It is believed that the use of a halogen-based flame retardant can suppress the elimination of halogens at high temperatures, thereby preventing a decrease in heat resistance. Furthermore, in fields where halogen-free materials are required, phosphorus-containing flame retardants (phosphorus-based flame retardants) are sometimes used. The phosphorus-based flame retardant is not particularly limited, but examples thereof include phosphate ester-based flame retardants, phosphazene-based flame retardants, bisdiphenylphosphine oxide-based flame retardants, 9,10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide (DOPO)-based flame retardants, and phosphinate-based flame retardants. Specific examples of phosphate ester-based flame retardants include condensed phosphate esters of dixylenyl phosphate. Specific examples of phosphazene-based flame retardants include phenoxyphosphazene. Specific examples of bisdiphenylphosphine oxide-based flame retardants include xylylenebisdiphenylphosphine oxide. Specific examples of DOPO-based flame retardants include hydrocarbons having two DOPO groups in the molecule (DOPO derivative compounds) and DOPO having a reactive functional group. Specific examples of phosphinate-based flame retardants include metal phosphinates of aluminum dialkylphosphinates. As the flame retardant, each of the exemplified flame retardants may be used alone or in combination of two or more.
本実施形態に係る樹脂組成物には、上述したように、反応開始剤を含有してもよい。前記反応開始剤は、前記樹脂組成物の硬化反応を促進することができるものであれば、特に限定されず、例えば、過酸化物及び有機アゾ化合物等が挙げられる。前記過酸化物としては、例えば、α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼン(PBP)、2,5-ジメチル-2,5-ジ(t-ブチルパーオキシ)-3-ヘキシン、及び過酸化ベンゾイル等が挙げられる。また、前記有機アゾ化合物としては、例えば、アゾビスイソブチロニトリル等が挙げられる。また、必要に応じて、カルボン酸金属塩等を併用することができる。そうすることによって、硬化反応を一層促進させるができる。これらの中でも、α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼンが好ましく用いられる。α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼンは、反応開始温度が比較的に高いため、プリプレグ乾燥時等の硬化する必要がない時点での硬化反応の促進を抑制することができ、樹脂組成物の保存性の低下を抑制することができる。さらに、α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼンは、揮発性が低いため、プリプレグ乾燥時や保存時に揮発せず、安定性が良好である。また、反応開始剤は、単独で用いても、2種以上を組み合わせて用いてもよい。 As described above, the resin composition according to this embodiment may contain a reaction initiator. The reaction initiator is not particularly limited as long as it can accelerate the curing reaction of the resin composition, and examples thereof include peroxides and organic azo compounds. Examples of peroxides include α,α'-di(t-butylperoxy)diisopropylbenzene (PBP), 2,5-dimethyl-2,5-di(t-butylperoxy)-3-hexyne, and benzoyl peroxide. Examples of organic azo compounds include azobisisobutyronitrile. If necessary, a metal carboxylate or the like can be used in combination. This further accelerates the curing reaction. Among these, α,α'-di(t-butylperoxy)diisopropylbenzene is preferred. Because α,α'-di(t-butylperoxy)diisopropylbenzene has a relatively high reaction initiation temperature, it can suppress acceleration of the curing reaction when curing is not required, such as during prepreg drying, thereby suppressing a decrease in the shelf life of the resin composition. Furthermore, α,α'-di(t-butylperoxy)diisopropylbenzene has low volatility and does not evaporate during prepreg drying or storage, providing good stability. Furthermore, the reaction initiators may be used alone or in combination of two or more.
本実施形態に係る樹脂組成物には、上述したように、硬化促進剤を含有してもよい。前記硬化促進剤としては、前記樹脂組成物の硬化反応を促進することができるものであれば、特に限定されない。前記硬化促進剤としては、具体的には、イミダゾール類及びその誘導体、有機リン系化合物、第二級アミン類及び第三級アミン類等のアミン類、第四級アンモニウム塩、有機ボロン系化合物、及び金属石鹸等が挙げられる。前記イミダゾール類としては、例えば、2-エチル-4-メチルイミダゾール(2E4MZ)、2-メチルイミダゾール、2-フェニル-4-メチルイミダゾール、2-フェニルイミダゾール、及び1-ベンジル-2-メチルイミダゾール等が挙げられる。また、前記有機リン系化合物としては、トリフェニルホスフィン、ジフェニルホスフィン、フェニルホスフィン、トリブチルホスフィン、及びトリメチルホスフィン等が挙げられる。また、前記アミン類としては、例えば、ジメチルベンジルアミン、トリエチレンジアミン、トリエタノールアミン、及び1,8-ジアザ-ビシクロ(5,4,0)ウンデセン-7(DBU)等が挙げられる。また、前記第四級アンモニウム塩としては、テトラブチルアンモニウムブロミド等が挙げられる。また、前記有機ボロン系化合物としては、例えば、2-エチル-4-メチルイミダゾール・テトラフェニルボレート等のテトラフェニルボロン塩、及びテトラフェニルホスホニウム・エチルトリフェニルボレート等のテトラ置換ホスホニウム・テトラ置換ボレート等が挙げられる。また、前記金属石鹸は、脂肪酸金属塩を指し、直鎖状の脂肪酸金属塩であっても、環状の脂肪酸金属塩であってもよい。前記金属石鹸としては、具体的には、炭素数が6~10の、直鎖状の脂肪族金属塩及び環状の脂肪族金属塩等が挙げられる。より具体的には、例えば、ステアリン酸、ラウリン酸、リシノール酸、及びオクチル酸等の直鎖状の脂肪酸や、ナフテン酸等の環状の脂肪酸と、リチウム、マグネシウム、カルシウム、バリウム、銅及び亜鉛等の金属とからなる脂肪族金属塩等が挙げられる。例えば、オクチル酸亜鉛等が挙げられる。前記硬化促進剤は、単独で用いても、2種以上を組み合わせて用いてもよい。 As described above, the resin composition according to this embodiment may contain a curing accelerator. The curing accelerator is not particularly limited as long as it can accelerate the curing reaction of the resin composition. Specific examples of the curing accelerator include imidazoles and their derivatives, organophosphorus compounds, amines such as secondary amines and tertiary amines, quaternary ammonium salts, organoboron compounds, and metal soaps. Examples of the imidazoles include 2-ethyl-4-methylimidazole (2E4MZ), 2-methylimidazole, 2-phenyl-4-methylimidazole, 2-phenylimidazole, and 1-benzyl-2-methylimidazole. Examples of the organophosphorus compounds include triphenylphosphine, diphenylphosphine, phenylphosphine, tributylphosphine, and trimethylphosphine. Examples of the amines include dimethylbenzylamine, triethylenediamine, triethanolamine, and 1,8-diaza-bicyclo(5,4,0)undecene-7 (DBU). Examples of the quaternary ammonium salts include tetrabutylammonium bromide. Examples of the organoboron compounds include tetraphenylboron salts such as 2-ethyl-4-methylimidazole tetraphenylborate, and tetra-substituted phosphonium tetra-substituted borates such as tetraphenylphosphonium ethyltriphenylborate. The metal soap refers to a fatty acid metal salt, and may be either a linear fatty acid metal salt or a cyclic fatty acid metal salt. Specific examples of the metal soap include linear fatty acid metal salts and cyclic fatty acid metal salts having 6 to 10 carbon atoms. More specifically, examples include aliphatic metal salts composed of linear fatty acids such as stearic acid, lauric acid, ricinoleic acid, and octylic acid, or cyclic fatty acids such as naphthenic acid, and metals such as lithium, magnesium, calcium, barium, copper, and zinc. For example, zinc octylate is one example. The curing accelerators may be used alone or in combination of two or more.
本実施形態に係る樹脂組成物には、上述したように、シランカップリング剤を含有してもよい。シランカップリング剤は、樹脂組成物に含有してもよいし、樹脂組成物に含有されている無機充填材に予め表面処理されたシランカップリング剤として含有していてもよい。この中でも、前記シランカップリング剤としては、無機充填材に予め表面処理されたシランカップリング剤として含有することが好ましく、このように無機充填材に予め表面処理されたシランカップリング剤として含有し、さらに、樹脂組成物にもシランカップリング剤を含有させることがより好ましい。また、プリプレグの場合、そのプリプレグには、繊維質基材に予め表面処理されたシランカップリング剤として含有していてもよい。前記シランカップリング剤としては、例えば、上述した、前記無機充填材を表面処理する際に用いるシランカップリング剤と同様のものが挙げられる。 As described above, the resin composition according to this embodiment may contain a silane coupling agent. The silane coupling agent may be contained in the resin composition, or may be contained as a silane coupling agent that has been pre-surface-treated on an inorganic filler contained in the resin composition. Among these, the silane coupling agent is preferably contained as a silane coupling agent that has been pre-surface-treated on an inorganic filler. It is more preferable to contain the silane coupling agent as a silane coupling agent that has been pre-surface-treated on an inorganic filler, and further to contain the silane coupling agent in the resin composition. Furthermore, in the case of a prepreg, the silane coupling agent may be contained as a silane coupling agent that has been pre-surface-treated on a fibrous base material. Examples of the silane coupling agent include the same silane coupling agents as those used to surface-treat the inorganic filler, as described above.
本実施形態に係る樹脂組成物は、熱膨張率の低い硬化物が得られる樹脂組成物である。このことから、本実施形態に係る樹脂組成物を用いて形成された絶縁層を備えた配線板は、反りの発生が少ない。 The resin composition according to this embodiment is a resin composition that produces a cured product with a low coefficient of thermal expansion. As a result, wiring boards equipped with an insulating layer formed using the resin composition according to this embodiment are less likely to warp.
(用途)
前記樹脂組成物は、後述するように、プリプレグを製造する際に用いられる。また、前記樹脂組成物は、樹脂付き金属箔及び樹脂付きフィルムに備えられる樹脂層、及び金属張積層板及び配線板に備えられる絶縁層を形成する際に用いられる。
(Application)
The resin composition is used to produce a prepreg, as described below, and also to form a resin layer provided in a resin-coated metal foil and a resin-coated film, and an insulating layer provided in a metal-clad laminate and a wiring board.
(製造方法)
前記樹脂組成物を製造する方法としては、特に限定されず、例えば、前記マレイミド化合物(A)、前記硬化剤(B)、前記スチレン系重合体(C)、及び必要に応じて、前記マレイミド化合物(A)、前記硬化剤(B)、及び前記スチレン系重合体(C)以外の成分を、所定の含有量となるように混合する方法等が挙げられる。また、有機溶媒を含むワニス状の組成物を得る場合は、後述する方法等が挙げられる。
(Manufacturing method)
The method for producing the resin composition is not particularly limited, and examples thereof include a method of mixing the maleimide compound (A), the curing agent (B), the styrene-based polymer (C), and, if necessary, components other than the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C) so as to achieve a predetermined content, etc. In addition, in the case of obtaining a varnish-like composition containing an organic solvent, the method described below, etc. can be used.
本実施形態に係る樹脂組成物を用いることによって、以下のように、プリプレグ、金属張積層板、配線板、樹脂付き金属箔、及び樹脂付きフィルムを得ることができる。 By using the resin composition according to this embodiment, prepregs, metal-clad laminates, wiring boards, resin-coated metal foils, and resin-coated films can be obtained as follows.
[プリプレグ]
図1は、本発明の実施形態に係るプリプレグ1の一例を示す概略断面図である。
[Prepreg]
FIG. 1 is a schematic cross-sectional view showing an example of a prepreg 1 according to an embodiment of the present invention.
本実施形態に係るプリプレグ1は、図1に示すように、前記樹脂組成物又は前記樹脂組成物の半硬化物2と、繊維質基材3とを備える。このプリプレグ1は、前記樹脂組成物又は前記樹脂組成物の半硬化物2と、前記樹脂組成物又は前記樹脂組成物の半硬化物2の中に存在する繊維質基材3とを備える。 As shown in Figure 1, the prepreg 1 according to this embodiment comprises the resin composition or a semi-cured resin composition 2, and a fibrous base material 3. This prepreg 1 comprises the resin composition or a semi-cured resin composition 2, and the fibrous base material 3 present in the resin composition or the semi-cured resin composition 2.
なお、本実施形態において、半硬化物とは、樹脂組成物をさらに硬化しうる程度に途中まで硬化された状態のものである。すなわち、半硬化物は、樹脂組成物を半硬化した状態の(Bステージ化された)ものである。例えば、樹脂組成物は、加熱すると、最初、粘度が徐々に低下し、その後、硬化が開始し、粘度が徐々に上昇する。このような場合、半硬化としては、粘度が上昇し始めてから、完全に硬化する前の間の状態等が挙げられる。 In this embodiment, a semi-cured product refers to a resin composition that has been partially cured to the extent that it can be further cured. In other words, a semi-cured product is a resin composition that has been semi-cured (B-staged). For example, when a resin composition is heated, the viscosity initially gradually decreases, and then curing begins, causing the viscosity to gradually increase. In such a case, semi-cured refers to the state between when the viscosity begins to increase and when the composition is completely cured.
本実施形態に係る樹脂組成物を用いて得られるプリプレグとしては、上記のような、前記樹脂組成物の半硬化物を備えるものであってもよいし、また、硬化させていない前記樹脂組成物そのものを備えるものであってもよい。すなわち、前記樹脂組成物の半硬化物(Bステージの前記樹脂組成物)と、繊維質基材とを備えるプリプレグであってもよいし、硬化前の前記樹脂組成物(Aステージの前記樹脂組成物)と、繊維質基材とを備えるプリプレグであってもよい。また、前記樹脂組成物又は前記樹脂組成物の半硬化物としては、前記樹脂組成物を乾燥又は加熱乾燥させたものであってもよい。 The prepreg obtained using the resin composition according to this embodiment may comprise a semi-cured product of the resin composition as described above, or may comprise the uncured resin composition itself. That is, it may be a prepreg comprising a semi-cured product of the resin composition (the resin composition in B stage) and a fibrous base material, or a prepreg comprising the resin composition before curing (the resin composition in A stage) and a fibrous base material. Furthermore, the resin composition or semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried.
前記プリプレグを製造する際には、プリプレグを形成するための基材である繊維質基材3に含浸するために、前記樹脂組成物2は、ワニス状に調製されて用いられることが多い。すなわち、前記樹脂組成物2は、通常、ワニス状に調製された樹脂ワニスであることが多い。このようなワニス状の樹脂組成物(樹脂ワニス)は、例えば、以下のようにして調製される。 When producing the prepreg, the resin composition 2 is often prepared in a varnish form and used to impregnate the fibrous base material 3, which is the base material for forming the prepreg. In other words, the resin composition 2 is usually a resin varnish prepared in a varnish form. Such a varnish-like resin composition (resin varnish) is prepared, for example, as follows.
まず、有機溶媒に溶解できる各成分を、有機溶媒に投入して溶解させる。この際、必要に応じて、加熱してもよい。その後、必要に応じて用いられる、有機溶媒に溶解しない成分を添加して、ボールミル、ビーズミル、プラネタリーミキサー、ロールミル等を用いて、所定の分散状態になるまで分散させることにより、ワニス状の樹脂組成物が調製される。ここで用いられる有機溶媒としては、前記樹脂組成物における有機成分や樹脂成分等を溶解させ、硬化反応を阻害しないものであれば、特に限定されない。具体的には、例えば、トルエンやメチルエチルケトン(MEK)等が挙げられる。 First, each component that is soluble in an organic solvent is added to the organic solvent and dissolved. Heating may be used if necessary. Then, any components that are insoluble in the organic solvent are added as needed, and the mixture is dispersed using a ball mill, bead mill, planetary mixer, roll mill, or the like until the desired dispersion state is achieved, thereby preparing a varnish-like resin composition. The organic solvent used here is not particularly limited, as long as it dissolves the organic components and resin components in the resin composition and does not inhibit the curing reaction. Specific examples include toluene and methyl ethyl ketone (MEK).
前記繊維質基材としては、具体的には、例えば、ガラスクロス、アラミドクロス、ポリエステルクロス、ガラス不織布、アラミド不織布、ポリエステル不織布、パルプ紙、及びリンター紙が挙げられる。なお、ガラスクロスを用いると、機械強度が優れた積層板が得られ、特に偏平処理加工したガラスクロスが好ましい。前記偏平処理加工としては、具体的には、例えば、ガラスクロスを適宜の圧力でプレスロールにて連続的に加圧してヤーンを偏平に圧縮する方法が挙げられる。なお、一般的に使用される繊維質基材の厚さは、例えば、0.01mm以上0.3mm以下である。また、前記ガラスクロスを構成するガラス繊維としては、特に限定されないが、例えば、Qガラス、NEガラス、Eガラス、Sガラス、Tガラス、Lガラス、及びL2ガラス等が挙げられる。また、前記繊維質基材の表面は、シランカップリング剤で表面処理されていてもよい。このシランカップリング剤としては、特に限定されないが、例えば、ビニル基、アクリロイル基、メタクリロイル基、スチリル基、アミノ基、及びエポキシ基からなる群から選ばれる少なくとも1種を分子内に有するシランカップリング剤等が挙げられる。 Specific examples of the fibrous substrate include glass cloth, aramid cloth, polyester cloth, glass nonwoven fabric, aramid nonwoven fabric, polyester nonwoven fabric, pulp paper, and linter paper. Using glass cloth results in a laminate with excellent mechanical strength, and flattened glass cloth is particularly preferred. Specific examples of the flattening process include a method in which glass cloth is continuously pressed with a press roll at an appropriate pressure to compress the yarns flat. The thickness of commonly used fibrous substrates is, for example, 0.01 mm or more and 0.3 mm or less. The glass fibers constituting the glass cloth are not particularly limited, but examples include Q glass, NE glass, E glass, S glass, T glass, L glass, and L2 glass. The surface of the fibrous substrate may be treated with a silane coupling agent. The silane coupling agent is not particularly limited, but examples include silane coupling agents having at least one group selected from the group consisting of vinyl groups, acryloyl groups, methacryloyl groups, styryl groups, amino groups, and epoxy groups in the molecule.
前記プリプレグの製造方法は、前記プリプレグを製造することができれば、特に限定されない。具体的には、前記プリプレグを製造する際には、上述した本実施形態に係る樹脂組成物は、上述したように、ワニス状に調製し、樹脂ワニスとして用いられることが多い。 The method for producing the prepreg is not particularly limited, as long as it is capable of producing the prepreg. Specifically, when producing the prepreg, the resin composition according to the present embodiment described above is often prepared in the form of a varnish, as described above, and used as a resin varnish.
プリプレグ1を製造する方法としては、具体的には、前記樹脂組成物2、例えば、ワニス状に調製された樹脂組成物2を繊維質基材3に含浸させた後、乾燥する方法が挙げられる。前記樹脂組成物2は、前記繊維質基材3へ、浸漬及び塗布等によって含浸される。必要に応じて複数回繰り返して含浸することも可能である。また、この際、組成や濃度の異なる複数の樹脂組成物を用いて含浸を繰り返すことにより、最終的に希望とする組成及び含浸量に調整することも可能である。 Specific methods for producing prepreg 1 include impregnating fibrous base material 3 with resin composition 2, for example, resin composition 2 prepared in the form of a varnish, and then drying. The resin composition 2 is impregnated into the fibrous base material 3 by immersion, coating, or the like. Impregnation can be repeated multiple times as needed. Furthermore, by repeating the impregnation process using multiple resin compositions with different compositions and concentrations, it is possible to adjust the final composition and impregnation amount to the desired level.
前記樹脂組成物(樹脂ワニス)2が含浸された繊維質基材3は、所望の加熱条件、例えば、40℃以上180℃以下で1分間以上10分間以下加熱される。加熱によって、硬化前(Aステージ)又は半硬化状態(Bステージ)のプリプレグ1が得られる。なお、前記加熱によって、前記樹脂ワニスから有機溶媒を揮発させ、有機溶媒を減少又は除去させることができる。 The fibrous substrate 3 impregnated with the resin composition (resin varnish) 2 is heated under the desired heating conditions, for example, at 40°C to 180°C for 1 minute to 10 minutes. By heating, a prepreg 1 in an uncured (A-stage) or semi-cured (B-stage) state is obtained. Furthermore, by heating, the organic solvent can be volatilized from the resin varnish, reducing or eliminating the organic solvent.
[金属張積層板]
図2は、本発明の実施形態に係る金属張積層板11の一例を示す概略断面図である。
[Metal-clad laminate]
FIG. 2 is a schematic cross-sectional view showing an example of a metal-clad laminate 11 according to an embodiment of the present invention.
本実施形態に係る金属張積層板11は、図2に示すように、前記樹脂組成物の硬化物を含む絶縁層12と、前記絶縁層12の上に設けられた金属箔13とを有する。前記金属張積層板11としては、例えば、図1に示したプリプレグ1の硬化物を含む絶縁層12と、前記絶縁層12とともに積層される金属箔13とから構成される金属張積層板等が挙げられる。また、前記絶縁層12は、前記樹脂組成物の硬化物からなるものであってもよいし、前記プリプレグの硬化物からなるものであってもよい。また、前記金属箔13の厚みは、最終的に得られる配線板に求められる性能等に応じて異なり、特に限定されない。前記金属箔13の厚みは、所望の目的に応じて、適宜設定することができ、例えば、0.2~70μmであることが好ましい。また、前記金属箔13としては、例えば、銅箔及びアルミニウム箔等が挙げられ、前記金属箔が薄い場合は、ハンドリング性を向上のために剥離層及びキャリアを備えたキャリア付銅箔であってもよい。 As shown in FIG. 2, the metal-clad laminate 11 according to this embodiment has an insulating layer 12 containing a cured product of the resin composition and a metal foil 13 disposed on the insulating layer 12. Examples of the metal-clad laminate 11 include a metal-clad laminate composed of an insulating layer 12 containing a cured product of the prepreg 1 shown in FIG. 1 and a metal foil 13 laminated together with the insulating layer 12. The insulating layer 12 may be composed of either a cured product of the resin composition or a cured product of the prepreg. The thickness of the metal foil 13 varies depending on the performance required of the final wiring board and is not particularly limited. The thickness of the metal foil 13 can be appropriately set depending on the desired purpose, and is preferably 0.2 to 70 μm, for example. Examples of the metal foil 13 include copper foil and aluminum foil. If the metal foil is thin, it may be a carrier-supported copper foil equipped with a release layer and carrier to improve handling.
前記金属張積層板11を製造する方法としては、前記金属張積層板11を製造することができれば、特に限定されない。具体的には、前記プリプレグ1を用いて金属張積層板11を作製する方法が挙げられる。この方法としては、前記プリプレグ1を1枚又は複数枚重ね、さらに、その上下の両面又は片面に銅箔等の金属箔13を重ね、前記金属箔13及び前記プリプレグ1を加熱加圧成形して積層一体化することによって、両面金属箔張り又は片面金属箔張りの積層板11を作製する方法等が挙げられる。すなわち、前記金属張積層板11は、前記プリプレグ1に前記金属箔13を積層して、加熱加圧成形して得られる。また、前記加熱加圧の条件は、前記金属張積層板11の厚みや前記プリプレグ1に含まれる樹脂組成物の種類等により適宜設定することができる。例えば、温度を170~230℃、圧力を2~7MPa、時間を60~150分間とすることができる。また、前記金属張積層板は、プリプレグを用いずに製造してもよい。例えば、ワニス状の樹脂組成物を金属箔上に塗布し、金属箔上に樹脂組成物を含む層を形成した後に、加熱加圧する方法等が挙げられる。 The method for manufacturing the metal-clad laminate 11 is not particularly limited, as long as it can be used to manufacture the metal-clad laminate 11. Specifically, a method for manufacturing the metal-clad laminate 11 using the prepreg 1 is exemplified. This method involves stacking one or more prepregs 1, then stacking a metal foil 13 such as copper foil on both sides or one side of the prepreg 1, and then heat-pressing and molding the metal foil 13 and the prepreg 1 to form an integrated laminate. In other words, the metal-clad laminate 11 is obtained by laminating the metal foil 13 on the prepreg 1 and then heat-pressing and molding the laminate. The heat-pressing conditions can be appropriately set depending on the thickness of the metal-clad laminate 11, the type of resin composition contained in the prepreg 1, and other factors. For example, the temperature can be 170 to 230°C, the pressure can be 2 to 7 MPa, and the time can be 60 to 150 minutes. The metal-clad laminate may also be manufactured without using a prepreg. For example, a method may be used in which a varnish-like resin composition is applied to a metal foil, a layer containing the resin composition is formed on the metal foil, and then heating and pressurizing is performed.
[配線板]
図3は、本発明の実施形態に係る配線板21の一例を示す概略断面図である。
[Wiring board]
FIG. 3 is a schematic cross-sectional view showing an example of a wiring board 21 according to an embodiment of the present invention.
本実施形態に係る配線板21は、図3に示すように、前記樹脂組成物の硬化物を含む絶縁層12と、前記絶縁層12の上に設けられた配線14とを有する。前記配線板21としては、例えば、図1に示したプリプレグ1を硬化して用いられる絶縁層12と、前記絶縁層12ともに積層され、前記金属箔13を部分的に除去して形成された配線14とから構成される配線板等が挙げられる。また、前記絶縁層12は、前記樹脂組成物の硬化物からなるものであってもよいし、前記プリプレグの硬化物からなるものであってもよい。 As shown in FIG. 3, the wiring board 21 according to this embodiment has an insulating layer 12 containing a cured product of the resin composition, and wiring 14 provided on the insulating layer 12. Examples of the wiring board 21 include a wiring board composed of an insulating layer 12 formed by curing the prepreg 1 shown in FIG. 1, and wiring 14 laminated together with the insulating layer 12 and formed by partially removing the metal foil 13. Furthermore, the insulating layer 12 may be made of a cured product of the resin composition, or a cured product of the prepreg.
前記配線板21を製造する方法は、前記配線板21を製造することができれば、特に限定されない。具体的には、前記プリプレグ1を用いて配線板21を作製する方法等が挙げられる。この方法としては、例えば、上記のように作製された金属張積層板11の表面の前記金属箔13をエッチング加工等して配線形成をすることによって、前記絶縁層12の表面に回路として配線が設けられた配線板21を作製する方法等が挙げられる。すなわち、前記配線板21は、前記金属張積層板11の表面の前記金属箔13を部分的に除去することにより回路形成して得られる。また、回路形成する方法としては、上記の方法以外に、例えば、セミアディティブ法(SAP:Semi Additive Process)やモディファイドセミアディティブ法(MSAP:Modified Semi Additive Process)による回路形成等が挙げられる。 The method for manufacturing the wiring board 21 is not particularly limited, as long as it can be used to manufacture the wiring board 21. Specific examples include a method of manufacturing the wiring board 21 using the prepreg 1. Examples of this method include a method of manufacturing the wiring board 21 in which wiring is provided as a circuit on the surface of the insulating layer 12 by etching the metal foil 13 on the surface of the metal-clad laminate 11 manufactured as described above. That is, the wiring board 21 is obtained by forming a circuit by partially removing the metal foil 13 on the surface of the metal-clad laminate 11. In addition to the above methods, other methods for forming circuits include circuit formation using a semi-additive process (SAP) or a modified semi-additive process (MSAP).
[樹脂付き金属箔]
図4は、本実施の形態に係る樹脂付き金属箔31の一例を示す概略断面図である。
[Metal foil with resin]
FIG. 4 is a schematic cross-sectional view showing an example of a resin-coated metal foil 31 according to this embodiment.
本実施形態に係る樹脂付き金属箔31は、図4に示すように、前記樹脂組成物又は前記樹脂組成物の半硬化物を含む樹脂層32と、金属箔13とを備える。この樹脂付き金属箔31は、前記樹脂層32の表面上に金属箔13を有する。すなわち、この樹脂付き金属箔31は、前記樹脂層32と、前記樹脂層32とともに積層される金属箔13とを備える。また、前記樹脂付き金属箔31は、前記樹脂層32と前記金属箔13との間に、他の層を備えていてもよい。 As shown in FIG. 4, the resin-coated metal foil 31 according to this embodiment comprises a resin layer 32 containing the resin composition or a semi-cured product of the resin composition, and a metal foil 13. This resin-coated metal foil 31 has the metal foil 13 on the surface of the resin layer 32. That is, this resin-coated metal foil 31 comprises the resin layer 32 and the metal foil 13 laminated together with the resin layer 32. The resin-coated metal foil 31 may also comprise another layer between the resin layer 32 and the metal foil 13.
前記樹脂層32としては、上記のような、前記樹脂組成物の半硬化物を含むものであってもよいし、また、硬化させていない前記樹脂組成物を含むものであってもよい。すなわち、前記樹脂付き金属箔31は、前記樹脂組成物の半硬化物(Bステージの前記樹脂組成物)を含む樹脂層と、金属箔とを備えるであってもよいし、硬化前の前記樹脂組成物(Aステージの前記樹脂組成物)を含む樹脂層と、金属箔とを備える樹脂付き金属箔であってもよい。また、前記樹脂層としては、前記樹脂組成物又は前記樹脂組成物の半硬化物を含んでいればよく、繊維質基材を含んでいても、含んでいなくてもよい。また、前記樹脂組成物又は前記樹脂組成物の半硬化物としては、前記樹脂組成物を乾燥又は加熱乾燥させたものであってもよい。また、前記繊維質基材としては、プリプレグの繊維質基材と同様のものを用いることができる。 The resin layer 32 may contain a semi-cured product of the resin composition as described above, or may contain the uncured resin composition. That is, the resin-coated metal foil 31 may comprise a resin layer containing a semi-cured product of the resin composition (the resin composition in B stage) and a metal foil, or may be a resin-coated metal foil comprising a resin layer containing the resin composition before curing (the resin composition in A stage) and a metal foil. Furthermore, the resin layer only needs to contain the resin composition or a semi-cured product of the resin composition, and may or may not contain a fibrous substrate. Furthermore, the resin composition or the semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried. Furthermore, the fibrous substrate can be the same as the fibrous substrate of a prepreg.
前記金属箔としては、金属張積層板や樹脂付き金属箔に用いられる金属箔を限定なく用いることができる。前記金属箔としては、例えば、銅箔及びアルミニウム箔等が挙げられる。 The metal foil can be any metal foil used in metal-clad laminates or resin-coated metal foils, without limitation. Examples of the metal foil include copper foil and aluminum foil.
前記樹脂付き金属箔31は、必要に応じて、カバーフィルム等を備えてもよい。カバーフィルムを備えることにより、異物の混入等を防ぐことができる。前記カバーフィルムとしては、特に限定されるものではないが、例えば、ポリオレフィンフィルム、ポリエステルフィルム、ポリメチルペンテンフィルム、及びこれらのフィルムに離型剤層を設けて形成されたフィルム等が挙げられる。 The resin-coated metal foil 31 may be provided with a cover film or the like, if necessary. By providing a cover film, it is possible to prevent the intrusion of foreign matter. The cover film is not particularly limited, but examples include polyolefin film, polyester film, polymethylpentene film, and films formed by providing these films with a release agent layer.
前記樹脂付き金属箔31を製造する方法は、前記樹脂付き金属箔31を製造することができれば、特に限定されない。前記樹脂付き金属箔31の製造方法としては、上記ワニス状の樹脂組成物(樹脂ワニス)を金属箔13上に塗布し、加熱することにより製造する方法等が挙げられる。ワニス状の樹脂組成物は、例えば、バーコーターを用いることにより、金属箔13上に塗布される。塗布された樹脂組成物は、例えば、40℃以上180℃以下、0.1分以上10分以下の条件で加熱される。加熱された樹脂組成物は、未硬化の樹脂層32として、前記金属箔13上に形成される。なお、前記加熱によって、前記樹脂ワニスから有機溶媒を揮発させ、有機溶媒を減少又は除去させることができる。 The method for producing the resin-coated metal foil 31 is not particularly limited, as long as it can produce the resin-coated metal foil 31. Examples of methods for producing the resin-coated metal foil 31 include a method in which the varnish-like resin composition (resin varnish) is applied to the metal foil 13 and heated. The varnish-like resin composition is applied to the metal foil 13 using, for example, a bar coater. The applied resin composition is heated, for example, at a temperature of 40°C to 180°C for 0.1 to 10 minutes. The heated resin composition is formed on the metal foil 13 as an uncured resin layer 32. Note that the heating volatilizes the organic solvent from the resin varnish, thereby reducing or removing the organic solvent.
[樹脂付きフィルム]
図5は、本実施の形態に係る樹脂付きフィルム41の一例を示す概略断面図である。
[Resin-coated film]
FIG. 5 is a schematic cross-sectional view showing an example of a resin-coated film 41 according to this embodiment.
本実施形態に係る樹脂付きフィルム41は、図5に示すように、前記樹脂組成物又は前記樹脂組成物の半硬化物を含む樹脂層42と、支持フィルム43とを備える。この樹脂付きフィルム41は、前記樹脂層42と、前記樹脂層42とともに積層される支持フィルム43とを備える。また、前記樹脂付きフィルム41は、前記樹脂層42と前記支持フィルム43との間に、他の層を備えていてもよい。 As shown in FIG. 5, the resin-coated film 41 according to this embodiment comprises a resin layer 42 containing the resin composition or a semi-cured product of the resin composition, and a support film 43. This resin-coated film 41 comprises the resin layer 42 and the support film 43 laminated together with the resin layer 42. The resin-coated film 41 may also comprise another layer between the resin layer 42 and the support film 43.
前記樹脂層42としては、上記のような、前記樹脂組成物の半硬化物を含むものであってもよいし、また、硬化させていない前記樹脂組成物を含むものであってもよい。すなわち、前記樹脂付きフィルム41は、前記樹脂組成物の半硬化物(Bステージの前記樹脂組成物)を含む樹脂層と、支持フィルムとを備えるであってもよいし、硬化前の前記樹脂組成物(Aステージの前記樹脂組成物)を含む樹脂層と、支持フィルムとを備える樹脂付きフィルムであってもよい。また、前記樹脂層としては、前記樹脂組成物又は前記樹脂組成物の半硬化物を含んでいればよく、繊維質基材を含んでいても、含んでいなくてもよい。また、前記樹脂組成物又は前記樹脂組成物の半硬化物としては、前記樹脂組成物を乾燥又は加熱乾燥させたものであってもよい。また、繊維質基材としては、プリプレグの繊維質基材と同様のものを用いることができる。 The resin layer 42 may contain a semi-cured product of the resin composition as described above, or may contain the uncured resin composition. That is, the resin-coated film 41 may comprise a resin layer containing a semi-cured product of the resin composition (the resin composition in B-stage) and a support film, or may be a resin-coated film comprising a resin layer containing the resin composition before curing (the resin composition in A-stage) and a support film. The resin layer may contain the resin composition or a semi-cured product of the resin composition, and may or may not contain a fibrous substrate. The resin composition or the semi-cured product of the resin composition may be the resin composition that has been dried or heat-dried. The fibrous substrate may be the same as the fibrous substrate of a prepreg.
前記支持フィルム43としては、樹脂付きフィルムに用いられる支持フィルムを限定なく用いることができる。前記支持フィルムとしては、例えば、ポリエステルフィルム、ポリエチレンテレフタレート(PET)フィルム、ポリイミドフィルム、ポリパラバン酸フィルム、ポリエーテルエーテルケトンフィルム、ポリフェニレンスルフィドフィルム、ポリアミドフィルム、ポリカーボネートフィルム、及びポリアリレートフィルム等の電気絶縁性フィルム等が挙げられる。 The support film 43 can be any support film used for resin-coated films, without limitation. Examples of such support films include electrically insulating films such as polyester film, polyethylene terephthalate (PET) film, polyimide film, polyparabanic acid film, polyether ether ketone film, polyphenylene sulfide film, polyamide film, polycarbonate film, and polyarylate film.
前記樹脂付きフィルム41は、必要に応じて、カバーフィルム等を備えてもよい。カバーフィルムを備えることにより、異物の混入等を防ぐことができる。前記カバーフィルムとしては、特に限定されるものではないが、例えば、ポリオレフィンフィルム、ポリエステルフィルム、及びポリメチルペンテンフィルム等が挙げられる。 The resin-coated film 41 may be provided with a cover film or the like, if necessary. By providing a cover film, it is possible to prevent the intrusion of foreign matter. The cover film is not particularly limited, but examples include polyolefin film, polyester film, and polymethylpentene film.
前記支持フィルム及び前記カバーフィルムとしては、必要に応じて、マット処理、コロナ処理、離型処理、及び粗化処理等の表面処理が施されたものであってもよい。 The support film and cover film may be subjected to surface treatments such as matte treatment, corona treatment, release treatment, and roughening treatment, as needed.
前記樹脂付きフィルム41を製造する方法は、前記樹脂付きフィルム41を製造することができれば、特に限定されない。前記樹脂付きフィルム41の製造方法は、例えば、上記ワニス状の樹脂組成物(樹脂ワニス)を支持フィルム43上に塗布し、加熱することにより製造する方法等が挙げられる。ワニス状の樹脂組成物は、例えば、バーコーターを用いることにより、支持フィルム43上に塗布される。塗布された樹脂組成物は、例えば、40℃以上180℃以下、0.1分以上10分以下の条件で加熱される。加熱された樹脂組成物は、未硬化の樹脂層42として、前記支持フィルム43上に形成される。なお、前記加熱によって、前記樹脂ワニスから有機溶媒を揮発させ、有機溶媒を減少又は除去させることができる。 The method for producing the resin-coated film 41 is not particularly limited as long as it can produce the resin-coated film 41. Examples of methods for producing the resin-coated film 41 include a method in which the varnish-like resin composition (resin varnish) is applied to a support film 43 and heated. The varnish-like resin composition is applied to the support film 43 using, for example, a bar coater. The applied resin composition is heated, for example, at a temperature of 40°C to 180°C for 0.1 minutes to 10 minutes. The heated resin composition is formed on the support film 43 as an uncured resin layer 42. The heating volatilizes the organic solvent from the resin varnish, thereby reducing or eliminating the organic solvent.
本実施形態に係る樹脂組成物は、熱膨張率の低い硬化物が得られる樹脂組成物である。すなわち、前記樹脂組成物を硬化させると、熱膨張率の低い硬化物になる。このため、前記樹脂組成物又は前記樹脂組成物の半硬化物を備えるプリプレグは、熱膨張率の低い硬化物が得られるプリプレグである。前記樹脂組成物又は前記樹脂組成物の半硬化物を含む樹脂層を備える、樹脂付き金属箔及び樹脂付きフィルムは、熱膨張率の低い硬化物を含む絶縁層が得られる樹脂層を備える、樹脂付き金属箔及び樹脂付きフィルムである。前記樹脂組成物の硬化物を含む絶縁層を備える、金属張積層板及び配線板は、熱膨張率の低い硬化物を含む絶縁層を備える、金属張積層板及び配線板である。そして、前記プリプレグ、前記樹脂付き金属箔、前記樹脂付きフィルム、及び金属張積層板は、熱膨張率の低い硬化物を含む絶縁層を備える配線板を好適に製造する際に用いることができる。前記プリプレグ、前記樹脂付き金属箔、前記樹脂付きフィルム、及び金属張積層板は、例えば、多層の配線板を製造する際に用いることもできる。前記樹脂付きフィルムであれば、例えば、配線板の上に積層した後に、支持フィルムを剥離すること、又は、支持フィルムを剥離した後に、配線板の上に積層することによって、多層の配線板を製造することができる。前記樹脂付き金属箔であれば、例えば、配線板の上に積層することによって、多層の配線板を製造することができる。このように、前記樹脂付きフィルム及び前記樹脂付き金属箔等を用いることによって、熱膨張率の低い硬化物を含む絶縁層を備える多層の配線板を製造することができる。前記プリプレグ、前記樹脂付き金属箔、前記樹脂付きフィルム、及び金属張積層板を用いて得られた配線板としては、熱膨張率の低い硬化物を含む絶縁層を備える配線板が得られる。 The resin composition according to this embodiment is a resin composition that yields a cured product with a low thermal expansion coefficient. In other words, when the resin composition is cured, it yields a cured product with a low thermal expansion coefficient. Therefore, a prepreg comprising the resin composition or a semi-cured product of the resin composition is a prepreg that yields a cured product with a low thermal expansion coefficient. Resin-coated metal foils and resin-coated films that include a resin layer containing the resin composition or a semi-cured product of the resin composition are resin-coated metal foils and resin-coated films that include a resin layer that yields an insulating layer containing a cured product with a low thermal expansion coefficient. Metal-clad laminates and wiring boards that include an insulating layer containing a cured product of the resin composition are metal-clad laminates and wiring boards that include an insulating layer containing a cured product with a low thermal expansion coefficient. The prepregs, resin-coated metal foils, resin-coated films, and metal-clad laminates can be suitably used to manufacture wiring boards that include an insulating layer containing a cured product with a low thermal expansion coefficient. The prepregs, resin-coated metal foils, resin-coated films, and metal-clad laminates can also be used, for example, to manufacture multilayer wiring boards. In the case of the resin-coated film, a multilayer wiring board can be produced, for example, by laminating it on a wiring board and then peeling off the support film, or by laminating it on a wiring board after peeling off the support film. In the case of the resin-coated metal foil, a multilayer wiring board can be produced, for example, by laminating it on a wiring board. In this way, by using the resin-coated film and resin-coated metal foil, etc., a multilayer wiring board having an insulating layer containing a cured material with a low thermal expansion coefficient can be produced. A wiring board obtained using the prepreg, the resin-coated metal foil, the resin-coated film, and a metal-clad laminate has an insulating layer containing a cured material with a low thermal expansion coefficient.
本明細書は、上述したように、様々な態様の技術を開示しているが、そのうち主な技術を以下に纏める。 As mentioned above, this specification discloses various aspects of technology, the main technologies of which are summarized below.
本発明の第1の態様に係る樹脂組成物は、インダン構造、及びメタ位に配向して結合されているアリーレン構造の少なくとも一方を分子中に有するマレイミド化合物(A)と、炭素-炭素不飽和結合を分子中に有する硬化剤(B)と、エチレン構造単位とブチレン構造単位とを分子中に有し、前記ブチレン構造単位が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であって、25℃で固体のスチレン系重合体(C)とを含み、前記スチレン系重合体(C)の含有量が、12質量%以上である樹脂組成物である。 The resin composition according to a first aspect of the present invention comprises a maleimide compound (A) having in its molecule at least one of an indane structure and an arylene structure bonded in a meta-oriented manner; a curing agent (B) having in its molecule a carbon-carbon unsaturated bond; and a styrene-based polymer (C) that has in its molecule ethylene structural units and butylene structural units, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, and is solid at 25°C, the content of the styrene-based polymer (C) being 12 mass % or more.
本発明の第2の態様に係る樹脂組成物は、本発明の第1の態様に係る樹脂組成物において、前記スチレン系重合体(C)は、スチレンを含む単量体由来の構造単位を20質量%以下含む樹脂組成物である。 The resin composition according to the second aspect of the present invention is the resin composition according to the first aspect of the present invention, wherein the styrene-based polymer (C) contains 20% by mass or less of structural units derived from a monomer containing styrene.
本発明の第3の態様に係る樹脂組成物は、本発明の第1又は第2の態様に係る樹脂組成物において、前記マレイミド化合物(A)以外のマレイミド化合物(D)をさらに含む樹脂組成物である。 The resin composition according to the third aspect of the present invention is the resin composition according to the first or second aspect of the present invention, further comprising a maleimide compound (D) other than the maleimide compound (A).
本発明の第4の態様に係る樹脂組成物は、本発明の第1~3のいずれか1つの態様に係る樹脂組成物において、前記スチレン系重合体(C)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)との合計に対して、20~60質量%である樹脂組成物である。 A resin composition according to a fourth aspect of the present invention is a resin composition according to any one of the first to third aspects of the present invention, in which the content of the styrene polymer (C) is 20 to 60 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene polymer (C).
本発明の第5の態様に係る樹脂組成物は、本発明の第1~4のいずれか1つの態様に係る樹脂組成物において、前記マレイミド化合物(A)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)との合計に対して、20~50質量%である樹脂組成物である。 A resin composition according to a fifth aspect of the present invention is a resin composition according to any one of the first to fourth aspects of the present invention, in which the content of the maleimide compound (A) is 20 to 50 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
本発明の第6の態様に係る樹脂組成物は、本発明の第1~5のいずれか1つの態様に係る樹脂組成物において、前記硬化剤(B)の含有量は、前記マレイミド化合物(A)と前記硬化剤(B)と前記スチレン系重合体(C)との合計に対して、5~40質量%である樹脂組成物である。 A resin composition according to a sixth aspect of the present invention is a resin composition according to any one of the first to fifth aspects of the present invention, in which the content of the curing agent (B) is 5 to 40 mass% based on the total of the maleimide compound (A), the curing agent (B), and the styrene-based polymer (C).
本発明の第7の態様に係る樹脂組成物は、本発明の第1~6のいずれか1つの態様に係る樹脂組成物において、前記スチレン系重合体(C)の酸価が、2mgCH3ONa/g以上である樹脂組成物である。 A resin composition according to a seventh aspect of the present invention is the resin composition according to any one of the first to sixth aspects of the present invention, wherein the styrene polymer (C) has an acid value of 2 mg CH 3 ONa/g or more.
本発明の第8の態様に係る樹脂組成物は、本発明の第1~7のいずれか1つの態様に係る樹脂組成物において、前記マレイミド化合物(A)は、前記インダン構造として、前記式(1)で表される構造を分子中に有するマレイミド化合物(A1-1)を含む樹脂組成物である。 The resin composition according to an eighth aspect of the present invention is a resin composition according to any one of the first to seventh aspects of the present invention, wherein the maleimide compound (A) contains a maleimide compound (A1-1) having a structure represented by formula (1) in the molecule as the indane structure.
本発明の第9の態様に係る樹脂組成物は、本発明の第1~7のいずれか1つの態様に係る樹脂組成物において、前記マレイミド化合物(A)は、前記式(2)で表されるマレイミド化合物(A2-1)を含む樹脂組成物である。 A resin composition according to a ninth aspect of the present invention is a resin composition according to any one of the first to seventh aspects of the present invention, in which the maleimide compound (A) contains a maleimide compound (A2-1) represented by the formula (2).
本発明の第10の態様に係る樹脂組成物は、本発明の第1~9のいずれか1つの態様に係る樹脂組成物において、前記硬化剤(B)は、アルケニル基を分子中に有するベンゾオキサジン化合物(B1)、炭素-炭素不飽和二重結合を分子中に有する炭化水素系化合物(B2)、及びエポキシ基を分子中に有するポリブタジエン化合物(B3)からなる群から選ばれる少なくとも1種を含む樹脂組成物である。 A resin composition according to a tenth aspect of the present invention is a resin composition according to any one of the first to ninth aspects of the present invention, wherein the curing agent (B) includes at least one selected from the group consisting of a benzoxazine compound (B1) having an alkenyl group in the molecule, a hydrocarbon compound (B2) having a carbon-carbon unsaturated double bond in the molecule, and a polybutadiene compound (B3) having an epoxy group in the molecule.
本発明の第11の態様に係る樹脂組成物は、本発明の第10の態様に係る樹脂組成物において、前記炭化水素系化合物(B2)は、前記式(3)で表される炭化水素系化合物(B-2)を含む樹脂組成物である。 The resin composition according to an eleventh aspect of the present invention is the resin composition according to the tenth aspect of the present invention, wherein the hydrocarbon compound (B2) contains a hydrocarbon compound (B-2) represented by the formula (3).
本発明の第12の態様に係る樹脂組成物は、本発明の第1~11のいずれか1つの態様に係る樹脂組成物において、無機充填材(E)をさらに含む樹脂組成物である。 The resin composition according to the twelfth aspect of the present invention is a resin composition according to any one of the first to eleventh aspects of the present invention, further comprising an inorganic filler (E).
本発明の第13の態様に係るプリプレグは、本発明の第1~12のいずれか1つの態様に係る樹脂組成物又は前記樹脂組成物の半硬化物と、繊維質基材とを備えるプリプレグである。 The prepreg according to the thirteenth aspect of the present invention is a prepreg comprising a resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a fibrous base material.
本発明の第14の態様に係る樹脂付きフィルムは、本発明の第1~12のいずれか1つの態様に係る樹脂組成物又は前記樹脂組成物の半硬化物を含む樹脂層と、支持フィルムとを備える樹脂付きフィルムである。 The resin-coated film according to the fourteenth aspect of the present invention is a resin-coated film comprising a resin layer containing the resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a support film.
本発明の第15の態様に係る樹脂付き金属箔は、本発明の第1~12のいずれか1つの態様に係る樹脂組成物又は前記樹脂組成物の半硬化物を含む樹脂層と、金属箔とを備える樹脂付き金属箔である。 The resin-coated metal foil according to the fifteenth aspect of the present invention is a resin-coated metal foil comprising a resin layer containing the resin composition according to any one of the first to twelfth aspects of the present invention or a semi-cured product of the resin composition, and a metal foil.
本発明の第16の態様に係る金属張積層板は、本発明の第1~12のいずれか1つの態様に係る樹脂組成物の硬化物を含む絶縁層と、金属箔とを備える金属張積層板である。 The metal-clad laminate according to the sixteenth aspect of the present invention is a metal-clad laminate comprising an insulating layer containing a cured product of the resin composition according to any one of the first to twelfth aspects of the present invention, and a metal foil.
本発明の第17の態様に係る金属張積層板は、本発明の第13の態様に係るプリプレグの硬化物を含む絶縁層と、金属箔とを備える金属張積層板である。 The metal-clad laminate according to the seventeenth aspect of the present invention is a metal-clad laminate comprising an insulating layer containing a cured product of the prepreg according to the thirteenth aspect of the present invention and a metal foil.
本発明の第18の態様に係る配線板は、本発明の第1~12のいずれか1つの態様に係る樹脂組成物の硬化物を含む絶縁層と、配線とを備える配線板である。 The wiring board according to the eighteenth aspect of the present invention is a wiring board comprising an insulating layer containing a cured product of the resin composition according to any one of the first to twelfth aspects of the present invention, and wiring.
本発明の第19の態様に係る配線板は、本発明の第13の態様に係るプリプレグの硬化物を含む絶縁層と、配線とを備える配線板である。 The wiring board according to the 19th aspect of the present invention is a wiring board comprising an insulating layer containing a cured product of the prepreg according to the 13th aspect of the present invention, and wiring.
本発明によれば、熱膨張率の低い硬化物が得られる樹脂組成物を提供することができる。また、本発明によれば、前記樹脂組成物を用いて得られる、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及び配線板を提供することができる。 The present invention provides a resin composition that produces a cured product with a low coefficient of thermal expansion. The present invention also provides prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are produced using the resin composition.
以下に、実施例により本発明をさらに具体的に説明するが、本発明の範囲はこれらに限定されるものではない。 The present invention will be explained in more detail below using examples, but the scope of the present invention is not limited to these examples.
[実施例1~5、及び比較例1~6]
本実施例において、樹脂組成物を調製する際に用いる各成分について説明する。
[Examples 1 to 5 and Comparative Examples 1 to 6]
In this example, each component used in preparing the resin composition will be described.
(マレイミド化合物(A))
マレイミド化合物1:メタ位で置換されているアリーレン構造を分子中に有するマレイミド化合物(日本化薬株式会社製のMIR-5000-60T(マレイミド化合物のトルエン溶解品)中の固形分、前記式(6)で表されるマレイミド化合物、マレイミド当量260g/mol)
マレイミド化合物2:インダン構造とメタ位に配向して結合されているアリーレン構造とを分子中に有するマレイミド化合物(DIC株式会社製のNE-X-9470S中の固形分、前記式(7)で表されるマレイミド化合物)
(Maleimide Compound (A))
Maleimide compound 1: A maleimide compound having an arylene structure substituted at the meta position in the molecule (solid content in MIR-5000-60T (a toluene solution of a maleimide compound) manufactured by Nippon Kayaku Co., Ltd., a maleimide compound represented by the formula (6) above, maleimide equivalent: 260 g/mol)
Maleimide compound 2: A maleimide compound having an indane structure and an arylene structure bonded to the meta position in the molecule (solid content in NE-X-9470S manufactured by DIC Corporation, a maleimide compound represented by the formula (7)).
(硬化剤(B))
炭化水素系化合物:前記式(13)で表される炭化水素系化合物である。
(Curing agent (B))
Hydrocarbon compound: A hydrocarbon compound represented by the formula (13).
具体的には、以下のようにして合成された炭化水素系化合物である。 Specifically, it is a hydrocarbon compound synthesized as follows:
(合成例1)
温度計、冷却管、及び撹拌機を取り付けたフラスコに、2-ブロモエチルベンゼン(東京化成工業株式会社製)296質量部、α,α’-ジクロロ-p-キシレン(東京化成工業株式会社製)70質量部、メタンスルホン酸(東京化成工業株式会社製)18.4質量部を仕込み、130℃で8時間反応させた。前記反応後、放冷させてから、前記反応により得られた反応液を水酸化ナトリウム水溶液で中和し、トルエン1200質量部で抽出し、有機層を水100質量部で5回洗浄した。加熱減圧下において溶剤及び過剰の2-ブロモエチルベンゼンを留去することにより、2-ブロモエチルベンゼン構造を有するオレフィン化合物前駆体(BEB-1)160質量部を液状樹脂として得た(Mn:538、Mw:649)。繰り返し単位dは1.7であった。また、得られた化合物の1H-NMRチャート(DMSО-d6)において、2.95-3.15ppm、及び3.60-3.75ppmにブロモエチル基由来のシグナルが観測された。
(Synthesis Example 1)
A flask equipped with a thermometer, a condenser, and a stirrer was charged with 296 parts by mass of 2-bromoethylbenzene (manufactured by Tokyo Chemical Industry Co., Ltd.), 70 parts by mass of α,α'-dichloro-p-xylene (manufactured by Tokyo Chemical Industry Co., Ltd.), and 18.4 parts by mass of methanesulfonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.), and the mixture was allowed to react at 130 ° C. for 8 hours. After the reaction, the mixture was allowed to cool, and the reaction liquid obtained by the reaction was neutralized with an aqueous sodium hydroxide solution, extracted with 1,200 parts by mass of toluene, and the organic layer was washed five times with 100 parts by mass of water. By distilling off the solvent and excess 2-bromoethylbenzene under heating and reduced pressure, 160 parts by mass of an olefin compound precursor (BEB-1) having a 2-bromoethylbenzene structure was obtained as a liquid resin (Mn: 538, Mw: 649). The repeating unit d was 1.7. Furthermore, in the 1 H-NMR chart (DMSO-d 6 ) of the obtained compound, signals derived from bromoethyl groups were observed at 2.95-3.15 ppm and 3.60-3.75 ppm.
(合成例2)
次に、温度計、冷却管、及び撹拌機を取り付けたフラスコに、前記合成例1で得られたBEB-1 22質量部、トルエン50質量部、ジメチルスルホキシド150質量部、水15質量部、及び水酸化ナトリウム5.4質量部を加え40℃で5時間反応を行った。反応後、放冷させてから、トルエン100質量部を加え、有機層を水100質量部で5回洗浄した。加熱減圧下において溶剤を留去することにより、スチレン構造を官能基として有する液状オレフィン化合物13質量部を得た(Mn:432、Mw:575)。繰り返し単位dは1.7であった。また、得られた化合物の1H-NMRデータ(DMSО-d6)において、5.10-5.30ppm、5.50-5.85ppm、及び6.60-6.80ppmにビニル基由来のシグナルが観測された。
(Synthesis Example 2)
Next, 22 parts by mass of BEB-1 obtained in Synthesis Example 1, 50 parts by mass of toluene, 150 parts by mass of dimethyl sulfoxide, 15 parts by mass of water, and 5.4 parts by mass of sodium hydroxide were added to a flask equipped with a thermometer, a condenser, and a stirrer, and the mixture was reacted at 40°C for 5 hours. After the reaction, the mixture was allowed to cool, and then 100 parts by mass of toluene was added, and the organic layer was washed five times with 100 parts by mass of water. The solvent was distilled off under heating and reduced pressure to obtain 13 parts by mass of a liquid olefin compound having a styrene structure as a functional group (Mn: 432, Mw: 575). The repeating unit d was 1.7. Furthermore, in the 1 H-NMR data (DMSO-d 6 ) of the obtained compound, signals derived from vinyl groups were observed at 5.10-5.30 ppm, 5.50-5.85 ppm, and 6.60-6.80 ppm.
この得られた化合物(液状オレフィン化合物)が、前記式(13)で表される炭化水素系化合物であった。 The resulting compound (liquid olefin compound) was the hydrocarbon compound represented by formula (13).
なお、前記合成例1及び前記合成例2において用いた重量平均分子量(Mw)、数平均分子量(Mn)は、以下の分析方法によって求めた値である。 The weight average molecular weight (Mw) and number average molecular weight (Mn) used in Synthesis Example 1 and Synthesis Example 2 were determined by the following analytical method.
(分析法)
ポリスチレン標準液を用いてポリスチレン換算により算出した。
(Analysis method)
Calculation was performed in terms of polystyrene using a polystyrene standard solution.
GPC:DGU-20A3R,LC-20AD,SIL-20AHT,RID-20A,SPD-20A,CTO-2、CBM-20A(いずれも(株)島津製作所製)
カラム:Shodex KF-603、KF-602x2、KF-601x2)
連結溶離液:テトラヒドロフラン
流速:0.5ml/min.
カラム温度:40℃
検出:RI(示差屈折検出器)
ベンゾオキサジン化合物:アリル基を分子中に有するベンゾオキサジン化合物(前記式(12)で表され、R3及びR4は、アリル基であり、Xがメチレン基であり、b及びcが1であるベンゾオキサジン化合物、四国化成工業株式会社製のALPd)
エポキシ化ポリブタジエン:分子中にエポキシ基を有するポリブタジエン化合物(日本曹達株式会社製のJP-100、1,2-ポリブタジエンのビニル基の酸化によりエポキシ基を導入したエポキシ化ポリブタジエン、オキシラン酸素の濃度:7.7質量%)
GPC: DGU-20A3R, LC-20AD, SIL-20AHT, RID-20A, SPD-20A, CTO-2, CBM-20A (all manufactured by Shimadzu Corporation)
Column: Shodex KF-603, KF-602x2, KF-601x2)
Eluent for coupling: tetrahydrofuran Flow rate: 0.5 ml/min.
Column temperature: 40°C
Detection: RI (differential refractive index detector)
Benzoxazine compound: a benzoxazine compound having an allyl group in the molecule (a benzoxazine compound represented by the formula (12) above, in which R3 and R4 are allyl groups, X is a methylene group, and b and c are 1, ALPd manufactured by Shikoku Chemicals Corporation).
Epoxidized polybutadiene: a polybutadiene compound having an epoxy group in the molecule (JP-100 manufactured by Nippon Soda Co., Ltd., an epoxidized polybutadiene in which an epoxy group has been introduced by oxidizing the vinyl group of 1,2-polybutadiene; oxirane oxygen concentration: 7.7% by mass)
(スチレン系重合体(C))
C5025:無水マレイン酸で酸変性したスチレン系重合体(旭化成株式会社製のC5025、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=27:73、スチレンを含む単量体由来の構造単位12質量%、重量平均分子量Mw16万、酸価4mgCH3ONa/g、25℃で固体)
H1221:スチレン系重合体(旭化成株式会社製のタフテックH1221、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=23:77、スチレンを含む単量体由来の構造単位12質量%、酸価0.03mgCH3ONa/g未満(検出限界以下)、重量平均分子量Mw15万、25℃で固体)
(Styrene-based polymer (C))
C5025: styrene-based polymer acid-modified with maleic anhydride (C5025 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structure (ethylene structural units:butylene structure) = 27:73, structural units derived from monomers including styrene 12% by mass, weight average molecular weight Mw 160,000, acid value 4 mg CH 3 ONa/g, solid at 25°C)
H1221: styrene-based polymer (Tuftec H1221 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structure (ethylene structural units:butylene structure) = 23:77, structural units derived from monomers including styrene 12% by mass, acid value less than 0.03 mg CH 3 ONa/g (below detection limit), weight average molecular weight Mw 150,000, solid at 25°C)
(スチレン系重合体(C)以外のスチレン系重合体)
H1041:スチレン系重合体(旭化成株式会社製のタフテックH1041、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=65:35、スチレンを含む単量体由来の構造単位28質量%、重量平均分子量Mw7.5万、25℃で固体)
S1609:スチレン系重合体(旭化成株式会社製のS1609、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=75:25、スチレンを含む単量体由来の構造単位66質量%、重量平均分子量Mw22万、25℃で固体)
P1500:スチレン系重合体(旭化成株式会社製のタフテックP1500、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=62:38、スチレンを含む単量体由来の構造単位29質量%、重量平均分子量Mw7.2万、25℃で固体)
M1913:無水マレイン酸で酸変性したスチレン系重合体(旭化成株式会社製のタフテックM1913、エチレン構造単位と前記ブチレン構造とのモル比(エチレン構造単位:前記ブチレン構造)=64:36、スチレンを含む単量体由来の構造単位30質量%、重量平均分子量Mw4.2万、酸価10mgCH3ONa/g、25℃で固体)
(Styrene-based polymer other than styrene-based polymer (C))
H1041: styrene-based polymer (Tuftec H1041 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structure (ethylene structural units:butylene structure) = 65:35, structural units derived from monomers including styrene 28% by mass, weight average molecular weight Mw 75,000, solid at 25°C)
S1609: styrene-based polymer (S1609 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structures (ethylene structural units:butylene structures) = 75:25, structural units derived from monomers including styrene 66% by mass, weight-average molecular weight Mw 220,000, solid at 25°C)
P1500: styrene-based polymer (Tuftec P1500 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structure (ethylene structural units:butylene structure) = 62:38, structural units derived from monomers including styrene 29% by mass, weight average molecular weight Mw 72,000, solid at 25°C)
M1913: styrene-based polymer acid-modified with maleic anhydride (Tuftec M1913 manufactured by Asahi Kasei Corporation, molar ratio of ethylene structural units to the butylene structure (ethylene structural units:butylene structure) = 64:36, structural units derived from monomers including styrene 30% by mass, weight average molecular weight Mw 42,000, acid value 10 mg CH 3 ONa/g, solid at 25°C)
(マレイミド化合物(D))
マレイミド化合物3:3,3’-ジメチル-5,5’-ジエチル-4,4’-ジフェニルメタンビスマレイミド(大和化成工業株式会社製のBMI-5100、ビスマレイミド化合物、マレイミド当量221g/mol)
(Maleimide Compound (D))
Maleimide compound 3: 3,3'-dimethyl-5,5'-diethyl-4,4'-diphenylmethane bismaleimide (BMI-5100, manufactured by Daiwa Chemical Industry Co., Ltd., bismaleimide compound, maleimide equivalent: 221 g/mol)
(反応開始剤)
PBP:α,α’-ジ(t-ブチルパーオキシ)ジイソプロピルベンゼン(PBP)(日油株式会社製のパーブチルP)
(Reaction initiator)
PBP: α,α'-di(t-butylperoxy)diisopropylbenzene (PBP) (Perbutyl P manufactured by NOF Corporation)
(硬化促進剤)
2E4MZ:2-エチル-4-メチルイミダゾール(2E4MZ)(四国化成工業株式会社製の2E4MZ)
(Curing accelerator)
2E4MZ: 2-ethyl-4-methylimidazole (2E4MZ) (2E4MZ manufactured by Shikoku Chemicals Corporation)
(無機充填材)
シリカ:分子中にフェニルアミノ基を有するシランカップリング剤で表面処理されたシリカ粒子(株式会社アドマテックス製のSC2500-SXJ)
モリブデン酸亜鉛:モリブデン酸亜鉛フィラー(株式会社アドマテックス製のZ4SX-A1)
(Inorganic filler)
Silica: Silica particles surface-treated with a silane coupling agent having a phenylamino group in the molecule (SC2500-SXJ manufactured by Admatechs Co., Ltd.)
Zinc molybdate: Zinc molybdate filler (Z4SX-A1 manufactured by Admatechs Co., Ltd.)
[調製方法]
まず、無機充填材以外の成分を、表1に記載の組成(質量部)で、固形分濃度が40~50質量%となるように、トルエンとメチルエチルケトン(MEK)との混合溶媒(質量比約2:1)に添加し、混合させた。得られた混合物を60分間攪拌した。その後、無機充填材を含む場合は、得られた混合物に、表1に記載の組成(質量部)で、無機充填材を添加し、ビーズミルで分散させた。そうすることによって、ワニス状の樹脂組成物(ワニス)が得られた。
[Preparation method]
First, the components other than the inorganic filler were added to a mixed solvent of toluene and methyl ethyl ketone (MEK) (mass ratio of approximately 2:1) so that the solids concentration was 40 to 50% by mass, in the composition (parts by mass) shown in Table 1, and mixed. The resulting mixture was stirred for 60 minutes. Thereafter, if an inorganic filler was included, the inorganic filler was added to the resulting mixture in the composition (parts by mass) shown in Table 1, and dispersed using a bead mill. This resulted in a varnish-like resin composition (varnish).
次に、以下のようにして、プリプレグを得た。 Next, prepreg was obtained as follows:
得られたワニスを繊維質基材(ガラスクロス:日東紡績株式会社製の#2118タイプ、Tガラス)に含浸させた後、130℃で3分間加熱乾燥することによりプリプレグを作製した。その際、硬化反応により樹脂を構成する成分の、プリプレグに対する含有量(樹脂含有量)が約43質量%となるように調整した。さらに、硬化後の厚みが103μmとなるように調整した。 The resulting varnish was impregnated into a fibrous substrate (glass cloth: #2118 type T-glass manufactured by Nitto Boseki Co., Ltd.), which was then heated and dried at 130°C for 3 minutes to produce a prepreg. The content of the components that make up the resin through the curing reaction (resin content) relative to the prepreg was adjusted to approximately 43% by mass. Furthermore, the thickness after curing was adjusted to be 103 μm.
以下のようにして、評価基板(金属張積層板)を得た。 The evaluation substrate (metal-clad laminate) was obtained as follows.
得られたプリプレグを12枚重ね合わせ、その両側に、12μm厚みの銅箔(三井金属鉱業株式会社製の3EC-VLP)を配置した。これを被圧体とし、昇温速度3℃/分で温度220℃まで加熱し、220℃、120分間、圧力3MPaの条件で加熱加圧することにより、両面に銅箔が接着された、樹脂層厚み約1236μmの評価基板(金属張積層板)を得た。 Twelve sheets of the resulting prepreg were stacked together, and 12 μm thick copper foil (3EC-VLP manufactured by Mitsui Mining & Smelting Co., Ltd.) was placed on both sides. This was used as a pressure body and heated to 220°C at a temperature increase rate of 3°C/min, and then heated and pressurized at 220°C for 120 minutes at a pressure of 3 MPa, resulting in an evaluation substrate (metal-clad laminate) with copper foil adhered to both sides and a resin layer thickness of approximately 1,236 μm.
上記のように調製された評価基板を、以下に示す方法により評価を行った。 The evaluation substrate prepared as described above was evaluated using the method described below.
[ガラス転移温度(Tg)]
前記評価基板(金属張積層板)から銅箔をエッチングにより除去したアンクラッド板を試験片とし、セイコーインスツルメンツ株式会社製の粘弾性スペクトロメータ「DMS6100」を用いて、樹脂組成物の硬化物のTgを測定した。このとき、曲げモジュールで周波数を10Hzとして動的粘弾性測定(DMA)を行い、昇温速度5℃/分の条件で室温から340℃まで昇温した際のtanδが極大を示す温度をTg(℃)とした。測定して得られたガラス転移温度が、270℃以上であれば、「合格」と判断した。
[Glass transition temperature (Tg)]
The copper foil was removed from the evaluation substrate (metal-clad laminate) by etching to prepare an unclad plate, which was used as a test specimen. The Tg of the cured resin composition was measured using a Seiko Instruments Inc. viscoelasticity spectrometer "DMS6100." Dynamic mechanical analysis (DMA) was performed using a bending module at a frequency of 10 Hz. The temperature at which tan δ reached a maximum when the temperature was increased from room temperature to 340°C at a heating rate of 5°C/min was defined as Tg (°C). A glass transition temperature of 270°C or higher was deemed to be "passed."
[貯蔵弾性率]
前記ガラス転移温度を測定する際の動的粘弾性測定(DMA)にて、30℃での貯蔵弾性率も測定した。
[Storage modulus]
In the dynamic mechanical analysis (DMA) performed when measuring the glass transition temperature, the storage modulus at 30° C. was also measured.
[熱膨張率(50~100℃)]
前記評価基板(金属張積層板)から銅箔をエッチングにより除去したアンクラッド板を試験片とし、樹脂組成物の硬化物のガラス転移温度未満の温度における、前記評価基板の面方向(引張方向、Y方向)の熱膨張率を、TMA法(Thermo-mechanical analysis)により測定した。具体的には、測定にはTMA装置(エスアイアイ・ナノテクノロジー株式会社製「TMA6000」)を用いて、圧縮モードで測定した。試験片が有する熱歪みの影響を除去するため、前記試験片をY方向に荷重10gで引っ張った状態で、昇温速度10℃/分で30℃から320℃に昇温させた後、室温まで冷却させた。その後、前記試験片をY方向に荷重10gで引っ張った状態で、昇温速度10℃/分で30℃から320℃に昇温させた。この昇温時に温度変位チャートを得た。そして、このときに得られた温度変位チャートから、50~100℃の平均熱膨張率を算出した。この平均熱膨張率(Y-CTE 50-100℃)が低いほど好ましい結果であることを意味し、本試験では、4.0ppm/℃以下であれば「合格」と判断した。
[Thermal expansion coefficient (50 to 100°C)]
An unclad plate obtained by etching the copper foil from the evaluation substrate (metal-clad laminate) was used as a test specimen. The thermal expansion coefficient in the plane direction (tensile direction, Y direction) of the evaluation substrate at a temperature below the glass transition temperature of the cured resin composition was measured by the TMA method (thermo-mechanical analysis). Specifically, a TMA device ("TMA6000" manufactured by SII NanoTechnology Inc.) was used for the measurement in compression mode. To eliminate the influence of thermal distortion of the test specimen, the test specimen was pulled in the Y direction with a load of 10 g, and the temperature was raised from 30 ° C to 320 ° C at a heating rate of 10 ° C / min, and then cooled to room temperature. Then, the test specimen was pulled in the Y direction with a load of 10 g, and the temperature was raised from 30 ° C to 320 ° C at a heating rate of 10 ° C / min. A temperature displacement chart was obtained during this temperature increase. The average thermal expansion coefficient from 50 to 100 ° C was calculated from the temperature displacement chart obtained at this time. The lower this average coefficient of thermal expansion (Y-CTE 50-100°C), the better the result. In this test, a value of 4.0 ppm/°C or less was judged to be "pass."
[銅箔ピール強度]
前記評価基板(金属張積層板)から前記金属箔(銅箔)を引き剥がし、そのときのピール強度を、JIS C 6481(1996)に準拠して測定した。具体的には、前記評価基板から前記銅箔を引っ張り試験機により50mm/分の速度で引き剥がし、そのときのピール強度(N/mm)を測定した。
[Copper foil peel strength]
The metal foil (copper foil) was peeled off from the evaluation substrate (metal-clad laminate), and the peel strength at this time was measured in accordance with JIS C 6481 (1996). Specifically, the copper foil was peeled off from the evaluation substrate at a rate of 50 mm/min using a tensile tester, and the peel strength at this time (N/mm) was measured.
上記各評価における結果は、樹脂組成物の組成とともに、表1に示す。 The results of each of the above evaluations, along with the composition of the resin composition, are shown in Table 1.
なお、表1におけるガラス転移温度の欄における「>310」は、310℃超であることを示す。また、平均熱膨張率(Y-CTE 50-100℃)が4.0ppm/℃以下である場合には、参考までに、前記温度変位チャートから、210~260℃の平均熱膨張率(Y-CTE 50-260℃)及び50~260℃の平均熱膨張率(Y-CTE 50-260℃)を算出した。この結果も表1に示す。 In Table 1, ">310" in the glass transition temperature column indicates a temperature above 310°C. Furthermore, when the average thermal expansion coefficient (Y-CTE 50-100°C) is 4.0 ppm/°C or less, the average thermal expansion coefficient from 210 to 260°C (Y-CTE 50-260°C) and the average thermal expansion coefficient from 50 to 260°C (Y-CTE 50-260°C) were calculated from the temperature change chart for reference. These results are also shown in Table 1.
前記スチレン系重合体(C)として、酸価が2mgCH3ONa/g以上のスチレン系重合体を用いる、すなわち、酸価が2mgCH3ONa/g以上となるように、無水マレイン酸で酸変性したスチレン系重合体を用いた場合(実施例1、及び実施例3~5)であれば、酸変性していないスチレン系重合体を用いた場合(実施例2)より、高温域(210~260℃)でも、熱膨張率が低かった。なお、無機充填材を含む場合(実施例1及び実施例2)であれば、無機充填材を含まない場合(実施例3~5)より、貯蔵弾性率の高かった。 When a styrene polymer having an acid value of 2 mg CH 3 ONa/g or more was used as the styrene polymer (C), that is, when a styrene polymer acid-modified with maleic anhydride so as to have an acid value of 2 mg CH 3 ONa/g or more was used (Example 1 and Examples 3 to 5), the thermal expansion coefficient was lower even in the high temperature range (210 to 260° C.) than when a non-acid-modified styrene polymer was used (Example 2). Note that when an inorganic filler was included (Examples 1 and 2), the storage modulus was higher than when no inorganic filler was included (Examples 3 to 5).
この出願は、2024年2月1日に出願された日本国特許出願特願2024-014384を基礎とするものであり、その内容は、本願に含まれるものである。 This application is based on Japanese Patent Application No. 2024-014384, filed on February 1, 2024, the contents of which are incorporated herein by reference.
本発明を表現するために、上述において実施形態を通して本発明を適切且つ十分に説明したが、当業者であれば上述の実施形態を変更および/または改良することは容易に為し得ることであると認識すべきである。したがって、当業者が実施する変更形態または改良形態が、請求の範囲に記載された請求項の権利範囲を離脱するレベルのものでない限り、当該変更形態または当該改良形態は、当該請求項の権利範囲に包括されると解釈される。 In order to express the present invention, the present invention has been appropriately and sufficiently described above through the embodiments, but it should be recognized that those skilled in the art could easily modify and/or improve the above-described embodiments. Therefore, unless modifications or improvements made by those skilled in the art are at a level that would cause them to depart from the scope of the claims set forth in the claims, such modifications or improvements are construed as being encompassed within the scope of the claims.
本発明によれば、熱膨張率の低い硬化物が得られる樹脂組成物を提供することができる。また、本発明によれば、前記樹脂組成物を用いて得られる、プリプレグ、樹脂付きフィルム、樹脂付き金属箔、金属張積層板、及び配線板が提供される。 The present invention provides a resin composition that produces a cured product with a low coefficient of thermal expansion. The present invention also provides prepregs, resin-coated films, resin-coated metal foils, metal-clad laminates, and wiring boards that are produced using the resin composition.
Claims (19)
炭素-炭素不飽和結合を分子中に有する硬化剤(B)と、
エチレン構造単位とブチレン構造単位とを分子中に有し、前記ブチレン構造単位が、前記エチレン構造単位及び前記ブチレン構造単位の合計に対して、50モル%以上であって、25℃で固体のスチレン系重合体(C)とを含み、
前記スチレン系重合体(C)の含有量が、12質量%以上である樹脂組成物。 a maleimide compound (A) having, in the molecule, at least one of an indane structure and an arylene structure bonded to a meta position;
a curing agent (B) having a carbon-carbon unsaturated bond in the molecule;
a styrene-based polymer (C) that has ethylene structural units and butylene structural units in its molecule, the butylene structural units accounting for 50 mol % or more of the total of the ethylene structural units and the butylene structural units, and is solid at 25°C;
The resin composition has a content of the styrene polymer (C) of 12 mass% or more.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2024014384 | 2024-02-01 | ||
| JP2024-014384 | 2024-02-01 |
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| WO2025164387A1 true WO2025164387A1 (en) | 2025-08-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2025/001470 Pending WO2025164387A1 (en) | 2024-02-01 | 2025-01-17 | Resin composition, prepreg, resin-attached film, resin-attached metal foil, metal-clad laminate, and wiring board |
Country Status (2)
| Country | Link |
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| TW (1) | TW202540265A (en) |
| WO (1) | WO2025164387A1 (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2022054862A1 (en) * | 2020-09-11 | 2022-03-17 | パナソニックIpマネジメント株式会社 | Resin composition, prepreg, film provided with resin, metal foil provided with resin, metal-clad laminate, and wiring board |
| WO2022145377A1 (en) * | 2020-12-28 | 2022-07-07 | 昭和電工マテリアルズ株式会社 | Resin composition, prepreg, laminated plate, resin film, print wiring board, and semiconductor package |
| JP2022162795A (en) * | 2021-04-13 | 2022-10-25 | 昭和電工マテリアルズ株式会社 | Resin composition, prepreg, laminate, resin film, multilayer printed wiring board, semiconductor package, method for producing resin composition and modified conjugated diene polymer |
| JP2023001134A (en) * | 2017-03-02 | 2023-01-04 | パナソニックIpマネジメント株式会社 | Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and wiring board |
| JP2023110554A (en) * | 2022-01-28 | 2023-08-09 | 株式会社レゾナック | Resin compositions, prepregs, laminates, resin films, printed wiring boards and semiconductor packages |
-
2025
- 2025-01-17 WO PCT/JP2025/001470 patent/WO2025164387A1/en active Pending
- 2025-01-22 TW TW114102736A patent/TW202540265A/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023001134A (en) * | 2017-03-02 | 2023-01-04 | パナソニックIpマネジメント株式会社 | Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and wiring board |
| WO2022054862A1 (en) * | 2020-09-11 | 2022-03-17 | パナソニックIpマネジメント株式会社 | Resin composition, prepreg, film provided with resin, metal foil provided with resin, metal-clad laminate, and wiring board |
| WO2022145377A1 (en) * | 2020-12-28 | 2022-07-07 | 昭和電工マテリアルズ株式会社 | Resin composition, prepreg, laminated plate, resin film, print wiring board, and semiconductor package |
| JP2022162795A (en) * | 2021-04-13 | 2022-10-25 | 昭和電工マテリアルズ株式会社 | Resin composition, prepreg, laminate, resin film, multilayer printed wiring board, semiconductor package, method for producing resin composition and modified conjugated diene polymer |
| JP2023110554A (en) * | 2022-01-28 | 2023-08-09 | 株式会社レゾナック | Resin compositions, prepregs, laminates, resin films, printed wiring boards and semiconductor packages |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202540265A (en) | 2025-10-16 |
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