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WO2024061599A1 - Guidage de composants d'un dispositif optique - Google Patents

Guidage de composants d'un dispositif optique Download PDF

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Publication number
WO2024061599A1
WO2024061599A1 PCT/EP2023/074124 EP2023074124W WO2024061599A1 WO 2024061599 A1 WO2024061599 A1 WO 2024061599A1 EP 2023074124 W EP2023074124 W EP 2023074124W WO 2024061599 A1 WO2024061599 A1 WO 2024061599A1
Authority
WO
WIPO (PCT)
Prior art keywords
joint
guide unit
guide
component
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2023/074124
Other languages
German (de)
English (en)
Inventor
Ulrich Weber
Yanko Sarov
Markus Hauf
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of WO2024061599A1 publication Critical patent/WO2024061599A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors

Definitions

  • the present invention relates to a guide arrangement and a corresponding method for relatively guiding two components of an optical imaging device for microlithography, which is suitable for the use of useful UV light, in particular light in the extreme ultraviolet (EUV) range.
  • the invention further relates to an optical module, in particular a facet mirror, and an optical imaging device with such an optical module.
  • the invention can be used in connection with any optical imaging method. It can be used particularly advantageously in the production or inspection of microelectronic circuits and the optical components used for this purpose (for example optical masks).
  • the optical systems used in connection with the fabrication of such microelectronic circuits include a variety of optical element modules, which include optical elements such as lenses, mirrors, gratings, etc., arranged in the path of the light. These optical elements typically cooperate in an exposure process to illuminate a pattern formed on a mask, reticle, or the like and to transfer an image of that pattern to a substrate such as a wafer.
  • the optical elements are usually combined in one or more functionally different optical element groups, which can be held within different optical element units.
  • Facet mirror devices such as those mentioned above can serve, among other things, to homogenize the exposure light beam, ie to bring about the most uniform possible power distribution within the exposure light beam. You can also can be used to provide any desired specific power distribution within the exposure light beam.
  • a problem in this context is the most precise possible power distribution or intensity distribution within the exposure light beam, which corresponds as closely as possible to a desired power distribution in order to ultimately avoid or at least reduce undesirable imaging errors.
  • DE 102 05425 A1 shows, among other things, facet mirror devices in which facet elements with a spherical rear surface sit in an assigned recess within a carrier element. The spherical rear surface rests on a corresponding spherical wall or several contact points of the support element delimiting this recess.
  • the spherical back surface has a comparatively small radius of curvature so that it defines a center of rotation of the facet element that is far away from a center of curvature of the optical surface of the facet element.
  • An operating lever is centrally connected to the back of the facet element and corresponding manipulators tilt the operating lever, i.e. produce lateral deflections of the free end of the operating lever in order to adjust both the position and the orientation of the optical surface of the facet.
  • the adjustment options continue to decrease the smaller the facet elements become and the more densely they are packed (hence the higher the “resolution” of the facet mirror becomes).
  • the desired sensitive adjustment of the power distribution or intensity distribution within the exposure light beam is therefore becoming increasingly difficult to achieve with these known systems.
  • the facet elements are tilted by one or more actuators, which act on the facet element with their plungers in a direction which (in an initial position or a non-deflected initial state) typically runs essentially perpendicular to the main plane of extension of the mirror surface.
  • actuators By tilting the facet element, transverse forces and/or torques are transmitted to the respective plunger, which are typically absorbed by a linear guide of the plunger, since the actuators used are often sensitive to such transverse forces and/or torques and may be ineffective without a suitable linear guide of the plunger their function could be impaired.
  • the invention is therefore based on the object of providing a guide arrangement and a corresponding method for the relative guidance of two components of an optical imaging device for microlithography, a corresponding optical module and a corresponding optical imaging device with such a guide arrangement, as well as an optical imaging method, which or which does not have the aforementioned disadvantages or at least to a lesser extent and, in particular, enables the largest possible adjustment range with high transverse rigidity of the linear guide in a simple manner with little installation space requirement.
  • the invention is based on the technical teaching that the largest possible adjustment range with high transverse rigidity of the linear guide can be achieved in a simple manner with little space requirement if at least one guide unit of the two guide units of the parallel guide between a first and second component of the imaging device is used as a kinematically serial combination designed from a four-bar link device and an intermediate element, wherein two joints of the four-bar link mechanism engage on the first component and two joints of the four-bar link mechanism engage on the intermediate element, so that the four-bar link mechanism defines an instantaneous rotation pole of a rotational movement of the first component with respect to the intermediate element.
  • the intermediate element is in turn articulated to the second component via a further, fifth joint, hereinafter also called compensating joint, so that with this compensating joint the intermediate element carries out a compensating movement described in more detail below during longitudinal guidance or parallel guidance by means of the two guide units.
  • This kinematically serial design enables, on the one hand, a nested arrangement of the four-bar link device and the intermediate element, in which the intermediate element can be arranged between two legs of the four-bar link mechanism, whereby a very compact design can be achieved.
  • the above-mentioned compensating movement can be achieved, thanks to which the instantaneous rotation pole during the deflection (along the parallel guide direction) is at most a very small amount along the Parallel guide direction is deflected relative to a reference plane which runs perpendicular to the parallel guide direction and through the compensating joint, via which the intermediate element is articulated to the second component. Since the resultant of the transverse forces that act on the first component perpendicular to the parallel guide direction acts in the instantaneous pole of rotation, these transverse forces only have a correspondingly small lever arm around the articulation of the intermediate element on the second component.
  • the degree of deflection of the instantaneous rotating pole from the reference plane can be set to a low value suitable for the respective application via the dimensioning or design of the guide unit.
  • the arrangement of the first to fifth joints of the first guide unit is preferably coordinated with one another in such a way that in normal operation a maximum deflection of the first instantaneous pivot pole with respect to the reference plane along the parallel guidance direction is at most 0% to 5% of a distance (AP) between the instantaneous pivot pole and the compensating joint which is present in an undeflected initial state of the guide arrangement parallel to the reference plane.
  • the invention therefore relates to a guide arrangement for guiding a first and a second component of an optical imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), relative to one another with a first guide unit and a second guide unit .
  • the first guide unit and the second guide unit are designed and arranged such that, during operation of the imaging device, they act kinematically parallel to one another between the first component and the second component in the manner of a parallel guide along a parallel guide direction. In normal operation of the imaging device, a maximum parallel guidance deflection can take place between the first component and the second component along the parallel guidance direction.
  • At least the first guide unit has a first four-bar link device and a first intermediate element, wherein the first four-bar link mechanism and the first intermediate element act kinematically in series with one another during operation between the first component and the second component.
  • a The first joint and a second joint of the first four-bar device engage the first component during operation, while a third joint and a fourth joint of the first four-bar device engage the intermediate element, so that the first four-bar device defines a first instantaneous rotation pole of the first component with respect to the intermediate element during operation .
  • the first intermediate element is articulated to the second component during operation via a fifth joint (hereinafter also referred to as compensating joint) of the first guide unit.
  • the arrangement of the first to fifth joints of the first guide unit is coordinated with one another in such a way that in normal operation a deflection of the first instantaneous rotation pole with respect to a first reference plane, which runs perpendicular to the parallel guiding direction and through the fifth joint, is at most 0% to 5%, preferably at most 0% to 2%, more preferably at most 0% to 0.5%, of a first distance between the first instantaneous pivot pole and the fifth joint (i.e. the compensating joint), which is parallel to the first reference plane in an undeflected initial state of the guide arrangement.
  • the joints of the first guide unit can in principle be designed in any suitable way in order to achieve appropriate longitudinal guidance or parallel guidance with sufficient transverse rigidity.
  • the first to fifth joints of the first guide unit each define at least one joint axis of rotation, which means that comparatively complex movement sequences can be implemented, in which, in addition to the desired parallel guidance, further guide movements can be realized.
  • Particularly simple designs with simple kinematics result when the first to fifth joints each define exactly one joint axis of rotation.
  • At least two of the joint rotation axes of different joints, preferably all of the joint rotation axes, of the first guide unit are at least essentially parallel to one another, at least in an initial state in which the first component and the second component are not deflected relative to one another along the parallel guidance direction.
  • This makes it possible to achieve a particularly compact design with simple kinematics, for example with essentially flat kinematics.
  • at least the at least one joint axis of rotation of the fifth joint (i.e. the compensating joint) of the first guide unit lies at least essentially in the first reference plane.
  • the guide unit in question can in principle have any complex three-dimensional design, in particular in order to take into account certain boundary conditions that arise, for example, in the densely packed spatial arrangement of the facet elements of facet mirrors.
  • at least some of the joints are arranged in a common plane.
  • at least two of the first to fourth joints of the first guide unit, in particular all of the first to fourth joints of the first guide unit can be arranged at least essentially in a common plane.
  • at least the third to fifth joint of the first guide unit can be arranged at least essentially in a common plane.
  • first to fourth joints and the fifth joint of the first guide unit can be arranged at least substantially in a common plane.
  • the first four-bar linkage device can be designed at least essentially in the manner of a flat four-bar linkage.
  • the joints can basically be designed in any suitable way to achieve the desired kinematics with sufficient accuracy and rigidity.
  • multi-part joints can also be used.
  • at least one of the first to fifth joints of the first guide unit, in particular each of the first to fifth joints of the first guide unit, is formed by a solid-state joint.
  • the respective joint can basically have any complex suitable design that defines one or more joint axes in one or more rotational degrees of freedom in space.
  • Particularly simple designs with clearly defined movement sequences or clearly defined kinematics result if at least one of the first to fifth joints of the first guide unit, in particular each of the first to fifth joints of the first guide unit, is designed in the manner of a hinge joint, thus defining exactly one axis of rotation with exactly one rotational degree of freedom.
  • At least one of the first to fifth joints of the first guide unit can be designed in the manner of a leaf spring joint.
  • the leaf spring joint in question can be designed to be at least essentially flat, at least in the undeflected initial state.
  • the transverse stiffness in the undeflected state or its change with increasing deflection can be influenced in an advantageous manner via the alignment of the respective leaf spring plane or the longitudinal direction of the leaf spring to the first reference plane RE1 or to the connecting straight line of the associated joints.
  • the first four-bar device can in principle have any suitable spatial arrangement of the four joints.
  • Particularly favorable configurations with simply designed kinematics result when a first joint axis of rotation of the first joint and a second joint axis of rotation of the second joint in a second reference plane, which runs parallel to the parallel guide direction, define a first connecting line of the first guide unit, while a third joint axis of rotation of the third Joint and a fourth joint axis of rotation of the fourth joint in the second reference plane define a second connecting line of the first guide unit, while finally the first and third joint axis of rotation define a third connecting line in the second reference plane and the second and fourth joint axis of rotation define a fourth connecting line in the second reference plane.
  • the instantaneous rotation pole of the first guide unit can then simply be defined by an intersection of the third and fourth connecting lines of the first guide unit.
  • the first connecting line and the second connecting line are at least essentially parallel to one another in a non-deflected initial state of the first guide unit.
  • a particularly simple kinematics results when the first and third joint rotation axes are at least essentially parallel to one another. The same applies if the second and fourth joint rotation axes are at least essentially parallel to one another.
  • the four joints of the first four-bar device can basically define any, possibly also three-dimensional (i.e. not flat) quadrilateral, as long as a sufficiently large transverse rigidity is still achieved via the deflection to be realized along the parallel guidance direction.
  • the first to fourth connecting lines in the second reference plane define a first joint trapezoid in the initial state.
  • the first articulated trapezoid can be an isosceles trapezoid in the initial state, and can therefore have a simple symmetrical design.
  • the first intermediate element is designed to be correspondingly symmetrical (in particular symmetrical to the first reference plane), so that a first guide unit that is essentially symmetrical overall (in particular symmetrical to the first reference plane) is realized.
  • a first base side of the first articulated trapezoid lies on the first connecting line and a second base side of the first articulated trapezoid lies on the second connecting line, in particular provided It can be that the first base side is longer than the second base side, and therefore forms the so-called base of the articulated trapezoid, whereby the instantaneous pole then lies on the side of the second connecting line facing away from the first connecting line.
  • the fifth joint is arranged on a side of the first connecting line that faces the second connecting line. It can be advantageous if the fifth joint is arranged in the first reference plane between the first connecting line and the second connecting line, since particularly compact configurations can be achieved in this way.
  • the distance D5 has a value of -20% to 20%, preferably -5% to 15%, more preferably 0% to 10%, which has the length LG1 and / or the angle WS has a value from 1° to 30°, preferably 2° to 20°, more preferably 5° to 10°.
  • the components of the first guide unit can basically have any suitable geometry between the joints and can optionally be designed in one or more parts.
  • first leg element can be designed as an elongated rod element.
  • second leg element can be designed as an elongated rod element.
  • the intermediate element can be essentially T-shaped or V-shaped. This results in particularly easy-to-manufacture configurations.
  • the intermediate element can be arranged between the first leg element and the second leg element, which results in a particularly compact design. The same applies if the first leg element, the second leg element and the intermediate element extend essentially in a common main extension plane.
  • the guide arrangement can in principle be constructed from any number of separate parts. Not least in view of the accuracy requirements to be met, it is particularly advantageous if at least partially one-piece connections are selected. At least one of the first leg element and the second leg element can be connected in one piece to the intermediate element. Likewise, at least one of the first component and the second component can be connected in one piece to the first guide unit. Likewise, at least one of the first component and the second component can be connected in one piece to the second guide unit.
  • the second guide unit can basically be designed in any way, as long as it is appropriately coordinated with the first guide unit in order to achieve the desired longitudinal guide in interaction with the first guide unit.
  • the second guide unit is preferably also designed in the manner of the first guide unit. It is particularly favorable if the second guide unit is designed at least essentially identically to the first guide unit. It is preferred if the first and second guide units are arranged in a common guide unit plane, which preferably runs at least substantially parallel to the parallel guide direction.
  • the first and second guide units preferably have a sufficiently large distance from one another along the parallel guide direction in order to achieve good support of tilting moments about a direction transverse to the parallel guide direction.
  • the second guide unit is spaced from the first guide unit along the parallel guide direction by a guide unit distance and the first guide unit has a maximum first transverse dimension (QA) perpendicular to the parallel guide direction, the guide unit distance then being 10% to 1000%, preferably 50% to 500%, more preferably 100% to 400%, of the maximum first transverse dimension.
  • QA first transverse dimension
  • At least one further guide unit can thus be provided, the further guide unit in turn preferably being designed in the manner of the first guide unit, in particular being designed at least substantially identically to the first guide unit.
  • a third guide unit is provided, wherein the third guide unit is spatially assigned to the first guide unit, in particular is arranged transversely to the parallel guide direction on a side of the first component opposite the first guide unit.
  • the transverse rigidity of the guide device in particular can be increased in an advantageous manner.
  • a fourth guide unit is provided, wherein the fourth guide unit is spatially assigned to the second guide unit, in particular is arranged transversely to the parallel guide direction on a side of the first component opposite the second guide unit.
  • the second guide unit also has a second four-bar link device and a second intermediate element, with the second four-bar link mechanism and the second intermediate element acting kinematically in series with one another during operation between the first component and the second component.
  • a first joint and a second joint of the second four-bar device engage the first component during operation, while a third joint and a fourth joint of the second four-bar device engage the intermediate element, so that the second four-bar device during operation has a second instantaneous rotation pole of the first component with respect to the intermediate element are defined.
  • the second intermediate element is articulated to the second component via a fifth joint of the second guide unit.
  • the arrangement of the first to fifth joints of the second guide unit is in turn coordinated with one another in such a way that in normal operation a deflection of the second instantaneous rotation pole with respect to a third reference plane, which runs perpendicular to the parallel guidance direction and through the fifth joint, is at most 0% to 5%, preferably at most 0% to 2%, more preferably at most 0% to 0.5%, of a second distance between the second instantaneous pivot pole and the fifth joint of the second guide unit, which is parallel to the third reference plane in an undeflected initial state of the guide arrangement.
  • Such a design can also be selected for one or more further management units (for example the above-mentioned third and/or fourth management units). This allows the above in connection with the corresponding design of the first management unit implement the advantages and variants described to the same extent, so that reference is made to the above statements.
  • the guide arrangement can in principle be used at any suitable location where a compact and transversely rigid longitudinal guide or parallel guide with correspondingly high transverse rigidity is required.
  • the advantages are particularly effective when the first component is part of an optical unit of the imaging device, in particular part of a facet unit of the imaging device. It is also advantageous if the first component is an element of an actuator device for actuating an optical unit of the imaging device, in particular an element of an actuator device for actuating a facet unit of the imaging device. It is particularly favorable if the first component is a plunger of an actuator device for actuating an optical unit of the imaging device, in particular a plunger of an actuator device for actuating a facet unit of the imaging device.
  • the second component can preferably be part of a correspondingly associated support structure of the imaging device.
  • the second component can be such a part of an optical unit of the imaging device, while the first component can then be a part of a correspondingly associated support structure of the imaging device.
  • the first component is part of an optical unit of the imaging device, in particular a facet unit of the imaging device, the optical unit comprising an optical surface.
  • the optical surface has an area of 0.1 mm 2 to 200 mm 2 , preferably 0.5 mm 2 to 100 mm 2 , more preferably 1.0 mm 2 to 50 mm 2 .
  • the optical surface preferably has a maximum dimension of 2 mm to 50 mm, preferably 3 mm to 25 mm, more preferably 4 mm to 10 mm.
  • the optical surface is an at least substantially flat surface.
  • the optical surface is a reflective surface.
  • the present invention further relates to an optical module, in particular a facet mirror, with at least one optical element, in particular a facet element, and at least one guide arrangement according to the invention, which is assigned to the at least one optical element.
  • the optical module can comprise a plurality N of guide arrangements according to the invention, whereby the Guide arrangements are connected to a common support structure.
  • the optical module can comprise a plurality K of optical elements, the plurality K having the value 100 to 100,000, preferably 100 to 10,000, more preferably 1,000 to 10,000.
  • the optical module can comprise a plurality of optical elements, the optical elements being arranged to form a narrow gap relative to one another, the gap having a gap width and the gap width in an assembled state being 0.01 mm to 0.2 mm, preferably 0. 02 mm to 0.1 mm, more preferably 0.04 mm to 0.08 mm.
  • the present invention further relates to an optical imaging device, in particular for microlithography, with an illumination device with a first optical element group, an object device for recording an object, a projection device with a second optical element group and an image device, wherein the illumination device is designed to illuminate the object and the projection device is designed to project an image of the object onto the image device.
  • the lighting device and/or the projection device comprises at least one optical module according to the invention.
  • the present invention further relates to a method for the relative guidance of a first and a second component of an optical imaging device for microlithography, in particular for the use of light in the extreme UV range (EUV), in which a guide unit and a second guide unit during operation of the imaging device act kinematically parallel to one another between the first component and the second component in the manner of a parallel guide along a parallel guide direction.
  • EUV extreme UV range
  • a maximum parallel guidance deflection can take place between the first component and the second component along the parallel guidance direction.
  • At least the first guide unit has a first four-bar link device and a first intermediate element, wherein the first four-bar link mechanism and the first intermediate element act kinematically in series with one another during operation between the first component and the second component.
  • a first joint and a second joint of the first four-bar device engage the first component during operation, while a third joint and a fourth joint of the first four-bar device engage the intermediate element, so that the first four-bar device has a first instantaneous rotation pole during operation the first component is defined with respect to the intermediate element.
  • the first intermediate element is articulated to the second component during operation via a fifth joint (hereinafter also referred to as compensating joint) of the first guide unit.
  • the arrangement of the first to fifth joints of the first guide unit is coordinated with one another in such a way that in normal operation a deflection of the first instantaneous rotation pole with respect to a first reference plane, which runs perpendicular to the parallel guidance direction and through the fifth joint (i.e.
  • the compensating joint is at most 0% to 5%, preferably at most 0% to 2%, more preferably at most 0% to 0.5%, of a first distance between the first instantaneous pivot pole and the fifth joint (i.e. the compensating joint), which is parallel to the first reference plane in an undeflected initial state of the guide arrangement is present.
  • the present invention relates to an optical imaging method, in particular for microlithography, in which an illumination device, which has a first optical element group, illuminates an object and a projection device, which has a second optical element group, projects an image of the object onto an image device. At least a first component, which is assigned to an optical element of the lighting device and/or the projection device, is guided relative to an assigned second component by means of a method according to the invention.
  • Figure 1 is a schematic representation of a preferred embodiment of a projection exposure system according to the invention, which includes a preferred embodiment of an optical module according to the invention, in which a preferred embodiment of a guide arrangement according to the invention is used.
  • Figure 2 is a schematic sectional view of the guide arrangement from Figure 1 (in a non-deflected initial state) in an embodiment with solid body joints.
  • Figure 3 is a mechanical equivalent circuit diagram of part of the guide arrangement from Figure 2 (in the initial state).
  • Figure 4 is a mechanical equivalent circuit diagram of the portion of the guide assembly of Figure 3 (in a deflected condition).
  • Figure 5 shows a variant of a guide unit such as can be used in the guide arrangement from Figures 2 to 4.
  • Figure 6 shows a further variant of a guide unit such as can be used in the guide arrangement from Figures 2 to 4.
  • FIGS. 1 to 6 A preferred exemplary embodiment of a projection exposure system 101 according to the invention for microlithography is described below with reference to FIGS. 1 to 6, which includes a preferred exemplary embodiment of an optical arrangement according to the invention.
  • an x,y,z coordinate system is given in the drawings, with the z direction running parallel to the direction of the gravitational force.
  • the x-direction and the y-direction accordingly run horizontally, with the x-direction in the illustration in FIG. 1 running perpendicularly into the plane of the drawing.
  • the essential components of a projection exposure system 101 will first be described below as an example with reference to FIG. The description of the basic structure of the projection exposure system 101 and its components is not intended to be restrictive.
  • a lighting device or a lighting system 102 of the projection exposure system 101 includes, in addition to a radiation source 102.1, an optical element group in the form of lighting optics 102.2 for illuminating an object field 103.1 (shown schematically).
  • the object field 103.1 lies in an object plane 103.2 of an object device 103.
  • a reticle 103.3 (also referred to as a mask) arranged in the object field 103.1 is illuminated.
  • the reticle 103.3 is held by a reticle holder 103.4.
  • the reticle holder 103.4 can be displaced in particular in one or more scanning directions via a reticle displacement drive 103.5. In the present example, such a scanning direction runs parallel to the y-axis.
  • the projection exposure system 101 further comprises a projection device 104 with a further optical element group in the form of projection optics 104.1.
  • the projection optics 104.1 is used to image the object field 103.1 into a (schematized) image field 105.1, which lies in an image plane 105.2 of an image device 105.
  • the image plane 105.2 runs parallel to the object plane 103.2. Alternatively, an angle other than 0° between the object plane 103.2 and the image plane 105.2 is also possible.
  • a structure of the reticle 103.3 is imaged onto a light-sensitive layer of a substrate in the form of a wafer 105.3, the light-sensitive layer being arranged in the image plane 105.2 in the area of the image field 105.1.
  • the wafer 105.3 is held by a substrate holder or wafer holder 105.4.
  • the wafer holder 105.4 can be displaced in particular along the y direction via a wafer displacement drive 105.5.
  • the displacement on the one hand of the reticle 103.3 via the reticle displacement drive 103.5 and on the other hand of the wafer 105.3 via the wafer displacement drive 105.5 can take place synchronized with one another. This synchronization can take place, for example, via a common control device 106 (shown only very schematically in FIG. 1 and without control paths).
  • the radiation source 102.1 is an EU radiation source (extreme ultraviolet radiation).
  • the radiation source 102.1 emits in particular EU radiation 107, which is also referred to below as useful radiation or illumination radiation becomes.
  • the useful radiation in particular has a wavelength in the range between 5 nm and 30 nm, in particular a wavelength of approximately 13 nm.
  • the radiation source 102.1 can be a plasma source, for example an LPP source (Laser Produced Plasma, i.e. using a Laser generated plasma) or a DPP source (Gas Discharged Produced Plasma, i.e. plasma generated by gas discharge). It can also be a synchrotron-based radiation source.
  • the radiation source 102.1 can also be a free electron laser (free electron laser, FEL).
  • the optical elements used are exclusively reflective optical elements.
  • the illumination radiation 107 which emanates from the radiation source 102.1, is focused by a collector 102.3.
  • the collector 102.3 can be a collector with one or more ellipsoidal and/or hyperboloid reflection surfaces.
  • the at least one reflection surface of the collector 102.3 can be exposed to the illumination radiation 107 in grazing incidence (Grazing Incidence, Gl), i.e. with angles of incidence greater than 45°, or in normal incidence (Normal Incidence, NI), i.e. with angles of incidence smaller than 45° become.
  • Gl grazing Incidence
  • NI normal incidence
  • the collector 11 can be structured and/or coated on the one hand to optimize its reflectivity for the useful radiation and on the other hand to suppress false light.
  • the illumination radiation 107 propagates through an intermediate focus in an intermediate focus plane 107.1.
  • the intermediate focus plane 107.1 can represent a separation between the illumination optics 102.2 and a radiation source module 102.4, which includes the radiation source 102.1 and the collector 102.3.
  • the illumination optics 102.2 includes a deflection mirror 102.5 along the beam path and a downstream first facet mirror 102.6.
  • the deflection mirror 102.5 can be a flat deflection mirror or, alternatively, a mirror with an effect that influences the bundle beyond the pure deflection effect.
  • the deflection mirror 102.5 can be designed as a spectral filter, which consists of the Illumination radiation 107 at least partially separates out so-called false light, the wavelength of which deviates from the useful light wavelength.
  • the first facet mirror 102.6 is also referred to as a field facet mirror.
  • the first facet mirror 102.6 comprises a large number of individual first facets 102.7, which are also referred to below as field facets. These first facets and their optical surfaces are only indicated very schematically in FIG. 1 by the dashed contour 102.7.
  • the first facets 102.7 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or part-circular edge contour.
  • the first facets 102.7 can be designed as facets with a planar or alternatively with a convex or concave curved optical surface.
  • the first facets 102.7 themselves can also each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors.
  • the first facet mirror 102.6 can in particular be designed as a microelectromechanical system (MEMS system), as is described in detail, for example, in DE 10 2008 009 600 A1.
  • MEMS system microelectromechanical system
  • the illumination radiation 107 runs horizontally between the collector 102.3 and the deflection mirror 102.5, i.e. along the y-direction.
  • a different orientation can also be selected for other variants.
  • a second facet mirror 102.8 is arranged downstream of the first facet mirror 102.6 in the beam path of the illumination optics 102.2. If the optically effective surfaces of the second facet mirror 102.8 are arranged in the area of a pupil plane of the illumination optics 102.2, the second facet mirror 102.8 is also referred to as a pupil facet mirror.
  • the second facet mirror 102.8 can also be arranged at a distance from a pupil plane of the illumination optics 102.2.
  • the combination of the first facet mirror 102.6 and the second facet mirror 102.8 is also referred to as a specular reflector.
  • the second facet mirror 102.8 in turn comprises a plurality of second facets, which are only indicated very schematically in FIG. 1 by the dashed contour 102.9.
  • the second facets 102.9 are also referred to as pupil facets in the case of a pupil facet mirror.
  • the second facets 102.9 can basically be designed like the first facets 102.7.
  • the second facets 102.9 can also be macroscopic facets, which can have, for example, round, rectangular or even hexagonal or any polygonal borders.
  • the second facets 102.9 can be facets composed of micromirrors.
  • the second facets 102.9 can in turn have planar or alternatively convex or concave curved reflection surfaces.
  • the lighting optics 102.2 thus forms a double-faceted system.
  • This basic principle is also known as the fly's eye integrator.
  • a transmission optics 102.10 (shown only in a highly schematic manner) can be arranged in the beam path between the second facet mirror 102.8 and the object field 103.1, which contributes in particular to the imaging of the first facets 102.7 into the object field 103.1.
  • the transmission optics 102.10 can have exactly one mirror, but alternatively also two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 102.2.
  • the transmission optics 102.10 can in particular include one or two mirrors for vertical incidence (NL mirror, normal incidence mirror) and/or one or two mirrors for grazing incidence (GL mirror, grazing incidence mirror).
  • the illumination optics 102.2 has exactly three mirrors after the collector 102.3, namely the deflection mirror 102.5, the first facet mirror 102.6 (e.g. a field facet mirror) and the second facet mirror 102.8 (e.g. a pupil facet mirror).
  • the deflection mirror 102.5 can also be omitted, so that the illumination optics 102.2 can then have exactly two mirrors after the collector 102.3, namely the first facet mirror 102.6 and the second facet mirror 102.8.
  • the individual first facets 102.7 are imaged in the object field 103.1.
  • the second facet mirror 102.8 is the last bundle-forming or actually the last mirror for the illumination radiation 107 in the beam path in front of the object field 103.1.
  • the image of the first facets 102.7 by means of the second facets 102.9 or with the second facets 102.9 and a transmission optics 102.10 in the object plane 103.2 is usually only an approximate image.
  • the projection optics 104.1 comprises a plurality of mirrors Mi, which are numbered according to their arrangement along the beam path of the projection exposure system 101.
  • the projection optics 104.1 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve or another number of mirrors Mi are also possible.
  • the penultimate mirror M5 and the last mirror M6 can each have a passage opening (not shown) for the illumination radiation 107.
  • the projection optics 104.1 is a double-obscured optic.
  • the projection optics 104.1 has an image-side numerical aperture NA that is greater than 0.5.
  • the image-side numerical aperture NA can also be larger than 0.6.
  • the image-side numerical aperture NA can be 0.7 or 0.75.
  • the reflection surfaces of the mirrors Mi can be designed as free-form surfaces without an axis of rotational symmetry.
  • the reflection surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflection surface shape.
  • the mirrors Mi just like the mirrors of the lighting optics 102.2, can have highly reflective coatings for the lighting radiation 107. These coatings can be made up of several layers (multilayer coatings), in particular they can be designed with alternating layers of molybdenum and silicon.
  • the projection optics 104.1 has a large object image offset in the y-direction between a y-coordinate of a center of the object field 103.1 and a y-coordinate of the center of the image field 105.1.
  • This object-image offset in the y-direction can be approximately as large as a distance between the object plane 103.2 and the image plane 105.2 in the z-direction.
  • the projection optics 104.1 can in particular be anamorphic. In particular, it has different imaging scales ßx, ßy in the x and y directions. The Both imaging scales ßx, ßy of the projection optics 104.1 are preferably included
  • ßx; ßy (+/- 0.25; +/- 0.125).
  • a positive magnification ß means an image without image reversal.
  • a negative sign for the image scale ß means an image with image reversal.
  • the projection optics 104.1 thus leads to a reduction in the x-direction, i.e. in the direction perpendicular to the scanning direction, in a ratio of 4:1.
  • the projection optics 104.1 in the y direction i.e. in the scanning direction, leads to a reduction in size in a ratio of 8:1.
  • Other image scales are also possible. Image scales of the same sign and absolutely the same in the x and y directions are also possible, for example with absolute values of 0.125 or 0.25.
  • the number of intermediate image planes in the x and y directions in the beam path between the object field 103.1 and the image field 105.1 can be the same. Likewise, the number of intermediate image planes can be different depending on the design of the projection optics 104.1. Examples of projection optics with different numbers of such intermediate images in the x and y directions are known, for example, from US 2018/0074303 A1 (the entire disclosure of which is incorporated herein by reference).
  • one of the pupil facets 102.9 is assigned to exactly one of the field facets 102.7 to form an illumination channel for illuminating the object field 103.1. This can in particular result in lighting based on Köhler's principle.
  • the far field is broken down into a large number of object fields 103.1 using the field facets 102.7.
  • the field facets 102.7 generate a plurality of images of the intermediate focus on the pupil facets 102.9 assigned to them.
  • the field facets 102.7 are each imaged onto the reticle 103.3 by an assigned pupil facet 102.9, with the images superimposing one another, so that there is an overlapping illumination of the object field 103.1.
  • the illumination of the object field 103.1 is preferably as homogeneous as possible. It preferably has a uniformity error of less than 2%. Field uniformity can be achieved by overlaying different lighting channels.
  • the illumination of the entrance pupil of the projection optics 104.1 can be geometrically defined.
  • the intensity distribution in the entrance pupil of the projection optics 104.1 can be adjusted. This intensity distribution is also referred to as the lighting setting of the lighting system 102.
  • a pupil uniformity that is also preferred Area of defined illuminated sections of an illumination pupil of the illumination optics 102.2 can be achieved by redistributing the illumination channels.
  • the aforementioned settings can be made for actively adjustable facets by appropriate control via the control device 106.
  • the projection optics 104.1 can in particular have a homocentric entrance pupil. This can be accessible or inaccessible.
  • the entrance pupil of the projection optics 104.1 often cannot be illuminated precisely with the pupil facet mirror 102.8.
  • the aperture rays often do not intersect at a single point. However, an area can be found in which the pairwise distance of the aperture beams becomes minimal.
  • This surface represents the entrance pupil or a surface conjugate to it in local space. In particular, this surface shows a finite curvature.
  • the projection optics 104.1 has different positions of the entrance pupil for the tangential and sagittal beam paths.
  • an imaging optical element in particular an optical component of the transmission optics 102.10, is provided between the second facet mirror 102.8 and the reticle 103.3. With the help of this imaging optical element, the different positions of the tangential entrance pupil and the sagittal entrance pupil can be taken into account.
  • the optical surfaces of the pupil facet mirror 102.8 are arranged in a surface conjugate to the entrance pupil of the projection optics 104.1.
  • the first facet mirror 102.6 (field facet mirror) defines a first main extension plane of its optical surfaces, which in the present example is arranged tilted relative to the object plane 5.
  • this first main extension plane of the first facet mirror 102.6 is arranged tilted to a second main extension plane, which is defined by the optical surface of the deflection mirror 102.5.
  • the first main extension plane of the first facet mirror 102.6 is in the present example further arranged tilted to a third main extension plane, which is defined by the optical surfaces of the second facet mirror 102.8.
  • the facet mirrors 102.6 and 102.8 are constructed as optical modules according to the invention, which comprise a plurality N of optical arrangements in the form of facet units 108, of which a part of a facet unit 108 is shown in Figure 2.
  • the facet units 108 are designed identically in the present example. In other variants, however, they can also be designed differently (individually or in groups).
  • the respective facet unit 108 comprises an optical element in the form of a facet element 108.1 (shown only schematically), a support device 108.2 and an active adjustment device 108.3.
  • the optical element 108.1 has a reflective optical surface 108.4, which is formed on a facet body 108.5.
  • the facet body 108.5 can sit on an interface unit (not shown) of the support device 108.2, which supports the facet body 108.5 so that it can be tilted about one or more tilting axes.
  • a tilt axis perpendicular to the plane of the drawing in FIG. 2 or parallel to the y-axis
  • the optical element 108.1 can be defined with respect to the support device 108.2 or the support structure.
  • the adjusting device 108.3 comprises an adjusting unit 108.6 with an actuator unit 108.7 (shown only partially and in a highly schematic manner), which can also be supported on the support device 108.2 and, controlled by the control device 106, acts on a plunger 108.8 of the adjusting unit 108.6.
  • the plunger 108.7 in turn acts on the facet body 108.5 via a tilt-decoupling plunger interface unit 108.9 of the adjustment unit 108.6 (shown only in very schematic form) in order to tilt the facet body 108.5 and thus the optical surface 108.4 in accordance with the specifications for the illustration.
  • the elongated plunger 108.8 is guided along a parallel guide direction PFR (which in the present example runs parallel to the z-axis) by a preferred embodiment of a guide arrangement 109 according to the invention, which is designed in the manner of a parallel guide.
  • PFR parallel guide direction
  • any number of adjustment units 108.6 can be provided in order to adjust the facet body 108.5 and thus the optical surface 108.4 in further degrees of freedom. If several adjustment units 108.6 are provided, they can be designed identically or have a different design.
  • the guide arrangement 109 guides the plunger 108.8 (which represents a first component of the imaging device 101) with respect to the support device 108.2 (which represents a second component of an optical imaging device) along the parallel guide direction PFR.
  • the leadership arrangement 109 includes, among other things, a first leadership unit 109.1, a second leadership unit 109.2, a third leadership unit 109.3 and a fourth leadership unit 109.4.
  • the first management unit 109.1 a first leadership unit 109.1, a second leadership unit 109.2, a third leadership unit 109.3 and a fourth leadership unit 109.4.
  • the second guide unit 109.2 are designed and arranged in such a way that, during operation of the imaging device 101, they act kinematically parallel to one another between the plunger 108.8 (as the first component) and the support device 108.2 (as the second component) in the manner of a parallel guide along the parallel guide direction PFR.
  • a maximum parallel guidance deflection PFAmax occurs between the first component 108.8 and the second component 108.2 along the parallel guidance direction PFR.
  • the second guide unit 109.2 each have a first end and a second end along a support force flow between the first component 108.8 and the second component 108.2, the first end being assigned to the first component 108.8 and the second end being assigned to the second component 108.2.
  • the first guide unit 109.1 has a first four-bar link device 109.5 and a first intermediate element 109.6, the first four-bar link mechanism 109.5 and the first intermediate element 109.6 being kinematically in series with one another during operation between the first component 108.8 and the second component
  • a first joint 109.7 and a second joint 109.8 of the first four-bar device 109.5 engage the first component 108.8 during operation, while a third joint 109.9 and a fourth joint 109.10 of the first four-bar device 109.5 engage the intermediate element 109.6, so that the first four-bar device 109.5 during operation a first instantaneous rotation pole MP1 of the first component 108.8 with respect to the intermediate element 109.6 is defined.
  • the first intermediate element 109.6 is articulated to the second component 108.2 during operation via a fifth joint (first compensating joint) 109.11 of the first guide unit 109.1.
  • the arrangement of the first to fifth joints 109.7 to 109.11 of the first guide unit 109.1 is coordinated with one another in such a way that in normal operation a deflection of the first instantaneous rotation pole MP1 with respect to a first reference plane RE1, which is perpendicular to the parallel guidance direction PFR and through the fifth joint 109.11 runs, at most 0% to 5%, preferably at most 0% to 2%, more preferably at most 0% to 0.5%, of the first distance AP1 between the first instantaneous pivot pole MP1 and the compensating joint, which is in the undeflected (shown in Figure 2).
  • the initial state of the guide arrangement 109 is parallel to the first reference plane RE1.
  • the first four-joint device 109.5 can in principle have any suitable spatial arrangement of the four joints 109.7 to 109.10. Particularly favorable configurations with simply designed kinematics result when (as in the present example) a first joint axis of rotation GDA1 of the first joint 109.7 and a second joint axis of rotation GDA2 of the second joint 109.8 in a second reference plane RE2 (here: the drawing plane of Figure 2). runs parallel to the parallel guidance direction PFR, defining a first connecting line VG1 of the first guidance unit 109.1.
  • a third joint axis of rotation GDA3 of the third joint 109.9 and a fourth joint axis of rotation GDA4 of the fourth joint 109.10 define a second connecting line VG2 of the first guide unit 109.1 in the second reference plane RE2, while finally the first joint axis of rotation GDA1 and the third joint axis of rotation GDA3 in the second reference plane RE2 form a third Define connecting line VG3 and the second joint axis of rotation GDA2 and the fourth joint axis of rotation GDA4 define a fourth connecting line VG2 in the second reference plane RE2.
  • the instantaneous rotation pole MP1 of the first guide unit 109.1 is simply defined by the intersection of the third connecting line VG3 and the fourth connecting line VG4 of the first guide unit 109.1.
  • a particularly simple and therefore advantageous kinematics is realized, in which the first connecting line VG1 and the second connecting line VG2 are at least essentially parallel to one another in the undeflected initial state of the first guide unit 109.1 shown in Figures 2 and 3.
  • a further simplification of the kinematics also results if the first and third joint rotation axes GDA1, GDA3 are at least essentially parallel to one another.
  • the second and fourth joint rotation axes GDA2, GDA4 are at least essentially parallel to one another. Both are the case in the present example, in which all four joint rotation axes GDA1 to GDA4 are at least essentially parallel to one another (thus running at least essentially perpendicular to the plane of the drawing in FIGS. 2 to 4).
  • the kinematically serial arrangement of the first four-bar linkage device 109.5 and the first intermediate element 109.6 results in a nested arrangement of the Four-bar link device 109.5 and the intermediate element 109.6 are realized, in which the intermediate element 109.6 is arranged between two legs 109.12 and 109.13 of the four-bar link mechanism 109.5, whereby a very compact design can be achieved.
  • connection described with the kinematically serial arrangement of the first four-bar linkage device 109.5 and the first intermediate element 109.6 also causes the first intermediate element 109.6 to carry out a compensating movement described in more detail below with reference to FIGS. 3 and 4 during longitudinal guidance or parallel guidance by means of the two guide units 109.1, 109.2 .
  • a compensating movement of the first intermediate element 109.6 can be achieved (see Figure 4), thanks to which the instantaneous pole MP1 during the deflection of the first component 108.8 (along the parallel guide direction PFR from the initial state shown in FIG.
  • the tilting of the first intermediate element 109.6 about the fifth joint rotation axis GDA5 of the fifth joint 109.11 in the example in FIG. 4 enables the third connecting line VG3 (which leads in the parallel guide direction PFR during the deflection shown in FIG. 4) to increase its inclination to the first reference plane RE1 , while the fourth connecting line VG4 (which trails in the parallel guidance direction PFR during the deflection shown in FIG. 4) reduces its inclination to the first reference plane RE1.
  • This change in inclination causes the intersection of the third and fourth connecting lines VG3, VG4, which defines the instantaneous rotation pole MP1, to remain at least close to the reference plane RE1 and, if necessary, not to move out of the reference plane RE1 along the parallel guide direction PFR at all.
  • the degree of deflection of the instantaneous pole MP1 from the reference plane RE1 can be set to a low value that is suitable for the respective application via the dimensioning or design of the first guide unit 109.1. With the design described here, it can be achieved in an advantageous manner that the transverse rigidity of the guide arrangement 109 remains almost unchanged during the entire relative movement expected in normal operation (along the parallel guide direction PFR) between the first and second components 108.8, 108.2.
  • the joints 109.7 to 109.11 of the first guide unit 109.1 can in principle be designed in any suitable manner in order to achieve appropriate longitudinal guidance or parallel guidance with sufficient transverse rigidity.
  • the first to fifth joints of the first guide unit each define at least one joint rotation axis GDA1 to GDA5, which means that comparatively complex movement sequences can be implemented, in which, in addition to the desired parallel guidance, further guide movements can be implemented.
  • Particularly simple designs with simple kinematics result when the first to fifth joints 109.7 to 109.11 each define exactly one joint axis of rotation GDA1 to GDA5.
  • At least two of the joint rotation axes GDA1 to GDA5 of different joints 109.7 to 109.11 preferably (as in the present example) all of the joint rotation axes GDA1 to GDA5, of the first guide unit 109.1 at least in the initial state (see Figures 2 and 3) at least to each other are essentially parallel.
  • the joint rotation axis GDA5 of the fifth joint 109.11 lies at least essentially in the first reference plane RE1.
  • the guide unit 109.1 to 109.4 in question can in principle have any complex three-dimensional design, in particular in order to take into account certain boundary conditions that arise, for example, in the densely packed spatial arrangement of the facet elements 108.
  • at least some of the joints 109.7 to 109.11 are arranged in a common plane (here: the drawing plane of FIGS. 2 to 4).
  • at least two of the first to fourth joints 109.7 to 109.10 of the first guide unit in particular (as in the present example) all of the first to fourth joints 109.7 to 109.10, can be arranged at least essentially in a common plane.
  • the first four-bar linkage device 109.5 is designed at least essentially in the manner of a flat four-bar linkage.
  • at least the third to fifth joints 109.9 to 109.11 i.e. the joints on the intermediate element 109.6 can be arranged at least essentially in a common plane.
  • at least two of the first to fourth joints 109.9 to 109.10 and the fifth joint 109.11, in particular all of the first to fifth joints 109.7 to 109.11 can be arranged at least essentially in a common plane.
  • the joints 109.7 to 109.11 can in principle be designed in any suitable way in order to achieve the desired kinematics with sufficient accuracy and rigidity. In principle, multi-part joints can also be used. Not least with regard to the accuracy requirements in the field of microlithography, it is advantageous if at least one of the first to fifth joints 109.7 to 109.11 of the first guide unit 109.1, in particular (as in the present example) each of the first to fifth joints 109.7 to 109.11 of the first Guide unit is formed by a solid joint.
  • the respective joint 109.7 to 109.11 can in principle have any complex, suitable design that defines one or more joint axes in one or more rotational degrees of freedom in space.
  • Particularly simple designs with clearly defined movement sequences or clearly defined kinematics result when at least one of the first to fifth joints 109.7 to 109.11, in particular (as in the present example) each of the first to fifth joints 109.7 to 109.11, in the manner of a Hinge joint is formed, therefore exactly one axis of rotation GDA1 to GDA5 is defined with exactly one degree of rotational freedom.
  • the four joints 109.7 to 109.10 of the first four-joint device 109.5 can basically define any, possibly also three-dimensional (i.e. not flat) quadrilateral.
  • the first to fourth connecting lines VG1 to VG4 in the second reference plane RE2 define a first joint trapezoid GT1 in the initial state.
  • the first articulated trapezoid GT1 (as in the present example) can be an isosceles trapezoid in the initial state, and therefore have a simple symmetrical design.
  • first intermediate element 109.6 is designed to be correspondingly symmetrical (in particular symmetrical in the initial state to the first reference plane RE1), so that, if necessary, a first guide unit 109.1 that is essentially symmetrical overall (in particular symmetrical in the initial state to the first reference plane RE1). is realized.
  • a first base side GS1 of the first articulated trapezoid GT1 lies on the first connecting line VG1, while a second base side GS2 of the first articulated trapezoid GT 1 lies on the second connecting line VG2.
  • the first base side GS1 is longer than the second base side GS2, and therefore forms the so-called base of the articulated trapezoid GT 1, whereby the instantaneous pole MP1 then lies on the side of the second connecting line VG2 facing away from the first connecting line VG1.
  • the fifth joint 109.11 is arranged on a side of the first connecting line VG1 that faces the second connecting line VG2. It can be advantageous if the fifth joint 109.11 (as in the present example) is arranged in the first reference plane RE1 between the first connecting line VG1 and the second connecting line VG2, since particularly compact configurations can be achieved in this way.
  • the first articulated trapezoid GT 1 in the initial state is an isosceles trapezoid with its first base side GS1 on the first connecting line VG1, its second base GS2 on the second connecting line VG2 and one leg each 109.12, 109.13 on the third connecting line VG3 and fourth connecting line VG4.
  • the distance D5 has a value of -20% to 20%, preferably -5% to 15%, more preferably 0% to 10%, of the length LG1.
  • the angle WS has a value of 1° to 30°, preferably 2° to 20°, more preferably 5° to 10°.
  • the components of the first guide unit 109.1 can basically have any suitable geometry between the joints 109.7 to 109.11 and can optionally be designed in one or more parts.
  • an advantageously simple design is realized in that the first joint 109.7 and the third joint 109.9 are connected via the first leg element 109.12, while the second joint 109.8 and the fourth joint 109.10 are connected via the second leg element 109.13.
  • Both leg elements 109.12, 109.13 are each designed as a simple elongated rod element.
  • the intermediate element can (as in the present example) be essentially T-shaped or V-shaped. This results in particularly easy-to-manufacture configurations.
  • the intermediate element 109.6 is arranged between the first leg element 109.12 and the second leg element 109.13 and the first leg element 109.12, the second leg element 109.13 and the intermediate element 109.6 extend essentially in a common main extension plane, thereby providing a particularly space-saving design simple and clearly defined kinematics.
  • the guide arrangement 109 can basically be constructed from any number of separate parts. Not least in view of the accuracy requirements to be met, it is particularly advantageous if at least partially one-piece connections are selected. At least one of the leg elements 109.12, 109.12 can be connected in one piece to the intermediate element 109.6.
  • first and second components 108.8, 108.2 can be connected in one piece to the first guide unit 109.1.
  • at least one of the first and second components 108.8, 108.2 can be connected in one piece to the second guide unit 109.2.
  • the second guide unit 109.2 can basically be designed in any way, as long as it is appropriately coordinated with the first guide unit 109.1 in order to achieve the desired longitudinal guidance between the first and second components 108.8, 108.2 in interaction with the first guide unit 109.1.
  • the second guide unit 109.2 is preferably also designed in the manner of the first guide unit 109.1. It is particularly favorable if the second guide unit 109.2 (as in the present example) is at least essentially identical to the first guide unit 109.1. It is preferred if the first guide unit 109.1 and the second guide unit 109.2 (as in the present example) are arranged in a common guide unit plane (here: the drawing plane of Figure 2), which preferably runs at least essentially parallel to the parallel guide direction PFR.
  • a common guide unit plane here: the drawing plane of Figure 2
  • the first guide unit 109.1 and the second guide unit 109.2 preferably (as in the present example) have a sufficiently large distance FEA from one another along the parallel guide direction PFR in order to achieve good support of tilting moments about a direction transverse to the parallel guide direction PFR.
  • the second guide unit 109.2 is spaced from the first guide unit 109.1 along the parallel guide direction PFR by a guide unit distance FEA, the first guide unit 109.1 having a maximum first transverse dimension QA1 perpendicular to the parallel guide direction PFR and the guide unit distance then 10 % to 1000%, preferably 50% to 500%, more preferably 100% to 400%, of the maximum first transverse dimension QA1.
  • first and second guide units 109.1, 109.2 can be sufficient to provide the desired relative longitudinal guidance or parallel guidance between the first and second component 108.8, 108.2 to achieve.
  • further guide units 109.3, 109.4 can also be provided (as in the present example), which in turn are preferably designed in the manner of the first guide unit 109.1.
  • the further guide units 109.3, 109.4 (as in the present example) can be designed at least essentially identical to the first guide unit 109.1.
  • the third management unit is 109.3 of the first management unit
  • the transverse rigidity of the guide device 109 can be increased in an advantageous manner.
  • the second guide unit 109.2 also has a second four-bar link device 109.14 and a second intermediate element 109.15, with the second four-bar link mechanism 109.14 and the second intermediate element 109.15 acting kinematically in series with one another during operation between the first component 108.8 and the second component 108.2.
  • the second intermediate element 109.15 is via a fifth joint 109.20 of the second guide unit
  • the arrangement of the first to fifth joints of the second guide unit 109.2 is in turn coordinated with one another in such a way that in normal operation a deflection of the second instantaneous rotation pole MP2 with respect to a third reference plane RE3, which is perpendicular to the
  • Parallel guide direction PFR and through the fifth joint 109.20 is at most 0% to 5%, preferably at most 0% to 2%, more preferably at most 0% to 0.5%, of the second distance (AP2 - not shown) between the second instantaneous center of rotation MP2 and the fifth joint 109.20 (second compensating joint 109.20) of the second guide unit 109.2, which in the undeflected initial state of the guide arrangement 109 (shown in Figure 2) is parallel to the third reference plane RE3.
  • Such a design can (as in the present example) also be used for one or several additional guide units (for example the above-mentioned third guide unit 109.3 and/or fourth guide unit 109.4) can be selected. This allows the advantages and variants described above in connection with the corresponding design of the first guide unit 109.1 to be realized to the same extent, so that reference is made to the above explanations in this regard.
  • FIG. 5 shows a guide unit 109.1, as can be used in the example of FIGS. 2 to 4.
  • the guide unit 109.1 is provided with leaf spring-like solid joints 109.7 to 109.11.
  • the solid-state joints 109.7 to 109.11 are at least essentially flat in the undeflected initial state shown.
  • the leaf spring plane or the leaf spring longitudinal direction of the solid joints 109.7, 109.8, 109.9 and 109.10 is each inclined to the first reference plane RE1.
  • the leaf spring longitudinal direction of the joints 109.7 and 109.9 is oriented parallel to the connecting line VG3 of the joints 109.7 and 109.9, while the respective leaf spring plane or leaf spring longitudinal direction of the joints 109.8 and 109.10 are oriented parallel to the connecting line VG4 of the joints 109.8 and 109.10.
  • FIG. 6 shows a guide unit 109.1, as can also be used in the example of FIGS. 2 to 4.
  • the guide unit 109.1 is also provided with leaf spring-like solid joints 109.7 to 109.11.
  • the solid-state joints 109.7 to 109.11 are at least essentially flat in the undeflected initial state shown.
  • the respective leaf spring plane or the leaf spring longitudinal direction of the joints 109.7, 109.8, 109.9 and 109.10 is oriented perpendicular to the parallel guide direction of the linear guide 109 or parallel to the first reference plane RE1.
  • transverse rigidity cannot be achieved as high as with the design from FIG. 5.
  • one advantage is that the transverse rigidity drops less sharply with increasing deflection. With the appropriate configuration, a slight increase in transverse stiffness can even be achieved with increasing deflection.
  • the orientation of the respective leaf spring plane or the longitudinal direction of the leaf spring to the first reference plane RE1 or to the can be determined (independently of the remaining design of the guide unit 109.1).
  • the connecting straight line of the associated joints 109.7 to 109.10 advantageously influence the transverse stiffness in the undeflected state or its change with increasing deflection.
  • the roles or functions of the first component and the second component can also be swapped.
  • the second component can be part of an optical unit of the imaging device 101, while the first component can then be part of a correspondingly associated support structure of the imaging device 101.
  • the first component is part of an optical unit of the imaging device, in particular a facet unit of the imaging device, the optical unit comprising an optical surface.
  • the optical surface has an area of 0.1 mm 2 to 200 mm 2 , preferably 0.5 mm 2 to 100 mm 2 , more preferably 1.0 mm 2 to 50 mm 2 .
  • the optical surface preferably has a maximum dimension of 2 mm to 50 mm, preferably 3 mm to 25 mm, more preferably 4 mm to 10 mm.
  • the optical surface is an at least substantially flat surface.
  • the optical surface is a reflective surface.
  • the facet mirror 102.8 can comprise a plurality N of guide arrangements 109 according to the invention, wherein the guide arrangements 109 are connected to a common support structure 108.2.
  • the plurality K of optical elements 108.1 can have the value 100 to 100,000, preferably 100 to 10,000, more preferably 1,000 to 10,000.
  • the optical elements 108.1 can be arranged to form a narrow gap, wherein the gap has a gap width and the gap width in an assembled state is 0.01 mm to 0.2 mm, preferably 0.02 mm to 0.1 mm, more preferably 0.04 mm to 0.08 mm.
  • the present invention has been described above exclusively using examples from the field of microlithography. However, it is understood that the invention can also be used in connection with any other optical applications, in particular imaging methods at other wavelengths, in which similar problems arise with regard to tilt adjustment or linear displacements, such as for focus corrections of components in a small installation space. Furthermore, the invention can be used in connection with the inspection of objects, such as so-called mask inspection, in which the masks used for microlithography are examined for their integrity, etc. In place of the wafer 105.1 in FIG. 1, for example, there is a sensor unit which records the image of the projection pattern of the reticle 104.1 (for further processing). This mask inspection can then take place at essentially the same wavelength that is used in the later microlithography process. However, any wavelengths that deviate from this can also be used for the inspection.
  • mask inspection In place of the wafer 105.1 in FIG. 1, for example, there is a sensor unit which records the image of the projection pattern of the reticle 104.1 (for further processing). This mask inspection can then take place

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un agencement de guidage pour guider un premier et un second composant (108.8, 108.2) d'un dispositif d'imagerie avec une première et une seconde unité de guidage (109.1, 109.2), qui fonctionnent cinématiquement parallèlement l'une à l'autre entre le premier et le second composant à la manière d'un guide parallèle le long d'un dispositif de guidage parallèle. Pendant le fonctionnement, il y a une déviation de guidage parallèle maximale entre le premier et le second composant. Au moins la première unité de guidage (109.1) présente un dispositif à quatre articulations (109.5) et un élément intermédiaire (109.6) qui fonctionnent cinématiquement en série l'un par rapport à l'autre entre le premier et le second composant. Pendant le fonctionnement, une première et une deuxième articulation (109.7, 109.8) agissent sur le premier composant, tandis qu'une troisième et une quatrième articulation (109.9, 109.10) agissent sur l'élément intermédiaire, et par conséquent le dispositif à quatre articulations définit un centre de révolution du premier composant par rapport à l'élément intermédiaire. L'élément intermédiaire est articulé sur le second composant au moyen d'une cinquième articulation (109.11). L'agencement des articulations est coordonné de telle sorte qu'une déviation du centre de révolution par rapport à un premier plan de référence, qui s'étend perpendiculairement au dispositif de guidage parallèle et passe par la cinquième articulation, est d'au plus 0 % à 5 % d'une première distance entre le centre de révolution et la cinquième articulation, qui est parallèle au premier plan de référence dans un état de départ non dévié.
PCT/EP2023/074124 2022-09-23 2023-09-04 Guidage de composants d'un dispositif optique Ceased WO2024061599A1 (fr)

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US20180074303A1 (en) 2015-04-14 2018-03-15 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure unit including same
DE102018214223A1 (de) * 2018-08-23 2018-11-08 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel
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US6573978B1 (en) 1999-01-26 2003-06-03 Mcguire, Jr. James P. EUV condenser with non-imaging optics
DE10205425A1 (de) 2001-11-09 2003-05-22 Zeiss Carl Smt Ag Facettenspiegel mit mehreren Spiegelfacetten
US20060132747A1 (en) 2003-04-17 2006-06-22 Carl Zeiss Smt Ag Optical element for an illumination system
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DE102008009600A1 (de) 2008-02-15 2009-08-20 Carl Zeiss Smt Ag Facettenspiegel zum Einsatz in einer Projektionsbelichtungsanlage für die Mikro-Lithographie
WO2012175116A1 (fr) 2011-06-21 2012-12-27 Carl Zeiss Smt Gmbh Dispositif de miroir à facettes
DE102013223017A1 (de) * 2013-11-12 2014-11-20 Carl Zeiss Smt Gmbh Optisches Modul
DE102014224991A1 (de) * 2014-12-05 2016-06-09 Carl Zeiss Smt Gmbh Verstellsystem-Bauelement, Baugruppe, Spiegelanordnung und Projektionsbelichtungsanlage für dieMikrolithographie
US20180074303A1 (en) 2015-04-14 2018-03-15 Carl Zeiss Smt Gmbh Imaging optical unit and projection exposure unit including same
DE102018214223A1 (de) * 2018-08-23 2018-11-08 Carl Zeiss Smt Gmbh Pupillenfacettenspiegel
DE102022210035A1 (de) 2022-09-23 2024-03-28 Carl Zeiss Smt Gmbh Führung von komponenten einer optischen einrichtung

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