WO2020166128A1 - Surface treatment film, method for producing same, and article - Google Patents
Surface treatment film, method for producing same, and article Download PDFInfo
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- WO2020166128A1 WO2020166128A1 PCT/JP2019/039787 JP2019039787W WO2020166128A1 WO 2020166128 A1 WO2020166128 A1 WO 2020166128A1 JP 2019039787 W JP2019039787 W JP 2019039787W WO 2020166128 A1 WO2020166128 A1 WO 2020166128A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F291/00—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00
- C08F291/04—Macromolecular compounds obtained by polymerising monomers on to macromolecular compounds according to more than one of the groups C08F251/00 - C08F289/00 on to halogen-containing macromolecules
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
Definitions
- the present invention relates to a surface-treated film provided on the surface of a base material, a method for producing the same, and an article provided with the surface-treated film.
- a polymer layer having a group capable of adsorbing or reacting with the base material at its end is applied to the base material to form a polymer layer physically or chemically bonded on the surface of the base material. It has been known. Further, a method is known in which a polymer is grafted from the surface of a base material by polymerizing a monomer starting from a polymerizable group provided on the surface of the base material.
- Rich polymer brushes exhibit low friction in the tribological fields of lubrication, friction, and wear.
- the polymer layer of the brush may be easily detached from the surface of the base material due to the lubricating oil or solvent used during rubbing.
- the thick polymer brush is formed by forming a polymerization initiation base layer, which is a monomolecular film layer, and then performing polymerization.
- a polymerization initiation base layer which is a monomolecular film layer
- the surface of the base material that forms the brush has irregularities, if the polymer layer of the brush cannot cover the irregularities, it may not exhibit low friction properties.
- special conditions and equipment are required, such as living radical polymerization under high pressure conditions (for example, 100 to 1,000 MPa) and grafting onto the surface of the substrate. Therefore, it is not always easy to form a brush having a large film thickness, and it is likely to be disadvantageous in terms of cost.
- the present invention has been made in view of the problems with such conventional techniques, and the problem is that abrasion resistance, abrasion resistance, chemical resistance, heat resistance, solvent resistance, and the like.
- An object of the present invention is to provide a surface-treated film capable of imparting durability to the surface of various base materials and having excellent adhesion to the surface of the base material.
- Another object of the present invention is to provide a method for producing the above surface-treated film and an article provided with the above surface-treated film.
- the following surface treatment film is provided.
- R 1 represents a hydrogen atom or a methyl group
- X represents O or NH
- R 2 represents an arbitrary organic group
- R 3 and R 4 are each independently.
- Y is a chlorine atom. , Bromine atom, or iodine atom
- the first polymer is a reactive functional group selected from the group consisting of an alkoxysilyl group, a (meth)acryloyloxy group, an epoxy group, an isocyanate group, a blocked isocyanate group, a hydroxyl group, a carboxy group, and a phosphoric acid group.
- the following method for producing a surface-treated film is provided.
- [6] The method for producing a surface-treated film as described in any one of [1] to [5] above, wherein a step of disposing the polymer layer (i) on the surface of the substrate, and an atmospheric pressure to 1
- One or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers in the presence of the polymer layer (i) under a pressure condition of 1,000 MPa.
- the present invention it is possible to impart durability such as wear resistance, abrasion resistance, chemical resistance, heat resistance, and solvent resistance to the surface of various base materials, adhesion with the surface of the base material It is possible to provide a surface-treated film having excellent properties. Further, according to the present invention, it is possible to provide a method for producing the above surface-treated film and an article including the above-mentioned surface-treated film.
- the surface-treated film of the present invention is a film provided on the surface of a base material, and comprises a polymer layer (i) arranged on the front surface side of the base material and a polymer layer (i) formed on the polymer layer (i). ii) and having a laminated structure including.
- the polymer layer (i) contains the 1st polymer containing the structural unit derived from the monomer represented by the following general formula (1).
- the polymer layer (ii) contains a structural unit derived from at least one monomer selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers, and the following general It contains a second polymer which is elongated with the functional group of the monomer represented by the formula (1) as a polymerization initiation point.
- a structural unit derived from at least one monomer selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers and the following general It contains a second polymer which is elongated with the functional group of the monomer represented by the formula (1) as a polymerization initiation point.
- the surface treatment film has a laminated structure including a polymer layer (i) and a polymer layer (ii).
- the polymer layer (i) is a layer arranged on the front surface side of the substrate, and is a layer containing a first polymer containing a constitutional unit derived from a monomer represented by the following general formula (1), and preferably It is a layer substantially formed of the first polymer.
- R 1 represents a hydrogen atom or a methyl group
- X represents O or NH
- R 2 represents an arbitrary organic group
- R 3 and R 4 are each independently.
- Y is a chlorine atom. , Bromine atom, or iodine atom
- the surface of the substrate For example, by coating and drying the component (coating liquid) containing the first polymer containing the constitutional unit derived from the monomer represented by the general formula (1) on the surface of the substrate and curing the component, the surface of the substrate
- the polymer layer (i) can be formed on the substrate.
- one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers are polymerized by a predetermined method.
- the second polymer extends with the functional group represented by the following general formula (2) in the first polymer contained in the polymer layer (i) as a polymerization initiation point.
- the polymer layer (ii) containing the second polymer preferably substantially formed of the second polymer, can be formed on the polymer layer (i) to obtain the surface-treated film.
- R 3 and R 4 each independently represent a hydrogen atom, an alkyl group, an aryl group, or an acyl group, and the carbon atom to which R 3 and R 4 are bonded is the It is a tertiary carbon atom or a quaternary carbon atom, and Y represents a chlorine atom, a bromine atom, or an iodine atom.
- a halogen atom such as a chlorine atom represented by Y is desorbed as a halogen radical by the action of light, heat, and a radical, and a tertiary or quaternary carbon radical is generated.
- the generated tertiary or quaternary carbon radical attacks and reacts with the above-mentioned monomer having a radical-polymerizable group, and the second polymer is elongated.
- the monomer represented by the general formula (1) include (di)hydroxyalkyl (meth)acrylate, N-hydroxyalkyl (meth)acrylamide, and (meth)acrylate having an epoxy group such as glycidyl methacrylate.
- 2-chloropropionic acid 2-chlorobutyric acid, 2-chloroisobutyric acid, 2-chlorovaleric acid, 2-bromopropionic acid, 2-bromobutyric acid, 2-bromoisobutyric acid, 2-bromovaleric acid, ⁇ -bromophenylacetic acid
- Examples thereof include halogen-substituted carboxylic acid compounds such as ⁇ -bromo-4-chloroacetic acid, and compounds obtained by reacting these acid anhydrides or acid halides. Further, compounds obtained by halogen exchange of chlorine atom or bromine atom in these compounds with iodine atom can be mentioned.
- 2-(2-bromoisobutyryloxy)ethyl methacrylate can be mentioned as a relatively easily available commercial product. It is also possible to use 2-(2-iodoisobutyryloxy)ethyl methacrylate in which the bromine atom of this 2-(2-bromoisobutyryloxy)ethyl methacrylate is replaced with an iodine atom.
- the first polymer can be obtained by polymerizing the monomer represented by the general formula (1). Further, a polymer obtained by polymerizing the above-mentioned (meth)acrylate having an epoxy group such as (di)hydroxyalkyl(meth)acrylate, N-hydroxyalkyl(meth)acrylamide, and glycidyl methacrylate is added to the above halogen-substituted carboxylic acid.
- the first polymer can also be obtained by reacting an acid compound or the like.
- the first polymer may include a structural unit (other structural unit) other than the structural unit derived from the monomer represented by the general formula (1).
- a structural unit other structural unit
- the first polymer preferably contains 0.1 to 100% by mass of the structural unit derived from the monomer represented by the general formula (1), more preferably 30% by mass or more, and 50% by mass or more. Is particularly preferable.
- the second polymer When the amount of the constitutional unit derived from the monomer represented by the general formula (1) in the first polymer is too small, the second polymer is elongated with the functional group of the monomer represented by the general formula (1) as a polymerization initiation point. And the effect of the polymer layer (ii) tends to be insufficient.
- the other structural unit can be formed by copolymerizing a monomer (other monomer) other than the monomer represented by the general formula (1) with the monomer represented by the general formula (1).
- a monomer other monomer
- a conventionally known radically polymerizable monomer can be appropriately selected and used.
- the adhesion of the polymer layer (i) to the substrate is improved or the mechanical strength of the polymer layer (i) is improved.
- the polymer layer (i) has a three-dimensional network structure.
- the reactive functional group include an alkoxysilyl group, a (meth)acryloyloxy group, an epoxy group, an isocyanate group, a blocked isocyanate group, a hydroxyl group, a carboxy group, and a phosphoric acid group.
- the alkoxysilyl group undergoes a dehydration condensation reaction with the hydroxyl group on the surface of the base material, or the alkoxysilyl groups self-crosslink to form a three-dimensional network structure.
- the crosslinking agent that reacts with the alkoxysilyl group include silane coupling agents such as tetraethoxysilane.
- the reactive functional group is a (meth)acryloyloxy group
- thermal crosslinking can be performed by adding a heat radical generator or the like.
- a monofunctional monomer such as phenoxyethyl acrylate; an acrylic oligomer such as pentaerythritol tetraacrylate can be used as a crosslinking agent.
- an epoxy cured product can be formed by adding a curing agent such as a photocation generator, a polyamine compound or an acid anhydride.
- a curing agent such as a photocation generator, a polyamine compound or an acid anhydride.
- a polymer layer (i) having toughness can be formed by adding a compound having two or more hydroxyl groups or amino groups to form a urethane bond. it can.
- a polycarboxylic acid compound or a polyisocyanate compound can be used as a crosslinking agent.
- a three-dimensional network structure can be formed by using a crosslinking agent such as a melamine crosslinking agent, a carbodiimide crosslinking agent, an oxazoline crosslinking agent, a polyisocyanate crosslinking agent, or a polyepoxy compound. ..
- a crosslinking agent such as a melamine crosslinking agent, a carbodiimide crosslinking agent, an oxazoline crosslinking agent, a polyisocyanate crosslinking agent, or a polyepoxy compound.
- the polymer structure of the first polymer may be linear, branched, grafted, block, multiblock, bottlebrush, star, multibranched, dendrimer, particle, crosslinked, etc. Can be mentioned.
- the number average molecular weight of the first polymer is preferably 1,000 or more.
- the first polymer can be formed by various polymerization methods such as radical polymerization, living radical polymerization, anionic polymerization, living anionic polymerization, cationic polymerization, and living cationic polymerization. Of these, radical polymerization and living radical polymerization are preferable because of mild reaction conditions and the like. Further, it can be produced by a conventionally known polymerization method such as bulk polymerization, suspension polymerization, emulsion polymerization, dispersion polymerization, precipitation polymerization and solution polymerization.
- the polymer layer (i) is substantially formed of the first polymer, or is formed by curing the first polymer with a crosslinking agent or the like.
- the polymer layer (i) can be formed by, for example, applying a coating liquid containing the first polymer onto the surface of the base material to form a coat layer, followed by drying and further curing.
- the coating liquid usually contains, as a component other than the first polymer, a liquid medium such as water or an organic solvent, a crosslinking agent, and other additives. Further, it may further contain a compound having a functional group represented by the general formula (2) as a starting point of polymerization and a group capable of reacting with a reactive functional group in the first polymer.
- compounds that react with an alkoxysilyl group include 3-(trimethoxysilyl)propyl 2-bromo-2-methylpropionate and 5-(trimethoxysilyl)pentyl 2-bromo-2- Mention may be made of methyl propionate.
- examples of the compound that reacts with the (meth)acryloyloxy group include 2-(2-bromoisobutyryloxy)ethyl (meth)acrylate.
- examples of the compound that reacts with the epoxy group include compounds having a functional group represented by the general formula (2) and an amino group or a carboxyl group.
- Examples of the compound that reacts with an isocyanate group or a blocked isocyanate group include compounds having a functional group represented by the general formula (2) and a hydroxyl group or an amino group.
- Examples of the compound that reacts with a hydroxyl group include compounds having a functional group represented by the general formula (2) and a carboxy group, and acid anhydrides and acid halides thereof.
- Examples of the compound that reacts with the carboxy group include compounds having a functional group represented by the general formula (2) and a functional group such as an amino group.
- a screen printing method As a method for applying the coating liquid on the surface of the substrate, a screen printing method, a dip coating method, an inkjet method, a spin coating method, a blade coating method, a bar coating method, a slit coating method, an edge casting method, a spray coating method, a roll method.
- a coating method, a curtain coating method, a gravure printing method, a flexographic printing method, a gravure offset printing method and the like can be mentioned.
- the inkjet method is preferable because it can be applied (printed) in an arbitrary shape on demand.
- Polymer layer (ii) A specific monomer is subjected to surface-initiated radical polymerization or surface-initiated living radical polymerization in the presence of the polymer layer (i) arranged on the surface of the substrate. This makes it possible to extend the second polymer using the functional group of the monomer represented by the general formula (1) as a polymerization initiation point to form the polymer layer (ii) on the polymer layer (i).
- the specific monomer one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers are used.
- the (meth)acrylate-based monomer is preferable because of its high polymerization rate and mild polymerization conditions.
- aromatic vinyl-based monomers examples include styrene, vinyltoluene, vinylhydroxybenzene, chloromethylstyrene, vinylnaphthalene, vinylbiphenyl, vinylethylbenzene, vinyldimethylbenzene, ⁇ -methylstyrene and the like.
- Examples of the (meth)acrylate-based monomer include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, 2-methylpropane (meth)acrylate, t- Butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, nonyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, Lauryl (meth)acrylate, tetradecyl (meth)acrylate, octadecyl (meth)acrylate, behenyl (meth)acrylate, isostearyl (meth)acrylate, cyclohexyl (meth)acrylate,
- (meth)acrylate-based monomer a (meth)acrylate-based compound containing a hydroxyl group, glycol group, acid group (carboxy group, sulfonic acid group, phosphoric acid group, etc.), oxygen atom, amino group, nitrogen atom, etc. It can also be used.
- Examples of the (meth)acrylamide-based monomer include (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-hydroxyethyl(meth)acrylamide, and (meth)acryloylmorpholine. And so on.
- the second polymer is obtained by surface-initiating radical polymerization or surface-initiating living radical polymerization under a pressure condition of atmospheric pressure to 1,000 MPa, preferably 100 MPa or more, using an organic solvent, an additive, a catalyst and the like. Can be formed. Since the polymerization is initiated from the polymerization initiation group having a halogen atom, it is preferable to polymerize the monomer by atom transfer radical polymerization using a conventionally known metal complex.
- the metal complex examples include complexes of copper chloride and copper bromide with polyamines such as dinonylbipyridine, tridimethylaminoethylamine and pentamethyldiethylenetriamine; and dichlorotris(triphenylphosphine)ruthenium.
- the atom transfer radical polymerization may be bulk polymerization or solution polymerization using an organic solvent or the like.
- organic solvent a hydrocarbon solvent, an ester solvent, a glycol solvent, an ether solvent, an amide solvent, an alcohol solvent, a sulfoxide solvent, a urea solvent, an ionic liquid, or the like can be used.
- ⁇ Since heavy metals are used in atom transfer radical polymerization, it is necessary to consider coloring and environmental load and also to remove them from the reaction system. Therefore, the polymerization is preferably performed in the presence of a general-purpose organic compound that does not use heavy metals. Specifically, in the presence of at least one salt selected from the group consisting of a quaternary ammonium halide salt, a quaternary phosphonium halide salt, and an alkali metal halide salt, surface-initiated radical polymerization or surface initiation Living radical polymerization is preferred. Thereby, it is possible to polymerize with a commercially available inexpensive organic material or inorganic salt. Further, since it is not necessary to remove the metal, the load on the environment can be reduced and the process can be simplified.
- ⁇ Y (halogen) in the general formula (1) is desorbed as a radical, and a monomer is inserted into the carbon radical generated along with the desorption of Y, and the polymerization proceeds.
- abstraction or halogen exchange of the halogen radical occurs, and the polymerization of the monomer proceeds from the generated carbon radical to form the second polymer.
- halogenated quaternary ammonium salt examples include benzyltrimethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium iodide, tetraoctylammonium iodide, nonylpyridinium chloride, choline chloride and the like.
- examples of the quaternary phosphonium halide salt include tetraphenylphosphonium chloride, methyltributylphosphonium bromide, tetrabutylphosphonium iodide and the like.
- alkali metal halide salt examples include lithium bromide and potassium iodide.
- an iodide salt As the salt.
- living radical polymerization proceeds and a second polymer having a narrower molecular weight distribution can be obtained.
- a salt that can be dissolved in a polymerization solution such as a quaternary ammonium iodide salt, a quaternary phosphonium iodide salt, and an alkali metal iodide salt, and a quaternary ammonium iodide salt is used. More preferable.
- Examples of the quaternary ammonium iodide salt include benzyltetrabutylammonium iodide, tetrabutylammonium iodide, tetraoctylammonium iodide, dodecyltrimethylammonium iodide, octadecyltrimethylammonium iodide, and trioctadecylmethylammonium iodide. Can be mentioned.
- the amount of the salt with respect to the polymerization initiation group is preferably equimolar or more, more preferably 10 times or more, and 100 times or more. It may be molar or more.
- the polymerization conditions are not particularly limited. It is performed under conventionally known conditions. Preferably, the temperature is 60° C. or higher, and it is preferable to use an organic solvent as the solvent.
- a conventionally known solvent can be used as the solvent and is not particularly limited.
- the solvent the conventionally known organic solvent described above can be used, but it is preferable to use a solvent capable of dissolving a salt, such as alcohol-based, glycol-based, amide-based, urea-based, sulfoxide-based, and ionic liquid polar solvents. Higher organic solvents are preferred.
- Polymerization is carried out under a pressure condition of normal pressure to 1,000 MPa, preferably 100 to 1,000 MPa, more preferably 200 to 800 MPa, and particularly preferably 300 to 600 MPa. Specifically, the entire polymerization vessel containing the monomer and the base material is polymerized while uniformly applying pressure through a medium such as water. By radical polymerization under pressure, the termination reaction can be suppressed and a second polymer having a higher molecular weight can be formed.
- the film thickness of the polymer layer (ii) increases.
- the thickness of the polymer layer (ii) can be, for example, several nm to several ⁇ m, preferably 10 nm or more, more preferably 100 nm or more.
- the polymerization vessel it is preferable to use a vessel that can be sealed and can withstand high pressure. Further, since pressure needs to be transmitted to the inside of the container, it is preferable to use a container having a portion that is deformed by pressure, such as a plastic soft portion or a stretchable portion. Specifically, various containers such as polyethylene bottles, PET bottles, retort pouches, and blister containers can be used. Further, a container made of a material having heat resistance, which does not easily deform at the temperature during polymerization, is preferable. Furthermore, a container made of a material having characteristics such as chemical resistance and solvent resistance, which is hard to be attacked by a polymerization solvent or the like, is preferable.
- Examples of materials forming the polymerization container include polyolefin-based resins, fluorine-based resins, polyester-based resins, polyamide-based resins, engineered plastics, and the like.
- the polymer layer of the base material is prepared by charging the polymerization solution of the base material, the monomer, the catalyst and the like into a polymerization vessel and applying the atmospheric pressure or the external pressure of the atmospheric pressure or more and 1000 MPa or less, preferably by heating to perform the polymerization.
- a polymer is generated from (i), and the surface of the base material can be modified.
- the surface of the base material can be modified to have arbitrary properties depending on the type of monomer used and the like. For example, by using a fluorine-based monomer, it is possible to form a polymer layer (ii) having a low surface tension that easily repels water and oil.
- a hydrophilic polymer layer (ii) By using a monomer having a polyethylene glycol group, a carboxy group, or the like, it is possible to form a hydrophilic polymer layer (ii) in which the hit steam immediately becomes a water drop and is hard to be clouded. Furthermore, it is also possible to manufacture a biocompatible substrate to which proteins and the like are less likely to adhere. Further, the formed polymer layer (ii) may be swollen with a lubricating oil or the like to form a lubricating film, which may be an extremely low friction polymer layer.
- the molecular weight of the second polymer constituting the polymer layer (ii) can be estimated by measuring the molecular weight of the formed free polymer according to a standard method.
- the polystyrene-equivalent number average molecular weight (Mn) of the formed free polymer measured by gel permeation chromatography (GPC) is usually 1,000 to 10,000,000, and preferably 100,000 or more. Is.
- ⁇ A compound having the same group as the polymerization initiation group is used as the initiation group monomer.
- compounds represented by the following formulas (3) to (5) can be used as the starting group monomer.
- the polymer layer (ii) is preferably swollen by containing a solvent such as water, an organic solvent, or a mixed solvent thereof.
- a solvent such as water, an organic solvent, or a mixed solvent thereof.
- the film thickness of the polymer layer (ii) can be increased.
- the swollen polymer layer (ii) is preferable because it exhibits unique properties such as strong resistance to compression and low friction.
- the polymer layer (ii) can be swollen by, for example, immersing the substrate having the surface-treated film formed on its surface in a solvent.
- the article of the present invention comprises a base material and the above-mentioned surface-treated film provided on the surface of the base material.
- the type of base material is not particularly limited, and any of natural materials, artificial materials, inorganic members, and organic members can be used. Above all, it is preferable to use a substrate that can withstand the polymerization solution.
- Specific examples of the base material include metal, metal oxides, metal nitrides, metal carbides, ceramics, wood, silicon compounds, thermoplastic resins, thermosetting resins, cellulose, mechanical parts such as glass, films, fibers, sheets. And so on.
- Substrate may be surface treated.
- the surface treatment includes inorganic treatment such as silane coupling treatment, silica coating treatment, and silica alumina treatment; cleaning such as plasma treatment, ultraviolet irradiation treatment, ozone oxidation treatment, radiation treatment, X-ray treatment, electron beam treatment, and laser treatment. Examples include activation and surface treatment functional group imparting treatment.
- the film thickness of the polymer layer (i) is preferably thicker than the maximum height Rz of the surface roughness of the surface of the base material.
- the surface of a general substrate usually has irregularities ranging from nano units to micron units. If the polymer layer (i) is too thin, the projections may be exposed without being able to completely cover the projections and depressions. Even if the protrusions are barely covered, the surface shape of the polymer layer (i) reflects the irregularities of the substrate, and the surface of the polymer layer (ii) formed thereon is likely to be irregular.
- the film thickness of the polymer layer (i) thicker than the maximum height Rz of the surface roughness of the surface of the base material, the entire surface of the base material can be uniformly coated and smoothed. .. Further, a smooth polymer layer (ii) can be formed on the entire surface of the polymer layer (i).
- the film thickness of the polymer layer (i) is, for example, a measuring method using a precision instrument such as an atomic force microscope or an ellipsometer, a measuring method by observation using an electron microscope, a measuring method using a film thickness measuring instrument, etc. Can be measured by
- a surface-treated film having a laminated structure including a polymer layer (i) that adheres to the base material and imparts mechanical strength, and a polymer layer (ii) that exhibits unique properties on the surface of the base material, It can be an article of the present invention to which performance as a part is imparted or performance is improved.
- the article of the present invention is suitable as an article used in various fields such as medical members, electronic materials, display materials, semiconductor materials, mechanical parts, sliding members, and battery materials.
- BBEM 2-(2-bromoisobutyryloxy)ethyl methacrylate
- MPES 3-methacryloxypropylmethyldiethoxysilane
- V-65 2,2'-azobis(2,4- 1.5 parts of dimethylvaleronitrile
- the solid content of the obtained liquid was 40.1%, and the polymerization rate was about 100%.
- the polystyrene equivalent number average molecular weight (Mn) of the starting group polymer 1 measured using a GPC apparatus was 12,000, and the molecular weight distribution (Mw/Mn, dispersity PDI) was It was 3.56.
- COT-2 A coating liquid (COT-2) was obtained by mixing 100 parts of a liquid containing the starting group polymer 2, 2 parts of polyethyleneimine (trade name "Epomin SP-003", manufactured by Nippon Shokubai Co., Ltd.), and 107.2 parts of PGMAc. ..
- Coating liquids (COT-3 to 5) were obtained in the same manner as in Production Example 1 except that the components shown in the middle row of Table 2 were used. The appearance and solid content (%) of each of the obtained coating solutions are shown in the lower part of Table 2.
- the obtained SUB-1 was immersed in THF and ultrasonically cleaned for 5 minutes, and then the film thickness of the polymer layer (i) was measured again. As a result, it was confirmed that the film thickness of the polymer layer (i) was scarcely changed before the cleaning, and that the sufficiently cured polymer layer (i) was formed.
- the obtained SUB-2 was immersed in THF and ultrasonically cleaned for 5 minutes, and then the film thickness of the polymer layer (i) was measured again. As a result, it was confirmed that the film thickness of the polymer layer (i) was scarcely changed before the cleaning, and that the sufficiently cured polymer layer (i) was formed.
- Example 1 ⁇ Manufacture of substrate for surface treatment film> (Example 1: SUB-6)
- EBiB ethyl 2-bromoisobutyrate
- KJCMPA 3-methoxy-N,N-dimethylpropanamide
- MMA MMA
- TBAI tetrabutylammonium iodide
- the polymer layer (i)-applied substrate SUB-1 was placed in a PTFE screw cap container, the prepared polymerization solution was poured into the container and the container was capped, and the lid was wrapped with a paraffin film.
- This container was placed in an aluminum laminate bag and heat-sealed while removing gas.
- PV-400 trade name “PV-400”, manufactured by Shin Corporation
- a high-viscosity solution containing a polymer was formed in the high-pressure apparatus, and the Mn of the polymer measured by sampling a part was 2,378,000 and the PDI was 1.42.
- the base material taken out from the container was thoroughly washed with THF.
- the film thickness of the film formed on the surface of the silicon wafer was measured by spectroscopic ellipsometry and found to be 1,962 nm. Since it was thicker than the polymer layer (i), it was confirmed that the surface-treated film in which the polymer layer (ii) was laminated on the polymer layer (i) was formed.
- the obtained base material surface-treated film-added base material
- SUB-6 surface-treated film-added base material
- Example 2 SUB-7
- EBiB 0.00098 parts, copper (II) bromide (CuBr 2 ) 0.080 parts, copper (I) bromide (CuBr) 0.46 parts, 4,4′-dinonyl-2,2′-under an argon atmosphere.
- 3.2 parts of bipyridyl (dNbpy), 100.1 parts of MMA, and 103.9 parts of anisole were put into a flask and stirred to prepare a polymerization solution.
- SUB-2 which is the base material to which the polymer layer (i) was applied, was placed in a PTFE screw cap container, the prepared polymerization solution was poured into the container and the container was plugged, and the lid portion was wrapped with a paraffin film.
- This container was placed in an aluminum laminate bag and heat-sealed while removing gas.
- the container was placed together with the aluminum laminate bag in a high-pressure device (PV-400) containing water as a pressurizing medium, heated to 60° C. and pressurized to 400 MPa to polymerize for 4 hours.
- PV-400 high-pressure device
- a high-viscosity solution containing a polymer was formed in the high-pressure device, and Mn of the polymer measured by sampling a part was 2,463,000 and PDI was 1.09.
- the base material taken out from the container was thoroughly washed with THF. When the film thickness of the film formed on the surface of the glass plate was measured by spectroscopic ellipsometry, it was 2,028 nm.
- the obtained base material (surface-treated film-attached base material) is referred to as SUB-7.
- the surface-treated film of the present invention can impart properties such as low friction property, anti-adhesion property, hydrophilic property, hydrophobic property, or water repellency to the surface of the base material. Further, the adhesion to the base material is high, and the durability of the base material can be enhanced. Therefore, by using the surface-treated film of the present invention, various articles such as parts used in various fields such as medical materials, electronic materials, display materials, semiconductor materials, mechanical parts, sliding members, and battery materials can be provided. can do.
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Abstract
Description
本発明は、基材の表面上に設けられる表面処理膜及びその製造方法、並びにこの表面処理膜を設けた物品に関する。 The present invention relates to a surface-treated film provided on the surface of a base material, a method for producing the same, and an article provided with the surface-treated film.
基材の改質方法として、その末端に基材と吸着又は反応しうる基を有するポリマーを基材に作用させることで、物理的又は化学的に結合したポリマー層を基材表面に形成する方法が知られている。また、基材表面に付与した重合性基を起点としてモノマーを重合させることで、基材表面からグラフトしたポリマー層を形成する方法も知られている。 As a method for modifying a base material, a polymer layer having a group capable of adsorbing or reacting with the base material at its end is applied to the base material to form a polymer layer physically or chemically bonded on the surface of the base material. It has been known. Further, a method is known in which a polymer is grafted from the surface of a base material by polymerizing a monomer starting from a polymerizable group provided on the surface of the base material.
近年、1990年代に発展したリビングラジカル重合の技術を利用して基板上に高密度にグラフトされる、いわゆる「濃厚ポリマーブラシ」が研究されている。この濃厚ポリマーブラシでは、高分子鎖が1~4nm間隔の高密度で基板上にグラフトされる。このような濃厚ポリマーブラシにより基材表面を改質し、低摩擦性、タンパク質吸着抑制、サイズ排除特性、親水性、撥水性等などの特徴を付与することができる(例えば、特許文献1及び2、非特許文献1~3)。 In recent years, so-called "dense polymer brushes" have been studied, which are densely grafted onto a substrate by utilizing the technology of living radical polymerization developed in the 1990s. In this thick polymer brush, polymer chains are grafted onto a substrate at a high density with an interval of 1 to 4 nm. The surface of the base material can be modified with such a thick polymer brush to impart characteristics such as low friction, protein adsorption suppression, size exclusion characteristics, hydrophilicity, and water repellency (for example, Patent Documents 1 and 2). , Non-Patent Documents 1 to 3).
濃厚ポリマーブラシ(以下、単に「ブラシ」とも記す)は、潤滑、摩擦、摩耗のトライボロジー分野において低摩擦性を示す。しかしながら、摩擦時に使用する潤滑油や溶剤によってブラシのポリマー層が基材表面から脱離しやすくなる場合があった。濃厚ポリマーブラシは、単分子膜層である重合開始基層を形成した後に重合することで形成される。しかし、単分子膜層の結合力や密着性が弱いため、摩擦や溶剤でポリマー層が脱離しやすいと考えられる。 Rich polymer brushes (hereinafter also simply referred to as "brushes") exhibit low friction in the tribological fields of lubrication, friction, and wear. However, the polymer layer of the brush may be easily detached from the surface of the base material due to the lubricating oil or solvent used during rubbing. The thick polymer brush is formed by forming a polymerization initiation base layer, which is a monomolecular film layer, and then performing polymerization. However, it is considered that the polymer layer is likely to be detached by friction or solvent because the binding force and the adhesiveness of the monolayer are weak.
また、ブラシを形成する基材の表面には凹凸があるため、ブラシのポリマー層が凹凸を被覆しきれない場合には、低摩擦性を示さないことがあった。基材表面の粗さをカバーするために、基材表面を研摩して平滑にした後でブラシを形成することもできるが、基材表面を研摩する工程が増えるのでコスト面などで不利であった。なお、膜厚の厚いブラシを形成することで、基材表面の粗さをカバーすることは可能ではある。しかし、膜厚の厚いブラシを形成するには、高圧条件下(例えば、100~1,000MPa)でリビングラジカル重合して基材表面にグラフトするといった、特殊な条件や装置が必要とされる。このため、膜厚の厚いブラシを形成するのは必ずしも容易ではなく、コスト面でも不利になりやすい。 Also, since the surface of the base material that forms the brush has irregularities, if the polymer layer of the brush cannot cover the irregularities, it may not exhibit low friction properties. In order to cover the roughness of the base material surface, it is possible to form the brush after polishing the base material surface to make it smooth, but this is disadvantageous in terms of cost, etc. because the process of polishing the base material surface increases. It was Note that it is possible to cover the roughness of the surface of the base material by forming a brush having a large film thickness. However, in order to form a brush having a large film thickness, special conditions and equipment are required, such as living radical polymerization under high pressure conditions (for example, 100 to 1,000 MPa) and grafting onto the surface of the substrate. Therefore, it is not always easy to form a brush having a large film thickness, and it is likely to be disadvantageous in terms of cost.
本発明は、このような従来技術の有する問題点に鑑みてなされたものであり、その課題とするところは、耐摩耗性、耐摩擦性、耐薬品性、耐熱性、及び耐溶剤性等の耐久性を各種基材の表面に付与することが可能な、基材の表面との密着性に優れた表面処理膜を提供することにある。また、本発明の課題とするところは、上記の表面処理膜の製造方法、及び上記の表面処理膜を備える物品を提供することにある。 The present invention has been made in view of the problems with such conventional techniques, and the problem is that abrasion resistance, abrasion resistance, chemical resistance, heat resistance, solvent resistance, and the like. An object of the present invention is to provide a surface-treated film capable of imparting durability to the surface of various base materials and having excellent adhesion to the surface of the base material. Another object of the present invention is to provide a method for producing the above surface-treated film and an article provided with the above surface-treated film.
すなわち、本発明によれば、以下に示す表面処理膜が提供される。
[1]基材の表面上に設けられる表面処理膜であって、前記基材の表面側に配置されるポリマー層(i)と、前記ポリマー層(i)上に形成されるポリマー層(ii)と、を含む積層構造を有し、前記ポリマー層(i)が、下記一般式(1)で表されるモノマーに由来する構成単位を含む第1ポリマーを含有し、前記ポリマー層(ii)が、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーに由来する構成単位を含む、下記一般式(1)で表されるモノマーの官能基を重合開始点として伸長した第2ポリマーを含有する表面処理膜。
That is, according to the present invention, the following surface treatment film is provided.
[1] A surface-treated film provided on the surface of a base material, the polymer layer (i) being disposed on the surface side of the base material, and a polymer layer (ii) formed on the polymer layer (i). ), and the polymer layer (i) contains a first polymer containing a constitutional unit derived from a monomer represented by the following general formula (1), and the polymer layer (ii) Is represented by the following general formula (1), containing a constitutional unit derived from one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers. A surface-treated film containing a second polymer elongated from the functional group of the monomer as a polymerization initiation point.
(前記一般式(1)中、R1は、水素原子又はメチル基を示し、Xは、O又はNHを示し、R2は、任意の有機基を示し、R3及びR4は、それぞれ独立に、水素原子、アルキル基、アリール基、又はアシル基を示すとともに、R3及びR4が結合している炭素原子は第3級炭素原子又は第4級炭素原子であり、Yは、塩素原子、臭素原子、又はヨウ素原子を示す) (In the general formula (1), R 1 represents a hydrogen atom or a methyl group, X represents O or NH, R 2 represents an arbitrary organic group, and R 3 and R 4 are each independently. Is a hydrogen atom, an alkyl group, an aryl group, or an acyl group, and the carbon atom to which R 3 and R 4 are bonded is a tertiary carbon atom or a quaternary carbon atom, and Y is a chlorine atom. , Bromine atom, or iodine atom)
[2]前記第1ポリマーが、前記一般式(1)で表されるモノマーに由来する構成単位を30質量%以上含有する前記[1]に記載の表面処理膜。
[3]前記第1ポリマーが、アルコキシシリル基、(メタ)アクリロイルオキシ基、エポキシ基、イソシアネート基、ブロックイソシアネート基、水酸基、カルボキシ基、及びリン酸基からなる群より選択される反応性の官能基を有するラジカル重合性モノマーに由来する構成単位をさらに含む前記[1]又は[2]に記載の表面処理膜。
[4]前記第1ポリマーが架橋構造を有する前記[3]に記載の表面処理膜。
[5]前記ポリマー層(ii)が、溶媒を含有して膨潤している前記[1]~[4]のいずれかに記載の表面処理膜。
[2] The surface-treated film according to [1], wherein the first polymer contains 30% by mass or more of a structural unit derived from the monomer represented by the general formula (1).
[3] The first polymer is a reactive functional group selected from the group consisting of an alkoxysilyl group, a (meth)acryloyloxy group, an epoxy group, an isocyanate group, a blocked isocyanate group, a hydroxyl group, a carboxy group, and a phosphoric acid group. The surface-treated film as described in [1] or [2] above, further including a structural unit derived from a radically polymerizable monomer having a group.
[4] The surface-treated film as described in [3] above, wherein the first polymer has a crosslinked structure.
[5] The surface-treated film as described in any of [1] to [4] above, wherein the polymer layer (ii) contains a solvent and swells.
また、本発明によれば、以下に示す表面処理膜の製造方法が提供される。
[6]前記[1]~[5]のいずれかに記載の表面処理膜の製造方法であって、前記基材の表面上に前記ポリマー層(i)を配置する工程と、常圧~1,000MPaの圧力条件下、前記ポリマー層(i)の存在下で、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーを表面開始ラジカル重合又は表面開始リビングラジカル重合して、前記ポリマー層(i)上に前記ポリマー層(ii)を形成する工程と、を有する表面処理膜の製造方法。
[7]さらに、ハロゲン化第4級アンモニウム塩、ハロゲン化第4級ホスホニウム塩、及びハロゲン化アルカリ金属塩からなる群より選択される少なくとも一種の塩の共存下で、表面開始ラジカル重合又は表面開始リビングラジカル重合して、前記ポリマー層(i)上に前記ポリマー層(ii)を形成する前記[6]に記載の表面処理膜の製造方法。
Further, according to the present invention, the following method for producing a surface-treated film is provided.
[6] The method for producing a surface-treated film as described in any one of [1] to [5] above, wherein a step of disposing the polymer layer (i) on the surface of the substrate, and an atmospheric pressure to 1 One or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers in the presence of the polymer layer (i) under a pressure condition of 1,000 MPa. Surface-initiated radical polymerization or surface-initiated living radical polymerization to form the polymer layer (ii) on the polymer layer (i).
[7] Further, in the presence of at least one salt selected from the group consisting of a quaternary ammonium halide salt, a quaternary phosphonium halide salt, and an alkali metal halide salt, surface-initiated radical polymerization or surface initiation The method for producing a surface-treated film as described in [6] above, wherein the polymer layer (ii) is formed on the polymer layer (i) by living radical polymerization.
さらに、本発明によれば、以下に示す物品が提供される。
[8]基材と、前記基材の表面上に設けられる、前記[1]~[5]のいずれかに記載の表面処理膜と、を備える物品。
[9]前記ポリマー層(i)の膜厚が、前記基材の表面の表面粗さの最大高さRzよりも厚い前記[8]に記載の物品。
Further, according to the present invention, the following articles are provided.
[8] An article comprising a substrate and the surface-treated film according to any one of [1] to [5] provided on the surface of the substrate.
[9] The article according to the above [8], wherein the film thickness of the polymer layer (i) is thicker than the maximum height Rz of the surface roughness of the surface of the base material.
本発明によれば、耐摩耗性、耐摩擦性、耐薬品性、耐熱性、及び耐溶剤性等の耐久性を各種基材の表面に付与することが可能な、基材の表面との密着性に優れた表面処理膜を提供することができる。また、本発明によれば、上記の表面処理膜の製造方法、及び上記の表面処理膜を備える物品を提供することができる。 According to the present invention, it is possible to impart durability such as wear resistance, abrasion resistance, chemical resistance, heat resistance, and solvent resistance to the surface of various base materials, adhesion with the surface of the base material It is possible to provide a surface-treated film having excellent properties. Further, according to the present invention, it is possible to provide a method for producing the above surface-treated film and an article including the above-mentioned surface-treated film.
<表面処理膜及びその製造方法>
以下、本発明の実施の形態について説明するが、本発明は以下の実施の形態に限定されるものではない。本発明の表面処理膜は、基材の表面上に設けられる膜であり、基材の表面側に配置されるポリマー層(i)と、このポリマー層(i)上に形成されるポリマー層(ii)と、を含む積層構造を有する。ポリマー層(i)は、下記一般式(1)で表されるモノマーに由来する構成単位を含む第1ポリマーを含有する。そして、ポリマー層(ii)は、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーに由来する構成単位を含む、下記一般式(1)で表されるモノマーの官能基を重合開始点として伸長した第2ポリマーを含有する。以下、本発明の表面処理膜の詳細について説明する。
<Surface treatment film and manufacturing method thereof>
Hereinafter, embodiments of the present invention will be described, but the present invention is not limited to the following embodiments. The surface-treated film of the present invention is a film provided on the surface of a base material, and comprises a polymer layer (i) arranged on the front surface side of the base material and a polymer layer (i) formed on the polymer layer (i). ii) and having a laminated structure including. The polymer layer (i) contains the 1st polymer containing the structural unit derived from the monomer represented by the following general formula (1). The polymer layer (ii) contains a structural unit derived from at least one monomer selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers, and the following general It contains a second polymer which is elongated with the functional group of the monomer represented by the formula (1) as a polymerization initiation point. Hereinafter, details of the surface-treated film of the present invention will be described.
(ポリマー層(i))
表面処理膜は、ポリマー層(i)と、ポリマー層(ii)とを含む積層構造を有する。ポリマー層(i)は、基材の表面側に配置される層であり、下記一般式(1)で表されるモノマーに由来する構成単位を含む第1ポリマーを含有する層であり、好ましくは第1ポリマーで実質的に形成される層である。
(Polymer layer (i))
The surface treatment film has a laminated structure including a polymer layer (i) and a polymer layer (ii). The polymer layer (i) is a layer arranged on the front surface side of the substrate, and is a layer containing a first polymer containing a constitutional unit derived from a monomer represented by the following general formula (1), and preferably It is a layer substantially formed of the first polymer.
(前記一般式(1)中、R1は、水素原子又はメチル基を示し、Xは、O又はNHを示し、R2は、任意の有機基を示し、R3及びR4は、それぞれ独立に、水素原子、アルキル基、アリール基、又はアシル基を示すとともに、R3及びR4が結合している炭素原子は第3級炭素原子又は第4級炭素原子であり、Yは、塩素原子、臭素原子、又はヨウ素原子を示す) (In the general formula (1), R 1 represents a hydrogen atom or a methyl group, X represents O or NH, R 2 represents an arbitrary organic group, and R 3 and R 4 are each independently. Is a hydrogen atom, an alkyl group, an aryl group, or an acyl group, and the carbon atom to which R 3 and R 4 are bonded is a tertiary carbon atom or a quaternary carbon atom, and Y is a chlorine atom. , Bromine atom, or iodine atom)
例えば、一般式(1)で表されるモノマーに由来する構成単位を含む第1ポリマーを含有する成分(コーティング液)を基材表面に塗布及び乾燥するとともに、硬化させることで、基材の表面にポリマー層(i)を形成することができる。そして、このポリマー層(i)の存在下、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーを所定の方法で重合すると、ポリマー層(i)に含まれる第1ポリマーにおける下記一般式(2)で表される官能基を重合開始点として第2ポリマーが伸長する。これにより、第2ポリマーを含有する、好ましくは第2ポリマーで実質的に形成されるポリマー層(ii)をポリマー層(i)上に形成し、表面処理膜を得ることができる。 For example, by coating and drying the component (coating liquid) containing the first polymer containing the constitutional unit derived from the monomer represented by the general formula (1) on the surface of the substrate and curing the component, the surface of the substrate The polymer layer (i) can be formed on the substrate. Then, in the presence of the polymer layer (i), one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers are polymerized by a predetermined method. The second polymer extends with the functional group represented by the following general formula (2) in the first polymer contained in the polymer layer (i) as a polymerization initiation point. Thereby, the polymer layer (ii) containing the second polymer, preferably substantially formed of the second polymer, can be formed on the polymer layer (i) to obtain the surface-treated film.
(前記一般式(2)中、R3及びR4は、それぞれ独立に、水素原子、アルキル基、アリール基、又はアシル基を示すとともに、R3及びR4が結合している炭素原子は第3級炭素原子又は第4級炭素原子であり、Yは、塩素原子、臭素原子、又はヨウ素原子を示す) (In the general formula (2), R 3 and R 4 each independently represent a hydrogen atom, an alkyl group, an aryl group, or an acyl group, and the carbon atom to which R 3 and R 4 are bonded is the It is a tertiary carbon atom or a quaternary carbon atom, and Y represents a chlorine atom, a bromine atom, or an iodine atom.)
一般式(2)中、Yで表される塩素原子等のハロゲン原子は、光、熱、及びラジカルなどの作用によってハロゲンラジカルとして脱離し、第3級又は第4級炭素ラジカルが生成する。生成した第3級又は第4級炭素ラジカルが、ラジカル重合しうる基を有する前述のモノマーを攻撃して反応し、第2ポリマーが伸長する。 In the general formula (2), a halogen atom such as a chlorine atom represented by Y is desorbed as a halogen radical by the action of light, heat, and a radical, and a tertiary or quaternary carbon radical is generated. The generated tertiary or quaternary carbon radical attacks and reacts with the above-mentioned monomer having a radical-polymerizable group, and the second polymer is elongated.
一般式(1)で表されるモノマーの具体例としては、(ジ)ヒドロキシアルキル(メタ)アクリレート、N-ヒドロキシアルキル(メタ)アクリルアミド、グリシジルメタクリレートなどのエポキシ基を有する(メタ)アクリレート等に、2-クロロプロピオン酸、2-クロロ酪酸、2-クロロイソ酪酸、2-クロロ吉草酸、2-ブロモプロピオン酸、2-ブロモ酪酸、2-ブロモイソ酪酸、2-ブロモ吉草酸、α-ブロモフェニル酢酸、α-ブロモ-4-クロロ酢酸などのハロゲン置換カルボン酸化合物、これらの酸無水物又は酸ハロゲン化物を反応させて得られる化合物を挙げることができる。さらには、これらの化合物中の塩素原子や臭素原子をヨウ素原子とハロゲン交換して得られる化合物を挙げることができる。一般式(1)で表される化合物のうち、比較的容易に入手可能な市販品として、2-(2-ブロモイソブチリルオキシ)エチルメタクリレートを挙げることができる。また、この2-(2-ブロモイソブチリルオキシ)エチルメタクリレートの臭素原子をヨウ素原子に置換した、2-(2-アイオドイソブチリルオキシ)エチルメタクリレートを用いることもできる。 Specific examples of the monomer represented by the general formula (1) include (di)hydroxyalkyl (meth)acrylate, N-hydroxyalkyl (meth)acrylamide, and (meth)acrylate having an epoxy group such as glycidyl methacrylate. 2-chloropropionic acid, 2-chlorobutyric acid, 2-chloroisobutyric acid, 2-chlorovaleric acid, 2-bromopropionic acid, 2-bromobutyric acid, 2-bromoisobutyric acid, 2-bromovaleric acid, α-bromophenylacetic acid, Examples thereof include halogen-substituted carboxylic acid compounds such as α-bromo-4-chloroacetic acid, and compounds obtained by reacting these acid anhydrides or acid halides. Further, compounds obtained by halogen exchange of chlorine atom or bromine atom in these compounds with iodine atom can be mentioned. Among the compounds represented by the general formula (1), 2-(2-bromoisobutyryloxy)ethyl methacrylate can be mentioned as a relatively easily available commercial product. It is also possible to use 2-(2-iodoisobutyryloxy)ethyl methacrylate in which the bromine atom of this 2-(2-bromoisobutyryloxy)ethyl methacrylate is replaced with an iodine atom.
一般式(1)で表されるモノマーを重合すれば、第1ポリマーを得ることができる。また、前述の(ジ)ヒドロキシアルキル(メタ)アクリレート、N-ヒドロキシアルキル(メタ)アクリルアミド、グリシジルメタクリレートなどのエポキシ基を有する(メタ)アクリレート等を重合して得たポリマーに、前述のハロゲン置換カルボン酸化合物等を反応させても、第1ポリマーを得ることができる。 The first polymer can be obtained by polymerizing the monomer represented by the general formula (1). Further, a polymer obtained by polymerizing the above-mentioned (meth)acrylate having an epoxy group such as (di)hydroxyalkyl(meth)acrylate, N-hydroxyalkyl(meth)acrylamide, and glycidyl methacrylate is added to the above halogen-substituted carboxylic acid. The first polymer can also be obtained by reacting an acid compound or the like.
第1ポリマーは、一般式(1)で表されるモノマーに由来する構成単位以外の構成単位(その他の構成単位)を含んでいてもよい。その他の構成単位を含ませることで、第1ポリマーの熱的・機械的特性を変化させたり、三次元網目構造を形成したりすることが可能となり、基材との密着性、柔軟性、耐薬品性等の耐久性を向上させることができる。第1ポリマーは、一般式(1)で表されるモノマーに由来する構成単位を0.1~100質量%含有することが好ましく、30質量%以上含有することがさらに好ましく、50質量%以上含有することが特に好ましい。第1ポリマー中の一般式(1)で表されるモノマーに由来する構成単位の量が少なすぎると、一般式(1)で表されるモノマーの官能基を重合開始点として伸長する第2ポリマーの量が少なくなり、ポリマー層(ii)の効果が不足しやすくなる。 The first polymer may include a structural unit (other structural unit) other than the structural unit derived from the monomer represented by the general formula (1). By including other structural units, it becomes possible to change the thermal/mechanical properties of the first polymer and to form a three-dimensional network structure, and the adhesion to the substrate, flexibility and resistance It is possible to improve durability such as chemical properties. The first polymer preferably contains 0.1 to 100% by mass of the structural unit derived from the monomer represented by the general formula (1), more preferably 30% by mass or more, and 50% by mass or more. Is particularly preferable. When the amount of the constitutional unit derived from the monomer represented by the general formula (1) in the first polymer is too small, the second polymer is elongated with the functional group of the monomer represented by the general formula (1) as a polymerization initiation point. And the effect of the polymer layer (ii) tends to be insufficient.
その他の構成単位は、一般式(1)で表されるモノマー以外のモノマー(その他のモノマー)を一般式(1)で表されるモノマーと共重合させることで形成することができる。その他のモノマーとしては、従来公知のラジカル重合性モノマーを適宜選択して用いることができる。なかでも、反応性の官能基を有するラジカル重合性モノマーを用いることで、基材に対するポリマー層(i)の密着性を向上させたり、ポリマー層(i)の機械的強度を向上させたりすることができるために好ましい。さらに、反応性の官能基が自己反応性を有する、或いは上記の反応性の官能基と反応する基を有する化合物(架橋剤)を用いることで、ポリマー層(i)を、三次元網目構造を有する硬化体とすることができるために好ましい。反応性の官能基としては、アルコキシシリル基、(メタ)アクリロイルオキシ基、エポキシ基、イソシアネート基、ブロックイソシアネート基、水酸基、カルボキシ基、及びリン酸基などを挙げることができる。 The other structural unit can be formed by copolymerizing a monomer (other monomer) other than the monomer represented by the general formula (1) with the monomer represented by the general formula (1). As the other monomer, a conventionally known radically polymerizable monomer can be appropriately selected and used. Above all, by using a radically polymerizable monomer having a reactive functional group, the adhesion of the polymer layer (i) to the substrate is improved or the mechanical strength of the polymer layer (i) is improved. Is preferable because it can Furthermore, by using a compound (crosslinking agent) in which the reactive functional group has self-reactivity or has a group that reacts with the above-mentioned reactive functional group, the polymer layer (i) has a three-dimensional network structure. It is preferable because it can be a cured product having. Examples of the reactive functional group include an alkoxysilyl group, a (meth)acryloyloxy group, an epoxy group, an isocyanate group, a blocked isocyanate group, a hydroxyl group, a carboxy group, and a phosphoric acid group.
反応性の官能基がアルコキシシリル基である場合、アルコキシシリル基が基材表面の水酸基と脱水縮合反応するか、或いはアルコキシシリル基同士が自己架橋反応して三次元網目構造を形成する。アルコキシシリル基と反応する架橋剤としては、テトラエトキシシランなどのシランカップリング剤を挙げることができる。 When the reactive functional group is an alkoxysilyl group, the alkoxysilyl group undergoes a dehydration condensation reaction with the hydroxyl group on the surface of the base material, or the alkoxysilyl groups self-crosslink to form a three-dimensional network structure. Examples of the crosslinking agent that reacts with the alkoxysilyl group include silane coupling agents such as tetraethoxysilane.
反応性の官能基が(メタ)アクリロイルオキシ基である場合、光ラジカル発生剤等を添加するとともに、紫外線や電子線を照射して硬化させることができる。また、熱ラジカル発生剤等を添加すれば、熱架橋することができる。さらに、フェノキシエチルアクリレートなどの単官能モノマー;ペンタエリスリトールテトラアクリレートなどのアクリルオリゴマーを架橋剤として用いることができる。 When the reactive functional group is a (meth)acryloyloxy group, it is possible to cure it by irradiating it with ultraviolet rays or electron beams while adding a photoradical generator and the like. In addition, thermal crosslinking can be performed by adding a heat radical generator or the like. Further, a monofunctional monomer such as phenoxyethyl acrylate; an acrylic oligomer such as pentaerythritol tetraacrylate can be used as a crosslinking agent.
反応性の官能基がエポキシ基である場合、光カチオン発生剤や、ポリアミン系化合物、酸無水物などの硬化剤を添加することで、エポキシ硬化体を形成することができる。反応性の官能基がイソシアネート基又はブロックイソシアネート基である場合、水酸基又はアミノ基を2以上有する化合物を添加してウレタン結合を形成すれば、強靭性を有するポリマー層(i)を形成することができる。反応性の官能基が水酸基である場合、ポリカルボン酸化合物やポリイソシアネート化合物を架橋剤として用いることができる。 When the reactive functional group is an epoxy group, an epoxy cured product can be formed by adding a curing agent such as a photocation generator, a polyamine compound or an acid anhydride. When the reactive functional group is an isocyanate group or a blocked isocyanate group, a polymer layer (i) having toughness can be formed by adding a compound having two or more hydroxyl groups or amino groups to form a urethane bond. it can. When the reactive functional group is a hydroxyl group, a polycarboxylic acid compound or a polyisocyanate compound can be used as a crosslinking agent.
反応性の官能基がカルボキシ基である場合、メラミン架橋剤、カルボジイミド架橋剤、オキサゾリン架橋剤、ポリイソシアネート架橋剤、ポリエポキシ化合物などの架橋剤を用いれば、三次元網目構造を形成することができる。また、反応性の官能基がリン酸基である場合、基材が金属であると、金属の表面との反応によりリン酸-金属結合が生成するので、基材とポリマー層(i)との密着性を向上させることができる。 When the reactive functional group is a carboxy group, a three-dimensional network structure can be formed by using a crosslinking agent such as a melamine crosslinking agent, a carbodiimide crosslinking agent, an oxazoline crosslinking agent, a polyisocyanate crosslinking agent, or a polyepoxy compound. .. Further, when the reactive functional group is a phosphoric acid group and the base material is a metal, a phosphoric acid-metal bond is generated by the reaction with the surface of the metal, so that the base material and the polymer layer (i) are Adhesion can be improved.
第1ポリマーのポリマー構造としては、直鎖状、分岐型、グラフト型、ブロック型、マルチブロック型、ボトルブラシ構造、星形構造、多分岐型構造、デンドリマー型、粒子型、架橋構造型などを挙げることができる。第1ポリマーの数平均分子量は、1,000以上であることが好ましい。第1ポリマーは、例えば、ラジカル重合、リビングラジカル重合、アニオン重合、リビングアニオン重合、カチオン重合、リビングカチオン重合など様々な重合方法によって形成することができる。なかでも、反応条件が温和であること等の理由により、ラジカル重合やリビングラジカル重合が好ましい。さらに、塊状重合、懸濁重合、乳化重合、分散重合、沈殿重合、溶液重合等の従来公知の重合方法により製造することができる。 The polymer structure of the first polymer may be linear, branched, grafted, block, multiblock, bottlebrush, star, multibranched, dendrimer, particle, crosslinked, etc. Can be mentioned. The number average molecular weight of the first polymer is preferably 1,000 or more. The first polymer can be formed by various polymerization methods such as radical polymerization, living radical polymerization, anionic polymerization, living anionic polymerization, cationic polymerization, and living cationic polymerization. Of these, radical polymerization and living radical polymerization are preferable because of mild reaction conditions and the like. Further, it can be produced by a conventionally known polymerization method such as bulk polymerization, suspension polymerization, emulsion polymerization, dispersion polymerization, precipitation polymerization and solution polymerization.
ポリマー層(i)は、第1ポリマーにより実質的に形成されている、又は第1ポリマーが架橋剤等によって硬化することで形成されている。ポリマー層(i)は、例えば、第1ポリマーを含有するコーティング液を基材の表面上に塗布してコート層を形成した後、乾燥し、さらに硬化させることで形成することができる。コーティング液には、通常、第1ポリマー以外の成分として、水や有機溶媒等の液媒体、架橋剤、その他の添加剤等が含有される。また、一般式(2)で表される重合の開始点となる官能基と、第1ポリマー中の反応性の官能基と反応しうる基とを有する化合物をさらに含有してもよい。そのような化合物のうち、アルコキシシリル基と反応する化合物としては、3-(トリメトキシシリル)プロピル2-ブロモ-2-メチルプロピオネート、5-(トリメトキシシリル)ペンチル2-ブロモ-2-メチルプロピオネートを挙げることができる。(メタ)アクリロイルオキシ基と反応する化合物としては、2-(2-ブロモイソブチリルオキシ)エチル(メタ)アクリレートなどを挙げることができる。エポキシ基と反応する化合物としては、一般式(2)で表される官能基と、アミノ基やカルボキシル基とを有する化合物を挙げることができる。イソシアネート基やブロックイソシアネート基と反応する化合物としては、一般式(2)で表される官能基と、水酸基やアミノ基とを有する化合物を挙げることができる。水酸基と反応する化合物としては、一般式(2)で表される官能基と、カルボキシ基とを有する化合物や、その酸無水物及び酸ハロゲン化物などを挙げることができる。カルボキシ基と反応する化合物としては、一般式(2)で表される官能基と、アミノ基などの官能基とを有する化合物を挙げることができる。 The polymer layer (i) is substantially formed of the first polymer, or is formed by curing the first polymer with a crosslinking agent or the like. The polymer layer (i) can be formed by, for example, applying a coating liquid containing the first polymer onto the surface of the base material to form a coat layer, followed by drying and further curing. The coating liquid usually contains, as a component other than the first polymer, a liquid medium such as water or an organic solvent, a crosslinking agent, and other additives. Further, it may further contain a compound having a functional group represented by the general formula (2) as a starting point of polymerization and a group capable of reacting with a reactive functional group in the first polymer. Among such compounds, compounds that react with an alkoxysilyl group include 3-(trimethoxysilyl)propyl 2-bromo-2-methylpropionate and 5-(trimethoxysilyl)pentyl 2-bromo-2- Mention may be made of methyl propionate. Examples of the compound that reacts with the (meth)acryloyloxy group include 2-(2-bromoisobutyryloxy)ethyl (meth)acrylate. Examples of the compound that reacts with the epoxy group include compounds having a functional group represented by the general formula (2) and an amino group or a carboxyl group. Examples of the compound that reacts with an isocyanate group or a blocked isocyanate group include compounds having a functional group represented by the general formula (2) and a hydroxyl group or an amino group. Examples of the compound that reacts with a hydroxyl group include compounds having a functional group represented by the general formula (2) and a carboxy group, and acid anhydrides and acid halides thereof. Examples of the compound that reacts with the carboxy group include compounds having a functional group represented by the general formula (2) and a functional group such as an amino group.
コーティング液を基材の表面に塗布する方法としては、スクリーン印刷法、ディップコート法、インクジェット法、スピンコート法、ブレードコート法、バーコート法、スリットコート法、エッジキャスト法、スプレーコート法、ロールコート法、カーテンコート法、グラビア印刷法、フレキソ印刷法、グラビアオフセット印刷法などを挙げることができる。なかでも、任意の形状にオンデマンドで塗布(印画)することが可能なインクジェット法が好ましい。 As a method for applying the coating liquid on the surface of the substrate, a screen printing method, a dip coating method, an inkjet method, a spin coating method, a blade coating method, a bar coating method, a slit coating method, an edge casting method, a spray coating method, a roll method. A coating method, a curtain coating method, a gravure printing method, a flexographic printing method, a gravure offset printing method and the like can be mentioned. Among them, the inkjet method is preferable because it can be applied (printed) in an arbitrary shape on demand.
(ポリマー層(ii))
基材の表面上に配置されたポリマー層(i)の存在下、特定のモノマーを表面開始ラジカル重合又は表面開始リビングラジカル重合する。これにより、一般式(1)で表されるモノマーの官能基を重合開始点として第2ポリマーを伸長させて、ポリマー層(i)上にポリマー層(ii)を形成することができる。
(Polymer layer (ii))
A specific monomer is subjected to surface-initiated radical polymerization or surface-initiated living radical polymerization in the presence of the polymer layer (i) arranged on the surface of the substrate. This makes it possible to extend the second polymer using the functional group of the monomer represented by the general formula (1) as a polymerization initiation point to form the polymer layer (ii) on the polymer layer (i).
特定のモノマーとしては、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーを用いる。なかでも、重合率が高く、重合条件が温和であることなどの理由により、(メタ)アクリレート系モノマーが好ましい。 As the specific monomer, one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers are used. Among them, the (meth)acrylate-based monomer is preferable because of its high polymerization rate and mild polymerization conditions.
芳香族ビニル系モノマーとしては、スチレン、ビニルトルエン、ビニルヒドロキシベンゼン、クロロメチルスチレン、ビニルナフタレン、ビニルビフェニル、ビニルエチルベンゼン、ビニルジメチルベンゼン、α-メチルスチレンなどを挙げることができる。 Examples of aromatic vinyl-based monomers include styrene, vinyltoluene, vinylhydroxybenzene, chloromethylstyrene, vinylnaphthalene, vinylbiphenyl, vinylethylbenzene, vinyldimethylbenzene, α-methylstyrene and the like.
(メタ)アクリレート系モノマーとしては、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、ブチル(メタ)アクリレート、2-メチルプロパン(メタ)アクリレート、t-ブチル(メタ)アクリレート、ペンチル(メタ)アクリレート、ヘキシル(メタ)アクリレート、オクチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、ノニル(メタ)アクリレート、デシル(メタ)アクリレート、イソデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、テトラデシル(メタ)アクリレート、オクタデシル(メタ)アクリレート、べへニル(メタ)アクリレート、イソステアリル(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、t-ブチルシクロヘキシルメチル(メタ)アクリレート、イソボロニル(メタ)アクリレート、トリメチルシクロヘキシル(メタ)アクリレート、シクロデシル(メタ)アクリレート、シクロデシルメチル(メタ)アクリレート、ベンジル(メタ)アクリレート、t-ブチルベンゾトリアゾールフェニルエチル(メタ)アクリレート、フェニル(メタ)アクリレート、ナフチル(メタ)アクリレート、アリル(メタ)アクリレートなどの脂肪族、脂環族、芳香族アルキル(メタ)アクリレートなどを挙げることができる。 Examples of the (meth)acrylate-based monomer include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, butyl (meth)acrylate, 2-methylpropane (meth)acrylate, t- Butyl (meth)acrylate, pentyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, nonyl (meth)acrylate, decyl (meth)acrylate, isodecyl (meth)acrylate, Lauryl (meth)acrylate, tetradecyl (meth)acrylate, octadecyl (meth)acrylate, behenyl (meth)acrylate, isostearyl (meth)acrylate, cyclohexyl (meth)acrylate, t-butylcyclohexylmethyl (meth)acrylate, isobornyl (Meth)acrylate, trimethylcyclohexyl (meth)acrylate, cyclodecyl (meth)acrylate, cyclodecylmethyl (meth)acrylate, benzyl (meth)acrylate, t-butylbenzotriazole phenylethyl (meth)acrylate, phenyl (meth)acrylate, Examples thereof include aliphatic, alicyclic and aromatic alkyl (meth)acrylates such as naphthyl (meth)acrylate and allyl (meth)acrylate.
なお、(メタ)アクリレート系モノマーとしては、水酸基、グリコール基、酸基(カルボキシ基、スルホン酸基、リン酸基等)、酸素原子、アミノ基、窒素原子などを含む(メタ)アクリレート系化合物を用いることもできる。 As the (meth)acrylate-based monomer, a (meth)acrylate-based compound containing a hydroxyl group, glycol group, acid group (carboxy group, sulfonic acid group, phosphoric acid group, etc.), oxygen atom, amino group, nitrogen atom, etc. It can also be used.
また、(メタ)アクリルアミド系モノマーとしては、(メタ)アクリルアミド、N,N-ジメチル(メタ)アクリルアミド、N,N-ジエチル(メタ)アクリルアミド、N-ヒドロキシエチル(メタ)アクリルアミド、(メタ)アクリロイルモルホリンなどを挙げることができる。 Examples of the (meth)acrylamide-based monomer include (meth)acrylamide, N,N-dimethyl(meth)acrylamide, N,N-diethyl(meth)acrylamide, N-hydroxyethyl(meth)acrylamide, and (meth)acryloylmorpholine. And so on.
有機溶媒、添加剤、及び触媒などを使用し、常圧~1,000MPaの圧力条件下、好ましくは100MPa以上の圧力条件下、表面開始ラジカル重合又は表面開始リビングラジカル重合することで、第2ポリマーを形成することができる。ハロゲン原子を有する重合開始基から重合を開始することから、従来公知の金属錯体を用いる原子移動ラジカル重合によってモノマーを重合することが好ましい。金属錯体としては、塩化銅、臭化銅と、ジノニルビピリジン、トリジメチルアミノエチルアミン、ペンタメチルジエチレントリアミンなどのポリアミンとの錯体や;ジクロロトリス(トリフェニルホスフィン)ルテニウム;などを挙げることができる。原子移動ラジカル重合は、バルク重合であってもよく、有機溶剤などを用いる溶液重合であってもよい。有機溶剤としては、炭化水素系溶剤、エステル系溶剤、グリコール系溶剤、エーテル系溶剤、アミド系溶剤、アルコール系溶剤、スルホキシド系溶剤、尿素系溶剤、イオン液体などを用いることができる。 The second polymer is obtained by surface-initiating radical polymerization or surface-initiating living radical polymerization under a pressure condition of atmospheric pressure to 1,000 MPa, preferably 100 MPa or more, using an organic solvent, an additive, a catalyst and the like. Can be formed. Since the polymerization is initiated from the polymerization initiation group having a halogen atom, it is preferable to polymerize the monomer by atom transfer radical polymerization using a conventionally known metal complex. Examples of the metal complex include complexes of copper chloride and copper bromide with polyamines such as dinonylbipyridine, tridimethylaminoethylamine and pentamethyldiethylenetriamine; and dichlorotris(triphenylphosphine)ruthenium. The atom transfer radical polymerization may be bulk polymerization or solution polymerization using an organic solvent or the like. As the organic solvent, a hydrocarbon solvent, an ester solvent, a glycol solvent, an ether solvent, an amide solvent, an alcohol solvent, a sulfoxide solvent, a urea solvent, an ionic liquid, or the like can be used.
原子移動ラジカル重合では重金属を用いるため、着色や環境への負荷を考慮する必要があるとともに、反応系から除去する必要もある。このため、重金属を用いない汎用の有機化合物の存在下で重合することが好ましい。具体的には、ハロゲン化第4級アンモニウム塩、ハロゲン化第4級ホスホニウム塩、及びハロゲン化アルカリ金属塩からなる群より選択される少なくとも一種の塩の共存下で、表面開始ラジカル重合又は表面開始リビングラジカル重合することが好ましい。これにより、市販の安価な有機材料や無機塩で重合することができる。また、金属を除去する必要がないため、環境に対する負荷を減ずることができるとともに、工程を簡略化することもできる。 ㆍSince heavy metals are used in atom transfer radical polymerization, it is necessary to consider coloring and environmental load and also to remove them from the reaction system. Therefore, the polymerization is preferably performed in the presence of a general-purpose organic compound that does not use heavy metals. Specifically, in the presence of at least one salt selected from the group consisting of a quaternary ammonium halide salt, a quaternary phosphonium halide salt, and an alkali metal halide salt, surface-initiated radical polymerization or surface initiation Living radical polymerization is preferred. Thereby, it is possible to polymerize with a commercially available inexpensive organic material or inorganic salt. Further, since it is not necessary to remove the metal, the load on the environment can be reduced and the process can be simplified.
一般式(1)中のY(ハロゲン)がラジカルとして脱離するとともに、Yの脱離とともに生成した炭素ラジカルにモノマーが挿入されて重合が進行する。その際、上記の特定の塩を共存させることで、ハロゲンラジカルの引き抜き又はハロゲン交換が生じ、生成した炭素ラジカルからモノマーの重合が進行して第2ポリマーが形成される。 ▽Y (halogen) in the general formula (1) is desorbed as a radical, and a monomer is inserted into the carbon radical generated along with the desorption of Y, and the polymerization proceeds. At that time, by coexisting with the above-mentioned specific salt, abstraction or halogen exchange of the halogen radical occurs, and the polymerization of the monomer proceeds from the generated carbon radical to form the second polymer.
ハロゲン化第4級アンモニウム塩としては、塩化ベンジルトリメチルアンモニウム、臭化テトラブチルアンモニウム、ヨウ化テトラブチルアンモニウム、ヨウ化テトラオクチルアンモニウム、塩化ノニルピリジニウム、塩化コリンなどを挙げることができる。ハロゲン化第4級ホスホニウム塩としては、塩化テトラフェニルホスホニウム、臭化メチルトリブチルホスホニウム、ヨウ化テトラブチルホスホニウムなどを挙げることができる。ハロゲン化アルカリ金属塩としては、臭化リチウム、ヨウ化カリウムなどを挙げることができる。 Examples of the halogenated quaternary ammonium salt include benzyltrimethylammonium chloride, tetrabutylammonium bromide, tetrabutylammonium iodide, tetraoctylammonium iodide, nonylpyridinium chloride, choline chloride and the like. Examples of the quaternary phosphonium halide salt include tetraphenylphosphonium chloride, methyltributylphosphonium bromide, tetrabutylphosphonium iodide and the like. Examples of the alkali metal halide salt include lithium bromide and potassium iodide.
塩としては、ヨウ化物塩を用いることが好ましい。ヨウ化物塩を用いることで、リビングラジカル重合が進行し、分子量分布がより狭い第2ポリマーを得ることができる。また、ヨウ化第4級アンモニウム塩、ヨウ化第4級ホスホニウム塩、及びヨウ化アルカリ金属塩などの重合溶液に溶解しうる塩を用いることが好ましく、ヨウ化第4級アンモニウム塩を用いることがさらに好ましい。ヨウ化第4級アンモニウム塩としては、ヨウ化ベンジルテトラブチルアンモニウム、ヨウ化テトラブチルアンモニウム、ヨウ化テトラオクチルアンモニウム、ヨウ化ドデシルトリメチルアンモニウム、ヨウ化オクタデシルトリメチルアンモニウム、ヨウ化トリオクダデシルメチルアンモニウムなどを挙げることができる。 It is preferable to use an iodide salt as the salt. By using an iodide salt, living radical polymerization proceeds and a second polymer having a narrower molecular weight distribution can be obtained. Further, it is preferable to use a salt that can be dissolved in a polymerization solution such as a quaternary ammonium iodide salt, a quaternary phosphonium iodide salt, and an alkali metal iodide salt, and a quaternary ammonium iodide salt is used. More preferable. Examples of the quaternary ammonium iodide salt include benzyltetrabutylammonium iodide, tetrabutylammonium iodide, tetraoctylammonium iodide, dodecyltrimethylammonium iodide, octadecyltrimethylammonium iodide, and trioctadecylmethylammonium iodide. Can be mentioned.
活性度を高めるとともに、より濃厚で高分子量の第2ポリマーを得る観点から、重合開始基に対する塩の量は当モル以上とすることが好ましく、10倍モル以上とすることがさらに好ましく、100倍モル以上としてもよい。 From the viewpoint of increasing the activity and obtaining a more concentrated and high molecular weight second polymer, the amount of the salt with respect to the polymerization initiation group is preferably equimolar or more, more preferably 10 times or more, and 100 times or more. It may be molar or more.
この第4級塩やハロゲン化物塩を使用する方法において、その重合条件は特に限定されない。従来公知の条件で行われる。好ましくは、温度は60℃以上、溶媒として有機溶媒を使用することが好ましい。溶媒としては、従来公知の溶媒が使用でき、特に限定されない。その溶剤は前記した従来公知の有機溶剤が使用できるが、好ましくは、塩を溶解する溶剤を使用することがよく、アルコール系、グリコール系、アミド系、尿素系、スルホキシド系、イオン液体などの極性が高い有機溶剤が好ましい。 In the method using the quaternary salt or halide salt, the polymerization conditions are not particularly limited. It is performed under conventionally known conditions. Preferably, the temperature is 60° C. or higher, and it is preferable to use an organic solvent as the solvent. A conventionally known solvent can be used as the solvent and is not particularly limited. As the solvent, the conventionally known organic solvent described above can be used, but it is preferable to use a solvent capable of dissolving a salt, such as alcohol-based, glycol-based, amide-based, urea-based, sulfoxide-based, and ionic liquid polar solvents. Higher organic solvents are preferred.
常圧~1,000MPaの圧力条件下、好ましくは100~1,000MPa、さらに好ましくは200~800MPa、特に好ましくは300~600MPaの圧力条件下で重合する。具体的には、モノマー及び基材を入れた重合容器の全体に、水などの媒体を介して均一に圧力を付与しながら重合する。圧力を付与した状態でラジカル重合することで、停止反応を抑制し、より高分子量の第2ポリマーを形成することができる。 Polymerization is carried out under a pressure condition of normal pressure to 1,000 MPa, preferably 100 to 1,000 MPa, more preferably 200 to 800 MPa, and particularly preferably 300 to 600 MPa. Specifically, the entire polymerization vessel containing the monomer and the base material is polymerized while uniformly applying pressure through a medium such as water. By radical polymerization under pressure, the termination reaction can be suppressed and a second polymer having a higher molecular weight can be formed.
1,000MPa超の圧力に耐えうる容器や装置を用意するのは困難であり、実用的ではない。形成される第2ポリマーの分子量が大きくなるに伴い、ポリマー層(ii)の膜厚が厚くなる。ポリマー層(ii)の膜厚を厚くすることで、基材表面をこれまでにない特性を示すように改質することができる。ポリマー層(ii)の膜厚は、例えば、数nmから数μmとすることができ、好ましくは10nm以上、さらに好ましくは100nm以上とすることができる。 It is difficult and not practical to prepare a container or device that can withstand a pressure of over 1,000 MPa. As the molecular weight of the second polymer formed increases, the film thickness of the polymer layer (ii) increases. By increasing the thickness of the polymer layer (ii), the surface of the base material can be modified so as to exhibit unprecedented characteristics. The thickness of the polymer layer (ii) can be, for example, several nm to several μm, preferably 10 nm or more, more preferably 100 nm or more.
重合容器としては、密閉可能であるとともに、高圧に耐えうる容器を用いることが好ましい。また、容器の内部に圧力が伝達される必要があるため、プラスチック製の軟質部分や伸縮部分などの、圧力で変形する部分を有する容器を用いることが好ましい。具体的には、ポリエチレン製の瓶、ペットボトル、レトルトパウチ、ブリスター容器など様々な容器を用いることができる。また、重合時の温度で変形しにくい、耐熱性を有する素材からなる容器が好ましい。さらに、重合用の溶剤等で侵されにくい、耐薬品性や耐溶剤性などの特性を有する素材からなる容器が好ましい。重合容器を構成する素材としては、例えば、ポリオレフィン系樹脂、フッ素系樹脂、ポリエステル系樹脂、ポリアミド系樹脂、エンジニアプラスチック等を挙げることができる。また、重合時には、可能な限り、重合容器内に気体が入りこまないようにすることが好ましい。例えば、重合容器の容量の90%以上に重合溶液を仕込むことが好ましい。 As the polymerization vessel, it is preferable to use a vessel that can be sealed and can withstand high pressure. Further, since pressure needs to be transmitted to the inside of the container, it is preferable to use a container having a portion that is deformed by pressure, such as a plastic soft portion or a stretchable portion. Specifically, various containers such as polyethylene bottles, PET bottles, retort pouches, and blister containers can be used. Further, a container made of a material having heat resistance, which does not easily deform at the temperature during polymerization, is preferable. Furthermore, a container made of a material having characteristics such as chemical resistance and solvent resistance, which is hard to be attacked by a polymerization solvent or the like, is preferable. Examples of materials forming the polymerization container include polyolefin-based resins, fluorine-based resins, polyester-based resins, polyamide-based resins, engineered plastics, and the like. In addition, during polymerization, it is preferable to prevent gas from entering the polymerization container as much as possible. For example, it is preferable to charge the polymerization solution to 90% or more of the capacity of the polymerization container.
以上、基材、モノマー、触媒等の重合溶液を重合容器に仕込んで、常圧、または常圧以上1000MPa以下の外圧をかけて、好ましくは加温して重合することで、基材のポリマー層(i)からポリマーが生成し、基材の表面を改質することができる。用いるモノマーの種類等に応じて、基材の表面を任意の性質に改質することができる。例えば、フッ素系モノマーを用いることで、水や油をはじきやすい表面張力の低いポリマー層(ii)を形成することができる。ポリエチレングリコール基やカルボキシ基などを有するモノマーを使用することで、当たった水蒸気が直ちに水滴となって曇りにくい親水性のポリマー層(ii)を形成することができる。さらに、タンパク等が付着しにくい生体適合性基材を製造することも可能である。また、形成されたポリマー層(ii)を潤滑油等で膨潤させて潤滑膜とし、極低摩擦性のポリマー層とすることもできる。 As described above, the polymer layer of the base material is prepared by charging the polymerization solution of the base material, the monomer, the catalyst and the like into a polymerization vessel and applying the atmospheric pressure or the external pressure of the atmospheric pressure or more and 1000 MPa or less, preferably by heating to perform the polymerization. A polymer is generated from (i), and the surface of the base material can be modified. The surface of the base material can be modified to have arbitrary properties depending on the type of monomer used and the like. For example, by using a fluorine-based monomer, it is possible to form a polymer layer (ii) having a low surface tension that easily repels water and oil. By using a monomer having a polyethylene glycol group, a carboxy group, or the like, it is possible to form a hydrophilic polymer layer (ii) in which the hit steam immediately becomes a water drop and is hard to be clouded. Furthermore, it is also possible to manufacture a biocompatible substrate to which proteins and the like are less likely to adhere. Further, the formed polymer layer (ii) may be swollen with a lubricating oil or the like to form a lubricating film, which may be an extremely low friction polymer layer.
形成されたポリマー層(ii)を構成する第2ポリマーの分子量を検証することは容易であるとは言えない。そこで、重合開始基と同一の開始基を有する開始基モノマーの共存下で表面開始ラジカル重合又は表面開始リビングラジカル重合することが好ましい。これにより、ポリマー層(ii)に含まれない遊離ポリマーが形成される。そして、形成された遊離ポリマーの分子量を定法にしたがって測定することで、ポリマー層(ii)を構成する第2ポリマーの分子量を推測することができる。形成される遊離ポリマーの、ゲルパーミエーションクロマトグラフィー(GPC)により測定されるポリスチレン換算の数平均分子量(Mn)は、通常、1,000~10,000,000であり、好ましくは100,000以上である。 It cannot be said that it is easy to verify the molecular weight of the second polymer forming the formed polymer layer (ii). Therefore, it is preferable to perform surface-initiated radical polymerization or surface-initiated living radical polymerization in the coexistence of an initiating group monomer having the same initiating group as the initiating group. This forms free polymer that is not included in polymer layer (ii). Then, the molecular weight of the second polymer constituting the polymer layer (ii) can be estimated by measuring the molecular weight of the formed free polymer according to a standard method. The polystyrene-equivalent number average molecular weight (Mn) of the formed free polymer measured by gel permeation chromatography (GPC) is usually 1,000 to 10,000,000, and preferably 100,000 or more. Is.
開始基モノマーとしては、重合開始基と同一の基を有する化合物を用いる。具体的には、下記式(3)~(5)で表される化合物を開始基モノマーとして用いることができる。 ㆍA compound having the same group as the polymerization initiation group is used as the initiation group monomer. Specifically, compounds represented by the following formulas (3) to (5) can be used as the starting group monomer.
ポリマー層(ii)は、水、有機溶剤、又はこれらの混合溶媒等の溶媒を含有して膨潤していることが好ましい。溶媒で膨潤させることで、ポリマー層(ii)の膜厚を増大させることができる。さらに、膨潤したポリマー層(ii)は、圧縮に対して強い抵抗や、低摩擦性などの特異な性質を示すために好ましい。ポリマー層(ii)は、例えば、表面処理膜がその表面に形成された基材を溶媒に浸漬することで膨潤させることができる。 The polymer layer (ii) is preferably swollen by containing a solvent such as water, an organic solvent, or a mixed solvent thereof. By swelling with a solvent, the film thickness of the polymer layer (ii) can be increased. Furthermore, the swollen polymer layer (ii) is preferable because it exhibits unique properties such as strong resistance to compression and low friction. The polymer layer (ii) can be swollen by, for example, immersing the substrate having the surface-treated film formed on its surface in a solvent.
<物品>
本発明の物品は、基材と、この基材の表面上に設けられる前述の表面処理膜とを備える。基材の種類は特に限定されず、天然物、人工物、無機部材、有機部材のいずれであっても用いることができる。なかでも、重合溶液に耐えうる基材を用いることが好ましい。基材の具体例としては、金属、金属酸化物、金属窒化物、金属炭化物、セラミックス、木材、ケイ素化合物、熱可塑性樹脂、熱硬化性樹脂、セルロース、ガラス等の機械部品、フィルム、繊維、シートなどを挙げることができる。
<Article>
The article of the present invention comprises a base material and the above-mentioned surface-treated film provided on the surface of the base material. The type of base material is not particularly limited, and any of natural materials, artificial materials, inorganic members, and organic members can be used. Above all, it is preferable to use a substrate that can withstand the polymerization solution. Specific examples of the base material include metal, metal oxides, metal nitrides, metal carbides, ceramics, wood, silicon compounds, thermoplastic resins, thermosetting resins, cellulose, mechanical parts such as glass, films, fibers, sheets. And so on.
基材には表面処理を施してもよい。表面処理としては、シランカップリング処理、シリカコート処理、シリカアルミナ処理などの無機処理;プラズマ処理、紫外線照射処理、オゾン酸化処理、放射線処理、X線処理、電子線処理、レーザー処理などの洗浄、活性化、及び表面処理官能基付与処理などを挙げることができる。 Substrate may be surface treated. The surface treatment includes inorganic treatment such as silane coupling treatment, silica coating treatment, and silica alumina treatment; cleaning such as plasma treatment, ultraviolet irradiation treatment, ozone oxidation treatment, radiation treatment, X-ray treatment, electron beam treatment, and laser treatment. Examples include activation and surface treatment functional group imparting treatment.
ポリマー層(i)の膜厚は、基材の表面の表面粗さの最大高さRzよりも厚いことが好ましい。一般的な基材の表面には、通常、ナノ単位からミクロン単位までの凹凸が生じている。ポリマー層(i)が薄すぎると、凹凸を被覆しきれずに凸部が露出する場合がある。また、凸部を辛うじて被覆したとしても、ポリマー層(i)の表面形状が基材の凹凸を反映するとともに、その上に形成されるポリマー層(ii)の表面も凹凸になりやすい。このため、ポリマー層(i)の膜厚を、基材の表面の表面粗さの最大高さRzよりも厚くすることで、基材の表面全体を均一に被覆して平滑にすることができる。また、ポリマー層(i)表面の全体により平滑なポリマー層(ii)を形成することができる。ポリマー層(i)の膜厚は、例えば、原子間力顕微鏡やエリプソメーターなどの精密機器を使用する測定方法や、電子顕微鏡を用いた観察による測定方法、膜厚測定機を使用する測定方法などにより測定することができる。 The film thickness of the polymer layer (i) is preferably thicker than the maximum height Rz of the surface roughness of the surface of the base material. The surface of a general substrate usually has irregularities ranging from nano units to micron units. If the polymer layer (i) is too thin, the projections may be exposed without being able to completely cover the projections and depressions. Even if the protrusions are barely covered, the surface shape of the polymer layer (i) reflects the irregularities of the substrate, and the surface of the polymer layer (ii) formed thereon is likely to be irregular. Therefore, by making the film thickness of the polymer layer (i) thicker than the maximum height Rz of the surface roughness of the surface of the base material, the entire surface of the base material can be uniformly coated and smoothed. .. Further, a smooth polymer layer (ii) can be formed on the entire surface of the polymer layer (i). The film thickness of the polymer layer (i) is, for example, a measuring method using a precision instrument such as an atomic force microscope or an ellipsometer, a measuring method by observation using an electron microscope, a measuring method using a film thickness measuring instrument, etc. Can be measured by
基材と密着して機械的強度を付与するポリマー層(i)と、特異な性質を示すポリマー層(ii)とを含む積層構造を有する表面処理膜を基材の表面上に設けることで、部品としての性能が付与された、又は性能が向上した本発明の物品とすることができる。本発明の物品は、例えば、医療用部材、電子材料、ディスプレイ材料、半導体材料、機械部品、摺動部材、電池材料などの様々な分野で用いられる物品として好適である。 By providing a surface-treated film having a laminated structure including a polymer layer (i) that adheres to the base material and imparts mechanical strength, and a polymer layer (ii) that exhibits unique properties on the surface of the base material, It can be an article of the present invention to which performance as a part is imparted or performance is improved. The article of the present invention is suitable as an article used in various fields such as medical members, electronic materials, display materials, semiconductor materials, mechanical parts, sliding members, and battery materials.
以下、本発明を実施例に基づいて具体的に説明するが、本発明はこれらの実施例に限定されるものではない。なお、実施例、比較例中の「部」及び「%」は、特に断らない限り質量基準である。 Hereinafter, the present invention will be specifically described based on Examples, but the present invention is not limited to these Examples. In addition, "part" and "%" in Examples and Comparative Examples are based on mass unless otherwise specified.
<開始基ポリマー(第1ポリマー)の合成>
(合成例1:開始基ポリマー1)
撹拌装置、撹拌翼、温度計、冷却管、窒素導入装置、及び滴下装置を装着した反応容器に、プロピレングリコールモノメチルエーテルアセテート(PGMAc)150部を入れた。窒素を吹き込みながら撹拌し、30分かけて80℃まで加温した。別容器に、2-(2-ブロモイソブチリルオキシ)エチルメタクリレート(BBEM)75部、3-メタクリロキシプロピルメチルジエトキシシラン(MPES)25部、及び2,2’-アゾビス(2,4-ジメチルバレロニトリル)(V-65)1.5部を入れて撹拌し、均一なモノマー混合液を調製した。調製したモノマー混合液の1/3を反応容器中に添加した後、残りのモノマー混合液を1時間かけて滴下した。滴下後、直ちにV-65 0.5部を添加した。1時間後、V-65 0.5部をさらに添加し、80℃で7時間重合して、開始基ポリマー1を含有する若干黄味の低粘度の液体を得た。得られた液体の固形分は40.1%であり、重合率は約100%であった。GPC装置(展開溶媒:テトラヒドロフラン(THF))を使用して測定した開始基ポリマー1のポリスチレン換算の数平均分子量(Mn)は12,000であり、分子量分布(Mw/Mn、分散度PDI)は3.56であった。
<Synthesis of Initiating Group Polymer (First Polymer)>
(Synthesis Example 1: Initiating group polymer 1)
150 parts of propylene glycol monomethyl ether acetate (PGMAc) was put into a reaction vessel equipped with a stirring device, a stirring blade, a thermometer, a cooling tube, a nitrogen introducing device, and a dropping device. The mixture was stirred while blowing nitrogen and heated to 80° C. over 30 minutes. In a separate container, 75 parts of 2-(2-bromoisobutyryloxy)ethyl methacrylate (BBEM), 25 parts of 3-methacryloxypropylmethyldiethoxysilane (MPES), and 2,2'-azobis(2,4- 1.5 parts of dimethylvaleronitrile (V-65) was added and stirred to prepare a uniform monomer mixture solution. After adding 1/3 of the prepared monomer mixed solution into the reaction vessel, the remaining monomer mixed solution was added dropwise over 1 hour. Immediately after dropping, 0.5 part of V-65 was added. After 1 hour, 0.5 part of V-65 was further added and the mixture was polymerized at 80° C. for 7 hours to obtain a slightly yellowish low viscosity liquid containing the initiator group polymer 1. The solid content of the obtained liquid was 40.1%, and the polymerization rate was about 100%. The polystyrene equivalent number average molecular weight (Mn) of the starting group polymer 1 measured using a GPC apparatus (developing solvent: tetrahydrofuran (THF)) was 12,000, and the molecular weight distribution (Mw/Mn, dispersity PDI) was It was 3.56.
(合成例2:開始基ポリマー2)
合成例1で使用した反応容器と同様の反応容器にPGMAc100部を入れ、窒素を吹き込みながら撹拌し、30分かけて65℃まで加温した。別容器に、BBEM50部、メチルメタクリレート(MMA)15部、ブチルメタクリレート(BMA)15部、2-エチルヘキシルメタクリレート(2EHMA)10部、2-[O-(1’-メチルプロピリデンアミノ)カルボキシアミノ]エチルメタクリレート(ブロックイソシアネートモノマー、商品名「カレンズMOI-BM」、昭和電工社製)10部、及びV-65 1部を入れて撹拌し、均一なモノマー混合液を調製した。調製したモノマー混合液の1/2を反応容器中に添加した後、残りのモノマー混合液を2時間かけて滴下した。3時間重合した後、V-65 0.5部をさらに添加して5時間重合して、開始基ポリマー2を含有する若干黄味の粘稠な溶液を得た。得られた液体の固形分は50.3%であり、重合率は約100%であった。開始基ポリマー2のMnは18,600であり、PDIは2.06であった。
(Synthesis example 2: Initiating group polymer 2)
100 parts of PGMAc was put into a reaction container similar to the reaction container used in Synthesis Example 1, stirred while blowing nitrogen, and heated to 65° C. over 30 minutes. In a separate container, BBEM 50 parts, methyl methacrylate (MMA) 15 parts, butyl methacrylate (BMA) 15 parts, 2-ethylhexyl methacrylate (2EHMA) 10 parts, 2-[O-(1'-methylpropylideneamino)carboxyamino] 10 parts of ethyl methacrylate (blocked isocyanate monomer, trade name "Karenzu MOI-BM", manufactured by Showa Denko KK) and 1 part of V-65 were added and stirred to prepare a uniform monomer mixture. After adding 1/2 of the prepared monomer mixture solution to the reaction vessel, the remaining monomer mixture solution was added dropwise over 2 hours. After polymerization for 3 hours, 0.5 part of V-65 was further added and polymerization was carried out for 5 hours to obtain a slightly yellowish viscous solution containing the initiator group polymer 2. The solid content of the obtained liquid was 50.3%, and the polymerization rate was about 100%. The Mn of Initiating Group Polymer 2 was 18,600 and the PDI was 2.06.
(合成例3~5:開始基ポリマー3~5)
表1の中段に示す種類及び量(単位:部)のモノマーを用いたこと以外は、前述の合成例1と同様にして、開始基ポリマー3~5をそれぞれ含有する溶液を得た。得られた開始基ポリマーのそれぞれの物性値等を表1の下段に示す。
(Synthesis Examples 3-5: Initiating Group Polymers 3-5)
A solution containing each of the starting group polymers 3 to 5 was obtained in the same manner as in Synthesis Example 1 except that the types and amounts (unit: parts) of monomers shown in the middle row of Table 1 were used. Physical properties and the like of the obtained starting group polymer are shown in the lower part of Table 1.
<ポリマー層(i)形成用のコーティング液の製造>
(製造例1:COT-1)
開始基ポリマー1を含有する液体100部、及びPGMAc60.4部を混合してコーティング液(COT-1)を得た。
<Production of coating liquid for forming polymer layer (i)>
(Production Example 1: COT-1)
A coating liquid (COT-1) was obtained by mixing 100 parts of the liquid containing the starting group polymer 1 and 60.4 parts of PGMAc.
(製造例2:COT-2)
開始基ポリマー2を含有する液体100部、ポリエチレンイミン(商品名「エポミンSP-003」、日本触媒社製)2部、及びPGMAc107.2部を混合してコーティング液(COT-2)を得た。
(Production Example 2: COT-2)
A coating liquid (COT-2) was obtained by mixing 100 parts of a liquid containing the starting group polymer 2, 2 parts of polyethyleneimine (trade name "Epomin SP-003", manufactured by Nippon Shokubai Co., Ltd.), and 107.2 parts of PGMAc. ..
(製造例3~5:COT-3~5)
表2の中段に示す種類及び量(単位:部)の成分を用いたこと以外は、前述の製造例1と同様にして、コーティング液(COT-3~5)を得た。得られたコーティング液のそれぞれの外観及び固形分(%)を表2の下段に示す。
(Production Examples 3-5: COT-3-5)
Coating liquids (COT-3 to 5) were obtained in the same manner as in Production Example 1 except that the components shown in the middle row of Table 2 were used. The appearance and solid content (%) of each of the obtained coating solutions are shown in the lower part of Table 2.
<ポリマー層(i)付与基材の製造>
(製造例6:SUB-1)
洗浄及びUVオゾンにより表面活性化処理したシリコンウェハを基材として用意した。用意した基材の表面にCOT-1を塗布し、スピンコーターを使用して2,000rpm、30秒の条件でコーティングした。80℃のオーブンに入れて5分間乾燥させた後、120℃のオーブンに入れて12時間加熱して硬化させてポリマー層(i)を形成し、ポリマー層(i)付与基材であるSUB-1を得た。分光エリプソメトリーにより測定したポリマー層(i)の膜厚は、1,286nmであった。得られたSUB-1をTHFに浸漬して5分間超音波洗浄した後、ポリマー層(i)の膜厚を再度測定した。その結果、ポリマー層(i)の膜厚は洗浄前からほとんど変化しておらず、十分に硬化したポリマー層(i)が形成されたことを確認した。
<Production of polymer layer (i)-applied substrate>
(Production Example 6: SUB-1)
A silicon wafer that had been cleaned and surface-activated by UV ozone was prepared as a base material. COT-1 was applied to the surface of the prepared base material, and was coated under the conditions of 2,000 rpm and 30 seconds using a spin coater. After being placed in an oven at 80° C. and dried for 5 minutes, placed in an oven at 120° C. and heated for 12 hours to be cured to form a polymer layer (i), and the polymer layer (i)-imparting substrate SUB- Got 1. The film thickness of the polymer layer (i) measured by spectroscopic ellipsometry was 1,286 nm. The obtained SUB-1 was immersed in THF and ultrasonically cleaned for 5 minutes, and then the film thickness of the polymer layer (i) was measured again. As a result, it was confirmed that the film thickness of the polymer layer (i) was scarcely changed before the cleaning, and that the sufficiently cured polymer layer (i) was formed.
(製造例7:SUB-2)
洗浄及びUVオゾンにより表面活性化処理したガラス板(Rz=15nm)を基材として用意した。用意した基材の表面にCOT-2を塗布し、スピンコーターを使用して2,000rpm、30秒の条件でコーティングした。80℃のオーブンに入れて5分間乾燥させた後、140℃のオーブンに入れて1時間加熱して硬化させてポリマー層(i)を形成し、ポリマー層(i)付与基材であるSUB-2を得た。分光エリプソメトリーにより測定したポリマー層(i)の膜厚は、1,331nmであった。得られたSUB-2をTHFに浸漬して5分間超音波洗浄した後、ポリマー層(i)の膜厚を再度測定した。その結果、ポリマー層(i)の膜厚は洗浄前からほとんど変化しておらず、十分に硬化したポリマー層(i)が形成されたことを確認した。
(Production Example 7: SUB-2)
A glass plate (Rz=15 nm) that had been cleaned and surface-activated by UV ozone was prepared as a substrate. COT-2 was applied to the surface of the prepared base material, and was coated under the conditions of 2,000 rpm and 30 seconds using a spin coater. After being placed in an oven at 80° C. and dried for 5 minutes, placed in an oven at 140° C. and heated for 1 hour to be cured to form a polymer layer (i), and the polymer layer (i)-imparting substrate SUB- Got 2. The film thickness of the polymer layer (i) measured by spectroscopic ellipsometry was 1,331 nm. The obtained SUB-2 was immersed in THF and ultrasonically cleaned for 5 minutes, and then the film thickness of the polymer layer (i) was measured again. As a result, it was confirmed that the film thickness of the polymer layer (i) was scarcely changed before the cleaning, and that the sufficiently cured polymer layer (i) was formed.
(製造例8~10:SUB-3~5)
表3の下段に示す条件としたこと以外は、前述の製造例6及び7と同様にして、ポリマー層(i)付与基材であるSUB-3~5を得た。
(Production Examples 8 to 10: SUB-3 to 5)
Substrates SUB-3 to 5 as polymer layer (i)-applied base materials were obtained in the same manner as in Production Examples 6 and 7 except that the conditions shown in the lower part of Table 3 were used.
(比較製造例1:SUB-C-1)
3-(トリメトキシシリルプロピル)-2-ブロモ-2-メチルプロピオネート(BPM)0.2部、濃アンモニア水2部、及びエタノール45部を混合した溶液をポリスチレン製のシャーレに入れた。基材として、十分に洗浄したガラス板(Rz=15nm)を用意した。用意した基材をシャーレに入れて溶液に浸漬し、室温で12時間静置した後、エタノールで十分に洗浄した。これにより、ガラス板の表面に重合開始点を有する単分子膜が形成されたSUB-C-1を得た。
(Comparative Production Example 1: SUB-C-1)
A solution obtained by mixing 0.2 part of 3-(trimethoxysilylpropyl)-2-bromo-2-methylpropionate (BPM), 2 parts of concentrated aqueous ammonia, and 45 parts of ethanol was put in a petri dish made of polystyrene. As a base material, a sufficiently washed glass plate (Rz=15 nm) was prepared. The prepared substrate was placed in a petri dish, immersed in the solution, allowed to stand at room temperature for 12 hours, and then thoroughly washed with ethanol. As a result, SUB-C-1 in which a monomolecular film having a polymerization initiation point was formed on the surface of the glass plate was obtained.
(比較製造例2:SUB-C-2)
ガラス板に代えてSUS板(Rz=0.8μm)を基材として用いたこと以外は、前述の比較製造例1と同様にして、SUS板の表面に重合開始点を有する単分子膜が形成されたSUB-C-2を得た。
(Comparative Production Example 2: SUB-C-2)
A monomolecular film having a polymerization initiation point was formed on the surface of the SUS plate in the same manner as in Comparative Production Example 1 described above, except that a SUS plate (Rz=0.8 μm) was used as the substrate instead of the glass plate. The obtained SUB-C-2 was obtained.
<表面処理膜付与基材の製造>
(実施例1:SUB-6)
アルゴン雰囲気下、2-ブロモイソ酪酸エチル(EBiB)0.00054部、3-メトキシ-N,N-ジメチルプロパンアミド(商品名「KJCMPA-100」、KJケミカルズ社製)(KJCMPA)55.5部、MMA55.1部、及びテトラブチルアンモニウムヨージド(TBAI)0.41部をフラスコに入れて撹拌し、重合溶液を調製した。ポリマー層(i)付与基材であるSUB-1をPTFE製のネジ口容器に入れるとともに、調製した重合溶液を容器内に注ぎ満たして栓をし、フタの部分をパラフィンフィルムで巻いた。この容器をアルミラミネート袋に入れ、気体を抜きながらヒートシールした。加圧媒体として水を入れた高圧装置(商品名「PV-400」、シンコーポレーション社製)内にアルミラミネート袋ごと容器を入れ、75℃に加温するとともに、400MPaに加圧して4時間重合した。高圧装置内には、ポリマーを含有する高粘性の溶液が生成しており、一部をサンプリングして測定したポリマーのMnは2,378,000であり、PDIは1.42であった。容器から取り出した基材をTHFで十分に洗浄した。シリコンウェハの表面上に形成された膜の膜厚を分光エリプソメトリーにより測定したところ、1,962nmであった。ポリマー層(i)の膜厚よりも厚くなっていたことから、ポリマー層(i)上にポリマー層(ii)が積層された表面処理膜が形成されたことを確認した。得られた基材(表面処理膜付与基材)をSUB-6とする。
<Manufacture of substrate for surface treatment film>
(Example 1: SUB-6)
In an argon atmosphere, ethyl 2-bromoisobutyrate (EBiB) 0.00054 parts, 3-methoxy-N,N-dimethylpropanamide (trade name "KJCMPA-100", manufactured by KJ Chemicals) (KJCMPA) 55.5 parts, 55.1 parts of MMA and 0.41 part of tetrabutylammonium iodide (TBAI) were put into a flask and stirred to prepare a polymerization solution. The polymer layer (i)-applied substrate SUB-1 was placed in a PTFE screw cap container, the prepared polymerization solution was poured into the container and the container was capped, and the lid was wrapped with a paraffin film. This container was placed in an aluminum laminate bag and heat-sealed while removing gas. Put the container together with the aluminum laminate bag in a high-pressure device (trade name “PV-400”, manufactured by Shin Corporation) containing water as a pressurizing medium, heat to 75° C., pressurize to 400 MPa and polymerize for 4 hours did. A high-viscosity solution containing a polymer was formed in the high-pressure apparatus, and the Mn of the polymer measured by sampling a part was 2,378,000 and the PDI was 1.42. The base material taken out from the container was thoroughly washed with THF. The film thickness of the film formed on the surface of the silicon wafer was measured by spectroscopic ellipsometry and found to be 1,962 nm. Since it was thicker than the polymer layer (i), it was confirmed that the surface-treated film in which the polymer layer (ii) was laminated on the polymer layer (i) was formed. The obtained base material (surface-treated film-added base material) is referred to as SUB-6.
(実施例2:SUB-7)
アルゴン雰囲気下、EBiB0.00098部、臭化銅(II)(CuBr2)0.080部、臭化銅(I)(CuBr)0.46部、4,4’-ジノニル-2,2’-ビピリジル(dNbpy)3.2部、MMA100.1部、及びアニソール103.9部をフラスコに入れて撹拌し、重合溶液を調製した。ポリマー層(i)付与基材であるSUB-2をPTFE製のネジ口容器に入れるとともに、調製した重合溶液を容器内に注ぎ満たして栓をし、フタの部分をパラフィンフィルムで巻いた。この容器をアルミラミネート袋に入れ、気体を抜きながらヒートシールした。加圧媒体として水を入れた高圧装置(PV-400)内にアルミラミネート袋ごと容器を入れ、60℃に加温するとともに、400MPaに加圧して4時間重合した。高圧装置内には、ポリマーを含有する高粘性の溶液が生成しており、一部をサンプリングして測定したポリマーのMnは2,463,000であり、PDIは1.09であった。容器から取り出した基材をTHFで十分に洗浄した。ガラス板の表面上に形成された膜の膜厚を分光エリプソメトリーにより測定したところ、2,028nmであった。ポリマー層(i)の膜厚よりも厚くなっていたことから、ポリマー層(i)上にポリマー層(ii)が積層された表面処理膜が形成されたことを確認した。得られた基材(表面処理膜付与基材)をSUB-7とする。
(Example 2: SUB-7)
EBiB 0.00098 parts, copper (II) bromide (CuBr 2 ) 0.080 parts, copper (I) bromide (CuBr) 0.46 parts, 4,4′-dinonyl-2,2′-under an argon atmosphere. 3.2 parts of bipyridyl (dNbpy), 100.1 parts of MMA, and 103.9 parts of anisole were put into a flask and stirred to prepare a polymerization solution. SUB-2, which is the base material to which the polymer layer (i) was applied, was placed in a PTFE screw cap container, the prepared polymerization solution was poured into the container and the container was plugged, and the lid portion was wrapped with a paraffin film. This container was placed in an aluminum laminate bag and heat-sealed while removing gas. The container was placed together with the aluminum laminate bag in a high-pressure device (PV-400) containing water as a pressurizing medium, heated to 60° C. and pressurized to 400 MPa to polymerize for 4 hours. A high-viscosity solution containing a polymer was formed in the high-pressure device, and Mn of the polymer measured by sampling a part was 2,463,000 and PDI was 1.09. The base material taken out from the container was thoroughly washed with THF. When the film thickness of the film formed on the surface of the glass plate was measured by spectroscopic ellipsometry, it was 2,028 nm. Since it was thicker than the polymer layer (i), it was confirmed that the surface-treated film in which the polymer layer (ii) was laminated on the polymer layer (i) was formed. The obtained base material (surface-treated film-attached base material) is referred to as SUB-7.
(実施例3~5、比較例1、2:SUB-8~10、SUB-C-3、4)
表4に示す種類のポリマー層(i)付与基材及びモノマーを用いたこと以外は、前述の実施例1又は2と同様にして、表面処理膜付与基材であるSUB-8~10、SUB-C-3、4を得た。得られた表面処理膜付与基材の詳細を表4に示す。
(Examples 3 to 5, Comparative Examples 1 and 2, SUB-8 to 10, SUB-C-3, 4)
Substrates SUB-8 to 10 and SUB, which are surface-treated film-added substrates, were prepared in the same manner as in Example 1 or 2 above, except that the polymer layer (i)-provided substrates and monomers of the types shown in Table 4 were used. -C-3, 4 were obtained. Table 4 shows the details of the obtained surface-treated film-coated substrate.
<評価>
(評価(1):SUB-7)
実施例2で得たSUB-7をトルエンに一晩浸漬して表面処理膜を膨潤させた。摩擦試験機(商品名「Heidon摩擦試験機タイプ14」、新東科学社製)を使用し、荷重1,000g、振幅幅30mm、摺動速度200mm/minの条件下、1,000往復のボール圧子往復摺動試験を行った。データ解析の結果、摩擦係数は0.0020であり、1,000往復後も摩擦係数に変化はなかった。摺動試験後の表面をレーザー顕微鏡により観察したところ、摩耗は認められなかった。以上より、SUB-7は、低摩擦であるとともに、高い耐久性を有していることを確認した。
<Evaluation>
(Evaluation (1): SUB-7)
The SUB-7 obtained in Example 2 was immersed in toluene overnight to swell the surface-treated film. Using a friction tester (trade name "Heidon friction tester type 14", manufactured by Shinto Kagaku Co., Ltd.), 1,000 reciprocating balls under the conditions of a load of 1,000 g, an amplitude width of 30 mm, and a sliding speed of 200 mm/min. An indenter reciprocating sliding test was conducted. As a result of data analysis, the friction coefficient was 0.0020, and the friction coefficient did not change even after 1,000 reciprocations. When the surface after the sliding test was observed with a laser microscope, no abrasion was observed. From the above, it was confirmed that SUB-7 has low friction and high durability.
(評価(2):SUB-10)
トルエンに代えてジイソトリデシルアジペートに浸漬したこと以外は、前述の評価(1)と同様にして、実施例5で得たSUB-10について摺動試験を行った。その結果、摩擦係数は0.0018であり、1,000往復後も摩擦係数に変化はなかった。摺動試験後の表面をレーザー顕微鏡により観察したところ、摩耗は認められなかった。以上より、SUB-10は、低摩擦であるとともに、高い耐久性を有していることを確認した。
(Evaluation (2): SUB-10)
A sliding test was conducted on the SUB-10 obtained in Example 5 in the same manner as in the above-mentioned evaluation (1) except that it was immersed in diisotridecyl adipate instead of toluene. As a result, the friction coefficient was 0.0018, and there was no change in the friction coefficient even after 1,000 reciprocations. When the surface after the sliding test was observed with a laser microscope, no abrasion was observed. From the above, it was confirmed that SUB-10 has low friction and high durability.
(評価(3):SUB-C-3)
前述の評価(1)と同様にして、比較例1で得たSUB-C-3について摺動試験を行った。その結果、初期の摩擦係数は0.002であったが、約500往復後から摩擦係数が徐々に上昇し、1,000往復後の摩擦係数は0.05となった。摺動試験後の表面をレーザー顕微鏡により観察したところ、摩耗痕が観察された。SUB-C-3は、ガラス板(Rz=15nm)上にポリマー層(i)を形成せず、ポリマー層(ii)を直接形成したものである。ポリマー層(i)が存在せず、ガラス板の表面粗さのために摩耗が進行し、摩擦係数が上昇したと考えられる。
(Evaluation (3): SUB-C-3)
A sliding test was conducted on the SUB-C-3 obtained in Comparative Example 1 in the same manner as in the evaluation (1). As a result, the initial friction coefficient was 0.002, but after about 500 reciprocations, the friction coefficient gradually increased, and after 1,000 reciprocations, the friction coefficient was 0.05. When the surface after the sliding test was observed with a laser microscope, wear marks were observed. SUB-C-3 is one in which the polymer layer (ii) is directly formed without forming the polymer layer (i) on the glass plate (Rz=15 nm). It is considered that the polymer layer (i) was not present and the abrasion progressed due to the surface roughness of the glass plate, and the friction coefficient increased.
(評価(4):SUB-C-4)
前述の評価(1)と同様にして、比較例2で得たSUB-C-4について摺動試験を行った。その結果、初期の摩擦係数は0.09であり、摩擦係数が徐々に上昇し、約100往復後の摩擦係数は0.2となった。摺動試験後の表面をレーザー顕微鏡により観察したところ、はっきりとした摩耗痕が観察された。SUB-C-4は、SUS板(Rz=0.8μm)上にポリマー層(i)を形成せず、ポリマー層(ii)を直接形成したものである。SUS板の表面が粗いためにポリマー層(ii)による潤滑性が乏しく、耐久性が著しく低下したと考えられる。
(Evaluation (4): SUB-C-4)
A sliding test was conducted on the SUB-C-4 obtained in Comparative Example 2 in the same manner as in the evaluation (1). As a result, the initial coefficient of friction was 0.09, the coefficient of friction gradually increased, and the coefficient of friction after about 100 reciprocations was 0.2. When the surface after the sliding test was observed with a laser microscope, clear wear marks were observed. SUB-C-4 is one in which the polymer layer (i) is directly formed without forming the polymer layer (i) on the SUS plate (Rz=0.8 μm). It is considered that since the surface of the SUS plate was rough, the lubricity due to the polymer layer (ii) was poor and the durability was significantly reduced.
本発明の表面処理膜は、低摩擦性、付着防止性、親水性、疎水性、又は撥水性などの性質を基材の表面に付与することができる。さらに、基材との密着性が高く、基材の耐久性を高めることができる。このため、本発明の表面処理膜を用いれば、医療用部材、電子材料、ディスプレイ材料、半導体材料、機械部品、摺動部材、電池材料などの様々な分野に用いられる部品等の各種物品を提供することができる。 The surface-treated film of the present invention can impart properties such as low friction property, anti-adhesion property, hydrophilic property, hydrophobic property, or water repellency to the surface of the base material. Further, the adhesion to the base material is high, and the durability of the base material can be enhanced. Therefore, by using the surface-treated film of the present invention, various articles such as parts used in various fields such as medical materials, electronic materials, display materials, semiconductor materials, mechanical parts, sliding members, and battery materials can be provided. can do.
Claims (9)
前記基材の表面側に配置されるポリマー層(i)と、前記ポリマー層(i)上に形成されるポリマー層(ii)と、を含む積層構造を有し、
前記ポリマー層(i)が、下記一般式(1)で表されるモノマーに由来する構成単位を含む第1ポリマーを含有し、
前記ポリマー層(ii)が、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーに由来する構成単位を含む、下記一般式(1)で表されるモノマーの官能基を重合開始点として伸長した第2ポリマーを含有する表面処理膜。
(前記一般式(1)中、R1は、水素原子又はメチル基を示し、Xは、O又はNHを示し、R2は、任意の有機基を示し、R3及びR4は、それぞれ独立に、水素原子、アルキル基、アリール基、又はアシル基を示すとともに、R3及びR4が結合している炭素原子は第3級炭素原子又は第4級炭素原子であり、Yは、塩素原子、臭素原子、又はヨウ素原子を示す) A surface treatment film provided on the surface of a base material,
A laminated structure including a polymer layer (i) arranged on the front surface side of the substrate and a polymer layer (ii) formed on the polymer layer (i),
The polymer layer (i) contains a first polymer containing a constitutional unit derived from a monomer represented by the following general formula (1),
The following general formula, in which the polymer layer (ii) contains structural units derived from one or more monomers selected from the group consisting of aromatic vinyl-based monomers, (meth)acrylate-based monomers, and (meth)acrylamide-based monomers. A surface-treated film containing a second polymer extended from the functional group of the monomer represented by (1) as a polymerization initiation point.
(In the general formula (1), R 1 represents a hydrogen atom or a methyl group, X represents O or NH, R 2 represents an arbitrary organic group, and R 3 and R 4 are each independently. Is a hydrogen atom, an alkyl group, an aryl group, or an acyl group, and the carbon atom to which R 3 and R 4 are bonded is a tertiary carbon atom or a quaternary carbon atom, and Y is a chlorine atom. , Bromine atom, or iodine atom)
前記基材の表面上に前記ポリマー層(i)を配置する工程と、
常圧~1,000MPaの圧力条件下、前記ポリマー層(i)の存在下で、芳香族ビニル系モノマー、(メタ)アクリレート系モノマー、及び(メタ)アクリルアミド系モノマーからなる群より選択される一種以上のモノマーを表面開始ラジカル重合又は表面開始リビングラジカル重合して、前記ポリマー層(i)上に前記ポリマー層(ii)を形成する工程と、を有する表面処理膜の製造方法。 The method for producing a surface-treated film according to any one of claims 1 to 5,
Disposing the polymer layer (i) on the surface of the substrate,
One selected from the group consisting of an aromatic vinyl-based monomer, a (meth)acrylate-based monomer, and a (meth)acrylamide-based monomer in the presence of the polymer layer (i) under a pressure condition of normal pressure to 1,000 MPa. A method for producing a surface-treated film, comprising the step of forming the polymer layer (ii) on the polymer layer (i) by surface-initiating radical polymerization or surface-initiating living radical polymerization of the above monomers.
前記基材の表面上に設けられる、請求項1~5のいずれか一項に記載の表面処理膜と、を備える物品。 Base material,
An article comprising the surface-treated film according to any one of claims 1 to 5, which is provided on the surface of the base material.
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