WO2025041642A1 - Composition, film, optical filter, solid-state imaging element, and image display device - Google Patents

Abstract

Provided is a composition comprising: a pigment A; a compound B which has an acid group and at least one structure selected from among dye structures, aromatic rings, and heteroaromatic rings and which has a molecular weight of 122 or higher but less than 2,000; a compound C which has two or more amino groups in the molecule and has a molecular weight of 60 or higher but less than 2,000; and a compound D which has at least one structure selected from among polyester structures and polyether structures and at least one group selected from among acid groups and basic groups and which has a weight-average molecular weight of 2,000-30,000. Also provided are a film, an optical filter, a solid-state imaging element, and an image display device which are obtained using the composition.

Description

Composition, film, optical filter, solid-state imaging device and image display device

The present invention relates to a composition containing a pigment. The present invention also relates to a film, an optical filter, a solid-state imaging device, and an image display device that use a composition containing a pigment.

Color filters are manufactured using compositions that contain coloring materials such as pigments.

Patent Document 1 describes an invention relating to a coloring composition for color filters that contains a diketopyrrolopyrrole pigment, a basic pigment derivative, and a resin-type dispersant.

JP 2020-172563 A

In recent years, there has been a strong demand for smaller and thinner solid-state imaging devices. For this reason, there has also been a demand in recent years for films containing color materials, such as color filters, used in solid-state imaging devices to be thinner. In order to achieve thinner films while maintaining the desired spectral performance, it is necessary to increase the concentration of color materials in the resin composition used to form the film.

However, when a colorant containing a pigment is used, increasing the concentration of the colorant in the composition reduces the proportion of materials such as resins that can be adsorbed relative to the pigment, which makes the pigment more likely to aggregate during storage and tends to increase the viscosity of the composition over time.

Therefore, an object of the present invention is to provide a composition having excellent storage stability. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging device, and an image display device.

The inventors have found through their research that the above object can be achieved by the composition described below, and have completed the present invention. Therefore, the present invention provides the following.

<1> Pigment A,
a compound B having at least one structure selected from a dye structure, an aromatic ring, and a heteroaromatic ring, and an acid group, and having a molecular weight of 122 or more and less than 2,000;
A compound C containing two or more amino groups in one molecule and having a molecular weight of 60 or more and less than 2,000;
a compound D having a weight average molecular weight of 2,000 to 30,000 and having at least one structure selected from a polyester structure and a polyether structure, and at least one group selected from an acid group and a basic group;
A composition comprising:
<2> The composition according to <1>, wherein the compound C is polyethyleneimine.
<3> The composition according to <1>, wherein the compound C is a compound having a heteroaromatic ring.
<4> The composition according to any one of <1> to <3>, wherein the compound C has an amine value of 800 mgKOH/g or more.
<5> The composition according to any one of <1> to <4>, comprising 10 to 150 parts by mass of the compound C relative to 100 parts by mass of the compound B.
<6> The composition according to any one of <1> to <5>, comprising, relative to 100 parts by mass of the pigment A, 5 to 15 parts by mass of the compound B, 2 to 8 parts by mass of the compound C, and 30 to 50 parts by mass of the compound D.
<7> The composition according to any one of <1> to <6>, further comprising a polymerizable compound and a photopolymerization initiator.
<8> The composition according to <7>, in which the content of the pigment A in the total solid content of the composition is 50 mass% or more.
<9> The composition according to any one of <1> to <8>, wherein the pigment A includes at least one pigment selected from the group consisting of a diketopyrrolopyrrole pigment and a phthalocyanine pigment.
<10> A film obtained by using the composition according to any one of <1> to <9>.
<11> An optical filter having the film according to <10>.
<12> A solid-state imaging device comprising the film according to <10>.
<13> An image display device having the film according to <10>.

The present invention can provide a composition with excellent storage stability. The present invention can also provide a film, an optical filter, a solid-state imaging device, and an image display device.

The present invention will be described in detail below.
In this specification, the use of "to" means that the numerical values before and after it are included as the lower limit and upper limit.
In the description of groups (atomic groups) in this specification, when there is no indication of whether they are substituted or unsubstituted, the term encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only alkyl groups that have no substituents (unsubstituted alkyl groups) but also alkyl groups that have substituents (substituted alkyl groups).
In this specification, unless otherwise specified, the term "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light represented by an excimer laser, extreme ultraviolet light (EUV light), X-rays, active rays or radiation such as electron beams.
In this specification, "(meth)acrylate" refers to both or either of acrylate and methacrylate, "(meth)acrylic" refers to both or either of acrylic and methacrylic, and "(meth)acryloyl" refers to both or either of acryloyl and methacryloyl.
In this specification, in the structural formulae, Me represents a methyl group, Et represents an ethyl group, Bu represents a butyl group, and Ph represents a phenyl group.
In this specification, the weight average molecular weight and number average molecular weight are values calculated as polystyrene standards measured by GPC (gel permeation chromatography).
In this specification, the total solids content refers to the total mass of all components of the composition excluding the solvent.
In this specification, a pigment means a coloring material that is difficult to dissolve in a solvent.
In this specification, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

<Composition>
The composition of the present invention comprises
Pigment A;
a compound B having at least one structure selected from a dye structure, an aromatic ring, and a heteroaromatic ring, and an acid group, and having a molecular weight of 122 or more and less than 2,000;
A compound C containing two or more amino groups in one molecule and having a molecular weight of 60 or more and less than 2,000;
a compound D having a weight average molecular weight of 2,000 to 30,000 and having at least one structure selected from a polyester structure and a polyether structure, and at least one group selected from an acid group and a basic group;
The present invention is characterized by comprising:

The composition of the present invention has good pigment dispersibility in the composition, can suppress the increase in viscosity over time, and has excellent storage stability. It is presumed that the reason for such effects is as follows. Pigment A and either compound B or compound C are adsorbed to the surface of the pigment due to the anchor effect, and compound B and compound C are adsorbed due to acid-base interaction. In addition, when compound D is a compound having an acid group, it is presumed that compound D is adsorbed to compound C due to acid-base interaction, and when compound D is a compound having a basic group, it is presumed that compound D is adsorbed to compound B due to acid-base interaction. Therefore, it is presumed that a strong network structure is formed between pigment A, compound B, compound C, and compound D in the composition. And, since compound D is a compound with a relatively large weight average molecular weight, it is presumed that compound D can suppress the aggregation of pigments. Therefore, it is presumed that the dispersibility of the pigment in the composition can be increased, and the increase in viscosity over time can be suppressed, thereby improving storage stability.

The composition of the present invention is preferably used as a composition for optical filters. Examples of optical filters include color filters, infrared transmission filters, and infrared cut filters, and color filters are preferred. The composition of the present invention is also preferably used for solid-state imaging devices. More specifically, the composition is preferably used as a composition for optical filters used in solid-state imaging devices, and is even more preferably used as a composition for forming colored pixels of color filters used in solid-state imaging devices.

An example of a color filter is a filter having colored pixels that transmit light of a specific wavelength. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels, with green pixels or red pixels being preferred.

The maximum absorption wavelength of the infrared cut filter is preferably in the wavelength range of 700 to 1800 nm, more preferably in the wavelength range of 700 to 1300 nm, and even more preferably in the wavelength range of 700 to 1000 nm. The transmittance of the infrared cut filter in the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. The transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. The ratio of the absorbance Amax at the maximum absorption wavelength of the infrared cut filter to the absorbance A550 at a wavelength of 550 nm (absorbance Amax/absorbance A550) is preferably 20 to 500, more preferably 50 to 500, even more preferably 70 to 450, and particularly preferably 100 to 400. The infrared cut filter can be formed using a composition containing an infrared absorbing pigment.

The infrared transmission filter is a filter that transmits at least a part of infrared light. The infrared transmission filter is preferably a filter that blocks at least a part of visible light and transmits at least a part of infrared light. Preferred examples of the infrared transmission filter include filters that satisfy the spectral characteristics of a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1300 nm. The infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (5).
(1): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm.
(2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 750 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 900 to 1500 nm.
(3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm.
(4): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm.
(5): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm.

The composition of the present invention can also be used as a light-shielding film.

The solids concentration of the composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, and more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less.

The components used in the composition of the present invention are explained below.

<<Pigment A>>
The composition of the present invention contains pigment A (hereinafter, referred to as pigment). Examples of the pigment include white pigments, black pigments, chromatic pigments, and infrared absorbing pigments. In the present invention, the white pigment includes not only pure white pigments, but also light gray pigments close to white (e.g., grayish white, light gray, etc.).

The pigment is preferably a compound that has neither acid groups nor basic groups, or a compound that has the same number of acid groups and basic groups.

The pigment may be either an inorganic pigment or an organic pigment, but is preferably an organic pigment from the standpoint of the wide range of color variations, ease of dispersion, safety, etc. Furthermore, the pigment preferably contains at least one type selected from a chromatic pigment and an infrared absorbing pigment, and more preferably contains a chromatic pigment.

The pigment preferably contains at least one selected from phthalocyanine pigments, dioxazine pigments, quinacridone pigments, anthraquinone pigments, perylene pigments, azo pigments, azomethine pigments, diketopyrrolopyrrole pigments, pyrrolopyrrole pigments, isoindoline pigments, and quinophthalone pigments, more preferably contains at least one selected from phthalocyanine pigments, pyrrolopyrrole pigments, diketopyrrolopyrrole pigments, isoindoline pigments, quinophthalone pigments, and azo pigments, and further preferably contains at least one selected from diketopyrrolopyrrole pigments and phthalocyanine pigments, because the effects of the present invention are more pronounced, and particularly preferably contains a phthalocyanine pigment.

The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, and more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from a photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is determined, and the corresponding circle equivalent diameter is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, the primary particles of the pigment refer to independent particles that are not aggregated.

The crystallite size of the pigment is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the half-width of the diffraction angle peak using an X-ray diffraction device, and is calculated using Scherrer's formula. The crystallite size of the organic pigment can be adjusted by known methods such as adjusting the manufacturing conditions or pulverizing after manufacturing.

The specific surface area of the pigment is preferably 1 to 300 ^{m 2} /g. The lower limit is preferably 10 m ² /g or more, more preferably 30 m ² /g or more. The upper limit is preferably 250 m ² /g or less, more preferably 200 m ² /g or less. The value of the specific surface area can be measured according to DIN 66131: determination of the specific surface area of solids by gas adsorption according to the BET (Brunauer, Emmett and Teller) method.

(chromatic pigments)
Examples of chromatic pigments include yellow pigments, orange pigments, red pigments, green pigments, purple pigments, and blue pigments. The chromatic pigments preferably contain at least one selected from green pigments and red pigments, and more preferably contain a green pigment. Specific examples of chromatic pigments include the following:

Red pigments include diketopyrrolopyrrole pigments, anthraquinone pigments, azo pigments, naphthol pigments, azomethine pigments, xanthene pigments, quinacridone pigments, perylene pigments, and thioindigo pigments, with diketopyrrolopyrrole pigments, anthraquinone pigments, and azo pigments being preferred, and diketopyrrolopyrrole pigments being more preferred.

Specific examples of red pigments include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 1 49,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294,295,296,297, etc. As a red pigment, the compound described in paragraph 0034 of WO 2022/085485 and the brominated diketopyrrolopyrrole compound described in JP 2020-085947 A can also be used.

As red pigments, C.I. Pigment Red 122, 177, 224, 254, 255, 264, 269, and 272 are preferred, and C.I. Pigment Red 254, 264, and 272 are more preferred.

Green pigments include phthalocyanine pigments and squarylium pigments, with phthalocyanine pigments being preferred.

Specific examples of green pigments include C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. In addition, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms in one molecule can also be used as a green pigment. Specific examples include the compounds described in WO 2015/118720. In addition, the compounds described in paragraph 0029 of WO 2022/085485, the aluminum phthalocyanine compounds described in JP-A-2020-070426, and the diarylmethane compounds described in JP-A-2020-504758 can also be used as green pigments.

As green pigments, C.I. Pigment Green 7, 36, 58, 62, and 63 are preferred, and C.I. Pigment Green 36 and 58 are more preferred.

Orange pigments include diketopyrrolopyrrole pigments and azo pigments, and diketopyrrolopyrrole pigments are preferred. Specific examples of orange pigments include C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

Examples of yellow pigments include azo pigments, azomethine pigments, isoindoline pigments, pteridine pigments, quinophthalone pigments, and perylene pigments. The yellow pigment is preferably at least one selected from isoindoline pigments, quinophthalone pigments, and azo pigments. Specific examples of yellow pigments include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125, 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236, etc.

As the yellow pigment, an azobarbituric acid nickel complex having the following structure can also be used.

The compounds described in paragraphs 0031 to 0033 of WO 2022/085485 can be used as yellow pigments.

Examples of purple pigments include oxazine pigments, quinacridone pigments, perylene pigments, and indigo pigments, with oxazine pigments being preferred. Specific examples of purple pigments include C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

Examples of blue pigments include phthalocyanine pigments and squarylium pigments, with phthalocyanine pigments being preferred. Specific examples of blue pigments include C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue pigments. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

Two or more chromatic pigments may be used in combination. When two or more chromatic pigments are used in combination, the two or more chromatic pigments may form a black color. Examples of such combinations include the following embodiments (1) to (7). When the composition contains two or more chromatic pigments and exhibits a black color through a combination of two or more chromatic pigments, the composition of the present invention can be preferably used as a composition for forming an infrared transmission filter.
(1) An embodiment containing a red pigment and a blue pigment.
(2) An embodiment containing a red pigment, a blue pigment, and a yellow pigment.
(3) An embodiment containing a red pigment, a blue pigment, a yellow pigment, and a purple pigment.
(4) An embodiment containing a red pigment, a blue pigment, a yellow pigment, a purple pigment, and a green pigment.
(5) An embodiment containing a red pigment, a blue pigment, a yellow pigment, and a green pigment.
(6) An embodiment containing a red pigment, a blue pigment, and a green pigment.
(7) An embodiment containing a yellow pigment and a purple pigment.

(White pigment)
Examples of the white pigment include inorganic pigments such as titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, and zinc sulfide. The white pigment may be any of the white pigments described in paragraphs 0040 to 0043 of WO 2022/085485.

(Black pigment)
The black pigment is not particularly limited, and any known black pigment can be used. The black pigment may be an inorganic black pigment or an organic black pigment. In this specification, the black pigment means a pigment that exhibits absorption over the entire wavelength range of 400 to 700 nm.

Examples of inorganic black pigments include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is black particles containing titanium atoms, and low-order titanium oxide and titanium oxynitride are preferred. As titanium black, titanium black described in paragraph 0044 of WO 2022/085485 and zirconium nitride powder described in JP 2023-048173 A can be used.

Examples of organic black pigments include bisbenzofuranone pigments, azomethine pigments, perylene pigments, and azo pigments, with bisbenzofuranone pigments and perylene pigments being preferred. The organic black pigment may be a compound described in paragraph 0166 of International Publication No. 2022/065215. In addition, the organic black pigment may be perylene black (Lumogen Black FK4280, etc.) described in paragraphs 0016 to 0020 of JP-A-2017-226821, or a black azo pigment described in JP-A-2022-121935.

(Infrared absorbing pigment)
The infrared absorbing pigment is preferably a compound having a maximum absorption wavelength longer than 700 nm. The infrared absorbing pigment is preferably a compound having a maximum absorption wavelength in the range of more than 700 nm to 1800 nm, more preferably a compound having a maximum absorption wavelength in the range of more than 700 nm to 1400 nm, even more preferably a compound having a maximum absorption wavelength in the range of more than 700 nm to 1200 nm, and particularly preferably a compound having a maximum absorption wavelength in the range of more than 700 nm to 1000 nm. In addition, the ratio A ¹ /A ² of the absorbance A ¹ at a wavelength of 500 nm of the infrared absorbing pigment to the absorbance ^{A 2} at the maximum absorption wavelength is preferably 0.08 or less, more preferably 0.04 or less. In addition, the infrared absorbing pigment is preferably a pigment, more preferably an organic pigment.

Infrared absorbing pigments include pyrrolopyrrole pigments, cyanine pigments, squarylium pigments, phthalocyanine pigments, naphthalocyanine pigments, quaterrylene pigments, merocyanine pigments, croconium pigments, oxonol pigments, iminium pigments, dithiol pigments, triarylmethane pigments, pyrromethene pigments, azomethine pigments, anthraquinone pigments, dibenzofuranone pigments, dithiolene metal complex pigments, metal oxides, metal borides, etc. Specific examples of these include the compounds described in paragraph 0114 of WO 2022/065215. Examples of infrared absorbing pigments include the compounds described in paragraph 0121 of WO 2022/065215, squarylium compounds described in JP 2020-075959 A, copper complexes described in Korean Patent Publication No. 10-2019-0135217, croconic acid compounds described in JP 2021-195515 A, near infrared absorbing dyes described in JP 2022-022070 A, croconium compounds described in WO 2019/021767 A, and compounds described in JP 2019-127549 A. It is also possible to use the compounds described in WO 2022/059619, the compounds described in JP 2022-151682 A, the squarylium compounds described in JP 2022-188858 A, the compounds described in JP 2022-184710 A, the compounds described in JP 2022-189736 A, the squarylium compounds described in JP 2023-004570 A, the squarylium compounds described in WO 2019/230660 A, and the compounds described in WO 2020/218615 A.

The pigment content of the total solid content of the composition is preferably 50% by mass or more, more preferably 55% by mass or more, and even more preferably 60% by mass or more. The upper limit is preferably 80% by mass or less, more preferably 77.5% by mass or less, and even more preferably 75% by mass or less.

<<Compound B (specific acidic compound)>>
The composition of the present invention contains compound B (hereinafter also referred to as specific acidic compound) having at least one structure selected from a dye structure, an aromatic ring, and a heteroaromatic ring, and an acid group, and having a molecular weight of 122 or more and less than 2,000.

The lower limit of the molecular weight of the specific acidic compound is preferably 200 or more, and more preferably 300 or more. The upper limit is preferably 1000 or less, and more preferably 1500 or less. In addition, when the molecular weight value of the specific acidic compound can be calculated from the structural formula, the molecular weight of the specific acidic compound is the value calculated from the structural formula.

Examples of the dye structure possessed by the specific acidic compound include a quinoline dye structure, a benzimidazolone dye structure, a benzoisoindole dye structure, a benzothiazole dye structure, an iminium dye structure, a squarylium dye structure, a croconium dye structure, an oxonol dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, an azo dye structure, an azomethine dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, an anthraquinone dye structure, a quinacridone dye structure, a dioxazine dye structure, a perinone dye structure, a perylene dye structure, a thiazineindigo dye structure, a thioindigo dye structure, an isoindoline dye structure, an isoindolinone dye structure, a quinophthalone dye structure, a dithiol dye structure, a triarylmethane dye structure, a pyrromethene dye structure, and the like. A diketopyrrolopyrrole dye structure, a phthalocyanine dye structure, a quinophthalone dye structure, an isoindoline dye structure, or an azomethine dye structure is preferable, and a quinophthalone dye structure is more preferable.

The aromatic rings contained in the specific acidic compound include a benzene ring and a naphthalene ring. These rings may further have a substituent. The heteroaromatic rings contained in the specific acidic compound may be monocyclic or polycyclic. The heteroatoms constituting the heteroaromatic ring preferably include at least one selected from a nitrogen atom, an oxygen atom, and a sulfur atom, and more preferably include a nitrogen atom. The number of heteroatoms constituting the heteroaromatic ring is preferably 1 to 4, and more preferably 1 to 3. Specific examples of the heteroaromatic ring include a triazine ring and a naphthalene ring, and a triazine ring is preferable.

Examples of the acid group possessed by the specific acidic compound include a carboxy group, a sulfo group, a phosphoric acid group, a boronic acid group, an imide acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ⁺ , Na ⁺ , K ⁺ , etc.), an alkaline earth metal ion (Ca ²⁺ , Mg ²⁺ , etc.), an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. The imide acid group is preferably -SO ₂ NHSO ₂ R ^X1 , -CONHSO ₂ R ^X2 , -CONHCOR ^X3 , or -SO ₂ NHCOR ^X4 , more preferably -SO ₂ NHSO ₂ R ^X1 , -CONHSO ₂ R ^X2 , or -SO ₂ NHCOR ^X4 , and even more preferably -SO ₂ NHSO ₂ R ^X1 or -CONHSO ₂ R ^X2 . R ^X1 to R ^X4 each independently represent an alkyl group or an aryl group. The alkyl group and aryl group represented by R ^X1 to R ^X4 may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom. ^{R X1} to R ^X4 each independently represent an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, more preferably an alkyl group containing a fluorine atom. The number of carbon atoms of the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The number of carbon atoms of the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.

The specific acidic compound is preferably a compound having at least one structure selected from a dye structure and a triazine ring, and an acid group.

The specific acidic compound may have a basic group, but it is preferable that the number of basic groups in one molecule is less than the number of acid groups. It is particularly preferable that the specific acidic compound does not have a basic group.

Specific examples of specific acidic compounds include compounds Syn-A1 to Syn-A5 described in the Examples below, compounds described in paragraph 0124 of WO 2022/085485, benzimidazolone compounds or salts thereof described in JP 2018-168244 A, compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282, compounds described in JP 2019-172968 A, and compounds described in the specification of Chinese Patent Application Publication No. 115124889.

The composition of the present invention preferably contains 1 to 30 parts by mass, more preferably 3 to 20 parts by mass, and even more preferably 3 to 11 parts by mass of the specific acidic compound per 100 parts by mass of the pigment.
The content of the specific acidic compound in the total solid content of the composition is preferably 1 to 20% by mass. The upper limit is preferably 10% by mass or less, and more preferably 8% by mass or less. The lower limit is preferably 2% by mass or more, and more preferably 3% by mass or more.
The composition of the present invention may contain only one specific acidic compound or may contain two or more specific acidic compounds. When two or more specific acidic compounds are contained, the total amount thereof is preferably within the above range.

<<Compound C (specific amine compound)>>
The composition of the present invention contains a compound C (hereinafter also referred to as a specific amine compound) that contains two or more amino groups in one molecule and has a molecular weight of 60 or more and less than 2,000.

The lower limit of the molecular weight of the specific amine compound is preferably 100 or more, more preferably 200 or more. The upper limit is preferably 1200 or less, more preferably 600 or less. Regarding the value of the molecular weight of the specific amine compound, if the molecular weight can be calculated from the structural formula, the molecular weight of the specific amine compound is the value calculated from the structural formula. On the other hand, if the molecular weight of the specific amine compound cannot be calculated from the structural formula or is difficult to calculate, the value of the number average molecular weight measured by the boiling point elevation method is used. If the molecular weight cannot be measured by the boiling point elevation method or is difficult to measure, the value of the number average molecular weight measured by the viscosity method is used. If the molecular weight cannot be measured by the viscosity method or is difficult to measure, the value of the number average molecular weight in polystyrene equivalent measured by the GPC (gel permeation chromatography) method is used.

The amine value of the specific amine compound is preferably 800 mgKOH/g or more, more preferably 850 mgKOH/g or more, and even more preferably 900 mgKOH/g or more. The upper limit is preferably 1500 mgKOH/g or less, more preferably 1400 mgKOH/g or less, and even more preferably 1300 mgKOH/g or less.

The number of amino groups contained in the specific amine compound is 2 or more, and preferably 3 or more. The upper limit can be 30 or less.

The amino group possessed by the specific amine compound may be any of a primary amino group, a secondary amino group, and a tertiary amino group, but is preferably a compound having a primary amino group, more preferably a compound containing a primary amino group and a secondary amino group or a tertiary amino group, and even more preferably a compound containing a primary amino group, a secondary amino group, and a tertiary amino group.

The amino group of the specific amine compound may be a cyclic amino group. The cyclic amino group may be an aliphatic cyclic amino group such as a piperidino group, or an aromatic cyclic amino group such as a pyridyl group. The cyclic amino group is preferably a cyclic amino group having a 5-membered or 6-membered ring structure, more preferably a cyclic amino group having a 6-membered ring structure, and even more preferably an aliphatic cyclic amino group having a 6-membered ring structure. The cyclic amino group preferably has a hindered amine structure, and particularly preferably has a 6-membered hindered amine structure. The hindered amine structure preferably has substituents such as alkyl groups on two carbon atoms in the ring structure adjacent to the nitrogen atom of the cyclic amino group. Examples of cyclic amino groups having a hindered amine structure include 1,2,2,6,6-pentamethylpiperidyl group, 2,2,6,6-tetramethylpiperidyl group, 1,2,6,6-trimethylpiperidyl group, 2,6-dimethylpiperidyl group, 1-methyl-2,6-di(t-butyl)piperidyl group, 2,6-di(t-butyl)piperidyl group, 1,2,2,5,5-pentamethylpyrrolidyl group, 2,2,5,5-tetramethylpyrrolidyl group, etc. Among these, 1,2,2,6,6-pentamethylpiperidyl group or 2,2,6,6-tetramethylpiperidyl group is preferred, and 1,2,2,6,6-pentamethylpiperidyl group is more preferred.

The specific amine compound may have an acid group, but it is preferable that the number of acid groups in one molecule is less than the number of amino groups. It is particularly preferable that the specific amine compound does not have an acid group.

The specific amine compound is preferably a polyalkyleneimine because it can further improve the storage stability of the composition. A polyalkyleneimine is a polymer obtained by ring-opening polymerization of an alkyleneimine. Specific examples of alkyleneimines include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine. Ethyleneimine or propyleneimine is preferable, and ethyleneimine is more preferable. The polyalkyleneimine is preferably a polymer having a branched structure containing a primary amino group, a secondary amino group, and a tertiary amino group. The number of carbon atoms in the alkyleneimine is preferably 2 to 6, more preferably 2 to 4, even more preferably 2 or 3, and particularly preferably 2.

The polyalkyleneimine is particularly preferably polyethyleneimine. The polyethyleneimine preferably contains primary amino groups in an amount of 10 mol% or more, more preferably 20 mol% or more, and even more preferably 30 mol% or more, based on the total amount of primary amino groups, secondary amino groups, and tertiary amino groups. Commercially available polyethyleneimines include Epomin SP-003, SP-006, SP-012, and SP-018 (all manufactured by Nippon Shokubai Co., Ltd.).

The specific amine compound is also preferably a compound having a heteroaromatic ring. According to this embodiment, an excellent effect can be obtained by adsorption to the pigment surface. The heteroaromatic ring of the specific amine compound may be a single ring or a polycyclic ring. The heteroatoms constituting the ring of the heteroaromatic ring preferably contain at least one type selected from a nitrogen atom, an oxygen atom, and a sulfur atom, and more preferably contain a nitrogen atom. The number of heteroatoms constituting the ring of the heteroaromatic ring is preferably 1 to 4, and more preferably 1 to 3. A specific example of a heteroaromatic ring is a nitrogen-containing aromatic ring such as a pyridine ring.

The composition of the present invention preferably contains 1 to 10 parts by mass of the specific amine compound per 100 parts by mass of the pigment, more preferably 2 to 5 parts by mass, and even more preferably 3 to 4 parts by mass.

The composition of the present invention preferably contains 5 to 200 parts by mass of the specific amine compound per 100 parts by mass of the above-mentioned specific acidic compound, more preferably 10 to 150 parts by mass, and even more preferably 20 to 50 parts by mass.

The content of the specific amine compound in the total solid content of the composition is preferably 1 to 5 mass%. The upper limit is preferably 5 mass% or less, and more preferably 3 mass% or less. The lower limit is preferably 1 mass% or more, and more preferably 1.5 mass% or more.

The composition of the present invention may contain only one specific amine compound, or may contain two or more specific amine compounds. When two or more specific acidic compounds are contained, it is preferable that the total amount of the specific acidic compounds is within the above range.

<<Compound D (specific polymer compound)>>
The composition of the present invention contains a compound D (hereinafter also referred to as a specific polymer compound) having a weight average molecular weight of 2,000 to 30,000 and having at least one structure selected from a polyester structure and a polyether structure, and at least one group selected from an acid group and a basic group.

The weight average molecular weight of the specific polymer compound is preferably 2,000 to 10,000, more preferably 2,000 to 7,000, and even more preferably 2,000 to 4,000.

The acid group contained in the specific polymer compound includes a carboxy group, a phosphate group, a sulfo group, a phenolic hydroxy group, etc., and a carboxy group is preferable. The basic group contained in the specific polymer compound includes an amino group, etc.

The specific polymer compound is preferably a compound having an acid group, since this can further improve storage stability and also effectively suppress the occurrence of development residues.

When the specific polymer compound is a compound having an acid group, the acid value of the specific polymer compound is preferably 5 to 150 mgKOH/g. The upper limit is preferably 150 mgKOH/g or less, and more preferably 80 mgKOH/g or less. The lower limit is preferably 5 mgKOH/g or more, and more preferably 40 mgKOH/g or more.

When the specific polymer compound is a compound having a basic group, the basic group value of the specific polymer compound is preferably 10 to 80 mgKOH/g. The upper limit is preferably 80 mgKOH/g or less, and more preferably 60 mgKOH/g or less. The lower limit is preferably 10 mgKOH/g or more, and more preferably 30 mgKOH/g or more.

The specific polymer compound may have both an acid group and a basic group. In this case, the specific polymer compound preferably has an acid value of 5 to 150 mgKOH/g and a basic group value of 10 to 80 mgKOH/g, more preferably has an acid value of 20 to 100 mgKOH/g and a basic group value of 20 to 70 mgKOH/g, and even more preferably has an acid value of 40 to 80 mgKOH/g and a basic group value of 30 to 60 mgKOH/g.

The specific polymer compound has at least one structure selected from a polyester structure and a polyether structure. The polyester structure may be a structure represented by formula (G-1), (G-2) or (G-3). The polyether structure may be a structure represented by formula (G-4).

In the above formula, ^R and ^R each independently represent an alkylene group.
n1 to n4 each independently represent an integer of 2 or more.

The number of carbon atoms in the alkylene group represented by R ^G1 and R ^G2 is preferably 1 to 20, more preferably 1 to 16, and further preferably 1 to 10. The alkylene group represented by R ^G1 and R ^G2 is preferably linear or branched, and more preferably linear.

n1 to n4 each independently represent an integer of 2 or greater, preferably an integer of 3 or greater, more preferably an integer of 5 or greater, and even more preferably an integer of 8 or greater. The upper limit is preferably 100 or less, more preferably 80 or less, and even more preferably 60 or less.

A preferred embodiment of compound D is a graft resin having a repeating unit with a graft chain containing at least one structure selected from a polyester structure and a polyether structure, and a repeating unit with an acid group or a basic group.

An example of the repeating unit having a graft chain is a repeating unit represented by formula (d1-1).

In formula (d1-1), X ^d1 represents a trivalent linking group, L ^d1 represents a single bond or a divalent linking group, and W ^d1 represents a graft chain containing at least one structure selected from a polyester structure and a polyether structure.

Examples of the trivalent linking group represented by ^Xd1 include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferable, and a poly(meth)acrylic linking group is more preferable.

Examples of the divalent linking group represented by L ^d1 include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), a heterocyclic group, -NH-, -SO-, -SO ₂ -, -CO-, -O-, -COO-, -OCO-, -S-, and a group formed by combining two or more of these.

The graft chain represented by ^Wd1 contains at least one structure selected from a polyester structure and a polyether structure. Examples of the polyester structure and the polyether structure include those described above.

The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. The substituent may be a group represented by formula (W-1).
-L ^w1 -R ^w1 ...(W-1)
In the formula, L ^w1 represents a single bond or a divalent linking group.
R ^w1 represents an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthioether group, an arylthioether group, or a heteroarylthioether group.

Examples of the divalent linking group represented by L ^w1 include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ₂ -, -CO-, -O-, -COO-, -OCO-, -S-, and a group combining two or more of these.

The weight average molecular weight of the repeating unit having a graft chain is preferably 1000 or more, more preferably 1000 to 10000, and even more preferably 1000 to 7500. In this specification, the weight average molecular weight of the repeating unit having a graft chain is a value calculated from the weight average molecular weight of the raw material monomer used in the polymerization of the repeating unit. For example, the repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, a macromonomer means a polymeric compound in which a polymerizable group is introduced at the end of the polymer. When the repeating unit having a graft chain is formed using a macromonomer, the weight average molecular weight of the macromonomer corresponds to the weight average molecular weight of the repeating unit having a graft chain.

The content of the repeating units having the above graft chains is preferably 1 to 90 mol% of the total repeating units of the graft resin. The lower limit is preferably 5 mol% or more, and more preferably 10 mol% or more. The upper limit is preferably 85 mol% or less, and more preferably 80 mol% or less.

The repeating unit having an acid group or a basic group contained in the graft resin includes a repeating unit represented by formula (d2-1).

In formula (d2-1), X ^d2 represents a trivalent linking group, L ^d2 represents a single bond or an (n+1)-valent linking group, W ^d2 represents an acid group or a basic group, and n represents an integer of 1 to 4.

Examples of the trivalent linking group represented by ^Xd2 include a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferable, and a poly(meth)acrylic linking group is more preferable.

Examples of the (n+1) valent linking group represented by L ^d2 include an aliphatic hydrocarbon group (preferably an aliphatic hydrocarbon group having 1 to 12 carbon atoms), an aromatic hydrocarbon group (preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms), a heterocyclic group, -NH-, -SO-, -SO ₂ -, -CO-, -O-, -COO-, -OCO-, -S-, and groups combining two or more of these.

Examples of the acid group and basic group represented by W ^d2 include the above-mentioned acid group and basic group. ^{W d2} is preferably an acid group.

n represents an integer from 1 to 4, preferably 1 or 2.

The content of repeating units having an acid group is preferably 1 to 90 mol% of all repeating units of the graft resin. The lower limit is preferably 5 mol% or more, and more preferably 10 mol% or more. The upper limit is preferably 85 mol% or less, and more preferably 80 mol% or less.

The graft resin may further have a repeating unit having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

The content of repeating units having an ethylenically unsaturated bond-containing group is preferably 1 mol% or more, more preferably 2 mol% or more, and even more preferably 3 mol% or more, of all repeating units of the graft resin. The upper limit can be 90 mol% or less, 80 mol% or less, or 70 mol% or less.

The weight average molecular weight of the graft resin is preferably 3,000 to 50,000. The upper limit is preferably 45,000 or less, and more preferably 40,000 or less. The lower limit is preferably 5,000 or more, and more preferably 8,000 or more.

The specific polymer compound is also preferably a compound represented by formula (1).
In formula (1), ^X1 represents a linking group having a valence of m+n and a molecular weight of 1,000 or less.
Y ¹ represents -O- or -NR ^Y1 -, R ^Y1 represents a hydrogen atom or a substituent;
^Z1 represents a polyether structure or a polyester structure;
R ¹ represents an alkyl group or an aryl group; m and n each independently represent an integer of 1 to 10.

The molecular weight of the m+n valent linking group represented by X ¹ in formula (1) is preferably 50-500, and more preferably 50-250.
Examples of the m+n valent linking group represented by ^X1 include an aromatic ring group, a heterocyclic group, an aliphatic hydrocarbon group, and a group in which two or more of these groups are linked via a single bond or a linking group. Examples of the linking group include -CR ^X1 R ^X2 -, -NH-, -N<, -O-, -CO-, -COO-, -OCO-, -NHCO-, -NHCOO-, -CONH-, -OCONH-, -S-, -SO ₂ -, and -OSO ₂ -, and -CR ^X1 R ^X2 -, -NH-, -N<, -O-, or -SO ₂ - is preferred. ^{R X1} and R ^X2 each independently represent a hydrogen atom or a methyl group.

The number of carbon atoms in the aromatic ring group is preferably 6 to 20, and more preferably 6 to 12. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. The aromatic ring group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a phenyl group, an amide group, a nitro group, and an alkoxy group.

The heterocyclic group may be a non-aromatic heterocyclic group or an aromatic heterocyclic group. The heterocyclic group is preferably a 5-membered or 6-membered ring. Examples of the heteroatoms constituting the heterocyclic group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the heterocyclic group is preferably 1 to 3. The heterocyclic group may be a monocyclic group or a condensed ring. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, a phenyl group, an amide group, a nitro group, and an alkoxy group.

The number of carbon atoms in the aliphatic hydrocarbon group is preferably 2 to 20. Examples of the aliphatic hydrocarbon group include saturated or unsaturated acyclic aliphatic hydrocarbon groups and aliphatic hydrocarbon groups containing a saturated or unsaturated aliphatic ring. The aliphatic ring may be a monocyclic ring or a condensed ring. The aliphatic ring may have a crosslinked structure. The aliphatic hydrocarbon group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, and a phenyl group.

The m+n valent linking group represented by ^X1 is preferably an aromatic ring group, an aliphatic hydrocarbon group, or a group in which two or more of these groups are linked via a single bond or the above-mentioned linking group, and more preferably an aromatic ring group, or a group in which two or more aromatic ring groups are linked via a single bond or the above-mentioned linking group.

In formula (1), Y ¹ represents -O- or -NR ^Y1 -, and R ^Y1 represents a hydrogen atom or a substituent. Examples of the substituent represented by R ^Y1 include an alkyl group and an aryl group, and R Y1 is preferably an alkyl group. R ^Y1 is preferably a hydrogen atom.
In formula (1), Y ¹ is preferably —O— or —NH—, and more preferably —O—.

^Z1 in formula (1) represents a polyether structure or a polyester structure, and is preferably a polyether structure. Examples of the polyether structure and polyester structure include those described above.

The molecular weight of the structure represented by ^Z1 in formula (1) is preferably 300 to 5000. The lower limit is preferably 500 or more, and more preferably 700 or more. The upper limit of the molecular weight is preferably 3500 or less, and more preferably 2500 or less.

^Z1 in formula (1) is preferably a polyalkylene glycol structure having a molecular weight of 300 to 5000. The lower limit of the molecular weight is preferably 500 or more, more preferably 700 or more. The upper limit of the molecular weight is preferably 3500 or less, more preferably 2500 or less.

^Z1 in formula (1) preferably contains a structure selected from formula (Z1-1) and formula (Z1-2), and more preferably contains a structure represented by formula (Z1-1).
In formula (Z1-1), p1 represents an integer of 2 or more, and preferably represents an integer of 2 to 90. The lower limit is preferably an integer of 3 or more, more preferably an integer of 5 or more, and even more preferably an integer of 10 or more. The upper limit is preferably an integer of 60 or less, more preferably an integer of 50 or less, and even more preferably an integer of 40 or less.
In formula (Z2-1), p2 represents an integer of 2 or more, and preferably represents an integer of 2 to 90. The lower limit is preferably an integer of 3 or more, more preferably an integer of 5 or more, and even more preferably an integer of 10 or more. The upper limit is preferably an integer of 60 or less, more preferably an integer of 50 or less, and even more preferably an integer of 40 or less.

A preferred embodiment of ^Z1 in formula (1) is a structure represented by formula (Z1-1).
Another preferred embodiment of ^Z1 in formula (1) is an embodiment containing a structure represented by formula (Z1-1) and a structure represented by formula (Z1-2). In this embodiment, the ratio of the number of repeating units (p1) of the structure represented by formula (Z1-1) to the number of repeating units (p2) of the structure represented by formula (Z1-2) is preferably p1:p2=1:0.05-1.5, more preferably 1:0.1-1.2, and even more preferably 1:0.12-1.0.

R ¹ in formula (1) represents an alkyl group or an aryl group, and is preferably an alkyl group.
The number of carbon atoms in the alkyl group is preferably 1 to 30, more preferably 1 to 20, and further preferably 1 to 15. The alkyl group is preferably linear or branched.
The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, and further preferably 6 to 15 carbon atoms.

In formula (1), m and n each independently represent an integer of 1 to 10.
m is preferably an integer of 1 to 4, more preferably an integer of 1 to 3, and even more preferably 2 or 3.
n is preferably an integer of 1 to 4, more preferably an integer of 1 to 3, and even more preferably 2 or 3.
The lower limit of n+m is 2 or more, preferably 3 or more, and more preferably 4 or more. The upper limit is preferably 10 or less, and more preferably 8 or less. n+m is preferably 6.

The weight average molecular weight of formula (1) is preferably 1,000 to 10,000. The upper limit is preferably 8,000 or less, and more preferably 4,000 or less. The lower limit is preferably 1,500 or more, and more preferably 2,000 or more.

The composition of the present invention preferably contains 10 to 100 parts by mass of the specific polymer compound per 100 parts by mass of the pigment, more preferably 10 to 50 parts by mass, even more preferably 30 to 50 parts by mass, and particularly preferably 30 to 40 parts by mass.

The content of the specific polymer compound in the total solid content of the composition is preferably 5 to 40% by mass. The upper limit is preferably 35% by mass or less, and more preferably 30% by mass or less. The lower limit is preferably 10% by mass or more, and more preferably 15% by mass or more.

The composition of the present invention may contain only one specific polymer compound, or may contain two or more specific polymer compounds. When two or more specific acidic compounds are contained, it is preferable that the total amount of the specific acidic compounds is within the above range.

<<Dye>>
The composition of the present invention may further contain a dye, such as a chromatic dye, a black dye, or an infrared absorbing dye.

There are no particular limitations on the chromatic dye, and any known dye can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes.

Black dyes include bisbenzofuranone dyes, azomethine dyes, perylene dyes, and azo dyes.

Infrared absorbing dyes include pyrrolopyrrole dyes, cyanine dyes, squarylium dyes, phthalocyanine dyes, naphthalocyanine dyes, quaterrylene dyes, merocyanine dyes, croconium dyes, oxonol dyes, iminium dyes, dithiol dyes, triarylmethane dyes, pyrromethene dyes, azomethine dyes, anthraquinone dyes, and dibenzofuranone dyes.

　A dye polymer can also be used as the dye. A dye polymer has two or more dye structures in one molecule, and preferably has three or more dye structures. There is no particular limit to the upper limit, but it can be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight average molecular weight (Mw) of the dye polymer is preferably 2000 to 50000. The lower limit is more preferably 3000 or more, and even more preferably 6000 or more. The upper limit is more preferably 30000 or less, and even more preferably 20000 or less. The dye polymer can also be a compound described in JP2011-213925A, JP2013-041097A, JP2015-028144A, JP2015-030742A, WO2016/031442, etc.

As the chromatic dye or the above-mentioned chromatic pigment, there may be mentioned a triarylmethane dye polymer described in Korean Patent Publication No. 10-2020-0028160, a xanthene compound described in JP 2020-117638 A, a phthalocyanine compound described in WO 2020/174991 A, an isoindoline compound or a salt thereof described in JP 2020-160279 A, a compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, a compound represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, a compound represented by formula 1 described in Korean Patent Publication No. 10-2020-006907 ... Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP-A-2020-180176, phenothiazine compounds described in JP-A-2021-187913, halogenated zinc phthalocyanines described in WO 2022/004261, and halogenated zinc phthalocyanines described in WO 2021/250883 can be used. The other colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, may be used in the rod-shaped structure, or may be used in both structures. Other colorants include quinophthalone compounds represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dyes described in Korean Patent Publication No. 10-2020-0061793, colorants described in JP-A-2022-029701, isoindoline compounds described in WO 2022/014635, aluminum phthalocyanine compounds described in WO 2022/024926, compounds described in JP-A-2022-045895, compounds described in WO 2022/050051, compounds described in JP-A-2020-090676, compounds described in JP-A-2020-055956, Compounds described in JP 2021-031681 A, compounds described in JP 2022-056354 A, compounds described in US Patent Application Publication No. 2021/0355327 A, compounds described in WO 2022/065357 A, compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726 A, compounds described in JP 2018-178039 A, compounds described in Chinese Patent Application Publication No. 113881244 A, compounds described in Chinese Patent Application Publication No. 113881245 A, compounds described in Chinese Patent Application Publication No. 113881246 A, compounds described in JP Compounds described in JP-A-2022-104822, compounds described in JP-A-2022-096701, compounds described in JP-A-2020-023652, green pigments described on pages 80 to 84 of the Journal of the Color Materials Association (published in 2022), compounds described in JP-A-2022-143135, compounds described in JP-A-2022-140287, compounds described in WO 2022/136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP-A-2020-180176, ... Compounds described in JP-A-023-013209, compounds described in JP-A-2023-013166, xanthene compounds described in WO 2023/286526, compounds described in JP-A-2021-155746, compounds described in JP-A-2021-155747, compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018/051876, compounds described in JP-A-2020-083981, compounds described in JP-A-2023-056463, compounds described in JP-T-2023-515473, and the like can also be used.

<<Resin>>
The composition of the present invention may further contain a resin as a material other than the above-mentioned compound D. The resin is blended, for example, for the purpose of dispersing pigments in the composition or for the purpose of a binder. Note that a resin used mainly for dispersing pigments in a composition is also called a dispersant. However, such a use of the resin is only an example, and the resin may be used for purposes other than such a use.

Examples of resins include (meth)acrylic resins, epoxy resins, (meth)acrylamide resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, and siloxane resins. Further, examples of the resin include the resin described in paragraphs 0091 to 0099 of WO 2022/065215, the blocked polyisocyanate resin described in JP 2016-222891 A, the resin described in JP 2020-122052 A, the resin described in JP 2020-111656 A, the resin described in JP 2020-139021 A, the resin described in JP 2017-138503 A containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, and the resin described in paragraphs 0199 to 0199 of JP 2020-186373 A. Resins described in JP-A-0233, alkali-soluble resins described in JP-A-2020-186325, resins represented by formula 1 described in Korean Patent Publication No. 10-2020-0078339, copolymers containing epoxy groups and acid groups described in WO 2022/030445, resins described in JP-A-2018-135514, copolymers described in JP-A-2020-041046, resins described in JP-A-2023-033156, resins described in JP-A-2023-030386, and resins described in JP-A-2023-027753 can also be used.

The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

As the resin, it is preferable to use a resin having an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group.

The acid value of the resin having acid groups is preferably 30 to 500 mgKOH/g. The lower limit is more preferably 40 mgKOH/g or more, and particularly preferably 50 mgKOH/g or more. The upper limit is more preferably 400 mgKOH/g or less, even more preferably 300 mgKOH/g or less, and particularly preferably 200 mgKOH/g or less. The weight average molecular weight (Mw) of the resin having acid groups is preferably 5,000 to 100,000, and more preferably 5,000 to 50,000. The number average molecular weight (Mn) of the resin having acid groups is preferably 1,000 to 20,000.

The resin having an acid group preferably contains a repeating unit having an acid group on the side chain, and more preferably contains 5 to 70 mol% of the repeating units having an acid group on the side chain out of all the repeating units of the resin. The upper limit of the content of repeating units having an acid group on the side chain is preferably 50 mol% or less, and more preferably 30 mol% or less. The lower limit of the content of repeating units having an acid group on the side chain is preferably 10 mol% or more, and more preferably 20 mol% or more.

For the resin having an acid group, the description in paragraphs 0558 to 0571 of JP 2012-208494 A (corresponding paragraphs 0685 to 0700 of the specification of US Patent Application Publication No. 2012/0235099) and the description in paragraphs 0076 to 0099 of JP 2012-198408 A can be referred to, and the contents of these are incorporated herein. In addition, a commercially available product can also be used as the resin having an acid group. In addition, there is no particular restriction on the method of introducing an acid group into the resin, but an example of the method is the method described in Japanese Patent No. 6349629 A. Furthermore, as a method of introducing an acid group into a resin, a method of reacting an acid anhydride with a hydroxyl group generated by a ring-opening reaction of an epoxy group to introduce an acid group can also be used.

As the resin, a resin having a basic group can also be used. The resin having a basic group is preferably a resin containing a repeating unit having a basic group in the side chain, more preferably a copolymer having a repeating unit having a basic group in the side chain and a repeating unit not having a basic group, and even more preferably a block copolymer having a repeating unit having a basic group in the side chain and a repeating unit not having a basic group. The resin having a basic group can also be used as a dispersant. The amine value of the resin having a basic group is preferably 5 to 300 mgKOH/g. The lower limit is preferably 10 mgKOH/g or more, more preferably 20 mgKOH/g or more. The upper limit is preferably 200 mgKOH/g or less, more preferably 100 mgKOH/g or less.

Commercially available resins with basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, BYK-LPN6919 (all manufactured by BYK-Chemie), Solsperse 11200, 13240, 13650, 13940, 24 000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by Lubrizol Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), and the like. In addition, the resin having a basic group may be a block copolymer (B) described in paragraphs 0063 to 0112 of JP 2014-219665 A, a block copolymer A1 described in paragraphs 0046 to 0076 of JP 2018-156021 A, or a vinyl resin having a basic group described in paragraphs 0150 to 0153 of JP 2019-184763 A, the contents of which are incorporated herein by reference.

It is also preferable to use a resin having an acid group and a resin having a basic group. According to this embodiment, the storage stability of the composition can be further improved. When a resin having an acid group and a resin having a basic group are used in combination, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass per 100 parts by mass of the resin having an acid group.

As the resin, it is also preferable to use a resin having an aromatic carboxy group. In a resin having an aromatic carboxy group, the aromatic carboxy group may be included in the main chain of a repeating unit, or may be included in a side chain of the repeating unit. It is preferable that the aromatic carboxy group is included in the main chain of a repeating unit. In this specification, an aromatic carboxy group refers to a group having a structure in which one or more carboxy groups are bonded to an aromatic ring. In an aromatic carboxy group, the number of carboxy groups bonded to an aromatic ring is preferably 1 to 4, and more preferably 1 to 2. Examples of resins having an aromatic carboxy group include the resins described in paragraphs 0082 to 0107 of WO 2021/166858.

The resin used is preferably at least one selected from graft polymers, star polymers, block copolymers, and resins in which at least one end of the polymer chain is blocked with an acid group. Such resins are preferably used as dispersants.

Examples of the graft polymer include resins having repeating units with graft chains. Examples of the graft chain include graft chains containing at least one structure selected from polyester structures, polyether structures, polystyrene structures, and poly(meth)acrylic structures. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkoxy group, and an alkylthioether group. Of these, from the viewpoint of improving the dispersibility of the pigment, a group having a steric repulsion effect is preferred, and an alkyl group or an alkoxy group having 5 to 30 carbon atoms is preferred. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched groups are preferred.

Specific examples of graft polymers include the resins described in paragraphs 0025 to 0094 of JP 2012-255128 A, paragraphs 0022 to 0097 of JP 2009-203462 A, and paragraphs 0102 to 0166 of JP 2012-255128 A. Among the graft polymers, a graft polymer having a weight average molecular weight of 2,000 to 30,000 and having a graft chain containing at least one structure selected from a polyester structure and a polyether structure, and at least one group selected from an acid group and a basic group, is a material that corresponds to the above-mentioned compound D.

Star polymers include resins with a structure in which multiple polymer chains are bonded to a core. Specific examples of star polymers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962A.

The block copolymer is preferably a block copolymer of a block of a polymer having a repeating unit containing an acid group or a basic group (hereinafter also referred to as block A) and a block of a polymer having a repeating unit not containing an acid group or a basic group (hereinafter also referred to as block B). As the block copolymer, block copolymer (B) described in paragraphs 0063 to 0112 of JP 2014-219665 A and block copolymer A1 described in paragraphs 0046 to 0076 of JP 2018-156021 A can also be used, the contents of which are incorporated herein by reference.

The resin in which at least one end of the polymer chain is blocked with an acid group includes a resin having a structure in which at least one end of the polymer chain containing at least one structure selected from a polyester structure, a polyether structure, and a poly(meth)acrylic structure is blocked with an acid group. Examples of the acid group blocking the end of the polymer chain include a carboxy group, a sulfo group, and a phosphate group. Among the resins in which at least one end of the polymer chain is blocked with an acid group, a resin having a structure in which at least one structure selected from a polyester structure and a polyether structure is blocked with an acid group and is a graft polymer having a weight average molecular weight of 2,000 to 30,000 is a material that corresponds to the above-mentioned compound D.

The resin may be used as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. The acidic dispersant (acidic resin) is preferably a resin in which the amount of acid groups is 70 mol% or more when the total amount of the acid groups and the basic groups is 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH/g. The basic dispersant (basic resin) refers to a resin in which the amount of basic groups is greater than the amount of acid groups. The basic dispersant (basic resin) is preferably a resin in which the amount of basic groups is greater than the amount of acid groups when the total amount of the acid groups and the basic groups is 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

Dispersants are also available as commercially available products. Specific examples include the Disperbyk series manufactured by BYK-Chemie (e.g., Disperbyk-111, 161, 2001, etc.), the Solsperse series manufactured by Lubrizol Japan (e.g., Solsperse 20000, 76500, etc.), the Ajisper series manufactured by Ajinomoto Fine-Techno Co., Ltd., A208F (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.), H-3606 (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.), and Sandet ET (manufactured by Sanyo Chemical Industries, Ltd.). In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

The resin content in the total solid content of the composition is preferably 30% by mass or less, more preferably 20% by mass or less, and even more preferably 10% by mass or less.
The total content of the resin and the specific polymer compound in the total solid content of the composition is preferably 10 to 30% by mass. The upper limit is preferably 30% by mass or less, and more preferably 25% by mass or less. The lower limit is preferably 20% by mass or more, and more preferably 15% by mass or more.
The composition of the present invention may contain only one type of resin, or may contain two or more types of resins. When two or more types of resins are contained, it is preferable that the total amount thereof is within the above range.

<<Polymerizable compound>>
The composition of the present invention preferably contains a polymerizable compound. The polymerizable compound may be a compound having an ethylenically unsaturated bond-containing group. The ethylenically unsaturated bond-containing group may be a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group. The polymerizable compound used in the present invention is preferably a radical polymerizable compound.

The molecular weight of the polymerizable compound is preferably 100 to 2500. The upper limit is preferably 2000 or less, and more preferably 1500 or less. The lower limit is preferably 150 or more, and more preferably 250 or more.

The ethylenically unsaturated bond-containing group value (hereinafter referred to as the C=C value) of the polymerizable compound is preferably 2 to 14 mmol/g from the viewpoint of storage stability of the composition. The lower limit is preferably 3 mmol/g or more, more preferably 4 mmol/g or more, and even more preferably 5 mmol/g or more. The upper limit is preferably 12 mmol/g or less, more preferably 10 mmol/g or less, and even more preferably 8 mmol/g or less. The C=C value of the polymerizable compound is a value calculated by dividing the number of ethylenically unsaturated bond-containing groups contained in one molecule of the polymerizable compound by the molecular weight of the polymerizable compound.

The polymerizable compound is preferably a compound containing 3 or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond-containing groups, and even more preferably a compound containing 3 to 6 ethylenically unsaturated bond-containing groups. The polymerizable compound is preferably a 3-15 functional (meth)acrylate compound, and more preferably a 3-6 functional (meth)acrylate compound. Specific examples of the polymerizable compound include the compounds described in paragraphs 0075 to 0083 of WO 2022/065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

Preferred polymerizable compounds include dipentaerythritol tri(meth)acrylate (commercially available product is KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product is KAYARAD D-320; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product is KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products are KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds in which the (meth)acryloyl groups are bonded via ethylene glycol and/or propylene glycol residues (e.g., SR454, SR499, commercially available from Sartomer Corporation). Examples of polymerizable compounds include diglycerol EO (ethylene oxide) modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA, manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), and NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.). Co., Ltd.), DPHA-40H (Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (Kyoeisha Chemical Co., Ltd.), and polymerizable compounds having a dendrimer structure or hyperbranch structure as described in JP-A-2023-043479 can also be used.

The content of the polymerizable compound in the total solid content of the composition is preferably 1 to 35 mass%. The upper limit is preferably 30 mass% or less, more preferably 25 mass% or less, even more preferably 20 mass% or less, and particularly preferably 10 mass% or less. The lower limit is preferably 2 mass% or more, and more preferably 5 mass% or more. The composition of the present invention may contain only one type of polymerizable compound, or may contain two or more types. When two or more types of polymerizable compounds are contained, it is preferable that the total amount thereof is within the above range.

<<Photopolymerization initiator>>
The composition of the present invention preferably contains a photopolymerization initiator. When the composition of the present invention contains a polymerizable compound, the composition of the present invention preferably further contains a photopolymerization initiator. The photopolymerization initiator is not particularly limited and can be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet to visible regions is preferred. The photopolymerization initiator is preferably a photoradical polymerization initiator.

Photopolymerization initiators include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. From the viewpoint of exposure sensitivity, the photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl substituted coumarin compound, more preferably a compound selected from an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, and an acylphosphine compound, and even more preferably an oxime compound. In addition, examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP 2014-130173 A, the compounds described in Japanese Patent No. 6301489 A, and the compounds described in MATERIAL STAGE 37 to 60p, vol. 19, No. 3, 2019, a photopolymerization initiator described in WO 2018/221177, a photopolymerization initiator described in WO 2018/110179, a photopolymerization initiator described in JP 2019-043864 A, a photopolymerization initiator described in JP 2019-044030 A, a peroxide-based initiator described in JP 2019-167313 A, an aminoacetophenone-based initiator having an oxazolidine group described in JP 2020-055992 A, Oxime-based photopolymerization initiators described in JP-A-0459, polymers described in JP-A-2020-172619, compounds represented by formula 1 described in WO 2020/152120, compounds described in JP-A-2021-181406, photopolymerization initiators described in JP-A-2022-013379, compounds represented by formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP-T-2021-507058, Chinese Patent Application Publication No. 1107643 Initiators described in JP-A-2022-518535, initiators described in WO 2021/175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022/075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Korean Patent Publication No. 10-2017-0087330, Examples of the photopolymerization initiator include the compound described in WO 2019/013112, the compound having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062 of WO 2019/013112, the oxime ester-based photopolymerization initiator described in Japanese Patent Publication No. 7219378, the photopolymerization initiator described in Korean Patent Publication No. 10-2021-0146174, the photopolymerization initiator described in WO 2019/013112, and the photopolymerization initiator described in JP 2023-033731.

Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (all manufactured by IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure 2959, Irgacure 127 (all manufactured by BASF), etc. Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

Examples of oxime compounds include the compound described in paragraph 0142 of WO 2022/085485, the compound described in Japanese Patent No. 5,430,746, the compound described in Japanese Patent No. 5,647,738, the compound represented by general formula (1) and the compounds described in paragraphs 0022 to 0024 of JP 2021-173858 A, the compound represented by general formula (1) and the compounds described in paragraphs 0117 to 0120 of JP 2021-170089 A, and the like. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, and Irgacure OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, and TR-PBG-327 (manufactured by TRONLY), and Adeka Optomer N-1919 (manufactured by ADEKA Corporation, photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use a compound that is not colorable or a compound that is highly transparent and does not easily discolor as the oxime compound. Commercially available products include Adeka Arcles NCI-730, NCI-831, and NCI-930 (all manufactured by ADEKA Corporation).

As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxyl group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022/085485 can be used.

As a photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

In formula (OX-1), X ^1a represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocycle;
R ^1a represents a hydrogen atom or an acyl group;
^R2a represents an alkyl group or an aryl group;
R ^3a and R ^4a each independently represent a hydrogen atom or an alkyl group;
Alk ¹ and Alk ² each independently represent an alkyl group;
R ^3a and R ^4a may be bonded to form a ring;
Alk ¹ and Alk ² may be linked to form a ring;
n represents 0 or 1.

Examples of the divalent linking group represented by X ^1a in formula (OX-1) include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded via a single bond or a linking group, a divalent group in which two or more heterocycles are bonded via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocycle are bonded via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings, heterocyclic groups, or aromatic rings and heterocycles include -CH ₂ -, -O-, -CO-, -S-, -NR ^x -, and groups combining these. R ^x represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

X ^1a in formula (OX-1) is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6).
In the formula, R ^X1 to R ^X9 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group or a heterocyclic group.

The number of carbon atoms in the alkyl group represented by R ^X1 to R ^X9 is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the alkenyl group represented by R ^X1 to R ^X9 is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the alkynyl group represented by R ^X1 to R ^X9 is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heterocyclic group.

The number of carbon atoms in the aryl group represented by R ^X1 to R ^X9 is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

The heterocyclic group represented by R ^X1 to R ^X9 is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably an oxygen atom, a nitrogen atom, or a sulfur atom. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

In formula (OX-1), R ^1a represents a hydrogen atom or an acyl group, and is preferably an acyl group.
The acyl group represented by R ^1a is preferably a group represented by —C(O)—R ^101. R ¹⁰¹ represents an aryl group or a heterocyclic group, and is preferably an aryl group.

The number of carbon atoms of the aryl group represented by R ¹⁰¹ is preferably 6 to 20, and more preferably 6 to 12. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The aryl group represented by ^{R 101} is preferably a phenyl group, a methylphenyl group, or a naphthyl group, and more preferably a methylphenyl group or a naphthyl group.

The heterocyclic group represented by R ¹⁰¹ is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heterocyclic group are preferably an oxygen atom, a nitrogen atom, or a sulfur atom. The number of heteroatoms contained in the heterocyclic group is preferably 1 to 3. The heterocyclic group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

R ^2a in formula (OX-1) represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high.
The number of carbon atoms of the alkyl group represented by R ^2a is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. The alkyl group represented by R ^2a is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group.
The number of carbon atoms in the aryl group represented by R ^2a is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

In formula (OX-1), R ^3a and R ^4a each independently represent a hydrogen atom or an alkyl group, and preferably a hydrogen atom.
The number of carbon atoms in the alkyl group represented by R ^3a and R ^4a is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group.
^R3a and ^R4a may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

In formula (OX-1), Alk ¹ and Alk ² each independently represent an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group.
^Alk1 and ^Alk2 may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

In formula (OX-1), n represents 0 or 1, and is preferably 0.

Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP2012-113104A and the compounds described in paragraph 0041 of JP2012-189997A.

As a photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

In formula (OX-2), R ^1b and R ^2b each independently represent a substituent, R ^3b to R ^7b each independently represent a hydrogen atom or a substituent, Ar ^1b represents an aromatic ring group or a heterocyclic group which may have a substituent, and n represents 0 or 1.

Examples of the substituent represented by R ^1b and R ^2b include an alkyl group and an aryl group, and an alkyl group is preferable. The number of carbon atoms of the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The number of carbon atoms of the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.

The substituents represented by R ^3b to R ^7b include a halogen atom, an alkyl group and an aryl group, the alkyl group and the aryl group being as described above.
R ^3b to R ^7b are preferably hydrogen atoms.

Ar ^1b represents an aromatic ring group or a heterocyclic group which may have a substituent, and Ar ^1b is preferably an aromatic ring group which may have a substituent. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferable. Examples of the acyl group include the acyl groups described above.

As a photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

In formula (OX-3), Ar ^1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group;
Ar ^2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group;
R ^1c to R ^3c each independently represent a substituent;
L ^1c represents a single bond or CR ^11c R ^12c , and R ^11c and R ^12c each independently represent a hydrogen atom, an alkyl group, or an aryl group;
X ^1c represents -O- or -S-;
k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

Examples of the substituent represented by R ^1c and R ^2c include an alkyl group and an aryl group, and an alkyl group is preferable. The number of carbon atoms of the alkyl group is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heterocyclic group. The number of carbon atoms of the aryl group is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heterocyclic group.
R ^2c is preferably an alkyl group having a branched or cyclic structure.

Examples of the substituent represented by ^R3c include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, and an acyl group, and an acyl group is preferable. Examples of the acyl group include the acyl groups described above.

Ar ^1c represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

^Ar2c represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

k represents 0 or 1, and is preferably 0.

m represents an integer from 0 to 4, preferably 0 or 1, and more preferably 1.

Specific examples of oxime compounds that are preferably used in the present invention are shown below, but the present invention is not limited to these.

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm. From the viewpoint of sensitivity, the molar absorption coefficient of the oxime compound at a wavelength of 365 nm or 405 nm is preferably high, more preferably 1000 to 300,000, even more preferably 2000 to 300,000, and particularly preferably 5000 to 200,000. The molar absorption coefficient of the compound can be measured using a known method. For example, it is preferable to measure using a spectrophotometer (Varian Cary-5 spectrophotometer) at a concentration of 0.01 g/L using ethyl acetate as a solvent.

As a photopolymerization initiator, it is also preferable to use a combination of Irgacure OXE01 (manufactured by BASF) and/or Irgacure OXE02 (manufactured by BASF) and Omnirad 2959 (manufactured by IGM Resins B.V.).

As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used. By using such a photoradical polymerization initiator, two or more radicals are generated from one molecule of the photoradical polymerization initiator, so good sensitivity can be obtained. In addition, when a compound with an asymmetric structure is used, crystallinity is reduced and solubility in solvents is improved, making it less likely to precipitate over time, and the storage stability of the coloring composition can be improved. Specific examples of bifunctional or trifunctional or higher functional photoradical polymerization initiators include the compounds described in paragraph 0148 of WO 2022/065215.

The content of the photopolymerization initiator in the total solid content of the composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more, and even more preferably 1.5% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. In the composition of the present invention, only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

<<Solvent>>
The composition of the present invention preferably contains a solvent. Examples of the solvent include organic solvents. The type of solvent is not particularly limited as long as the solubility of each component and the coatability of the composition are satisfied. Examples of the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details of these, refer to paragraph 0223 of International Publication No. 2015/166779, the contents of which are incorporated herein by reference. In addition, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether, propylene glycol Examples of the ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol and 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol. However, there are cases where it is better to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons, etc. (for example, the amount can be 50 ppm (parts per million) by mass or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, organic solvents at the ppt (parts per trillion) by mass level may be used, and such organic solvents are provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The filter used for filtration preferably has a pore size of 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

The organic solvent may contain isomers (compounds with the same number of atoms but different structures). In addition, the organic solvent may contain only one type of isomer, or multiple types of isomers.

The peroxide content in the organic solvent is preferably 0.8 mmol/L or less, and more preferably substantially free of peroxide.

The content of the solvent in the composition is preferably 10 to 95% by mass, more preferably 20 to 90% by mass, and even more preferably 30 to 90% by mass.

From the viewpoint of environmental regulations, it is preferable that the composition of the present invention is substantially free of environmentally regulated substances. In the present invention, substantially free of environmentally regulated substances means that the content of environmentally regulated substances in the composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, more preferably 10 ppm by mass or less, and particularly preferably 1 ppm by mass or less. Examples of environmentally regulated substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These substances are registered as environmentally regulated substances under the REACH (Registration Evaluation Authorization and Restriction of Chemicals) regulations, the PRTR (Pollutant Release and Transfer Register) Act, the VOC (Volatile Organic Compounds) regulations, etc., and their usage and handling methods are strictly regulated. These compounds may be used as solvents when producing each component used in the composition, and may be mixed into the composition as a residual solvent. From the viewpoint of human safety and environmental consideration, it is preferable to reduce these substances as much as possible. As a method for reducing environmentally regulated substances, a method of reducing them by heating or reducing pressure in the system to a temperature above the boiling point of the environmentally regulated substance and distilling off the environmentally regulated substance from the system can be mentioned. In addition, when distilling off a small amount of environmentally regulated substances, it is useful to perform azeotropy with a solvent having a boiling point equivalent to that of the solvent in question in order to increase efficiency. In addition, when a radically polymerizable compound is contained, a polymerization inhibitor or the like may be added and then distilled off under reduced pressure in order to prevent crosslinking between molecules caused by the radical polymerization reaction during distillation under reduced pressure. These distillation methods can be used at any stage, such as the stage of the raw materials, the stage of the product obtained by reacting the raw materials (for example, a resin solution or a polyfunctional monomer solution after polymerization), or the stage of a composition prepared by mixing these compounds.

<<Compound Having Cyclic Ether Group>>
The composition of the present invention may contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. The epoxy group may be an alicyclic epoxy group. The alicyclic epoxy group means a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are condensed. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of the epoxy compound include compounds having one or more epoxy groups in one molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups in one molecule. The upper limit of the epoxy groups contained in the epoxy compound can be, for example, 10 or less, or 5 or less. The lower limit of the epoxy groups contained in the epoxy compound is preferably 2 or more. As the epoxy compound, the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, paragraphs 0147 to 0156 of JP-A-2014-043556, and paragraphs 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172 can also be used.

The compound having a cyclic ether group may be a low molecular weight compound (e.g., a molecular weight of less than 2000, or even less than 1000) or a high molecular weight compound (macromolecule) (e.g., a molecular weight of 1000 or more, or in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the weight average molecular weight is more preferably 10,000 or less, particularly preferably 5,000 or less, and even more preferably 3,000 or less.

Commercially available compounds having a cyclic ether group include, for example, EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers). In addition, the compounds described in the examples below can also be used as compounds having a cyclic ether group.

The content of the compound having a cyclic ether group in the total solid content of the composition is preferably 0.1 to 20 mass%. The lower limit is, for example, more preferably 0.5 mass% or more, and even more preferably 1 mass% or more. The upper limit is, for example, more preferably 15 mass% or less, and even more preferably 10 mass% or less. Only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

<<Curing accelerator>>
The composition of the present invention may contain a curing accelerator. Examples of the curing accelerator include a thiol compound, a methylol compound, an amine compound, a phosphonium salt compound, an amidine salt compound, an amide compound, a base generator, an isocyanate compound, an alkoxysilane compound, and an onium salt compound. Specific examples of the curing accelerator include the compound described in paragraph 0164 of International Publication No. 2022/085485 and the compound described in JP-A-2021-181406. The content of the curing accelerator in the total solid content of the composition is preferably 0.3 to 8.9% by mass, more preferably 0.8 to 6.4% by mass.

<<Ultraviolet absorbing agent>>
The composition of the present invention may contain an ultraviolet absorber. Examples of ultraviolet absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Specific examples of such compounds include the compounds described in paragraph 0179 of International Publication No. 2022/085485, the reactive triazine ultraviolet absorbers described in JP-A-2021-178918, the ultraviolet absorbers described in JP-A-2022-007884, the compounds described in Korean Patent Publication No. 10-2022-0014454, and the compounds described in JP-A-2023-013321. The content of the ultraviolet absorber in the total solid content of the composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. In the present invention, only one type of ultraviolet absorber may be used, or two or more types may be used. When two or more types are used, the total amount is preferably within the above range.

<<Polymerization inhibitor>>
The composition of the present invention may contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.). Among these, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solid content of the composition is preferably 0.0001 to 5% by mass. The polymerization inhibitor may be of only one type or of two or more types. In the case of two or more types, the total amount is preferably within the above range.

<<Silane coupling agents>>
The composition of the present invention may contain a silane coupling agent. Examples of the silane coupling agent include silane compounds having a hydrolyzable group, and it is preferable that the silane coupling agent is a silane compound having a hydrolyzable group and other functional groups. The hydrolyzable group refers to a substituent that is directly bonded to a silicon atom and can generate a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. In addition, examples of functional groups other than the hydrolyzable group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, and an amino group, a (meth)acryloyl group, and an epoxy group are preferable. Specific examples of the silane coupling agent include the compounds described in paragraph 0177 of International Publication No. 2022/085485 and the compounds described in JP-A-2019-183020. The content of the silane coupling agent in the total solid content of the composition is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass. The silane coupling agent may be one type or two or more types. In the case of two or more types, it is preferable that the total amount is within the above range.

<<Surfactants>>
The composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as fluorine-based surfactants, nonionic surfactants, cationic surfactants, anionic surfactants, and silicone-based surfactants can be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant, and more preferably a silicone-based surfactant. For the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015/166779, the contents of which are incorporated herein by reference.

As fluorosurfactants, the compounds described in paragraphs 0167 to 0173 of WO 2022/085485 can be used.

Nonionic surfactants include the compounds described in paragraph 0174 of WO 2022/085485.

Silicone surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials, Inc.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie), etc. As the silicone surfactant, a compound having the following structure can also be used.

The content of the surfactant in the total solid content of the composition is preferably 0.001% by mass to 5.0% by mass, and more preferably 0.005% by mass to 3.0% by mass. There may be only one type of surfactant, or two or more types. When there are two or more types, it is preferable that the total amount is within the above range.

<<Antioxidants>>
The composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenolic compounds, phosphite compounds, and thioether compounds. As the phenolic compound, any phenolic compound known as a phenolic antioxidant may be used. As a preferred phenolic compound, a hindered phenolic compound may be used. A compound having a substituent at the site (ortho position) adjacent to the phenolic hydroxyl group is preferred. As the aforementioned substituent, a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferred. In addition, as the antioxidant, a compound having a phenolic group and a phosphite group in the same molecule is also preferred. In addition, as the antioxidant, a phosphorus-based antioxidant may also be suitably used. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, and ethylbis(2,4-di-tert-butyl-6-methylphenyl)phosphite. Commercially available antioxidants include, for example, Adeka STAB AO-20, Adeka STAB AO-30, Adeka STAB AO-40, Adeka STAB AO-50, Adeka STAB AO-50F, Adeka STAB AO-60, Adeka STAB AO-60G, Adeka STAB AO-80, and Adeka STAB AO-330 (manufactured by ADEKA Corporation). In addition, the antioxidant may be a compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, a compound described in International Publication No. WO 2017/006600, a compound described in International Publication No. WO 2017/164024, or a compound described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the composition is preferably 0.01 to 20 mass%, more preferably 0.3 to 15 mass%. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is in the above range.

<<Other ingredients>>
The composition of the present invention may contain, as necessary, a sensitizer, a plasticizer, and other auxiliary agents (e.g., conductive particles, fillers, defoamers, flame retardants, leveling agents, peeling promoters, fragrances, surface tension regulators, chain transfer agents, etc.). By appropriately incorporating these components, properties such as film properties can be adjusted. As these components, the compounds described in paragraph 0182 of WO 2022/085485 can be used. In addition, as the chain transfer agent, a thiol compound described in JP 2020-109068 A can be used.

The composition of the present invention may contain a metal oxide in order to adjust the refractive index of the resulting film. Examples of the metal oxide include TiO ₂ , ZrO ₂ , Al ₂ O ₃ , and SiO ₂ . The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and even more preferably 5 to 50 nm. The metal oxide may have a core-shell structure. In this case, the core may be hollow.

The composition of the present invention may contain a light resistance improver. Examples of light resistance improvers include the compounds described in paragraph 0183 of WO 2022/085485.

It is also preferred that the composition of the present invention is substantially free of terephthalic acid esters. Here, "substantially free" means that the content of terephthalic acid esters in the total amount of the composition is 1000 ppb by mass or less, more preferably 100 ppb by mass or less, and particularly preferably zero.

In view of environmental regulations, it is preferable that the composition of the present invention has a melamine content of 10,000 ppm by mass or less.

The composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing free metals and halogens in the composition include washing with ion-exchanged water, filtration, ultrafiltration, and purification with ion-exchange resins.

From the viewpoint of environmental regulations, the use of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts may be restricted. When the content of the above-mentioned compounds is reduced in the composition of the present invention, the content of perfluoroalkylsulfonic acid (particularly perfluoroalkylsulfonic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts, and perfluoroalkylcarboxylic acid (particularly perfluoroalkylcarboxylic acid having 6 to 8 carbon atoms in the perfluoroalkyl group) and its salts is preferably in the range of 0.01 ppb to 1,000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, based on the total solid content of the composition. The composition of the present invention may be substantially free of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts. For example, a composition that is substantially free of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts may be selected by using a compound that can be a substitute for perfluoroalkylsulfonic acid and its salts, and a compound that can be a substitute for perfluoroalkylcarboxylic acid and its salts. Examples of compounds that can be a substitute for regulated compounds include compounds that are excluded from regulation due to the difference in the number of carbon atoms in the perfluoroalkyl group. However, the above content does not prevent the use of perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts. The composition of the present invention may contain perfluoroalkylsulfonic acid and its salts, and perfluoroalkylcarboxylic acid and its salts, within the maximum allowable range.

The use of fluorine-containing compounds may be restricted from the perspective of environmental regulations. When the content of fluorine-containing compounds in the composition is reduced, the content of fluorine-containing compounds in the composition is preferably 5% by mass or less, more preferably 1% by mass or less, and even more preferably 0.1% by mass or less. The composition may be substantially free of fluorine-containing compounds.

The moisture content of the composition of the present invention is usually 3% by mass or less, preferably 0.01 to 1.5% by mass, and more preferably in the range of 0.1 to 1.0% by mass. The moisture content can be measured by the Karl Fischer method.

The composition of the present invention can be used by adjusting the viscosity for the purpose of adjusting the film surface state (flatness, etc.) and film thickness. The viscosity value can be selected appropriately as needed, but for example, it is preferably 0.3 mPa·s to 50 mPa·s at 25°C, and more preferably 0.5 mPa·s to 20 mPa·s. The viscosity can be measured, for example, using a cone-plate type viscometer with the temperature adjusted to 25°C.

<<Storage container>>
The container for storing the composition is not particularly limited, and a known container can be used. In addition, the container described in paragraph 0187 of WO 2022/085485 can be used as the container.

<Method of preparing the composition>
The composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the composition, all the components may be simultaneously dissolved and/or dispersed in a solvent to prepare the composition, or, if necessary, each component may be appropriately prepared as two or more solutions or dispersions, which are then mixed at the time of use (application) to prepare the composition.

In addition, it is preferable that the preparation of the composition includes a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high-speed impellers, sand grinders, flow jet mixers, high-pressure wet atomization, and ultrasonic dispersion. In addition, when grinding the pigment in a sand mill (bead mill), it is preferable to use beads with a small diameter and increase the bead packing rate, thereby increasing the grinding efficiency. In addition, it is preferable to remove coarse particles by filtration, centrifugation, or the like after the grinding process. In addition, the process and dispersing machine for dispersing the pigment may be suitably used as described in "Dispersion Technology Encyclopedia, published by Information Technology Co., Ltd., July 15, 2005" or "Dispersion Technology and Industrial Application Practice Focused on Suspension (Solid/Liquid Dispersion System) - Comprehensive Data Collection, published by Management Development Center Publishing Department, October 10, 1978", and in paragraph number 0022 of JP 2015-157893 A. In addition, in the process for dispersing the pigment, a salt milling process may be performed to refine the particles. For the materials, equipment, processing conditions, etc. used in the salt milling process, the descriptions in, for example, JP 2015-194521 A and JP 2012-046629 A may be referred to. Examples of materials for the beads used for dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of inorganic compounds with a Mohs hardness of 2 or more. The composition may contain 1 to 10,000 ppm of the above beads.

When preparing the composition, it is preferable to filter the composition with a filter for the purpose of removing foreign matter and reducing defects. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022/085485.

<Membrane>
The film of the present invention is obtained from the composition of the present invention described above. The film of the present invention can be used for optical filters such as color filters, infrared transmission filters, and infrared cut filters.

The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. For example, the thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the film thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

When the film of the present invention is used as a color filter, the film of the present invention preferably has a green, red, blue, cyan, magenta or yellow hue, and more preferably has a green or red hue. The film of the present invention can also be preferably used as a colored pixel of a color filter. Examples of colored pixels include red pixels, green pixels, blue pixels, magenta pixels, cyan pixels, and yellow pixels, and green or red pixels are preferred.

<Membrane manufacturing method>
Next, a method for producing the film of the present invention will be described. The film of the present invention can be produced through a step of applying the composition of the present invention. The film production method preferably further includes a step of forming a pattern (pixel). Examples of the method for forming the pattern (pixel) include a photolithography method and a dry etching method, and the photolithography method is preferred. By forming a pattern by the photolithography method using the composition of the present invention, the generation of development residues can be further suppressed.

Pattern formation by photolithography preferably includes a step of forming a composition layer on a support using the composition of the present invention, a step of exposing the composition layer to light in a pattern, and a step of developing and removing the unexposed parts of the composition layer to form a pattern (pixels). If necessary, a step of baking the composition layer (pre-bake step) and a step of baking the developed pattern (pixels) (post-bake step) may be provided.

In the step of forming the composition layer, the composition layer is formed on a support using the composition of the present invention. The support is not particularly limited and can be appropriately selected depending on the application. For example, a glass substrate, a silicon substrate, etc. can be mentioned, and a silicon substrate is preferable. A charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, etc. may be formed on the silicon substrate. A black matrix that isolates each pixel may be formed on the silicon substrate. A base layer may be provided on the silicon substrate to improve adhesion with the upper layer, prevent diffusion of substances, or flatten the substrate surface. The surface contact angle of the base layer is preferably 20 to 70° when measured with diiodomethane. It is also preferable that the surface contact angle is 30 to 80° when measured with water.

　A known method can be used as a method for applying the composition. For example, a dropping method (drop casting); a slit coating method; a spray method; a roll coating method; a rotary coating method (spin coating); a casting coating method; a slit and spin method; a pre-wetting method (for example, a method described in JP 2009-145395 A); various printing methods such as ejection printing such as inkjet (for example, on-demand method, piezo method, thermal method), nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, and metal mask printing; a transfer method using a mold, etc.; a nanoimprint method, etc. can also be used. In addition, the application method described in paragraph 0207 of WO 2022/085485 A can also be used.

The composition layer formed on the support may be dried (prebaked). When a film is produced by a low-temperature process, prebaking may not be performed. When prebaking is performed, the prebaking temperature is preferably 150°C or less, more preferably 120°C or less, and even more preferably 110°C or less. The lower limit can be, for example, 50°C or more, and can also be 80°C or more. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and even more preferably 80 to 220 seconds. Prebaking can be performed using a hot plate, an oven, etc.

Next, the composition layer is exposed to light in a pattern (exposure step). For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine or a scanner exposure machine through a mask having a predetermined mask pattern. This allows the exposed parts to harden.

Radiation (light) that can be used for exposure includes g-line and i-line. Light with a wavelength of 300 nm or less (preferably light with a wavelength of 180 to 300 nm) can also be used. Examples of light with a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Long-wavelength light sources of 300 nm or more can also be used.

In addition, during exposure, light may be applied continuously or in pulses (pulse exposure). Pulse exposure is an exposure method in which light is applied and paused repeatedly in short cycles (e.g., milliseconds or less).

The irradiation amount (exposure amount) is, for example, preferably 0.03 to 2.5 J/cm ² , more preferably 0.05 to 1.0 J/cm ^2. The oxygen concentration during exposure can be appropriately selected, and in addition to being performed under air, for example, exposure may be performed under a low-oxygen atmosphere with an oxygen concentration of 19 volume% or less (e.g., 15 volume%, 5 volume%, or substantially oxygen-free), or exposure may be performed under a high-oxygen atmosphere with an oxygen concentration of more than 21 volume% (e.g., 22 volume%, 30 volume%, or 50 volume%). The exposure illuminance can be appropriately set, and can usually be selected from the range of 1000 W/m ² to 100,000 W/m ² (e.g., 5,000 W/m ² , 15,000 W/m ² , or 35,000 W/m ² ). The oxygen concentration and exposure illuminance may be appropriately combined. For example, the oxygen concentration can be 10% by volume and the illuminance can be 10,000 W/m ² , and the oxygen concentration can be 35% by volume and the illuminance can be 20,000 W/m ² .

Next, the unexposed parts of the composition layer are developed and removed to form a pattern (pixels). The unexposed parts of the composition layer can be developed and removed using a developer. As a result, the composition layer in the unexposed parts during the exposure process dissolves into the developer, leaving only the photocured parts. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In order to improve residue removal, the process of shaking off the developer every 60 seconds and then supplying new developer may be repeated several times.

The developer may be an organic solvent or an alkaline developer, with an alkaline developer being preferred. The developer and the washing (rinsing) method after development may be as described in paragraph 0214 of WO 2022/085485.

After development and drying, it is preferable to perform additional exposure processing or heating processing (post-baking). Additional exposure processing and post-baking are curing processing after development to complete curing. The heating temperature in post-baking is, for example, preferably 100 to 300°C, more preferably 200 to 270°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, a convection oven (hot air circulation dryer), or a high-frequency heater to achieve the above conditions for the developed film. When additional exposure processing is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. In addition, additional exposure processing may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

The pattern formation by the dry etching method preferably includes the steps of forming a composition layer on a support using the composition of the present invention, curing the entire composition layer to form a cured layer, forming a photoresist layer on the cured layer, exposing the photoresist layer in a pattern and developing it to form a resist pattern, and dry etching the cured layer using an etching gas with the resist pattern as a mask. In forming the photoresist layer, it is preferable to further perform a pre-bake treatment. In particular, the process of forming the photoresist layer is preferably a form in which a heat treatment after exposure and a heat treatment after development (post-bake treatment) are performed. For the pattern formation by the dry etching method, the description in paragraphs 0010 to 0067 of JP 2013-064993 A can be referred to, and the contents of this specification are incorporated herein.

<Optical filter>
The optical filter of the present invention has the above-mentioned film of the present invention. The types of optical filters include color filters, infrared cut filters, and infrared transmission filters, and are preferably color filters. The color filter preferably has the film of the present invention as its pixel, more preferably has the film of the present invention as its color pixel, and even more preferably has the film of the present invention as its red pixel.

The optical filter may have a protective layer on the surface of the film of the present invention. By providing a protective layer, various functions such as oxygen blocking, low reflection, hydrophilicity/hydrophobicity, and shielding of light of a specific wavelength (ultraviolet rays, infrared rays, etc.) can be imparted. The thickness of the protective layer is preferably 0.01 to 10 μm, more preferably 0.1 to 5 μm. Methods for forming the protective layer include a method of forming the protective layer by applying a resin composition for forming the protective layer, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive. The components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluorine resin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al ₂ O ₃ , Mo, SiO ₂ , and Si ₂ N ₄ , and may contain two or more of these components. For example, in the case of a protective layer intended for oxygen blocking, the protective layer preferably contains a polyol resin, SiO ₂ , and Si ₂ N _4. In addition, in the case of a protective layer intended for low reflection, the protective layer preferably contains a (meth)acrylic resin and a fluorine resin.

When forming a protective layer by applying a resin composition, known methods such as spin coating, casting, screen printing, and inkjet can be used as a method for applying the resin composition. Known organic solvents (e.g., propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.) can be used as the organic solvent contained in the resin composition. When forming the protective layer by chemical vapor deposition, known chemical vapor deposition methods (thermal chemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used as the chemical vapor deposition method.

The protective layer may contain additives such as organic or inorganic fine particles, absorbents for light of specific wavelengths (e.g., ultraviolet light, infrared light, etc.), refractive index adjusters, antioxidants, adhesion agents, and surfactants, as necessary. Examples of organic or inorganic fine particles include polymer fine particles (e.g., silicone resin fine particles, polystyrene fine particles, melamine resin fine particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known absorbents can be used as absorbents for light of specific wavelengths. The content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, and more preferably 1 to 60% by mass, based on the total mass of the protective layer.

The protective layer may be the one described in paragraphs 0073 to 0092 of JP2017-151176A.

The optical filter may have a structure in which each pixel is embedded in a space partitioned by partitions, for example in a grid pattern.

<Solid-state imaging element>
The solid-state imaging device of the present invention has the above-mentioned film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device, and examples thereof include the following configurations.

The substrate has a plurality of photodiodes constituting the light receiving area of a solid-state imaging element (such as a CCD (charge-coupled device) image sensor or a CMOS (complementary metal-oxide semiconductor) image sensor) and a transfer electrode made of polysilicon or the like, a light-shielding film that opens only the light receiving portion of the photodiode on the photodiode and the transfer electrode, a device protection film made of silicon nitride or the like formed on the light-shielding film so as to cover the entire light-shielding film and the light receiving portion of the photodiode, and a color filter on the device protection film. Furthermore, the device protection film may have a light-collecting means (e.g., a microlens, etc.; the same applies below) on the device protection film and below the color filter (the side closer to the substrate), or a light-collecting means on the color filter. The color filter may have a structure in which each colored pixel is embedded in a space partitioned by partitions, for example in a lattice shape. In this case, it is preferable that the partitions have a lower refractive index than each colored pixel. Examples of imaging devices having such a structure include those described in JP 2012-227478 A, JP 2014-179577 A, and WO 2018/043654 A. In addition, as shown in JP 2019-211559 A, an ultraviolet absorbing layer may be provided in the structure of the solid-state imaging element to improve light resistance. The imaging device equipped with the solid-state imaging element of the present invention can be used for digital cameras, electronic devices with imaging functions (such as mobile phones), as well as in-vehicle cameras and surveillance cameras.

<Image display device>
The image display device of the present invention has the above-mentioned film of the present invention. Examples of the image display device include liquid crystal display devices and organic electroluminescence display devices. The definition of the image display device and details of each image display device are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Junsho Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). The liquid crystal display device is described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There is no particular limitation on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above "Next Generation Liquid Crystal Display Technology".

The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, processing contents, processing procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In addition, in the structural formula shown below, iPr represents an isopropyl group.

<Preparation of Dispersion>
(Formulation 1)
A mixture of 15 parts by mass of pigment and derivative 1 in total calculated as solid content, 0.5 parts by mass of derivative 2 in solid content, 4.5 parts by mass of dispersant in solid content, and 80 parts by mass of solvent was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.1 mm diameter). Next, a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Japan BEE Co., Ltd.) equipped with a pressure reducing mechanism under conditions of a pressure of 2000 kg/ ^cm2 and a flow rate of 500 g/min. This dispersion treatment was repeated a total of 10 times to obtain a dispersion. The pigment, derivative, dispersant, and solvent used were the materials shown in the table below.

(Formulation 2)
A mixture of 15 parts by mass of pigment and derivative 1 in total calculated as solid content, 0.3 parts by mass of derivative 2 in solid content, 4.7 parts by mass of dispersant in solid content, and 80 parts by mass of solvent was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.1 mm diameter). Next, a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Japan BEE Co., Ltd.) equipped with a pressure reducing mechanism under conditions of a pressure of 2000 kg/ ^cm2 and a flow rate of 500 g/min. This dispersion treatment was repeated a total of 10 times to obtain a dispersion. The pigment, derivative, dispersant, and solvent used were the materials shown in the table below.

(Formulation 3)
A mixture of 15 parts by mass of pigment and derivative 1 in total calculated as solid content, 1.2 parts by mass of derivative 2 in solid content, 3.8 parts by mass of dispersant in solid content, and 80 parts by mass of solvent was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.1 mm diameter). Next, a dispersion treatment was performed using a high-pressure disperser NANO-3000-10 (manufactured by Japan BEE Co., Ltd.) equipped with a pressure reducing mechanism under conditions of a pressure of 2000 kg/ ^cm2 and a flow rate of 500 g/min. This dispersion treatment was repeated a total of 10 times to obtain a dispersion. The pigment, derivative, dispersant, and solvent used were the materials shown in the table below.

Details of the materials listed with the abbreviations in the table above are as follows:
(Pigment)
P-1: C.I. Pigment Green 36 (phthalocyanine compound, green pigment)
P-2: C.I. Pigment Green 58 (phthalocyanine compound, green pigment)
P-3: C.I. Pigment Yellow 139 (isoindoline compound, yellow pigment)
P-4: C.I. Pigment Yellow 150 (azo compound, yellow pigment)
P-5: C.I. Pigment Yellow 185 (isoindoline compound, yellow pigment)
P-6: C.I. Pigment Red 254 (diketopyrrolopyrrole compound, red pigment)
P-7: C.I. Pigment Red 272 (diketopyrrolopyrrole compound, red pigment)
P-8: C.I. Pigment Blue 15:6 (phthalocyanine compound, blue pigment)
P-9: C.I. Pigment Violet 23 (dioxazine compound, purple pigment)
P-10: Compound having the following structure
P-11: C.I. Pigment Yellow 129 (azomethine compound, yellow pigment)

(Derivatives)
Syn-A1: Compound having the following structure (compound having a dye structure and an acid group, molecular weight 750)
Syn-A2: Compound having the following structure (compound having a dye structure and an acid group, molecular weight 363)
Syn-A3: Compound having the following structure (compound having a dye structure and an acid group, molecular weight 650)
Syn-A4: Compound having the following structure (compound having a dye structure and an acid group, molecular weight 432)
Syn-A5: Compound having the following structure (compound having a dye structure and an acid group, molecular weight 2000)
Syn-B1: Compound having the following structure (compound having three amino groups, molecular weight of 146, amine value of 1145.7 mg KOH/g)
Syn-B2: Compound having the following structure (compound having four amino groups, molecular weight 178, amine value 1261.3 mgKOH/g)
Syn-B3: Compound having the following structure (compound having five amino groups, molecular weight of 189, amine value of 1075 mg KOH/g)
Syn-B4: Epomin SP-003 (manufactured by Nippon Shokubai Co., Ltd., a compound having two or more amino groups, polyethyleneimine, molecular weight 300, amine value 934.7 mg KOH/g, solid content concentration 30 mass propylene glycol monomethyl ether solution)
Syn-B5: Epomin SP-006 (manufactured by Nippon Shokubai Co., Ltd., a compound having two or more amino groups, polyethyleneimine, molecular weight 600, amine value 903.8 mg KOH/g, solid content concentration 30 mass propylene glycol monomethyl ether solution)
Syn-B6: Epomin SP-012 (manufactured by Nippon Shokubai Co., Ltd., a compound having two or more amino groups, polyethyleneimine, molecular weight 1200, amine value 894.7 mg KOH/g, solid content concentration 30 mass propylene glycol monomethyl ether solution)

(Dispersant)
D-1: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight of 21085, acid value of 74.7 mgKOH/g)
D-2: Resin having the following structure (the number attached to the main chain is in moles, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight of 25764, and acid value of 48.7 mgKOH/g)
D-3: Compound having the following structure (the numerical value added to the repeating unit is the number of repeating units. Compound having a polyether structure and an acid group, weight average molecular weight of 2613, acid value of 74.7 mgKOH/g)
D-5: Basic graft polymer (a resin synthesized by the method described in Synthesis Example 9 of Japanese Patent No. 5953380 (living radical polymerization of macromonomer/dimethylaminoethyl methacrylate/methyl methacrylate, which is a reaction product of polyethylene glycol monopropylene glycol monomethyl ether monoamine (molecular weight 2000) and isocyanatoethyl methacrylate (weight average molecular weight 155.15, manufactured by Showa Denko K.K., product name Karenz MOI)), a resin having a polyether structure and a basic group, weight average molecular weight 24200, number average molecular weight 17300, amine value 40.0 mgKOH/g)

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)

<Production of Composition>
Each material was mixed in the ratio of formulations 1 to 20 shown below, and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to produce each composition. Note that in Examples 80, 81, and 94 in which additives were blended, 0.1 parts by mass of the additives shown in the table below were further blended.

Details of the materials indicated by the abbreviations in the table showing the formulation of the above composition are as follows:

(Dispersion)
Dispersions 1 to 70, C1 to C5: Dispersions 1 to 70, C1 to C5 described above

(Monomer (polymerizable compound))
M-1: A mixture of compounds having the following structure (a mixture of the compound on the left (a hexafunctional (meth)acrylate compound) and the compound on the right (a pentafunctional (meth)acrylate compound) in a molar ratio of 7:3)
M-2: Compound having the following structure
M-3: Compound having the following structure

(Photopolymerization initiator)
I-1: Compound having the following structure
I-2: Compound having the following structure
I-3: Compound having the following structure

(binder)
B-1: 30% by mass PGMEA solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight of 18,300, acid value of 61.8 mgKOH/g)
B-2: 30% by mass PGMEA solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight 19143, acid value 94.7 mgKOH/g)
B-3: 30% by mass PGMEA solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight of 20,000, acid value of 70.1 mgKOH/g)
B-4: 20% by mass PGMEA solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight 10424, acid value 44.3 mgKOH/g, amine value 40.0 mgKOH/g)
B-5: 20% by mass solution of a resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Resin having a polyester structure and an acid group, weight average molecular weight 20903, acid value 36.0 mgKOH/g, amine value 47.0 mgKOH/g) (solvent: PGMEA:PGME) = 9:1 mixture)
B-6: 30% by mass PGMEA solution of a resin having the following structure (the numerical values added to the main chain are molar ratios; weight average molecular weight 12073, acid value 195.4 mgKOH/g)

(Surfactant)
Su-1: Compound having the following structure

(Polymerization inhibitor)
In-1: a compound having the following structure

(Additives)
C-1: Compound having the following structure
C-2: Compound having the following structure

(solvent)
S-1: Propylene glycol monomethyl ether acetate (PGMEA)
S-2: Propylene glycol monomethyl ether (PGME)
S-3: Cyclopentanone

<Evaluation>
(Storage stability)
The viscosity (mPa·s) of the composition immediately after production was measured using "RE-85L" manufactured by Toki Sangyo Co., Ltd. After the above measurement, the composition was left to stand at 45°C, protected from light, for 3 days, and the viscosity (mPa·s) was measured again. The storage stability was evaluated according to the following evaluation criteria from the viscosity difference (ΔVis) before and after the above standing. It can be said that the smaller the viscosity difference (ΔVis) value, the better the storage stability of the composition. The above viscosity measurements were all performed in a laboratory where the temperature and humidity were controlled to 22±5°C and 60±20%, and the temperature of the composition was adjusted to 25°C.
-Evaluation criteria-
4: ΔVis was 0.2 mPa·s or less. 3: ΔVis was greater than 0.2 mPa·s and less than 0.3 mPa·s. 2: ΔVis was greater than 0.3 mPa·s and less than 0.5 mPa·s. 1: ΔVis was greater than 0.5 mPa·s.

(Brightness unevenness)
CT-4000 (manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied to a glass substrate by spin coating to a film thickness of 0.1 μm, and heated on a hot plate at 220° C. for 1 hour to form an undercoat layer. Each composition was applied to the glass substrate with the undercoat layer by spin coating, and then heated on a hot plate at 100° C. for 2 minutes to obtain a composition layer with a thickness of 0.5 μm.
This composition layer was irradiated with light having a wavelength of 365 nm, and exposed to an exposure dose of 500 mJ/ ^cm2 . Then, post-baking was performed using a hot plate at 220°C for 300 seconds to form a film. The luminance distribution was analyzed by the following method using the glass substrate (evaluation substrate) on which this film was formed, and luminance unevenness was evaluated based on the number of pixels with a deviation of ±10% or more from the average.
The measurement method of the luminance distribution will be described. The evaluation substrate was placed between the observation lens of an optical microscope and a light source, and light was irradiated toward the observation lens, and the transmitted light state was observed using an optical microscope MX-50 (manufactured by Olympus Corporation) equipped with a digital camera. Photographs of the film surface were taken of five arbitrarily selected areas. The luminance of the photographed image was quantified as a density distribution of 256 gradations from 0 to 255 and saved. The luminance distribution was analyzed from this image, and the luminance unevenness was evaluated by the number of pixels that deviated from the average by more than ±10%. The evaluation criteria are as follows.
4: The number of pixels whose deviation from the average exceeds ±10% is 3,000 or less.
3: The number of pixels with a deviation from the average of more than ±10% is more than 3,000 and is 5,000 or less.
2: The number of pixels whose deviation from the average exceeds ±10% is more than 5,000 and is 15,000 or less.
1: The number of pixels whose deviation from the average exceeds ±10% exceeds 15,000.

(Development Residue)
A composition for forming an underlayer (CT-4000, manufactured by Fujifilm Electronic Materials Co., Ltd.) was applied to an 8-inch (20.32 cm) silicon wafer using a spin coater so that the thickness after post-baking was 0.1 μm, and the underlayer was formed by heating at 220° C. for 300 seconds using a hot plate, and a silicon wafer with an underlayer (support) was obtained. Next, each composition was applied by spin coating so that the film thickness after post-baking was 0.62 μm. Next, the wafer was heated at 100° C. for 2 minutes using a hot plate. Next, the wafer was exposed to light having a wavelength of 365 nm at an exposure dose of 1000 mJ/cm ² through a mask with a dot pattern of 1.0 μm square using an i-line stepper exposure device FPA-3000i5+ (manufactured by Canon Inc.). Next, the silicon wafer on which the exposed coating film was formed was placed on the horizontal rotating table of a spin-shower developer (DW-30 type, manufactured by Chemitronics Co., Ltd.), and paddle development was performed for 60 seconds at 23°C using a 60% diluted solution of CD-2000 (manufactured by Fujifilm Electronic Materials Co., Ltd.). The silicon wafer was then fixed to the horizontal rotating table by a vacuum chuck system, and while rotating the silicon wafer at a rotation speed of 50 rpm using a rotating device, pure water was supplied in the form of a shower from a spray nozzle from above the center of rotation to perform a rinse treatment, and then spray-dried. Furthermore, a heat treatment (post-bake) was performed for 300 seconds using a hot plate at 200°C to form a pattern (pixel).
The silicon wafer on which the pixels were formed was observed under a scanning electron microscope (SEM) (magnification: 10,000 times), and the development residue was evaluated according to the following evaluation criteria.
-Evaluation criteria-
4: No residue was found outside the pixel formation area (unexposed area). 3: Very slight residue was found outside the pixel formation area (unexposed area), but to a degree that did not pose any practical problems. 2: Slight residue was found outside the pixel formation area (unexposed area), but to a degree that did not pose any practical problems. 1: Significant residue was found outside the pixel formation area (unexposed area).

As shown in the table above, the compositions of the examples were excellent in terms of storage stability, brightness unevenness, and development residue.

The films obtained from the compositions described in the examples can be suitably used in optical filters, solid-state imaging devices, and image display devices.

Claims (13)

Pigment A;
a compound B having at least one structure selected from a dye structure, an aromatic ring, and a heteroaromatic ring, and an acid group, and having a molecular weight of 122 or more and less than 2,000;
A compound C containing two or more amino groups in one molecule and having a molecular weight of 60 or more and less than 2,000;
A compound D having a weight average molecular weight of 2,000 to 30,000 and having at least one structure selected from a polyester structure and a polyether structure, and at least one group selected from an acid group and a basic group;
A composition comprising: The composition of claim 1, wherein compound C is polyethyleneimine. The composition according to claim 1, wherein compound C is a compound having a heteroaromatic ring. The composition according to any one of claims 1 to 3, wherein the amine value of compound C is 800 mg KOH/g or more. The composition according to any one of claims 1 to 3, comprising 10 to 150 parts by mass of compound C per 100 parts by mass of compound B. The composition according to any one of claims 1 to 3, comprising 5 to 15 parts by mass of compound B, 2 to 8 parts by mass of compound C, and 30 to 50 parts by mass of compound D, relative to 100 parts by mass of pigment A. The composition according to any one of claims 1 to 3, further comprising a polymerizable compound and a photopolymerization initiator. The composition according to claim 7, wherein the content of the pigment A in the total solid content of the composition is 50 mass% or more. The composition according to any one of claims 1 to 3, wherein the pigment A includes at least one selected from a diketopyrrolopyrrole pigment and a phthalocyanine pigment. A film made using the composition according to any one of claims 1 to 3. An optical filter having the film according to claim 10. A solid-state imaging device having the film according to claim 10. An image display device having the film according to claim 10.