WO2019131695A1 - Production method for 1-[5-(2-fluorophenyl)-1-(pyridin-3-ylsulfonyl)-1h-pyrrol-3-yl]-n-methylmethanamine monofumarate - Google Patents
Production method for 1-[5-(2-fluorophenyl)-1-(pyridin-3-ylsulfonyl)-1h-pyrrol-3-yl]-n-methylmethanamine monofumarate Download PDFInfo
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K31/00—Medicinal preparations containing organic active ingredients
- A61K31/33—Heterocyclic compounds
- A61K31/395—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins
- A61K31/435—Heterocyclic compounds having nitrogen as a ring hetero atom, e.g. guanethidine or rifamycins having six-membered rings with one nitrogen as the only ring hetero atom
- A61K31/44—Non condensed pyridines; Hydrogenated derivatives thereof
- A61K31/4427—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems
- A61K31/4439—Non condensed pyridines; Hydrogenated derivatives thereof containing further heterocyclic ring systems containing a five-membered ring with nitrogen as a ring hetero atom, e.g. omeprazole
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61P—SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS OR MEDICINAL PREPARATIONS
- A61P1/00—Drugs for disorders of the alimentary tract or the digestive system
- A61P1/04—Drugs for disorders of the alimentary tract or the digestive system for ulcers, gastritis or reflux esophagitis, e.g. antacids, inhibitors of acid secretion, mucosal protectants
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- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/30—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members
- C07D207/32—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/33—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having two double bonds between ring members or between ring members and non-ring members with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to ring carbon atoms with substituted hydrocarbon radicals, directly attached to ring carbon atoms
- C07D207/333—Radicals substituted by oxygen or sulfur atoms
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- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B51/00—Introduction of protecting groups or activating groups, not provided for in the preceding groups
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Definitions
- the present invention relates to an acid secretion inhibitor, 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrol-3-yl] -N-methylmethanamine mono-
- the present invention relates to a method for producing fumaric acid salt and its intermediate.
- Bonoprazan fumarate is a potassium ion competitive acid blocker, which inhibits the binding of potassium ion to H + and K ⁇ ATPase and suppresses gastric acid secretion, thereby treating gastric and duodenal ulcers, etc. It is used for pH control in the stomach at the time of prevention and Helicobacter-Helicobacter pylori eradication. Bonoprazan fumarate is stable against acids, rapidly reaches effective concentration, and rapidly suppresses the action of gastric acid for a long time, compared to existing proton pump inhibitors It is known.
- Patent Document 1 discloses synthesis of a pyrrol-3-carboxaldehyde derivative, which is a synthetic intermediate, from a cyano compound represented by the following formula via a pyrrol compound. Methods are disclosed.
- Patent No. 5819494 gazette Patent No. 3140818 gazette
- the present invention provides a process for producing a synthetic intermediate pyrrol-3-carboxaldehyde derivative in the production of bonoprazan fumarate, and an industrial process for producing a novel bonoprazan fumarate using the derivative.
- the purpose is
- the protective group represented by P is a silyl-based protective group as described above. 1] It relates to the manufacturing method described. [3] The present invention also relates to the process according to the above [1] or [2], wherein the protective group represented by P is a triisopropylsilyl group. [4] Further, according to the present invention, the pyrrole derivative of the above general formula (I) is Following formula (V):
- the orthofluorobenzene derivative represented by (wherein L represents a leaving group) is obtained by the reaction with pyrrole in the presence of a metal catalyst.
- L represents a leaving group
- the present invention relates to a method for producing compound (I) of [5]
- the present invention also relates to the production method of the above-mentioned [4], wherein the metal catalyst is a palladium catalyst.
- the present invention also relates to 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde represented by the general formula (IV) obtained by the above-mentioned production method, an inorganic base or an organic base Reaction with pyridine-3-sulfonyl chloride or a salt thereof in the presence of The following formula (VI):
- the present invention relates to a method for producing 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrol-3-yl] -N-methylmethanamine represented by . [7] Further, the present invention provides 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H with fumaric acid and a compound of the general formula (VII) obtained by the above-mentioned production method The present invention relates to a process for producing -pyrrol-3-yl] -N-methylmethanamine monofumaric acid salt.
- 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde is good in an inexpensive, short and short process using easily available raw materials such as pyrrole and 2-fluoroiodobenzene. It is possible to obtain a yield (70% or more), is more economical and productivity than conventional methods, and is suitable for industrial production. Furthermore, the use of the transition metal catalyst can be kept to a very small amount, and by using it in the upstream process, it is possible to reduce the concern about metal impurities remaining in the final product.
- halogen atoms of chlorine, bromine and iodine lower alkanesulfonyloxy groups such as methanesulfonyloxy group and trifluoromethanesulfonyloxy group, benzenesulfonyloxy And arylsulfonyloxy groups such as p-toluenesulfonyloxy group can be mentioned.
- silyl-based protective groups include trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl, triisopropylsilyl, tert-butyldiphenylsilyl and the like, and a preferred example is tert. -Butyldimethylsilyl group, triisopropylsilyl group and the like.
- alkyl protecting group examples include an allyl group, a dimethoxymethyl group, a diethoxymethyl group, a tert-butyl group, a triphenylmethyl group, a benzyl group and a 4-methoxybenzyl group.
- heteroaryl-based protecting group examples include 2-pyridyl group, 4-pyridyl group, 2-pyrazyl group, 2-pyrimidyl group and 2-triazyl group.
- a carboxyl group protecting group a methoxycarbonyl group, an ethoxycarbonyl group, a tert-butoxycarbonyl group, a tert-amyloxycarbonyl group, a 2,2,2-trichloroethoxycarbonyl group, a benzyloxycarbonyl group, a p-chloro group Benzyloxycarbonyl group, p-methoxybenzyloxycarbonyl group, p-nitrobenzyloxycarbonyl group, p-phenylazobenzyloxycarbonyl group, p-methoxyphenylazobenzyloxycarbonyl group, 3,5-dimethoxybenzyloxycarbonyl group, 3,4,5-Trimethoxybenzyloxycarbonyl group, p-biphenylisopropyloxycarbonyl group, diisopropyl methyloxycarbonyl group, 2- (trimethylsilyl) ethoxycarbonyl group, 9-fluoren
- alkylsulfonyl groups such as methanesulfonyl group, arylsulfonyl groups such as p-toluenesulfonyl group, alkylacyl groups such as acetyl group, and arylacyl groups such as benzoyl group can be used.
- a silyl protecting group is preferable as a protecting group from the viewpoint of yield etc., and a trimethylsilyl group, a triethylsilyl group, a tert-butyldimethylsilyl group and a triisopropylsilyl group are particularly preferable.
- it is a triisopropyl silyl group.
- a nickel catalyst, a palladium catalyst or the like can be used as the metal catalyst used in the reaction for obtaining the compound (I) from the compound (V).
- nickel catalysts used in the present invention include zero-valent nickel catalysts such as bis (1,5-cyclooctadienyl) nickel, and divalent nickel catalysts such as nickel chloride and bis (triphenylphosphine) nickel chloride.
- Triphenylphosphine 2- (di-tert-butylphosphino) biphenyl, Xantphos, bis [2- (diphenylphosphino) phenyl] ether (hereinafter referred to as DPEPhos), ( ⁇ ) -2, Adding a phosphine ligand such as 2′-bis (diphenylphosphino) -1,1′-binaphthyl (hereinafter, ( ⁇ ) -BINAP), N, N, N ′, N′-tetramethylethylenediamine, etc. it can.
- DPEPhos bis [2- (diphenylphosphino) phenyl] ether
- the palladium catalyst used in the present invention may be a zero-valent palladium catalyst such as palladium carbon or tetrakistriphenylphosphine palladium or a divalent palladium such as palladium chloride, palladium acetate or (dichlorobis (tri-o-tolylphosphine)) palladium.
- a catalyst may be mentioned, and if necessary, phosphine ligands such as triphenylphosphine, 2- (di-tert-butylphosphino) biphenyl, Xantphos, DPEPhos, ( ⁇ ) -BINAP and the like can be added.
- Examples of the base used in the present invention include tertiary amines such as triethylamine and diisopropylethylamine, lithium hydride, sodium hydride, potassium hydrogen, sodium amide, lithium diisopropylamide (hereinafter referred to as LDA), lithium hexamethyl disilazide (hereinafter referred to as (LiHMDS), ethylmagnesium, sodium carbonate, calcium carbonate and other metal bases can be added.
- tertiary amines such as triethylamine and diisopropylethylamine
- lithium hydride sodium hydride
- potassium hydrogen sodium amide
- lithium diisopropylamide hereinafter referred to as LDA
- LiHMDS lithium hexamethyl disilazide
- ethylmagnesium sodium carbonate, calcium carbonate and other metal bases can be added.
- Compound (I) can be produced by the cross coupling reaction described in Non-Patent Document 3 or Non-Patent Document 4, or the like.
- a base preferably a metal base
- an inert gas atmosphere such as nitrogen or argon
- ethers such as diethyl ether of sodium hydride, cyclopropyl methyl ether, tetrahydrofuran, 4-methyltetrahydropyran, dioxane, monoglyme, diglyme and the like; aromatic hydrocarbons such as benzene, toluene, xylene and the like
- a solution of 1 to 3 equivalents of pyrrole / the solvent is added dropwise at -10 ° C to room temperature and stirred for 10 minutes to 1 hour, and then 1 to 3 equivalents of zinc
- the catalyst such as 1 to 3 equivalents of compound (V), 0.0001 to 1.0 equivalents (preferably 0.001 to 0.003 equivalents) of the catalyst such as palladium, etc. and 0.0001 to 1.0 equivalents (preferably) (0.001 to 0.003 equivalents) of the above phosphine ligand, and reacting at room temperature to 150 ° C. (preferably 90 to 130 ° C.) for 5 minutes to 24 hours to produce compound (I) it can.
- the compound (II) can be produced by introducing a protecting group into the compound (I), and the introduction of the protecting group may vary depending on the selected protecting group, but a generally known method can be adopted.
- a silyl-based protecting group 1 to 1.5 equivalents of the above-mentioned bases, preferably metal bases, more preferably sodium hydride diethyl ether, cyclopropyl methyl ether, tetrahydrofuran, 4 -Aprotic polar solvents such as ethers such as methyl tetrahydropyran, dioxane, monoglyme and diglyme, or N, N-dimethylformamide or mixed solvents thereof, preferably in the solvent suspension such as ethers I) is added dropwise at -10 ° C to room temperature, and then a metal chelating agent such as crown ether, tetraethylenediamine or dimethylimidazolidinone, preferably dimethylimid
- the reaction conditions vary depending on the kind of the cationic protecting group, and for example, tert-butoxycarbonyl (Boc group), tert- for compound (I), etc.
- an organic base such as triethylamine or pyridine, sodium hydride, potassium hydroxide, sodium hydroxide, sodium hydrogencarbonate, hydrogencarbonate Di-tert-butyl dicarbonate in the presence of an inorganic base such as sodium ((Bo c) 2 O) or tert-butoxycarbonyl chloride, benzyloxycarbonyl chloride, tert-amyloxycarbonyl chloride, 9-fluorenylmethyloxycarbonyl chloride, 2,2,2-trichloroethyl chloroformate, 2- (trimethylsilyl)
- a reagent to be introduced such as a commonly known Boc group such as ethoxymethyl chloride, tert-butoxycarbonyl azide, benzyloxycarbonyl azide, etc.
- the compound (III) can be produced by a generally known formylation reaction such as Vilsmeier reaction, Rieche reaction, Daff reaction, Reimer-Tiemann reaction, etc.
- a generally known formylation reaction such as Vilsmeier reaction, Rieche reaction, Daff reaction, Reimer-Tiemann reaction, etc.
- N, N-dimethylformamide (DMF), N- N, N-disubstituted formamide such as methylformanilide (MFA), N-formyl morpholine, N, N-diisopropylformamide, and phosphorus oxychloride, oxalyl chloride, thionyl chloride, triphenylphosphine-bromine, hexachlorotriphospazatriene, etc.
- the Vilsmeier reagent (chloromethylene) dimethyliminium chloride) is prepared from the acid chloride of or commercially available, and this and the compound (II) are used as a solvent such as phosphorus oxychloride; Halogenated hydrocarbons such as ethane, chloroform, carbon tetrachloride and chlorobenzene; aromatic hydrocarbons such as benzene, toluene and nitrobenzene; ethers such as tetrahydrofuran, tetramethylhydropyran and dioxane or ethyl acetate, acetonitrile, N, Aprotic polar solvents such as N-dimethylformamide or mixed solvents thereof, preferably ether solvents, aromatic hydrocarbons, aprotic polar solvents or mixed solvents thereof, more preferably in tetramethyl hydropyran
- the compound (III) can be produced by reaction after stirring at -100 ° C. (preferably 40-80 ° C
- Compound (IV) can be produced from the deprotection reaction of compound (III).
- the deprotection reaction varies depending on the protecting group, generally known methods can be used.
- the protecting group is a silyl protecting group
- tetrabutylammonium fluoride is allowed to react at ⁇ 10 ° C. to room temperature in a solution such as tetrahydrofuran. It can be produced by reacting a fluorine source such as HF pyridine complex or HF triethylamine complex.
- the deprotecting reaction of the silyl protecting group proceeds similarly under acidic conditions such as hydrochloric acid and trifluoroacetic acid, and under basic conditions such as aqueous sodium hydroxide solution, and compound (IV) can be produced.
- the deprotecting reagent can be 3 to 10 equivalents (preferably 5 equivalents) of aqueous sodium hydroxide solution relative to compound (III).
- reaction conditions may differ depending on the kind of the protecting group of a carboxylate type, but the reaction can be carried out by a generally known method, for example, palladium black under hydrogen atmosphere It can be carried out by catalytic reduction in the presence of palladium carbon or the like, or by appropriately selecting acetic acid / hydrogen bromide, trifluoroacetic acid, hydrochloric acid / organic solvent etc. as a protective group.
- Compound (IV) can also be produced by one-pot operation without isolating Compound (III) from Compound (II).
- the reaction can be carried out by adding the reagent for the deprotection to the reaction system after completion of the reaction of the compound (II) to the compound (III).
- the compound (IV) can also be produced by a one-pot operation without isolating the compound (II) and the compound (III) from the compound (I).
- the reaction reagent in the production of the compound (IV) is added to the reaction system, and after completion of the reaction, the reagent for the above-mentioned deprotection reaction is further added to the reaction system, and the compound (IV) is produced by the same reaction. be able to.
- the amount relationship of reagents in any production the same amount as described above can be used.
- Compound (VI) can be produced by further adding pyridine-3-sulfonyl chloride and stirring at ⁇ 10 ° C. to room temperature for 0.5 to 1 hour.
- Compound (VI) can be prepared by using triethylamine, a base such as N, N-diisopropylamine, a catalytic amount of 4-dimethylaminopyridine, or pyridine-3-3 in a solution of compound (IV) in dichloromethane or acetonitrile at 0 ° C. to room temperature. It can be prepared by adding sulfonyl chloride and stirring at room temperature to 100 ° C. for 0.5 to 12 hours.
- 15-crown-5-ether (0.16 mL, 0.79 mmol) was added and the mixture was stirred at 0 ° C. for 0.5 hour. Subsequently, pyridine-3-sulfonyl chloride (95 ⁇ L, 0.79 mmol) was added and stirred at 0 ° C. for 0.5 hours. Further, pyridine-3-sulfonyl chloride (95 ⁇ L, 0.79 mmol) was added and stirred at 0 ° C. for 0.5 hour. Water was added dropwise and partitioned with ethyl acetate.
- Example 7 Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde Sodium hydride (dispersed in 60% liquid paraffin, 8.8 g, 220.0 mmol) and 4-methyltetrahydropyran (100 mL) To the suspension is added dropwise pyrol (15.7 mL, 220.0 mmol) under ice-cooling and stirred for 0.5 hours, then zinc chloride (30.3 g, 220.0 mmol) is added and stirred at room temperature for 0.5 hour did.
- Oxalyl chloride (17.2 mL, 200.0 mmol) was added to dichloromethane (100 mL), DMF (15.5 mL, 200.0 mmol) was added dropwise under ice-cooling, and the mixture was stirred for 0.5 hours.
- a 4-methyltetrahydropyran (100 mL) solution of the obtained crude product of 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole was added in one portion and stirred at about 50 ° C. for 3 hours did. Under ice-cooling, aqueous sodium hydroxide solution (5.0 M, 100 mL) was added and the mixture was stirred overnight at room temperature.
- Example 8 Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde (one-pot synthesis from 2- (2-fluorophenyl) -1H-pyrrole) After adding dimethylimidazolidinone (20.0 mL, 186 mmol) to a solution of 2- (2-fluorophenyl) -1H-pyrrole (10.0 g, 62.0 mmol) in 4-methyltetrahydropyran (62 mL), Sodium hydride (dispersed in 60% liquid paraffin, 2.7 g, 68.2 mmol) was slowly added under ice-cooling and stirred for 10 minutes.
- aqueous sodium hydroxide solution (2.0 M, 310 mL) was added and the mixture was stirred overnight at room temperature.
- the organic layer was separated, and the aqueous layer was partitioned with ethyl acetate (120 mL).
- the organic layer was combined, washed with saturated brine (120 mL), and the solvent was evaporated under reduced pressure.
- Ethyl acetate (29 mL) was added to the obtained solid residue, and after dissolution at about 70 ° C., heptane (180 mL) was added.
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Abstract
Description
本発明は、酸分泌抑制薬である1-[5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-イル]-N-メチルメタンアミンモノフマル酸塩及びその中間体の製造方法に関する。 The present invention relates to an acid secretion inhibitor, 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrol-3-yl] -N-methylmethanamine mono- The present invention relates to a method for producing fumaric acid salt and its intermediate.
下記式で示される1-[5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-イル]-N-メチルメタンアミンモノフマル酸塩(以下、ボノプラザンフマル酸塩)は、カリウムイオン競合型アシッドブロッカ-であり、カリウムイオンのH+,K±ATPaseへの結合を阻害し、胃酸分泌を抑制することから、胃・十二指腸潰瘍等の治療や予防、ヘリコバクタ-・ピロリ除菌時の胃内pH調整に用いられている。ボノプラザンフマル酸塩は既存のプロトンポンプインヒビタ-と比較して、酸に対して安定であり、有効濃度への到達が速やかで、服用から作用発現までが早く胃酸を長時間にわたって強く抑制することが知られている。 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrol-3-yl] -N-methylmethanamine monofumaric acid salt represented by the following formula , Bonoprazan fumarate) is a potassium ion competitive acid blocker, which inhibits the binding of potassium ion to H + and K ± ATPase and suppresses gastric acid secretion, thereby treating gastric and duodenal ulcers, etc. It is used for pH control in the stomach at the time of prevention and Helicobacter-Helicobacter pylori eradication. Bonoprazan fumarate is stable against acids, rapidly reaches effective concentration, and rapidly suppresses the action of gastric acid for a long time, compared to existing proton pump inhibitors It is known.
ボノプラザンフマル酸塩の製造方法については、例えば特許文献1には、合成中間体であるピロ-ル-3-カルボキシアルデヒド誘導体について、下記式で示されるシアノ化合物からピロ-ル体を経て合成する方法が開示されている。 With regard to a method for producing vonoprazan fumarate, for example, Patent Document 1 discloses synthesis of a pyrrol-3-carboxaldehyde derivative, which is a synthetic intermediate, from a cyano compound represented by the following formula via a pyrrol compound. Methods are disclosed.
この方法では[2-(2-フルオロフェニル)-2-オキソエチル]プロパンジニトリル(a)を原料としている。この原料は、特許文献2記載の方法により製造できることが記載されており、臭化2-フルオロフェナシルからマロノニトリルの反応により合成することが開示されている。また、臭化2-フルオロフェナシルは、一般公知の方法により製造できることが記載されている。具体的な記載はないが、例えば酢酸中で臭素と反応させる方法(非特許文献1)や、塩化アルミニウムの存在下、臭素と反応させる方法などが知られている(非特許文献2)。原料の合成に2工程を要するため、目的化合物の製造に多工程が必要となる。またこれらの反応では、毒性や環境への影響が懸念されるマロノニトリルや腐食性、刺激性の強い臭素を必要とすることから、より人体及び環境への安全に配慮した製造方法が望まれる。また、5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドは、原料より収率53%~60%で合成されており、収率の改善も望まれる。
従って、人体や環境への影響の少なく、より短工程で収率の良い製造方法が望まれる。
In this method, [2- (2-fluorophenyl) -2-oxoethyl] propanedinitrile (a) is used as a raw material. It is described that this raw material can be produced by the method described in Patent Document 2, and it is disclosed that it is synthesized from 2-fluorophenacyl bromide by the reaction of malononitrile. In addition, it is described that 2-fluorophenacyl bromide can be produced by a generally known method. Although there is no specific description, for example, a method of reacting with bromine in acetic acid (Non-patent Document 1), a method of reacting with bromine in the presence of aluminum chloride, and the like are known (Non-patent Document 2). Since two steps are required to synthesize the raw materials, multiple steps are required to produce the target compound. In addition, since these reactions require malononitrile, which may cause toxicity or environmental impact, or corrosive or irritant bromine, a production method more in consideration of human and environmental safety is desired. In addition, 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde is synthesized from a raw material in a yield of 53% to 60%, and improvement of the yield is also desired.
Therefore, a production method with less yield to human bodies and the environment and better yield in a shorter process is desired.
本発明は、ボノプラザンフマル酸塩の製造における合成中間体ピロ-ル-3-カルボキシアルデヒド誘導体の製造法及び当該誘導体を用いた新規なボノプラザンフマル酸塩の工業的製造法を提供することを目的とする。 The present invention provides a process for producing a synthetic intermediate pyrrol-3-carboxaldehyde derivative in the production of bonoprazan fumarate, and an industrial process for producing a novel bonoprazan fumarate using the derivative. The purpose is
本発明者らは鋭意検討を行った結果、入手容易なフルオロヨードベンゼンとピロールによるカップリング反応、およびピロ-ル環上窒素原子の適切な保護による位置選択的なホルミル化反応を用いることでピロ-ル-3-カルボキシアルデヒド誘導体を高収率かつ簡便に製造する方法を見出し、本発明を完成するに至った。 As a result of intensive studies, the present inventors have found that coupling reactions with readily available fluoroiodobenzene and pyrrole and regioselective formylation reactions by appropriate protection of nitrogen atoms on the pyrrol ring The present invention has been accomplished by finding a method for easily producing a-3-carboxaldehyde derivative in a high yield.
すなわち
[1]本発明は、下記一般式(I)、
[1] The present invention relates to the following general formula (I),
下記式(II):
The following formula (II):
[3]また本発明は、前記Pで表される保護基が、トリイソプロピルシリル基である前記[1]又は[2]記載の製造方法に関するものである。
[4]また本発明は、前記一般式(I)のピロール誘導体が、
下記式(V):
[3] The present invention also relates to the process according to the above [1] or [2], wherein the protective group represented by P is a triisopropylsilyl group.
[4] Further, according to the present invention, the pyrrole derivative of the above general formula (I) is
Following formula (V):
[5]また本発明は、前記金属触媒がパラジウム触媒である前記[4]記載の製造方法に関するものである。
[6]また本発明は、前記製造方法により得られた一般式(IV)で表される5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドを、無機塩基または有機塩基の存在下、ピリジン-3-スルホニルクロリドまたはその塩と反応させ、
下記式(VI):
[5] The present invention also relates to the production method of the above-mentioned [4], wherein the metal catalyst is a palladium catalyst.
[6] The present invention also relates to 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde represented by the general formula (IV) obtained by the above-mentioned production method, an inorganic base or an organic base Reaction with pyridine-3-sulfonyl chloride or a salt thereof in the presence of
The following formula (VI):
[7]また本発明は、前記製造方法により得られた一般式(VII)の化合物とフマル酸による1-[5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-イル]-N-メチルメタンアミンモノフマル酸塩の製造方法に関するものである。
[7] Further, the present invention provides 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H with fumaric acid and a compound of the general formula (VII) obtained by the above-mentioned production method The present invention relates to a process for producing -pyrrol-3-yl] -N-methylmethanamine monofumaric acid salt.
本発明は、ピロールや2-フルオロヨードベンゼンなどの入手容易な原料を用い、安価で短時間かつ短工程で5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドを良好な収率(70%以上)で得ることが可能であり、従来法よりも経済性及び生産性が高く工業的生産に適する。さらに遷移金属触媒の使用に関しても極少量に抑え、かつ上流工程で用いることで、より最終物への金属不純物残留に対する懸念を低減することが可能である。 In the present invention, 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde is good in an inexpensive, short and short process using easily available raw materials such as pyrrole and 2-fluoroiodobenzene. It is possible to obtain a yield (70% or more), is more economical and productivity than conventional methods, and is suitable for industrial production. Furthermore, the use of the transition metal catalyst can be kept to a very small amount, and by using it in the upstream process, it is possible to reduce the concern about metal impurities remaining in the final product.
以下、本発明について更に詳細に説明する。
前記一般式(V)中、Lで表される脱離基としては、塩素、臭素、ヨウ素のハロゲン原子、メタンスルホニルオキシ基やトリフルオロメタンスルホニルオキシ基のような低級アルカンスルホニルオキシ基、ベンゼンスルホニルオキシ基やp-トルエンスルホニルオキシ基のようなアリールスルホニルオキシ基等を挙げることができる。
Hereinafter, the present invention will be described in more detail.
As the leaving group represented by L in the general formula (V), halogen atoms of chlorine, bromine and iodine, lower alkanesulfonyloxy groups such as methanesulfonyloxy group and trifluoromethanesulfonyloxy group, benzenesulfonyloxy And arylsulfonyloxy groups such as p-toluenesulfonyloxy group can be mentioned.
前記一般式(II)及び(III)中、Pで表されるピロ-ル環窒素保護基としては、シリル系保護基あるいはアルキル系保護基、ヘテロアリール系保護基、アシル系保護基、カ-バメ-ト系保護基等が挙げられ、シリル系保護基としてはトリメチルシリル基、トリエチルシリル基、tert-ブチルジメチルシリル基、トリイソプロピルシリル基、tert-ブチルジフェニルシリル基等が挙げられ、好ましくはtert-ブチルジメチルシリル基、トリイソプロピルシリル基等が挙げられる。
アルキル系保護基としてはアリル基、ジメトキシメチル基、ジエトキシメチル基、tert-ブチル基、トリフェニルメチル基、ベンジル基、4-メトキシベンジル基などが挙げられる。
ヘテロアリール系保護基としては2-ピリジル基、4-ピリジル基、2-ピラジル基、2-ピリミジル基、2-トリアジル基が挙げられる。
カ-バメ-ト系保護基としてはメトキシカルボニル基、エトキシカルボニル基、tert-ブトキシカルボニル基、tert-アミロキシカルボニル基、2,2,2-トリクロロエトキシカルボニル基、ベンジルオキシカルボニル基、p-クロロベンジルオキシカルボニル基、p-メトキシベンジルオキシカルボニル基、p-ニトロベンジルオキシカルボニル基、p-フェニルアゾベンジルオキシカルボニル基、p-メトキシフェニルアゾベンジルオキシカルボニル基、3,5-ジメトキシベンジルオキシカルボニル基、3,4,5-トリメトキシベンジルオキシカルボニル基、p-ビフェニルイソプロピルオキシカルボニル基、ジイソプロピルメチロキシカルボニル基、2-(トリメチルシリル)エトキシカルボニル基、9-フルオレニルメチルオキシカルボニル基等が挙げられる。
また、その他の保護基としてメタンスルホニル基等のアルキルスルホニル基、p-トルエンスルホニル基等のアリ-ルスルホニル基、アセチル基などのアルキルアシル基、ベンゾイル基などのアリールアシル基を用いることができる。
これらの保護基のうち、保護基としては収率等の点からシリル系保護基が好ましく、特に好ましくはトリメチルシリル基、トリエチルシリル基、tert-ブチルジメチルシリル基、トリイソプロピルシリル基が挙げられ、さらに好ましくはトリイソプロピルシリル基である。
In the general formulas (II) and (III), as a pyrrol ring nitrogen protecting group represented by P, a silyl protecting group, an alkyl protecting group, a heteroaryl protecting group, an acyl protecting group, a car Examples of silyl-based protective groups include trimethylsilyl, triethylsilyl, tert-butyldimethylsilyl, triisopropylsilyl, tert-butyldiphenylsilyl and the like, and a preferred example is tert. -Butyldimethylsilyl group, triisopropylsilyl group and the like.
Examples of the alkyl protecting group include an allyl group, a dimethoxymethyl group, a diethoxymethyl group, a tert-butyl group, a triphenylmethyl group, a benzyl group and a 4-methoxybenzyl group.
Examples of the heteroaryl-based protecting group include 2-pyridyl group, 4-pyridyl group, 2-pyrazyl group, 2-pyrimidyl group and 2-triazyl group.
As a carboxyl group protecting group, a methoxycarbonyl group, an ethoxycarbonyl group, a tert-butoxycarbonyl group, a tert-amyloxycarbonyl group, a 2,2,2-trichloroethoxycarbonyl group, a benzyloxycarbonyl group, a p-chloro group Benzyloxycarbonyl group, p-methoxybenzyloxycarbonyl group, p-nitrobenzyloxycarbonyl group, p-phenylazobenzyloxycarbonyl group, p-methoxyphenylazobenzyloxycarbonyl group, 3,5-dimethoxybenzyloxycarbonyl group, 3,4,5-Trimethoxybenzyloxycarbonyl group, p-biphenylisopropyloxycarbonyl group, diisopropyl methyloxycarbonyl group, 2- (trimethylsilyl) ethoxycarbonyl group, 9-fluorenyl Etc. chill oxycarbonyl group.
As other protective groups, alkylsulfonyl groups such as methanesulfonyl group, arylsulfonyl groups such as p-toluenesulfonyl group, alkylacyl groups such as acetyl group, and arylacyl groups such as benzoyl group can be used.
Among these protecting groups, a silyl protecting group is preferable as a protecting group from the viewpoint of yield etc., and a trimethylsilyl group, a triethylsilyl group, a tert-butyldimethylsilyl group and a triisopropylsilyl group are particularly preferable. Preferably it is a triisopropyl silyl group.
本発明において、化合物(V)から化合物(I)を得る反応において用いられる金属触媒としては、ニッケル触媒やパラジウム触媒等を用いることができる。
本発明に用いられるニッケル触媒としては、ビス(1,5-シクロオクタジエニル)ニッケル等の0価のニッケル触媒、ニッケルクロリド、ビス(トリフェニルホスフィン)ニッケルクロリド等の2価のニッケル触媒等が挙げられ、必要に応じてトリフェニルホスフィン、2-(ジ-tert-ブチルホスフィノ)ビフェニル、Xantphos、ビス[2- (ジフェニルホスフィノ)フェニル]エーテル(以下、DPEPhos)、(±)-2,2’-ビス(ジフェニルホスフィノ)-1,1’-ビナフチル(以下、(±)-BINAP)等のホスフィン配位子、N,N,N’,N’-テトラメチルエチレンジアミン等を加えることができる。
本発明に用いられるパラジウム触媒としては、パラジウム炭素、テトラキストリフェニルホスフィンパラジウム等の0価のパラジウム触媒あるいは塩化パラジウム、酢酸パラジウム、(ジクロロビス(トリ-o-トリルホスフィン))パラジウム等の2価のパラジウム触媒が挙げられ、必要に応じてトリフェニルホスフィン、2-(ジ-tert-ブチルホスフィノ)ビフェニル、Xantphos、DPEPhos、(±)-BINAP等のホスフィン配位子等を加えることができる。
本発明に用いられる塩基としては、トリエチルアミン、ジイソプロピルエチルアミンなどの3級アミン、水素化リチウム、水素化ナトリウム、水素カリウム、ナトリウムアミド、リチウムジイソプロピルアミド(以下、LDA)、リチウムヘキサメチルジシラジド(以下、LiHMDS)、エチルマグネシウム、炭酸ナトリウム、炭酸カルシウムなどの金属塩基等を加えることができる。
In the present invention, a nickel catalyst, a palladium catalyst or the like can be used as the metal catalyst used in the reaction for obtaining the compound (I) from the compound (V).
Examples of nickel catalysts used in the present invention include zero-valent nickel catalysts such as bis (1,5-cyclooctadienyl) nickel, and divalent nickel catalysts such as nickel chloride and bis (triphenylphosphine) nickel chloride. Triphenylphosphine, 2- (di-tert-butylphosphino) biphenyl, Xantphos, bis [2- (diphenylphosphino) phenyl] ether (hereinafter referred to as DPEPhos), (±) -2, Adding a phosphine ligand such as 2′-bis (diphenylphosphino) -1,1′-binaphthyl (hereinafter, (±) -BINAP), N, N, N ′, N′-tetramethylethylenediamine, etc. it can.
The palladium catalyst used in the present invention may be a zero-valent palladium catalyst such as palladium carbon or tetrakistriphenylphosphine palladium or a divalent palladium such as palladium chloride, palladium acetate or (dichlorobis (tri-o-tolylphosphine)) palladium. A catalyst may be mentioned, and if necessary, phosphine ligands such as triphenylphosphine, 2- (di-tert-butylphosphino) biphenyl, Xantphos, DPEPhos, (±) -BINAP and the like can be added.
Examples of the base used in the present invention include tertiary amines such as triethylamine and diisopropylethylamine, lithium hydride, sodium hydride, potassium hydrogen, sodium amide, lithium diisopropylamide (hereinafter referred to as LDA), lithium hexamethyl disilazide (hereinafter referred to as (LiHMDS), ethylmagnesium, sodium carbonate, calcium carbonate and other metal bases can be added.
本発明におけるボノプラザンフマル酸塩の製造における合成中間体ピロ-ル-3-カルボキシアルデヒド誘導体の製造法及び当該誘導体を用いたボノプラザンフマル酸塩の製造法を次に示す。 The process for producing the synthetic intermediate pyrrol-3-carboxaldehyde derivative in the production of bonoprazan fumaric acid salt according to the present invention and the process for producing bonoprazan fumaric acid salt using the derivative are shown below.
(化合物(I)の製造)
化合物(I)は非特許文献3や非特許文献4に記載のクロスカップリング反応などにより製造することができる。例えば、根岸カップリング反応を用いることでハロゲン化されていない無置換のピロールを用いることができ、窒素又はアルゴン等の不活性ガス雰囲気下1~3当量の前述の塩基、好ましくは金属塩基、より好ましくは水素化ナトリウムのジエチルエ-テル、シクロプロピルメチルエ-テル、テトラヒドロフラン、4-メチルテトラヒドロピラン、ジオキサン、モノグライム、ジグライム等のエ-テル類;ベンゼン、トルエン、キシレン等の芳香族炭化水素類等の溶媒懸濁液に1~3当量のピロール/前記溶媒の溶液を-10℃~室温で滴下し10分~1時間撹拌した後、1~3当量のハロゲン化亜鉛(塩化亜鉛、臭化亜鉛)等の無機亜鉛、ジピバロイル亜鉛等の有機亜鉛(好ましくは、ハロゲン化亜鉛、特に好ましくは塩化亜鉛)を加え室温で10分~1時間攪拌する。次に、1~3当量の化合物(V)、0.0001~1.0当量(好ましくは0.001~0.003当量)のパラジウム等の前記触媒と0.0001~1.0当量(好ましくは0.001~0.003当量)の前記ホスフィン配位子を加え、室温~150℃(好ましくは90~130℃)で5分~24時間反応させることにより化合物(I)を製造することができる。
(Production of Compound (I))
Compound (I) can be produced by the cross coupling reaction described in Non-Patent Document 3 or Non-Patent Document 4, or the like. For example, it is possible to use unsubstituted pyrrole which is not halogenated by using Negishi coupling reaction, 1 to 3 equivalents of the aforementioned base, preferably a metal base, under an inert gas atmosphere such as nitrogen or argon Preferably, ethers such as diethyl ether of sodium hydride, cyclopropyl methyl ether, tetrahydrofuran, 4-methyltetrahydropyran, dioxane, monoglyme, diglyme and the like; aromatic hydrocarbons such as benzene, toluene, xylene and the like A solution of 1 to 3 equivalents of pyrrole / the solvent is added dropwise at -10 ° C to room temperature and stirred for 10 minutes to 1 hour, and then 1 to 3 equivalents of zinc halide (zinc chloride, zinc bromide Etc.), organic zinc such as dipivaloyl zinc (preferably zinc halide, particularly preferably zinc chloride) and It is stirred in 10 minutes to 1 hour. Next, the catalyst such as 1 to 3 equivalents of compound (V), 0.0001 to 1.0 equivalents (preferably 0.001 to 0.003 equivalents) of the catalyst such as palladium, etc. and 0.0001 to 1.0 equivalents (preferably) (0.001 to 0.003 equivalents) of the above phosphine ligand, and reacting at room temperature to 150 ° C. (preferably 90 to 130 ° C.) for 5 minutes to 24 hours to produce compound (I) it can.
(化合物(II)の製造)
化合物(II)は化合物(I)に保護基を導入することにより製造することができ、保護基の導入は選択する保護基により製造方法は異なるが、一般公知の方法を採用することができる。例えばシリル系の保護基の導入にあっては、1~1.5当量の前述の塩基、好ましくは金属塩基、より好ましくは水素化ナトリウムのジエチルエ-テル、シクロプロピルメチルエ-テル、テトラヒドロフラン、4-メチルテトラヒドロピラン、ジオキサン、モノグライム、ジグライム等のエ-テル類又はN,N-ジメチルホルムアミド等の非プロトン性極性溶媒もしくはこれらの混合溶媒、好ましくはエーテル類等の溶媒懸濁液に、化合物(I)を-10℃~室温で滴下した後、クラウンエーテルやテトラエチレンジアミン、ジメチルイミダゾリジノン等の金属キレート剤、好ましくはジメチルイミダゾリジノンを加え、次いで1~1.5当量の保護基導入試薬を滴下し5分~3時間反応させることにより、化合物(II)を製造することができる。
また、カ-バメ-ト系保護基を導入する場合には、カ-バメート系保護基の種類により反応条件は異なるが、例えば化合物(I)に対しtert-ブトキシカルボニル(Boc基)、tert-アミロキシカルボニル(Aoc基)あるいはベンジルオキシカルボニル(Z基)、9-フルオレニルメチルオキシカルボニル(Fmoc)基、2,2,2-トリクロロエトキシカルボニル基、2-(トリメチルシリル)エトキシカルボニル基等を導入する場合には、ジオキサン、ジオキサン/水、塩化メチレン、テトラヒロドフラン等の溶媒中、トリエチルアミン、ピリジン等の有機塩基、水素化ナトリウム、水酸化カリウム、水酸化ナトリウム、炭酸水素カリウム、炭酸水素ナトリウム等の無機塩基の存在下、ジ-tert-ブチルジカルボネ-ト((Boc)2O)やtert-ブトキシカルボニルクロリド、ベンジルオキシカルボニルクロリド、tert-アミロキシカルボニルクロリド、9-フルオレニルメチルオキシカルボニルクロリド、クロロギ酸2,2,2-トリクロロエチル 、2-(トリメチルシリル)エトキシメチルクロリド、tert-ブトキシカルボニルアジド、ベンジルオキシカルボニルアジド等の一般公知のBoc基等の導入試薬1~1.5当量を0℃~100℃で5分~10時間反応させることにより製造することができる。
(Production of Compound (II))
The compound (II) can be produced by introducing a protecting group into the compound (I), and the introduction of the protecting group may vary depending on the selected protecting group, but a generally known method can be adopted. For example, in the introduction of a silyl-based protecting group, 1 to 1.5 equivalents of the above-mentioned bases, preferably metal bases, more preferably sodium hydride diethyl ether, cyclopropyl methyl ether, tetrahydrofuran, 4 -Aprotic polar solvents such as ethers such as methyl tetrahydropyran, dioxane, monoglyme and diglyme, or N, N-dimethylformamide or mixed solvents thereof, preferably in the solvent suspension such as ethers I) is added dropwise at -10 ° C to room temperature, and then a metal chelating agent such as crown ether, tetraethylenediamine or dimethylimidazolidinone, preferably dimethylimidazolidinone is added, and then 1 to 1.5 equivalents of protecting group introducing reagent Can be added dropwise and reacted for 5 minutes to 3 hours to produce compound (II). Can.
In the case of introducing a cationic protecting group, the reaction conditions vary depending on the kind of the cationic protecting group, and for example, tert-butoxycarbonyl (Boc group), tert- for compound (I), etc. Amidoxy carbonyl (Aoc group) or benzyloxycarbonyl (Z group), 9-fluorenylmethyloxycarbonyl (Fmoc) group, 2,2,2-trichloroethoxycarbonyl group, 2- (trimethylsilyl) ethoxycarbonyl group, etc. When introduced, in a solvent such as dioxane, dioxane / water, methylene chloride, tetrahydrofuran, etc., an organic base such as triethylamine or pyridine, sodium hydride, potassium hydroxide, sodium hydroxide, sodium hydrogencarbonate, hydrogencarbonate Di-tert-butyl dicarbonate in the presence of an inorganic base such as sodium ((Bo c) 2 O) or tert-butoxycarbonyl chloride, benzyloxycarbonyl chloride, tert-amyloxycarbonyl chloride, 9-fluorenylmethyloxycarbonyl chloride, 2,2,2-trichloroethyl chloroformate, 2- (trimethylsilyl) The reaction is carried out by reacting 1 to 1.5 equivalents of a reagent to be introduced such as a commonly known Boc group such as ethoxymethyl chloride, tert-butoxycarbonyl azide, benzyloxycarbonyl azide, etc. at 0 ° C. to 100 ° C. for 5 minutes to 10 hours. Can.
(化合物(III)の製造)
化合物(III)は一般公知のホルミル化反応、例えばVilsmeier反応やRieche反応、Daff反応、Reimer―Tiemann反応などにより製造することができ、例えばVilsmeier反応ではN,N-ジメチルホルムアミド(DMF)、N-メチルホルムアニリド(MFA)、N-ホルミルモルホリン、N,N―ジイソプロピルホルムアミド等のN,N-二置換ホルムアミドとオキシ塩化リン、塩化オキサリル、塩化チオニル、トリフェニルホスフィン-臭素、ヘキサクロロトリホスファザトリエン等の酸塩化物からVilsmeier試薬((クロロメチレン)ジメチルイミニウムクロリド)を調製または市販品を購入し、これと化合物(II)を溶媒、例えばオキシ塩化リン;またはジクロロメタン、ジクロロエタン、クロロホルム、四塩化炭素、クロロベンゼン等のハロゲン化炭化水素類;ベンゼン、トルエン、ニトロベンゼン等の芳香族炭化水素類;テトラヒドロフラン、テトラメチルヒドロピラン、ジオキサン等のエーテル類又は酢酸エチル、アセトニトリル、N,N-ジメチルホルムアミド等の非プロトン性極性溶媒もしくはこれらの混合溶媒、好ましくはエーテル系溶媒、芳香族炭化水素類、非プロトン性極性溶媒もしくはこれらの混合溶媒、より好ましくはテトラメチルヒドロピラン中、0~100℃(好ましくは40~80℃)で0.5~12時間攪拌後反応させることにより、化合物(III)を製造することができる。
(Production of Compound (III))
The compound (III) can be produced by a generally known formylation reaction such as Vilsmeier reaction, Rieche reaction, Daff reaction, Reimer-Tiemann reaction, etc. For example, in Vilsmeier reaction, N, N-dimethylformamide (DMF), N- N, N-disubstituted formamide such as methylformanilide (MFA), N-formyl morpholine, N, N-diisopropylformamide, and phosphorus oxychloride, oxalyl chloride, thionyl chloride, triphenylphosphine-bromine, hexachlorotriphospazatriene, etc. The Vilsmeier reagent ((chloromethylene) dimethyliminium chloride) is prepared from the acid chloride of or commercially available, and this and the compound (II) are used as a solvent such as phosphorus oxychloride; Halogenated hydrocarbons such as ethane, chloroform, carbon tetrachloride and chlorobenzene; aromatic hydrocarbons such as benzene, toluene and nitrobenzene; ethers such as tetrahydrofuran, tetramethylhydropyran and dioxane or ethyl acetate, acetonitrile, N, Aprotic polar solvents such as N-dimethylformamide or mixed solvents thereof, preferably ether solvents, aromatic hydrocarbons, aprotic polar solvents or mixed solvents thereof, more preferably in tetramethyl hydropyran The compound (III) can be produced by reaction after stirring at -100 ° C. (preferably 40-80 ° C.) for 0.5-12 hours.
(化合物(IV)の製造)
化合物(IV)は化合物(III)の脱保護反応より製造することができる。脱保護反応は保護基により異なるが、一般公知の方法を用いることができ、例えば、保護基がシリル系保護基の場合には、テトラヒドロフラン等の溶液中-10℃~室温でテトラブチルアンモニウムフルオライドやHFピリジン錯体、HFトリエチルアミン錯体等のフッ素源を反応させることにより製造することができる。また、塩酸やトリフルオロ酢酸等の酸性条件下、水酸化ナトリウム水溶液等の塩基性条件下でも同様にシリル系保護基の脱保護反応が進行し、化合物(IV)を製造することができる。脱保護試薬は化合物(III)に対し3~10当量(好ましくは5当量)の水酸化ナトリウム水溶液を用いることができる。
また、カ-バメ-ト系の保護基の場合には、カ-バメ-ト系保護基の種類により反応条件は異なるが、一般公知の方法により行うことができ、例えば水素雰囲気下、パラジウム黒、パラジウム炭素等の存在下、接触還元により、あるいは酢酸/臭化水素、トリフルオロ酢酸、塩酸/有機溶媒等を保護基に合わせて適宜選択することにより行うことができる。
また化合物(IV)は化合物(II)から化合物(III)を単離することなくワンポットの操作で製造することができる。この場合、前記化合物(II)から化合物(III)の反応終了後、反応系中に前記脱保護のための試薬を加えることにより行うことができる。
また化合物(IV)は、化合物(I)から化合物(II)、化合物(III)を単離することなくワンポットの操作で製造することもでき、例えば前記化合物(III)の製造における反応終了後、その反応系に前記化合物(IV)の製造における反応試薬を加え、反応終了後、さらに反応系に上記脱保護反応のための試薬を加え、同様に反応させることにより、化合物(IV)を製造することができる。いずれの製造における試薬の量関係は、前記と同様の量を用いることができる。
(Production of Compound (IV))
Compound (IV) can be produced from the deprotection reaction of compound (III). Although the deprotection reaction varies depending on the protecting group, generally known methods can be used. For example, when the protecting group is a silyl protecting group, tetrabutylammonium fluoride is allowed to react at −10 ° C. to room temperature in a solution such as tetrahydrofuran. It can be produced by reacting a fluorine source such as HF pyridine complex or HF triethylamine complex. Further, the deprotecting reaction of the silyl protecting group proceeds similarly under acidic conditions such as hydrochloric acid and trifluoroacetic acid, and under basic conditions such as aqueous sodium hydroxide solution, and compound (IV) can be produced. The deprotecting reagent can be 3 to 10 equivalents (preferably 5 equivalents) of aqueous sodium hydroxide solution relative to compound (III).
Further, in the case of a protecting group of a carboxylate type, reaction conditions may differ depending on the kind of the protecting group of a carboxylate type, but the reaction can be carried out by a generally known method, for example, palladium black under hydrogen atmosphere It can be carried out by catalytic reduction in the presence of palladium carbon or the like, or by appropriately selecting acetic acid / hydrogen bromide, trifluoroacetic acid, hydrochloric acid / organic solvent etc. as a protective group.
Compound (IV) can also be produced by one-pot operation without isolating Compound (III) from Compound (II). In this case, the reaction can be carried out by adding the reagent for the deprotection to the reaction system after completion of the reaction of the compound (II) to the compound (III).
The compound (IV) can also be produced by a one-pot operation without isolating the compound (II) and the compound (III) from the compound (I). For example, after completion of the reaction in the production of the compound (III), The reaction reagent in the production of the compound (IV) is added to the reaction system, and after completion of the reaction, the reagent for the above-mentioned deprotection reaction is further added to the reaction system, and the compound (IV) is produced by the same reaction. be able to. With regard to the amount relationship of reagents in any production, the same amount as described above can be used.
(化合物(VI)の製造)
1~1.5当量の水素化ナトリウム/テトラヒドロフランの懸濁液に-10℃~室温で化合物(IV)のテトラヒドロフラン等の溶液を滴下して加え、0.5~1時間撹拌した後、さらにクラウンエ-テルやテトラメチルエチレンジアミン、ジメチルイミダゾリジノン等の金属キレート剤の存在下、-10℃~室温で0.5~1時間攪拌し、続いてピリジン-3-スルホニルクロリドを加え、0℃で0.5時間攪拌する。さらにピリジン-3-スルホニルクロリドを加え、-10℃~室温で0.5~1時間撹拌することにより、化合物(VI)を製造することができる。
また化合物(VI)は、化合物(IV)のジクロロメタンやアセトニトリル等の溶液中、0℃~室温でトリエチルアミンやN,N-ジイソプロピルアミン等の塩基、触媒量の4-ジメチルアミノピリジン、ピリジン-3-スルホニルクロリドを添加し室温~100℃で0.5~12時間攪拌することにより製造することができる。
(Production of Compound (VI))
A solution of compound (IV) in tetrahydrofuran or the like is added dropwise to a suspension of 1 to 1.5 equivalents of sodium hydride / tetrahydrofuran at −10 ° C. to room temperature, and the mixture is stirred for 0.5 to 1 hour. -Stir at -10 ° C to room temperature for 0.5 to 1 hour in the presence of metal chelating agent such as teryl, tetramethylethylenediamine, dimethylimidazolidinone etc., add pyridine-3-sulfonyl chloride, then add to 0 ° C. Stir for 5 hours. Compound (VI) can be produced by further adding pyridine-3-sulfonyl chloride and stirring at −10 ° C. to room temperature for 0.5 to 1 hour.
Compound (VI) can be prepared by using triethylamine, a base such as N, N-diisopropylamine, a catalytic amount of 4-dimethylaminopyridine, or pyridine-3-3 in a solution of compound (IV) in dichloromethane or acetonitrile at 0 ° C. to room temperature. It can be prepared by adding sulfonyl chloride and stirring at room temperature to 100 ° C. for 0.5 to 12 hours.
(化合物(VII)の製造)
化合物(VI)のメタノ-ル等の溶液に0℃~室温でメチルアミンのメタノ-ル等の溶液を滴下して加え、0.5~1時間攪拌し、これを0℃~室温で水素化ホウ素ナトリウム等の還元剤を1~3当量加え、0.5~1時間反応させることにより、化合物(VII)を得ることができる。
(Production of Compound (VII))
A solution of methylamine in methanol or the like is added dropwise to a solution of compound (VI) in methanol or the like at 0 ° C to room temperature, and stirred for 0.5 to 1 hour, and this is hydrogenated at 0 ° C to room temperature Compound (VII) can be obtained by adding 1 to 3 equivalents of a reducing agent such as sodium boron and reacting for 0.5 to 1 hour.
(ボノプラザンフマル酸塩の製造)
化合物(VII)の酢酸エチル、メタノ-ル等の溶液に0℃~室温でフマル酸のメタノ-ル等の溶液を加え、0.5~1時間攪拌し、析出した結晶をろ取し、必要に応じてメタノール/水で再結晶することにより、ボノプラザンフマル酸塩を製造することができる。
(Manufacture of Bonoprazan fumaric acid salt)
A solution of fumaric acid methanol or the like is added to a solution of compound (VII) such as ethyl acetate or methanol at 0 ° C to room temperature, stirred for 0.5 to 1 hour, and the precipitated crystals are collected by filtration and necessary Depending on recrystallization with methanol / water, Bonoprazan fumarate can be produced.
以下に実施例、比較例および試験例により本発明をより詳細に説明するが、本発明はこれらに限定されるものではない。 Hereinafter, the present invention will be described in more detail by way of Examples, Comparative Examples and Test Examples, but the present invention is not limited thereto.
実施例1
2-(2-フルオロフェニル)-1H-ピロ-ルの製造
水素化ナトリウム(60%流動パラフィンに分散、1.2g,30.0mmol)とテトラヒドロフラン(10mL)の懸濁液に氷冷下ピロ-ル(2.1mL,30.0mmol)を滴下し0.5時間撹拌した後、塩化亜鉛(4.1g,30.0mmol)を加え室温で0.5時間攪拌した。続いて酢酸パラジウム(11mg,0.05mmol)、2-(ジ-tert-ブチルホスフィノ)ビフェニル(15mg,0.05mmol)及び1-フルオロ-2-ヨ-ドベンゼン(1.1mL,10.0mmol)を加え脱気後、60℃で6時間撹拌した。反応混合物を0℃で冷却しつつ水を滴下し、不溶物をろ過した後、酢酸エチルで分液した。水層に酢酸エチルを加え再度抽出した後、有機層を合わせ飽和食塩水で洗浄した。減圧下溶媒を留去後、シリカゲルカラムクロマトグラフィ-で精製し減圧下乾燥することにより表題化合物(1.18g,収率74%)を得た。
Example 1
Preparation of 2- (2-fluorophenyl) -1H-pyrrole A suspension of sodium hydride (dispersed in 60% liquid paraffin, 1.2 g, 30.0 mmol) and tetrahydrofuran (10 mL) under ice-cooling under ice-cooling After adding dropwise (2.1 mL, 30.0 mmol) and stirring for 0.5 hours, zinc chloride (4.1 g, 30.0 mmol) was added and the mixture was stirred at room temperature for 0.5 hours. Subsequently, palladium acetate (11 mg, 0.05 mmol), 2- (di-tert-butylphosphino) biphenyl (15 mg, 0.05 mmol) and 1-fluoro-2-iodobenzene (1.1 mL, 10.0 mmol) The mixture was degassed and then stirred at 60 ° C. for 6 hours. Water was added dropwise while cooling the reaction mixture at 0 ° C., and the insoluble matter was filtered off and partitioned with ethyl acetate. After ethyl acetate was added to the aqueous layer to extract again, the organic layers were combined and washed with saturated brine. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column chromatography and dried under reduced pressure to obtain the title compound (1.18 g, yield 74%).
Mass(ESI):m/zcalcdforC10H7FN[M-H]-:160.06;found:160.18;1H-NMR(400MHz,CDCl3)δ(ppm):6.30-6.33(m,1H),6.64-6.67(m,1H),6.90-6.93(m,1H),7.07-7.16(m,1H),7.13-7.17(m,2H),7.60-7.65(m,1H),9.05(brs,1H). Mass (ESI): m / z calcd for C 10 H 7 FN [M−H] −: 160.06; found: 160.18; 1 H-NMR (400 MHz, CDCl 3) δ (ppm): 6.30 to 6.33 (m, 1 H) , 6.64-6.67 (m, 1 H), 6.90-6.93 (m, 1 H), 7.07-7.16 (m, 1 H), 7.13-7. 17 (m, 1 H) 2H), 7.60-7.65 (m, 1 H), 9.05 (brs, 1 H).
実施例2
2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ルの製造
水素化ナトリウム(60%流動パラフィンに分散,64mg,1.61mmol)とテトラヒドロフラン(2mL)の懸濁液に氷冷下2-(2-フルオロフェニル)-1H-ピロ-ル(172mg,1.07mmol)のテトラヒドロフラン(2mL)溶液を滴下し0.5時間撹拌した後、15-クラウン-5-エ-テル(0.32mL,1.61mmol)を加え0℃で0.5時間攪拌した。続いてトリイソプロピルシリルクロリド(0.35mL,1.61mmol)を滴下し室温で4時間撹拌した。0℃まで冷却し水を滴下し酢酸エチルで分液した。水層に酢酸エチルを加え再度抽出した後、有機層を合わせ飽和食塩水で洗浄した。減圧下溶媒を留去後、シリカゲルカラムで精製し減圧下乾燥することにより表題化合物(272mg,収率80%)を得た。
Example 2
Preparation of 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole Suspension of sodium hydride (dispersed in 60% liquid paraffin, 64 mg, 1.61 mmol) and tetrahydrofuran (2 mL) To the mixture was added dropwise a solution of 2- (2-fluorophenyl) -1H-pyrrole (172 mg, 1.07 mmol) in tetrahydrofuran (2 mL) under ice-cooling and stirred for 0.5 hours. Ter (0.32 mL, 1.61 mmol) was added and stirred at 0 ° C. for 0.5 hour. Subsequently, triisopropylsilyl chloride (0.35 mL, 1.61 mmol) was added dropwise and stirred at room temperature for 4 hours. The mixture was cooled to 0 ° C., water was added dropwise, and the mixture was partitioned with ethyl acetate. After ethyl acetate was added to the aqueous layer to extract again, the organic layers were combined and washed with saturated brine. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column and dried under reduced pressure to obtain the title compound (272 mg, yield 80%).
Mass(ESI):m/zcalcdforC19H28FNNaSi[M+Na]+:340.19;found:340.16;1H-NMR(400MHz,CDCl3)δ(ppm):1.01(d,J=6.9Hz,18H),1.13-1.21(m,3H),6.25(dd,J=3.2,1.2Hz,1H),6.37(t,J=3.2Hz,1H),6.93(dd,J=2.8,2.0Hz,1H),7.03-7.12(m,2H),7.29-7.37(m,2H). Mass (ESI): m / z calcd for C 19 H 28 FN Na Si [M + Na] +: 340. 19; found: 340. 16; 1 H-NMR (400 MHz, CDCl 3) δ (ppm): 1.01 (d, J = 6.9 Hz, 18 H) , 1.13-1.21 (m, 3H), 6.25 (dd, J = 3.2, 1.2 Hz, 1 H), 6.37 (t, J = 3.2 Hz, 1 H), 6. 93 (dd, J = 2.8, 2.0 Hz, 1 H), 7.03-7.12 (m, 2 H), 7.29-7.37 (m, 2 H).
実施例3
5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドの製造
2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ル(100mg,0.32mmol)のジクロロメタン(3.0mL)溶液に氷冷下Vilsmeier試薬(123mg,0.96mmol)を加え40℃で0.5時間攪拌した。溶媒を減圧下留去した後に水酸化ナトリウム水溶液(1.0M,3mL)を加え室温で6時間撹拌し、酢酸エチルを加え分液した。水層に酢酸エチルを加え再度抽出した後、有機層を合わせ飽和食塩水で洗浄した。シリカゲルカラムで精製し減圧下乾燥することにより表題化合物(48mg,収率80%)を得た。
Example 3
Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole (100 mg, 0.32 mmol) Under ice-cooling, Vilsmeier reagent (123 mg, 0.96 mmol) was added to a dichloromethane (3.0 mL) solution of and stirred at 40 ° C. for 0.5 hour. The solvent was evaporated under reduced pressure, aqueous sodium hydroxide solution (1.0 M, 3 mL) was added, and the mixture was stirred at room temperature for 6 hours, and ethyl acetate was added to separate the layers. After ethyl acetate was added to the aqueous layer to extract again, the organic layers were combined and washed with saturated brine. The residue was purified by silica gel column and dried under reduced pressure to give the title compound (48 mg, yield 80%).
Mass(ESI):m/zcalcdforC11H8FNNaO[M+Na]+:212.05;found:212.03;1H-NMR(400MHz,CDCl3)δ(ppm):7.07(dd,J=2.0,1.2Hz,1H),7.12-7.26(m,3H),7.53(dd,J=2.8,1.2Hz,1H),7.64(dt,J=7.6,1.6Hz,1H),9.45(brs,1H),9.86(s,1H). Mass (ESI): m / z calcdfor C11 H 8 FN NaO [M + Na] +: 212.05; found: 212.03; 1 H-NMR (400 MHz, CDCl3) δ (ppm): 7.07 (dd, J = 2.0, 1. 2 Hz, 1 H), 7.12-7.26 (m, 3 H), 7.53 (dd, J = 2.8, 1.2 Hz, 1 H), 7.64 (dt, J = 7.6, 1 .6 Hz, 1 H), 9.45 (brs, 1 H), 9.86 (s, 1 H).
実施例4
5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドの製造
水素化ナトリウム(60%流動パラフィンに分散、1.2g,30.0mmol)と4-メチルテトラヒドロピラン(10mL)の懸濁液に氷冷下ピロ-ル(2.1mL,30.0mmol)を滴下し0.5時間撹拌した後、塩化亜鉛(4.1g,30.0mmol)を加え室温で0.5時間攪拌した。続いて酢酸パラジウム(11mg,0.05mmol)、2-(ジ-tert-ブチルホスフィノ)ビフェニル(15mg,0.05mmol)及び1-フルオロ-2-ヨ-ドベンゼン(1.1mL,10.0mmol)を加え、100℃で0.5時間撹拌した。反応混合物を0℃で冷却しつつ28%アンモニア水を滴下し、不溶物をろ過した後、酢酸エチルで分液した。減圧下溶媒を留去後、2-(2-フルオロフェニル)-1H-ピロ-ルを粗生成物として得た。
水素化ナトリウム(60%流動パラフィンに分散,600mg,15mmol)とテトラヒドロフラン(10mL)及びジメチルイミダゾリジノン(2mL)の懸濁液に得られた2-(2-フルオロフェニル)-1H-ピロ-ルの粗生成物のテトラヒドロフラン(2mL)溶液を氷冷下滴下し0.5時間撹拌した。続いてトリイソプロピルシリルクロリド(3.2mL,15mmol)を滴下し室温で2時間撹拌した。0℃まで冷却しつつ水を滴下し酢酸エチルで分液した。減圧下溶媒を留去後、ヘプタンと水で再度分液操作を行い減圧下溶媒を留去することにより、2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ルを粗生成物として得た。
得られた2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ルの粗生成物のジクロロメタン(50mL)溶液に氷冷下Vilsmeier試薬(3.8g,30mmol)を加え40℃で0.5時間攪拌した。溶媒を減圧下留去した後に水酸化ナトリウム水溶液(1.0M,100mL)を加え室温で6時間撹拌し、酢酸エチルを加え分液した。有機層を飽和食塩水で洗浄後、減圧下溶媒を留去した。ヘプタン及び酢酸エチルで再結晶を行い、減圧下乾燥することにより表題化合物(1.34g,収率70%)を得た。
Example 4
Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde Sodium hydride (dispersed in 60% liquid paraffin, 1.2 g, 30.0 mmol) and 4-methyltetrahydropyran (10 mL) Pyrrolyl (2.1 mL, 30.0 mmol) was added dropwise to the suspension under ice-cooling and stirred for 0.5 hours, then zinc chloride (4.1 g, 30.0 mmol) was added and stirred at room temperature for 0.5 hour did. Subsequently, palladium acetate (11 mg, 0.05 mmol), 2- (di-tert-butylphosphino) biphenyl (15 mg, 0.05 mmol) and 1-fluoro-2-iodobenzene (1.1 mL, 10.0 mmol) Was added and stirred at 100 ° C. for 0.5 hours. While cooling the reaction mixture at 0 ° C., 28% aqueous ammonia was added dropwise, and the insoluble matter was filtered off and partitioned with ethyl acetate. After evaporating the solvent under reduced pressure, 2- (2-fluorophenyl) -1H-pyrrole was obtained as a crude product.
2- (2-Fluorophenyl) -1H-pyrrole obtained in suspension of sodium hydride (dispersed in 60% liquid paraffin, 600 mg, 15 mmol) and tetrahydrofuran (10 mL) and dimethylimidazolidinone (2 mL) A solution of the crude product in tetrahydrofuran (2 mL) was added dropwise with ice-cooling and stirred for 0.5 hours. Subsequently, triisopropylsilyl chloride (3.2 mL, 15 mmol) was added dropwise and stirred at room temperature for 2 hours. Water was added dropwise while cooling to 0 ° C., and the mixture was partitioned with ethyl acetate. After distilling off the solvent under reduced pressure, the liquid separation operation is performed again with heptane and water, and the solvent is distilled off under reduced pressure to obtain 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole. Was obtained as a crude product.
To a solution of the obtained 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole crude product in dichloromethane (50 mL) was added Vilsmeier reagent (3.8 g, 30 mmol) under ice-cooling The mixture was stirred at 40 ° C. for 0.5 hours. The solvent was evaporated under reduced pressure, aqueous sodium hydroxide solution (1.0 M, 100 mL) was added, and the mixture was stirred at room temperature for 6 hours, and ethyl acetate was added to separate the layers. The organic layer was washed with saturated brine, and the solvent was evaporated under reduced pressure. Recrystallization from heptane and ethyl acetate and drying under reduced pressure gave the title compound (1.34 g, yield 70%).
実施例5
5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-カルボキシアルデヒドの製造
水素化ナトリウム(60%流動パラフィンに分散,32mg,0.79mmol)とテトラヒドロフラン(2mL)の懸濁液に氷冷下5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒド(100mg,0.53mmol)のテトラヒドロフラン(2mL)溶液を滴下し0.5時間撹拌した後、15-クラウン-5-エ-テル(0.16mL,0.79mmol)を加え0℃で0.5時間攪拌した。続いてピリジン-3-スルホニルクロリド(95μL,0.79mmol)を添加し、0℃で0.5時間攪拌した。さらにピリジン-3-スルホニルクロリド(95μL,0.79mmol)を加え、0℃で0.5時間攪拌した。水を滴下し酢酸エチルで分液した。水層に酢酸エチルを加え再度抽出した後、有機層を合わせ飽和食塩水で洗浄した。減圧下溶媒を留去後、シリカゲルカラムで精製し減圧下乾燥することにより表題化合物(167mg,収率95%)を得た。
Example 5
Preparation of 5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrole-3-carboxaldehyde Sodium hydride (dispersed in 60% liquid paraffin, 32 mg, 0.79 mmol) and A solution of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde (100 mg, 0.53 mmol) in tetrahydrofuran (2 mL) was added dropwise to a suspension of tetrahydrofuran (2 mL) under ice-cooling to 0.5. After stirring for 15 hours, 15-crown-5-ether (0.16 mL, 0.79 mmol) was added and the mixture was stirred at 0 ° C. for 0.5 hour. Subsequently, pyridine-3-sulfonyl chloride (95 μL, 0.79 mmol) was added and stirred at 0 ° C. for 0.5 hours. Further, pyridine-3-sulfonyl chloride (95 μL, 0.79 mmol) was added and stirred at 0 ° C. for 0.5 hour. Water was added dropwise and partitioned with ethyl acetate. After ethyl acetate was added to the aqueous layer to extract again, the organic layers were combined and washed with saturated brine. After evaporating the solvent under reduced pressure, the residue was purified by silica gel column and dried under reduced pressure to obtain the title compound (167 mg, yield 95%).
Mass(ESI):m/zcalcdforC16H11FN2NaO3S「M+Na」+:353.04;found:353.00;1H-NMR(400MHz,CDCl3)δ(ppm):6.68(d,J=1.7Hz,1H),7.01-7.05(m,1H),7.16-7.18(m,2H),7.37-7.40(m,1H),7.45-7.51(m,1H),7.69-7.72(m,1H),8.15(d,J=1.8Hz,1H),8.58(d,J=1.7Hz,1H),8.82(dd,J=4.8,1.5Hz,1H),9.90(s,1H). Mass (ESI): m / z calcd for C 16 H 11 FN 2 NaO 3 S “M + Na” +: 353.04; found: 353.00; 1 H-NMR (400 MHz, CDCl 3) δ (ppm): 6.68 (d, J = 1.7 Hz, 1 H) , 7.01-7.05 (m, 1H), 7.16-7.18 (m, 2H), 7.37-7.40 (m, 1H), 7.45-7.51 (m, 1 H) 1H), 7.69-7.72 (m, 1H), 8.15 (d, J = 1.8 Hz, 1 H), 8.58 (d, J = 1.7 Hz, 1 H), 8.82 ( dd, J = 4.8, 1.5 Hz, 1 H), 9.90 (s, 1 H).
実施例6
1-[5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-イル]-N-メチルメタンアミンフマル酸塩の製造
5-(2-フルオロフェニル)-1-(ピリジン-3-イルスルホニル)-1H-ピロ-ル-3-カルボキシアルデヒド(100mg,0.30mmol)のメタノ-ル(3mL)溶液に室温でメチルアミンのメタノ-ル溶液(2.0M,1.06mL,2.12mmol)を滴下し、0.5時間攪拌した。0℃に冷却し、水素化ホウ素ナトリウム(34mg,0.91mmol)を加え0.5時間攪拌した。0℃で1規定塩酸(3mL)を滴下し、室温で0.5時間攪拌した。飽和重曹水、酢酸エチルを加え分液した。水層に酢酸エチルを加え再度抽出した後、有機層を合わせて飽和食塩水で洗浄した。有機層を濃縮した後、酢酸エチル(3mL)を加え、フマル酸(39mg,0.30mmol)のメタノ-ル(0.3mL)溶液を添加した。室温で30分間攪拌後、析出した結晶をろ過し、酢酸エチルとメタノ-ルで洗浄し、粗生成物を得た。得られた粗結晶をメタノ-ル及び水から再結晶し、析出した結晶をろ取後減圧下乾燥することにより表題化合物(90mg,収率64%)を得た。
Example 6
Preparation of 1- [5- (2-fluorophenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrol-3-yl] -N-methylmethanamine fumarate 5- (2-fluoro) A solution of methylamine in methanol (3 mL) at room temperature in a solution of phenyl) -1- (pyridin-3-ylsulfonyl) -1H-pyrrole-3-carboxaldehyde (100 mg, 0.30 mmol) 2.0 M (1.06 mL, 2.12 mmol) was added dropwise and stirred for 0.5 hours. The mixture was cooled to 0 ° C., sodium borohydride (34 mg, 0.91 mmol) was added, and the mixture was stirred for 0.5 hours. 1N hydrochloric acid (3 mL) was added dropwise at 0 ° C., and the mixture was stirred at room temperature for 0.5 hour. A saturated aqueous sodium bicarbonate solution and ethyl acetate were added to separate the layers. Ethyl acetate was added to the aqueous layer to extract again, and then the organic layer was combined and washed with saturated brine. After concentration of the organic layer, ethyl acetate (3 mL) was added, and a solution of fumaric acid (39 mg, 0.30 mmol) in methanol (0.3 mL) was added. After stirring for 30 minutes at room temperature, the precipitated crystals were filtered and washed with ethyl acetate and methanol to obtain a crude product. The obtained crude crystals were recrystallized from methanol and water, and the precipitated crystals were collected by filtration and then dried under reduced pressure to give the title compound (90 mg, yield 64%).
Mass(ESI):m/zcalcdforC17H17FN3NaO2S「M+H」+:346.09;found:346.11;1H-NMR(400MHz,DMSO-d6)δ(ppm):2.39(s,3H),3.76(s,2H),6.44(d,J=2.0Hz,1H),6.47(s,2H),7.10-7.13(m,1H),7.20-7.26(m,2H),7.50-7.56(m,1H),7.60-7.67(m,2H),7.85-7.89(m,1H),8.56(d,J=2.8Hz,1H),8.87-8.89(m,1H).3H未検出。
Mass (ESI): m / z calcd for C 17 H 17 FN 3 NaO 2 S “M + H” +: 346.09; found: 346.11; 1 H-NMR (400 MHz, DMSO-d6) δ (ppm): 2.39 (s, 3 H), 3.76 (S, 2 H), 6.44 (d, J = 2.0 Hz, 1 H), 6.47 (s, 2 H), 7.10 to 7.13 (m, 1 H), 7.20 to 7.26 (M, 2H), 7.50 to 7.56 (m, 1 H), 7. 70 to 7.67 (m, 2 H), 7.85 to 7.89 (m, 1 H), 8.56 (d , J = 2.8 Hz, 1 H), 8.87-8.89 (m, 1 H). 3H not detected.
実施例7
5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドの製造
水素化ナトリウム(60%流動パラフィンに分散、8.8g,220.0mmol)と4-メチルテトラヒドロピラン(100mL)の懸濁液に氷冷下ピロ-ル(15.7mL,220.0mmol)を滴下し0.5時間撹拌した後、塩化亜鉛(30.3g,220.0mmol)を加え室温で0.5時間攪拌した。続いて酢酸パラジウム(56.1mg,0.25mmol)、2-(ジ-tert-ブチルホスフィノ)ビフェニル(74.6mg,0.25mmol)及び1-フルオロ-2-ヨ-ドベンゼン(11.5mL,100.0mmol)を加え、約100℃で1時間撹拌した。氷冷下、反応混合物に水酸化ナトリウム水溶液(5.0N,220.0mmol)を滴下し、室温で0.5時間攪拌した。不溶物をろ過、トルエン(100mL)を用いて洗浄した後、有機層を分離して水層をトルエン(100mL)を用いて抽出した。有機層を合わせ蒸留水(167mL)及び飽和食塩水(167mL)で洗浄した。減圧下溶媒を留去後、残渣にトルエン(167mL)を加えた。減圧下溶媒を留去することにより、2-(2-フルオロフェニル)-1H-ピロ-ルを粗生成物(20.9g)として得た。
水素化ナトリウム(60%流動パラフィンに分散,4.4g,110.0mmol)とテトラヒドロフラン(100mL)及びジメチルイミダゾリジノン(32.6mL,300.0mmol)の懸濁液に得られた2-(2-フルオロフェニル)-1H-ピロ-ルの粗生成物のテトラヒドロフラン(10mL)溶液を氷冷下滴下し、テトラヒドロフラン(10mL)で洗いこみ、0.5時間撹拌した。続いてトリイソプロピルシリルクロリド(23.5mL,110.0mmol)を滴下し室温で1時間撹拌した。氷浴下、蒸留水(17mL)を滴下し、さらに蒸留水(167mL)を加えた。酢酸エチル(84mL)を用いて2回抽出を行い、蒸留水(167mL)及び飽和食塩水(167mL)で洗浄した。減圧下溶媒を留去後、残渣にトルエン(167mL)を加えた。減圧下溶媒を留去後、減圧下溶媒を留去することにより、2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ルを粗生成物(45.2g)として得た。
ジクロロメタン(100mL)に塩化オキサリル(17.2mL,200.0mmol)を加え、DMF(15.5mL,200.0mmol)を氷冷下滴下し、0.5時間撹拌した。得られた2-(2-フルオロフェニル)-1-(トリイソプロピルシリル)-1H-ピロ-ルの粗生成物の4-メチルテトラヒドロピラン(100mL)溶液を一度で加え約50℃で3時間攪拌した。氷冷下、水酸化ナトリウム水溶液(5.0M,100mL)を加え室温で終夜撹拌した。有機層を分離し、水層を酢酸エチル(200mL)で分液した。有機層を合わせ、飽和食塩水(200mL)で洗浄後、減圧下溶媒を留去した。得られた固体残渣に酢酸エチル(47mL)を加え、約70℃にて溶解後、ヘプタン(300mL)を加えた。室温下放冷後、氷浴下で1時間撹拌し、析出した結晶をろ取、冷却した酢酸エチル:ヘプタン(1:6,70mL)で洗浄した。減圧下にて50℃、1.5時間乾燥することにより表題化合物(13.6g,収率72%)を得た。
Example 7
Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde Sodium hydride (dispersed in 60% liquid paraffin, 8.8 g, 220.0 mmol) and 4-methyltetrahydropyran (100 mL) To the suspension is added dropwise pyrol (15.7 mL, 220.0 mmol) under ice-cooling and stirred for 0.5 hours, then zinc chloride (30.3 g, 220.0 mmol) is added and stirred at room temperature for 0.5 hour did. Subsequently, palladium acetate (56.1 mg, 0.25 mmol), 2- (di-tert-butylphosphino) biphenyl (74.6 mg, 0.25 mmol) and 1-fluoro-2-iodobenzene (11.5 mL) 100.0 mmol) was added and stirred at about 100 ° C. for 1 hour. An aqueous solution of sodium hydroxide (5.0 N, 220.0 mmol) was added dropwise to the reaction mixture under ice cooling, and the mixture was stirred at room temperature for 0.5 hours. The insolubles were filtered and washed with toluene (100 mL), then the organic layer was separated and the aqueous layer was extracted with toluene (100 mL). The organic layers were combined and washed with distilled water (167 mL) and saturated brine (167 mL). After evaporating the solvent under reduced pressure, toluene (167 mL) was added to the residue. The solvent was evaporated under reduced pressure to give 2- (2-fluorophenyl) -1H-pyrrole as a crude product (20.9 g).
2- (2) obtained in suspension of sodium hydride (dispersed in 60% liquid paraffin, 4.4 g, 110.0 mmol) and tetrahydrofuran (100 mL) and dimethylimidazolidinone (32.6 mL, 300.0 mmol) A solution of the crude product of -fluorophenyl) -1H-pyrrole in tetrahydrofuran (10 mL) was added dropwise with ice-cooling, washed with tetrahydrofuran (10 mL) and stirred for 0.5 hours. Subsequently, triisopropylsilyl chloride (23.5 mL, 110.0 mmol) was added dropwise and stirred at room temperature for 1 hour. Distilled water (17 mL) was added dropwise under an ice bath, and distilled water (167 mL) was further added. The mixture was extracted twice with ethyl acetate (84 mL) and washed with distilled water (167 mL) and saturated brine (167 mL). After evaporating the solvent under reduced pressure, toluene (167 mL) was added to the residue. After distilling off the solvent under reduced pressure, the solvent is distilled off under reduced pressure to obtain 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole as a crude product (45.2 g). Obtained.
Oxalyl chloride (17.2 mL, 200.0 mmol) was added to dichloromethane (100 mL), DMF (15.5 mL, 200.0 mmol) was added dropwise under ice-cooling, and the mixture was stirred for 0.5 hours. A 4-methyltetrahydropyran (100 mL) solution of the obtained crude product of 2- (2-fluorophenyl) -1- (triisopropylsilyl) -1H-pyrrole was added in one portion and stirred at about 50 ° C. for 3 hours did. Under ice-cooling, aqueous sodium hydroxide solution (5.0 M, 100 mL) was added and the mixture was stirred overnight at room temperature. The organic layer was separated, and the aqueous layer was partitioned with ethyl acetate (200 mL). The organic layer was combined, washed with saturated brine (200 mL), and the solvent was evaporated under reduced pressure. Ethyl acetate (47 mL) was added to the obtained solid residue, and after dissolution at about 70 ° C., heptane (300 mL) was added. After cooling at room temperature, the mixture was stirred for 1 hour under an ice bath, and the precipitated crystals were collected by filtration and washed with cooled ethyl acetate: heptane (1: 6, 70 mL). The title compound (13.6 g, yield 72%) was obtained by drying under reduced pressure at 50 ° C. for 1.5 hours.
実施例8
5-(2-フルオロフェニル)-1H-ピロ-ル-3-カルボキシアルデヒドの製造(2-(2-フルオロフェニル)-1H-ピロ-ルからのワンポット合成)
2-(2-フルオロフェニル)-1H-ピロ-ル(10.0g,62.0mmol)の4-メチルテトラヒドロピラン(62mL)溶液にジメチルイミダゾリジノン(20.0mL,186mmol)を加えた後、水素化ナトリウム(60%流動パラフィンに分散,2.7g,68.2mmol)を氷冷下ゆっくりと加え10分間撹拌した。続いてトリイソプロピルシリルクロリド(14.6mL,68.2mmol)を滴下し氷冷下2時間撹拌した。塩化オキサリル(10.6mL,124mmol)とDMF(9.65mL,124mmol)から調整したVilsmeier試薬のジクロロメタン(90mL)溶液に、2-(2-フルオロフェニル)-1H-ピロ-ルの反応溶液を氷冷下一度で加え、4-メチルテトラヒドロピラン(20mL)で洗いこみ、約60℃で2時間攪拌した。氷冷下、水酸化ナトリウム水溶液(2.0M,310mL)を加え室温で終夜撹拌した。有機層を分離し、水層を酢酸エチル(120mL)で分液した。有機層を合わせ、飽和食塩水(120mL)で洗浄後、減圧下溶媒を留去した。得られた固体残渣に酢酸エチル(29mL)を加え、約70℃にて溶解後、ヘプタン(180mL)を加えた。室温下放冷後、氷浴下で1時間撹拌し、析出した結晶をろ取、冷却した酢酸エチル:ヘプタン(1:6,42mL)で洗浄した。減圧下にて50℃、1.5時間乾燥することにより表題化合物(8.30g,収率71%)を得た。
Example 8
Preparation of 5- (2-fluorophenyl) -1H-pyrrole-3-carboxaldehyde (one-pot synthesis from 2- (2-fluorophenyl) -1H-pyrrole)
After adding dimethylimidazolidinone (20.0 mL, 186 mmol) to a solution of 2- (2-fluorophenyl) -1H-pyrrole (10.0 g, 62.0 mmol) in 4-methyltetrahydropyran (62 mL), Sodium hydride (dispersed in 60% liquid paraffin, 2.7 g, 68.2 mmol) was slowly added under ice-cooling and stirred for 10 minutes. Subsequently, triisopropylsilyl chloride (14.6 mL, 68.2 mmol) was added dropwise and stirred for 2 hours under ice-cooling. A solution of 2- (2-fluorophenyl) -1H-pyrrole in ice-cold dichloromethane (90 mL) solution of Vilsmeier reagent prepared from oxalyl chloride (10.6 mL, 124 mmol) and DMF (9.65 mL, 124 mmol) The mixture was cooled in one portion, washed with 4-methyltetrahydropyran (20 mL) and stirred at about 60 ° C. for 2 hours. Under ice-cooling, aqueous sodium hydroxide solution (2.0 M, 310 mL) was added and the mixture was stirred overnight at room temperature. The organic layer was separated, and the aqueous layer was partitioned with ethyl acetate (120 mL). The organic layer was combined, washed with saturated brine (120 mL), and the solvent was evaporated under reduced pressure. Ethyl acetate (29 mL) was added to the obtained solid residue, and after dissolution at about 70 ° C., heptane (180 mL) was added. After cooling at room temperature, the mixture was stirred for 1 hour in an ice bath, and the precipitated crystals were collected by filtration and washed with cooled ethyl acetate: heptane (1: 6, 42 mL). The title compound (8.30 g, yield 71%) was obtained by drying under reduced pressure at 50 ° C. for 1.5 hours.
Claims (7)
下記式(II):
The following formula (II):
下記式(V):
Following formula (V):
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- 2018-12-26 KR KR1020227030825A patent/KR102500124B1/en active Active
- 2018-12-26 JP JP2019562062A patent/JP7227925B2/en active Active
- 2018-12-26 KR KR1020207019383A patent/KR102443292B1/en active Active
- 2018-12-26 CN CN201880082979.8A patent/CN111527067B/en active Active
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| CN113549054A (en) * | 2020-04-23 | 2021-10-26 | 鲁南制药集团股份有限公司 | Vonoprazan fumarate intermediate and preparation method thereof |
| CN113549054B (en) * | 2020-04-23 | 2024-03-15 | 鲁南制药集团股份有限公司 | Vonoprazan fumarate intermediate and preparation method thereof |
Also Published As
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|---|---|
| KR20200096598A (en) | 2020-08-12 |
| JPWO2019131695A1 (en) | 2021-01-14 |
| JP7227925B2 (en) | 2023-02-22 |
| KR102443292B1 (en) | 2022-09-14 |
| KR20220127369A (en) | 2022-09-19 |
| CN111527067A (en) | 2020-08-11 |
| CN111527067B (en) | 2024-06-25 |
| KR102500124B1 (en) | 2023-02-14 |
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