WO2019225267A1 - METHOD FOR PRODUCING OPTICALLY ACTIVE cis-AMINOPIPERIDINE - Google Patents
METHOD FOR PRODUCING OPTICALLY ACTIVE cis-AMINOPIPERIDINE Download PDFInfo
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- WO2019225267A1 WO2019225267A1 PCT/JP2019/017295 JP2019017295W WO2019225267A1 WO 2019225267 A1 WO2019225267 A1 WO 2019225267A1 JP 2019017295 W JP2019017295 W JP 2019017295W WO 2019225267 A1 WO2019225267 A1 WO 2019225267A1
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- following formula
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- 0 [C+]*(CCC(C1)N)N1c1ccccc1 Chemical compound [C+]*(CCC(C1)N)N1c1ccccc1 0.000 description 8
- PMEKLFAJPBRHMJ-UHFFFAOYSA-N NC(CCC12CC1)CN2c1ccccc1 Chemical compound NC(CCC12CC1)CN2c1ccccc1 PMEKLFAJPBRHMJ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/56—Nitrogen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/60—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
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- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12P—FERMENTATION OR ENZYME-USING PROCESSES TO SYNTHESISE A DESIRED CHEMICAL COMPOUND OR COMPOSITION OR TO SEPARATE OPTICAL ISOMERS FROM A RACEMIC MIXTURE
- C12P41/00—Processes using enzymes or microorganisms to separate optical isomers from a racemic mixture
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to an optically active cis-aminopiperidine useful as a pharmaceutical intermediate.
- 2-Substituted-5-aminopiperidine is known as an optically active cis-aminopiperidine useful as a pharmaceutical intermediate (for example, Patent Document 1).
- This patent document 1 discloses pyrrolo [2,3-d] pyrimidinyl, pyrrolo [2,3-b] pyrazinyl, pyrrolo [2,3-d] pyridinylacrylamide and the like as compounds that inhibit Janus kinase (JAK).
- As an intermediate step for producing the compound the following steps are disclosed. In the following steps, racemic (2S, 5R) -benzyl-5-amino-2-methylpiperidine-1-carboxylate (compound (e)) as 2-substituted-5-aminopiperidine is prepared.
- racemic (2S, 5R) -benzyl-5-amino-2-methylpiperidine-1-carboxylate is not an optically active substance, it must be converted into an optically active substance in a later step.
- the compound (d) is purified by an optically active column using a supercritical medium, and is extremely complicated and inefficient.
- the present invention has been made paying attention to the circumstances as described above, and its object is to achieve high-purity optically active cis-aminopiperidine without requiring protection of both amino groups of aminopiperidine. It is to provide a method capable of manufacturing.
- the present invention is as follows.
- a process for producing an optically active substance using racemic-cis-nipecotamide represented by the following formula (2) as an optically active substance The optically active-cis-nipecotamide represented by the following formula (3) obtained in the optically active substance production step is subjected to de-CO rearrangement reaction to obtain an optically active-cis-aminopiperidine represented by the following formula (4).
- Dislocation process A process for producing optically active cis-aminopiperidine having (Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom.
- Cis represents an R 1 group bonded to a piperidine ring and an amide group or amino group. (Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.) [2] The process for producing an optically active cis-aminopiperidine according to [1], wherein the racemic-cis-nipecotamide represented by the formula (2) has a cis isomer excess determined by the following formula of 35% de or more.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100 [3] Crystallizing one or both of the optically active cis-nipecotamide represented by the formula (3) and the optically active cis-aminopiperidine represented by the formula (4) The production method according to [1] or [2], which increases both purity.
- the optically active-cis-N-protected aminopiperidine represented by the following formula (4a) is obtained by subjecting the optically active-cis-N-protected nipecotamide represented by the following formula (3b) obtained in the N-protecting step to de-CO rearrangement reaction.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100 [7] Crystallizing one or both of the optically active-cis-N protected nipecotamide represented by the formula (3b) and the optically active-cis-N protected aminopiperidine represented by the formula (4a) The method for producing optically active-cis-aminopiperidine according to any one of [4] to [6], wherein both the excess ratio and the optical purity are increased.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100 (Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (Indicates that [11] Racemic-cis-nipecotamide represented by the following formula (2a) or the following formula (2bx).
- R 1 represents an alkyl group having 1 to 10 carbon atoms
- Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group)
- cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100 (Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.) [13] Optically active-cis-nipecotamide represented by the following formula (3a) or the following formula (3bx).
- R 1 represents an alkyl group having 1 to 10 carbon atoms
- Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group)
- cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship, and * indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.
- An optically active cis-nipecotamide represented by the following formula (3) having a cis isomer excess of 35% de or more determined by the following formula is crystallized to enhance both the cis isomer excess and the optical purity.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100 (Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100
- R 1 represents an alkyl group having 1 to 10 carbon atoms
- P 1 represents an amino-protecting group or a hydrogen atom.
- Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amino group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
- a compound having an amine group for example, a racemic-cis-nipecotamide represented by the formula (2), the formula (2a), the formula (2b), or the formula (2bx); the formula (3), the formula (3a), optically active-cis-nipecotamide represented by formula (3b), or (3bx); optically active-cis-amino represented by formula (4), formula (4a), or formula (4b) Piperidine is defined as any salt.
- high-purity optically active cis-aminopiperidine can be produced without requiring protection of both two amino groups of aminopiperidine.
- Step A1 An optically active substance production step (Step A1) in which a racemic-cis-nipecotamide represented by the following formula (2) (hereinafter sometimes referred to as compound (2)) is made into an optically active substance;
- Step A2 A rearrangement step (Step A2) in which the obtained optically active-cis-nipecotamide represented by the formula (3) (hereinafter sometimes referred to as compound (3)) is de-CO rearranged to give the compound (4), Manufactured by.
- R 1 represents an alkyl group having 1 to 10 carbon atoms
- P 1 represents an amino-protecting group or a hydrogen atom.
- Cis represents an R 1 group bonded to a piperidine ring and an amide group or amino group.
- the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.
- crystallization is possible in any of compound (3) and compound (4), and high-purity compound (4) can be easily produced.
- the compound (4) is excellent in that it can be crystallized without protecting the exocyclic amino group of the compound (4).
- Examples of the alkyl group represented by R 1 include a methyl group, an ethyl group, a propyl group (including an isopropyl group), a butyl group, a pentyl group, and a hexyl group.
- Preferred are alkyl groups having 1 to 3 carbon atoms, more preferred are methyl, ethyl, n-propyl, isopropyl and the like, and particularly preferred is methyl.
- Examples of the protecting group for the amino group represented by P 1 include protecting groups described in Green's Protective Groups in Organic Synthesis 4th edition (Publisher: John Wiley & Sons Inc.) pages 696-926.
- Preferred examples include carbamate protecting groups such as tert-butoxycarbonyl group and benzyloxycarbonyl group, acyl protecting groups such as acetyl group and benzoyl group, and benzyl group. More preferred is a carbamate protecting group.
- Cis isomer excess (% de) (cis isomer substance amount ⁇ trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) ⁇ 100
- compound (2a) a compound represented by the following formula (2a)
- compound (2bx) a compound represented by the following formula (2bx)
- R 1 and cis are the same as described above.
- Pro (x) is the same as P 1 except that it does not contain a hydrogen atom and a t-butoxycarbonyl group.
- compound (3a) a compound represented by the following formula (3a) (hereinafter sometimes referred to as compound (3a)) or a compound represented by the following formula (3bx) (hereinafter referred to as compound (3bx)) are also novel compounds and are preferred.
- the compound (3) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the CONH 2 group is bonded is in the R configuration.
- the compound (4) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
- the compound (2), the compound (2a), the compound (2bx), the compound (3), the compound (3a), the compound (3bx), the compound (4) and the like may be a salt as described above.
- the salt may be produced in the production process of each compound, or may be obtained by treating each compound that is not a salt with an acid.
- Examples of salts of each compound include mineral acids such as hydrogen chloride, hydrogen bromide, sulfuric acid and nitric acid; sulfonic acids such as trifluoromethanesulfonic acid, paratoluenesulfonic acid and methanesulfonic acid; and carboxylic acids such as acetic acid and trifluoroacetic acid.
- Examples include salts containing acid components, preferably salts containing hydrogen chloride, hydrogen bromide, sulfuric acid and the like as acid components, and more preferably salts containing hydrogen chloride as an acid component.
- This (A1) compound (2) used as a process raw material in the optically active substance production process may have an excess of cis isomer of 10% de or more, but 35% de or more or What is 40% de or more is preferable, and what is 50% de or more is more preferable.
- the higher the cis isomer excess the easier the crystallization of the compound (3) or the compound (4).
- the cis isomer excess may be 100% de, but may be 99% de or less, 97% de or less, 90% de or less, 80% de or less, or 70% de or less.
- the method for producing compound (3) from compound (2) in the optically active substance production step is not particularly limited.
- one optically active component of compound (2) is selectively isomerized to produce the other optically active component.
- a resolving agent that selectively acts on one optically active component of the compound (2) (method 2), a chemical catalyst or an enzyme source, etc.
- method 3 using an enzyme source is particularly preferred.
- one optically active component of racemic-cis-nipecotamide (2) is hydrolyzed to give an optically active-cis-nipecotic acid represented by the following formula (5) (hereinafter referred to as Compound (5)). And the other optically active component is preferably left as optically active-cis-nipecotamide (3) (Method 4).
- the enzyme source used in the method 4 only needs to have the ability to hydrolyze the compound (2) optically and selectively into the compound (5). Therefore, in addition to the enzyme itself, a culture of a microorganism having the above hydrolysis activity. And processed products thereof.
- “Microbial culture” means a culture solution or culture containing cells
- “processed product” means, for example, a crude extract, freeze-dried microorganism, acetone-dried microorganism, or these bacteria. It means a body ground product, etc., as long as it has the above hydrolytic activity.
- the enzyme source may be one obtained by immobilizing the enzyme or bacterial cells (immobilized enzyme, immobilized bacterial cells) or the like.
- Immobilization of the enzyme or bacterial cells can be performed by methods well known to those skilled in the art (for example, a crosslinking method, a physical adsorption method, a comprehensive method, etc.).
- a crosslinking method for example, a crosslinking method, a physical adsorption method, a comprehensive method, etc.
- the resin is preferably an ion exchange resin such as an anion exchange resin.
- the resin may be pretreated before adsorbing to the enzyme. As pretreatment, the resin is washed with a NaCl aqueous solution, pure water or the like, and the pH is adjusted with alkaline water (sodium hydroxide aqueous solution or the like). To 8.5), including drainage.
- the crosslinking agent examples include glutaraldehyde.
- the cross-linking agent may be inactivated if necessary.
- a Tris buffer concentration is about 0.01 to 2M, pH is about 7.5 to 8.5).
- the resin after inactivating the cross-linking agent may be washed with an aqueous NaCl solution as necessary.
- Examples of the enzyme source having the ability to optically hydrolyze the racemic compound (2) to the optically active compound (5) include, for example, the genus Achromobacter, the genus Brevibacterium, the capriavidas Examples include an enzyme source derived from a microorganism selected from the group consisting of the genus (Cupriavidus), the genus Pectobacterium, the genus Pseudomonas, the genus Rhodococcus, and the genus Staphylococcus. In addition, it can be understood that these enzyme sources have a predetermined hydrolyzing ability by considering both the description of the examples in this specification and the pamphlet of International Publication No. 2008/102720.
- examples of the enzyme source having the ability to stereoselectively hydrolyze cis-nipecotamide in which the carbon to which the CONH 2 group is bonded are in the S configuration include, for example, the genus Achromobacter, Capriavidus (Cupriavidus) ), An enzyme source derived from a microorganism selected from the group consisting of the genus Pseudomonas and the genus Rhodococcus.
- An enzyme source is mentioned. More preferably, Achromobacter xylosoxidans subspecies xylosoxidans subsp. Xylosoxidans NBRC13495, Capriavidus sp. Rhodococcus erythropolis IAM1440.
- examples of the enzyme source having the ability to stereoselectively hydrolyze cis-nipecotamide in which the carbon to which the CONH 2 group is bonded are in the R configuration include, for example, Brevibacterium genus, Pseudomonas (Pseudomonas). ), An enzyme source derived from a microorganism selected from the group consisting of the genus Pectobacteria and the genus Staphylococcus.
- Brevibacterium iodinum, Pseudomonas fragid, Pectobacterium carotobolum subspices, etc. Can be mentioned.
- Brevibacterium Yodenamu (Brevibacterium iodinum) NBRC3558, Pseudomonas fragi (Pseudomonas fragi) NBRC3458, Baek Doo Agrobacterium Karotoboramu subsp Karotoboramu (Pectobacterium carotovorum subsp. Carotovorum) NBRC12380, a Staphylococcus epidermidis (Staphylococcus epidermidis) JCM2414.
- the microorganisms can be obtained from patent microorganism deposit institutions and other research institutions.
- the microorganism specified by the NBRC number is specified by the Biological Resource Department of the National Institute of Technology and Evaluation
- the microorganism specified by the FERM number is specified by the Patent Organism Depositary, National Institute of Advanced Industrial Science and Technology, and the IAM number.
- Microorganisms to be identified are available from the Institute for Molecular Cell Biology, the University of Tokyo, Cell Function Information Research Center, and microorganisms identified by JCM numbers are available from the Institute for Microbial Materials Development, RIKEN BioResource Center.
- microorganism having the ability to produce a hydrolase derived from the microorganism may be a wild strain or a mutant strain.
- microorganisms derived by genetic techniques such as cell fusion or gene manipulation can also be used.
- the microorganism that produces the genetically engineered enzyme can be determined by isolating and / or purifying the enzyme to determine part or all of the amino acid sequence of the enzyme, as described in, for example, WO 98/35025.
- the recombinant microorganism as described above include a transformed microorganism transformed with a plasmid having a DNA encoding the hydrolase.
- Escherichia coli is preferable as the host microorganism.
- the stereoselective hydrolysis reaction of compound (2) in Method 4 can be performed, for example, by stirring the enzyme source and compound (2) in a suitable solvent (for example, water).
- a suitable solvent for example, water.
- an enzyme source that can be used for the stirring reaction, for example, a culture of the microorganism, a treated product thereof, and the immobilized enzyme are preferable.
- the reaction conditions vary depending on the enzyme source used, the substrate concentration, etc., but the substrate concentration is usually about 0.1 to 100% by weight, preferably 1 to 60% by weight, and the reaction temperature is 10 to 60 ° C., preferably 20 to
- the reaction time can be 1 to 120 hours at 50 ° C.
- the substrate can be added in a batch or continuously.
- the reaction can be carried out batchwise or continuously.
- the hydrolysis reaction by stirring may be performed under pH adjustment.
- the pH during the reaction for adjusting the pH is 4 to 11, preferably 6 to 9.
- the optically active compound (3) produced in Method 4 can be purified as necessary.
- the reaction solution containing the compound (3) produced by the hydrolysis reaction is demineralized using sodium hydroxide and extracted with an organic solvent such as ethyl acetate and toluene, and the organic solvent is distilled off under reduced pressure. Thereafter, it can be purified by a treatment such as distillation or chromatography.
- compound (3) may or may not contain compound (5). Even when the compound (5) is contained, the compound (5) can be removed by crystallizing at least one (preferably both) of the compound (3) and the compound (4).
- the compound (3) may be crystallized at an appropriate stage.
- the solution extracted with an organic solvent as described above may be crystallized by applying appropriate means such as concentration, solvent replacement, addition of a poor solvent, and cooling as appropriate.
- the filtrate obtained by removing microbial cells from the reaction solution may be subjected to neutralization crystallization using sodium hydroxide or the like, and the precipitated target product may be separated by filtration.
- the crystallization can increase at least one of the cis excess and optical purity (enantiomeric excess) of the compound (3), and preferably increases both the cis excess and optical purity (enantiomeric excess). be able to.
- the crystallization solvent for the compound (3) can be appropriately selected depending on the solubility of the compound (3), and the same reaction solvent as exemplified in the (A2) rearrangement step described later can be exemplified as the crystallization solvent.
- a preferred crystallization solvent is water when P 1 of the compound (3) is a hydrogen atom, and an ester solvent such as ethyl acetate when P 1 is an amino-protecting group.
- the compound (3) obtained as described above may have a cis isomer excess of 10% de or more, preferably 35% de or 40% de or more, and 50% de or more. Some are more preferred.
- the cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower.
- the cis-isomer excess rate of the compound (3) before crystallization may be the same as the cis-isomer excess rate of a compound (2).
- the cis excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 20% de or more, and even more preferably 30% de or more.
- the optical purity (enantiomeric excess) of the compound (3) obtained as described above is, for example, 30% ee or more, preferably 50% ee or more, more preferably 70% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less.
- the optical purity (enantiomeric excess) of the compound (3) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less.
- the optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
- the de-CO rearrangement reaction can be performed by reacting the compound (3) with an oxidizing agent and a base.
- the oxidizing agent include chlorine, bromine, and sodium hypochlorite, and sodium hypochlorite is preferable.
- the amount of the oxidizing agent to be used is not particularly limited, but is, for example, 1 to 10 mol, preferably 1 to 3 mol, relative to 1 mol of the compound (3).
- Examples of the base include metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, barium hydroxide, magnesium hydroxide; lithium methoxide, lithium ethoxide, sodium methoxide, sodium ethoxide, potassium methoxy Metal alkoxides such as potassium, ethoxide, potassium tert-butoxide and the like can be used.
- metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, barium hydroxide, magnesium hydroxide
- Metal alkoxides such as potassium, ethoxide, potassium tert-butoxide and the like can be used.
- lithium hydroxide, sodium hydroxide, and potassium hydroxide are used.
- the amount of the base used is not particularly limited, but is, for example, 0.5 to 30 mol, preferably 3 to 15 mol, with respect to 1
- the temperature of the de-CO rearrangement reaction is, for example, ⁇ 20 to 100 ° C., preferably ⁇ 5 to 70 ° C.
- the reaction time is, for example, 30 minutes to 24 hours, preferably 1 to 12 hours.
- a solvent in the de-CO rearrangement reaction, it is preferable to use a solvent, and as the solvent, water, an organic solvent, or the like can be used.
- the organic solvent include alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran (THF), 1,4-dioxane, ethylene glycol dimethyl ether and methyl tert-butyl ether; ester solvents such as ethyl acetate and isopropyl acetate.
- Solvents such as hydrocarbon solvents such as benzene, toluene, hexane, etc .; ketone solvents such as acetone and methyl ethyl ketone; nitrile solvents such as acetonitrile and propionitrile; halogen solvents such as methylene chloride and chloroform; N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide; sulfoxide solvents such as dimethyl sulfoxide; urea solvents such as dimethylpropylene urea; phosphonic acid solvents such as hexamethylphosphonic acid triamide Amide solvents. These reaction solvents may be used alone or in combination of two or more.
- water, tetrahydrofuran, and toluene are used.
- the amount of the solvent to be used is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (3).
- the addition method and the order of addition of the compound (3), oxidizing agent, base, and reaction solvent during the de-CO rearrangement reaction are not particularly limited, but it is preferable to add the oxidizing agent last in terms of yield improvement.
- the treatment method after the reaction is not particularly limited, but it is preferable to extract the target compound (4) by adding a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane and the like. Prior to this extraction, it is preferable to adjust the pH of the reaction solution to about 2-6, preferably about 3-5, and remove the organic layer. When the reaction solvent and the extraction solvent are distilled off from the resulting extract by an operation such as heating under reduced pressure, the target compound (4) is obtained.
- the compound (4) can be obtained as a crystal by crystallization or the like, which is preferable.
- the present invention is characterized in that the compound (4), which is a de-CO rearrangement reaction product, is crystallized. Is easy.
- the crystallization can increase at least one of the cis excess and optical purity (enantiomeric excess) of the compound (4), and preferably increases both the cis excess and optical purity (enantiomeric excess). be able to.
- the compound (4) when the compound (4) is a salt such as hydrochloride or p-toluenesulfonate, purification by crystallization becomes easier.
- crystallization solvent for the compound (4) examples include the same crystallization solvents as those exemplified in the de-CO rearrangement reaction step.
- Preferred crystallization solvents include ester solvents such as ethyl acetate; alcohol solvents such as ethanol and isopropanol; ether solvents such as tetrahydrofuran and methyl tert-butyl ether; ketone solvents such as acetone and methyl ethyl ketone; carbonization such as toluene and hexane. It is a hydrogen-based solvent.
- the compound (4) obtained as described above may have a cis isomer excess of 10% de or more, but is preferably 35% de or more or 40% de or more, preferably 80% de or more. Some are more preferable, more preferably 90% de or more, and most preferably 95% de or more or 99% de or more.
- the cis isomer excess may be 100% de, but may be 99.9% de or less.
- the cis-isomer excess of the compound (4) before crystallization is 10% de or more, for example, Preferably it is 35% de or more or 40% de or more Yes, more preferably 50% de or more or 60% de or more.
- the excess of cis form is improved by, for example, 0% de or more, preferably 2% de or more, more preferably 5% de or more, and even more preferably 10% de or more.
- the optical purity (enantiomeric excess) of the compound (4) obtained as described above is, for example, 50% ee or more, preferably 90% ee or more, more preferably 98% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less.
- the optical purity (enantiomeric excess) of the compound (4) before crystallization is, for example, 50% ee or more, preferably 90% ee or more.
- the optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 1% ee or more, more preferably 3% ee or more.
- Step B1 An optically active substance production step (Step B1) in which a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) (hereinafter sometimes referred to as compound (2a)) is an optically active substance; N obtained by reacting an optically active-cis-N unprotected nipecotamide (hereinafter sometimes referred to as compound (3a)) represented by the following formula (3a) obtained in the optically active substance production step with an amino group protecting reagent.
- a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) hereinafter sometimes referred to as compound (2a)
- N obtained by reacting an optically active-cis-N unprotected nipecotamide (hereinafter sometimes referred to as compound (3a)) represented by the following formula (3a) obtained in the optically active substance production step with an amino group protecting reagent.
- Step B2 Deprotection step (Step B2), and optically active-cis-N-protected nipecotamide (hereinafter sometimes referred to as compound (3b)) represented by the following formula (3b) obtained in the N protection step Rearrangement step to form an optically active-cis-N-protected aminopiperidine represented by the following formula (4a) (Step B3)
- Step B3 Means a process including
- R 1 Specific examples and preferred ranges of R 1 are the same as those in the above-mentioned “(A) Step of producing compound (4) from compound (2) and compound (3)”. Specific examples and preferred ranges of Pro are the same as P 1 except that no hydrogen atom is contained. Specific examples of the salt when the compound (2a), (3a), (3b), (4a) and the like are salts are the above-mentioned “(A) Compound (2), Compound (3) to Compound (4)”. This is the same as in the “manufacturing step”.
- compound (3a) and compound (3b) those in which the carbon to which R 1 group is bonded are in S configuration and the carbon to which CONH 2 group is bonded are in R configuration are preferable.
- the compound (4a) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
- (B1) Optically active substance production process The cis-isomer excess of compound (2a), which is a process raw material in this (B1) optically active substance production process, is the same as the cis-isomer excess of compound (2). The higher the cis isomer excess, the easier the crystallization of the compound (3a), the compound (3b), the compound (4a), etc.
- the details and preferred embodiments of the present (B1) optically active substance production step are the same as the above (A1) optically active substance production step, except that the process raw material is compound (2a) and the process product is compound (3a) It is.
- an optically active-cis-N unprotected nipecotic acid represented by the following formula (5a) (hereinafter referred to as compound (5a)) is obtained from the reaction solution in the (B1) optically active substance production step.
- the compound (3a) may be used in the next (B2) N protection step without separation.
- the compound (5a) can be separated by crystallization at an appropriate stage after the next step.
- the cis-isomer excess may be 10% de or more, but preferably 35% de or more or 40% de or more, What is 50% de or more is more preferable.
- the cis isomer excess may be 100% de, but may be 95% de or less, 90% de or less, or 85% de or less.
- the optical purity (enantiomeric excess) of the compound (3a) is, for example, 30% ee or more, preferably 50% ee or more, more preferably 70% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee, 99% ee or less, or 97% ee or less.
- the protective agent can be appropriately selected depending on the type of protective group (Pro), and includes acid anhydrides such as dialkyl dicarbonates (particularly ditert-butyl dicarbonate), alkyl chloroformates, benzyl chloroformates, alkyl halides, benzyl halides. Acid halides such as acetyl halide and benzoyl halide are preferred, di-tert-butyl dicarbonate and benzyl chloroformate are more preferred, and benzyl chloroformate is more preferred.
- the amount of the protective agent to be used is, for example, 0.5 to 10 mol, preferably 1.0 to 5 mol, per 1 mol of the compound (3a).
- Examples of the base include triethylamine, tri-n-butylamine, N-methylmorpholine, N-methylpiperidine, diisopropylethylamine, pyridine, N, N-dimethylaminopyridine, 1,4-diazabicyclo [2,2,2] octane, etc.
- Tertiary hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, barium hydroxide, magnesium hydroxide; metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate; lithium hydrogen carbonate Metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate; use metal alkoxides such as lithium methoxide, lithium ethoxide, sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide and potassium tert-butoxide Can .
- Triethylamine, lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, and potassium carbonate are preferable, and sodium hydroxide, potassium carbonate, and potassium hydroxide are more preferable.
- the amount of the base to be used is, for example, 0.1 to 10 mol, preferably 1.0 to 5 mol, per 1 mol of compound (3a).
- reaction solvent in the present (B2) N protection step the same solvent as the reaction solvent in the (A2) rearrangement step can be exemplified.
- Preferred are THF and water.
- the amount of the solvent used is not particularly limited, but is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (3a).
- the hydrolysis of the said protective agent advances. If the reaction is performed while gradually adding the protective agent and the base while controlling the pH of the reaction solution, hydrolysis of the protective agent can be suppressed.
- the pH of the reaction solution is preferably 6 to 14, and more preferably 7 to 13.
- the reaction temperature in the present (B2) N protection step is, for example, ⁇ 20 to 80 ° C., preferably 0 to 50 ° C.
- the reaction time is not particularly limited, but is, for example, 30 minutes to 24 hours, preferably 1 to 6 hours.
- the addition method and order of addition of the compound (3a), the base, the protective agent, and the reaction solvent in the (B2) N-protecting step are not particularly limited, but the base and the protective agent are added to the mixture of the compound (3a) and the reaction solvent. Is preferably added gradually while controlling the pH.
- the reaction solution obtained in the present (B2) N protection step may be used in the next step as it is, but may be post-treated as necessary.
- a general treatment for obtaining a product from the reaction solution may be performed.
- the extraction operation may be performed using a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane or the like for the reaction solution after completion of the reaction.
- N protection step it is preferable to crystallize the obtained compound (3b).
- the compound (3b) By crystallizing the compound (3b), at least one of the cis-isomer excess and the optical purity (enantiomeric excess), preferably both, can be increased. Further, even when the compound (3a) as the process raw material contains the compound (5), the compound (5) can be easily removed by this crystallization.
- the crystallization solvent for the compound (3b) can be appropriately selected according to the solubility of the compound (3b), and the same reaction solvent as exemplified in the (A2) rearrangement step can be exemplified as the crystallization solvent.
- Preferred crystallization solvents are ester solvents such as ethyl acetate, alcohol solvents such as ethanol and isopropanol, ether solvents such as tetrahydrofuran and methyl tert-butyl ether, ketone solvents such as acetone and methyl ethyl ketone, and carbonization such as toluene and hexane. It is a hydrogen-based solvent.
- the compound (3b) obtained in the present (B2) N-protecting step may have a cis isomer excess of 10% de or more, preferably 35% de or 40% de or more, 60% What is more than de is more preferable, and what is more than 70% de is most preferable.
- the cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower.
- the cis isomer excess of the compound (3b) before crystallization may be the same as the cis isomer excess of the compound (2a). The higher the cis isomer excess of the compound (3b) before crystallization, the easier the crystallization of the compound (3b).
- the cis isomer excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 30% de or more.
- the optical purity (enantiomeric excess) of the compound (3b) is, for example, 30% ee or more, preferably 70% ee or more, more preferably 90% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less.
- the optical purity (enantiomeric excess) of the compound (3b) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less.
- the optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
- (B3) Rearrangement Step The details and preferred embodiments of the present (B3) rearrangement step are the same as the (A2) rearrangement step except that the process raw material is the compound (3b) and the process product is the compound (4a). is there.
- the compound (4a) obtained by the rearrangement step may have a cis isomer excess of 10% de or more, preferably 40% de or more, more preferably 80% de or more. Preferably, it is more preferably 90% de or more, and most preferably 95% de or more or 99% de or more. The cis isomer excess may be 100% de, but may be 99.9% de or less.
- the excess of cis isomer of the compound (4a) before crystallization is, for example, 10% de or more, preferably 35% de or more or 40% de or more. Yes, more preferably 50% de or more or 60% de or more.
- the excess of cis form is improved by, for example, 0% de or more, preferably 2% de or more, more preferably 5% de or more, and even more preferably 10% de or more.
- the optical purity (enantiomeric excess) of the compound (4a) is, for example, 50% ee or more, preferably 90% ee or more, more preferably 98% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less.
- the optical purity (enantiomeric excess) of the compound (4a) before crystallization is, for example, 50% ee or more, preferably 90% ee or more.
- the optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 1% ee or more, more preferably 3% ee or more.
- Step C1 Step of producing compound (4a) from compound (2a), compound (2b) and compound (3b) “(C) Compound (2a), compound (2b), compound (3b) to compound (4a) "Manufacturing process" N-protection step (Step C1) in which a racemic-cis-N unprotected nipecotamide (compound (2a)) represented by the following formula (2a) is reacted with an amino group-protecting reagent;
- an optically active-cis-N-protected nipecotamide (compound (3b)) represented by the following formula (3b) obtained in the optically active substance production step is subjected to de-CO rearrangement reaction and represented by the following formula (4a): Optically active-cis
- R 1 Specific examples and preferred ranges of R 1 are the same as those in the above-mentioned “(A) Step of producing compound (4) from compound (2) and compound (3)”. Specific examples and preferred ranges of Pro are the same as P 1 except that no hydrogen atom is contained. Specific examples of the salt when the compounds (2a), (2b), (3b), (4a) and the like are salts are the above-mentioned “(A) Compound (2), Compound (3) to Compound (4)”. This is the same as in the “manufacturing step”.
- the compound (3b) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the CONH 2 group is bonded is in the R configuration.
- the compound (4a) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
- (C1) N-protection step The cis-isomer excess of compound (2a), which is the process raw material for this (C1) N-protection step, is the same as the cis-isomer excess of compound (2). The higher the cis isomer excess, the easier the crystallization of the compound (3b), the compound (4a), etc.
- the details and preferred embodiments of the present (C1) N protection step are the same as the (B2) N protection step except that the process raw material is the compound (2a) and the process product is the compound (2b).
- the cis isomer excess of compound (2b) is the same as the cis isomer excess of compound (2a), which is the process raw material.
- (C2) Optically active substance production process The details and preferred embodiments of the present (C2) optically active substance production process are the same as the above (A1) except that the process raw material is the compound (2b) and the process product is the compound (3b). ) The same as the optically active substance production process.
- the present (C2) optically active substance production step it is preferable to crystallize the obtained compound (3b).
- the compound (3b) By crystallizing the compound (3b), at least one of the cis-isomer excess and the optical purity, preferably both, can be increased. Further, the optically active-cis-N protected nipecotic acid represented by the following formula (5b) can be easily removed by this crystallization.
- the crystallization solvent for the compound (3b) can be appropriately selected according to the solubility of the compound (3b), and the same reaction solvent as exemplified in the (A2) rearrangement step can be exemplified as the crystallization solvent.
- a preferred crystallization solvent is an ester solvent such as ethyl acetate.
- the cis isomer excess may be 10% de or more, but preferably 35% de or more or 40% de or more, More preferable is 50% de or more, and most preferable is 70% de or more.
- the cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower.
- the cis isomer excess of the compound (3b) before crystallization may be the same as the cis isomer excess of the compound (2a). The higher the cis isomer excess of the compound (3b) before crystallization, the easier the crystallization of the compound (3b).
- the cis isomer excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 30% de or more.
- the optical purity (enantiomeric excess) of the compound (3b) is, for example, 30% ee or more, preferably 70% ee or more, more preferably 90% ee or more.
- the optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less.
- the optical purity (enantiomeric excess) of the compound (3b) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less.
- the optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
- (C3) Rearrangement Step The details and preferred aspects of the main (C3) rearrangement step are the same as the (B3) rearrangement step.
- step of producing (4a) it is desirable to purify at least one of the compound (3b) and the compound (4a) by crystallization, and it is more desirable to purify at least the compound (4a) by crystallization. It is most desirable to purify both 3b) and compound (4a) by crystallization. In each crystallization step, the cis isomer excess ratio and the optical purity (enantiomeric excess ratio) can be increased.
- (D) Reduction step It is possible to crystallize an aminopiperidine such as compound (4) and compound (4a) without protecting the exocyclic amino group.
- the rearrangement of (A2), (B3) and (C3) This is because the excess of the cis isomer of the compound (4) and the compound (4a) in the reaction solution in the step is high, and the reason why the cis isomer excess in the reaction solution can be increased is the compound (2), the compound (2a), This is because the cis-isomer excess of compound (2b) is high.
- the high cis-isomer excess of compound (2) and compound (2b) can be achieved by increasing the cis-isomer excess of compound (2a), in other words, the cis-isomer excess of compound (2a) is increased. If possible, it is possible to crystallize aminopiperidine such as compound (4) and compound (4a) without protecting the exocyclic amino group.
- the compound (2a) having a high cis isomer excess ratio is a reduction step (Step D) in which nicotinamide represented by the following formula (1) (hereinafter sometimes referred to as compound (1)) is hydrogenated in the presence of a metal catalyst. ).
- metal catalysts such as a palladium catalyst, a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst, a cobalt catalyst, and an iridium catalyst, and Pd / C and Pt 2 O are preferable.
- the amount of the catalyst is, for example, 0.005 to 0.5 parts by weight with respect to 1 part by weight of the compound (1).
- the compound (1) is reduced using hydrogen gas, and the pressure (absolute pressure) of the hydrogen gas is, for example, 0.1 to 1 MPa.
- reaction solvent in the present (D) reduction step the same reaction solvent as in the (A2) rearrangement step can be used, and these may be used alone or in combination of two or more.
- An alcohol solvent such as ethanol is preferred.
- the amount of the solvent to be used is, for example, 1 to 50 parts by weight, preferably 2 to 20 parts by weight with respect to 1 part by weight of the compound (1).
- the reaction temperature in this reduction step (D) is preferably not higher than the boiling point of the solvent, for example, 40 to 80 ° C.
- the reaction time of the reduction step (D) is not particularly limited, but is preferably 1 to 100 hours.
- the compound (2a) produced by the reaction can be isolated and purified by a conventional method. For example, when the filtrate obtained by removing the metal catalyst from the reaction solution is distilled off the reaction solvent by an operation such as heating under reduced pressure, the desired product is obtained.
- the compound (2a) thus obtained has a sufficient purity that can be used in the subsequent step, but for the purpose of further increasing the yield of the subsequent step or the purity of the compound obtained in the subsequent step,
- the purity may be further increased by a general purification method such as analysis, fractional distillation, column chromatography or the like.
- the method for deprotecting the protecting group of the amino group may be performed by a general method described in pages 696 to 926 of Green's Protective Groups in Organic Synthesis 4th edition (Publisher: John Wiley & Sons Inc.).
- a tert-butoxycarbonyl group, an acetyl group, and a benzoyl group are hydrolyzed by the action of an acid or a base.
- deprotection is carried out by hydrogenolysis of the compound (4a) by acting a hydrogen source in the presence of a metal catalyst.
- Examples of the base used for the hydrolysis include sodium hydroxide, potassium hydroxide, and lithium hydroxide.
- the amount of the base to be used is, for example, 1 to 20 mol, preferably 1 to 10 mol, per 1 mol of compound (4a).
- Examples of the acid used for the hydrolysis include mineral acids such as hydrogen chloride, hydrogen bromide, sulfuric acid and nitric acid; and sulfonic acids such as trifluoromethanesulfonic acid, paratoluenesulfonic acid and methanesulfonic acid.
- mineral acids such as hydrogen chloride, hydrogen bromide, and sulfuric acid
- sulfonic acids such as trifluoromethanesulfonic acid, paratoluenesulfonic acid and methanesulfonic acid.
- Preferred are hydrogen chloride, hydrogen bromide, and sulfuric acid, and more preferred is hydrogen chloride.
- the amount of the acid to be used is, for example, 1 to 50 mol, preferably 1 to 20 mol, per 1 mol of the compound (4a).
- the hydrolysis reaction temperature is, for example, 20 ° C. to 200 ° C., preferably 50 ° C. to 140 ° C.
- the reaction time for the hydrolysis is, for example, 1 to 40 hours, preferably 1 to 20 hours.
- reaction solvent for hydrolysis examples include water; alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran, 1,4-dioxane and ethylene glycol dimethyl ether. These may be used alone or in combination of two or more. When using 2 or more types together, the mixing ratio is not particularly limited. Alcohol solvents such as methanol, ethanol and isopropanol are preferred.
- the addition method and the order of addition of the compound (4a), acid or base, and reaction solvent in the hydrolysis reaction are not particularly limited. What is necessary is just to perform the general process for acquiring the target compound (4b) from a reaction liquid as a process after reaction.
- a reaction liquid for example, water is added to the reaction solution after completion of the reaction to neutralize it as necessary, and extraction is performed using a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane and the like.
- a compound (4b) is obtained.
- the compound (4b) can also be isolated by filtering off the target product precipitated in the reaction solution.
- Examples of the metal catalyst used for hydrogenolysis as deprotection include a metal catalyst such as a palladium catalyst, a platinum catalyst, a rhodium catalyst, and a ruthenium catalyst, preferably Pd / C.
- the amount of the catalyst is, for example, 0.005 to 0.5 parts by weight with respect to 1 part by weight of the compound (4a).
- the pressure (absolute pressure) of hydrogen gas used in hydrogenolysis is, for example, 0.1 to 1 MPa.
- reaction solvent for the hydrogenolysis the same solvents as those used in the (A2) rearrangement step can be used, and these may be used alone or in combination of two or more.
- Alcohol solvents such as ethanol and isopropanol are preferred.
- the amount of the solvent to be used is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (4a).
- the reaction temperature of the hydrogenolysis is, for example, not higher than the boiling point of the solvent, and preferably 40 to 80 ° C.
- the reaction time for hydrogenolysis is, for example, 1 to 100 hours.
- a general treatment for obtaining the target compound (4b) from the reaction solution may be performed.
- a compound (4b) is obtained by distilling off the reaction solvent from the filtrate from which the metal catalyst has been removed from the reaction solution by an operation such as heating under reduced pressure.
- the compound (4b) obtained as described above has sufficient purity as a pharmaceutical intermediate, but the reaction yield in the subsequent step using the pharmaceutical intermediate or the reaction product in the subsequent step In order to further increase the purity, the purity may be further increased by a general purification method such as crystallization, fractional distillation, or column chromatography. Furthermore, when the obtained compound (4b) is not a salt, the compound (4b) may be converted into a salt by treating the compound (4b) with an acid.
- Mineral acids such as hydrogen chloride (hydrochloric acid), hydrogen bromide, a sulfuric acid, nitric acid; trifluoromethanesulfonic acid, paratoluenesulfonic acid, methane
- sulfonic acids such as sulfonic acid.
- Preferred are hydrogen chloride (hydrochloric acid), hydrogen bromide, and sulfuric acid, and more preferred is hydrogen chloride (hydrochloric acid).
- the amount of the acid used for salt formation is, for example, 1 to 50 mol, preferably 1 to 20 mol, with respect to 1 mol of the non-salt compound (4b).
- the reaction temperature for salt formation is, for example, 20 ° C. to 200 ° C., preferably 50 ° C. to 140 ° C.
- the reaction time for salt formation is, for example, 1 to 40 hours, preferably 1 to 30 hours.
- Examples of the solvent for the salt formation reaction include water; alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran, 1,4-dioxane and ethylene glycol dimethyl ether; and ester solvents such as ethyl acetate and isopropyl acetate. It is done. These may be used alone or in combination of two or more. When using 2 or more types together, the mixing ratio is not particularly limited. Preferred are ethyl acetate and isopropanol.
- the addition method and the order of addition of the compound (4b), acid, and reaction solvent during the salt formation reaction are not particularly limited. What is necessary is just to perform the general process for acquiring a product from a reaction liquid as a process after salt formation reaction.
- the reaction solvent may be distilled off from the reaction solution by an operation such as heating under reduced pressure to isolate the compound (4b) as a salt with an acid, or crystallization may be further performed for the purpose of increasing purity.
- the solvent for crystallization is preferably an alcohol solvent such as methanol, ethanol or isopropanol; an ether solvent such as tetrahydrofuran, 1,4-dioxane or ethylene glycol dimethyl ether; an ester solvent such as ethyl acetate or isopropyl acetate; Hydrocarbon solvents such as benzene, toluene, xylene and hexane; halogen solvents such as methylene chloride, chloroform and chlorobenzene. These solvents may be used alone or in combination of two or more. More preferred are methanol, ethanol, ethyl acetate, toluene and the like.
- the compound (4b) can also be produced by subjecting the above-mentioned compound (3a) to a de-CO rearrangement reaction (Step F). Therefore, the manufacturing process which consists of the process (Step B1) which manufactures a compound (3a) from a compound (2a), and the process (Step F) which manufactures a compound (4b) from a compound (3a) is also 1 aspect of this invention.
- the immobilized enzyme used in the following Example was prepared according to the following Production Example 1.
- Production Example 1 Recombinant Escherichia coli expressing a gene derived from Capriavidus sp. KNK-J915 (FERM BP-10739) was concentrated and disrupted, and the enzyme in the disrupted solution was anion-exchange resin (trade name, manufactured by The Dow Chemical Company, trade name) "Duolite A568K"). After washing with water to remove unadsorbed components, the adsorbed resin was equilibrated to pH 8 with a 2% aqueous sodium hydroxide solution.
- the enzyme adsorbed on the resin was cross-linked with glutaraldehyde (GA) and immobilized on the resin. Thereafter, the remaining glutaraldehyde was inactivated with 0.05 M Tris buffer (pH 8) and washed with 2 M NaCl / 0.05 M Tris buffer to obtain an immobilized enzyme.
- Example 2 To 39.0 g of the aqueous solution of racemic-cis-6-methylnipecotamide (20a) obtained in Example 1 (6-methylnipecotamide (20a) pure amount 11.0 g), 335 mL of water and immobilized enzyme 14 .3 g (1.3 times weight) was added, and the mixture was stirred at 45 ° C. for 119 hours. After completion of the reaction, the immobilized enzyme was filtered off. Further, the filtered immobilized enzyme was washed with 110 ml of water.
- Example 5 Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) N-benzyloxycarbonyl- (2S, 5R) -2 obtained in Example 4 -Isopropanol solution 1 containing 1.7 g of methyl-5-aminopiperidine (40a) (optical purity (enantiomeric excess) 99.8% ee, cis isomer excess 96.2% de) in a concentration of 31.7% hydrochloric acid 0.0 g and 15 g of ethyl acetate were added.
- Example 6 Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) Obtained in the same manner as in Example 4, and then mixed with a trans isomer to obtain a cis isomer.
- 1.7 g of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) adjusted for excess (optical purity (enantiomeric excess) 98.7% ee, cis excess) 58.9% de) was added 1.0 g of an isopropanol solution containing 31.7% hydrochloric acid, 2.07 g of ethanol and 19.6 g of acetone.
- Example 7 Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) Obtained in the same manner as in Example 4, and then mixed with a trans isomer to obtain a cis isomer.
- 0.5 g of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) adjusted for excess (optical purity (enantiomeric excess) 98.6% ee, cis isomer excess) 38.9% de) was added 0.3 g of an isopropanol solution containing hydrochloric acid at a concentration of 31.7%, 0.2 g of ethanol, and 19.0 g of acetone.
- Example 9 Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) N-tert-butoxycarbonyl- (2S, 5R) obtained in Example 8 Ethyl acetate was added to 8.1 g (optical purity (enantiomeric excess) 97.5% ee, cis isomer excess 57.2% de) of -2-methyl-5-carbamoylpiperidine (31b) After adjusting the concentration so that the content was 25%, it was cooled to 5 ° C. and aged for 2 hours.
- the precipitated crystals were separated by filtration and dried to obtain 3.7 g of the title compound (31b) as white crystals (yield 45.9%).
- the optical purity (enantiomeric excess) was 99.9% ee, and the cis-isomer excess was 98.8% de.
- Example 10 Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) After obtaining in the same manner as in Example 8, the trans isomer and enantiomer were mixed.
- N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) (optical purity (enantiomeric excess) 91.2% ee) adjusted for cis isomer excess and optical purity 2.6 g of methyl tert-butyl ether and 2.6 g of hexane were added to 0.5 g of cis isomer excess 53.5% de), and the mixture was cooled to 5 ° C. and aged for 2 hours. The precipitated crystals were separated by filtration to obtain 0.3 g of the title compound (31b) as white crystals (yield 65.6%). The optical purity (enantiomeric excess) was 95.8% ee, and the cis isomer excess was 94.7% de.
- N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) obtained in Example 8 was added to 18.5 g of THF, 35.5 g of toluene, 17.4 mL of water, 30%. After adding 12.5 g (3.2 equivalents) of an aqueous sodium hydroxide solution and 23.5 g (1.3 equivalents) of a 12% aqueous sodium hypochlorite solution and stirring at 0 to 5 ° C. for 10 hours, For 6 hours. After completion of the reaction, 12.3 g (0.5 equivalent) of a 15% aqueous sodium sulfite solution was added and stirred for 15 minutes.
- Hydrochloric acid 12.4g was added, pH was adjusted to 4.7, and the organic layer was isolate
- Example 12 Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a) N-tert-butoxycarbonyl- (2S, 5R) obtained in Example 11 -2-Methyl-5-aminopiperidine (41a) 1.02 g (optical purity (enantiomeric excess) 97.6% ee, cis isomer excess 61.4% de) and paratoluenesulfonic acid monohydrate 0 0.5 g was added and tetrahydrofuran was added until the substrate concentration was 10%.
- Example 13 Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a) N-tert-butoxycarbonyl- (2S) obtained in the same manner as in Example 11 , 5R) -2-methyl-5-aminopiperidine (41a) 1.02 g (optical purity (enantiomeric excess) 97.8% ee, cis isomer excess 62.5% de) to paratoluenesulfonic acid monohydrate 0.5 g of the Japanese product was added, and methyl ethyl ketone was added until the substrate concentration was 7%.
- Compound (2), Compound (2a), Compound (2b), Compound (2bx), Compound (3), Compound (3a), Compound (3b), Compound (3bx), Compound (4), Compound (4a), Compound (4b) is useful as a pharmaceutical intermediate, and the method for producing these compounds is also useful as a method for producing a pharmaceutical intermediate.
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Abstract
Description
本発明は医薬品中間体として有用な光学活性-cis-アミノピペリジンに関する。 The present invention relates to an optically active cis-aminopiperidine useful as a pharmaceutical intermediate.
医薬品中間体として有用な光学活性-cis-アミノピペリジンとして、2-置換-5-アミノピペリジンが知られている(例えば、特許文献1)。この特許文献1は、ヤヌスキナーゼ(JAK)を阻害する化合物として、ピロロ[2,3-d]ピリミジニル、ピロロ[2,3-b]ピラジニル、ピロロ[2,3-d]ピリジニルアクリルアミドなどを開示しており、前記化合物を製造する中間工程として、下記の工程を開示している。下記の工程では2-置換-5-アミノピペリジンとしてのラセミ(2S,5R)-ベンジル-5-アミノ-2-メチルピペリジン-1-カルボキシラート(化合物(e))が製造されている。 2-Substituted-5-aminopiperidine is known as an optically active cis-aminopiperidine useful as a pharmaceutical intermediate (for example, Patent Document 1). This patent document 1 discloses pyrrolo [2,3-d] pyrimidinyl, pyrrolo [2,3-b] pyrazinyl, pyrrolo [2,3-d] pyridinylacrylamide and the like as compounds that inhibit Janus kinase (JAK). As an intermediate step for producing the compound, the following steps are disclosed. In the following steps, racemic (2S, 5R) -benzyl-5-amino-2-methylpiperidine-1-carboxylate (compound (e)) as 2-substituted-5-aminopiperidine is prepared.
しかし、前記ラセミ(2S,5R)-ベンジル-5-アミノ-2-メチルピペリジン-1-カルボキシラートは光学活性体ではないため、後の工程で光学活性体にする必要がある。またアミノピペリジンの2つの窒素原子の両方を保護した化合物(d)の精製を経て初めて環外アミノ基が保護されていないアミノピペリジン化合物(e)の精製が可能となり、簡便に純度の高い光学活性-cis-アミノピペリジンを製造することができない。さらに前記化合物(d)は、超臨界媒体を用いた光学活性カラムによって精製されており、極めて煩雑かつ非効率である。
本発明は上記の様な事情に着目してなされたものであって、その目的は、アミノピペリジンの2つのアミノ基の両方の保護を必須としなくても高純度な光学活性-cis-アミノピペリジンを製造可能な方法を提供することにある。
However, since the racemic (2S, 5R) -benzyl-5-amino-2-methylpiperidine-1-carboxylate is not an optically active substance, it must be converted into an optically active substance in a later step. In addition, it is possible to purify an aminopiperidine compound (e) in which the exocyclic amino group is not protected only after purification of the compound (d) in which both two nitrogen atoms of aminopiperidine are protected. -It is not possible to produce cis-aminopiperidine. Furthermore, the compound (d) is purified by an optically active column using a supercritical medium, and is extremely complicated and inefficient.
The present invention has been made paying attention to the circumstances as described above, and its object is to achieve high-purity optically active cis-aminopiperidine without requiring protection of both amino groups of aminopiperidine. It is to provide a method capable of manufacturing.
本発明者らは、前記課題を解決するために鋭意研究を重ねた結果、2-置換-5-アミノピペリジン又はその前駆体であるニペコタミドのシス/トランス比を適切な範囲にすると、アミノピペリジンの2つのアミノ基の両方の保護を必須としなくても高純度な光学活性-cis-アミノピペリジンを製造できることを見出し、本発明を完成した。 As a result of intensive studies to solve the above problems, the present inventors have determined that when the cis / trans ratio of 2-substituted-5-aminopiperidine or its precursor nipecotamide is within an appropriate range, aminopiperidine It has been found that a highly pure optically active-cis-aminopiperidine can be produced without requiring protection of both of two amino groups, and the present invention has been completed.
すなわち本発明は、以下の通りである。
[1] 下記式(2)で表されるラセミ-cis-ニペコタミドを光学活性体にする光学活性体製造工程、
前記光学活性体製造工程で得られた下記式(3)で表される光学活性-cis-ニペコタミドを脱CO転位反応させて下記式(4)で表される光学活性-cis-アミノピペリジンにする転位工程、
を有する光学活性-cis-アミノピペリジンの製造方法。
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基又はアミノ基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
[2] 前記式(2)で表されるラセミ-cis-ニペコタミドの下記式で求まるシス体過剰率が35%de以上である[1]に記載の光学活性-cis-アミノピペリジンの製造方法。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
[3] 前記式(3)で表される光学活性-cis-ニペコタミド及び前記式(4)で表される光学活性-cis-アミノピペリジンの一方又は両方を晶析し、シス体過剰率と光学純度の両方を高める[1]又は[2]に記載の製造方法。
[4] 下記式(2a)で表されるラセミ-cis-N無保護ニペコタミドを光学活性体にする光学活性体製造工程、
前記光学活性体製造工程で得られた下記式(3a)で表される光学活性-cis-N無保護ニペコタミドとアミノ基保護試薬とを反応させるN保護工程、
前記N保護工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミドを脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジンにする転位工程、
を有する[1]に記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。)
[5] 下記式(2a)で表されるラセミ-cis-N無保護ニペコタミドとアミノ基保護試薬とを反応させるN保護工程、
前記N保護工程で得られた下記式(2b)で表されるラセミ-cis-N保護ニペコタミドを光学活性体にする光学活性体製造工程、
前記光学活性体製造工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミドを脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジンにする転位工程、
を有する[1]に記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。)
[6] 前記式(2a)で表されるラセミ-cis-N無保護ニペコタミドの下記式で求まるシス体過剰率が35%de以上である[4]又は[5]に記載の光学活性-cis-アミノピペリジンの製造方法。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
[7] 前記式(3b)で表される光学活性-cis-N保護ニペコタミド及び前記式(4a)で表される光学活性-cis-N保護アミノピペリジンの一方又は両方を晶析し、シス体過剰率と光学純度の両方を高める[4]~[6]のいずれかに記載の光学活性-cis-アミノピペリジンの製造方法。
[8] 下記式(1)で表されるニコチンアミドを金属触媒の存在下で水素化して前記式(2a)で表されるラセミ-cis-N無保護ニペコタミドを製造する還元工程をさらに有する[4]~[7]のいずれかに記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1及びcisは前記と同じ。)
[9] 下記式(4a)で表される光学活性-cis-N保護アミノピペリジンを脱保護して下記式(4b)で表される光学活性-cis-N無保護アミノピペリジンを製造する脱保護工程をさらに有する[4]~[8]のいずれかに記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1、Pro、cis及び*は前記と同じ。)
[10] 下記式で求まるシス体過剰率が35%de~99%deである下記式(2)で表されるラセミ-cis-ニペコタミド。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。)
[11] 下記式(2a)又は下記式(2bx)で表されるラセミ-cis-ニペコタミド。
(式中、R1は炭素数1~10のアルキル基を示し、Pro(x)はアミノ基の保護基(ただし、t-ブトキシカルボニル基を除く)を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。)
[12] 下記式で求まるシス体過剰率が35%de~99%deである下記式(3)で表される光学活性-cis-ニペコタミド。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
[13] 下記式(3a)又は下記式(3bx)で表される光学活性-cis-ニペコタミド。
(式中、R1は炭素数1~10のアルキル基を示し、Pro(x)はアミノ基の保護基(ただし、t-ブトキシカルボニル基を除く)を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
[14] 下記式で求まるシス体過剰率が35%de以上である下記式(3)で表される光学活性-cis-ニペコタミドを晶析してシス体過剰率と光学純度の両方を高める光学活性-cis-ニペコタミドの精製方法。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
[15] 下記式で求まるシス体過剰率が35%de以上である下記式(4)で表される光学活性-cis-アミノピペリジンを晶析してシス体過剰率と光学純度の両方を高める光学活性-cis-アミノピペリジンの精製方法。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミノ基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
That is, the present invention is as follows.
[1] A process for producing an optically active substance using racemic-cis-nipecotamide represented by the following formula (2) as an optically active substance,
The optically active-cis-nipecotamide represented by the following formula (3) obtained in the optically active substance production step is subjected to de-CO rearrangement reaction to obtain an optically active-cis-aminopiperidine represented by the following formula (4). Dislocation process,
A process for producing optically active cis-aminopiperidine having
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents an R 1 group bonded to a piperidine ring and an amide group or amino group. (Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
[2] The process for producing an optically active cis-aminopiperidine according to [1], wherein the racemic-cis-nipecotamide represented by the formula (2) has a cis isomer excess determined by the following formula of 35% de or more.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
[3] Crystallizing one or both of the optically active cis-nipecotamide represented by the formula (3) and the optically active cis-aminopiperidine represented by the formula (4) The production method according to [1] or [2], which increases both purity.
[4] A process for producing an optically active substance in which a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) is used as an optically active substance;
An N-protecting step in which an optically active-cis-N unprotected nipecotamide represented by the following formula (3a) obtained in the optically active substance production step is reacted with an amino group protecting reagent;
The optically active-cis-N-protected aminopiperidine represented by the following formula (4a) is obtained by subjecting the optically active-cis-N-protected nipecotamide represented by the following formula (3b) obtained in the N-protecting step to de-CO rearrangement reaction. Dislocation process,
[1] The process for producing an optically active cis-aminopiperidine according to [1].
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
[5] An N-protecting step of reacting a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) with an amino group protecting reagent,
An optically active substance production step in which the racemic-cis-N-protected nipecotamide represented by the following formula (2b) obtained in the N-protecting step is used as an optically active substance;
The optically active-cis-N-protection represented by the following formula (4a) is obtained by subjecting the optically active-cis-N-protected nipecotamide represented by the following formula (3b) obtained in the optically active substance production step to a de-CO rearrangement reaction. Rearrangement step to aminopiperidine,
[1] The process for producing an optically active cis-aminopiperidine according to [1].
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
[6] The optically active-cis according to [4] or [5], wherein the racemic-cis-N unprotected nipecotamide represented by the formula (2a) has a cis isomer excess determined by the following formula of 35% de or more. -A process for the production of aminopiperidine.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
[7] Crystallizing one or both of the optically active-cis-N protected nipecotamide represented by the formula (3b) and the optically active-cis-N protected aminopiperidine represented by the formula (4a) The method for producing optically active-cis-aminopiperidine according to any one of [4] to [6], wherein both the excess ratio and the optical purity are increased.
[8] A reduction step of producing a racemic-cis-N unprotected nipecotamide represented by the above formula (2a) by hydrogenating nicotinamide represented by the following formula (1) in the presence of a metal catalyst [ [4] The process for producing an optically active cis-aminopiperidine according to any one of [7] to [7].
(In the formula, R 1 and cis are the same as above.)
[9] Deprotection to produce optically active-cis-N unprotected aminopiperidine represented by the following formula (4b) by deprotecting the optically active-cis-N protected aminopiperidine represented by the following formula (4a) The method for producing optically active-cis-aminopiperidine according to any one of [4] to [8], further comprising a step.
(In the formula, R 1 , Pro, cis and * are the same as above.)
[10] Racemic-cis-nipecotamide represented by the following formula (2) having a cis isomer excess ratio determined by the following formula of 35% de to 99% de.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (Indicates that
[11] Racemic-cis-nipecotamide represented by the following formula (2a) or the following formula (2bx).
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, and Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group), and cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship.)
[12] An optically active cis-nipecotamide represented by the following formula (3) having a cis isomer excess ratio determined by the following formula of 35% de to 99% de.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
[13] Optically active-cis-nipecotamide represented by the following formula (3a) or the following formula (3bx).
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, and Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group), and cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship, and * indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance. )
[14] An optically active cis-nipecotamide represented by the following formula (3) having a cis isomer excess of 35% de or more determined by the following formula is crystallized to enhance both the cis isomer excess and the optical purity. Purification of active-cis-nipecotamide.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
[15] Crystalline optically active-cis-aminopiperidine represented by the following formula (4) having a cis excess of 35% de or more determined by the following formula is used to increase both the cis excess and the optical purity. Optically active-cis-aminopiperidine purification method.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(In the formula, R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amino group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
なお本明細書において、アミン基を有する化合物、例えば、式(2)、式(2a)、式(2b)、又は式(2bx)で表されるラセミ-cis-ニペコタミド;式(3)、式(3a)、式(3b)、又は式(3bx)で表される光学活性-cis-ニペコタミド;式(4)、式(4a)、又は式(4b)で表される光学活性-cis-アミノピペリジンは、いずれも塩を含むものとして定義される。 In this specification, a compound having an amine group, for example, a racemic-cis-nipecotamide represented by the formula (2), the formula (2a), the formula (2b), or the formula (2bx); the formula (3), the formula (3a), optically active-cis-nipecotamide represented by formula (3b), or (3bx); optically active-cis-amino represented by formula (4), formula (4a), or formula (4b) Piperidine is defined as any salt.
本発明によればアミノピペリジンの2つのアミノ基の両方の保護を必須としなくても高純度な光学活性-cis-アミノピペリジンを製造できる。 According to the present invention, high-purity optically active cis-aminopiperidine can be produced without requiring protection of both two amino groups of aminopiperidine.
(A)化合物(2)、化合物(3)から化合物(4)を製造する工程
光学活性-cis-アミノピペリジンは下記式(4)で表され(以下、化合物(4)という場合がある)、該化合物(4)は、概略、
下記式(2)で表されるラセミ-cis-ニペコタミド(以下、化合物(2)という場合がある)を光学活性体にする光学活性体製造工程(Step A1)、及び
前記光学活性体製造工程で得られた式(3)で表される光学活性-cis-ニペコタミド(以下、化合物(3)という場合がある)を脱CO転位反応させて前記化合物(4)にする転位工程(Step A2)、
によって製造される。
(A) Process for producing compound (4) from compound (2) and compound (3) Optical activity-cis-aminopiperidine is represented by the following formula (4) (hereinafter sometimes referred to as compound (4)), The compound (4) is roughly
An optically active substance production step (Step A1) in which a racemic-cis-nipecotamide represented by the following formula (2) (hereinafter sometimes referred to as compound (2)) is made into an optically active substance; A rearrangement step (Step A2) in which the obtained optically active-cis-nipecotamide represented by the formula (3) (hereinafter sometimes referred to as compound (3)) is de-CO rearranged to give the compound (4),
Manufactured by.
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基又はアミノ基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。)
前記方法によれば、化合物(3)及び化合物(4)のいずれでも晶析が可能であり、高純度の化合物(4)を簡便に製造できる。特に化合物(4)の環外アミノ基を保護しなくても化合物(4)を晶析できる点で優れている。
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents an R 1 group bonded to a piperidine ring and an amide group or amino group. (Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
According to the said method, crystallization is possible in any of compound (3) and compound (4), and high-purity compound (4) can be easily produced. In particular, the compound (4) is excellent in that it can be crystallized without protecting the exocyclic amino group of the compound (4).
R1で示されるアルキル基としては、メチル基、エチル基、プロピル基(イソプロピル基を含む)、ブチル基、ペンチル基、ヘキシル基などが挙げられる。好ましくは炭素数が1~3のアルキル基が挙げられ、メチル基、エチル基、n-プロピル基、イソプロピル基などがより好ましく、メチル基が特に好ましい。 Examples of the alkyl group represented by R 1 include a methyl group, an ethyl group, a propyl group (including an isopropyl group), a butyl group, a pentyl group, and a hexyl group. Preferred are alkyl groups having 1 to 3 carbon atoms, more preferred are methyl, ethyl, n-propyl, isopropyl and the like, and particularly preferred is methyl.
P1で示されるアミノ基の保護基としては、Greene’s Protective Groups in Organic Synthesis 4th edition(出版社:John Wiley & Sons Inc.)696~926ページ記載の保護基が挙げられる。好ましくは、tert-ブトキシカルボニル基、ベンジルオキシカルボニル基などのカルバメート系保護基や、アセチル基、ベンゾイル基などのアシル系保護基、ベンジル基が挙げられる。より好ましくはカルバメート系保護基である。 Examples of the protecting group for the amino group represented by P 1 include protecting groups described in Green's Protective Groups in Organic Synthesis 4th edition (Publisher: John Wiley & Sons Inc.) pages 696-926. Preferred examples include carbamate protecting groups such as tert-butoxycarbonyl group and benzyloxycarbonyl group, acyl protecting groups such as acetyl group and benzoyl group, and benzyl group. More preferred is a carbamate protecting group.
なお化合物(2)のうち、シス体過剰率が35%de~99%deである化合物は、新規な化合物であり好ましい。
なお本明細書においてシス体過剰率とは下記式によって算出される値を意味する。
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
Of the compounds (2), those having a cis isomer excess of 35% de to 99% de are novel compounds and are preferred.
In the present specification, the cis isomer excess means a value calculated by the following formula.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
また、下記式(2a)で表される化合物(以下、化合物(2a)という場合がある)や下記式(2bx)で表される化合物(以下、化合物(2bx)という場合がある)も、新規な化合物であり、好ましい。 Further, a compound represented by the following formula (2a) (hereinafter sometimes referred to as compound (2a)) and a compound represented by the following formula (2bx) (hereinafter sometimes referred to as compound (2bx)) are also novel. And preferred.
(式中、R1及びcisは前記と同じである。Pro(x)は、水素原子及びt-ブトキシカルボニル基を含まない以外は、前記P1と同じである。) (In the formula, R 1 and cis are the same as described above. Pro (x) is the same as P 1 except that it does not contain a hydrogen atom and a t-butoxycarbonyl group.)
また化合物(3)のうち、シス体過剰率が35%de~99%deであるものも、新規な化合物であり好ましい。 Of the compounds (3), those having a cis isomer excess of 35% de to 99% de are also novel compounds and are preferable.
さらに化合物(3)のうち、下記式(3a)で表される化合物(以下、化合物(3a)という場合がある)や下記式(3bx)で表される化合物(以下、化合物(3bx)という場合がある)も、新規な化合物であり、好ましい。 Further, among compounds (3), a compound represented by the following formula (3a) (hereinafter sometimes referred to as compound (3a)) or a compound represented by the following formula (3bx) (hereinafter referred to as compound (3bx)) Are also novel compounds and are preferred.
(式中、R1、Pro(x)、cis、及び*は前記と同じ。) (In the formula, R 1 , Pro (x), cis, and * are the same as described above.)
化合物(3)としてはR1基が結合する炭素がS配置であり、CONH2基が結合する炭素がR配置となるものが好ましい。化合物(4)としてはR1基が結合する炭素がS配置であり、NH2基が結合する炭素がR配置となるものが好ましい。 The compound (3) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the CONH 2 group is bonded is in the R configuration. The compound (4) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
前記化合物(2)、化合物(2a)、化合物(2bx)、化合物(3)、化合物(3a)、化合物(3bx)、化合物(4)などは前述した通り、塩であってもよい。塩は各化合物の製造工程で生じたものであってもよく、塩ではない各化合物を酸で処理することで得られたものであってもよい。各化合物の塩としては、塩化水素、臭化水素、硫酸、硝酸等の鉱酸;トリフルオロメタンスルホン酸、パラトルエンスルホン酸、メタンスルホン酸等のスルホン酸類;酢酸、トリフルオロ酢酸などのカルボン酸類を酸成分として含む塩が挙げられ、好ましくは塩化水素、臭化水素、硫酸などを酸成分として含む塩が挙げられ、更に好ましくは塩化水素を酸成分として含む塩が挙げられる。 The compound (2), the compound (2a), the compound (2bx), the compound (3), the compound (3a), the compound (3bx), the compound (4) and the like may be a salt as described above. The salt may be produced in the production process of each compound, or may be obtained by treating each compound that is not a salt with an acid. Examples of salts of each compound include mineral acids such as hydrogen chloride, hydrogen bromide, sulfuric acid and nitric acid; sulfonic acids such as trifluoromethanesulfonic acid, paratoluenesulfonic acid and methanesulfonic acid; and carboxylic acids such as acetic acid and trifluoroacetic acid. Examples include salts containing acid components, preferably salts containing hydrogen chloride, hydrogen bromide, sulfuric acid and the like as acid components, and more preferably salts containing hydrogen chloride as an acid component.
(A1)光学活性体製造工程
本(A1)光学活性体製造工程の工程原料となる化合物(2)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、50%de以上であるものがより好ましい。シス体過剰率が高いほど、化合物(3)や化合物(4)の晶析が容易になる。シス体過剰率は100%deであってもよいが、99%de以下、97%de以下、90%de以下、80%de以下、又は70%de以下であってもよい。
(A1) Optically active substance production process This (A1) compound (2) used as a process raw material in the optically active substance production process may have an excess of cis isomer of 10% de or more, but 35% de or more or What is 40% de or more is preferable, and what is 50% de or more is more preferable. The higher the cis isomer excess, the easier the crystallization of the compound (3) or the compound (4). The cis isomer excess may be 100% de, but may be 99% de or less, 97% de or less, 90% de or less, 80% de or less, or 70% de or less.
光学活性体製造工程で化合物(2)から化合物(3)を製造する方法は特に限定されず、例えば、化合物(2)の一方の光学活性成分を選択的に異性化させて他方の光学活性成分に揃える方法(方法1)、化合物(2)の一方の光学活性成分に選択的に作用する分割剤を使用して光学活性体を取得する方法(方法2)、化学触媒又は酵素源などを用いて化合物(2)の一方の光学活性成分を選択的に用いて分解し、他方の光学活性成分を光学活性体として残す(好ましくは回収する)方法(方法3)などが挙げられ、方法3が好ましく、酵素源を用いる方法3が特に好ましい。 The method for producing compound (3) from compound (2) in the optically active substance production step is not particularly limited. For example, one optically active component of compound (2) is selectively isomerized to produce the other optically active component. Using a resolving agent that selectively acts on one optically active component of the compound (2) (method 2), a chemical catalyst or an enzyme source, etc. And a method (method 3) in which one optically active component of the compound (2) is selectively decomposed and the other optically active component is left as an optically active substance (preferably recovered). Preferably, method 3 using an enzyme source is particularly preferred.
酵素源を用いる方法3では、ラセミ-cis-ニペコタミド(2)の一方の光学活性成分を加水分解して下記式(5)で表される光学活性-cis-ニペコチン酸(以下、化合物(5)という場合がある)にし、他方の光学活性成分を光学活性-cis-ニペコタミド(3)として残す方法(方法4)が好ましい。 In Method 3 using an enzyme source, one optically active component of racemic-cis-nipecotamide (2) is hydrolyzed to give an optically active-cis-nipecotic acid represented by the following formula (5) (hereinafter referred to as Compound (5)). And the other optically active component is preferably left as optically active-cis-nipecotamide (3) (Method 4).
(式中、R1、P1、及び*は前記と同じ。cisはピペリジン環に結合するR1基とアミド基又はカルボン酸基とがシスの関係にあることを示す。) (In the formula, R 1 , P 1 , and * are the same as described above. Cis represents that the R 1 group bonded to the piperidine ring and the amide group or carboxylic acid group are in a cis relationship.)
前記方法4で使用する酵素源は、化合物(2)を光学選択的に化合物(5)に加水分解する能力を有すればよく、したがって酵素そのものの他、上記加水分解活性を有する微生物の培養物およびその処理物も含まれる。「微生物の培養物」とは、菌体を含む培養液あるいは培養菌体を意味し、「その処理物」とは、例えば、粗抽出液、凍結乾燥微生物体、アセトン乾燥微生物体、又はそれら菌体の磨砕物等を意味し、上記加水分解活性を有する限りはこれに含まれる。さらに酵素源は、前記酵素又は菌体を固定化したもの(固定化酵素、固定化菌体)などであってよい。 The enzyme source used in the method 4 only needs to have the ability to hydrolyze the compound (2) optically and selectively into the compound (5). Therefore, in addition to the enzyme itself, a culture of a microorganism having the above hydrolysis activity. And processed products thereof. “Microbial culture” means a culture solution or culture containing cells, and “processed product” means, for example, a crude extract, freeze-dried microorganism, acetone-dried microorganism, or these bacteria. It means a body ground product, etc., as long as it has the above hydrolytic activity. Furthermore, the enzyme source may be one obtained by immobilizing the enzyme or bacterial cells (immobilized enzyme, immobilized bacterial cells) or the like.
酵素又は菌体の固定化は、当業者に周知の方法(例えば架橋法、物理的吸着法、包括法等)で行うことができる。例えば、樹脂に酵素を固定化する場合、樹脂に酵素を吸着し、架橋剤を作用させればよい。前記樹脂としては、陰イオン交換樹脂などのイオン交換樹脂が好ましい。酵素に吸着させる前に樹脂を前処理してもよく、前処理としては、NaCl水溶液、純水などによる樹脂洗浄、アルカリ水(水酸化ナトリウム水溶液など)によるpH調整(好ましいpHは約7.5~8.5)、脱液などが含まれる。架橋剤としては、例えば、グルタルアルデヒドが挙げられる。架橋後、架橋剤を必要に応じて不活性化してもよく、グルタルアルデヒドの不活性化には、トリス緩衝液(濃度は、0.01~2M程度、pHは7.5~8.5程度)を使用するのが好ましい。架橋剤を不活性化した後の樹脂は、必要に応じて、NaCl水溶液で洗浄してもよい。 Immobilization of the enzyme or bacterial cells can be performed by methods well known to those skilled in the art (for example, a crosslinking method, a physical adsorption method, a comprehensive method, etc.). For example, when an enzyme is immobilized on a resin, the enzyme may be adsorbed on the resin and a crosslinking agent may be allowed to act. The resin is preferably an ion exchange resin such as an anion exchange resin. The resin may be pretreated before adsorbing to the enzyme. As pretreatment, the resin is washed with a NaCl aqueous solution, pure water or the like, and the pH is adjusted with alkaline water (sodium hydroxide aqueous solution or the like). To 8.5), including drainage. Examples of the crosslinking agent include glutaraldehyde. After cross-linking, the cross-linking agent may be inactivated if necessary. For inactivation of glutaraldehyde, a Tris buffer (concentration is about 0.01 to 2M, pH is about 7.5 to 8.5). ) Is preferred. The resin after inactivating the cross-linking agent may be washed with an aqueous NaCl solution as necessary.
ラセミの化合物(2)を光学活性を有する化合物(5)に光学選択的に加水分解する能力を有する酵素源としては、例えば、アクロモバクター(Achromobacter)属、ブレビバクテリウム(Brevibacterium)属、カプリアビダス(Cupriavidus)属、ペクトバクテリウム(Pectobacterium)属、シュードモナス(Pseudomonas)属、ロドコッカス(Rhodococcus)属、およびスタフィロコッカス(Staphylococcus)属からなる群から選ばれた微生物由来の酵素源が挙げられる。なおこれら酵素源が所定の加水分解能を有することは、本明細書の実施例の欄と国際公開第2008/102720号パンフレットとの両方の記載を合わせて考えれば理解できる。 Examples of the enzyme source having the ability to optically hydrolyze the racemic compound (2) to the optically active compound (5) include, for example, the genus Achromobacter, the genus Brevibacterium, the capriavidas Examples include an enzyme source derived from a microorganism selected from the group consisting of the genus (Cupriavidus), the genus Pectobacterium, the genus Pseudomonas, the genus Rhodococcus, and the genus Staphylococcus. In addition, it can be understood that these enzyme sources have a predetermined hydrolyzing ability by considering both the description of the examples in this specification and the pamphlet of International Publication No. 2008/102720.
前記酵素源のうち、CONH2基が結合する炭素がS配置となるcis-ニペコタミドを立体選択的に加水分解する能力を有する酵素源としては、例えば、アクロモバクター(Achromobacter)属、カプリアビダス(Cupriavidus)属、シュードモナス(Pseudomonas)属、ロドコッカス(Rhodococcus)属からなる群から選ばれた微生物由来の酵素源が挙げられる。好ましくは、アクロモバクター キシロソキシダンス サブスピーシーズ キシロソキシダンス(Achromobacter xylosoxidans subsp. xylosoxidans)、カプリアビダス エスピー(Cupriavidus sp.)、シュードモナス クロロラフィス(Pseudomonas chlororaphis)、ロドコッカス エリスロポリス(Rhodococcus erythropolis)等の微生物由来の酵素源が挙げられる。より好ましくは、アクロモバクター キシロソキシダンス サブスピーシーズ キシロソキシダンス(Achromobacter xylosoxidans subsp. xylosoxidans)NBRC13495、カプリアビダス エスピー(Cupriavidus sp.)KNK-J915株(FERM BP-10739)、シュードモナス クロロラフィス(Pseudomonas chlororaphis)NBRC3904、ロドコッカス エリスロポリス(Rhodococcus erythropolis)IAM1440である。 Among the enzyme sources, examples of the enzyme source having the ability to stereoselectively hydrolyze cis-nipecotamide in which the carbon to which the CONH 2 group is bonded are in the S configuration include, for example, the genus Achromobacter, Capriavidus (Cupriavidus) ), An enzyme source derived from a microorganism selected from the group consisting of the genus Pseudomonas and the genus Rhodococcus. Preferably, Achromobacter xylosoxidans subsp. Xylosoxidans, Capriavis sp., Pseudomonas chlororaris An enzyme source is mentioned. More preferably, Achromobacter xylosoxidans subspecies xylosoxidans subsp. Xylosoxidans NBRC13495, Capriavidus sp. Rhodococcus erythropolis IAM1440.
前記酵素源のうち、CONH2基が結合する炭素がR配置となるcis-ニペコタミドを立体選択的に加水分解する能力を有する酵素源としては、例えば、ブレビバクテリウム(Brevibacterium)属、シュードモナス(Pseudomonas)属、ペクトバクテリウム(Pectobacterium)属、スタフィロコッカス(Staphylococcus)属からなる群から選ばれた微生物由来の酵素源が挙げられる。好ましくは、ブレビバクテリウム ヨーデナム(Brevibacterium iodinum)、シュードモナス フラジ(Pseudomonas fragi)、ペクトバクテリウム カロトボラム サブスピーシーズ カロトボラム(Pectobacterium carotovorum subsp. carotovorum)、スタフィロコッカス エピデルミディス(Staphylococcus epidermidis)等の微生物由来の酵素源が挙げられる。より好ましくはブレビバクテリウム ヨーデナム(Brevibacterium iodinum)NBRC3558、シュードモナス フラジ(Pseudomonas fragi)NBRC3458、ペクトバクテリウム カロトボラム サブスピーシーズ カロトボラム(Pectobacterium carotovorum subsp. carotovorum)NBRC12380、スタフィロコッカス エピデルミディス(Staphylococcus epidermidis)JCM2414である。 Among the above-mentioned enzyme sources, examples of the enzyme source having the ability to stereoselectively hydrolyze cis-nipecotamide in which the carbon to which the CONH 2 group is bonded are in the R configuration include, for example, Brevibacterium genus, Pseudomonas (Pseudomonas). ), An enzyme source derived from a microorganism selected from the group consisting of the genus Pectobacteria and the genus Staphylococcus. Preferably, Brevibacterium iodinum, Pseudomonas fragid, Pectobacterium carotobolum subspices, etc. Can be mentioned. More preferably Brevibacterium Yodenamu (Brevibacterium iodinum) NBRC3558, Pseudomonas fragi (Pseudomonas fragi) NBRC3458, Baek Doo Agrobacterium Karotoboramu subsp Karotoboramu (Pectobacterium carotovorum subsp. Carotovorum) NBRC12380, a Staphylococcus epidermidis (Staphylococcus epidermidis) JCM2414.
前記各微生物は、特許微生物寄託機関やその他研究機関から入手可能である。例えば、NBRC番号で特定される微生物は、独立行政法人製品評価技術基盤機構生物遺伝資源部門、FERM番号で特定される微生物は、独立行政法人産業技術総合研究所特許生物寄託センター、IAM番号で特定される微生物は、東京大学分子細胞生物学研究所細胞機能情報研究センター、JCM番号で特定される微生物は、独立行政法人理化学研究所バイオリソースセンター微生物材料開発室より入手可能である。 The microorganisms can be obtained from patent microorganism deposit institutions and other research institutions. For example, the microorganism specified by the NBRC number is specified by the Biological Resource Department of the National Institute of Technology and Evaluation, the microorganism specified by the FERM number is specified by the Patent Organism Depositary, National Institute of Advanced Industrial Science and Technology, and the IAM number. Microorganisms to be identified are available from the Institute for Molecular Cell Biology, the University of Tokyo, Cell Function Information Research Center, and microorganisms identified by JCM numbers are available from the Institute for Microbial Materials Development, RIKEN BioResource Center.
また、前記微生物由来の加水分解酵素の産生能を有する微生物としては、野生株および変異株のうち、いずれでもよい。あるいは細胞融合又は遺伝子操作等の遺伝学的手法により誘導される微生物も用いることができる。遺伝子操作された本酵素を生産する微生物は、例えば、国際公開第98/35025号パンフレットに記載されたように、酵素を単離及び/又は精製して酵素のアミノ酸配列の一部又は全部を決定する工程、このアミノ酸配列に基づいて酵素をコードするDNA配列を得る工程、このDNAを他の微生物に導入して組換え微生物を得る工程、及びこの組換え微生物を培養して、本酵素を得る工程を含有する方法等により得ることができる。上記のような組換え微生物としては、前記加水分解酵素をコードするDNAを有するプラスミドで形質転換された形質転換微生物が挙げられる。また、宿主微生物としてはエシェリヒア・コリ(Escherichia coli)が好ましい。 In addition, the microorganism having the ability to produce a hydrolase derived from the microorganism may be a wild strain or a mutant strain. Alternatively, microorganisms derived by genetic techniques such as cell fusion or gene manipulation can also be used. The microorganism that produces the genetically engineered enzyme can be determined by isolating and / or purifying the enzyme to determine part or all of the amino acid sequence of the enzyme, as described in, for example, WO 98/35025. A step of obtaining a DNA sequence encoding the enzyme based on the amino acid sequence, a step of introducing the DNA into another microorganism to obtain a recombinant microorganism, and culturing the recombinant microorganism to obtain the enzyme It can be obtained by a method containing steps. Examples of the recombinant microorganism as described above include a transformed microorganism transformed with a plasmid having a DNA encoding the hydrolase. In addition, Escherichia coli is preferable as the host microorganism.
方法4における化合物(2)の立体選択的な加水分解反応は、例えば、酵素源と化合物(2)とを適当な溶媒(例えば、水)中で攪拌することで行うことができる。攪拌反応に使用し得る酵素源としては、例えば、前記微生物の培養物、その処理物、前記固定化酵素などが好ましい。反応条件は用いる酵素源、基質濃度等によって異なるが、通常、基質濃度は約0.1~100重量%、好ましくは1~60重量%であり、反応温度は10~60℃、好ましくは20~50℃であり、反応時間は1~120時間で行うことができる。基質は一括、又は連続的に添加して行うことができる。反応はバッチ方式又は連続方式で行うことができる。前記攪拌による加水分解反応は、pH調整下で行ってもよい。pH調整するときの反応時のpHは4~11、好ましくは6~9である。 The stereoselective hydrolysis reaction of compound (2) in Method 4 can be performed, for example, by stirring the enzyme source and compound (2) in a suitable solvent (for example, water). As an enzyme source that can be used for the stirring reaction, for example, a culture of the microorganism, a treated product thereof, and the immobilized enzyme are preferable. The reaction conditions vary depending on the enzyme source used, the substrate concentration, etc., but the substrate concentration is usually about 0.1 to 100% by weight, preferably 1 to 60% by weight, and the reaction temperature is 10 to 60 ° C., preferably 20 to The reaction time can be 1 to 120 hours at 50 ° C. The substrate can be added in a batch or continuously. The reaction can be carried out batchwise or continuously. The hydrolysis reaction by stirring may be performed under pH adjustment. The pH during the reaction for adjusting the pH is 4 to 11, preferably 6 to 9.
方法4で生じた光学活性な化合物(3)は、必要に応じて精製できる。例えば、加水分解反応で生じた化合物(3)を含む反応液を、水酸化ナトリウム等を用いて解塩し、酢酸エチル、トルエン等の有機溶媒で抽出し、有機溶媒を減圧下で留去した後、蒸留、又はクロマトグラフィー等の処理を行うことにより、精製できる。このようにして得られた化合物(3)は、化合物(5)を含んでいなくてもよく、含んでいてもよい。化合物(5)を含んでいても、化合物(3)及び化合物(4)の少なくとも一方(好ましくは両方)を晶析することによって、化合物(5)を除去できる。 The optically active compound (3) produced in Method 4 can be purified as necessary. For example, the reaction solution containing the compound (3) produced by the hydrolysis reaction is demineralized using sodium hydroxide and extracted with an organic solvent such as ethyl acetate and toluene, and the organic solvent is distilled off under reduced pressure. Thereafter, it can be purified by a treatment such as distillation or chromatography. Thus obtained compound (3) may or may not contain compound (5). Even when the compound (5) is contained, the compound (5) can be removed by crystallizing at least one (preferably both) of the compound (3) and the compound (4).
本発明では前記化合物(3)を適当な段階で、晶析してもよい。例えば、前記の様にして有機溶媒で抽出した溶液に、適宜、濃縮、溶媒置換、貧溶媒添加、冷却等の適当な手段を適用することで晶析してもよい。また、反応液から微生物菌体を除去したろ液を、水酸化ナトリウム等を用いて中和晶析し、析出した目的物をろ別してもよい。
前記晶析によって化合物(3)のシス体過剰率及び光学純度(鏡像体過剰率)の少なくとも一方を高めることができ、好ましくはシス体過剰率及び光学純度(鏡像体過剰率)の両方を高めることができる。
In the present invention, the compound (3) may be crystallized at an appropriate stage. For example, the solution extracted with an organic solvent as described above may be crystallized by applying appropriate means such as concentration, solvent replacement, addition of a poor solvent, and cooling as appropriate. Alternatively, the filtrate obtained by removing microbial cells from the reaction solution may be subjected to neutralization crystallization using sodium hydroxide or the like, and the precipitated target product may be separated by filtration.
The crystallization can increase at least one of the cis excess and optical purity (enantiomeric excess) of the compound (3), and preferably increases both the cis excess and optical purity (enantiomeric excess). be able to.
化合物(3)の晶析溶媒は、化合物(3)の溶解性に応じて適宜選択でき、後述する(A2)転位工程で例示する反応溶媒と同じものが晶析溶媒として例示できる。好ましい晶析溶媒は、化合物(3)のP1が水素原子の場合は水であり、P1がアミノ基の保護基の場合は酢酸エチルなどのエステル系溶媒である。 The crystallization solvent for the compound (3) can be appropriately selected depending on the solubility of the compound (3), and the same reaction solvent as exemplified in the (A2) rearrangement step described later can be exemplified as the crystallization solvent. A preferred crystallization solvent is water when P 1 of the compound (3) is a hydrogen atom, and an ester solvent such as ethyl acetate when P 1 is an amino-protecting group.
以上の様にして得られる化合物(3)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、50%de以上であるものがより好ましい。シス体過剰率は100%deであってもよいが、99%de以下、又は97%de以下であってもよい。なお化合物(3)を前記晶析によって精製する場合、晶析前の化合物(3)のシス体過剰率は、化合物(2)のシス体過剰率と同様であってもよい。晶析前の化合物(3)のシス体過剰率が高いほど、化合物(3)の晶析が容易になる。晶析によってシス体過剰率は、例えば、0%de以上、好ましくは10%de以上、より好ましくは20%de以上、よりさらに好ましくは30%de以上、向上する。 The compound (3) obtained as described above may have a cis isomer excess of 10% de or more, preferably 35% de or 40% de or more, and 50% de or more. Some are more preferred. The cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower. In addition, when refine | purifying a compound (3) by the said crystallization, the cis-isomer excess rate of the compound (3) before crystallization may be the same as the cis-isomer excess rate of a compound (2). The higher the cis isomer excess of the compound (3) before crystallization, the easier the crystallization of the compound (3). By crystallization, the cis excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 20% de or more, and even more preferably 30% de or more.
以上の様にして得られる化合物(3)の光学純度(鏡像体過剰率)は、例えば、30%ee以上であり、好ましくは50%ee以上であり、より好ましくは70%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99.9%ee以下であってもよい。なお化合物(3)を前記晶析によって精製する場合、晶析前の化合物(3)の光学純度(鏡像体過剰率)は、例えば、99%ee以下であってもよく、95%ee以下であってもよく、90%ee以下であってもよい。晶析によって光学純度(鏡像体過剰率)は、例えば、0%ee以上、好ましくは5%ee以上、より好ましくは8%ee以上、向上する。 The optical purity (enantiomeric excess) of the compound (3) obtained as described above is, for example, 30% ee or more, preferably 50% ee or more, more preferably 70% ee or more. The optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less. When the compound (3) is purified by crystallization, the optical purity (enantiomeric excess) of the compound (3) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less. The optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
(A2)転位工程
前記転位工程(A2)で化合物(3)から化合物(4)を製造する転位工程では、ホフマン転位などの様に、化合物RX-C(=O)-NH2のC(=O)が脱離してRXとNH2とが直接結合して化合物RX-NH2を生成する転位反応(脱CO転位反応)が行われる。
(A2) Rearrangement Step In the rearrangement step of producing the compound (4) from the compound (3) in the rearrangement step (A2), as in the Hoffman rearrangement, the compound R X —C (═O) —NH 2 C ( = O) is eliminated, and R X and NH 2 are directly bonded to form a rearrangement reaction (de-CO rearrangement reaction) to produce the compound R X —NH 2 .
脱CO転位反応は、前記化合物(3)に酸化剤と塩基を作用させることにより行うことができる。酸化剤としては、例えば、塩素、臭素、次亜塩素酸ナトリウムが挙げられ、好ましくは次亜塩素酸ナトリウムである。酸化剤の使用量としては特に限定されないが、前記化合物(3)1モルに対して、例えば、1~10モルであり、好ましくは1~3モルである。 The de-CO rearrangement reaction can be performed by reacting the compound (3) with an oxidizing agent and a base. Examples of the oxidizing agent include chlorine, bromine, and sodium hypochlorite, and sodium hypochlorite is preferable. The amount of the oxidizing agent to be used is not particularly limited, but is, for example, 1 to 10 mol, preferably 1 to 3 mol, relative to 1 mol of the compound (3).
塩基としては、例えば、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化バリウム、水酸化マグネシウム等の金属水酸化物;リチウムメトキシド、リチウムエトキシド、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウムtert-ブトキシド等の金属アルコキシドを用いることができる。好ましくは水酸化リチウム、水酸化ナトリウム、および水酸化カリウムが挙げられる。塩基の使用量としては特に限定されないが、前記化合物(3)1モルに対して、例えば、0.5~30モルであり、好ましくは3~15モルである。 Examples of the base include metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, barium hydroxide, magnesium hydroxide; lithium methoxide, lithium ethoxide, sodium methoxide, sodium ethoxide, potassium methoxy Metal alkoxides such as potassium, ethoxide, potassium tert-butoxide and the like can be used. Preferably, lithium hydroxide, sodium hydroxide, and potassium hydroxide are used. The amount of the base used is not particularly limited, but is, for example, 0.5 to 30 mol, preferably 3 to 15 mol, with respect to 1 mol of the compound (3).
脱CO転位反応の温度は、例えば、-20~100℃であり、好ましくは-5~70℃である。反応時間は、例えば、30分~24時間であり、好ましくは1~12時間である。 The temperature of the de-CO rearrangement reaction is, for example, −20 to 100 ° C., preferably −5 to 70 ° C. The reaction time is, for example, 30 minutes to 24 hours, preferably 1 to 12 hours.
脱CO転位反応では溶媒を使用するのが好ましく、該溶媒としては、水、有機溶媒などが使用できる。有機溶媒としては、メタノール、エタノール、イソプロパノール等のアルコール系溶媒;テトラヒドロフラン(THF)、1,4-ジオキサン、エチレングリコールジメチルエーテル、メチルtert-ブチルエーテル等のエーテル系溶媒;酢酸エチル、酢酸イソプロピル等のエステル系溶媒;ベンゼン、トルエン、ヘキサン等の炭化水素系溶媒;アセトン、メチルエチルケトン等のケトン系溶媒;アセトニトリル、プロピオニトリル等のニトリル系溶媒;塩化メチレン、クロロホルム等のハロゲン系溶媒;N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド等のアミド系溶媒;ジメチルスルホキシド等のスルホキシド系溶媒;シメチルプロピレンウレア等のウレア系溶媒;ヘキサメチルホスホン酸トリアミド等のホスホン酸トリアミド系溶媒が挙げられる。これらの反応溶媒は単独で用いてもよく、2種以上を併用してもよい。好ましくは、水、テトラヒドロフラン、トルエンである。
溶媒の使用量は前記化合物(3)1重量部に対し、例えば、2~50重量部、好ましくは5~20重量部である。
In the de-CO rearrangement reaction, it is preferable to use a solvent, and as the solvent, water, an organic solvent, or the like can be used. Examples of the organic solvent include alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran (THF), 1,4-dioxane, ethylene glycol dimethyl ether and methyl tert-butyl ether; ester solvents such as ethyl acetate and isopropyl acetate. Solvents; hydrocarbon solvents such as benzene, toluene, hexane, etc .; ketone solvents such as acetone and methyl ethyl ketone; nitrile solvents such as acetonitrile and propionitrile; halogen solvents such as methylene chloride and chloroform; N, N-dimethylformamide Amide solvents such as N, N-dimethylacetamide; sulfoxide solvents such as dimethyl sulfoxide; urea solvents such as dimethylpropylene urea; phosphonic acid solvents such as hexamethylphosphonic acid triamide Amide solvents. These reaction solvents may be used alone or in combination of two or more. Preferably, water, tetrahydrofuran, and toluene are used.
The amount of the solvent to be used is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (3).
脱CO転位反応の際の前記化合物(3)、酸化剤、塩基、及び反応溶媒の添加方法や添加順序は特に制限されないが、収量向上の観点から最後に酸化剤を滴下するのが好ましい。反応後の処理法は特に制限されないが、一般的な抽出溶媒、例えば酢酸エチル、ジエチルエーテル、塩化メチレン、トルエン、ヘキサン等を加えて目的物である化合物(4)を抽出することが好ましい。またこの抽出に先だって、反応液のpHを約2~6程度、好ましくは3~5程度に調整し、有機層を除去しておくことが好ましい。得られた抽出液から減圧加熱等の操作により、反応溶媒及び抽出溶媒を留去すると目的物である化合物(4)が得られる。 The addition method and the order of addition of the compound (3), oxidizing agent, base, and reaction solvent during the de-CO rearrangement reaction are not particularly limited, but it is preferable to add the oxidizing agent last in terms of yield improvement. The treatment method after the reaction is not particularly limited, but it is preferable to extract the target compound (4) by adding a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane and the like. Prior to this extraction, it is preferable to adjust the pH of the reaction solution to about 2-6, preferably about 3-5, and remove the organic layer. When the reaction solvent and the extraction solvent are distilled off from the resulting extract by an operation such as heating under reduced pressure, the target compound (4) is obtained.
特に本発明によれば、晶析などによって前記化合物(4)を結晶として取得でき、好ましい。国際公開第2008/102720号パンフレットに記載のホフマン転位生成物が結晶化しないことに比べると、本発明は脱CO転位反応生成物である化合物(4)が結晶化する点に特徴があり、精製が容易である。前記晶析によって化合物(4)のシス体過剰率及び光学純度(鏡像体過剰率)の少なくとも一方を高めることができ、好ましくはシス体過剰率及び光学純度(鏡像体過剰率)の両方を高めることができる。特に化合物(4)が塩酸塩、パラトルエンスルホン酸塩などの塩であると、晶析による精製がより容易になる。化合物(4)を塩として晶析するには、化合物(4)と、酸の存在下、晶析溶媒で処理するのが好ましい。 Particularly, according to the present invention, the compound (4) can be obtained as a crystal by crystallization or the like, which is preferable. Compared to the fact that the Hoffmann rearrangement product described in WO2008 / 102720 pamphlet does not crystallize, the present invention is characterized in that the compound (4), which is a de-CO rearrangement reaction product, is crystallized. Is easy. The crystallization can increase at least one of the cis excess and optical purity (enantiomeric excess) of the compound (4), and preferably increases both the cis excess and optical purity (enantiomeric excess). be able to. In particular, when the compound (4) is a salt such as hydrochloride or p-toluenesulfonate, purification by crystallization becomes easier. In order to crystallize the compound (4) as a salt, it is preferable to treat the compound (4) with a crystallization solvent in the presence of an acid.
化合物(4)の晶析溶媒としては、前記脱CO転位反応工程で例示する反応溶媒と同じものが晶析溶媒として例示できる。好ましい晶析溶媒は、酢酸エチルなどのエステル系溶媒;エタノール、イソプロパノールなどのアルコール系溶媒;テトラヒドロフラン、メチルtert-ブチルエーテルなどのエーテル系溶媒;アセトン、メチルエチルケトンなどのケトン系溶媒;トルエン、ヘキサンなどの炭化水素系溶媒である。 Examples of the crystallization solvent for the compound (4) include the same crystallization solvents as those exemplified in the de-CO rearrangement reaction step. Preferred crystallization solvents include ester solvents such as ethyl acetate; alcohol solvents such as ethanol and isopropanol; ether solvents such as tetrahydrofuran and methyl tert-butyl ether; ketone solvents such as acetone and methyl ethyl ketone; carbonization such as toluene and hexane. It is a hydrogen-based solvent.
以上の様にして得られる化合物(4)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、80%de以上であるものがより好ましく、90%de以上であるものがよりさらに好ましく、95%de以上又は99%de以上であるものが最も好ましい。シス体過剰率は100%deであってもよいが、99.9%de以下であってもよい。なお化合物(4)を前記晶析によって精製する場合、晶析前の化合物(4)のシス体過剰率は、例えば、10%de以上であり、好ましくは35%de以上又は40%de以上であり、より好ましくは50%de以上又は60%de以上である。化合物(4)のシス体過剰率が高いほど、化合物(4)の晶析が容易になる。晶析によってシス体過剰率は、例えば、0%de以上、好ましくは2%de以上、より好ましくは5%de以上、よりさらに好ましくは10%de以上向上する。 The compound (4) obtained as described above may have a cis isomer excess of 10% de or more, but is preferably 35% de or more or 40% de or more, preferably 80% de or more. Some are more preferable, more preferably 90% de or more, and most preferably 95% de or more or 99% de or more. The cis isomer excess may be 100% de, but may be 99.9% de or less. In addition, when refine | purifying a compound (4) by the said crystallization, the cis-isomer excess of the compound (4) before crystallization is 10% de or more, for example, Preferably it is 35% de or more or 40% de or more Yes, more preferably 50% de or more or 60% de or more. The higher the cis-isomer excess of compound (4), the easier the crystallization of compound (4). By crystallization, the excess of cis form is improved by, for example, 0% de or more, preferably 2% de or more, more preferably 5% de or more, and even more preferably 10% de or more.
以上の様にして得られる化合物(4)の光学純度(鏡像体過剰率)、例えば、50%ee以上であり、好ましくは90%ee以上であり、より好ましくは98%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99.9%ee以下であってもよい。化合物(4)を前記晶析によって精製する場合、晶析前の化合物(4)の光学純度(鏡像体過剰率)は、例えば、50%ee以上であり、好ましくは90%ee以上である。晶析によって光学純度(鏡像体過剰率)は、例えば、0%ee以上、好ましくは1%ee以上、より好ましくは3%ee以上向上する。 The optical purity (enantiomeric excess) of the compound (4) obtained as described above is, for example, 50% ee or more, preferably 90% ee or more, more preferably 98% ee or more. The optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less. When the compound (4) is purified by crystallization, the optical purity (enantiomeric excess) of the compound (4) before crystallization is, for example, 50% ee or more, preferably 90% ee or more. The optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 1% ee or more, more preferably 3% ee or more.
(B)化合物(2a)、化合物(3a)、化合物(3b)から化合物(4a)を製造する工程
前記「(A)化合物(2)、化合物(3)から化合物(4)を製造する工程」は、「(B)化合物(2a)、化合物(3a)、化合物(3b)から化合物(4a)を製造する工程」、「(C)化合物(2a)、化合物(2b)、化合物(3b)から化合物(4a)を製造する工程」などであることが好ましい。
(B) Step of producing compound (4a) from compound (2a), compound (3a), and compound (3b) “(A) Step of producing compound (4) from compound (2) and compound (3)” "(B) Step of producing compound (4a) from compound (2a), compound (3a), compound (3b)", "(C) From compound (2a), compound (2b), compound (3b)" The step of producing compound (4a) ”is preferred.
「(B)化合物(2a)、化合物(3a)、化合物(3b)から化合物(4a)を製造する工程」とは、
下記式(2a)で表されるラセミ-cis-N無保護ニペコタミド(以下、化合物(2a)という場合がある)を光学活性体にする光学活性体製造工程(Step B1)、
前記光学活性体製造工程で得られた下記式(3a)で表される光学活性-cis-N無保護ニペコタミド(以下、化合物(3a)という場合がある)とアミノ基保護試薬とを反応させるN保護工程(Step B2)、及び
前記N保護工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミド(以下、化合物(3b)という場合がある)を脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジンにする転位工程(Step B3)
を含む工程のことをいう。
“(B) Step of producing compound (4a) from compound (2a), compound (3a), compound (3b)”
An optically active substance production step (Step B1) in which a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) (hereinafter sometimes referred to as compound (2a)) is an optically active substance;
N obtained by reacting an optically active-cis-N unprotected nipecotamide (hereinafter sometimes referred to as compound (3a)) represented by the following formula (3a) obtained in the optically active substance production step with an amino group protecting reagent. Deprotection step (Step B2), and optically active-cis-N-protected nipecotamide (hereinafter sometimes referred to as compound (3b)) represented by the following formula (3b) obtained in the N protection step Rearrangement step to form an optically active-cis-N-protected aminopiperidine represented by the following formula (4a) (Step B3)
Means a process including
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。)
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
R1の具体例及び好ましい範囲は前記「(A)化合物(2)、化合物(3)から化合物(4)を製造する工程」の場合と同じである。またProの具体例及び好ましい範囲は、水素原子が含まれないこと以外は前記P1と同じである。前記化合物(2a)、(3a)、(3b)、(4a)などが塩である時の塩の具体例は、前記「(A)化合物(2)、化合物(3)から化合物(4)を製造する工程」の場合と同じである。 Specific examples and preferred ranges of R 1 are the same as those in the above-mentioned “(A) Step of producing compound (4) from compound (2) and compound (3)”. Specific examples and preferred ranges of Pro are the same as P 1 except that no hydrogen atom is contained. Specific examples of the salt when the compound (2a), (3a), (3b), (4a) and the like are salts are the above-mentioned “(A) Compound (2), Compound (3) to Compound (4)”. This is the same as in the “manufacturing step”.
化合物(3a)、化合物(3b)としてはR1基が結合する炭素がS配置であり、CONH2基が結合する炭素がR配置となるものが好ましい。化合物(4a)としてはR1基が結合する炭素がS配置であり、NH2基が結合する炭素がR配置となるものが好ましい。 As compound (3a) and compound (3b), those in which the carbon to which R 1 group is bonded are in S configuration and the carbon to which CONH 2 group is bonded are in R configuration are preferable. The compound (4a) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
(B1)光学活性体製造工程
本(B1)光学活性体製造工程の工程原料となる化合物(2a)のシス体過剰率は、前記化合物(2)のシス体過剰率と同様である。シス体過剰率が高いほど、化合物(3a)、化合物(3b)、化合物(4a)などの晶析が容易になる。
本(B1)光学活性体製造工程の詳細及び好ましい態様は、工程原料が化合物(2a)であり工程生成物が化合物(3a)である点以外は、前記(A1)光学活性体製造工程と同様である。
また、上記方法4が用いられる場合、(B1)光学活性体製造工程の反応液から、下記式(5a)で表される光学活性-cis-N無保護ニペコチン酸(以下、化合物(5a)という場合がある)を分離しないまま、化合物(3a)を次工程である(B2)N保護工程に用いてもよい。次工程以降の適当な段階で晶析することによって、化合物(5a)を分離できる。
(B1) Optically active substance production process The cis-isomer excess of compound (2a), which is a process raw material in this (B1) optically active substance production process, is the same as the cis-isomer excess of compound (2). The higher the cis isomer excess, the easier the crystallization of the compound (3a), the compound (3b), the compound (4a), etc.
The details and preferred embodiments of the present (B1) optically active substance production step are the same as the above (A1) optically active substance production step, except that the process raw material is compound (2a) and the process product is compound (3a) It is.
When the above method 4 is used, an optically active-cis-N unprotected nipecotic acid represented by the following formula (5a) (hereinafter referred to as compound (5a)) is obtained from the reaction solution in the (B1) optically active substance production step. The compound (3a) may be used in the next (B2) N protection step without separation. The compound (5a) can be separated by crystallization at an appropriate stage after the next step.
本(B1)光学活性体製造工程で得られる化合物(3a)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、50%de以上であるものがより好ましい。シス体過剰率は100%deであってもよいが、95%de以下、90%de以下、又は85%de以下であってもよい。
化合物(3a)の光学純度(鏡像体過剰率)は、例えば、30%ee以上であり、好ましくは50%ee以上であり、より好ましくは70%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99%ee以下であってもよく、97%ee以下であってもよい。
As the compound (3a) obtained in the present (B1) optically active substance production step, the cis-isomer excess may be 10% de or more, but preferably 35% de or more or 40% de or more, What is 50% de or more is more preferable. The cis isomer excess may be 100% de, but may be 95% de or less, 90% de or less, or 85% de or less.
The optical purity (enantiomeric excess) of the compound (3a) is, for example, 30% ee or more, preferably 50% ee or more, more preferably 70% ee or more. The optical purity (enantiomeric excess) may be 100% ee, 99% ee or less, or 97% ee or less.
(B2)N保護工程
本(B2)N保護工程では、工程原料である化合物(3a)に、塩基存在下で保護剤を作用させるのが好ましい。保護剤は、保護基(Pro)の種類に応じて適宜選択でき、二炭酸ジアルキル(特に、二炭酸ジtert-ブチル)等の酸無水物、クロロギ酸アルキル、クロロギ酸ベンジル、アルキルハライド、ベンジルハライド、アセチルハライド、ベンゾイルハライド等の酸ハロゲン化物などが好ましく、二炭酸ジtert-ブチル、クロロギ酸ベンジルがより好ましく、クロロギ酸ベンジルがさらに好ましい。保護剤の使用量は、前記化合物(3a)1モルに対して、例えば、0.5~10モルであり、好ましくは1.0~5モルである。
(B2) N-protecting step In this (B2) N-protecting step, it is preferable that a protecting agent is allowed to act on the compound (3a) as a raw material in the presence of a base. The protective agent can be appropriately selected depending on the type of protective group (Pro), and includes acid anhydrides such as dialkyl dicarbonates (particularly ditert-butyl dicarbonate), alkyl chloroformates, benzyl chloroformates, alkyl halides, benzyl halides. Acid halides such as acetyl halide and benzoyl halide are preferred, di-tert-butyl dicarbonate and benzyl chloroformate are more preferred, and benzyl chloroformate is more preferred. The amount of the protective agent to be used is, for example, 0.5 to 10 mol, preferably 1.0 to 5 mol, per 1 mol of the compound (3a).
塩基としては、例えば、トリエチルアミン、トリn-ブチルアミン、N-メチルモルホリン、N-メチルピペリジン、ジイソプロピルエチルアミン、ピリジン、N,N-ジメチルアミノピリジン、1,4-ジアザビシクロ[2,2,2]オクタン等の第3級アミン類;水酸化リチウム、水酸化ナトリウム、水酸化カリウム、水酸化バリウム、水酸化マグネシウム等の金属水酸化物;炭酸リチウム、炭酸ナトリウム、炭酸カリウム等の金属炭酸塩;炭酸水素リチウム、炭酸水素ナトリウム、炭酸水素カリウム等の金属炭酸水素塩;リチウムメトキシド、リチウムエトキシド、ナトリウムメトキシド、ナトリウムエトキシド、カリウムメトキシド、カリウムエトキシド、カリウムtert-ブトキシド等の金属アルコキシドを用いることができる。好ましくは、トリエチルアミン、水酸化リチウム、水酸化ナトリウム、水酸化カリウム、炭酸リチウム、炭酸ナトリウム、炭酸カリウムであり、更に好ましくは水酸化ナトリウム、炭酸カリウム、および水酸化カリウムである。塩基の使用量は、前記化合物(3a)1モルに対して、例えば、0.1~10モルであり、好ましくは1.0~5モルである。 Examples of the base include triethylamine, tri-n-butylamine, N-methylmorpholine, N-methylpiperidine, diisopropylethylamine, pyridine, N, N-dimethylaminopyridine, 1,4-diazabicyclo [2,2,2] octane, etc. Tertiary hydroxides; metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, barium hydroxide, magnesium hydroxide; metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate; lithium hydrogen carbonate Metal hydrogen carbonates such as sodium hydrogen carbonate and potassium hydrogen carbonate; use metal alkoxides such as lithium methoxide, lithium ethoxide, sodium methoxide, sodium ethoxide, potassium methoxide, potassium ethoxide and potassium tert-butoxide Can . Triethylamine, lithium hydroxide, sodium hydroxide, potassium hydroxide, lithium carbonate, sodium carbonate, and potassium carbonate are preferable, and sodium hydroxide, potassium carbonate, and potassium hydroxide are more preferable. The amount of the base to be used is, for example, 0.1 to 10 mol, preferably 1.0 to 5 mol, per 1 mol of compound (3a).
本(B2)N保護工程の反応溶媒としては、前記(A2)転位工程の反応溶媒と同じものが例示できる。好ましくはTHF、水である。溶媒の使用量は特に限定されないが、前記化合物(3a)1重量部に対して、例えば、2~50重量部、好ましくは5~20重量部である。 As the reaction solvent in the present (B2) N protection step, the same solvent as the reaction solvent in the (A2) rearrangement step can be exemplified. Preferred are THF and water. The amount of the solvent used is not particularly limited, but is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (3a).
なお、含水溶媒系で本(B2)N保護工程を実施する際には、前記保護剤の加水分解が進行する。反応液のpHを制御しつつ、前記保護剤と前記塩基を徐々に添加しながら反応を行うと、保護剤の加水分解を抑制できる。反応液のpHは、6~14が好ましく、7~13がさらに好ましい。 In addition, when performing this (B2) N protection process by a hydrous solvent system, the hydrolysis of the said protective agent advances. If the reaction is performed while gradually adding the protective agent and the base while controlling the pH of the reaction solution, hydrolysis of the protective agent can be suppressed. The pH of the reaction solution is preferably 6 to 14, and more preferably 7 to 13.
本(B2)N保護工程の反応温度は、例えば、-20~80℃であり、好ましくは0~50℃である。反応時間は特に制限されないが、例えば、30分~24時間であり、好ましくは1~6時間である。 The reaction temperature in the present (B2) N protection step is, for example, −20 to 80 ° C., preferably 0 to 50 ° C. The reaction time is not particularly limited, but is, for example, 30 minutes to 24 hours, preferably 1 to 6 hours.
本(B2)N保護工程での化合物(3a)、塩基、保護剤、及び反応溶媒の添加方法や添加順序は特に制限されないが、前記化合物(3a)と反応溶媒の混合物に、塩基と保護剤を、pHを制御しながら徐々に添加することが好ましい。 The addition method and order of addition of the compound (3a), the base, the protective agent, and the reaction solvent in the (B2) N-protecting step are not particularly limited, but the base and the protective agent are added to the mixture of the compound (3a) and the reaction solvent. Is preferably added gradually while controlling the pH.
本(B2)N保護工程で得られた反応液はそのまま次工程に用いてもよいが、必要に応じて後処理を行ってもよい。後処理としては、反応液から生成物を取得するための一般的な処理を行えばよい。例えば、反応終了後の反応液に一般的な抽出溶媒、例えば酢酸エチル、ジエチルエーテル、塩化メチレン、トルエン、ヘキサン等を用いて抽出操作を行えばよい。 The reaction solution obtained in the present (B2) N protection step may be used in the next step as it is, but may be post-treated as necessary. As the post-treatment, a general treatment for obtaining a product from the reaction solution may be performed. For example, the extraction operation may be performed using a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane or the like for the reaction solution after completion of the reaction.
特に本(B2)N保護工程では、得られた化合物(3b)を晶析することが好ましい。化合物(3b)を晶析することによって、シス体過剰率及び光学純度(鏡像体過剰率)の少なくとも一方、好ましくは両方を高める事ができる。また工程原料である化合物(3a)が化合物(5)を含む場合であっても、この晶析で化合物(5)を簡便に除去できる。 Particularly, in the present (B2) N protection step, it is preferable to crystallize the obtained compound (3b). By crystallizing the compound (3b), at least one of the cis-isomer excess and the optical purity (enantiomeric excess), preferably both, can be increased. Further, even when the compound (3a) as the process raw material contains the compound (5), the compound (5) can be easily removed by this crystallization.
化合物(3b)の晶析溶媒は、化合物(3b)の溶解性に応じて適宜選択でき、前記(A2)転位工程で例示する反応溶媒と同じものが晶析溶媒として例示できる。好ましい晶析溶媒は、酢酸エチルなどのエステル系溶媒、エタノール、イソプロパノールなどのアルコール系溶媒、テトラヒドロフラン、メチルtert-ブチルエーテルなどのエーテル系溶媒、アセトン、メチルエチルケトンなどのケトン系溶媒、トルエン、ヘキサンなどの炭化水素系溶媒である。 The crystallization solvent for the compound (3b) can be appropriately selected according to the solubility of the compound (3b), and the same reaction solvent as exemplified in the (A2) rearrangement step can be exemplified as the crystallization solvent. Preferred crystallization solvents are ester solvents such as ethyl acetate, alcohol solvents such as ethanol and isopropanol, ether solvents such as tetrahydrofuran and methyl tert-butyl ether, ketone solvents such as acetone and methyl ethyl ketone, and carbonization such as toluene and hexane. It is a hydrogen-based solvent.
本(B2)N保護工程で得られる化合物(3b)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、60%de以上であるものがより好ましく、70%de以上であるものが最も好ましい。シス体過剰率は100%deであってもよいが、99%de以下、又は97%de以下であってもよい。なお化合物(3b)を前記晶析によって精製する場合、晶析前の化合物(3b)のシス体過剰率は、化合物(2a)のシス体過剰率と同様であってもよい。晶析前の化合物(3b)のシス体過剰率が高いほど、化合物(3b)の晶析が容易になる。晶析によってシス体過剰率は、例えば、0%de以上、好ましくは10%de以上、より好ましくは30%de以上、向上する。
化合物(3b)の光学純度(鏡像体過剰率)は、例えば、30%ee以上であり、好ましくは70%ee以上であり、より好ましくは90%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99.9%ee以下であってもよい。なお化合物(3b)を前記晶析によって精製する場合、晶析前の化合物(3b)の光学純度(鏡像体過剰率)は、例えば、99%ee以下であってもよく、95%ee以下であってもよく、90%ee以下であってもよい。晶析によって光学純度(鏡像体過剰率)は、例えば、0%ee以上、好ましくは5%ee以上、より好ましくは8%ee以上、向上する。
The compound (3b) obtained in the present (B2) N-protecting step may have a cis isomer excess of 10% de or more, preferably 35% de or 40% de or more, 60% What is more than de is more preferable, and what is more than 70% de is most preferable. The cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower. When the compound (3b) is purified by crystallization, the cis isomer excess of the compound (3b) before crystallization may be the same as the cis isomer excess of the compound (2a). The higher the cis isomer excess of the compound (3b) before crystallization, the easier the crystallization of the compound (3b). By crystallization, the cis isomer excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 30% de or more.
The optical purity (enantiomeric excess) of the compound (3b) is, for example, 30% ee or more, preferably 70% ee or more, more preferably 90% ee or more. The optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less. When the compound (3b) is purified by crystallization, the optical purity (enantiomeric excess) of the compound (3b) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less. The optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
(B3)転位工程
本(B3)転位工程の詳細及び好ましい態様は、工程原料が化合物(3b)であり工程生成物が化合物(4a)である点以外は、前記(A2)転位工程と同様である。
(B3)転位工程によって得られる化合物(4a)としては、シス体過剰率が10%de以上であってもよいが、40%de以上であるものが好ましく、80%de以上であるものがより好ましく、90%de以上であるものがよりさらに好ましく、95%de以上又は99%de以上であるものが最も好ましい。シス体過剰率は100%deであってもよいが、99.9%de以下であってもよい。なお化合物(4a)を前記晶析によって精製する場合、晶析前の化合物(4a)のシス体過剰率は、例えば、10%de以上であり、好ましくは35%de以上又は40%de以上であり、より好ましくは50%de以上又は60%de以上である。化合物(4a)のシス体過剰率が高いほど、化合物(4a)の晶析が容易になる。晶析によってシス体過剰率は、例えば、0%de以上、好ましくは2%de以上、より好ましくは5%de以上、よりさらに好ましくは10%de以上向上する。
化合物(4a)の光学純度(鏡像体過剰率)は、例えば、50%ee以上であり、好ましくは90%ee以上であり、より好ましくは98%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99.9%ee以下であってもよい。化合物(4a)を前記晶析によって精製する場合、晶析前の化合物(4a)の光学純度(鏡像体過剰率)は、例えば、50%ee以上であり、好ましくは90%ee以上である。晶析によって光学純度(鏡像体過剰率)は、例えば、0%ee以上、好ましくは1%ee以上、より好ましくは3%ee以上、向上する。
(B3) Rearrangement Step The details and preferred embodiments of the present (B3) rearrangement step are the same as the (A2) rearrangement step except that the process raw material is the compound (3b) and the process product is the compound (4a). is there.
(B3) The compound (4a) obtained by the rearrangement step may have a cis isomer excess of 10% de or more, preferably 40% de or more, more preferably 80% de or more. Preferably, it is more preferably 90% de or more, and most preferably 95% de or more or 99% de or more. The cis isomer excess may be 100% de, but may be 99.9% de or less. When the compound (4a) is purified by crystallization, the excess of cis isomer of the compound (4a) before crystallization is, for example, 10% de or more, preferably 35% de or more or 40% de or more. Yes, more preferably 50% de or more or 60% de or more. The higher the cis-isomer excess of compound (4a), the easier the crystallization of compound (4a). By crystallization, the excess of cis form is improved by, for example, 0% de or more, preferably 2% de or more, more preferably 5% de or more, and even more preferably 10% de or more.
The optical purity (enantiomeric excess) of the compound (4a) is, for example, 50% ee or more, preferably 90% ee or more, more preferably 98% ee or more. The optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less. When the compound (4a) is purified by crystallization, the optical purity (enantiomeric excess) of the compound (4a) before crystallization is, for example, 50% ee or more, preferably 90% ee or more. The optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 1% ee or more, more preferably 3% ee or more.
(C)化合物(2a)、化合物(2b)、化合物(3b)から化合物(4a)を製造する工程
「(C)化合物(2a)、化合物(2b)、化合物(3b)から化合物(4a)を製造する工程」とは、
下記式(2a)で表されるラセミ-cis-N無保護ニペコタミド(化合物(2a))とアミノ基保護試薬とを反応させるN保護工程(Step C1)、
前記N保護工程で得られた下記式(2b)で表されるラセミ-cis-N保護ニペコタミド(以下、化合物(2b)という場合がある)を光学活性体にする光学活性体製造工程(Step C2)、及び
前記光学活性体製造工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミド(化合物(3b))を脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジン(化合物(4a))にする転位工程(Step C3)、
を含む工程のことをいう。
(C) Step of producing compound (4a) from compound (2a), compound (2b) and compound (3b) “(C) Compound (2a), compound (2b), compound (3b) to compound (4a) "Manufacturing process"
N-protection step (Step C1) in which a racemic-cis-N unprotected nipecotamide (compound (2a)) represented by the following formula (2a) is reacted with an amino group-protecting reagent;
An optically active substance production step (Step C2) using the racemic-cis-N protected nipecotamide (hereinafter sometimes referred to as compound (2b)) represented by the following formula (2b) obtained in the N-protecting step as an optically active substance And an optically active-cis-N-protected nipecotamide (compound (3b)) represented by the following formula (3b) obtained in the optically active substance production step is subjected to de-CO rearrangement reaction and represented by the following formula (4a): Optically active-cis-N-protected aminopiperidine (compound (4a)) rearrangement step (Step C3),
Means a process including
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。)
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
R1の具体例及び好ましい範囲は前記「(A)化合物(2)、化合物(3)から化合物(4)を製造する工程」の場合と同じである。またProの具体例及び好ましい範囲は、水素原子が含まれないこと以外は前記P1と同じである。前記化合物(2a)、(2b)、(3b)、(4a)などが塩である時の塩の具体例は、前記「(A)化合物(2)、化合物(3)から化合物(4)を製造する工程」の場合と同じである。 Specific examples and preferred ranges of R 1 are the same as those in the above-mentioned “(A) Step of producing compound (4) from compound (2) and compound (3)”. Specific examples and preferred ranges of Pro are the same as P 1 except that no hydrogen atom is contained. Specific examples of the salt when the compounds (2a), (2b), (3b), (4a) and the like are salts are the above-mentioned “(A) Compound (2), Compound (3) to Compound (4)”. This is the same as in the “manufacturing step”.
化合物(3b)としてはR1基が結合する炭素がS配置であり、CONH2基が結合する炭素がR配置となるものが好ましい。化合物(4a)としてはR1基が結合する炭素がS配置であり、NH2基が結合する炭素がR配置となるものが好ましい。 The compound (3b) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the CONH 2 group is bonded is in the R configuration. The compound (4a) is preferably such that the carbon to which the R 1 group is bonded is in the S configuration and the carbon to which the NH 2 group is bonded is in the R configuration.
(C1)N保護工程
本(C1)N保護工程の工程原料となる化合物(2a)のシス体過剰率は、前記化合物(2)のシス体過剰率と同様である。シス体過剰率が高いほど、化合物(3b)、化合物(4a)などの晶析が容易になる。
本(C1)N保護工程の詳細及び好ましい態様は、工程原料が化合物(2a)であり工程生成物が化合物(2b)である点以外は、前記(B2)N保護工程と同様である。
化合物(2b)のシス体過剰率は、工程原料である化合物(2a)のシス体過剰率と同様である。
(C1) N-protection step The cis-isomer excess of compound (2a), which is the process raw material for this (C1) N-protection step, is the same as the cis-isomer excess of compound (2). The higher the cis isomer excess, the easier the crystallization of the compound (3b), the compound (4a), etc.
The details and preferred embodiments of the present (C1) N protection step are the same as the (B2) N protection step except that the process raw material is the compound (2a) and the process product is the compound (2b).
The cis isomer excess of compound (2b) is the same as the cis isomer excess of compound (2a), which is the process raw material.
(C2)光学活性体製造工程
本(C2)光学活性体製造工程の詳細及び好ましい態様は、工程原料が化合物(2b)であり工程生成物が化合物(3b)である点以外は、前記(A1)光学活性体製造工程と同様である。
(C2) Optically active substance production process The details and preferred embodiments of the present (C2) optically active substance production process are the same as the above (A1) except that the process raw material is the compound (2b) and the process product is the compound (3b). ) The same as the optically active substance production process.
特に本(C2)光学活性体製造工程では、得られた化合物(3b)を晶析することが好ましい。化合物(3b)を晶析することによって、シス体過剰率及び光学純度の少なくとも一方、好ましくは両方を高める事ができる。またこの晶析で下記式(5b)で表される光学活性-cis-N保護ニペコチン酸を簡便に除去できる。 In particular, in the present (C2) optically active substance production step, it is preferable to crystallize the obtained compound (3b). By crystallizing the compound (3b), at least one of the cis-isomer excess and the optical purity, preferably both, can be increased. Further, the optically active-cis-N protected nipecotic acid represented by the following formula (5b) can be easily removed by this crystallization.
化合物(3b)の晶析溶媒は、化合物(3b)の溶解性に応じて適宜選択でき、前記(A2)転位工程で例示する反応溶媒と同じものが晶析溶媒として例示できる。好ましい晶析溶媒は、酢酸エチルなどのエステル系溶媒である。 The crystallization solvent for the compound (3b) can be appropriately selected according to the solubility of the compound (3b), and the same reaction solvent as exemplified in the (A2) rearrangement step can be exemplified as the crystallization solvent. A preferred crystallization solvent is an ester solvent such as ethyl acetate.
本(C2)光学活性体製造工程で得られる化合物(3b)としては、シス体過剰率が10%de以上であってもよいが、35%de以上又は40%de以上であるものが好ましく、50%de以上であるものがより好ましく、70%de以上であるものが最も好ましい。シス体過剰率は100%deであってもよいが、99%de以下、又は97%de以下であってもよい。なお化合物(3b)を前記晶析によって精製する場合、晶析前の化合物(3b)のシス体過剰率は、化合物(2a)のシス体過剰率と同様であってもよい。晶析前の化合物(3b)のシス体過剰率が高いほど、化合物(3b)の晶析が容易になる。晶析によってシス体過剰率は、例えば、0%de以上、好ましくは10%de以上、より好ましくは30%de以上、向上する。
化合物(3b)の光学純度(鏡像体過剰率)は、例えば、30%ee以上であり、好ましくは70%ee以上であり、より好ましくは90%ee以上である。光学純度(鏡像体過剰率)は100%eeであってもよく、99.9%ee以下であってもよい。なお化合物(3b)を前記晶析によって精製する場合、晶析前の化合物(3b)の光学純度(鏡像体過剰率)は、例えば、99%ee以下であってもよく、95%ee以下であってもよく、90%ee以下であってもよい。晶析によって光学純度(鏡像体過剰率)は、例えば、0%ee以上、好ましくは5%ee以上、より好ましくは8%ee以上、向上する。
As the compound (3b) obtained in the present (C2) optically active substance production step, the cis isomer excess may be 10% de or more, but preferably 35% de or more or 40% de or more, More preferable is 50% de or more, and most preferable is 70% de or more. The cis isomer excess may be 100% de, but may be 99% de or lower, or 97% de or lower. When the compound (3b) is purified by crystallization, the cis isomer excess of the compound (3b) before crystallization may be the same as the cis isomer excess of the compound (2a). The higher the cis isomer excess of the compound (3b) before crystallization, the easier the crystallization of the compound (3b). By crystallization, the cis isomer excess is improved by, for example, 0% de or more, preferably 10% de or more, more preferably 30% de or more.
The optical purity (enantiomeric excess) of the compound (3b) is, for example, 30% ee or more, preferably 70% ee or more, more preferably 90% ee or more. The optical purity (enantiomeric excess) may be 100% ee or 99.9% ee or less. When the compound (3b) is purified by crystallization, the optical purity (enantiomeric excess) of the compound (3b) before crystallization may be, for example, 99% ee or less, and 95% ee or less. It may be 90% ee or less. The optical purity (enantiomeric excess) is improved by crystallization, for example, 0% ee or more, preferably 5% ee or more, more preferably 8% ee or more.
(C3)転位工程
本(C3)転位工程の詳細及び好ましい態様は、前記(B3)転位工程と同じである。
(C3) Rearrangement Step The details and preferred aspects of the main (C3) rearrangement step are the same as the (B3) rearrangement step.
「(B)化合物(2a)、化合物(3a)、化合物(3b)から化合物(4a)を製造する工程」、及び「(C)化合物(2a)、化合物(2b)、化合物(3b)から化合物(4a)を製造する工程」では、化合物(3b)及び化合物(4a)の少なくとも一方を晶析で精製することが望ましく、少なくとも化合物(4a)を晶析で精製することがより望ましく、化合物(3b)及び化合物(4a)の両方を晶析で精製することが最も望ましい。各晶析工程で、シス体過剰率や光学純度(鏡像体過剰率)を高めることができる。 “(B) Compound (2a), Compound (3a), Step of Producing Compound (4a) from Compound (3b)”, and “(C) Compound (2a), Compound (2b), Compound from Compound (3b)” In the step of producing (4a), it is desirable to purify at least one of the compound (3b) and the compound (4a) by crystallization, and it is more desirable to purify at least the compound (4a) by crystallization. It is most desirable to purify both 3b) and compound (4a) by crystallization. In each crystallization step, the cis isomer excess ratio and the optical purity (enantiomeric excess ratio) can be increased.
(D)還元工程
化合物(4)及び化合物(4a)の様なアミノピペリジンを、その環外アミノ基を保護することなく晶析できるのは、(A2)、(B3)、(C3)の転位工程での反応液中の化合物(4)及び化合物(4a)のシス体過剰率が高いためであり、反応液中のシス体過剰率を高くできるのは化合物(2)、化合物(2a)、化合物(2b)のシス体過剰率が高いためである。化合物(2)、化合物(2b)の高シス体過剰率は、化合物(2a)のシス体過剰率を高くすることで達成可能であり、換言すれば化合物(2a)のシス体過剰率を高くできれば、化合物(4)及び化合物(4a)の様なアミノピペリジンを、その環外アミノ基を保護することなく晶析可能となる。シス体過剰率の高い化合物(2a)は、下記式(1)で表されるニコチンアミド(以下、化合物(1)という場合がある)を金属触媒の存在下で水素化する還元工程(Step D)によって製造できる。
(D) Reduction step It is possible to crystallize an aminopiperidine such as compound (4) and compound (4a) without protecting the exocyclic amino group. The rearrangement of (A2), (B3) and (C3) This is because the excess of the cis isomer of the compound (4) and the compound (4a) in the reaction solution in the step is high, and the reason why the cis isomer excess in the reaction solution can be increased is the compound (2), the compound (2a), This is because the cis-isomer excess of compound (2b) is high. The high cis-isomer excess of compound (2) and compound (2b) can be achieved by increasing the cis-isomer excess of compound (2a), in other words, the cis-isomer excess of compound (2a) is increased. If possible, it is possible to crystallize aminopiperidine such as compound (4) and compound (4a) without protecting the exocyclic amino group. The compound (2a) having a high cis isomer excess ratio is a reduction step (Step D) in which nicotinamide represented by the following formula (1) (hereinafter sometimes referred to as compound (1)) is hydrogenated in the presence of a metal catalyst. ).
(式中、R1及びcisは前記と同じ。)
(In the formula, R 1 and cis are the same as above.)
前記金属触媒としては、パラジウム触媒、白金触媒、ロジウム触媒、ルテニウム触媒、ニッケル触媒、コバルト触媒、イリジウム触媒等の金属触媒が挙げられ、好ましくはPd/C、Pt2Oである。 Examples of the metal catalyst include metal catalysts such as a palladium catalyst, a platinum catalyst, a rhodium catalyst, a ruthenium catalyst, a nickel catalyst, a cobalt catalyst, and an iridium catalyst, and Pd / C and Pt 2 O are preferable.
触媒量は、前記化合物(1)1重量部に対して、例えば、0.005~0.5重量部である。
本(D)還元工程では、水素ガスを用いて化合物(1)を還元し、該水素ガスの圧力(絶対圧)は、例えば、0.1~1MPaである。
The amount of the catalyst is, for example, 0.005 to 0.5 parts by weight with respect to 1 part by weight of the compound (1).
In this reduction step (D), the compound (1) is reduced using hydrogen gas, and the pressure (absolute pressure) of the hydrogen gas is, for example, 0.1 to 1 MPa.
本(D)還元工程の反応溶媒としては、前記(A2)転位工程の反応溶媒と同様のものが使用でき、これらは単独で用いてもよく、2種以上を併用してもよい。好ましくはエタノールなどのアルコール系溶媒である。溶媒の使用量は、前記化合物(1)1重量部に対して、例えば、1~50重量部、好ましくは2~20重量部である。 As the reaction solvent in the present (D) reduction step, the same reaction solvent as in the (A2) rearrangement step can be used, and these may be used alone or in combination of two or more. An alcohol solvent such as ethanol is preferred. The amount of the solvent to be used is, for example, 1 to 50 parts by weight, preferably 2 to 20 parts by weight with respect to 1 part by weight of the compound (1).
本(D)還元工程の反応温度は、溶媒の沸点以下であるのが好ましく、例えば、40~80℃である。本(D)還元工程の反応時間は特に制限されないが、好ましくは1~100時間である。 The reaction temperature in this reduction step (D) is preferably not higher than the boiling point of the solvent, for example, 40 to 80 ° C. The reaction time of the reduction step (D) is not particularly limited, but is preferably 1 to 100 hours.
反応で生じた化合物(2a)は、常法により単離、精製できる。例えば、反応液から金属触媒を除去したろ液を減圧加熱等の操作により反応溶媒を留去すると、目的物が得られる。 The compound (2a) produced by the reaction can be isolated and purified by a conventional method. For example, when the filtrate obtained by removing the metal catalyst from the reaction solution is distilled off the reaction solvent by an operation such as heating under reduced pressure, the desired product is obtained.
このようにして得られた化合物(2a)は、後続工程に使用できる十分な純度を有しているが、後続工程の収率、若しくは後続工程で得られる化合物の純度をさらに高める目的で、晶析、分別蒸留、カラムクロマトグラフィー等の一般的な精製手法により、さらに純度を高めてもよい。 The compound (2a) thus obtained has a sufficient purity that can be used in the subsequent step, but for the purpose of further increasing the yield of the subsequent step or the purity of the compound obtained in the subsequent step, The purity may be further increased by a general purification method such as analysis, fractional distillation, column chromatography or the like.
(E)脱保護工程
前記「(B)化合物(2a)、化合物(3a)、化合物(3b)から化合物(4a)を製造する工程」、及び「(C)化合物(2a)、化合物(2b)、化合物(3b)から化合物(4a)を製造する工程」で化合物(4a)を得た後、必要に応じて該化合物(4a)を脱保護して下記式(4b)で表される光学活性-cis-N無保護アミノピペリジン(以下、化合物(4b)という場合がある)を製造する脱保護工程をさらに行ってもよい。化合物(4b)は、化合物(4a)と同様に医薬中間体として有用である。
(E) Deprotection step “(B) Step of producing compound (4a) from compound (2a), compound (3a), compound (3b)” and “(C) Compound (2a), compound (2b)” , The step of producing compound (4a) from compound (3b) ”, after obtaining compound (4a), the compound (4a) is deprotected as necessary to obtain an optical activity represented by the following formula (4b) A deprotection step for producing -cis-N unprotected aminopiperidine (hereinafter sometimes referred to as compound (4b)) may be further performed. Compound (4b) is useful as a pharmaceutical intermediate in the same manner as compound (4a).
(式中、R1、Pro、cis及び*は前記と同じ。) (In the formula, R 1 , Pro, cis and * are the same as above.)
アミノ基の保護基を脱保護する方法は、Greene’s Protective Groups in Organic Synthesis 4th edition(出版社:John Wiley & Sons Inc.)696~926ページ記載の一般的な手法で行えばよい。例えば、tert-ブトキシカルボニル基、アセチル基、ベンゾイル基は酸または塩基を作用させて加水分解を行う。ベンジルオキシカルボニル基、ベンジル基の場合、金属触媒存在下、前記化合物(4a)に水素源を作用させて加水素分解することにより、脱保護を行う。 The method for deprotecting the protecting group of the amino group may be performed by a general method described in pages 696 to 926 of Green's Protective Groups in Organic Synthesis 4th edition (Publisher: John Wiley & Sons Inc.). For example, a tert-butoxycarbonyl group, an acetyl group, and a benzoyl group are hydrolyzed by the action of an acid or a base. In the case of a benzyloxycarbonyl group or a benzyl group, deprotection is carried out by hydrogenolysis of the compound (4a) by acting a hydrogen source in the presence of a metal catalyst.
前記加水分解に用いる塩基としては、例えば、水酸化ナトリウム、水酸化カリウム、水酸化リチウムが挙げられる。塩基の使用量としては前記化合物(4a)1モルに対し、例えば、1~20モルであり、好ましくは1~10モルである。 Examples of the base used for the hydrolysis include sodium hydroxide, potassium hydroxide, and lithium hydroxide. The amount of the base to be used is, for example, 1 to 20 mol, preferably 1 to 10 mol, per 1 mol of compound (4a).
前記加水分解に用いる酸としては、例えば、塩化水素、臭化水素、硫酸、硝酸等の鉱酸;トリフルオロメタンスルホン酸、パラトルエンスルホン酸、メタンスルホン酸等のスルホン酸類が挙げられる。好ましくは塩化水素、臭化水素、および硫酸であり、更に好ましくは塩化水素である。酸の使用量としては前記化合物(4a)1モルに対し、例えば、1~50モルであり、好ましくは1~20モルである。 Examples of the acid used for the hydrolysis include mineral acids such as hydrogen chloride, hydrogen bromide, sulfuric acid and nitric acid; and sulfonic acids such as trifluoromethanesulfonic acid, paratoluenesulfonic acid and methanesulfonic acid. Preferred are hydrogen chloride, hydrogen bromide, and sulfuric acid, and more preferred is hydrogen chloride. The amount of the acid to be used is, for example, 1 to 50 mol, preferably 1 to 20 mol, per 1 mol of the compound (4a).
前記加水分解の反応温度は、例えば、20℃~200℃であり、好ましくは50℃~140℃である。加水分解の反応時間は、例えば、1~40時間であり、好ましくは1~20時間である。 The hydrolysis reaction temperature is, for example, 20 ° C. to 200 ° C., preferably 50 ° C. to 140 ° C. The reaction time for the hydrolysis is, for example, 1 to 40 hours, preferably 1 to 20 hours.
加水分解の反応溶媒としては、水;メタノール、エタノール、イソプロパノール等のアルコール系溶媒;テトラヒドロフラン、1,4-ジオキサン、エチレングリコールジメチルエーテル等のエーテル系溶媒が挙げられる。これらは単独で用いてもよく、2種以上を併用してもよい。2種以上を併用する場合はその混合比は特に制限されない。好ましくはメタノール、エタノール、イソプロパノール等のアルコール系溶媒である。 Examples of the reaction solvent for hydrolysis include water; alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran, 1,4-dioxane and ethylene glycol dimethyl ether. These may be used alone or in combination of two or more. When using 2 or more types together, the mixing ratio is not particularly limited. Alcohol solvents such as methanol, ethanol and isopropanol are preferred.
加水分解反応の際の前記化合物(4a)、酸または塩基、及び反応溶媒の添加方法や添加順序は特に制限されない。
反応後の処理としては、反応液から目的物である化合物(4b)を取得するための一般的な処理を行えばよい。例えば、反応終了後の反応液に水を加えて必要に応じて中和し、一般的な抽出溶媒、例えば酢酸エチル、ジエチルエーテル、塩化メチレン、トルエン、ヘキサン等を用いて抽出操作を行なう。得られた抽出液から減圧加熱等の操作により、反応溶媒及び抽出溶媒を留去すると化合物(4b)が得られる。または、反応液中に析出した目的物をろ別することによっても化合物(4b)を単離できる。
The addition method and the order of addition of the compound (4a), acid or base, and reaction solvent in the hydrolysis reaction are not particularly limited.
What is necessary is just to perform the general process for acquiring the target compound (4b) from a reaction liquid as a process after reaction. For example, water is added to the reaction solution after completion of the reaction to neutralize it as necessary, and extraction is performed using a general extraction solvent such as ethyl acetate, diethyl ether, methylene chloride, toluene, hexane and the like. When the reaction solvent and the extraction solvent are distilled off from the obtained extract by an operation such as heating under reduced pressure, a compound (4b) is obtained. Alternatively, the compound (4b) can also be isolated by filtering off the target product precipitated in the reaction solution.
脱保護としての加水素分解に使用する前記金属触媒としては、パラジウム触媒、白金触媒、ロジウム触媒、ルテニウム触媒等の金属触媒が挙げられ、好ましくはPd/Cである。触媒量は、前記化合物(4a)1重量部に対して、例えば、0.005~0.5重量部である。加水素分解で用いる水素ガスの圧力(絶対圧)は、例えば、0.1~1MPaである。 Examples of the metal catalyst used for hydrogenolysis as deprotection include a metal catalyst such as a palladium catalyst, a platinum catalyst, a rhodium catalyst, and a ruthenium catalyst, preferably Pd / C. The amount of the catalyst is, for example, 0.005 to 0.5 parts by weight with respect to 1 part by weight of the compound (4a). The pressure (absolute pressure) of hydrogen gas used in hydrogenolysis is, for example, 0.1 to 1 MPa.
加水素分解の反応溶媒としては、前記(A2)転位工程の反応溶媒と同様のものが使用でき、これらは単独で用いてもよく、2種以上を併用してもよい。好ましくはエタノール、イソプロパノールなどのアルコール系溶媒である。溶媒の使用量は、前記化合物(4a)1重量部に対して、例えば、2~50重量部、好ましくは5~20重量部である。 As the reaction solvent for the hydrogenolysis, the same solvents as those used in the (A2) rearrangement step can be used, and these may be used alone or in combination of two or more. Alcohol solvents such as ethanol and isopropanol are preferred. The amount of the solvent to be used is, for example, 2 to 50 parts by weight, preferably 5 to 20 parts by weight with respect to 1 part by weight of the compound (4a).
加水素分解の反応温度は、例えば、溶媒の沸点以下であり、好ましくは40~80℃である。加水素分解の反応時間は、例えば、1~100時間である。 The reaction temperature of the hydrogenolysis is, for example, not higher than the boiling point of the solvent, and preferably 40 to 80 ° C. The reaction time for hydrogenolysis is, for example, 1 to 100 hours.
加水素分解反応後の処理としては、反応液から目的物である化合物(4b)を取得するための一般的な処理を行えばよい。例えば、反応液から金属触媒を除去したろ液を減圧加熱等の操作により反応溶媒を留去すると、化合物(4b)が得られる。 As the treatment after the hydrogenolysis reaction, a general treatment for obtaining the target compound (4b) from the reaction solution may be performed. For example, a compound (4b) is obtained by distilling off the reaction solvent from the filtrate from which the metal catalyst has been removed from the reaction solution by an operation such as heating under reduced pressure.
以上のようにして得られた化合物(4b)は、医薬中間体として十分な純度を有しているが、該医薬中間体を用いた後続工程での反応収率、若しくは後続工程での反応物の純度をさらに高める目的で、晶析、分別蒸留、カラムクロマトグラフィー等の一般的な精製手法により、さらに純度を高めてもよい。更に、得られた化合物(4b)が塩ではない場合、化合物(4b)を酸で処理することにより、化合物(4b)を塩に変換してもよい。 The compound (4b) obtained as described above has sufficient purity as a pharmaceutical intermediate, but the reaction yield in the subsequent step using the pharmaceutical intermediate or the reaction product in the subsequent step In order to further increase the purity, the purity may be further increased by a general purification method such as crystallization, fractional distillation, or column chromatography. Furthermore, when the obtained compound (4b) is not a salt, the compound (4b) may be converted into a salt by treating the compound (4b) with an acid.
化合物(4b)を塩にする為に使用する酸としては特に限定はされないが、塩化水素(塩酸)、臭化水素、硫酸、硝酸等の鉱酸;トリフルオロメタンスルホン酸、パラトルエンスルホン酸、メタンスルホン酸等のスルホン酸類が挙げられる。好ましくは塩化水素(塩酸)、臭化水素、および硫酸であり、更に好ましくは塩化水素(塩酸)である。 Although it does not specifically limit as an acid used in order to make a compound (4b) a salt, Mineral acids, such as hydrogen chloride (hydrochloric acid), hydrogen bromide, a sulfuric acid, nitric acid; trifluoromethanesulfonic acid, paratoluenesulfonic acid, methane Examples thereof include sulfonic acids such as sulfonic acid. Preferred are hydrogen chloride (hydrochloric acid), hydrogen bromide, and sulfuric acid, and more preferred is hydrogen chloride (hydrochloric acid).
塩形成に使用する酸の量は、前記塩ではない化合物(4b)1モルに対し、例えば、1~50モルであり、好ましくは1~20モルである。塩形成の反応温度は、例えば、20℃~200℃であり、好ましくは50℃~140℃である。塩形成の反応時間は、例えば、1~40時間であり、好ましくは1~30時間である。 The amount of the acid used for salt formation is, for example, 1 to 50 mol, preferably 1 to 20 mol, with respect to 1 mol of the non-salt compound (4b). The reaction temperature for salt formation is, for example, 20 ° C. to 200 ° C., preferably 50 ° C. to 140 ° C. The reaction time for salt formation is, for example, 1 to 40 hours, preferably 1 to 30 hours.
塩形成反応の溶媒としては、水;メタノール、エタノール、イソプロパノール等のアルコール系溶媒;テトラヒドロフラン、1,4-ジオキサン、エチレングリコールジメチルエーテル等のエーテル系溶媒;酢酸エチル、酢酸イソプロピル等のエステル系溶媒が挙げられる。これらは単独で用いてもよく、2種以上を併用してもよい。2種以上を併用する場合はその混合比は特に制限されない。好ましくは酢酸エチル、イソプロパノールである。 Examples of the solvent for the salt formation reaction include water; alcohol solvents such as methanol, ethanol and isopropanol; ether solvents such as tetrahydrofuran, 1,4-dioxane and ethylene glycol dimethyl ether; and ester solvents such as ethyl acetate and isopropyl acetate. It is done. These may be used alone or in combination of two or more. When using 2 or more types together, the mixing ratio is not particularly limited. Preferred are ethyl acetate and isopropanol.
塩形成反応の際の前記化合物(4b)、酸、及び反応溶媒の添加方法や添加順序は特に制限されない。
塩形成反応後の処理としては、反応液から生成物を取得するための一般的な処理を行えばよい。例えば、反応液から反応溶媒を減圧加熱等の操作により留去して、前記化合物(4b)を酸との塩として単離してもよく、純度を高める目的で更に晶析を行ってもよい。
晶析を行う場合の溶媒として好ましくは、メタノール、エタノール、イソプロパノール等のアルコール系溶媒;テトラヒドロフラン、1,4-ジオキサン、エチレングリコールジメチルエーテル等のエーテル系溶媒;酢酸エチル、酢酸イソプロピル等のエステル系溶媒;ベンゼン、トルエン、キシレン、ヘキサン等の炭化水素系溶媒;塩化メチレン、クロロホルム、クロロベンゼン等のハロゲン系溶媒が挙げられる。これらの溶媒は、単独で用いても2種以上を併用しても良い。更に好ましくはメタノール、エタノール、酢酸エチル、トルエン等である。
The addition method and the order of addition of the compound (4b), acid, and reaction solvent during the salt formation reaction are not particularly limited.
What is necessary is just to perform the general process for acquiring a product from a reaction liquid as a process after salt formation reaction. For example, the reaction solvent may be distilled off from the reaction solution by an operation such as heating under reduced pressure to isolate the compound (4b) as a salt with an acid, or crystallization may be further performed for the purpose of increasing purity.
The solvent for crystallization is preferably an alcohol solvent such as methanol, ethanol or isopropanol; an ether solvent such as tetrahydrofuran, 1,4-dioxane or ethylene glycol dimethyl ether; an ester solvent such as ethyl acetate or isopropyl acetate; Hydrocarbon solvents such as benzene, toluene, xylene and hexane; halogen solvents such as methylene chloride, chloroform and chlorobenzene. These solvents may be used alone or in combination of two or more. More preferred are methanol, ethanol, ethyl acetate, toluene and the like.
(F)転位工程
前記化合物(4b)は、上述した化合物(3a)を脱CO転位反応(Step F)することによっても製造できる。従って化合物(2a)から化合物(3a)を製造する工程(Step B1)、化合物(3a)から化合物(4b)を製造する工程(Step F)からなる製造工程も本発明の一態様である。
(F) Rearrangement Step The compound (4b) can also be produced by subjecting the above-mentioned compound (3a) to a de-CO rearrangement reaction (Step F). Therefore, the manufacturing process which consists of the process (Step B1) which manufactures a compound (3a) from a compound (2a), and the process (Step F) which manufactures a compound (4b) from a compound (3a) is also 1 aspect of this invention.
本(F)転位工程の詳細及び好ましい態様は、工程原料が化合物(3a)であり工程生成物が化合物(4b)である点以外は、前記(A2)転位工程と同様である。 Details and preferred embodiments of the present (F) rearrangement step are the same as those in the (A2) rearrangement step except that the process raw material is the compound (3a) and the process product is the compound (4b).
本願は、2018年5月22日に提出された日本国特許出願第2018-098317号に基づく優先権の利益を主張するものである。2018年5月22日に出願された日本国特許出願第2018-098317号の明細書の全内容が、本願に参考のため援用される。 This application claims the benefit of priority based on Japanese Patent Application No. 2018-098317 filed on May 22, 2018. The entire contents of the specification of Japanese Patent Application No. 2018-098317 filed on May 22, 2018 are incorporated herein by reference.
以下、実施例を挙げて本発明をより具体的に説明するが、本発明はもとより下記実施例によって制限を受けるものではなく、前・後記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。 EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited by the following examples, but may be appropriately modified within a range that can meet the purpose described above and below. Of course, it is possible to implement them, and they are all included in the technical scope of the present invention.
なお実施例の欄で使用する以下の化合物の化学純度(収量)、シス体過剰率、光学純度(鏡像体過剰率)は、以下のクロマトグラフィー分析に基づいて算出した。
6-メチルニコンチンアミド(10)
ラセミ-cis-6-メチルニペコタミド(20a)
光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)
N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(30b)
N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)
N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)
N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)
The chemical purity (yield), cis isomer excess, and optical purity (enantiomeric excess) of the following compounds used in the Examples column were calculated based on the following chromatographic analysis.
6-Methyl Nikontinamide (10)
Racemic-cis-6-methylnipecotamide (20a)
Optically active (3R, 6S) -cis-6-methylnipecotamide (30a)
N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (30b)
N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b)
N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a)
N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a)
(1)ガスクロマトグラフィー
(1.1)ラセミ-cis-6-メチルニペコタミド(20a)の化学純度(収量)
カラム:J&W Scientific DB-1
(内径0.32mm、膜厚0.25μm、長さ30m)
スプリット比:1:50
気化室温度:325℃
検出器温度:325℃
カラム温度:150℃→250℃(10℃/min、5min保持)
250℃→320℃(30℃/min、5min保持)
(1) Gas chromatography (1.1) Chemical purity (yield) of racemic-cis-6-methylnipecotamide (20a)
Column: J & W Scientific DB-1
(Inner diameter 0.32mm, film thickness 0.25μm, length 30m)
Split ratio: 1:50
Vaporization chamber temperature: 325 ° C
Detector temperature: 325 ° C
Column temperature: 150 ° C. → 250 ° C. (10 ° C./min, 5 min hold)
250 ° C → 320 ° C (30 ° C / min, 5 min hold)
(2)光学活性高速液体クロマトグラフィー
(2.1)ラセミ-cis-6-メチルニペコタミド(20a)のシス体過剰率;N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)のシス体過剰率、光学純度(鏡像体過剰率)
カラム:CHIRALPAK AD-RH(4.6mmφ×150mm、ダイセル化学社製)、CHIRALPAK OD-RH(4.6mmφ×150mm、ダイセル化学社製)
溶離液:蒸留水(pH2.5)/アセトニトリル=7/3(体積比)
流速:0.5mL/分
カラム温度:30℃
測定波長:210nm
(2) Optically active high performance liquid chromatography (2.1) cis-isomer excess of racemic-cis-6-methylnipecotamide (20a); N-tert-butoxycarbonyl- (2S, 5R) -2-methyl- 5-carbamoylpiperidine (31b) cis isomer excess, optical purity (enantiomeric excess)
Column: CHIRALPAK AD-RH (4.6 mmφ × 150 mm, manufactured by Daicel Chemical), CHIRALPAK OD-RH (4.6 mmφ × 150 mm, manufactured by Daicel Chemical)
Eluent: distilled water (pH 2.5) / acetonitrile = 7/3 (volume ratio)
Flow rate: 0.5 mL / min Column temperature: 30 ° C
Measurement wavelength: 210 nm
(2.2)光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)の光学純度(鏡像体過剰率);N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(30b)のシス体過剰率、光学純度(鏡像体過剰率)
カラム:CHIRALPAK AD-RH(4.6mmφ×150mm、ダイセル化学社製)
溶離液:蒸留水(pH2.5)/アセトニトリル=7/3(体積比)
流速:0.5mL/分
カラム温度:30℃ 測定波長:210nm
(2.2) Optical purity (enantiomeric excess) of optically active (3R, 6S) -cis-6-methylnipecotamide (30a); N-benzyloxycarbonyl- (2S, 5R) -2-methyl- 5-carbamoylpiperidine (30b) cis isomer excess, optical purity (enantiomeric excess)
Column: CHIRALPAK AD-RH (4.6 mmφ × 150 mm, manufactured by Daicel Chemical Industries)
Eluent: distilled water (pH 2.5) / acetonitrile = 7/3 (volume ratio)
Flow rate: 0.5 mL / min Column temperature: 30 ° C. Measurement wavelength: 210 nm
(2.3)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)のシス体過剰率、光学純度(鏡像体過剰率)
カラム:CHIRALPAK AD-H(4.6mmφ×250mm、ダイセル化学社製)
溶離液:ヘキサン/IPA=85/15(体積比)
流速:1.5mL/分
カラム温度:30℃
測定波長:210nm
(2.3) N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) cis isomer excess, optical purity (enantiomeric excess)
Column: CHIRALPAK AD-H (4.6 mmφ × 250 mm, manufactured by Daicel Chemical Industries)
Eluent: Hexane / IPA = 85/15 (volume ratio)
Flow rate: 1.5 mL / min Column temperature: 30 ° C
Measurement wavelength: 210 nm
(2.4)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)のシス体過剰率、光学純度(鏡像体過剰率)
カラム:CHIRALPAK AD-H(4.6mmφ×250mm、ダイセル化学社製)
溶離液:ヘキサン/IPA=95/5(体積比)
流速:1.0mL/分
カラム温度:30℃
測定波長:210nm
(2.4) N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a) cis isomer excess, optical purity (enantiomeric excess)
Column: CHIRALPAK AD-H (4.6 mmφ × 250 mm, manufactured by Daicel Chemical Industries)
Eluent: Hexane / IPA = 95/5 (volume ratio)
Flow rate: 1.0 mL / min Column temperature: 30 ° C
Measurement wavelength: 210 nm
また下記実施例で使用した固定化酵素は、以下の製造例1に従って調製したものである。
製造例1
カプリアビダス エスピー(Cupriavidus sp.)KNK-J915株(FERM BP-10739)由来の遺伝子を発現させた組み換え大腸菌を濃縮破砕し、破砕液中の酵素を陰イオン交換樹脂(The Dow Chemical Company製、商品名“Duolite A568K”)に吸着させた。水で洗浄し未吸着成分を除去した後、吸着樹脂を2%水酸化ナトリウム水溶液でpH8に平衡化した。pH平衡化後、樹脂に吸着した酵素をグルタルアルデヒド(GA)にて架橋して樹脂に固定化した。その後、0.05Mトリス緩衝液(pH8)で残存するグルタルアルデヒドを不活性化し、2MNaCl/0.05Mトリス緩衝液で洗浄し、固定化酵素を得た。
Moreover, the immobilized enzyme used in the following Example was prepared according to the following Production Example 1.
Production Example 1
Recombinant Escherichia coli expressing a gene derived from Capriavidus sp. KNK-J915 (FERM BP-10739) was concentrated and disrupted, and the enzyme in the disrupted solution was anion-exchange resin (trade name, manufactured by The Dow Chemical Company, trade name) "Duolite A568K"). After washing with water to remove unadsorbed components, the adsorbed resin was equilibrated to pH 8 with a 2% aqueous sodium hydroxide solution. After pH equilibration, the enzyme adsorbed on the resin was cross-linked with glutaraldehyde (GA) and immobilized on the resin. Thereafter, the remaining glutaraldehyde was inactivated with 0.05 M Tris buffer (pH 8) and washed with 2 M NaCl / 0.05 M Tris buffer to obtain an immobilized enzyme.
(実施例1)ラセミ-cis-6-メチルニペコタミド(20a)の製造 (Example 1) Production of racemic-cis-6-methylnipecotamide (20a)
6-メチルニコンチンアミド(10)30.0gにエタノール300mLを加え、Pd/Cを6.0g(0.2倍重量)添加した。水素置換し、常圧60℃で88時間攪拌した。反応終了後、Pd/Cをろ別した。さらに、ろ過したPd/Cをエタノール10mLで洗浄した。ろ液と洗浄液を合わせて濃縮した。濃縮液に水300mLを加えさらに濃縮し、エタノールを除去した。水溶液に硫酸10.1gを添加し、pHを6.3に調整し、ラセミ-cis-6-メチルニペコタミド(20a)を含む水溶液100.8g(化合物濃度28.2%、収率90.7%)を取得した(シス体過剰率:60.6%de)。 300 mL of ethanol was added to 30.0 g of 6-methylnicontinamide (10), and 6.0 g (0.2 times weight) of Pd / C was added. After purging with hydrogen, the mixture was stirred at 60 ° C. for 88 hours. After completion of the reaction, Pd / C was filtered off. Further, the filtered Pd / C was washed with 10 mL of ethanol. The filtrate and washings were combined and concentrated. 300 mL of water was added to the concentrate, and the mixture was further concentrated to remove ethanol. 10.1 g of sulfuric acid was added to the aqueous solution to adjust the pH to 6.3, and 100.8 g of the aqueous solution containing racemic-cis-6-methylnipecotamide (20a) (compound concentration: 28.2%, yield: 90. (7%) was obtained (cis excess: 60.6% de).
(実施例2)光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)の製造 (Example 2) Production of optically active (3R, 6S) -cis-6-methylnipecotamide (30a)
実施例1で得られたラセミ-cis-6-メチルニペコタミド(20a)の水溶液39.0g(6-メチルニペコタミド(20a)純分量11.0g)に、水335mL、固定化酵素14.3g(1.3倍重量)を加え、45℃で119時間攪拌した。反応終了後、固定化酵素をろ別した。さらにろ過した固定化酵素を水110mlで洗浄した。ろ液と洗浄液に、30%水酸化ナトリウム水溶液10.3gを添加したのち、減圧下で濃縮し、光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)(光学純度(鏡像体過剰率):91.4%ee。変換率94%)と(3S,6R)-cis-6-メチルニペコチン酸(50a)とを含む水溶液を得た。 To 39.0 g of the aqueous solution of racemic-cis-6-methylnipecotamide (20a) obtained in Example 1 (6-methylnipecotamide (20a) pure amount 11.0 g), 335 mL of water and immobilized enzyme 14 .3 g (1.3 times weight) was added, and the mixture was stirred at 45 ° C. for 119 hours. After completion of the reaction, the immobilized enzyme was filtered off. Further, the filtered immobilized enzyme was washed with 110 ml of water. After adding 10.3 g of 30% aqueous sodium hydroxide solution to the filtrate and washing solution, the filtrate was concentrated under reduced pressure, and optically active (3R, 6S) -cis-6-methylnipecotamide (30a) (optical purity (mirror image (Body excess ratio): 91.4% ee (conversion 94%) and an aqueous solution containing (3S, 6R) -cis-6-methylnipecotic acid (50a) was obtained.
(実施例3)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(30b)の製造 Example 3 Production of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (30b)
実施例2で取得した、光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)と(3S,6R)-cis-6-メチルニペコチン酸(50a)を含む水溶液100gにTHF100gを加え、炭酸カリウム19.4g(2.0当量)、クロロギ酸ベンジル12.0g(1.0当量)を添加した。室温にて1時間攪拌後、酢酸エチル、水を添加して水層を分離した。有機層を減圧下で濃縮し、THFを除去した。濃縮液に酢酸エチルを添加し、生成物の含量が25%となるよう濃度調整後、5℃まで冷却し2時間熟成した。析出した結晶を濾別して乾燥後、表題化合物2.8gを白色結晶として取得した(収率48.2%、晶析収率61.0%)。光学純度(鏡像体過剰率)は99.8%ee、シス体過剰率は96.2%deであった。 To 100 g of an aqueous solution containing optically active (3R, 6S) -cis-6-methylnipecotamide (30a) and (3S, 6R) -cis-6-methylnipecotic acid (50a) obtained in Example 2, 100 g of THF was added. 19.4 g (2.0 equivalents) of potassium carbonate and 12.0 g (1.0 equivalent) of benzyl chloroformate were added. After stirring at room temperature for 1 hour, ethyl acetate and water were added to separate the aqueous layer. The organic layer was concentrated under reduced pressure to remove THF. Ethyl acetate was added to the concentrate, the concentration was adjusted so that the product content was 25%, and the mixture was cooled to 5 ° C. and aged for 2 hours. The precipitated crystals were separated by filtration and dried to obtain 2.8 g of the title compound as white crystals (yield 48.2%, crystallization yield 61.0%). The optical purity (enantiomeric excess) was 99.8% ee, and the cis isomer excess was 96.2% de.
(実施例4)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)の製造 Example 4 Production of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a)
実施例3で取得した白色結晶(30b)2.5gにTHF12.5g、トルエン12.5g、水6.3mL、30%水酸化ナトリウム水溶液3.9g(3.2当量)、12%次亜塩素酸ナトリウム水溶液7.3g(1.3当量)を添加し、0~5℃にて3時間攪拌したのちに、30℃にて5時間攪拌した。反応終了後、15%亜硫酸ナトリウム水溶液2.3g(0.3当量)を加え、15分攪拌した。塩酸4.2gを加えpHを4.5に調整し、有機層を分離した。水層に酢酸エチル37.5gを加え、30%水酸化ナトリウム水溶液5.8gを添加し、pHを13に調整したのち、水層を分離した。有機層を減圧下で濃縮し、表題化合物1.7gを取得した(収率75.6%)。光学純度(鏡像体過剰率)99.8%ee、シス体過剰率96.2%deであった。 To 2.5 g of white crystals (30b) obtained in Example 3, 12.5 g of THF, 12.5 g of toluene, 6.3 mL of water, 3.9 g of 30% aqueous sodium hydroxide (3.2 equivalents), 12% hypochlorous acid After adding 7.3 g (1.3 equivalents) of an aqueous sodium acid solution and stirring at 0 to 5 ° C. for 3 hours, the mixture was stirred at 30 ° C. for 5 hours. After completion of the reaction, 2.3 g (0.3 equivalent) of a 15% aqueous sodium sulfite solution was added and stirred for 15 minutes. Hydrochloric acid 4.2g was added, pH was adjusted to 4.5, and the organic layer was isolate | separated. 37.5 g of ethyl acetate was added to the aqueous layer, 5.8 g of 30% aqueous sodium hydroxide solution was added to adjust the pH to 13, and then the aqueous layer was separated. The organic layer was concentrated under reduced pressure to obtain 1.7 g of the title compound (yield 75.6%). The optical purity (enantiomeric excess) was 99.8% ee, and the cis-isomer excess was 96.2% de.
(実施例5)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)の晶析
実施例4で取得したN-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)1.7g(光学純度(鏡像体過剰率)99.8%ee、シス体過剰率96.2%de)に濃度31.7%塩酸を含むイソプロパノール溶液1.0g、酢酸エチル15gを添加した。析出した結晶をろ別して、乾燥後、表題化合物(40a)1.8g(収率92.8%)を白色結晶(塩酸塩)として取得した。光学純度(鏡像体過剰率)99.7%ee、シス体過剰率99.0%deであった。
(Example 5) Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) N-benzyloxycarbonyl- (2S, 5R) -2 obtained in Example 4 -Isopropanol solution 1 containing 1.7 g of methyl-5-aminopiperidine (40a) (optical purity (enantiomeric excess) 99.8% ee, cis isomer excess 96.2% de) in a concentration of 31.7% hydrochloric acid 0.0 g and 15 g of ethyl acetate were added. The precipitated crystals were separated by filtration and dried, and 1.8 g (yield 92.8%) of the title compound (40a) was obtained as white crystals (hydrochloride). The optical purity (enantiomeric excess) was 99.7% ee, and the cis-isomer excess was 99.0% de.
(実施例6)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)の晶析
実施例4と同様にして取得した後、トランス体を混合してシス体過剰率を調整したN-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)1.7g(光学純度(鏡像体過剰率)98.7%ee、シス体過剰率58.9%de)に濃度31.7%塩酸を含むイソプロパノール溶液1.0g、エタノール2.07g、アセトン19.6gを添加した。析出した結晶をろ別して、乾燥後、表題化合物(40a)1.1g(収率56.7%)を白色結晶(塩酸塩)として取得した。光学純度(鏡像体過剰率)99.3%ee、シス体過剰率96.6%deであった。
(Example 6) Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) Obtained in the same manner as in Example 4, and then mixed with a trans isomer to obtain a cis isomer. 1.7 g of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) adjusted for excess (optical purity (enantiomeric excess) 98.7% ee, cis excess) 58.9% de) was added 1.0 g of an isopropanol solution containing 31.7% hydrochloric acid, 2.07 g of ethanol and 19.6 g of acetone. The precipitated crystals were separated by filtration and dried, and 1.1 g (yield 56.7%) of the title compound (40a) was obtained as white crystals (hydrochloride). The optical purity (enantiomeric excess) was 99.3% ee, and the cis-isomer excess was 96.6% de.
(実施例7)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)の晶析
実施例4と同様にして取得した後、トランス体を混合してシス体過剰率を調整したN-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)0.5g(光学純度(鏡像体過剰率)98.6%ee、シス体過剰率38.9%de)に濃度31.7%塩酸を含むイソプロパノール溶液0.3g、エタノール0.2g、アセトン19.0gを添加した。析出した結晶をろ別して、乾燥後、表題化合物(40a)0.2g(収率41.7%)を白色結晶(塩酸塩)として取得した。光学純度(鏡像体過剰率)99.2%ee、シス体過剰率60.3%deであった。
Example 7 Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) Obtained in the same manner as in Example 4, and then mixed with a trans isomer to obtain a cis isomer. 0.5 g of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) adjusted for excess (optical purity (enantiomeric excess) 98.6% ee, cis isomer excess) 38.9% de) was added 0.3 g of an isopropanol solution containing hydrochloric acid at a concentration of 31.7%, 0.2 g of ethanol, and 19.0 g of acetone. The precipitated crystals were separated by filtration and dried, and then 0.2 g (yield 41.7%) of the title compound (40a) was obtained as white crystals (hydrochloride). The optical purity (enantiomeric excess) was 99.2% ee, and the cis isomer excess was 60.3% de.
(比較例1)N-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)の晶析 実施例4と同様にして取得した後、トランス体を混合してシス体過剰率を調整したN-ベンジルオキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(40a)0.2g(光学純度(鏡像体過剰率)98.5%ee、シス体過剰率28.8%de)に濃度31.7%塩酸を含むイソプロパノール溶液0.1g、エタノール0.5g、アセトン4.4gを添加した。析出した結晶をろ別して、乾燥後、表題化合物(40a)0.1g(収率44.3%)を白色結晶(塩酸塩)として取得した。光学純度(鏡像体過剰率)99.0%ee、シス体過剰率31.3%deであった。 (Comparative Example 1) Crystallization of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) Obtained in the same manner as in Example 4, and then mixed with a trans isomer to obtain a cis isomer 0.2 g of N-benzyloxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (40a) adjusted for excess (optical purity (enantiomeric excess) 98.5% ee, cis excess) 28.8% de) was added 0.1 g of an isopropanol solution containing hydrochloric acid at a concentration of 31.7%, 0.5 g of ethanol, and 4.4 g of acetone. The precipitated crystals were separated by filtration and dried, and 0.1 g (yield 44.3%) of the title compound (40a) was obtained as white crystals (hydrochloride). The optical purity (enantiomeric excess) was 99.0% ee, and the cis isomer excess was 31.3% de.
(実施例8)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)の製造 Example 8 Production of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b)
実施例2で取得した、光学活性(3R,6S)-cis-6-メチルニペコタミド(30a)と(3S,6R)-cis-6-メチルニペコチン酸(50a)を含む水溶液47.1gにTHF42.5gを加え、30%水酸化ナトリウム水溶液0.85g、二炭酸ジtert-ブチル14.3g(1.0当量)を添加した。室温にて2時間攪拌後、酢酸エチル、水を添加して水層を分離した。有機層を減圧下で濃縮し、表題化合物8.0gを白色結晶として取得した(収率100%)。光学純度(鏡像体過剰率)97.5%ee、シス体過剰率57.2%deであった。 To 47.1 g of an aqueous solution containing optically active (3R, 6S) -cis-6-methylnipecotamide (30a) and (3S, 6R) -cis-6-methylnipecotic acid (50a) obtained in Example 2, THF42 0.5 g was added, and 0.85 g of 30% aqueous sodium hydroxide solution and 14.3 g (1.0 equivalent) of ditert-butyl dicarbonate were added. After stirring at room temperature for 2 hours, ethyl acetate and water were added to separate the aqueous layer. The organic layer was concentrated under reduced pressure to obtain 8.0 g of the title compound as white crystals (yield 100%). The optical purity (enantiomeric excess) was 97.5% ee, and the cis-isomer excess was 57.2% de.
(実施例9)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)の晶析
実施例8で取得したN-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)8.1g(光学純度(鏡像体過剰率)97.5%ee、シス体過剰率57.2%de)に酢酸エチルを添加し、生成物の含量が25%となるよう濃度調整後、5℃まで冷却し2時間熟成した。析出した結晶を濾別して乾燥後、表題化合物(31b)3.7gを白色結晶として取得した(収率45.9%)。光学純度(鏡像体過剰率)は99.9%ee、シス体過剰率は98.8%deであった。
Example 9 Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) N-tert-butoxycarbonyl- (2S, 5R) obtained in Example 8 Ethyl acetate was added to 8.1 g (optical purity (enantiomeric excess) 97.5% ee, cis isomer excess 57.2% de) of -2-methyl-5-carbamoylpiperidine (31b) After adjusting the concentration so that the content was 25%, it was cooled to 5 ° C. and aged for 2 hours. The precipitated crystals were separated by filtration and dried to obtain 3.7 g of the title compound (31b) as white crystals (yield 45.9%). The optical purity (enantiomeric excess) was 99.9% ee, and the cis-isomer excess was 98.8% de.
(実施例10)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)の晶析
実施例8と同様にして取得した後、トランス体およびエナンチオマーを混合してシス体過剰率と光学純度を調整したN-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)(光学純度(鏡像体過剰率)91.2%ee、シス体過剰率53.5%de)0.5gにメチルtert-ブチルエーテル2.6g、ヘキサンを2.6g添加し、5℃まで冷却し2時間熟成した。析出した結晶を濾別して、表題化合物(31b)0.3gを白色結晶として取得した(収率65.6%)。光学純度(鏡像体過剰率)は95.8%ee、シス体過剰率は94.7%deであった。
(Example 10) Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) After obtaining in the same manner as in Example 8, the trans isomer and enantiomer were mixed. N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) (optical purity (enantiomeric excess) 91.2% ee) adjusted for cis isomer excess and optical purity 2.6 g of methyl tert-butyl ether and 2.6 g of hexane were added to 0.5 g of cis isomer excess 53.5% de), and the mixture was cooled to 5 ° C. and aged for 2 hours. The precipitated crystals were separated by filtration to obtain 0.3 g of the title compound (31b) as white crystals (yield 65.6%). The optical purity (enantiomeric excess) was 95.8% ee, and the cis isomer excess was 94.7% de.
(実施例11)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)の製造 Example 11 Production of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a)
実施例8で取得したN-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-カルバモイルピペリジン(31b)7.1gにTHF18.5g、トルエン35.5g、水17.4mL、30%水酸化ナトリウム水溶液12.5g(3.2当量)、12%次亜塩素酸ナトリウム水溶液23.5g(1.3当量)を添加し、0~5℃にて10時間攪拌したのちに、30℃にて6時間攪拌した。反応終了後、15%亜硫酸ナトリウム水溶液12.3g(0.5当量)を加え、15分攪拌した。塩酸12.4gを加えpHを4.7に調整し、有機層を分離した。水層に酢酸エチル85.2gを加え、30%水酸化ナトリウム水溶液5.2gを添加し、pHを12.5に調整したのち、水層を分離した。有機層を減圧下で濃縮し、表題化合物5.14gを取得した(収率81.8%)。光学純度(鏡像体過剰率)97.6%ee、シス体過剰率61.4%deであった。 N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-carbamoylpiperidine (31b) obtained in Example 8 was added to 18.5 g of THF, 35.5 g of toluene, 17.4 mL of water, 30%. After adding 12.5 g (3.2 equivalents) of an aqueous sodium hydroxide solution and 23.5 g (1.3 equivalents) of a 12% aqueous sodium hypochlorite solution and stirring at 0 to 5 ° C. for 10 hours, For 6 hours. After completion of the reaction, 12.3 g (0.5 equivalent) of a 15% aqueous sodium sulfite solution was added and stirred for 15 minutes. Hydrochloric acid 12.4g was added, pH was adjusted to 4.7, and the organic layer was isolate | separated. After adding 85.2 g of ethyl acetate to the aqueous layer and adding 5.2 g of 30% aqueous sodium hydroxide solution to adjust the pH to 12.5, the aqueous layer was separated. The organic layer was concentrated under reduced pressure to obtain 5.14 g of the title compound (yield 81.8%). The optical purity (enantiomeric excess) was 97.6% ee and the cis-isomer excess was 61.4% de.
(実施例12)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)の晶析
実施例11で取得したN-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)1.02g(光学純度(鏡像体過剰率)97.6%ee、シス体過剰率61.4%de)にパラトルエンスルホン酸一水和物0.5gを添加し、テトラヒドロフランを基質濃度が10%になるまで添加した。析出した結晶をろ別して、乾燥後、表題化合物(41a)0.7g(収率39.3%)を白色結晶(パラトルエンスルホン酸塩)として取得した。光学純度(鏡像体過剰率)100.0%ee、シス体過剰率97.6%deであった。
(Example 12) Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a) N-tert-butoxycarbonyl- (2S, 5R) obtained in Example 11 -2-Methyl-5-aminopiperidine (41a) 1.02 g (optical purity (enantiomeric excess) 97.6% ee, cis isomer excess 61.4% de) and paratoluenesulfonic acid monohydrate 0 0.5 g was added and tetrahydrofuran was added until the substrate concentration was 10%. The precipitated crystals were filtered off and dried, and then 0.7 g (yield 39.3%) of the title compound (41a) was obtained as white crystals (paratoluenesulfonate). The optical purity (enantiomeric excess) was 100.0% ee, and the cis isomer excess was 97.6% de.
(実施例13)N-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)の晶析
実施例11と同様にして取得したN-tert-ブトキシカルボニル-(2S,5R)-2-メチル-5-アミノピペリジン(41a)1.02g(光学純度(鏡像体過剰率)97.8%ee、シス体過剰率62.5%de)にパラトルエンスルホン酸一水和物0.5gを添加し、メチルエチルケトンを基質濃度が7%になるまで添加した。析出した結晶をろ別して、乾燥後、表題化合物(41a)1.1g(収率61.0%)を白色結晶(パラトルエンスルホン酸塩)として取得した。光学純度(鏡像体過剰率)100%ee、シス体過剰率97.8%deであった。
(Example 13) Crystallization of N-tert-butoxycarbonyl- (2S, 5R) -2-methyl-5-aminopiperidine (41a) N-tert-butoxycarbonyl- (2S) obtained in the same manner as in Example 11 , 5R) -2-methyl-5-aminopiperidine (41a) 1.02 g (optical purity (enantiomeric excess) 97.8% ee, cis isomer excess 62.5% de) to paratoluenesulfonic acid monohydrate 0.5 g of the Japanese product was added, and methyl ethyl ketone was added until the substrate concentration was 7%. The precipitated crystals were separated by filtration and dried, and 1.1 g (yield 61.0%) of the title compound (41a) was obtained as white crystals (paratoluenesulfonate). The optical purity (enantiomeric excess) was 100% ee and the cis isomer excess was 97.8% de.
化合物(2)、化合物(2a)、化合物(2b)、化合物(2bx)、化合物(3)、化合物(3a)、化合物(3b)、化合物(3bx)、化合物(4)、化合物(4a)、化合物(4b)はいずれも医薬中間体として有用であり、これら化合物の製造方法もまた医薬中間体の製造方法として有用である。 Compound (2), Compound (2a), Compound (2b), Compound (2bx), Compound (3), Compound (3a), Compound (3b), Compound (3bx), Compound (4), Compound (4a), Compound (4b) is useful as a pharmaceutical intermediate, and the method for producing these compounds is also useful as a method for producing a pharmaceutical intermediate.
Claims (15)
前記光学活性体製造工程で得られた下記式(3)で表される光学活性-cis-ニペコタミドを脱CO転位反応させて下記式(4)で表される光学活性-cis-アミノピペリジンにする転位工程、
を有する光学活性-cis-アミノピペリジンの製造方法。
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基又はアミノ基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。) An optically active substance production process in which racemic-cis-nipecotamide represented by the following formula (2) is converted into an optically active substance;
The optically active-cis-nipecotamide represented by the following formula (3) obtained in the optically active substance production step is subjected to de-CO rearrangement reaction to obtain an optically active-cis-aminopiperidine represented by the following formula (4). Dislocation process,
A process for producing optically active cis-aminopiperidine having
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents an R 1 group bonded to a piperidine ring and an amide group or amino group. (Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100 The method for producing an optically active cis-aminopiperidine according to claim 1, wherein the racemic-cis-nipecotamide represented by the formula (2) has a cis-isomer excess determined by the following formula of 35% de or more.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
前記光学活性体製造工程で得られた下記式(3a)で表される光学活性-cis-N無保護ニペコタミドとアミノ基保護試薬とを反応させるN保護工程、
前記N保護工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミドを脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジンにする転位工程、
を有する請求項1に記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。) An optically active substance production step in which racemic-cis-N unprotected nipecotamide represented by the following formula (2a) is made into an optically active substance;
An N-protecting step in which an optically active-cis-N unprotected nipecotamide represented by the following formula (3a) obtained in the optically active substance production step is reacted with an amino group protecting reagent;
The optically active-cis-N-protected aminopiperidine represented by the following formula (4a) is obtained by subjecting the optically active-cis-N-protected nipecotamide represented by the following formula (3b) obtained in the N-protecting step to de-CO rearrangement reaction. Dislocation process,
The process for producing an optically active cis-aminopiperidine according to claim 1 having the formula:
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
前記N保護工程で得られた下記式(2b)で表されるラセミ-cis-N保護ニペコタミドを光学活性体にする光学活性体製造工程、
前記光学活性体製造工程で得られた下記式(3b)で表される光学活性-cis-N保護ニペコタミドを脱CO転位反応させて下記式(4a)で表される光学活性-cis-N保護アミノピペリジンにする転位工程、
を有する請求項1に記載の光学活性-cis-アミノピペリジンの製造方法。
(式中、R1、cis、及び*は前記と同じ。Proはアミノ基の保護基を示す。) An N-protecting step in which a racemic-cis-N unprotected nipecotamide represented by the following formula (2a) is reacted with an amino group-protecting reagent;
An optically active substance production step in which the racemic-cis-N-protected nipecotamide represented by the following formula (2b) obtained in the N-protecting step is used as an optically active substance;
The optically active-cis-N-protection represented by the following formula (4a) is obtained by subjecting the optically active-cis-N-protected nipecotamide represented by the following formula (3b) obtained in the optically active substance production step to a de-CO rearrangement reaction. Rearrangement step to aminopiperidine,
The process for producing an optically active cis-aminopiperidine according to claim 1 having the formula:
(In the formula, R 1 , cis, and * are the same as above. Pro represents an amino-protecting group.)
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100 6. The production of optically active cis-aminopiperidine according to claim 4 or 5, wherein the racemic-cis-N unprotected nipecotamide represented by the formula (2a) has a cis-isomer excess determined by the following formula of 35% de or more. Method.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(式中、R1及びcisは前記と同じ。) 5. A reduction step of producing a racemic-cis-N unprotected nipecotamide represented by the formula (2a) by hydrogenating a nicotinamide represented by the following formula (1) in the presence of a metal catalyst: 8. The method for producing an optically active cis-aminopiperidine according to any one of 7 above.
(In the formula, R 1 and cis are the same as above.)
(式中、R1、Pro、cis及び*は前記と同じ。) A deprotection step of producing an optically active-cis-N unprotected aminopiperidine represented by the following formula (4b) by deprotecting the optically active-cis-N protected aminopiperidine represented by the following formula (4a): The method for producing an optically active cis-aminopiperidine according to any one of claims 4 to 8.
(In the formula, R 1 , Pro, cis and * are the same as above.)
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。) Racemic-cis-nipecotamide represented by the following formula (2) having a cis isomer excess ratio determined by the following formula of 35% de to 99% de.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (Indicates that
(式中、R1は炭素数1~10のアルキル基を示し、Pro(x)はアミノ基の保護基(ただし、t-ブトキシカルボニル基を除く)を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。) Racemic-cis-nipecotamide represented by the following formula (2a) or the following formula (2bx).
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, and Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group), and cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship.)
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。) An optically active cis-nipecotamide represented by the following formula (3) having a cis excess of 35% de to 99% de determined by the following formula:
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
(式中、R1は炭素数1~10のアルキル基を示し、Pro(x)はアミノ基の保護基(ただし、t-ブトキシカルボニル基を除く)を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。) Optically active-cis-nipecotamide represented by the following formula (3a) or the following formula (3bx).
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, and Pro (x) represents an amino-protecting group (excluding a t-butoxycarbonyl group), and cis represents an R bonded to the piperidine ring. 1 indicates that the amide group is in a cis relationship, and * indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance. )
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミド基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。) An optically active cis that increases both the cis isomer excess and optical purity by crystallization of the optically active cis-nipecotamide represented by the following formula (3) having a cis isomer excess of 35% de or more determined by the following formula: -Purification method of nipecotamide.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(Wherein R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amide group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
シス体過剰率(%de)=(シス体の物質量-トランス体の物質量)/(シス体の物質量+トランス体の物質量)×100
(式中、R1は炭素数1~10のアルキル基を示し、P1はアミノ基の保護基又は水素原子を示す。cisはピペリジン環に結合するR1基とアミノ基とがシスの関係にあることを示す。*はそれが付された炭素原子が不斉炭素であることと該不斉炭素を有する化合物が光学活性体であることを示す。) An optical activity represented by the following formula (4) having a cis isomer excess of 35% de or more determined by the following formula: Optical activity to increase both cis isomer excess and optical purity by crystallization of cis-aminopiperidine Purification method of cis-aminopiperidine.
Cis isomer excess (% de) = (cis isomer substance amount−trans isomer substance amount) / (cis isomer substance amount + trans isomer substance amount) × 100
(In the formula, R 1 represents an alkyl group having 1 to 10 carbon atoms, P 1 represents an amino-protecting group or a hydrogen atom. Cis represents a cis relationship between the R 1 group bonded to the piperidine ring and the amino group. (* Indicates that the carbon atom to which it is attached is an asymmetric carbon and that the compound having the asymmetric carbon is an optically active substance.)
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