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WO2019230952A1 - Apparatus and method for sterilizing water within water supply pipe of dental unit - Google Patents

Apparatus and method for sterilizing water within water supply pipe of dental unit Download PDF

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Publication number
WO2019230952A1
WO2019230952A1 PCT/JP2019/021736 JP2019021736W WO2019230952A1 WO 2019230952 A1 WO2019230952 A1 WO 2019230952A1 JP 2019021736 W JP2019021736 W JP 2019021736W WO 2019230952 A1 WO2019230952 A1 WO 2019230952A1
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WIPO (PCT)
Prior art keywords
water
water supply
supply pipe
heating
unit
Prior art date
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Ceased
Application number
PCT/JP2019/021736
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French (fr)
Japanese (ja)
Inventor
宏 江草
信博 高橋
将博 山田
純平 鷲尾
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Tohoku University NUC
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Tohoku University NUC
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Priority to JP2020522630A priority Critical patent/JP7376106B2/en
Publication of WO2019230952A1 publication Critical patent/WO2019230952A1/en
Anticipated expiration legal-status Critical
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61CDENTISTRY; APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE
    • A61C19/00Dental auxiliary appliances
    • CCHEMISTRY; METALLURGY
    • C02TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02FTREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00Treatment of water, waste water, or sewage
    • C02F1/02Treatment of water, waste water, or sewage by heating

Definitions

  • the present invention relates to an apparatus and method for sterilizing water in a water supply pipe of a dental unit.
  • Patent Document 1 As a conventional technique for solving this problem, a neutral electrolyzed water generating device (for example, see Patent Document 1) that automatically corrects the residual chlorine concentration of dental unit water is used, but it is expensive, and the bacterial existing amount is reduced. It is unclear whether it is effective in reducing the number of heterotrophic bacteria, which has been attracting attention in recent years as an index for grasping more accurately.
  • Non-patent Document 1 As a means of reducing the number of heterotrophic bacteria in water used in the medical field, for example, setting the temperature control of the artificial dialysate production apparatus line after hot water disinfection to 50 ° C.
  • Non-patent Document 3 treats the piping and circulation system of a hand-washing water station in an operating room with hot water of 65 ° C.
  • Non-patent Document 3 the unit water sampled from a dental unit, in which 3.9 ⁇ 10 4 CFU / ml heterotrophic bacteria were detected was heated to 80 ° C. and heat disinfection was performed. It is described that all the bacteria were sterilized.
  • the subject of this invention is providing the apparatus and method for disinfecting the water in the water supply piping which can supply the water in which the number of heterotrophic bacteria decreased easily and cheaply also in the location away from the water tap of the apparatus. is there.
  • the present inventors attach a heater to the water supply pipe of the dental unit, and use a water supply heated to a moderate temperature of about 55 to 75 ° C. by the heater so that the distance from the water tap in the dental unit is increased.
  • the present invention has been completed by succeeding in suppressing the growth of heterotrophic bacteria that cause microbial contamination of water at the locations.
  • Item 1 A water supply pipe, and a heating device attached to the water supply pipe for sterilizing water in the water supply pipe, wherein the heating device is heterotrophic of water in the water supply pipe downstream from the heating device.
  • Item 2. Item 1. The heating apparatus includes a casing capable of storing water in the water supply pipe and a heater provided in the casing, and heats the water in the casing to 50 ° C or higher. The device described.
  • Item 3. Item 2. The apparatus according to Item 1, wherein the concentration of free residual chlorine in the water supply pipe downstream from the heating device is 0.1 mg / L or more.
  • the apparatus is a dental unit including an assistant unit and a doctor unit, and the water supply pipe is branched into a water supply pipe leading to the assistant unit and a water supply pipe leading to the doctor unit.
  • Item 4. The device according to any one of Items 1 to 3, which is provided at the branching part or upstream thereof.
  • the doctor unit includes an instrument that is in fluid communication with the water supply pipe, and the number of heterotrophic bacteria in the water discharged from the instrument is 2000 CFU / mL or less. .
  • Item 6. Item 6.
  • a method for sterilizing water in a water supply pipe of an apparatus wherein the water supply pipe is attached to the water supply pipe and is used for heating and sterilizing water in the water supply pipe.
  • a sterilization method characterized in that the number of heterotrophic bacteria in the water is 2000 CFU / mL or less.
  • the number of heterotrophic bacteria at locations away from the water tap of the apparatus can be reduced simply and inexpensively. According to the sterilization apparatus and method of the present invention, it is possible to reduce the use frequency or amount of the chemical for sterilizing water in the water supply pipe, which is excellent in safety.
  • the present invention can be incorporated into an existing dental unit at a low cost and is excellent in practicality.
  • the schematic sectional drawing of the example of a heating apparatus. which shows the water supply piping in a dental unit, and a water sampling location.
  • the photograph which shows the culture result of heterotrophic bacteria and general bacteria in an aerobic and anaerobic environment.
  • Hand Handpiece water.
  • Moisture Moisture water.
  • Hand Handpiece water.
  • Moisture Moisture water.
  • (A) Graph from the water tap (P1) to the inside of the operator table (P6).
  • (B) Graph of handpiece (P7).
  • the left bar graph is data of unit 1
  • the central bar graph is data of unit 2
  • the right bar graph is data of unit 3.
  • the arrows in the graph indicate samples containing the number of bacteria below the target value of heterotrophic bacteria (2000 CFU / mL).
  • the graph which shows the influence with respect to the temperature of handpiece discharged water and the heterotrophic bacteria in this discharged water by the heating of the water in the water supply piping of a general dental unit.
  • # In the graph indicates a sample containing the number of bacteria below the target number of heterotrophic bacteria (2000 CFU / mL).
  • the graph which shows the influence with respect to the temperature of the handpiece discharge water, and the free residual chlorine concentration in this discharge water by the heating of the water in the water supply piping of a general dental unit.
  • the general bacterium refers to an aerobic bacterium, facultative anaerobic bacterium that forms a colony in a medium when cultured on a blood agar medium under conditions of 36 ° C. ⁇ 1 ° C. for 7 days, and A general term for obligate anaerobic bacteria.
  • Heterotrophic bacteria refer to all bacteria that form colonies in the medium when cultured for a long time at a low temperature using a medium containing a low concentration of organic nutrients, specifically 20 ° C using an R2A agar medium. It is a general term for bacteria that form colonies when cultured in 7 days.
  • FIG. 1 is a schematic plan view of a dental unit 1 according to an embodiment.
  • the dental unit 1 includes a patient chair 10, dental lighting (not shown), a spit device 15 connected on one side of the patient chair 10, and an assistant unit 20 connected to the spit device 15 via an arm 22. And a doctor unit 30 connected on the other side of the patient chair 10.
  • the base 2 is disposed below the patient chair 10 and supports the patient chair 10.
  • Various control devices are included in the base 2. Examples of the control device include a hydraulic circuit for moving the patient chair 10 up and down, tilting and standing, and a hydraulic control means for controlling the hydraulic circuit.
  • a foot switch (not shown) is provided on the back side of the patient chair 10 in the base 2, and a practitioner such as a dentist or a dental assistant uses the operation panel (not shown) of the foot switch or the doctor unit 30. It is possible to operate and send a command to the hydraulic control means, and to control the hydraulic circuit so that the patient chair 10 can be lifted and tilted.
  • the patient chair 10 includes a headrest 11, a backrest 12, a seat portion 13, and a legrest 14.
  • the spiton device 15 includes a water supply nozzle 16, a bowl-shaped or bowl-shaped spitton 17 for receiving water after the patient has washed and discharged from the oral cavity, a pipe (not shown) for supplying water to the water supply nozzle 16, and a spiton 17 is provided with a water supply / drainage box 18 that accommodates a pipe (not shown) for discharging water flowing through the discharge hole 17a on the bottom surface of 17.
  • the assistant unit 20 is connected to an assistant table 21 serving as a work table and an assistant table 21, and includes an arm 22 that can rotate the assistant table 21.
  • a base end portion of the arm 22 is pivotally supported by the spitone device 15.
  • Various instruments 23 can be placed on or suspended on the assistant unit 20, and examples of such instruments 23 include handpieces such as a vacuum, a saliva ejector, and a syringe.
  • the doctor unit 30 includes an operator table 31 and an operation panel 32 as a work table.
  • Various instruments 33 can be suspended on the doctor unit 30.
  • an instrument 33 an air turbine, a micromotor, an ultrasonic scaler, which is a handpiece used by a practitioner during the operation, A syringe three way syringe etc. are mentioned.
  • a part of the instrument 33 is connected to an electric circuit, a water circuit, an air circuit, and the like.
  • the operation panel 32 includes switches (not shown) for operating the various instruments 33.
  • the switch for moving the patient chair 10 up and down and tilting up and water for treatment from the instruments 33 are provided. Examples include a switch for supplying water and stopping water supply.
  • the corresponding various instruments 33 can be appropriately operated via a drive circuit and a control circuit (not shown).
  • the dental unit 1 of this embodiment includes a heating device 40 for sterilizing water in the water supply pipe of the dental unit 1.
  • the heating device 40 is attached to the water supply pipe of the dental unit 1 and functions to heat and sterilize the water in the water supply pipe.
  • the warming device 40 can be accommodated in the water supply / drainage box 18 of the spitone device 15 and can be prevented from being visually recognized during a patient's operation.
  • FIG. 2 is a diagram showing the structure of the heating device 40 in more detail.
  • the heating device 40 includes a substantially cylindrical (particularly substantially cylindrical) casing 41 that can store water in the water supply pipe 61, a heater 46 provided in the internal space 42 of the casing 41, and a power source for the heater 46. And a thermo switch 47 for switching on / off.
  • the water supply pipe 61 refers to a portion from the water tap 4 to the internal branch P3 in the water supply pipe 60 (see FIG. 3).
  • the casing 41 includes a side member 43, a terminal member 44 and a base end member 45 connected to both ends of the side member 43.
  • the heater 46 is attached to the distal end member 44, and the thermo switch 47 is attached to the proximal end member 45.
  • the base end member 45 includes holes 45 a and 45 b that are in fluid communication with the water supply pipe 61 of the dental unit 1.
  • One hole 45 a flows into the internal space 42 of the casing 41 from the water supply pipe 61 (that is, a heating device).
  • the other hole 45b acts as an inflow port for water in the upstream water supply pipe), and the other hole 45b flows from the internal space 42 of the casing 41 to the water supply pipe 61 (that is, water in the water supply pipe downstream from the heating device). ). Since the internal space 42 defined by the casing 41 is in fluid communication with the water supply pipe 61, the casing 41 and the internal space 42 also constitute the water supply pipe of the dental unit 1.
  • the thermo switch 47 senses the temperature of the surface of the heating device 40, and when the temperature of the surface of the heating device 40 decreases due to a decrease in the water temperature in the heating device 40 and reaches a certain temperature (first temperature), the thermo switch 47 The switch 47 starts supplying power to the heater 46, and when the temperature of the surface of the heating device 40 rises to a certain temperature (second temperature) due to the rise of the water temperature in the heating device 40, the thermo switch 47 turns on the heater 46. Stop power supply to. Such control by the thermo switch is a well-known technique.
  • the water in the heating device 40 should be heated to 55 ° C or higher. It is preferable to heat to 60 ° C. or higher, more preferably to 65 ° C. or higher. In particular, in order to satisfy the above-mentioned value of the number of heterotrophic bacteria even with water discharged from the instrument 33 including the handpiece having a long distance from the water tap, it is preferable to heat to 55 ° C. or higher. It is more preferable to heat to above, and it is more preferable to heat to 65 ° C. or higher.
  • the temperature of the heated water is preferably 100 ° C. or less, and preferably 90 ° C. or less. More preferably, it is 80 ° C. or less, more preferably 75 ° C. or less.
  • the water in the heating device 40 is preferably heated to a moderate temperature of 55 ° C to 75 ° C, more preferably 60 ° C to 70 ° C. For this reason, for example, it is preferable to set the first temperature to about 60 ° C., the second temperature to about 80 ° C., and preferably the second temperature to about 70 ° C.
  • the heating time of water by the heating device 40 is not particularly limited, but a shorter time is preferable in terms of the speed and cost of later treatment.
  • the heating time of water by the heating device 40 is preferably 5 seconds or more, more preferably 30 seconds or more, still more preferably 1 minute or more, and even more preferably 2 minutes or more.
  • the upper limit of the heating time is, for example, 60 minutes or less.
  • the temperature of the water discharged from the instrument 33 including the handpiece after heating by the heating device 40 is preferably 15 to 42 ° C. so that it can be used as it is for the patient's treatment.
  • a temperature of 35 ° C. is more preferable, and a temperature of 18 to 35 ° C. is even more preferable.
  • the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 70 ° C. for 10 minutes by the heating device is preferably 15 to 42 ° C., and preferably 15 to 35 ° C. Is more preferable, and the temperature is more preferably 18 to 35 ° C.
  • the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 65 ° C. for 10 minutes by the heating device is preferably 15 to 42 ° C., and preferably 15 to 35 ° C. Is preferable, and 18 to 35 ° C. is more preferable.
  • the temperature of water discharged from the instrument during 0 to 2 minutes after heating for 10 minutes at 60 to 70 ° C. by the heating device is preferably 15 to 42 ° C.
  • a temperature of 35 ° C. is more preferable, and a temperature of 18 to 35 ° C. is even more preferable.
  • the temperature of water discharged from the instrument during 0 to 2 minutes after heating for 10 minutes at 60 to 65 ° C. by the heating device is preferably 15 to 42 ° C., It is preferably 35 ° C., more preferably 18 to 35 ° C.
  • the heating device causes the water in the heating device 40 to be heated to a temperature of 55 ° C. to 75 ° C., more preferably 60 ° C. to 70 ° C., more preferably 60 ° C. to 65 ° C. for 30 seconds or more, more preferably 1 minute or more. Even more preferably, heating is performed for 2 minutes or more, and the temperature of water discharged from the instrument after 2 minutes of heating is preferably 15 to 42 ° C, more preferably 15 to 35 ° C, More preferably, the temperature is ⁇ 35 ° C.
  • the water in the heating device 40 is heated to 55 ° C. to 75 ° C., more preferably 60 ° C. to 70 ° C., and even more preferably 60 ° C. to 65 ° C. for 30 seconds or more, more preferably 1 minute or more. Even more preferably, heating is performed for 2 minutes or more, and the temperature of water discharged from the instrument during 0 to 2 minutes after heating is preferably 15 to 42 ° C, and preferably 15 to 35 ° C. More preferably, the temperature is 18 to 35 ° C.
  • the standard value of free residual chlorine concentration in tap water is set at 0.1 mg / L or more.
  • the free residual chlorine concentration of water at each location in the water supply pipe 60 is preferably 0.1 mg / L or more, and in particular, the water is discharged from the instrument 33 including the handpiece having a long distance from the water tap.
  • the water supply pipe 60 of the dental unit 1 of the present embodiment is connected to the water tap 4 and branches through the inside of the water supply / drainage box 18 (see FIG. 1) of the spit device 15.
  • the water supply pipe 60 includes a water supply pipe 61 that is a part from the water tap 4 to the internal branch P3, a water supply pipe 62 that is a part from the internal branch P3 to the water supply nozzle 16, and an arm 22 from the internal branch P3.
  • a water supply pipe 64 extending from the internal branch P3 to the operator table 31 of the doctor unit 30.
  • a practitioner such as a dentist or a dental assistant uses the instrument 23 attached to the water supply pipe 63 of the assistant table 21 and / or the instrument 33 attached to the water supply pipe 64 of the operator table 31 to use the water supply pipe.
  • the treatment is performed using water discharged from the instrument 60 (61, 63, 64) to the instruments 23, 33.
  • the heterotrophic water remaining in the water supply pipe 60 is increased.
  • the number of bacteria increases and the free residual chlorine concentration tends to decrease.
  • the water staying in the water supply pipe 60 may not meet the management target value of the number of heterotrophic bacteria of 2000 CFU / mL or less.
  • tap water standards for free residual chlorine concentrations may not be met.
  • the water in the water supply pipe 60 can be heated to a moderate temperature of 55 ° C. to 75 ° C. by the heating device 40 accommodated in the spittoon device 15.
  • Water quality management target value and liberation of heterotrophic bacteria count in water discharged from dental units such as gargle water discharged through the water supply pipe 62 and handpiece discharge water discharged through the water supply pipes 63 and 64
  • Water that satisfies all water quality standards for residual chlorine concentration can be supplied easily and quickly.
  • it is not always necessary to use a chemical for heating water it is also excellent in terms of safety and cost.
  • the present invention relates to the heating device 40 for heat sterilizing water in the water supply pipe, the dental unit 1 provided with the heating device 40, and the water supply pipe of the dental unit 1 using the heating device 40. Also includes water sterilization methods.
  • the above embodiment has the following effects.
  • the number of heterotrophic bacteria in a location far from the water tap downstream from the heating device 40 can be simply increased by heating the water in the water supply pipe 60 by the heating device 40. Since water that satisfies both the water quality management target value and the water quality standard for free residual chlorine concentration can be supplied, it is easy and quick.
  • the prior art has problems such as the impact on the living body and the cost effectiveness of the residual liquid of the disinfecting liquid added to the water system of the dental unit, but according to the dental unit of this embodiment, the water temperature is reduced. Because it is possible to sterilize heterotrophic bacteria only by raising it moderately, it is a safe, inexpensive and effective approach.
  • the possibility of corrosion of the dental unit equipment due to the use of the disinfectant can be eliminated or reduced. ⁇ Frequent purchase and use of disinfectant is unnecessary. At least the use frequency or amount of the disinfectant can be reduced. -In the dental unit 1 of this embodiment, since the heating apparatus 40 is provided in the position upstream from the internal branch P3, it is only necessary to provide the heating apparatus 40 in one place, and it branches from the internal branch P3. Water that satisfies both the water quality management target value for the number of heterotrophic bacteria and the water quality standard for the free residual chlorine concentration can be efficiently supplied to all locations of the water supply pipe 60.
  • the heating apparatus 40 is provided in the position upstream from the internal branch P3, when the practitioner uses the instruments 23 and 33, the temperature of the heated water Has been cooled to a temperature that does not irritate the patient and can be used as is for the procedure.
  • this embodiment can also install the heating apparatus 40 in the water supply piping of the existing dental unit, it can be incorporated cheaply and safely in all the dental units currently used, versatility, Excellent practicality.
  • the structure of the heating apparatus 40 is not limited to what was shown in FIG. 2, You may use another structure heater which can heat the water in the water supply piping 60 containing a well-known heater. -According to the present invention, the number of heterotrophic bacteria may be suppressed to 2000 CFU / mL or less, and the water quality standard having a free residual chlorine concentration of 0.1 mg / L or more may not necessarily be satisfied.
  • the attachment position of the heating device 40 is not limited to the position of the pipe 61 between the water tap 4 and the internal branch P3, as long as the water quality management target value of heterotrophic bacteria is satisfied, the water supply pipe 60 in the dental unit 1 Can be attached to any location.
  • the heating device 40 may be provided between the water tap 4 and the spittoon device 15, may be provided in the internal branch P3, or may be provided in the assistant unit 20 or the doctor unit 30 or the like downstream from the internal branch P3. It may be provided. Only one installation location is required, and when the practitioner uses the instruments 23 and 33, the temperature of the heated water is cooled to a temperature that does not irritate the patient. 40 is preferably provided in the internal branch P3 or upstream thereof.
  • This invention is not limited to the dental unit 1, It can apply also to arbitrary other apparatuses provided with water supply piping, such as a water supply piping of a household water purifier, and a water supply piping of a water storage tank. As a result, the apparatus of the present invention can be used even in sites, regions, and overseas where water pollution is a concern.
  • each patient's gargle water and handpiece water (25 mL) before and after residual water discharge are divided into 10 mL and 15 mL in sterile polyethylene tubes. did. The previous 10 mL was used for bacterial testing, and the subsequent 15 mL was used for free residual chlorine concentration measurement.
  • heterotrophic bacteria and general bacteria in the residual water sample collected from the handpiece were cultured in an aerobic and anaerobic environment. Aerobic culture was performed in the same manner as the heterotrophic bacteria and general bacteria detection methods described below. Anaerobic culture was performed in a highly anaerobic environment (80% N 2 , 10% CO 2 , 10% H 2 ) using a Thea-type Anaero box (ANB-18-2E, manufactured by Hirasawa).
  • Free residual chlorine concentration is measured by diethylparaphenylenediamine reagent (free residual chlorine measurement reagent DPD plus, Oyalax Co., Ltd., Cat. # OYWT-11-03) and spectrophotometric residual chlorine measuring instrument. (Photometer CL, Oyalux Co., Ltd., Cat. # OYWT-31) was used according to the attached instruction manual. 10 mL of the 15 mL water sample was dispensed into the sample cell, zero calibration was performed, and then one powdered reagent was dissolved. It was set in the cell insertion part of the measuring instrument and measured after standing for about 30 seconds. Zero calibration and sample cell cleaning with ultrapure water were performed for each sample. Pass / fail was judged based on the standard value (0.1 mg / L or more) of the tap water quality standard (Article 17-3 of the Water Supply Law Enforcement Regulations) indicated by the Ministry of Health, Labor and Welfare.
  • the remaining water sample was dispensed in 5 ml each into a 15 ml sterile conical tube.
  • a small dry incubator equipped with an aluminum block (BSR-M002, manufactured by Bio Medical Science), the above 1.
  • BSR-M002 manufactured by Bio Medical Science
  • heating was started.
  • a mercury thermometer is set in the conical tube containing tap water, and when the temperature of this thermometer reaches 30, 35, 40, 45, 50, 55, 60 ° C, it is removed from the conical tube containing each sample.
  • a 300 ⁇ L water sample was quickly collected with a sterilized fin pipette, transferred to a sterilized tube (Assist Tube 72.693.100S, Sarustat Co., Ltd.), and stored on ice until seeding.
  • the casing capacity of the heating device was 180 ml, the heating device voltage was 24 VAC, the power was 52.8 W, the power density was 2.5 W / cm 2 , and the maximum temperature (maximum water temperature at the heater outlet) was about 65 ° C.
  • Results Examination of culture conditions: Culture results of heterotrophic bacteria and general bacteria in aerobic and anaerobic environments As shown in Fig. 4, as a preliminary experiment before the start of a series of experiments, residues collected from handpieces When heterotrophic bacteria and general bacteria in a water sample were cultured in an aerobic and anaerobic environment, colonies of the heterotrophic bacteria were observed only in the aerobic environment and were not detected in the anaerobic environment. In addition, general bacteria were not detected under either condition. Therefore, in the subsequent experiments, the number of heterotrophic bacteria detected in the aerobic culture was the subject of the study.
  • the number of detections is around 2000 CFU / mL
  • the number of detections increases to 150000 CFU / mL at a stretch. Increased.
  • Free residual chlorine concentration in handpiece water of dental unit with drug cleaning function As shown in Fig. 10, as a reference example, in a water sample collected from a dental unit handpiece with drug cleaning function before discharging residual water The free residual chlorine concentration of was less than the standard value of the water supply law. Due to residual water discharge, free residual chlorine concentration tended to increase, but it did not always exceed the standard value. As described above, there was a concern that the concentration of free residual chlorine does not necessarily comply with the Water Supply Law, and that the pipes were continuously corroded by hydrogen peroxide.
  • the number of heterotrophic bacteria detected was almost flat from room temperature to 45 degrees, but it was more than 50 degrees At 55 ° C or higher, the detected amount was less than the target value of 2000 CFU / mL. It has been shown that moderate heating around 50-60 ° C can significantly reduce the number of heterotrophic bacteria in handpiece water.
  • the temperature of the water sample collected from the tip of the handpiece after moderate heating was about 33 ° C. at the maximum. This was thought to be because the pipe in the unit from the heating device to the tip of the handpiece had a distance and was cooled in the flow path.
  • the number of heterotrophic bacteria is greatly reduced in the sample collected 30 seconds after continuing to draw water from the tip of the handpiece, compared with the sample before heating, and the two units clear the target value of 2000 CFU / mL The result was obtained. Thereafter, the decreased state was maintained until 1 minute and 2 minutes later.
  • the residual chlorine concentration in the water remaining in the handpiece was below the water supply standard (0.1 mg / L) before heating, but the residual chlorine concentration in the water remaining in the handpiece increased significantly after moderate heating. In Unit 1, it was 0.3 mg / L or more, greatly exceeding the standard value of the Water Supply Law. During residual water discharge for 2 minutes, the free residual chlorine concentration never fell below the standard value of the Waterworks Law, and all units were always above 0.2 mg / L.

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Dentistry (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Dental Tools And Instruments Or Auxiliary Dental Instruments (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)

Abstract

This apparatus is characterized by being provided with: a water supply pipe; and a heating device which is mounted to the water supply pipe and which is for thermally sterilizing water inside the water supply pipe, wherein the heating device controls the number of heterotrophic bacteria in the water inside the water supply pipe at a portion downstream of the heating device to not more than 2000 CFU/mL.

Description

歯科用ユニットの給水配管内の水を殺菌するための装置及び方法Apparatus and method for sterilizing water in a water supply pipe of a dental unit

 本発明は、歯科用ユニットの給水配管内の水を殺菌するための装置及び方法に関する。 The present invention relates to an apparatus and method for sterilizing water in a water supply pipe of a dental unit.

 昨今、歯を削る機器(エアータービン、マイクロモーター、超音波スケーラー)等の歯科用インスツルメントと患者が着座又は横になって診療を受ける診療台(チェア)とを備えた歯科用ユニットにおいて、内部に滞留する水の微生物汚染が大きな問題として注目されている。この微生物汚染が生じる原因の一つとして、歯科用ユニットの内部に多く利用されている細長い管の内部に水が滞留し易いことや、細菌の集合により形成されるバイオフィルムが付着しやすいことが考えられている。 In recent years, in dental units equipped with dental instruments such as tooth-shaving devices (air turbines, micromotors, ultrasonic scalers) and a medical table (chair) where patients sit or lie down and receive medical care, Microbial contamination of water staying inside attracts attention as a big problem. One of the causes of this microbial contamination is that water tends to stay inside elongated tubes that are often used inside dental units, and that biofilms formed by the collection of bacteria tend to adhere. It is considered.

 この問題を解決する従来技術として、自動的に歯科用ユニット水の残留塩素濃度を補正する中性電解水生成装置(例えば特許文献1参照)が利用されているものの高価であり、細菌現存量をより正確に把握する指標として近年注目されている従属栄養細菌数の減少に効果があるかが不明である。 As a conventional technique for solving this problem, a neutral electrolyzed water generating device (for example, see Patent Document 1) that automatically corrects the residual chlorine concentration of dental unit water is used, but it is expensive, and the bacterial existing amount is reduced. It is unclear whether it is effective in reducing the number of heterotrophic bacteria, which has been attracting attention in recent years as an index for grasping more accurately.

 なお、医療現場で利用される水の従属栄養細菌数を減少させる手段として、例えば熱水消毒後の人工透析液製造装置ラインの温度管理を50℃に設定すること(非特許文献1)や、手術室における手洗い水場の配管内や循環系統を65℃の熱水で処理すること(非特許文献2)が提案されている。また、非特許文献3には、歯科用ユニットから採取し、3.9×104 CFU/mlの従属栄養細菌が検出されたユニット水を80℃に加熱し、熱消毒を行ったところ、1分間で全ての菌が殺菌されたことが記載されている。 In addition, as a means of reducing the number of heterotrophic bacteria in water used in the medical field, for example, setting the temperature control of the artificial dialysate production apparatus line after hot water disinfection to 50 ° C. (Non-patent Document 1) It has been proposed that non-patent literature 2 treats the piping and circulation system of a hand-washing water station in an operating room with hot water of 65 ° C. In Non-patent Document 3, the unit water sampled from a dental unit, in which 3.9 × 10 4 CFU / ml heterotrophic bacteria were detected was heated to 80 ° C. and heat disinfection was performed. It is described that all the bacteria were sterilized.

特開2009-118892JP2009-118892

北海道科学大学研究紀要, 41, 185-191(2016)Bulletin of Hokkaido University of Science, 41, 185-191 (2016) 医学検査, 65(4), 447-452(2016)Medical examination, 65 (4), 447-452 (2016) 科学研究費補助金研究成果報告書 ウイルス肝炎患者および易感染性患者の歯科治療における院内対策に関する研究 平成21年5月8日Grant-in-Aid for Scientific Research Research Report, Research on In-Hospital Measures in Dental Treatment of Viral Hepatitis Patients and Infectious Patients May 8, 2009

 ところで、発明者らは一般歯科用ユニット内の給水配管内に滞留する水(つまり給水配管から排出される水でもある)の従属栄養細菌数に関して、水の滞留箇所(つまり給水配管からの排出箇所でもある)が水道栓から離れるほど増加する傾向にあることを報告している(厚生労働科学研究費補助金 地域医療基盤開発推進研究事業 平成28年度総括研究報告書歯科ユニット給水システム純水化装置の開発に関する研究)。しかしながら、特許文献1ではこの問題を取り扱っていない。 By the way, regarding the number of heterotrophic bacteria in the water staying in the water supply pipe in the general dental unit (that is, the water discharged from the water supply pipe), the inventors have stayed in the water (that is, the discharge place from the water supply pipe). However, there is a tendency to increase as the distance from the water tap increases (Subsidy for Health and Labor Sciences Research Fund, Regional Medical Infrastructure Development Promotion Research Project, 2016 General Research Report Dental Unit Water Supply System Pure Water Purifier Research on the development of). However, Patent Document 1 does not deal with this problem.

 我が国では、歯科用ユニットを初めとする装置の給水配管における水の厳密な水質管理目標設定値は無いが、歯科用ユニット内部を通って供給される水の汚染への対応は喫緊の課題である。歯科用ユニットにおける水道栓から離れた箇所でも厳密な水質管理目標設定値を満たす水を供給できれば、科学的な根拠をもって微生物学的に安全な水質の水を歯科医療に提供することができるため、安全衛生管理上有益である。 In Japan, there is no strict water quality management target setting value in the water supply piping of devices such as dental units, but it is an urgent issue to deal with contamination of water supplied through the interior of the dental unit. . If we can supply water that satisfies the strict water quality management target setting value even at a location away from the water tap in the dental unit, we can provide microbiologically safe water with a scientific basis to dental care. Useful for health and safety management.

 本発明の課題は、装置の水道栓から離れた箇所でも、従属栄養細菌数が減少された水を簡便かつ安価に供給できる給水配管内の水を殺菌するための装置及び方法を提供することにある。 The subject of this invention is providing the apparatus and method for disinfecting the water in the water supply piping which can supply the water in which the number of heterotrophic bacteria decreased easily and cheaply also in the location away from the water tap of the apparatus. is there.

 本発明者らは、歯科用ユニットの給水配管にヒーターを取り付け、該ヒータにより55~75℃程度の中等度の温度に加熱した給水を用いることで、歯科用ユニットにおける水道栓からの距離が離れた箇所でも水の微生物汚染の原因となる従属栄養細菌の増殖を抑制できることに成功し、本発明を完成するに至った。 The present inventors attach a heater to the water supply pipe of the dental unit, and use a water supply heated to a moderate temperature of about 55 to 75 ° C. by the heater so that the distance from the water tap in the dental unit is increased. The present invention has been completed by succeeding in suppressing the growth of heterotrophic bacteria that cause microbial contamination of water at the locations.

 すなわち本発明は、以下の項に記載の主題を包含する。
項1.給水配管と、前記給水配管に取り付けられた、給水配管内の水を殺菌するための加温装置とを備え、前記加温装置は、前記加温装置より下流の給水配管内の水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする装置。
項2.前記加温装置は前記給水配管内の水を収容可能なケーシングと、前記ケーシング内に設けられたヒータとを備え、前記ケーシング内の水を50℃以上に加熱することを特徴とする項1に記載の装置。
項3.前記加温装置より下流の給水配管内の水の遊離残留塩素濃度を0.1 mg/L以上にすることを特徴とする項1に記載の装置。
項4.前記装置は、アシスタントユニットとドクターユニットとを備えた歯科用ユニットであり、前記給水配管はアシスタントユニットに至る給水配管と、ドクターユニットに至る給水配管とに分岐しており、前記加温装置は該分岐部又はその上流に設けられている項1~3のいずれかに記載の装置。
項5.前記ドクターユニットは前記給水配管と流体連通するインスツルメントを備え、前記インスツルメントから排出される水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする項4に記載の装置。
項6.前記加熱装置による60~70℃での10分間の加熱の2分後に前記インスツルメントから排出される水の温度が15~35℃である項5のいずれかに記載の装置。
項7.装置の給水配管内の水の殺菌方法であって、前記給水配管に取り付けられた、前記給水配管内の水を加熱殺菌するための加温装置を用いて、前記加温装置より下流の給水配管内の水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする殺菌方法。
That is, the present invention encompasses the subject matters described in the following sections.
Item 1. A water supply pipe, and a heating device attached to the water supply pipe for sterilizing water in the water supply pipe, wherein the heating device is heterotrophic of water in the water supply pipe downstream from the heating device. An apparatus characterized in that the number of bacteria is 2000 CFU / mL or less.
Item 2. Item 1. The heating apparatus includes a casing capable of storing water in the water supply pipe and a heater provided in the casing, and heats the water in the casing to 50 ° C or higher. The device described.
Item 3. Item 2. The apparatus according to Item 1, wherein the concentration of free residual chlorine in the water supply pipe downstream from the heating device is 0.1 mg / L or more.
Item 4. The apparatus is a dental unit including an assistant unit and a doctor unit, and the water supply pipe is branched into a water supply pipe leading to the assistant unit and a water supply pipe leading to the doctor unit. Item 4. The device according to any one of Items 1 to 3, which is provided at the branching part or upstream thereof.
Item 5. The apparatus according to claim 4, wherein the doctor unit includes an instrument that is in fluid communication with the water supply pipe, and the number of heterotrophic bacteria in the water discharged from the instrument is 2000 CFU / mL or less. .
Item 6. Item 6. The apparatus according to Item 5, wherein the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 70 ° C for 10 minutes by the heating device is 15 to 35 ° C.
Item 7. A method for sterilizing water in a water supply pipe of an apparatus, wherein the water supply pipe is attached to the water supply pipe and is used for heating and sterilizing water in the water supply pipe. A sterilization method characterized in that the number of heterotrophic bacteria in the water is 2000 CFU / mL or less.

 本発明の殺菌装置及び方法によれば、装置の水道栓から離れた箇所の従属栄養細菌数を簡便かつ安価に減少させることができる。本発明の殺菌装置及び方法によれば、給水配管内の水の殺菌のための薬剤の使用頻度又は量を低減させることもでき、安全性に優れている。本発明は、既存の歯科用ユニットに安価かつ安全に組み込むことができ、実用性に優れている。 According to the sterilization apparatus and method of the present invention, the number of heterotrophic bacteria at locations away from the water tap of the apparatus can be reduced simply and inexpensively. According to the sterilization apparatus and method of the present invention, it is possible to reduce the use frequency or amount of the chemical for sterilizing water in the water supply pipe, which is excellent in safety. The present invention can be incorporated into an existing dental unit at a low cost and is excellent in practicality.

歯科用ユニットの例の略平面図。The schematic plan view of the example of a dental unit. 加温装置の例の略断面図。The schematic sectional drawing of the example of a heating apparatus. 歯科用ユニット内の給水配管と、採水箇所を示す説明図。Explanatory drawing which shows the water supply piping in a dental unit, and a water sampling location. 好気及び嫌気環境下での従属栄養細菌及び一般細菌の培養結果を示す写真。The photograph which shows the culture result of heterotrophic bacteria and general bacteria in an aerobic and anaerobic environment. 残留水排出による一般歯科用ユニット中の従属栄養細菌の変化を示すグラフ。ハンド:ハンドピース水。含漱:含漱用水。The graph which shows the change of the heterotrophic bacteria in the general dental unit by residual water discharge | emission. Hand: Handpiece water. Moisture: Moisture water. 残留水排出による一般歯科用ユニット中の遊離残留塩素濃度の変化を示すグラフ。ハンド:ハンドピース水。含漱:含漱用水。The graph which shows the change of the free residual chlorine concentration in the general dental unit by residual water discharge. Hand: Handpiece water. Moisture: Moisture water. 一般歯科用ユニット配管各箇所における従属栄養細菌数(CFU/mL)を示すグラフ。(A)水道栓(P1)から術者テーブル内部(P6)までのグラフ。(B)ハンドピース(P7)のグラフ。The graph which shows the number of heterotrophic bacteria (CFU / mL) in each general dental unit piping location. (A) Graph from the water tap (P1) to the inside of the operator table (P6). (B) Graph of handpiece (P7). 一般歯科用ユニット配管各箇所における遊離残留塩素濃度(mg/L)を示すグラフ。The graph which shows the free residual chlorine concentration (mg / L) in each part of general dental unit piping. 薬物洗浄機能付き歯科用ユニットのハンドピース排水中の従属栄養細菌数(CFU/mL)を示すグラフ。The graph which shows the heterotrophic bacteria count (CFU / mL) in the handpiece drainage of the dental unit with a drug washing function. 薬物洗浄機能付き歯科用ユニットのハンドピース排出水中の遊離残留塩素濃度(mg/L)を示すグラフ。The graph which shows the free residual chlorine concentration (mg / L) in the handpiece discharge water of a dental unit with a drug cleaning function. 一般歯科用ユニットの給水配管内の水の加熱による、ハンドピース排出水に存在する従属栄養細菌に対する影響を示すグラフ。各加温温度において、左側の棒グラフはユニット1、中央の棒グラフはユニット2、右側の棒グラフはユニット3のデータである。グラフ中の矢印は従属栄養細菌数の目標値(2000 CFU/mL)以下の細菌数を含む試料を示す。The graph which shows the influence with respect to the heterotrophic bacteria which exist in the handpiece discharge water by the heating of the water in the water supply piping of a general dental unit. At each heating temperature, the left bar graph is data of unit 1, the central bar graph is data of unit 2, and the right bar graph is data of unit 3. The arrows in the graph indicate samples containing the number of bacteria below the target value of heterotrophic bacteria (2000 CFU / mL). 一般歯科用ユニットの給水配管内の水の加熱による、ハンドピース排出水の温度と該排出水中の従属栄養細菌とに対する影響を示すグラフ。グラフ中の#は従属栄養細菌数の目標値(2000 CFU/mL)以下の細菌数を含む試料を示す。The graph which shows the influence with respect to the temperature of handpiece discharged water and the heterotrophic bacteria in this discharged water by the heating of the water in the water supply piping of a general dental unit. # In the graph indicates a sample containing the number of bacteria below the target number of heterotrophic bacteria (2000 CFU / mL). 一般歯科用ユニットの給水配管内の水の加熱による、ハンドピース排出水の温度と該排出水中の遊離残留塩素濃度とに対する影響を示すグラフ。The graph which shows the influence with respect to the temperature of the handpiece discharge water, and the free residual chlorine concentration in this discharge water by the heating of the water in the water supply piping of a general dental unit.

 以下、本発明の実施の形態を図面を参照して説明する。 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

 本明細書において、一般細菌とは、血液寒天培地を用いて、36℃±1℃、7日間という条件下で培養したときに培地に集落を形成する好気性細菌、通性嫌気性細菌、及び偏性嫌気性菌の総称である。 In the present specification, the general bacterium refers to an aerobic bacterium, facultative anaerobic bacterium that forms a colony in a medium when cultured on a blood agar medium under conditions of 36 ° C. ± 1 ° C. for 7 days, and A general term for obligate anaerobic bacteria.

 従属栄養細菌とは、低濃度の有機栄養物を含む培地を用いて低温で長時間培養したときに培地に集落を形成するすべての菌を指し、具体的にはR2A寒天培地を用いて20℃で7日間培養したときに集落を形成する細菌の総称である。 Heterotrophic bacteria refer to all bacteria that form colonies in the medium when cultured for a long time at a low temperature using a medium containing a low concentration of organic nutrients, specifically 20 ° C using an R2A agar medium. It is a general term for bacteria that form colonies when cultured in 7 days.

 図1は、一実施形態に係る歯科用ユニット1の略平面図である。 FIG. 1 is a schematic plan view of a dental unit 1 according to an embodiment.

 歯科用ユニット1は、患者用椅子10、歯科用照明(非図示)、患者用椅子10の一方の側面で接続されたスピットン装置15、アーム22を介してスピットン装置15に接続されたアシスタントユニット20、及び患者用椅子10の他方の側面で接続されたドクターユニット30を備えている。 The dental unit 1 includes a patient chair 10, dental lighting (not shown), a spit device 15 connected on one side of the patient chair 10, and an assistant unit 20 connected to the spit device 15 via an arm 22. And a doctor unit 30 connected on the other side of the patient chair 10.

 患者用椅子10の下方には基台2が配置されており、該患者用椅子10を支持する。基台2内には、各種制御機器が内包されている。該制御機器としては、例えば、患者用椅子10の昇降、傾倒起立等させるための油圧回路、及び該油圧回路を制御する油圧制御手段等が挙げられる。基台2における患者用椅子10の背面側にはフットスイッチ(非図示)が設けられており、歯科医、歯科助手等の施術者はこのフットスイッチ又はドクターユニット30の操作パネル(非図示)を操作して油圧制御手段に対して指令を送り、油圧回路を制御して患者用椅子10の昇降、傾倒起立等させることが可能である。 The base 2 is disposed below the patient chair 10 and supports the patient chair 10. Various control devices are included in the base 2. Examples of the control device include a hydraulic circuit for moving the patient chair 10 up and down, tilting and standing, and a hydraulic control means for controlling the hydraulic circuit. A foot switch (not shown) is provided on the back side of the patient chair 10 in the base 2, and a practitioner such as a dentist or a dental assistant uses the operation panel (not shown) of the foot switch or the doctor unit 30. It is possible to operate and send a command to the hydraulic control means, and to control the hydraulic circuit so that the patient chair 10 can be lifted and tilted.

 患者用椅子10は、ヘッドレスト11、背もたれ12、座部13、及びレッグレスト14を備えている。 The patient chair 10 includes a headrest 11, a backrest 12, a seat portion 13, and a legrest 14.

 スピットン装置15は、給水ノズル16、患者が口腔内を洗浄して吐き出した後の水を受けるためのボウル形又は鉢状のスピットン17、給水ノズル16へ水を供給する配管(非図示)及びスピットン17の底面の排出孔17aを通って流れる水を排出する配管(非図示)を収容する給排水ボックス18を備えている。 The spiton device 15 includes a water supply nozzle 16, a bowl-shaped or bowl-shaped spitton 17 for receiving water after the patient has washed and discharged from the oral cavity, a pipe (not shown) for supplying water to the water supply nozzle 16, and a spiton 17 is provided with a water supply / drainage box 18 that accommodates a pipe (not shown) for discharging water flowing through the discharge hole 17a on the bottom surface of 17.

 アシスタントユニット20は、作業台としての補佐テーブル21、補佐テーブル21と連結され、補佐テーブル21を回動可能なアーム22を備え、アーム22の基端部はスピットン装置15に軸支されている。 The assistant unit 20 is connected to an assistant table 21 serving as a work table and an assistant table 21, and includes an arm 22 that can rotate the assistant table 21. A base end portion of the arm 22 is pivotally supported by the spitone device 15.

 アシスタントユニット20には各種インスツルメント23を載置又は懸架することができ、そのようなインスツルメント23としては、例えばバキューム、排唾管、シリンジ等のハンドピースを挙げることができる。 Various instruments 23 can be placed on or suspended on the assistant unit 20, and examples of such instruments 23 include handpieces such as a vacuum, a saliva ejector, and a syringe.

 ドクターユニット30は、作業台としての術者テーブル31及び操作パネル32を備えている。ドクターユニット30には各種インスツルメント33を懸架することができ、そのようなインスツルメント33としては施術者が施術の際に使用するハンドピースである、エアータービン、マイクロモーター、超音波スケーラー、シリンジスリーウェイシリンジ等が挙げられる。インスツルメント33の一部は電気回路、水回路、エア回路等と連結されている。操作パネル32は、各種インスツルメント33を動作させるためのスイッチ(非図示)を備えており、例えば、患者用椅子10を上下動、傾倒起立させるスイッチ、インスツルメント33から施術用の水を給水し、給水を停止するスイッチ等が挙げられる。施術者が各種スイッチを操作することにより、非図示の駆動回路及び制御回路を介して、対応する各種インスツルメント33を適宜動作させることが可能である。 The doctor unit 30 includes an operator table 31 and an operation panel 32 as a work table. Various instruments 33 can be suspended on the doctor unit 30. As such an instrument 33, an air turbine, a micromotor, an ultrasonic scaler, which is a handpiece used by a practitioner during the operation, A syringe three way syringe etc. are mentioned. A part of the instrument 33 is connected to an electric circuit, a water circuit, an air circuit, and the like. The operation panel 32 includes switches (not shown) for operating the various instruments 33. For example, the switch for moving the patient chair 10 up and down and tilting up and water for treatment from the instruments 33 are provided. Examples include a switch for supplying water and stopping water supply. When the practitioner operates various switches, the corresponding various instruments 33 can be appropriately operated via a drive circuit and a control circuit (not shown).

 図1に示すように、本実施形態の歯科用ユニット1は、歯科用ユニット1の給水配管内の水を殺菌するための加温装置40を備えている。加温装置40は歯科用ユニット1の給水配管に取り付けられ、給水配管内の水を加熱殺菌するよう機能する。加温装置40はスピットン装置15の給排水ボックス18内に収容可能であり、患者の施術時には視認されないようにすることができる。 As shown in FIG. 1, the dental unit 1 of this embodiment includes a heating device 40 for sterilizing water in the water supply pipe of the dental unit 1. The heating device 40 is attached to the water supply pipe of the dental unit 1 and functions to heat and sterilize the water in the water supply pipe. The warming device 40 can be accommodated in the water supply / drainage box 18 of the spitone device 15 and can be prevented from being visually recognized during a patient's operation.

 図2は加温装置40の構造をより詳細に示した図である。加温装置40は、給水配管61内の水を収容可能な略筒形(特には略円筒形)のケーシング41と、ケーシング41の内部空間42に設けられたヒータ46と、ヒータ46の電源の入/切を切り替えるサーモスイッチ47とを備えている。給水配管61は給水配管60(図3参照)のうち、水道栓4から内部分岐P3までの部分を指す。ケーシング41は側方部材43と、側方部材43の両端に接続された末端部材44及び基端部材45からなる。ヒータ46は末端部材44に取り付けられ、サーモスイッチ47は基端部材45に取り付けられている。基端部材45は歯科用ユニット1の給水配管61と流体連通する孔45a,45bを備え、一方の孔45aが給水配管61からケーシング41の内部空間42内へ流入される水(すなわち加温装置より上流の給水配管内の水)の流入口として作用し、もう一方の孔45bはケーシング41の内部空間42から給水配管61へ流出される水(すなわち加温装置より下流の給水配管内の水)の流出口として作用する。ケーシング41により区画形成された内部空間42は給水配管61と流体連通しているため、ケーシング41及び内部空間42も歯科用ユニット1の給水配管を構成する。 FIG. 2 is a diagram showing the structure of the heating device 40 in more detail. The heating device 40 includes a substantially cylindrical (particularly substantially cylindrical) casing 41 that can store water in the water supply pipe 61, a heater 46 provided in the internal space 42 of the casing 41, and a power source for the heater 46. And a thermo switch 47 for switching on / off. The water supply pipe 61 refers to a portion from the water tap 4 to the internal branch P3 in the water supply pipe 60 (see FIG. 3). The casing 41 includes a side member 43, a terminal member 44 and a base end member 45 connected to both ends of the side member 43. The heater 46 is attached to the distal end member 44, and the thermo switch 47 is attached to the proximal end member 45. The base end member 45 includes holes 45 a and 45 b that are in fluid communication with the water supply pipe 61 of the dental unit 1. One hole 45 a flows into the internal space 42 of the casing 41 from the water supply pipe 61 (that is, a heating device). The other hole 45b acts as an inflow port for water in the upstream water supply pipe), and the other hole 45b flows from the internal space 42 of the casing 41 to the water supply pipe 61 (that is, water in the water supply pipe downstream from the heating device). ). Since the internal space 42 defined by the casing 41 is in fluid communication with the water supply pipe 61, the casing 41 and the internal space 42 also constitute the water supply pipe of the dental unit 1.

 サーモスイッチ47は加温装置40の表面の温度を感知し、加温装置40内の水温の低下により加温装置40の表面の温度が下がり、ある一定温度(第1温度)に達すると、サーモスイッチ47はヒータ46への電源供給を開始し、加温装置40内の水温の上昇により加温装置40の表面の温度が上がりある温度(第2温度)に達すると、サーモスイッチ47はヒータ46への電源供給を停止する。このようなサーモスイッチによる制御は周知技術である。 The thermo switch 47 senses the temperature of the surface of the heating device 40, and when the temperature of the surface of the heating device 40 decreases due to a decrease in the water temperature in the heating device 40 and reaches a certain temperature (first temperature), the thermo switch 47 The switch 47 starts supplying power to the heater 46, and when the temperature of the surface of the heating device 40 rises to a certain temperature (second temperature) due to the rise of the water temperature in the heating device 40, the thermo switch 47 turns on the heater 46. Stop power supply to. Such control by the thermo switch is a well-known technique.

 厚生労働省が示す水質基準に関する省令の一部改正で水質管理目標設定項目として追加された健水発第1115002号の目標値として「1mlの検水で、R2A寒天培地法にて20±1℃で7日間培養した後に形成される集落数として2000 CFU/mL以下」が定められている。 As a target value of 1115002 from Kensui, which was added as a water quality management target setting item in the partial amendment of the ministerial ordinance on the water quality standards set forth by the Ministry of Health, Labor and Welfare The number of settlements formed after 7 days of culture is defined as 2000 CFU / mL or less.

 加温装置40より下流の給水配管60内の各箇所における水の従属栄養細菌数が2000 CFU/mL以下という基準を満たすためには、加温装置40内の水を55℃以上に加熱することが好ましく、60℃以上に加熱することが好ましく、65℃以上に加熱することがさらに好ましい。特に、水道栓からの距離が長い、ハンドピースを初めとするインスツルメント33から排出される水でも従属栄養細菌数の上記値を満たすために、55℃以上に加熱することが好ましく、60℃以上に加熱することがより好ましく、65℃以上に加熱することがさらに好ましい。また、加熱された水の温度が高すぎると、歯科用ユニット1の部品への負担及び施術者への使用に適さないことから、100℃以下であることが好ましく、90℃以下であることがより好ましく、80℃以下であることがさらに好ましく、75℃以下であることが特に好ましい。加温装置40内の水を55℃~75℃の中等度の温度に加熱することが好ましく、60℃~70℃に加熱することがより好ましい。このため、例えば、上記第1温度を約60℃前後、上記第2温度を約80℃、好ましくは上記第2温度を約70℃に設定することが好ましい。 In order to satisfy the standard that the number of heterotrophic bacteria in water at each location in the water supply pipe 60 downstream from the heating device 40 is 2000 CFU / mL or less, the water in the heating device 40 should be heated to 55 ° C or higher. It is preferable to heat to 60 ° C. or higher, more preferably to 65 ° C. or higher. In particular, in order to satisfy the above-mentioned value of the number of heterotrophic bacteria even with water discharged from the instrument 33 including the handpiece having a long distance from the water tap, it is preferable to heat to 55 ° C. or higher. It is more preferable to heat to above, and it is more preferable to heat to 65 ° C. or higher. In addition, if the temperature of the heated water is too high, it is not suitable for the burden on the parts of the dental unit 1 and the use for the practitioner. Therefore, the temperature is preferably 100 ° C. or less, and preferably 90 ° C. or less. More preferably, it is 80 ° C. or less, more preferably 75 ° C. or less. The water in the heating device 40 is preferably heated to a moderate temperature of 55 ° C to 75 ° C, more preferably 60 ° C to 70 ° C. For this reason, for example, it is preferable to set the first temperature to about 60 ° C., the second temperature to about 80 ° C., and preferably the second temperature to about 70 ° C.

 加温装置40による水の加熱時間は特に限定されないが、短時間の方が後の施術の迅速さ及びコストの点で好ましい。加温装置40による水の加熱時間は、好ましくは5秒以上、より好ましくは30秒以上、さらに好ましくは1分以上、さらにより好ましくは2分以上である。加熱時間の上限は例えば60分以下とする。 The heating time of water by the heating device 40 is not particularly limited, but a shorter time is preferable in terms of the speed and cost of later treatment. The heating time of water by the heating device 40 is preferably 5 seconds or more, more preferably 30 seconds or more, still more preferably 1 minute or more, and even more preferably 2 minutes or more. The upper limit of the heating time is, for example, 60 minutes or less.

 また、加温装置40による加熱後に、ハンドピースを初めとするインスツルメント33から排出される水の温度は、そのまま患者の施術に使用できるよう、15~42℃であることが好ましく、15~35℃であることがより好ましく、18~35℃であることがさらに好ましい。 The temperature of the water discharged from the instrument 33 including the handpiece after heating by the heating device 40 is preferably 15 to 42 ° C. so that it can be used as it is for the patient's treatment. A temperature of 35 ° C. is more preferable, and a temperature of 18 to 35 ° C. is even more preferable.

 さらに、前記加熱装置による60~70℃での10分間の加熱の2分後に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることがより好ましく、18~35℃であることがさらに好ましい。特に、前記加熱装置による60~65℃での10分間の加熱の2分後に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることが好ましく、18~35℃であることがより好ましい。 Further, the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 70 ° C. for 10 minutes by the heating device is preferably 15 to 42 ° C., and preferably 15 to 35 ° C. Is more preferable, and the temperature is more preferably 18 to 35 ° C. In particular, the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 65 ° C. for 10 minutes by the heating device is preferably 15 to 42 ° C., and preferably 15 to 35 ° C. Is preferable, and 18 to 35 ° C. is more preferable.

 さらに、前記加熱装置による60~70℃での10分間の加熱後の0~2分間の間に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることがより好ましく、18~35℃であることがさらに好ましい。特に、前記加熱装置による60~65℃での10分間の加熱後の0~2分間の間に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることが好ましく、18~35℃であることがより好ましい。 Further, the temperature of water discharged from the instrument during 0 to 2 minutes after heating for 10 minutes at 60 to 70 ° C. by the heating device is preferably 15 to 42 ° C., A temperature of 35 ° C. is more preferable, and a temperature of 18 to 35 ° C. is even more preferable. In particular, the temperature of water discharged from the instrument during 0 to 2 minutes after heating for 10 minutes at 60 to 65 ° C. by the heating device is preferably 15 to 42 ° C., It is preferably 35 ° C., more preferably 18 to 35 ° C.

 また、前記加熱装置により、加温装置40内の水を55℃~75℃、より好ましくは60℃~70℃、さらに好ましくは60~65℃の温度に30秒以上、より好ましくは1分以上、さらにより好ましくは2分以上加熱し、加熱2分後に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることがより好ましく、18~35℃であることがさらに好ましい。 Further, the heating device causes the water in the heating device 40 to be heated to a temperature of 55 ° C. to 75 ° C., more preferably 60 ° C. to 70 ° C., more preferably 60 ° C. to 65 ° C. for 30 seconds or more, more preferably 1 minute or more. Even more preferably, heating is performed for 2 minutes or more, and the temperature of water discharged from the instrument after 2 minutes of heating is preferably 15 to 42 ° C, more preferably 15 to 35 ° C, More preferably, the temperature is ˜35 ° C.

 さらに、前記加熱装置により、加温装置40内の水を55℃~75℃、より好ましくは60℃~70℃、さらに好ましくは60~65℃の温度に30秒以上、より好ましくは1分以上、さらにより好ましくは2分以上加熱し、加熱後の0~2分間の間に前記インスツルメントから排出される水の温度が、15~42℃であることが好ましく、15~35℃であることがより好ましく、18~35℃であることがさらに好ましい。 Furthermore, the water in the heating device 40 is heated to 55 ° C. to 75 ° C., more preferably 60 ° C. to 70 ° C., and even more preferably 60 ° C. to 65 ° C. for 30 seconds or more, more preferably 1 minute or more. Even more preferably, heating is performed for 2 minutes or more, and the temperature of water discharged from the instrument during 0 to 2 minutes after heating is preferably 15 to 42 ° C, and preferably 15 to 35 ° C. More preferably, the temperature is 18 to 35 ° C.

 厚生労働省が示す水道水質基準(水道法施行規則第17条3号)によれば、水道水の遊離残留塩素濃度の基準値が0.1 mg/L以上と定められている。 According to the tap water quality standard (Article 17-3 of the Water Supply Law Enforcement Regulations) indicated by the Ministry of Health, Labor and Welfare, the standard value of free residual chlorine concentration in tap water is set at 0.1 mg / L or more.

 給水配管60内の各箇所における水の遊離残留塩素濃度は0.1 mg/L以上であることが好ましく、特に、水道栓からの距離が長い、ハンドピースを初めとするインスツルメント33から排出される水でも遊離残留塩素濃度の上記値を満たすために、加温装置40内の水を45℃以上に加熱することが好ましく、好ましい加熱温度及び加熱時間は、従属栄養細菌数の基準を満たすために上述した通りである。 The free residual chlorine concentration of water at each location in the water supply pipe 60 is preferably 0.1 mg / L or more, and in particular, the water is discharged from the instrument 33 including the handpiece having a long distance from the water tap. In order to satisfy the above value of the free residual chlorine concentration even with water, it is preferable to heat the water in the heating device 40 to 45 ° C. or higher, and the preferred heating temperature and heating time are to satisfy the criteria for the number of heterotrophic bacteria. As described above.

 次に、歯科用ユニット1の給水配管60について説明する。 Next, the water supply pipe 60 of the dental unit 1 will be described.

 図3に示すように、本実施形態の歯科用ユニット1の給水配管60は水道栓4に接続されており、スピットン装置15の給排水ボックス18(図1参照)の内部を通り、分岐する。本実施形態では、給水配管60は、水道栓4から内部分岐P3までの部分である給水配管61と、内部分岐P3から給水ノズル16までの部分である給水配管62と、内部分岐P3からアーム22を介して補佐テーブル21に至る給水配管63と、内部分岐P3からドクターユニット30の術者テーブル31に至る給水配管64とを備えている。歯科医、歯科助手等の施術者は、補佐テーブル21の給水配管63に取り付けたインスツルメント23、及び/又は術者テーブル31の給水配管64に取り付けたインスツルメント33を用いて、給水配管60(61,63,64)からインスツルメント23,33へ排出される水を用いて施術を行う。 As shown in FIG. 3, the water supply pipe 60 of the dental unit 1 of the present embodiment is connected to the water tap 4 and branches through the inside of the water supply / drainage box 18 (see FIG. 1) of the spit device 15. In the present embodiment, the water supply pipe 60 includes a water supply pipe 61 that is a part from the water tap 4 to the internal branch P3, a water supply pipe 62 that is a part from the internal branch P3 to the water supply nozzle 16, and an arm 22 from the internal branch P3. And a water supply pipe 64 extending from the internal branch P3 to the operator table 31 of the doctor unit 30. A practitioner such as a dentist or a dental assistant uses the instrument 23 attached to the water supply pipe 63 of the assistant table 21 and / or the instrument 33 attached to the water supply pipe 64 of the operator table 31 to use the water supply pipe. The treatment is performed using water discharged from the instrument 60 (61, 63, 64) to the instruments 23, 33.

 後述するように、給水配管60において水道栓からの距離が離れるほど(採水箇所P1、P2、P3、P4、P5、P6、P7の順に遠い)、給水配管60内に滞留する水の従属栄養細菌数は増加し、遊離残留塩素濃度は低下する傾向がある。このため、特に、水道栓からの距離が離れるほど、給水配管60内に滞留する水は2000 CFU/mL以下の従属栄養細菌数の管理目標値に適合しない場合がある。また、0.1 mg/L以上の遊離残留塩素濃度の水道水基準も満たさない場合もある。特に、スピットン装置15から排出される含嗽水や、水道栓から最も遠いドクターユニット30のインスツルメント33(図ではハンドピースとして例示)から排出される水では、従属栄養細菌数と遊離残留塩素濃度の上記の目標値および基準値をいずれも満たさない場合がある。 As will be described later, as the distance from the water tap increases in the water supply pipe 60 (in the order of the water sampling points P1, P2, P3, P4, P5, P6, and P7), the heterotrophic water remaining in the water supply pipe 60 is increased. The number of bacteria increases and the free residual chlorine concentration tends to decrease. For this reason, in particular, as the distance from the water tap increases, the water staying in the water supply pipe 60 may not meet the management target value of the number of heterotrophic bacteria of 2000 CFU / mL or less. In addition, tap water standards for free residual chlorine concentrations of 0.1 mg / L or more may not be met. In particular, in the case of gargle water discharged from the Spitton device 15 or water discharged from the instrument 33 of the doctor unit 30 farthest from the water tap (illustrated as a handpiece in the figure), the number of heterotrophic bacteria and free residual chlorine concentration In some cases, neither the above target value nor the reference value is satisfied.

 本実施形態の歯科用ユニット1によれば、スピットン装置15内に収容された加温装置40により給水配管60内の水を55℃~75℃の中等度の温度に加熱することができるため、給水配管62を経て排出される含嗽水や、給水配管63,64を経て排出されるハンドピース排出水を初めとする歯科用ユニットから排出される水における従属栄養細菌数の水質管理目標値及び遊離残留塩素濃度の水質基準をいずれも満たす水を簡便かつ迅速に供給することができる。また、水の加熱に必ずしも薬剤を用いなくても済むため、安全性及び費用の点でも優れている。 According to the dental unit 1 of the present embodiment, the water in the water supply pipe 60 can be heated to a moderate temperature of 55 ° C. to 75 ° C. by the heating device 40 accommodated in the spittoon device 15. Water quality management target value and liberation of heterotrophic bacteria count in water discharged from dental units such as gargle water discharged through the water supply pipe 62 and handpiece discharge water discharged through the water supply pipes 63 and 64 Water that satisfies all water quality standards for residual chlorine concentration can be supplied easily and quickly. Moreover, since it is not always necessary to use a chemical for heating water, it is also excellent in terms of safety and cost.

 本発明は、給水配管内の水を加熱殺菌するための上記加温装置40、加温装置40を備えた歯科用ユニット1、及び加温装置40を用いた歯科用ユニット1の給水配管内の水の殺菌方法も包含する。 The present invention relates to the heating device 40 for heat sterilizing water in the water supply pipe, the dental unit 1 provided with the heating device 40, and the water supply pipe of the dental unit 1 using the heating device 40. Also includes water sterilization methods.

 上記実施形態は以下の効果を有する。
・本実施形態の歯科用ユニット1によれば、加温装置40により給水配管60内の水を加熱するだけで、加温装置40よりも下流の、水道栓から離れた箇所に従属栄養細菌数の水質管理目標値及び遊離残留塩素濃度の水質基準をいずれも満たす水を供給できるため、簡便性かつ迅速性に優れている。
・従来技術は、歯科用ユニットの水路系に添加する消毒液の残留液が及ぼす生体への影響や、費用対効果などが課題であるところ、本実施形態の歯科用ユニットによれば、水温を中等度に上げるだけで従属栄養細菌が殺菌できるため、安全性は高く、安価で効果的なアプローチである。また、消毒液使用による歯科用ユニットの機器の腐食の可能性も排除又は低減することができる。
・消毒液の頻繁な購入、使用が不要となる。少なくとも消毒液の使用頻度又は使用量を低減させることができる。
・本実施形態の歯科用ユニット1では、加温装置40を内部分岐P3よりも上流の位置に設けているため、加温装置40を一か所に設けるだけで済み、内部分岐P3から分岐する給水配管60のすべての箇所に効率的に従属栄養細菌数の水質管理目標値及び遊離残留塩素濃度の水質基準をいずれも満たす水を供給することができる。
・本実施形態の歯科用ユニット1では、加温装置40を内部分岐P3よりも上流の位置に設けているため、施術者がインスツルメント23,33を使用する時には加温された水の温度は患者に刺激を与えない程度の温度に冷めており、施術にそのまま使用することができる。
・本実施形態は、既存の歯科用ユニットの給水配管に加温装置40を設置することもできるため、現在使用されているすべての歯科用ユニットに安価かつ安全に組み込むことができ、汎用性、実用性に優れている。
The above embodiment has the following effects.
-According to the dental unit 1 of the present embodiment, the number of heterotrophic bacteria in a location far from the water tap downstream from the heating device 40 can be simply increased by heating the water in the water supply pipe 60 by the heating device 40. Since water that satisfies both the water quality management target value and the water quality standard for free residual chlorine concentration can be supplied, it is easy and quick.
-The prior art has problems such as the impact on the living body and the cost effectiveness of the residual liquid of the disinfecting liquid added to the water system of the dental unit, but according to the dental unit of this embodiment, the water temperature is reduced. Because it is possible to sterilize heterotrophic bacteria only by raising it moderately, it is a safe, inexpensive and effective approach. Also, the possibility of corrosion of the dental unit equipment due to the use of the disinfectant can be eliminated or reduced.
・ Frequent purchase and use of disinfectant is unnecessary. At least the use frequency or amount of the disinfectant can be reduced.
-In the dental unit 1 of this embodiment, since the heating apparatus 40 is provided in the position upstream from the internal branch P3, it is only necessary to provide the heating apparatus 40 in one place, and it branches from the internal branch P3. Water that satisfies both the water quality management target value for the number of heterotrophic bacteria and the water quality standard for the free residual chlorine concentration can be efficiently supplied to all locations of the water supply pipe 60.
-In the dental unit 1 of this embodiment, since the heating apparatus 40 is provided in the position upstream from the internal branch P3, when the practitioner uses the instruments 23 and 33, the temperature of the heated water Has been cooled to a temperature that does not irritate the patient and can be used as is for the procedure.
-Since this embodiment can also install the heating apparatus 40 in the water supply piping of the existing dental unit, it can be incorporated cheaply and safely in all the dental units currently used, versatility, Excellent practicality.

 なお、本発明は上記実施形態に限定されず、以下のような変形が可能である。
・加温装置40の構成は図2に示したものに限定されず、公知のヒータを含む、給水配管60内の水を加熱可能な別の構成ヒータを用いてもよい。
・本発明によれば、従属栄養細菌数が2000 CFU/mL以下に抑制されておればよく、遊離残留塩素濃度0.1 mg/L以上の水質基準は必ずしも満たされなくてもよい。
・加温装置40の取り付け位置は水道栓4と内部分岐P3の間の配管61の位置に限定されず、従属栄養細菌数の水質管理目標値を満たす限り、歯科ユニット1内の給水配管60の任意の箇所に取り付けることができる。例えば、加温装置40は、水道栓4とスピットン装置15の間に設けてもよいし、内部分岐P3に設けてもよいし、内部分岐P3より下流の、アシスタントユニット20又はドクターユニット30等に設けてもよい。設置箇所が一か所で済み、施術者がインスツルメント23,33を使用する時には加温された水の温度が患者に刺激を与えない程度の温度に冷めているという点では、加温装置40は内部分岐P3又はその上流に設けられることが好ましい。
・本発明は、歯科用ユニット1に限定されず、家庭用浄水装置の給水配管や、貯水タンクの給水配管等、給水配管を備えた任意の他の装置にも適用することができる。これにより、水質汚染が危惧される敷地、地域、海外でも本発明の装置を使用することができる。
In addition, this invention is not limited to the said embodiment, The following modifications are possible.
-The structure of the heating apparatus 40 is not limited to what was shown in FIG. 2, You may use another structure heater which can heat the water in the water supply piping 60 containing a well-known heater.
-According to the present invention, the number of heterotrophic bacteria may be suppressed to 2000 CFU / mL or less, and the water quality standard having a free residual chlorine concentration of 0.1 mg / L or more may not necessarily be satisfied.
The attachment position of the heating device 40 is not limited to the position of the pipe 61 between the water tap 4 and the internal branch P3, as long as the water quality management target value of heterotrophic bacteria is satisfied, the water supply pipe 60 in the dental unit 1 Can be attached to any location. For example, the heating device 40 may be provided between the water tap 4 and the spittoon device 15, may be provided in the internal branch P3, or may be provided in the assistant unit 20 or the doctor unit 30 or the like downstream from the internal branch P3. It may be provided. Only one installation location is required, and when the practitioner uses the instruments 23 and 33, the temperature of the heated water is cooled to a temperature that does not irritate the patient. 40 is preferably provided in the internal branch P3 or upstream thereof.
-This invention is not limited to the dental unit 1, It can apply also to arbitrary other apparatuses provided with water supply piping, such as a water supply piping of a household water purifier, and a water supply piping of a water storage tank. As a result, the apparatus of the present invention can be used even in sites, regions, and overseas where water pollution is a concern.

 以下に実施例を挙げて本発明をより具体的に説明するが、本発明はこれらに限定されない。 Hereinafter, the present invention will be described more specifically with reference to examples, but the present invention is not limited to these examples.

1.歯科用ユニットからの水試料の採取
 一般歯科用ユニットとして、東北大学病院内で2009年12月より稼働しているGC社レフィーノ3台(製造番号00036、00041及び00042)と2012年9月より稼働しているGC社イオム レガロ2台(製造番号00672及び00672)を対象とした。また、薬物洗浄機能付き歯科用ユニットとして、2015年5月もしくは2016年3月より稼働しているモリタ スペースラインスピリットV  PdWトレーシステム3台(製造番号CH1006、EB1503及びZC1001)を対象とした。
1. Collecting water samples from dental units As a general dental unit, three GC Refino units (Product Nos. 00036, 00041 and 00042) have been operating in Tohoku University Hospital since December 2009 and have been operating since September 2012. The two GC Iome Regalo (manufactured Nos. 00672 and 00672). In addition, three Morita Spaceline Spirit V PdW tray systems (manufacturing numbers CH1006, EB1503, and ZC1001) that have been in operation since May 2015 or March 2016 were targeted as dental units with drug cleaning functions.

 一般歯科用ユニットは使用前に日本歯科医学会監修 院内感染対策実践マニュアルにあるガイドラインに従い、図1及び図2の符号を用いて説明すると、スピットン装置での使用のために、スピットン装置15の給水ノズル16(P4)から排出される含漱用水(以下、「含漱水」と称する)では紙コップ8杯分、ハンドピースでの使用のために、ハンドピース(P7)から排出される水(以下、「ハンドピース水」と称する)では30秒間の最大運転によるフラッシング(残留水排出)を行い、水質管理を施した。また、薬物洗浄機能付き歯科用ユニットでは、毎週末に、0.1%過酸化水素水をチェア給水管路内部に約2日間滞留させ、毎朝使用前に、専用フラッシングタンクにハンドピース等全ての経路を接続し、水道水を豊富な水流量で7分間循環させ、残留水を排出させた。 Before using the general dental unit according to the guidelines in the Hospital Infection Control Practice Manual supervised by the Japan Dental Medical Association, using the symbols in FIGS. 1 and 2, the water supply of the Spitton device 15 for use in the Spitton device In the water for gargle drained from the nozzle 16 (P4) (hereinafter referred to as “garden water”), water for 8 cups of paper, drained from the handpiece (P7) for use in the handpiece ( (Hereinafter referred to as "handpiece water") was subjected to flushing (residual water discharge) by maximum operation for 30 seconds to control water quality. Also, in the dental unit with drug cleaning function, 0.1% hydrogen peroxide solution stays in the chair water supply line for about 2 days every weekend, and before use every morning, all routes such as handpieces are routed to the dedicated flushing tank. Connected and circulated tap water at abundant water flow for 7 minutes to discharge residual water.

 一般歯科用ユニットおよび薬物洗浄機能付き歯科用ユニットについて、それぞれ残留水排出前後の患者用の含漱用水及びハンドピース水25 mLの各々を滅菌ポリエチレンチューブに10 mLと15 mLとに分けて採水した。先の10 mLは細菌検査に、後の15 mLは遊離残留塩素濃度測定に使用した。 For general dental units and dental units with a drug cleaning function, each patient's gargle water and handpiece water (25 mL) before and after residual water discharge are divided into 10 mL and 15 mL in sterile polyethylene tubes. did. The previous 10 mL was used for bacterial testing, and the subsequent 15 mL was used for free residual chlorine concentration measurement.

 また、一般歯科用ユニットGC社レフィーノ2台(製造番号00036及び00041)の給水配管パーツを取り外し、(1)水道栓(採水箇所P1)、(2)水道栓からユニット配管に入った直後(採水箇所P2)、(3)内部分岐点(採水箇所P3)、(4)スピットン装置の給水ノズル(P4)、(5)補佐用テーブル内部(採水箇所P5)及び(6)術者用テーブル内部(採水箇所P6)の各ポイントから同様に25 mLを滅菌ポリエチレンチューブに10 mLと15 mLとに分けて採水した(図3)。 Also, remove the water supply piping parts of two general dental unit GC company Refino (manufacturing numbers 00036 and 00041) and (1) taps (water sampling point P1), (2) immediately after entering the unit piping from the tap ( Water sampling point P2), (3) Internal branch point (water sampling point P3), (4) Spitton device water supply nozzle (P4), (5) Assistant table inside (water sampling point P5) and (6) Operator Similarly, 25 μmL was sampled from each point inside the table (water sampling location P6) into 10 μmL and 15 μmL in a sterile polyethylene tube (FIG. 3).

2.従属栄養細菌及び一般細菌の培養・観察方法
 上記1.の各水試料は、0.22μmのフィルタ(Millex-GP SLGP033RS,メルクミリポア社製)にて滅菌したmilliQ水を用いて10倍及び100倍に希釈した。
2. Methods for culturing and observing heterotrophic bacteria and general bacteria Each water sample was diluted 10 times and 100 times using milliQ water sterilized with a 0.22 μm filter (Millex-GP SLGP033RS, manufactured by Merck Millipore).

 一連の実験を開始する前に、培養条件検討のための予備実験として、ハンドピース部より採取した残留水試料中の従属栄養細菌及び一般細菌を、好気及び嫌気環境下で培養した。好気培養は以下に記した従属栄養細菌及び一般細菌検出法と同様に行った。嫌気培養は、テーハー式アナエロボックス(ANB-18-2E、ヒラサワ製)を用いた高度嫌気環境(80% N2, 10% CO2, 10% H2)下で行った。 Before starting a series of experiments, as a preliminary experiment for examining the culture conditions, heterotrophic bacteria and general bacteria in the residual water sample collected from the handpiece were cultured in an aerobic and anaerobic environment. Aerobic culture was performed in the same manner as the heterotrophic bacteria and general bacteria detection methods described below. Anaerobic culture was performed in a highly anaerobic environment (80% N 2 , 10% CO 2 , 10% H 2 ) using a Thea-type Anaero box (ANB-18-2E, manufactured by Hirasawa).

 従属栄養細菌の培養では、R2A寒天培地(251258, 日本BD)に原液及び希釈した試料を100μLずつ播種し、クールインキュベータ(CN-25C-1, 三菱電機エンジニアリング社製)を用いて20℃、7日間培養後、各寒天培地上のコロニー数を目視にてカウントし、各試料中の細菌数(CFU/mL)を算定した。 For the culture of heterotrophic bacteria, 100 μL each of the stock solution and diluted sample is seeded on R2A agar medium (251258, Sakai Nippon BD), and 20 ° C, 7 ° C using a cool incubator (CN-25C-1, manufactured by Mitsubishi Electric Engineering Co., Ltd.). After culturing for a day, the number of colonies on each agar medium was visually counted, and the number of bacteria in each sample (CFU / mL) was calculated.

 また、一般細菌検出のための培養では、CDC羊血液寒天培地(251733, 日本BD)に原液試料を100μL播種し、インキュベータ(CI-410, アドバンテック社製)を用いて37℃、7日間培養後、同様に細菌数(CFU/mL)を算定した。 In culture for detection of general bacteria, 100 μL of the stock solution sample is seeded on CDC sheep blood agar medium (251733, Sakai Nippon BD) and cultured at 37 ° C for 7 days using an incubator (CI-410, Sakai Advantech). Similarly, the number of bacteria (CFU / mL) was calculated.

 従属栄養細菌では、水質基準に関する省令の一部改正で水質管理目標設定項目として追加され、健水発第1115002号で当面の目標値として設定された「1mlの検水で、R2A寒天培地法にて20℃で7日間培養した後に形成される集落数として2000 CFU/mL以下」を基に合否を判定した。 For heterotrophic bacteria, it was added as a water quality management target setting item in the partial amendment of the ministerial ordinance on water quality standards, and was set as the immediate target value in 1115002 from Kensui. Pass / fail was determined based on the number of colonies formed after culturing at 20 ° C. for 7 days as 2000 CFU / mL or less ”.

3.遊離残留塩素濃度の測定
 遊離残留塩素濃度の測定はジエチルパラフェニレンジアミン試薬(遊離残留塩素測定用試薬DPDプラス、株式会社オーヤラックス、Cat. # OYWT-11-03)及び吸光光度法による残留塩素測定器(Photometer CL、株式会社オーヤラックス、Cat. # OYWT-31)を用いて、添付の取り扱い説明書に沿って行った。15 mLの水サンプルの内10mLを試料セル内に分取し、ゼロ校正を行った後、粉末試薬1包を溶解した。測定器のセル挿入部にセットし、約30秒間静置後測定を行った。ゼロ校正ならびに超純水による試料セルの洗浄を試料ごとに行った。厚生労働省が示す水道水質基準(水道法施行規則第17条3号)の基準値(0.1 mg/L以上)をもとに合否を判定した。
3. Measurement of free residual chlorine concentration Free residual chlorine concentration is measured by diethylparaphenylenediamine reagent (free residual chlorine measurement reagent DPD plus, Oyalax Co., Ltd., Cat. # OYWT-11-03) and spectrophotometric residual chlorine measuring instrument. (Photometer CL, Oyalux Co., Ltd., Cat. # OYWT-31) was used according to the attached instruction manual. 10 mL of the 15 mL water sample was dispensed into the sample cell, zero calibration was performed, and then one powdered reagent was dissolved. It was set in the cell insertion part of the measuring instrument and measured after standing for about 30 seconds. Zero calibration and sample cell cleaning with ultrapure water were performed for each sample. Pass / fail was judged based on the standard value (0.1 mg / L or more) of the tap water quality standard (Article 17-3 of the Water Supply Law Enforcement Regulations) indicated by the Ministry of Health, Labor and Welfare.

4.ハンドピース残留水中の従属栄養細菌に対する加温効果の検証方法(in vitro)
 一般歯科用ユニットGC社レフィーノ3台(製造番号00036、00041及び00042)よりフラッシング(残留水排出)を行わずに採取した、前日からハンドピース内に残留していたハンドピース水試料をin vitroで加熱した際の、試料中の従属栄養細菌に対する殺菌効果を検証するため、以下のように試料を処理した。
4). Verification method of heating effect against heterotrophic bacteria in handpiece residual water (in vitro)
Handpiece water samples remaining in the handpiece from the previous day, collected without flushing (residual water discharge) from three general dental units GC Refino (Product No. 00036, 00041, and 00042) in vitro In order to verify the bactericidal effect on heterotrophic bacteria in the sample when heated, the sample was treated as follows.

 残留水試料を、それぞれ15mlの滅菌コニカルチューブに5ml分注した。アルミブロックを搭載した小型ドライインキュベータ(BSR-M002, Bio Medical Science社製)に、上記1.の水試料を入れたコニカルチューブと、水道水を同量入れた同コニカルチューブをセット後、加温を開始した。水道水を入れたコニカルチューブには水銀温度計をセットし、この温度計の温度が30、35、40、45、50、55、60℃に達した時点で、各試料の入ったコニカルチューブから速やかに300μLの水試料を滅菌フィンピペットにて採取し、滅菌チューブ(アシストチューブ 72.693.100S, ザルスタット株式会社)に移して播種まで氷冷にて保管した。 The remaining water sample was dispensed in 5 ml each into a 15 ml sterile conical tube. In a small dry incubator equipped with an aluminum block (BSR-M002, manufactured by Bio Medical Science), the above 1. After setting the conical tube containing the water sample and the same conical tube containing the same amount of tap water, heating was started. A mercury thermometer is set in the conical tube containing tap water, and when the temperature of this thermometer reaches 30, 35, 40, 45, 50, 55, 60 ° C, it is removed from the conical tube containing each sample. A 300 μL water sample was quickly collected with a sterilized fin pipette, transferred to a sterilized tube (Assist Tube 72.693.100S, Sarustat Co., Ltd.), and stored on ice until seeding.

5.一般歯科用ユニットの給水配管への中等度加温効果の検証方法
 一般歯科用ユニットGC社イオム レガロ2台(製造番号00672及び00672)の給水配管のスピットン装置(15)の給排水ボックス(18)内の内部分岐P3の直前(図3に矢印で示した位置)(図3参照)に図2に示す構造を有する中等度加温装置を設置した。この加温装置は、歯科用ユニットの加温装置40内の温度を9分間で23℃から65℃まで加温することができる。加温装置のケーシングの容量は180ml、加温装置の電圧はAC24V、電力は52.8W、電力密度は2.5W/cm2、最大温度(ヒータ吐出口における最大水温)は約65℃であった。
5. Method of verifying moderate heating effect on the water supply pipe of a general dental unit Inside the water supply / drainage box (18) of the spit-on device (15) of the water supply pipes of two general dental unit GC company Iom Regalo (manufacture No.00672 and00672) A moderate heating apparatus having the structure shown in FIG. 2 was installed immediately before the internal branch P3 (position indicated by the arrow in FIG. 3) (see FIG. 3). This heating device can heat the temperature in the heating device 40 of the dental unit from 23 ° C. to 65 ° C. in 9 minutes. The casing capacity of the heating device was 180 ml, the heating device voltage was 24 VAC, the power was 52.8 W, the power density was 2.5 W / cm 2 , and the maximum temperature (maximum water temperature at the heater outlet) was about 65 ° C.

 加温装置の作動前にフラッシング(残留水排出)を行わずに前日からハンドピース内に残留していたハンドピース水25mLを滅菌ポリエチレンチューブに10 mLと15 mLに分けて採水した。その後、加温装置を作動させ、10分間加温した。その後、ハンドピースの最大出力での運転を開始し、ハンドピース運転30秒後、1分間後及び2分間後それぞれで25mLを同様の方法で採水した。各採水時に、デジタル温度計(CT-05SD, CUSTOM社製)を用いて検温した。加温装置は実験が終了するまで作動させ続けた。 Before the heating device was operated, flushing (residual water discharge) was not performed, and 25 mL of handpiece water remaining in the handpiece from the previous day was collected in 10 μmL and 15 μmL in a sterile polyethylene tube. Thereafter, the heating device was activated and heated for 10 minutes. Thereafter, operation at the maximum output of the handpiece was started, and 25 mL of water was collected in the same manner after 30 seconds, 1 minute and 2 minutes after the handpiece operation. The temperature was measured using a digital thermometer (CT-05SD, manufactured by Sakai CUSTOM) at each sampling time. The warming device continued to operate until the experiment was completed.

6.結果
 (1)培養条件の検討:好気及び嫌気環境下での従属栄養細菌及び一般細菌の培養結果
 図4に示すように、一連の実験の開始前の予備実験として、ハンドピースより採取した残留水試料中の従属栄養細菌及び一般細菌を、好気及び嫌気環境下で培養したところ、従属栄養細菌は好気環境のみでコロニーが観察され、嫌気では非検出となった。また、一般細菌はどちらの条件でも非検出となった。そのため、それ以後の実験では、好気培養で検出された従属栄養細菌数を研究対象とした。
6). Results (1) Examination of culture conditions: Culture results of heterotrophic bacteria and general bacteria in aerobic and anaerobic environments As shown in Fig. 4, as a preliminary experiment before the start of a series of experiments, residues collected from handpieces When heterotrophic bacteria and general bacteria in a water sample were cultured in an aerobic and anaerobic environment, colonies of the heterotrophic bacteria were observed only in the aerobic environment and were not detected in the anaerobic environment. In addition, general bacteria were not detected under either condition. Therefore, in the subsequent experiments, the number of heterotrophic bacteria detected in the aerobic culture was the subject of the study.

 (2)残留水排出による一般歯科用ユニット水中の従属栄養細菌数の変化
 図5に示すように、残留水排出後のハンドピース水及び含漱用水中の従属栄養細菌数は、排出前と比較し、ハンドピース水で約94%、含漱用水で98%、有意に減少した。(P <0.01, paired t-test)。また、含漱用水では残留水排出後の細菌数が目標値である2000 CFU/mLを下回ったが、ハンドピース水では残留水排出後でも目標値の5倍近い細菌数が検出された。
(2) Changes in the number of heterotrophic bacteria in general dental unit water due to residual water discharge As shown in Fig. 5, the number of heterotrophic bacteria in handpiece water and gargle water after residual water discharge is compared with that before discharge However, it decreased significantly by about 94% for handpiece water and 98% for gargle water. (P <0.01, paired t-test). In addition, the number of bacteria after discharge of residual water was less than the target value of 2000 CFU / mL in the water containing ginger, but the number of bacteria close to 5 times the target value was detected even after discharge of residual water in handpiece water.

 (3)残留水排出による一般歯科用ユニット水中の遊離残留塩素濃度の変化
 図6に示すように、含漱用水の遊離残留塩素濃度は、残留水排出前では水道法の基準値(0.1 mg/L)よりも低かったが、残留水排出後に0.2 mg/L以上となり基準値を大きく上回った(P <0.01, paired t-test)。一方、ハンドピース水の遊離残留塩素濃度は残留水排出の有無にかかわらず、0.5 mg/L程度であり、基準値を上回ることはなかった。
(3) Change in free residual chlorine concentration in general dental unit water due to residual water discharge As shown in Fig. 6, the free residual chlorine concentration in gargle water is the standard value (0.1 mg / Although it was lower than L), it was 0.2 mg / L or more after residual water discharge, significantly exceeding the reference value (P <0.01, paired t-test). On the other hand, the free residual chlorine concentration of handpiece water was about 0.5 mg / L regardless of whether residual water was discharged or not, and did not exceed the standard value.

 (4)歯科用ユニットの給水配管各部の従属栄養細菌数
 図7に示すように、ユニット内の各ポイントから水試料を採取し、各々の従属栄養細菌数を比較したところ、水道栓(P1)及び水道栓からユニット配管に入った直後(P2)の試料中では、従属栄養細菌はほとんど検出されなかったのに対し、内部分岐部(P3)、スピットン装置の給水ノズル(P4)、及び補佐用テーブル内(P5)の配管から採取した試料では、目標値である2000 CFU/mL内に収まったものの、その検出数は徐々に増加した。さらに、術者用テーブル内(P6)では2000 CFU/mL前後の検出数となり、より細い配管で繋げられたハンドピース先端からの試料(P7)では、その検出数が一気に150000 CFU/mLへと増加した。これらの結果は、元栓からの距離に応じて、従属栄養細菌数が増加する傾向を示しており、元栓から遠いユニット内配管中では水中に含まれる従属栄養細菌が滞り、バイオフィルムなどの細菌供給源を形成している可能性が示唆された。
(4) Number of heterotrophic bacteria in each part of the water supply piping of the dental unit As shown in Fig. 7, water samples were collected from each point in the unit and the numbers of heterotrophic bacteria were compared. In the sample immediately after entering the unit pipe from the water tap (P2), almost no heterotrophic bacteria were detected, whereas the internal branch (P3), the water nozzle (P4) of the Spitton device, and the assistant In the sample collected from the pipe in the table (P5), although it was within the target value of 2000 CFU / mL, the number of detections gradually increased. Furthermore, in the operator's table (P6), the number of detections is around 2000 CFU / mL, and in the sample (P7) from the tip of the handpiece connected by a thinner pipe, the number of detections increases to 150000 CFU / mL at a stretch. Increased. These results show that the number of heterotrophic bacteria tends to increase according to the distance from the main plug. In the unit piping far from the main plug, heterotrophic bacteria contained in water stagnate, and supply of bacteria such as biofilm. This suggests the possibility of forming a source.

 (5)歯科用ユニットの給水配管各部の遊離残留塩素濃度
 図8に示すように、水道栓(P1)及び水道栓からユニット配管に入った直後(P2)の遊離残留塩素濃度は、0.3 mg/L以上であり、水道法の基準値(0.1 mg/L)を大きく超えていた。一般歯科用ユニット内部に進むにつれ遊離残留塩素濃度は下がるが、内部分岐部(P3)や補佐用テーブル内部(P5)では未だ基準値以上であった。しかし、スピットン装置の給水ノズル(P4)、術者用テーブル内部(P6)及びハンドピース先端からの試料(P7)では基準値を下回った。水道栓から遠い箇所ほど、遊離残留塩素濃度は低くなる傾向を示した。
(5) Free Residual Chlorine Concentration in Each Portion of Dental Unit Water Supply Piping As shown in Fig. 8, the free residual chlorine concentration immediately after entering the unit piping from the water tap (P1) and water tap (P2) is 0.3 mg / It was over L and greatly exceeded the standard value (0.1 mg / L) of the Water Supply Law. Although the free residual chlorine concentration decreased as it proceeded to the general dental unit, it was still above the reference value in the internal branch (P3) and in the assistant table (P5). However, the water supply nozzle (P4) of the Spitton device, the inside of the operator table (P6), and the sample (P7) from the tip of the handpiece were below the reference value. The farther away from the tap, the lower the residual chlorine concentration tended to be lower.

 (6)薬物洗浄機能付き歯科用ユニットのハンドピース水中の従属栄養細菌数
 図9に示すように、参考例として、薬物洗浄機能付き歯科用ユニットハンドピースより採取した水試料では、残留水排出前でも、従属栄養細菌数が非常に少なく、目標値をクリアしていた。残留水の排出後はさらにその数が減少した。日頃より過酸化水素水が流路を循環することで、流路内の従属栄養細菌が殺菌されていることが示唆された。
(6) Number of heterotrophic bacteria in the handpiece water of the dental unit with the drug cleaning function As shown in Fig. 9, the water sample collected from the dental unit handpiece with the drug cleaning function is used as a reference example before discharging residual water. However, the number of heterotrophic bacteria was very small and the target value was cleared. The number further decreased after discharge of residual water. It was suggested that the heterotrophic bacteria in the flow path were sterilized by hydrogen peroxide water circulating in the flow path.

 (7)薬物洗浄機能付き歯科用ユニットのハンドピース水中の遊離残留塩素濃度
 図10に示すように、参考例として、残留水排出前の薬物洗浄機能付き歯科用ユニットハンドピースより採取した水試料中の遊離残留塩素濃度は水道法基準値未満であった。残留水排出により、遊離残留塩素濃度は増加傾向にあったが、必ずしも基準値以上にならなかった。このように、遊離残留塩素濃度が必ずしも水道法に準拠しないこと、さらに、過酸化水素による配管の継時的腐食が危惧された。
(7) Free residual chlorine concentration in handpiece water of dental unit with drug cleaning function As shown in Fig. 10, as a reference example, in a water sample collected from a dental unit handpiece with drug cleaning function before discharging residual water The free residual chlorine concentration of was less than the standard value of the water supply law. Due to residual water discharge, free residual chlorine concentration tended to increase, but it did not always exceed the standard value. As described above, there was a concern that the concentration of free residual chlorine does not necessarily comply with the Water Supply Law, and that the pipes were continuously corroded by hydrogen peroxide.

 (8)従属栄養細菌に対する加温による影響(in vitro)
 ハンドピースより各々採取した水試料をin vitroで各温度まで加熱した際の、試料中の従属栄養細菌に対する影響を検証した。
(8) Effects of heating on heterotrophic bacteria (in vitro)
The effect on heterotrophic bacteria in the sample when each water sample collected from the handpiece was heated to each temperature in vitro was examined.

 図11に示すように、今回対象とした3台の一般歯科ユニットから採取した試料では、検出される従属栄養細菌数は常温から45度までは、ほぼ横ばいの値を示したが、50度以上で急激に減少し、55℃以上では、目標値である2000 CFU/mLを下回る検出量となった。50~60℃程度の中等度の加温により、ハンドピース水中の従属栄養細菌数を大幅に減少させることができることが示された。 As shown in Fig. 11, in the samples collected from the three general dental units targeted this time, the number of heterotrophic bacteria detected was almost flat from room temperature to 45 degrees, but it was more than 50 degrees At 55 ° C or higher, the detected amount was less than the target value of 2000 CFU / mL. It has been shown that moderate heating around 50-60 ° C can significantly reduce the number of heterotrophic bacteria in handpiece water.

 (9)一般歯科用ユニットの給水配管の中等度加温によるハンドピース水内従属栄養細菌への殺菌効果
 ユニットの給水配管内の加温装置により、最大で65℃まで加温した際の、ハンドピース水試料中の採取直後の温度及び従属栄養細菌数の経時的変化を調べた。
(9) Handpieces by moderate heating of water supply pipes for general dental units Hands sterilizing effect on heterotrophic bacteria in water Hands when heated up to 65 ° C by the heating device in the water supply pipe of the unit The time course of temperature and heterotrophic bacteria count in the piece water sample was investigated.

 図12に示すように、中等度加温後にハンドピース先端より採取した水試料温度は最大で33℃程度であった。これは、加温装置からハンドピース先端までのユニット内配管に距離があったことから、流路内で冷却されたためと考えられた。 As shown in FIG. 12, the temperature of the water sample collected from the tip of the handpiece after moderate heating was about 33 ° C. at the maximum. This was thought to be because the pipe in the unit from the heating device to the tip of the handpiece had a distance and was cooled in the flow path.

 従属栄養細菌数は、ハンドピース先端より水を出し続け30秒後に採取した試料では、加温前の試料と比較し、大きく減少し2台のユニット共に目標値である2000 CFU/mLをクリアする結果を得た。その後、1分後、2分後まで、減少した状態が保たれた。 The number of heterotrophic bacteria is greatly reduced in the sample collected 30 seconds after continuing to draw water from the tip of the handpiece, compared with the sample before heating, and the two units clear the target value of 2000 CFU / mL The result was obtained. Thereafter, the decreased state was maintained until 1 minute and 2 minutes later.

 この加温装置によりユニット内の従属栄養細菌が殺菌され、排水中はその効果が維持されることが示された。 It was shown that the heterotrophic bacteria in the unit were sterilized by this heating device and the effect was maintained during drainage.

 (10)一般歯科用ユニットの給水配管の中等度加温によるハンドピース排出水の温度と遊離残留塩素濃度への影響
 図13に示すように、一般歯科用ユニットのハンドピース水の温度は加熱前後の残留水は約20℃の常温であり、加熱後残留水を排出するにつれ上昇したが、30℃前後で頭打ちとなった。
(10) Effect of moderate heating on water supply piping of general dental unit on handpiece discharge water temperature and free residual chlorine concentration As shown in Figure 13, the temperature of handpiece water of general dental unit is around The residual water at room temperature was about 20 ° C and increased as the residual water was discharged after heating, but it reached a peak at around 30 ° C.

 ハンドピース残留水の遊離残留塩素濃度は加熱前は水道法の基準値(0.1 mg/L)以下をとる場合があったが、中等度加熱後にハンドピース残留水中の遊離残留塩素濃度は著しく増加し、ユニット1では0.3 mg/L以上となり、水道法の基準値を大きく上回った。2分間の残留水排出中、遊離残留塩素濃度が水道法の基準値未満となることはなく、いずれのユニットも常に0.2 mg/L以上であった。 In some cases, the residual chlorine concentration in the water remaining in the handpiece was below the water supply standard (0.1 mg / L) before heating, but the residual chlorine concentration in the water remaining in the handpiece increased significantly after moderate heating. In Unit 1, it was 0.3 mg / L or more, greatly exceeding the standard value of the Water Supply Law. During residual water discharge for 2 minutes, the free residual chlorine concentration never fell below the standard value of the Waterworks Law, and all units were always above 0.2 mg / L.

 以上の結果から、既存の院内感染対策実践マニュアルにあるガイドラインに従う方法や薬物洗浄機能付き歯科用ユニットにおける過酸化水素水を用いた殺菌では、従属栄養細菌数及び遊離残留塩素濃度の両方の点で、水道法に準拠した基準で水質管理が困難であることが示された。一方で、本実施例では、歯科用ユニット内部の給水配管の分岐部に中等度加温装置を取り付けることで、歯科用ユニットのハンドピース水の水質を、安全性と確実性が高く、従属栄養細菌数及び遊離残留塩素濃度の両方の点で、水道法に準拠した水準で管理できることが示された。 Based on the above results, in terms of both the number of heterotrophic bacteria and free residual chlorine concentration, sterilization using hydrogen peroxide in a dental unit with a drug cleaning function and the method following the guidelines in the existing hospital infection countermeasure practice manual According to the standards in accordance with the Water Supply Law, water quality management was shown to be difficult. On the other hand, in this embodiment, by attaching a moderate heating device to the branch of the water supply pipe inside the dental unit, the quality of the handpiece water of the dental unit is high in safety and reliability, and the heterotrophic nutrition. It was shown that it can be managed at a level that complies with the Water Supply Law, both in terms of bacterial count and free residual chlorine concentration.

 40…加温装置、60…給水配管。 40 ... Warming device, 60 ... Water supply piping.

Claims (7)

 給水配管と、
 前記給水配管に取り付けられた、給水配管内の水を殺菌するための加温装置とを備え、
 前記加温装置は、前記加温装置より下流の給水配管内の水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする装置。
Water supply piping,
A heating device attached to the water supply pipe for sterilizing water in the water supply pipe;
The heating apparatus is characterized in that the number of heterotrophic bacteria in water in the water supply pipe downstream from the heating apparatus is 2000 CFU / mL or less.
 前記加温装置は前記給水配管内の水を収容可能なケーシングと、前記ケーシング内に設けられたヒータとを備え、前記ケーシング内の水を50℃以上に加熱することを特徴とする請求項1に記載の装置。 The said heating apparatus is provided with the casing which can accommodate the water in the said water supply piping, and the heater provided in the said casing, The water in the said casing is heated to 50 degreeC or more, The said heating apparatus is characterized by the above-mentioned. The device described in 1.  前記加温装置より下流の給水配管内の水の遊離残留塩素濃度を0.1 mg/L以上にすることを特徴とする請求項1に記載の装置。 The apparatus according to claim 1, wherein the concentration of free residual chlorine in the water supply pipe downstream from the heating device is 0.1 mg / L or more.  前記装置は、アシスタントユニットとドクターユニットとを備えた歯科用ユニットであり、前記給水配管はアシスタントユニットに至る給水配管と、ドクターユニットに至る給水配管とに分岐しており、前記加温装置は該分岐部又はその上流に設けられている請求項1~3のいずれかに記載の装置。 The apparatus is a dental unit including an assistant unit and a doctor unit, and the water supply pipe is branched into a water supply pipe leading to the assistant unit and a water supply pipe leading to the doctor unit. The apparatus according to any one of claims 1 to 3, wherein the apparatus is provided at the branching section or upstream thereof.  前記ドクターユニットは前記給水配管と流体連通するインスツルメントを備え、前記インスツルメントから排出される水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする請求項4に記載の装置。 The said doctor unit is equipped with the instrument which is fluidly connected with the said water supply piping, The heterotrophic bacteria count of the water discharged | emitted from the said instrument shall be 2000 CFU / mL or less. apparatus.  前記加熱装置による60~70℃での10分間の加熱の2分後に前記インスツルメントから排出される水の温度が15~35℃である請求項5のいずれかに記載の装置。 6. The apparatus according to claim 5, wherein the temperature of water discharged from the instrument after 2 minutes of heating at 60 to 70 ° C. for 10 minutes by the heating apparatus is 15 to 35 ° C.  装置の給水配管内の水の殺菌方法であって、前記給水配管に取り付けられた、前記給水配管内の水を加熱殺菌するための加温装置を用いて、前記加温装置より下流の給水配管内の水の従属栄養細菌数を2000 CFU/mL以下にすることを特徴とする殺菌方法。 A method for sterilizing water in a water supply pipe of an apparatus, wherein the water supply pipe is attached to the water supply pipe and is used for heating and sterilizing water in the water supply pipe. A sterilization method characterized in that the number of heterotrophic bacteria in the water is 2000 CFU / mL or less.
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Citations (6)

* Cited by examiner, † Cited by third party
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JP2000070291A (en) * 1998-08-31 2000-03-07 J Morita Tokyo Mfg Corp Dental sterilization and washing management apparatus
JP2003164474A (en) * 2001-04-27 2003-06-10 Jonan Kk Distributing water pipe for medical treatment unit, and method and device for current sterilizing of distributing water
JP2004181078A (en) * 2002-12-05 2004-07-02 Matsushita Electric Ind Co Ltd Electric water heater and sterilization method
WO2009125702A1 (en) * 2008-04-09 2009-10-15 国立大学法人長崎大学 Heat sterilizing water purifier
JP2011254989A (en) * 2010-06-09 2011-12-22 Takeshi Kameda Autoclaving/drying/sterilized water generation system
JP2013010067A (en) * 2011-06-28 2013-01-17 Selfmedical Inc Electrolyzed water generation device, dental examination and treatment device including the same, and method for sterilizing inside of water supply conduit of the dental examination and treatment device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000070291A (en) * 1998-08-31 2000-03-07 J Morita Tokyo Mfg Corp Dental sterilization and washing management apparatus
JP2003164474A (en) * 2001-04-27 2003-06-10 Jonan Kk Distributing water pipe for medical treatment unit, and method and device for current sterilizing of distributing water
JP2004181078A (en) * 2002-12-05 2004-07-02 Matsushita Electric Ind Co Ltd Electric water heater and sterilization method
WO2009125702A1 (en) * 2008-04-09 2009-10-15 国立大学法人長崎大学 Heat sterilizing water purifier
JP2011254989A (en) * 2010-06-09 2011-12-22 Takeshi Kameda Autoclaving/drying/sterilized water generation system
JP2013010067A (en) * 2011-06-28 2013-01-17 Selfmedical Inc Electrolyzed water generation device, dental examination and treatment device including the same, and method for sterilizing inside of water supply conduit of the dental examination and treatment device

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