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WO2022039522A1 - Perovskite thin film having passivated crystalline grain boundary, method for preparing same, and electronic device comprising same - Google Patents

Perovskite thin film having passivated crystalline grain boundary, method for preparing same, and electronic device comprising same Download PDF

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Publication number
WO2022039522A1
WO2022039522A1 PCT/KR2021/011034 KR2021011034W WO2022039522A1 WO 2022039522 A1 WO2022039522 A1 WO 2022039522A1 KR 2021011034 W KR2021011034 W KR 2021011034W WO 2022039522 A1 WO2022039522 A1 WO 2022039522A1
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perovskite
thin film
grain boundary
lewis base
perovskite thin
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French (fr)
Korean (ko)
Inventor
전남중
신성식
송슬기
김영윤
김범수
박은영
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Korea Research Institute of Chemical Technology KRICT
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/169Thin semiconductor films on metallic or insulating substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a method for manufacturing a perovskite thin film having passivated grain boundaries and an electronic device including the same.
  • the present invention provides a passivation ( passivation) and confirmed that the efficiency of an electronic device including the same can be improved, and the present invention has been completed.
  • the present invention provides a perovskite thin film having a passivated grain boundary and a method for manufacturing the same.
  • the present invention provides an electronic device using the perovskite thin film of the present invention.
  • the present invention provides a perovskite thin film having a passivated grain boundary, the perovskite thin film of the present invention,
  • the Lewis base according to an embodiment of the present invention may be a compound including any one or two or more electron donor elements selected from N, O, and S, and preferably a pKa value of 8 or more.
  • the Lewis base according to an embodiment of the present invention is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine , triethylamine, tetramethylethylenediamine, and methyl-4-pyridinemethylamine may be any one or two or more selected from, but is not limited thereto.
  • the perovskite thin film according to an embodiment of the present invention may be formed by heat-treating a perovskite precursor solution containing a compound satisfying the following Chemical Formula 1 and a metal halide satisfying the following Chemical Formula 2.
  • A is Cs + or an organocation
  • M is selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;
  • X is Br - , Cl - or I - .
  • the organocation of A in Formula 1 may be a compound represented by Formula 3 or Formula 4 below.
  • R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl
  • R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.
  • the present invention provides a method for manufacturing a perovskite thin film having an immobilized grain boundary of the present invention, the method for manufacturing a perovskite thin film of the present invention is
  • the Lewis base solution according to an embodiment of the present invention may have a pKa value of 8 or more, specifically piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, and 1 -Methylpyrrolidine, diethylamine, triethylamine, tetramethylethylenediamine, and may be any one or two or more selected from methyl-4-pyridinemethylamine, but is not limited thereto.
  • the primary heat treatment according to an embodiment of the present invention may be performed at a temperature of 50 to 300 °C, and the secondary heat treatment may be performed at a temperature of 50 to 150 °C.
  • the present invention provides an electronic device comprising the perovskite thin film of the present invention.
  • the perovskite thin film according to an embodiment of the present invention effectively inhibits the oxidation of metal cations in the perovskite structure by placing Lewis base crystals at the grain boundaries of the perovskite structure crystals, thereby forming the perovskite structure. By making it stable, the efficiency of the electronic device including the same is improved.
  • the method of manufacturing a perovskite thin film according to an embodiment of the present invention is different from the conventionally known method of adding a Lewis base compound to a perovskite precursor solution, after forming a perovskite structure crystal
  • the Lewis base is not only evenly distributed at the perovskite grain boundary, but also stably maintained on the perovskite thin film at high temperature, thereby maintaining the perovskite thin film grain boundary. can maintain the immobilization of
  • the electronic device including the perovskite thin film of the present invention has surprisingly improved properties.
  • Example 1 is a photograph (b) of a thin film after spin-coating DMAP on a crystal (a), a substrate prepared in Preparation Example 1, and heating it at 100° C. for 30 minutes, and a perovskite thin film prepared in Example 1 SEM image of (c) is shown.
  • Figure 2 shows the time-dependent SEM image of the perovskite thin film of Example 1 of the present invention.
  • FIG. 3 shows SEM images of non-annealing and annealing when 4-dimethylaminopyridine is applied.
  • FIG. 5 shows SEM images for each concentration of 4-dimethylaminopyridine of the perovskite thin film.
  • Figure 6 shows the X-ray diffraction pattern for each concentration of 4-dimethylaminopyridine of the perovskite thin film.
  • TCSPC Time-Correlated Single Photon Counting
  • Example 8 is a graph showing the strength of adhesion between the perovskite thin film and the hole transport layer prepared in Example 1 and Comparative Example 1 of the present invention.
  • Example 9 is a graph showing the long-term stability of the perovskite solar cells prepared in Example 1 and Comparative Example 1 of the present invention.
  • DMAP 4-dimethylaminopyridine
  • alkyl refers to a saturated straight-chain or branched non- having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms (when the number of carbon atoms is not particularly limited). It means a cyclic hydrocarbon. "Lower alkyl” means straight-chain or branched alkyl having 1 to 4 carbon atoms.
  • saturated straight chain alkyls are -methyl, -ethyl, -n-propyl, -n-butyl, -n-pentyl, -n-hexyl, -n-heptyl, -n-octyl, -n-nonyl and -n- contains decyl
  • saturated branched alkyl is -isopropyl, -sec-butyl, -isobutyl, -tert-butyl, isopentyl, 2-methylhexyl, 3-methylbutyl, 2-methylpentyl, 3- Methylpentyl, 4-methylpentyl, 2-methylhexyl, 3-methylhexyl, 2-methylpentyl, 3-methylpentyl, 4-methylpentyl, 2-methylhexyl, 3-methylhexyl, 4-methylpentyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5-
  • C1-6 alkyl When described as “C1-6" in the present specification, it means that it has 1 to 6 carbon atoms.
  • C 1-6 alkyl means alkyl having 1 to 6 carbon atoms.
  • heterocycle is a cyclic compound containing a heteroatom, including heterocycloalkyl and heteroaryl, and may be a C3-C20, preferably C3-C12, more preferably C3-C8 heterocyclic compound. there is.
  • heterocycloalkyl has 2 to 12, preferably 2 to 10 carbon atoms and 1 to 6 heteroatoms selected from the group consisting of nitrogen, oxygen and sulfur, for example 1 to 5 refers to a stable 3- to 18-membered saturated or partially unsaturated radical consisting of heteroatoms, 1 to 4 heteroatoms, 1 to 3 heteroatoms, or 1 to 2 heteroatoms.
  • Exemplary heterocyclealkyls include, but are not limited to, stable 3-15 membered saturated or partially unsaturated radicals, stable 3-12 membered saturated or partially unsaturated radicals, stable 3-9 membered saturated or partially unsaturated radicals, stable 8-membered saturated or partially unsaturated radicals, and stable 8-membered saturated or partially unsaturated radicals. radicals, stable 7-membered saturated or partially unsaturated radicals, stable 6-membered saturated or partially unsaturated radicals, or stable 5-membered saturated or partially unsaturated radicals.
  • heteroaryl has at least one heteroatom selected from the group consisting of nitrogen, oxygen and sulfur, and includes 5 to 10 carbon atoms including at least one carbon atom, including mono- and bicyclic ring systems. It is an aromatic heterocycle ring of members.
  • heteroaryls include triazolyl, tetrazolyl, oxadiazolyl, pyridyl, furyl, benzofuranyl, thiophenyl, benzothiophenyl, quinolinyl, pyrrolyl, indolyl, oxazolyl, benzoxazolyl ( benzoxazolyl), imidazolyl, benzimidazolyl, thiazolyl, benzothiazolyl, isoxazolyl, pyrazolyl, isothiazolyl, pyridazinyl, pyrimidinyl, pyrazinyl, tria Zinyl, cinnolinyl, phthalazinyl, quinazolinyl, pyrimidyl, oxetanyl, azepinyl, piperazinyl, morpholinyl, dioxanyl, thietanyl and oxazolyl.
  • substituted means that the hydrogen atom of the moiety being substituted (eg, alkyl, aryl, heteroaryl, heterocycle, or cycloalkyl) is replaced by a substituent.
  • each carbon atom of the group being substituted is unsubstituted by more than two substituents.
  • each carbon atom of the group being substituted is unsubstituted by more than one substituent.
  • the two hydrogen atoms are replaced by an oxygen attached to the carbon by a double bond.
  • substituted substituents are hydrogen, halogen, amino, (C1-C10)alkyl, (C1-C10)alkoxy(C1-C10)alkyl, halo(C1-C10)alkyl, (C6-C12)aryl, (C3-C10)heterocycle or (C3-C12)heteroaryl.
  • One aspect of the present invention is a perovskite thin film having a passivated grain boundary.
  • Perovskite thin film according to an embodiment of the present invention is a perovskite structure crystal
  • the presence of a Lewis base at the grain boundary of the perovskite structure crystal can be found through GIWAX measurement of the perovskite thin film.
  • the perovskite thin film according to an embodiment of the present invention a Lewis base is selectively present at the grain boundary of the perovskite structure crystal, thereby preventing defects in the perovskite structure crystal. Therefore, the perovskite thin film of the present invention has excellent properties.
  • the Lewis base present at the grain boundary of the perovskite thin film according to an embodiment of the present invention is selectively distributed at the grain boundary interface of the perovskite thin film unlike conventional surface treatment materials, and the formed Lewis base crystal is The passivation is stably maintained even at a high temperature, specifically 100 °C, which greatly improves the efficiency of the electronic device employing it.
  • the perovskite thin film according to an embodiment of the present invention has a crystal of a Lewis base at the grain boundary of the perovskite structure crystal. Able to know.
  • the electronic device including the perovskite thin film of the present invention has more improved efficiency and durability.
  • the Lewis base according to an embodiment of the present invention may be a compound containing any one or two or more electron donor elements selected from N, O, and S, and specifically, any one or two or more selected from N, O and S It may be a C3-C20 heterocyclic compound containing an electron donor element.
  • the Lewis base according to an embodiment of the present invention may be a monomolecular C3-C20 heterocyclic compound containing any one or two or more electron donor elements selected from N, O, and S, and is preferably selected from N and O. It may be monomolecular C3-C10 heterocycloalkyl or monomolecular C3-C10 heteroaryl containing at least one.
  • the Lewis base according to an embodiment of the present invention may be a mono-molecular C3-C10 heterocycloalkyl or a mono-molecular C3-C10 heteroaryl into which a mono-C1-C10 alkylamino group or a di-C1-C10 alkylamino group is introduced.
  • the Lewis base according to an embodiment of the present invention may be a compound represented by the following Chemical Formula 5 or Chemical Formula 6.
  • R and R' are independently of each other C1-C5 alkyl
  • A is O, S or NR 24 ;
  • R 11 , R 12 and R 21 to R 24 are each independently hydrogen or C 1 -C 5 alkyl
  • n is an integer from 0 to 4
  • m is an integer from 0 to 3.
  • R and R' are each independently C1-C3 alkyl;
  • A is O, S or NR 24 ;
  • R 11 , R 12 , R 21 to R 24 are each independently hydrogen or C 1 -C 3 alkyl;
  • n is an integer from 0 to 2, m may be an integer from 0 to 2,
  • R and R' are each independently C1-C3 alkyl;
  • A is O or NR 24 ;
  • R 11 , R 12 , R 21 to R 24 are each independently hydrogen or C 1 -C 3 alkyl;
  • n may be an integer from 0 to 1
  • m may be an integer from 0 to 1.
  • the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine, tetramethylethylene. It may be any one or two or more selected from diamine and methyl-4-pyridinemethylamine, and preferably, the Lewis base according to an embodiment of the present invention may have a pKa value of 8 or more.
  • the perovskite structure crystal according to an embodiment of the present invention may be formed by heat-treating a perovskite precursor solution containing a compound satisfying the following Chemical Formula 1 and a metal halide satisfying the following Chemical Formula 2.
  • A is Cs + or an organocation
  • M is selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;
  • X is Br - , Cl - or I - .
  • the organic cation of A in Formula 1 may be a compound represented by Formula 3 or Formula 4 below.
  • R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl
  • R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.
  • the Lewis base employed in the present invention is characterized in that it is a compound containing any one or two or more electron donor elements selected from N, O and S.
  • the Lewis base employed in the present invention is characterized in that the pKa value (which is the pKa value in water) is 8 or more, specifically, the pKa value is 9 or more and 13 or less. If the pKa value is less than 8, the passivation effect of the perovskite grain boundaries may be reduced.
  • the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine , may be any one or two or more selected from tetramethylethylenediamine and methyl-4-pyridinemethylamine, but is not limited thereto.
  • the Lewis base may be any one or two or more selected from 4-dimethylaminopyridine, 1-methylpiperidine and tetramethylethylenediamine.
  • the compounds represented by Chemical Formulas 5 and 6 are uniformly dispersed in the perovskite grain boundaries and then bound, thereby effectively passivating the perovskite grain boundaries. there is.
  • the perovskite thin film of the present invention is characterized in that a hole transport layer is formed on the perovskite thin film in which Lewis base crystals are formed at grain boundaries.
  • the first step is a step of forming a perovskite structure crystal by applying a perovskite precursor solution to a substrate and performing primary heat treatment.
  • a perovskite precursor solution containing an inorganic or organic halide or a metal halide is applied on a substrate and subjected to a primary heat treatment.
  • the inorganic or organic halide according to an embodiment of the present invention may satisfy the following formula (1).
  • A is Cs + or an organocation
  • X is Br - , Cl - or I - .
  • the metal halide according to an embodiment of the present invention may satisfy the following formula (2).
  • M comprises a metal selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;
  • X is Br - , Cl - or I - .
  • the organic cation of A in Formula 1 may be represented by Formula 3 or Formula 4 below.
  • R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl
  • R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.
  • Chemical Formula 1 may be selected from CH 3 NH 3 I (methylammonium iodide), CH(NH 2 ) 2 I (formamidinium iodide), or CsI (cesium iodide).
  • the perovskite precursor solution may contain 0.8 to 1.2 moles of a metal halide with respect to 1 mole of the inorganic or organic halide.
  • the first heat treatment for annealing the applied perovskite precursor solution is not particularly limited as long as the solution is sufficiently dried and the temperature at which the perovskite structure can be stably maintained, but in one embodiment, the heat treatment is 50 to It may be carried out at a temperature of 300 °C for 10 minutes to 4 hours.
  • the step of forming a metal oxide thin film may be further performed, and the forming step of the metal oxide thin film may be performed by chemical or physical vapor deposition used in a typical semiconductor process, and ,
  • the material of the metal oxide thin film is, for example, Ti oxide, Zn oxide, In oxide, Sn oxide, W oxide, Nb oxide, Mo oxide, Mg oxide, Zr oxide, Sr oxide, Yr oxide, La oxide, V oxide, It may be at least one material selected from Al oxide, Y oxide, Sc oxide, Sm oxide, Ga oxide, SrTi oxide, and composites thereof, and more preferably, at least one material selected from Ti oxide, Sn oxide, and composites thereof. there is.
  • the second step is a step of forming a Lewis base crystal at the grain boundary of the perovskite structure by applying a Lewis base solution to the crystals of the perovskite structure and performing secondary heat treatment.
  • the Lewis base employed in the present invention may be any one selected from N, O, and S, or a compound containing two or more electron donor elements.
  • the Lewis base employed in the present invention is characterized in that the pKa value is 8 or more, specifically, the pKa value is 9 or more and 13 or less. If the pKa value is less than 8, the passivation effect of the perovskite grain boundaries may be reduced.
  • the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine , may be any one or two or more selected from tetramethylethylenediamine and methyl-4-pyridinemethylamine, but is not limited thereto.
  • the Lewis base may be any one or two or more selected from 4-dimethylaminopyridine, 1-methylpiperidine and tetramethylethylenediamine.
  • the Lewis base of the present invention may be one or two or more compounds selected from the compounds represented by Chemical Formulas 5 and 6.
  • the solvent for preparing the Lewis base solution may be used without particular limitation as long as it is a solvent that can dissolve the Lewis base and can be easily removed by volatilization during drying.
  • the solvent is chloroform, chlorobenzene, gamma-butyrolactone, formamide, N,N-dimethylformamide, diformamide, acetonitrile, tetrahydrofuran, dimethyl sulfoxide.
  • diethylene glycol, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, acetone, ⁇ -terpineol, ⁇ -terpineol, dihydroterpineol, 2-methoxyethanol , acetylacetone, methanol, ethanol, 2-propanol, butanol, pentanol, hexanol, ketone, diethyl ether, toluene and methyl isobutyl ketone may be any one or two or more selected from.
  • the solvent may be any one or two or more selected from chloroform, chlorobenzene, diethyl ether, toluene and 2-propanol.
  • the heat treatment temperature for the annealing of the Lewis base solution is not particularly limited, but in one embodiment may be performed at a temperature of 50 to 200° C. for 5 minutes to 20 minutes.
  • the annealing of the Lewis base solution may be performed at a temperature of 50 to 150° C., which is a low temperature process, for 5 to 15 minutes.
  • the present invention is different from the conventionally known method of adding a Lewis base to a perovskite precursor solution, after preparing a perovskite structure crystal (structure crystal layer), the Lewis base is placed at the grain boundary of the perovskite structure.
  • the Lewis base is evenly distributed at the grain boundaries of the perovskite structure crystals, and the Lewis base crystals formed at the grain boundaries are at high temperature.
  • the oxidation of metal cations in the perovskite structure is effectively suppressed, and the perovskite structure is stabilized, thereby improving the efficiency of the solar cell.
  • FTO substrate first electrode
  • SnCl 2 ⁇ 2H 2 O was dissolved in IPA at 70 mM, spin-coated at 3000 rpm for 30 seconds, and then heat treated at 150° C. for 30 minutes to control the thickness of the thin film.
  • the perovskite precursor solution was spin-coated on the thin SnO 2 layer prepared in Preparation Example 1 at 1000 rpm for 10 seconds and at 5000 rpm for 50 seconds, and annealed at a temperature of 100° C. for 60 minutes to form a perovskite. A structural crystal layer was formed. At this time, during the second spin coating, 1 ml of diethyl ether was dropped onto the first spin-coated perovskite precursor solution.
  • a chloroform solution containing 3 mmol of 4-dimethylaminopyridine (DMAP, pKa value in water (25° C.): 9.6) was applied on the perovskite structure crystal layer prepared above, which had been cooled after annealing, and was rotated at 5000 rpm. After spin coating for 30 seconds, it was annealed again at 100° C. for 5 minutes to form 4-dimethylaminopyridine crystals at the grain boundaries of the perovskite structure prepared above.
  • DMAP 4-dimethylaminopyridine
  • Bis(trifluoromethane)sulfonimide/acetonitrile (509 mg/ml) and 4-tert butylpyridine were added on the perovskite thin film layer where the Lewis base crystal was formed at the grain boundary of the prepared perovskite structure.
  • a PTAA/chloroform (10.5 mg/ml) solution containing the PTAA/chloroform (10.5 mg/ml) solution was spin-coated at 3000 rpm for 30 seconds to form a hole transport layer.
  • Au was vacuum-deposited on the top of the hole transport layer with a thermal evaporator of high vacuum (5x10 -6 torr or less) to form an Au electrode (second electrode) having a thickness of about 60 nm, and effective active The area (effective active area) was fixed at 0.096 cm2.
  • a photograph of the crystals of the DMAP powder in FIG. 1 is shown in (a), and the image of the evaporated DMAP crystals after heating the DMAP powder at 100° C. for 30 minutes is shown in (b), and the peroves prepared in Example 1 When DMAP was used on the skyte thin film, the SEM image bound through the immobilization of the defect is shown in (c).
  • Figure 2 shows the time SEM image of the perovskite thin film of Example 1
  • Figure 3 shows the SEM image of the case of not annealing (annealing) and annealing (a) when applying 4-dimethylaminopyridine .
  • the Lewis base when the Lewis base is treated without annealing after forming the perovskite structure crystal from FIG. 3 (pdmap w/o annealing, Comparative Example 1, (a)), the Lewis base is entirely at the grain boundary of the perovskite structure crystal. It can be seen that crystallization of the Lewis base occurs selectively at the grain boundary interface of the perovskite structure crystal when the Lewis base is treated (pdmap w annealing) after annealing after forming a perovskite structure crystal after irregular existence. there is.
  • Figure 4 shows the XRD diffraction patterns of DMAP, the perovskite thin film and the perovskite thin film prepared in Example 1.
  • DMAP is present on the perovskite thin film through GIWAX measurement of the perovskite thin film prepared in Example 1 in FIG. 10 .
  • Example 5 All the processes were the same as in Example 1, but in the step of forming a Lewis base crystal at the grain boundary of the prepared perovskite structure, 5 mmol (Example 2), 10 mmol (Example 3), 15 mmol (Example 4), respectively and 20 mmol (Example 5) of 4-dimethylaminopyridine solution were spin-coated and annealed on the perovskite structure crystals respectively prepared to form 4-dimethylaminopyridine crystals at the grain boundaries of the perovskite structure.
  • Example 5 shows SEM images of the perovskite thin films prepared in Example 1 (3 mmol), Example 2 (5 mmol), Example 3 (10 mmol), and Example 4 (15 mmol), It can be seen that a Lewis base crystal was formed at the grain boundary of the lobskite structure crystal.
  • Figure 6 shows the X-ray diffraction pattern for each concentration of 4-dimethylaminopyridine of the perovskite thin film.
  • FIG. 7 is a graph showing the change of TCSPC (Time-Correlated Single Photon Counting) using the perovskite thin film prepared in Examples 2 to 5 of the present invention. It can be seen from Figs. 5 and 6 that a perovskite thin film was formed, and from Fig. 7, as the treatment concentration of DMAP of the present invention increased, defects of the perovskite structure crystal were passivated and the lifespan was increased. there is.
  • TCSPC Time-Correlated Single Photon Counting
  • Example 1 except that the primary heat treatment was not carried out in the step of forming the perovskite structure crystal, in the same manner as in Example 1, except that the perovskite thin film and the same were used.
  • a perovskite solar cell was prepared by carrying out an SEM photograph (pdmap w/o annealing) of the prepared perovskite thin film is shown in FIG. 3 .
  • Example 1 To measure the current-voltage characteristics of the solar cells prepared in Example 1 and Comparative Example 1, an artificial solar device (ORIEL class A solar simulator, Newport, model 91195A) and a source-meter (Kethley, model 2420) ) was used.
  • ORIEL class A solar simulator Newport, model 91195A
  • source-meter Karl Fischer, model 2420
  • the bonding force between the perovskite thin film and the hole transport layer formed on the perovskite thin film of the perovskite solar cell prepared in Example 1 was measured by the double cantilever beam (DCB) test method, and the results are shown in FIG. 8 shown in
  • the adhesion between the perovskite thin film of the present invention and the hole transport layer is compared with the adhesion between the perovskite thin film and the hole transport layer of Comparative Example 1 (indicated by bare)
  • the improvement is remarkable.
  • the DMAP present at the grain boundary of the perovskite structure of the perovskite thin film of the present invention improves the adhesion, and the increase in the adhesion force allows the perovskite electronic device to have excellent durability.

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Abstract

The present invention relates to a perovskite thin film having passivated crystalline grain boundary, a method for preparing same, and a perovskite thin film comprising same, the perovskite thin film comprising: perovskite structure crystalline; and Lewis base crystalline formed on the grain boundary of the perovskite structure crystalline. An electronic device employing the perovskite thin film of the present invention has surprisingly enhanced properties.

Description

부동화된 결정입계를 갖는 페로브스카이트 박막, 이의 제조방법 및 이를 포함하는 전자소자Perovskite thin film having passivated grain boundaries, manufacturing method thereof, and electronic device comprising same

본 발명은 부동화된 결정입계를 갖는 페로브스카이트 박막 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법 및 이를 포함하는 전자소자에 관한 것이다.The present invention relates to a method for manufacturing a perovskite thin film having passivated grain boundaries and an electronic device including the same.

고효율 페로브스카이트 태양전지를 제조하기 위해서는 균일한 두께의 박막으로 결정성이 우수하고 결정크기가 큰 페로브스카이트 박막을 제조하는 것이 핵심이다. 고효율 태양전지의 제조를 위해서는 페로브스카이트 박막의 균일도와 품질을 개선하여 밀도가 높고 결정성이 우수한 페로브스카이트 박막을 제조하는 것이 요구된다. 그런데 제조된 페로브스카이트 박막은 그 제조방법의 특징에 기인하여 결정 사이의 입계(grain boundary)가 형성될 수밖에 없고, 결과적으로는 이 입계로 인하여 균일한 박막이 형성되기 어렵다.In order to manufacture a high-efficiency perovskite solar cell, it is essential to produce a perovskite thin film with a uniform thickness and excellent crystallinity and a large crystal size. In order to manufacture a high-efficiency solar cell, it is required to improve the uniformity and quality of the perovskite thin film to produce a perovskite thin film with high density and excellent crystallinity. However, in the prepared perovskite thin film, grain boundaries between crystals are inevitably formed due to the characteristics of the manufacturing method, and as a result, it is difficult to form a uniform thin film due to the grain boundaries.

균일한 박막을 만들면서도 전기화학적 특성이 우수한 박막을 만드는 것은 순수한 페로브스카이트 용액만으로 구현하는 것이 어려워 루이스 염기 등 여러 첨가제를 페로브스카이트 전구체 용액에 함께 혼합하여 물성이 우수한 페로브스카이트 박막을 제조하는 방법이 공지되었으나, 균일한 페로브스카이트 박막을 제조하는 데에는 한계가 있었다.It is difficult to make a thin film with excellent electrochemical properties while making a uniform thin film, so it is difficult to implement only with a pure perovskite solution. Although a method for producing a was known, there was a limit to producing a uniform perovskite thin film.

상기와 같은 문제점을 해결하기 위하여 본 발명은 페로브스카이트 구조결정을 형성한 후, 상기 페로브스카이트 구조결정의 입계에 루이스 염기 결정을 형성하면 상기 페로브스카이트 박막의 결정입계가 부동화(passivation)되어 이를 포함하는 전자소자의 효율을 향상시킬 수 있는 것을 확인하고, 본 발명을 완성하기에 이르렀다.In order to solve the above problems, the present invention provides a passivation ( passivation) and confirmed that the efficiency of an electronic device including the same can be improved, and the present invention has been completed.

이에 본 발명은 부동화된 결정입계를 갖는 페로브스카이트 박막 및 이의 제조방법을 제공한다.Accordingly, the present invention provides a perovskite thin film having a passivated grain boundary and a method for manufacturing the same.

또한 본 발명은 본 발명의 페로브스카이트 박막을 체용한 전자소자를 제공한다.In addition, the present invention provides an electronic device using the perovskite thin film of the present invention.

상기 목적을 달성하기 위하여 본 발명은 부동화된 결정입계를 갖는 페로브스카이트 박막을 제공하는 것으로, 본 발명의 페로브스카이트 박막은,In order to achieve the above object, the present invention provides a perovskite thin film having a passivated grain boundary, the perovskite thin film of the present invention,

페로브스카이트 구조 결정; 및perovskite structure determination; and

상기 페로브스카이트 구조 결정의 입계에 형성된 루이스 염기 결정;을 포함한다.and a Lewis base crystal formed at the grain boundary of the perovskite structure crystal.

본 발명의 일 실시예에 따른 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 화합물일 수 있으며, 바람직하게 pKa 값이 8 이상일 수 있다.The Lewis base according to an embodiment of the present invention may be a compound including any one or two or more electron donor elements selected from N, O, and S, and preferably a pKa value of 8 or more.

구체적으로 본 발명의 일 실시예에 따른 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상일 수 있으나, 이에 한정이 있는 것은 아니다.Specifically, the Lewis base according to an embodiment of the present invention is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine , triethylamine, tetramethylethylenediamine, and methyl-4-pyridinemethylamine may be any one or two or more selected from, but is not limited thereto.

본 발명의 일 실시예에 따른 페로브스카이트 박막은 하기 화학식 1을 만족하는 화합물 및 하기 화학식 2를 만족하는 금속할로겐화물을 포함하는 페로브스카이트 전구체 용액을 열처리하여 형성된 것일 수 있다.The perovskite thin film according to an embodiment of the present invention may be formed by heat-treating a perovskite precursor solution containing a compound satisfying the following Chemical Formula 1 and a metal halide satisfying the following Chemical Formula 2.

[화학식 1][Formula 1]

AXAX

[화학식 2][Formula 2]

MX2 mx 2

(상기 화학식 1 및 2에서,(In Formulas 1 and 2,

A는 Cs+ 또는 유기양이온이고;A is Cs + or an organocation;

M은 Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge 및 이들의 조합들로 이루어진 군으로부터 선택되고;M is selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;

X는 Br-, Cl- 또는 I-이다.)X is Br - , Cl - or I - .)

구체적으로 본 발명의 일 실시예에 따른 화학식 1에서 A의 유기양이온은 하기 화학식 3 또는 화학식 4로 표시되는 화합물일 수 있다.Specifically, the organocation of A in Formula 1 according to an embodiment of the present invention may be a compound represented by Formula 3 or Formula 4 below.

[화학식 3][Formula 3]

(R1R2N=CH-NR3R4)+ (R 1 R 2 N=CH-NR 3 R 4 ) +

[화학식 4][Formula 4]

(R5R6R7R8N)+ (R 5 R 6 R 7 R 8 N) +

(상기 화학식 3 및 4에서,(In Formulas 3 and 4,

R1 내지 R4는 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C6)알킬로부터 선택되고;R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl;

R5 내지 R8은 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C20)알킬 또는 비치환 또는 치환된 아릴로부터 선택된다.)R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.)

또한 본 발명은 본 발명의 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법을 제공하는 것으로, 본 발명의 페로브스카이트 박막의 제조방법은In addition, the present invention provides a method for manufacturing a perovskite thin film having an immobilized grain boundary of the present invention, the method for manufacturing a perovskite thin film of the present invention is

기판에 페로브스카이트 용액을 도포 및 1차 열처리하여 페로브스카이트 구조 결정을 형성하는 단계; 및forming a perovskite structure crystal by applying a perovskite solution to a substrate and performing primary heat treatment; and

상기 페로브스카이트 구조 결정에 루이스 염기용액을 도포 및 2차 열처리하여 상기 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성시키는 단계;를 포함한다.and applying a Lewis base solution to the perovskite structure crystal and performing secondary heat treatment to form a Lewis base crystal at the grain boundary of the perovskite structure crystal.

본 발명의 일 실시예에 따른 루이스 염기용액은 pKa값이 8 이상일 수 있으며, 구체적으로 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상일 수 있으나, 이에 한정이 있는 것은 아니다.The Lewis base solution according to an embodiment of the present invention may have a pKa value of 8 or more, specifically piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, and 1 -Methylpyrrolidine, diethylamine, triethylamine, tetramethylethylenediamine, and may be any one or two or more selected from methyl-4-pyridinemethylamine, but is not limited thereto.

본 발명의 일 실시예에 따른 1차 열처리는 50 내지 300℃의 온도에서 수행되며, 2차 열처리는 50 내지 150℃의 온도에서 수행되는 것일 수 있다.The primary heat treatment according to an embodiment of the present invention may be performed at a temperature of 50 to 300 °C, and the secondary heat treatment may be performed at a temperature of 50 to 150 °C.

또한 본 발명은 본 발명의 페로브스카이트 박막을 포함하는 전자소자를 제공한다.In addition, the present invention provides an electronic device comprising the perovskite thin film of the present invention.

본 발명의 일 실시예에 따른 페로브스카이트 박막은 페로브스카이트 구조결정의 입계에 루이스 염기 결정이 자리함으로써 페로브스카이트 구조 내 금속 양이온의 산화를 효과적으로 억제하여, 페로브스카이트 구조를 안정하게 만들어 이를 포함하는 전자소자의 효율을 향상시킨다.The perovskite thin film according to an embodiment of the present invention effectively inhibits the oxidation of metal cations in the perovskite structure by placing Lewis base crystals at the grain boundaries of the perovskite structure crystals, thereby forming the perovskite structure. By making it stable, the efficiency of the electronic device including the same is improved.

본 발명의 일 실시예에 따른 페로브스카이트 박막의 제조방법은 페로브스카이트 전구체 용액에 루이스 염기 화합물을 첨가하는 기존의 공지된 방법과 달리 페로브스카이트 구조결정을 형성한 후 완성된 페로브스카이트 구조결정 상에 형성된 루이스 염기를 도포 및 열처리함으로써 루이스 염기가페로브스카이트 결정입계에 골고루 분포하게 될 뿐만 아니라, 고온에서도 페로브스카이트 박막 상에서 안정하게 유지되어 페로브스카이트 박막 결정입계의 부동화를 유지할 수 있다.The method of manufacturing a perovskite thin film according to an embodiment of the present invention is different from the conventionally known method of adding a Lewis base compound to a perovskite precursor solution, after forming a perovskite structure crystal By applying and heat-treating the Lewis base formed on the rovskite structure crystal, the Lewis base is not only evenly distributed at the perovskite grain boundary, but also stably maintained on the perovskite thin film at high temperature, thereby maintaining the perovskite thin film grain boundary. can maintain the immobilization of

따라서 본 발명의 페로브스카이트 박막을 포함하는 전자소자는 놀랍도록 향상된 특성을 가진다.Therefore, the electronic device including the perovskite thin film of the present invention has surprisingly improved properties.

도 1은 DMAP을 결정(a), 제조예 1에서 제조된 기판에 스핀코팅한 후, 이를 100℃에서 30분 가열한 후의 박막의 사진(b) 및 실시예 1에서 제조된 페로브스카이트 박막의 SEM 이미지(c)를 나타내었다.1 is a photograph (b) of a thin film after spin-coating DMAP on a crystal (a), a substrate prepared in Preparation Example 1, and heating it at 100° C. for 30 minutes, and a perovskite thin film prepared in Example 1 SEM image of (c) is shown.

도 2는 본 발명의 실시예 1의 페로브스카이트 박막의 시간별 SEM 이미지를 나타낸 것이다.Figure 2 shows the time-dependent SEM image of the perovskite thin film of Example 1 of the present invention.

도 3은 4-디메틸아미노피리딘 도포 시 어닐링(annealing)하지 않은 경우와 어닐링 한 경우의 SEM 이미지를 나타낸 것이다.FIG. 3 shows SEM images of non-annealing and annealing when 4-dimethylaminopyridine is applied.

도 4는 DMAP, 페로브스카이트 박막 및 실시예 1에서 제조된 페로브스카이트 박막의 XRD 회절 패턴을 나타내었다.4 shows the XRD diffraction patterns of DMAP, the perovskite thin film and the perovskite thin film prepared in Example 1.

도 5는 페로브스카이트 박막의 4-디메틸아미노피리딘 농도별 SEM 이미지를 나타낸 것이다.FIG. 5 shows SEM images for each concentration of 4-dimethylaminopyridine of the perovskite thin film.

도 6은 페로브스카이트 박막의 4-디메틸아미노피리딘 농도별 X선 회절 패턴을 나타낸 것이다. Figure 6 shows the X-ray diffraction pattern for each concentration of 4-dimethylaminopyridine of the perovskite thin film.

도 7은 본 발명의 실시예 2 내지 5에서 제조된 페로브스카이트 박막을 이용한 TCSPC(Time-Correlated Single Photon Counting)의 변화를 나타낸 그래프이다.7 is a graph showing the change of TCSPC (Time-Correlated Single Photon Counting) using the perovskite thin film prepared in Examples 2 to 5 of the present invention.

도 8은 본 발명의 실시예 1 및 비교예 1에서 제조된 페로브스카이트 박막과 정공정달층과의 접착력 세기를 나타낸 그래프이다.8 is a graph showing the strength of adhesion between the perovskite thin film and the hole transport layer prepared in Example 1 and Comparative Example 1 of the present invention.

도 9는 본 발명의 실시예 1 및 비교예 1에서 제조된 페로브스카이트 태양전지의 장기 안정성을 나타낸 그래프이다.9 is a graph showing the long-term stability of the perovskite solar cells prepared in Example 1 and Comparative Example 1 of the present invention.

도 10 본 발명의 페로브스카이트 박막상의 4-디메틸아미노피리딘(DMAP) 결정을 GIWAX 측정을 통해 확인한 도면이다.10 is a view confirming 4-dimethylaminopyridine (DMAP) crystals on the perovskite thin film of the present invention through GIWAX measurement.

이하 첨부한 도면들을 참조하여 본 발명에 따른 부동화된 결정입계를 갖는 페로브스카이트 박막 및 이의 제조방법에 대하여 상세히 설명한다. 다음에 소개되는 도면들은 당업자에게 본 발명의 사상이 충분히 전달될 수 있도록 하기 위해 예로서 제공되는 것이다. 따라서, 본 발명은 이하 제시되는 도면들에 한정되지 않고 다른 형태로 구체화될 수도 있다. 또한 명세서 전체에 걸쳐서 동일한 참조번호들은 동일한 구성요소들을 나타낸다.Hereinafter, a perovskite thin film having an immobilized grain boundary according to the present invention and a method for manufacturing the same will be described in detail with reference to the accompanying drawings. The drawings introduced below are provided as examples so that the spirit of the present invention can be sufficiently conveyed to those skilled in the art. Accordingly, the present invention is not limited to the drawings presented below and may be embodied in other forms. Also, like reference numerals refer to like elements throughout.

이때, 사용되는 기술 용어 및 과학 용어에 있어서 다른 정의가 없다면, 이 발명이 속하는 기술 분야에서 통상의 지식을 가진 자가 통상적으로 이해하고 있는 의미를 가지며, 하기의 설명 및 첨부 도면에서 본 발명의 요지를 불필요하게 흐릴 수 있는 공지 기능 및 구성에 대한 설명은 생략한다.At this time, if there is no other definition in the technical terms and scientific terms used, it has the meaning commonly understood by those of ordinary skill in the art to which this invention belongs, and the gist of the present invention in the following description and accompanying drawings Descriptions of known functions and configurations that may be unnecessarily obscure will be omitted.

본 명세서에서 사용된 용어 "알킬"은 (탄소수가 특별히 한정되지 않은 경우) 탄소수 1 내지 10, 바람직하게 탄소수 1 내지 6, 보다 바람직하게 탄소수 1 내지 4를 가진 포화된 직쇄상 또는 분지상의 비-고리(cyclic) 탄화수소를 의미한다. "저급 알킬"은 탄소수가 1 내지 4인 직쇄상 또는 분지상 알킬을 의미한다. 대표적인 포화 직쇄상 알킬은 -메틸, -에틸, -n-프로필, -n-부틸, -n-펜틸, -n-헥실, -n-헵틸, -n-옥틸, -n-노닐 과 -n-데실을 포함하고, 반면에 포화 분지상 알킬은 -이소프로필, -sec-부틸, -이소부틸, -tert-부틸, 이소펜틸, 2-메틸헥실, 3-메틸부틸, 2-메틸펜틸, 3-메틸펜틸, 4-메틸펜틸, 2-메틸헥실, 3-메틸헥실, 2-메틸펜틸, 3-메틸펜틸, 4-메틸펜틸, 2-메틸헥실, 3-메틸헥실, 4-메틸헥실, 5- 메틸헥실, 2,3-디메틸부틸, 2,3-디메틸펜틸, 2,4-디메틸펜틸, 2,3-디메틸헥실, 2,4-디메틸헥실, 2,5-디메틸헥실, 2,2-디메틸펜틸, 2,2-디메틸헥실, 3,3-디메틸펜틸, 3,3-디메틸헥실, 4,4-디메틸헥실, 2-에틸펜틸, 3-에틸펜틸, 2-데틸헥실, 3-에틸헥실, 4-에틸헥실, 2-메틸-2-에틸펜틸, 2-메틸-3-에틸펜틸, 2-메틸-4-에틸펜틸, 2-메틸-2-에틸헥실, 2-메틸-3-에틸헥실, 2-메틸-4-에틸헥실, 2,2-디에틸펜틸, 3,3-디에틸헥실, 2,2-디에틸헥실, 및 3,3-디에틸헥실을 포함한다.As used herein, the term “alkyl” refers to a saturated straight-chain or branched non- having 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, more preferably 1 to 4 carbon atoms (when the number of carbon atoms is not particularly limited). It means a cyclic hydrocarbon. "Lower alkyl" means straight-chain or branched alkyl having 1 to 4 carbon atoms. Representative saturated straight chain alkyls are -methyl, -ethyl, -n-propyl, -n-butyl, -n-pentyl, -n-hexyl, -n-heptyl, -n-octyl, -n-nonyl and -n- contains decyl, whereas saturated branched alkyl is -isopropyl, -sec-butyl, -isobutyl, -tert-butyl, isopentyl, 2-methylhexyl, 3-methylbutyl, 2-methylpentyl, 3- Methylpentyl, 4-methylpentyl, 2-methylhexyl, 3-methylhexyl, 2-methylpentyl, 3-methylpentyl, 4-methylpentyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5- Methylhexyl, 2,3-dimethylbutyl, 2,3-dimethylpentyl, 2,4-dimethylpentyl, 2,3-dimethylhexyl, 2,4-dimethylhexyl, 2,5-dimethylhexyl, 2,2-dimethyl Pentyl, 2,2-dimethylhexyl, 3,3-dimethylpentyl, 3,3-dimethylhexyl, 4,4-dimethylhexyl, 2-ethylpentyl, 3-ethylpentyl, 2-ethylhexyl, 3-ethylhexyl, 4-ethylhexyl, 2-methyl-2-ethylpentyl, 2-methyl-3-ethylpentyl, 2-methyl-4-ethylpentyl, 2-methyl-2-ethylhexyl, 2-methyl-3-ethylhexyl, 2-methyl-4-ethylhexyl, 2,2-diethylpentyl, 3,3-diethylhexyl, 2,2-diethylhexyl, and 3,3-diethylhexyl.

본 명세서에서 "C1-6"와 같이 기재될 경우 이는 탄소수가 1 내지 6개임을 의미한다. 예를 들어, C1-6알킬은 탄소 수가 1 내지 6인 알킬을 의미한다.When described as "C1-6" in the present specification, it means that it has 1 to 6 carbon atoms. For example, C 1-6 alkyl means alkyl having 1 to 6 carbon atoms.

본 명세서에서 “헤테로고리”는 헤테로원자를 포함하는 고리화합물로, 헤테로사이클로알킬 및 헤테로아릴을 포함하며, C3-C20, 바람직하게 C3-C12, 보다 좋기로는 C3-C8의 헤테로고리 화합물일 수 있다.As used herein, “heterocycle” is a cyclic compound containing a heteroatom, including heterocycloalkyl and heteroaryl, and may be a C3-C20, preferably C3-C12, more preferably C3-C8 heterocyclic compound. there is.

본 명세서에 사용된 용어 “헤테로사이클로알킬”은 2 내지 12개, 바람직하게 2 내지 10개의 탄소 원자 및 질소, 산소 및 황으로 이루어진 군으로부터 선택된 1 내지 6개의 헤테로원자, 예를 들어 1 내지 5개의 헤테로원자, 1 내지 4개의 헤테로원자, 1 내지 3개의 헤테로원자, 또는 1 내지 2개의 헤테로원자로 이루어진 안정한 3- 내지 18-원 포화 또는 일부 불포화 라디칼을 지칭한다. 예시적인 헤테로사이클알킬은 비제한적으로 안정한 3-15 원 포화 또는 일부 불포화 라디칼, 안정한 3-12 원 포화 또는 일부 불포화 라디칼, 안정한 3-9 원 포화 또는 일부 불포화 라디칼, 안정한 8-원 포화 또는 일부 불포화 라디칼, 안정한 7-원 포화 또는 일부 불포화 라디칼, 안정한 6-원 포화 또는 일부 불포화 라디칼, 또는 안정한 5-원 포화 또는 일부 불포화 라디칼을 포함한다.As used herein, the term “heterocycloalkyl” has 2 to 12, preferably 2 to 10 carbon atoms and 1 to 6 heteroatoms selected from the group consisting of nitrogen, oxygen and sulfur, for example 1 to 5 refers to a stable 3- to 18-membered saturated or partially unsaturated radical consisting of heteroatoms, 1 to 4 heteroatoms, 1 to 3 heteroatoms, or 1 to 2 heteroatoms. Exemplary heterocyclealkyls include, but are not limited to, stable 3-15 membered saturated or partially unsaturated radicals, stable 3-12 membered saturated or partially unsaturated radicals, stable 3-9 membered saturated or partially unsaturated radicals, stable 8-membered saturated or partially unsaturated radicals, and stable 8-membered saturated or partially unsaturated radicals. radicals, stable 7-membered saturated or partially unsaturated radicals, stable 6-membered saturated or partially unsaturated radicals, or stable 5-membered saturated or partially unsaturated radicals.

본 명세서에서 사용된 "헤테로아릴"은 질소, 산소 및 황으로 구성된 군으로부터 선택된 적어도 하나의 헤테로원자를 가지고, 모노- 및 바이사이클릭 링 시스템을 포함하는 적어도 하나의 탄소 원자를 포함하는 5 내지 10 멤버의 방향족 헤테로고리(heterocycle) 링이다. 대표적인 헤테로아릴은 트리아졸일, 테트라졸일, 옥사디아졸일, 피리딜, 퓨릴, 벤조퓨라닐, 티오페닐, 벤조티오페닐, 퀴노리닐, 피롤일(pyrrolyl), 인돌일, 옥사졸일, 벤족사졸일(benzoxazolyl), 이미다졸일, 벤즈이미다졸일, 티아졸일(thiazolyl), 벤조티아졸일, 이속사졸일, 파이라졸일(pyrazolyl), 이소티아졸일, 피리다지닐, 피리미디닐, 파이라지닐, 트리아지닐, 신놀리닐(cinnolinyl), 프탈라지닐, 퀴나졸리닐, 피리미딜, 옥세타닐, 아제피닐, 피페라지닐, 모포리닐(morpholinyl), 디옥사닐, 티에타닐 및 옥사졸일이다. 헤테로아릴 그룹은 모노사이클릭 또는 바이사이클릭일 수 있다. 헤테로아릴은 용어 헤테로아릴환, 헤테로아릴 그룹 또는 헤테로방향족과 혼용하여 사용될 수 있으며, 이들 용어는 모두 임의로 치환된 환을 포함할 수 있다.As used herein, "heteroaryl" has at least one heteroatom selected from the group consisting of nitrogen, oxygen and sulfur, and includes 5 to 10 carbon atoms including at least one carbon atom, including mono- and bicyclic ring systems. It is an aromatic heterocycle ring of members. Representative heteroaryls include triazolyl, tetrazolyl, oxadiazolyl, pyridyl, furyl, benzofuranyl, thiophenyl, benzothiophenyl, quinolinyl, pyrrolyl, indolyl, oxazolyl, benzoxazolyl ( benzoxazolyl), imidazolyl, benzimidazolyl, thiazolyl, benzothiazolyl, isoxazolyl, pyrazolyl, isothiazolyl, pyridazinyl, pyrimidinyl, pyrazinyl, tria Zinyl, cinnolinyl, phthalazinyl, quinazolinyl, pyrimidyl, oxetanyl, azepinyl, piperazinyl, morpholinyl, dioxanyl, thietanyl and oxazolyl. A heteroaryl group may be monocyclic or bicyclic. Heteroaryl may be used interchangeably with the terms heteroaryl ring, heteroaryl group, or heteroaromatic, and all of these terms may include an optionally substituted ring.

본 명세서에서 사용된 용어 "치환된"(substituted)은 치환되는 부분(예를 들어, 알킬, 아릴, 헤테로아릴, 헤테로사이클 또는 사이클로알킬)의 수소 원자가 치환기로 대체되는 것을 의미한다. 일 실시예에서, 치환되는 그룹의 각각의 탄소원자는 2개의 치환기이상 치환되지 않는다. 다른 실시예에서, 치환되는 그룹의 각각의 탄소원자는 1개의 치환기 이상 치환되지 않는다. 케토치환기의 경우, 두개의 수소원자는 이중결합에 의해 탄소에 부착되는 산소로 치환된다. 치환체와 관련하여 별도의 기재가 없는 한, 본 발명의 임의로 치환된 치환체로는 할로겐, 하이드록실, (저급)알킬, 할로알킬, 모노- 또는 디-알킬아미노, 아릴, 헤테로사이클, -NO2, -NRa1Rb1, -NRa1C(=O) Rb1, -NRa1C(=O)NRa1Rb1, -NRa1C(=O)ORb1, -NRa1SO2Rb1, -ORa1, -CN, -C(=O)Ra1, -C(=O)ORa1, -C(=O)NRa1Rb1, -OC(=O)Ra1, -OC(=O)ORa1, -OC(=O)NRa1Rb1, -NRa1SO2Rb1, -PO3Ra1, -PO(ORa1)(ORb1), -SO2Ra1, -S(O)Ra1, -SO(NRa1)Rb1 (예를 들어, sulfoximine), -S(NRa1)Rb1 (예를 들어, sulfilimine) 및 -SRa1가 이용될 수 있으며, 여기에서 Ra1와 Rb1는 같거나 다를 수 있으며, 서로 독립적으로 하이드로겐, 할로겐, 아미노, 알킬, 알콕시알킬, 할로알킬, 아릴 또는 헤테로사이클이고, 또는 부착된 질소원자와 같이 Ra1와 Rb1는 헤테로사이클 형태가 될 수 있다. 여기서 Ra1와 Rb1는 결합된 원자에 따라 복수 개일 수 있으며, 바람직하게 상기 알킬은 C1-6알킬일 수 있으며, 아릴은 C6-12일 수 있으며, 헤테로사이클은 C3-12일 수 있다. 바람직하게 “치환된” 치환기는 하이드로겐, 할로겐, 아미노, (C1-C10)알킬, (C1-C10)알콕시(C1-C10)알킬, 할로(C1-C10)알킬, (C6-C12)아릴, (C3-C10)헤테로사이클 또는 (C3-C12)헤테로아릴일 수 있다.As used herein, the term "substituted" means that the hydrogen atom of the moiety being substituted (eg, alkyl, aryl, heteroaryl, heterocycle, or cycloalkyl) is replaced by a substituent. In one embodiment, each carbon atom of the group being substituted is unsubstituted by more than two substituents. In another embodiment, each carbon atom of the group being substituted is unsubstituted by more than one substituent. In the case of a keto substituent, the two hydrogen atoms are replaced by an oxygen attached to the carbon by a double bond. Unless otherwise stated with respect to the substituent, optionally substituted substituents of the present invention include halogen, hydroxyl, (lower) alkyl, haloalkyl, mono- or di-alkylamino, aryl, heterocycle, -NO 2 , -NR a1 R b1 , -NR a1 C(=O) R b1 , -NR a1 C(=O)NR a1 R b1 , -NR a1 C(=O)OR b1 , -NR a1 SO 2 R b1 , - OR a1 , -CN, -C(=O)R a1 , -C(=O)OR a1 , -C(=O)NR a1 R b1 , -OC(=O)R a1 , -OC(=O) OR a1 , -OC(=O)NR a1 R b1 , -NR a1 SO 2 R b1 , -PO 3 R a1 , -PO(OR a1 )(OR b1 ), -SO 2 R a1 , -S(O) R a1 , -SO(NR a1 )R b1 (eg sulfoximine), -S(NR a1 )R b1 (eg sulfilimine) and -SR a1 may be used, wherein R a1 and R b1 may be the same or different, independently of each other hydrogen, halogen, amino, alkyl, alkoxyalkyl , haloalkyl, aryl or heterocycle ; can Here, R a1 and R b1 may be plural depending on the atom to which they are bonded, and preferably, the alkyl may be C 1-6 alkyl, aryl may be C 6-12 , and heterocycle may be C 3-12 . there is. Preferably “substituted” substituents are hydrogen, halogen, amino, (C1-C10)alkyl, (C1-C10)alkoxy(C1-C10)alkyl, halo(C1-C10)alkyl, (C6-C12)aryl, (C3-C10)heterocycle or (C3-C12)heteroaryl.

본 발명의 일 양태는 부동화된 결정입계를 갖는 페로브스카이트 박막이다.One aspect of the present invention is a perovskite thin film having a passivated grain boundary.

본 발명의 일 실시예에 따른 페로브스카이 박막은 페로브스카이트 구조 결정; 및 Perovskite thin film according to an embodiment of the present invention is a perovskite structure crystal; and

상기 페로브스카이트 구조 결정의 입계에 형성된 루이스 염기 결정;을 포함한다.and a Lewis base crystal formed at the grain boundary of the perovskite structure crystal.

본 발명의 일 실시예에 따른 페로브스카이트 박막은 페로브스카이트 구조결정의 입계에 루이스 염기가 존재함을 페로브스카이트 박막의 GIWAX 측정을 통해 알 수 있다.In the perovskite thin film according to an embodiment of the present invention, the presence of a Lewis base at the grain boundary of the perovskite structure crystal can be found through GIWAX measurement of the perovskite thin film.

구체적으로 본 발명의 일 실시예에 따른 페로브스카이트 박막은 페로브스카이트 구조결정의 입계 경계 (Grain boundary)에 루이스 염기가 선택적으로 존재함으로써 페로브스카이트 구조결정의 결함을 막는 역할을 하는 것으로 판단되며, 이에 본 발명의 페로브스카이트 박막은 우수한 특성을 가진다.Specifically, in the perovskite thin film according to an embodiment of the present invention, a Lewis base is selectively present at the grain boundary of the perovskite structure crystal, thereby preventing defects in the perovskite structure crystal. Therefore, the perovskite thin film of the present invention has excellent properties.

즉, 본 발명의 일 실시예에 따른 페로브스카이트 박막의 입계에 존재하는 루이스 염기는 기존 표면처리 물질들과는 달리 페로브스카이트 박막의 결정입계 계면에 선택적으로 분포하게 되고, 형성된 루이스 염기 결정은 고온, 구체적으로 100 ℃에서도 안정하게 부동화가 유지되어 이를 채용한 전자소자의 효율을 극히 향상시킨다.That is, the Lewis base present at the grain boundary of the perovskite thin film according to an embodiment of the present invention is selectively distributed at the grain boundary interface of the perovskite thin film unlike conventional surface treatment materials, and the formed Lewis base crystal is The passivation is stably maintained even at a high temperature, specifically 100 ℃, which greatly improves the efficiency of the electronic device employing it.

보다 구체적으로 도 10에 나타낸 바와 같이 GIWAX측정 결과에서 알 수 있는 바와 같이 본 발명의 일 실시예에 따른 페로브스카이트 박막은 페로브스카이트 구조결정의 입계 경계에 루이스 염기의 결정이 존재함을 알 수 있다.More specifically, as can be seen from the GIWAX measurement results as shown in FIG. 10, the perovskite thin film according to an embodiment of the present invention has a crystal of a Lewis base at the grain boundary of the perovskite structure crystal. Able to know.

이로서 본 발명의 페로브스카이트 박막을 포함하는 전자소자는 보다 향상된 효율 및 내구성을 가짐을 알 수 있다.As a result, it can be seen that the electronic device including the perovskite thin film of the present invention has more improved efficiency and durability.

본 발명의 일 실시예에 따른 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 화합물일 수 있으며, 구체적으로 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 C3-C20헤테로고리 화합물일 수 있다.The Lewis base according to an embodiment of the present invention may be a compound containing any one or two or more electron donor elements selected from N, O, and S, and specifically, any one or two or more selected from N, O and S It may be a C3-C20 heterocyclic compound containing an electron donor element.

본 발명의 일 실시예에 따른 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 단분자 C3-C20헤테로고리 화합물일 수 있으며, 바람직하게 N 및 O에서 선택되는 하나이상을 포함하는 단분자 C3-C10헤테로사이클로알킬 또는 단분자 C3-C10헤테로아릴일 수 있다.The Lewis base according to an embodiment of the present invention may be a monomolecular C3-C20 heterocyclic compound containing any one or two or more electron donor elements selected from N, O, and S, and is preferably selected from N and O. It may be monomolecular C3-C10 heterocycloalkyl or monomolecular C3-C10 heteroaryl containing at least one.

바람직하게 본 발명의 일 실시예에 따른 루이스 염기는 모노C1-C10알킬아미노기 또는 디C1-C10알킬아미노기가 도입된 단분자 C3-C10헤테로사이클로알킬 또는 단분자 C3-C10헤테로아릴일 수 있다.Preferably, the Lewis base according to an embodiment of the present invention may be a mono-molecular C3-C10 heterocycloalkyl or a mono-molecular C3-C10 heteroaryl into which a mono-C1-C10 alkylamino group or a di-C1-C10 alkylamino group is introduced.

보다 바람직하게 본 발명의 일 실시예에 따른 루이스 염기는 하기 화학식 5 또는 화학식 6으로 표시되는 화합물일 수 있다.More preferably, the Lewis base according to an embodiment of the present invention may be a compound represented by the following Chemical Formula 5 or Chemical Formula 6.

[화학식 5][Formula 5]

Figure PCTKR2021011034-appb-img-000001
Figure PCTKR2021011034-appb-img-000001

[화학식 6][Formula 6]

Figure PCTKR2021011034-appb-img-000002
Figure PCTKR2021011034-appb-img-000002

(상기 화학식 5 및 6에서,(In Formulas 5 and 6,

R 및 R’은 서로 독립적으로 C1-C5알킬이며;R and R' are independently of each other C1-C5 alkyl;

A는 O, S 또는 NR24이며;A is O, S or NR 24 ;

R11, R12 및 R21 내지 R24는 서로 독립적으로 수소 또는 C1-C5알킬이며;R 11 , R 12 and R 21 to R 24 are each independently hydrogen or C 1 -C 5 alkyl;

n은 0 내지 4의 정수이며, m은 0 내지 3의 정수이다.)n is an integer from 0 to 4, and m is an integer from 0 to 3.)

바람직하게 상기 화학식 5 및 6에서, R 및 R’은 서로 독립적으로 C1-C3알킬이며; A는 O, S 또는 NR24이며; R11, R12, R21 내지 R24는 서로 독립적으로 수소 또는 C1-C3알킬이며; n은 0 내지 2의 정수이며, m은 0 내지 2의 정수일 수 있으며, R 및 R’은 서로 독립적으로 C1-C3알킬이며; A는 O 또는 NR24이며; R11, R12, R21 내지 R24는 서로 독립적으로 수소 또는 C1-C3알킬이며; n은 0 내지 1의 정수이며, m은 0 내지 1의 정수일 수 있다.Preferably, in Formulas 5 and 6, R and R' are each independently C1-C3 alkyl; A is O, S or NR 24 ; R 11 , R 12 , R 21 to R 24 are each independently hydrogen or C 1 -C 3 alkyl; n is an integer from 0 to 2, m may be an integer from 0 to 2, R and R' are each independently C1-C3 alkyl; A is O or NR 24 ; R 11 , R 12 , R 21 to R 24 are each independently hydrogen or C 1 -C 3 alkyl; n may be an integer from 0 to 1, and m may be an integer from 0 to 1.

구체적으로 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상일 수 있으며, 바람직하게 본 발명의 일 실시예에 따른 루이스 염기는 pKa 값이 8 이상일 수 있다.Specifically, the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine, tetramethylethylene. It may be any one or two or more selected from diamine and methyl-4-pyridinemethylamine, and preferably, the Lewis base according to an embodiment of the present invention may have a pKa value of 8 or more.

본 발명의 일 실시예에 따른 페로브스카이트 구조결정은 하기 화학식 1을 만족하는 화합물 및 하기 화학식 2를 만족하는 금속할로겐화물을 포함하는 페로브스카이트 전구체 용액을 열처리하여 형성된 것일 수 있다.The perovskite structure crystal according to an embodiment of the present invention may be formed by heat-treating a perovskite precursor solution containing a compound satisfying the following Chemical Formula 1 and a metal halide satisfying the following Chemical Formula 2.

[화학식 1][Formula 1]

AXAX

[화학식 2][Formula 2]

MX2 mx 2

상기 화학식 1 및 2에서,In Formulas 1 and 2,

A는 Cs+ 또는 유기양이온이고;A is Cs + or an organocation;

M은 Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge 및 이들의 조합들로 이루어진 군으로부터 선택되고;M is selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;

X는 Br-, Cl- 또는 I-이다.X is Br - , Cl - or I - .

본 발명의 일 실시예에 따른 상기 화학식 1에서 A의 유기양이온은 하기 화학식 3 또는 화학식 4로 표시되는 화합물일 수 있다.The organic cation of A in Formula 1 according to an embodiment of the present invention may be a compound represented by Formula 3 or Formula 4 below.

[화학식 3][Formula 3]

(R1R2N=CH-NR3R4)+ (R 1 R 2 N=CH-NR 3 R 4 ) +

[화학식 4][Formula 4]

(R5R6R7R8N)+ (R 5 R 6 R 7 R 8 N) +

(상기 화학식 3 및 4에서,(In Formulas 3 and 4,

R1 내지 R4는 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C6)알킬로부터 선택되고;R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl;

R5 내지 R8은 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C20)알킬 또는 비치환 또는 치환된 아릴로부터 선택된다.)R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.)

본 발명에서 채용되는 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 화합물인 것을 특징으로 한다. 또한 본 발명에서 채용되는 루이스 염기는 pKa값(물에서의 pKa 값임)이 8 이상인 것을 특징으로 하며, 구체적으로는 pKa값이 9 이상 13 이하인 것을 특징으로 한다. pKa값이 8 미만이면 페로브스카이트 결정입계의 부동화 효과가 저하될 수 있다.The Lewis base employed in the present invention is characterized in that it is a compound containing any one or two or more electron donor elements selected from N, O and S. In addition, the Lewis base employed in the present invention is characterized in that the pKa value (which is the pKa value in water) is 8 or more, specifically, the pKa value is 9 or more and 13 or less. If the pKa value is less than 8, the passivation effect of the perovskite grain boundaries may be reduced.

일 구체예로, 상기 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있으나, 이에 제한되는 것은 아니다.In one embodiment, the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine , may be any one or two or more selected from tetramethylethylenediamine and methyl-4-pyridinemethylamine, but is not limited thereto.

보다 바람직하게는, 상기 루이스 염기는 4-디메틸아미노피리딘, 1-메틸피페리딘 및 테트라메틸에틸렌디아민에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있다. 본 발명의 일 실시예에 따른 루이스 염기중 상기 화학식 5 및 화학식 6으로 표시되는 화합물은 페로브스카이트 결정입계에 골고루 분산된 후 바인딩(binding)되어, 효과적으로 페로브스카이트 결정입계를 부동화시킬 수 있다.More preferably, the Lewis base may be any one or two or more selected from 4-dimethylaminopyridine, 1-methylpiperidine and tetramethylethylenediamine. Among the Lewis bases according to an embodiment of the present invention, the compounds represented by Chemical Formulas 5 and 6 are uniformly dispersed in the perovskite grain boundaries and then bound, thereby effectively passivating the perovskite grain boundaries. there is.

본 발명의 페로브스카이트 박막은, 루이스 염기 결정이 입계에 형성된 페로브스카이트 박막 위에 정공전달층이 형성되는 것을 특징으로 한다.The perovskite thin film of the present invention is characterized in that a hole transport layer is formed on the perovskite thin film in which Lewis base crystals are formed at grain boundaries.

이하, 본 발명에 따른 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법에 대하여 상세히 설명한다.Hereinafter, a method for manufacturing a perovskite thin film having a passivated grain boundary according to the present invention will be described in detail.

본 발명의 페로브스카이트 박막의 제조방법은,The manufacturing method of the perovskite thin film of the present invention,

기판에 페로브스카이트 전구체 용액을 도포 및 1차 열처리하여 페로브스카이트 구조 결정을 형성하는 단계; 및forming a perovskite structure crystal by applying a perovskite precursor solution to a substrate and performing primary heat treatment; and

상기 페로브스카이트 구조 결정에 루이스 염기용액을 도포 및 2차 열처리하여 상기 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성시키는 단계;forming a Lewis base crystal at the grain boundary of the perovskite structure by applying a Lewis base solution to the crystals of the perovskite structure and performing secondary heat treatment;

를 포함한다.includes

본 발명에 따른 제조방법에 있어서, 첫 번째 단계는 기판에 페로브스카이트 전구체 용액을 도포 및 1차 열처리하여 페로브스카이트 구조 결정을 형성하는 단계이다.In the manufacturing method according to the present invention, the first step is a step of forming a perovskite structure crystal by applying a perovskite precursor solution to a substrate and performing primary heat treatment.

이때, 상기 단계의 수행을 위하여 무기 또는 유기할로겐화물, 금속할로겐화물을 포함하는 페로브스카이트 전구체 용액을 기재 상에 도포하고 1차 열처리한다.At this time, in order to perform the above step, a perovskite precursor solution containing an inorganic or organic halide or a metal halide is applied on a substrate and subjected to a primary heat treatment.

본 발명의 일 예에 따른 무기 또는 유기할로겐화물은 하기 화학식 1을 만족하는 것일 수 있다.The inorganic or organic halide according to an embodiment of the present invention may satisfy the following formula (1).

[화학식 1][Formula 1]

AXAX

(상기 화학식 1에서,(In Formula 1,

A는 Cs+ 또는 유기양이온이고;A is Cs + or an organocation;

X는 Br-, Cl- 또는 I-이다.)X is Br - , Cl - or I - .)

본 발명의 일 예에 따른 금속할로겐화물은 하기 화학식 2를 만족하는 것일 수 있다.The metal halide according to an embodiment of the present invention may satisfy the following formula (2).

[화학식 2][Formula 2]

MX2 mx 2

(상기 화학식 2에서,(In Formula 2,

M은 Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge 및 이들의 조합들로 이루어진 군으로부터 선택되는 금속을 포함하는 것이고;M comprises a metal selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof;

X는 Br-, Cl- 또는 I-이다.)X is Br - , Cl - or I - .)

일 실시예에 따르면 상기 화학식 1의 A의 유기양이온은 하기 화학식 3 또는 화학식 4로 표시될 수 있다.According to an embodiment, the organic cation of A in Formula 1 may be represented by Formula 3 or Formula 4 below.

[화학식 3][Formula 3]

(R1R2N=CH-NR3R4)+ (R 1 R 2 N=CH-NR 3 R 4 ) +

[화학식 4][Formula 4]

(R5R6R7R8N)+ (R 5 R 6 R 7 R 8 N) +

(상기 화학식 3 및 4에서,(In Formulas 3 and 4,

R1 내지 R4는 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C6)알킬로부터 선택되고;R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl;

R5 내지 R8은 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C20)알킬 또는 비치환 또는 치환된 아릴로부터 선택된다.)R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl.)

보다 구체적으로 상기 화학식 1은 CH3NH3I(메틸암모늄 아이오이드), CH(NH2)2I(포름아미디늄 아이오다이드) 또는 CsI(세슘 아이오다이드)에서 선택되는 것일 수 있다.More specifically, Chemical Formula 1 may be selected from CH 3 NH 3 I (methylammonium iodide), CH(NH 2 ) 2 I (formamidinium iodide), or CsI (cesium iodide).

본 발명의 일 예에 있어, 페로브스카이트 전구체 용액은 무기 또는 유기할로겐화물 1몰에 대하여, 금속할로겐화물 0.8 내지 1.2몰을 함유하는 것일 수 있다.In an example of the present invention, the perovskite precursor solution may contain 0.8 to 1.2 moles of a metal halide with respect to 1 mole of the inorganic or organic halide.

상기 도포된 페로브스카이트 전구체 용액의 어닐링을 위한 1차 열처리는 용액이 충분히 건조되며, 페로브스카이트 구조가 안정적으로 유지될 수 있는 온도라면 특별히 한정하지 않으나, 일 구체예로 열처리는 50 내지 300 ℃의 온도에서 10분 내지 4시간 동안 수행될 수 있다.The first heat treatment for annealing the applied perovskite precursor solution is not particularly limited as long as the solution is sufficiently dried and the temperature at which the perovskite structure can be stably maintained, but in one embodiment, the heat treatment is 50 to It may be carried out at a temperature of 300 °C for 10 minutes to 4 hours.

상기 페로브스카이트구조 결정을 형성하기 전에 금속산화물 박막을 형성하는 단계가 더 수행될 수 있는데, 상기 금속산화물 박막의 형성단계는 통상의 반도체 공정에서 사용되는 화학적 또는 물리적 증착에 의해 수행될 수 있고, 상기 금속산화물 박막의 물질은 예를 들면 Ti산화물, Zn산화물, In산화물, Sn산화물, W산화물, Nb산화물, Mo산화물, Mg산화물, Zr산화물, Sr산화물, Yr산화물, La산화물, V산화물, Al산화물, Y산화물, Sc산화물, Sm산화물, Ga산화물 및 SrTi산화물 및 이들의 복합물 중에서 하나 이상 선택된 물질일 수 있으며, 보다 바람직하게는 Ti산화물, Sn산화물 및 이들의 복합물 중에서 하나 이상 선택된 물질일 수 있다.Before forming the perovskite structure crystal, the step of forming a metal oxide thin film may be further performed, and the forming step of the metal oxide thin film may be performed by chemical or physical vapor deposition used in a typical semiconductor process, and , The material of the metal oxide thin film is, for example, Ti oxide, Zn oxide, In oxide, Sn oxide, W oxide, Nb oxide, Mo oxide, Mg oxide, Zr oxide, Sr oxide, Yr oxide, La oxide, V oxide, It may be at least one material selected from Al oxide, Y oxide, Sc oxide, Sm oxide, Ga oxide, SrTi oxide, and composites thereof, and more preferably, at least one material selected from Ti oxide, Sn oxide, and composites thereof. there is.

본 발명에 따른 제조방법에 있어서, 두 번째 단계는 상기 페로브스카이트 구조 결정에 루이스 염기용액을 도포 및 2차 열처리하여 상기 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성시키는 단계이다.In the manufacturing method according to the present invention, the second step is a step of forming a Lewis base crystal at the grain boundary of the perovskite structure by applying a Lewis base solution to the crystals of the perovskite structure and performing secondary heat treatment.

본 발명에서 채용되는 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 화합물일 수 있다. 또한 본 발명에서 채용되는 루이스 염기는 pKa값이 8 이상인 것을 특징으로 하며, 구체적으로는 pKa값이 9 이상 13 이하인 것을 특징으로 한다. pKa값이 8 미만이면 페로브스카이트 결정입계의 부동화 효과가 저하될 수 있다.The Lewis base employed in the present invention may be any one selected from N, O, and S, or a compound containing two or more electron donor elements. In addition, the Lewis base employed in the present invention is characterized in that the pKa value is 8 or more, specifically, the pKa value is 9 or more and 13 or less. If the pKa value is less than 8, the passivation effect of the perovskite grain boundaries may be reduced.

일 구체예로, 상기 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있으나, 이에 제한되는 것은 아니다.In one embodiment, the Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine , may be any one or two or more selected from tetramethylethylenediamine and methyl-4-pyridinemethylamine, but is not limited thereto.

보다 바람직하게는, 상기 루이스 염기는 4-디메틸아미노피리딘, 1-메틸피페리딘 및 테트라메틸에틸렌디아민에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있다. More preferably, the Lewis base may be any one or two or more selected from 4-dimethylaminopyridine, 1-methylpiperidine and tetramethylethylenediamine.

바람직하게 본 발명의 루이스 염기는 상기 화학식 5 및 화학식 6으로 표시되는 화합물에서 선택되는 하나 또는 둘이상의 화합물일 수 있다.Preferably, the Lewis base of the present invention may be one or two or more compounds selected from the compounds represented by Chemical Formulas 5 and 6.

본 발명의 일 예에 있어, 루이스 염기 용액을 제조하기 위한 용매는 루이스 염기를 용해시킬 수 있으며 건조 시 용이하게 휘발 제거될 수 있는 용매라면 특별히 한정하지 않고 사용할 수 있다.In one embodiment of the present invention, the solvent for preparing the Lewis base solution may be used without particular limitation as long as it is a solvent that can dissolve the Lewis base and can be easily removed by volatilization during drying.

보다 구체적이며 비한정적인 일 예로 상기 용매는 클로로폼, 클로로벤젠, 감마-부티로락톤, 포름아마이드, N,N-다이메틸포름아마이드, 다이포름아마이드, 아세토나이트릴, 테트라하이드로퓨란, 다이메틸설폭사이드, 다이에틸렌글리콜, 1-메틸-2-피롤리돈, N,N-다이메틸아세트아미드, 아세톤, α-터피네올, β-터피네올, 다이하이드로 터피네올, 2-메톡시 에탄올, 아세틸아세톤, 메탄올, 에탄올, 2-프로판올, 부탄올, 펜탄올, 헥산올, 케톤, 다이에틸에터, 톨루엔 및 메틸 이소부틸 케톤에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있다.In a more specific and non-limiting example, the solvent is chloroform, chlorobenzene, gamma-butyrolactone, formamide, N,N-dimethylformamide, diformamide, acetonitrile, tetrahydrofuran, dimethyl sulfoxide. Side, diethylene glycol, 1-methyl-2-pyrrolidone, N,N-dimethylacetamide, acetone, α-terpineol, β-terpineol, dihydroterpineol, 2-methoxyethanol , acetylacetone, methanol, ethanol, 2-propanol, butanol, pentanol, hexanol, ketone, diethyl ether, toluene and methyl isobutyl ketone may be any one or two or more selected from.

보다 바람직하게는, 상기 용매는 클로로폼, 클로로벤젠, 다이에틸에터, 톨루엔 및 2-프로판올에서 선택되는 어느 하나 또는 둘 이상인 것일 수 있다.More preferably, the solvent may be any one or two or more selected from chloroform, chlorobenzene, diethyl ether, toluene and 2-propanol.

상기 루이스 염기 용액의 어닐링을 위한 열처리 온도는 특별히 한정하지 않으나, 일 구체예로 50 내지 200℃의 온도에서 5분 내지 20분 동안 수행될 수 있다.The heat treatment temperature for the annealing of the Lewis base solution is not particularly limited, but in one embodiment may be performed at a temperature of 50 to 200° C. for 5 minutes to 20 minutes.

보다 바람직하게는, 상기 루이스 염기 용액의 어닐링은 저온 공정인 50 내지 150℃의 온도에서 5분 내지 15분 동안 수행될 수 있다.More preferably, the annealing of the Lewis base solution may be performed at a temperature of 50 to 150° C., which is a low temperature process, for 5 to 15 minutes.

이와 같이 본 발명은 페로브스카이트 전구체 용액에 루이스 염기를 첨가하는 기존의 공지된 방법과는 달리, 페로브스카이트 구조 결정(구조 결정층)을 제조한 후 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성하는 방법을 통하여 페로브스카이트의 결정입계를 부동화시킴으로써, 기존 표면처리 물질들과 달리 루이스 염기가 페로브스카이트 구조 결정의 입계에 골고루 분포하게 되고 입계에 형성된 루이스 염기 결정이 고온에서도 안정하게 결정입계의 부동화를 유지시킴으로써, 페로브스카이트 구조 내 금속 양이온의 산화를 효과적으로 억제하여 페로브스카이트 구조가 안정화되어 태양전지의 효율을 향상시킬 수 있다.As described above, the present invention is different from the conventionally known method of adding a Lewis base to a perovskite precursor solution, after preparing a perovskite structure crystal (structure crystal layer), the Lewis base is placed at the grain boundary of the perovskite structure. By passivating the grain boundaries of perovskite through the method of forming base crystals, unlike conventional surface treatment materials, the Lewis base is evenly distributed at the grain boundaries of the perovskite structure crystals, and the Lewis base crystals formed at the grain boundaries are at high temperature. By stably maintaining the passivation of the grain boundaries even in the present invention, the oxidation of metal cations in the perovskite structure is effectively suppressed, and the perovskite structure is stabilized, thereby improving the efficiency of the solar cell.

이하, 하기 제조예 및 실시예를 통해 본 발명에 따른 결정화된 부동입계를 갖는 페로브스카이트 박막 및 이의 제조방법에 대하여 더욱 상세히 설명한다. 다만 하기 실시예는 본 발명을 상세히 설명하기 위한 하나의 참조일 뿐 본 발명이 이에 한정되는 것은 아니며, 여러 형태로 구현될 수 있다.Hereinafter, a perovskite thin film having a crystallized floating grain boundary according to the present invention and a method for manufacturing the same will be described in more detail through the following preparation examples and examples. However, the following examples are only a reference for describing the present invention in detail, and the present invention is not limited thereto, and may be implemented in various forms.

또한 달리 정의되지 않은 한, 모든 기술적 용어 및 과학적 용어는 본 발명이 속하는 당업자 중 하나에 의해 일반적으로 이해되는 의미와 동일한 의미를 갖는다. 본 발명에서 설명에 사용되는 용어는 단지 특정 실시예를 효과적으로 기술하기 위함이고 본 발명을 제한하는 것으로 의도되지 않는다. 또한 명세서에 특별히 기재하지 않은 첨가물의 단위는 중량%일 수 있다.Also, unless otherwise defined, all technical and scientific terms have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description herein is for the purpose of effectively describing particular embodiments only and is not intended to limit the present invention. In addition, the unit of additives not specifically described in the specification may be weight %.

[제조예 1][Production Example 1]

불소 함유 산화주석이 코팅된 유리 기판(FTO; F-doped SnO2, 8 ohms/㎠, Pilkington, 이하 FTO 기판(제1전극)) 위에 약 50 ㎚ 두께의 치밀한 구조의 SnO2 박막을 스핀코팅 방법으로 제조하였다. 구체적으로 SnCl2·2H2O를 IPA에 70 mM로 녹여 3000 rpm으로 30초 동안 스핀코팅 후 150 ℃에서 30분 간 열처리를 통해 상기 박막의 두께를 조절하였다.Spin-coating a SnO 2 thin film having a dense structure with a thickness of about 50 nm on a fluorine-containing tin oxide-coated glass substrate (FTO; F-doped SnO 2 , 8 ohms/cm 2 , Pilkington, hereinafter FTO substrate (first electrode)) was prepared with Specifically, SnCl 2 ·2H 2 O was dissolved in IPA at 70 mM, spin-coated at 3000 rpm for 30 seconds, and then heat treated at 150° C. for 30 minutes to control the thickness of the thin film.

[실시예 1] 페로브스카이트 태양전지의 제조[Example 1] Preparation of perovskite solar cell

CH(NH2)2I(1.4 mmol)과 PbI2(1.4 mmol)을 디메틸포름아미드와 디메틸설폭사이드(디메틸포름아미드:디메틸설폭사이드=4:1의 부피비)의 혼합용매 1 ㎖에 용해한 후, PbBr2(0.07 mmol)을 순차적으로 첨가하여 페로브스카이트 전구체 용액을 제조하였다.CH(NH 2 ) 2 I (1.4 mmol) and PbI 2 (1.4 mmol) were dissolved in 1 ml of a mixed solvent of dimethylformamide and dimethyl sulfoxide (dimethylformamide: dimethyl sulfoxide = 4:1 volume ratio), PbBr 2 (0.07 mmol) was sequentially added to prepare a perovskite precursor solution.

상기 제조예 1에서 제조된 얇은 SnO2층에 상기 페로브스카이트 전구체 용액을 1000 rpm으로 10초, 5000 rpm으로 50초 동안 스핀코팅하고, 100 ℃의 온도로 60분 동안 어닐링하여 페로브스카이트 구조 결정층을 형성하였다. 이때, 두 번째 스핀코팅 시, 1 ㎖의 다이에틸에터를 1차 스핀 코팅된 페로브스카이트 전구체 용액 상에 투하하였다.The perovskite precursor solution was spin-coated on the thin SnO 2 layer prepared in Preparation Example 1 at 1000 rpm for 10 seconds and at 5000 rpm for 50 seconds, and annealed at a temperature of 100° C. for 60 minutes to form a perovskite. A structural crystal layer was formed. At this time, during the second spin coating, 1 ml of diethyl ether was dropped onto the first spin-coated perovskite precursor solution.

4-디메틸아미노피리딘(DMAP, 물(25℃)에서의 pKa값:9.6) 3 mmol을 포함한 클로로폼 용액을, 어닐링 후 식혀진 상기 제조된 페로브스카이트 구조 결정층 상에 도포하고 5000 rpm으로 30초 동안 스핀코팅 후 100 ℃에서 5분 간 다시 어닐링하여 상기에서 제조된 페로브스카이트 구조 결정 입계에 4-디메틸아미노피리딘 결정을 형성하였다.A chloroform solution containing 3 mmol of 4-dimethylaminopyridine (DMAP, pKa value in water (25° C.): 9.6) was applied on the perovskite structure crystal layer prepared above, which had been cooled after annealing, and was rotated at 5000 rpm. After spin coating for 30 seconds, it was annealed again at 100° C. for 5 minutes to form 4-dimethylaminopyridine crystals at the grain boundaries of the perovskite structure prepared above.

상기 제조된 페로브스카이트 구조 결정 입계에 루이스 염기 결정의 형성이 완료된 페로브스카이트 박막층 상에 비스(트리플루오로메탄)설폰이미드/아세토니트릴(509 ㎎/㎖)과 4-tert butylpyridine을 함유하는 PTAA/클로로폼(10.5 ㎎/㎖) 용액을 3000 rpm으로 30초 동안 스핀코팅하여 정공전달층을 형성하였다.Bis(trifluoromethane)sulfonimide/acetonitrile (509 mg/ml) and 4-tert butylpyridine were added on the perovskite thin film layer where the Lewis base crystal was formed at the grain boundary of the prepared perovskite structure. A PTAA/chloroform (10.5 mg/ml) solution containing the PTAA/chloroform (10.5 mg/ml) solution was spin-coated at 3000 rpm for 30 seconds to form a hole transport layer.

끝으로, 정공전달층의 상부에 고진공(5x10-6 torr 이하)의 열 증착기(thermal evaporator)로 Au를 진공증착하여, 두께가 약 60 ㎚인 Au 전극(제2전극)을 형성하였으며, 유효 활성 면적(effective active area)은 0.096 ㎠로 고정하였다.Finally, Au was vacuum-deposited on the top of the hole transport layer with a thermal evaporator of high vacuum (5x10 -6 torr or less) to form an Au electrode (second electrode) having a thickness of about 60 nm, and effective active The area (effective active area) was fixed at 0.096 cm2.

도 1에 DMAP 파우더의 결정의 사진을 (a)에 나타내었고, DMAP 파우더를 100℃에서 30분 가열한 후의 증발된 DMAP 결정의 이미지를 (b)에 나타내었으며, 실시예 1에서 제조된 페로브스카이트 박막위에 DMAP을 사용하였을 때 결함의 부동화를 통해 binding 된 SEM 이미지를 (c)에 나타내었다.A photograph of the crystals of the DMAP powder in FIG. 1 is shown in (a), and the image of the evaporated DMAP crystals after heating the DMAP powder at 100° C. for 30 minutes is shown in (b), and the peroves prepared in Example 1 When DMAP was used on the skyte thin film, the SEM image bound through the immobilization of the defect is shown in (c).

도 1로부터 DMAP을 파우더상태 그대로 100oC에서 가열한 경우 DMAP이 모두 휘발되어 존재하지 않으나, 실시예 1에서와 같이 페로보스카이트 구조결정층 상에 DMAP을 코팅하여 열처리한 경우 페르보스카이트 구조결정 입계에 DMAP의 결정이 바인딩 되어 존재하는 것을 알 수 있다. As shown in FIG. 1, when DMAP is heated at 100 o C in a powder state, all of the DMAP is volatilized and does not exist. However, as in Example 1, when DMAP is coated on the perovskite structure crystal layer and heat-treated, the perovskite structure is determined. It can be seen that DMAP crystals are bound to the grain boundary and exist.

도 2는 실시예 1의 페로브스카이트 박막의 시간별 SEM 이미지를 나타낸 것이며, 도 3은 4-디메틸아미노피리딘 도포 시 어닐링(annealing)하지 않은 경우와 어닐링 한 경우(a)의 SEM 이미지를 나타낸 것이다.Figure 2 shows the time SEM image of the perovskite thin film of Example 1, Figure 3 shows the SEM image of the case of not annealing (annealing) and annealing (a) when applying 4-dimethylaminopyridine .

특히 도 3으로부터 페로브스카이트 구조 결정을 형성한 후 어닐링없이 루이스 염기를 처리한 경우(pdmap w/o annealing, 비교예 1, (a)) 페로브스카이트 구조 결정의 입계에 루이스 염기가 전체적으로 불규칙하게 존재하다가, 페로브스카이트 구조 결정을 형성한 후 어닐링한 후 루이스 염기를 처리한 경우(pdmap w annealing) 페로브스카이트 구조 결정의 입계 계면에 선택적으로 루이스 염기의 결정화가 일어남을 알 수 있다.In particular, when the Lewis base is treated without annealing after forming the perovskite structure crystal from FIG. 3 (pdmap w/o annealing, Comparative Example 1, (a)), the Lewis base is entirely at the grain boundary of the perovskite structure crystal. It can be seen that crystallization of the Lewis base occurs selectively at the grain boundary interface of the perovskite structure crystal when the Lewis base is treated (pdmap w annealing) after annealing after forming a perovskite structure crystal after irregular existence. there is.

또한 도 4는 DMAP, 페로브스카이트 박막 및 실시예 1에서 제조된 페로브스카이트 박막의 XRD 회절 패턴을 나타내었다. In addition, Figure 4 shows the XRD diffraction patterns of DMAP, the perovskite thin film and the perovskite thin film prepared in Example 1.

또한 도 10에 실시예 1에서 제조된 페로브스카이트 박막의 GIWAX 측정을 통해 페로브스카이트 박막 상의 DMAP가 존재함을 알 수 있다.In addition, it can be seen that DMAP is present on the perovskite thin film through GIWAX measurement of the perovskite thin film prepared in Example 1 in FIG. 10 .

[실시예 2 내지 5] 페로브스카이트 박막의 제조[Examples 2 to 5] Preparation of perovskite thin films

모든 과정을 실시예 1과 동일하게 하되, 제조된 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성하는 단계에서 각각 5mmol(실시예 2), 10mmol(실시예 3), 15mmol(실시예 4) 및 20mmol(실시예 5)의 4-디메틸아미노피리딘 용액으로 각각 제조된 페로브스카이트 구조결정 상에 스핀코팅 및 어닐링하여 페로브스카이트 구조 결정 입계에 4-디메틸아미노피리딘 결정을 형성하였다.All the processes were the same as in Example 1, but in the step of forming a Lewis base crystal at the grain boundary of the prepared perovskite structure, 5 mmol (Example 2), 10 mmol (Example 3), 15 mmol (Example 4), respectively and 20 mmol (Example 5) of 4-dimethylaminopyridine solution were spin-coated and annealed on the perovskite structure crystals respectively prepared to form 4-dimethylaminopyridine crystals at the grain boundaries of the perovskite structure.

도 5에 실시예 1(3mmol), 실시예 2(5mmol), 실시예 3(10mmol), 실시예 4(15mmol)에서 제조된 페로브스카이트 박막의 SEM 이미지를 나타내었으며, 이로부터 제조된 페로브스카이트 구조 결정의 입계에 루이스 염기 결정이 형성되었음을 알 수 있다.5 shows SEM images of the perovskite thin films prepared in Example 1 (3 mmol), Example 2 (5 mmol), Example 3 (10 mmol), and Example 4 (15 mmol), It can be seen that a Lewis base crystal was formed at the grain boundary of the lobskite structure crystal.

또한 도 6은 페로브스카이트 박막의 4-디메틸아미노피리딘 농도별 X선 회절 패턴을 나타내었다.In addition, Figure 6 shows the X-ray diffraction pattern for each concentration of 4-dimethylaminopyridine of the perovskite thin film.

도 7에 본 발명의 실시예 2 내지 5에서 제조된 페로브스카이트 박막을 이용하여 TCSPC(Time-Correlated Single Photon Counting)의 변화를 나타낸 그래프이다. 도 5 및 도 6으로부터 페로브스카이트 박막이 형성되었음을 알 수 있으며, 도 7로부터 본 발명이 DMAP의 처리농도가 증가함에 따라 페로브스카이트 구조결정의 결함이 부동화되어 수명이 증가되는 것을 알 수 있다. 7 is a graph showing the change of TCSPC (Time-Correlated Single Photon Counting) using the perovskite thin film prepared in Examples 2 to 5 of the present invention. It can be seen from Figs. 5 and 6 that a perovskite thin film was formed, and from Fig. 7, as the treatment concentration of DMAP of the present invention increased, defects of the perovskite structure crystal were passivated and the lifespan was increased. there is.

[비교예 1] 페로브스카이트 태양전지의 제조[Comparative Example 1] Preparation of perovskite solar cell

실시예 1에서 페로브스카이트 구조 결정을 형성하는 단계에서 1차 열처리하지 않은 것을 제외하고는 실시예 1과 동일하게 실시하여 페로브스카이트 박막 및 이를 이용한 것을 제외하고는 실시예 1과 동일하게 실시하여 페로브스카이트 태양전지를 제조하였으며, 제조된 페로브스카이트 박막의 SEM 사진(pdmap w/o annealing)을 도 3에 나타내었다.In Example 1, except that the primary heat treatment was not carried out in the step of forming the perovskite structure crystal, in the same manner as in Example 1, except that the perovskite thin film and the same were used. A perovskite solar cell was prepared by carrying out an SEM photograph (pdmap w/o annealing) of the prepared perovskite thin film is shown in FIG. 3 .

[실험예 1] 페로브스카이트 태양전지의 특성측정[Experimental Example 1] Measurement of characteristics of perovskite solar cells

실시예 1 및 비교예 1에서 제조된 태양전지의 전류-전압 특성을 측정하기 위해, 인공태양장치(ORIEL class A solar simulator, Newport, model 91195A)와 소스-미터(source-meter, Kethley, model 2420)를 사용하였다.To measure the current-voltage characteristics of the solar cells prepared in Example 1 and Comparative Example 1, an artificial solar device (ORIEL class A solar simulator, Newport, model 91195A) and a source-meter (Kethley, model 2420) ) was used.

실시예 1Example 1 비교예 1Comparative Example 1 Rev.Rev. For.For. Rev.Rev. For.For. Voc(V)V oc (V) 1.161.16 1.141.14 1.071.07 1.071.07 Jsc(mA/cm2)J sc (mA/cm 2 ) 24.7924.79 24.7824.78 23.723.7 23.7023.70 FF(%)FF(%) 78.0878.08 72.5672.56 78.5178.51 73.1373.13 PCEPCE 22.4122.41 20.5020.50 20.0420.04 18.5018.50

상기 표 1에 나타난 바와 같이,페로브스카이트 박막 제조 후 루이스 염기인 4-디메틸아미노피리딘이 첨가된 용액을 완성된 페로브스카이트 구조결정 상에 스핀코팅 및 어닐링하여 루이스 염기 결정을 형성된 페로브스카이트 박막을 채용한 실시예 1의 경우, 비교예 1과 대비하여 성능지수 및 발전효율이 향상된 것을 확인할 수 있었다.As shown in Table 1, after the perovskite thin film was prepared, a solution to which 4-dimethylaminopyridine, which is a Lewis base, was added was spin-coated and annealed on the finished perovskite structure crystal to form a Lewis base crystal. In the case of Example 1 employing the skyte thin film, it was confirmed that the figure of merit and power generation efficiency were improved compared to Comparative Example 1.

[실험예 2] 페로브스카이트 박막과 정공전달층의 접착력 측정[Experimental Example 2] Measurement of adhesion between the perovskite thin film and the hole transport layer

실시예 1에서 제조된 페로브스카이트 태양전지의 페로브스카이트 박막과 페로브스카이트 박막상에 형성된 정공전달층과의 결합력을 double cantilever beam (DCB) test방법으로 측정하여 그 결과를 도 8에 나타내었다.The bonding force between the perovskite thin film and the hole transport layer formed on the perovskite thin film of the perovskite solar cell prepared in Example 1 was measured by the double cantilever beam (DCB) test method, and the results are shown in FIG. 8 shown in

또한 비교예 1에서 제조된 페로브스카이트 박막 및 페로브스카이트 박막상에 형성된 정공전달층과의 결합을 상기와 같은 방법으로 측정하였으며, 그 결과를 도 8에 나타내었다.In addition, the bonding between the perovskite thin film prepared in Comparative Example 1 and the hole transport layer formed on the perovskite thin film was measured in the same manner as above, and the results are shown in FIG. 8 .

도 8에서 보이는 바와 같이 본 발명의 페로브스카이트 박막과 정공전달층과의 접착력(DMAP로 표시)이 비교예 1의 페로브스카이트 박막과 정공전달층과의 접착력(bare로 표시)과 대비하여 놀랍도록 향상된 것을 알 수 있다. 이는 본 발명의 페로브스카이트 박막의 페로브스카이트 구조결정 입계에 존재하는 DMAP가 접착력을 향상시키는 것을 알 수 있으며, 이러한 접착력의 증가로 페로브스카이트 전자소자는 우수한 내구성을 가질 수 있다.As shown in FIG. 8, the adhesion between the perovskite thin film of the present invention and the hole transport layer (indicated by DMAP) is compared with the adhesion between the perovskite thin film and the hole transport layer of Comparative Example 1 (indicated by bare) Thus, it can be seen that the improvement is remarkable. It can be seen that the DMAP present at the grain boundary of the perovskite structure of the perovskite thin film of the present invention improves the adhesion, and the increase in the adhesion force allows the perovskite electronic device to have excellent durability.

[실험예 2] 페로브스카이트 박막과 정공전달층의 접착력 측정[Experimental Example 2] Measurement of adhesion between the perovskite thin film and the hole transport layer

실시예 1에서 제조된 페로브스카이트 태양전지 및 비교예 1에서 제조된 페로브스카이트 태양전지의 내구성을 측정하기위해 온도 85℃, 평균 상대습도 85%에서 500시간동안 방치한 후 광전 변환 효율을 측정하였으며, 총 5회 수행하였다. In order to measure the durability of the perovskite solar cell prepared in Example 1 and the perovskite solar cell prepared in Comparative Example 1, the photoelectric conversion efficiency after standing at 85° C. and 85% average relative humidity for 500 hours was measured, and performed a total of 5 times.

측정된 결과를 도 9에 나타내었으며, 도 9에 나타난 바와 같이 본 발명의 페로스카이트 태양전지(DMAP로 표시)가 비교예 1의 페로브스카이트 태양전지(control로 표시)와 대비하여 보다 향상된 내구성을 가지는 것을 알 수 있다.The measured results are shown in FIG. 9, and as shown in FIG. 9, the perovskite solar cell of the present invention (indicated by DMAP) is more improved compared to the perovskite solar cell (indicated by control) of Comparative Example 1 It can be seen that it has durability.

이상과 같이 본 발명에서는 특정된 사항들과 한정된 실시예 및 비교예에 의해 설명되었으나 이는 본 발명의 보다 전반적인 이해를 돕기 위해서 제공된 것일 뿐, 본 발명은 상기의 실시예에 한정되는 것은 아니며, 본 발명이 속하는 분야에서 통상의 지식을 가진 자라면 이러한 기재로부터 다양한 수정 및 변형이 가능하다.As described above, in the present invention, specific matters and limited examples and comparative examples have been described, but these are only provided to help a more general understanding of the present invention, and the present invention is not limited to the above examples, and the present invention is not limited to the above examples. Various modifications and variations are possible from these descriptions by those of ordinary skill in the art.

따라서, 본 발명의 사상은 설명된 실시예에 국한되어 정해져서는 아니되며, 후술하는 특허청구범위 뿐 아니라 이 특허청구범위와 균등하거나 등가적 변형이 있는 모든 것들은 본 발명 사상의 범주에 속한다고 할 것이다.Therefore, the spirit of the present invention should not be limited to the described embodiments, and not only the claims to be described later, but also all those with equivalent or equivalent modifications to the claims will be said to belong to the scope of the spirit of the present invention. .

Claims (12)

페로브스카이트 구조 결정; 및perovskite structure determination; and 상기 페로브스카이트 구조 결정의 입계에 형성된 루이스 염기 결정;을 포함하는, 부동화된 결정입계를 갖는 페로브스카이트 박막.A perovskite thin film having a passivated grain boundary comprising; a Lewis base crystal formed at the grain boundary of the perovskite structure crystal. 제 1항에 있어서,The method of claim 1, 상기 루이스 염기는 N, O 및 S에서 선택되는 어느 하나 또는 둘 이상의 전자주개 원소를 포함하는 화합물인 것을 특징으로 하는, 부동화된 결정입계를 갖는 페로브스카이트 박막.The Lewis base is a perovskite thin film having an immobilized grain boundary, characterized in that it is a compound containing any one or two or more electron donor elements selected from N, O and S. 제 2항에 있어서,3. The method of claim 2, 상기 루이스 염기는 pKa 값이 8 이상인 것을 특징으로 하는, 부동화된 결정입계를 갖는 페로브스카이트 박막.The Lewis base is a perovskite thin film having a passivated grain boundary, characterized in that the pKa value is 8 or more. 제 1항에 있어서,The method of claim 1, 상기 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상인, 부동화된 결정입계를 갖는 페로브스카이트 박막.The Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine, tetramethylethylenediamine And any one or two or more selected from methyl-4-pyridinemethylamine, a perovskite thin film having an immobilized grain boundary. 제 1항에 있어서,The method of claim 1, 상기 페로브스카이트 구조 결정은 하기 화학식 1을 만족하는 화합물 및 하기 화학식 2를 만족하는 금속할로겐화물을 포함하는 페로브스카이트 전구체 용액을 열처리하여 형성된 것을 특징으로 하는, 부동화된 결정입계를 갖는 페로브스카이트 박막.The perovskite structure crystal is characterized in that it is formed by heat treatment of a perovskite precursor solution containing a compound satisfying the following formula (1) and a metal halide satisfying the following formula (2), which has a passivated grain boundary lobskite thin film. [화학식 1][Formula 1] AXAX [화학식 2][Formula 2] MX2 mx 2 상기 화학식 1 및 2에서,In Formulas 1 and 2, A는 Cs+ 또는 유기양이온이고;A is Cs + or an organocation; M은 Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge 및 이들의 조합들로 이루어진 군으로부터 선택되고;M is selected from the group consisting of Pb, Cu, Ni, Co, Fe, Mn, Cr, Pd, Cd, Yb, Sn, Ge, and combinations thereof; X는 Br-, Cl- 또는 I-이다.X is Br - , Cl - or I - . 제 5항에 있어서,6. The method of claim 5, 상기 화학식 1의 A는 하기 화학식 3 또는 화학식 4로 표시되는 화합물인, 부동화된 결정입계를 갖는 페로브스카이트 박막.A of Formula 1 is a compound represented by Formula 3 or Formula 4, a perovskite thin film having a passivated grain boundary. [화학식 3][Formula 3] (R1R2N=CH-NR3R4)+ (R 1 R 2 N=CH-NR 3 R 4 ) + [화학식 4][Formula 4] (R5R6R7R8N)+ (R 5 R 6 R 7 R 8 N) + 상기 화학식 3 및 4에서,In Formulas 3 and 4, R1 내지 R4는 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C6)알킬로부터 선택되고;R 1 to R 4 are each independently selected from hydrogen and unsubstituted or substituted (C1-C6)alkyl; R5 내지 R8은 각각 독립적으로 수소 및 비치환 또는 치환된 (C1-C20)알킬 또는 비치환 또는 치환된 아릴로부터 선택된다.R 5 to R 8 are each independently selected from hydrogen and unsubstituted or substituted (C1-C20)alkyl or unsubstituted or substituted aryl. 기판에 페로브스카이트 전구체 용액을 도포 및 1차 열처리하여 페로브스카이트 구조 결정을 형성하는 단계; 및Forming a perovskite structure crystal by applying a perovskite precursor solution to a substrate and performing primary heat treatment; and 상기 페로브스카이트 구조 결정에 루이스 염기용액을 도포 및 2차 열처리하여 상기 페로브스카이트 구조 결정 입계에 루이스 염기 결정을 형성시키는 단계;를 포함하는, 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법. A perovskite thin film having a passivated grain boundary comprising; applying a Lewis base solution to the perovskite structure crystal and secondary heat treatment to form a Lewis base crystal at the grain boundary of the perovskite structure crystal manufacturing method. 제 7항에 있어서,8. The method of claim 7, 상기 루이스 염기용액은 pKa값이 8 이상인 루이스 염기를 포함하는 것을 특징으로 하는, 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법.The Lewis base solution is a method for producing a perovskite thin film having an immobilized grain boundary, characterized in that it contains a Lewis base having a pKa value of 8 or more. 제 8항에 있어서,9. The method of claim 8, 상기 루이스 염기는 피페라진, 모르폴린, 4-디메틸아미노피리딘, 피페리딘, 1-메틸피페리딘, 피롤리딘, 1-메틸피롤리딘, 디에틸아민, 트리에틸아민, 테트라메틸에틸렌디아민 및 메틸-4-피리딘메틸아민에서 선택되는 어느 하나 또는 둘 이상인 것을 특징으로 하는, 부동화된 결정입계를 갖는 페로브스카이트 박막의 제조방법.The Lewis base is piperazine, morpholine, 4-dimethylaminopyridine, piperidine, 1-methylpiperidine, pyrrolidine, 1-methylpyrrolidine, diethylamine, triethylamine, tetramethylethylenediamine And methyl-4-pyridinemethylamine, characterized in that any one or two or more selected from, the method for producing a perovskite thin film having an immobilized grain boundary. 제 7항에 있어서,8. The method of claim 7, 상기 1차 열처리는 50 내지 300℃의 온도에서 수행되며, 2차 열처리는 50 내지 150℃의 온도에서 수행되는, 페로브스카이트 박막의 제조방법.The first heat treatment is performed at a temperature of 50 to 300 ℃, the second heat treatment is performed at a temperature of 50 to 150 ℃, a method of manufacturing a perovskite thin film. 제 1항 내지 7항에서 선택되는 어느 한 항의 페로브스카이트 박막을 포함하는 전자 소자. An electronic device comprising the perovskite thin film of any one of claims 1 to 7. 제 11항에 있어서, 12. The method of claim 11, 상기 전자 소자는 페로브스카이트 태양전지인 전자 The electronic device is a perovskite solar cell
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