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WO2025078109A1 - Structure de refroidissement et mécanique pour un forceur polyphasé à enroulement distribué - Google Patents

Structure de refroidissement et mécanique pour un forceur polyphasé à enroulement distribué Download PDF

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Publication number
WO2025078109A1
WO2025078109A1 PCT/EP2024/075815 EP2024075815W WO2025078109A1 WO 2025078109 A1 WO2025078109 A1 WO 2025078109A1 EP 2024075815 W EP2024075815 W EP 2024075815W WO 2025078109 A1 WO2025078109 A1 WO 2025078109A1
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WO
WIPO (PCT)
Prior art keywords
slot
poly
phase
filling portion
coils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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PCT/EP2024/075815
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English (en)
Inventor
Taehee Shin
Ankush Gupta
Arjun Verma
Nathan Robert FINNEY
Stephen Roux
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of WO2025078109A1 publication Critical patent/WO2025078109A1/fr
Pending legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K3/00—Details of windings
    • H02K3/04—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors
    • H02K3/24—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors with channels or ducts for cooling medium between the conductors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K3/00—Details of windings
    • H02K3/04—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors
    • H02K3/12—Windings characterised by the conductor shape, form or construction, e.g. with bar conductors arranged in slots
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/15—Sectional machines

Definitions

  • This description relates generally to a distributed wound electromagnetic poly-phase forcer.
  • Linear actuators are known. Also known as permanent magnet linear synchronous motors (PMSM), multi-phase electromagnetic linear actuators have been used as long stroke actuators in lithography apparatuses, metrology systems, and other devices, for example.
  • PMSM permanent magnet linear synchronous motors
  • a lithography (e.g., projection) apparatus can be used, for example, in the manufacture of integrated circuits (ICs).
  • a patterning device e.g., a mask
  • design layout a pattern corresponding to an individual layer of the IC
  • a substrate e.g., silicon wafer
  • a layer of radiation-sensitive material (“resist”)
  • a single substrate contains a plurality of adjacent target portions to which the pattern is transferred successively by the lithographic projection apparatus, one target portion at a time.
  • the pattern on the entire patterning device is transferred onto one target portion in one operation.
  • Such an apparatus is commonly referred to as a stepper.
  • a projection beam scans over the patterning device in a given reference direction (the “scanning” direction) while synchronously moving the substrate parallel or anti-parallel to this reference direction. Different portions of the pattern on the patterning device are transferred to one target portion progressively.
  • Various movements of the lithography apparatus may be facilitated by one or more linear actuators.
  • a linear actuator is but one type of forcer that can be used in machines to cause movement.
  • Different types of forcers in rotary and linear actuators such as interior permanent magnet (IPM) motors, reluctance force motors, and PMSMs, are some examples that can be used in lithography apparatuses, metrology systems, and other devices. It is desirable to develop new kinds of forcers that can improve efficiency in these and other kinds of machines.
  • a distributed wound electromagnetic poly-phase forcer comprising: an iron core defining a plurality of teeth and a plurality of slots each disposed between a pair of teeth among the plurality of teeth; a plurality of cooling plates, wherein each of the plurality of cooling plates is disposed in a slot among the plurality of slots and comprises at least one end positioned outside of the slot; a plurality of poly-phase coils each comprising a closed loop defining a first slot-filling portion and a second slot-filling portion positioned opposite the first slot-filling portion; wherein each of the plurality of poly-phase coils is disposed in both a first and a second slot among the plurality of slots such that the first slot-filling portion is disposed in the first slot and the second slot-filling portion is disposed in the second slot; and a cooling mechanism configured to provide cooling fluid into the at least one end of each of the plurality of cooling
  • At least one slot among the plurality of slots is filled with at least one cooling plate among the plurality of cooling plates and either the first or the second slot-filling portion of one poly-phase coil among the plurality of poly-phase coils.
  • At least one slot among the plurality of slots is filled with: at least one cooling plate among the plurality of cooling plates; either the first or the second slot-filling portion of a first poly-phase coil among the plurality of poly-phase coils; and either the first or the second slotfilling portion of a second poly-phase coil among the plurality of poly-phase coils.
  • the one cooling plate among the plurality of cooling plates is disposed between either the first or the second slot-filling portion of the first poly-phase coil and either the first or the second slot-filling portion of the second poly-phase coil.
  • the iron core comprises a plurality of linearly stacked iron modules, each of the iron modules defining a subset of the plurality of slots and a subset of the plurality of slots.
  • each first and second slot-filling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in a respective first and second slot belonging to the same iron module.
  • each slot defines an upper portion and a lower portion; each first slotfilling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in the lower portion of its respective first slot; and each second slot-filling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in the upper portion of its respective second slot.
  • the distributed wound electromagnetic poly-phase forcer is configured to drive an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • a poly-phase coil for installation in a distributed wound electromagnetic poly-phase forcer comprising: a closed loop defining: a first slot-filling portion; a second slot-filling portion positioned opposite the first slot-filling portion; a first terminal connector portion positioned between the first slot-filling portion and the second slot-filling portion; and a second terminal connection portion positioned between the first slot-filling portion and the second slot-filling portion and opposite the first terminal connector portion; wherein the first slot-filling portion is configured to be disposed in a first slot of an iron core of the distributed wound electromagnetic poly-phase forcer and the second slot-filling portion is configured to be disposed in a second slot of the iron core of the distributed wound electromagnetic poly-phase forcer; and wherein the first terminal connector portion and the second terminal connector portion extend away from the second slot-filling portion and are both positioned along a straight line with the second slotfilling portion.
  • the first slot-filling portion is further configured to be disposed in a lower portion of the first slot and the second slot-filling portion is further configured to be disposed in an upper portion of the second slot.
  • the first terminal connector portion comprises less than three edge turns and the second terminal connector portion comprises less than three edge turns.
  • the poly-phase coil is configured to cool an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • another poly-phase coil for installation in a distributed wound electromagnetic poly-phase forcer comprising: a closed loop defining: a first slot-filling portion; a second slot-filling portion positioned opposite the first slot-filling portion; a first terminal connector portion positioned between the first slot-filling portion and the second slotfilling portion; and a second terminal connection portion positioned between the first slot-filling portion and the second slot-filling portion and opposite the first terminal connector portion; wherein the first slot-filling portion is configured to be disposed in a first slot of an iron core of the distributed wound electromagnetic poly-phase forcer such that the first slot-filling portion spans an entire depth of the first slot, and the second slot-filling portion is configured to be disposed in a second slot of the iron core of the distributed wound electromagnetic poly-phase forcer such that the second slot-filling portion spans an entire depth of the second slot.
  • the first terminal connector portion and the second terminal connector portion extend away from the second slot-filling portion and are both positioned along a straight line with the second slot-filling portion.
  • the first terminal connector portion comprises less than three edge turns and the second terminal connector portion comprises less than three edge turns.
  • the first slot-filling portion extends along a first plane; the second slot-filling portion extends along a second plane parallel to the first plane; and the first terminal connector portion and the second terminal connector portion extend along a third plane parallel to both the first plane and the second plane and in between the first plane and the second plane.
  • the first terminal connector portion comprises less than five edge turns and the second terminal connector portion comprises less than five edge turns.
  • the first terminal connector and the second terminal connector both extend above and below both the first and second slot-filling portions.
  • the extension above both the first and second slotfilling portions is symmetrical in shape to the extension below both the first and second slot-filling portions.
  • the poly-phase coil is configured to cool an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • FIG. 1 schematically depicts a lithography apparatus, which may include a linear actuator with the present cooling system, according to an embodiment.
  • FIG. 2 schematically depicts an embodiment of a lithographic cell or cluster, which may include a linear actuator with the present cooling system in one or more apparatuses of the lithographic cell or cluster, according to an embodiment.
  • FIGS. 3A and 3B provide an example of a linear actuator of the present disclosures and common components found in a number of variations presented herein.
  • FIG. 4 illustrates phase current distribution configurations for a linear actuator, which may be consistent with the phase current distributions of linear actuators of the present disclosures.
  • FIGS. 5A, 5B, and 5C show another example of a linear actuator of the present disclosures, this time including a cooling plate apparatus.
  • FIGS. 6A, 6B, and 6C show multiple views of another embodiment of the linear actuator of the present disclosures, this time illustrating a coil design whose slot-fitting portions cover the entire depth of their respective slots.
  • FIG. 7 shows side by side views of two designs of the linear actuator of the present disclosures.
  • FIGS. 8A, 8B, 8C, and 8D show various views of two linear motor layouts, according to aspects of the present disclosure.
  • FIGS. 9A, 9B, 9C, and 9D show a more detailed explanation of the 5-phase repeating coil design that may be achievable using the single coil per slot design, according to some embodiments.
  • FIGS. 10A, 10B, and 10C show how the linear actuator may include in each slot of the iron core a cooling plate sandwiched between a coil pair, according to some embodiments.
  • FIGS. 11A and 11B show a first design of the cooling channels utilizing a cooling plate and coil shape design of the present disclosures.
  • FIG. 12 shows a zoomed in cross-sectional area of a fluid channel between the fluid inlet and a vertical cooling plate, according to some embodiments.
  • FIG. 13 shows an alternative cooling plate apparatus is shown with fluid inlets that direct fluid through the vertical cooling plates, according to some embodiments.
  • FIG. 14 shows another example of how the fluid may be channeled in the cooling plates that mirror the contours of the coils including their end turns, according to some embodiments.
  • FIG. 15 shows additional illustrations of how the end turns may be connected to fluid inlets and outlets, consistent with the descriptions of FIGS. 13 and 14.
  • FIG. 16 shows a chart of various examples of coil geometries that may be used to produce cooling systems for a linear actuator, according to some embodiments.
  • FIGS. 17A through 17G show detailed illustrations of the assembled linear actuator using the single coil per slot design (e.g., design 1610), also consistent with FIGS. 6A-6C.
  • FIGS. 18A through 18G show detailed illustrations of the assembled linear actuator using the single coil per slot design with coil pairs in each slot sandwiching a cooling plate in between (e.g., design 1625), also consistent with FIGS. 10A-10C.
  • Multi-phase electromagnetic linear actuators of two separate types have been used as long stroke actuators in lithography apparatuses, metrology systems, and other devices.
  • Lorentz actuators linear actuators with magnetic materials present in their armatures with or without slots or magnetic teeth in the armature, and/or other motion systems are used in lithography apparatuses (these may also be known as slotted iron core LPMSMs (Linear Permanent Magnet Synchronous Motors), for example).
  • LPMSMs Linear Permanent Magnet Synchronous Motors
  • the new cooling system includes an iron core having multiple slots, wound electrical coils of a particular design shape, and cooling plates.
  • Each electrical coil is shaped the same and in a ring configuration that has two opposite sides of the ring configured to fit into two different slots of the iron core.
  • Each cooling plate may be shaped to mirror at least part of the contour of a coil such that each cooling plate may be fitted into at least one slot of the iron core.
  • the particular design of the coils and cooling plates allows them to be stacked into multiple slots of the iron core such that there are no volume conflicts with each other.
  • the coils may be shaped to ensure that there is equivalent cooling volume at the end turns, which are positioned to the lateral sides of the iron core when the coils are fitted into the slots.
  • the shape of the coils and cooling plates allows for at least 80% of the volume of the slots to be filled, providing for substantial cooling properties of the linear actuator.
  • the coils are configured to provide 100% volume fill of the slots in the iron core.
  • a linear actuator having the new cooling system described below is more efficient compared to prior linear actuators, requiring reduced average power from amplifiers compared to prior linear actuators. This allows such a linear actuator to achieve a higher force density (limited by coil temperature or amplifier limits) compared to prior linear actuators, and therefore achieve a higher peak acceleration of a lithography apparatus stage.
  • the various designs of the linear actuator of the present disclosures may therefore be used in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system, among other types of lithography systems.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • the distributed wound electromagnetic poly-phase forcer includes a cooling system that includes wound electrical coils and cooling plates.
  • the electrical coils are configured to be energized to provide an electromagnetic force for the linear actuator.
  • the electrical coils are configured to be fitted into slots of an iron core.
  • the cooling plates are in thermal contact with the electrical coils and configured to also fit into the slots and cool the electrical coils.
  • the electrical coils and the cooling plates are configured to be assembled piece by piece.
  • a generally perpendicular orientation of the electrical coils and the cooling plates relative to the length of the armature, and/or the separate piece by piece nature of electrical coils and the cooling plates, is configured to reduce shear forces on mechanical fasteners and/or adhesives joining any two wound electrical coils and/or cooling plates along the length of the armature. Also, an orientation of the electrical coils and the cooling plates in a plane perpendicular to the length of the armature is configured to resist unwanted motion or deformation of the linear actuator.
  • the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures (“post-exposure procedures”), such as a post-exposure bake (PEB), development, a hard bake and measurement and/or other inspection of the transferred pattern.
  • post-exposure procedures such as a post-exposure bake (PEB), development, a hard bake and measurement and/or other inspection of the transferred pattern.
  • PEB post-exposure bake
  • This array of procedures is used as a basis to make an individual layer of a device, e.g., an IC.
  • the substrate may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemical mechanical polishing, etc., all intended to finish an individual layer of the device.
  • the whole procedure, or a variant thereof, is repeated for each layer.
  • a device will be present in each target portion on the substrate. These devices are then separated from one another by a technique such as dicing or sawing, and then the individual devices can be mounted on a carrier, connected to pins, etc.
  • Manufacturing devices such as semiconductor devices, typically involves processing a substrate (e.g., a semiconductor wafer) using a number of fabrication processes to form various features and multiple layers of the devices. Such layers and features are typically manufactured and processed using, e.g., deposition, lithography, etch, chemical mechanical polishing, ion implantation, and/or other processes. Multiple devices may be fabricated on a plurality of dies on a substrate and then separated into individual devices. This device manufacturing process may be considered a patterning process.
  • a patterning process involves a patterning step, such as optical and/or nanoimprint lithography using a patterning device in a lithographic apparatus, to transfer a pattern on the patterning device to a substrate and typically, but optionally, involves one or more related pattern processing steps, such as resist development by a development apparatus, baking of the substrate using a bake tool, etching using the pattern using an etch apparatus, etc.
  • One or more metrology processes are typically involved in the patterning process. Lithography apparatuses, metrology systems, and other equipment used to fabricate semiconductor devices may use one or more linear actuators having the described cooling system.
  • Lithography is a step in the manufacturing of device such as ICs, where patterns formed on substrates define functional elements of the devices, such as microprocessors, memory chips, etc. Similar lithographic techniques are also used in the formation of flat panel displays, micro-electro mechanical systems (MEMS) and other devices.
  • MEMS micro-electro mechanical systems
  • FIG. 1 schematically depicts an embodiment of a lithographic apparatus LA that may include and/or be associated with one or more linear actuators and corresponding cooling systems.
  • the apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g. UV radiation, DUV radiation, or EUV radiation); a support structure (e.g. a mask table) MT constructed to support a patterning device (e.g. a mask) MA and connected to a first positioner PM configured to accurately position the patterning device in accordance with certain parameters; a substrate table (e.g. a wafer table) WT (e.g., WTa, WTb or both) configured to hold a substrate (e.g.
  • a radiation beam B e.g. UV radiation, DUV radiation, or EUV radiation
  • a support structure e.g. a mask table
  • WT e.g., WTa, WTb or both
  • the apparatus is of a transmissive type (e.g. employing a transmissive mask).
  • the apparatus may be of a reflective type (e.g. employing a programmable mirror array of a type as referred to above, or employing a reflective mask).
  • the illuminator IL receives a beam of radiation from a radiation source SO.
  • the source and the lithographic apparatus may be separate entities, for example when the source is an excimer laser. In such cases, the source is not considered to form part of the lithographic apparatus and the radiation beam is passed from the source SO to the illuminator IL with the aid of a beam delivery system BD comprising for example suitable directing mirrors and/or a beam expander. In other cases, the source may be an integral part of the apparatus, for example when the source is a mercury lamp.
  • the source SO and the illuminator IL, together with the beam delivery system BD if required, may be referred to as a radiation system.
  • the illuminator IL may alter the intensity distribution of the beam.
  • the illuminator may be arranged to limit the radial extent of the radiation beam such that the intensity distribution is non-zero within an annular region in a pupil plane of the illuminator IL. Additionally or alternatively, the illuminator IL may be operable to limit the distribution of the beam in the pupil plane such that the intensity distribution is non-zero in a plurality of equally spaced sectors in the pupil plane.
  • the intensity distribution of the radiation beam in a pupil plane of the illuminator IL may be referred to as an illumination mode.
  • the illuminator IL may comprise adjuster AD configured to adjust the (angular / spatial) intensity distribution of the beam.
  • adjuster AD configured to adjust the (angular / spatial) intensity distribution of the beam.
  • at least the outer and/or inner radial extent (commonly referred to as o-outer and o-inner, respectively) of the intensity distribution in a pupil plane of the illuminator can be adjusted.
  • the illuminator IL may be operable to vary the angular distribution of the beam.
  • the illuminator may be operable to alter the number, and angular extent, of sectors in the pupil plane wherein the intensity distribution is non-zero.
  • the intensity distribution may have a multi-pole distribution such as, for example, a dipole, quadrupole or hexapole distribution.
  • a desired illumination mode may be obtained, e.g., by inserting an optic which provides that illumination mode into the illuminator IL or using a spatial light modulator.
  • the illuminator IL may be operable to alter the polarization of the beam and may be operable to adjust the polarization using adjuster AD.
  • the polarization state of the radiation beam across a pupil plane of the illuminator IL may be referred to as a polarization mode.
  • the use of different polarization modes may allow greater contrast to be achieved in the image formed on the substrate W.
  • the radiation beam may be unpolarized.
  • the illuminator may be arranged to linearly polarize the radiation beam.
  • the polarization direction of the radiation beam may vary across a pupil plane of the illuminator IL.
  • the polarization direction of radiation may be different in different regions in the pupil plane of the illuminator IL.
  • the polarization state of the radiation may be chosen in dependence on the illumination mode.
  • the polarization of each pole of the radiation beam may be generally perpendicular to the position vector of that pole in the pupil plane of the illuminator IL.
  • the radiation may be linearly polarized in a direction that is substantially perpendicular to a line that bisects the two opposing sectors of the dipole.
  • the radiation beam may be polarized in one of two different orthogonal directions, which may be referred to as X-polarized and Y-polarized states.
  • the radiation in the sector of each pole may be linearly polarized in a direction that is substantially perpendicular to a line that bisects that sector.
  • This polarization mode may be referred to as XY polarization.
  • the radiation in the sector of each pole may be linearly polarized in a direction that is substantially perpendicular to a line that bisects that sector.
  • This polarization mode may be referred to as TE polarization.
  • the illuminator IL generally comprises various other components, such as an integrator IN and a condenser CO.
  • the illumination system may include various types of optical components, such as refractive, reflective, magnetic, electromagnetic, electrostatic, or other types of optical components, or any combination thereof, for directing, shaping, or controlling radiation.
  • the illuminator provides a conditioned beam of radiation B, having a desired uniformity and intensity distribution in its cross section.
  • the support structure MT supports the patterning device in a manner that depends on the orientation of the patterning device, the design of the lithographic apparatus, and other conditions, such as for example whether or not the patterning device is held in a vacuum environment.
  • the support structure may use mechanical, vacuum, electrostatic or other clamping techniques to hold the patterning device.
  • the support structure may be a frame or a table, for example, which may be fixed or movable as required. The support structure may ensure that the patterning device is at a desired position, for example with respect to the projection system.
  • the lithographic apparatus may be of a type having two (dual stage) or more tables (e.g., two or more substrate tables WTa, WTb, two or more patterning device tables, a substrate table WTa and a table WTb below the projection system without a substrate that is dedicated to, for example, facilitating measurement, and/or cleaning, etc.).
  • the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposure. For example, alignment measurements using an alignment sensor AS and/or level (height, tilt, etc.) measurements using a level sensor LS may be made.
  • a radiation beam is conditioned and provided by the illumination system IL.
  • the radiation beam B is incident on the patterning device (e.g., mask) MA, which is held on the support structure (e.g., mask table) MT. Having traversed the patterning device MA, the radiation beam B passes through the projection system PS, which focuses the beam onto a target portion C of the substrate W.
  • the substrate table WT can be moved accurately, e.g. to position different target portions C in the path of the radiation beam B.
  • the first positioner PM and another position sensor can be used to accurately position the patterning device MA with respect to the path of the radiation beam B, e.g. after mechanical retrieval from a mask library, or during a scan.
  • movement of the support structure MT may be realized with the aid of a long-stroke module (coarse positioning) and a short-stroke module (fine positioning), which form part of the first positioner PM.
  • movement of the substrate table WT may be realized using a long-stroke module and a shortstroke module, which form part of the second positioner PW.
  • the support structure MT may be connected to a short-stroke actuator only, or may be fixed.
  • Patterning device MA and substrate W may be aligned using patterning device alignment marks Ml, M2 and substrate alignment marks Pl, P2.
  • the substrate alignment marks as illustrated occupy dedicated target portions, they may be located in spaces between target portions (these are known as scribe-lane alignment marks).
  • the patterning device alignment marks may be located between the dies.
  • the depicted apparatus may be used in at least one of the following modes: 1.
  • step mode the support structure MT and the substrate table WT are kept essentially stationary, while a pattern imparted to the radiation beam is projected onto a target portion C at one time (i.e. a single static exposure).
  • the substrate table WT is then shifted in the X and/or Y direction so that a different target portion C can be exposed.
  • step mode the maximum size of the exposure field limits the size of the target portion C imaged in a single static exposure.
  • scan mode the support structure MT and the substrate table WT are scanned synchronously while a pattern imparted to the radiation beam is projected onto a target portion C (i.e. a single dynamic exposure).
  • the velocity and direction of the substrate table WT relative to the support structure MT may be determined by the (de-) magnification and image reversal characteristics of the projection system PS.
  • scan mode the maximum size of the exposure field limits the width (in the non-scanning direction) of the target portion in a single dynamic exposure, whereas the length of the scanning motion determines the height (in the scanning direction) of the target portion. 3.
  • the support structure MT is kept essentially stationary holding a programmable patterning device, and the substrate table WT is moved or scanned while a pattern imparted to the radiation beam is projected onto a target portion C.
  • a pulsed radiation source is employed, and the programmable patterning device is updated as required after each movement of the substrate table WT or in between successive radiation pulses during a scan.
  • This mode of operation can be readily applied to maskless lithography that utilizes programmable patterning device, such as a programmable mirror array of a type as referred to above. Combinations and/or variations on the above-described modes of use or entirely different modes of use may also be employed.
  • a substrate may be processed, before or after exposure, in for example a track (a tool that typically applies a layer of resist to a substrate and develops the exposed resist) or a metrology or inspection tool. Any or all of these tools may include linear actuators with corresponding cooling systems.
  • Various patterns on or provided by a patterning device may have different process windows, i.e., a space of processing variables under which a pattern will be produced within specification. Examples of pattern specifications that relate to potential systematic defects include checks for necking, line pull back, line thinning, critical dimension (CD), edge placement, overlapping, resist top loss, resist undercut and/or bridging.
  • the process window of the patterns on a patterning device or an area thereof may be obtained by merging (e.g., overlapping) process windows of each individual pattern.
  • the boundary of the process window of a group of patterns comprises boundaries of process windows of some of the individual patterns. In other words, these individual patterns limit the process window of the group of patterns.
  • the lithographic apparatus LA may form part of a lithographic cell LC, also sometimes referred to a lithocell or cluster, which also includes apparatuses to perform pre- and post-exposure processes on a substrate.
  • a lithographic cell LC also sometimes referred to a lithocell or cluster
  • these include one or more spin coaters SC to deposit one or more resist layers, one or more developers to develop exposed resist, one or more chill plates CH and/or one or more bake plates BK.
  • a substrate handler, or robot, RO picks up one or more substrates from input/output port I/Ol, I/O2, moves them between the different process apparatuses and delivers them to the loading bay LB of the lithographic apparatus.
  • a substrate that is exposed by the lithographic apparatus is exposed correctly and consistently and/or in order to monitor a part of the patterning process (e.g., a device manufacturing process) that includes at least one pattern transfer step (e.g., an optical lithography step)
  • a pattern transfer step e.g., an optical lithography step
  • the one or more measured parameters may include, for example, alignment, overlay between successive layers formed in or on the patterned substrate, critical dimension (CD) (e.g., critical linewidth) of, for example, features formed in or on the patterned substrate, focus or focus error of an optical lithography step, dose or dose error of an optical lithography step, optical aberrations of an optical lithography step, etc.
  • CD critical dimension
  • This measurement may be performed on a target of the product substrate itself and/or on a dedicated metrology target provided on the substrate.
  • the measurement can be performed after-development of a resist but before etching, after-etching, after deposition, and/or at other times.
  • a fast and non-invasive form of specialized metrology tool is one in which a beam of radiation is directed onto a target on the surface of the substrate and properties of the scattered (diffracted/reflected) beam are measured. By evaluating one or more properties of the radiation scattered by the substrate, one or more properties of the substrate can be determined. This may be termed diffraction-based metrology.
  • diffraction-based metrology One such application of this diffraction-based metrology is in the measurement of feature asymmetry within a target.
  • asymmetry can be measured by comparing opposite parts of the diffraction spectrum (for example, comparing the -1st and +l st orders in the diffraction spectrum of a periodic grating).
  • Metrology results may be provided directly or indirectly to the supervisory control system SCS. If an error is detected, an adjustment may be made to exposure of a subsequent substrate (especially if the inspection can be done soon and fast enough that one or more other substrates of the batch are still to be exposed) and/or to subsequent exposure of the exposed substrate. Also, an already exposed substrate may be stripped and reworked to improve yield, or discarded, thereby avoiding performing further processing on a substrate known to be faulty. In a case where only some target portions of a substrate are faulty, further exposures may be performed only on those target portions which meet specifications.
  • the present cooling system(s), and/or method(s) may be used as stand-alone tools and/or techniques, and/or or used in conjunction with semiconductor manufacturing apparatuses and/or processes, to enhance the accurate transfer of complex designs to physical wafers.
  • the present cooling system may be part of a linear actuator included the lithography apparatus shown in FIG. 1 , included in one or more apparatuses of the lithographic cell shown in FIG. 2, and/or included in other apparatuses (semiconductor or non-semiconductor related).
  • the present cooling system includes surface wound electrical coils and cooling plates positioned into slots of an iron core.
  • the electrical coils are configured to be energized to provide an electromagnetic force for the linear actuator.
  • the cooling plates are in thermal contact with the electrical coils and configured to cool the electrical coils.
  • FIGS. 3 A and 3B provide an example of a linear actuator of the present disclosures and common components found in a number of variations presented herein.
  • Shown here in FIG. 3A is an exploded view 300 of various components of a linear actuator.
  • the exploded view 300 features wound electrical coils 305, cooling plates 310 and an iron core 315.
  • the wound coils 305 are individual rings in a particular shape and configuration such that the rings 305 may be stacked next to each other without volume conflicts, akin to how some chairs or carabiners are designed so that they can be stacked efficiently.
  • the iron core 315 is shown to have many vertical slots, and the core 315 may comprise a soft ferromagnetic material, and/or other materials.
  • one cooling plate among the cooling plates 310 and one coil among the coil 305 may be positioned together into one of the vertical slots of the iron core 315. Due to the ring design of the coils 305, one portion of the coil will be positioned into the slot, such as the slot-fitting portion 306, while another portion of the coil on its opposite side will be positioned into another vertical slot of the iron core, such as the slot-fitting portion 307. In this example, the portion 306 fits into a lower half of one slot, while the portion 307 fits into an upper half of another slot.
  • Each of the coils among coils 305 are designed with the same shape in this example, such that there are no volume conflicts among the coils and the lower half and upper half of most slots in the iron core 315 will be filled with a slot-fitting portion of each coil.
  • the coils 305 are shown with five different shadings in a repeating pattern, which represent a 5-phase electrical coil design used in some embodiments. The multi-phase coil design will be described in more detail below.
  • FIG. 3B an integrated view 320 of the iron core with the cooling plates and coils positioned into their respective slots is also shown.
  • the integrated design 320 may form part of a linear actuator that includes the main current-carrying windings (e.g., coils 305) and in which electromotive force is induced.
  • the iron core of the integrated design 320 may comprise a soft ferromagnetic material and/or other materials, for example.
  • FIG. 4 illustrates phase current distribution configurations for a linear actuator, which may be consistent with the phase current distributions of linear actuators of the present disclosures.
  • FIG. 4 illustrates concentrated phase current 400 and distributed phase current 402 (for N phases).
  • Surface wound electrical coils 450 comprise coils with windings encircling iron core 410 (encircling the y-axis in this example). Because the coils presented herein have two portions that are fitted into different slots of the iron core, the linear actuators of the present disclosure follow the distributed phase current design 402.
  • FIG. 4 illustrates N-phase coil pitches 404, 406, 408, and 410.
  • the current per phase has an adjacent +/-x current direction.
  • the current per phase has a +/- x current direction that is spatially distributed.
  • Amsterdamar actuators in lithography apparatuses may use racetrack wound coils 452 with concentrated phase current 400 as a forcer (lower left box, note coils would be sandwiched between cool plates oriented in the XY-plane).
  • the present cooling system provides for distributed winding configurations for surface wound coils (right column in FIG. 4) in linear actuators.
  • FIGS. 5 A, 5B, and 5C shown is another example of a linear actuator of the present disclosures, this time including a cooling plate apparatus 505.
  • the iron core 500 may have a cooling plate apparatus 505 positioned on top of it with vertical cooling plates fitted inside each respective vertical slot.
  • the cooling plate apparatus 505 includes a series of vertical cooling plates connected by lateral plates 507 and 508.
  • Lateral plate 508 includes a cooling fluid entrance 509 to allow cooling fluid to flow within the cooling plate apparatus 505, including within the vertical slots.
  • Lateral plate 507 includes an outlet for the cooling fluid, not shown.
  • FIG. 5B shows a front view 525 of the cooling plate apparatus 505, where it can be seen how the cooling plates are spaced.
  • the combination of the iron core 500 and the cooling plate apparatus 505 produces the structure 510.
  • the series of coils 515 that are in the same design shape as coils 305 may then be positioned within the slots of the iron core 500 to produce the combined structure 520.
  • the upper slot-fitting portions of the coils 515 will fit into only the upper halves of their respective slots, while the lower slot-fitting portions of the coils 515 will fit into the lower halves of different respective slots, as shown in the cross-sectional area illustration 535.
  • the cross-sectional illustration 535 depicts the iron core 500, the vertical slots of the cooling apparatus 505, and the upper and lower slot-fitting portions of the coils 515.
  • the upper slot-fitting portion 538 belongs to the same coil as the lower slot-fitting portion 539, and the pattern continues down the line for each subsequent coil.
  • a zoomed-in portion 537 of the cross-sectional area is also shown to reveal the slots between the teeth 545 of the iron core 500 and the positioning of the vertical cooling plates 540 of the cooling plate apparatus 505 within the slots.
  • Next to them in the slots are the upper portions of two coils including coil 538.
  • the arrow 550 shows the direction of the coil layer, facing upward to the top of the slots.
  • FIGS. 6A, 6B, and 6C shown are multiple views of another embodiment of the linear actuator of the present disclosures, this time illustrating a coil design whose slot-fitting portions cover the entire depth of their respective slots.
  • Illustration 600 in FIG. 6 A shows an exploded view of a series of modules 608, 616, and 624, the concatenations of which may form a linear actuator 626.
  • Each module includes an iron module that may be linearly stacked with other iron modules to collectively constitute the iron core, such as modules 606, 614, and 622; cooling plates, such as cooling plates 604, 612, and 620; and 5-phase coils with non-conflicting volumes, such as 5-phase coils 602, 610, and 618 having just a single coil portion per slot.
  • the linear actuator may look like illustration 628 in FIG. 6B, that allows for high acceleration in the axis along line 630.
  • This modular design may be possible due to the design shape of the coils 602, 610, and 618.
  • each coil possesses two slot-filling portions that fill the entire depth of their respective slots, in contrast with the double lap winding coil design of the previously shown coils 515 and 310.
  • the previous coils 515 and 310 featured a staggered design whose slot-filling portions covered either a top half or a bottom half of each slot, which may lend itself to utilizing two separate coils to fit any one particular slot.
  • the designs of coils 602, 610, and 618 do not require multiple coils to fill any single slot. This allows the iron cores to be split or modularized, such that each 5-phase series of coils can be contained in their own separate modules, as shown in FIG. 6A.
  • the cooling plates 604, 612, and 620 can be shaped to mirror the contours of the coils accordingly.
  • illustration 632 shows a cross-sectional area of the 5-phase coil design of illustrations 600 and 628, including the series of cooling plates 636 within each slot of the teeth of the iron core 634.
  • the sets of 5-phase coils 602, 610, and 618 provide distributed phase current due to their stacking design structure.
  • FIG. 7 shown are side by side views of two designs of the linear actuator of the present disclosures.
  • the assembled view 700 shows a 5-phase design with the double lap winding coils consistent with the coil designs 310 and 515.
  • the assembled view 705 shows a 5-phase design with the single coil portion per slot consistent with the coil designs 602, 610, and 618.
  • This side-by-side view highlights how the two designs compare to one another.
  • illustration 705 it can be seen that 100% of all slots are filled with a coil portion and corresponding cooling plate.
  • the illustration 700 shows that the double-layer lap winding design leaves the ends of the iron core slots half empty.
  • FIGS. 8A, 8B, 8C, and 8D shown are various views of two linear motor layouts, according to aspects of the present disclosure.
  • Illustrations 800 (see FIG. 8A) and 820 (see FIG. 8B) pertain to the motor layout of the double-layer lap winding coil design (see e.g, FIGS. 3A-3B and 5A- 5C), while illustrations 815 (see FIG. 8C) and 845 (see FIG. 8D) show a motor layout for the single coil per slot design (see e.g., FIGS. 6A-6C).
  • each of the coils are fit into a slot and a portion of their ends are positioned laterally to the iron core 805, such as what is shown with coil 810.
  • Illustration 820 in FIG. 8B also shows neutral points 855 that represent a lateral side of the coils that are not configured with terminal phase connections, e.g., terminal phase connections 835. Those are positioned on the opposite side of the iron core.
  • Illustration 845 of FIG. 8D shows the pinout schematic for the single coil per slot design. Here, there are no half-total current ends, since the design of the coils allows for every slot-filling portion to cover the entire depth of their respective slot.
  • the partition 840 represents the modular capabilities of this design, consistent with the descriptions in FIGS. 6A-6C that the 5-phase sets of coils can be modularized to be separated or put together as modular pieces.
  • the neutral points 850 are also shown in this pinout.
  • Illustration 900 of FIG. 9A shows a more detailed explanation of the 5-phase repeating coil design that may be achievable using the single coil per slot design that corresponds to the design in illustration 905 of FIG. 9B, consistent with the descriptions in FIGS. 6A-6C and illustration 845.
  • Illustration 900 shows a cross-sectional area in the y direction (along the length of the actuator) and a repeating pattern of 5-phase coils. As shown, one coil may include the slot-fitting portions of both A and A’. The slot-fitting portions A and A’ are positioned on opposite sides of the coil.
  • the single coil will have one slot-fitting portion A to fit into the first slot as shown, while on the opposite side of its ring-like structure, the same coil has a second slot-fitting portion A’ that fits into the slot that is located five slots down.
  • a second coil includes the slot-filling portions B and B ’ that are positioned on opposite sides of their coil, and also are spaced five slots apart. This pattern repeats for the third, fourth, and fifth coils comprising slot-filling portions C and C’, D and D’, and E and E’, respectively. It can be seen that these five coils now fill a self-enclosed set of 10 slots, without any overlap or need for other coils to cover missing slots.
  • illustration 910 shows a cross-sectional area in the y direction (along the length of the actuator) and a repeating pattern of 5-phase coils of the double-layer lap winding design, consistent with FIGS. 3A-3B and 5A-5C.
  • illustration 915 in FIG. 9D see illustration 915 in FIG. 9D.
  • one coil may include the slot-fitting portions of both A and A’, where the A slot-fitting portion of this first coil is fitted into the lower half of the first slot, while the A’ slot-fitting portion positioned opposite to the A slot-fitting portion of this first coil is fitted into the upper half of the fifth slot.
  • a second coil includes the slot-filling portions B and B’.
  • this pattern repeats for the third, fourth, and fifth coils comprising slot-filling portions C and C’, D and D’, and E and E’, respectively.
  • the next set of 5-phase coils i.e., F and F’, G and G’, H and H’, I and I’ , and J and J’ , repeats this positioning, except that it is 5 slots down and inverted.
  • the lower half of the slot that includes the A’ slot-fitting portion is filled with the F’ slot-fitting portion of the sixth coil.
  • the slot having its upper half filled with the B’ slot-fitting portion includes the G’ slot-fitting portion in its lower half.
  • the inversion of the second set of 5-phase coils allows for each slot to include consistent force directionality, e.g., A’ and F’ together, rather than A’ and F together.
  • the slot-filling portions of the coils still manage to leave a small slot 920 within each slot.
  • the linear actuator may include in each slot of the iron core a cooling plate sandwiched between a coil pair.
  • the coils may each be slightly thinner, compared to the previous designs, as a result.
  • Illustration 1000 in FIG. 10A shows an example of an exploded view of the single coil per slot design shape, similar to FIG. 6A, but this time each slot includes two coils each with the cooling plate sandwiched in between.
  • the modules 1005, 1015, and 1020 therefore include pairs of coils in a 5-phase pattern, meaning that there are 10 coils in total with cooling plates sandwiched in between successive pairs. See the example configuration of the coils 1025 and the cooling plates 1030.
  • Illustration 1040 in FIG. 10B shows an isometric view of the assembled structure of the three modules 1005, 1015, and 1020.
  • the arrows 1045 show a central longitudinal axis along which demonstrates the main directionality of the linear actuator.
  • Illustration 1050 in FIG. 10C shows a cross-sectional area of the assembled module with each coil pair 1041, 1042, 14043, 1044, and 1045, having a cooling plate 1055 sandwiched in between and positioned within each slot of the iron core.
  • cooling efficiency may be improved even over other designs mentioned herein.
  • FIGS. 11A through 15 will discuss various examples of fluid channels that utilize the designs of the coils and cooling plates discussed herein, according to some embodiments.
  • Cooling plate apparatus 1100 which is consistent with the cooling plate apparatus 505 in FIG. 5 A, includes a cooling fluid opening 1105 in a base lateral plate that connects to all of the vertical cooling plates that would be positioned in the slots of an iron core.
  • a cooling fluid outlet 1125 would be positioned on the opposite base lateral plate, as shown in illustration 1120.
  • Illustration 1110 shows a cross-sectional view of the cooling plate apparatus while it is positioned on the iron core.
  • the cooling fluid inlet 1105 allows water or other cooling fluid to flow into the cooling plate apparatus. Narrow channels in the base lateral plate flow from the inlet 1105 to each vertical cooling plate, as shown by the arrows. Referring to illustration 1120, the cooling fluid would then flow vertically to each vertical cooling plate that is positioned above the base lateral plates in parallel with one another. The cooling fluid would then flow along each vertical cooling plate, then back down at the other end of each vertical cooling plate. Finally, the cooling fluid would flow out the outlet 1125.
  • the outlet 1125 may be positioned symmetrically to the position of the inlet 1105, meaning the fluid would flow down the end of each vertical cooling plate and collect in the middle of the opposite base lateral plate before exiting the outlet 1125. In this way, the structures described herein demonstrate a system for cooling and performing high accelerations in a linear actuator.
  • FIG. 11B shown are alternative perspective views of the cooling channels of the cooling plate apparatus as shown in FIG. 11 A. While illustrations 1110 and 1120 showed fluid channels flowing across the vertical cooling plates in parallel, the illustrations 1130, 1135 and 110 provide an example of the fluid flowing across the cooling plates in a single, direct path.
  • the fluid may divert directly to one end of the cooling plate apparatus, say to the left in this example.
  • the fluid may flow across (up) one of the vertical cooling plates to the other side.
  • the base lateral plates of the cooling plate apparatus may provide a path directly to the next vertical cooling plate, rather than an entire channel running to all vertical cooling plates in parallel.
  • Illustrations 1135 and 1140 show an opposite view and a side view, respectively, of the linear actuator of this embodiment. In illustrations 1135 and 1140, the inlet is shown with reference 1105 and the outlet is shown with reference 1125.
  • illustration 1200 shows a zoomed in cross-sectional area of a fluid channel between the fluid inlet and a vertical cooling plate, according to some embodiments.
  • This illustration may be consistent with both the parallel and direct flow examples in FIGS. 11 A and 1 IB.
  • the fluid represented by the dotted area
  • a narrow path can channel 1222 flowing from the inlet 1220 leads to the cooling plate 1205.
  • the base of the iron module 1210 supports the cooling plate 1205 above it. Therefore, the cooling plate 1205 rests in a slot between teeth of the iron core 1210.
  • a further zoomed-in illustration 1230 shows even more clearly how the fluid 1225 flows from the inlet to a larger space of the cooling plate 1205.
  • the end turns of the coils 1215 are shown to the side.
  • This illustration 1200 therefore shows how the narrow connections between the base lateral plates of the cooling plate apparatus provide fluid channels to the vertical cooling plates.
  • Illustration 1300 shows an alternative design of a cooling plate apparatus with fluid inlets and outlets.
  • the apparatus in illustration 1300 may be consistent with or adaptable with the cooling plates shown in FIGS. 3A-B, 6A-C, and 10A-C, for example. That is, the bending or winding characteristics of the cooling plate apparatus 1300 are consistent with how the contours of the cooling plates in FIGS. 3A-B, 6A-C, and 10A-C conform to the contours of the coils in those figures.
  • the inclusion of one or more inlets 1302 and outlets, as shown in illustration 1300 may be applied to any of the designs of the cooling plates of the aforementioned figures, as well as any similar designs, including those described below.
  • the example in illustration 1300 shows two sets of cooling plates that may mirror the contours of the coils in the double-layer lap winding design, consistent with FIGS. 3A- B and 5A-C.
  • the top half of the end turns are coupled to a common inlet 1302 and the bottom half of the end turns are coupled to a common inlet 1304.
  • the fluid channeling provided may be similar to the pathways described in FIG. 11 A, 11B and 12.
  • the illustration 1305 shows an overhead view of how the fluid may flow from the inlet 1302 into parallel fluid channels. The fluid then travels along the upper path, such as path 1306, and out to the outlet 1312. This also provides for parallel flow to the cooling plates on the bottom half.
  • Illustrations 1310 and 1315 show side views of the two cooling plate apparatuses.
  • FIG. 14 shown is another example of how the fluid may be channeled in the cooling plates that mirror the contours of the coils including their end turns. These descriptions may be consistent with the example cooling plates 310, with a different angle shown of the collection of cooling plates in illustration 1420.
  • Illustration 1400 shows a single cooling plate with a direction of the fluid flow, according to some embodiments.
  • the fluid channels may be positioned within the cooling plate and flow from one top end 1402, through the upper vertical cooling plate section 1404, through the opposite end turn 1406, and then back through the lower vertical cooling plate section 1408.
  • the width of the paths through the cooling plate may be similar to the narrow channels shown in FIG. 12. While the single cooling plate shown in illustration 1400 has an open end on the left, the collection of cooling plates, such as those shown in 310 or 1420, may be connected on one side to provide a single inlet to channel fluid through them all in parallel. Illustrations 1405, 1410, and 1415 show an overhead view and two side views, respectively, of the structure of the single cooling plate.
  • inlets 1505 provide dual channels for fluid to flow through one side of the cooling plates and out the end at the bottom outlets 1507.
  • Illustration 1510 provides an overhead view of the same fluid channels as in illustration 1500, for perspective, with fluid outlet 1511 shown at bottom. This may be consistent with the descriptions in FIG. 13.
  • illustration 1520 shows a fluid inlet 1508 and outlet 1515 through fluid path 1509 on the same lateral side.
  • Illustration 1525 shows an overhead view of this design, where the fluid may travel in a loop and back out to the lateral side that it flowed into, starting from inlet 1512.
  • these designs may be shaped for the double-layer lap winding coil design, however analogous designs that mirror the contours of the single coil per slot designs may be achieved with the design principles described herein, and embodiments are not so limited.
  • FIG. 16 shown is a chart of various examples of coil geometries that may be used to produce cooling systems for a linear actuator, according to some embodiments.
  • Row A shows the perspective view of each example design.
  • Row B shows the view of each example design from the XZ plane, meaning facing the front or the back of it.
  • Row C shows the view of each example design from the XY plane, meaning view each coil from the top down.
  • the design 1600 shows the described doublelayer lapped winding design that is consistent with the descriptions in at least FIGS. 3 and 5, for example.
  • the design 1610 shows the single coil per slot design that is consistent with the descriptions in at least FIGS. 6A-6C, for example.
  • FIG. 16 shows additional example designs that are variants of these two concepts.
  • Design 1605 features a second double-layer lapped winding design that features an asymmetrical overhead (XY plane) view of the coils.
  • the upper slot-fitting portion of the coil runs straight across all the way to the end turns, while the original double-layer lapped winding 1600 featured in the previous descriptions includes an upper slot-filling portion that bends away from the end turns such that the overhead view is symmetrical.
  • the design 1605 may provide for more power than the design 1600, and therefore may be more efficient.
  • the design 1610 represents the original single coil per slot design described above.
  • the single coil per slot concept allows for every slot of the iron core to be completely filled, such that overlapping with other coils to fill a single slot is not necessary.
  • This allows for the iron cores to be modularized, which may provide for easier assembly, disassembling and cleaning. This also provides for more uniform power at the ends of the iron core, so that cooling and power efficiency go up.
  • the design 1610 features an overhead profile (XY view) similar to the design 1605. It also features a front facing view (XZ view) with a profile that has the end turns dropping below the depth of the slots in the iron core and looping back up to be level with the slots.
  • design 1615 provides another single coil per slot variation, this time with the end turns positioned in the middle of both slot-filling portions. This is evident in the overhead view (XY view), which looks similar to the design 1600. The XY symmetry may provide for some additional efficiencies, either in manufacturing or in cooling.
  • design 1620 provides another single coil per slot variation, this time with symmetry also in the front facing view (XZ view).
  • XZ view front facing view
  • the end turns are looped both above and below the slot depth, so that the slot falls in between the top and bottom height of the end turns. This may provide for easier manufacturability, including being able to deform existing racetrack coils to fit this design.
  • design 1625 features the coil pairs in a single slot with the cooling plate sandwiched in between, consistent with the descriptions of FIGS. 10A-10C. Each coil width is therefore halved. This may provide for improved cooling efficiency and easier manufacturability.
  • Table A below provides additional details to the example coil designs 1600, 1605, 1610, 1615, 1620, and 1625, starting from the second column and on through the rightmost column.
  • Table A Additional descriptions of the example designs of 1600, 1605, 1610, 1615, 1620, and 1625.
  • the second column from the left is in reference to example design 1600 and on through the rightmost column describing example design 1625.
  • FIGS. 17A through 17G shown are detailed illustrations of the assembled linear actuator using the single coil per slot design (e.g., design 1610), also consistent with FIGS. 6A-6C.
  • FIG. 17A shows a perspective view of the single coil per slot design, including three 5-phase coil modules assembled together.
  • FIG. 17B shows the top or overhead view (in the XY plane) of the single coil per slot design, while FIG. 17C shows the bottom view, which is opposite the view of FIG. 17B.
  • FIG. 17D shows the front view (in the XZ plane) of the single coil per slot design, while FIG. 17E shows the back view, which is opposite the view of FIG. 17D.
  • FIG. 17F shows the left side view, while FIG. 17G shows the right-side view.
  • FIGS. 18A through 18G shown are detailed illustrations of the assembled linear actuator using the single coil per slot design with coil pairs in each slot sandwiching a cooling plate in between (e.g., design 1625), also consistent with FIG. 10A-10C.
  • FIG. 18A shows a perspective view of the coil pair per slot design, including three 5-phase coil modules assembled together.
  • FIG. 18B shows the top or overhead view (in the XY plane), while FIG. 18C shows the bottom view, which is opposite the view of FIG. 18B.
  • FIG. 18D shows the front view (in the XZ plane), while FIG. 18E shows the back view, which is opposite the view of FIG. 18D.
  • FIG. 18F shows the left side view, while FIG. 18G shows the right side view.
  • FIGS. 17A through 18G Based on the examples of detailed views shown in FIGS. 17A through 18G, it may be apparent to those with skill in the art how the detailed views of the other coil designs described in FIG. 16, e.g., designs 1600, 1605, 1615, and 1620, may be viewed and produced. Patterns may be produced using these examples that are within the scope of these disclosures, and embodiments are not so limited.
  • a distributed wound electromagnetic poly-phase forcer comprising: an iron core defining a plurality of teeth and a plurality of slots each disposed between a pair of teeth among the plurality of teeth; a plurality of cooling plates, wherein each of the plurality of cooling plates is disposed in a slot among the plurality of slots and comprises at least one end positioned outside of the slot; a plurality of polyphase coils each comprising a closed loop defining a first slot-filling portion and a second slot-filling portion positioned opposite the first slot-filling portion; wherein each of the plurality of poly-phase coils is disposed in both a first and a second slot among the plurality of slots such that the first slot-filling portion is disposed in the first slot and the second slot-filling portion is disposed in the second slot; and a cooling mechanism configured to provide cooling fluid into the at least one end of each of the plurality of cooling plates.
  • the iron core comprises a plurality of linearly stacked iron modules, each of the iron modules defining a subset of the plurality of slots and a subset of the plurality of slots.
  • each first and second slot-filling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in a respective first and second slot belonging to the same iron module.
  • each slot defines an upper portion and a lower portion; each first slot-filling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in the lower portion of its respective first slot; and each second slot-filling portion of each poly-phase coil among the plurality of poly-phase coils is disposed in the upper portion of its respective second slot.
  • the distributed wound electromagnetic poly-phase forcer of any of the previous clauses configured to drive an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • first slot-filling portion is further configured to be disposed in a lower portion of the first slot and the second slot-filling portion is further configured to be disposed in an upper portion of the second slot.
  • the poly-phase coil of any of the previous clauses configured to cool an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • a poly-phase coil for installation in a distributed wound electromagnetic poly-phase forcer comprising: a closed loop defining: a first slot-filling portion; a second slot-filling portion positioned opposite the first slot-filling portion; a first terminal connector portion positioned between the first slot-filling portion and the second slot-filling portion; and a second terminal connection portion positioned between the first slot-filling portion and the second slot-filling portion and opposite the first terminal connector portion; wherein the first slot-filling portion is configured to be disposed in a first slot of an iron core of the distributed wound electromagnetic poly-phase forcer such that the first slot-filling portion spans an entire depth of the first slot, and the second slot-filling portion is configured to be disposed in a second slot of the iron core of the distributed wound electromagnetic poly-phase forcer such that the second slot-filling portion spans an entire depth of the second slot.
  • first slot-filling portion extends along a first plane
  • second slot-filling portion extends along a second plane parallel to the first plane
  • first terminal connector portion and the second terminal connector portion extend along a third plane parallel to both the first plane and the second plane and in between the first plane and the second plane.
  • the poly-phase coil of any of the previous clauses configured to cool an actuator in a deep ultraviolet (DUV) lithography system or an extreme ultraviolet (EUV) lithography system.
  • DUV deep ultraviolet
  • EUV extreme ultraviolet
  • the concepts disclosed herein may be used for a linear actuator associated with wafer manufacturing on a substrate such as a silicon wafer, it shall be understood that the disclosed concepts may be used with any type of manufacturing system that may include a linear actuator, e.g., those used for manufacturing on substrates other than silicon wafers.
  • the combination and sub- combinations of disclosed elements may comprise separate embodiments.
  • the cooling system, and an associated lithography apparatus that includes the cooling system may comprise separate embodiments, and/or these features may be used together in the same embodiment.

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Abstract

L'invention concerne un système de refroidissement pour un actionneur linéaire. Le système de refroidissement comprend un noyau de fer ayant de multiples fentes, des bobines électriques enroulées d'une forme de conception particulière et des plaques de refroidissement. Chaque bobine électrique est de forme identique et présente une configuration annulaire dont les deux côtés opposés sont destinés à s'insérer dans deux fentes différentes du noyau de fer. Chaque plaque de refroidissement peut être façonnée de manière à épouser au moins une partie du contour d'une bobine pour s'insérer dans au moins une fente du noyau de fer. La conception particulière des bobines et des plaques de refroidissement leur permet d'être empilées dans de multiples fentes du noyau de fer de telle sorte qu'il n'y a pas de conflits de volume entre elles.
PCT/EP2024/075815 2023-10-09 2024-09-16 Structure de refroidissement et mécanique pour un forceur polyphasé à enroulement distribué Pending WO2025078109A1 (fr)

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