WO2019021370A1 - Coating device, el device manufacturing apparatus, and el device - Google Patents
Coating device, el device manufacturing apparatus, and el device Download PDFInfo
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- WO2019021370A1 WO2019021370A1 PCT/JP2017/026855 JP2017026855W WO2019021370A1 WO 2019021370 A1 WO2019021370 A1 WO 2019021370A1 JP 2017026855 W JP2017026855 W JP 2017026855W WO 2019021370 A1 WO2019021370 A1 WO 2019021370A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
Definitions
- the present invention relates to a coating apparatus for coating a resin for sealing an EL light emitting element layer.
- An EL device including an EL element has a structure in which a TFT (Thin Film Transistor) layer, a light emitting element layer, a sealing layer, and the like are stacked on a base material.
- TFT Thin Film Transistor
- an inorganic sealing film made of an inorganic material is formed, and an organic sealing film made of an organic material for planarization is formed thereon. After formation, an inorganic sealing film is further formed thereon.
- the formation of the organic sealing film is performed by applying an ink containing an organic material by an inkjet device.
- an ink is apply
- the application conditions of the ink in the application area D0 are uniform throughout the application area D0.
- the ink is applied to the four corners 271a (only one corner 271a is shown in FIG. 9). Because it does not spread well, it is formed in a curvilinear shape, not an angular shape.
- the distance L11 from the outer end of the corner 271a to the outer end of the active area DA is equal to the distance L12 from the outer end of the side 271b of the organic sealing film 271 to the outer end of the active area DA. Also become shorter.
- the distance L12 is set to the shortest length at which the organic sealing film 271 can prevent the penetration of water. Therefore, when the distance L11 is shorter than the distance L12, it is difficult to sufficiently prevent the penetration of water from the corner 271a. As a result, the light emitting element close to the corner 271 a is damaged by the infiltrated water, which causes a problem that a defective product is generated.
- One aspect of the present invention is to improve the sealing property of an organic sealing film.
- the application device concerning one mode of the present invention controls the discharge of the ink by the head which discharges the ink containing an organic material to the application field which forms the rectangle on a lower layer film which makes a rectangle.
- a discharge control unit wherein the discharge control unit controls the discharge of the ink according to the ink application amount per unit area by the head, which is set for each of the plurality of divided regions into which the application region is divided; The divided areas are provided at least at four corners of the application area.
- an effect is obtained that the sealing property of the organic sealing film can be improved.
- (A) And (b) is process drawing which shows an example of the manufacturing process of EL device.
- (A) And (b) is sectional drawing which shows the structural example of EL device. It is a top view which shows the process of division in the said manufacturing process.
- (A) is a figure which shows the structure of the coating device used for formation of the organic sealing film in the said manufacturing process
- (b) is a top view which shows the ink discharge surface of the head provided in the said coating device. It is a figure which shows the division which concerns on Embodiment 1 to which an ink is apply
- (A) is a figure which expands and shows a part of organic sealing film formed by application of the ink by the said coating device.
- (B) is a cross-sectional view taken along line AA of (a) showing a cross-sectional structure of the organic sealing film 27. It is a figure which shows the division which concerns on Embodiment 2 to which an ink is apply
- Embodiment 1 The following description will explain Embodiment 1 of the present invention with reference to FIGS. 1 to 6.
- FIG. 1 is a process chart showing an example of a manufacturing process of an EL device.
- FIG. 2A is a cross-sectional view showing a configuration example of the EL device.
- FIG. 3 is a plan view showing the process of division in the above manufacturing process.
- the resin layer 12 is formed on the base material 10 (supporting material) common to a plurality of EL devices (step S1).
- the barrier layer 3 is formed (step S2).
- the TFT layer 4 including the gate insulating film 16, the passivation films 18 and 20, and the organic interlayer film 21 is formed on the barrier layer 3 (step S3).
- a light emitting element layer (for example, an OLED (Organic Light Emitting Diode) element layer) 5 is formed on the TFT layer 4 (step S4).
- the sealing layer 6 including the first inorganic sealing film 26 (lower layer film, first inorganic film), the second inorganic sealing film 28 (second inorganic film), and the organic sealing film 27 (organic film) is formed.
- the laminate 7 step S5
- the laminate 7 is divided together with the base material 10 and separated into pieces (step S7). Then, the functional film 39 is attached via the adhesive layer 38 (step S8). Further, the electronic circuit board is mounted on the end of the TFT layer 4 (step S9).
- the EL device 2 shown in FIG. 2A is obtained.
- the above steps are performed by an EL device manufacturing apparatus 100 (see FIG. 4) described later.
- a laminate 7 (resin layer 12 and barrier layer 3) is formed on a glass substrate 50 (supporting material).
- the TFT layer 4, the light emitting element layer 5 and the sealing layer 6) are formed, and the top film 9 is pasted on the laminated body 7 through the adhesive layer 8 (step S6a).
- the lower surface of the resin layer 12 is irradiated with laser light through the glass substrate 50 (step S6b).
- the lower surface (the interface with the glass substrate 50) of the resin layer 12 is degraded by ablation, and the bonding force between the resin layer 12 and the glass substrate 50 is reduced.
- step S6c the glass substrate 50 is peeled off from the resin layer 12
- step S6d the base material 10 (for example, a lower surface film made of PET or the like) is attached to the lower surface of the resin layer 12 through the adhesive layer (step S6d). Thereafter, the process proceeds to step S7.
- the base material 10 for example, a lower surface film made of PET or the like
- Examples of the material of the resin layer 12 include polyimide, epoxy, polyamide and the like. Examples of the material of the lower film include polyethylene terephthalate (PET).
- the barrier layer 3 is a layer that prevents moisture and impurities from reaching the TFT layer 4 and the light emitting element layer 5 when the EL device is used.
- the barrier layer 3 can be formed of, for example, a silicon oxide film, a silicon nitride film, a silicon oxynitride film, or a laminated film thereof formed by CVD.
- the TFT layer 4 includes the semiconductor film 15, the gate insulating film 16, the gate electrode G, the passivation films 18 and 20, the capacitance electrode C and terminals, the source wiring S and the drain wiring D, and the organic interlayer film (planarization And 21).
- the gate insulating film 16 is formed above the semiconductor film 15.
- the gate electrode G is formed above the gate insulating film 16.
- the passivation films 18 and 20 are formed in the upper layer than the gate electrode G.
- the capacitance electrode C and a terminal are formed above the passivation film 18.
- the source wiring S and the drain wiring D are formed above the passivation film 20.
- the organic interlayer film 21 is formed above the source line S and the drain line D.
- the thin film transistor is configured to include the semiconductor film 15, the gate insulating film 16, and the gate electrode G.
- the non-active area of the TFT layer 4 a plurality of the above-mentioned terminals used for connection with the electronic circuit substrate are formed.
- the semiconductor film 15 is made of, for example, low temperature polysilicon (LTPS) or an oxide semiconductor.
- the gate insulating film 16 can be formed of, for example, a silicon oxide (SiOx) film or a silicon nitride (SiNx) film formed by a CVD method, or a laminated film of these.
- the gate electrode G, the source electrode S, the drain electrode D, and the terminals are made of, for example, aluminum (Al), tungsten (W), molybdenum (Mo), tantalum (Ta), chromium (Cr), titanium (Ti), copper It is comprised by the single layer film or laminated film of the metal containing at least one of Cu).
- the TFT having the semiconductor film 15 as a channel has a top gate structure in (a) and (b) of FIG.
- the TFT may have a bottom gate structure (eg, in the case where the channel of the TFT is an oxide semiconductor).
- the gate insulating film 16 and the passivation films 18 and 20 can be formed of, for example, a silicon oxide (SiOx) film or a silicon nitride (SiNx) film formed by a CVD method, or a laminated film of these.
- the organic interlayer film 21 can be made of, for example, a coatable photosensitive organic material such as polyimide or acrylic. The edge of the terminal is covered with the organic interlayer film 21.
- the light emitting element layer 5 (for example, an organic light emitting diode layer) includes a first electrode 22 (for example, an anode electrode), an organic insulating film 23, an EL (electroluminescence) layer 24, and a second electrode 25. Further, the first electrode 22, the EL layer 24, and the second electrode 25 constitute a light emitting element (for example, an organic light emitting diode).
- the first electrode 22 is formed above the organic interlayer film 21.
- the organic insulating film 23 covers the edge of the first electrode 22.
- the EL layer 24 is formed in the upper layer than the first electrode 22.
- the second electrode 25 is formed above the EL layer 24.
- the organic insulating film 23 functions as a bank (pixel partition wall) which defines a sub pixel.
- the organic insulating film 23 can be made of, for example, a coatable photosensitive organic material such as polyimide or acrylic.
- the organic insulating film 23 can be applied by, for example, an inkjet method to the non-active area where the active area DA and the light emitting element layer 5 are not formed.
- a bank-like convex body TK surrounding the active area is provided.
- the convex body TK defines an edge of the organic sealing film 27 (for example, a film formed by an inkjet method).
- the convex body TK is configured to include, for example, at least one of the organic interlayer film 21 and the organic insulating film 23.
- the EL layer 24 is formed by an evaporation method or an inkjet method in a region (sub-pixel region) surrounded by the partition wall 23c.
- the light emitting element layer 5 is an organic light emitting diode (OLED) layer
- the EL layer 24 is formed by sequentially laminating a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer from the lower layer side. It is constituted by doing. Note that one or more layers of the EL layer 24 can be a common layer (shared by a plurality of pixels).
- the first electrode 22 is formed of, for example, a laminate of ITO (Indium Tin Oxide) and an alloy containing Ag, and has light reflectivity.
- the second electrode 25 (for example, a cathode electrode) is a common electrode and can be made of a transparent metal such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
- the driving current between the first electrode 22 and the second electrode 25 recombines holes and electrons in the EL layer 24, and the exciton generated thereby falls to the ground state. Light is emitted.
- the light emitting element layer 5 is not limited to forming an OLED element, and may form an inorganic light emitting diode or a quantum dot light emitting diode.
- the sealing layer 6 is sealed by covering the light emitting element layer 5 to prevent permeation of foreign matter such as water and oxygen into the light emitting element layer 5.
- the sealing layer 6 includes a first inorganic sealing film 26, an organic sealing film 27, and a second inorganic sealing film 28.
- the first inorganic sealing film 26 covers the organic insulating film 23 and the second electrode 25.
- the organic sealing film 27 is formed above the first inorganic sealing film 26 and functions as a buffer film.
- the second inorganic sealing film 28 covers the first inorganic sealing film 26 and the organic sealing film 27. Further, the end portion of the organic sealing film 27 is covered with the first inorganic sealing film 26 and the second inorganic sealing film 28.
- Each of the first inorganic sealing film 26 and the second inorganic sealing film 28 is, for example, a silicon oxide film, a silicon nitride film, a silicon oxynitride film, or a laminated film thereof formed by CVD using a mask.
- the organic sealing film 27 is a translucent organic insulating film thicker than the first inorganic sealing film 26 and the second inorganic sealing film 28, and is made of a photosensitive organic material that can be coated, such as polyimide or acrylic. can do.
- the organic sealing film 27 is formed by curing by UV irradiation.
- the functional film 39 has, for example, an optical compensation function, a touch sensor function, a protection function, and the like. In the case where the layer having one or more of these functions is stacked on the light emitting element layer 5, the functional film 39 can be formed thin or removed.
- the electronic circuit board is, for example, an IC chip or a flexible printed circuit (FPC) mounted on a plurality of terminals.
- the terminal TM and the terminal wiring TW formed in the non-active region of the laminate formed on the base 10 and the TFT layer 4 And are cut by irradiation of a laser onto the dividing line DL to cut out pieces of the EL device.
- the dividing line DL is provided at a position wider than the outer end of the second inorganic sealing film 28 and at a distance from the outer end.
- the organic sealing film 27 covers the active area DA and is entirely covered by the second inorganic sealing film 28. Further, the terminal wire TW is connected to the terminal TM, and is located closer to the active area DA than the terminal TM.
- FIG. 4 is a figure which shows the structure of the coating device 101 used for formation of the organic sealing film 27 of a sealing layer.
- FIG. 4B is a plan view showing the ink ejection surface 104 a of the head 104 provided in the coating apparatus 101.
- FIG. 5 is a view showing a section to which the ink is applied by the applying device 101. As shown in FIG.
- the coating apparatus 101 is included in the EL device manufacturing apparatus 100, and includes a stage 102, a gantry 103, a head 104, and a control unit 105.
- the coating device 101 is an inkjet type device, and applies the ink to the coated laminate 201.
- the stage 102 is a stage on which the coated laminate 201 is placed.
- the to-be-coated laminate 201 includes a plurality of laminates before being cut into pieces, in which up to the first inorganic sealing film 26 is formed on the light emitting element layer 5 shown in FIG. It has a rectangular shape.
- the gantry 103 is driven to move on the stage 102 in the Y1 direction and the Y2 direction.
- the gantry 103 also has two legs 103a and a beam 103b.
- the legs 103 a are disposed to face each other on both sides of the coated laminate 201 along the X1 direction and the X2 direction. Both ends of the beam portion 103 b are connected to the upper end of the leg portion 103 a.
- a drive mechanism (not shown) for driving the gantry 103 is provided on the stage 102.
- the head 104 is a device that discharges (drops) an ink containing an organic material to the coated laminate 201. Further, as shown in (b) of FIG. 4, a plurality of nozzles 104 b are formed on the ink discharge surface 104 a of the head 104.
- the nozzles 104 b are ink discharge ports, and are arranged in a plurality of columns and a plurality of rows.
- the nozzles 104 b in each row aligned in the X1 direction and the X2 direction are misaligned in the column direction (the Y1 direction and the Y2 direction).
- the resolution of the nozzles 104 b in one row is 140 DPI
- ink can be ejected at a resolution of n ⁇ 140 DPI if n rows of nozzles 104 b are provided.
- the head 104 is attached to the beam portion 103b of the gantry 103 with the ink discharge surface 104a facing the stage 102, and along the guide rails (not shown) provided on the lower surface of the beam portion 103b, in the X1 direction and the X2 direction.
- Drive to move to A drive mechanism (not shown) for driving the head 104 is provided to the beam portion 103 b of the gantry 103.
- the control unit 105 includes a gantry drive control unit 106, a head drive control unit 107, a discharge control unit 108, and a storage unit 109.
- the gantry drive control unit 106 controls the drive of the gantry 103 in the Y1 direction and the Y2 direction.
- the head drive control unit 107 controls the driving of the head 104 in the X1 direction and the X2 direction.
- the discharge control unit 108 controls the discharge of the ink by the nozzle 104 b based on the preset application conditions.
- the application conditions include the amount of ink droplets ejected from the nozzles 104 b (ink ejection amount), the ejection density of ink (ink ejection density), and the like.
- the ink ejection density (ink ejection amount per drop [pl]) is the ink ejection amount per unit area [pl / um 2 ].
- the storage unit 109 stores data and the like for the control unit 105 to perform various controls.
- the storage unit 109 stores a pattern for controlling the drive of the gantry 103 by the gantry drive control unit 106.
- the storage unit 109 stores a pattern for the head drive control unit 107 to control the drive of the head 104.
- the storage unit 109 also stores application conditions used by the discharge control unit 108 to control the ink discharge of the head 104.
- the gantry drive control unit 106, the head drive control unit 107, and the discharge control unit 108 in the control unit 105 may be realized by a logic circuit (hardware) formed in an integrated circuit (IC chip) or the like, or a CPU (Central Processing Unit). It may be realized by software using Processing Unit).
- a logic circuit hardware
- IC chip integrated circuit
- CPU Central Processing Unit
- the coating apparatus 101 is a CPU that executes instructions of a program that is software that implements each function, a ROM (Read Only Memory) in which the program and various data are recorded readable by a computer (or CPU) or A storage device (these are referred to as a "recording medium"), a RAM (Random Access Memory) for developing the program, and the like are provided.
- the object of the present invention is achieved by the computer (or CPU) reading the program from the recording medium and executing the program.
- a “non-transitory tangible medium”, for example, a tape, a disk, a card, a semiconductor memory, a programmable logic circuit or the like can be used as the recording medium.
- the program may be supplied to the computer via any transmission medium (communication network, broadcast wave, etc.) capable of transmitting the program.
- one aspect of the present invention can also be realized in the form of a data signal embedded in a carrier wave in which the program is embodied by electronic transmission.
- FIG. 5 is a view showing a section to which the ink is applied by the applying device 101. As shown in FIG. FIG. 5 shows the laminated body in a solidified state for convenience. Also, the active area DA here is the active area DA in the laminate in which the first inorganic sealing film 26 is formed.
- the application area D0 to which the ink is applied is provided in a wide range including the active area DA.
- the aforementioned convex body TK is provided around the application area D0.
- the application area D0 is divided into nine divided areas D1 to D9, and application conditions corresponding to the divided areas D1 to D9 are set.
- the divided area D1 (second divided area) is a rectangular area which covers the rectangular active area DA and extends to a predetermined distance from the outer end of the active area DA.
- the divided area D2 (second divided area, third divided area) is a narrow area provided along one long side of the divided area D1.
- the divided area D3 (second divided area, third divided area) is a narrow area provided along the other long side of the divided area D1.
- the divided area D4 (second divided area, third divided area) is a narrow area provided along one short side of the divided area D1.
- the divided area D5 (second divided area, third divided area) is a narrow area provided along the other short side of the divided area D1.
- the divided area D6 (first divided area) is a rectangular area adjacent to the divided area D2 and the divided area D4.
- the divided area D7 (first divided area) is a rectangular area adjacent to the divided area D3 and the divided area D4.
- the divided area D8 (first divided area) is a rectangular area adjacent to the divided area D2 and the divided area D5.
- the divided area D9 (first divided area) is a rectangular area adjacent to the divided area D3 and the divided area D5.
- the divided areas D6 to D8 are provided at four corners of the application area D0.
- the application conditions for the divided regions D1 to D5 are set to normal application conditions.
- the coating conditions for the divided regions D1 to D5 are set to coating conditions different from normal.
- the ink ejection amount is set larger than usual so that the ink application amount per unit area (the application amount of the organic material) is increased, or the ink ejection density is usually It may be set higher.
- the ink ejection density may be increased.
- the normal application conditions refer to application conditions for performing one application by the head 104 in order to obtain a desired film thickness of the organic sealing film 27.
- FIG. 6A is an enlarged view of a part of the organic sealing film 27 formed by the application of the ink by the coating device 101.
- FIG. FIG. 6B is a cross-sectional view taken along line AA of FIG. 6A showing the cross-sectional structure of the organic sealing film 27. As shown in FIG.
- the head 104 ejects ink droplets to the application laminate 201 on the stage 102 while moving in the X1 direction or the X2 direction.
- the gantry 103 moves in the Y1 direction by a predetermined distance.
- the head 104 ejects an ink droplet to the coated laminate 201 while moving in the opposite direction to the previous application. By repeating such an operation, the ink is applied to the application region D0 of the application laminate 201.
- the application as described above is repeated until the organic sealing film 27 having the required thickness (5 to 10 ⁇ m) is formed.
- the second application is performed by moving the gantry 103 in the Y2 direction.
- the ejection control unit 108 controls the ink ejection of the head 104 under normal application conditions when the head 104 ejects the ink on the divided regions D1 to D5. On the other hand, when the head 104 ejects the ink on the divided regions D6 to D9, the ink ejection of the head 104 is controlled under the application condition different from the normal as described above.
- the organic sealing film 27 formed as a result as shown in FIG. 6A, four corners 27a (one corner 27a in FIG. 6A) corresponding to the divided regions D6 to D9. (Shown only) is formed so as to bulge with respect to the side 27b. Further, the organic sealing film 27 is formed between the corner 27a, the inner part 27c formed in the active area DA, and the corner 27a and the inner part 27c in the cross section shown in FIG. 6B. And an intermediate portion 27d.
- the film thickness of the corner 27a is the largest
- the film thickness of the inner part 27c is the smallest
- the film thickness of the middle part 27d is an intermediate size between the film thickness of the corner 27a and the film thickness of the inner part 27c.
- the film thickness of the side portion 27b is the same as the film thickness of the middle portion 27d.
- the distance L1 from the corner 27a to the outer end of the active area DA can be secured to be equal to or larger than the distance L2 from the side 27b to the outer end of the active area DA.
- the distance L2 is set to the shortest length at which the organic sealing film 27 can prevent the penetration of water.
- the film thickness of the corner 27 a is the largest in the organic sealing film 27. Therefore, it is possible to prevent the penetration of water in the corner 27a. Therefore, the sealing property of the organic sealing film 27 can be improved. Then, the reliability of the organic sealing film 27 can be improved.
- the head 104 since the width of the head 104 is smaller than the width (short side) of the coated laminate 201, it is necessary to move the head in the X1 direction or the X2 direction.
- the head 104 may have a width capable of having the number of nozzles 104 b capable of discharging the ink to the entire application range in the width direction of the coated laminate 201.
- the head 104 configured in this way does not need to be moved and is fixed to the gantry 103.
- the pitch of application When making the pitch of application more dense using the above-mentioned wide head 104, it is possible to perform movement (scanning) of Y1 direction or Y2 direction in multiple times. Specifically, assuming that the application pitch in one scan is 70.5 um, when one reciprocation (two times) scan is performed, the head 104 is scanned from the position in the forward scan in the backward scan. By slightly moving in the X1 direction or the X2 direction, the application pitch can be halved to 35.25 um. The coating pitch can be 17.625 ⁇ m by performing two reciprocations (four times) in the same manner as described above.
- the head 104 is moved in the Y1 direction or the Y2 direction.
- the stage 102 may be moved in the X1 direction or the X2 direction and in the Y1 direction or the Y2 direction.
- the organic interlayer film 21 may be provided at the end of the organic sealing film 27. Thereby, the organic interlayer film 21 can enhance the sealing effect of the organic sealing film 27.
- the passivation film 20 may be raised on the end side of the organic sealing film 27. Also by this, the sealing effect of the organic sealing film 27 can be enhanced.
- the application area D0 is divided into nine divided areas D1 to D9.
- the present invention is not limited to this, and the application area D0 may be divided by more than nine.
- the coating condition of the edge portion (outer edge portion) of the divided regions D2 to D5 shown in FIG. 5 is also different from the normal coating condition.
- the coating conditions for the portions other than the edge portion are set to be the same as the normal coating conditions, and the coating conditions for the edge portion are different from the normal coating conditions (for example, The ink discharge amount is reduced, the ink discharge density is reduced, and the like.
- the edge portion of the formed organic sealing film 27 has the same thickness as that of the portion other than the edge portion even if it is raised by the surface tension of the ink. Is formed.
- the edge portion of the formed organic sealing film 27 swells due to the surface tension of the ink, and therefore, is formed thicker than the portions other than the edge portion. Ru. The rise of the edge portion causes a crack in the second inorganic sealing film 28 formed on the organic sealing film 27. For this reason, there arises a disadvantage that water easily enters from the crack.
- the coating conditions for the divided regions D2 to D5 as in the present embodiment, it is possible to suppress the rise of the edge portion in the divided regions D2 to D5 of the organic sealing film 27.
- the possibility of the occurrence of cracks in the second inorganic sealing film 28 can be significantly reduced.
- the reliability of the organic sealing film 27 can be further improved.
- the edges of the division areas D2 to D5 as described above are also generated at the start and end points of the ink discharge in the division areas D1 to D9. It is preferable to set application conditions in the part.
- FIG. 7 is a view showing sections according to Embodiment 2 to which the application device 101 applies the ink.
- the application region D0 is divided into division regions D1 to D5, D61, D71, D81, and D91.
- the aforementioned convex body TK is provided around the application area D0.
- the divided area D61 (first divided area) is a rectangular area in contact with the divided area D2 and the divided area D4, and protrudes outward beyond the divided area D2 and the divided area D4.
- the divided area D71 (first divided area) is a rectangular area in contact with the divided area D3 and the divided area D4, and protrudes outward beyond the divided area D3 and the divided area D4.
- the divided area D81 (first divided area) is a rectangular area in contact with the divided area D2 and the divided area D5, and protrudes outward beyond the divided area D2 and the divided area D5.
- the divided area D91 (first divided area) is a rectangular area in contact with the divided area D3 and the divided area D5, and protrudes outward beyond the divided area D3 and the divided area D5.
- the divided areas D61, D71, D81 and D91 respectively correspond to the four corners of the application area D0. Further, the divided regions D61, D71, D81, and D91 are formed larger than the divided regions D6 to D9 (see FIG. 5) in the first embodiment.
- the coating conditions for the divided areas D1 to D5, D61, D71, D81, and D91 are normally set as in the first embodiment.
- the corner 27a of the formed organic sealing film 27 is as shown in (a) and (b) of FIG. Similar to the corner 27 a of the organic sealing film 27 in the first embodiment, it is formed in a wide range.
- the coating apparatus includes a head 104 that discharges an ink containing an organic material to a square application region on the lower layer film, and a discharge control unit 108 that controls the discharge of the ink by the head 104.
- the ejection control unit 108 controls the ejection of the ink according to the ink application amount per unit area by the head 104 set for each of the divided areas where the application area is divided into a plurality.
- the divided areas are provided at least at four corners of the application area.
- the application condition of the divided area can be made different from the ink application amount of the other divided areas.
- the corner portions of the formed organic film can be formed large by optimally setting the ink application amounts of the divided regions provided at the four corners of the application region. Therefore, a long distance from the outer end of the organic film at the corner to the outer end of the lower layer can be secured. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
- the divided areas are configured by first divided areas provided at the four corners of the application area, and second divided areas other than the first divided area.
- the ink application amount per unit area to the first divided area may be set larger than that of the second divided area.
- the second divided area includes a third divided area provided between the first divided areas of two adjacent corners of the application area. It may be.
- the ink application amount of the third divided area can be set optimally.
- the edge portion of the organic film formed by applying the ink to the third divided region tends to swell due to the surface tension of the ink. Therefore, if the ink application amount in the third divided region is set to be smaller, it is possible to suppress the rise of the edge portion of the organic film.
- the first divided area may protrude outward beyond the third divided area.
- the corner of the organic film can be formed large. Thereby, a long distance from the outer end of the corner of the organic film to the outer end of the lower layer film can be secured.
- any one of the above aspects 1 to 4 nine or more divided areas may be provided.
- the ink application amount can be set in accordance with the more finely divided divided areas.
- a coating apparatus is a coating apparatus for applying an organic material to a square application area on a support material common to a plurality of EL devices, wherein the application area is provided for each of the EL devices.
- the application amount of the organic material is made different between the four corners and the area other than the four corners.
- the application amount of the organic material with respect to the four corners is made different from that in the regions other than the four corners. It can be formed large. Therefore, it is possible to secure a long distance from the outer end at the corner of the organic film to the outer end of the lower film of the organic film. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
- An EL device manufacturing apparatus comprises the coating apparatus according to any one of aspects 1 to 6, wherein the coating apparatus is included in the sealing layer for sealing the light emitting element layer of the EL device. Form a film.
- the application region is provided to the application region provided so as to surround the active region where the light emitting element layer is formed.
- the organic film may be formed to seal the light emitting element layer by applying the organic material so that the four corners of the active region correspond to the four corners of the active region.
- a square is formed on the light emitting element layer so as to seal the light emitting element layer and an active region in which a light emitting element layer including a plurality of light emitting elements is formed.
- an organic film formed by applying an organic material to the application region so as to surround the active region, wherein four corners of the organic film correspond to four corners of the active region, respectively.
- the application amount of the organic material is different between the four corners and the area other than the four corners.
- the application amount of the organic material is different between the four corners and the other region, so the application amount of the four corners is increased, so that the corners are It can be formed large. Therefore, it is possible to secure a long distance from the outer end at the corner of the organic film to the outer end of the lower film of the organic film. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
- the four corners of the organic film may bulge outward beyond the side between two adjacent corners.
- the film thickness of the four corners in the organic film may be the largest, and the film thickness on the active region in the organic film may be the smallest.
- the EL device according to aspect 12 of the present invention may further include a convex body provided so as to surround the active region in any of the above aspects 9 to 11.
- the edge portion of the active area can be sealed.
- the organic film is sandwiched between the first inorganic film lower than the organic film and the second inorganic film upper than the organic film.
- the edge of the organic film may be covered by the first inorganic film and the second inorganic film.
- the edge portion of the organic film can be sealed.
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Abstract
Description
本発明は、EL発光素子層を封止する樹脂を塗布する塗布装置に関する。 The present invention relates to a coating apparatus for coating a resin for sealing an EL light emitting element layer.
EL素子(electroluminescence element)を含むELデバイスは、基材上に、TFT(Thin Film Transistor)層、発光素子層、封止層等が積層される構造を有している。 An EL device including an EL element (electroluminescence element) has a structure in which a TFT (Thin Film Transistor) layer, a light emitting element layer, a sealing layer, and the like are stacked on a base material.
このようなELデバイスの製造において、封止層を形成する工程では、例えば、無機材料からなる無機封止膜を形成し、その上に平坦化のための有機材料かららなる有機封止膜を形成した後、その上にさらに無機封止膜を形成する。有機封止膜の形成は、例えば、特許文献1に開示されているように、有機材料を含むインクをインクジェット装置によって塗布することで行われる。 In the manufacturing of such an EL device, in the step of forming the sealing layer, for example, an inorganic sealing film made of an inorganic material is formed, and an organic sealing film made of an organic material for planarization is formed thereon. After formation, an inorganic sealing film is further formed thereon. For example, as disclosed in Patent Document 1, the formation of the organic sealing film is performed by applying an ink containing an organic material by an inkjet device.
例えば、上記のようなインクジェット装置を用いて有機封止膜を形成する場合、図8に示すように、発光素子が形成されたアクティブ領域DAを覆う塗布領域D0にインクを塗布する。通常、塗布領域D0におけるインクの塗布条件(ヘッドのノズルから吐出されるインク滴の量、インクの吐出密度等)は、塗布領域D0の全体で均一である。 For example, when forming an organic sealing film using the above-mentioned inkjet apparatus, as shown in FIG. 8, an ink is apply | coated to application | coating area | region D0 which covers active area DA in which the light emitting element was formed. Usually, the application conditions of the ink in the application area D0 (the amount of ink droplets ejected from the nozzles of the head, the ejection density of the ink, etc.) are uniform throughout the application area D0.
図9に示すように、塗布領域D0にインクが塗布されることによって形成された有機封止膜271において、その4つの隅部271a(図9では1つの隅部271aのみ示す)は、インクが十分に行き渡らなかったために、角張った形状ではなく、曲線状に形成される。
As shown in FIG. 9, in the
このため、隅部271aの外端部からアクティブ領域DAの外端部までの距離L11が、有機封止膜271における辺部271bの外端部からアクティブ領域DAの外端部までの距離L12よりも短くなる。距離L12は、有機封止膜271が水分の浸透を防ぐことができる最短の長さに設定されている。したがって、距離L11が距離L12よりも短いと、隅部271aからの水分の浸透を十分に防ぐことが難しくなる。この結果、隅部271aに近い発光素子が、浸透した水分によってダメージを受けることによって、不良品が生じるという不都合が生じる。
Therefore, the distance L11 from the outer end of the
本発明の一態様は、有機封止膜の封止性を向上させることを目的とする。 One aspect of the present invention is to improve the sealing property of an organic sealing film.
上記の課題を解決するために、本発明の一態様に係る塗布装置は、下層膜上の方形を成す塗布領域に有機材料を含むインクを吐出するヘッドと、前記ヘッドによるインクの吐出を制御する吐出制御部と、を備え、前記吐出制御部は、前記塗布領域が複数に区分された区分領域ごとに設定された、前記ヘッドによる単位面積当たりのインク塗布量にしたがってインクの吐出を制御し、前記区分領域は、少なくとも前記塗布領域の四隅に設けられている。 In order to solve the above-mentioned subject, the application device concerning one mode of the present invention controls the discharge of the ink by the head which discharges the ink containing an organic material to the application field which forms the rectangle on a lower layer film which makes a rectangle. A discharge control unit, wherein the discharge control unit controls the discharge of the ink according to the ink application amount per unit area by the head, which is set for each of the plurality of divided regions into which the application region is divided; The divided areas are provided at least at four corners of the application area.
本発明の一態様によれば、有機封止膜の封止性を向上させることができるという効果を奏する。 According to one aspect of the present invention, an effect is obtained that the sealing property of the organic sealing film can be improved.
〔実施形態1〕
本発明の実施形態1について図1~図6に基づいて説明すると、以下の通りである。
Embodiment 1
The following description will explain Embodiment 1 of the present invention with reference to FIGS. 1 to 6.
図1は、ELデバイスの製造工程の一例を示す工程図である。図2(a)は、ELデバイスの構成例を示す断面図である。図3は、上記製造工程における分断化の工程を示す平面図である。 FIG. 1 is a process chart showing an example of a manufacturing process of an EL device. FIG. 2A is a cross-sectional view showing a configuration example of the EL device. FIG. 3 is a plan view showing the process of division in the above manufacturing process.
まず、ELデバイスの製造について説明する。 First, manufacturing of the EL device will be described.
図1の(a)および図2の(a)に示すように、まず、複数のELデバイスに共通する基材10(支持材)上に樹脂層12を形成する(ステップS1)。次いで、バリア層3を形成する(ステップS2)。バリア層3上に、ゲート絶縁膜16およびパッシベーション膜18,20および有機層間膜21を含むTFT層4を形成する(ステップS3)。
As shown in (a) of FIG. 1 and (a) of FIG. 2, first, the
TFT層4の上に、発光素子層(例えば、OLED(Organic Light Emitting Diode)素子層)5を形成する(ステップS4)。次いで、第1無機封止膜26(下層膜,第1無機膜)、第2無機封止膜28(第2無機膜)および有機封止膜27(有機膜)を含む封止層6を形成し、積層体7を得る(ステップS5)。
A light emitting element layer (for example, an OLED (Organic Light Emitting Diode) element layer) 5 is formed on the TFT layer 4 (step S4). Next, the sealing
この積層体7を基材10とともに分断し、個片化する(ステップS7)。そして、接着層38を介して機能フィルム39を貼り付ける(ステップS8)。さらに、TFT層4の端部に電子回路基板を実装する(ステップS9)。
The
これにより、図2の(a)に示すELデバイス2を得る。なお、前記各ステップは後述するELデバイス製造装置100(図4参照)が行う。
Thereby, the
フレキシブルなELデバイスを製造する場合には、図1の(b)および図2の(b)に示すように、例えばガラス基板50(支持材)上に積層体7(樹脂層12、バリア層3、TFT層4、発光素子層5および封止層6)を形成しておき、積層体7上に接着層8を介して上面フィルム9を貼り付ける(ステップS6a)。この状態で、ガラス基板50越しに樹脂層12の下面にレーザ光を照射する(ステップS6b)。レーザ光の照射により、樹脂層12の下面(ガラス基板50との界面)がアブレーションによって変質し、樹脂層12およびガラス基板50間の結合力が低下する。
In the case of producing a flexible EL device, as shown in (b) of FIG. 1 and (b) of FIG. 2, for example, a laminate 7 (
次いで、ガラス基板50を樹脂層12から剥離する(ステップS6c)。次いで、樹脂層12の下面に、接着層を介して基材10(例えば、PET等で構成された下面フィルム)を貼り付ける(ステップS6d)。その後、上記ステップS7に移行する。
Next, the
樹脂層12の材料としては、例えば、ポリイミド、エポキシ、ポリアミド等が挙げられる。下面フィルムの材料としては、例えばポリエチレンテレフタレート(PET)が挙げられる。
Examples of the material of the
バリア層3は、ELデバイスの使用時に、水分や不純物が、TFT層4や発光素子層5に到達することを防ぐ層である。バリア層3は、例えば、CVDにより形成される、酸化シリコン膜、窒化シリコン膜、あるいは酸窒化シリコン膜、またはこれらの積層膜で構成することができる。
The barrier layer 3 is a layer that prevents moisture and impurities from reaching the
TFT層4は、半導体膜15と、ゲート絶縁膜16と、ゲート電極Gと、パッシベーション膜18,20と、容量電極Cおよび端子と、ソース配線Sおよびドレイン配線Dと、有機層間膜(平坦化膜)21とを含む。
The
ゲート絶縁膜16は、半導体膜15よりも上層に形成されている。ゲート電極Gは、ゲート絶縁膜16よりも上層に形成されている。パッシベーション膜18,20は、ゲート電極Gよりも上層に形成されている。容量電極Cおよび図示しない端子は、パッシベーション膜18よりも上層に形成されている。ソース配線Sおよびドレイン配線Dは、パッシベーション膜20よりも上層に形成されている。有機層間膜21は、ソース配線Sおよびドレイン配線Dよりも上層に形成されている。
The
薄層トランジスタ(TFT)は、半導体膜15、ゲート絶縁膜16、およびゲート電極Gを含むように構成されている。TFT層4の非アクティブ領域には、電子回路基板との接続に用いられる複数の上記の端子が形成されている。
The thin film transistor (TFT) is configured to include the
半導体膜15は、例えば低温ポリシリコン(LTPS)あるいは酸化物半導体で構成される。ゲート絶縁膜16は、例えば、CVD法によって形成された、酸化シリコン(SiOx)膜あるいは窒化シリコン(SiNx)膜、またはこれらの積層膜によって構成することができる。ゲート電極G、ソース電極S、ドレイン電極D、および端子は、例えば、アルミニウム(Al)、タングステン(W)、モリブデン(Mo)、タンタル(Ta)、クロム(Cr)、チタン(Ti)、銅(Cu)の少なくとも1つを含む金属の単層膜あるいは積層膜によって構成される。
The
なお、半導体膜15をチャネルとするTFTは、図2の(a)および(b)においてトップゲート構造である。ただし、TFTは、ボトムゲート構造であってもよい(例えば、TFTのチャネルが酸化物半導体の場合)。
The TFT having the
ゲート絶縁膜16およびパッシベーション膜18,20は、例えば、CVD法によって形成された、酸化シリコン(SiOx)膜あるいは窒化シリコン(SiNx)膜、またはこれらの積層膜によって構成することができる。有機層間膜21は、例えば、ポリイミド、アクリル等の塗布可能な感光性有機材料によって構成することができる。端子のエッジは有機層間膜21で覆われている。
The
発光素子層5(例えば、有機発光ダイオード層)は、第1電極22(例えば、アノード電極)と、有機絶縁膜23と、EL(electroluminescence)層24と、第2電極25とを含んでいる。また、第1電極22、EL層24、および第2電極25によって発光素子(例えば有機発光ダイオード)が構成される。
The light emitting element layer 5 (for example, an organic light emitting diode layer) includes a first electrode 22 (for example, an anode electrode), an organic insulating
第1電極22は、有機層間膜21よりも上層に形成されている。有機絶縁膜23は、第1電極22のエッジを覆っている。EL層24は、第1電極22よりも上層に形成されている。第2電極25は、EL層24よりも上層に形成されている。発光素子層5が形成されるアクティブ領域DAにおいて、有機絶縁膜23は、サブピクセルを規定するバンク(画素隔壁)として機能する。
The
有機絶縁膜23は、例えば、例えば、ポリイミド、アクリル等の塗布可能な感光性有機材料によって構成することができる。有機絶縁膜23は、例えば、アクティブ領域DAおよび発光素子層5が形成されていない非アクティブ領域に対してインクジェット方式で塗布することができる。
The organic insulating
非アクティブ領域には、アクティブ領域を取り囲むバンク状の凸体TKが設けられる。凸体TKは有機封止膜27(例えば、インクジェット方式で形成される膜)のエッジを規定する。凸体TKは、例えば、有機層間膜21および有機絶縁膜23の少なくとも一方を含むように構成される。
In the non-active area, a bank-like convex body TK surrounding the active area is provided. The convex body TK defines an edge of the organic sealing film 27 (for example, a film formed by an inkjet method). The convex body TK is configured to include, for example, at least one of the
EL層24は、隔壁23cによって囲まれた領域(サブピクセル領域)に、蒸着法あるいはインクジェット法によって形成される。発光素子層5が有機発光ダイオード(OLED)層である場合、EL層24は、例えば、下層側から順に、正孔注入層、正孔輸送層、発光層、電子輸送層、電子注入層を積層することで構成される。なお、EL層24の1以上の層を(複数の画素で共有する)共通層とすることもできる。 The EL layer 24 is formed by an evaporation method or an inkjet method in a region (sub-pixel region) surrounded by the partition wall 23c. When the light emitting element layer 5 is an organic light emitting diode (OLED) layer, for example, the EL layer 24 is formed by sequentially laminating a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer, and an electron injection layer from the lower layer side. It is constituted by doing. Note that one or more layers of the EL layer 24 can be a common layer (shared by a plurality of pixels).
第1電極22(陽極)は、例えばITO(Indium Tin Oxide)とAgを含む合金との積層によって構成され、光反射性を有する。第2電極25(例えば、カソード電極)は、共通電極であり、ITO(Indium Tin Oxide)、IZO(Indium Zinc Oxide)等の透明金属で構成することができる。 The first electrode 22 (anode) is formed of, for example, a laminate of ITO (Indium Tin Oxide) and an alloy containing Ag, and has light reflectivity. The second electrode 25 (for example, a cathode electrode) is a common electrode and can be made of a transparent metal such as ITO (Indium Tin Oxide) or IZO (Indium Zinc Oxide).
発光素子層5がOLED層である場合、第1電極22および第2電極25間の駆動電流によって正孔と電子がEL層24内で再結合し、これによって生じたエキシトンが基底状態に落ちることによって、光が放出される。
When the light emitting element layer 5 is an OLED layer, the driving current between the
発光素子層5は、OLED素子を構成する場合に限られず、無機発光ダイオードあるいは量子ドット発光ダイオードを構成してもよい。 The light emitting element layer 5 is not limited to forming an OLED element, and may form an inorganic light emitting diode or a quantum dot light emitting diode.
封止層6は、発光素子層5を覆うことにより封止して、水、酸素等の異物の発光素子層5への浸透を防ぐ。封止層6は、第1無機封止膜26と、有機封止膜27と、第2無機封止膜28とを含む。第1無機封止膜26は、有機絶縁膜23および第2電極25を覆う。有機封止膜27は、第1無機封止膜26よりも上層に形成され、バッファ膜として機能する。第2無機封止膜28は、第1無機封止膜26および有機封止膜27を覆う。また、有機封止膜27の端部は、第1無機封止膜26および第2無機封止膜28によって覆われている。
The
第1無機封止膜26および第2無機封止膜28は、それぞれ、例えば、マスクを用いたCVDにより形成される、酸化シリコン膜、窒化シリコン膜、あるいは酸窒化シリコン膜、またはこれらの積層膜で構成することができる。有機封止膜27は、第1無機封止膜26および第2無機封止膜28よりも厚い、透光性の有機絶縁膜であり、ポリイミド、アクリル等の塗布可能な感光性有機材料によって構成することができる。例えば、このような有機材料を含むインクを第1無機封止膜26上にインクジェット塗布した後、UV照射により硬化させることで、有機封止膜27を形成する。
Each of the first inorganic sealing film 26 and the second
機能フィルム39は、例えば、光学補償機能、タッチセンサ機能、保護機能等を有する。これらの1以上の機能を有する層が発光素子層5よりも上層に積層されている場合には、機能フィルム39を薄く形成したり、除いたりすることもできる。電子回路基板は、例えば、複数の端子上に実装されるICチップあるいはフレキシブルプリント基板(FPC)である。
The
上述のステップS7における分断による固片化においては、図3に示すように、基材10上に形成された積層体と、TFT層4の非アクティブ領域に形成された、端子TMおよび端子配線TWとを、分断線DL上へのレーザの照射によってカットし、ELデバイスの個片を切り出す。ここで、分断線DLは、第2無機封止膜28の外端部よりも広く、かつ当該外端部と間隔をおいた位置に設けられる。
In solidifying by division in the above-mentioned step S7, as shown in FIG. 3, the terminal TM and the terminal wiring TW formed in the non-active region of the laminate formed on the
また、有機封止膜27は、アクティブ領域DAを覆い、かつ第2無機封止膜28によって全体を覆われている。また、端子配線TWは、端子TMに接続されており、端子TMよりもアクティブ領域DA側に位置する。
The
続いて、有機封止膜27を形成する塗布装置について説明する。
Subsequently, a coating apparatus for forming the
図4の(a)は、封止層の有機封止膜27の形成に用いられる塗布装置101の構成を示す図である。図4の(b)は、塗布装置101に設けられたヘッド104のインク吐出面104aを示す平面図である。図5は、塗布装置101によってインクが塗布される区分を示す図である。
(A) of FIG. 4 is a figure which shows the structure of the
図4の(a)に示すように、塗布装置101は、ELデバイス製造装置100に含まれており、ステージ102と、ガントリ103と、ヘッド104と、制御部105とを備えている。塗布装置101は、インクジェット式の装置であり、被塗布積層体201にインクを塗布する。
As shown in (a) of FIG. 4, the
ステージ102は、被塗布積層体201が載置される台である。被塗布積層体201は、図2の(a)に示す発光素子層5上に第1無機封止膜26までが形成された、固片化される前の複数の積層体を含んでおり、長方形を成している。
The
ガントリ103は、ステージ102上をY1方向およびY2方向に移動するように駆動される。また、ガントリ103は、2本の脚部103aと、梁部103bとを有している。脚部103aは、被塗布積層体201の、X1方向およびX2方向に沿った両側に互いに対向するように配置されている。梁部103bは、その両端が脚部103aの上端に接続されている。ガントリ103を駆動する駆動機構(図示せず)は、ステージ102に設けられている。
The
ヘッド104は、有機材料を含むインクを被塗布積層体201に対して吐出(滴下)する装置である。また、図4の(b)に示すように、ヘッド104のインク吐出面104aには、複数のノズル104bが形成されている。ノズル104bは、インクの吐出口であり、複数列かつ複数行に配列されている。X1方向およびX2方向に並ぶ各行のノズル104bは、列方向(Y1方向およびY2方向)の位置がずれている。これにより、各行のノズル解像度を合わせることで、高解像度でインクを吐出することができる。例えば、1行のノズル104bの解像度が140DPIであれば、ノズル104bがn行設けられている場合、n×140DPIの解像度でインクを吐出することができる。
The
また、ヘッド104は、インク吐出面104aをステージ102に向けてガントリ103の梁部103bに取り付けられており、梁部103bの下面に設けられた図示しないガイドレールに沿って、X1方向およびX2方向に移動するように駆動される。ヘッド104を駆動する駆動機構(図示せず)は、ガントリ103の梁部103bに設けられている。
The
制御部105は、ガントリ駆動制御部106と、ヘッド駆動制御部107と、吐出制御部108と、記憶部109とを含んでいる。
The
ガントリ駆動制御部106は、ガントリ103のY1方向およびY2方向の駆動を制御する。ヘッド駆動制御部107は、ヘッド104のX1方向およびX2方向の駆動を制御する。吐出制御部108は、予め設定された塗布条件に基づいてノズル104bによるインクの吐出を制御する。ここで、塗布条件とは、ノズル104bから吐出されるインク滴の量(インク吐出量)、インクの吐出密度(インク吐出密度)等のことである。インク吐出密度(一滴当たりのインク吐出量[pl])は、単位面積当たりのインクの吐出量[pl/um2]である。
The gantry
記憶部109は、制御部105が各種の制御を行うためのデータ等を記憶している。例えば、記憶部109は、ガントリ駆動制御部106がガントリ103の駆動を制御するためのパターンを記憶している。また、記憶部109は、ヘッド駆動制御部107がヘッド104の駆動を制御するためのパターンを記憶している。また、記憶部109は、吐出制御部108がヘッド104のインク吐出を制御するために用いる塗布条件を記憶している。
The
制御部105におけるガントリ駆動制御部106、ヘッド駆動制御部107および吐出制御部108は、集積回路(ICチップ)等に形成された論理回路(ハードウェア)によって実現してもよいし、CPU(Central Processing Unit)を用いてソフトウェアによって実現してもよい。
The gantry
後者の場合、塗布装置101は、各機能を実現するソフトウェアであるプログラムの命令を実行するCPU、上記プログラムおよび各種データがコンピュータ(またはCPU)で読み取り可能に記録されたROM(Read Only Memory)または記憶装置(これらを「記録媒体」と称する)、上記プログラムを展開するRAM(Random Access Memory)などを備えている。そして、コンピュータ(またはCPU)が上記プログラムを上記記録媒体から読み取って実行することにより、本発明の目的が達成される。
In the latter case, the
上記記録媒体としては、「一時的でない有形の媒体」、例えば、テープ、ディスク、カード、半導体メモリ、プログラマブルな論理回路などを用いることができる。また、上記プログラムは、該プログラムを伝送可能な任意の伝送媒体(通信ネットワークや放送波等)を介して上記コンピュータに供給されてもよい。 As the recording medium, a “non-transitory tangible medium”, for example, a tape, a disk, a card, a semiconductor memory, a programmable logic circuit or the like can be used. The program may be supplied to the computer via any transmission medium (communication network, broadcast wave, etc.) capable of transmitting the program.
なお、本発明の一態様は、上記プログラムが電子的な伝送によって具現化された、搬送波に埋め込まれたデータ信号の形態でも実現され得る。 Note that one aspect of the present invention can also be realized in the form of a data signal embedded in a carrier wave in which the program is embodied by electronic transmission.
次に、塗布条件の設定について説明する。 Next, setting of application conditions will be described.
図5は、塗布装置101によってインクが塗布される区分を示す図である。図5は、便宜上、固片化された状態の積層体を示している。また、ここでのアクティブ領域DAは、第1無機封止膜26までが形成された積層体におけるアクティブ領域DAのことである。
FIG. 5 is a view showing a section to which the ink is applied by the applying
図5に示すように、インクが塗布される塗布領域D0がアクティブ領域DAを含む広い範囲に設けられている。塗布領域D0の周囲には、前述の凸体TKが設けられている。塗布領域D0は、9つの区分領域D1~D9に分割されており、区分領域D1~D9に応じた塗布条件が設定されている。 As shown in FIG. 5, the application area D0 to which the ink is applied is provided in a wide range including the active area DA. The aforementioned convex body TK is provided around the application area D0. The application area D0 is divided into nine divided areas D1 to D9, and application conditions corresponding to the divided areas D1 to D9 are set.
区分領域D1(第2区分領域)は、長方形を成すアクティブ領域DAを覆い、アクティブ領域DAの外端部から所定の距離を置いた範囲まで広がる長方形の領域である。区分領域D2(第2区分領域,第3区分領域)は、区分領域D1の一方の長辺に沿うように設けられた幅の狭い領域である。区分領域D3(第2区分領域,第3区分領域)は、区分領域D1の他方の長辺に沿うように設けられた幅の狭い領域である。区分領域D4(第2区分領域,第3区分領域)は、区分領域D1の一方の短辺に沿うように設けられた幅の狭い領域である。区分領域D5(第2区分領域,第3区分領域)は、区分領域D1の他方の短辺に沿うように設けられた幅の狭い領域である。 The divided area D1 (second divided area) is a rectangular area which covers the rectangular active area DA and extends to a predetermined distance from the outer end of the active area DA. The divided area D2 (second divided area, third divided area) is a narrow area provided along one long side of the divided area D1. The divided area D3 (second divided area, third divided area) is a narrow area provided along the other long side of the divided area D1. The divided area D4 (second divided area, third divided area) is a narrow area provided along one short side of the divided area D1. The divided area D5 (second divided area, third divided area) is a narrow area provided along the other short side of the divided area D1.
区分領域D6(第1区分領域)は、区分領域D2と区分領域D4とに隣接する方形の領域である。区分領域D7(第1区分領域)は、区分領域D3と区分領域D4とに隣接する方形の領域である。区分領域D8(第1区分領域)は、区分領域D2と区分領域D5とに隣接する方形の領域である。区分領域D9(第1区分領域)は、区分領域D3と区分領域D5とに隣接する方形の領域である。区分領域D6~D8は、それぞれ塗布領域D0の四隅の部分に設けられている。 The divided area D6 (first divided area) is a rectangular area adjacent to the divided area D2 and the divided area D4. The divided area D7 (first divided area) is a rectangular area adjacent to the divided area D3 and the divided area D4. The divided area D8 (first divided area) is a rectangular area adjacent to the divided area D2 and the divided area D5. The divided area D9 (first divided area) is a rectangular area adjacent to the divided area D3 and the divided area D5. The divided areas D6 to D8 are provided at four corners of the application area D0.
区分領域D1~D5に対する塗布条件は、通常の塗布条件に設定される。一方、区分領域D1~D5に対する塗布条件は、通常とは異なる塗布条件に設定される。例えば、区分領域D6~D9に対する塗布条件としては、単位面積当たりのインク塗布量(有機材料の塗布量)を多くするように、インク吐出量が通常より多く設定されていたり、インク吐出密度が通常より高く設定されていたりする。インク塗布量を多くするには、例えば、インク吐出密度を高くすればよい。インク吐出密度を高くする方法としては、ヘッド104の駆動波形を変えて一滴あたりのインク吐出量を多くする方法、吐出周波数を高くする方法などがある。ここで、通常の塗布条件とは、有機封止膜27の所望の膜厚を得るために、ヘッド104による1回の塗布を行うための塗布条件のことをいう。
The application conditions for the divided regions D1 to D5 are set to normal application conditions. On the other hand, the coating conditions for the divided regions D1 to D5 are set to coating conditions different from normal. For example, as the application conditions for the divided regions D6 to D9, the ink ejection amount is set larger than usual so that the ink application amount per unit area (the application amount of the organic material) is increased, or the ink ejection density is usually It may be set higher. In order to increase the ink application amount, for example, the ink ejection density may be increased. As a method of increasing the ink discharge density, there are a method of changing the drive waveform of the
引き続いて、上記のように構成される塗布装置101の動作について説明する。
Subsequently, the operation of the
図6の(a)は、塗布装置101によるインクの塗布で形成された有機封止膜27の一部を拡大して示す図である。図6の(b)は、有機封止膜27の断面構造を示す図6の(a)のA-A線矢視断面図である。
FIG. 6A is an enlarged view of a part of the
ガントリ103が初期位置にある状態で、ヘッド104は、X1方向またはX2方向に移動しながら、ステージ102上の被塗布積層体201に対してインク滴を吐出する。被塗布積層体201の短辺方向へのインクの塗布が終了すると、ガントリ103がY1方向へ所定距離移動する。ヘッド104は、この位置で、先の塗布とは逆方向に移動しながら被塗布積層体201に対してインク滴を吐出する。このような動作を繰り返すことにより、被塗布積層体201における塗布領域D0にインクが塗布される。
With the
上記のような塗布を、必要な厚さ(5~10μm)を有する有機封止膜27が形成されるまで繰り返して行う。2回目の塗布は、ガントリ103をY2方向に移動させることで行う。
The application as described above is repeated until the
吐出制御部108は、ヘッド104が区分領域D1~D5上でインクを吐出するときには、通常の塗布条件でヘッド104のインク吐出を制御する。一方、ヘッド104が区分領域D6~D9上でインクを吐出するときには、上記のように通常とは異なる塗布条件でヘッド104のインク吐出を制御する。
The
この結果形成された有機封止膜27においては、図6の(a)に示すように、区分領域D6~D9に対応する4つの隅部27a(図6の(a)では1つの隅部27aのみ示す)が、辺部27bに対して膨らむように大きく形成される。また、有機封止膜27は、図6の(b)に示す断面部分において、隅部27aと、アクティブ領域DAに形成された内側部27cと、隅部27aと内側部27cとの間に形成された中間部27dとで構成される。隅部27aの膜厚が最も大きく、内側部27cの膜厚が最も小さく、中間部27dの膜厚が隅部27aの膜厚と内側部27cの膜厚との中間の大きさである。辺部27bの膜厚は、中間部27dの膜厚と同じである。
In the
これにより、有機封止膜27において、隅部27aからアクティブ領域DAの外端部までの距離L1を、辺部27bからアクティブ領域DAの外端部までの距離L2以上に確保することができる。距離L2は、有機封止膜27が水分の浸透を防ぐことができる最短の長さに設定されている。また、隅部27aの膜厚が、有機封止膜27において最も大きい。したがって、隅部27aにおける水分の浸透を防止することができる。よって、有機封止膜27の封止性を向上させることができる。そして、延いては、有機封止膜27の信頼性を向上させることができる。
Thereby, in the
なお、本実施形態では、ヘッド104の幅が被塗布積層体201の幅(短辺)よりも小さいために、X1方向またはX2方向に移動させる必要がある。これに対し、ヘッド104が、被塗布積層体201の幅方向の塗布範囲の全てにインクを吐出することができる数のノズル104bを有することができる幅を有していてもよい。このように構成されるヘッド104は、移動させる必要がなく、ガントリ103に固定される。
In the present embodiment, since the width of the
上記の幅広のヘッド104を使用して塗布のピッチをより密にする場合、Y1方向またはY2方向の移動(走査)を複数回行うことが考えられる。具体的には、1回の走査における塗布のピッチが70.5umであるとすると、1往復(2回)の走査を行うときに、復路の走査において、ヘッド104を往路の走査における位置から走査X1方向またはX2方向にわずかに動かすことにより、塗布のピッチを35.25umに半減することができる。また、上記と同様にして2往復(4回)の走査を行うことにより、塗布のピッチを17.625umにすることができる。
When making the pitch of application more dense using the above-mentioned
また、本実施形態では、ステージ102を固定して、ガントリ103を移動させることにより、ヘッド104をY1方向またはY2方向に移動させている。これに対し、ヘッド104を固定した状態で、ステージ102を、X1方向またはX2方向と、Y1方向またはY2方向とに移動させてもよい。
Further, in the present embodiment, by fixing the
また、本実施形態では、有機層間膜21を有機封止膜27の端部に設けてもよい。これにより、有機層間膜21が有機封止膜27の封止効果を高めることができる。あるいは、有機封止膜27の端部側でパッシベーション膜20を隆起させてもよい。これによっても、有機封止膜27の封止効果を高めることができる。
In the present embodiment, the
また、本実施形態では、塗布領域D0を9つの区分領域D1~D9に区分した例について説明した。しかしながら、これに限らず、塗布領域D0を9つを超える数で区分してもよい。 Further, in the present embodiment, an example in which the application area D0 is divided into nine divided areas D1 to D9 has been described. However, the present invention is not limited to this, and the application area D0 may be divided by more than nine.
〔実施形態2〕
本発明の実施形態2について図4および図5に基づいて説明すると、以下の通りである。なお、本実施形態において、前述の実施形態1における構成要素と同等の機能を有する構成要素については、同一の符号を付記してその説明を適宜省略する。
Second Embodiment
The second embodiment of the present invention is described below with reference to FIGS. 4 and 5. In the present embodiment, the components having the same functions as the components in the first embodiment described above will be denoted by the same reference numerals, and the description thereof will be appropriately omitted.
本実施形態では、実施形態1における塗布条件の設定に加え、図5に示す区分領域D2~D5のエッジ部(外側の端縁部)の塗布条件も通常の塗布条件と異ならせる。具体的には、区分領域D2~D5において、エッジ部以外の部分の塗布条件を通常の塗布条件と同じに設定し、エッジ部の部分の塗布条件を通常の塗布条件と異なる塗布条件(例えば、インク吐出量の減量、インク吐出密度の低減等)に設定する。 In the present embodiment, in addition to the setting of the coating condition in the first embodiment, the coating condition of the edge portion (outer edge portion) of the divided regions D2 to D5 shown in FIG. 5 is also different from the normal coating condition. Specifically, in the divided regions D2 to D5, the coating conditions for the portions other than the edge portion are set to be the same as the normal coating conditions, and the coating conditions for the edge portion are different from the normal coating conditions (for example, The ink discharge amount is reduced, the ink discharge density is reduced, and the like.
このような塗布条件によって、区分領域D2~D5にインクを塗布すると、形成された有機封止膜27のエッジ部は、インクの表面張力によって盛り上がっても、エッジ部以外の部分と同程度の厚さに形成される。
When ink is applied to the divided regions D2 to D5 under such application conditions, the edge portion of the formed
これに対し、区分領域D2~D5に対する塗布条件を均一に設定した場合、形成された有機封止膜27のエッジ部は、インクの表面張力によって盛り上がるので、エッジ部以外の部分よりも厚く形成される。このエッジ部の盛り上がりによって、有機封止膜27上に形成された第2無機封止膜28にクラックが生じる。このため、そのクラックから水分が進入しやすくなるという不都合が生じる。
On the other hand, when the application conditions for the divided regions D2 to D5 are set to be uniform, the edge portion of the formed
したがって、本実施形態のように、区分領域D2~D5に対する塗布条件を設定することにより、有機封止膜27の区分領域D2~D5におけるエッジ部の盛り上がりを抑えることができる。よって、第2無機封止膜28にクラックが生じる可能性を大幅に低減することができる。その結果、有機封止膜27の信頼性をより向上させることができる。
Therefore, by setting the coating conditions for the divided regions D2 to D5 as in the present embodiment, it is possible to suppress the rise of the edge portion in the divided regions D2 to D5 of the
なお、インク吐出の開始時点および終了時点でも、インクの表面張力による盛り上がりが生じるので、区分領域D1~D9におけるインク吐出の開始箇所および終了箇所についても、上記のような区分領域D2~D5のエッジ部における塗布条件を設定することが好ましい。 In addition, since rising occurs due to the surface tension of the ink even at the start and end of ink discharge, the edges of the division areas D2 to D5 as described above are also generated at the start and end points of the ink discharge in the division areas D1 to D9. It is preferable to set application conditions in the part.
〔実施形態3〕
本発明の実施形態3について図6および図7に基づいて説明すると、以下の通りである。なお、本実施形態において、前述の実施形態1における構成要素と同等の機能を有する構成要素については、同一の符号を付記してその説明を適宜省略する。
Third Embodiment
The third embodiment of the present invention is described below with reference to FIGS. 6 and 7. In the present embodiment, the components having the same functions as the components in the first embodiment described above will be denoted by the same reference numerals, and the description thereof will be appropriately omitted.
図7は、塗布装置101によってインクが塗布される実施形態2に係る区分を示す図である。
FIG. 7 is a view showing sections according to
本実施形態では、実施形態1における塗布領域D0と異なり、図7に示すように、塗布領域D0が区分領域D1~D5,D61,D71,D81,D91に区分されている。塗布領域D0の周囲には、前述の凸体TKが設けられている。 In this embodiment, unlike the application region D0 in the first embodiment, as shown in FIG. 7, the application region D0 is divided into division regions D1 to D5, D61, D71, D81, and D91. The aforementioned convex body TK is provided around the application area D0.
区分領域D61(第1区分領域)は、区分領域D2と区分領域D4とに接する方形の領域であり、区分領域D2および区分領域D4よりも外側に突出している。区分領域D71(第1区分領域)は、区分領域D3と区分領域D4とに接する方形の領域であり、区分領域D3および区分領域D4よりも外側に突出している。区分領域D81(第1区分領域)は、区分領域D2と区分領域D5とに接する方形の領域であり、区分領域D2および区分領域D5よりも外側に突出している。区分領域D91(第1区分領域)は、区分領域D3と区分領域D5とに接する方形の領域であり、区分領域D3および区分領域D5よりも外側に突出している。区分領域D61,D71,D81,D91は、それぞれ塗布領域D0の四隅の部分に当たる。また、区分領域D61,D71,D81,D91は、実施形態1における区分領域D6~D9(図5参照)よりも大きく形成されている。 The divided area D61 (first divided area) is a rectangular area in contact with the divided area D2 and the divided area D4, and protrudes outward beyond the divided area D2 and the divided area D4. The divided area D71 (first divided area) is a rectangular area in contact with the divided area D3 and the divided area D4, and protrudes outward beyond the divided area D3 and the divided area D4. The divided area D81 (first divided area) is a rectangular area in contact with the divided area D2 and the divided area D5, and protrudes outward beyond the divided area D2 and the divided area D5. The divided area D91 (first divided area) is a rectangular area in contact with the divided area D3 and the divided area D5, and protrudes outward beyond the divided area D3 and the divided area D5. The divided areas D61, D71, D81 and D91 respectively correspond to the four corners of the application area D0. Further, the divided regions D61, D71, D81, and D91 are formed larger than the divided regions D6 to D9 (see FIG. 5) in the first embodiment.
区分領域D1~D5,D61,D71,D81,D91に対する塗布条件は、実施形態1と同じく通常に設定される。このような塗布条件で、区分領域D61,D71,D81,D91にインクを塗布すると、形成された有機封止膜27の隅部27aは、図6の(a)および(b)に示すように、実施形態1における有機封止膜27の隅部27aと同じく、広い範囲に形成される。
The coating conditions for the divided areas D1 to D5, D61, D71, D81, and D91 are normally set as in the first embodiment. When ink is applied to the divided regions D61, D71, D81 and D91 under such application conditions, the
〔まとめ〕
本発明の態様1に係る塗布装置は、下層膜上の方形を成す塗布領域に有機材料を含むインクを吐出するヘッド104と、前記ヘッド104によるインクの吐出を制御する吐出制御部108と、を備える。前記吐出制御部108は、前記塗布領域が複数に区分された区分領域ごとに設定された、前記ヘッド104による単位面積当たりのインク塗布量にしたがってインクの吐出を制御する。前記区分領域は、少なくとも前記塗布領域の四隅に設けられている。
[Summary]
The coating apparatus according to aspect 1 of the present invention includes a
上記の構成によれば、区分領域が塗布領域の四隅に設けられているので、当該区分領域の塗布条件を他の区分領域のインク塗布量と異ならせることができる。これにより、塗布領域の四隅に設けられた区分領域のインク塗布量を最適に設定することにより、形成される有機膜の隅部を大きく形成することができる。それゆえ、有機膜の隅部における外端部から下層膜の外端部までの距離を長く確保することができる。したがって、有機膜から下層膜への水分の浸透を抑制することができる。 According to the above configuration, since the divided areas are provided at the four corners of the application area, the application condition of the divided area can be made different from the ink application amount of the other divided areas. Thus, the corner portions of the formed organic film can be formed large by optimally setting the ink application amounts of the divided regions provided at the four corners of the application region. Therefore, a long distance from the outer end of the organic film at the corner to the outer end of the lower layer can be secured. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
本発明の態様2に係る塗布装置は、上記態様1において、前記区分領域は、前記塗布領域の四隅に設けられた第1区分領域と、当該第1区分領域以外の第2区分領域とで構成され、前記第1区分領域への単位面積当たりのインク塗布量が前記第2区分領域よりも多く設定されていてもよい。
In the coating apparatus according to
上記の構成によれば、第1区分領域へ多めのインクが塗布されるので、有機膜の隅部を大きく形成することができる。これにより、有機膜の隅部における外端部から下層膜の外端部までの距離を長く確保することができる。 According to the above configuration, a larger amount of ink is applied to the first divided area, so that the corner of the organic film can be formed larger. Thereby, a long distance from the outer end of the corner of the organic film to the outer end of the lower layer film can be secured.
本発明の態様3に係る塗布装置は、上記態様2において、前記第2区分領域は、前記塗布領域の隣接する2つの隅の前記第1区分領域の間に設けられた第3区分領域を含んでいてもよい。
In the coating device according to aspect 3 of the present invention, in the
上記の構成によれば、上記のような第3区分領域を設けるので、この第3区分領域のインク塗布量をも最適に設定することができる。第3区分領域にインクを塗布することによって形成される有機膜のエッジ部は、インクの表面張力によって盛り上がりやすい。そこで、第3区分領域のインク塗布量を少なめに設定すれば、有機膜のエッジ部の盛り上がりを抑えることができる。 According to the above configuration, since the third divided area as described above is provided, the ink application amount of the third divided area can be set optimally. The edge portion of the organic film formed by applying the ink to the third divided region tends to swell due to the surface tension of the ink. Therefore, if the ink application amount in the third divided region is set to be smaller, it is possible to suppress the rise of the edge portion of the organic film.
本発明の態様4に係る塗布装置は、上記態様3において、前記第1区分領域が前記第3区分領域よりも外側に突出していてもよい。
In the coating apparatus according to
上記の構成によれば、第3区分よりも外側に突出した第1区分領域にインクが塗布されるので、有機膜の隅部を大きく形成することができる。これにより、有機膜の隅部における外端部から下層膜の外端部までの距離を長く確保することができる。 According to the above configuration, since the ink is applied to the first divided area that protrudes outside the third section, the corner of the organic film can be formed large. Thereby, a long distance from the outer end of the corner of the organic film to the outer end of the lower layer film can be secured.
本発明の態様5に係る塗布装置は、上記態様1から4のいずれかにおいて、前記区分領域は、9つ以上設けられていてもよい。 In the coating apparatus according to aspect 5 of the present invention, in any one of the above aspects 1 to 4, nine or more divided areas may be provided.
上記の構成によれば、より細かく区分された区分領域に応じたインク塗布量を設定することができる。 According to the above configuration, the ink application amount can be set in accordance with the more finely divided divided areas.
本発明の態様6に係る塗布装置は、複数のELデバイスに共通する支持材上の方形を成す塗布領域に有機材料を塗布する塗布装置であって、前記ELデバイスごとに設けられた前記塗布領域において、前記有機材料の塗布量を、四隅と、当該四隅以外の領域とで異ならせる。 A coating apparatus according to a sixth aspect of the present invention is a coating apparatus for applying an organic material to a square application area on a support material common to a plurality of EL devices, wherein the application area is provided for each of the EL devices. In the above, the application amount of the organic material is made different between the four corners and the area other than the four corners.
上記の構成によれば、各ELデバイスの塗布領域において、四隅に対する有機材料の塗布量を、四隅以外の領域とで異ならせるので、四隅の塗布量を多くすることで、有機膜の隅部を大きく形成することができる。それゆえ、有機膜の隅部における外端部から有機膜の下層膜の外端部までの距離を長く確保することができる。したがって、有機膜から下層膜への水分の浸透を抑制することができる。 According to the above configuration, in the application region of each EL device, the application amount of the organic material with respect to the four corners is made different from that in the regions other than the four corners. It can be formed large. Therefore, it is possible to secure a long distance from the outer end at the corner of the organic film to the outer end of the lower film of the organic film. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
本発明の態様7に係るELデバイス製造装置は、上記態様1から6のいずれかの塗布装置を備え、前記塗布装置が、ELデバイスの発光素子層を封止する封止層に含まれる前記有機膜を形成する。
An EL device manufacturing apparatus according to
上記の構成によれば、有機膜から発光素子層への水分の浸透を抑制することができる。 According to the above configuration, permeation of moisture from the organic film to the light emitting element layer can be suppressed.
本発明の態様8に係るELデバイス製造装置は、上記態様7において、前記塗布装置が、前記発光素子層が形成されるアクティブ領域を囲むように設けられた前記塗布領域に対して、前記塗布領域の四隅が前記アクティブ領域の四隅にそれぞれ対応するように前記有機材料を塗布することにより、前記発光素子層を封止するように前記有機膜を形成してもよい。
In the EL device manufacturing apparatus according to
本発明の態様9に係るELデバイスは、複数の発光素子を含む発光素子層が形成されるアクティブ領域と、前記発光素子層を封止するように、前記発光素子層上に方形を成して前記アクティブ領域を囲むように塗布領域に有機材料が塗布されることにより形成された有機膜と、を備え、前記有機膜の4つの隅部が前記アクティブ領域の四隅にそれぞれ対応しており、前記有機膜において、前記有機材料の塗布量が、4つの隅部と、当該4つの隅部以外の領域とで異なっている。
In the EL device according to
上記の構成によれば、有機膜において、4つの隅部と、それ以外の領域とで、有機材料の塗布量が異なるので、4つの隅部の塗布量を多くすることで、当該隅部を大きく形成することができる。それゆえ、有機膜の隅部における外端部から有機膜の下層膜の外端部までの距離を長く確保することができる。したがって、有機膜から下層膜への水分の浸透を抑制することができる。 According to the above configuration, in the organic film, the application amount of the organic material is different between the four corners and the other region, so the application amount of the four corners is increased, so that the corners are It can be formed large. Therefore, it is possible to secure a long distance from the outer end at the corner of the organic film to the outer end of the lower film of the organic film. Therefore, the penetration of water from the organic film to the lower layer film can be suppressed.
本発明の態様10に係るELデバイスは、上記態様9において、前記有機膜の4つの隅部は、隣接する2つの隅部の間の辺部よりも外側に膨らんでいてもよい。
In the EL device according to
上記の構成によれば、有機膜の隅部における外端部から有機膜の下層の膜の外端部までの距離を長く確保することができる。これにより、隅部における水分の浸透を防止することができる。 According to the above configuration, it is possible to secure a long distance from the outer end of the corner of the organic film to the outer end of the lower film of the organic film. This can prevent the penetration of water at the corners.
本発明の態様11に係るELデバイスは、上記態様10において、前記有機膜における4つの隅部の膜厚が最も大きく、前記有機膜における前記アクティブ領域上の膜厚が最も小さくてもよい。
In the EL device according to aspect 11 of the present invention, in the
上記の構成によれば、隅部が厚く形成されることにより、隅部における水分の浸透を防止することができる。 According to the above configuration, by making the corner thick, it is possible to prevent the penetration of water at the corner.
本発明の態様12に係るELデバイスは、上記態様9から11のいずれかにおいて、前記アクティブ領域を取り囲むように設けられた凸体をさらに備えていてもよい。
The EL device according to
上記の構成によれば、アクティブ領域のエッジ部分を封止することができる。 According to the above configuration, the edge portion of the active area can be sealed.
本発明の態様13に係るELデバイスは、上記態様9から12のいずれかにおいて、前記有機膜が、前記有機膜より下層の第1無機膜と、前記有機膜より上層の第2無機膜によって挟まれ、前記有機膜の端部が、前記第1無機膜および前記第2無機膜によって覆われていてもよい。
In the EL device according to aspect 13 of the present invention, in any of the
上記の構成によれば、有機膜のエッジ部分を封止することができる。 According to the above configuration, the edge portion of the organic film can be sealed.
〔付記事項〕
本発明は上述した各実施形態に限定されるものではなく、請求項に示した範囲で種々の変更が可能であり、異なる実施形態にそれぞれ開示された技術的手段を適宜組み合わせて得られる実施形態についても本発明の技術的範囲に含まれる。さらに、各実施形態にそれぞれ開示された技術的手段を組み合わせることにより、新しい技術的特徴を形成することができる。
[Items to be added]
The present invention is not limited to the above-described embodiments, and various modifications can be made within the scope of the claims, and embodiments obtained by appropriately combining the technical means disclosed in the different embodiments. Is also included in the technical scope of the present invention. Furthermore, new technical features can be formed by combining the technical means disclosed in each embodiment.
2 ELデバイス
5 発光素子層
6 封止層
10 基材(支持材)
22 第1電極(発光素子)
23 有機絶縁膜(バンク)
24 EL層(発光素子)
25 第2電極(発光素子)
26 第1無機封止膜(下層膜,第1無機膜)
27 有機封止膜(有機膜)
28 第2無機封止膜(第2無機膜)
50 ガラス基板(支持材)
100 ELデバイス製造装置
101 塗布装置
104 ヘッド
108 吐出制御部
D0 塗布領域
D1 区分領域(第2区分領域)
D2~D5 区分領域(第2区分領域,第3区分領域)
D6~D9 区分領域(第1区分領域)
D61,D71,D81,D91 区分領域(第1区分領域)
DA アクティブ領域
TK 凸体
2 EL Device 5 Light Emitting
22 1st electrode (light emitting element)
23 Organic insulating film (bank)
24 EL layer (light emitting element)
25 Second electrode (light emitting element)
26 First inorganic sealing film (lower layer film, first inorganic film)
27 Organic sealing film (organic film)
28 Second inorganic sealing film (second inorganic film)
50 Glass substrate (support material)
DESCRIPTION OF
D2 to D5 divisional area (second divisional area, third divisional area)
D6 to D9 Sectioned Area (First Sectioned Area)
D61, D71, D81, D91 Sectioned area (first sectioned area)
DA Active area TK convex body
Claims (13)
前記ヘッドによるインクの吐出を制御する吐出制御部と、を備え、
前記吐出制御部は、前記塗布領域が複数に区分された区分領域ごとに設定された、前記ヘッドによる単位面積当たりのインク塗布量にしたがってインクの吐出を制御し、
前記区分領域は、少なくとも前記塗布領域の四隅に設けられていることを特徴とする塗布装置。 A head for ejecting an ink containing an organic material to a square application area on the lower layer film;
And a discharge control unit configured to control the discharge of the ink by the head.
The discharge control unit controls the discharge of the ink according to the ink application amount per unit area by the head, which is set for each of the divided areas into which the application area is divided into a plurality of areas.
The coating apparatus is characterized in that the divided areas are provided at least at four corners of the application area.
前記第1区分領域への単位面積当たりのインク塗布量が前記第2区分領域よりも多く設定されていることを特徴とする請求項1に記載の塗布装置。 The divided area is composed of a first divided area provided at four corners of the application area, and a second divided area other than the first divided area.
The coating device according to claim 1, wherein the ink application amount per unit area to the first divided area is set larger than that of the second divided area.
前記ELデバイスごとに設けられた前記塗布領域において、前記有機材料の塗布量を、四隅と、当該四隅以外の領域とで異ならせることを特徴とする塗布装置。 An application apparatus for applying an organic material to a square application area on a support common to a plurality of EL devices, comprising:
An application device, wherein the application amount of the organic material is made different between the four corners and the regions other than the four corners in the application region provided for each of the EL devices.
前記塗布装置は、ELデバイスの発光素子層を封止する封止層に含まれる有機膜を形成することを特徴とするELデバイス製造装置。 A coating apparatus according to any one of claims 1 to 6, comprising:
The said coating apparatus forms the organic film contained in the sealing layer which seals the light emitting element layer of EL device, The EL device manufacturing apparatus characterized by the above-mentioned.
前記発光素子層を封止するように、前記発光素子層上に方形を成して前記アクティブ領域を囲むように塗布領域に有機材料が塗布されることにより形成された有機膜と、を備え、
前記有機膜の4つの隅部が前記アクティブ領域の四隅にそれぞれ対応しており、
前記有機膜において、前記有機材料の塗布量が、4つの隅部と、当該4つの隅部以外の領域とで異なっていることを特徴とするELデバイス。 An active region in which a light emitting element layer including a plurality of light emitting elements is formed;
And an organic film formed by applying an organic material to a coating region so as to form a square on the light emitting device layer and to surround the active region so as to seal the light emitting device layer.
Four corners of the organic film correspond to four corners of the active region, respectively.
In the organic film, an application amount of the organic material is different between four corners and an area other than the four corners.
前記有機膜の端部は、前記第1無機膜および前記第2無機膜によって覆われていることを特徴とする請求項9から12のいずれか1項に記載のELデバイス。 The organic film is sandwiched between a first inorganic film lower than the organic film and a second inorganic film higher than the organic film.
The EL device according to any one of claims 9 to 12, wherein an end of the organic film is covered with the first inorganic film and the second inorganic film.
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