WO2024048375A1 - Boron nitride powder and resin composition - Google Patents
Boron nitride powder and resin composition Download PDFInfo
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- WO2024048375A1 WO2024048375A1 PCT/JP2023/030197 JP2023030197W WO2024048375A1 WO 2024048375 A1 WO2024048375 A1 WO 2024048375A1 JP 2023030197 W JP2023030197 W JP 2023030197W WO 2024048375 A1 WO2024048375 A1 WO 2024048375A1
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- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L101/00—Compositions of unspecified macromolecular compounds
Definitions
- the present invention relates to boron nitride powder and a resin composition.
- Boron nitride has lubricity, high thermal conductivity, and insulation properties, and is used in various applications such as solid lubricants, mold release materials, raw materials for cosmetics, heat dissipation materials, and heat-resistant insulating sintered bodies. used for a purpose.
- Patent Document 1 describes a hexagonal boron nitride powder made of primary particles of hexagonal boron nitride that can impart high thermal conductivity and high dielectric strength to a resin composition obtained by filling a resin. Contains aggregated particles, has a BET specific surface area of 0.7 to 1.3 m 2 /g, and has an oil absorption amount of 80 g/100 g or less measured based on JIS K 5101-13-1. A hexagonal boron nitride powder is disclosed.
- the main objective of the present invention is to provide a novel boron nitride powder.
- the present invention provides the following [1] to [5].
- [1] A boron nitride powder containing boron nitride particles having pores, which has a differential pore volume of 1.2 ⁇ m or less in a curve of differential pore volume against pore radius measured by a mercury porosimeter.
- [2] The boron nitride powder according to [1], wherein the cumulative pore volume in a range where the pore radius is 1.2 ⁇ m or less is 0.2 ml/g or less.
- [3] The boron nitride powder according to [1] or [2], which has a maximum value of 0.4 ml/g or less.
- [4] The boron nitride powder according to any one of [1] to [3], which has a maximum value of 0.1 ml/g or more.
- [5] A resin composition containing the boron nitride powder according to any one of [1] to [4] and a resin.
- a novel boron nitride powder can be provided.
- 1 is a graph of X-ray diffraction measurement results of boron nitride powder obtained in Example 1.
- 1 is a pore size distribution of boron nitride powder obtained in Example 1.
- 1 is a pore size distribution of boron nitride powder obtained in Example 2. It is a pore size distribution of the boron nitride powder obtained in Example 3.
- 1 is a pore size distribution of boron nitride powder obtained in Comparative Example 1.
- the boron nitride powder according to the present embodiment includes boron nitride particles having pores, and may be an aggregate of a plurality of boron nitride particles (boron nitride particles having pores).
- Each of the plurality of boron nitride particles is composed of, for example, a plurality of boron nitride pieces.
- the pores of the boron nitride particles may be formed between a plurality of boron nitride pieces.
- the boron nitride pieces are made of boron nitride and may have, for example, a scale-like shape.
- the plurality of boron nitride pieces may be in physical contact with each other or may be chemically bonded.
- the fact that the plurality of boron nitride pieces are chemically bonded to each other can be confirmed by using SEM, since no boundaries between the boron nitride pieces are observed at the joints between the boron nitride pieces.
- the boron nitride particles may have a cross section that includes a region where a plurality of boron nitride pieces are stacked. The fact that multiple boron nitride pieces are stacked is confirmed by observing the cross section of the boron nitride particles using SEM, and confirming that the multiple boron nitride pieces are arranged side by side in the thickness direction of the boron nitride pieces. can.
- the average thickness of the boron nitride pieces may be 0.5 ⁇ m or more, 1 ⁇ m or more, or 1.5 ⁇ m or more, and 5 ⁇ m or less.
- the average length of the boron nitride pieces in the longitudinal direction may be, for example, 1 ⁇ m or more and 10 ⁇ m or less.
- the average thickness and average length in the longitudinal direction of the boron nitride pieces can be determined by using an SEM to observe the cross section of the boron nitride particles at a magnification of 1,000 times using an image analysis software (for example, "Mac- It is defined as the average value of the thickness and longitudinal length of 40 boron nitride pieces measured in the SEM image.
- the boron nitride particles may consist essentially of boron nitride. That the boron nitride particles are substantially composed only of boron nitride can be confirmed by detecting only a peak derived from boron nitride in X-ray diffraction measurement.
- Boron nitride powder has a pore radius of 1.2 ⁇ m or less in a curve of differential pore volume versus pore radius (horizontal axis: pore radius, vertical axis: differential pore volume) measured using a mercury porosimeter. It has a maximum value (peak) within the range. The maximum value is a maximum value such that the slope of the straight line connecting the point where the differential pore volume curve rises and the point where the differential pore volume reaches the maximum value is 0.8 or less. .
- the differential pore volume at the point where the curve of differential pore volume rises in the range where the pore radius is 1.2 ⁇ m or less is defined as V 1 (ml/ g)
- the pore radius when the differential pore volume is V 1 is R 1 ( ⁇ m)
- the differential pore volume at the point where the differential pore volume reaches its maximum value is V 2 (ml/g)
- the boron nitride powder has a peak such that the slope of the above straight line (the slope a expressed by the above formula (1)) is 0.8 or less in the curve of the differential pore volume against the pore radius.
- Each boron nitride particle in the boron nitride powder has few pores with a small pore radius, so the volume of voids existing inside the particle is also small. Therefore, the boron nitride powder contains dense boron nitride particles, and when such boron nitride powder is mixed with a resin and used as a thermally conductive material (e.g., a heat dissipating material), it is different from the conventional boron nitride powder. It can exhibit higher thermal conductivity than powder.
- the curve of differential pore volume versus pore radius is determined using a mercury porosimeter based on the mercury intrusion method in accordance with JIS R1655:2003.
- the differential pore volume curve is obtained by the following procedure. Specifically, first, the differential pore volume with respect to pressure is measured in the range of 0.40 to 60,000 psia using a mercury porosimeter. At this time, in a logarithmic graph with the logarithm of pressure on the horizontal axis and the differential pore volume on the vertical axis, set the pressure values at which the differential pore volume is measured to be 130 points equally spaced on the horizontal axis. .
- the point at which the differential pore volume curve rises is defined as the point where the differential pore volume becomes 0.02 ml/g. That is, the differential pore volume V 1 in equation (1) is 0.02 ml/g, and the pore radius R 1 is the pore radius when the differential pore volume is 0.02 ml/g. In a range where the differential pore volume is less than 0.02 ml/g, the influence of measurement noise is large, so the point where the differential pore volume becomes 0.02 ml/g is the point at which the differential pore volume curve rises. defined.
- the point with the smallest pore radius among the multiple points is the differential fine. It is defined as the point where the pore volume curve rises.
- the maximum value (peak) of the differential pore volume is defined as a measurement point on the curve of the differential pore volume versus the pore radius at which the change in the differential pore volume with an increase in the pore radius changes from positive to negative. That is, among the measurement points of the differential pore volume, the m-th measurement point (pore radius: R m-1 ( ⁇ m), differential pore volume: V m-1 (ml/g)), the m-th measurement point measurement point (pore radius: R m ( ⁇ m), differential pore volume: V m (ml/g)), and the m+1th measurement point (pore radius: R m+1 ( ⁇ m), differential pore volume :V m+1 (ml/g)), the m-th measurement point that satisfies R m-1 ⁇ R m ⁇ R m+1 and also satisfies V m - V m-1 > 0 and V m +1 - V m ⁇ 0 is defined as the point where the differential pore volume reaches
- V m+1 V m
- V m the m+nth measurement point (pore radius: R m+n ( ⁇ m), differential pore volume: V m+n (ml/g), n: 2 or more, and V m ⁇ V m+n )
- V m + n - V m ⁇ 0 is the differential It is defined as the point where the pore volume reaches its maximum value.
- the point where the pore radius is the smallest among the multiple points is the point of the differential pore volume. It is defined as the point where the maximum value is reached.
- the pore radius R1 may be 0.01 ⁇ m or more, 0.02 ⁇ m or more, 0.04 ⁇ m or more, 0.05 ⁇ m or more, or 0.06 ⁇ m or more, and 0.3 ⁇ m or less, 0.2 ⁇ m or less, 0.15 ⁇ m Below, it may be 0.13 ⁇ m or less, 0.12 ⁇ m or less, or 0.11 ⁇ m or less.
- the maximum value V2 is 0.4 ml/g or less, 0.35 ml/g or less, 0.32 ml/g or less, 0.3 ml/g or less, 0.28 ml/g or less, or 0.26 ml/g or less.
- the amount may be 0.1 ml/g or more, 0.15 ml/g or more, 0.19 ml/g or more, or 0.2 ml/g or more.
- the pore radius R2 may be 0.2 ⁇ m or more, 0.3 ⁇ m or more, 0.4 ⁇ m or more, 0.5 ⁇ m or more, or 0.6 ⁇ m or more, and 1.1 ⁇ m or less, 1 ⁇ m or less, 0.9 ⁇ m or less, It may be 0.8 ⁇ m or less, or 0.7 ⁇ m or less.
- the slope of the above straight line may be 0.7 or less, 0.6 or less, or 0.5 or less, 0.1 or more, 0.2 or more, 0. It may be greater than or equal to .3, or greater than or equal to 0.35.
- the curve of the differential pore volume against the pore radius shows that the change (decrease) in the differential pore volume occurs in the range from the pore radius R2 , where the differential pore volume becomes the maximum value V2 , to the pore radius 1.2 ⁇ m. It may be a gentle curve.
- the minimum value of the differential pore volume in the range from the pore radius R 2 where the differential pore volume becomes the maximum value V 2 to the pore radius 1.2 ⁇ m is set as V 3 (ml/g), and the differential pore volume is
- the cumulative pore volume of boron nitride powder in a range where the pore radius measured by a mercury porosimeter is 1.2 ⁇ m or less is 0.2 ml/g or less, 0.19 ml/g or less, or 0.18 ml/g or less. It's good.
- the cumulative pore volume in the range where the pore radius of boron nitride powder is 1.2 ⁇ m or less can be regarded as the total amount of voids in each boron nitride particle constituting the boron nitride powder. The smaller the integrated pore volume in the following range, the more dense the boron nitride particles become.
- the cumulative pore volume in the range where the pore radius measured by a mercury porosimeter is 1.2 ⁇ m or less is 0.1 ml/g or more, 0.12 ml/g or more, 0.14 ml/g or more, 0.15 ml/g or more , 0.16 ml/g or more, or 0.17 ml/g or more.
- the cumulative pore volume of the boron nitride powder in a range where the pore radius measured by a mercury porosimeter is 500 ⁇ m or less may be 1 ml/g or less, 0.95 ml/g or less, or 0.91 ml/g or less.
- the cumulative pore volume may be 0.7 ml/g or more, 0.8 ml/g or more, 0.85 ml/g or more, 0.88 ml/g or more, or 0.9 ml/g or more.
- the bulk density of the boron nitride powder may be 0.7 g/ml or more, 0.72 g/ml or more, 0.74 g/ml or more, or 0.75 g/ml or more, and 0.9 g/ml or less, 0. It may be 8 g/ml or less, or 0.75 g/ml or less.
- the average particle diameter of the boron nitride powder may be, for example, 10 ⁇ m or more, 20 ⁇ m or more, or 30 ⁇ m or more, and 100 ⁇ m or less, 80 ⁇ m or less, or 60 ⁇ m or less.
- the average particle size of boron nitride powder means the particle size (D50) at which the volume cumulative particle size distribution is 50%, and can be measured by a laser diffraction scattering method.
- the BET specific surface area of boron nitride powder can be measured by the BET multipoint method using nitrogen gas in accordance with JIS Z 8830:2013.
- the BET specific surface area of the boron nitride powder may be 1 m 2 /g or more, 2 m 2 /g or more, or 2.5 m 2 /g or more, and 5 m 2 /g or less, 4 m 2 /g or less, or 3.5 m 2 /g or less.
- the method for producing the above boron nitride powder will be explained below.
- the boron nitride powder is obtained by, for example, nitriding boron carbide particles while hot isostatic pressing (also called “hot isostatic pressing") to obtain boron carbonitride particles (nitriding step); It can be manufactured by a method comprising a step (decarburization step) of decarburizing boron carbonitride particles to obtain boron nitride powder containing boron nitride particles. That is, another embodiment of the present invention is a method for producing such boron nitride powder.
- the method for producing the boron nitride particles is not limited to the above method.
- Boron carbide particles can be produced, for example, by a known production method. For example, there is a method in which boric acid and acetylene black are mixed and then heated in an inert gas atmosphere at 1800 to 2400° C. for 1 to 10 hours to obtain bulk boron carbide particles.
- the bulk boron carbide particles obtained by this method may be subjected to pulverization, sieving, washing, impurity removal, drying, etc. as appropriate.
- the average particle diameter of the boron carbide particles may be, for example, 5 ⁇ m or more, 10 ⁇ m or more, or 15 ⁇ m or more, and 80 ⁇ m or less, 60 ⁇ m or less, or 40 ⁇ m or less.
- the average particle diameter of boron carbide particles means the particle diameter (D50) at which the volume cumulative particle size distribution is 50%, and can be measured by a laser diffraction scattering method.
- boron carbide particles are nitrided to obtain boron carbonitride particles by heating the container filled with boron carbide particles while applying hot isostatic pressure in an atmosphere that allows the nitriding reaction to proceed.
- the container may be, for example, a carbon crucible.
- the hot isostatic pressing can be performed using, for example, a hot isostatic pressing device (for example, manufactured by Kobe Steel, Ltd.).
- the atmosphere in which the nitriding reaction proceeds in the nitriding step may be a nitriding gas atmosphere that nitrides boron carbide particles.
- the nitriding gas may be nitrogen gas, ammonia gas, etc. Nitrogen gas may be used from the viewpoint of ease of nitriding boron carbide particles and from the viewpoint of cost.
- the nitriding gas may be used alone or in combination of two or more, and the proportion of nitrogen gas in the nitriding gas may be 95% by volume or more, 99% by volume or more, or 99.9% by volume or more.
- the pressure in the nitriding step may be 50 MPa or more, 70 MPa or more, or 100 MPa or more.
- the pressure in the nitriding step may be 200 MPa or less or 150 MPa or less.
- the heating temperature in the nitriding step may be 1600° C. or higher or 1700° C. or higher from the viewpoint of sufficiently nitriding the boron carbide particles.
- the heating temperature in the nitriding step may be 2200°C or lower or 2000°C or lower.
- the time for pressurizing and heating in the nitriding step may be 30 minutes, 45 minutes or more, or 1 hour or more from the viewpoint of sufficiently nitriding the boron carbide particles.
- the time for applying pressure and heating in the nitriding step may be 30 hours or less, 20 hours or less, or 10 hours or less.
- the boron carbonitride particles are decarburized by heating a mixture containing the boron carbonitride particles obtained in the nitriding step and a boron source in a container.
- the container may be, for example, a boron nitride crucible.
- Boron sources include boric acid, boron oxide, or mixtures thereof.
- the mixture may further contain other additives used in the art, if necessary.
- the mixing ratio of boron carbonitride particles and boron source is selected as appropriate.
- boric acid or boron oxide is used as a boron source, the proportion of boric acid or boron oxide may be, for example, 50 parts by mass or more or 80 parts by mass or more, and 300 parts by mass or less, based on 100 parts by mass of boron carbonitride. Or it may be 200 parts by mass or less.
- the atmosphere in the decarburization process may be a normal pressure (atmospheric pressure) atmosphere or a pressurized atmosphere.
- the pressure in the decarburization step may be, for example, 0.5 MPa or less or 0.3 MPa or less, and may be 0.01 MPa or more or 0.03 MPa or more.
- the temperature is raised to a predetermined temperature (a temperature at which decarburization can start), and then the temperature is further raised to a holding temperature at the predetermined temperature.
- the predetermined temperature temperature at which decarburization can start
- the rate of temperature increase from a predetermined temperature (temperature at which decarburization can be started) to the holding temperature may be, for example, 5° C./min or less, 4° C./min or less, 3° C./min or less, or 2° C./min or less.
- the holding temperature may be 1800° C. or higher or 2000° C. or higher from the viewpoint of facilitating good particle growth.
- the holding temperature may be 2200°C or less or 2100°C or less.
- the holding time at the holding temperature may be, for example, 0.5 hours or more, 1 hour or more, 3 hours or more, or 5 hours or more, from the viewpoint of good particle growth.
- the holding time at the holding temperature may be, for example, 40 hours or less, 30 hours or less, or 20 hours or less.
- the boron nitride particles (boron nitride powder) obtained as described above may be subjected to a step (classification step) of classifying them using a sieve so as to obtain boron nitride powder having a desired particle size.
- the boron nitride powder described above is suitable for use in, for example, heat dissipation members.
- the boron nitride powder is used, for example, as a resin composition mixed with a resin.
- another embodiment of the present invention is a resin composition containing a resin and the above boron nitride powder.
- the content of the boron nitride powder mentioned above is 50% by volume or more and 55% by volume based on the total volume of the resin composition, from the viewpoint of improving the thermal conductivity of the resin composition and easily obtaining excellent heat dissipation performance.
- the content may be 60% by volume or more, 65% by volume or more, or 70% by volume or more.
- the content of the boron nitride powder is 85% by volume or less, 80% by volume or less, based on the total volume of the resin composition, from the viewpoint of suppressing the generation of pores during molding and the decrease in insulation and mechanical strength. Or it may be 75 volume% or less.
- the resin examples include epoxy resin, silicone resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, unsaturated polyester, fluororesin, polyimide, polyamideimide, polyetherimide, polybutylene terephthalate, polyethylene terephthalate, Polyphenylene ether, polyphenylene sulfide, fully aromatic polyester, polysulfone, liquid crystal polymer, polyether sulfone, polycarbonate, maleimide modified resin, ABS (acrylonitrile-butadiene-styrene) resin, AAS (acrylonitrile-acrylic rubber/styrene) resin, and AES ( Examples include acrylonitrile, ethylene, propylene, diene rubber (styrene) resin.
- the content of the resin may be 15% by volume or more, 20% by volume or more, or 25% by volume or more, and 50% by volume or less, 45% by volume or less, 40% by volume or less, based on the total volume of the resin composition. , 35% by volume or less, or 30% by volume or less.
- the resin composition may further contain a curing agent for curing the resin.
- the curing agent is appropriately selected depending on the type of resin.
- examples of the curing agent include phenol novolac compounds, acid anhydrides, amino compounds, and imidazole compounds.
- the content of the curing agent may be, for example, 0.5 parts by mass or more or 1.0 parts by mass or more, and 15 parts by mass or less or 10 parts by mass or less, based on 100 parts by mass of the resin.
- the resin composition may further contain other components.
- Other components may include a curing accelerator (curing catalyst), a coupling agent, a wetting and dispersing agent, a surface conditioner, and the like.
- curing accelerators examples include phosphorus curing accelerators such as tetraphenylphosphonium tetraphenylborate and triphenyl phosphate, imidazole curing accelerators such as 2-phenyl-4,5-dihydroxymethylimidazole, and trifluorocarbon curing accelerators.
- phosphorus curing accelerators such as tetraphenylphosphonium tetraphenylborate and triphenyl phosphate
- imidazole curing accelerators such as 2-phenyl-4,5-dihydroxymethylimidazole
- trifluorocarbon curing accelerators examples include amine curing accelerators such as boron monoethylamine.
- Examples of the coupling agent include silane coupling agents, titanate coupling agents, and aluminate coupling agents.
- Chemical bonding groups contained in these coupling agents include vinyl groups, epoxy groups, amino groups, methacrylic groups, mercapto groups, and the like.
- wetting and dispersing agents include phosphate ester salts, carboxylic esters, polyesters, acrylic copolymers, block copolymers, and the like.
- surface conditioners examples include acrylic surface conditioners, silicone surface conditioners, vinyl surface conditioners, fluorine surface conditioners, and the like.
- Example 1 Boron carbide particles with an average particle diameter (D50) of 26 ⁇ m were filled in a carbon crucible, and heated at 1800° C. and 196 MPa in a nitrogen gas atmosphere using a hot isostatic press device (manufactured by Kobe Steel). Boron carbide particles were nitrided by heating and pressurizing by HIP method for .5 hours to obtain boron carbonitride particles (B 4 CN 4 ). After mixing 100 parts by mass of the obtained boron carbonitride particles and 150 parts by mass of boric acid (60% by mass of boric acid) using a Henschel mixer, the mixture was filled into a boron nitride crucible and heated using a resistance heating furnace.
- D50 average particle diameter
- Coarse particles were obtained by heating under conditions of a holding temperature of 2000° C., 0.03 MPa, and a holding time of 5 hours in a nitrogen gas atmosphere at normal pressure. After the coarse particles were crushed in a mortar for 10 minutes, they were classified using a nylon sieve with a mesh size of 175 ⁇ m. As a result, a particle aggregate (powder) was obtained.
- Example 2 A powder was obtained in the same manner as in Example 1, except that the amount of boric acid was changed to 100 parts by mass (50% by mass of boric acid).
- Example 3 A powder was obtained in the same manner as in Example 1, except that the boric acid was changed to 81.8 parts by mass (boric acid 45% by mass).
- Example 1 The same as in Example 1 except that boron carbide particles were nitrided by heating and pressurizing in a nitrogen gas atmosphere at 2000° C. and 0.85 MPa for 25 hours using a resistance heating furnace to obtain boron carbonitride particles. Boron nitride powder was obtained.
- the volume curve is shown in FIG. From the obtained differential pore volume curve, the above-mentioned pore radii R 1 , R 2 and R 3 , differential pore volumes V 2 and V 3 , straight line slopes a and b, and pore radius up to 1.2 ⁇ m are determined. The cumulative pore volume and the cumulative pore volume up to a pore radius of 500 ⁇ m were calculated. The results are shown in Table 1. Further, the bulk density of the boron nitride powder was calculated from the density of the boron nitride particles (2.26 g/ml) and the integrated pore volume.
- press heating and pressing was performed for 60 minutes at a temperature of 150° C. and a pressure of 160 kg/cm 2 to produce a 0.5 mm sheet-like heat dissipating material.
- a measurement sample with a size of 10 mm x 10 mm was cut out from the prepared heat dissipation material, and the thermal diffusivity A (m 2 /sec) of the measurement sample was measured using a laser flash method using a xenon flash analyzer (manufactured by NETZSCH, LFA447NanoFlash). was measured. Further, the specific gravity B (kg/m 3 ) of the measurement sample was measured by the Archimedes method.
- the thermal conductivity of the heat dissipating material produced using the boron nitride powder obtained in Example 1 was 22 W/(m K), and the thermal conductivity of the heat dissipating material produced using the boron nitride powder obtained in Comparative Example 1 was The thermal conductivity was 17 W/(m ⁇ K).
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Abstract
Description
本発明は、窒化ホウ素粉末及び樹脂組成物に関する。 The present invention relates to boron nitride powder and a resin composition.
窒化ホウ素は、潤滑性、高熱伝導性、及び絶縁性を有しており、固体潤滑材、離型材、化粧料の原料、放熱材、並びに、耐熱性を有する絶縁性焼結体等の種々の用途に利用されている。 Boron nitride has lubricity, high thermal conductivity, and insulation properties, and is used in various applications such as solid lubricants, mold release materials, raw materials for cosmetics, heat dissipation materials, and heat-resistant insulating sintered bodies. used for a purpose.
例えば、特許文献1には、樹脂に充填して得られる樹脂組成物に高い熱伝導性と高い絶縁耐力を付与することが可能な六方晶窒化ホウ素粉末として、六方晶窒化ホウ素の一次粒子からなる凝集粒子を含み、BET比表面積が0.7~1.3m2/gであり、且つ、JIS K 5101-13-1に基づき測定される吸油量が80g/100g以下であることを特徴とする六方晶窒化ホウ素粉末が開示されている。
For example,
本発明の主な目的は、新規な窒化ホウ素粉末を提供することである。 The main objective of the present invention is to provide a novel boron nitride powder.
本発明は、いくつか側面において、以下の[1]~[5]を提供する。
[1] 細孔を有する窒化ホウ素粒子を含む窒化ホウ素粉末であって、水銀ポロシメーターによって測定される細孔半径に対する微分細孔体積の曲線において、細孔半径が1.2μm以下の範囲で、微分細孔体積の曲線が立ち上がる点と、微分細孔体積が極大値となる点とを直線で結んだときの直線の傾きが0.8以下である、窒化ホウ素粉末。
[2] 細孔半径が1.2μm以下の範囲における積算細孔体積が0.2ml/g以下である、[1]に記載の窒化ホウ素粉末。
[3] 極大値が0.4ml/g以下である、[1]又は[2]に記載の窒化ホウ素粉末。
[4] 極大値が0.1ml/g以上である、[1]~[3]のいずれかに記載の窒化ホウ素粉末。
[5] [1]~[4]のいずれかに記載の窒化ホウ素粉末と、樹脂と、を含有する、樹脂組成物。
In some aspects, the present invention provides the following [1] to [5].
[1] A boron nitride powder containing boron nitride particles having pores, which has a differential pore volume of 1.2 μm or less in a curve of differential pore volume against pore radius measured by a mercury porosimeter. A boron nitride powder having a slope of 0.8 or less when a straight line connects the point where the pore volume curve rises and the point where the differential pore volume reaches its maximum value.
[2] The boron nitride powder according to [1], wherein the cumulative pore volume in a range where the pore radius is 1.2 μm or less is 0.2 ml/g or less.
[3] The boron nitride powder according to [1] or [2], which has a maximum value of 0.4 ml/g or less.
[4] The boron nitride powder according to any one of [1] to [3], which has a maximum value of 0.1 ml/g or more.
[5] A resin composition containing the boron nitride powder according to any one of [1] to [4] and a resin.
本発明の一側面によれば、新規な窒化ホウ素粉末を提供することができる。 According to one aspect of the present invention, a novel boron nitride powder can be provided.
以下、本発明の実施形態について詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail.
本実施形態に係る窒化ホウ素粉末は、細孔を有する窒化ホウ素粒子を含んでおり、複数の窒化ホウ素粒子(細孔を有する窒化ホウ素粒子)の集合体であってよい。 The boron nitride powder according to the present embodiment includes boron nitride particles having pores, and may be an aggregate of a plurality of boron nitride particles (boron nitride particles having pores).
複数の窒化ホウ素粒子のそれぞれは、例えば、複数の窒化ホウ素片により構成されている。窒化ホウ素粒子の細孔は、複数の窒化ホウ素片間に形成されていてよい。窒化ホウ素片は、窒化ホウ素により形成されており、例えば鱗片状の形状を有していてよい。 Each of the plurality of boron nitride particles is composed of, for example, a plurality of boron nitride pieces. The pores of the boron nitride particles may be formed between a plurality of boron nitride pieces. The boron nitride pieces are made of boron nitride and may have, for example, a scale-like shape.
複数の窒化ホウ素片同士は、物理的に接触していてもよく、化学的に結合していてもよい。複数の窒化ホウ素片同士が化学的に結合していることは、SEMを用いて、窒化ホウ素片同士の結合部分に窒化ホウ素片間の境界が観察されないことにより確認できる。 The plurality of boron nitride pieces may be in physical contact with each other or may be chemically bonded. The fact that the plurality of boron nitride pieces are chemically bonded to each other can be confirmed by using SEM, since no boundaries between the boron nitride pieces are observed at the joints between the boron nitride pieces.
窒化ホウ素粒子は、複数の窒化ホウ素片が積層している領域を有する断面を有していてもよい。複数の窒化ホウ素片が積層していていることは、SEMを用いて窒化ホウ素粒子の断面を観察し、複数の窒化ホウ素片が窒化ホウ素片の厚さ方向に並んで配置されていることにより確認できる。 The boron nitride particles may have a cross section that includes a region where a plurality of boron nitride pieces are stacked. The fact that multiple boron nitride pieces are stacked is confirmed by observing the cross section of the boron nitride particles using SEM, and confirming that the multiple boron nitride pieces are arranged side by side in the thickness direction of the boron nitride pieces. can.
窒化ホウ素片の平均厚さは、0.5μm以上、1μm以上、又は1.5μm以上であってよく、5μm以下であってよい。窒化ホウ素片の長手方向の平均長さは、例えば、1μm以上であってよく、10μm以下であってよい。窒化ホウ素片の平均厚さ及び長手方向の平均長さは、SEMを用いて、倍率1000倍で窒化ホウ素粒子の断面を観察したSEM画像を画像解析ソフトウェア(例えば、株式会社マウンテック製の「Mac-view」)に取り込み、当該SEM画像において測定される40個の窒化ホウ素片の厚さ及び長手方向の長さの平均値として定義される。 The average thickness of the boron nitride pieces may be 0.5 μm or more, 1 μm or more, or 1.5 μm or more, and 5 μm or less. The average length of the boron nitride pieces in the longitudinal direction may be, for example, 1 μm or more and 10 μm or less. The average thickness and average length in the longitudinal direction of the boron nitride pieces can be determined by using an SEM to observe the cross section of the boron nitride particles at a magnification of 1,000 times using an image analysis software (for example, "Mac- It is defined as the average value of the thickness and longitudinal length of 40 boron nitride pieces measured in the SEM image.
窒化ホウ素粒子は、実質的に窒化ホウ素のみからなってよい。窒化ホウ素粒子が実質的に窒化ホウ素のみからなることは、X線回折測定において、窒化ホウ素に由来するピークのみが検出されることにより確認できる。 The boron nitride particles may consist essentially of boron nitride. That the boron nitride particles are substantially composed only of boron nitride can be confirmed by detecting only a peak derived from boron nitride in X-ray diffraction measurement.
窒化ホウ素粉末は、水銀ポロシメーターを用いて測定される細孔半径に対する微分細孔体積の曲線(横軸:細孔半径、縦軸:微分細孔体積)において、細孔半径が1.2μm以下の範囲に、極大値(ピーク)を有する。当該極大値は、微分細孔体積の曲線が立ち上がる点と、微分細孔体積が極大値となる点とを直線で結んだときの直線の傾きが0.8以下となるような極大値である。 Boron nitride powder has a pore radius of 1.2 μm or less in a curve of differential pore volume versus pore radius (horizontal axis: pore radius, vertical axis: differential pore volume) measured using a mercury porosimeter. It has a maximum value (peak) within the range. The maximum value is a maximum value such that the slope of the straight line connecting the point where the differential pore volume curve rises and the point where the differential pore volume reaches the maximum value is 0.8 or less. .
より具体的には、細孔半径に対する微分細孔体積の曲線において、細孔半径が1.2μm以下の範囲で、微分細孔体積の曲線が立ち上がる点の微分細孔体積をV1(ml/g)、微分細孔体積がV1であるときの細孔半径をR1(μm)、微分細孔体積が極大値となる点の微分細孔体積をV2(ml/g)、微分細孔体積が極大値V2であるときの細孔半径をR2(μm)として、以下の式(1)で表される傾きaが0.8以下である。
a=(V2-V1)/(R2-R1) ・・・(1)
More specifically, in the curve of differential pore volume versus pore radius, the differential pore volume at the point where the curve of differential pore volume rises in the range where the pore radius is 1.2 μm or less is defined as V 1 (ml/ g), the pore radius when the differential pore volume is V 1 is R 1 (μm), the differential pore volume at the point where the differential pore volume reaches its maximum value is V 2 (ml/g), the differential fine The slope a expressed by the following formula (1) is 0.8 or less, where the pore radius when the pore volume is the maximum value V 2 is R 2 (μm).
a=(V 2 -V 1 )/(R 2 -R 1 )...(1)
窒化ホウ素粉末は、細孔半径に対する微分細孔体積の曲線において、上記の直線の傾き(上記式(1)で表される傾きa)が0.8以下となるようなピークを有することで、窒化ホウ素粉末中の各窒化ホウ素粒子は、細孔半径が小さい細孔が少ないため、粒子内部に存在する空隙の体積も小さくなる。したがって、窒化ホウ素粉末は緻密な窒化ホウ素粒子を含むこととなり、このような窒化ホウ素粉末は、例えば樹脂に混合されて熱伝導材料(例えば、放熱材)として用いられた場合に、従来の窒化ホウ素粉末に比べて、高い熱伝導率を発現し得る。 The boron nitride powder has a peak such that the slope of the above straight line (the slope a expressed by the above formula (1)) is 0.8 or less in the curve of the differential pore volume against the pore radius. Each boron nitride particle in the boron nitride powder has few pores with a small pore radius, so the volume of voids existing inside the particle is also small. Therefore, the boron nitride powder contains dense boron nitride particles, and when such boron nitride powder is mixed with a resin and used as a thermally conductive material (e.g., a heat dissipating material), it is different from the conventional boron nitride powder. It can exhibit higher thermal conductivity than powder.
細孔半径に対する微分細孔体積の曲線は、水銀ポロシメーターを用いて、JIS R1655:2003に準拠して水銀圧入法に基づいて行われる。微分細孔体積の曲線は、以下の手順により得られる。具体的には、まず、水銀ポロシメーターにて、0.40~60000psiaの範囲で圧力に対する微分細孔体積を測定する。このとき、圧力の対数を横軸に、微分細孔体積を縦軸にとった対数グラフにおいて、微分細孔体積を測定する圧力の値が横軸に等間隔で130点となるように設定する。そして、圧力を細孔半径に変換した上で、変換された細孔半径の対数に対する測定された微分気孔体積をプロットして、プロット間を直線で繋ぐことにより、細孔半径に対する微分細孔体積の曲線が得られる。 The curve of differential pore volume versus pore radius is determined using a mercury porosimeter based on the mercury intrusion method in accordance with JIS R1655:2003. The differential pore volume curve is obtained by the following procedure. Specifically, first, the differential pore volume with respect to pressure is measured in the range of 0.40 to 60,000 psia using a mercury porosimeter. At this time, in a logarithmic graph with the logarithm of pressure on the horizontal axis and the differential pore volume on the vertical axis, set the pressure values at which the differential pore volume is measured to be 130 points equally spaced on the horizontal axis. . Then, by converting the pressure to the pore radius, plotting the measured differential pore volume against the logarithm of the converted pore radius, and connecting the plots with a straight line, we can calculate the differential pore volume against the pore radius. A curve is obtained.
微分細孔体積の曲線が立ち上がる点は、微分細孔体積が0.02ml/gになる点として定義される。すなわち、式(1)における微分細孔体積V1は、0.02ml/gであり、細孔半径R1は、微分細孔体積が0.02ml/gになるときの細孔半径である。微分細孔体積が0.02ml/g未満の範囲では、測定上のノイズの影響が大きいため、微分細孔体積が0.02ml/gになる点が、微分細孔体積の曲線が立ち上がる点と定義される。なお、細孔半径が1.2μm以下の範囲で、微分細孔体積が0.02ml/gになる点が複数存在する場合は、複数の点のうち、細孔半径が最も小さい点が微分細孔体積の曲線が立ち上がる点と定義される。 The point at which the differential pore volume curve rises is defined as the point where the differential pore volume becomes 0.02 ml/g. That is, the differential pore volume V 1 in equation (1) is 0.02 ml/g, and the pore radius R 1 is the pore radius when the differential pore volume is 0.02 ml/g. In a range where the differential pore volume is less than 0.02 ml/g, the influence of measurement noise is large, so the point where the differential pore volume becomes 0.02 ml/g is the point at which the differential pore volume curve rises. defined. In addition, if there are multiple points where the differential pore volume is 0.02 ml/g in a range where the pore radius is 1.2 μm or less, the point with the smallest pore radius among the multiple points is the differential fine. It is defined as the point where the pore volume curve rises.
微分細孔体積の極大値(ピーク)は、細孔半径に対する微分細孔体積の曲線において、細孔半径の増加に伴う微分細孔体積の変化が正から負に変わる測定点として定義される。すなわち、微分細孔体積の測定点のうち、m-1番目の測定点(細孔半径:Rm-1(μm)、微分細孔体積:Vm-1(ml/g))、m番目の測定点(細孔半径:Rm(μm)、微分細孔体積:Vm(ml/g))、及び、m+1番目の測定点(細孔半径:Rm+1(μm)、微分細孔体積:Vm+1(ml/g))について、Rm-1<Rm<Rm+1を満たし、かつ、Vm-Vm-1>0及びVm+1-Vm<0を満たすm番目の測定点が、微分細孔体積が極大値となる点として定義される。Vm+1=Vmの場合、m+n番目の測定点(細孔半径:Rm+n(μm)、微分細孔体積:Vm+n(ml/g)、n:2以上であり、且つVm≠Vm+nを満たす最小の整数)について、Rm-1<Rm<Rm+nを満たし、かつ、Vm-Vm-1>0及びVm+n-Vm<0を満たすm番目の測定点が、微分細孔体積が極大値となる点として定義される。なお、細孔半径が1.2μm以下の範囲で、微分細孔体積が極大値となる点が複数存在する場合は、複数の点のうち、細孔半径が最も小さい点が微分細孔体積の極大値となる点と定義される。 The maximum value (peak) of the differential pore volume is defined as a measurement point on the curve of the differential pore volume versus the pore radius at which the change in the differential pore volume with an increase in the pore radius changes from positive to negative. That is, among the measurement points of the differential pore volume, the m-th measurement point (pore radius: R m-1 (μm), differential pore volume: V m-1 (ml/g)), the m-th measurement point measurement point (pore radius: R m (μm), differential pore volume: V m (ml/g)), and the m+1th measurement point (pore radius: R m+1 (μm), differential pore volume :V m+1 (ml/g)), the m-th measurement point that satisfies R m-1 < R m < R m+1 and also satisfies V m - V m-1 > 0 and V m +1 - V m < 0 is defined as the point where the differential pore volume reaches its maximum value. When V m+1 = V m , the m+nth measurement point (pore radius: R m+n (μm), differential pore volume: V m+n (ml/g), n: 2 or more, and V m ≠ V m+n ), the mth measurement point that satisfies R m-1 < R m < R m+n and also satisfies V m - V m-1 > 0 and V m + n - V m < 0 is the differential It is defined as the point where the pore volume reaches its maximum value. In addition, if there are multiple points where the differential pore volume has a maximum value in a range where the pore radius is 1.2 μm or less, the point where the pore radius is the smallest among the multiple points is the point of the differential pore volume. It is defined as the point where the maximum value is reached.
細孔半径R1は、0.01μm以上、0.02μm以上、0.04μm以上、0.05μm以上、又は0.06μm以上であってよく、0.3μm以下、0.2μm以下、0.15μm以下、0.13μm以下、0.12μm以下、又は0.11μm以下であってよい。 The pore radius R1 may be 0.01 μm or more, 0.02 μm or more, 0.04 μm or more, 0.05 μm or more, or 0.06 μm or more, and 0.3 μm or less, 0.2 μm or less, 0.15 μm Below, it may be 0.13 μm or less, 0.12 μm or less, or 0.11 μm or less.
極大値V2は、0.4ml/g以下、0.35ml/g以下、0.32ml/g以下、0.3ml/g以下、0.28ml/g以下、又は0.26ml/g以下であってよく、0.1ml/g以上、0.15ml/g以上、0.19ml/g以上、又は0.2ml/g以上であってよい。 The maximum value V2 is 0.4 ml/g or less, 0.35 ml/g or less, 0.32 ml/g or less, 0.3 ml/g or less, 0.28 ml/g or less, or 0.26 ml/g or less. The amount may be 0.1 ml/g or more, 0.15 ml/g or more, 0.19 ml/g or more, or 0.2 ml/g or more.
細孔半径R2は、0.2μm以上、0.3μm以上、0.4μm以上、0.5μm以上、又は0.6μm以上であってよく、1.1μm以下、1μm以下、0.9μm以下、0.8μm以下、又は0.7μm以下であってよい。 The pore radius R2 may be 0.2 μm or more, 0.3 μm or more, 0.4 μm or more, 0.5 μm or more, or 0.6 μm or more, and 1.1 μm or less, 1 μm or less, 0.9 μm or less, It may be 0.8 μm or less, or 0.7 μm or less.
上記の直線の傾き(式(1)で表される傾きa)は、0.7以下、0.6以下、又は0.5以下であってよく、0.1以上、0.2以上、0.3以上、又は0.35以上であってよい。 The slope of the above straight line (the slope a expressed by formula (1)) may be 0.7 or less, 0.6 or less, or 0.5 or less, 0.1 or more, 0.2 or more, 0. It may be greater than or equal to .3, or greater than or equal to 0.35.
細孔半径に対する微分細孔体積の曲線は、微分細孔体積が極大値V2になる細孔半径R2から細孔半径1.2μmまでの範囲において、微分細孔体積の変化(減少)が緩やかな曲線であってよい。具体的には、微分細孔体積が極大値V2になる細孔半径R2から細孔半径1.2μmまでの範囲における微分細孔体積の最小値をV3(ml/g)とし、微分細孔体積が最小値V3になる細孔半径をR3(μm)とするとき、極大値V2と最小値V3とを結んだ直線の傾きb=(V2-V3)/(R2-R3)は、-0.01以下、-0.04以下、又は-0.05以下であってよく、-0.5以上、-0.4以上、-0.3以上、-0.2以上、又は-0.1以上であってよい。 The curve of the differential pore volume against the pore radius shows that the change (decrease) in the differential pore volume occurs in the range from the pore radius R2 , where the differential pore volume becomes the maximum value V2 , to the pore radius 1.2 μm. It may be a gentle curve. Specifically, the minimum value of the differential pore volume in the range from the pore radius R 2 where the differential pore volume becomes the maximum value V 2 to the pore radius 1.2 μm is set as V 3 (ml/g), and the differential pore volume is When the pore radius at which the pore volume reaches the minimum value V 3 is R 3 (μm), the slope of the straight line connecting the maximum value V 2 and the minimum value V 3 is b = (V 2 - V 3 )/( R 2 -R 3 ) may be -0.01 or less, -0.04 or less, or -0.05 or less, -0.5 or more, -0.4 or more, -0.3 or more, - It may be 0.2 or more, or -0.1 or more.
窒化ホウ素粉末の、水銀ポロシメーターによって測定される細孔半径が1.2μm以下の範囲における積算細孔体積は、0.2ml/g以下、0.19ml/g以下、又は0.18ml/g以下であってよい。窒化ホウ素粉末の細孔半径が1.2μm以下の範囲における積算細孔体積は、窒化ホウ素粉末を構成する各窒化ホウ素粒子内の空隙の総量とみなすことができるため、細孔半径が1.2μm以下の範囲における積算細孔体積が小さいほど、窒化ホウ素粒子は緻密な粒子になりやすい。そのため、このような窒化ホウ素粒子を樹脂と混合して放熱材を作製する場合、窒化ホウ素粒子を潰さなくても窒化ホウ素粒子の充填率が高くなり、高い熱伝導率を有する放熱材を得やすくなる。水銀ポロシメーターによって測定される細孔半径が1.2μm以下の範囲における積算細孔体積は、0.1ml/g以上、0.12ml/g以上、0.14ml/g以上、0.15ml/g以上、0.16ml/g以上、又は0.17ml/g以上であってよい。 The cumulative pore volume of boron nitride powder in a range where the pore radius measured by a mercury porosimeter is 1.2 μm or less is 0.2 ml/g or less, 0.19 ml/g or less, or 0.18 ml/g or less. It's good. The cumulative pore volume in the range where the pore radius of boron nitride powder is 1.2 μm or less can be regarded as the total amount of voids in each boron nitride particle constituting the boron nitride powder. The smaller the integrated pore volume in the following range, the more dense the boron nitride particles become. Therefore, when making a heat dissipation material by mixing such boron nitride particles with resin, the filling rate of boron nitride particles increases without crushing the boron nitride particles, making it easier to obtain a heat dissipation material with high thermal conductivity. Become. The cumulative pore volume in the range where the pore radius measured by a mercury porosimeter is 1.2 μm or less is 0.1 ml/g or more, 0.12 ml/g or more, 0.14 ml/g or more, 0.15 ml/g or more , 0.16 ml/g or more, or 0.17 ml/g or more.
窒化ホウ素粉末の、水銀ポロシメーターによって測定される細孔半径が500μm以下の範囲における積算細孔体積は、1ml/g以下、0.95ml/g以下、又は0.91ml/g以下であってよい。積算細孔体積は、0.7ml/g以上、0.8ml/g以上、0.85ml/g以上、0.88ml/g以上、又は0.9ml/g以上であってよい。 The cumulative pore volume of the boron nitride powder in a range where the pore radius measured by a mercury porosimeter is 500 μm or less may be 1 ml/g or less, 0.95 ml/g or less, or 0.91 ml/g or less. The cumulative pore volume may be 0.7 ml/g or more, 0.8 ml/g or more, 0.85 ml/g or more, 0.88 ml/g or more, or 0.9 ml/g or more.
窒化ホウ素粉末の嵩密度は、0.7g/ml以上、0.72g/ml以上、0.74g/ml以上、又は0.75g/ml以上であってよく、0.9g/ml以下、0.8g/ml以下、又は0.75g/ml以下であってよい。 The bulk density of the boron nitride powder may be 0.7 g/ml or more, 0.72 g/ml or more, 0.74 g/ml or more, or 0.75 g/ml or more, and 0.9 g/ml or less, 0. It may be 8 g/ml or less, or 0.75 g/ml or less.
窒化ホウ素粉末の平均粒子径は、例えば、10μm以上、20μm以上、又は30μm以上であってよく、100μm以下、80μm以下、又は60μm以下であってよい。窒化ホウ素粉末の平均粒子径は、体積累積粒度分布が50%となる粒子径(D50)を意味し、レーザー回折散乱法により測定できる。 The average particle diameter of the boron nitride powder may be, for example, 10 μm or more, 20 μm or more, or 30 μm or more, and 100 μm or less, 80 μm or less, or 60 μm or less. The average particle size of boron nitride powder means the particle size (D50) at which the volume cumulative particle size distribution is 50%, and can be measured by a laser diffraction scattering method.
窒化ホウ素粉末のBET比表面積は、JIS Z 8830:2013に準拠して、窒素ガスを使用してBET多点法により測定することができる。窒化ホウ素粉末のBET比表面積は、1m2/g以上、2m2/g以上、又は2.5m2/g以上であってよく、5m2/g以下、4m2/g以下、又は3.5m2/g以下であってよい。 The BET specific surface area of boron nitride powder can be measured by the BET multipoint method using nitrogen gas in accordance with JIS Z 8830:2013. The BET specific surface area of the boron nitride powder may be 1 m 2 /g or more, 2 m 2 /g or more, or 2.5 m 2 /g or more, and 5 m 2 /g or less, 4 m 2 /g or less, or 3.5 m 2 /g or less.
上記窒化ホウ素粉末の製造方法について以下に説明する。上記窒化ホウ素粉末は、例えば、炭化ホウ素粒子を熱間等方圧加圧(「熱間静水圧加圧」とも呼ばれる)しながら窒化して、炭窒化ホウ素粒子を得る工程(窒化工程)と、炭窒化ホウ素粒子を脱炭して、窒化ホウ素粒子を含む窒化ホウ素粉末を得る工程(脱炭工程)と、を備える方法により製造することができる。すなわち、本発明の他の一実施形態は、このような窒化ホウ素粉末の製造方法である。上記窒化ホウ素粒子の製造方法は、上記の方法に限られない。 The method for producing the above boron nitride powder will be explained below. The boron nitride powder is obtained by, for example, nitriding boron carbide particles while hot isostatic pressing (also called "hot isostatic pressing") to obtain boron carbonitride particles (nitriding step); It can be manufactured by a method comprising a step (decarburization step) of decarburizing boron carbonitride particles to obtain boron nitride powder containing boron nitride particles. That is, another embodiment of the present invention is a method for producing such boron nitride powder. The method for producing the boron nitride particles is not limited to the above method.
炭化ホウ素粒子は、例えば公知の製造方法により製造することができる。例えば、ホウ酸とアセチレンブラックとを混合した後、不活性ガス雰囲気中で、1800~2400℃にて、1~10時間加熱し、塊状の炭化ホウ素粒子を得る方法が挙げられる。この方法により得られた塊状の炭化ホウ素粒子に対して、粉砕、篩分け、洗浄、不純物除去、及び乾燥等を適宜行ってもよい。炭化ホウ素粒子の平均粒子径は、例えば、5μm以上、10μm以上、又は15μm以上であってよく、80μm以下、60μm以下、又は40μm以下であってよい。炭化ホウ素粒子の平均粒子径は、体積累積粒度分布が50%となる粒子径(D50)を意味し、レーザー回折散乱法により測定できる。 Boron carbide particles can be produced, for example, by a known production method. For example, there is a method in which boric acid and acetylene black are mixed and then heated in an inert gas atmosphere at 1800 to 2400° C. for 1 to 10 hours to obtain bulk boron carbide particles. The bulk boron carbide particles obtained by this method may be subjected to pulverization, sieving, washing, impurity removal, drying, etc. as appropriate. The average particle diameter of the boron carbide particles may be, for example, 5 μm or more, 10 μm or more, or 15 μm or more, and 80 μm or less, 60 μm or less, or 40 μm or less. The average particle diameter of boron carbide particles means the particle diameter (D50) at which the volume cumulative particle size distribution is 50%, and can be measured by a laser diffraction scattering method.
窒化工程では、窒化反応を進行させる雰囲気下で、炭化ホウ素粒子を容器に充填した状態で熱間等方圧加圧しながら加熱することにより、炭化ホウ素粒子を窒化して炭窒化ホウ素粒子を得る。容器は、例えば、カーボンルツボであってよい。熱間等方圧加圧は、例えば、熱間等方圧加圧装置(例えば、神戸製鋼所製)を用いて行うことができる。 In the nitriding step, boron carbide particles are nitrided to obtain boron carbonitride particles by heating the container filled with boron carbide particles while applying hot isostatic pressure in an atmosphere that allows the nitriding reaction to proceed. The container may be, for example, a carbon crucible. The hot isostatic pressing can be performed using, for example, a hot isostatic pressing device (for example, manufactured by Kobe Steel, Ltd.).
窒化工程における窒化反応を進行させる雰囲気は、炭化ホウ素粒子を窒化する窒化ガス雰囲気であってよい。窒化ガスとしては、窒素ガス、アンモニアガス等であってよく、炭化ホウ素粒子を窒化しやすい観点及びコストの観点から、窒素ガスであってよい。窒化ガスは、1種単独又は2種以上を組合せて用いてよく、窒化ガス中の窒素ガスの割合は、95体積%以上、99体積%以上又は99.9体積%以上であってよい。 The atmosphere in which the nitriding reaction proceeds in the nitriding step may be a nitriding gas atmosphere that nitrides boron carbide particles. The nitriding gas may be nitrogen gas, ammonia gas, etc. Nitrogen gas may be used from the viewpoint of ease of nitriding boron carbide particles and from the viewpoint of cost. The nitriding gas may be used alone or in combination of two or more, and the proportion of nitrogen gas in the nitriding gas may be 95% by volume or more, 99% by volume or more, or 99.9% by volume or more.
窒化工程における圧力は、50MPa以上、70MPa以上、又は100MPa以上であってよい。窒化工程における圧力は、200MPa以下又は150MPa以下であってよい。 The pressure in the nitriding step may be 50 MPa or more, 70 MPa or more, or 100 MPa or more. The pressure in the nitriding step may be 200 MPa or less or 150 MPa or less.
窒化工程における加熱温度は、炭化ホウ素粒子を充分に窒化させる観点から、1600℃以上又は1700℃以上であってよい。窒化工程における加熱温度は、2200℃以下又は2000℃以下であってよい。 The heating temperature in the nitriding step may be 1600° C. or higher or 1700° C. or higher from the viewpoint of sufficiently nitriding the boron carbide particles. The heating temperature in the nitriding step may be 2200°C or lower or 2000°C or lower.
窒化工程における加圧及び加熱を行う時間は、炭化ホウ素粒子を充分に窒化させる観点から、30分、45分以上、又は1時間以上であってよい。窒化工程における加圧及び加熱を行う時間は、30時間以下、20時間以下、又は10時間以下であってよい。 The time for pressurizing and heating in the nitriding step may be 30 minutes, 45 minutes or more, or 1 hour or more from the viewpoint of sufficiently nitriding the boron carbide particles. The time for applying pressure and heating in the nitriding step may be 30 hours or less, 20 hours or less, or 10 hours or less.
脱炭工程では、窒化工程にて得られた炭窒化ホウ素粒子と、ホウ素源とを含む混合物を容器に充填した状態で加熱することにより、炭窒化ホウ素粒子を脱炭する。容器は、例えば、窒化ホウ素ルツボであってよい。 In the decarburization step, the boron carbonitride particles are decarburized by heating a mixture containing the boron carbonitride particles obtained in the nitriding step and a boron source in a container. The container may be, for example, a boron nitride crucible.
ホウ素源としては、ホウ酸、酸化ホウ素、又はその混合物が挙げられる。混合物は、必要に応じて当技術分野で用いられるその他の添加物を更に含有していてもよい。炭窒化ホウ素粒子とホウ素源との混合割合は、適宜選定される。ホウ素源としてホウ酸又は酸化ホウ素を用いる場合、ホウ酸又は酸化ホウ素の割合は、炭窒化ホウ素100質量部に対して、例えば50質量部以上又は80質量部以上であってよく、300質量部以下又は200質量部以下であってよい。 Boron sources include boric acid, boron oxide, or mixtures thereof. The mixture may further contain other additives used in the art, if necessary. The mixing ratio of boron carbonitride particles and boron source is selected as appropriate. When boric acid or boron oxide is used as a boron source, the proportion of boric acid or boron oxide may be, for example, 50 parts by mass or more or 80 parts by mass or more, and 300 parts by mass or less, based on 100 parts by mass of boron carbonitride. Or it may be 200 parts by mass or less.
脱炭工程における雰囲気は、常圧(大気圧)の雰囲気又は加圧された雰囲気であってよい。脱炭工程における圧力は、例えば0.5MPa以下又は0.3MPa以下であってよく、0.01MPa以上又は0.03MPa以上であってよい。 The atmosphere in the decarburization process may be a normal pressure (atmospheric pressure) atmosphere or a pressurized atmosphere. The pressure in the decarburization step may be, for example, 0.5 MPa or less or 0.3 MPa or less, and may be 0.01 MPa or more or 0.03 MPa or more.
脱炭工程では、例えば、まず、所定の温度(脱炭開始可能な温度)まで昇温した後に、所定の温度で保持温度まで更に昇温する。所定の温度(脱炭開始可能な温度)は、例えば、1000℃以上であってよく、1500℃以下又は1200℃以下であってよい。所定の温度(脱炭開始可能な温度)から保持温度へ昇温する速度は、例えば5℃/分以下、4℃/分以下、3℃/分以下、又は2℃/分以下であってよい。 In the decarburization process, for example, first, the temperature is raised to a predetermined temperature (a temperature at which decarburization can start), and then the temperature is further raised to a holding temperature at the predetermined temperature. The predetermined temperature (temperature at which decarburization can start) may be, for example, 1000°C or higher, 1500°C or lower, or 1200°C or lower. The rate of temperature increase from a predetermined temperature (temperature at which decarburization can be started) to the holding temperature may be, for example, 5° C./min or less, 4° C./min or less, 3° C./min or less, or 2° C./min or less. .
保持温度は、粒子成長が良好に起こりやすい観点から、1800℃以上又は2000℃以上であってよい。保持温度は、2200℃以下又は2100℃以下であってよい。 The holding temperature may be 1800° C. or higher or 2000° C. or higher from the viewpoint of facilitating good particle growth. The holding temperature may be 2200°C or less or 2100°C or less.
保持温度における保持時間は、粒子成長が良好に起こりやすい観点から、例えば、0.5時間以上、1時間以上、3時間以上、又は5時間以上であってよい。保持温度における保持時間は、例えば40時間以下、30時間以下、又は20時間以下であってよい。 The holding time at the holding temperature may be, for example, 0.5 hours or more, 1 hour or more, 3 hours or more, or 5 hours or more, from the viewpoint of good particle growth. The holding time at the holding temperature may be, for example, 40 hours or less, 30 hours or less, or 20 hours or less.
以上のようにして得られる窒化ホウ素粒子(窒化ホウ素粉末)に対して、篩によって所望の粒子径を有する窒化ホウ素粉末が得られるように分級する工程(分級工程)を実施してもよい。 The boron nitride particles (boron nitride powder) obtained as described above may be subjected to a step (classification step) of classifying them using a sieve so as to obtain boron nitride powder having a desired particle size.
以上説明した窒化ホウ素粉末は、例えば、放熱部材に好適に用いられる。窒化ホウ素粉末は、放熱部材に用いられる場合、例えば樹脂と共に混合された樹脂組成物として用いられる。すなわち、本発明の他の一実施形態は、樹脂と、上記の窒化ホウ素粉末とを含有する樹脂組成物である。 The boron nitride powder described above is suitable for use in, for example, heat dissipation members. When the boron nitride powder is used in a heat dissipating member, it is used, for example, as a resin composition mixed with a resin. That is, another embodiment of the present invention is a resin composition containing a resin and the above boron nitride powder.
上記の窒化ホウ素粉末の含有量は、樹脂組成物の全体積を基準として、樹脂組成物の熱伝導率を向上させ、優れた放熱性能が得られやすい観点から、50体積%以上、55体積%以上、60体積%以上、65体積%以上、又は70体積%以上であってよい。窒化ホウ素粉末の含有量は、樹脂組成物の全体積を基準として、成形時に細孔の発生、並びに、絶縁性及び機械強度の低下を抑制できる観点から、85体積%以下、80体積%以下、又は75体積%以下であってよい。 The content of the boron nitride powder mentioned above is 50% by volume or more and 55% by volume based on the total volume of the resin composition, from the viewpoint of improving the thermal conductivity of the resin composition and easily obtaining excellent heat dissipation performance. The content may be 60% by volume or more, 65% by volume or more, or 70% by volume or more. The content of the boron nitride powder is 85% by volume or less, 80% by volume or less, based on the total volume of the resin composition, from the viewpoint of suppressing the generation of pores during molding and the decrease in insulation and mechanical strength. Or it may be 75 volume% or less.
樹脂としては、例えば、エポキシ樹脂、シリコーン樹脂、シリコーンゴム、アクリル樹脂、フェノール樹脂、メラミン樹脂、ユリア樹脂、不飽和ポリエステル、フッ素樹脂、ポリイミド、ポリアミドイミド、ポリエーテルイミド、ポリブチレンテレフタレート、ポリエチレンテレフタレート、ポリフェニレンエーテル、ポリフェニレンスルフィド、全芳香族ポリエステル、ポリスルホン、液晶ポリマー、ポリエーテルスルホン、ポリカーボネート、マレイミド変性樹脂、ABS(アクリロニトリル-ブタジエン-スチレン)樹脂、AAS(アクリロニトリル-アクリルゴム・スチレン)樹脂、及びAES(アクリロニトリル・エチレン・プロピレン・ジエンゴム-スチレン)樹脂が挙げられる。 Examples of the resin include epoxy resin, silicone resin, silicone rubber, acrylic resin, phenol resin, melamine resin, urea resin, unsaturated polyester, fluororesin, polyimide, polyamideimide, polyetherimide, polybutylene terephthalate, polyethylene terephthalate, Polyphenylene ether, polyphenylene sulfide, fully aromatic polyester, polysulfone, liquid crystal polymer, polyether sulfone, polycarbonate, maleimide modified resin, ABS (acrylonitrile-butadiene-styrene) resin, AAS (acrylonitrile-acrylic rubber/styrene) resin, and AES ( Examples include acrylonitrile, ethylene, propylene, diene rubber (styrene) resin.
樹脂の含有量は、樹脂組成物の全体積を基準として、15体積%以上、20体積%以上、又は25体積%以上であってよく、50体積%以下、45体積%以下、40体積%以下、35体積%以下、又は30体積%以下であってよい。 The content of the resin may be 15% by volume or more, 20% by volume or more, or 25% by volume or more, and 50% by volume or less, 45% by volume or less, 40% by volume or less, based on the total volume of the resin composition. , 35% by volume or less, or 30% by volume or less.
樹脂組成物は、樹脂を硬化させる硬化剤を更に含有していてよい。硬化剤は、樹脂の種類によって適宜選択される。例えば、樹脂がエポキシ樹脂である場合、硬化剤としては、フェノールノボラック化合物、酸無水物、アミノ化合物、及びイミダゾール化合物が挙げられる。硬化剤の含有量は、樹脂100質量部に対して、例えば、0.5質量部以上又は1.0質量部以上であってよく、15質量部以下又は10質量部以下であってよい。 The resin composition may further contain a curing agent for curing the resin. The curing agent is appropriately selected depending on the type of resin. For example, when the resin is an epoxy resin, examples of the curing agent include phenol novolac compounds, acid anhydrides, amino compounds, and imidazole compounds. The content of the curing agent may be, for example, 0.5 parts by mass or more or 1.0 parts by mass or more, and 15 parts by mass or less or 10 parts by mass or less, based on 100 parts by mass of the resin.
樹脂組成物は、その他の成分を更に含有してもよい。その他の成分は、硬化促進剤(硬化触媒)、カップリング剤、湿潤分散剤、表面調整剤等であってよい。 The resin composition may further contain other components. Other components may include a curing accelerator (curing catalyst), a coupling agent, a wetting and dispersing agent, a surface conditioner, and the like.
硬化促進剤(硬化触媒)としては、テトラフェニルホスホニウムテトラフェニルボレート、トリフェニルフォスフェイト等のリン系硬化促進剤、2-フェニル-4,5-ジヒドロキシメチルイミダゾール等のイミダゾール系硬化促進剤、三フッ化ホウ素モノエチルアミン等のアミン系硬化促進剤などが挙げられる。 Examples of curing accelerators (curing catalysts) include phosphorus curing accelerators such as tetraphenylphosphonium tetraphenylborate and triphenyl phosphate, imidazole curing accelerators such as 2-phenyl-4,5-dihydroxymethylimidazole, and trifluorocarbon curing accelerators. Examples include amine curing accelerators such as boron monoethylamine.
カップリング剤としては、シラン系カップリング剤、チタネート系カップリング剤、及びアルミネート系カップリング剤等が挙げられる。これらのカップリング剤に含まれる化学結合基としては、ビニル基、エポキシ基、アミノ基、メタクリル基、メルカプト基等が挙げられる。 Examples of the coupling agent include silane coupling agents, titanate coupling agents, and aluminate coupling agents. Chemical bonding groups contained in these coupling agents include vinyl groups, epoxy groups, amino groups, methacrylic groups, mercapto groups, and the like.
湿潤分散剤としては、リン酸エステル塩、カルボン酸エステル、ポリエステル、アクリル共重合物、ブロック共重合物等が挙げられる。 Examples of wetting and dispersing agents include phosphate ester salts, carboxylic esters, polyesters, acrylic copolymers, block copolymers, and the like.
表面調整剤としては、アクリル系表面調整剤、シリコーン系表面調整剤、ビニル系調整剤、フッ素系表面調整剤等が挙げられる。 Examples of surface conditioners include acrylic surface conditioners, silicone surface conditioners, vinyl surface conditioners, fluorine surface conditioners, and the like.
以下、実施例により本発明を具体的に説明する。ただし、本発明は下記の実施例に限定されるものではない。 Hereinafter, the present invention will be specifically explained with reference to Examples. However, the present invention is not limited to the following examples.
(実施例1)
平均粒子径(D50)が26μmである炭化ホウ素粒子をカーボンルツボに充填し、熱間等方圧加圧装置(神戸製鋼社製)を用いて窒素ガス雰囲気で、1800℃、196MPaの条件で1.5時間HIP法により加熱及び加圧し、炭化ホウ素粒子を窒化して炭窒化ホウ素粒子(B4CN4)を得た。得られた炭窒化ホウ素粒子100質量部と、ホウ酸150質量部(ホウ酸60質量%)とをヘンシェルミキサーを用いて混合した後、混合物を窒化ホウ素ルツボに充填し、抵抗加熱炉を用いて、常圧、窒素ガス雰囲気で、保持温度2000℃、0.03MPaの条件で、保持時間5時間で加熱することにより、粗大な粒子を得た。粗大な粒子を乳鉢により10分間解砕した後、篩目175μmのナイロン篩にて分級を行った。これにより、粒子の集合体(粉末)を得た。
(Example 1)
Boron carbide particles with an average particle diameter (D50) of 26 μm were filled in a carbon crucible, and heated at 1800° C. and 196 MPa in a nitrogen gas atmosphere using a hot isostatic press device (manufactured by Kobe Steel). Boron carbide particles were nitrided by heating and pressurizing by HIP method for .5 hours to obtain boron carbonitride particles (B 4 CN 4 ). After mixing 100 parts by mass of the obtained boron carbonitride particles and 150 parts by mass of boric acid (60% by mass of boric acid) using a Henschel mixer, the mixture was filled into a boron nitride crucible and heated using a resistance heating furnace. Coarse particles were obtained by heating under conditions of a holding temperature of 2000° C., 0.03 MPa, and a holding time of 5 hours in a nitrogen gas atmosphere at normal pressure. After the coarse particles were crushed in a mortar for 10 minutes, they were classified using a nylon sieve with a mesh size of 175 μm. As a result, a particle aggregate (powder) was obtained.
(実施例2)
ホウ酸100質量部(ホウ酸50質量%)に変更したこと以外は、実施例1と同様にして粉末を得た。
(Example 2)
A powder was obtained in the same manner as in Example 1, except that the amount of boric acid was changed to 100 parts by mass (50% by mass of boric acid).
(実施例3)
ホウ酸81.8質量部(ホウ酸45質量%)に変更したこと以外は、実施例1と同様にして粉末を得た。
(Example 3)
A powder was obtained in the same manner as in Example 1, except that the boric acid was changed to 81.8 parts by mass (boric acid 45% by mass).
(比較例1)
抵抗加熱炉を用いて窒素ガス雰囲気で、2000℃、0.85MPaの条件で25時間加熱及び加圧し、炭化ホウ素粒子を窒化して炭窒化ホウ素粒子を得たこと以外は、実施例1と同様にして窒化ホウ素粉末を得た。
(Comparative example 1)
The same as in Example 1 except that boron carbide particles were nitrided by heating and pressurizing in a nitrogen gas atmosphere at 2000° C. and 0.85 MPa for 25 hours using a resistance heating furnace to obtain boron carbonitride particles. Boron nitride powder was obtained.
[X線回折測定]
各実施例において得られた粉末の一部を回収し、X線回折装置(株式会社リガク製、「ULTIMA-IV」)を用いてX線回折測定した。そのX線回折測定結果、及び比較対象として比較例1で得られた窒化ホウ素粉末のX線回折測定結果をそれぞれ図1に示す。図1から分かるように、窒化ホウ素に由来するピークのみが検出され、各実施例において窒化ホウ素粉末が得られたことを確認した。
[X-ray diffraction measurement]
A portion of the powder obtained in each example was collected and subjected to X-ray diffraction measurement using an X-ray diffraction device (Rigaku Co., Ltd., "ULTIMA-IV"). The X-ray diffraction measurement results and the X-ray diffraction measurement results of the boron nitride powder obtained in Comparative Example 1 as a comparison target are shown in FIG. 1, respectively. As can be seen from FIG. 1, only a peak derived from boron nitride was detected, confirming that boron nitride powder was obtained in each example.
[窒化ホウ素粉末の微分細孔体積の測定]
得られた窒化ホウ素粉末に対して水銀ポロシメーターを用い、以下の手順に従って細孔半径に対する微分細孔体積の測定を行った。測定装置は島津製作所製のオートポアIV9500を用い、測定用セルは粉体用の5cc×1.1ccのものを使用した。まず、水銀ポロシメーターにて、0.40~60000psiaの範囲で圧力に対する微分細孔体積を測定した。このとき、圧力の対数を横軸に、微分細孔体積を縦軸にとった対数グラフにおいて、微分細孔体積を測定する圧力の値が横軸に等間隔で130点となるように設定した。そして、圧力を細孔半径に変換した上で、変換された細孔半径の対数に対する測定された微分気孔体積をプロットして、プロット間を直線で繋ぐことにより、細孔半径に対する微分細孔体積の曲線を得た。実施例1~3で得られた窒化ホウ素粉末の細孔半径に対する微分細孔体積の曲線をそれぞれ図2~4に示し、比較例1で得られた窒化ホウ素粉末の細孔半径に対する微分細孔体積の曲線を図5に示す。得られた微分細孔体積の曲線から、上述した細孔半径R1、R2及びR3、微分細孔体積V2及びV3、直線の傾きa及びb、細孔半径1.2μmまでの積算細孔体積、細孔半径500μmまでの積算細孔体積を算出した。結果を表1に示す。また、窒化ホウ素粉末の嵩密度を、窒化ホウ素粒子の密度(2.26g/ml)と積算細孔体積とから算出した。
[Measurement of differential pore volume of boron nitride powder]
Using a mercury porosimeter on the obtained boron nitride powder, the differential pore volume with respect to the pore radius was measured according to the following procedure. The measuring device used was Autopore IV9500 manufactured by Shimadzu Corporation, and the measuring cell used was a 5 cc x 1.1 cc cell for powder. First, the differential pore volume with respect to pressure was measured in the range of 0.40 to 60,000 psia using a mercury porosimeter. At this time, in a logarithmic graph with the logarithm of pressure on the horizontal axis and the differential pore volume on the vertical axis, the pressure values at which the differential pore volume was measured were set at 130 points equally spaced on the horizontal axis. . Then, by converting the pressure to the pore radius, plotting the measured differential pore volume against the logarithm of the converted pore radius, and connecting the plots with a straight line, we can calculate the differential pore volume against the pore radius. obtained the curve. The curves of differential pore volume versus pore radius of the boron nitride powders obtained in Examples 1 to 3 are shown in FIGS. 2 to 4, respectively, and the differential pore volume versus pore radius of the boron nitride powder obtained in Comparative Example 1 is shown in FIGS. The volume curve is shown in FIG. From the obtained differential pore volume curve, the above-mentioned pore radii R 1 , R 2 and R 3 , differential pore volumes V 2 and V 3 , straight line slopes a and b, and pore radius up to 1.2 μm are determined. The cumulative pore volume and the cumulative pore volume up to a pore radius of 500 μm were calculated. The results are shown in Table 1. Further, the bulk density of the boron nitride powder was calculated from the density of the boron nitride particles (2.26 g/ml) and the integrated pore volume.
[窒化ホウ素粉末の平均粒子径の測定]
窒化ホウ素粉末の平均粒子径は、ISO13320:2009に準拠し、レーザー回折散乱法粒度分布測定装置(ベックマン・コールター株式会社製、「LS-13 320」)を用いて測定した。ただし、測定処理の前に試料にホモジナイザーをかけずに測定した。粒度分布測定に際し、窒化ホウ素粉末を分散させる溶媒には水を用い、分散剤にはヘキサメタリン酸を用いた。このとき水の屈折率には1.33を用い、また、窒化ホウ素粒子の屈折率については1.7の数値を用いた。測定結果を表1に示す。
[Measurement of average particle size of boron nitride powder]
The average particle diameter of the boron nitride powder was measured in accordance with ISO13320:2009 using a laser diffraction scattering particle size distribution analyzer (manufactured by Beckman Coulter, Inc., "LS-13 320"). However, the measurement was performed without applying a homogenizer to the sample before the measurement process. When measuring the particle size distribution, water was used as a solvent for dispersing the boron nitride powder, and hexametaphosphoric acid was used as a dispersant. At this time, a value of 1.33 was used for the refractive index of water, and a value of 1.7 was used for the refractive index of boron nitride particles. The measurement results are shown in Table 1.
[窒化ホウ素粉末のBET比表面積の測定]
JIS Z 8830:2013に準拠して窒素ガスを使用してBET多点法により窒化ホウ素粉末のBET比表面積を測定した。測定結果を表1に示す。
[Measurement of BET specific surface area of boron nitride powder]
The BET specific surface area of the boron nitride powder was measured by the BET multi-point method using nitrogen gas in accordance with JIS Z 8830:2013. The measurement results are shown in Table 1.
[熱伝導率の測定]
ナフタレン型エポキシ樹脂(DIC社製、HP4032)100質量部と、硬化剤としてイミダゾール化合物(四国化成社製、2E4MZ-CN)10質量部とを混合し、次いで、実施例1及び比較例1において得られたそれぞれの窒化ホウ素粉末を窒化ホウ素粉末の充填率が70体積%となるように混合して樹脂組成物を得た。この樹脂組成物を、500Paの減圧脱泡を10分間行い、PET製シート上に厚みが1.0mmになるように塗布した。その後、温度150℃、圧力160kg/cm2条件で60分間のプレス加熱加圧を行って、0.5mmのシート状の放熱材を作製した。作製した放熱材から10mm×10mmの大きさの測定用試料を切り出し、キセノンフラッシュアナライザ(NETZSCH社製、LFA447NanoFlash)を用いたレーザーフラッシュ法により、測定用試料の熱拡散率A(m2/秒)を測定した。また、測定用試料の比重B(kg/m3)をアルキメデス法により測定した。また、測定用試料の比熱容量C(J/(kg・K))を、示差走査熱量計(株式会社リガク製、ThermoPlusEvoDSC8230)を用いて測定した。これらの各物性値を用いて、熱伝導率H(W/(m・K))をH=A×B×Cの式から求めた。実施例1において得られた窒化ホウ素粉末を用いて作製した放熱材の熱伝導率は22W/(m・K)であり、比較例1において得られた窒化ホウ素粉末を用いて作製した放熱材の熱伝導率は17W/(m・K)であった。
[Measurement of thermal conductivity]
100 parts by mass of a naphthalene type epoxy resin (manufactured by DIC Corporation, HP4032) and 10 parts by mass of an imidazole compound (manufactured by Shikoku Kasei Co., Ltd., 2E4MZ-CN) as a curing agent were mixed, and then, the mixture obtained in Example 1 and Comparative Example 1 was mixed. The obtained boron nitride powders were mixed so that the boron nitride powder filling rate was 70% by volume to obtain a resin composition. This resin composition was degassed under reduced pressure of 500 Pa for 10 minutes, and then applied onto a PET sheet to a thickness of 1.0 mm. Thereafter, press heating and pressing was performed for 60 minutes at a temperature of 150° C. and a pressure of 160 kg/cm 2 to produce a 0.5 mm sheet-like heat dissipating material. A measurement sample with a size of 10 mm x 10 mm was cut out from the prepared heat dissipation material, and the thermal diffusivity A (m 2 /sec) of the measurement sample was measured using a laser flash method using a xenon flash analyzer (manufactured by NETZSCH, LFA447NanoFlash). was measured. Further, the specific gravity B (kg/m 3 ) of the measurement sample was measured by the Archimedes method. Further, the specific heat capacity C (J/(kg·K)) of the measurement sample was measured using a differential scanning calorimeter (ThermoPlusEvoDSC8230, manufactured by Rigaku Co., Ltd.). Using these physical property values, the thermal conductivity H (W/(m·K)) was determined from the formula H=A×B×C. The thermal conductivity of the heat dissipating material produced using the boron nitride powder obtained in Example 1 was 22 W/(m K), and the thermal conductivity of the heat dissipating material produced using the boron nitride powder obtained in Comparative Example 1 was The thermal conductivity was 17 W/(m·K).
Claims (5)
水銀ポロシメーターによって測定される細孔半径に対する微分細孔体積の曲線において、前記細孔半径が1.2μm以下の範囲で、前記微分細孔体積の曲線が立ち上がる点と、前記微分細孔体積が極大値となる点とを直線で結んだときの前記直線の傾きが0.8以下である、窒化ホウ素粉末。 A boron nitride powder comprising boron nitride particles having pores,
In the curve of the differential pore volume against the pore radius measured by a mercury porosimeter, the point where the curve of the differential pore volume rises and the point where the differential pore volume reaches a maximum in the range where the pore radius is 1.2 μm or less A boron nitride powder having a slope of 0.8 or less when the straight line connects the points where the values are obtained.
A resin composition comprising the boron nitride powder according to any one of claims 1 to 4 and a resin.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05319934A (en) * | 1992-05-21 | 1993-12-03 | Toshiba Corp | Method for producing boron nitride and MHD generator |
| JPH0753282A (en) * | 1993-08-12 | 1995-02-28 | Agency Of Ind Science & Technol | Coated high pressure type boron nitride quasi-fine particle, sintered body of the same and production thereof |
| JPH0753269A (en) * | 1993-08-12 | 1995-02-28 | Agency Of Ind Science & Technol | Coated high pressure type boron nitride sintered body and its production |
| WO2021079912A1 (en) * | 2019-10-23 | 2021-04-29 | デンカ株式会社 | Boron nitride powder and production method therefor, boron carbonitride powder, composite material, and heat dissipating member |
| JP2022106113A (en) * | 2021-01-06 | 2022-07-19 | デンカ株式会社 | Boron nitride powder, heat conductive resin composition, heat dissipation sheet and electronic component structure |
-
2023
- 2023-08-22 WO PCT/JP2023/030197 patent/WO2024048375A1/en not_active Ceased
- 2023-08-22 CN CN202380062838.0A patent/CN119790016A/en active Pending
- 2023-08-22 JP JP2024544157A patent/JPWO2024048375A1/ja active Pending
- 2023-08-28 TW TW112132214A patent/TW202417371A/en unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05319934A (en) * | 1992-05-21 | 1993-12-03 | Toshiba Corp | Method for producing boron nitride and MHD generator |
| JPH0753282A (en) * | 1993-08-12 | 1995-02-28 | Agency Of Ind Science & Technol | Coated high pressure type boron nitride quasi-fine particle, sintered body of the same and production thereof |
| JPH0753269A (en) * | 1993-08-12 | 1995-02-28 | Agency Of Ind Science & Technol | Coated high pressure type boron nitride sintered body and its production |
| WO2021079912A1 (en) * | 2019-10-23 | 2021-04-29 | デンカ株式会社 | Boron nitride powder and production method therefor, boron carbonitride powder, composite material, and heat dissipating member |
| JP2022106113A (en) * | 2021-01-06 | 2022-07-19 | デンカ株式会社 | Boron nitride powder, heat conductive resin composition, heat dissipation sheet and electronic component structure |
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| TW202417371A (en) | 2024-05-01 |
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