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WO2018111043A1 - Photopolymerizable composition for forming bezel pattern, method for manufacturing bezel pattern of display substrate using same, bezel pattern manufactured thereby - Google Patents

Photopolymerizable composition for forming bezel pattern, method for manufacturing bezel pattern of display substrate using same, bezel pattern manufactured thereby Download PDF

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Publication number
WO2018111043A1
WO2018111043A1 PCT/KR2017/014866 KR2017014866W WO2018111043A1 WO 2018111043 A1 WO2018111043 A1 WO 2018111043A1 KR 2017014866 W KR2017014866 W KR 2017014866W WO 2018111043 A1 WO2018111043 A1 WO 2018111043A1
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WIPO (PCT)
Prior art keywords
bezel pattern
forming
photopolymerizable composition
bezel
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/KR2017/014866
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French (fr)
Korean (ko)
Inventor
박성은
유재현
김아름
김준형
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
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LG Chem Ltd
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Publication date
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Priority to CN201780060232.8A priority Critical patent/CN109804312A/en
Priority to JP2019510798A priority patent/JP6870194B2/en
Publication of WO2018111043A1 publication Critical patent/WO2018111043A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Definitions

  • the present invention relates to a photopolymerizable composition for forming a bezel pattern, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby.
  • circuits for applying an electric signal to operate the device are located at four edges of the inside of the device. Circuits made of metals such as copper or aluminum reflect external light and require a bezel to block it. Conventionally, a separate plastic structure case has been used, but recently, a method of directly forming a bezel pattern on a touch screen or a thin film transistor substrate using a printing method such as screen printing or inkjet has been used.
  • a solvent having a low boiling point is removed, a solvent having a high boiling point, or a solvent-free composition composed of only a reactive component having a high boiling point is used as in FIG. 2.
  • a solvent having a high boiling point is used, the drying problem can be solved, but since evaporation is too slow, a residual solvent remains in the film even after curing, resulting in poor curing rate and film characteristics.
  • Patent Document 1 KR 10-2013-0112003 A
  • the present invention by forming a bezel pattern using a photopolymerizable composition for forming a bezel pattern having a high boiling point, but does not lower the curing reaction rate, thereby remaining in the thin film in the process film characteristics It aims at forming the bezel pattern which does not show a fall and hardening inhibition.
  • This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.
  • the present invention using the photopolymerizable composition for forming a bezel pattern, forming a bezel pattern on a substrate; And curing the bezel pattern. It provides a method of manufacturing a bezel pattern for a display substrate comprising a.
  • the present invention provides a bezel pattern for a display substrate formed by curing the photopolymerizable composition for forming a bezel pattern.
  • the present invention provides a display substrate including the bezel pattern for the display substrate.
  • the photopolymerizable composition for forming bezel patterns which has a high boiling point and does not decrease the curing reaction rate, is used, in forming a bezel pattern, it remains in the thin film in the process and exhibits no deterioration in film properties and hardening inhibition. There is an advantage.
  • FIG. 1 is a schematic diagram showing an inkjet process according to the prior art.
  • Figure 2 is a schematic diagram showing another inkjet process according to the prior art.
  • This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.
  • the photopolymerizable composition for forming a bezel pattern of the present invention may further include any one or more selected from the group consisting of a surfactant, an adhesion promoter, a diluent and a photosensitizer.
  • a radically polymerizable compound and a cationic polymerizable compound may be mainly used in the photopolymerizable composition for forming a bezel pattern.
  • the radically polymerizable compound is not suitable for curing a thin film because it suffers from a hardening disorder due to oxygen, and is not suitable for forming a bezel pattern due to its high adhesion shrinkage and low adhesion to a glass substrate.
  • the cationic polymerization type compound it is generally advantageous for curing the thin film because the curing shrinkage rate is low and the influence by oxygen is small.
  • the photopolymerizable composition for bezel pattern formation used by this invention contains an epoxy compound as a cationic curing component.
  • the epoxy compound is selected from a bisphenol type epoxy compound, a novolak type epoxy compound, a glycidyl ester type epoxy compound, a glycidyl amine type epoxy compound, a linear aliphatic epoxy compound, a biphenyl type epoxy compound, and an alicyclic epoxy compound. It may be one kind or a mixture of two kinds.
  • the alicyclic epoxy compound may mean a compound including at least one epoxidized aliphatic ring group.
  • the epoxidized aliphatic ring group means an epoxy group bonded to an alicyclic ring, for example, a 3,4-epoxycyclopentyl group, 3,4-epoxy Cyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- Functional groups, such as a (3, 4- epoxycyclo petyl) propyl group or 3- (3, 4- epoxy cyclohexyl) propyl group, can be illustrated.
  • the hydrogen atom constituting the alicyclic ring in the above may be optionally substituted with a substituent such as an alkyl group.
  • a substituent such as an alkyl group.
  • the content of the epoxy compound is preferably 5 to 40% by weight, and more preferably 10 to 30% by weight based on the total weight of the photopolymerizable composition for forming the bezel pattern. When it exceeds 40 weight%, the viscosity of a composition will rise and when it is less than 5 weight%, hardening sensitivity will fall.
  • the photopolymerizable composition for forming a bezel pattern includes an oxetane compound as another cationically polymerizable monomer.
  • the oxetane compound is a compound having a four-membered cyclic ether group in its molecular structure, and can act to lower the viscosity of the cationic cured ink composition (eg, less than 50 cPs at 25 ° C.).
  • oxetane compound For example, "Alon oxetane OXT-101", “Alon oxetane OXT-121", “Alon oxetane OXT-211", “Alon oxetane OXT-221" of Toagosei Co., Ltd., or "Alonoxetane OXT-212" etc. can be used. These can be used individually or in combination of 2 or more types.
  • the content of the oxetane compound may be 20 to 70% by weight, and more preferably 40 to 60% by weight, based on the total weight of the photopolymerizable composition for forming bezel patterns. When it exceeds 70 weight%, hardening sensitivity will be low, and when it is less than 20 weight%, a viscosity will rise and coating property will fall.
  • the oxetane compound of this invention can be used including the oxetane compound which has one oxetane ring, and the oxetane compound which has two oxetane rings.
  • the viscosity and the flexibility of the membrane can be adjusted.
  • an oxetane compound having one oxetane ring The content range of the oxetane compound having two oxetane rings is in the range of 1:16 to 1: 3. It is preferable to use.
  • the ink composition of the present invention includes, as a cationic photopolymerization initiator, a compound which produces a cation species or bronsted acid by irradiation of ultraviolet rays, for example, an iodonium salt or a sulfonium salt, but is not limited thereto. It doesn't happen.
  • the iodonium salt or sulfonium salt may cause a curing reaction to form a polymer by reacting monomers having unsaturated double bonds contained in the ink during UV curing, and may use a photosensitizer according to polymerization efficiency.
  • the photopolymerization initiator may have an anion represented by SbF 6- , AsF 6- , BF 6- , (C 6 F 5 ) 4 B-, PF 6 -or RfnF 6-n , but is not limited thereto. It doesn't happen.
  • the photopolymerization initiator is preferably included in 0.5 to 10% by weight based on the total weight of the photopolymerizable composition for bezel pattern formation. If the content of the photopolymerization initiator is less than 0.5% by weight, the curing reaction may not be sufficient. If the content of the photopolymerization initiator is more than 10% by weight, all of the photopolymerization initiator may not be dissolved or the viscosity may increase, thereby decreasing the coating property.
  • the ink composition may include a solvent having a boiling point of 190 to 280 ° C. in order to improve the coating property by decreasing the viscosity of the ink to increase fluidity, and to prevent a decrease in shading density per unit thickness, and more preferably, a boiling point.
  • the solvent which is 200-260 degreeC can be included.
  • the nozzle may not be dried during inkjet printing, and the curing rate may not be lowered, thereby causing problems in curing of the coating film.
  • any one or more selected from the group consisting of alcohols, glycols and glycol ethers having a boiling point of 190 to 280 ° C can be used.
  • the glycol-based ether having a boiling point of 190 to 280 ° C. may be an alkylene glycol alkyl ether having C 1 to C 6 carbon atoms in the alkyl glycol moiety, more preferably ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl Any one or more selected from the group consisting of ether, tetraethylene glycol alkyl ether, propylene glycol alkyl ether, dipropylene glycol alkyl ether, and glycol dialkylene ether may be used, and most preferably the number of carbon atoms in the alkyl ether portion is C1 to It is possible to use monoalkyl ether having one alkyl group of C4 or dialkyl ether having two alkyl groups of C1 to C4 number of carbon atoms in the alkyl ether portion.
  • the content of the solvent is preferably 1 to 40% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. When the content of the solvent is more than 40% by weight, the curing sensitivity is lowered.
  • the photopolymerizable composition for forming a bezel pattern includes a colorant.
  • the colorant may be used in the form of a pigment dispersion containing one or more pigments, dyes or mixtures thereof, and is not particularly limited as long as it can express colors as necessary.
  • carbon black, graphite, a metal oxide, an organic black pigment etc. can be used as said pigment.
  • Examples of carbon black include cysto 5HIISAF-HS, cysto KH, cysto 3HHAF-HS, cysto NH, cysto 3M, cysto 300HAF-LS, cysto 116HMMAF-HS, cysto 116MAF, cysto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA
  • aniline black, lactam black, or perylene black series may be used, but is not limited thereto.
  • the photopolymerizable composition for forming a bezel pattern is cured by irradiation of ultraviolet rays (for example, 250 or 450 nm), more preferably, long wavelength ultraviolet rays (for example, 360 nm to 410 nm), and thus a certain level of optical density (OD). Characterized in having a.
  • the content of the colorant is preferably 1 to 15% by weight, and more preferably 3 to 10% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. If the content of the colorant is less than 1% by weight, there is no level of OD applicable to the bezel, and if it is more than 15% by weight, the excess colorant is not dispersed in the ink and a precipitate may be formed.
  • the OD value may be maintained in the range of 0.1 to 1.5 per 1.0 ⁇ m of the film thickness.
  • the photopolymerizable composition for forming a bezel pattern includes a surfactant that lowers the surface tension of the ink composition to exhibit a small taper angle.
  • the surfactant is preferably included in 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight relative to the total weight of the photopolymerizable composition for bezel pattern formation.
  • amount of the surfactant is less than 0.1% by weight, the effect of lowering the surface tension of the composition is not sufficient, so that the coating cannot be uniformly applied when the composition is coated on the substrate, and when the content is greater than 5.0% by weight, the surfactant is used in an excessive amount. There is a problem that the compatibility and anti-foaming of the composition is rather reduced.
  • the bezel pattern forming photopolymerizable composition may further include a photosensitizer to compensate for the curability in the long wavelength active energy ray.
  • the photosensitizers are anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxy
  • Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Such as thioxan
  • the photosensitizer is preferably included in an amount of 1 to 200 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator. If less than 1 part by weight can not be expected to increase the curing sensitivity at the desired wavelength, if more than 200 parts by weight there is a problem in that the photosensitizer is not dissolved and the adhesion and crosslinking density of the pattern is reduced.
  • the photopolymerizable composition for forming a bezel pattern may further include an adhesion promoter as an additive.
  • the film attached to the bezel pattern is repeatedly contracted and expanded according to the use conditions such as temperature and humidity, so that the bezel pattern is stressed so that the film and the bezel may be removed from the glass substrate.
  • at least one silane compound selected from the group consisting of an alkoxy silane compound, an epoxy silane compound, an aminophenyl silane compound, an amino silane compound, a mercapto silane compound and a vinyl silane compound is used as an adhesion promoter. When used, excellent results can be obtained.
  • epoxy silane compounds are more preferable as the adhesion promoter of the present invention.
  • the adhesion promoter is preferably included in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably 2 to 10% by weight. If the amount is less than 0.1 wt%, the bezel pattern may not be prevented from being peeled from the glass substrate. If the amount is more than 15 wt%, the viscosity of the ink solution may be increased and the dispersibility may be low.
  • the photopolymerizable composition for forming a bezel pattern used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties. Therefore, when applying the photopolymerizable composition for forming the bezel pattern, it is preferable to install a UV-lamp immediately behind the inkjet head so as to be curable at the same time as inkjet printing.
  • the curing dose is 1 to 10,000 mJ / cm 2, and preferably 80 to 2,000 mJ / cm 2.
  • the photopolymerizable composition for forming a bezel pattern is cured by absorbing radiation in a wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.
  • the photopolymerizable composition for forming a bezel pattern is, for example, suitable for an inkjet process by having a viscosity of 1 to 20 mPa ⁇ s at 25 ° C.
  • the photopolymerizable composition for bezel pattern formation which has said viscosity range has favorable discharge at a process temperature.
  • the said process temperature means the temperature heated so that the viscosity of a curable ink composition may become low.
  • the process temperature may be 10 ° C to 100 ° C, preferably 20 ° C to 70 ° C.
  • the photopolymerizable composition for forming a bezel pattern may have a residual mass after elapse of two hours when evaporated in a convection oven at 35 ° C., for example, 85% or more, so that the evaporation rate is low, but the curing rate and the film properties are not poor. do.
  • An upper end portion of the bezel pattern formed of the photopolymerizable composition for forming a bezel pattern is attached to the upper substrate through an adhesive layer for forming an upper substrate. Since the adhesive for the upper base material such as a polyvinyl alcohol-based pressure-sensitive adhesive, a polyurethane-based pressure-sensitive adhesive and the like excellent adhesive force, when using the photopolymerizable composition for forming the bezel pattern it is possible to obtain an effect of improving the adhesion between the bezel pattern and the upper substrate.
  • the adhesive for the upper base material such as a polyvinyl alcohol-based pressure-sensitive adhesive, a polyurethane-based pressure-sensitive adhesive and the like excellent adhesive force, when using the photopolymerizable composition for forming the bezel pattern it is possible to obtain an effect of improving the adhesion between the bezel pattern and the upper substrate.
  • the method for manufacturing a bezel pattern of the display substrate of the present invention uses the photopolymerizable composition for forming the bezel pattern.
  • the method of manufacturing a bezel pattern of the display substrate of the present invention a) using the photopolymerizable composition for forming the bezel pattern, forming a bezel pattern on the substrate; And b) curing the bezel pattern.
  • the method for manufacturing a bezel pattern of the display substrate of the present invention may further include a step of cleaning and drying the substrate before the step of forming the bezel pattern. This is to selectively perform the surface treatment according to the surface energy of the substrate in order to improve the coating property of the ink and to remove stains caused by foreign substances.
  • the surface treatment may be performed by a treatment such as a wet surface treatment, UV ozone, atmospheric pressure plasma.
  • a method selected from inkjet printing, gravure coating, and reverse offset coating using an ultraviolet curing composition may be used instead of photolithography and screen printing. It is preferable that the viscosity of the ink composition of this invention is 1-20 mPa * s in order to apply the said method.
  • An ink composition having a low viscosity of 1 to 20 mPa ⁇ s is applied at a height of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, to form a bezel pattern on a specific portion of the substrate by the above method.
  • the applied composition is cured through exposure including ultraviolet rays, and as a result, a bezel pattern having a thin film thickness of 0.1 to 20 ⁇ m, more specifically 0.5 to 5 ⁇ m, can be produced.
  • a light source for curing the photopolymerizable composition for forming a bezel pattern of the present invention for example, mercury vapor arc (arc), carbon arc, Xe arc, LED curing machine, etc. which emit light having a wavelength of 250 to 450 nm, but not necessarily It is not limited.
  • the optical density after curing the photopolymerizable composition for forming the bezel pattern is 0.1 to 1.5 based on a film thickness of 1.0 ⁇ m, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.
  • the present invention provides a bezel pattern of a display substrate manufactured by the above method.
  • the bezel pattern refers to a pattern formed on the edges of various devices such as a watch and a display device.
  • the optical density of the bezel pattern may be 0.1 to 1.5 based on a film thickness of 1.0 ⁇ m, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.
  • the present invention provides a display substrate including the bezel pattern.
  • the display includes a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal
  • PDP plasma display panel
  • LED light emitting diode
  • OLED organic light emitting diode
  • LCD liquid crystal display
  • TFT thin film transistor-liquid crystal display
  • CRT cathode ray tube
  • A1 Carbon Black Pigment Dispersion (BK-5026, Tokushiki Co., Ltd.)
  • KBM-403 (3-glycidoxypropyl trimethoxysilane, Shin-Etsu Silicone)
  • DEGBEA diethylene glycol monobutyl ether acetate, hereinafter BCA, boiling point 248 degreeC
  • DEGEEA diethylene glycol monoethyl ether acetate, hereinafter ECA, boiling point 220 °C
  • G3 DEGDBE (diethylene glycol dibutyl ether, hereinafter BDGy, boiling point 250 °C)
  • G4 DPMA (dipropylene glycol methyl ether acetate, boiling point 220 °C)
  • G5 EGBE (ethylene glycol monobutyl ether, hereinafter BCs, boiling point 170 °C)
  • TPGBE tripropylene glycol butyl ether, boiling point 291 °C
  • G7 benzyl alcohol (boiling point 205 °C)
  • G8 diethylene glycol (boiling point 245 ° C)
  • H1 triethylene glycol divinyl ether, BASF
  • compositions prepared in Examples 1 to 5 and Comparative Examples 1 to 4 were coated on the cleaned LCD glass substrate by an inkjet coating method so as to have a thickness of 2 ⁇ m after curing.
  • the bezel pattern was formed by curing the coating layer by irradiating UV under the following conditions within 1 minute after coating.
  • UV irradiator used a high pressure mercury lamp, and was irradiated with a light amount of 1000mJ / cm 2 based on UV.
  • a bezel pattern was formed on the upper surface of the display panel (hereinafter referred to as Panel 1) according to the method of Preparation Example 1, and an NRT polarizing film manufactured by LG Chemical using an acrylic adhesive layer was attached as an upper substrate. After attachment, the surroundings were encapsulated with a sealant to prevent the ingress of moisture and foreign matter into the gap between the polarizing film and the pattern.
  • each composition was placed in a convection oven at a temperature of 35 degrees for a period of time to observe the rate of evaporation of the composition.
  • the definition of evaporation rate was calculated as the ratio of the residue to the initial relative value by placing each composition in an aluminum dish by 1 g weight using a micro balance and then measuring the weight of the composition remaining after the passage of time in a convection oven. The measurement results are shown in Table 2 below. After 2 hours have elapsed after the start of evaporation, the residual mass ratio is 85% or more, and less than 85%.
  • Each composition was continuously discharged for 1 minute using an experimental inkjet printer (UJ-200, UniJet), and then the discharge was stopped for 15 minutes to allow drying of the nozzle to take a rest time, and then again discharged onto paper. Was carried out. It was evaluated whether the discharge of each composition was performed smoothly. The measurement results are shown in Table 2 below. When the ink is normally discharged on the paper and a normal printed matter is output, the result is indicated by ⁇ . When the discharge is poor due to drying of the ink, the quality of the printed product is deteriorated. Is represented by X.
  • Each said composition was apply
  • a UV irradiation apparatus high pressure mercury lamp, Innocure 5000, Cheil UV
  • Example Viscosity Evaporation rate Jetting Stability Curing sensitivity Optical density / thickness
  • Examples 1 to 5 according to the present invention used a glycol alkyl ether solvent having a boiling point of 210 °C to 260 °C, because of the low evaporation rate was good jetting stability, the curing was also good.
  • Examples 6 to 7 used glycol and alcohol solvents having a boiling point of 190 ° C. to 280 ° C., and evaporation rate and jetting stability were good. Although the curing sensitivity was good, it was somewhat insufficient compared with Examples 1-5.
  • Comparative Example 1 used a glycol alkyl ether solvent having a relatively low boiling point of 170 ° C., so that the evaporation rate was high, and thus the jetting stability was poor.
  • Comparative Example 2 has a good boiling stability because the evaporation rate is low because the boiling point is 291 °C excessively high glycol alkyl ether solvent, but the curing rate was poor.
  • the boiling point of the monomer compounds such as ECC and DOX is higher than 210 ° C., but the jetting stability is good. Was needed.
  • the content of the non-reactive volatile component in the liquid film was low, there was no reduction in the thickness before or after curing, so that the shading density / thickness was relatively insufficient.
  • Comparative Example 4 contained more than 40% of the ratio of the ECC composition, although the solvent was included, unlike the Comparative Example 3, the viscosity was high, and thus, the temperature was required.

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Abstract

The present invention relates to a photopolymerizable composition for forming a bezel pattern comprising a colorant, an epoxy compound, an oxetane compound, a photopolymerization initiator, and a solvent having a boiling point of 190 to 280℃; a method for manufacturing a bezel pattern of a display substrate using the same; and a bezel pattern using the same.

Description

베젤 패턴 형성용 광중합성 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴A photopolymerizable composition for forming a bezel pattern, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby

본 출원은 2016.12.16.자로 출원된 한국특허출원 제10-2016-0172292호에 기초한 우선권의 이익을 주장하며, 해당 한국 특허출원의 문헌에 개시된 모든 내용은 본 명세서의 일부로서 포함된다.This application claims the benefit of priority based on Korean Patent Application No. 10-2016-0172292, filed Dec. 16, 2016, and all contents disclosed in the documents of that Korean Patent Application are incorporated as part of this specification.

본 발명은 베젤 패턴 형성용 광중합성 조성물, 이를 이용한 디스플레이 기판의 베젤 패턴의 제조방법 및 이에 의하여 제조된 베젤 패턴에 관한 것이다.The present invention relates to a photopolymerizable composition for forming a bezel pattern, a method of manufacturing a bezel pattern of a display substrate using the same, and a bezel pattern manufactured thereby.

TV, 모니터 등 디스플레이 기기에 있어, 기기 내부의 가장 자리 네 변에는 기기를 동작시키기 위해 전기신호를 인가하는 회로가 위치한다. 구리 또는 알루미늄과 같은 금속으로 이루어진 회로는 외부 빛을 반사하기 때문에, 이를 차단하기 위해 베젤이 필요하다. 종래에는 별도의 플라스틱 구조물 케이스를 이용하여 왔으나, 최근 스크린 인쇄나 잉크젯 등의 인쇄 방법을 이용하여 베젤 패턴을 터치스크린 또는 박막 트랜지스터 기판 위에 직접 형성하는 방법이 사용되고 있다.In display devices such as TVs and monitors, circuits for applying an electric signal to operate the device are located at four edges of the inside of the device. Circuits made of metals such as copper or aluminum reflect external light and require a bezel to block it. Conventionally, a separate plastic structure case has been used, but recently, a method of directly forming a bezel pattern on a touch screen or a thin film transistor substrate using a printing method such as screen printing or inkjet has been used.

이러한 잉크젯 방법을 이용하여, 베젤 패턴을 형성할 경우, 낮은 두께 또는 높은 두께를 적용하는 것이 용이하고, 높은 해상도의 패턴을 형성할 수 있으며, 낮은 점도의 물질을 적용할 수 있다.Using this inkjet method, when forming the bezel pattern, it is easy to apply a low or high thickness, it is possible to form a pattern of high resolution, it is possible to apply a low viscosity material.

그러나 이러한 잉크젯 방법을 사용할 때 있어, 잉크의 증발 속도가 충분히 느리지 않으면, 도 1과 같이 잉크젯 헤드의 미세 노즐 표면에 맺힌 미세 잉크 방울이 건조되기 쉽다. 건조된 미세 잉크 방울은 고체가 되어, 노즐 막힘을 유발하거나, 노즐의 불량을 야기할 수 있다.However, when using such an inkjet method, if the evaporation rate of the ink is not sufficiently slow, fine ink droplets formed on the surface of the fine nozzle of the inkjet head tend to dry as shown in FIG. The dried fine ink droplets may become solid, causing nozzle clogging or nozzle failure.

따라서 종래의 기술에서는 잉크 조성물의 증발 속도를 억제하기 위해도 2와 같이 비점이 낮은 용제를 제거하고, 비점이 높은 용제를 사용하거나, 비점이 높은 반응성 성분만으로 이루어진 무용제 조성물을 이용하고 있다. 비점이 높은 용제를 사용할 경우, 건조 문제는 해결할 수 있으나 증발이 너무 더디기 때문에, 경화 후에도 잔류 용제가 막내에 잔류하여 경화 속도 및 막 특성이 불량하다는 문제가 있었다. 또한, 반응성 성분만으로 이루어질 경우, 잉크 조성물의 점도를 낮추기 곤란하며, 또한 경화 시 수반되는 용매 증발이 없으므로 막의 두께를 낮출 수 없기 때문에, 낮은 두께에서 충분한 차폐력을 얻을 수 없는 문제가 있다.Therefore, in the related art, in order to suppress the evaporation rate of the ink composition, a solvent having a low boiling point is removed, a solvent having a high boiling point, or a solvent-free composition composed of only a reactive component having a high boiling point is used as in FIG. 2. When a solvent having a high boiling point is used, the drying problem can be solved, but since evaporation is too slow, a residual solvent remains in the film even after curing, resulting in poor curing rate and film characteristics. In addition, when only the reactive component is used, it is difficult to lower the viscosity of the ink composition, and since there is no solvent evaporation associated with curing, the thickness of the film cannot be lowered, so that a sufficient shielding force cannot be obtained at a low thickness.

따라서, 종래의 베젤 조성물에 대비해, 잉크젯 헤드 표면에서의 증발 속도는 낮으면서 경화 속도 및 막 특성이 불량하지 않은 조성물을 개발할 필요가 있다.Therefore, in contrast to the conventional bezel composition, there is a need to develop a composition having a low evaporation rate on the inkjet head surface and a poor curing rate and film properties.

[선행기술문헌][Preceding technical literature]

[특허문헌][Patent Documents]

(특허문헌 1) KR 10-2013-0112003 A(Patent Document 1) KR 10-2013-0112003 A

상기 종래 기술의 문제점을 해결하기 위하여, 본 발명은 높은 비등점을 지니면서도, 경화 반응 속도를 저하하지 않는 베젤 패턴 형성용 광중합성 조성물을 이용하여 베젤 패턴을 형성함으로써, 공정상에서 박막 내에 잔류하여 막 특성 저하 및 경화 저해를 나타내지 않는 베젤 패턴을 형성하는 것을 목적으로 한다.In order to solve the problems of the prior art, the present invention by forming a bezel pattern using a photopolymerizable composition for forming a bezel pattern having a high boiling point, but does not lower the curing reaction rate, thereby remaining in the thin film in the process film characteristics It aims at forming the bezel pattern which does not show a fall and hardening inhibition.

상기 과제를 해결하기 위하여, In order to solve the above problems,

본 발명은, 착색제, 에폭시 화합물, 옥세탄 화합물, 광중합 개시제 및 끓는점이 190~280℃인 용매를 포함하는 베젤 패턴 형성용 광중합성 조성물을 제공한다.This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.

또한 본 발명은, 상기 베젤 패턴 형성용 광중합성 조성물을 사용하여, 기판상에 베젤 패턴을 형성하는 단계; 및 상기 베젤 패턴을 경화하는 단계; 를 포함하는 디스플레이 기판용 베젤 패턴의 제조방법을 제공한다.In another aspect, the present invention, using the photopolymerizable composition for forming a bezel pattern, forming a bezel pattern on a substrate; And curing the bezel pattern. It provides a method of manufacturing a bezel pattern for a display substrate comprising a.

또한, 본 발명은, 상기 베젤 패턴 형성용 광중합성 조성물이 경화되어, 기판상에 형성된 디스플레이 기판용 베젤 패턴을 제공한다.In addition, the present invention provides a bezel pattern for a display substrate formed by curing the photopolymerizable composition for forming a bezel pattern.

또한, 본 발명은, 상기 디스플레이 기판용 베젤 패턴을 포함하는 디스플레이 기판을 제공한다.In addition, the present invention provides a display substrate including the bezel pattern for the display substrate.

본 발명에 따르면 높은 비등점을 지니면서도, 경화 반응 속도를 저하하지 않는 베젤 패턴 형성용 광중합성 조성물을 이용하기 때문에, 베젤 패턴을 형성함에 있어서, 공정상에서 박막 내에 잔류하여 막 특성 저하 및 경화 저해를 나타내지 않는다는 장점이 있다.According to the present invention, since the photopolymerizable composition for forming bezel patterns, which has a high boiling point and does not decrease the curing reaction rate, is used, in forming a bezel pattern, it remains in the thin film in the process and exhibits no deterioration in film properties and hardening inhibition. There is an advantage.

도 1은 종래 기술에 의한 잉크젯 공정을 나타낸 모식도이다.1 is a schematic diagram showing an inkjet process according to the prior art.

도 2는 또 다른 종래 기술에 의한 잉크젯 공정을 나타낸 모식도이다.Figure 2 is a schematic diagram showing another inkjet process according to the prior art.

이하, 본 발명을 보다 상세히 설명한다.Hereinafter, the present invention will be described in more detail.

본 발명은, 착색제, 에폭시 화합물, 옥세탄 화합물, 광중합 개시제 및 끓는점이 190~280℃인 용매를 포함하는 베젤 패턴 형성용 광중합성 조성물을 제공한다.This invention provides the photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC.

또한, 본 발명의 베젤 패턴 형성용 광중합성 조성물은 계면활성제, 밀착증진제, 희석제 및 광증감제로 이루어지는 군에서 선택되는 어느 하나 이상을 더 포함할 수 있다.In addition, the photopolymerizable composition for forming a bezel pattern of the present invention may further include any one or more selected from the group consisting of a surfactant, an adhesion promoter, a diluent and a photosensitizer.

베젤 패턴 형성용 광중합성 조성물에는 통상적으로 라디컬 중합형 화합물과 양이온 중합형 화합물이 주로 사용될 수 있다. 라디컬 중합형 화합물의 경우, 산소에 의한 경화 장애를 받기 때문에 박막의 경화에 적합하지 않으며, 또한 경화 수축이 크기 때문에 유리 기재와의 밀착성이 낮아 베젤 패턴 형성에 적합하지 않다. 반면에 양이온 중합형 화합물의 경우, 통상적으로 경화 수축율이 낮으며 산소에 의한 영향이 작기 때문에 박막을 경화하는 데 유리하다. Typically, a radically polymerizable compound and a cationic polymerizable compound may be mainly used in the photopolymerizable composition for forming a bezel pattern. The radically polymerizable compound is not suitable for curing a thin film because it suffers from a hardening disorder due to oxygen, and is not suitable for forming a bezel pattern due to its high adhesion shrinkage and low adhesion to a glass substrate. On the other hand, in the case of the cationic polymerization type compound, it is generally advantageous for curing the thin film because the curing shrinkage rate is low and the influence by oxygen is small.

본 발명에서 사용하는 베젤 패턴 형성용 광중합성 조성물은 양이온성 경화 성분으로서 에폭시 화합물을 포함한다. 상기 에폭시 화합물은 구체적으로 비스페놀형 에폭시 화합물, 노볼락형 에폭시 화합물, 글리시딜 에스테르형 에폭시 화합물, 글리시딜 아민형 에폭시 화합물, 선형 지방족 에폭시 화합물, 비페닐형 에폭시 화합물 및 지환식 에폭시 화합물 중에서 선택되는 1종 또는 2종의 혼합물일 수 있다.The photopolymerizable composition for bezel pattern formation used by this invention contains an epoxy compound as a cationic curing component. Specifically, the epoxy compound is selected from a bisphenol type epoxy compound, a novolak type epoxy compound, a glycidyl ester type epoxy compound, a glycidyl amine type epoxy compound, a linear aliphatic epoxy compound, a biphenyl type epoxy compound, and an alicyclic epoxy compound. It may be one kind or a mixture of two kinds.

상기 지환식 에폭시 화합물은, 에폭시화 지방족 고리기를 하나 이상 포함하는 화합물을 의미할 수 있다.The alicyclic epoxy compound may mean a compound including at least one epoxidized aliphatic ring group.

에폭시화 지방족 고리기를 포함하는 상기 지환족 에폭시 화합물에서, 상기 에폭시화 지방족 고리기는 지환식 고리에 결합된 에폭시 기를 의미하는 것으로, 예를 들면, 3,4-에폭시시클로펜틸기, 3,4-에폭시시클로헥실기, 3,4-에폭시시클로펜틸메틸기, 3,4-에폭시시클로헥실메틸기, 2-(3,4-에폭시시클로펜틸)에틸기, 2-(3,4-에폭시시클로헥실)에틸기, 3-(3,4-에폭시시클로페틸)프로필기 또는 3-(3,4-에폭시시클로헥실)프로필기 등의 관능기가 예시될 수 있다. 상기에서 지환식 고리를 구성하는 수소 원자는, 임의적으로 알킬기 등의 치환기에 의해 치환될 수도 있다. 상기 지환식 에폭시 화합물로는, 예를 들면, 이하에서 구체적으로 예시되는 화합물을 사용할 수 있으나, 사용할 수 있는 에폭시 화합물이 하기의 종류에 제한되는 것은 아니다.In the alicyclic epoxy compound containing an epoxidized aliphatic ring group, the epoxidized aliphatic ring group means an epoxy group bonded to an alicyclic ring, for example, a 3,4-epoxycyclopentyl group, 3,4-epoxy Cyclohexyl group, 3,4-epoxycyclopentylmethyl group, 3,4-epoxycyclohexylmethyl group, 2- (3,4-epoxycyclopentyl) ethyl group, 2- (3,4-epoxycyclohexyl) ethyl group, 3- Functional groups, such as a (3, 4- epoxycyclo petyl) propyl group or 3- (3, 4- epoxy cyclohexyl) propyl group, can be illustrated. The hydrogen atom constituting the alicyclic ring in the above may be optionally substituted with a substituent such as an alkyl group. As said alicyclic epoxy compound, although the compound specifically illustrated below can be used, the epoxy compound which can be used is not limited to the following types.

예컨대 디시클로펜타디엔디옥사이드, 시클로헥센옥사이드, 4-비닐-1,2-에폭시-4-비닐시클로헥센, 비닐시클로헥센디옥사이드, 리모넨모노옥사이드, 리모넨디옥사이드, (3,4-에폭시시클로헥실)메틸-3,4-에폭시시클로헥산카르복실레이트, 3-비닐시클로헥센옥사이드, 비스(2,3-에폭시시클로펜틸)에테르, 비스(3,4-에폭시시클로헥실메틸)아디페이트, 비스(3,4-에폭시-6-메틸시클로헥실메틸)아디페이트, (3,4-에폭시시클로헥실)메틸알코올, (3,4-에폭시-6-메틸시클로헥실)메틸-3,4-에폭시-6-메틸시클로헥산카르복실레이트, 에틸렌글리콜비스(3,4-에폭시시클로헥실)에테르, 3,4-에폭시시클로헥센카르본산 에틸렌글리콜디에스테르, (3,4-에폭시시클로헥실)에틸트리메톡시실란, 다이셀 코포레이션사의 셀록사이드 8000 등을 사용할 수 있다.For example, dicyclopentadiene dioxide, cyclohexene oxide, 4-vinyl-1,2-epoxy-4-vinylcyclohexene, vinylcyclohexene dioxide, limonene monooxide, limonene dioxide, (3,4-epoxycyclohexyl) methyl- 3,4-epoxycyclohexanecarboxylate, 3-vinylcyclohexene oxide, bis (2,3-epoxycyclopentyl) ether, bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4- Epoxy-6-methylcyclohexylmethyl) adipate, (3,4-epoxycyclohexyl) methyl alcohol, (3,4-epoxy-6-methylcyclohexyl) methyl-3,4-epoxy-6-methylcyclohexane Carboxylate, ethylene glycol bis (3,4-epoxycyclohexyl) ether, 3,4-epoxycyclohexene carboxylic acid ethylene glycol diester, (3,4-epoxycyclohexyl) ethyltrimethoxysilane, dicel corporation Celoxide 8000 etc. can be used.

상기 에폭시 화합물의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 5~40 중량%인 것이 바람직하며, 보다 바람직하게는 10~30 중량%일 수 있다. 40 중량%를 초과하면 조성물의 점도가 상승하고, 5 중량% 미만이면 경화 감도가 저하된다.The content of the epoxy compound is preferably 5 to 40% by weight, and more preferably 10 to 30% by weight based on the total weight of the photopolymerizable composition for forming the bezel pattern. When it exceeds 40 weight%, the viscosity of a composition will rise and when it is less than 5 weight%, hardening sensitivity will fall.

상기 베젤 패턴 형성용 광중합성 조성물은 다른 양이온 중합성 단량체로서 옥세탄 화합물을 포함한다.The photopolymerizable composition for forming a bezel pattern includes an oxetane compound as another cationically polymerizable monomer.

옥세탄 화합물는, 분자 구조 내에 4원 고리형 에테르기를 가지는 화합물로서, 양이온성 경화된 잉크 조성물의 점도를 낮추는(일례로, 25℃에서 50cPs 미만) 작용을 할 수 있다. The oxetane compound is a compound having a four-membered cyclic ether group in its molecular structure, and can act to lower the viscosity of the cationic cured ink composition (eg, less than 50 cPs at 25 ° C.).

구체적으로는, 3-에틸-3-히드록시메틸 옥세탄, 1,4-비스[(3-에틸-3-옥세타닐)메톡시메틸]벤젠, 3-에틸-3-(페녹시메틸)옥세탄, 디[(3-에틸-3-옥세타닐)메틸]에테르, 3-에틸-3-(2-에틸헥실옥시메틸)옥세탄, 3-에틸-3-시클로헥실옥시메틸 옥세탄 또는 페놀노볼락 옥세탄 등이 예시될 수 있다. 옥세탄 화합물로는, 예를 들면, 토아고세이㈜사의 「알론옥세탄 OXT-101」, 「알론옥세탄 OXT-121」, 「알론옥세탄 OXT-211」, 「알론옥세탄 OXT-221」 또는 「알론옥세탄 OXT-212」 등을 사용할 수 있다. 이들은 단독으로, 혹은 2종 이상을 조합으로 이용할 수 있다.Specifically, 3-ethyl-3-hydroxymethyl oxetane, 1,4-bis [(3-ethyl-3-oxetanyl) methoxymethyl] benzene, 3-ethyl-3- (phenoxymethyl) Oxetane, di [(3-ethyl-3-oxetanyl) methyl] ether, 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane, 3-ethyl-3-cyclohexyloxymethyl oxetane or Phenol novolac oxetane and the like can be exemplified. As an oxetane compound, For example, "Alon oxetane OXT-101", "Alon oxetane OXT-121", "Alon oxetane OXT-211", "Alon oxetane OXT-221" of Toagosei Co., Ltd., or "Alonoxetane OXT-212" etc. can be used. These can be used individually or in combination of 2 or more types.

상기 옥세탄 화합물의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 20~70 중량%인 것이 바람직하며, 보다 바람직하게는 40~60 중량%일 수 있다. 70 중량%를 초과하면 경화 감도가 낮고, 20 중량% 미만이면 점도가 상승하여 코팅성이 저하된다. The content of the oxetane compound may be 20 to 70% by weight, and more preferably 40 to 60% by weight, based on the total weight of the photopolymerizable composition for forming bezel patterns. When it exceeds 70 weight%, hardening sensitivity will be low, and when it is less than 20 weight%, a viscosity will rise and coating property will fall.

또한, 본 발명의 옥세탄 화합물은 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 포함하여 사용할 수 있다. 상기 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 함께 사용하는 경우에는 점도 및 막의 유연성을 조절할 수 있다는 장점이 있다. 상기와 같이 2종의 옥세탄 화합물을 함께 사용하는 경우, 1개의 옥세탄 고리를 갖는 옥세탄 화합물: 2개의 옥세탄 고리를 갖는 옥세탄 화합물의 함량범위는 1:16 내지 1:3의 범위로 사용하는 것이 바람직하다.In addition, the oxetane compound of this invention can be used including the oxetane compound which has one oxetane ring, and the oxetane compound which has two oxetane rings. When the oxetane compound having one oxetane ring and the oxetane compound having two oxetane rings are used together, the viscosity and the flexibility of the membrane can be adjusted. When two kinds of oxetane compounds are used together as described above, an oxetane compound having one oxetane ring: The content range of the oxetane compound having two oxetane rings is in the range of 1:16 to 1: 3. It is preferable to use.

본 발명의 잉크 조성물은 양이온성 광중합 개시제로서 자외선의 조사에 의해 양이온(cation) 종이나 브론스테드산을 만들어내는 화합물, 예를 들면 요오드늄 염 또는 설포늄 염 등을 포함하고 있으나, 반드시 이에 한정되는 것은 아니다.The ink composition of the present invention includes, as a cationic photopolymerization initiator, a compound which produces a cation species or bronsted acid by irradiation of ultraviolet rays, for example, an iodonium salt or a sulfonium salt, but is not limited thereto. It doesn't happen.

상기 요오드늄 염 또는 설포늄 염은 자외선 경화 과정에서 잉크에 함유된 불포화 이중결합을 갖는 모노머가 반응하여 고분자를 형성하는 경화 반응이 일어나도록 하며, 중합 효율에 따라 광증감제를 사용할 수도 있다.The iodonium salt or sulfonium salt may cause a curing reaction to form a polymer by reacting monomers having unsaturated double bonds contained in the ink during UV curing, and may use a photosensitizer according to polymerization efficiency.

일 예로, 상기 광중합 개시제는 SbF6-, AsF6-, BF6-, (C6F5)4B-, PF6- 혹은 RfnF6-n으로 표시되는 음이온을 갖는 것일 수 있으나, 반드시 이에 한정되는 것은 아니다. For example, the photopolymerization initiator may have an anion represented by SbF 6- , AsF 6- , BF 6- , (C 6 F 5 ) 4 B-, PF 6 -or RfnF 6-n , but is not limited thereto. It doesn't happen.

상기 광중합 개시제는 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 0.5~10 중량%로 포함되는 것이 바람직하다. 광중합 개시제의 함량이 0.5 중량% 미만이면 경화 반응이 충분하지 않고, 10 중량% 초과이면 모두 용해되지 않거나 점도가 증가하여 코팅성이 저하될 수 있다.The photopolymerization initiator is preferably included in 0.5 to 10% by weight based on the total weight of the photopolymerizable composition for bezel pattern formation. If the content of the photopolymerization initiator is less than 0.5% by weight, the curing reaction may not be sufficient. If the content of the photopolymerization initiator is more than 10% by weight, all of the photopolymerization initiator may not be dissolved or the viscosity may increase, thereby decreasing the coating property.

상기 잉크 조성물은 잉크의 점도를 저하시켜 유동성을 증가시킴으로써 코팅성을 개선하고, 단위 두께당 차광 밀도의 저하를 방지하기 위해 끓는점이 190~280℃인 용매를 포함할 수 있으며, 보다 바람직하게는 끓는점이 200~260℃인 용매를 포함할 수 있다. 본 발명은 상기와 같이 끓는점이 190~280℃인 용매를 사용함으로써 잉크젯 인쇄 시에 노즐 건조 발생하지 않으면서도, 경화 속도에 저하를 유발하지 않아 도막의 경화에 문제를 발생시키지 않을 수 있다.The ink composition may include a solvent having a boiling point of 190 to 280 ° C. in order to improve the coating property by decreasing the viscosity of the ink to increase fluidity, and to prevent a decrease in shading density per unit thickness, and more preferably, a boiling point. The solvent which is 200-260 degreeC can be included. In the present invention, by using a solvent having a boiling point of 190 to 280 ° C. as described above, the nozzle may not be dried during inkjet printing, and the curing rate may not be lowered, thereby causing problems in curing of the coating film.

본 발명에 있어서, 상기 용매로는 끓는점이 190~280℃인 알콜, 글리콜 및 글리콜계 에테르로 이루어지는 군에서 선택되는 어느 하나 이상을 사용할 수 있다.In the present invention, as the solvent, any one or more selected from the group consisting of alcohols, glycols and glycol ethers having a boiling point of 190 to 280 ° C can be used.

상기 끓는점이 190~280℃인 글리콜계 에테르는 알킬 글리콜 부의 탄소 원자 수가 C1~C6인 알킬렌 글리콜 알킬 에테르일 수 있으며, 보다 바람직하게는 에틸렌글리콜 알킬 에테르, 디에틸렌글리콜 알킬 에테르, 트리에틸렌글리콜 알킬 에테르, 테트라에틸렌글리콜 알킬 에테르, 프로필렌글리콜 알킬 에테르, 디프로필렌글리콜 알킬 에테르 및 글리콜 디알킬렌 에테르로 이루어지는 군에서 선택되는 어느 하나 이상을 사용할 수 있으며, 가장 바람직하게는 알킬 에테르부의 탄소 원자 수가 C1~C4의 알킬기를 1개를 갖는 모노 알킬 에테르이거나 또는 알킬 에테르부의 탄소 원자 수가 C1~C4의 알킬기를 2개를 갖는 디알킬 에테르를 사용할 수 있다.The glycol-based ether having a boiling point of 190 to 280 ° C. may be an alkylene glycol alkyl ether having C 1 to C 6 carbon atoms in the alkyl glycol moiety, more preferably ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl Any one or more selected from the group consisting of ether, tetraethylene glycol alkyl ether, propylene glycol alkyl ether, dipropylene glycol alkyl ether, and glycol dialkylene ether may be used, and most preferably the number of carbon atoms in the alkyl ether portion is C1 to It is possible to use monoalkyl ether having one alkyl group of C4 or dialkyl ether having two alkyl groups of C1 to C4 number of carbon atoms in the alkyl ether portion.

상기 용매의 함량은 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 1~40 중량%인 것이 바람직하다. 상기 용매의 함량이 40 중량% 초과이면 경화 감도가 저하된다. The content of the solvent is preferably 1 to 40% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. When the content of the solvent is more than 40% by weight, the curing sensitivity is lowered.

상기 베젤 패턴 형성용 광중합성 조성물은 착색제를 포함한다.The photopolymerizable composition for forming a bezel pattern includes a colorant.

상기 착색제로는 1종 이상의 안료, 염료 또는 이들의 혼합물을 포함하는 안료 분산액 형태로 사용할 수 있으며, 필요에 따른 색을 발현할 수 있다면 특별히 한정하지 않는다.The colorant may be used in the form of a pigment dispersion containing one or more pigments, dyes or mixtures thereof, and is not particularly limited as long as it can express colors as necessary.

본 발명의 일 구체예로서는, 상기 안료로서 카본 블랙, 흑연, 금속 산화물, 유기블랙 안료 등을 사용할 수 있다.As a specific example of this invention, carbon black, graphite, a metal oxide, an organic black pigment etc. can be used as said pigment.

카본 블랙의 예로는 시스토 5HIISAF-HS, 시스토 KH, 시스토 3HHAF-HS, 시스토 NH, 시스토 3M, 시스토 300HAF-LS, 시스토 116HMMAF-HS, 시스토 116MAF, 시스토 FMFEF-HS, 시스토 SOFEF, 시스토VGPF, 시스토 SVHSRF-HS 및 시스토 SSRF(동해카본 ㈜); 다이어그램 블랙 II, 다이어그램 블랙 N339, 다이어그램 블랙 SH, 다이어그램 블랙 H, 다이어그램 LH, 다이어그램 HA, 다이어그램 SF, 다이어그램 N550M, 다이어그램 M, 다이어그램 E, 다이어그램 G, 다이어그램 R, 다이어그램 N760M, 다이어그램 LR, #2700, #2600, #2400, #2350, #2300, #2200, #1000, #980, #900, MCF88, #52, #50, #47, #45, #45L, #25, #CF9, #95, #3030, #3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B 및 OIL31B(미쯔비시화학㈜) ; PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, 및 LAMP BLACK-101(대구사㈜); RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, 및 RAVEN-1170(콜롬비아 카본㈜) 또는 이들의 혼합물 등을 들 수 있다.Examples of carbon black include cysto 5HIISAF-HS, cysto KH, cysto 3HHAF-HS, cysto NH, cysto 3M, cysto 300HAF-LS, cysto 116HMMAF-HS, cysto 116MAF, cysto FMFEF-HS , Sisto SOFEF, Sisto VGPF, Sisto SVHSRF-HS and Sisto SSRF (Donghae Carbon Co., Ltd.); Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, MA100, MA40, OIL7B, OIL9B, OIL11B, OIL30B and OIL31B (Mitsubishi Chemical Corporation); PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX- 200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101 (Daegu Corporation); RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN- 820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN-2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, RAVEN-1170 (Colombia Carbon, Inc.), or mixtures thereof.

상기 유기블랙 안료로 아닐린 블랙, 락탐 블랙 또는 페릴렌 블랙계열 등을 사용할 수 있으나, 이로 한정하는 것은 아니다.As the organic black pigment, aniline black, lactam black, or perylene black series may be used, but is not limited thereto.

본 발명에서 베젤 패턴 형성용 광중합성 조성물은 자외선(일예로 250 또는 450nm), 보다 바람직하게는 장파장의 자외선 (일예로 360 nm 내지 410 nm)의 조사에 의해 경화되어 일정 수준의 OD(Optical Density)를 갖는 것을 특징으로 한다. 이를 위해, 상기 착색제의 함량은 베젤 패턴 형성용 광중합성 조성물의 전체 중량에 대하여 1 내지 15 중량%인 것이 바람직하며, 보다 바람직하게는 3 내지 10 중량%일 수 있다. 착색제의 함량이 1중량% 미만일 경우, 베젤에 적용할 만한 수준의 OD가 나타나지 않으며, 15중량% 초과일 경우, 과량의 착색제가 잉크에 분산되지 않고 침전물이 형성될 수 있다.In the present invention, the photopolymerizable composition for forming a bezel pattern is cured by irradiation of ultraviolet rays (for example, 250 or 450 nm), more preferably, long wavelength ultraviolet rays (for example, 360 nm to 410 nm), and thus a certain level of optical density (OD). Characterized in having a. To this end, the content of the colorant is preferably 1 to 15% by weight, and more preferably 3 to 10% by weight based on the total weight of the photopolymerizable composition for forming bezel patterns. If the content of the colorant is less than 1% by weight, there is no level of OD applicable to the bezel, and if it is more than 15% by weight, the excess colorant is not dispersed in the ink and a precipitate may be formed.

상기 착색제의 함량이 상기 범위 내인 경우 OD 값이 막 두께 1.0㎛ 당 0.1~1.5의 범위로 유지할 수 있다.When the content of the colorant is within the above range, the OD value may be maintained in the range of 0.1 to 1.5 per 1.0 μm of the film thickness.

상기 베젤 패턴 형성용 광중합성 조성물은 작은 테이퍼 각을 나타내기 위해 잉크 조성물의 표면장력을 낮춰주는 계면활성제를 포함한다.The photopolymerizable composition for forming a bezel pattern includes a surfactant that lowers the surface tension of the ink composition to exhibit a small taper angle.

상기 계면활성제로는 시판품을 사용할 수 있으며, 예를 들면DIC(DaiNippon Ink & Chemicals) 사의 Megafack F-444, F-475, F-478, F-479, F-484, F-550, F-552, F-553, F-555, F-570, RS-75 또는 아사히 가라스 사의 Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 및 S-145 또는 스미토모 스리엠 사의 Fluorad FC-93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 및 FC-4430 또는 듀퐁 사의 Zonyl FS-300, FSN, FSN-100 및 FSO 및 BYK사의 BYK-306, BYK-310, BYK-320, BYK-331, BYK-333, BYK-342, BYK-350, BYK-354, BYK-355, BYK-356, BYK-358N, BYK-359, BYK-361N, BYK-381, BYK-370, BYK-371, BYK-378, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, BYK-SILCLEAN 3700 및 BYK-UV 3570 또는 테고 사의 Rad 2100, Rad 2011, Glide 100, Glide 410, Glide 450, Flow 370 및 Flow 425 등으로 이루어진 군에서 선택되는 것을 사용할 수 있다.Commercially available products may be used as the surfactant, for example, Megafack F-444, F-475, F-478, F-479, F-484, F-550, F-552, manufactured by DaiNippon Ink & Chemicals Co., Ltd. Surflon S-111, S-112, S-113, S-121, S-131, S-132, S-141 and F-553, F-555, F-570, RS-75 or Asahi Glass S-145 or Sumitomo 3M's Fluorad FC-93, FC-95, FC-98, FC-129, FC-135, FC-170C, FC-430 and FC-4430 or Zonyl FS-300, FSN from Dupont, BYK-306, BYK-310, BYK-320, BYK-331, BYK-333, BYK-342, BYK-350, BYK-354, BYK-355, BYK-356, BYK- 358N, BYK-359, BYK-361N, BYK-381, BYK-370, BYK-371, BYK-378, BYK-388, BYK-392, BYK-394, BYK-399, BYK-3440, BYK-3441, BYKETOL-AQ, BYK-DYNWET 800, BYK-SILCLEAN 3700 and BYK-UV 3570 or Tego's Rad 2100, Rad 2011, Glide 100, Glide 410, Glide 450, Flow 370 and Flow 425 Can be.

상기 계면활성제는 베젤 패턴 형성용 광중합성 조성물 총 중량에 대해 0.1 내지 5.0 중량%, 보다 바람직하게는 0.5 내지 3.0 중량%로 포함되는 것이 바람직하다. 상기 계면활성제의 함량이 0.1 중량% 미만일 경우에는 조성물의 표면장력을 낮추는 효과가 충분치 않아 기재에 조성물을 코팅 시 균일하게 도포할 수 없고, 5.0 중량%를 초과할 경우에는 계면활성제가 과량으로 사용되어 조성물의 상용성 및 소포성이 오히려 감소하게 되는 문제점이 있다.The surfactant is preferably included in 0.1 to 5.0% by weight, more preferably 0.5 to 3.0% by weight relative to the total weight of the photopolymerizable composition for bezel pattern formation. When the amount of the surfactant is less than 0.1% by weight, the effect of lowering the surface tension of the composition is not sufficient, so that the coating cannot be uniformly applied when the composition is coated on the substrate, and when the content is greater than 5.0% by weight, the surfactant is used in an excessive amount. There is a problem that the compatibility and anti-foaming of the composition is rather reduced.

상기 베젤 패턴 형성용 광중합성 조성물은 장파장 활성 에너지 선에서의 경화성을 보완하기 위해 광 증감제를 더 포함할 수 있다.The bezel pattern forming photopolymerizable composition may further include a photosensitizer to compensate for the curability in the long wavelength active energy ray.

상기 광 증감제는 안트라센, 9,10-디부톡시안트라센, 9,10-디메톡시The photosensitizers are anthracene, 9,10-dibutoxyanthracene, 9,10-dimethoxy

안트라센, 9,10-디에톡시안트라센, 2-에틸-9,10-디메톡시안트라센 등의 안트라센계 화합물; 벤조페논, 4,4-비스(디메틸아미노)벤조페논, 4,4-비스(디에틸아미노)벤조페논, 2,4,6-트리메틸아미노벤조페논, 메틸-o-벤조일벤조에이트, 3,3-디메틸-4-메톡시벤조페논, 3,3,4,4-테트라(t-부틸퍼옥시카보닐)벤조페논 등의 벤조페논계 화합물; 아세토페논; 디메톡시아세토페논, 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 프로판온 등의 케톤계 화합물; 페릴렌; 9-플로레논, 2-크로로-9-프로레논, 2-메틸-9-플로레논 등의 플로레논계 화합물; 티옥산톤, 2,4-디에틸 티옥산톤, 2-클로로 티옥산톤, 1-클로로-4-프로필옥시 티옥산톤, 이소프로필티옥산톤(ITX), 디이소프로필티옥산톤 등의 티옥산톤계 화합물; 크산톤, 2-메틸크산톤 등의 크산톤계 화합물; 안트라퀴논, 2-메틸 안트라퀴논, 2-에틸 안트라퀴논, t-부틸 안트라퀴논, 2,6-디클로로-9,10- 안트라퀴논 등의 안트라퀴논계 화합물; 9-페닐아크리딘, 1,7-비스(9-아크리디닐)헵탄, 1,5-비스(9-아크리디닐펜탄), 1,3-비스(9-아크리디닐)프로판 등의 아크리딘계 화합물; 벤질, 1,7,7-트리메틸-비시클로[2,2,1]헵탄-2,3-디온, 9,10-펜안트렌퀴논 등의 디카보닐 화합물; 2,4,6-트리메틸벤조일 디페닐포스핀 옥사이드, 비스(2,6-디메톡시벤조일)-2,4,4-트리메틸펜틸 포스핀 옥사이드 등의 포스핀 옥사이드계 화합물; 메틸-4-(디메틸아미노)벤조에이트, 에틸-4-(디메틸아미노)벤조에이트, 2-n-부톡시에틸-4-(디메틸아미노)벤조에이트 등의 벤조에이트계 화합물; 2,5-비스(4-디에틸아미노벤잘)시클로펜타논, 2,6-비스(4-디에틸아미노벤잘)시클로헥사논, 2,6-비스(4-디에틸아미노벤잘)-4-메틸-시클로펜타논 등의 아미노 시너지스트; 3,3-카본닐비닐-7-(디에틸아미노)쿠마린, 3-(2-벤조티아졸일)-7-(디에틸아미노)쿠마린, 3-벤조일-7-(디에틸아미노)쿠마린, 3-벤조일-7-메톡시-쿠마린, 10,10-카르보닐비스[1,1,7,7-테트라메틸-2,3,6,7-테트라히드로-1H,5H,11H-C1]-벤조피라노[6,7,8-ij]-퀴놀리진-11-온 등의 쿠마린계 화합물; 4-디에틸아미노 칼콘, 4-아지드벤잘아세토페논 등의 칼콘 화합물; 2-벤조일메틸렌; 및 3-메틸-b-나프토티아졸린으로 이루어진 군으로부터 선택되는 1종 이상일 수 있다.Anthracene-based compounds such as anthracene, 9,10-diethoxy anthracene and 2-ethyl-9,10-dimethoxyanthracene; Benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoylbenzoate, 3,3 Benzophenone compounds such as dimethyl-4-methoxybenzophenone and 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Acetophenone; Ketone compounds such as dimethoxy acetophenone, diethoxy acetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, and propanone; Perylene; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone (ITX) and diisopropyl thioxanthone Thioxanthone type compounds; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinylpentane), 1,3-bis (9-acridinyl) propane Acridine-based compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, 9,10-phenanthrenequinone; Phosphine oxide compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentyl phosphine oxide; Benzoate compounds such as methyl-4- (dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate and 2-n-butoxyethyl-4- (dimethylamino) benzoate; 2,5-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-diethylaminobenzal) cyclohexanone, 2,6-bis (4-diethylaminobenzal) -4- Amino synergists such as methyl-cyclopentanone; 3,3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7- (diethylamino) coumarin, 3 -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H-C1] -benzo Coumarin-based compounds such as pyrano [6,7,8-ij] -quinolizine-11-one; Chalcone compounds such as 4-diethylamino chalcone and 4-azidebenzalacetophenone; 2-benzoylmethylene; And 3-methyl-b-naphthothiazoline may be one or more selected from the group consisting of.

상기 광 증감제는 광중합 개시제 100 중량부에 대해, 1 내지 200 중량부로 포함되는 것이 바람직하고, 더욱 바람직하게는 10 내지 100 중량부로 포함된다. 1 중량부 미만일 경우에는 원하는 파장에서의 경화감도 상승 작용을 기대할 수 없으며, 200 중량부 초과일 경우 광 증감제가 용해되지 못하고 패턴의 접착력 및 가교 밀도를 저하시키는 문제점이 있다.The photosensitizer is preferably included in an amount of 1 to 200 parts by weight, more preferably 10 to 100 parts by weight, based on 100 parts by weight of the photopolymerization initiator. If less than 1 part by weight can not be expected to increase the curing sensitivity at the desired wavelength, if more than 200 parts by weight there is a problem in that the photosensitizer is not dissolved and the adhesion and crosslinking density of the pattern is reduced.

상기 베젤 패턴 형성용 광중합성 조성물은 첨가제로서 밀착증진제를 더 포함할 수 있다.The photopolymerizable composition for forming a bezel pattern may further include an adhesion promoter as an additive.

베젤 패턴 위에 부착된 필름은 온도와 습도 등 사용 조건에 따라 수축과 팽창을 반복함으로써, 베젤 패턴에 응력이 가해지게 되어 필름과 베젤이 유리 기재에서 탈락될 수 있다. 이를 방지하기 위해 밀착증진제로서 알콕시 실란계 화합물, 에폭시 실란계 화합물, 아미노페닐 실란계 화합물, 아미노 실란계 화합물, 메르캅토 실란계 화합물 및 비닐 실란계 화합물로 이루어진 군으로부터 선택되는 1종 이상의 실란계 화합물을 사용할 경우 우수한 결과를 나타낼 수 있다.The film attached to the bezel pattern is repeatedly contracted and expanded according to the use conditions such as temperature and humidity, so that the bezel pattern is stressed so that the film and the bezel may be removed from the glass substrate. In order to prevent this, at least one silane compound selected from the group consisting of an alkoxy silane compound, an epoxy silane compound, an aminophenyl silane compound, an amino silane compound, a mercapto silane compound and a vinyl silane compound is used as an adhesion promoter. When used, excellent results can be obtained.

이 중에서도 에폭시 실란계 화합물이 본 발명의 밀착증진제로 더욱 바람직하다.Among these, epoxy silane compounds are more preferable as the adhesion promoter of the present invention.

상기 밀착증진제는 잉크 조성물 총 중량에 대해 0.1 내지 15 중량%로 포함되는 것이 바람직하며, 보다 바람직하게는 2 내지 10 중량%로 포함된다. 0.1 중량% 미만일 경우에는 베젤 패턴이 유리 기재로부터 박리하는 것을 방지하여 주지 못하며, 15 중량% 초과인 경우에는 잉크 용액의 점도가 상승하고 분산성이 낮은 문제점이 있다.The adhesion promoter is preferably included in 0.1 to 15% by weight based on the total weight of the ink composition, more preferably 2 to 10% by weight. If the amount is less than 0.1 wt%, the bezel pattern may not be prevented from being peeled from the glass substrate. If the amount is more than 15 wt%, the viscosity of the ink solution may be increased and the dispersibility may be low.

본 발명에서 사용하는 베젤 패턴 형성용 광중합성 조성물은 잉크젯 프린팅 직후 짧은 시간 내에 퍼짐이 일어나서, 우수한 도막 특성을 나타내며, 경화되어 우수한 접착 특성을 나타낸다. 따라서, 상기 베젤 패턴 형성용 광중합성 조성물을 적용시에는 잉크젯 프린팅과 동시에 경화가 가능하도록 잉크젯 헤드 바로 뒤에 UV-lamp를 설치하는 것이 바람직하다. The photopolymerizable composition for forming a bezel pattern used in the present invention spreads within a short time immediately after inkjet printing, exhibits excellent coating film properties, and cures to exhibit excellent adhesive properties. Therefore, when applying the photopolymerizable composition for forming the bezel pattern, it is preferable to install a UV-lamp immediately behind the inkjet head so as to be curable at the same time as inkjet printing.

상기 베젤 패턴 형성용 광중합성 조성물은 경화 도즈량이 1~10,000 mJ/㎠, 바람직하게는 80~2,000 mJ/㎠이다.In the photopolymerizable composition for forming a bezel pattern, the curing dose is 1 to 10,000 mJ / cm 2, and preferably 80 to 2,000 mJ / cm 2.

상기 베젤 패턴 형성용 광중합성 조성물은 250 nm 내지 450 nm, 바람직하게는 360 nm 내지 410 nm의 파장 범위에서 방사선을 흡수하여 경화된다.The photopolymerizable composition for forming a bezel pattern is cured by absorbing radiation in a wavelength range of 250 nm to 450 nm, preferably 360 nm to 410 nm.

상기 베젤 패턴 형성용 광중합성 조성물은 일 예로 25℃에서 1 내지 20 mPa·s의 점도를 가짐으로써 잉크젯 공정에 적합하다. 상기의 점도 범위를 갖는 베젤 패턴 형성용 광중합성 조성물은 공정 온도에서의 토출이 양호하다. 상기 공정 온도는 경화형 잉크 조성물의 점도가 낮아지도록 가열한 온도를 의미한다. 공정 온도는 10℃ 내지 100℃일 수 있으며, 바람직하게는 20℃ 내지 70℃일 수 있다.The photopolymerizable composition for forming a bezel pattern is, for example, suitable for an inkjet process by having a viscosity of 1 to 20 mPa · s at 25 ° C. The photopolymerizable composition for bezel pattern formation which has said viscosity range has favorable discharge at a process temperature. The said process temperature means the temperature heated so that the viscosity of a curable ink composition may become low. The process temperature may be 10 ° C to 100 ° C, preferably 20 ° C to 70 ° C.

또한, 상기 베젤 패턴 형성용 광중합성 조성물은 일 예로 35℃의 대류 오븐에서 증발시켰을 때 2시간 경과 후의 잔여 질량이 85% 이상 일 수 있어 증발 속도는 낮으면서도, 경화 속도 및 막 특성이 불량하지 않게 된다.In addition, the photopolymerizable composition for forming a bezel pattern may have a residual mass after elapse of two hours when evaporated in a convection oven at 35 ° C., for example, 85% or more, so that the evaporation rate is low, but the curing rate and the film properties are not poor. do.

상기 베젤 패턴 형성용 광중합성 조성물로 형성한 베젤 패턴의 상단부는 상부 기재용 점착제층을 개재하여 상부 기재와 부착되는데, 상기 베젤 패턴 형성용 광중합성 조성물은 아크릴계 점착제, 스티렌 부타디엔 고무계 점착제, 에폭시 점착제, 폴리비닐알코올계 점착제, 폴리우레탄계 점착제 등의 상부 기재용 점착제와 우수한 부착력을 나타내므로, 상기 베젤 패턴 형성용 광중합성 조성물을 사용할 경우 베젤 패턴과 상부 기재 간의 부착력이 개선되는 효과를 얻을 수 있다.An upper end portion of the bezel pattern formed of the photopolymerizable composition for forming a bezel pattern is attached to the upper substrate through an adhesive layer for forming an upper substrate. Since the adhesive for the upper base material such as a polyvinyl alcohol-based pressure-sensitive adhesive, a polyurethane-based pressure-sensitive adhesive and the like excellent adhesive force, when using the photopolymerizable composition for forming the bezel pattern it is possible to obtain an effect of improving the adhesion between the bezel pattern and the upper substrate.

본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은 상기 베젤 패턴 형성용 광중합성 조성물을 이용한다.The method for manufacturing a bezel pattern of the display substrate of the present invention uses the photopolymerizable composition for forming the bezel pattern.

구체적으로, 본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은, a) 상기 베젤 패턴 형성용 광중합성 조성물을 사용하여, 기판 상에 베젤 패턴을 형성하는 단계; 및 b) 상기 베젤 패턴을 경화하는 단계;를 포함한다.Specifically, the method of manufacturing a bezel pattern of the display substrate of the present invention, a) using the photopolymerizable composition for forming the bezel pattern, forming a bezel pattern on the substrate; And b) curing the bezel pattern.

또한 본 발명의 디스플레이 기판의 베젤 패턴의 제조방법은, 상기 a) 베젤 패턴을 형성하는 단계 이전에, 기판의 세정 및 건조 단계를 더 포함할 수 있다. 이는 잉크의 코팅성 향상 및 이물질로 인한 얼룩의 제거를 위해 기판의 표면에너지에 따라 표면 처리를 선택적으로 실시하기 위함이다.In addition, the method for manufacturing a bezel pattern of the display substrate of the present invention may further include a step of cleaning and drying the substrate before the step of forming the bezel pattern. This is to selectively perform the surface treatment according to the surface energy of the substrate in order to improve the coating property of the ink and to remove stains caused by foreign substances.

구체적으로 상기 표면 처리는 습식 표면처리, UV 오존, 상압 플라즈마 등의 처리에 의하여 실시 될 수 있다.Specifically, the surface treatment may be performed by a treatment such as a wet surface treatment, UV ozone, atmospheric pressure plasma.

상기 기판상에 베젤패턴을 형성하는 방법으로는 포토리소그라피 및 스크린 인쇄 대신 자외선 경화 조성물을 이용한 잉크젯(Inkjet) 인쇄, 그라비아(Gravure) 코팅 및 리버스 오프셋(Reverse offset) 코팅 중에서 선택된 방법을 사용할 수 있다. 상기 방법을 적용하기 위해 본 발명의 잉크 조성물의 점도는 1 내지 20 mPa·s 인 것이 바람직하다. As a method of forming the bezel pattern on the substrate, a method selected from inkjet printing, gravure coating, and reverse offset coating using an ultraviolet curing composition may be used instead of photolithography and screen printing. It is preferable that the viscosity of the ink composition of this invention is 1-20 mPa * s in order to apply the said method.

상기의 방법으로 기판의 특정 부분에 베젤 패턴을 형성하기 위해 1 내지 20 mPa·s의 낮은 점도를 지니는 잉크 조성물을 0.1 내지 20 ㎛, 보다 구체적으로는 0.5 내지 5 ㎛의 높이로 도포한다. 도포된 상기 조성물은 자외선을 포함하는 노광을 통해 경화되며, 그 결과 0.1 내지 20 ㎛, 보다 구체적으로는 0.5 내지 5 ㎛의 얇은 막 두께를 지니는 베젤 패턴이 제조될 수 있다.An ink composition having a low viscosity of 1 to 20 mPa · s is applied at a height of 0.1 to 20 μm, more specifically 0.5 to 5 μm, to form a bezel pattern on a specific portion of the substrate by the above method. The applied composition is cured through exposure including ultraviolet rays, and as a result, a bezel pattern having a thin film thickness of 0.1 to 20 μm, more specifically 0.5 to 5 μm, can be produced.

본 발명의 베젤 패턴 형성용 광중합성 조성물을 경화시키기 위한 광원으로는, 예컨대 파장이 250 내지 450㎚의 광을 발산하는 수은 증기 아크(arc), 탄소 아크, Xe 아크, LED 경화기 등이 있으나 반드시 이에 국한되지는 않는다.As a light source for curing the photopolymerizable composition for forming a bezel pattern of the present invention, for example, mercury vapor arc (arc), carbon arc, Xe arc, LED curing machine, etc. which emit light having a wavelength of 250 to 450 nm, but not necessarily It is not limited.

상기 베젤 패턴 형성용 광중합성 조성물을 경화시킨 후의 광학밀도는 막 두께 1.0㎛ 기준으로 0.1 내지 1.5이며, 필요에 따라, 0.5 내지 1.0일 수 있다. 이 경우 베젤패턴에 의한 차폐특성이 우수한 장점이 있다. 광학밀도가 1.5를 초과할 경우에는 투입해야 할 안료의 요구 함량이 매우 높아지기 때문에 잉크의 제조 및 잉크젯 공정에 악영향을 미칠 수 있으며, 베젤 패턴 형성용 광중합성 조성물이 방사선에 의한 경화되는 것을 저해 할 수 있다.The optical density after curing the photopolymerizable composition for forming the bezel pattern is 0.1 to 1.5 based on a film thickness of 1.0 μm, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.

본 발명은 상기 방법에 의해 제조된 디스플레이 기판의 베젤 패턴을 제공한다. 본 발명에서 베젤패턴은 시계, 디스플레이 장치 등 각종 장치의 테두리부분에 형성되는 패턴을 말한다.The present invention provides a bezel pattern of a display substrate manufactured by the above method. In the present invention, the bezel pattern refers to a pattern formed on the edges of various devices such as a watch and a display device.

상기 베젤패턴의 광학밀도는 막 두께 1.0㎛ 기준으로 0.1 내지 1.5이며, 필요에 따라, 0.5 내지 1.0일 수 있다. 이 경우 베젤패턴에 의한 차폐특성이 우수한 장점이 있다. 광학밀도가 1.5를 초과할 경우에는 투입해야 할 안료의 요구 함량이 매우 높아지기 때문에 잉크의 제조 및 잉크젯 공정에 악영향을 미칠 수 있으며, 베젤 패턴 형성용 광중합성 조성물이 방사선에 의한 경화되는 것을 저해 할 수 있다.The optical density of the bezel pattern may be 0.1 to 1.5 based on a film thickness of 1.0 μm, and may be 0.5 to 1.0 as necessary. In this case, there is an advantage of excellent shielding characteristics by the bezel pattern. If the optical density exceeds 1.5, the required content of the pigment to be added is very high, which may adversely affect the ink manufacturing and inkjet process, and may inhibit the curing of the photopolymerizable composition for bezel pattern formation by radiation. have.

또한, 본 발명은 상기 베젤 패턴을 포함하는 디스플레이 기판을 제공한다.In addition, the present invention provides a display substrate including the bezel pattern.

상기 디스플레이는 플라즈마 디스플레이 패널(Plasma Display Panel, PDP), 발광 다이오드(Light Emitting Diode, LED), 유기 발광 소자(Organic Light Emitting Diode, OLED), 액정 표시 장치(Liquid Crystal Display, LCD), 박막 트랜지스터 액정 표시 장치(Thin Film Transistor- Liquid Crystal Display, LCD-TFT) 및 음극선관(Cathode Ray Tube, CRT) 중 어느 하나에 사용되는 것일 수 있다.The display includes a plasma display panel (PDP), a light emitting diode (LED), an organic light emitting diode (OLED), a liquid crystal display (LCD), a thin film transistor liquid crystal The display device may be used in any one of a thin film transistor-liquid crystal display (LCD-TFT) and a cathode ray tube (CRT).

이하, 본 발명을 실시예를 들어 상세하게 설명한다. 하기 실시예는 본 발명을 설명하기 위한 것으로, 본 발명의 범위는 하기의 특허청구범위에 기재된 범위 및 그 치환 및 변경을 포함하며, 실시예의 범위로 한정되지 않는다.Hereinafter, an Example is given and this invention is demonstrated in detail. The following examples are provided to illustrate the present invention, and the scope of the present invention includes the ranges described in the following claims, their substitutions and changes, and is not limited to the examples.

실시예 Example

하기 표 1의 조성으로 혼합한 후 24시간 동안 교반하여 베젤 패턴 형성용 조성물을 제조하였다.After mixing to the composition of Table 1 and stirred for 24 hours to prepare a composition for forming a bezel pattern.

안료분산액(안료)Pigment Dispersion (Pigment) 에폭시Epoxy 옥세탄Oxetane 광개시제Photoinitiator 밀착증진제Adhesion promoter 용매menstruum 바인더bookbinder 실시예Example AA BB CC DD EE GG HH 1One 55(13.75)55 (13.75) 55 2020 D1: 1D1: 1 E1: 0.5E1: 0.5 G1: 18.5G1: 18.5 -- 22 30(7.5)30 (7.5) 1515 3535 D1: 3D1: 3 E2: 0.5E2: 0.5 G1: 10G1: 10 H1: 6.5H1: 6.5 33 15(3.75)15 (3.75) 2525 2020 D2: 5D2: 5 E1: 1E1: 1 G2: 15G2: 15 H2: 19H2: 19 44 30(7.5)30 (7.5) 88 3232 D3: 5D3: 5 E2: 3E2: 3 G3: 10G3: 10 H3: 12H3: 12 55 5(1.25)5 (1.25) 1515 6565 D4: 1D4: 1 E1: 0.5E1: 0.5 G4: 15G4: 15 -- 66 10(2.5)10 (2.5) 1515 5555 D4: 1D4: 1 E1: 0.5E1: 0.5 G7: 10G7: 10 H1: 10H1: 10 77 20(5.0)20 (5.0) 1010 5050 D4: 1D4: 1 E1: 0.5E1: 0.5 G8: 10G8: 10 H1: 10H1: 10 비교예Comparative example 1One 30(7.5)30 (7.5) 1010 4040 D1: 1D1: 1 E2: 0.5E2: 0.5 G5: 15G5: 15 H3: 3.5H3: 3.5 22 30(7.5)30 (7.5) 1010 3434 D2: 5D2: 5 E1: 1E1: 1 G6: 10G6: 10 H3: 10H3: 10 33 30(7.5)30 (7.5) 1313 5050 D5: 1D5: 1 E2: 1E2: 1 -- H3: 5H3: 5 44 30(7.5)30 (7.5) 5050 1010 D6: 5D6: 5 E1: 0.5E1: 0.5 G6: 4.5G6: 4.5 --

A1: 카본 블랙 안료 분산액 (BK-5026, Tokushiki社)A1: Carbon Black Pigment Dispersion (BK-5026, Tokushiki Co., Ltd.)

B: 3,4-에폭시사이클로헥실카르복실레이트 (TTA-21P, Tetrachem)B: 3,4-epoxycyclohexylcarboxylate (TTA-21P, Tetrachem)

C: 3-에틸-3-[(2-에틸헥실옥시)메틸]옥세탄 (GASON DOX, Guarson Chemical)C: 3-ethyl-3-[(2-ethylhexyloxy) methyl] oxetane (GASON DOX, Guarson Chemical)

D1: UVI-6992 (Dow社)D1: UVI-6992 (Dow Corporation)

D2: UVI-6994 (Dow社)D2: UVI-6994 (Dow Corporation)

D3: Irgacure 250 (BASF社)D3: Irgacure 250 (BASF Corporation)

D4: Omnicat 440 (IGM resin社)D4: Omnicat 440 (IGM resin)

D5: Rhodorsil 2074 (Rhodia社)D5: Rhodorsil 2074 (Rhodia)

D6: CPI-100P (SAN-APRO社)D6: CPI-100P (SAN-APRO)

E1: KBM-303 (2-(3,4 에폭시씨클로헥실)에틸트리메톡시실란, 신에츠실리콘)E1: KBM-303 (2- (3,4 epoxycyclohexyl) ethyltrimethoxysilane, Shin-Etsu Silicone)

E2: KBM-403 (3-글리시독시프로필 트리메톡시실란, 신에츠실리콘)E2: KBM-403 (3-glycidoxypropyl trimethoxysilane, Shin-Etsu Silicone)

G1: DEGBEA (디에틸렌글리콜모노부틸에테르아세테이트, 이하 BCA, 비등점 248℃)G1: DEGBEA (diethylene glycol monobutyl ether acetate, hereinafter BCA, boiling point 248 degreeC)

G2: DEGEEA (디에틸렌글리콜모노에틸에테르아세테이트, 이하 ECA, 비등점 220℃)G2: DEGEEA (diethylene glycol monoethyl ether acetate, hereinafter ECA, boiling point 220 ℃)

G3: DEGDBE (디에틸렌글리콜디부틸에테르, 이하 BDGy, 비등점 250℃) G3: DEGDBE (diethylene glycol dibutyl ether, hereinafter BDGy, boiling point 250 ℃)

G4: DPMA (디프로필렌글리콜메틸에테르아세테이트, 비등점 220℃) G4: DPMA (dipropylene glycol methyl ether acetate, boiling point 220 ℃)

G5: EGBE (에틸렌글리콜모노부틸에테르, 이하 BCs, 비등점 170℃)G5: EGBE (ethylene glycol monobutyl ether, hereinafter BCs, boiling point 170 ℃)

G6: TPGBE (트리프로필렌글리콜 부틸에테르, 비등점 291℃)G6: TPGBE (tripropylene glycol butyl ether, boiling point 291 ℃)

G7: 벤질알코올 (비등점 205℃)G7: benzyl alcohol (boiling point 205 ℃)

G8: 디에틸렌글리콜 (비등점 245℃)G8: diethylene glycol (boiling point 245 ° C)

H1: 트리에틸렌글리콜 디비닐에테르, BASFH1: triethylene glycol divinyl ether, BASF

H2: 1,4-시클로헥산디메탄올 디비닐에테르, BASFH2: 1,4-cyclohexanedimethanol divinyl ether, BASF

H3: 이소 부틸 비닐에테르, BASFH3: Isobutyl vinyl ether, BASF

<제조예 1> 베젤 패턴의 제조 Production Example 1 Preparation of Bezel Pattern

상기 실시예 1 내지 5 및 비교예 1 내지 4에서 제조한 조성물을 세정된 LCD 글라스 기재 상에 경화 후에 두께가 2㎛가 되도록 잉크젯 코팅 방법으로 코팅하였다. 이물질 부착을 방지하기 위해 코팅 후 1분 이내에 코팅층을 하기 조건으로 자외선을 조사하여 경화함으로써 베젤 패턴을 형성하였다. 자외선 조사기는 고압 수은등을 사용하였으며, UV 기준 1000mJ/cm2의 광량으로 조사하였다. The compositions prepared in Examples 1 to 5 and Comparative Examples 1 to 4 were coated on the cleaned LCD glass substrate by an inkjet coating method so as to have a thickness of 2 μm after curing. In order to prevent adhesion of foreign substances, the bezel pattern was formed by curing the coating layer by irradiating UV under the following conditions within 1 minute after coating. UV irradiator used a high pressure mercury lamp, and was irradiated with a light amount of 1000mJ / cm 2 based on UV.

<제조예 2> 베젤 패턴을 이용한 디스플레이 소자의 제조Production Example 2 Fabrication of Display Device Using Bezel Pattern

디스플레이 패널(이하 패널) 상부면에 상기 제조예 1의 방법을 따라 베젤 패턴을 형성하고, 상부 기재로서 아크릴계 점착층을 사용하는 LG화학 제조 NRT 편광필름을 부착하였다. 부착 후에는 편광 필름과 패턴의 틈으로 수분 및 이물질이 혼입되는 것을 방지하기 위해, 씰런트로 주위를 인캡하였다.A bezel pattern was formed on the upper surface of the display panel (hereinafter referred to as Panel 1) according to the method of Preparation Example 1, and an NRT polarizing film manufactured by LG Chemical using an acrylic adhesive layer was attached as an upper substrate. After attachment, the surroundings were encapsulated with a sealant to prevent the ingress of moisture and foreign matter into the gap between the polarizing film and the pattern.

실험예Experimental Example

<실험예 1>: 점도Experimental Example 1 Viscosity

상기 실시예 1 내지 5 및 비교예 1 내지 4에서 제조한 조성물에 대해 점도를 측정하였다. 점도 측정 장비로 Brookfield사의 Viscometer DV-2를 사용하였다.The viscosity of the compositions prepared in Examples 1 to 5 and Comparative Examples 1 to 4 was measured. Brookfield's Viscometer DV-2 was used as the viscosity measuring instrument.

상기 측정 결과를 하기 표 2에 나타내었으며, 조성물의 점도가 20 mPa·s 이하일 경우, 결과를 ○로 나타내고, 20 mPa·s 이상일 경우, 결과 X로 나타낸다.The measurement results are shown in Table 2 below, and when the viscosity of the composition is 20 mPa · s or less, the result is represented by ○, and when 20 mPa · s or more, the result is represented by the result X.

<실험예 2>: 증발 속도의 측정 Experimental Example 2 Measurement of Evaporation Rate

상기 각 조성물을 온도 35도의 대류 오븐에 일정 시간 비치하여, 조성물의 증발 속도를 관찰하였다. 증발 속도의 정의는 각 조성물을 알루미늄 접시에 마이크로 저울을 이용하여 1g 중량만큼 담은 후, 대류 오븐 내에서 시간이 경과한 후에 남은 조성물의 중량을 측정하여, 초기 대비 잔류물의 비로서 계산하였다. 상기 측정 결과를 하기 표 2에 나타내었으며, 증발 시작 후, 2시간이 경과한 후, 잔여 질량 비율이 85% 이상이면 ○로 나타내고, 85% 미만일 경우 결과 X로 나타낸다.Each composition was placed in a convection oven at a temperature of 35 degrees for a period of time to observe the rate of evaporation of the composition. The definition of evaporation rate was calculated as the ratio of the residue to the initial relative value by placing each composition in an aluminum dish by 1 g weight using a micro balance and then measuring the weight of the composition remaining after the passage of time in a convection oven. The measurement results are shown in Table 2 below. After 2 hours have elapsed after the start of evaporation, the residual mass ratio is 85% or more, and less than 85%.

<실험예 3>: 제팅안정성 Experimental Example 3 Jetting Stability

상기 각 조성물을 실험용 잉크젯 프린터 (UJ-200, 유니젯)을 이용하여 1분간 연속적으로 토출한 후, 15분간 토출을 중지하여 휴지 시간을 가짐으로써 노즐의 건조가 일어나도록 한 후, 다시 종이 위에 토출을 실시하였다. 각 조성물의 토출이 원활히 이루어지는지 평가하였다. 상기 측정 결과를 하기 표 2에 나타내었으며, 종이 위에 잉크가 정상적으로 토출되어 정상적인 인쇄물이 출력되었을 경우, 결과를 ○로 나타내고, 잉크의 건조로 인한 토출 불량이 발생하여 인쇄물의 품질이 저하되었을 경우, 결과를 X로 나타내었다.Each composition was continuously discharged for 1 minute using an experimental inkjet printer (UJ-200, UniJet), and then the discharge was stopped for 15 minutes to allow drying of the nozzle to take a rest time, and then again discharged onto paper. Was carried out. It was evaluated whether the discharge of each composition was performed smoothly. The measurement results are shown in Table 2 below. When the ink is normally discharged on the paper and a normal printed matter is output, the result is indicated by ○. When the discharge is poor due to drying of the ink, the quality of the printed product is deteriorated. Is represented by X.

<실험예 4>: 경화감도 Experimental Example 4: Hardening Sensitivity

상기 각 조성물을 유리 기판에 스포이드로 도포하고, 1000~5000rpm의 회전 속도로 스핀코팅을 실시하였다. 그런 다음, UV 조사장치 (고압 수은등, Innocure 5000, 제일UV)를 이용하여 총 노광량이 1000mJ/cm2의 자외선을 조사하여, 조성물을 경화시켰다. 노광량의 측정은 UV puck 2 (EIT사) 측정기를 이용하여 수행하였다. 상기 측정 결과를 하기 표 2에 나타내었으며, 조사 후에 1분 경과 후 지촉하였을 때, 액막이 완전히 경화되지 않고 액체가 묻어나올 때는 X로 나타내고, 액막이 완전히 경화되지 않아 끈적임이 남아있을 경우에는 △, 박막이 완전히 경화되어 끈적임이 없었을 경우에는 ○로 나타내었다.Each said composition was apply | coated to the glass substrate with the eyedropper, and spin-coating was performed at the rotation speed of 1000-5000 rpm. Then, ultraviolet rays with a total exposure amount of 1000 mJ / cm 2 were irradiated with a UV irradiation apparatus (high pressure mercury lamp, Innocure 5000, Cheil UV) to cure the composition. The exposure dose was measured using a UV puck 2 (EIT) measuring instrument. The measurement results are shown in Table 2 below, and when pressed after 1 minute after irradiation, the liquid film is not cured completely and is expressed as X when the liquid comes out, and when the liquid film is not completely cured and remains sticky, △, the thin film is When it hardened completely and there was no stickiness, it showed with (circle).

<실험예 5>: 베젤 패턴의 광학밀도/두께 평가Experimental Example 5 Evaluation of Optical Density / Thickness of the Bezel Pattern

제조예 1의 방법에서 잉크젯 코팅 대신 스핀코팅으로 일반 LCD 글래스 기재 위에 두께가 1㎛가 되도록 코팅한 조성물의 광학밀도/두께를 X-rite 사의 OD 측정기를 이용하여 측정하였다. 측정한 값은 표 2에 기입하였다.In the method of Preparation Example 1, the optical density / thickness of the composition coated on a general LCD glass substrate by a spin coating instead of an inkjet coating was measured using an OD meter manufactured by X-rite. The measured values are listed in Table 2.

실시예Example 점도Viscosity 증발속도Evaporation rate 제팅 안정성Jetting Stability 경화 감도Curing sensitivity 광학밀도/두께Optical density / thickness 1One ○○ ○○ ○○ ○○ 1.03/1㎛1.03 / 1 μm 22 ○○ ○○ ○○ ○○ 0.49/1㎛0.49 / 1 ㎛ 33 ○○ ○○ ○○ ○○ 0.26/1㎛0.26 / 1 μm 44 ○○ ○○ ○○ ○○ 0.51/1㎛0.51 / 1 ㎛ 55 ○○ ○○ ○○ ○○ 0.11/1㎛0.11 / 1 μm 66 ○○ ○○ ○○ △△ 0.19/1㎛0.19 / 1 μm 77 ○○ ○○ ○○ △△ 0.33/1㎛0.33 / 1 ㎛ 비교예Comparative example 1One ○○ XX XX ○○ 0.50/1㎛0.50 / 1㎛ 22 ○○ ○○ ○○ XX -- 33 XX ○○ ○○ ○○ 0.51/1㎛0.51 / 1 ㎛ 44 XX ○○ ○○ ○○ 0.50/1㎛0.50 / 1㎛

상기 표 1의 결과로부터, 본 발명에 따른 실시예 1 내지 5는 비등점이 210℃ 내지는 260℃인 글리콜 알킬에테르 용제를 사용하였으며, 증발속도가 낮기 때문에 제팅 안정성이 양호하였으며, 경화감도 또한 양호하였다. 실시예 6 내지 7은 비등점인 190℃ 내지는 280℃를 갖는 글리콜 및 알코올 용제를 사용하였으며, 증발속도 및 제팅안정성은 양호하였다. 경화감도는 양호하였으나, 실시예 1 내지 5에 비해서는 다소 부족하였다.From the results of Table 1, Examples 1 to 5 according to the present invention used a glycol alkyl ether solvent having a boiling point of 210 ℃ to 260 ℃, because of the low evaporation rate was good jetting stability, the curing was also good. Examples 6 to 7 used glycol and alcohol solvents having a boiling point of 190 ° C. to 280 ° C., and evaporation rate and jetting stability were good. Although the curing sensitivity was good, it was somewhat insufficient compared with Examples 1-5.

이에 비하여, 비교예 1은 비등점이 170℃로 비교적 낮은 글리콜 알킬에테르 용매를 사용했기 때문에 증발속도가 빠르며, 따라서 제팅 안정성이 불량하였다.In contrast, Comparative Example 1 used a glycol alkyl ether solvent having a relatively low boiling point of 170 ° C., so that the evaporation rate was high, and thus the jetting stability was poor.

또한, 비교예 2는 끓는점이 291℃로 과도하게 높은 글리콜 알킬에테르 용매를 사용했기 때문에 증발속도가 낮기 때문에 제팅 안정성은 양호하였으나, 경화속도가 불량하였다.In addition, Comparative Example 2 has a good boiling stability because the evaporation rate is low because the boiling point is 291 ℃ excessively high glycol alkyl ether solvent, but the curing rate was poor.

또한, 비교예 3과 같이 용매가 적용되지 않은 조성물에서는, ECC 및 DOX와 같은 모노머 화합물들의 비등점이 210℃ 이상이기 때문에 제팅 안정성은 양호하였으나, 점도가 높아 잉크젯 공정을 위해 점도를 낮추기 위해 불필요하게 승온이 필요하였다. 또한 액막 내에 비반응성 휘발성분의 함량이 낮기 때문에 경화 전/후에도 두께의 축소가 나타나지 않아, 차광밀도/두께가 상대적으로 부족하였다.In addition, in the composition to which the solvent is not applied as in Comparative Example 3, the boiling point of the monomer compounds such as ECC and DOX is higher than 210 ° C., but the jetting stability is good. Was needed. In addition, since the content of the non-reactive volatile component in the liquid film was low, there was no reduction in the thickness before or after curing, so that the shading density / thickness was relatively insufficient.

다만, 비교예 4는 ECC 조성의 비율이 40% 이상 포함되었기 때문에 비교예 3과 달리 솔벤트가 포함되었음에도 불구하고 점도가 높았으며, 따라서 승온이 필요하였다.However, since Comparative Example 4 contained more than 40% of the ratio of the ECC composition, although the solvent was included, unlike the Comparative Example 3, the viscosity was high, and thus, the temperature was required.

Claims (24)

착색제, 에폭시 화합물, 옥세탄 화합물, 광중합 개시제 및 끓는점이 190~280℃인 용매를 포함하는 베젤 패턴 형성용 광중합성 조성물.The photopolymerizable composition for bezel pattern formation containing a coloring agent, an epoxy compound, an oxetane compound, a photoinitiator, and a solvent whose boiling point is 190-280 degreeC. 청구항 1에 있어서, The method according to claim 1, 계면활성제, 밀착증진제, 희석제 및 광증감제로 이루어지는 군에서 선택되는 어느 하나 이상을 더 포함하는 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.A photopolymerizable composition for forming a bezel pattern, further comprising any one or more selected from the group consisting of a surfactant, an adhesion promoter, a diluent, and a photosensitizer. 청구항 1에 있어서,The method according to claim 1, 상기 착색제는 카본 블랙, 흑연, 금속 산화물, 유기블랙 안료로 이루어지는 군에서 선택되는 1종 이상의 안료 및 염료를 포함하는 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The colorant is a photopolymerizable composition for forming a bezel pattern, characterized in that it comprises at least one pigment and dye selected from the group consisting of carbon black, graphite, metal oxides, organic black pigments. 청구항 1에 있어서, The method according to claim 1, 상기 착색제의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 1~15 중량%인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The content of the coloring agent is a photopolymerizable composition for forming a bezel pattern, characterized in that 1 to 15% by weight relative to the total weight of the photopolymerizable composition for forming a bezel pattern. 청구항 1에 있어서,The method according to claim 1, 상기 옥세탄 화합물은 1개의 옥세탄 고리를 갖는 옥세탄 화합물 및 2개의 옥세탄 고리를 갖는 옥세탄 화합물을 포함하는 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The oxetane compound is a photopolymerizable composition for forming a bezel pattern comprising an oxetane compound having one oxetane ring and an oxetane compound having two oxetane rings. 청구항 1에 있어서, The method according to claim 1, 상기 옥세탄 화합물의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 20~70 중량%인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The content of the oxetane compound is a photopolymerizable composition for forming a bezel pattern, characterized in that 20 to 70% by weight based on the total weight of the photopolymerizable composition for forming a bezel pattern. 청구항 1에 있어서,The method according to claim 1, 상기 에폭시 화합물은 비스페놀형 에폭시 화합물, 노볼락형 에폭시 화합물, 글리시딜 에스테르형 에폭시 화합물, 글리시딜 아민형 에폭시 화합물, 선형 지방족 에폭시 화합물, 비페닐형 에폭시 화합물 및 지환식 에폭시 화합물로 이루어진 군에서 선택되는 어느 하나 이상인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The epoxy compound in the group consisting of bisphenol-type epoxy compound, novolak-type epoxy compound, glycidyl ester type epoxy compound, glycidyl amine type epoxy compound, linear aliphatic epoxy compound, biphenyl type epoxy compound and alicyclic epoxy compound Photopolymerizable composition for forming a bezel pattern, characterized in that any one or more selected. 청구항 1에 있어서, The method according to claim 1, 상기 에폭시 화합물의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 5~40 중량%인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The content of the epoxy compound is a photopolymerizable composition for forming a bezel pattern, characterized in that 5 to 40% by weight relative to the total weight of the photopolymerizable composition for forming a bezel pattern. 청구항 1에 있어서, The method according to claim 1, 상기 광중합 개시제는 요오드늄 염 또는 설포늄 염인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The photopolymerization initiator is a photopolymerizable composition for forming a bezel pattern, characterized in that the iodonium salt or sulfonium salt. 청구항 1에 있어서, The method according to claim 1, 상기 광중합 개시제의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 0.5~10 중량%인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The content of the photopolymerization initiator is a photopolymerizable composition for forming a bezel pattern, characterized in that 0.5 to 10% by weight relative to the total weight of the photopolymerizable composition for forming a bezel pattern. 청구항 1에 있어서, The method according to claim 1, 상기 용매는 끓는점이 190~280℃인 알콜, 글리콜 및 글리콜계 에테르로 이루어지는 군에서 선택되는 어느 하나 이상인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The solvent is a photopolymerizable composition for forming a bezel pattern, characterized in that any one or more selected from the group consisting of alcohol, glycol and glycol ether having a boiling point of 190 ~ 280 ℃. 청구항 11에 있어서, The method according to claim 11, 상기 글리콜계 에테르는 알킬 글리콜 부의 탄소 원자 수가 C1~C6인 알킬렌 글리콜 알킬 에테르인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The glycol ether is a photopolymerizable composition for forming a bezel pattern, wherein the alkyl glycol part is an alkylene glycol alkyl ether having C 1 to C 6 carbon atoms. 청구항 12에 있어서, The method according to claim 12, 상기 알킬 글리콜 부의 탄소 원자 수가 C1~C6인 알킬렌 글리콜 알킬 에테르는 에틸렌글리콜 알킬 에테르, 디에틸렌글리콜 알킬 에테르, 트리에틸렌글리콜 알킬 에테르, 테트라에틸렌글리콜 알킬 에테르, 프로필렌글리콜 알킬 에테르 및 디프로필렌글리콜 알킬 에테르로 이루어지는 군에서 선택되는 어느 하나 이상인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.Alkylene glycol alkyl ethers having from 1 to 6 carbon atoms in the alkyl glycol moiety include ethylene glycol alkyl ether, diethylene glycol alkyl ether, triethylene glycol alkyl ether, tetraethylene glycol alkyl ether, propylene glycol alkyl ether, and dipropylene glycol alkyl ether. Photopolymerizable composition for forming a bezel pattern, characterized in that any one or more selected from the group consisting of. 청구항 12에 있어서, The method according to claim 12, 상기 알킬 글리콜 부의 탄소 원자 수가 C1~C6인 알킬렌 글리콜 알킬 에테르는 알킬 에테르부의 탄소 원자 수가 C1~C4의 알킬기를 1개를 갖는 모노 알킬 에테르이거나 또는 알킬 에테르부의 탄소 원자 수가 C1~C4의 알킬기를 2개를 갖는 디알킬 에테르인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The alkylene glycol alkyl ether having C 1 to C 6 carbon atoms in the alkyl glycol part is a mono alkyl ether having 1 alkyl group having 1 to 4 carbon atoms in the alkyl ether portion or an alkyl group having 1 to 4 carbon atoms in the alkyl ether portion. It is a dialkyl ether which has two, The photopolymerizable composition for bezel pattern formation. 청구항 1에 있어서, The method according to claim 1, 상기 용매는 끓는 점이 200~260℃인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The solvent is a photopolymerizable composition for forming a bezel pattern, characterized in that the boiling point is 200 ~ 260 ℃. 청구항 1에 있어서, The method according to claim 1, 상기 용매의 함량은 상기 베젤 패턴 형성용 광중합성 조성물의 총 중량에 대하여 1~40 중량%인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The content of the solvent is a photopolymerizable composition for forming a bezel pattern, characterized in that 1 to 40% by weight relative to the total weight of the photopolymerizable composition for forming a bezel pattern. 청구항 1에 있어서,The method according to claim 1, 상기 베젤 패턴 형성용 광중합성 조성물의 점도가 25℃에서 1 내지 20 mPa·s인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The photopolymerizable composition for forming a bezel pattern, wherein the viscosity of the photopolymerizable composition for forming a bezel pattern is 1 to 20 mPa · s at 25 ° C. 청구항 1에 있어서,The method according to claim 1, 상기 베젤 패턴 형성용 광중합성 조성물을 35℃의 대류 오븐에서 증발시켰을 때 2시간 경과 후의 잔여 질량이 85% 이상인 것을 특징으로 하는 베젤 패턴 형성용 광중합성 조성물.The photopolymerizable composition for forming a bezel pattern, wherein the photopolymerizable composition for forming a bezel pattern is evaporated in a convection oven at 35 ° C. after 2 hours of 85% or more. a) 청구항 1의 베젤 패턴 형성용 광중합성 조성물을 사용하여, 기판 상에 베젤 패턴을 형성하는 단계; 및a) forming a bezel pattern on a substrate using the photopolymerizable composition for forming a bezel pattern of claim 1; And b) 상기 베젤 패턴을 경화하는 단계;를 포함하는 디스플레이 기판용 베젤 패턴의 제조방법.b) hardening the bezel pattern. 청구항 19에 있어서, The method according to claim 19, 상기 a) 단계에서 기판 상에 베젤 패턴을 형성하는 방법은 잉크젯(Inkjet) 인쇄, 그라비아(Gravure) 코팅 및 리버스 오프셋(Reverse offset) 코팅 중에서 선택된 방법인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The method of forming the bezel pattern on the substrate in the step a) is a method of manufacturing a bezel pattern for a display substrate, characterized in that the method selected from inkjet printing, gravure coating and reverse offset coating . 청구항 19에 있어서,The method according to claim 19, 상기 베젤 패턴의 두께가 0.1㎛~20㎛인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴의 제조방법.The thickness of the bezel pattern is 0.1㎛ ~ 20㎛ manufacturing method of the bezel pattern for a display substrate. 청구항 1의 베젤 패턴 형성용 광중합성 조성물이 경화되어, 기판 상에 형성된 디스플레이 기판용 베젤 패턴.The bezel pattern for display substrates which hardened | cured the photopolymerizable composition for bezel pattern formation of Claim 1, and was formed on the board | substrate. 청구항 22에 있어서,The method according to claim 22, 상기 베젤 패턴의 OD 값이 막 두께 1.0㎛ 당 0.1~1.5인 것을 특징으로 하는 디스플레이 기판용 베젤 패턴.The bezel pattern for a display substrate, characterized in that the OD value of the bezel pattern is 0.1 ~ 1.5 per 1.0 ㎛ thickness. 청구항 22의 디스플레이 기판용 베젤 패턴을 포함하는 디스플레이 기판.A display substrate comprising the bezel pattern for a display substrate of claim 22.
PCT/KR2017/014866 2016-12-16 2017-12-15 Photopolymerizable composition for forming bezel pattern, method for manufacturing bezel pattern of display substrate using same, bezel pattern manufactured thereby Ceased WO2018111043A1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020537016A (en) * 2018-08-17 2020-12-17 エルジー・ケム・リミテッド An ultraviolet curable ink composition that can be printed on a film, a method for manufacturing a bezel pattern using the composition, a bezel pattern manufactured thereby, and a foldable display substrate containing the same.
JP2022547421A (en) * 2019-08-27 2022-11-14 フェロ ゲーエムベーハー Printing Substances for Coating Glass Surfaces

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102743641B1 (en) * 2019-08-23 2024-12-17 주식회사 엘지화학 Photopolymerizable composition for forming bezel pattern, method of manufacturing bezel pattern by using the same, and bezel pattern prepared by using the same
CN115466543B (en) * 2022-10-19 2024-02-27 福斯特(安吉)新材料有限公司 Photocurable black inkjet packaging composition, packaging structure and application thereof

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080005875A (en) * 2006-07-10 2008-01-15 후지필름 가부시키가이샤 Photocurable composition and pattern formation method using the same
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
KR20150081553A (en) * 2014-01-06 2015-07-15 동우 화인켐 주식회사 Photosensitive resin composition
KR20160063101A (en) * 2014-11-26 2016-06-03 주식회사 엘지화학 method for manufacturing a bezel having sharp and fine pattern using UV curable ink for inkjet, a bezel pattern using the same method and electronic device comprising the bezel pattern
KR20160071336A (en) * 2014-12-11 2016-06-21 주식회사 엘지화학 photosensitive color ink composition for bezel, bezel pattern formed by using the same, and display panel comprising the pattern

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4344082B2 (en) * 2000-12-28 2009-10-14 大日本印刷株式会社 Ink jet ink composition for color filter, method for producing ink composition, and method for producing color filter
JP3889953B2 (en) * 2001-10-24 2007-03-07 大日本印刷株式会社 Ink-jet ink for color filter, method for producing the ink and color filter
TW200533692A (en) * 2003-11-06 2005-10-16 Showa Denko Kk Curable polyester having an oxetanyl group at end and process for preparing the same, resist composition, jet printing ink composition, curing methods and uses thereof
JP2006104452A (en) * 2004-09-09 2006-04-20 Konica Minolta Medical & Graphic Inc Actinic ray-curable inkjet ink, image-forming method and inkjet recording apparatus
JP2008088272A (en) * 2006-09-29 2008-04-17 Fujifilm Corp Curable coloring composition, color filter, and liquid crystal display device using color filter
JP2010111802A (en) * 2008-11-07 2010-05-20 Toyo Ink Mfg Co Ltd Inkjet ink and color filter substrate
KR101390709B1 (en) * 2008-11-07 2014-04-30 주식회사 엘지화학 Photoresist resin composition and the Liquid crystal display comprising micropattern thereof
JP6015073B2 (en) 2012-04-02 2016-10-26 セイコーエプソン株式会社 Functional layer forming ink and light emitting device manufacturing method
CN111367143B (en) * 2014-03-07 2023-10-31 日铁化学材料株式会社 Black resin composition for light-shielding film, substrate with light-shielding film, color filter and touch screen
WO2016048116A1 (en) 2014-09-26 2016-03-31 주식회사 엘지화학 Uv-curable ink composition, method for producing bezel pattern of display substrate using same, and bezel pattern produced thereby
WO2016093672A1 (en) * 2014-12-11 2016-06-16 주식회사 엘지화학 Photosensitive colored ink composition for bezel, bezel pattern formed by using same, and display substrate containing same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080005875A (en) * 2006-07-10 2008-01-15 후지필름 가부시키가이샤 Photocurable composition and pattern formation method using the same
KR20130132322A (en) * 2012-05-25 2013-12-04 주식회사 엘지화학 Photosensitive resin composition, pattern formed by using the same and display panel comprising the same
KR20150081553A (en) * 2014-01-06 2015-07-15 동우 화인켐 주식회사 Photosensitive resin composition
KR20160063101A (en) * 2014-11-26 2016-06-03 주식회사 엘지화학 method for manufacturing a bezel having sharp and fine pattern using UV curable ink for inkjet, a bezel pattern using the same method and electronic device comprising the bezel pattern
KR20160071336A (en) * 2014-12-11 2016-06-21 주식회사 엘지화학 photosensitive color ink composition for bezel, bezel pattern formed by using the same, and display panel comprising the pattern

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020537016A (en) * 2018-08-17 2020-12-17 エルジー・ケム・リミテッド An ultraviolet curable ink composition that can be printed on a film, a method for manufacturing a bezel pattern using the composition, a bezel pattern manufactured thereby, and a foldable display substrate containing the same.
JP7005882B2 (en) 2018-08-17 2022-01-24 エルジー・ケム・リミテッド An ultraviolet curable ink composition that can be printed on a film, a method for manufacturing a bezel pattern using the composition, a bezel pattern manufactured by the composition, and a foldable display substrate containing the bezel pattern.
US11485866B2 (en) 2018-08-17 2022-11-01 Lg Chem, Ltd. Film-printable UV-curable ink composition, method for producing bezel pattern using same, bezel pattern produced by same, and foldable display substrate comprising same
JP2022547421A (en) * 2019-08-27 2022-11-14 フェロ ゲーエムベーハー Printing Substances for Coating Glass Surfaces

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