WO2018216571A1 - 透明樹脂組成物、透明被膜および透明樹脂被覆ガラス基板 - Google Patents
透明樹脂組成物、透明被膜および透明樹脂被覆ガラス基板 Download PDFInfo
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- WO2018216571A1 WO2018216571A1 PCT/JP2018/018949 JP2018018949W WO2018216571A1 WO 2018216571 A1 WO2018216571 A1 WO 2018216571A1 JP 2018018949 W JP2018018949 W JP 2018018949W WO 2018216571 A1 WO2018216571 A1 WO 2018216571A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3405—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of organic materials
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
- C08L43/04—Homopolymers or copolymers of monomers containing silicon
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/45—Anti-settling agents
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/445—Organic continuous phases
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/11—Deposition methods from solutions or suspensions
- C03C2218/119—Deposition methods from solutions or suspensions by printing
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
Definitions
- the present invention relates to a transparent resin composition containing a siloxane resin, an organic solvent and a surfactant, a transparent film using the same, and a transparent resin-coated glass substrate.
- various display terminals such as wearable terminals, smartphones, and tablet PCs (personal computers) have a decorative film formed on the front surface of a display panel such as a liquid crystal display device or an organic EL (electroluminescence) display device by using colored ink for printing. It has a configuration in which the formed cover glass is laminated.
- a cover glass having a transparent electrode on the glass and provided with a touch sensor function is also applied.
- the cover glass is easily damaged when the display terminal is dropped due to insufficient strength of the glass of the cover glass itself or a decrease in glass strength due to an inorganic film such as a transparent electrode on the glass. There was a problem.
- a cover glass-integrated touch panel is proposed in which a conductive glass and a sensor are directly formed on the cover glass, and one glass has both functions of the cover glass and the touch sensor.
- a light shielding layer is generally formed on glass, and a wiring such as a conductive film or ITO is generally formed on the light shielding layer.
- a method for manufacturing a cover glass integrated touch panel for example, a step of forming a decorative portion on a cover glass substrate by a screen printing method, a step of polishing the decorative portion on the cover glass substrate, and over the cover glass substrate
- a method for manufacturing a decorative cover glass-integrated touch panel which includes a step of applying a coat layer, a step of forming a touch panel sensor on the overcoat layer, and a step of cutting a cover glass substrate for each touch panel sensor. (See, for example, Patent Document 1).
- a manufacturing method has a problem that the strength of the glass is insufficient.
- a sensor-integrated cover glass including a glass plate, a transparent conductive film, and a base insulating film made of a transparent organic compound
- translucent chemistry A protective plate substrate for a display device (for example, see Patent Document 3) having a tempered glass substrate and a resin layer, a front plate of an image display device having a tempered glass, a transparent conductive film, and a cured film ( For example, Patent Document 4) has been proposed.
- Examples of the method for forming the resin layer include coating methods such as inkjet coating and spray coating.
- a resin composition suitable for inkjet coating for example, an inkjet coating liquid containing an oxazoline group-containing resin, an alkanediol having 7 or more carbon atoms, a surfactant, and water (see, for example, Patent Document 5)
- Ink jet inks containing a hydroxy group-containing carboxylic acid ester having 6 or less carbon atoms, a surfactant, and water have been proposed.
- composition capable of satisfactorily coating a coating material a main chain having a polymer structure of a polymerizable monomer, a side chain having a fluorinated alkyl group or a poly (perfluoroalkylene ether) chain, a specific chain
- a resist composition containing a fluorine-containing thermally decomposable resin having a side chain having a functional group has been proposed (see, for example, Patent Document 7).
- JP 2012-155644 A International Publication No. 2014/30599 JP 2014-228615 A Japanese Unexamined Patent Publication No. 2016-124720 JP 2013-28130 A JP 2013-87207 A JP 2016-17172 A
- the resist composition described in Patent Document 7 forms a transparent resin film on glass for the purpose of improving glass strength, and then applies a colored ink on the transparent resin film to improve the design.
- a transparent inorganic film as the optical adjustment layer, there is a problem that peeling occurs at the interface between the layers due to a difference in thermal expansion coefficient.
- the present invention was devised in view of the problems of the prior art, and even when applied by spray coating or ink jet coating, it suppresses repellency and unevenness, has a good appearance, and has good adhesion to an inorganic film or an organic film.
- An object is to provide a transparent resin composition capable of forming an excellent transparent film.
- the present inventors have used the siloxane resin as the matrix resin of the transparent resin composition, and combined the use of a plurality of specific surfactants to solve the problems of the present invention. I found it possible to solve it.
- the object of the present invention is achieved by the following configuration.
- the present invention even when applied by spraying or ink jetting, it is possible to suppress repelling and unevenness and form a transparent film having a good appearance. Furthermore, by using the transparent resin composition of the present invention, it is possible to obtain a transparent film having excellent adhesion with an inorganic film or an organic film.
- the transparent resin composition of the present invention contains at least (A) a siloxane resin, (B) an organic solvent and two or more (C) surfactants, and (C1) a silicon-modified acrylic surfactant as a surfactant. And (C2) a fluorine-containing thermally decomposable surfactant, wherein the total content of the surfactants (C1) and (C2) is from 50 ppm to 500 ppm in the transparent resin composition.
- A) Siloxane resin has the effect
- the organic solvent has the effect
- the transparent resin composition in this invention points out that the transmittance
- (C1) The silicon-modified acrylic surfactant can reduce the surface tension while suppressing an increase in the contact angle of the transparent resin composition on the glass substrate. For this reason, (C1) by containing a silicon-modified acrylic surfactant, even when the transparent resin composition is applied on the glass substrate by spraying or ink jetting, the discharged droplets spread on the glass substrate. Application defects such as repellency can be suppressed. However, in a resin composition containing a siloxane resin, the effect of reducing the surface tension by the silicon-modified acrylic surfactant is low, and there is a problem that unevenness such as Benard cell is likely to occur when the coating film is dried.
- the silicon-based surfactant and the fluorine-based surfactant have an effect of reducing the surface tension of the transparent resin composition, and can suppress unevenness when the coating film is dried.
- the contact angle of the transparent resin composition on the glass substrate is increased, there is a problem that when the transparent resin composition is applied on the substrate by spraying or ink jetting, repelling is likely to occur.
- the surface free energy of the formed transparent coating is reduced when it contains a silicon-based surfactant or a fluorine-based surfactant, so the adhesion is reduced when an organic or inorganic film is laminated on the transparent coating. It's easy to do.
- a surfactant that can suppress poor coating properties when a transparent resin composition is coated on a glass substrate by spray coating or inkjet coating and poor drying at the time of drying the coating film, and maintains the adhesion of the transparent coating.
- C1 a silicon-modified acrylic surfactant
- C2 a fluorine-containing thermally decomposable surfactant. That is, by containing (C1) a silicone-modified acrylic surfactant, poor coating properties such as repelling are suppressed, and (C2) contact on a glass substrate by containing a fluorine-containing thermally decomposable surfactant.
- the surface tension can be reduced while suppressing an increase in corners, unevenness during drying of the coating film can be achieved, and (C2) the fluorine-containing thermally decomposable surfactant is thermally decomposed when the transparent resin composition is thermally cured. It has been found that the adhesion of the transparent film with an inorganic film or an organic film is improved.
- Examples of the silicon-modified acrylic surfactant include compounds having a structure represented by the following general formula (1).
- R 1 to R 3 each independently represents a hydrogen atom or a methyl group.
- a represents an integer of 1 to 18
- p represents an integer of 0 to 50
- q represents an integer of 1 to 8.
- a is preferably an integer of 2 to 18.
- the p repeating units and the q repeating units may be block or random.
- (C1) As the silicon-modified acrylic surfactant, a commercially available one may be used. Examples of the compound having the structure represented by the general formula (1) include “BYK” -3550, “BYK”. "-SILXLEAN3700 (all manufactured by Big Chemie). Two or more of these may be contained.
- the fluorine-containing thermally decomposable surfactant refers to a fluorine-containing surfactant having thermal decomposability.
- thermal decomposability refers to thermal decomposition by exposure to any environment of 150 to 300 ° C. for 30 minutes.
- a fluorine-containing thermally decomposable surfactant having a carboxyl group (C2) exposure to an environment of 150 to 300 ° C. for 30 minutes results in elimination of the structure in which the carboxyl group is blocked and generation of a carboxyl group.
- Examples of (C2) fluorine-containing thermally decomposable surfactant include a main chain having a polymer structure of a polymerizable monomer, and a side chain having a fluorinated alkyl group and / or a poly (perfluoroalkylene ether) chain. And a side chain having a group having a structure represented by the following general formula (2).
- R 4 , R 5 and R 6 each independently represent a hydrogen atom or a monovalent organic group having 1 to 18 carbon atoms.
- R 7 represents a monovalent organic group having 1 to 18 carbon atoms. However, R 6 and R 7 may be bonded to each other to form a heterocycle having Y 1 as a hetero atom. Y 1 represents an oxygen atom or a sulfur atom.
- the monovalent organic group having 1 to 18 carbon atoms is preferably an alkyl group or a cycloalkyl group.
- R 4 , R 5 and R 6 are preferably hydrogen atoms, and R 7 is preferably an alkyl group having 1 to 18 carbon atoms or a cycloalkyl group having 1 to 18 carbon atoms.
- (C2) As a polymerizable monomer constituting the main chain of the fluorine-containing thermally decomposable surfactant, a polymerizable monomer represented by the following general formula (3), a polymerizable monomer having a carboxyl group Etc. Rf in the following general formula (3) constitutes a side chain having the aforementioned fluorinated alkyl group and / or poly (perfluoroalkylene ether) chain in the (C2) fluorine-containing thermally decomposable surfactant.
- a polymerizable monomer represented by the following general formula (3) a polymerizable monomer having a carboxyl group Etc.
- Rf in the following general formula (3) constitutes a side chain having the aforementioned fluorinated alkyl group and / or poly (perfluoroalkylene ether) chain in the (C2) fluorine-containing thermally decomposable surfactant.
- R 0 represents a hydrogen atom or a methyl group
- L represents a polyether, polyurethane or polyol having 1 to 18 carbon atoms
- Rf represents a fluorinated alkyl group having 1 to 18 carbon atoms.
- it represents a poly (perfluoroalkylene ether) chain having 1 to 18 carbon atoms.
- Rf is preferably a fluorinated alkyl group having 1 to 6 carbon atoms to which fluorine atoms are directly bonded.
- C2 As the fluorine-containing thermally decomposable surfactant, commercially available ones may be used, and a main chain having a polymer structure of a polymerizable monomer, a fluorinated alkyl group and / or a poly (par For example, “DS-21” (manufactured by DIC Corporation) and the like having a side chain having a fluoroalkylene chain) and a side chain having a group having the structure represented by the general formula (2) Can be mentioned.
- Fluorine-containing thermally decomposable surfactant for example, polymerizes a polymerizable monomer having a fluorinated alkyl group and / or a poly (perfluoroalkylene ether) chain and a polymerizable monomer having a carboxyl group
- the polymer obtained by heating can be obtained by heating a vinyl ether compound to about 20 to 100 ° C. in the presence of an acid catalyst to block the carboxyl group.
- the method described in JP-A-2016-17172 can be mentioned.
- the total content of (C1) silicon-modified acrylic surfactant and (C2) fluorine-containing thermally decomposable surfactant in the transparent resin composition of the present invention is 50 ppm to 500 ppm in the transparent resin composition. If the total content thereof is less than 50 ppm, the surface tension of the transparent resin composition increases, so that unevenness such as Benard cell tends to occur when the coating film is dried. On the other hand, when the total content of these exceeds 500 ppm, the surface tension of the coating liquid is excessively lowered, resulting in uneven drying and thinning of the transparent film at the edge of the glass substrate.
- Their total content is preferably 400 ppm or less.
- the content of the (C1) silicon-modified acrylic surfactant in the colored resin composition of the present invention is preferably 25 ppm or more and 300 ppm or less in the transparent resin composition, and the contact angle can be easily adjusted to a preferred range described later. .
- the content of the silicon-modified acrylic surfactant is more preferably 25 ppm or more and 150 ppm or less.
- the content of the (C2) fluorine-containing thermally decomposable surfactant in the colored resin composition of the present invention is preferably 25 ppm or more and 300 ppm or less in the transparent resin composition, and the surface tension can be easily adjusted to a preferred range described later. it can.
- the content of the fluorine-containing thermally decomposable surfactant is more preferably 25 ppm or more and 150 ppm or less.
- the content ratio (C2) / (C1) of the (C2) fluorine-containing thermally decomposable surfactant to the content of the (C1) silicon-modified acrylic surfactant is from the viewpoint of further suppressing unevenness at the time of drying the coating film. 0.25 or more is preferable, and 0.50 or more is more preferable. On the other hand, (C2) / (C1) is preferably 4.0 or less, more preferably 2.0 or less, from the viewpoint of further suppressing unevenness at the edge of the glass substrate.
- a siloxane resin refers to a polymer having a repeating unit having a siloxane skeleton. Hydrolysis condensates of organosilane compounds having a structure represented by the following general formula (4) are preferred.
- X 1 represents a hydrogen atom, a fluorine atom, a monovalent organic group having 1 to 20 carbon atoms, or a B atom, N atom, Al atom, P atom, Si atom, Ge atom or A group containing a Ti atom is represented.
- X 2 represents a hydrolyzable group.
- n represents an integer of 0 to 2, and when n is 2, each X 1 may be the same or different, and when n is 0 to 2, each X 2 may be the same or different.
- Examples of the hydrolyzable group X 2 include an alkoxy group, a halogen group, an acetoxy group, an isocyanate group, and a hydroxyl group. Among these, an alkoxy group is preferable from the viewpoint of liquid stability and coatability of the transparent resin composition.
- the siloxane resin preferably has a radical polymerizable group, and more preferably has a radical polymerizable group, a carboxyl group and / or a dicarboxylic anhydride group.
- the radical polymerizable group By having the radical polymerizable group, the glass substrate can be further strengthened, and the transparent film can be easily patterned by photosensitivity. Furthermore, by having a carboxyl group and / or a dicarboxylic anhydride group, the solubility during pattern processing of the transparent film is improved, so that a finer pattern can be processed.
- siloxane resin which has a radically polymerizable group and a carboxyl group can be obtained by using the organosilane compound which has these groups as an organosilane compound to hydrolyze and condense.
- radical polymerizable group examples include a vinyl group, an ⁇ -methylvinyl group, an allyl group, a styryl group, and a (meth) acryloyl group. From the viewpoint of further improving the hardness of the transparent film and the sensitivity during pattern processing, a (meth) acryloyl group is preferred.
- siloxane resin having an alkali-soluble group by containing a photoacid generator as a photosensitizer, the alkali solubility in the exposed area can be relatively increased and positive photosensitivity can be imparted. .
- organosilane compound having a radical polymerizable group examples include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (methoxyethoxy) silane, vinylmethyldimethoxysilane, vinylmethyldiethoxysilane, vinylmethyldi (methoxyethoxy) silane, and allyl.
- ⁇ -acryloylpropyltrimethoxysilane, ⁇ -acryloylpropyltriethoxysilane, ⁇ -methacryloylpropyltrimethoxysilane, ⁇ -methacryloylpropyltri Ethoxysilane is preferred.
- organosilane compound having a carboxyl group examples include a urea group-containing organosilane compound represented by the following general formula (5), a urethane group-containing organosilane compound represented by the following general formula (6), and a general formula (10
- the organosilane compound etc. which are represented by this. Two or more of these may be used.
- R 8 , R 10 and R 14 represent a divalent organic group having 1 to 20 carbon atoms.
- R 9 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
- R 11 to R 13 each represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a phenoxy group, an alkylcarbonyloxy group having 2 to 6 carbon atoms, or a substituted product thereof. However, at least one of R 11 to R 13 is an alkoxy group, a phenoxy group or an acetoxy group.
- R 8 and R 14 in the general formulas (5) to (6) include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, a phenylene group, —CH 2 —C 6 H 4 —.
- hydrocarbon groups such as CH 2 — and —CH 2 —C 6 H 4 —.
- a hydrocarbon group having an aromatic ring such as a phenylene group, —CH 2 —C 6 H 4 —CH 2 —, —CH 2 —C 6 H 4 — or the like is preferable from the viewpoint of heat resistance.
- R 9 in the general formula (6) is preferably hydrogen or a methyl group from the viewpoint of reactivity.
- R 10 in the general formulas (5) to (6) is, for example, a hydrocarbon group such as a methylene group, an ethylene group, an n-propylene group, an n-butylene group or an n-pentylene group, an oxymethylene group, an oxy Examples include an ethylene group, an oxy n-propylene group, an oxy n-butylene group, and an oxy n-pentylene group.
- methylene group, ethylene group, n-propylene group, n-butylene group, oxymethylene group, oxyethylene group, oxy n-propylene group, and oxy n-butylene group are preferable from the viewpoint of easy synthesis.
- alkyl group examples include a methyl group, an ethyl group, an n-propyl group, and an isopropyl group. From the viewpoint of ease of synthesis, a methyl group or an ethyl group is preferable.
- Specific examples of the alkoxy group include methoxy group, ethoxy group, n-propoxy group, isopropoxy group and the like. From the viewpoint of ease of synthesis, a methoxy group or an ethoxy group is preferable.
- substituent of the substituent examples include a methoxy group and an ethoxy group. Specific examples include a 1-methoxypropyl group and a methoxyethoxy group.
- the urea group-containing organosilane compound represented by the general formula (5) includes an aminocarboxylic acid compound represented by the following general formula (7) and an isocyanate group-containing organosilane compound represented by the following general formula (9). From the above, it can be obtained by a known urea reaction.
- the urethane group-containing organosilane compound represented by the general formula (6) has a hydroxycarboxylic acid compound represented by the following general formula (8) and an isocyanate group represented by the following general formula (9). It can be obtained from an organosilane compound by a known urethanization reaction.
- R 8 , R 10 and R 14 represent a divalent organic group having 1 to 20 carbon atoms.
- R 9 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms.
- R 11 to R 13 each represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a phenoxy group, an alkylcarbonyloxy group having 2 to 6 carbon atoms, or a substituted product thereof.
- at least one of R 7 to R 9 is an alkoxy group, a phenoxy group or an acetoxy group.
- Preferred examples of R 8 - R 14 may, for R 8 - R 14 is as described above in the general formula (5) to (6).
- R 15 represents an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a phenoxy group, an alkylcarbonyloxy group having 2 to 6 carbon atoms, or a substitution thereof.
- the plurality of R 15 may be the same or different, and at least one is an alkoxy group, a phenoxy group or an acetoxy group.
- l represents an integer of 1 to 3.
- m represents an integer of 2 to 20.
- organosilane compound having a dicarboxylic acid anhydride group examples include organosilane compounds represented by any one of the following general formulas (11) to (13). Two or more of these may be used.
- R 16 to R 18 , R 20 to R 22 and R 24 to R 26 are each an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, a phenyl group, a phenoxy group, or 2 carbon atoms.
- R 19 , R 23 and R 27 have a single bond, a chain aliphatic hydrocarbon group, a cyclic aliphatic hydrocarbon group, a carbonyl group, an ether group, an ester group, an amide group, an aromatic group, or any one of these.
- h and k each represents an integer of 0 to 3.
- R 19 , R 23 and R 27 include —C 2 H 4 —, —C 3 H 6 —, —C 4 H 8 —, —O—, —C 3 H 6 OCH 2 CH (OH). Examples thereof include CH 2 O 2 C—, —CO—, —CO 2 —, —CONH—, and the following organic groups.
- organosilane compound represented by the general formula (11) include 3-trimethoxysilylpropyl succinic anhydride, 3-triethoxysilylsilylpropyl succinic anhydride, 3-triphenoxysilylpropyl succinic acid. An anhydride etc. are mentioned.
- Specific examples of the organosilane compound represented by the general formula (12) include 3-trimethoxysilylsilylpropylcyclohexyl dicarboxylic acid anhydride.
- organosilane compound represented by the general formula (13) include 3-trimethoxysilylsilylpropylphthalic anhydride.
- the siloxane resin may be a hydrolysis-condensation product of the above-mentioned radical polymerizable group or an organosilane having a carboxyl group and another organosilane.
- organosilane compounds include methyltrimethoxysilane, methyltriethoxysilane, methyltri (methoxyethoxy) silane, methyltripropoxysilane, methyltriisopropoxysilane, methyltributoxysilane, ethyltrimethoxysilane, ethyltrimethoxysilane.
- trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyltriethoxysilane, and the like can be given. Two or more of these may be used.
- the siloxane resin can be obtained by hydrolytic condensation of an organosilane compound.
- the obtained silanol compound can be obtained by subjecting the resulting silanol compound to a condensation reaction in the presence of (B) an organic solvent or without a solvent.
- Various conditions for the hydrolysis reaction can be appropriately set in consideration of the reaction scale, the size and shape of the reaction vessel, and the like. For example, it is preferable to add an acid catalyst and water to the organosilane compound in a solvent over 1 to 180 minutes and then react at room temperature to 110 ° C. for 1 to 180 minutes. By performing the hydrolysis reaction under such conditions, a rapid reaction can be suppressed.
- the reaction temperature is more preferably 30 to 105 ° C.
- the hydrolysis reaction is preferably performed in the presence of an acid catalyst.
- an acid catalyst an acidic aqueous solution containing formic acid, acetic acid and phosphoric acid is preferable.
- the addition amount of the acid catalyst is preferably 0.1 to 5 parts by weight with respect to 100 parts by weight of all organosilane compounds used in the hydrolysis reaction. By setting the amount of the acid catalyst within the above range, the hydrolysis reaction can be more efficiently advanced.
- the condensation reaction After obtaining the silanol compound by the hydrolysis reaction of the organosilane compound, it is preferable to carry out the condensation reaction by heating the reaction solution as it is at 50 ° C. or higher and below the boiling point of the solvent for 1 to 100 hours. Moreover, in order to raise the polymerization degree of polysiloxane, you may perform reheating or a base catalyst addition.
- Examples of the organic solvent used for the hydrolysis reaction of the organosilane compound and the condensation reaction of the silanol compound include methanol, ethanol, propanol, isopropanol, butanol, isobutanol, t-butanol, pentanol, and 4-methyl-2-pen.
- Alcohols such as butanol, 3-methyl-2-butanol, 3-methyl-3-methoxy-1-butanol, 1-t-butoxy-2-propanol, diacetone alcohol; glycols such as ethylene glycol and propylene glycol; Ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monopropyl ether, propylene Ethers such as recall monobutyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethyl ether; methyl ethyl ketone, acetylacetone, methylpropyl ketone, methylbutylketone, methylisobutylketone, diisobutylketone, cyclopentanone, 2- Ketones such as heptanone; Amides such as
- Diacetone alcohol propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol mono t-butyl ether, propylene glycol monopropyl ether, propylene glycol Monobutyl ether, ⁇ -butyrolactone and the like are preferably used.
- a solvent When a solvent is generated by a hydrolysis reaction, it can be hydrolyzed without solvent. It is also preferable to adjust the concentration of the resin composition to an appropriate level by adding a solvent after completion of the reaction. Further, after hydrolysis according to the purpose, an appropriate amount of the produced alcohol may be distilled and removed under heating and / or reduced pressure, and then a suitable solvent may be added.
- the amount of the solvent used in the hydrolysis reaction is preferably 80 parts by weight or more and 500 parts by weight or less with respect to 100 parts by weight of the total organosilane compound. By setting the amount of the solvent within the above range, the hydrolysis reaction can be more efficiently advanced.
- the water used for the hydrolysis reaction is preferably ion-exchanged water.
- the amount of water is preferably 1.0 to 4.0 moles per mole of silane atoms.
- Examples of the organic solvent include aliphatic hydrocarbons, carboxylic acid esters, ketones, ethers, alcohols, and the like. Two or more of these may be contained. From the viewpoint of uniformly dissolving each component and improving the transparency of the resulting coating film, a compound having an alcoholic hydroxyl group and a cyclic compound having a carbonyl group are preferred.
- Examples of the compound having an alcoholic hydroxyl group include acetol, 3-hydroxy-3-methyl-2-butanone, 4-hydroxy-3-methyl-2-butanone, 5-hydroxy-2-pentanone, and 4-hydroxy-4.
- -Methyl-2-pentanone diacetone alcohol
- ethyl lactate butyl lactate
- propylene glycol monomethyl ether propylene glycol monoethyl ether
- propylene glycol mono n-propyl ether propylene glycol mono n-butyl ether
- propylene glycol mono t-butyl ether propylene glycol mono t-butyl ether
- 3-methoxy-1-butanol 3-methyl-3-methoxy-1-butanol and the like.
- diacetone alcohol and 3-methyl-3-methoxy-1-butanol are preferable from the viewpoint of storage stability.
- cyclic compound having a carbonyl group examples include ⁇ -butyrolactone, ⁇ -valerolactone, ⁇ -valerolactone, propylene carbonate, N-methylpyrrolidone, cyclohexanone, cycloheptanone and the like.
- ⁇ -butyrolactone is particularly preferably used.
- Examples of the aliphatic hydrocarbon include xylene, ethylbenzene, and solvent naphtha.
- carboxylic acid ester examples include benzyl acetate, ethyl benzoate, ⁇ -butyrolactone, methyl benzoate, diethyl malonate, 2-ethylhexyl acetate, 2-butoxyethyl acetate, 3-methoxy-3-methyl-butyl acetate, diethyl oxalate , Ethyl acetoacetate, cyclohexyl acetate, 3-methoxy-butyl acetate, methyl acetoacetate, ethyl-3-ethoxypropionate, 2-ethylbutylacetate, isopentylpropionate, propylene glycol monomethyl ether propionate, propylene glycol Examples include monoethyl ether acetate, ethyl acetate, butyl acetate, isopentyl acetate, pentyl acetate, and propylene glycol monomethyl ether acetate. .
- ketones examples include cyclopentanone and cyclohexanone.
- ethers include aliphatic ethers such as propylene glycol derivatives such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol tertiary butyl ether, and dipropylene glycol monomethyl ether.
- propylene glycol derivatives such as propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol tertiary butyl ether, and dipropylene glycol monomethyl ether.
- An organic solvent having a boiling point of 150 ° C. or more and 250 ° C. or less under atmospheric pressure from the viewpoint of appropriately adjusting the volatility and drying characteristics when applied to a glass substrate by spray coating or inkjet coating, and further improving the coating properties; It is preferable to contain an organic solvent having a boiling point of less than 150 ° C. under atmospheric pressure. From the viewpoint of suppressing solidification of the (A) siloxane resin due to drying of the coating liquid in the nozzle, (B) an organic solvent having a boiling point of 150 ° C. or more and 250 ° C. or less under atmospheric pressure with respect to 100 parts by mass of the organic solvent. It is preferable to contain 10 parts by mass or more of the solvent.
- the boiling point under atmospheric pressure is 150 ° C. or more and 250 ° C. or less with respect to 100 parts by mass of the total organic solvent (B).
- the organic solvent is preferably contained in an amount of 75 parts by mass or less.
- the boiling point of the organic solvent having a boiling point of 150 ° C. or higher and 250 ° C. or lower under atmospheric pressure is more preferably 150 ° C. or higher and 200 ° C. or lower.
- Examples of the organic solvent having a boiling point of 150 ° C. to 250 ° C. under atmospheric pressure include, for example, 4-hydroxy-4-methyl-2-pentanone (diacetone alcohol), ethyl lactate, butyl lactate, propylene glycol mono t-butyl ether, 3-methoxy-1-butanol, 3-methyl-3-methoxy-1-butanol, benzyl acetate, ethyl benzoate, methyl benzoate, diethyl malonate, 2-ethylhexyl acetate, 2-butoxyethyl acetate, 3-methoxy-3- Methyl-butyl acetate, diethyl oxalate, ethyl acetoacetate, cyclohexyl acetate, 3-methoxy-butyl acetate, methyl acetoacetate, ethyl-3-ethoxypropionate, isopentylpropionate, propylene glyco
- cycloheptanone and the like.
- 4-hydroxy-4-methyl-2-pentanone diacetone alcohol
- 3-methyl-3-methoxy-1-butanol 3-methoxy-3-methyl-butyl acetate
- 3-methoxy-butyl acetate ⁇ -butyrolactone is particularly preferably used.
- organic solvents having a boiling point of less than 150 ° C. under atmospheric pressure include, for example, methyl acetate, ethyl acetate, isopropyl acetate, n-propyl acetate, butyl acetate, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether Propylene glycol monoethyl ether, ethylene glycol ethyl ether, ethylene glycol methyl ether, butanol, isobutanol, n-propyl alcohol, ethyl acetate and the like.
- propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether are particularly preferably used.
- the transparent resin composition of the present invention preferably has photosensitivity, and by reducing the stress of the transparent film by curing the coating film by photocuring in addition to heat curing, the adhesiveness with the glass substrate is further improved. be able to.
- reactive monomers examples include monofunctional or polyfunctional acrylic monomers and acrylic oligomers. Two or more of these may be contained. Among these, polyfunctional (meth) acrylate is preferable.
- polyfunctional (meth) acrylate examples include 2,2- [9H-fluorene-9,9-diylbis (1,4-phenylene) bisoxy] diethanol di (meth) acrylate (hereinafter “MM-1”), Ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, dimethyloltricyclodecane di (meth) acrylate, ethoxylated bisphenol A di (meth) acrylate, glycerin di (meth) Acrylate, tripropylene glycol di (meth) acrylate, 1,3-butanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol
- MM-1 2,2- [9H-fluorene-9,
- the content of the reactive monomer in the transparent resin composition of the present invention is preferably 10 to 90 parts by mass with respect to 100 parts by mass of the total content of (A) siloxane resin and reactive monomer.
- photo radical polymerization initiator examples include alkylphenone photo radical polymerization initiators, acyl phosphine oxide photo radical polymerization initiators, oxime ester photo radical polymerization initiators, benzophenone photo radical polymerization initiators, and oxanthone photo radicals.
- examples include radical photopolymerization initiators, phosphorus radical photopolymerization initiators, and inorganic radical photopolymerization initiators such as titanate. Two or more of these may be contained.
- alkylphenone photoradical polymerization initiator examples include an ⁇ -aminoalkylphenone photoradical polymerization initiator and an ⁇ -hydroxyalkylphenone photoradical polymerization initiator.
- ⁇ -aminoalkylphenone photoradical polymerization initiator examples include acylphosphine oxide photoradical polymerization initiator, oxime ester photoradical polymerization initiator, benzophenone having an amino group
- a radical photopolymerization initiator and an benzoate radical photopolymerization initiator having an amino group are preferred.
- Examples of ⁇ -aminoalkylphenone photoradical polymerization initiators include 2-methyl- [4- (methylthio) phenyl] -2-morpholinopropan-1-one, 2-dimethylamino-2- (4-methyl). Benzyl) -1- (4-morpholin-4-yl-phenyl) -butan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1, and the like. .
- acylphosphine oxide photo radical polymerization initiator examples include 2,4,6-trimethylbenzoylphenylphosphine oxide, bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide, and bis (2,6-dimethoxy). Benzoyl)-(2,4,4-trimethylpentyl) -phosphine oxide and the like.
- Examples of the oxime ester photo radical polymerization initiator include 1-phenyl-1,2-propanedione-2- (o-ethoxycarbonyl) oxime, 1,2-octanedione, 1- [4- (phenylthio)- 2- (O-benzoyloxime)], 1-phenyl-1,2-butadion-2- (o-methoxycarbonyl) oxime, 1,3-diphenylpropanetrione-2- (o-ethoxycarbonyl) oxime, ethanone, And 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime).
- benzophenone photoradical polymerization initiator having an amino group examples include 4,4-bis (dimethylamino) benzophenone and 4,4-bis (diethylamino) benzophenone.
- benzoic acid ester radical polymerization initiator having an amino group examples include ethyl p-dimethylaminobenzoate, 2-ethylhexyl-p-dimethylaminobenzoate, ethyl p-diethylaminobenzoate and the like.
- the content of the photo radical polymerization initiator in the transparent resin composition of the present invention is preferably 0.01% by weight or more, preferably 0.1% by weight or more in the solid content of the siloxane resin composition, from the viewpoint of sufficiently promoting radical curing. Is more preferable.
- the content of the radical photopolymerization initiator is preferably 20% by weight or less, and more preferably 10% by weight or less.
- a photoacid generator as a photosensitizer.
- a photoacid generator By imparting positive photosensitivity, a transparent film having a fine pattern of irregularities can be easily produced.
- a photoacid generator a quinonediazide compound is preferable.
- the quinonediazide compound an esterified product of a compound having a phenolic hydroxyl group and a quinonediazidesulfonyl acid chloride is more preferable. In order to improve alkali solubility, a part of the phenolic hydroxyl group may be intentionally left without esterification.
- the content of the quinonediazide compound in the transparent resin composition of the present invention is preferably 1 to 50 parts by weight with respect to 100 parts by weight of the siloxane resin from the viewpoint of pattern processability.
- the transparent resin composition of the present invention may contain a surfactant (C) other than the above (C1) and (C2), further suppress unevenness during drying, and improve the flatness of the colored coating.
- a surfactant (C) other than the above (C1) and (C2) include anionic surfactants such as ammonium lauryl sulfate and polyoxyethylene alkyl ether sulfate triethanolamine; stearylamine acetate, lauryltrimethylammonium chloride and the like.
- Cationic surfactants amphoteric surfactants such as lauryldimethylamine oxide and laurylcarboxymethylhydroxyethylimidazolium betaine; nonionic surfactants such as polyoxyethylene lauryl ether, polyoxyethylene stearyl ether and sorbitan monostearate Silicone-based surfactants having polydimethylsiloxane or the like as the main skeleton; fluorine-based surfactants other than (C2); acrylic surfactants other than (C1).
- the content thereof is preferably within a range not inhibiting the effects of (C1) and (C2).
- the transparent resin composition Among them, 300 ppm or less is preferable, and 200 ppm or less is more preferable.
- the transparent resin composition of the present invention preferably contains an adhesion improving agent such as a silane coupling agent, and can improve the adhesion between the coating film and the base substrate.
- an adhesion improving agent such as a silane coupling agent
- the silane coupling agent include silane coupling agents having a functional group such as a vinyl group, an epoxy group, a styryl group, a methacryloxy group, an acryloxy group, and an amino group.
- the content of the adhesion improving agent in the transparent resin composition of the present invention is preferably 1% by weight or more, more preferably 2% by weight or more in the solid content of the transparent resin composition from the viewpoint of further improving the adhesiveness.
- the content of the adhesion improving agent is preferably 15% by weight or less in the solid content of the transparent resin composition, 10% by weight or less is more preferable.
- the transparent resin composition of the present invention may contain various curing agents, and can accelerate or facilitate the curing of the transparent resin composition.
- the curing agent include nitrogen-containing organic substances, silicone resin curing agents, various metal alcoholates, various metal chelate compounds, isocyanate compounds and polymers thereof, methylolated melamine derivatives, methylolated urea derivatives, and siloxane compounds having an oxetanyl group. Is mentioned. Two or more of these may be contained. Of these, metal chelate compounds, methylolated melamine derivatives, and methylolated urea derivatives are preferably used from the viewpoints of stability of the curing agent and processability of the obtained coating film.
- a siloxane compound having an oxetanyl group is preferable, and a siloxane compound having a plurality of oxetanyl groups is more preferable.
- the transparent resin composition may contain a curing catalyst such as a thermal acid generator.
- a curing catalyst such as a thermal acid generator.
- the thermal acid generator include various onium salt compounds such as aromatic diazonium salts, sulfonium salts, diaryl iodonium salts, triaryl sulfonium salts, triaryl selenium salts, sulfonic acid esters, and halogen compounds.
- the transparent resin composition of the present invention may contain inorganic particles, can improve the hardness of the transparent film, and can appropriately adjust the refractive index of the transparent film.
- the inorganic particles include silicon compound particles, aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, barium compound particles, and the like, which can be appropriately selected depending on the application.
- silica particles, zirconia oxide particles, and titanium oxide particles are preferable.
- the average particle diameter of the inorganic particles is preferably 1 to 200 nm, and more preferably 1 to 70 nm from the viewpoint of further improving the transparency of the transparent film.
- the average particle diameter of the inorganic particles can be measured with a scanning electron microscope.
- the inorganic particles can be obtained, for example, by procuring appropriate nanoparticle powders and pulverizing or dispersing them using a dispersing machine such as a bead mill, or by replacing the solvent of the nanoparticle dispersion produced by the sol-gel method. it can.
- a dispersing machine such as a bead mill
- examples of commercially available nanoparticle powders include sicastar (silica particles: manufactured by Corefront Co., Ltd.), reolosil (silica particles; manufactured by Tokuyama Co., Ltd.), UEP-100 (zirconium oxide particles; first rare element chemistry).
- STR-100N titanium oxide particles; manufactured by Sakai Chemical Industry Co., Ltd.).
- Examples of the dispersion of inorganic particles that can be procured include, for example, IPA-ST, MIBK-ST, IPA-ST-L, IPA-ST-ZL, PGM-ST or PMA-ST (above silica particles, both of which are Nissan Chemical Industries).
- the content of the inorganic particles is preferably 10% by weight or more and 60% by weight or less, preferably 20% by weight or more in the solid content of the transparent resin composition, from the viewpoint of improving the film hardness of the transparent coating and more easily adjusting the refractive index. More preferred is 40% by weight or less.
- the solid content concentration of the transparent resin composition of the present invention is preferably 2% by weight or more, and more preferably 5% by weight or more.
- the solid content concentration of the transparent resin composition is preferably 60% by weight or less, and more preferably 30% by weight or less from the viewpoint of storage stability.
- the surface tension at 25 ° C. of the transparent resin composition of the present invention is preferably 26 mN / m or more, and more preferably 26.5 mN / m or more, from the viewpoint of further suppressing thinning at the glass edge of the coated film after drying. .
- the surface tension at 25 ° C. of the transparent resin composition of the present invention is preferably 28 mN / m or less and more preferably 27.5 mN / m or less from the viewpoint of further suppressing drying unevenness.
- the surface tension is a value measured at 25 ° C. using a platinum plate by the Wilhelmy method (plate method, vertical plate method). The surface tension at 25 ° C.
- the content of the (C2) fluorine-containing thermally decomposable surfactant can be adjusted by, for example, the content of the (C2) fluorine-containing thermally decomposable surfactant.
- C2 The method of making content of a fluorine-containing thermal decomposable surfactant into the above-mentioned preferable range is mentioned.
- the contact angle on the alkali-free glass of the transparent resin composition of the present invention is preferably 1 ° or more from the viewpoint of making the film thickness at the edge of the substrate more uniform.
- the contact angle on the alkali-free glass of the colored resin composition of the present invention is preferably 12 ° or less, and more preferably 10 ° or less.
- the contact angle is a value measured using a portable contact angle meter by dropping the transparent resin composition on alkali-free glass (# 1737, manufactured by Corning) washed with an alkaline detergent.
- the contact angle on the alkali-free glass of the transparent resin composition of the present invention can be adjusted by, for example, the content of (C1) silicon-modified acrylic surfactant.
- the content of (C1) silicon-modified acrylic surfactant is within the above-mentioned preferable range.
- the refractive index at 550 nm of the transparent film made of the transparent resin composition of the present invention is preferably 1.46 or more, more preferably 1.48 or more.
- the refractive index is preferably 1.54 or less, and more preferably 1.52 or less.
- the viscosity at 25 ° C. of the transparent resin composition of the present invention is preferably 3 mPa ⁇ s or more, preferably 5 mPa ⁇ s or more, from the viewpoint of stably applying by ink jetting even when the transparent resin composition is applied on an inclined substrate. More than s is more preferable.
- the viscosity of the transparent resin composition of the present invention at 25 ° C. is to bind the landed droplets by the flow of the droplets when the transparent resin composition of the present invention is applied on the substrate by spraying or inkjet.
- the viscosity is a value at 25 to 100 rpm measured with a cone-plate viscometer set at 25.0 ⁇ 0.2 ° C.
- a method for producing the transparent resin composition of the present invention will be described.
- a method for producing the transparent resin composition of the present invention a method of stirring and mixing (A) a siloxane resin, (B) an organic solvent, (C) a surfactant and other components as necessary is common.
- the transparent film of the present invention can be obtained by curing the transparent resin composition of the present invention.
- a method for forming a transparent film from a transparent resin composition will be described by taking a transparent resin composition having negative photosensitivity as an example.
- a photosensitive transparent resin composition is applied on a glass substrate to obtain a coating film.
- the glass substrate include soda glass, alkali-free glass, quartz glass, aluminosilicate glass, chemically tempered glass using these glasses, and the like.
- the coating method include spin coating using a spinner, spray coating, inkjet coating, die coating, and roll coating. In the present invention, spray coating and inkjet coating are preferable.
- the film thickness of the coating film can be appropriately selected depending on the coating method and the like. Generally, the film thickness after drying is 1 to 150 ⁇ m.
- the dried coating film is dried to obtain a dry film.
- the drying method include heat drying, air drying, reduced pressure drying, infrared irradiation, and the like.
- Examples of the heat drying apparatus include an oven and a hot plate.
- the drying temperature is preferably 50 to 150 ° C., and the drying time is preferably 1 minute to several hours.
- the obtained dried film is irradiated with actinic radiation through a mask having a desired pattern to obtain an exposed film.
- actinic radiation to be irradiated include ultraviolet rays, visible rays, electron beams, and X-rays.
- the colored resin composition of the present invention is preferably irradiated with i-line (365 nm), h-line (405 nm), and g-line (436 nm) from a mercury lamp.
- the resulting exposed film is developed using an alkaline developer or the like to remove unexposed portions and obtain a pattern.
- alkaline compound used in the alkaline developer include inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, potassium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia; ethylamine, n-propylamine, etc.
- Secondary amines such as diethylamine and di-n-propylamine; tertiary amines such as triethylamine and methyldiethylamine; tetraalkylammonium hydroxides such as tetramethylammonium hydroxide (TMAH), choline Quaternary ammonium salts such as; ethanolamines such as triethanolamine, diethanolamine, monoethanolamine, dimethylaminoethanol, diethylaminoethanol; pyrrole, piperidine, 1,8-diazabicyclo 5,4,0] -7-undecene, 1,5-diazabicyclo [4,3,0] -5-nonane, organic alkalis cyclic amines such as morpholine.
- ethanolamines such as triethanolamine, diethanolamine, monoethanolamine, dimethylaminoethanol, diethylaminoethanol
- pyrrole piperidine, 1,8-diazabicyclo 5,4,0] -7-und
- the concentration of the alkaline compound in the alkaline developer is generally from 0.01 to 50% by mass, preferably from 0.02 to 1% by mass.
- a surfactant such as a nonionic surfactant may be added in an amount of 0.1 to 5% by mass.
- a water-soluble organic solvent such as ethanol, ⁇ -butyrolactone, dimethylformamide, N-methyl-2-pyrrolidone may be added to the developer.
- Examples of the developing method include an immersion method, a spray method, and a paddle method.
- the obtained pattern may be rinsed with pure water or the like.
- a patterned transparent film can be obtained by heat-treating (post-baking) the obtained pattern.
- the heat treatment may be performed in air, in a nitrogen atmosphere, or in a vacuum state.
- the heating temperature is preferably 150 to 300 ° C., and the heating time is preferably 0.25 to 5 hours.
- the heating temperature may be changed continuously or may be changed stepwise.
- the transparent resin-coated glass substrate of the present invention has the transparent film described above on a glass substrate. Moreover, the decorated glass substrate of this invention has a colored layer further on a transparent film.
- the material and the forming method of the colored layer are not particularly limited. Moreover, you may have a transparent refractive index adjustment layer instead of a colored layer or with a colored layer. As a transparent refractive index adjustment layer, an inorganic film etc. are mentioned, for example.
- the method for forming the transparent refractive index adjusting layer is not particularly limited.
- the transparent resin composition of the present invention can be suitably used for forming a glass reinforced resin layer of a cover glass provided on the front surface of a display device such as a smartphone or a tablet PC, an in-vehicle display or an instrument panel.
- a display device such as a smartphone or a tablet PC, an in-vehicle display or an instrument panel.
- viscosity Using the viscometer (RE105L manufactured by Toki Sangyo Co., Ltd.) with the temperature set to 25.0 ⁇ 0.2 ° C., the viscosity at 50 rpm was measured for the transparent resin compositions obtained in each Example and Comparative Example. It was measured.
- Refractive index With respect to the transparent film on the 4-inch silicone wafer obtained in each Example and Comparative Example, the refractive index at a wavelength of 550 nm was measured at 23 ° C. using a prism coupler (manufactured by Metricon, PC-2000).
- Coating repellent The transparent coatings obtained in each Example and Comparative Example were visually observed under a fluorescent lamp, and the presence or absence of application repelling was evaluated according to the following criteria. From the viewpoint of industrial use, A and B were considered acceptable.
- C There is an uncoated region on the substrate.
- Dry unevenness The central part of the transparent coating obtained in each Example and Comparative Example was visually observed under a fluorescent lamp and a Na lamp, and the presence or absence of drying unevenness was evaluated according to the following criteria. From the viewpoint of industrial use, A and B were considered acceptable. A: Unevenness is not confirmed in coating film observation under a fluorescent lamp and a Na lamp. B: Unevenness is not confirmed in coating film observation under a fluorescent lamp, but unevenness is confirmed in coating film observation under a Na lamp. C: Unevenness is confirmed in coating film observation under a fluorescent lamp.
- Glass edge unevenness The glass edges of the transparent coatings obtained in each Example and Comparative Example were visually observed under a fluorescent lamp and a Na lamp, respectively, and the presence or absence of interference unevenness at the glass edges was evaluated according to the following criteria. From the viewpoint of industrial use, A and B were considered acceptable. A: Unevenness is not confirmed in coating film observation under a fluorescent lamp and a Na lamp. B: Unevenness is not confirmed in coating film observation under a fluorescent lamp, but unevenness is confirmed in coating film observation under a Na lamp. C: Unevenness is confirmed in coating film observation under a fluorescent lamp.
- Glass surface strength Static test equipment for strength of glass breaking when placing transparent film obtained in each example and comparative example on support ring ( ⁇ 35 mm) and pushing load ring ( ⁇ 17.5 mm) at a speed of 10 mm / min Measured with AG-Xplus (manufactured by Shimadzu Corporation), the glass surface strength was determined according to the following criteria. From the viewpoint of industrial use, A and B were considered acceptable. In addition, the glass surface intensity
- Adhesion A black ink (GLS-HF979, manufactured by Teikoku Ink Manufacturing Co., Ltd.) was applied on the transparent coating obtained in each of the Examples and Comparative Examples using a screen printer so that the film thickness was 8 ⁇ m after drying. Then, it was cured by heating at 160 ° C. for 1 hour in a hot air oven. The glass substrate on which the transparent film and the black film are laminated is immersed in boiling pure water for 10 minutes, and after drying, the transparent film and the glass substrate are formed according to JIS “K5400” 8.5.2 (1990) cross-cut tape method. Adhesion was evaluated.
- 11 mm vertical and horizontal parallel straight lines are drawn at 1 mm intervals on the surface of the laminated film of the transparent film and black ink on the glass substrate so as to reach the substrate of the glass plate with a cutter knife.
- 100 squares were prepared.
- a phosphoric acid aqueous solution in which 0.401 g of phosphoric acid (0.2 parts by mass with respect to the charged monomer) was dissolved was added to the flask with a dropping funnel over 10 minutes. After stirring at 40 ° C. for 1 hour, the oil bath temperature was set to 70 ° C. and stirred for 1 hour, and the oil bath was further heated to 115 ° C. over 30 minutes. One hour after the start of temperature increase, the internal temperature of the solution reached 100 ° C., and was then heated and stirred for 2 hours (the internal temperature was 100 to 110 ° C.). During the reaction, a total of 120 g of methanol and water as by-products were distilled out.
- polysiloxane DAA was added to the obtained polysiloxane DAA solution so that the polymer concentration was 40% by mass to obtain a polysiloxane solution (PS-1). In addition, it was 5000 (polystyrene conversion) when the weight average molecular weight (henceforth "Mw") of the obtained polymer was measured by GPC.
- the aqueous phosphoric acid solution was added with a dropping funnel over 10 minutes. After stirring at 40 ° C. for 1 hour, the oil bath temperature was set to 70 ° C. and stirred for 1 hour, and the oil bath was further heated to 115 ° C. over 30 minutes. One hour after the start of temperature increase, the internal temperature of the solution reached 100 ° C., and was then heated and stirred for 2 hours (the internal temperature was 100 to 110 ° C.). During the reaction, a total of 177 g of methanol and water as by-products were distilled out. DAA was added to the obtained polysiloxane DAA solution so that the polymer concentration was 40% by mass to obtain a polysiloxane solution (PS-3). In addition, when the weight average molecular weight of the obtained polymer was measured by GPC, it was 4000 (polystyrene conversion).
- MMB 3-methyl-3-methoxy-1-butanol
- siloxane resin composition C-1 having a solid concentration of 26% by weight.
- the surface tension of the siloxane resin composition C-1 was 27.9 mN / m, the contact angle was 8.5 °, and the viscosity was 6.5 mPa ⁇ s.
- Example 2 0.10 g (corresponding to a concentration of 50 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”, PGMEA 5 wt% of fluorine-containing thermally decomposable surfactant“ DS-21 ”
- a siloxane resin composition C-2 was prepared in the same manner as in Example 1 except that the amount of the solution added was 0.10 g (corresponding to a concentration of 50 ppm).
- the surface tension of the siloxane resin composition C-2 was 27.3 mN / m, the contact angle was 8.9 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-2 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 3 0.20 g (corresponding to a concentration of 100 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”and PGMEA 5 wt% of fluorine-containing pyrolytic surfactant“ DS-21 ”
- a siloxane resin composition C-3 was prepared in the same manner as in Example 1 except that the addition amount of the solution was 0.20 g (corresponding to a concentration of 100 ppm).
- the surface tension of the siloxane resin composition C-3 was 26.9 mN / m, the contact angle was 9.3 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-3 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 4 0.40 g (corresponding to a concentration of 200 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”and 5 wt% PGMEA of fluorine-containing pyrolytic surfactant“ DS-21 ”
- a siloxane resin composition C-4 was prepared in the same manner as in Example 1 except that the amount of the solution added was 0.40 g (corresponding to a concentration of 200 ppm).
- the surface tension of the siloxane resin composition C-4 was 26.4 mN / m, the contact angle was 10.1 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-4 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 5 0.10 g (corresponding to a concentration of 50 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”, PGMEA 5 wt% of fluorine-containing thermally decomposable surfactant“ DS-21 ” The amount of the solution added was 0.10 g (corresponding to a concentration of 50 ppm), and 0.10 g (concentration 50 ppm) of a PGMEA 5 wt% solution of a silicon-based surfactant (trade name “BYK” -333 ”manufactured by Big Chemie Japan Co., Ltd.).
- a siloxane resin composition C-5 was prepared in the same manner as in Example 1 except for further adding.
- the surface tension of the siloxane resin composition C-5 was 26.8 mN / m, the contact angle was 10.2 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-5 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 6 0.30 g (corresponding to a concentration of 150 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”, PGMEA 5 wt% of fluorine-containing pyrolytic surfactant“ DS-21 ”
- a siloxane resin composition C-6 was prepared in the same manner as in Example 1 except that the addition amount of the solution was changed to 0.10 g (corresponding to a concentration of 50 ppm).
- the surface tension of the siloxane resin composition C-6 was 27.6 mN / m, the contact angle was 8.6 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-6 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 7 0.10 g (corresponding to a concentration of 50 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”, PGMEA 5 wt% of fluorine-containing thermally decomposable surfactant“ DS-21 ”
- a siloxane resin composition C-7 was prepared in the same manner as in Example 1 except that the amount of the solution added was 0.30 g (corresponding to a concentration of 150 ppm).
- the surface tension of the siloxane resin composition C-7 was 26.2 mN / m, the contact angle was 9.8 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-7 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 8 65.00 g of polysiloxane solution (PS-2) was dissolved in 19.80 g of PGMEA and 14.80 g of MMB, and 0.20 g of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 (concentration to 100 ppm) And 0.20 g (corresponding to a concentration of 100 ppm) of a PGMEA 5 wt% solution of the fluorine-containing thermally decomposable surfactant “DS-21” were added and stirred. Next, the mixture was filtered through a 0.45 ⁇ m filter to prepare a siloxane resin composition C-8 having a solid concentration of 26% by weight.
- PS-2 polysiloxane solution
- the surface tension of the siloxane resin composition C-8 was 26.9 mN / m, the contact angle was 9.2 °, the viscosity was 5.7 mPa ⁇ s, and the transmittance of the prebaked film was 99%.
- a transparent film A-8 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 9 52.00 g of polysiloxane solution (PS-2) was dissolved in 13.00 g of DAA, 2.47 g of PGMEA, and 14.80 g of MMB, and a 30 wt% dispersion of PGMEA of titanium oxide particles (trade name “TR-513” JGC Catalysts & Chemicals Co., Ltd.
- silicon modified acrylic surfactant (trade name “BYK” -3550 ”manufactured by Big Chemie Japan Co., Ltd.) 0.20 g of 5% by weight PGMEA solution (corresponding to a concentration of 100 ppm) and fluorine-containing heat 0.20 g (corresponding to a concentration of 100 ppm) of a 5% by weight PGMEA solution of a degradable surfactant (trade name “DS-21” manufactured by DIC Corporation) was added and stirred. Subsequently, the mixture was filtered through a 1.00 ⁇ m filter to prepare a siloxane resin composition C-9 having a solid content concentration of 26% by weight.
- the surface tension of the siloxane resin composition C-9 was 27.0 mN / m, the contact angle was 9.3 °, the viscosity was 5.5 mPa ⁇ s, and the transmittance of the prebaked film was 99%.
- a transparent film A-9 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 10 A siloxane resin composition C-10 having a solid concentration of 26% by weight was prepared in the same manner as in Example 8 except that 65.00 g of the polysiloxane solution (PS-2) was changed to 65.00 g of the polysiloxane solution (PS-3). Prepared.
- the surface tension of the siloxane resin composition C-10 was 27.0 mN / m, the contact angle was 9.2 °, the viscosity was 5.9 mPa ⁇ s, and the transmittance of the prebaked film was 99%.
- a transparent film A-10 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- MDT 3-methyl-3-methoxy-1-butyl acetate
- the surface tension of the siloxane resin composition C-11 was 26.5 mN / m, the contact angle was 9.5 °, the viscosity was 6.9 mPa ⁇ s, and the transmittance of the film after exposure was 98%.
- a transparent film A-11 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 12 Tris- (trimethoxy) was dissolved in a mixed solvent of DAA 4.00 g, PGMEA 8.80 g and MMB-AC 22.20 g of a crosslinking accelerator (trade name “MDT” manufactured by Heraeus) represented by the structural formula (15).
- MDT crosslinking accelerator
- Silylpropyl) isocyanurate (trade name “KBM-9659” manufactured by Shin-Etsu Chemical Co., Ltd.) 0.54 g, polysiloxane solution (PS-4) 37.49 g, PGMEA 30 wt% dispersion of silica particles (trade name “PMA” -ST "23.89 g (Nissan Chemical Co., Ltd.), silicon modified acrylic surfactant (trade name“ BYK ”(registered trademark) -3550” manufactured by Big Chemie Japan Co., Ltd.) 5% by weight PGMEA solution 20 g of PGMEA (corresponding to a concentration of 100 ppm) and fluorine-containing thermally decomposable surfactant (trade name “DS-21” manufactured by DIC Corporation) 5 weight The solution 0.20g (corresponding to concentration 100 ppm) was added and stirred. Next, the mixture was filtered through a 1.00 ⁇ m filter to prepare a siloxane resin composition C-12 having a solid concentration of
- the surface tension of the siloxane resin composition C-12 was 26.5 mN / m, the contact angle was 9.7 °, the viscosity was 6.6 mPa ⁇ s, and the transmittance of the film after prebaking and exposure was 99%. .
- a transparent coating A-12 was prepared in the same manner as in Example 1 except that no exposure was performed, and the evaluation results are shown in Table 2.
- silicone surfactant (trade name “BYK” -333)
- a siloxane resin composition C-13 was prepared in the same manner as in Example 1 except that 0.40 g (corresponding to a concentration of 200 ppm) of a 5% by weight PGMEA solution manufactured by Chemie Japan Co., Ltd. was added.
- the surface tension of the siloxane resin composition C-13 was 25.9 mN / m, the contact angle was 12.1 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-13 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 3 The amount of PGMEA 5 wt% solution of silicon modified acrylic surfactant “BYK” -3550 ”is 0.40 g (corresponding to a concentration of 200 ppm), and fluorine-containing thermally decomposable surfactant“ DS-21 ”is added.
- a siloxane resin composition C-15 was prepared in the same manner as in Example 1 except that there was not.
- the surface tension of the siloxane resin composition C-15 was 28.4 mN / m, the contact angle was 7.9 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent coating A-15 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- a siloxane resin composition C-16 was prepared in the same manner as in Example 1.
- the surface tension of the siloxane resin composition C-16 was 26.2 mN / m, the contact angle was 11.0 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent coating A-16 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- the surface tension of the siloxane resin composition C-17 was 28.6 mN / m, the contact angle was 8.2 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-17 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Example 6 0.60 g (corresponding to a concentration of 300 ppm) of PGMEA 5 wt% solution of silicon-modified acrylic surfactant “BYK” -3550 ”, PGMEA 5 wt% of fluorine-containing pyrolytic surfactant“ DS-21 ”
- a siloxane resin composition C-18 was prepared in the same manner as in Example 1 except that the addition amount of the solution was 0.60 g (corresponding to a concentration of 300 ppm).
- the surface tension of the siloxane resin composition C-18 was 25.8 mN / m, the contact angle was 10.6 °, the viscosity was 6.5 mPa ⁇ s, and the transmittance of the prebaked film was 97%.
- a transparent film A-18 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- the surface tension of the siloxane resin composition C-19 was 26.8 mN / m, the contact angle was 11.0 °, and the viscosity was 6.5 mPa ⁇ s, and the transmittance of the pre-baked film was 97% Using the siloxane resin composition C-19, a transparent film A-19 was prepared and evaluated in the same manner as in Example 1. Is shown in Table 2.
- an acrylic resin composition A-1 having a solid content concentration of 26% by weight.
- the surface tension of the acrylic resin composition A-1 was 26.9 mN / m, the contact angle was 9.1 °, the viscosity was 6.0 mPa ⁇ s, and the transmittance of the prebaked film was 96%.
- a transparent coating A-20 was produced in the same manner as in Example 1, and the evaluation results are shown in Table 2.
- Table 1 shows the compositions of Examples and Comparative Examples, and Table 2 shows the evaluation results.
- the transparent resin composition produced in the examples formed a transparent film on a glass substrate by ink jet coating, the repelling and unevenness were suppressed, and had a good appearance, and further, when a transparent film was formed It can be seen that the glass strength and the adhesion when the laminated film is formed are excellent.
- the transparent resin composition of the present invention is applied on a glass substrate by spraying or ink jetting, it is possible to suppress repelling and unevenness and easily provide a transparent film having a good appearance. Furthermore, since it has excellent adhesion with the organic film and inorganic film formed on the transparent resin layer, it becomes possible to form a cover glass excellent in reliability for display devices such as smartphones with high production efficiency. .
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Abstract
Description
「表面張力」
各実施例および比較例により得られた透明樹脂組成物について、自動表面張力計K11(KRUSS社製)を使用して、白金プレートを用いて、25℃において表面張力を測定した。
アルカリ洗剤(ヘモゾールHEM026-058(和研薬(株)製))により洗浄した無アルカリガラス(#1737、コーニング社製)上に、各実施例および比較例により得られた透明樹脂組成物を滴下し、ポータブル接触角計PCA-1(協和界面科学(株)製)を使用して接触角を測定した。
各実施例および比較例により得られた透明樹脂組成物について、温度を25.0±0.2℃に設定した粘度計(東機産業(株)製RE105L)を使用して、50rpmにおける粘度を測定した。
各実施例および比較例により得られた4インチシリコーンウェハー上の透明被膜について、プリズムカプラー(メトリコン製、PC-2000)を用い、室温23℃において、波長550nmにおける屈折率を測定した。
各実施例および比較例により得られた5cm角のテンパックスガラス基板上のプリベイク膜およびキュア後の透明被膜について、紫外-可視分光光度計UV-2600((株)島津製作所製)を用いて、膜厚1.5μm、測定波長400nmにおける透過率を測定した。
各実施例および比較例により得られた透明被膜を蛍光灯下においてそれぞれ目視観察し、以下の基準により塗布はじきの有無を評価した。工業的利用の観点から、AおよびBを合格とした。
A:蛍光灯下およびNaランプ下での塗膜観察において、ピンホールが確認されない。
B:蛍光灯下での塗膜観察において、ピンホールが確認されないが、Naランプ下での塗膜観察において、ピンホールに起因する凹みが確認される。
C:基板上に未塗布領域がある。
各実施例および比較例により得られた透明被膜の中央部を蛍光灯下およびNaランプ下においてそれぞれ目視観察し、以下の基準により乾燥ムラの有無を評価した。工業的利用の観点から、AおよびBを合格とした。
A:蛍光灯下およびNaランプ下での塗膜観察において、ムラが確認されない。
B:蛍光灯下での塗膜観察において、ムラが確認されないが、Naランプ下での塗膜観察において、ムラが確認される。
C:蛍光灯下での塗膜観察において、ムラが確認される。
各実施例および比較例により得られた透明被膜のガラス端部を蛍光灯下およびNaランプ下においてそれぞれ目視観察し、以下の基準によりガラス端部での干渉ムラの有無を評価した。工業的利用の観点から、AおよびBを合格とした。
A:蛍光灯下およびNaランプ下での塗膜観察において、ムラが確認されない。
B:蛍光灯下での塗膜観察において、ムラが確認されないが、Naランプ下での塗膜観察において、ムラが確認される。
C:蛍光灯下での塗膜観察において、ムラが確認される。
各実施例および比較例により得られた透明被膜をサポートリング(φ35mm)上に置き、ロードリング(φ17.5mm)を10mm/minの速度で押し込んだ際にガラスが破断する強度を静的試験装置AG-Xplus((株)島津製作所製)により測定し、以下の基準によりガラス面強度を判定した。工業的利用の観点から、AおよびBを合格とした。なお、透明被膜のないガラスのみでのガラス面強度は800MPaであった。
A:ガラス面強度が900MPa以上。
B:ガラス面強度が800以上900MPa未満。
C:ガラス面強度が800MPa未満。
各実施例および比較例により得られた透明被膜の上に、スクリーン印刷機を用いて、黒色インク(帝国インキ製造(株)製、GLS-HF979)を乾燥後膜厚が8μmとなるように塗布し、熱風オーブンにより160℃、1時間加熱して熱硬化させた。透明被膜および黒色膜を積層したガラス基板を沸騰した純水に10分間浸漬し、乾燥後に、JIS「K5400」8.5.2(1990)碁盤目テープ法に準じて透明被膜とガラス基板との密着性を評価した。すなわち、ガラス基板上の透明被膜と黒色インクの積層膜表面に、カッターナイフでガラス板の素地に到達するように、直交する縦横11本ずつの平行な直線を1mm間隔で引いて、1mm×1mmのマス目を100個作製した。切られたITO表面にセロハン粘着テープ(幅=18mm、粘着力=3.7N/10mm)を張り付け、消しゴム(JIS S6050合格品)で擦って密着させ、テープの一端を持ち、板に直角に保ち瞬間的に剥離した際のマス目の残存数を目視によって計数した。マス目の剥離面積により以下のように判定し、4B以上を合格とした。
5B:剥離面積=0%
4B:剥離面積=0%を超え5%未満
3B:剥離面積=5%以上15%未満
2B:剥離面積=15%以上35%未満
1B:剥離面積=35%以上65%未満
0B:剥離面積=65%以上100%未満。
500mLの三口フラスコにメチルトリメトキシシランを47.67g(0.35mol)、フェニルトリメトキシシランを39.66g(0.20mol)、3-トリメトキシシリルプロピルコハク酸を26.23g(0.10mol)、γ-アクリロイルプロピルトリメトキシシランを82.04g(0.35mol)、ダイアセトンアルコール(以下、「DAA」)を180.56g仕込み、40℃のオイルバスに漬けて撹拌しながら、水55.8gにリン酸0.401g(仕込みモノマに対して0.2質量部)を溶かしたリン酸水溶液を滴下ロートで10分間かけて添加した。40℃で1時間撹拌した後、オイルバス温度を70℃に設定して1時間撹拌し、さらにオイルバスを30分間かけて115℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール及び水が合計120g留出した。得られたポリシロキサンのDAA溶液に、ポリマー濃度が40質量%となるようにDAAを加えてポリシロキサン溶液(PS-1)を得た。なお、得られたポリマーの重量平均分子量(以下、「Mw」)をGPCにより測定したところ5000(ポリスチレン換算)であった。
500mLの三口フラスコにテトラエトキシシランを106.54g(0.70mol)、メチルトリメトキシシランを10.87g(0.30mol)、DAAを85.92g仕込み、40℃のオイルバスに漬けて撹拌しながら、水55.8gにリン酸0.401g(仕込みモノマに対して0.2質量部)を溶かしたリン酸水溶液を滴下ロートで10分間かけて添加した。40℃で1時間撹拌した後、オイルバス温度を70℃に設定して1時間撹拌し、さらにオイルバスを30分間かけて115℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール及び水が合計182g留出した。得られたポリシロキサンのDAA溶液に、ポリマー濃度が40質量%となるようにDAAを加えてポリシロキサン溶液(PS-2)を得た。なお、得られたポリマーの重量平均分子量をGPCにより測定したところ3000(ポリスチレン換算)であった。
500mLの三口フラスコにテトラエトキシシランを91.32g(0.60mol)、フェニルトリメトキシシランを56.79g(0.30mol)、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシランを24.64g(0.10mol)、DAAを152.91g仕込み、40℃のオイルバスに漬けて撹拌しながら、水55.8gにリン酸0.401g(仕込みモノマに対して0.2質量部)を溶かしたリン酸水溶液を滴下ロートで10分間かけて添加した。40℃で1時間撹拌した後、オイルバス温度を70℃に設定して1時間撹拌し、さらにオイルバスを30分間かけて115℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール及び水が合計177g留出した。得られたポリシロキサンのDAA溶液に、ポリマー濃度が40質量%となるようにDAAを加えてポリシロキサン溶液(PS-3)を得た。なお、得られたポリマーの重量平均分子量をGPCにより測定したところ4000(ポリスチレン換算)であった。
500mlの三口フラスコにメチルトリメトキシシランを54.48g(0.40mol)、フェニルトリメトキシシランを99.15g(0.50mol)、2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシランを24.64g(0.10mol)DAAを163.35g仕込み、室温で攪拌しながら水54.0gにリン酸0.535g(仕込みモノマーに対して0.3質量部)を溶かしたリン酸水溶液を滴下ロートで10分かけて添加した。40℃で1時間撹拌した後、オイルバス温度を70℃に設定して1時間撹拌し、さらにオイルバスを30分間かけて115℃まで昇温した。昇温開始1時間後に溶液の内温が100℃に到達し、そこから2時間加熱撹拌した(内温は100~110℃)。反応中に副生成物であるメタノール及び水が合計177g留出した。得られたポリシロキサンのDAA溶液に、ポリマー濃度が45質量%となるようにDAAを加えてポリシロキサン溶液(PS-4)を得た。なお、得られたポリマーの重量平均分子量をGPCにより測定したところ3000(ポリスチレン換算)であった。
500mlのフラスコに2,2’-アゾビス(イソブチロニトリル)を3g、PGMEAプロピレングリコールメチルエーテルアセテート(以下、「PGMEA」)を50g仕込んだ。その後、メタクリル酸を30g、ベンジルメタクリレートを35g、トリシクロ[5.2.1.02,6]デカン-8-イルメタクリレートを35g仕込み、室温でしばらく撹拌し、フラスコ内を窒素置換した後、70℃で5時間加熱撹拌した。次に、得られた溶液にメタクリル酸グリシジルを15g、ジメチルベンジルアミンを1g、p-メトキシフェノールを0.2g、PGMEAを100g添加し、90℃で4時間加熱撹拌し、アクリル樹脂溶液(PA-1)を得た。得られたアクリル樹脂溶液(PA-1)に固形分濃度が40重量%になるようにPGMEAを加えた。アクリル樹脂の重量平均分子量は10000、酸価は118mgKOH/gであった。
黄色灯下にてフェニルビス(2,4,6-トリメチルベンゾイル)ホスフィンオキシド(商品名「“イルガキュア”(登録商標)819」(表1中、「IC-819」と略記)チバスペシャリティケミカルズ(株)製)1.58g、ジルコニウムテトラアセチルアセトナート(商品名「オルガチックスZC-150」マツモトファインケミカル(株)製)0.77gを、DAA(沸点=169℃)23.44g、PGMEA(沸点=146℃)1.01g、3-メチル-3-メトキシ-1-ブタノール(沸点=174℃、以下“MMB”)14.80gの混合溶媒に溶解させ、オキセタニル基を有するシロキサン化合物「“アロンオキセタン”(登録商標)OXT-191」0.59g、トリス(2-ヒドロキシエチル)イソシアヌル酸のアクリル酸エステル(商品名「“アロニックス”(登録商標)M-315」東亞合成(株)製)4.52g、3-アミノプロピルトリメトキシシラン(商品名「KBM-903」信越化学工業(株)製)0.45g、ポリシロキサン溶液(PS-1)22.60g、シリカ粒子のPGMEA30重量%分散液(商品名「PMA-ST」日産化学(株)製)30.14g、シリコン変性アクリル系界面活性剤(商品名「“BYK”(登録商標)-3550」ビックケミージャパン(株)製)のPGMEA5重量%溶液0.05g(濃度25ppmに相当)と含フッ素熱分解性界面活性剤(商品名「DS-21」DIC(株)製)のPGMEA5重量%溶液0.05g(濃度25ppmに相当)を加え、撹拌した。次いで1.00μmのフィルターでろ過を行い、固形分濃度26重量%のシロキサン樹脂組成物C-1を調製した。シロキサン樹脂組成物C-1の表面張力は27.9mN/m、接触角は8.5°、粘度は6.5mPa・sであった。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-2を調製した。シロキサン樹脂組成物C-2の表面張力は27.3mN/m、接触角は8.9°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-2を用いて、実施例1と同様にして透明被膜A-2を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.20g(濃度100ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.20g(濃度100ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-3を調製した。シロキサン樹脂組成物C-3の表面張力は26.9mN/m、接触角は9.3°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-3を用いて、実施例1と同様にして透明被膜A-3を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.40g(濃度200ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.40g(濃度200ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-4を調製した。シロキサン樹脂組成物C-4の表面張力は26.4mN/m、接触角は10.1°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-4を用いて、実施例1と同様にして透明被膜A-4を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)とし、シリコン系界面活性剤(商品名「“BYK”-333」ビックケミージャパン(株)製)のPGMEA5重量%溶液0.10g(濃度50ppmに相当)をさらに添加した以外は実施例1と同様にしてシロキサン樹脂組成物C-5を調製した。シロキサン樹脂組成物C-5の表面張力は26.8mN/m、接触角は10.2°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-5を用いて、実施例1と同様にして透明被膜A-5を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.30g(濃度150ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-6を調製した。シロキサン樹脂組成物C-6の表面張力は27.6mN/m、接触角は8.6°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-6を用いて、実施例1と同様にして透明被膜A-6を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.10g(濃度50ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液添加量を0.30g(濃度150ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-7を調製した。シロキサン樹脂組成物C-7の表面張力は26.2mN/m、接触角は9.8°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-7を用いて、実施例1と同様にして透明被膜A-7を作製し、評価した結果を表2に示す。
ポリシロキサン溶液(PS-2)65.00gを、PGMEA19.80g、MMB14.80gに溶解させ、シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液0.20g(濃度100ppmに相当)と含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液0.20g(濃度100ppmに相当)を加え、撹拌した。次いで0.45μmのフィルターでろ過を行い、固形分濃度26重量%のシロキサン樹脂組成物C-8を調製した。シロキサン樹脂組成物C-8の表面張力は26.9mN/m、接触角は9.2°、粘度は5.7mPa・sであり、プリベイク膜の透過率は99%であった。シロキサン樹脂組成物C-8を用いて、実施例1と同様にして透明被膜A-8を作製し、評価した結果を表2に示す。
ポリシロキサン溶液(PS-2)52.00gを、DAA13.00g、PGMEA2.47g、MMB14.80gに溶解させ、酸化チタン粒子のPGMEA30重量%分散液(商品名「TR-513」日揮触媒化成(株)製)17.33g、シリコン変性アクリル系界面活性剤(商品名「“BYK”-3550」ビックケミージャパン(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)と含フッ素熱分解性界面活性剤(商品名「DS-21」DIC(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)を加え、撹拌した。次いで1.00μmのフィルターでろ過を行い、固形分濃度26重量%のシロキサン樹脂組成物C-9を調製した。シロキサン樹脂組成物C-9の表面張力は27.0mN/m、接触角は9.3°、粘度は5.5mPa・sであり、プリベイク膜の透過率は99%であった。シロキサン樹脂組成物C-9を用いて、実施例1と同様にして透明被膜A-9を作製し、評価した結果を表2に示す。
ポリシロキサン溶液(PS-2)65.00gをポリシロキサン溶液(PS-3)65.00gとしたこと以外は実施例8と同様にして固形分濃度26重量%のシロキサン樹脂組成物C-10を調製した。シロキサン樹脂組成物C-10の表面張力は27.0mN/m、接触角は9.2°、粘度は5.9mPa・sであり、プリベイク膜の透過率は99%であった。シロキサン樹脂組成物C-10を用いて、実施例1と同様にして透明被膜A-10を作製し、評価した結果を表2に示す。
黄色灯下にて下記構造式(14)で表されるキノンジアジド化合物(商品名「TAS-200A」東洋合成(株)製)1.52g、下記構造式(15)で表される架橋促進剤(商品名「MDT」ヘレウス製)0.34gをDAA5.28g、PGMEA9.78g、3-メチル-3-メトキシ-1-ブチルアセテート(沸点=188℃、以下“MMB-AC”)22.20gの混合溶媒に溶解させ、トリス-(トリメトキシシリルプロピル)イソシアヌレート(商品名「KBM-9659」信越化学工業(株)製)0.51g、ポリシロキサン溶液(PS-4)37.49g、シリカ粒子のPGMEA30重量%分散液(商品名「PMA-ST」日産化学(株)製)22.49g、シリコン変性アクリル系界面活性剤(商品名「“BYK”(登録商標)-3550」ビックケミージャパン(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)と含フッ素熱分解性界面活性剤(商品名「DS-21」DIC(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)を加え、撹拌した。次いで1.00μmのフィルターでろ過を行い、固形分濃度26重量%のシロキサン樹脂組成物C-11を調製した。
構造式(15)で表される架橋促進剤(商品名「MDT」ヘレウス製)0.36gをDAA4.00g、PGMEA8.80g、MMB-AC22.20gの混合溶媒に溶解させ、トリス-(トリメトキシシリルプロピル)イソシアヌレート(商品名「KBM-9659」信越化学工業(株)製)0.54g、ポリシロキサン溶液(PS-4)37.49g、シリカ粒子のPGMEA30重量%分散液(商品名「PMA-ST」日産化学(株)製)23.89g、シリコン変性アクリル系界面活性剤(商品名「“BYK”(登録商標)-3550」ビックケミージャパン(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)と含フッ素熱分解性界面活性剤(商品名「DS-21」DIC(株)製)のPGMEA5重量%溶液0.20g(濃度100ppmに相当)を加え、撹拌した。次いで1.00μmのフィルターでろ過を行い、固形分濃度26重量%のシロキサン樹脂組成物C-12を調製した。
シリコン変性アクリル系界面活性剤「“BYK”-3550」および含フッ素熱分解性界面活性剤「DS-21」を添加せずに、シリコン系界面活性剤(商品名「“BYK”-333」ビックケミージャパン(株)製)のPGMEA5重量%溶液を0.40g(濃度200ppmに相当)添加した以外は実施例1と同様にしてシロキサン樹脂組成物C-13を調製した。シロキサン樹脂組成物C-13の表面張力は25.9mN/m、接触角は12.1°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-13を用いて、実施例1と同様にして透明被膜A-13を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」および含フッ素熱分解性界面活性剤「DS-21」を添加せずに、フッ素系界面活性剤(商品名「F-477」(DIC(株)製)のPGMEA5重量%溶液を0.40g(濃度200ppmに相当)添加した以外は実施例1と同様にしてシロキサン樹脂組成物C-14を調製した。シロキサン樹脂組成物C-14の表面張力は26.2mN/m、接触角は11.5°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-14を用いて、実施例1と同様にして透明被膜A-14を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.40g(濃度200ppmに相当)とし、含フッ素熱分解性界面活性剤「DS-21」を添加しなかった以外は実施例1と同様にしてシロキサン樹脂組成物C-15を調製した。シロキサン樹脂組成物C-15の表面張力は28.4mN/m、接触角は7.9°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-15を用いて、実施例1と同様にして透明被膜A-15を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」を添加せずに、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.40g(濃度200ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-16を調製した。シロキサン樹脂組成物C-16の表面張力は26.2mN/m、接触角は11.0°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-16を用いて、実施例1と同様にして透明被膜A-16を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.02g(濃度10ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.02g(濃度10ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-17を調製した。シロキサン樹脂組成物C-17の表面張力は28.6mN/m、接触角は8.2°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-17を用いて、実施例1と同様にして透明被膜A-17を作製し、評価した結果を表2に示す。
シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液の添加量を0.60g(濃度300ppmに相当)、含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液の添加量を0.60g(濃度300ppmに相当)とした以外は実施例1と同様にしてシロキサン樹脂組成物C-18を調製した。シロキサン樹脂組成物C-18の表面張力は25.8mN/m、接触角は10.6°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-18を用いて、実施例1と同様にして透明被膜A-18を作製し、評価した結果を表2に示す。
含フッ素熱分解性界面活性剤「DS-21」の代わりにフッ素系界面活性剤(商品名「F-477」(DIC(株)製)のPGMEA5重量%溶液を0.20g(濃度100ppmに相当)添加した以外は実施例3と同様にしてシロキサン樹脂組成物C-19を調製した。シロキサン樹脂組成物C-19の表面張力は26.8mN/m、接触角は11.0°、粘度は6.5mPa・sであり、プリベイク膜の透過率は97%であった。シロキサン樹脂組成物C-19を用いて、実施例1と同様にして透明被膜A-19を作製し、評価した結果を表2に示す。
黄色灯下にてフェニルビス(2,4,6-トリメチルベンゾイル)ホスフィンオキシド「“イルガキュア”819」1.67gを、DAA37.00g、PGMEA3.94g、MMB14.80gの混合溶媒に溶解させ、トリス(2-ヒドロキシエチル)イソシアヌル酸のアクリル酸エステル「“アロニックス”M-315」4.77g、ジペンタエリスリトールヘキサアクリレート(商品名「“カヤラッド”(登録商標)DPHA」新日本化薬(株)製)7.15g、3-アミノプロピルトリメトキシシラン「KBM-903」0.48g、アクリル樹脂溶液(PA-1)29.79g、シリコン変性アクリル系界面活性剤「“BYK”-3550」のPGMEA5重量%溶液0.20g(濃度100ppmに相当)と含フッ素熱分解性界面活性剤「DS-21」のPGMEA5重量%溶液0.20g(濃度100ppmに相当)を加え、撹拌した。次いで1.00μmのフィルターでろ過を行い、固形分濃度26重量%のアクリル樹脂組成物A-1を得た。アクリル樹脂組成物A-1の表面張力は26.9mN/m、接触角は9.1°、粘度は6.0mPa・sであり、プリベイク膜の透過率は96%であった。アクリル樹脂組成物A-1を用いて、実施例1と同様にして透明被膜A-20を作製し、評価した結果を表2に示す。
Claims (10)
- 少なくとも(A)シロキサン樹脂、(B)有機溶媒および2種以上の(C)界面活性剤を含有する透明樹脂組成物であって、前記界面活性剤として(C1)シリコン変性アクリル系界面活性剤および(C2)含フッ素熱分解性界面活性剤を含有し、前記界面活性剤(C1)および(C2)の総含有量が、透明樹脂組成物中50ppm以上500ppm以下である透明樹脂組成物。
- 前記界面活性剤(C1)の含有量に対する前記界面活性剤(C2)の含有量比率(C2)/(C1)が0.25以上4.0以下である請求項1に記載の透明樹脂組成物。
- 透明樹脂組成物から透明被膜を形成したときの550nmにおける屈折率が、1.46~1.54となる請求項1または2に記載の透明樹脂組成物。
- 無アルカリガラス上における接触角が1°以上12°以下である請求項1~3のいずれか1項に記載の透明樹脂組成物。
- 25℃における表面張力が26mN/m以上28mN/m以下である請求項1~4のいずれか1項に記載の透明樹脂組成物。
- 25℃における粘度が3mPa・s以上20mPa・s以下である請求項1~5のいずれか1項に記載の透明樹脂組成物。
- 前記(A)シロキサン樹脂がラジカル重合性基を有し、反応性モノマおよび光ラジカル重合開始剤をさらに含有する請求項1~6のいずれか1項に記載の感光性透明樹脂組成物。
- 請求項1~7のいずれかに記載の透明樹脂組成物からなる透明被膜。
- ガラス基板上に請求項8に記載の透明被膜を有する透明樹脂被覆ガラス基板。
- ガラス基板上に請求項8に記載の透明被膜および着色層をこの順に有する加飾ガラス基板。
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| CN114502613A (zh) * | 2019-10-02 | 2022-05-13 | 东京应化工业株式会社 | 固化性组合物、固化物及固化物的形成方法 |
| JP2022535589A (ja) * | 2019-06-11 | 2022-08-09 | エージーシー グラス ユーロップ | 装飾ガラス要素及びそれを製造する方法 |
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| WO2022014667A1 (ja) * | 2020-07-16 | 2022-01-20 | 三菱瓦斯化学株式会社 | 積層体 |
| KR20230138445A (ko) * | 2021-01-29 | 2023-10-05 | 도레이 카부시키가이샤 | 수지 피복 초박판 유리 |
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