WO2018159493A1 - Photocurable composition for solid molding, method for preparing solid article therewith, and resin - Google Patents
Photocurable composition for solid molding, method for preparing solid article therewith, and resin Download PDFInfo
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- WO2018159493A1 WO2018159493A1 PCT/JP2018/006708 JP2018006708W WO2018159493A1 WO 2018159493 A1 WO2018159493 A1 WO 2018159493A1 JP 2018006708 W JP2018006708 W JP 2018006708W WO 2018159493 A1 WO2018159493 A1 WO 2018159493A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
- C08F290/14—Polymers provided for in subclass C08G
Definitions
- the present invention relates to a photocurable composition for three-dimensional modeling, a method for producing a three-dimensional object using the same, and a resin.
- An optical three-dimensional modeling method for producing a desired three-dimensional object by curing a liquid photocurable composition for each layer with light such as ultraviolet rays and sequentially laminating them has been intensively studied.
- the use of stereolithography is not limited to prototype modeling for rapid shape confirmation (rapid prototyping), but has expanded to include modeling of working models for functional verification and modeling of models (rapid tooling).
- the use of stereolithography is spreading to real product modeling (rapid manufacturing).
- Patent Document 1 modeling (photocuring) is performed by an optical modeling method using a photocurable composition containing an acrylic group-containing blocked isocyanate and a chain extender, and the obtained photocured product is further heat treated. Describes a method of modeling a three-dimensional object by applying the above. Thereby, it is possible to model a three-dimensional object having higher strength and rigidity than the conventional photocurable composition, and it is possible to model a three-dimensional object having an excellent balance of strength, rigidity, and toughness.
- Patent Document 1 the photocured material is heat-treated to reduce the crosslink density and to improve the toughness by generating polyurethane and polyurea.
- the toughness of the obtained cured product was not sufficiently large.
- the present invention has an object to provide a photocurable composition for three-dimensional modeling that can form a three-dimensional object having higher toughness than before.
- the photocurable composition for three-dimensional modeling as one aspect of the present invention includes a (meth) acrylic compound having a (meth) acryloyl group and a photoradical generator. And a polyrotaxane having a plurality of cyclic molecules having at least one of a (meth) acryloyl group and a hydroxyl group.
- the photocurable composition for three-dimensional modeling as one aspect of the present invention, it is possible to provide a photocurable composition for three-dimensional modeling that can model a three-dimensional object having higher toughness than before.
- the photocurable composition for three-dimensional modeling according to the present embodiment includes a (meth) acrylic compound (a) that is a polymerizable compound, and a photoradical.
- a generator (b) and a polyrotaxane (c) are contained.
- the meta (acrylic) compound (a) is a compound having at least one (meth) acryloyl group, and undergoes a polymerization reaction with radicals generated by the photoradical generator (b) described later.
- (meth) acryloyl group means an acryloyl group or a methacryloyl group
- (meth) acrylic compound means an acrylic compound or a methacrylic compound
- the (meth) acrylic compound (a) may be composed of only one type of (meth) acrylic compound or may be composed of a plurality of types of (meth) acrylic compounds.
- the number of (meth) acryloyl groups that the (meth) acrylic compound (a) has is not particularly limited.
- the (meth) acrylic compound (a) include a monofunctional (meth) acrylic compound having one (meth) acryloyl group in the molecule and a bifunctional (meth) having one (meth) acryloyl group in the molecule.
- examples include acrylic compounds, trifunctional (meth) acrylic compounds having three (meth) acryloyl groups in the molecule, and tetrafunctional or more (meth) acrylic compounds having four or more (meth) acryloyl groups in the molecule. However, it is not limited to these.
- the (meth) acrylic compound (a) may be a urethane (meth) acrylic compound having a urethane structure in the molecular structure or a polyester (meth) acrylic compound having a polyester structure in the molecular structure.
- (meth) acrylic compound (a) examples include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, (meth) acrylic.
- N-butyl acid isobutyl (meth) acrylate, tert-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic N-heptyl acid, n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate , Isodecyl (meth) acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, ( T) Stearyl acrylate, (meth) acrylic acid tridecyl, (meth) acrylic acid tridecyl, (meth)
- urethane (meth) acrylic compound examples include polycarbonate urethane (meth) acrylate, polyester urethane (meth) acrylate, polyether urethane (meth) acrylate, caprolactone urethane (meth) acrylate, and the like. However, it is not limited to these.
- urethane (meth) acrylic compounds can be obtained by reacting an isocyanate compound obtained by reacting a polyol with a diisocyanate and a (meth) acrylate monomer having a hydroxyl group.
- specific examples of the polyol include polycarbonate polyol, polyester polyol, polyether polyol, and polycaprolactone polyol.
- the photo radical generator (b) include benzoin, benzoin monomethyl ether, benzoin isopropyl ether, acetoin, benzyl, benzophenone, p-methoxybenzophenone, diethoxyacetophenone, benzyldimethylketal, Carbonyl such as 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, methylphenylglyoxylate, ethylphenylglyoxylate, 2-hydroxy-2-methyl-1-phenylpropan-1-one Compounds, sulfur compounds such as tetramethylthiuram monosulfide and tetramethylthiuram disulfide, and acylphosphine oxides such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide. To but are not limited to.
- Examples of commercially available photo radical generators include IRGACURE series such as IRGACURE (registered trademark) 184 and IRGACURE 819, DAROCUR series such as DAROCUR (registered trademark) 1173 and DAROCUR TPO (above, manufactured by BASF), KAYACURE (registered trademark) ) Examples include, but are not limited to, KAYACURE series (manufactured by Nippon Kayaku Co., Ltd.) such as DETX-S and KAYACURE CTX.
- the addition amount of the photoradical generator (b) is preferably 0.05% by mass or more and 20% by mass or less, and more preferably 0.1% by mass or more when the entire photocurable composition is 100% by mass. More preferably, it is 5 mass% or less.
- the addition amount is less than 0.05% by mass, the radicals to be generated are insufficient, and the polymerization conversion rate of the photocurable composition is reduced. As a result, the photocurable composition is obtained by photocuring and then heat-treating. The strength of the three-dimensional object is insufficient.
- the added amount exceeds 30% by mass, most of the light irradiated to the photocurable composition is absorbed by the excessive photoradical generator (b), and light does not reach the inside of the curable composition. Sometimes. Therefore, there exists a possibility that the polymerization conversion rate of the photocurable composition inside a photocurable composition may fall.
- the polyrotaxane (c) includes a plurality of cyclic molecules having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, a linear molecule penetrating through the plurality of cyclic molecules, A supramolecule having a blocking group disposed at both ends of a linear molecule and preventing elimination of the cyclic molecule.
- the cyclic molecule can move freely along the linear molecular chain like a pulley.
- the cyclic molecule is blocked by a blocking group at the end of the linear molecule, and thus has a structure that cannot escape from the linear molecule.
- the polyrotaxane cyclic molecule has at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, can include a linear molecule, and is free along the linear molecular chain like a pulley. If it can move to, it will not be specifically limited.
- the cyclic molecule does not necessarily have to be a completely closed ring, and may be, for example, approximately “C”.
- polyrotaxane cyclic molecule examples include cyclodextrins such as ⁇ -cyclodextrin, ⁇ -cyclodextrin and ⁇ -cyclodextrin, crown ethers, benzocrowns, dibenzocrowns, dicyclohexanocrowns, etc. However, it is not limited to these. Of these, cyclodextrins are preferred because they are readily available and it is easy to select an appropriate ring diameter. In particular, ⁇ -cyclodextrin is more preferably used as the cyclic molecule of polyrotaxane.
- the polyrotaxane (c) may contain two or more different types of cyclic molecules in one molecule of the polyrotaxane.
- the polyrotaxane cyclic molecule has at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, and has two or more (meth) acryloyl groups or a hydroxyl group alone or simultaneously. You may do it.
- the polyrotaxane (c) contains two or more different types of cyclic molecules in one molecule of the polyrotaxane, at least one type of cyclic molecule has at least one (meth) acryloyl group or hydroxyl group. It only has to have.
- the polyrotaxane linear molecule is a molecule or substance that is included in a cyclic molecule and can be integrated without a covalent bond, and is not particularly limited as long as it is linear.
- linear in the present specification means substantially “linear”. That is, as long as the cyclic molecule can slide or move on the linear molecule, the linear molecule may have a branched chain. Further, as long as the cyclic molecule can slide or move on the linear molecule, it may be bent or spiral. Further, the length of the “straight chain” is not particularly limited as long as the cyclic molecule can slide or move on the linear molecule.
- polyrotaxane linear molecules include polyalkylenes, polyesters such as polycaprolactone, polyethers such as polyalkylene glycols such as polyethylene glycol and polypropylene glycol, polyamides, polyacryls, and benzene rings.
- the linear molecule etc. which have are mentioned, However, It is not limited to these.
- polyethers are preferable from the viewpoint of easy inclusion of molecules and flexibility, and among these, polyethylene glycol is more preferable.
- the number average molecular weight of the linear molecule of the polyrotaxane is preferably 1,000 or more and 1,000,000 or less, and more preferably 5,000 or more and 50,000 or less.
- the molecular weight of the linear molecule is less than 1,000, the pulley effect due to the cyclic molecule cannot be sufficiently obtained, and the sufficient impact improvement effect cannot be obtained.
- the molecular weight exceeds 1,000,000, the viscosity becomes too high, and there is a possibility that the photo-curable resin composition for optical three-dimensional modeling of the present invention cannot be modeled by the optical modeling apparatus.
- the blocking group is arranged at the end (both ends) of the polyrotaxane linear molecule, and has a role of preventing the cyclic molecule from being detached from the linear molecule.
- the blocking group is not particularly limited as long as it has a role of a stopper for preventing the cyclic molecule from leaving. Examples of the method for preventing elimination include a method for physically preventing the use of a bulky group and a method for electrically preventing the use of an ionic group.
- the blocking group include adamantane groups, dinitrophenyl groups, cyclodextrins, trityl groups, fluoresceins, pyrenes, and derivatives or modified products thereof. There is no limitation.
- Examples of commercially available polyrotaxanes that can be used as the polyrotaxane (c) having a (meth) acryloyl group according to the present embodiment include, for example, SeRM SM3405P, SeRM SA3405P, SeRM SM3400C, SeRM SA3400C, SeRM SA2400C (all of these are advanced Soft Materials Co., Ltd.).
- a commercial item of the polyrotaxane (c) which has a hydroxyl group SeRM SH3400P, SeRM SH2400P, SeRM SH1300P (all are the product made from Advanced Soft Materials Co., Ltd.) is mentioned, for example.
- the blending ratio of the polyrotaxane (c) is not particularly limited as long as the effect of the present invention is not impaired.
- the blending ratio is, for example, preferably 1% by mass or more and 50% by mass or more preferably 5% by mass or more and 30% by mass or less when the entire photocurable composition is 100% by mass.
- the blending ratio is less than 1% by mass, the toughness of a cured product obtained by curing the photocurable composition may be lowered.
- the said mixture ratio exceeds 50 mass%, there exists a possibility that the elasticity modulus and intensity
- the photocurable composition according to this embodiment may further contain a radical polymerizable compound other than the (meth) acrylic compound.
- radically polymerizable compounds include styrene monomers, styrene oligomers, acrylonitrile compounds, vinyl ester monomers, vinyl ester oligomers, N-vinyl pyrrolidone, acrylamide monomers, acrylamide oligomers, conjugated diene monomers.
- Conjugated diene oligomers vinyl ketone monomers, vinyl ketone oligomers, vinyl halide monomers, vinyl halide oligomers, vinylidene halide monomers, vinylidene halide oligomers, etc. Absent.
- the photocurable composition according to the present embodiment may further contain a cationic polymerizable compound.
- the cationic polymerizable compound undergoes a polymerization reaction with an acid generated by a photoacid generator described later.
- Examples of the cationic polymerizable compound include, but are not limited to, epoxy monomers, epoxy oligomers, oxetane monomers, oxetane oligomers, vinyl ether monomers, vinyl ether oligomers, and the like.
- the photocurable composition according to this embodiment may further contain a photoacid generator when it contains the above-described cationic polymerizable compound.
- the photoacid generator is a compound that initiates a polymerization reaction by generating an acid as a polymerization factor by receiving active energy rays such as light of a predetermined wavelength.
- the photoacid generator examples include trichloromethyl-s-triazines, sulfonium salts and iodonium salts, quaternary ammonium salts, diazomethane compounds, imide sulfonate compounds, and oxime sulfonate compounds. These are not limited.
- the addition amount of the photoacid generator is preferably 0.05% by mass or more and 20% by mass or less when the entire photocurable composition is 100% by mass. More preferably, the content is 1% by mass or more and 5% by mass or less.
- the addition amount is less than 0.05% by mass, the acid generated is insufficient, and the polymerization conversion rate of the photocurable composition is decreased.
- the photocurable composition is heat-treated after being photocured. The strength of the three-dimensional object is insufficient.
- the added amount exceeds 30% by mass, most of the light irradiated to the photocurable composition is absorbed by the excessive photoacid generator, and the light may not reach the inside of the curable composition. . Therefore, there exists a possibility that the polymerization conversion rate of the photocurable composition inside a photocurable composition may fall.
- reaction accelerators (e) may be used alone or in combination of two or more.
- the amount of the reaction accelerator (e) used is preferably 0.001% by mass or more and 10% by mass or less with respect to 100% by mass of the total amount of polyol.
- the photocurable composition according to the present embodiment is a reactive diluent, a colorant such as a pigment or a dye, an antifoaming agent, a leveling agent, a thickener, as necessary, unless the effects of the present invention are impaired.
- Additives such as flame retardants, antioxidants, inorganic fillers (crosslinked polymer particles, silica, glass powder, ceramics powder, metal powders, etc.), modifying resins (thermoplastic resins, thermoplastic resin particles, rubber particles, etc.) 1 type or 2 types or more may be contained appropriately.
- the photocurable composition according to the present embodiment can appropriately use a photoinitiator or a sensitizer in addition to the photoradical generator (b) as necessary.
- the photoinitiation assistant or sensitizer include benzoin compounds, acetophenone compounds, anthraquinone compounds, thioxanthone compounds, ketal compounds, benzophenone compounds, tertiary amine compounds, and xanthone compounds.
- the photocurable composition for three-dimensional modeling containing a (meth) acrylic compound (a) and a photoradical generator (b) can be cured by irradiation with light to form a cured product (three-dimensional object).
- radical polymerization reaction of the (meth) acrylic compound (a) is started by radicals generated by the photoradical generator (b), and curing of the photocurable composition proceeds.
- the crosslink density in the cured product (three-dimensional object) is high.
- the crosslinking point in the cured product does not move. Therefore, if the crosslinking density is increased too much, the toughness is lowered and becomes brittle.
- the photo-curable composition for three-dimensional modeling according to the present embodiment contains the polyrotaxane (c) described above.
- the cyclic molecule in the polyrotaxane (c) contains at least one functional group selected from a (meth) acryloyl group and a hydroxyl group.
- the cyclic molecule in the polyrotaxane (c) according to this embodiment contains a (meth) acryloyl group
- the photocurable composition according to this embodiment is irradiated with light
- the (meth) acrylic compound (a) The polymerization reaction between them proceeds.
- a polymerization reaction between the (meth) acrylic compound (a) and the polyrotaxane (c) and a polymerization reaction between the polyrotaxanes (c) also proceed.
- a cured product (three-dimensional product) having a structure as schematically shown in FIG.
- the photocurable composition according to the present embodiment contains a hydroxyl group
- polymerization of the (meth) acrylic compounds (a) is performed.
- the reaction proceeds.
- a cured product in which the (meth) acryloyl group in the molded article obtained and the hydroxyl group in the polyrotaxane (c) are bonded by hydrogen bonds is obtained.
- the internal stress generated during the curing by the post-treatment by heat is eliminated by the movement of the crosslinking point in the cured product and the optimal arrangement of the (meth) acryloyl group and the polyrotaxane (c).
- the photocurable composition which concerns on this embodiment can be used suitably for the manufacturing method of the solid thing by the optical three-dimensional modeling method (optical modeling method).
- optical modeling method optical modeling method
- a conventionally known method can be used as the stereolithography. That is, in the method for producing a three-dimensional object according to this embodiment, the photocurable composition according to this embodiment is selectively irradiated with active energy rays such as light to cure the photocurable composition one by one. This is a method for producing a three-dimensional object by repeating this process.
- active energy rays are selectively irradiated to the photocurable composition based on slice data of the three-dimensional object to be created.
- the active energy ray applied to the photocurable composition is not particularly limited as long as it is an active energy ray that can cure the photocurable composition according to the present embodiment.
- Specific examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X rays, gamma rays and laser rays, and particle rays such as alpha rays, beta rays and electron rays.
- ultraviolet rays are most preferable from the viewpoint of the absorption wavelength of the photoradical generator (c) to be used and the cost of equipment installation.
- the exposure amount is not particularly limited, preferably not 0.001J / cm 2 or more 10J / cm 2 or less. If it is less than 0.001 J / cm 2 , the photocurable composition may not be sufficiently cured, and if it exceeds 10 J / cm 2 , the irradiation time becomes longer and the productivity is lowered.
- the method of irradiating the photocurable composition with active energy rays is not particularly limited.
- the following method can be employed.
- As a first method there is a method of using two-dimensionally scanning light with respect to the photocurable composition using light condensed in a spot shape like laser light.
- the two-dimensional scanning may be a point drawing method or a line drawing method.
- As the second method there is a surface exposure method in which light is applied to the shape of the cross-sectional data using a projector or the like.
- the active energy rays may be irradiated in a planar manner through a planar drawing mask formed by arranging a plurality of micro light shutters such as a liquid crystal shutter or a digital micromirror shutter.
- the surface of the obtained shaped object may be washed with a cleaning agent such as an organic solvent. Moreover, you may perform the postcure which hardens the unreacted residual component which may remain
- a cleaning agent such as an organic solvent.
- the photocurable composition which concerns on this embodiment contains the block isocyanate (a1) which has the (meth) acryloyl group mentioned later as the polymeric compound (a) in 1st Embodiment. That is, when the polyrotaxane (c) has a (meth) acryloyl group, the photocurable composition according to the second embodiment includes a blocked isocyanate (a1) having a (meth) acryloyl group and a photo radical generator (b ), And a chain extender (d), and when the polyrotaxane (c) has a hydroxyl group, a blocked isocyanate (a1) having a (meth) acryloyl group, a photo radical generator (b), And a reaction accelerator (e).
- the block isocyanate (a1) which has the (meth) acryloyl group mentioned later as the polymeric compound (a) in 1st Embodiment. That is, when the polyrotaxane (c) has a (
- the blocked isocyanate (a1) is represented by the following general formula (1).
- ABC (1) In formula (1), A and C each independently represent a group represented by the following formula (2), and B represents a group represented by the following formula (3).
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms
- L 1 represents a substituent.
- R 3 and R 4 each independently represent a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and a is an integer of 1 to 100. . )
- the substituent when any of L 1 , R 2 , R 3 and R 4 has a substituent, the substituent may be a substituent containing a carbon atom. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 3 and R 4 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”. Moreover, the said substituent may contain the hetero atom.
- Block isocyanate (a1) is a (meth) acrylic compound containing at least two (meth) acryloyl groups as described above.
- R 2 is preferably a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group. This is preferable because the temperature (deblocking temperature) when the photocurable composition is photocured and then subjected to a heat treatment for deblocking can be reduced. Further, by adopting any one group of the R 2, it is possible to facilitate the synthesis of blocked isocyanate (a1). Further, by adopting any one group of the R 2, to obtain the synthesis of blocked isocyanate (a1) a low cost.
- L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
- R 3 has at least one divalent linking group selected from the group consisting of the following formulas (A-1) to (A-4) from the viewpoint of easy availability and synthesis. Is preferred.
- c is an integer of 1 to 10
- d is an integer of 1 to 10.
- R 3 is preferably has a group represented by the above formula (A-4). Thereby, the elasticity modulus of the hardened
- a and C are preferably the same. That is, the blocked isocyanate (a1) is preferably represented by the following general formula (4). Thereby, the synthesis
- ABA ... (4) In formula (4), A represents a group represented by the above formula (2), and B represents a group represented by the above formula (3).
- blocked isocyanate (a1) examples include the following structures.
- the blocked isocyanate (a1) contained in the photocurable composition may be one type of compound or a plurality of types of compounds.
- the blending ratio of the blocked isocyanate (a1) in the photocurable composition is calculated based on the total mass of the plurality of types of compounds.
- the blending ratio of the blocked isocyanate (a1) in the photocurable composition is preferably 10% by mass or more and 90% by mass or less, and 30% by mass or more and 70% by mass, when the entire photocurable composition is 100% by mass. It is more preferable that the amount is not more than mass%.
- the blending ratio is less than 10% by mass, the toughness of the cured product obtained by curing the photocurable composition becomes low, and when the blending ratio exceeds 80% by mass, the viscosity of the photocurable composition is high. It becomes difficult to handle.
- the blocked isocyanate (a1) includes the following step (I) and step (II).
- This step is a step of reacting polyol and diisocyanate. Thereby, a polyisocyanate having a polyol skeleton is obtained.
- polystyrene resin examples include polyether polyol, polyester polyol, polycarbonate polyol, polyalkylene polyol, and polyacetal, but are not limited thereto. Two or more of these polyols may be mixed and used.
- diisocyanates used in this step include aliphatic diisocyanates such as trimethylene diisocyanate, 1,2-propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, trimethylhexamethylene diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, 3- Cycloaliphatic diisocyanates such as isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate (isophorodiisocyanate), methylene bis (cyclohexyl isocyanate) or dicyclohexylmethane diisocyanate, bis (isocyanate methyl) cyclohexane, norbornane diisocyanate, phenylene diisocyanate, Li diisocyanate, 4,4'-diphenyl diisocyanate, 1,5-naphthalen
- the polyol and the diisocyanate are preferably reacted in a solvent.
- the said solvent will not be specifically limited if a polyol and diisocyanate melt
- dialkyl ethers such as diethyl ether and dipropyl ether, cyclic ethers such as 1,4-dioxane and tetrahydrofuran, ketones such as acetone, methyl ethyl ketone, diisopropyl ketone and isobutyl methyl ketone, methyl acetate and ethyl acetate
- esters such as butyl acetate
- hydrocarbons such as toluene, xylene and ethylbenzene
- halogen solvents such as methylene chloride, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane and chlorobenzene, and nitriles such as
- the ratio of the number of moles of diisocyanate to the number of moles of polyol to be reacted in this step is preferably 1 or more and 20 or less, and more preferably 3 or more and 10 or less.
- the ratio is less than 1, the ratio of the unwanted side formation of polyurethane by the polyaddition reaction of diisocyanate and polyol, which is a side reaction, increases, and the yield of diisocyanate having the target polyol skeleton decreases. If the ratio is greater than 20, unreacted diisocyanate remains excessively after the reaction, and it may be difficult to remove the unreacted diisocyanate.
- This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 100 ° C. or lower. Moreover, you may perform this process under recirculation
- an inert atmosphere such as nitrogen, helium or argon.
- this step may be performed in the presence of a catalyst.
- the catalyst include, for example, organic tin compounds such as tin octylate, dibutyltin diacetate, dibutyltin dilaurate and 2-ethylhexanetin, naphthenic acid metal salts such as copper naphthenate, zinc naphthenate and cobalt naphthenate, triethylamine, benzyl And tertiary amines such as dimethylamine, pyridine, N, N-dimethylpiperazine, and triethylenediamine.
- the amount of the catalyst used is preferably 0.001% by mass to 10% by mass with respect to 100% by mass of the total amount of polyol.
- the diisocyanate having a polyol skeleton obtained in this step can be separated and purified by a conventional separation method, for example, separation means such as reprecipitation with a poor solvent, concentration and filtration, or a separation means combining these.
- Step (II) a step of reacting a blocking agent with a diisocyanate having a polyol skeleton obtained in step (I)
- This step is a step of reacting the blocking agent with the polyisocyanate having the polyol skeleton obtained in step (I).
- the blocked isocyanate which concerns on this embodiment is obtained.
- the blocking agent is a compound capable of protecting an active isocyanate group by reacting with an isocyanate group (—NCO) of diisocyanate.
- Isocyanate groups protected by a blocking agent are called blocked isocyanate groups or blocked isocyanate groups. Since the blocked isocyanate group is protected by the blocking agent, it can be kept stable in a normal state.
- the blocking agent is dissociated (deblocked) from the blocked isocyanate group, and the original isocyanate group can be regenerated.
- the blocking agent used in this step is not particularly limited as long as it is a (meth) acrylic compound having an amino group, but tert-butylaminoethyl (meth) acrylate, tert-pentylaminoethyl (meth) acrylate, tert-hexylamino A compound selected from ethyl (meth) acrylate and tert-butylaminopropyl (meth) acrylate is preferable. Thereby, the deblocking temperature of blocked isocyanate can be lowered.
- this step it is preferable to react a blocking agent and a diisocyanate having a polyol skeleton in a solvent.
- the solvent is not particularly limited as long as the blocking agent and the polyisocyanate having a polyol skeleton are dissolved, and specifically, those described in the step (I) can be used.
- This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, more preferably 30 ° C. or higher and 80 ° C. or lower. Moreover, you may perform this process under recirculation
- an inert atmosphere such as nitrogen, helium or argon.
- this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, more preferably 30 ° C. or higher and 80 ° C. or lower.
- reflux
- this step may be performed in the presence of a catalyst.
- a catalyst those described in the step (I) can be used.
- a polymerization inhibitor may be used for the purpose of suppressing polymerization of the (meth) acryloyl group of the blocking agent.
- a polymerization inhibitor may be used for the purpose of suppressing polymerization of the (meth) acryloyl group of the blocking agent.
- Specific examples include benzoquinone, hydroquinone, catechol, diphenylbenzoquinone, hydroquinone monomethyl ether, naphthoquinone, t-butylcatechol, t-butylphenol, dimethyl-t-butylphenol, t-butylcresol, dibutylhydroxytoluene and phenothiazine.
- the blocked isocyanate obtained in this step can be separated and purified by the same method as in step (I).
- the chain extender (d) is a compound having at least two active hydrogens that react with an isocyanate group formed by deblocking a blocked isocyanate group of the blocked isocyanate (a1) or the blocked isocyanate (a3) described later.
- the chain extender (d) preferably contains a compound having at least two of the same or different functional groups selected from the group consisting of a hydroxyl group, an amino group, and a thiol group in one molecule.
- the chain extender (d) is at least selected from the group consisting of a polyol having at least two hydroxyl groups, a polyamine having at least two amino groups, and a polythiol having at least two thiol groups. It is more preferable to contain one.
- the reaction accelerator (e) described later is preferably used from the viewpoint of reactivity.
- chain extender (d) examples include ethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,8-octanediol, Linear diols such as 1,9-nonanediol and 1,10-decanediol; 2-methyl-1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 2,2-diethyl- 1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2,4-heptanediol, 1,4-dimethylolhexane, 2-ethyl-1,3-hexanediol, 2, 2,4-trimethyl-1,3-pentanediol, 2-methyl-1,8-octanediol, 2-butyl
- the balance of the physical properties of a cured product obtained by heat-curing the photocurable composition after photocuring as described later is preferable, and it is industrially inexpensive and available in large quantities.
- the ratio of the number of moles of chain extender (d) to the number of moles of blocked isocyanate (a1) is 0.1 or more and 5 or less. It is preferably 0.5 or more and 3 or less.
- the ratio is less than 0.1, the efficiency of the reaction between the isocyanate group and the chain extender (d) is low, and the mechanical properties of the three-dimensional product finally obtained by heat treatment after photocuring Tend to decrease.
- the ratio is larger than 5, unreacted excess chain extender (d) remains inside the three-dimensional object, and the mechanical properties of the three-dimensional object finally obtained by heat treatment after photocuring deteriorates. There is a tendency.
- reaction accelerator (e) In the present embodiment, as described above, the polyrotaxane having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group is contained.
- the reaction accelerator (e) removes the blocked isocyanate group of the blocked isocyanate (a1). It is a compound characterized by accelerating the reaction between an isocyanate group formed by blocking and a hydroxyl group.
- the reaction accelerator include tin compounds such as dibutyltin dilaurate, dioctyltin dilaurate, and dibutyltin dioctanoate.
- reaction accelerators (e) may be used alone or in combination of two or more.
- the amount of the reaction accelerator (e) used is preferably 0.001% by mass or more and 10% by mass or less with respect to 100% by mass of the total amount of polyol.
- the photocurable composition for three-dimensional modeling contains a polyrotaxane (c) having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, the first embodiment.
- a cured product (three-dimensional product) with higher toughness than before can be obtained.
- the photocurable composition for three-dimensional modeling according to the present embodiment can be further improved in toughness by being cured by being irradiated with light (photocuring) and then subjected to heat treatment.
- This reaction scheme will be described with reference to FIG.
- FIG. 2 is a diagram schematically showing a reaction scheme when the photocurable composition according to this embodiment is cured by irradiating light and then subjected to heat treatment.
- a photo radical generator in the photocurable composition is obtained by irradiating the photocurable composition according to the present embodiment with light of a predetermined wavelength (for example, ultraviolet rays).
- (B) generates radicals.
- the (meth) acryloyl group possessed by the blocked isocyanate (a1) undergoes a polymerization reaction and solidifies.
- the polymerization reaction between the polyrotaxane (c) having a (meth) acryloyl group and the blocked isocyanate (a1) also proceeds.
- the photocurable composition further contains a reactive diluent such as another radical polymerizable compound
- a reactive diluent such as another radical polymerizable compound
- the three components of blocked isocyanate (a1), polyrotaxane (c) and reactive diluent are appropriately combined.
- the polymerization reaction proceeds. Thereby, a photocured material as schematically shown in FIG. 2B is generated. Since this photocured product can move a cross-linking point as in the first embodiment, the photocured composition has higher toughness than the case where the photocurable composition does not contain polyrotaxane (c).
- a photocurable composition according to this embodiment when the photocurable composition according to this embodiment is irradiated with light having a predetermined wavelength (for example, ultraviolet rays), a photo radical generator (b) in the photocurable composition (b) ) Generates radicals. Then, the (meth) acryloyl group possessed by the blocked isocyanate (a1) undergoes a polymerization reaction and solidifies.
- a photocurable composition further contains a reactive diluent such as another radical polymerizable compound
- a polymerization reaction proceeds by appropriately combining the two components of the blocked isocyanate (a1) and the reactive diluent. To do. As a result, a photocured product as schematically shown in FIG. 3B is generated.
- the crosslink density is reduced more than after photocuring due to deblocking as described above. be able to.
- a urethane bond or a urea bond produces
- the toughness can be further improved.
- the degree to which the toughness of a cured product obtained by curing the curable composition by adding a toughness improving component to the curable composition is affected by the crosslink density of the cured product. . That is, the effect of improving toughness due to the toughness improving component is reduced in a cured product having a high crosslinking density, and conversely, the effect of improvement is increased in a cured product having a low crosslinking density.
- a photocured product is obtained by a deblocking reaction by performing a heat treatment after photocuring. The bond inside can be broken.
- the crosslink density of the cured product can be lowered. Therefore, according to the present embodiment, since the crosslinking density can be reduced by performing heat treatment as compared with a general photocured product, the toughness improving effect by the polyrotaxane (c), which is a toughness improving component, is exhibited more greatly. can do.
- the photo-thermoset (resin) according to the present embodiment includes a repeating structural unit represented by the following general formula (8), a repeating structural unit represented by the following general formula (9), and a polyrotaxane structure. contains.
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms
- L 1 represents a substituent.
- R 3 , R 4 and R 5 each independently represent a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent
- X 1 and X 2 are each Independently, one of O (oxygen atom), S (sulfur atom), and NH (imino group) is represented.
- a is an integer of 1 or more and 100 or less.
- the substituent when any of L 1 , R 2 , R 3 , R 4 and R 5 has a substituent, the substituent is a substituent containing a carbon atom, Also good. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 3 , R 4 and R 5 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”. Moreover, the said substituent may contain the hetero atom.
- R 2 is a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group because the deblocking temperature can be lowered as described above. Is preferred.
- R 2 by adopting any of the above groups as R 2 , the synthesis of the photo-thermosetting product can be facilitated at low cost.
- L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
- R 3 has at least one divalent linking group selected from the group consisting of the following formulas (A-1) to (A-4) from the viewpoint of easy availability and synthesis. Is preferred.
- c is an integer of 1 to 10
- d is an integer of 1 to 10.
- R 3 preferably has a group represented by Formula (A-4). Thereby, the elastic modulus of the photo-thermosetting product can be increased.
- the “polyrotaxane structure” means a plurality of cyclic molecules, a linear molecule penetrating the plurality of cyclic molecules in a skewered manner, and the elimination of the cyclic molecules arranged at both ends of the linear molecule. And a blocking group that prevents the above.
- the cyclic molecule, linear molecule, and blocking group are as described above.
- the repeating structural unit represented by the general formula (8) is bonded to the cyclic molecule in the polyrotaxane structure.
- the cyclic molecule in the polyrotaxane structure can freely move along the linear molecule in the polyrotaxane structure. Therefore, when an external stress is applied, the cross-linking point in the cured product can move in accordance with the stress. As a result, the tension between the polymers becomes uniform with respect to the stress. -Thermosets show high toughness.
- the photocurable composition which concerns on this embodiment can be used suitably for the manufacturing method of the solid thing by the optical three-dimensional modeling method (optical modeling method).
- optical modeling method optical modeling method
- the manufacturing method of the three-dimensional object which concerns on this embodiment has the process of modeling a modeling object by the optical modeling method, and the process of heat-processing the said modeling object.
- This step includes a step of selectively irradiating the photocurable composition with active energy rays based on slice data of a three-dimensional object to be created to cure the photocurable composition layer by layer.
- the exposure amount is not particularly limited, preferably not 0.001J / cm 2 or more 10J / cm 2 or less. If it is less than 0.001 J / cm 2 , the photocurable composition may not be sufficiently cured, and if it exceeds 10 J / cm 2 , the irradiation time becomes longer and the productivity is lowered.
- the method of irradiating the photocurable composition with active energy rays is not particularly limited.
- the following method can be employed.
- As a first method there is a method of using two-dimensionally scanning light with respect to the photocurable composition using light condensed in a spot shape like laser light.
- the two-dimensional scanning may be a point drawing method or a line drawing method.
- As the second method there is a surface exposure method in which light is applied to the shape of the cross-sectional data using a projector or the like.
- the active energy rays may be irradiated in a planar manner through a planar drawing mask formed by arranging a plurality of micro light shutters such as a liquid crystal shutter or a digital micromirror shutter.
- the surface of the obtained shaped object may be washed with a cleaning agent such as an organic solvent.
- a cleaning agent such as an organic solvent.
- heat treatment is performed on a modeled object obtained by the optical modeling method to advance deblocking as described above to reduce the crosslinking density and to generate polyurethane or polyurea. Thereby, a three-dimensional object with higher toughness can be formed.
- the heat treatment time in this step is not particularly limited as long as the deblocking of the block part in the shaped article proceeds sufficiently, but is preferably 0.5 hours or more and 10 hours or less. If it is shorter than 0.5 hour, deblocking does not proceed, and the effect of improving toughness may not be sufficiently obtained. If it is longer than 10 hours, it is disadvantageous from the viewpoints of reduction in various mechanical properties of the three-dimensional object due to deterioration of the resin and productivity.
- the photocurable composition which concerns on this embodiment contains the blocked isocyanate (a2) which has the (meth) acryloyl group mentioned later as the blocked isocyanate (a1) in 2nd Embodiment. That is, in the photocurable composition according to the third embodiment, when the polyrotaxane has a (meth) acryloyl group, the blocked isocyanate (a3), the photoradical generator (b), the polyrotaxane (c), and the chain And an extender (d). On the other hand, when the polyrotaxane has a hydroxyl group, it contains a blocked isocyanate (a3), a photo radical generator (b), a polyrotaxane (c), and a reaction accelerator (e).
- the blocked isocyanate (a2) is represented by the following general formula (5).
- A-D-C (5) (In formula (5), A and C each independently represent a group represented by the following formula (2), and D represents a group represented by the following formula (6).
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms
- L 1 represents a substituent.
- R 11 , R 12 and R 13 each independently represent a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.
- E and f are integers satisfying 1 ⁇ e + f ⁇ 50, either one of which may be 0. )
- the substituent when any of L 1 , R 2 , R 11 , R 12 and R 13 has a substituent, the substituent is a substituent containing a carbon atom, Also good. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 11 , R 12 and R 13 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”.
- L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
- R 11 and R 12 are preferably each independently any one of the following formulas (B-1) to (B-9).
- g is an integer of 1 to 10
- h or i may be 0, and is an integer satisfying 1 ⁇ h + i ⁇ 10 is there.
- either j or k may be 0, and is an integer that satisfies 1 ⁇ j + k ⁇ 10.
- a and C are preferably the same. That is, the blocked isocyanate (a2) is preferably represented by the following general formula (7). Thereby, the synthesis
- AD-A ... (7) (In the formula (7), A represents a group represented by the above formula (2), and D represents a group represented by the above formula (6).)
- blocked isocyanate (a2) examples include the following structures.
- the method for synthesizing the blocked isocyanate (a3) includes the following step (I) ′ and step (II).
- Step (I) ′ Step of reacting polycarbonate diol and diisocyanate
- Step (II) Step of reacting the blocking agent with the diisocyanate having the polycarbonate skeleton obtained in step (I)
- step (I) ′ is the same as in step (I) of the second embodiment except that polycarbonate diol is used instead of polyol, description of portions overlapping with those of the second embodiment will be omitted.
- the polycarbonate diol used in this step can be synthesized by, for example, a transesterification reaction between a carbonate compound and a diol.
- diol used for synthesizing the polycarbonate diol examples include ethylene glycol, diethylene glycol, propylene glycol, 1,4-butanediol, 1,3-butanediol, 1,5-pentanediol, neopentyl glycol, 3-methyl-1 , 5-pentanediol, 1,6-hexanediol, 1,4-cyclohexanedimethanol, 2-methyl-1,8-octanediol, 1,9-nonanediol and other aliphatic diols, cyclohexanediol, hydrogenated bisphenol -A, hydrogenated bisphenol-F, hydrogenated xylylene cholole, and other alicyclic diols, bisphenol-A, bisphenol-F, 4,4'-biphenol, xylylene glycol, and other aromatic diols, etc. But only It is not. Two or more of these dio
- the number average molecular weight M n of the polycarbonate diol is preferably 100 or more and 5000 or less.
- the number average molecular weight Mn of the polycarbonate diol is less than 100, the molecular weight of the finally obtained blocked isocyanate is reduced, and the elastic modulus and strength of the three-dimensional product obtained by curing the photocurable composition are reduced. There is.
- the number average molecular weight Mn of polycarbonate diol exceeds 5000, the molecular weight of the finally obtained blocked isocyanate will become large, the viscosity of a photocurable composition may become high, and workability
- chain extender (d) When the photocurable composition which concerns on this embodiment has a (meth) acryloyl group on a polyrotaxane (c) similarly to the photocurable composition which concerns on 2nd Embodiment, chain extender (d) is used. contains. The description about the chain extender (d) according to this embodiment is the same except that the blocked isocyanate (a1) is replaced with the blocked isocyanate (a3) in the description of the chain extender (d) according to the second embodiment. Therefore, the description is omitted.
- reaction accelerator (e) Similar to the reaction accelerator according to the second embodiment, the reaction accelerator according to this embodiment is added as necessary. That is, when the chain extender (d) has a hydroxyl group, a polyrotaxane is contained when (c) has a hydroxyl group.
- the explanation about the reaction accelerator (e) according to this embodiment is the same except that the blocked isocyanate (a1) is replaced with the blocked isocyanate (23) in the description of the chain extender (d) according to the second embodiment. Therefore, the description is omitted.
- the photo-thermoset (resin) according to the present embodiment includes a repeating structural unit represented by the following general formula (8), a repeating structural unit represented by the following general formula (10), and a polyrotaxane structure. contains.
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms
- L 1 represents a substituent.
- R 11 , R 12 , R 13 and R 14 each independently represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent
- 3 and X 4 each independently represent one of O (oxygen atom), S (sulfur atom), and NH (imino group), and either e or f may be 0, 1 ⁇ e + f ⁇ An integer satisfying 50.
- the substituent when any of L 1 , R 2 , R 11 , R 12 , R 13 and R 14 has a substituent, the substituent is a substituent containing a carbon atom. It may be. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 11 , R 12 , R 13 and R 14 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”.
- R 2 is a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group because the deblocking temperature can be lowered as described above. Is preferred.
- R 2 by adopting any of the above groups as R 2 , the synthesis of the photo-thermosetting product can be facilitated at low cost.
- L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
- R 11 and R 12 are preferably each independently any one of the following formulas (B-1) to (B-9). Thereby, the elastic modulus and strength of the photo-thermoset can be further increased.
- g is an integer of 1 to 10
- h or i may be 0, and is an integer satisfying 1 ⁇ h + i ⁇ 10 is there.
- either j or k may be 0, and is an integer that satisfies 1 ⁇ j + k ⁇ 10.
- the “polyrotaxane structure” means a plurality of cyclic molecules, a linear molecule penetrating the plurality of cyclic molecules in a skewered manner, and the elimination of the cyclic molecules arranged at both ends of the linear molecule. And a blocking group that prevents the above.
- the cyclic molecule, linear molecule, and blocking group are as described above.
- the repeating structural unit represented by the general formula (8) is bonded to a cyclic molecule in the polyrotaxane structure.
- the cyclic molecule in the polyrotaxane structure can freely move along the linear molecule in the polyrotaxane structure. Therefore, when an external stress is applied, the cross-linking point in the cured product can move in accordance with the stress. As a result, the tension between the polymers becomes uniform with respect to the stress. -Thermosets show high toughness.
- the photocurable composition according to the present embodiment contains a hydroxyl group
- polymerization of the (meth) acrylic compounds (a) is performed.
- the reaction proceeds. Curing by reacting the isocyanate group formed by deblocking the blocked isocyanate group of the blocked isocyanate (a2) described later and the hydroxyl group in the polyrotaxane (c) by subjecting the resulting molded article to a heat treatment. A thing is obtained. Due to the effect of the polyrotaxane, a cured product having higher toughness than the conventional photocurable composition can be obtained.
- the photocurable composition according to this embodiment contains a blocked isocyanate (a3) having a branched chain structure as the polymerizable compound (a) in the first embodiment. That is, the photocurable composition according to this embodiment comprises a blocked isocyanate (a3) having a branched chain structure, a photo radical generator (b), a polyrotaxane (c), and a chain extender (d). contains.
- the blocked isocyanate having a branched chain structure is a (meth) acrylic compound containing at least three (meth) acryloyl groups.
- Specific examples of the blocked isocyanate having a branched chain structure include a blocked isocyanate represented by the following general formula (A).
- a 1 to A 4 are each independently a structure represented by the following general formula (12), and B is a structure represented by the following general formula (13).
- R 1 represents a hydrogen atom or a methyl group
- R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms
- L 1 has a substituent.
- R 3a , R 3b , R 4 , R 5 , R 6 and R 7 are each independently a divalent divalent having 1 to 20 carbon atoms which may have a substituent.
- Y 1 represents a divalent linking group
- a represents an integer of 1 to 99. It said R 4 is same as R 4 in the formula (3).
- R 2 is preferably a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group. This is preferable because the temperature (deblocking temperature) when the photocurable composition is photocured and then subjected to a heat treatment for deblocking can be reduced. Further, by adopting any one group of the R 2, it is possible to facilitate the synthesis of blocked isocyanate. Further, by adopting any one group of the R 2, to obtain the synthesis of blocked isocyanate at a low cost.
- L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
- Y 1 is preferably at least one divalent linking group selected from the group consisting of the following formulas (C1) to (C3) from the viewpoint of easy availability and synthesis.
- a 1 to A 4 are preferably the same. That is, the blocked isocyanate is preferably represented by the following general formula (6). Thereby, the synthesis
- A represents a group represented by general formula (12)
- B represents a group represented by general formula (13).
- the blending ratio of the blocked isocyanate (a3) having a branched chain structure in the photocurable composition is preferably 0 part by mass or more and 90% by mass or less when the entire photocurable composition is 100%. More preferably, it is at least part% and no more than 70% by mass. When the said mixture ratio exceeds 80%, the viscosity of a photocurable composition will become high and handling will become difficult.
- blocked isocyanate examples include blocked isocyanates represented by the following formulas (I-1) to (I-20).
- This step is a step of reacting polyol and diisocyanate. Thereby, a polyisocyanate having a polyol skeleton is obtained.
- polystyrene resin examples include polyether polyol, polyester polyol, polycarbonate polyol, polyalkylene polyol, and polyacetal, but are not limited thereto. Two or more of these polyols may be mixed and used.
- diisocyanates used in this step include aliphatic diisocyanates such as trimethylene diisocyanate, 1,2-propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, trimethylhexamethylene diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, 3- Cycloaliphatic diisocyanates such as isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate (isophorodiisocyanate), methylenebis (cyclohexyl isocyanate) or dicyclohexylmethane diisocyanate, bis (isocyanatomethyl) cyclohexane, norbornane diisocyanate, phenylene diisocyanate, Li diisocyanate, 4,4'-diphenyl diisocyanate, 1,5-naphthalen
- the polyol and the diisocyanate are preferably reacted in a solvent.
- the said solvent will not be specifically limited if a polyol and diisocyanate melt
- dialkyl ethers such as diethyl ether and dipropyl ether, cyclic ethers such as 1,4-dioxane and tetrahydrofuran, ketones such as acetone, methyl ethyl ketone, diisopropyl ketone and isobutyl methyl ketone, methyl acetate and ethyl acetate
- esters such as butyl acetate
- hydrocarbons such as toluene, xylene and ethylbenzene
- halogen solvents such as methylene chloride, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane and chlorobenzene, and nitriles such as
- the ratio of the number of moles of diisocyanate to the number of moles of polyol to be reacted in this step is preferably 1 or more and 20 or less, and more preferably 3 or more and 10 or less.
- the ratio is less than 1, the ratio of the unwanted addition of polyurethane by the polyaddition reaction of diisocyanate and polyol, which is a side reaction, increases, and the yield of polyisocyanate having the target polyol skeleton decreases. If the ratio is greater than 20, unreacted diisocyanate remains excessively after the reaction, and it may be difficult to remove the unreacted diisocyanate.
- This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 100 ° C. or lower. Moreover, you may perform this process under recirculation
- an inert atmosphere such as nitrogen, helium or argon.
- this step may be performed in the presence of a catalyst.
- the catalyst include, for example, organic tin compounds such as tin octylate, dibutyltin diacetate, dibutyltin dilaurate and 2-ethylhexanetin, naphthenic acid metal salts such as copper naphthenate, zinc naphthenate and cobalt naphthenate, triethylamine, benzyl And tertiary amines such as dimethylamine, pyridine, N, N-dimethylpiperazine, and triethylenediamine.
- These catalysts may be used alone or in combination of two or more.
- the amount of the catalyst used may be 0.001% by mass or more and 1% by mass or less with respect to 100% by mass of the total amount of polyol.
- the diisocyanate having a polyol skeleton obtained in this step can be separated and purified by a conventional separation method, for example, separation means such as reprecipitation with a poor solvent, concentration and filtration, or a separation means combining these.
- Step (II) a step of reacting a blocking agent with a polyisocyanate having a polyol skeleton obtained in step (I)
- This step is a step of reacting the blocking agent with the polyisocyanate having the polyol skeleton obtained in step (I).
- the blocked isocyanate (a3) having a branched structure according to the present embodiment is obtained.
- the blocking agent is a compound capable of protecting an active isocyanate group by reacting with an isocyanate group (—NCO) of diisocyanate.
- Isocyanate groups protected by a blocking agent are called blocked isocyanate groups or blocked isocyanate groups. Since the blocked isocyanate group is protected by the blocking agent, it can be kept stable in a normal state.
- the blocking agent is dissociated (deblocked) from the blocked isocyanate group, and the original isocyanate group can be regenerated.
- the blocking agent used in this step is not particularly limited as long as it is a (meth) acrylic compound having an amino group, but tert-butylaminoethyl (meth) acrylate, tert-pentylaminoethyl (meth) acrylate, tert-hexyl.
- a compound selected from aminoethyl (meth) acrylate and tert-butylaminopropyl (meth) acrylate is preferred. Thereby, the deblocking temperature of blocked isocyanate can be lowered.
- this step it is preferable to react a blocking agent and a diisocyanate having a polyol skeleton in a solvent.
- the solvent is not particularly limited as long as the blocking agent and the polyisocyanate having a polyol skeleton are dissolved. Specifically, those described in the description of the step (I) can be used.
- This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 120 ° C. or lower.
- this step is carried out at a reaction temperature of less than 0 ° C., the reaction is difficult to proceed.
- this process is performed at reaction temperature higher than 150 degreeC, there exists a possibility that block agents may superpose
- this step may be performed in the presence of a catalyst.
- a catalyst those described in the description of the step (I) can be used.
- a polymerization inhibitor may be used for the purpose of suppressing the polymerization reaction of the (meth) acryloyl group of the blocking agent.
- Specific examples include benzoquinone, hydroquinone, catechol, diphenylbenzoquinone, hydroquinone monomethyl ether, naphthoquinone, t-butylcatechol, t-butylphenol, dimethyl-t-butylphenol, t-butylcresol, dibutylhydroxytoluene and phenothiazine.
- the blocked isocyanate obtained in this step can be separated and purified by the same method as in step (I).
- the three-dimensional product produced using the photocurable composition according to the present embodiment can move the cross-linking point according to the stress even when an external stress is applied due to the effect of the polyrotaxane.
- the tension between the polymers becomes uniform with respect to the stress, and as a result, a cured product having higher toughness than the conventional photocurable composition can be obtained.
- the photocurable composition which concerns on this embodiment contains block isocyanate (a3).
- the blocked isocyanate (a3) may have a polycarbonate structure containing a plurality of carbonate groups (—O— (C ⁇ O) —O—) in the molecular structure as represented by the above formula (3).
- the cured product obtained by heat-curing the photocurable composition according to the present embodiment also includes the above-described polycarbonate structure therein, according to the photocurable composition according to the present embodiment, A three-dimensional object having high tensile strength and elastic modulus can be formed by stereolithography.
- the use of the photocurable composition for three-dimensional modeling according to the first to third embodiments and the cured product thereof is not particularly limited.
- it can be used for various applications such as resin for stereolithography 3D printers, sports equipment, medical / nursing care equipment, industrial machinery / equipment, precision equipment, electrical / electronic equipment, electrical / electronic parts, building materials. is there.
- blocked isocyanate 1 was synthesized.
- hexamethylene diisocyanate (207 g, 1.23 mol, 1.0 eq.) Were added to a 500 mL reactor at room temperature in an argon atmosphere and stirred. .
- the resulting polytetrahydrofuran diisocyanate 1 was added with 300 mL of dichloromethane and cooled with ice while stirring. Hydroquinone (10 mg) and 2- (t-butylamino) ethyl methacrylate (142 g, 769 mmol, 5.0 eq.) Were slowly added thereto, and the mixture was stirred at room temperature for 12 hours. This solution was analyzed by infrared spectroscopy, and it was confirmed by the above method that there was no isocyanate-derived absorption peak.
- blocked isocyanate 2 was synthesized.
- 4,4′-methylenebis (cyclohexyl diisocyanate) 323 g, 1.23 mol, at room temperature in a 500 mL reactor at room temperature.
- 1.0 eq. was added and stirred.
- 2-ethylhexane tin (II) 80 ⁇ L, cat.
- the solution was heated to 50 ° C. and stirred at the same temperature for 5 hours.
- the solution was allowed to cool to room temperature and then added to vigorously stirred hexane (4 L).
- the resulting polytetrahydrofuran diisocyanate 2 was added with 300 mL of dichloromethane and cooled with ice while stirring. Hydroquinone (10 mg) and 2- (t-butylamino) ethyl methacrylate (114 g, 615 mmol, 5.0 eq.) Were slowly added thereto and stirred at room temperature for 1.5 days. This solution was analyzed by infrared spectroscopy, and it was confirmed by the above method that there was no isocyanate-derived absorption peak.
- blocked isocyanate 4 was synthesized. First, polytetrahydrofuran (100 g, 154 mmol, 1.0 eq.) And hexamethylene diisocyanate (207 g, 1.23 mol, 8.0 eq.) Having a number average molecular weight Mn of 650 at room temperature in an argon atmosphere in a 500 mL reactor. Added and stirred. To this solution was added tin (II) 2-ethylhexanoate (80 ⁇ L, cat.). The solution was heated to 80 ° C. and stirred at the same temperature for 8 hours. The solution was allowed to cool to room temperature and then added to vigorously stirred hexane (4 L).
- photocurable composition A was prepared according to the following prescription.
- Comparative Example 1 A photocurable composition 2 for three-dimensional modeling of Comparative Example 1 was prepared in the same manner as in Example 1 except that the polyrotaxane (c) was not used in Example 1. That is, the composition of the photocurable composition 2 for three-dimensional modeling of Comparative Example 1 is the same as the composition of the photocurable composition A in Example 1.
- the photocurable composition B was prepared according to the following prescription.
- Photocurable composition 3 for three-dimensional modeling of Example 2 was prepared.
- Photocurable composition B 90% by mass Polyrotaxane (c): ⁇ C-1> SeRM SA2400C (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
- Comparative Example 2 A photocurable composition 4 for three-dimensional modeling of Comparative Example 2 was prepared in the same manner as in Example 2 except that the polyrotaxane (c) was not used in Example 2. That is, the composition of the photocurable composition 4 for three-dimensional modeling in Comparative Example 2 is the same as the composition of the photocurable composition B in Example 2.
- a photocurable resin C was prepared according to the following formulation.
- Example 3 the photocurable composition 6 for three-dimensional modeling of the comparative example 3 was prepared like Example 3 except not using a polyrotaxane (c). That is, the composition of the photocurable composition 6 for three-dimensional modeling in Comparative Example 3 is the same as the composition of the photocurable composition C in Example 3.
- Example 4 First, according to the following prescription, the photocurable resin D was prepared.
- Comparative Example 4 A photocurable composition 8 for three-dimensional modeling of Comparative Example 4 was prepared in the same manner as in Example 4 except that no reaction accelerator was used in Example 4. That is, the composition of the three-dimensional photocurable composition 8 of Comparative Example 4 is the same as the composition of the photocurable composition C in Example 4.
- the photocurable resin E was prepared.
- the obtained photo-thermoset having a thickness of about 300 ⁇ m was punched out into a No. 8 type dumbbell to prepare a test piece.
- This test piece was measured according to JIS K 7127 using a tensile tester (trade name “Strograph EII” manufactured by Toyo Seiki Seisakusho) at a test temperature of 23 ° C. and a tensile speed of 10 mm / min. Maximum point strength and elongation were measured.
- the breaking energy was determined from the area surrounded by the stress-strain curve obtained in this tensile test.
- the tensile modulus can be used as an index of rigidity
- the maximum point strength can be used as an index of strength
- the breaking energy can be used as an index of toughness.
- Table 1 summarizes each composition of the photo-curable composition for three-dimensional modeling and the mechanical properties of the light-thermosetting material produced using the composition.
- Example 5 as compared with Comparative Example 1, polyrotaxane was added to a blocked isocyanate having a branched chain structure, but the toughness (breaking energy) could be improved while maintaining a high elastic modulus. .
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Abstract
Description
本発明は、立体造形用の光硬化性組成物、それを用いた立体物の製造方法、および樹脂に関する。 The present invention relates to a photocurable composition for three-dimensional modeling, a method for producing a three-dimensional object using the same, and a resin.
液状の光硬化性組成物を紫外線等の光によって層毎に硬化させ、それを順次積層することにより、所望の立体物を作製する光学的立体造形法(光造形法)が鋭意研究されている。光造形法の用途は形状確認のための試作品の造形(ラピッドプロトタイピング)にとどまらず、機能性検証のためのワーキングモデルの造形や型の造形(ラピッドツーリング)などへと広がってきている。また、光造形法の用途は実製品の造形(ラピッドマニュファクチャリング)にまで広がりつつある。 An optical three-dimensional modeling method (an optical modeling method) for producing a desired three-dimensional object by curing a liquid photocurable composition for each layer with light such as ultraviolet rays and sequentially laminating them has been intensively studied. . The use of stereolithography is not limited to prototype modeling for rapid shape confirmation (rapid prototyping), but has expanded to include modeling of working models for functional verification and modeling of models (rapid tooling). In addition, the use of stereolithography is spreading to real product modeling (rapid manufacturing).
このような背景から、光造形法に用いられる立体造形用の光硬化性組成物に対する要求は高度化してきている。最近では、汎用のエンジニアリングプラスチックに匹敵するような高い機械特性(強度や剛性、靱性など)を有する立体物を造形可能な立体造形用の光硬化性組成物が求められている。 From such a background, the demand for the photocurable composition for three-dimensional modeling used in the stereolithography has been advanced. Recently, a photocurable composition for three-dimensional modeling that can model a three-dimensional object having high mechanical properties (strength, rigidity, toughness, etc.) comparable to general-purpose engineering plastics has been demanded.
特許文献1には、アクリル基含有ブロックイソシアネートと鎖延長剤とを含有する光硬化性組成物を用いて光造形法によって造形(光硬化)を行い、得られた光硬化物に対してさらに熱処理を施すことで立体物を造形する方法が記載されている。これにより、従来の光硬化性組成物よりも強度および剛性が高い立体物を造形することができ、強度、剛性、および靭性のバランスに優れた立体物を造形することができる。
In
特許文献1では、光硬化物を熱処理することで架橋密度を低下させるとともに、ポリウレタンやポリウレアを生成させることで靱性を向上させている。しかしながら、特許文献1に記載されている方法では、得られる硬化物の靱性は十分に大きいものではなかった。
In
そこで本発明では上述の課題に鑑み、従来よりも靱性の高い立体物を造形可能な、立体造形用の光硬化性組成物を提供することを目的とする。 Therefore, in view of the above-described problems, the present invention has an object to provide a photocurable composition for three-dimensional modeling that can form a three-dimensional object having higher toughness than before.
本発明の一側面としての立体造形用の光硬化性組成物は、(メタ)アクリロイル基を有する(メタ)アクリル化合物と、光ラジカル発生剤と、を含有する立体造形用の光硬化性組成物であって、(メタ)アクリロイル基、ヒドロキシル基の少なくともいずれか一つを有する複数の環状分子を有するポリロタキサンを含有することを特徴とする。 The photocurable composition for three-dimensional modeling as one aspect of the present invention includes a (meth) acrylic compound having a (meth) acryloyl group and a photoradical generator. And a polyrotaxane having a plurality of cyclic molecules having at least one of a (meth) acryloyl group and a hydroxyl group.
本発明の一側面としての立体造形用の光硬化性組成物によれば、従来よりも靭性の高い立体物を造形可能な、立体造形用の光硬化性組成物を提供することができる。 According to the photocurable composition for three-dimensional modeling as one aspect of the present invention, it is possible to provide a photocurable composition for three-dimensional modeling that can model a three-dimensional object having higher toughness than before.
以下、本発明の実施の形態について説明する。なお、本発明は、以下の実施の形態に限定されるものではなく、本発明の趣旨を逸脱しない範囲で、当業者の通常の知識に基づいて、以下の実施の形態に対して適宜変更、改良等が加えられたものも本発明の範囲に含まれる。 Hereinafter, embodiments of the present invention will be described. It should be noted that the present invention is not limited to the following embodiments, and is appropriately modified with respect to the following embodiments based on ordinary knowledge of those skilled in the art without departing from the spirit of the present invention. Those with improvements and the like are also included in the scope of the present invention.
(第1の実施形態)
本実施形態に係る立体造形用の光硬化性組成物(以下、単に「光硬化性組成物」と称することがある)は、重合性化合物である(メタ)アクリル化合物(a)と、光ラジカル発生剤(b)と、ポリロタキサン(c)と、を含有する。
(First embodiment)
The photocurable composition for three-dimensional modeling according to the present embodiment (hereinafter sometimes simply referred to as “photocurable composition”) includes a (meth) acrylic compound (a) that is a polymerizable compound, and a photoradical. A generator (b) and a polyrotaxane (c) are contained.
以下、本実施形態に係る光硬化性組成物に含有される各成分について、詳細に説明する。 Hereinafter, each component contained in the photocurable composition according to the present embodiment will be described in detail.
[(メタ)アクリル化合物(a)]
メタ(アクリル)化合物(a)は、(メタ)アクリロイル基を少なくとも1つ有する化合物であり、後述する光ラジカル発生剤(b)により発生されたラジカルによって重合反応する。
[(Meth) acrylic compound (a)]
The meta (acrylic) compound (a) is a compound having at least one (meth) acryloyl group, and undergoes a polymerization reaction with radicals generated by the photoradical generator (b) described later.
ここで、本明細書において「(メタ)アクリロイル基」とはアクリロイル基またはメタクリロイル基を意味し、「(メタ)アクリル化合物」とはアクリル化合物またはメタクリル化合物を意味する。 Here, in this specification, “(meth) acryloyl group” means an acryloyl group or a methacryloyl group, and “(meth) acrylic compound” means an acrylic compound or a methacrylic compound.
(メタ)アクリル化合物(a)は、一種類の(メタ)アクリル化合物のみから構成されていてもよく、複数種類の(メタ)アクリル化合物で構成されていてもよい。 The (meth) acrylic compound (a) may be composed of only one type of (meth) acrylic compound or may be composed of a plurality of types of (meth) acrylic compounds.
(メタ)アクリル化合物(a)が有する(メタ)アクリロイル基の数は特に限定はされない。(メタ)アクリル化合物(a)としては、例えば、分子中に(メタ)アクリロイル基を1つ有する単官能(メタ)アクリル化合物、分子中に(メタ)アクリロイル基を1つ有する2官能(メタ)アクリル化合物、分子中に(メタ)アクリロイル基を3つ有する3官能(メタ)アクリル化合物、分子中に(メタ)アクリロイル基を4つ以上有する4官能以上の(メタ)アクリル化合物などが挙げられるが、これらに限定されるものではない。 The number of (meth) acryloyl groups that the (meth) acrylic compound (a) has is not particularly limited. Examples of the (meth) acrylic compound (a) include a monofunctional (meth) acrylic compound having one (meth) acryloyl group in the molecule and a bifunctional (meth) having one (meth) acryloyl group in the molecule. Examples include acrylic compounds, trifunctional (meth) acrylic compounds having three (meth) acryloyl groups in the molecule, and tetrafunctional or more (meth) acrylic compounds having four or more (meth) acryloyl groups in the molecule. However, it is not limited to these.
また、(メタ)アクリル化合物(a)は、分子構造中にウレタン構造を有するウレタン(メタ)アクリル化合物や、分子構造中にポリエステル構造を有するポリエステル(メタ)アクリル化合物などを用いてもよい。 The (meth) acrylic compound (a) may be a urethane (meth) acrylic compound having a urethane structure in the molecular structure or a polyester (meth) acrylic compound having a polyester structure in the molecular structure.
(メタ)アクリル化合物(a)の具体的な例としては、(メタ)アクリル酸メチル、(メタ)アクリル酸エチル、(メタ)アクリル酸n-プロピル、(メタ)アクリル酸イソプロピル、(メタ)アクリル酸n-ブチル、(メタ)アクリル酸イソブチル、(メタ)アクリル酸tert-ブチル、(メタ)アクリル酸n-ペンチル、(メタ)アクリル酸n-ヘキシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸n-ヘプチル、(メタ)アクリル酸n-オクチル、(メタ)アクリル酸イソオクチル、(メタ)アクリル酸2-エチルヘキシル、(メタ)アクリル酸ノニル、(メタ)アクリル酸イソノニル、(メタ)アクリル酸デシル、(メタ)アクリル酸イソデシル、(メタ)アクリル酸ドデシル、(メタ)アクリル酸ラウリル、(メタ)アクリル酸ステアリル、(メタ)アクリル酸トリデシル、(メタ)アクリル酸トリデシル、(メタ)アクリル酸シクロヘキシル、(メタ)アクリル酸イソボルニル、(メタ)アクリル酸ジシクロペンタニル、(メタ)アクリル酸アダマンチル、(メタ)アクリル酸フェニル、(メタ)アクリル酸トルイル、(メタ)アクリル酸ベンジル、(メタ)アクリル酸2-メトキシエチル、(メタ)アクリル酸3-メトキシブチル、(メタ)アクリル酸2-ヒドロキシエチル、(メタ)アクリル酸2-ヒドロキシプロピル、(メタ)アクリル酸ステアリル等の単官能(メタ)アクリル化合物;1,4-ブタンジオールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,9-ノナンジオールジ(メタ)アクリレート、トリシクロデカンジメタノール(メタ)アクリレート、ビスフェノールA(ポリ)エトキシジ(メタ)アクリレート、ビスフェノールA(ポリ)プロポキシジ(メタ)アクリレート、ビスフェノールF(ポリ)エトキシジ(メタ)アクリレート、エチレングリコールジ(メタ)アクリレート等の2官能(メタ)アクリル化合物;トリメチロールプロパントリ(メタ)アクリレート、トリメチロールオクタントリ(メタ)アクリレート、トリメチロールプロパンポリエトキシトリ(メタ)アクリレート、トリメチロールプロパン(ポリ)プロポキシトリ(メタ)アクリレート、トリメチロールプロパン(ポリ)エトキシ(ポリ)プロポキシトリ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、トリス[(メタ)アクリロイルオキシエチル]イソシアヌレート、カプロラクトン変性トリス[(メタ)アクリロイルオキシエチル]イソシアヌレート等の3官能(メタ)アクリル化合物;ジトリメチロールプロパンテトラ(メタ)アクリレート、ペンタエリスリトールポリエトキシテトラ(メタ)アクリレート、ペンタエリスリトールポリエトキシテトラ(メタ)アクリレート、ペンタエリスリトール(ポリ)プロポキシテトラ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ジペンタエリスリトルテトラ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールヘキサ(メタ)アクリレート等の4官能以上の(メタ)アクリル化合物;などが挙げられるが、これらに限定はされない。 Specific examples of the (meth) acrylic compound (a) include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, (meth) acrylic. N-butyl acid, isobutyl (meth) acrylate, tert-butyl (meth) acrylate, n-pentyl (meth) acrylate, n-hexyl (meth) acrylate, cyclohexyl (meth) acrylate, (meth) acrylic N-heptyl acid, n-octyl (meth) acrylate, isooctyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, nonyl (meth) acrylate, isononyl (meth) acrylate, decyl (meth) acrylate , Isodecyl (meth) acrylate, dodecyl (meth) acrylate, lauryl (meth) acrylate, ( T) Stearyl acrylate, (meth) acrylic acid tridecyl, (meth) acrylic acid tridecyl, (meth) acrylic acid cyclohexyl, (meth) acrylic acid isobornyl, (meth) acrylic acid dicyclopentanyl, (meth) acrylic acid adamantyl , Phenyl (meth) acrylate, toluyl (meth) acrylate, benzyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, 2-hydroxy (meth) acrylate Monofunctional (meth) acrylic compounds such as ethyl, 2-hydroxypropyl (meth) acrylate, stearyl (meth) acrylate; 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) Acrylate, 1,9-nonanediol di (meth) acrylate Tricyclodecane dimethanol (meth) acrylate, bisphenol A (poly) ethoxydi (meth) acrylate, bisphenol A (poly) propoxy di (meth) acrylate, bisphenol F (poly) ethoxydi (meth) acrylate, ethylene glycol di (meth) acrylate Bifunctional (meth) acrylic compounds such as: trimethylolpropane tri (meth) acrylate, trimethyloloctane tri (meth) acrylate, trimethylolpropane polyethoxytri (meth) acrylate, trimethylolpropane (poly) propoxytri (meth) Acrylate, trimethylolpropane (poly) ethoxy (poly) propoxytri (meth) acrylate, pentaerythritol tri (meth) acrylate, tris [(meth) acrylic Royloxyethyl] isocyanurate, caprolactone-modified tris [(meth) acryloyloxyethyl] isocyanurate and other trifunctional (meth) acryl compounds; ditrimethylolpropane tetra (meth) acrylate, pentaerythritol polyethoxytetra (meth) acrylate, penta Erythritol polyethoxytetra (meth) acrylate, pentaerythritol (poly) propoxytetra (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipenta Examples include, but are not limited to, tetrafunctional or higher functional (meth) acrylic compounds such as erythritol hexa (meth) acrylate.
ウレタン(メタ)アクリル化合物の具体的な例としては、ポリカーボネート系ウレタン(メタ)アクリレート、ポリエステル系ウレタン(メタ)アクリレート、ポリエーテル系ウレタン(メタ)アクリレート、カプロラクトン系ウレタン(メタ)アクリレート等が挙げられるが、これらに限定はされない。 Specific examples of the urethane (meth) acrylic compound include polycarbonate urethane (meth) acrylate, polyester urethane (meth) acrylate, polyether urethane (meth) acrylate, caprolactone urethane (meth) acrylate, and the like. However, it is not limited to these.
これらのウレタン(メタ)アクリル化合物は、ポリオールとジイソシアネートとを反応させて得られるイソシアネート化合物と、水酸基を有する(メタ)アクリレートモノマーと、を反応させて得ることができる。ここで、上記ポリオールの具体例としては、ポリカーボネートポリオール、ポリエステルポリオール、ポリエーテルポリオール、ポリカプロラクトンポリオールなどが挙げられる。 These urethane (meth) acrylic compounds can be obtained by reacting an isocyanate compound obtained by reacting a polyol with a diisocyanate and a (meth) acrylate monomer having a hydroxyl group. Here, specific examples of the polyol include polycarbonate polyol, polyester polyol, polyether polyol, and polycaprolactone polyol.
ポリエステル(メタ)アクリル化合物は、例えば、ポリカルボン酸とポリオールの縮合によって両末端に水酸基を有するポリエステルオリゴマーを得、次いで、その両末端の水酸基をアクリル酸でエステル化することにより得られる。 The polyester (meth) acrylic compound is obtained, for example, by obtaining a polyester oligomer having hydroxyl groups at both ends by condensation of polycarboxylic acid and polyol, and then esterifying the hydroxyl groups at both ends with acrylic acid.
[光ラジカル発生剤(b)]
光ラジカル発生剤(b)は、所定の波長の光等の活性エネルギー線を受けることにより重合因子であるラジカルを発生させ、重合反応を開始させる化合物である。光ラジカル剤(b)は、活性エネルギー線を受けることにより分解して、ラジカルを発生させる化合物であってもよい。ここで、活性エネルギー線としては、具体的には、赤外線、可視光線、紫外線、遠紫外線、X線、電子線等の荷電粒子線や、放射線等を用いることができる。
[Photoradical generator (b)]
The photoradical generator (b) is a compound that initiates a polymerization reaction by generating radicals that are polymerization factors by receiving active energy rays such as light having a predetermined wavelength. The photoradical agent (b) may be a compound that decomposes by receiving active energy rays to generate radicals. Here, specifically, as the active energy rays, charged particle beams such as infrared rays, visible rays, ultraviolet rays, far ultraviolet rays, X-rays, and electron beams, radiation, and the like can be used.
光ラジカル発生剤(b)の具体的な例としては、ベンゾイン、ベンゾインモノメチルエ-テル、ベンゾインイソプロピルエ-テル、アセトイン、ベンジル、ベンゾフェノン、p-メトキシベンゾフェノン、ジエトキシアセトフェノン、ベンジルジメチルケタ-ル、2,2-ジエトキシアセトフェノン、1-ヒドロキシシクロヘキシルフェニルケトン、メチルフェニルグリオキシレ-ト、エチルフェニルグリオキシレ-ト、2-ヒドロキシ-2-メチル-1-フェニルプロパン-1-オン等のカルボニル化合物、テトラメチルチウラムモノスルフィド、テトラメチルチウラムジスルフィドなどの硫黄化合物、2,4,6-トリメチルベンゾイルジフェニルフォスフィンオキサイドなどのアシルフォスフィンオキサイド等が挙げられるが、これらに限定はされない。 Specific examples of the photo radical generator (b) include benzoin, benzoin monomethyl ether, benzoin isopropyl ether, acetoin, benzyl, benzophenone, p-methoxybenzophenone, diethoxyacetophenone, benzyldimethylketal, Carbonyl such as 2,2-diethoxyacetophenone, 1-hydroxycyclohexyl phenyl ketone, methylphenylglyoxylate, ethylphenylglyoxylate, 2-hydroxy-2-methyl-1-phenylpropan-1-one Compounds, sulfur compounds such as tetramethylthiuram monosulfide and tetramethylthiuram disulfide, and acylphosphine oxides such as 2,4,6-trimethylbenzoyldiphenylphosphine oxide. To but are not limited to.
上記光ラジカル発生剤の市販品としては、IRGACURE(登録商標)184やIRGACURE819などのIRGACUREシリーズや、DAROCUR(登録商標)1173やDAROCUR TPOなどのDAROCURシリーズ(以上、BASF社製)、KAYACURE(登録商標) DETX-S、KAYACURE CTXなどのKAYACUREシリーズ(以上、日本化薬社製)等が挙げられるが、これらに限定はされない。 Examples of commercially available photo radical generators include IRGACURE series such as IRGACURE (registered trademark) 184 and IRGACURE 819, DAROCUR series such as DAROCUR (registered trademark) 1173 and DAROCUR TPO (above, manufactured by BASF), KAYACURE (registered trademark) ) Examples include, but are not limited to, KAYACURE series (manufactured by Nippon Kayaku Co., Ltd.) such as DETX-S and KAYACURE CTX.
光ラジカル発生剤(b)の添加量は、光硬化性組成物の全体を100質量%としたときに、0.05質量%以上20質量%以下であることが好ましく、0.1質量%以上5質量%以下であることがより好ましい。当該添加量が0.05質量%未満であると、生成するラジカルが不足し、光硬化性組成物の重合転化率が低下する結果、光硬化性組成物を光硬化させた後に熱処理して得られる立体物の強度が不足する。当該添加量が30質量%を越えると、光硬化性組成物に照射した光の大部分が過剰に存在する光ラジカル発生剤(b)によって吸収され、硬化性組成物の内部まで光が届かないことがある。そのため、光硬化性組成物の内部の光硬化性組成物の重合転化率が低下する恐れがある。 The addition amount of the photoradical generator (b) is preferably 0.05% by mass or more and 20% by mass or less, and more preferably 0.1% by mass or more when the entire photocurable composition is 100% by mass. More preferably, it is 5 mass% or less. When the addition amount is less than 0.05% by mass, the radicals to be generated are insufficient, and the polymerization conversion rate of the photocurable composition is reduced. As a result, the photocurable composition is obtained by photocuring and then heat-treating. The strength of the three-dimensional object is insufficient. When the added amount exceeds 30% by mass, most of the light irradiated to the photocurable composition is absorbed by the excessive photoradical generator (b), and light does not reach the inside of the curable composition. Sometimes. Therefore, there exists a possibility that the polymerization conversion rate of the photocurable composition inside a photocurable composition may fall.
[ポリロタキサン(c)]
ポリロタキサン(c)は、(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つを有する複数の環状分子と、該複数の環状分子を串刺し状に貫通する直鎖状分子と、該直鎖状分子の両末端に配置され前記環状分子の脱離を防止する封鎖基と、を有する超分子である。ポリロタキサン(c)において、環状分子は滑車のように直鎖状分子鎖に沿って自由に移動することができる。また、ポリロタキサン(c)において、環状分子は直鎖状分子の端部においては封鎖基によってブロックされるため、直鎖状分子からは抜け出せない構造となっている。
[Polyrotaxane (c)]
The polyrotaxane (c) includes a plurality of cyclic molecules having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, a linear molecule penetrating through the plurality of cyclic molecules, A supramolecule having a blocking group disposed at both ends of a linear molecule and preventing elimination of the cyclic molecule. In the polyrotaxane (c), the cyclic molecule can move freely along the linear molecular chain like a pulley. In the polyrotaxane (c), the cyclic molecule is blocked by a blocking group at the end of the linear molecule, and thus has a structure that cannot escape from the linear molecule.
(ポリロタキサンの環状分子)
ポリロタキサンの環状分子は、(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つを有し、直鎖状分子を包接でき、滑車のように直鎖状分子鎖に沿って自由に移動できるものであれば特に限定はされない。なお、環状分子は必ずしも完全に閉じた環状である必要はなく、たとえば略「C」字であってもよい。
(Cyclic molecules of polyrotaxane)
The polyrotaxane cyclic molecule has at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, can include a linear molecule, and is free along the linear molecular chain like a pulley. If it can move to, it will not be specifically limited. In addition, the cyclic molecule does not necessarily have to be a completely closed ring, and may be, for example, approximately “C”.
ポリロタキサンの環状分子の具体的な例としては、α-シクロデキストリン、β-シクロデキストリン、γ-シクロデキストリン等のシクロデキストリン類、クラウンエーテル類、ベンゾクラウン類、ジベンゾクラウン類、ジシクロヘキサノクラウン類などが挙げられるが、これらに限定はされない。これらのうち、入手が容易であり、適切な環径を選択しやすいことから、シクロデキストリン類が好ましい。中でも特に、ポリロタキサンの環状分子としてはα-シクロデキストリンを使用することがより好ましい。また、ポリロタキサン(c)は、ポリロタキサン1分子中に2種以上の異なる種類の環状分子を含んでいても良い。 Specific examples of the polyrotaxane cyclic molecule include cyclodextrins such as α-cyclodextrin, β-cyclodextrin and γ-cyclodextrin, crown ethers, benzocrowns, dibenzocrowns, dicyclohexanocrowns, etc. However, it is not limited to these. Of these, cyclodextrins are preferred because they are readily available and it is easy to select an appropriate ring diameter. In particular, α-cyclodextrin is more preferably used as the cyclic molecule of polyrotaxane. The polyrotaxane (c) may contain two or more different types of cyclic molecules in one molecule of the polyrotaxane.
ポリロタキサンの環状分子は、(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つを有しており、2つ以上の(メタ)アクリロイル基、またはヒドロキシル基を単独で、あるいは同時に有していてもよい。また、ポリロタキサン(c)がポリロタキサン1分子中に2種以上の異なる種類の環状分子を含んでいる場合には、少なくとも1種類の環状分子が、少なくとも1つの(メタ)アクリロイル基、またはヒドロキシル基を有していればよい。 The polyrotaxane cyclic molecule has at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, and has two or more (meth) acryloyl groups or a hydroxyl group alone or simultaneously. You may do it. When the polyrotaxane (c) contains two or more different types of cyclic molecules in one molecule of the polyrotaxane, at least one type of cyclic molecule has at least one (meth) acryloyl group or hydroxyl group. It only has to have.
(ポリロタキサンの直鎖状分子)
ポリロタキサンの直鎖状分子は、環状分子に包接され、共有結合を介さずに一体化することができる分子または物質であって、直鎖状であれば特に限定はされない。
(Linear molecule of polyrotaxane)
The polyrotaxane linear molecule is a molecule or substance that is included in a cyclic molecule and can be integrated without a covalent bond, and is not particularly limited as long as it is linear.
ここで、本明細書において「直鎖」とは、実質的に「直鎖」であることを意味する。すなわち、環状分子が直鎖状分子上で摺動または移動可能であれば、直鎖状分子は分岐鎖を有していてもよい。また、環状分子が直鎖状分子上で摺動または移動可能であれば、屈曲していても螺旋状であっても構わない。また、「直鎖」の長さは、環状分子が直鎖状分子上で摺動または移動可能であれば、その長さに特に制限はない。 Here, “linear” in the present specification means substantially “linear”. That is, as long as the cyclic molecule can slide or move on the linear molecule, the linear molecule may have a branched chain. Further, as long as the cyclic molecule can slide or move on the linear molecule, it may be bent or spiral. Further, the length of the “straight chain” is not particularly limited as long as the cyclic molecule can slide or move on the linear molecule.
ポリロタキサンの直鎖状分子の具体的な例としては、ポリアルキレン類、ポリカプロラクトン等のポリエステル類、ポリエチレングリコール、ポリプロピレングリコール等のポリアルキレングリコールなどのポリエーテル類、ポリアミド類、ポリアクリル類、ベンゼン環を有する直鎖状分子等が挙げられるが、これらに限定はされない。これらのうち、分子の包接し易さや柔軟性の観点から、ポリエーテル類が好ましく、中でも、ポリエチレングリコールがより好ましい。 Specific examples of polyrotaxane linear molecules include polyalkylenes, polyesters such as polycaprolactone, polyethers such as polyalkylene glycols such as polyethylene glycol and polypropylene glycol, polyamides, polyacryls, and benzene rings. The linear molecule etc. which have are mentioned, However, It is not limited to these. Of these, polyethers are preferable from the viewpoint of easy inclusion of molecules and flexibility, and among these, polyethylene glycol is more preferable.
ポリロタキサンの直鎖状分子の数平均分子量は、1,000以上1,000,000以下であることが好ましく、5,000以上50,000以下であることがより好ましい。直鎖状分子の分子量が1,000未満であると、環状分子による滑車効果が十分に得られず充分な衝撃性向上効果が得られない。分子量が1,000,000を超えると、粘度が高くなりすぎて、本発明の光学的立体造形用光硬化性樹脂組成物を光造形装置で造形できなくなる恐れがある。 The number average molecular weight of the linear molecule of the polyrotaxane is preferably 1,000 or more and 1,000,000 or less, and more preferably 5,000 or more and 50,000 or less. When the molecular weight of the linear molecule is less than 1,000, the pulley effect due to the cyclic molecule cannot be sufficiently obtained, and the sufficient impact improvement effect cannot be obtained. When the molecular weight exceeds 1,000,000, the viscosity becomes too high, and there is a possibility that the photo-curable resin composition for optical three-dimensional modeling of the present invention cannot be modeled by the optical modeling apparatus.
(封鎖基)
封鎖基は、ポリロタキサンの直鎖状分子の末端(両末端)に配置され、直鎖状分子から環状分子が脱離することを防止する役割を有する。封鎖基は、環状分子が脱離することを防止するストッパーの役割を有していればよく、特に構造は限定されない。脱離を防止する方法としては、嵩高い基を用いて物理的に防止する方法と、イオン性を有する基を用いて電気的に防止する方法が挙げられる。
(Blocking group)
The blocking group is arranged at the end (both ends) of the polyrotaxane linear molecule, and has a role of preventing the cyclic molecule from being detached from the linear molecule. The blocking group is not particularly limited as long as it has a role of a stopper for preventing the cyclic molecule from leaving. Examples of the method for preventing elimination include a method for physically preventing the use of a bulky group and a method for electrically preventing the use of an ionic group.
封鎖基の具体的な例としては、アダマンタン基類、ジニトロフェニル基類、シクロデキストリン類、トリチル基類、フルオレセイン類及、ピレン類、並びにこれらの誘導体または変性体を挙げることができるが、これらに限定はされない。 Specific examples of the blocking group include adamantane groups, dinitrophenyl groups, cyclodextrins, trityl groups, fluoresceins, pyrenes, and derivatives or modified products thereof. There is no limitation.
本実施形態に係る(メタ)アクリロイル基を有するポリロタキサン(c)として使用可能なポリロタキサンの市販品としては、例えば、SeRM SM3405P、SeRM SA3405P、SeRM SM3400C、SeRM SA3400C、SeRM SA2400C(以上、いずれもアドバンスト・ソフトマテリアルズ(株)製)が挙げられる。また、ヒドロキシル基を有するポリロタキサン(c)の市販品としては、例えばSeRM SH3400P、SeRM SH2400P、SeRM SH1300P(以上、いずれもアドバンスト・ソフトマテリアルズ(株)製)が挙げられる。 Examples of commercially available polyrotaxanes that can be used as the polyrotaxane (c) having a (meth) acryloyl group according to the present embodiment include, for example, SeRM SM3405P, SeRM SA3405P, SeRM SM3400C, SeRM SA3400C, SeRM SA2400C (all of these are advanced Soft Materials Co., Ltd.). Moreover, as a commercial item of the polyrotaxane (c) which has a hydroxyl group, SeRM SH3400P, SeRM SH2400P, SeRM SH1300P (all are the product made from Advanced Soft Materials Co., Ltd.) is mentioned, for example.
ポリロタキサン(c)の配合割合は、本発明の効果を損なわない範囲であれば、特に限定はされない。当該配合割合は、例えば、光硬化性組成物全体を100質量%としたときに、1質量%以上50質量%であることが好ましく、5質量%以上30質量%以下であることがより好ましい。前記配合割合が1質量%未満であると、光硬化性組成物を硬化させて得られる硬化物の靭性が低くなる場合がある。前記配合割合が50質量%を超えると、光硬化性組成物を硬化させて得られる硬化物の弾性率や強度が低下する恐れがある。 The blending ratio of the polyrotaxane (c) is not particularly limited as long as the effect of the present invention is not impaired. The blending ratio is, for example, preferably 1% by mass or more and 50% by mass or more preferably 5% by mass or more and 30% by mass or less when the entire photocurable composition is 100% by mass. When the blending ratio is less than 1% by mass, the toughness of a cured product obtained by curing the photocurable composition may be lowered. When the said mixture ratio exceeds 50 mass%, there exists a possibility that the elasticity modulus and intensity | strength of the hardened | cured material obtained by hardening | curing a photocurable composition may fall.
[その他の成分]
(ラジカル重合性化合物)
本実施形態に係る光硬化性組成物は、(メタ)アクリル化合物以外のラジカル重合性化合物をさらに含有していてもよい。このようなラジカル重合性化合物の例としては、スチレン系モノマー、スチレン系オリゴマー、アクリロニトリル化合物、ビニルエステル系モノマー、ビニルエステル系オリゴマー、N-ビニルピロリドン、アクリルアミド系モノマー、アクリルアミド系オリゴマー、共役ジエン系モノマー、共役ジエン系オリゴマー、ビニルケトン系モノマー、ビニルケトン系オリゴマー、ハロゲン化ビニル系モノマー、ハロゲン化ビニル系オリゴマー、ハロゲン化ビニリデン系モノマー、ハロゲン化ビニリデン系オリゴマー等が挙げられるが、これらに限定されるものではない。
[Other ingredients]
(Radically polymerizable compound)
The photocurable composition according to this embodiment may further contain a radical polymerizable compound other than the (meth) acrylic compound. Examples of such radically polymerizable compounds include styrene monomers, styrene oligomers, acrylonitrile compounds, vinyl ester monomers, vinyl ester oligomers, N-vinyl pyrrolidone, acrylamide monomers, acrylamide oligomers, conjugated diene monomers. Conjugated diene oligomers, vinyl ketone monomers, vinyl ketone oligomers, vinyl halide monomers, vinyl halide oligomers, vinylidene halide monomers, vinylidene halide oligomers, etc. Absent.
(カチオン重合性化合物)
本実施形態に係る光硬化性組成物は、カチオン重合性化合物をさらに含有していてもよい。カチオン重合性化合物は、後述する光酸発生剤により発生された酸によって重合反応する。
(Cationically polymerizable compound)
The photocurable composition according to the present embodiment may further contain a cationic polymerizable compound. The cationic polymerizable compound undergoes a polymerization reaction with an acid generated by a photoacid generator described later.
カチオン重合性化合物としては、エポキシ系モノマー、エポキシ系オリゴマー、オキセタン系モノマー、オキセタン系オリゴマー、ビニルエーテル系モノマー、ビニルエーテル系オリゴマー等が挙げられるが、これらに限定されるものではない。 Examples of the cationic polymerizable compound include, but are not limited to, epoxy monomers, epoxy oligomers, oxetane monomers, oxetane oligomers, vinyl ether monomers, vinyl ether oligomers, and the like.
(光酸発生剤)
本実施形態に係る光硬化性組成物は、上述のカチオン重合性化合物を含有する場合には、光酸発生剤をさらに含有していてもよい。光酸発生剤は、所定の波長の光等の活性エネルギー線を受けることにより重合因子である酸を発生させ、重合反応を開始させる化合物である。
(Photoacid generator)
The photocurable composition according to this embodiment may further contain a photoacid generator when it contains the above-described cationic polymerizable compound. The photoacid generator is a compound that initiates a polymerization reaction by generating an acid as a polymerization factor by receiving active energy rays such as light of a predetermined wavelength.
光酸発生剤の具体的な例としては、トリクロロメチル-s-トリアジン類、スルホニウム塩やヨードニウム塩、第四級アンモニウム塩類、ジアゾメタン化合物、イミドスルホネート化合物、及び、オキシムスルホネート化合物などが挙げられるが、これらに限定はされない。 Specific examples of the photoacid generator include trichloromethyl-s-triazines, sulfonium salts and iodonium salts, quaternary ammonium salts, diazomethane compounds, imide sulfonate compounds, and oxime sulfonate compounds. These are not limited.
光酸発生剤を含む場合、光酸発生剤の添加量は、光硬化性組成物の全体を100質量%としたときに、0.05質量%以上20質量%以下であることが好ましく、0.1質量%以上5質量%以下であることがより好ましい。当該添加量が0.05質量%未満であると、生成する酸が不足し、光硬化性組成物の重合転化率が低下する結果、光硬化性組成物を光硬化させた後に熱処理して得られる立体物の強度が不足する。当該添加量が30質量%を越えると、光硬化性組成物に照射した光の大部分が過剰に存在する光酸発生剤によって吸収され、硬化性組成物の内部まで光が届かないことがある。そのため、光硬化性組成物の内部の光硬化性組成物の重合転化率が低下する恐れがある。 When the photoacid generator is included, the addition amount of the photoacid generator is preferably 0.05% by mass or more and 20% by mass or less when the entire photocurable composition is 100% by mass. More preferably, the content is 1% by mass or more and 5% by mass or less. When the addition amount is less than 0.05% by mass, the acid generated is insufficient, and the polymerization conversion rate of the photocurable composition is decreased. As a result, the photocurable composition is heat-treated after being photocured. The strength of the three-dimensional object is insufficient. When the added amount exceeds 30% by mass, most of the light irradiated to the photocurable composition is absorbed by the excessive photoacid generator, and the light may not reach the inside of the curable composition. . Therefore, there exists a possibility that the polymerization conversion rate of the photocurable composition inside a photocurable composition may fall.
(反応促進剤)
鎖延長剤(d)がヒドロキシル基を有する化合物を用いる場合、あるいはヒドロキシル基を有するポリロタキサン(c)を用いる場合に、反応促進剤を添加することが好ましい。反応促進剤は、ブロックイソシアネート(a1)あるいは後述するブロックイソシアネート(a3)が有するブロックイソシアネート基が脱ブロック化して生成するイソシアネート基とヒドロキシル基との反応を促進させることを特徴とする化合物である。反応促進剤の例としては、例えば、ジラウリン酸ジブチルスズ、ジラウリン酸ジオクチルスズ、ジオクタン酸ジブチルスズ等のスズ化合物を用いることができる。
(Reaction accelerator)
When the chain extender (d) uses a compound having a hydroxyl group, or when using a polyrotaxane (c) having a hydroxyl group, it is preferable to add a reaction accelerator. The reaction accelerator is a compound characterized by accelerating the reaction between the isocyanate group formed by deblocking the blocked isocyanate group of the blocked isocyanate (a1) or the blocked isocyanate (a3) described later and the hydroxyl group. Examples of the reaction accelerator include tin compounds such as dibutyltin dilaurate, dioctyltin dilaurate, and dibutyltin dioctanoate.
これらの反応促進剤(e)は、単独で又は2種以上組み合わせてもよい。反応促進剤(e)の使用量は、ポリオールの総量100質量%に対して、0.001質量%以上10質量%以下であることが好ましい。 These reaction accelerators (e) may be used alone or in combination of two or more. The amount of the reaction accelerator (e) used is preferably 0.001% by mass or more and 10% by mass or less with respect to 100% by mass of the total amount of polyol.
(その他の添加剤)
本実施形態に係る光硬化性組成物は、本発明の効果を損なわない限り、必要に応じて、反応性希釈剤、顔料や染料などの着色剤、消泡剤、レベリング剤、増粘剤、難燃剤、酸化防止剤、無機充填剤(架橋ポリマー粒子、シリカ、ガラス粉、セラミックス粉、金属粉など)、改質用樹脂(熱可塑性樹脂、熱可塑性樹脂粒子、ゴム粒子など)などの添加剤を1種または2種以上を適量含有していてもよい。
(Other additives)
The photocurable composition according to the present embodiment is a reactive diluent, a colorant such as a pigment or a dye, an antifoaming agent, a leveling agent, a thickener, as necessary, unless the effects of the present invention are impaired. Additives such as flame retardants, antioxidants, inorganic fillers (crosslinked polymer particles, silica, glass powder, ceramics powder, metal powders, etc.), modifying resins (thermoplastic resins, thermoplastic resin particles, rubber particles, etc.) 1 type or 2 types or more may be contained appropriately.
また、本実施形態に係る光硬化性組成物は、必要に応じて、光ラジカル発生剤(b)の他、光開始助剤または増感剤を適宜用いることができる。光開始助剤または増感剤としては、ベンゾイン化合物、アセトフェノン化合物、アントラキノン化合物、チオキサントン化合物、ケタール化合物、ベンゾフェノン化合物、3級アミン化合物、及びキサントン化合物などを挙げることができる。 In addition, the photocurable composition according to the present embodiment can appropriately use a photoinitiator or a sensitizer in addition to the photoradical generator (b) as necessary. Examples of the photoinitiation assistant or sensitizer include benzoin compounds, acetophenone compounds, anthraquinone compounds, thioxanthone compounds, ketal compounds, benzophenone compounds, tertiary amine compounds, and xanthone compounds.
[立体造形用の光硬化性組成物の機能]
(メタ)アクリル化合物(a)および光ラジカル発生剤(b)を含有する立体造形用の光硬化性組成物は光を照射することによって硬化して硬化物(立体物)を形成することができる。このとき、光ラジカル発生剤(b)によって発生されたラジカルによって(メタ)アクリル化合物(a)のラジカル重合反応が開始され、光硬化性組成物の硬化が進行する。ここで、硬化物(立体物)の剛性を高めるためにも、硬化物(立体物)中の架橋密度は高いことが好ましい。しかしながら、従来の立体造形用の光硬化性組成物では硬化物中の架橋点が動かないため、架橋密度を高めすぎると、靱性が低下して脆くなってしまう。
[Function of photocurable composition for three-dimensional modeling]
The photocurable composition for three-dimensional modeling containing a (meth) acrylic compound (a) and a photoradical generator (b) can be cured by irradiation with light to form a cured product (three-dimensional object). . At this time, radical polymerization reaction of the (meth) acrylic compound (a) is started by radicals generated by the photoradical generator (b), and curing of the photocurable composition proceeds. Here, in order to increase the rigidity of the cured product (three-dimensional object), it is preferable that the crosslink density in the cured product (three-dimensional object) is high. However, in the conventional photocurable composition for three-dimensional modeling, the crosslinking point in the cured product does not move. Therefore, if the crosslinking density is increased too much, the toughness is lowered and becomes brittle.
一方、本実施形態に係る立体造形用の光硬化性組成物では、上述のポリロタキサン(c)を含有している。本実施形態に係るポリロタキサン(c)は、ポリロタキサン(c)中の環状分子が(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つを含有している。 On the other hand, the photo-curable composition for three-dimensional modeling according to the present embodiment contains the polyrotaxane (c) described above. In the polyrotaxane (c) according to this embodiment, the cyclic molecule in the polyrotaxane (c) contains at least one functional group selected from a (meth) acryloyl group and a hydroxyl group.
本実施形態に係るポリロタキサン(c)中の環状分子が(メタ)アクリロイル基を含有している場合、本実施形態に係る光硬化性組成物に光を照射すると、(メタ)アクリル化合物(a)同士の重合反応が進行する。加えて、(メタ)アクリル化合物(a)とポリロタキサン(c)との間の重合反応やポリロタキサン(c)同士の重合反応も進行していく。その結果、図1(B)に模式的に示されるような構造の硬化物(立体物)が得られる。ポリロタキサン(c)中の環状分子はポリロタキサン(c)中の直鎖状分子鎖に沿って自由に移動することができるため、硬化物中のいくつかの架橋点は動くことができる。すなわち、外部応力などが加わった際にもその応力に応じて架橋点が移動することができるため、応力に対してポリマー間のテンションが均一になる結果、従来の光硬化性組成物よりも靱性の高い硬化物が得られるようになる。 When the cyclic molecule in the polyrotaxane (c) according to this embodiment contains a (meth) acryloyl group, when the photocurable composition according to this embodiment is irradiated with light, the (meth) acrylic compound (a) The polymerization reaction between them proceeds. In addition, a polymerization reaction between the (meth) acrylic compound (a) and the polyrotaxane (c) and a polymerization reaction between the polyrotaxanes (c) also proceed. As a result, a cured product (three-dimensional product) having a structure as schematically shown in FIG. Since the cyclic molecules in the polyrotaxane (c) can move freely along the linear molecular chain in the polyrotaxane (c), some cross-linking points in the cured product can move. In other words, even when external stress is applied, the cross-linking point can move in response to the stress. As a result, the tension between the polymers becomes uniform with respect to the stress, resulting in a tougher than conventional photocurable compositions. A cured product having a high thickness can be obtained.
本実施形態に係るポリロタキサン(c)中の環状分子がヒドロキシル基を含有している場合、本実施形態に係る光硬化性組成物に光を照射すると、(メタ)アクリル化合物(a)同士の重合反応が進行していく。その結果得られた造形物中の(メタ)アクリロイル基とポリロタキサン(c)中のヒドロキシル基が水素結合で結合された硬化物が得られる。熱による後処理により、硬化の際に生じた内部応力は、硬化物中の架橋点が移動して(メタ)アクリロイル基とポリロタキサン(c)の配置が最適になることによって解消される。造形物中の(メタ)アクリロイル基がポリロタキサン(c)の環状分子のヒドロキシル基に対して水素結合を介して外部応力などが加わった際に応力を伝えることができる。ポリロタキサン(c)の環状分子は移動することができるため、応力に対してポリマー間のテンションを均一にすることができる。その結果、ポリロタキサン(c)中の環状分子が(メタ)アクリロイル基を含有している場合と同様に、ポリロタキサンの効果により従来の光硬化性組成物よりも靱性の高い硬化物が得られるようになる。 When the cyclic molecule in the polyrotaxane (c) according to the present embodiment contains a hydroxyl group, when the photocurable composition according to the present embodiment is irradiated with light, polymerization of the (meth) acrylic compounds (a) is performed. The reaction proceeds. As a result, a cured product in which the (meth) acryloyl group in the molded article obtained and the hydroxyl group in the polyrotaxane (c) are bonded by hydrogen bonds is obtained. The internal stress generated during the curing by the post-treatment by heat is eliminated by the movement of the crosslinking point in the cured product and the optimal arrangement of the (meth) acryloyl group and the polyrotaxane (c). When a (meth) acryloyl group in the molded article is subjected to an external stress or the like via a hydrogen bond to a hydroxyl group of the cyclic molecule of the polyrotaxane (c), the stress can be transmitted. Since the cyclic molecule of the polyrotaxane (c) can move, the tension between the polymers can be made uniform with respect to the stress. As a result, as in the case where the cyclic molecule in the polyrotaxane (c) contains a (meth) acryloyl group, a cured product having higher toughness than the conventional photocurable composition can be obtained by the effect of the polyrotaxane. Become.
[立体物の製造方法]
本実施形態に係る光硬化性組成物は、光学的立体造形法(光造形法)による立体物の製造方法に好適に用いることができる。以下、本実施形態に係る光硬化性組成物を用いた立体物の製造方法について説明する。
[Method of manufacturing a three-dimensional object]
The photocurable composition which concerns on this embodiment can be used suitably for the manufacturing method of the solid thing by the optical three-dimensional modeling method (optical modeling method). Hereinafter, the manufacturing method of the solid thing using the photocurable composition concerning this embodiment is demonstrated.
光造形法としては、従来公知の方法を用いることができる。すなわち、本実施形態に係る立体物の製造方法は、本実施形態に係る光硬化性組成物に選択的に光などの活性エネルギー線を照射して前記光硬化性組成物を一層ずつ硬化させる工程を含み、これを繰り返すことによって立体物を製造する方法である。 A conventionally known method can be used as the stereolithography. That is, in the method for producing a three-dimensional object according to this embodiment, the photocurable composition according to this embodiment is selectively irradiated with active energy rays such as light to cure the photocurable composition one by one. This is a method for producing a three-dimensional object by repeating this process.
光硬化性組成物を一層ずつ硬化させる工程においては、作成したい立体物のスライスデータに基づいて光硬化性組成物に活性エネルギー線を選択的に照射する。 In the step of curing the photocurable composition layer by layer, active energy rays are selectively irradiated to the photocurable composition based on slice data of the three-dimensional object to be created.
光硬化性組成物に照射する活性エネルギー線としては、本実施形態に係る光硬化性組成物を硬化させることができる活性エネルギー線であれば特に制限はない。活性エネルギー線の具体例としては、紫外線、可視光線、赤外線、X線、ガンマー線、レーザー光線等の電磁波、アルファー線、ベータ線、電子線等の粒子線等が挙げられる。これらのうち、使用する光ラジカル発生剤(c)の吸収波長や設備導入のコストの点から、紫外線が最も好ましい。露光量としては、特に限定されないが、好ましくは0.001J/cm2以上10J/cm2以下である。0.001J/cm2未満であると、光硬化性組成物が十分に硬化しない恐れがあり、10J/cm2を超えると照射時間が長くなり生産性が落ちる。 The active energy ray applied to the photocurable composition is not particularly limited as long as it is an active energy ray that can cure the photocurable composition according to the present embodiment. Specific examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X rays, gamma rays and laser rays, and particle rays such as alpha rays, beta rays and electron rays. Among these, ultraviolet rays are most preferable from the viewpoint of the absorption wavelength of the photoradical generator (c) to be used and the cost of equipment installation. The exposure amount is not particularly limited, preferably not 0.001J / cm 2 or more 10J / cm 2 or less. If it is less than 0.001 J / cm 2 , the photocurable composition may not be sufficiently cured, and if it exceeds 10 J / cm 2 , the irradiation time becomes longer and the productivity is lowered.
光硬化性組成物に対して活性エネルギー線を照射する方法は特に限定はされず、例えば活性エネルギー線として光を照射する場合には、以下の方法を採用することができる。第1の方法としては、レーザー光のように点状に集光した光を使用して、この光を光硬化性組成物に対して二次元的に走査する方法が挙げられる。このとき、二次元的な走査は点描方式でもよいし、線描方式でもよい。第2の方法としては、プロジェクターなどを用いて断面データの形状に光を照射する面露光方式が挙げられる。この場合、液晶シャッターまたはデジタルマイクロミラーシャッターなどのような微小光シャッターを複数配列して形成した面状描画マスクを通して、活性エネルギー線を面状に照射してもよい。 The method of irradiating the photocurable composition with active energy rays is not particularly limited. For example, when irradiating light as active energy rays, the following method can be employed. As a first method, there is a method of using two-dimensionally scanning light with respect to the photocurable composition using light condensed in a spot shape like laser light. At this time, the two-dimensional scanning may be a point drawing method or a line drawing method. As the second method, there is a surface exposure method in which light is applied to the shape of the cross-sectional data using a projector or the like. In this case, the active energy rays may be irradiated in a planar manner through a planar drawing mask formed by arranging a plurality of micro light shutters such as a liquid crystal shutter or a digital micromirror shutter.
本工程では、光造形法によって造形物を得た後に、得られた造形物の表面を有機溶剤などの洗浄剤によって洗浄してもよい。また、得られた造形物に対して光や熱を照射することで、造形物の表面や内部に残存することのある未反応の残存成分を硬化させるポストキュアーを行ってもよい。 In this step, after obtaining a shaped object by stereolithography, the surface of the obtained shaped object may be washed with a cleaning agent such as an organic solvent. Moreover, you may perform the postcure which hardens the unreacted residual component which may remain | survive on the surface or inside of a molded article by irradiating light and heat with respect to the obtained molded article.
(第2の実施形態)
本実施形態に係る光硬化性組成物は、第1の実施形態における重合性化合物(a)として、後述する(メタ)アクリロイル基を有するブロックイソシアネート(a1)を含有する。すなわち、第2の実施形態に係る光硬化性組成物は、ポリロタキサン(c)が(メタ)アクリロイル基を有する場合、(メタ)アクリロイル基を有するブロックイソシアネート(a1)と、光ラジカル発生剤(b)と、と、鎖延長剤(d)と、を含み、ポリロタキサン(c)がヒドロキシル基を有する場合、(メタ)アクリロイル基を有するブロックイソシアネート(a1)と、光ラジカル発生剤(b)と、反応促進剤(e)と、を含有する。
(Second Embodiment)
The photocurable composition which concerns on this embodiment contains the block isocyanate (a1) which has the (meth) acryloyl group mentioned later as the polymeric compound (a) in 1st Embodiment. That is, when the polyrotaxane (c) has a (meth) acryloyl group, the photocurable composition according to the second embodiment includes a blocked isocyanate (a1) having a (meth) acryloyl group and a photo radical generator (b ), And a chain extender (d), and when the polyrotaxane (c) has a hydroxyl group, a blocked isocyanate (a1) having a (meth) acryloyl group, a photo radical generator (b), And a reaction accelerator (e).
以下、本実施形態に係る光硬化性組成物に含有される各成分について、詳細に説明する。なお、以下の説明においては第1の実施形態と重複する部分については説明を省略することがある。 Hereinafter, each component contained in the photocurable composition according to the present embodiment will be described in detail. In the following description, the description of the same parts as those in the first embodiment may be omitted.
[ブロックイソシアネート(a1)]
ブロックイソシアネート(a1)は、下記一般式(1)で表される。
A-B-C・・・(1)
(式(1)中、AおよびCは各々独立に、下記式(2)で表される基を表し、Bは下記式(3)で表される基を表す。
[Blocked isocyanate (a1)]
The blocked isocyanate (a1) is represented by the following general formula (1).
ABC (1)
(In formula (1), A and C each independently represent a group represented by the following formula (2), and B represents a group represented by the following formula (3).
ここで、式(2)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(3)中、R3およびR4は各々独立に、置換基を有していてもよい炭素原子数1から20の炭化水素基を表し、aは1以上100以下の整数である。) Here, in formula (2), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may have In formula (3), R 3 and R 4 each independently represent a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and a is an integer of 1 to 100. . )
式(2)および式(3)において、L1、R2、R3およびR4のいずれかが置換基を有する場合には、当該置換基は炭素原子を含む置換基であってもよい。ただしその場合、当該置換基がL1、R2、R3およびR4のそれぞれと結合する原子は炭素原子以外の原子である。またその場合、置換基に含まれる炭素原子の数は「炭化水素基」の炭素原子数には含めないものとする。また、上記置換基はヘテロ原子を含んでいてもよい。 In Formula (2) and Formula (3), when any of L 1 , R 2 , R 3 and R 4 has a substituent, the substituent may be a substituent containing a carbon atom. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 3 and R 4 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”. Moreover, the said substituent may contain the hetero atom.
ブロックイソシアネート(a1)は、上記のとおり、(メタ)アクリロイル基を少なくとも2つ含む(メタ)アクリル化合物である。 Block isocyanate (a1) is a (meth) acrylic compound containing at least two (meth) acryloyl groups as described above.
式(2)中、R2はtert‐ブチル基、tert‐ペンチル基、および、tert‐ヘキシル基から選択される基であることが好ましい。これにより、光硬化性組成物を光硬化させた後に熱処理を施して脱ブロック化する際の温度(脱ブロック化温度)を低下させることができるため好ましい。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネート(a1)の合成を容易にすることができる。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネート(a1)の合成を低コストにすることができる。 In formula (2), R 2 is preferably a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group. This is preferable because the temperature (deblocking temperature) when the photocurable composition is photocured and then subjected to a heat treatment for deblocking can be reduced. Further, by adopting any one group of the R 2, it is possible to facilitate the synthesis of blocked isocyanate (a1). Further, by adopting any one group of the R 2, to obtain the synthesis of blocked isocyanate (a1) a low cost.
式(2)中、L1は入手や合成のし易さの観点からエチレン基またはプロピレン基であることが好ましい。 In formula (2), L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
式(3)中、R3は入手や合成のし易さの観点から下記式(A-1)~(A-4)からなる群から選択される少なくとも1つの2価の連結基を有することが好ましい。 In the formula (3), R 3 has at least one divalent linking group selected from the group consisting of the following formulas (A-1) to (A-4) from the viewpoint of easy availability and synthesis. Is preferred.
ここで、式(A-1)中、cは1以上10以下の整数であり、式(A-2)中、dは1以上10以下の整数である。 Here, in the formula (A-1), c is an integer of 1 to 10, and in the formula (A-2), d is an integer of 1 to 10.
また、式(3)中、R3は上記式(A-4)で表される基を有することが好ましい。これにより、硬化させて得られる硬化物の弾性率を高めることができる。 In the formula (3), R 3 is preferably has a group represented by the above formula (A-4). Thereby, the elasticity modulus of the hardened | cured material obtained by making it harden | cure can be raised.
また、式(1)中、AとCは同一であることが好ましい。すなわち、ブロックイソシアネート(a1)は、下記一般式(4)で表されることが好ましい。これにより、ブロックイソシアネート(a1)の合成を安価に、かつ容易にすることができる。
A-B-A・・・(4)
(式(4)中、Aは上記式(2)で表される基を表し、Bは上記式(3)で表される基を表す。)
In the formula (1), A and C are preferably the same. That is, the blocked isocyanate (a1) is preferably represented by the following general formula (4). Thereby, the synthesis | combination of block isocyanate (a1) can be made cheap and easy.
ABA ... (4)
(In formula (4), A represents a group represented by the above formula (2), and B represents a group represented by the above formula (3).)
ブロックイソシアネート(a1)の具体的な構造としては、以下のような構造が挙げられる。 Specific examples of the blocked isocyanate (a1) include the following structures.
光硬化性組成物に含有されるブロックイソシアネート(a1)は、一種類の化合物であってもよく、複数種類の化合物であってもよい。なお、ブロックイソシアネート(a1)として複数種類の化合物が含有される場合には、ブロックイソシアネート(a1)の光硬化性組成物における配合割合は、複数種類の化合物の質量の合計に基づいて計算するものとする。 The blocked isocyanate (a1) contained in the photocurable composition may be one type of compound or a plurality of types of compounds. When a plurality of types of compounds are contained as the blocked isocyanate (a1), the blending ratio of the blocked isocyanate (a1) in the photocurable composition is calculated based on the total mass of the plurality of types of compounds. And
ブロックイソシアネート(a1)の光硬化性組成物における配合割合は、光硬化性組成物全体を100質量%としたときに、10質量%以上90質量%以下であることが好ましく、30質量%以上70質量%以下であることがより好ましい。前記配合割合が10質量%未満であると、光硬化性組成物を硬化させて得られる硬化物の靭性が低くなり、前記配合割合が80質量%を超えると光硬化性組成物の粘度が高くなり取り扱いが難しくなる。 The blending ratio of the blocked isocyanate (a1) in the photocurable composition is preferably 10% by mass or more and 90% by mass or less, and 30% by mass or more and 70% by mass, when the entire photocurable composition is 100% by mass. It is more preferable that the amount is not more than mass%. When the blending ratio is less than 10% by mass, the toughness of the cured product obtained by curing the photocurable composition becomes low, and when the blending ratio exceeds 80% by mass, the viscosity of the photocurable composition is high. It becomes difficult to handle.
<ブロックイソシアネート(a1)の合成方法>
次に、ブロックイソシアネート(a1)の合成方法について説明する。ブロックイソシアネート(a1)は、下記の工程(I)および工程(II)を含む。
工程(I):ポリオールとジイソシアネートとを反応させる工程
工程(II):ブロック剤と工程(I)で得られたポリオール骨格を有するジイソシアネートとを反応させる工程
<Synthesis Method of Blocked Isocyanate (a1)>
Next, a method for synthesizing the blocked isocyanate (a1) will be described. The blocked isocyanate (a1) includes the following step (I) and step (II).
Step (I): Step of reacting polyol and diisocyanate Step (II): Step of reacting a blocking agent with diisocyanate having a polyol skeleton obtained in step (I)
以下、各工程を説明する。 Hereinafter, each process will be described.
(工程(I):ポリオールとジイソシアネートとを反応させる工程)
本工程は、ポリオールとジイソシアネートとを反応させる工程である。これにより、ポリオール骨格を有するポリイソシアネートが得られる。
(Step (I): Step of reacting polyol and diisocyanate)
This step is a step of reacting polyol and diisocyanate. Thereby, a polyisocyanate having a polyol skeleton is obtained.
本工程で用いられるポリオールは、例えば、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール、ポリアルキレンポリオール、ポリアセタールなどが挙げられるが、これらに限定はされない。これらのポリオールを二種以上混合して用いてもよい。 Examples of the polyol used in this step include polyether polyol, polyester polyol, polycarbonate polyol, polyalkylene polyol, and polyacetal, but are not limited thereto. Two or more of these polyols may be mixed and used.
本工程で用いられるジイソシアネートとしては、トリメチレンジイソシアネート、1,2-プロピレンジイソシアネート、ブチレンジイソシアネート、ヘキサメチレンジイソシアネート、ペンタメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネートなどの脂肪族ジイソシアネート、シクロヘキサンジイソシアネート、メチルシクロヘキサンジイソシアネート、3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート(イソホロジイソシアネート)、メチレンビス(シクロヘキシルイソシアネート)又はジシクロヘキシルメタンジイソシアネート、ビス(イソシアネートメチル)シクロヘキサン、ノルボルナンジイソシアネートなどの脂環式ジイソシアネート、フェニレンジイソシアネート、トリレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,5-ナフタレンジイソシアネート、ジフェニルメタンジイソシネート、4,4’-トルイジンジイソシアネートなどの芳香族ジイソシアネートなどが挙げられるが、これらに限定はされない。 Examples of diisocyanates used in this step include aliphatic diisocyanates such as trimethylene diisocyanate, 1,2-propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, trimethylhexamethylene diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, 3- Cycloaliphatic diisocyanates such as isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate (isophorodiisocyanate), methylene bis (cyclohexyl isocyanate) or dicyclohexylmethane diisocyanate, bis (isocyanate methyl) cyclohexane, norbornane diisocyanate, phenylene diisocyanate, Li diisocyanate, 4,4'-diphenyl diisocyanate, 1,5-naphthalene diisocyanate, diphenylmethane diisopropyl Société sulfonates, although other aromatic diisocyanates such as 4,4'-toluidine diisocyanate, but are not limited to.
本工程は、上記ポリオールと上記ジイソシアネートとを溶媒中で反応させることが好ましい。当該溶媒は、ポリオールおよびジイソシアネートが溶解するものならば特に限定されない。具体的には、ジエチルエーテル、ジプロピルエーテルなどのジアルキルエーテル類、1,4-ジオキサン、テトラヒドロフランなどの環状エーテル類、アセトン、メチルエチルケトン、ジイソプロピルケトン、イソブチルメチルケトンなどのケトン類、酢酸メチル、酢酸エチル、酢酸ブチルなどのエステル類、トルエン、キシレン、エチルベンゼンなどの炭化水素類、塩化メチレン、クロロホルム、四塩化炭素、テトラクロロエタン、トリクロロエタン、クロロベンゼンなどのハロゲン系溶媒、アセトニトリルなどニトリル類などが挙げられる。これらの溶媒は単独で又は2種以上組み合わせてもよい。また、使用する溶媒は、水分によってジイソシアネートのイソシアネート基が分解することを抑制するという観点から、脱水溶媒を用いることが好ましい。 In this step, the polyol and the diisocyanate are preferably reacted in a solvent. The said solvent will not be specifically limited if a polyol and diisocyanate melt | dissolve. Specifically, dialkyl ethers such as diethyl ether and dipropyl ether, cyclic ethers such as 1,4-dioxane and tetrahydrofuran, ketones such as acetone, methyl ethyl ketone, diisopropyl ketone and isobutyl methyl ketone, methyl acetate and ethyl acetate And esters such as butyl acetate, hydrocarbons such as toluene, xylene and ethylbenzene, halogen solvents such as methylene chloride, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane and chlorobenzene, and nitriles such as acetonitrile. These solvents may be used alone or in combination of two or more. The solvent to be used is preferably a dehydrated solvent from the viewpoint of suppressing decomposition of the isocyanate group of diisocyanate by moisture.
本工程で反応させるポリオールのモル数に対するジイソシアネートのモル数の比(ジイソシアネートのモル数/ポリオールのモル数)は、1以上20以下が好ましく、3以上10以下がより好ましい。前記比が1より小さいと、副反応であるジイソシアネートとポリオールの重付加反応により望まないポリウレタンが生成する割合が高くなり、目的のポリオール骨格を有するジイソシアネートの収率が低下する。前記比が20より大きいと、反応後に未反応のジイソシアネートが過剰に残存し、この未反応のジイソシアネートを除去することが困難になることがあるからである。 The ratio of the number of moles of diisocyanate to the number of moles of polyol to be reacted in this step (number of moles of diisocyanate / number of moles of polyol) is preferably 1 or more and 20 or less, and more preferably 3 or more and 10 or less. When the ratio is less than 1, the ratio of the unwanted side formation of polyurethane by the polyaddition reaction of diisocyanate and polyol, which is a side reaction, increases, and the yield of diisocyanate having the target polyol skeleton decreases. If the ratio is greater than 20, unreacted diisocyanate remains excessively after the reaction, and it may be difficult to remove the unreacted diisocyanate.
本工程は、窒素、ヘリウム、アルゴンなどの不活性雰囲気中で行うことが好ましい。また本工程は、0℃以上150℃以下で行うことが好ましく、30℃以上100℃以下で行うことがより好ましい。また本工程は、還流下で行ってもよい。本工程を150℃より高い反応温度で行うと副反応を起こす可能性が高くなる。本工程を0℃未満の反応温度で行うと反応速度が低下するため、反応時間の延長や、収率の低下が懸念される。 This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 100 ° C. or lower. Moreover, you may perform this process under recirculation | reflux. If this step is carried out at a reaction temperature higher than 150 ° C., the possibility of causing side reactions increases. When this step is carried out at a reaction temperature of less than 0 ° C., the reaction rate decreases, so there is a concern that the reaction time may be extended or the yield may be reduced.
なお、本工程は、触媒の存在下で行ってもよい。触媒としては、例えば、オクチル酸スズ、ジブチルスズジアセテート、ジブチルスズジラウレート、2-エチルヘキサンスズなどの有機スズ系化合物、ナフテン酸銅、ナフテン酸亜鉛、ナフテン酸コバルトなどのナフテン酸金属塩、トリエチルアミン、ベンジルジメチルアミン、ピリジン、N,N-ジメチルピペラジン、トリエチレンジアミンなどの第3級アミン類などが挙げられる。これらの触媒は、単独で又は2種以上組み合わせてもよい。触媒の使用量は、ポリオールの総量100質量%に対して、0.001質量%以上10質量%以下であることが好ましい。 Note that this step may be performed in the presence of a catalyst. Examples of the catalyst include, for example, organic tin compounds such as tin octylate, dibutyltin diacetate, dibutyltin dilaurate and 2-ethylhexanetin, naphthenic acid metal salts such as copper naphthenate, zinc naphthenate and cobalt naphthenate, triethylamine, benzyl And tertiary amines such as dimethylamine, pyridine, N, N-dimethylpiperazine, and triethylenediamine. These catalysts may be used alone or in combination of two or more. The amount of the catalyst used is preferably 0.001% by mass to 10% by mass with respect to 100% by mass of the total amount of polyol.
本工程により得られるポリオール骨格を有するジイソシアネートは、慣用の分離方法、例えば、貧溶媒での再沈殿、濃縮、濾過などの分離手段や、これらを組み合わせた分離手段により、分離精製できる。 The diisocyanate having a polyol skeleton obtained in this step can be separated and purified by a conventional separation method, for example, separation means such as reprecipitation with a poor solvent, concentration and filtration, or a separation means combining these.
(工程(II):ブロック剤と工程(I)で得られたポリオール骨格を有するジイソシアネートとを反応させる工程)
本工程は、ブロック剤と工程(I)で得られたポリオール骨格を有するポリイソシアネートとを反応させる工程である。これにより、本実施形態に係るブロックイソシアネートが得られる。
(Step (II): a step of reacting a blocking agent with a diisocyanate having a polyol skeleton obtained in step (I))
This step is a step of reacting the blocking agent with the polyisocyanate having the polyol skeleton obtained in step (I). Thereby, the blocked isocyanate which concerns on this embodiment is obtained.
ここでいうブロック剤とは、ジイソシアネートが有するイソシアネート基(-NCO)と反応して、活性なイソシアネート基を保護することのできる化合物である。ブロック剤によって保護されたイソシアネート基は、ブロックイソシアネート基またはブロック化イソシアネート基と呼ばれる。ブロックイソシアネート基はブロック剤によって保護されているため通常の状態では安定を保つことができる。 Here, the blocking agent is a compound capable of protecting an active isocyanate group by reacting with an isocyanate group (—NCO) of diisocyanate. Isocyanate groups protected by a blocking agent are called blocked isocyanate groups or blocked isocyanate groups. Since the blocked isocyanate group is protected by the blocking agent, it can be kept stable in a normal state.
ブロックイソシアネート基を有するブロックイソシアネート化合物を加熱すると、ブロックイソシアネート基からブロック剤が解離(脱ブロック化)し、元のイソシアネート基を再生することができる。 When the blocked isocyanate compound having a blocked isocyanate group is heated, the blocking agent is dissociated (deblocked) from the blocked isocyanate group, and the original isocyanate group can be regenerated.
本工程で用いられるブロック剤は、アミノ基を有する(メタ)アクリル化合物であれば特に限定されないが、tert‐ブチルアミノエチル(メタ)アクリレート、tert‐ペンチルアミノエチル(メタ)アクリレート、tert‐ヘキシルアミノエチル(メタ)アクリレート、および、tert‐ブチルアミノプロピル(メタ)アクリレートから選択される化合物であることが好ましい。これにより、ブロックイソシアネートの脱ブロック化温度を低下させることができる。 The blocking agent used in this step is not particularly limited as long as it is a (meth) acrylic compound having an amino group, but tert-butylaminoethyl (meth) acrylate, tert-pentylaminoethyl (meth) acrylate, tert-hexylamino A compound selected from ethyl (meth) acrylate and tert-butylaminopropyl (meth) acrylate is preferable. Thereby, the deblocking temperature of blocked isocyanate can be lowered.
本工程は、ブロック剤とポリオール骨格を有するジイソシアネートとを溶媒中で反応させることが好ましい。当該溶媒は、ブロック剤とポリオール骨格を有するポリイソシアネートとが溶解するものならば特に限定されず、具体的には、工程(I)で述べたものを用いることができる。 In this step, it is preferable to react a blocking agent and a diisocyanate having a polyol skeleton in a solvent. The solvent is not particularly limited as long as the blocking agent and the polyisocyanate having a polyol skeleton are dissolved, and specifically, those described in the step (I) can be used.
本工程は、窒素、ヘリウム、アルゴンなどの不活性雰囲気中で行うことが好ましい。また本工程は、0℃以上150℃以下で行うことが好ましく、30℃以上80℃以下で行うことがより好ましい。また本工程は、還流下で行ってもよい。本工程を0℃未満の反応温度で行うと反応が進行しにくくなる。また、本工程を150℃より高い反応温度で行うとブロック剤同士が(メタ)アクリロイル基の重合反応によって重合する恐れがある。その結果、収率が低下する恐れがある。 This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, more preferably 30 ° C. or higher and 80 ° C. or lower. Moreover, you may perform this process under recirculation | reflux. When this step is carried out at a reaction temperature of less than 0 ° C., the reaction is difficult to proceed. Moreover, when this process is performed at reaction temperature higher than 150 degreeC, there exists a possibility that block agents may superpose | polymerize by the polymerization reaction of a (meth) acryloyl group. As a result, the yield may decrease.
なお、本工程は、触媒の存在下で行ってもよい。触媒の具体例としては、工程(I)で述べたものを用いることができる。 Note that this step may be performed in the presence of a catalyst. As specific examples of the catalyst, those described in the step (I) can be used.
また、本工程は、ブロック剤の(メタ)アクリロイル基の重合を抑制する目的で重合禁止剤を用いてもよい。具体的には、ベンゾキノン、ハイドロキノン、カテコール、ジフェニルベンゾキノン、ハイドロキノンモノメチルエーテル、ナフトキノン、t-ブチルカテコール、t-ブチルフェノール、ジメチル-t-ブチルフェノール、t-ブチルクレゾール、ジブチルヒドロキシトルエン及びフェノチアジンなどが挙げられる。 In this step, a polymerization inhibitor may be used for the purpose of suppressing polymerization of the (meth) acryloyl group of the blocking agent. Specific examples include benzoquinone, hydroquinone, catechol, diphenylbenzoquinone, hydroquinone monomethyl ether, naphthoquinone, t-butylcatechol, t-butylphenol, dimethyl-t-butylphenol, t-butylcresol, dibutylhydroxytoluene and phenothiazine.
本工程により得られるブロックイソシアネートは、工程(I)と同様の手法で、分離精製できる。 The blocked isocyanate obtained in this step can be separated and purified by the same method as in step (I).
[鎖延長剤(d)]
鎖延長剤(d)は、ブロックイソシアネート(a1)または後述するブロックイソシアネート(a3)の有するブロックイソシアネート基が脱ブロック化して生成するイソシアネート基と反応する活性水素を少なくとも2つ有する化合物である。
[Chain extender (d)]
The chain extender (d) is a compound having at least two active hydrogens that react with an isocyanate group formed by deblocking a blocked isocyanate group of the blocked isocyanate (a1) or the blocked isocyanate (a3) described later.
イソシアネート基と反応する活性水素としては、ヒドロキシル基中の水素原子や、アミノ基中の水素原子、チオール基中の水素原子が挙げられる。したがって、鎖延長剤(d)は、ヒドロキシル基、アミノ基、およびチオール基からなる群から選択される同種、もしくは異種の官能基を1分子中に少なくとも2つ有する化合物を含有することが好ましい。また、反応性の観点から、鎖延長剤(d)はヒドロキシル基を少なくとも2つ有するポリオール、アミノ基を少なくとも2つ有するポリアミン、およびチオール基を少なくとも2つ有するポリチオールからなる群から選択される少なくとも1つを含有することがより好ましい。特にヒドロキシル基を有する鎖延長剤(d)を用いる場合、反応性の観点から後述する反応促進剤(e)を用いることが好ましい。 Examples of active hydrogen that reacts with an isocyanate group include a hydrogen atom in a hydroxyl group, a hydrogen atom in an amino group, and a hydrogen atom in a thiol group. Therefore, the chain extender (d) preferably contains a compound having at least two of the same or different functional groups selected from the group consisting of a hydroxyl group, an amino group, and a thiol group in one molecule. From the viewpoint of reactivity, the chain extender (d) is at least selected from the group consisting of a polyol having at least two hydroxyl groups, a polyamine having at least two amino groups, and a polythiol having at least two thiol groups. It is more preferable to contain one. In particular, when the chain extender (d) having a hydroxyl group is used, the reaction accelerator (e) described later is preferably used from the viewpoint of reactivity.
鎖延長剤(d)の具体例としては、エチレングリコール、1,3-プロパンジオール、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、1,8-オクタンジオール、1,9-ノナンジオール、1,10-デカンジオール等の直鎖ジオール類;2-メチル-1,3-プロパンジオール、2,2-ジメチル-1,3-プロパンジオール、2,2-ジエチル-1,3-プロパンジオール、2-メチル-2-プロピル-1,3-プロパンジオール、2,4-ヘプタンジオール、1,4-ジメチロールヘキサン、2-エチル-1,3-ヘキサンジオール、2,2,4-トリメチル-1,3-ペンタンジオール、2-メチル-1,8-オクタンジオール、2-ブチル-2-エチル-1,3-プロパンジオール、ダイマージオール等の分岐鎖を有するジオール類;ジエチレングリコール、プロピレングリコール等のエーテル基を有するジオール類;1,4-シクロヘキサンジオール、1,4-シクロヘキサンジメタノール、1,4-ジヒドロキシエチルシクロヘキサン等の脂環構造を有するジオール類、キシリレングリコール、1,4-ジヒドロキシエチルベンゼン、4,4’-メチレンビス(ヒドロキシエチルベンゼン)等の芳香族基を有するジオール類;グリセリン、トリメチロールプロパン、ペンタエリスリトール等のポリオール類;N-メチルエタノールアミン、N-エチルエタノールアミン等のヒドロキシアミン類;エチレンジアミン、1,3-ジアミノプロパン、ヘキサメチレンジアミン、トリエチレンテトラミン、ジエチレントリアミン、イソホロンジアミン、4,4’-ジアミノジシクロヘキシルメタン、2-ヒドロキシエチルプロピレンジアミン、ジ-2-ヒドロキシエチルエチレンジアミン、ジ-2-ヒドロキシエチルプロピレンジアミン、2-ヒドロキシプロピルエチレンジアミン、ジ-2-ヒドロキシプロピルエチレンジアミン、4,4’-ジフェニルメタンジアミン、メチレンビス(o-クロロアニリン)、キシリレンジアミン、ジフェニルジアミン、トリレンジアミン、ヒドラジン、ピペラジン、N,N’-ジアミノピペラジン等のポリアミン類;1,2-エタンジチオール、1,2,3-プロパントリチオール、1,2-シクロヘキサンジチオール、ビス(2-メルカプトエチル)エーテル、テトラキス(メルカプトメチル)メタン、ジエチレングリコールビス(2-メルカプトアセテート)、トリメチロールプロパントリス(3-メルカプトプロピオネート)、トリメチロールプロパントリス(2-メルカプトアセテート)、ペンタエリスリトールテトラキス(2-メルカプトアセテート)、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)、ヒドロキシメチルスルフィドビス(2-メルカプトアセテート)、ヒドロキシメチルスルフィドビス(3-メルカプトプロピオネート)、1,1,3,3-テトラキス(メルカプトメチルチオ)プロパン、トリス(メルカプトエチルチオ)メタン等の脂肪族ポリチオール類;1,2-ジメルカプトベンゼン、1,3-ジメルカプトベンゼン、1,4-ジメルカプトベンゼン、1,2-ビス(メルカプトメチル)ベンゼン、1,3-ビス(メルカプトメチル)ベンゼン、1,4-ビス(メルカプトメチル)ベンゼン、1,2-ビス(メルカプトエチル)ベンゼン、1,3-ビス(メルカプトエチル)ベンゼン、1,4-ビス(メルカプトエチル)ベンゼン、1,3,5-トリメルカプトベンゼン、1,3,5-トリス(メルカプトメチル)ベンゼン、1,3,5-トリス(メルカプトメチレンオキシ)ベンゼン、1,3,5-トリス(メルカプトエチレンオキシ)ベンゼン、2,5-トルエンジチオール、3,4-トルエンジチオール、1,5-ナフタレンジチオール、2,6-ナフタレンジチオール等の芳香族ポリチオール化合物類;及び水等を挙げることができる。これらの鎖延長剤は単独で用いてもよく、2種以上を併用してもよい。 Specific examples of the chain extender (d) include ethylene glycol, 1,3-propanediol, 1,4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,8-octanediol, Linear diols such as 1,9-nonanediol and 1,10-decanediol; 2-methyl-1,3-propanediol, 2,2-dimethyl-1,3-propanediol, 2,2-diethyl- 1,3-propanediol, 2-methyl-2-propyl-1,3-propanediol, 2,4-heptanediol, 1,4-dimethylolhexane, 2-ethyl-1,3-hexanediol, 2, 2,4-trimethyl-1,3-pentanediol, 2-methyl-1,8-octanediol, 2-butyl-2-ethyl-1,3-propanediol, dimer Diols having branched chains such as diols; Diols having ether groups such as diethylene glycol and propylene glycol; Alicyclic structures such as 1,4-cyclohexanediol, 1,4-cyclohexanedimethanol and 1,4-dihydroxyethylcyclohexane Diols having an aromatic group such as xylylene glycol, 1,4-dihydroxyethylbenzene, 4,4′-methylenebis (hydroxyethylbenzene); polyols such as glycerin, trimethylolpropane, pentaerythritol; N -Hydroxyamines such as methylethanolamine and N-ethylethanolamine; ethylenediamine, 1,3-diaminopropane, hexamethylenediamine, triethylenetetramine, diethylenetriamine, iso Rondiamine, 4,4'-diaminodicyclohexylmethane, 2-hydroxyethylpropylenediamine, di-2-hydroxyethylethylenediamine, di-2-hydroxyethylpropylenediamine, 2-hydroxypropylethylenediamine, di-2-hydroxypropylethylenediamine, 4 , 4′-diphenylmethanediamine, methylenebis (o-chloroaniline), xylylenediamine, diphenyldiamine, tolylenediamine, hydrazine, piperazine, polyamines such as N, N′-diaminopiperazine; 1,2-ethanedithiol, 1 , 2,3-propanetrithiol, 1,2-cyclohexanedithiol, bis (2-mercaptoethyl) ether, tetrakis (mercaptomethyl) methane, diethylene glycol bis (2- Mercaptoacetate), trimethylolpropane tris (3-mercaptopropionate), trimethylolpropane tris (2-mercaptoacetate), pentaerythritol tetrakis (2-mercaptoacetate), pentaerythritol tetrakis (3-mercaptopropionate), Aliphatic acids such as hydroxymethyl sulfide bis (2-mercaptoacetate), hydroxymethyl sulfide bis (3-mercaptopropionate), 1,1,3,3-tetrakis (mercaptomethylthio) propane, tris (mercaptoethylthio) methane Polythiols; 1,2-dimercaptobenzene, 1,3-dimercaptobenzene, 1,4-dimercaptobenzene, 1,2-bis (mercaptomethyl) benzene, 1,3-bis (merca) Tomethyl) benzene, 1,4-bis (mercaptomethyl) benzene, 1,2-bis (mercaptoethyl) benzene, 1,3-bis (mercaptoethyl) benzene, 1,4-bis (mercaptoethyl) benzene, 1, 3,5-trimercaptobenzene, 1,3,5-tris (mercaptomethyl) benzene, 1,3,5-tris (mercaptomethyleneoxy) benzene, 1,3,5-tris (mercaptoethyleneoxy) benzene, 2 Aromatic polythiol compounds such as 1,5-toluenedithiol, 3,4-toluenedithiol, 1,5-naphthalenedithiol, 2,6-naphthalenedithiol; and water. These chain extenders may be used alone or in combination of two or more.
これらの中でも、光硬化性組成物を後述するように光硬化させた後に熱処理して得られる硬化物の物性のバランスが好ましい点、工業的に安価に多量に入手が可能な点で、1,4-ブタンジオール、1,5-ペンタンジオール、1,6-ヘキサンジオール、1,8-オクタンジオール、1,9-ノナンジオール、1,10-デカンジオール、1,4-シクロヘキサンジメタノール、1,4-ジヒドロキシエチルシクロヘキサン、エチレンジアミン、1,3-ジアミノプロパン、イソホロンジアミン、4,4’-ジアミノジシクロヘキシルメタンが好ましい。 Among these, the balance of the physical properties of a cured product obtained by heat-curing the photocurable composition after photocuring as described later is preferable, and it is industrially inexpensive and available in large quantities. 4-butanediol, 1,5-pentanediol, 1,6-hexanediol, 1,8-octanediol, 1,9-nonanediol, 1,10-decanediol, 1,4-cyclohexanedimethanol, 1, 4-Dihydroxyethylcyclohexane, ethylenediamine, 1,3-diaminopropane, isophoronediamine, and 4,4′-diaminodicyclohexylmethane are preferred.
ブロックイソシアネート(a1)のモル数に対する鎖延長剤(d)のモル数の比(鎖延長剤(d)のモル数/ブロックイソシアネート(a1)のモル数)は、0.1以上5以下であることが好ましく、0.5以上3以下であることがより好ましい。後述するように、本実施形態に係る光硬化性組成物を光硬化させた後に熱処理するとイソシアネート基が再生し、当該イソシアネート基と鎖延長剤(d)との間でウレタン結合等の結合が生成する反応が生じる。しかし、前記比が0.1より小さいと、当該イソシアネート基と鎖延長剤(d)との間の反応の効率が低くなり、光硬化した後に熱処理して最終的に得られる立体物の機械特性が低下する傾向にある。また、前記比が5より大きいと、未反応の過剰な鎖延長剤(d)が立体物の内部に残留し、光硬化した後に熱処理して最終的に得られる立体物の機械特性が低下する傾向にある。 The ratio of the number of moles of chain extender (d) to the number of moles of blocked isocyanate (a1) (number of moles of chain extender (d) / number of moles of blocked isocyanate (a1)) is 0.1 or more and 5 or less. It is preferably 0.5 or more and 3 or less. As will be described later, when the photocurable composition according to this embodiment is photocured and then heat treated, the isocyanate group is regenerated, and a bond such as a urethane bond is formed between the isocyanate group and the chain extender (d). Reaction occurs. However, if the ratio is less than 0.1, the efficiency of the reaction between the isocyanate group and the chain extender (d) is low, and the mechanical properties of the three-dimensional product finally obtained by heat treatment after photocuring Tend to decrease. On the other hand, if the ratio is larger than 5, unreacted excess chain extender (d) remains inside the three-dimensional object, and the mechanical properties of the three-dimensional object finally obtained by heat treatment after photocuring deteriorates. There is a tendency.
[反応促進剤(e)]
本実施形態では上述のように(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つ有するポリロタキサンを含有する。反応促進剤(e)は、鎖延長剤(d)がヒドロキシル基を有する化合物を用いる場合、あるいはヒドロキシル基を有するポリロタキサン(c)を用いる場合に、ブロックイソシアネート(a1)が有するブロックイソシアネート基が脱ブロック化して生成するイソシアネート基とヒドロキシル基との反応を促進させることを特徴とする化合物である。反応促進剤の例としては、例えば、ジラウリン酸ジブチルスズ、ジラウリン酸ジオクチルスズ、ジオクタン酸ジブチルスズ等のスズ化合物を用いることができる。
[Reaction accelerator (e)]
In the present embodiment, as described above, the polyrotaxane having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group is contained. When the chain extender (d) uses a compound having a hydroxyl group, or when a polyrotaxane (c) having a hydroxyl group is used, the reaction accelerator (e) removes the blocked isocyanate group of the blocked isocyanate (a1). It is a compound characterized by accelerating the reaction between an isocyanate group formed by blocking and a hydroxyl group. Examples of the reaction accelerator include tin compounds such as dibutyltin dilaurate, dioctyltin dilaurate, and dibutyltin dioctanoate.
これらの反応促進剤(e)は、単独で又は2種以上組み合わせてもよい。反応促進剤(e)の使用量は、ポリオールの総量100質量%に対して、0.001質量%以上10質量%以下であることが好ましい。 These reaction accelerators (e) may be used alone or in combination of two or more. The amount of the reaction accelerator (e) used is preferably 0.001% by mass or more and 10% by mass or less with respect to 100% by mass of the total amount of polyol.
[光硬化性組成物の機能]
本実施形態に係る立体造形用の光硬化性組成物は(メタ)アクリロイル基、ヒドロキシル基から選択される官能基を少なくとも一つ有するポリロタキサン(c)を含有しているため、第1の実施形態と同様に、光を照射して硬化させた際に、従来よりも靱性が高い硬化物(立体物)を得ることができる。
[Functions of the photocurable composition]
Since the photocurable composition for three-dimensional modeling according to the present embodiment contains a polyrotaxane (c) having at least one functional group selected from a (meth) acryloyl group and a hydroxyl group, the first embodiment. Similarly, when cured by irradiation with light, a cured product (three-dimensional product) with higher toughness than before can be obtained.
また、本実施形態に係る立体造形用の光硬化性組成物は、光を照射して硬化(光硬化)させ、次いで熱処理を施すことでさらに靱性を向上させることができる。この反応スキームについて、図2を用いて説明する。図2は、本実施形態に係る光硬化性組成物に光を照射して硬化させ、次いで熱処理を施したときの反応スキームを模式的に示す図である。 Also, the photocurable composition for three-dimensional modeling according to the present embodiment can be further improved in toughness by being cured by being irradiated with light (photocuring) and then subjected to heat treatment. This reaction scheme will be described with reference to FIG. FIG. 2 is a diagram schematically showing a reaction scheme when the photocurable composition according to this embodiment is cured by irradiating light and then subjected to heat treatment.
(メタ)アクリロイル基を有するポリロタキサンを用いた場合、本実施形態に係る光硬化性組成物に対して所定の波長の光(例えば紫外線)を照射すると、光硬化性組成物中の光ラジカル発生剤(b)がラジカルを発生させる。すると、ブロックイソシアネート(a1)の有する(メタ)アクリロイル基が重合反応し、固体化する。このとき、(メタ)アクリロイル基を有するポリロタキサン(c)とブロックイソシアネート(a1)との間の重合反応も進行する。なお、光硬化性組成物が他のラジカル重合性化合物などの反応性希釈剤をさらに含有する場合には、ブロックイソシアネート(a1)、ポリロタキサン(c)および反応性希釈剤の3つの成分を適宜組み合わせた重合反応が進行する。これにより、図2(B)に模式的に示されるような光硬化物が生成される。この光硬化物は、第1の実施形態と同様に、架橋点が動くことができるため、光硬化性組成物がポリロタキサン(c)を含有していなかった場合よりも靱性が高い。 When a polyrotaxane having a (meth) acryloyl group is used, a photo radical generator in the photocurable composition is obtained by irradiating the photocurable composition according to the present embodiment with light of a predetermined wavelength (for example, ultraviolet rays). (B) generates radicals. Then, the (meth) acryloyl group possessed by the blocked isocyanate (a1) undergoes a polymerization reaction and solidifies. At this time, the polymerization reaction between the polyrotaxane (c) having a (meth) acryloyl group and the blocked isocyanate (a1) also proceeds. In addition, when the photocurable composition further contains a reactive diluent such as another radical polymerizable compound, the three components of blocked isocyanate (a1), polyrotaxane (c) and reactive diluent are appropriately combined. The polymerization reaction proceeds. Thereby, a photocured material as schematically shown in FIG. 2B is generated. Since this photocured product can move a cross-linking point as in the first embodiment, the photocured composition has higher toughness than the case where the photocurable composition does not contain polyrotaxane (c).
次に、得られた光硬化物に対して熱処理を施すと、図2(C)に模式的に示すように、ブロック剤由来のブロック部(BL)が脱離する脱ブロック化が進行し、イソシアネート基(-NCO)が再生される。すると、再生されたイソシアネート基が直ちに鎖延長剤(d)と反応する。これにより、鎖延長剤(d)がヒドロキシル基を有していた場合には反応促進剤(e)の効果によりウレタン結合が生成し、鎖延長剤(d)がアミノ基を有していた場合にはウレア結合が生成される。この結果、図2(D)に模式的に示される硬化物が得られる。 Next, when the obtained photocured product is subjected to a heat treatment, as schematically shown in FIG. 2 (C), deblocking in which the block part (BL) derived from the blocking agent proceeds, Isocyanate groups (—NCO) are regenerated. Then, the regenerated isocyanate group immediately reacts with the chain extender (d). Thereby, when the chain extender (d) has a hydroxyl group, a urethane bond is generated by the effect of the reaction accelerator (e), and the chain extender (d) has an amino group. A urea bond is formed in. As a result, a cured product schematically shown in FIG. 2 (D) is obtained.
一方ヒドロキシル基を有するポリロタキサンを用いた場合、本実施形態に係る光硬化性組成物に対して所定の波長の光(例えば紫外線)を照射すると、光硬化性組成物中の光ラジカル発生剤(b)がラジカルを発生させる。すると、ブロックイソシアネート(a1)の有する(メタ)アクリロイル基が重合反応し、固体化する。なお、光硬化性組成物が他のラジカル重合性化合物などの反応性希釈剤をさらに含有する場合には、ブロックイソシアネート(a1)、反応性希釈剤の2つの成分を適宜組み合わせた重合反応が進行する。これにより、図3(B)に模式的に示されるような光硬化物が生成される。 On the other hand, when a polyrotaxane having a hydroxyl group is used, when the photocurable composition according to this embodiment is irradiated with light having a predetermined wavelength (for example, ultraviolet rays), a photo radical generator (b) in the photocurable composition (b) ) Generates radicals. Then, the (meth) acryloyl group possessed by the blocked isocyanate (a1) undergoes a polymerization reaction and solidifies. In addition, when the photocurable composition further contains a reactive diluent such as another radical polymerizable compound, a polymerization reaction proceeds by appropriately combining the two components of the blocked isocyanate (a1) and the reactive diluent. To do. As a result, a photocured product as schematically shown in FIG. 3B is generated.
次に、得られた光硬化物に対して熱処理を施すと、図3(C)に模式的に示すように、ブロック剤由来のブロック部(BL)が脱離する脱ブロック化が進行し、イソシアネート基(-NCO)が再生される。すると、再生されたイソシアネート基が反応促進剤(e)の効果によりポリロタキサン(c)のヒドロキシル基と直ちに反応し、ウレタン結合が生成する。この光硬化物は、第1の実施形態と同様に、架橋点が動くことができるため、光硬化性組成物がポリロタキサン(c)を含有していなかった場合よりも靱性が高い。 Next, when the obtained photocured product is subjected to a heat treatment, as schematically shown in FIG. 3 (C), deblocking in which the block part (BL) derived from the blocking agent proceeds, Isocyanate groups (—NCO) are regenerated. Then, the regenerated isocyanate group reacts immediately with the hydroxyl group of the polyrotaxane (c) by the effect of the reaction accelerator (e), and a urethane bond is generated. Since this photocured product can move a cross-linking point as in the first embodiment, the photocured composition has higher toughness than the case where the photocurable composition does not contain polyrotaxane (c).
この結果、図3(D)に模式的に示される硬化物が得られる。 As a result, a cured product schematically shown in FIG. 3 (D) is obtained.
このように、本実施形態に係る光硬化性組成物では、光硬化させた後に熱処理を行うことで、上述のように脱ブロック化が生じることで光硬化させた後よりも架橋密度を低下させることができる。そして、ウレタン結合またはウレア結合が生成し、ポリウレタン構造またはポリウレア構造、それらの混合構造を有する硬化物が生成する。この結果、さらに靱性を向上させることができる。 As described above, in the photocurable composition according to this embodiment, by performing heat treatment after photocuring, the crosslink density is reduced more than after photocuring due to deblocking as described above. be able to. And a urethane bond or a urea bond produces | generates, and the hardened | cured material which has a polyurethane structure or a polyurea structure, and those mixed structures produces | generates. As a result, the toughness can be further improved.
靱性改善成分を硬化性組成物に添加することでその硬化性組成物を硬化して得られる硬化物の靱性が改善される度合いは、硬化物の架橋密度に影響されることが知られている。すなわち、架橋密度が高い硬化物では靱性改善成分による靱性の改善効果が小さくなり、逆に、架橋密度が低い硬化物では、その改善効果は大きくなる。本実施形態では、重合性化合物(a)として(メタ)アクリロイル基を有するブロックイソシアネート(a1)を用いることで、上述のように、光硬化後に熱処理を施すことで脱ブロック化反応によって光硬化物中の結合を切断することができる。すなわち、熱処理を施すことによって、硬化物の架橋密度を低くすることができる。したがって、本実施形態によれば、熱処理を施すことで一般的な光硬化物よりも架橋密度を低下させることができるため、靱性改善成分であるポリロタキサン(c)による靱性の改善効果をより大きく発揮することができる。 It is known that the degree to which the toughness of a cured product obtained by curing the curable composition by adding a toughness improving component to the curable composition is affected by the crosslink density of the cured product. . That is, the effect of improving toughness due to the toughness improving component is reduced in a cured product having a high crosslinking density, and conversely, the effect of improvement is increased in a cured product having a low crosslinking density. In the present embodiment, by using the blocked isocyanate (a1) having a (meth) acryloyl group as the polymerizable compound (a), as described above, a photocured product is obtained by a deblocking reaction by performing a heat treatment after photocuring. The bond inside can be broken. That is, by performing heat treatment, the crosslink density of the cured product can be lowered. Therefore, according to the present embodiment, since the crosslinking density can be reduced by performing heat treatment as compared with a general photocured product, the toughness improving effect by the polyrotaxane (c), which is a toughness improving component, is exhibited more greatly. can do.
(光-熱硬化物)
本実施形態に係る光硬化性組成物を光硬化させ、次いで熱処理して得られる硬化物(光-熱硬化物)について説明する。本実施形態に係る光-熱硬化物(樹脂)は、下記一般式(8)で表される繰り返し構造単位と、下記一般式(9)で表される繰り返し構造単位と、ポリロタキサン構造と、を含有する。
(Light-thermoset)
A cured product (photo-thermosetting product) obtained by photocuring the photocurable composition according to this embodiment and then heat-treating will be described. The photo-thermoset (resin) according to the present embodiment includes a repeating structural unit represented by the following general formula (8), a repeating structural unit represented by the following general formula (9), and a polyrotaxane structure. contains.
ここで、式(8)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(9)中、R3、R4およびR5は各々独立に、置換基を有していてもよい炭素原子数1から20の炭化水素基を表し、X1およびX2は各々独立に、О(酸素原子)、S(硫黄原子)、およびNH(イミノ基)のいずれかを表す。aは1以上100以下の整数である。 Here, in formula (8), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may have In the formula (9), R 3 , R 4 and R 5 each independently represent a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and X 1 and X 2 are each Independently, one of O (oxygen atom), S (sulfur atom), and NH (imino group) is represented. a is an integer of 1 or more and 100 or less.
式(8)および式(9)において、L1、R2、R3、R4およびR5のいずれかが置換基を有する場合には、当該置換基は炭素原子を含む置換基であってもよい。ただしその場合、当該置換基がL1、R2、R3、R4およびR5のそれぞれと結合する原子は炭素原子以外の原子である。またその場合、置換基に含まれる炭素原子の数は「炭化水素基」の炭素原子数には含めないものとする。また、上記置換基はヘテロ原子を含んでいてもよい。 In Formula (8) and Formula (9), when any of L 1 , R 2 , R 3 , R 4 and R 5 has a substituent, the substituent is a substituent containing a carbon atom, Also good. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 3 , R 4 and R 5 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”. Moreover, the said substituent may contain the hetero atom.
式(8)中、R2は、前述した様に脱ブロック化温度を低下させることができるため、tert‐ブチル基、tert‐ペンチル基、および、tert‐ヘキシル基から選択される基であることが好ましい。また、R2として上記のいずれかの基を採用することで、光-熱硬化物の合成を低コストで容易にすることができる。 In Formula (8), R 2 is a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group because the deblocking temperature can be lowered as described above. Is preferred. In addition, by adopting any of the above groups as R 2 , the synthesis of the photo-thermosetting product can be facilitated at low cost.
式(8)中、L1は入手や合成のし易さの観点からエチレン基またはプロピレン基であることが好ましい。 In formula (8), L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
式(9)中、R3は入手や合成のし易さの観点から下記式(A-1)~(A-4)からなる群から選択される少なくとも1つの2価の連結基を有することが好ましい。 In formula (9), R 3 has at least one divalent linking group selected from the group consisting of the following formulas (A-1) to (A-4) from the viewpoint of easy availability and synthesis. Is preferred.
ここで、式(A-1)中、cは1以上10以下の整数であり、式(A-2)中、dは1以上10以下の整数である。 Here, in the formula (A-1), c is an integer of 1 to 10, and in the formula (A-2), d is an integer of 1 to 10.
また、式(9)中、R3は上記式(A-4)で表される基を有することが好ましい。これにより、光-熱硬化物の弾性率を高めることができる。 In Formula (9), R 3 preferably has a group represented by Formula (A-4). Thereby, the elastic modulus of the photo-thermosetting product can be increased.
ここで、「ポリロタキサン構造」とは、複数の環状分子と、該複数の環状分子を串刺し状に貫通する直鎖状分子と、該直鎖状分子の両末端に配置され前記環状分子の脱離を防止する封鎖基と、を有する構造を指す。環状分子、直鎖状分子、封鎖基については上述のとおりである。 Here, the “polyrotaxane structure” means a plurality of cyclic molecules, a linear molecule penetrating the plurality of cyclic molecules in a skewered manner, and the elimination of the cyclic molecules arranged at both ends of the linear molecule. And a blocking group that prevents the above. The cyclic molecule, linear molecule, and blocking group are as described above.
本実施形態に係る光-熱硬化物においては、上記一般式(8)で表される繰り返し構造単位と、ポリロタキサン構造中の環状分子とが結合している。ポリロタキサン構造中の環状分子は、ポリロタキサン構造中の直鎖状分子に沿って自由に移動することができる。そのため、外部応力などが加わった際にもその応力に応じて硬化物中の架橋点が移動することができるため、応力に対してポリマー間のテンションが均一になる結果、本実施形態に係る光-熱硬化物は高い靱性を示す。 In the photo-thermosetting material according to the present embodiment, the repeating structural unit represented by the general formula (8) is bonded to the cyclic molecule in the polyrotaxane structure. The cyclic molecule in the polyrotaxane structure can freely move along the linear molecule in the polyrotaxane structure. Therefore, when an external stress is applied, the cross-linking point in the cured product can move in accordance with the stress. As a result, the tension between the polymers becomes uniform with respect to the stress. -Thermosets show high toughness.
[立体物の製造方法]
本実施形態に係る光硬化性組成物は、光学的立体造形法(光造形法)による立体物の製造方法に好適に用いることができる。以下、本実施形態に係る光硬化性組成物を用いた立体物の製造方法について説明する。
[Method of manufacturing a three-dimensional object]
The photocurable composition which concerns on this embodiment can be used suitably for the manufacturing method of the solid thing by the optical three-dimensional modeling method (optical modeling method). Hereinafter, the manufacturing method of the solid thing using the photocurable composition concerning this embodiment is demonstrated.
本実施形態に係る立体物の製造方法は、光造形法によって造形物を造形する工程と、前記造形物に熱処理を施す工程と、を有する。 The manufacturing method of the three-dimensional object which concerns on this embodiment has the process of modeling a modeling object by the optical modeling method, and the process of heat-processing the said modeling object.
<光造形法によって造形物を造形する工程>
光造形法としては、従来公知の方法を用いることができる。本工程は、作成したい立体物のスライスデータに基づいて光硬化性組成物に活性エネルギー線を選択的に照射して、当該光硬化性組成物を層毎に硬化させる工程を含む。
<Process of modeling a model by stereolithography>
A conventionally known method can be used as the optical modeling method. This step includes a step of selectively irradiating the photocurable composition with active energy rays based on slice data of a three-dimensional object to be created to cure the photocurable composition layer by layer.
本工程において光硬化性組成物に照射する活性エネルギー線としては、本実施形態に係る光硬化性組成物を硬化させることができる活性エネルギー線であれば特に制限はない。活性エネルギー線の具体例としては、紫外線、可視光線、赤外線、X線、ガンマー線、レーザー光線等の電磁波、アルファー線、ベータ線、電子線等の粒子線等が挙げられる。これらのうち、使用する光ラジカル発生剤(c)の吸収波長や設備導入のコストの点から、紫外線が最も好ましい。露光量としては、特に限定されないが、好ましくは0.001J/cm2以上10J/cm2以下である。0.001J/cm2未満であると、光硬化性組成物が十分に硬化しない恐れがあり、10J/cm2を超えると照射時間が長くなり生産性が落ちる。 There is no restriction | limiting in particular as an active energy ray irradiated to a photocurable composition in this process, if it is an active energy ray which can harden the photocurable composition which concerns on this embodiment. Specific examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X rays, gamma rays and laser rays, and particle rays such as alpha rays, beta rays and electron rays. Among these, ultraviolet rays are most preferable from the viewpoint of the absorption wavelength of the photoradical generator (c) to be used and the cost of equipment installation. The exposure amount is not particularly limited, preferably not 0.001J / cm 2 or more 10J / cm 2 or less. If it is less than 0.001 J / cm 2 , the photocurable composition may not be sufficiently cured, and if it exceeds 10 J / cm 2 , the irradiation time becomes longer and the productivity is lowered.
光硬化性組成物に対して活性エネルギー線を照射する方法は特に限定はされず、例えば活性エネルギー線として光を照射する場合には、以下の方法を採用することができる。第1の方法としては、レーザー光のように点状に集光した光を使用して、この光を光硬化性組成物に対して二次元的に走査する方法が挙げられる。このとき、二次元的な走査は点描方式でもよいし、線描方式でもよい。第2の方法としては、プロジェクターなどを用いて断面データの形状に光を照射する面露光方式が挙げられる。この場合、液晶シャッターまたはデジタルマイクロミラーシャッターなどのような微小光シャッターを複数配列して形成した面状描画マスクを通して、活性エネルギー線を面状に照射してもよい。 The method of irradiating the photocurable composition with active energy rays is not particularly limited. For example, when irradiating light as active energy rays, the following method can be employed. As a first method, there is a method of using two-dimensionally scanning light with respect to the photocurable composition using light condensed in a spot shape like laser light. At this time, the two-dimensional scanning may be a point drawing method or a line drawing method. As the second method, there is a surface exposure method in which light is applied to the shape of the cross-sectional data using a projector or the like. In this case, the active energy rays may be irradiated in a planar manner through a planar drawing mask formed by arranging a plurality of micro light shutters such as a liquid crystal shutter or a digital micromirror shutter.
本工程では、光造形法によって造形物を得た後に、得られた造形物の表面を有機溶剤などの洗浄剤によって洗浄してもよい。また、得られた造形物に対して光や熱を照射することで、造形物の表面や内部に残存することのある未反応の残存成分を硬化させるポストキュアーを行ってもよい。なお、熱照射によってポストキュアーを行う場合には、後述する造形物に熱処理を施す工程を兼ねてもよい。 In this step, after obtaining a shaped object by stereolithography, the surface of the obtained shaped object may be washed with a cleaning agent such as an organic solvent. Moreover, you may perform the postcure which hardens the unreacted residual component which may remain | survive on the surface or inside of a molded article by irradiating light and heat with respect to the obtained molded article. In addition, when performing post cure by heat irradiation, you may serve as the process of heat-processing to the molded article mentioned later.
<造形物に熱処理を施す工程>
本実施形態では、光造形法によって得られた造形物に対して熱処理を施すことにより、上述のように脱ブロック化を進行させて架橋密度を低下させるとともに、ポリウレタンまたはポリウレアを生成させる。これにより、靱性がより高い立体物を形成することができる。
<Process of heat-treating the model>
In the present embodiment, heat treatment is performed on a modeled object obtained by the optical modeling method to advance deblocking as described above to reduce the crosslinking density and to generate polyurethane or polyurea. Thereby, a three-dimensional object with higher toughness can be formed.
本工程における熱処理温度は、造形物中のブロック部の脱ブロック化が進行する温度であれば特に限定されないが、50℃以上200℃以下が好ましい。更に好ましくは、100℃以上150℃以下である。50℃より低いと脱ブロック化が進行せず、靱性を向上させる効果が十分に得られない可能性がある。200℃を超えると、樹脂が劣化し、立体物の各種機械特性が低下する恐れがある。 The heat treatment temperature in this step is not particularly limited as long as it is a temperature at which deblocking of the block portion in the molded article proceeds, but is preferably 50 ° C. or higher and 200 ° C. or lower. More preferably, it is 100 degreeC or more and 150 degrees C or less. If it is lower than 50 ° C., deblocking does not proceed, and the effect of improving toughness may not be sufficiently obtained. When it exceeds 200 ° C., the resin is deteriorated, and various mechanical properties of the three-dimensional object may be lowered.
本工程における熱処理時間は、造形物中のブロック部の脱ブロック化が十分に進行すれば特に限定されないが、0.5時間以上10時間以下が好ましい。0.5時間より短いと、脱ブロックが進行せず、靱性を向上させる効果が十分に得られない可能性がある。10時間より長いと、樹脂の劣化による立体物の各種機械特性の低下や、生産性の観点から不利である。 The heat treatment time in this step is not particularly limited as long as the deblocking of the block part in the shaped article proceeds sufficiently, but is preferably 0.5 hours or more and 10 hours or less. If it is shorter than 0.5 hour, deblocking does not proceed, and the effect of improving toughness may not be sufficiently obtained. If it is longer than 10 hours, it is disadvantageous from the viewpoints of reduction in various mechanical properties of the three-dimensional object due to deterioration of the resin and productivity.
(第3の実施形態)
本実施形態に係る光硬化性組成物は、第2の実施形態におけるブロックイソシアネート(a1)として、後述する(メタ)アクリロイル基を有するブロックイソシアネート(a2)を含有する。すなわち、第3の実施形態に係る光硬化性組成物は、ポリロタキサンが(メタ)アクリロイル基を有する場合、ブロックイソシアネート(a3)と、光ラジカル発生剤(b)と、ポリロタキサン(c)と、鎖延長剤(d)と、を含有する。一方ポリロタキサンがヒドロキシル基を有する場合、ブロックイソシアネート(a3)と、光ラジカル発生剤(b)と、ポリロタキサン(c)と、反応促進剤(e)とを含有する。
(Third embodiment)
The photocurable composition which concerns on this embodiment contains the blocked isocyanate (a2) which has the (meth) acryloyl group mentioned later as the blocked isocyanate (a1) in 2nd Embodiment. That is, in the photocurable composition according to the third embodiment, when the polyrotaxane has a (meth) acryloyl group, the blocked isocyanate (a3), the photoradical generator (b), the polyrotaxane (c), and the chain And an extender (d). On the other hand, when the polyrotaxane has a hydroxyl group, it contains a blocked isocyanate (a3), a photo radical generator (b), a polyrotaxane (c), and a reaction accelerator (e).
以下、本実施形態に係る光硬化性組成物に含有される各成分について、詳細に説明する。 Hereinafter, each component contained in the photocurable composition according to the present embodiment will be described in detail.
なお、以下の説明においては第1の実施形態および第2の実施形態と重複する部分については説明を省略することがある。 In the following description, description of the same parts as those in the first embodiment and the second embodiment may be omitted.
[ブロックイソシアネート(a2)]
ブロックイソシアネート(a2)は、下記一般式(5)で表される。
A-D-C・・・(5)
(式(5)中、AおよびCは各々独立に、下記式(2)で表される基を表し、Dは下記式(6)で表される基を表す。
[Block isocyanate (a2)]
The blocked isocyanate (a2) is represented by the following general formula (5).
A-D-C (5)
(In formula (5), A and C each independently represent a group represented by the following formula (2), and D represents a group represented by the following formula (6).
ここで、式(2)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(6)中、R11、R12およびR13は各々独立に、置換基を有していてもよい炭素原子数1から20の2価の炭化水素基を表す。また、eおよびfは、いずれか一方は0でもよい、1≦e+f≦50を満たす整数である。) Here, in formula (2), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may have In formula (6), R 11 , R 12 and R 13 each independently represent a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. E and f are integers satisfying 1 ≦ e + f ≦ 50, either one of which may be 0. )
式(2)および式(6)において、L1、R2、R11、R12およびR13のいずれかが置換基を有する場合には、当該置換基は炭素原子を含む置換基であってもよい。ただしその場合、当該置換基がL1、R2、R11、R12およびR13のそれぞれと結合する原子は炭素原子以外の原子である。またその場合、置換基に含まれる炭素原子の数は「炭化水素基」の炭素原子数には含めないものとする。 In Formula (2) and Formula (6), when any of L 1 , R 2 , R 11 , R 12 and R 13 has a substituent, the substituent is a substituent containing a carbon atom, Also good. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 11 , R 12 and R 13 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”.
式(2)中、R2はtert‐ブチル基、tert‐ペンチル基、および、tert‐ヘキシル基から選択される基であることが好ましい。これにより、光硬化性組成物を光硬化させた後に熱処理を施して脱ブロック化する際の温度(脱ブロック化温度)を低下させることができるため好ましい。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネート(a2)の合成を容易にすることができる。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネート(a2)の合成を低コストにすることができる。 In formula (2), R 2 is preferably a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group. This is preferable because the temperature (deblocking temperature) when the photocurable composition is photocured and then subjected to a heat treatment for deblocking can be reduced. Further, by adopting any one group of the R 2, it is possible to facilitate the synthesis of blocked isocyanate (a2). Further, by adopting any one group of the R 2, to obtain the synthesis of blocked isocyanate (a2) at low cost.
式(2)中、L1は入手や合成のし易さの観点からエチレン基またはプロピレン基であることが好ましい。 In formula (2), L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
式(6)中、R11およびR12は各々独立に、下記式(B-1)~(B-9)のいずれかであることが好ましい。これにより、後述するように光硬化性組成物を光硬化させた後に熱処理して得られる硬化物の弾性率と強度をさらに高くすることができる。 In the formula (6), R 11 and R 12 are preferably each independently any one of the following formulas (B-1) to (B-9). Thereby, the elastic modulus and intensity | strength of the hardened | cured material obtained by heat-processing after photocuring a photocurable composition so that it may mention later can be made still higher.
ここで、式(B-1)中、gは1から10の整数であり、式(B-2)中、hおよびiはいずれか一方は0でもよい、1≦h+i≦10を満たす整数である。また、式(B-3)中、jおよびkはいずれか一方は0でもよい、1≦j+k≦10を満たす整数である。 Here, in formula (B-1), g is an integer of 1 to 10, and in formula (B-2), either h or i may be 0, and is an integer satisfying 1 ≦ h + i ≦ 10 is there. In formula (B-3), either j or k may be 0, and is an integer that satisfies 1 ≦ j + k ≦ 10.
また、式(5)中、AとCは同一であることが好ましい。すなわち、ブロックイソシアネート(a2)は、下記一般式(7)で表されることが好ましい。これにより、ブロックイソシアネート(a2)の合成を安価に、かつ容易にすることができる。
A-D-A・・・(7)
(式(7)中、Aは上記式(2)で表される基を表し、Dは上記式(6)で表される基を表す。)
In formula (5), A and C are preferably the same. That is, the blocked isocyanate (a2) is preferably represented by the following general formula (7). Thereby, the synthesis | combination of block isocyanate (a2) can be made cheap and easy.
AD-A ... (7)
(In the formula (7), A represents a group represented by the above formula (2), and D represents a group represented by the above formula (6).)
ブロックイソシアネート(a2)の具体的な構造としては、以下のような構造が挙げられる。 Specific examples of the blocked isocyanate (a2) include the following structures.
<ブロックイソシアネート(a3)の合成方法>
次に、ブロックイソシアネート(a3)の合成方法について説明する。ブロックイソシアネート(a3)の合成方法は、下記の工程(I)´および工程(II)を含む。
工程(I)´:ポリカーボネートジオールとジイソシアネートとを反応させる工程
工程(II):ブロック剤と工程(I)で得られたポリカーボネート骨格を有するジイソシアネートと反応させる工程
<Synthesis Method of Blocked Isocyanate (a3)>
Next, a method for synthesizing the blocked isocyanate (a3) will be described. The method for synthesizing the blocked isocyanate (a3) includes the following step (I) ′ and step (II).
Step (I) ′: Step of reacting polycarbonate diol and diisocyanate Step (II): Step of reacting the blocking agent with the diisocyanate having the polycarbonate skeleton obtained in step (I)
工程(I)´は、第2の実施形態の工程(I)において、ポリオールの代わりにポリカーボネートジオールを用いること以外は同じなので、第2の実施形態と重複する部分については説明を省略する。 Since step (I) ′ is the same as in step (I) of the second embodiment except that polycarbonate diol is used instead of polyol, description of portions overlapping with those of the second embodiment will be omitted.
本工程で用いられるポリカーボネートジオールは、例えば、カーボネート化合物とジオールとのエステル交換反応によって合成できる。 The polycarbonate diol used in this step can be synthesized by, for example, a transesterification reaction between a carbonate compound and a diol.
ポリカーボネートジオールを合成するために用いるカーボネート化合物としては、ジメチルカーボネート、ジエチルカーボネート等のジアルキルカーボネート類、エチレンカーボネート、プロピレンカーボネート等のアルキレンカーボネート類、ジフェニルカーボネート、ジナフチルカーボネート、ジアントリルカーボネート、ジフェナントリルカーボネート、ジインダニルカーボネート、テトラヒドロナフチルカーボネート等のジアリールカーボネート類などが挙げられるが、これらに限定はされない。これらのカーボネート化合物を二種以上混合して用いてもよい。 Examples of carbonate compounds used to synthesize polycarbonate diol include dialkyl carbonates such as dimethyl carbonate and diethyl carbonate, alkylene carbonates such as ethylene carbonate and propylene carbonate, diphenyl carbonate, dinaphthyl carbonate, dianthryl carbonate, and diphenanthryl. Examples thereof include diaryl carbonates such as carbonate, diindanyl carbonate, and tetrahydronaphthyl carbonate, but are not limited thereto. Two or more of these carbonate compounds may be mixed and used.
ポリカーボネートジオールを合成するために用いるジオールとしては、エチレングリコール、ジエチレングリコール、プロピレングリコール、1,4-ブタンジオール、1,3-ブタンジオール、1,5-ペンタンジオール、ネオペンチルグリコール、3-メチル-1,5-ペンタンジオール、1,6-ヘキサンジオール、1,4-シクロヘキサンジメタノール、2-メチル-1,8-オクタンジオール、1,9-ノナンジオールなどの脂肪族ジオール、シクロヘキサンジオール、水添ビスフェノール-A、水添ビスフェノール-F、水添キシリレングコリール、などの脂環式ジオール、ビスフェノール-A、ビスフェノール-F、4,4’-ビフェノール、キシリレングリコール、などの芳香族ジオールなどが挙げられるが、これらに限定はされない。これらのジオールを二種以上混合して用いてもよい。 Examples of the diol used for synthesizing the polycarbonate diol include ethylene glycol, diethylene glycol, propylene glycol, 1,4-butanediol, 1,3-butanediol, 1,5-pentanediol, neopentyl glycol, 3-methyl-1 , 5-pentanediol, 1,6-hexanediol, 1,4-cyclohexanedimethanol, 2-methyl-1,8-octanediol, 1,9-nonanediol and other aliphatic diols, cyclohexanediol, hydrogenated bisphenol -A, hydrogenated bisphenol-F, hydrogenated xylylene cholole, and other alicyclic diols, bisphenol-A, bisphenol-F, 4,4'-biphenol, xylylene glycol, and other aromatic diols, etc. But only It is not. Two or more of these diols may be mixed and used.
ポリカーボネートジオールの数平均分子量Mnは、100以上5000以下であることが好ましい。ポリカーボネートジオールの数平均分子量Mnが100未満であると、最終的に得られるブロックイソシアネートの分子量が小さくなり、光硬化性組成物を硬化して得られる立体物の弾性率や強度が低下する場合がある。また、ポリカーボネートジオールの数平均分子量Mnが5000を超えると、最終的に得られるブロックイソシアネートの分子量が大きくなり、光硬化性組成物の粘度が高くなり、作業性が低下する場合がある。 The number average molecular weight M n of the polycarbonate diol is preferably 100 or more and 5000 or less. When the number average molecular weight Mn of the polycarbonate diol is less than 100, the molecular weight of the finally obtained blocked isocyanate is reduced, and the elastic modulus and strength of the three-dimensional product obtained by curing the photocurable composition are reduced. There is. Moreover, when the number average molecular weight Mn of polycarbonate diol exceeds 5000, the molecular weight of the finally obtained blocked isocyanate will become large, the viscosity of a photocurable composition may become high, and workability | operativity may fall.
ポリカーボネートジオールの市販品としては、例えば、ETERNACOLL(登録商標) UM-90(3/1)(Mn=900)、ETERNACOLL UM-90(1/1)(Mn=900)、ETERNACOLL UM-90(1/3)(Mn=900)、ETERNACOLL UC-100(Mn=1000)、ETERNACOLL UH-200(Mn=2000)、ETERNACOLL UH-100(Mn=1000)、ETERNACOLL PH-200(Mn=2000)及びETERNACOLL PH-100(Mn=1000)(以上、いずれも宇部興産(株)製)が挙げられるが、これらに限定はされない。 Examples of commercially available polycarbonate diols include ETERNACOLL (registered trademark) UM-90 (3/1) (M n = 900), ETERNACOLL UM-90 (1/1) (M n = 900), and ETERNACOLL UM-90. (1/3) (M n = 900), ETERNACOLL UC-100 (M n = 1000), ETERNACOLL UH-200 (M n = 2000), ETERNCOLLUH-100 (M n = 1000), ETERNACOLL PH-200 ( M n = 2000) and ETERNACOLL PH-100 (M n = 1000) (all of which are manufactured by Ube Industries, Ltd.), but are not limited thereto.
[鎖延長剤(d)]
本実施形態に係る光硬化性組成物は、第2の実施形態に係る光硬化性組成物と同様に、ポリロタキサン(c)上に(メタ)アクリロイル基を有する場合、鎖延長剤(d)を含有する。本実施形態に係る鎖延長剤(d)に関する説明は、第2の実施形態に係る鎖延長剤(d)の記載において、ブロックイソシアネート(a1)をブロックイソシアネート(a3)に置き換えた以外は同様であるため、説明を省略する。
[Chain extender (d)]
When the photocurable composition which concerns on this embodiment has a (meth) acryloyl group on a polyrotaxane (c) similarly to the photocurable composition which concerns on 2nd Embodiment, chain extender (d) is used. contains. The description about the chain extender (d) according to this embodiment is the same except that the blocked isocyanate (a1) is replaced with the blocked isocyanate (a3) in the description of the chain extender (d) according to the second embodiment. Therefore, the description is omitted.
[反応促進剤(e)]
本実施形態に係る反応促進剤は、第2の実施形態に係る反応促進剤と同様に、必要に応じて添加される。即ち、鎖延長剤(d)がヒドロキシル基を有する場合、ポリロタキサンを(c)がヒドロキシル基を有する場合に含有される。本実施形態に係る反応促進剤(e)に関する説明は、第2の実施形態に係る鎖延長剤(d)の記載において、ブロックイソシアネート(a1)をブロックイソシアネート(23)に置き換えた以外は同様であるため、説明を省略する。
[Reaction accelerator (e)]
Similar to the reaction accelerator according to the second embodiment, the reaction accelerator according to this embodiment is added as necessary. That is, when the chain extender (d) has a hydroxyl group, a polyrotaxane is contained when (c) has a hydroxyl group. The explanation about the reaction accelerator (e) according to this embodiment is the same except that the blocked isocyanate (a1) is replaced with the blocked isocyanate (23) in the description of the chain extender (d) according to the second embodiment. Therefore, the description is omitted.
(光-熱硬化物)
本実施形態に係る光硬化性組成物を光硬化させ、次いで熱処理して得られる硬化物(光-熱硬化物)について説明する。本実施形態に係る光-熱硬化物(樹脂)は、下記一般式(8)で表される繰り返し構造単位と、下記一般式(10)で表される繰り返し構造単位と、ポリロタキサン構造と、を含有する。
(Light-thermoset)
A cured product (photo-thermosetting product) obtained by photocuring the photocurable composition according to this embodiment and then heat-treating will be described. The photo-thermoset (resin) according to the present embodiment includes a repeating structural unit represented by the following general formula (8), a repeating structural unit represented by the following general formula (10), and a polyrotaxane structure. contains.
ここで、式(8)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(10)中、R11、R12、R13およびR14は各々独立に、置換基を有していてもよい炭素原子数1から20の2価の炭化水素基を表し、X3およびX4は各々独立に、О(酸素原子)、S(硫黄原子)、およびNH(イミノ基)のいずれかを表し、eおよびfは、いずれか一方は0でもよい、1≦e+f≦50を満たす整数である。 Here, in formula (8), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may have In the formula (10), R 11 , R 12 , R 13 and R 14 each independently represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, 3 and X 4 each independently represent one of O (oxygen atom), S (sulfur atom), and NH (imino group), and either e or f may be 0, 1 ≦ e + f ≦ An integer satisfying 50.
式(8)および式(10)において、L1、R2、R11、R12、R13およびR14のいずれかが置換基を有する場合には、当該置換基は炭素原子を含む置換基であってもよい。ただしその場合、当該置換基がL1、R2、R11、R12、R13およびR14のそれぞれと結合する原子は炭素原子以外の原子である。またその場合、置換基に含まれる炭素原子の数は「炭化水素基」の炭素原子数には含めないものとする。 In Formula (8) and Formula (10), when any of L 1 , R 2 , R 11 , R 12 , R 13 and R 14 has a substituent, the substituent is a substituent containing a carbon atom. It may be. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 11 , R 12 , R 13 and R 14 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”.
式(8)中、R2は、前述した様に脱ブロック化温度を低下させることができるため、tert‐ブチル基、tert‐ペンチル基、および、tert‐ヘキシル基から選択される基であることが好ましい。また、R2として上記のいずれかの基を採用することで、光-熱硬化物の合成を低コストで容易にすることができる。 In Formula (8), R 2 is a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group because the deblocking temperature can be lowered as described above. Is preferred. In addition, by adopting any of the above groups as R 2 , the synthesis of the photo-thermosetting product can be facilitated at low cost.
式(8)中、L1は入手や合成のし易さの観点からエチレン基またはプロピレン基であることが好ましい。 In formula (8), L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
式(10)中、R11およびR12は各々独立に、下記式(B-1)~(B-9)のいずれかであることが好ましい。これにより、光-熱硬化物の弾性率と強度をさらに高くすることができる。 In the formula (10), R 11 and R 12 are preferably each independently any one of the following formulas (B-1) to (B-9). Thereby, the elastic modulus and strength of the photo-thermoset can be further increased.
ここで、式(B-1)中、gは1から10の整数であり、式(B-2)中、hおよびiはいずれか一方は0でもよい、1≦h+i≦10を満たす整数である。また、式(B-3)中、jおよびkはいずれか一方は0でもよい、1≦j+k≦10を満たす整数である。 Here, in formula (B-1), g is an integer of 1 to 10, and in formula (B-2), either h or i may be 0, and is an integer satisfying 1 ≦ h + i ≦ 10 is there. In formula (B-3), either j or k may be 0, and is an integer that satisfies 1 ≦ j + k ≦ 10.
ここで、「ポリロタキサン構造」とは、複数の環状分子と、該複数の環状分子を串刺し状に貫通する直鎖状分子と、該直鎖状分子の両末端に配置され前記環状分子の脱離を防止する封鎖基と、を有する構造を指す。環状分子、直鎖状分子、封鎖基については上述のとおりである。 Here, the “polyrotaxane structure” means a plurality of cyclic molecules, a linear molecule penetrating the plurality of cyclic molecules in a skewered manner, and the elimination of the cyclic molecules arranged at both ends of the linear molecule. And a blocking group that prevents the above. The cyclic molecule, linear molecule, and blocking group are as described above.
本実施形態に係る光-熱硬化物においては、(メタ)アクリロイル基を有するポリロタキサンの場合、上記一般式(8)で表される繰り返し構造単位と、ポリロタキサン構造中の環状分子とが結合している。ポリロタキサン構造中の環状分子は、ポリロタキサン構造中の直鎖状分子に沿って自由に移動することができる。そのため、外部応力などが加わった際にもその応力に応じて硬化物中の架橋点が移動することができるため、応力に対してポリマー間のテンションが均一になる結果、本実施形態に係る光-熱硬化物は高い靱性を示す。 In the photo-thermoset according to the present embodiment, in the case of a polyrotaxane having a (meth) acryloyl group, the repeating structural unit represented by the general formula (8) is bonded to a cyclic molecule in the polyrotaxane structure. Yes. The cyclic molecule in the polyrotaxane structure can freely move along the linear molecule in the polyrotaxane structure. Therefore, when an external stress is applied, the cross-linking point in the cured product can move in accordance with the stress. As a result, the tension between the polymers becomes uniform with respect to the stress. -Thermosets show high toughness.
本実施形態に係るポリロタキサン(c)中の環状分子がヒドロキシル基を含有している場合、本実施形態に係る光硬化性組成物に光を照射すると、(メタ)アクリル化合物(a)同士の重合反応が進行していく。その結果得られた造形物に対して熱処理を施すことにより、後述するブロックイソシアネート(a2)の有するブロックイソシアネート基が脱ブロック化して生成するイソシアネート基とポリロタキサン(c)中のヒドロキシル基が反応した硬化物が得られる。ポリロタキサンの効果で従来の光硬化性組成物よりも靱性の高い硬化物が得られるようになる。 When the cyclic molecule in the polyrotaxane (c) according to the present embodiment contains a hydroxyl group, when the photocurable composition according to the present embodiment is irradiated with light, polymerization of the (meth) acrylic compounds (a) is performed. The reaction proceeds. Curing by reacting the isocyanate group formed by deblocking the blocked isocyanate group of the blocked isocyanate (a2) described later and the hydroxyl group in the polyrotaxane (c) by subjecting the resulting molded article to a heat treatment. A thing is obtained. Due to the effect of the polyrotaxane, a cured product having higher toughness than the conventional photocurable composition can be obtained.
(第4の実施形態)
本実施形態に係る光硬化性組成物は、第1の実施形態における重合性化合物(a)として、分岐鎖構造を有するブロックイソシアネート(a3)を含有する。すなわち、本実施形態に係る光硬化性組成物は、分岐鎖構造を有するブロックイソシアネート(a3)と、光ラジカル発生剤(b)と、ポリロタキサン(c)と、鎖延長剤(d)と、を含有する。
(Fourth embodiment)
The photocurable composition according to this embodiment contains a blocked isocyanate (a3) having a branched chain structure as the polymerizable compound (a) in the first embodiment. That is, the photocurable composition according to this embodiment comprises a blocked isocyanate (a3) having a branched chain structure, a photo radical generator (b), a polyrotaxane (c), and a chain extender (d). contains.
分岐鎖構造を有するブロックイソシアネートは(メタ)アクリロイル基を少なくとも3つ含む(メタ)アクリル化合物である。分岐鎖構造を有するブロックイソシアネートの具体的な構造としては、例えば下記一般式(A)で表されるブロックイソシアネートが挙げられる。 The blocked isocyanate having a branched chain structure is a (meth) acrylic compound containing at least three (meth) acryloyl groups. Specific examples of the blocked isocyanate having a branched chain structure include a blocked isocyanate represented by the following general formula (A).
式(4)中、A1~A4は各々独立に下記一般式(12)で表わされる構造であり、Bは下記一般式(13)で表わされる構造である。 In formula (4), A 1 to A 4 are each independently a structure represented by the following general formula (12), and B is a structure represented by the following general formula (13).
一般式(12)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、一般式(13)中、R3a、R3b、R4、R5、R6およびR7は各々独立に、置換基を有していてもよい炭素原子数1から20の2価の炭化水素基を表し、Y1は2価の連結基であり、aは1以上99以下の整数である。上記R4は式(3)中のR4と共通である。 In General Formula (12), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 has a substituent. And a divalent hydrocarbon group having 1 to 10 carbon atoms which may be present. In the general formula (13), R 3a , R 3b , R 4 , R 5 , R 6 and R 7 are each independently a divalent divalent having 1 to 20 carbon atoms which may have a substituent. Represents a hydrocarbon group, Y 1 represents a divalent linking group, and a represents an integer of 1 to 99. It said R 4 is same as R 4 in the formula (3).
一般式(12)および一般式(13)において、L1、R2、R3a、R3b、R4、R5、R6およびR7のいずれかが置換基を有する場合には、当該置換基は炭素原子を含む置換基であってもよい。ただしその場合、当該置換基がL1、R2、R3a、R3b、R4、R5、R6およびR7のそれぞれと結合する原子は炭素原子以外の原子である。またその場合、置換基に含まれる炭素原子の数は「炭化水素基」の炭素原子数には含めないものとする。上記R4は式(3)中のR4と共通である。 In General Formula (12) and General Formula (13), when any of L 1 , R 2 , R 3a , R 3b , R 4 , R 5 , R 6 and R 7 has a substituent, the substitution The group may be a substituent containing a carbon atom. However, in that case, the atom to which the substituent is bonded to each of L 1 , R 2 , R 3a , R 3b , R 4 , R 5 , R 6 and R 7 is an atom other than a carbon atom. In that case, the number of carbon atoms contained in the substituent is not included in the number of carbon atoms of the “hydrocarbon group”. It said R 4 is same as R 4 in the formula (3).
一般式(12)中、R2はtert-ブチル基、tert-ペンチル基、およびtert-ヘキシル基から選択される基であることが好ましい。これにより、光硬化性組成物を光硬化させた後に熱処理を施して脱ブロック化する際の温度(脱ブロック化温度)を低下させることができるため好ましい。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネートの合成を容易にすることができる。また、R2として上記のいずれかの基を採用することで、ブロックイソシアネートの合成を低コストにすることができる。 In general formula (12), R 2 is preferably a group selected from a tert-butyl group, a tert-pentyl group, and a tert-hexyl group. This is preferable because the temperature (deblocking temperature) when the photocurable composition is photocured and then subjected to a heat treatment for deblocking can be reduced. Further, by adopting any one group of the R 2, it is possible to facilitate the synthesis of blocked isocyanate. Further, by adopting any one group of the R 2, to obtain the synthesis of blocked isocyanate at a low cost.
一般式(12)中、L1は入手や合成のし易さの観点からエチレン基またはプロピレン基であることが好ましい。 In general formula (12), L 1 is preferably an ethylene group or a propylene group from the viewpoint of availability and ease of synthesis.
一般式(13)中、Y1は入手や合成のし易さの観点から下記式(C1)~(C3)からなる群から選択される少なくとも1つの2価の連結基であることが好ましい。 In general formula (13), Y 1 is preferably at least one divalent linking group selected from the group consisting of the following formulas (C1) to (C3) from the viewpoint of easy availability and synthesis.
また、一般式(11)中、A1~A4は同一であることが好ましい。すなわち、ブロックイソシアネートは、下記一般式(6)で表されることが好ましい。これにより、ブロックイソシアネートの合成を安価に、かつ容易にすることができる。 In the general formula (11), A 1 to A 4 are preferably the same. That is, the blocked isocyanate is preferably represented by the following general formula (6). Thereby, the synthesis | combination of block isocyanate can be made cheap and easy.
一般式(14)中、Aは上記一般式(12)で表される基を表し、Bは上記一般式(13)で表される基を表す。 In general formula (14), A represents a group represented by general formula (12), and B represents a group represented by general formula (13).
上記分岐鎖構造を有するブロックイソシアネート(a3)の光硬化性組成物における配合割合は、光硬化性組成物全体を100%としたときに0質量部以上90質量%以下含むことが好ましく、0質量部%以上70質量%以下であることがより好ましい。前記配合割合が80%を超えると光硬化性組成物の粘度が高くなり取り扱いが難しくなる。 The blending ratio of the blocked isocyanate (a3) having a branched chain structure in the photocurable composition is preferably 0 part by mass or more and 90% by mass or less when the entire photocurable composition is 100%. More preferably, it is at least part% and no more than 70% by mass. When the said mixture ratio exceeds 80%, the viscosity of a photocurable composition will become high and handling will become difficult.
ブロックイソシアネートの具体的な構造としては、例えば以下の式(I-1)~式(I-20)で表されるブロックイソシアネートが挙げられる。 Specific examples of the blocked isocyanate include blocked isocyanates represented by the following formulas (I-1) to (I-20).
<ブロックイソシアネート(a3)の合成方法>
次に、分岐鎖構造を有するブロックイソシアネート(a3)の合成方法について説明する。ブロックイソシアネート(a3)の合成方法は、下記の工程(I)および工程(II)を含む。
工程(I):ポリオールとジイソシアネートとを反応させる工程
工程(II):ブロック剤と工程(I)で得られたポリオール骨格を有するポリイソシアネートと反応させる工程
<Synthesis Method of Blocked Isocyanate (a3)>
Next, a method for synthesizing the blocked isocyanate (a3) having a branched chain structure will be described. The method for synthesizing the blocked isocyanate (a3) includes the following step (I) and step (II).
Step (I): Step of reacting a polyol and diisocyanate Step (II): Step of reacting a blocking agent with a polyisocyanate having a polyol skeleton obtained in Step (I)
以下、各工程を説明する。 Hereinafter, each process will be described.
(工程(I):ポリオールとジイソシアネートとを反応させる工程)
本工程は、ポリオールとジイソシアネートとを反応させる工程である。これにより、ポリオール骨格を有するポリイソシアネートが得られる。
(Step (I): Step of reacting polyol and diisocyanate)
This step is a step of reacting polyol and diisocyanate. Thereby, a polyisocyanate having a polyol skeleton is obtained.
本工程で用いられるポリオールは、例えば、ポリエーテルポリオール、ポリエステルポリオール、ポリカーボネートポリオール、ポリアルキレンポリオール、ポリアセタールなどが挙げられるが、これらに限定はされない。これらのポリオールを二種以上混合して用いてもよい。 Examples of the polyol used in this step include polyether polyol, polyester polyol, polycarbonate polyol, polyalkylene polyol, and polyacetal, but are not limited thereto. Two or more of these polyols may be mixed and used.
本工程で用いられるジイソシアネートとしては、トリメチレンジイソシアネート、1,2-プロピレンジイソシアネート、ブチレンジイソシアネート、ヘキサメチレンジイソシアネート、ペンタメチレンジイソシアネート、トリメチルヘキサメチレンジイソシアネートなどの脂肪族ジイソシアネート、シクロヘキサンジイソシアネート、メチルシクロヘキサンジイソシアネート、3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート(イソホロジイソシアネート)、メチレンビス(シクロヘキシルイソシアネート)又はジシクロヘキシルメタンジイソシアネート、ビス(イソシアネートメチル)シクロヘキサン、ノルボルナンジイソシアネートなどの脂環式ジイソシアネート、フェニレンジイソシアネート、トリレンジイソシアネート、4,4’-ジフェニルジイソシアネート、1,5-ナフタレンジイソシアネート、ジフェニルメタンジイソシネート、4,4’-トルイジンジイソシアネートなどの芳香族ジイソシアネートなどが挙げられるが、これらに限定はされない。 Examples of diisocyanates used in this step include aliphatic diisocyanates such as trimethylene diisocyanate, 1,2-propylene diisocyanate, butylene diisocyanate, hexamethylene diisocyanate, pentamethylene diisocyanate, trimethylhexamethylene diisocyanate, cyclohexane diisocyanate, methylcyclohexane diisocyanate, 3- Cycloaliphatic diisocyanates such as isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate (isophorodiisocyanate), methylenebis (cyclohexyl isocyanate) or dicyclohexylmethane diisocyanate, bis (isocyanatomethyl) cyclohexane, norbornane diisocyanate, phenylene diisocyanate, Li diisocyanate, 4,4'-diphenyl diisocyanate, 1,5-naphthalene diisocyanate, diphenylmethane diisopropyl Société sulfonates, although other aromatic diisocyanates such as 4,4'-toluidine diisocyanate, but are not limited to.
本工程は、上記ポリオールと上記ジイソシアネートとを溶媒中で反応させることが好ましい。当該溶媒は、ポリオールおよびジイソシアネートが溶解するものならば特に限定されない。具体的には、ジエチルエーテル、ジプロピルエーテルなどのジアルキルエーテル類、1,4-ジオキサン、テトラヒドロフランなどの環状エーテル類、アセトン、メチルエチルケトン、ジイソプロピルケトン、イソブチルメチルケトンなどのケトン類、酢酸メチル、酢酸エチル、酢酸ブチルなどのエステル類、トルエン、キシレン、エチルベンゼンなどの炭化水素類、塩化メチレン、クロロホルム、四塩化炭素、テトラクロロエタン、トリクロロエタン、クロロベンゼンなどのハロゲン系溶媒、アセトニトリルなどニトリル類などが挙げられる。これらの溶媒は単独で又は2種以上組み合わせてもよい。また、使用する溶媒は、水分によってジイソシアネート化合物のイソシアネート基が分解することを抑制するという観点から、脱水溶媒を用いることが好ましい。 In this step, the polyol and the diisocyanate are preferably reacted in a solvent. The said solvent will not be specifically limited if a polyol and diisocyanate melt | dissolve. Specifically, dialkyl ethers such as diethyl ether and dipropyl ether, cyclic ethers such as 1,4-dioxane and tetrahydrofuran, ketones such as acetone, methyl ethyl ketone, diisopropyl ketone and isobutyl methyl ketone, methyl acetate and ethyl acetate And esters such as butyl acetate, hydrocarbons such as toluene, xylene and ethylbenzene, halogen solvents such as methylene chloride, chloroform, carbon tetrachloride, tetrachloroethane, trichloroethane and chlorobenzene, and nitriles such as acetonitrile. These solvents may be used alone or in combination of two or more. The solvent to be used is preferably a dehydrated solvent from the viewpoint of suppressing decomposition of the isocyanate group of the diisocyanate compound by moisture.
本工程で反応させるポリオールのモル数に対するジイソシアネートのモル数の比(ジイソシアネートのモル数/ポリオールのモル数)は、1以上20以下が好ましく、3以上10以下がより好ましい。前記比が1より小さいと、副反応であるジイソシアネートとポリオールの重付加反応により望まないポリウレタンが生成する割合が高くなり、目的のポリオール骨格を有するポリイソシアネートの収率が低下する。前記比が20より大きいと、反応後に未反応のジイソシアネートが過剰に残存し、この未反応のジイソシアネートを除去することが困難になることがあるからである。 The ratio of the number of moles of diisocyanate to the number of moles of polyol to be reacted in this step (number of moles of diisocyanate / number of moles of polyol) is preferably 1 or more and 20 or less, and more preferably 3 or more and 10 or less. When the ratio is less than 1, the ratio of the unwanted addition of polyurethane by the polyaddition reaction of diisocyanate and polyol, which is a side reaction, increases, and the yield of polyisocyanate having the target polyol skeleton decreases. If the ratio is greater than 20, unreacted diisocyanate remains excessively after the reaction, and it may be difficult to remove the unreacted diisocyanate.
本工程は、窒素、ヘリウム、アルゴンなどの不活性雰囲気中で行うことが好ましい。また本工程は、0℃以上150℃以下で行うことが好ましく、30℃以上100℃以下で行うことがより好ましい。また本工程は、還流下で行ってもよい。本工程を150℃より高い反応温度で行うと副反応を起こす可能性が高くなる。本工程を0℃未満の反応温度で行うと反応速度が低下するため、反応時間が長くなったり、収率が低下したりする。 This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 100 ° C. or lower. Moreover, you may perform this process under recirculation | reflux. If this step is carried out at a reaction temperature higher than 150 ° C., the possibility of causing side reactions increases. If this step is carried out at a reaction temperature of less than 0 ° C., the reaction rate decreases, so the reaction time becomes longer or the yield decreases.
なお、本工程は、触媒の存在下で行ってもよい。触媒としては、例えば、オクチル酸スズ、ジブチルスズジアセテート、ジブチルスズジラウレート、2-エチルヘキサンスズなどの有機スズ系化合物、ナフテン酸銅、ナフテン酸亜鉛、ナフテン酸コバルトなどのナフテン酸金属塩、トリエチルアミン、ベンジルジメチルアミン、ピリジン、N,N-ジメチルピペラジン、トリエチレンジアミンなどの第3級アミン類などが挙げられる。これらの触媒は、単独で又は2種以上組み合わせてもよい。触媒の使用量は、ポリオールの総量100質量%に対して、0.001質量%以上1質量%以下であってもよい。 Note that this step may be performed in the presence of a catalyst. Examples of the catalyst include, for example, organic tin compounds such as tin octylate, dibutyltin diacetate, dibutyltin dilaurate and 2-ethylhexanetin, naphthenic acid metal salts such as copper naphthenate, zinc naphthenate and cobalt naphthenate, triethylamine, benzyl And tertiary amines such as dimethylamine, pyridine, N, N-dimethylpiperazine, and triethylenediamine. These catalysts may be used alone or in combination of two or more. The amount of the catalyst used may be 0.001% by mass or more and 1% by mass or less with respect to 100% by mass of the total amount of polyol.
本工程により得られるポリオール骨格を有するジイソシアネートは、慣用の分離方法、例えば、貧溶媒での再沈殿、濃縮、濾過などの分離手段や、これらを組み合わせた分離手段により、分離精製できる。 The diisocyanate having a polyol skeleton obtained in this step can be separated and purified by a conventional separation method, for example, separation means such as reprecipitation with a poor solvent, concentration and filtration, or a separation means combining these.
(工程(II):ブロック剤と工程(I)で得られたポリオール骨格を有するポリイソシアネートとを反応させる工程)
本工程は、ブロック剤と工程(I)で得られたポリオール骨格を有するポリイソシアネートとを反応させる工程である。これより、本実施形態に係る分岐構造を有するブロックイソシアネート(a3)が得られる。
(Step (II): a step of reacting a blocking agent with a polyisocyanate having a polyol skeleton obtained in step (I))
This step is a step of reacting the blocking agent with the polyisocyanate having the polyol skeleton obtained in step (I). Thereby, the blocked isocyanate (a3) having a branched structure according to the present embodiment is obtained.
ここでいうブロック剤とは、ジイソシアネートが有するイソシアネート基(-NCO)と反応して、活性なイソシアネート基を保護することのできる化合物である。ブロック剤によって保護されたイソシアネート基は、ブロックイソシアネート基またはブロック化イソシアネート基と呼ばれる。ブロックイソシアネート基はブロック剤によって保護されているため通常の状態では安定を保つことができる。 Here, the blocking agent is a compound capable of protecting an active isocyanate group by reacting with an isocyanate group (—NCO) of diisocyanate. Isocyanate groups protected by a blocking agent are called blocked isocyanate groups or blocked isocyanate groups. Since the blocked isocyanate group is protected by the blocking agent, it can be kept stable in a normal state.
ブロックイソシアネート基を有するブロックイソシアネート化合物を加熱すると、ブロックイソシアネート基からブロック剤が解離(脱ブロック化)し、元のイソシアネート基を再生することができる。 When the blocked isocyanate compound having a blocked isocyanate group is heated, the blocking agent is dissociated (deblocked) from the blocked isocyanate group, and the original isocyanate group can be regenerated.
本工程で用いられるブロック剤は、アミノ基を有する(メタ)アクリル化合物であれば特に限定はされないが、tert‐ブチルアミノエチル(メタ)アクリレート、tert‐ペンチルアミノエチル(メタ)アクリレート、tert‐ヘキシルアミノエチル(メタ)アクリレート、および、tert‐ブチルアミノプロピル(メタ)アクリレートから選択される化合物であることが好ましい。これにより、ブロックイソシアネートの脱ブロック化温度を低下させることができる。 The blocking agent used in this step is not particularly limited as long as it is a (meth) acrylic compound having an amino group, but tert-butylaminoethyl (meth) acrylate, tert-pentylaminoethyl (meth) acrylate, tert-hexyl. A compound selected from aminoethyl (meth) acrylate and tert-butylaminopropyl (meth) acrylate is preferred. Thereby, the deblocking temperature of blocked isocyanate can be lowered.
本工程は、ブロック剤とポリオール骨格を有するジイソシアネートとを溶媒中で反応させることが好ましい。当該溶媒は、ブロック剤とポリオール骨格を有するポリイソシアネートとが溶解するものならば特に限定されず、具体的には、工程(I)の説明で述べたものを用いることができる。 In this step, it is preferable to react a blocking agent and a diisocyanate having a polyol skeleton in a solvent. The solvent is not particularly limited as long as the blocking agent and the polyisocyanate having a polyol skeleton are dissolved. Specifically, those described in the description of the step (I) can be used.
本工程は、窒素、ヘリウム、アルゴンなどの不活性雰囲気中で行うことが好ましい。また本工程は、0℃以上150℃以下で行うことが好ましく、30℃以上120℃以下で行うことがより好ましい。分岐構造を有するブロックイソシアネート(a3)を得るためには、特に60℃以上100℃以下で処理することがより好ましい。また本工程は、還流下で行ってもよい。本工程を0℃未満の反応温度で行うと反応が進行しにくくなる。また、本工程を150℃より高い反応温度で行うとブロック剤同士が(メタ)アクリロイル基の重合反応によって重合する恐れがある。 This step is preferably performed in an inert atmosphere such as nitrogen, helium or argon. Further, this step is preferably performed at 0 ° C. or higher and 150 ° C. or lower, and more preferably performed at 30 ° C. or higher and 120 ° C. or lower. In order to obtain the blocked isocyanate (a3) having a branched structure, it is particularly preferable to treat at 60 ° C. or more and 100 ° C. or less. Moreover, you may perform this process under recirculation | reflux. When this step is carried out at a reaction temperature of less than 0 ° C., the reaction is difficult to proceed. Moreover, when this process is performed at reaction temperature higher than 150 degreeC, there exists a possibility that block agents may superpose | polymerize by the polymerization reaction of a (meth) acryloyl group.
なお、本工程は、触媒の存在下で行ってもよい。触媒の具体例としては、工程(I)の説明で述べたものを用いることができる。 Note that this step may be performed in the presence of a catalyst. As specific examples of the catalyst, those described in the description of the step (I) can be used.
また、本工程では、ブロック剤の(メタ)アクリロイル基の重合反応を抑制する目的で重合禁止剤を用いてもよい。具体的には、ベンゾキノン、ハイドロキノン、カテコール、ジフェニルベンゾキノン、ハイドロキノンモノメチルエーテル、ナフトキノン、t-ブチルカテコール、t-ブチルフェノール、ジメチル-t-ブチルフェノール、t-ブチルクレゾール、ジブチルヒドロキシトルエン及びフェノチアジンなどが挙げられる。 In this step, a polymerization inhibitor may be used for the purpose of suppressing the polymerization reaction of the (meth) acryloyl group of the blocking agent. Specific examples include benzoquinone, hydroquinone, catechol, diphenylbenzoquinone, hydroquinone monomethyl ether, naphthoquinone, t-butylcatechol, t-butylphenol, dimethyl-t-butylphenol, t-butylcresol, dibutylhydroxytoluene and phenothiazine.
本工程により得られるブロックイソシアネートは、工程(I)と同様の手法で、分離精製できる。 The blocked isocyanate obtained in this step can be separated and purified by the same method as in step (I).
側鎖構造を有するブロックイソシアネート(a3)に、第2の実施形態に記載した光ラジカル発生剤(b)と、ポリロタキサン(c)と、鎖延長剤(d)を添加することで、光硬化組成物を得ることができる。ポリロタキサン(c)がヒドロキシル基を有する場合には、第2の実施形態と同様の反応促進剤(e)を添加するとよい。 By adding the photo radical generator (b), polyrotaxane (c), and chain extender (d) described in the second embodiment to the blocked isocyanate (a3) having a side chain structure, a photocurable composition is obtained. You can get things. When the polyrotaxane (c) has a hydroxyl group, the same reaction accelerator (e) as in the second embodiment may be added.
本実施形態にかかる光硬化組成物を用いて立体物を製造する際には、第1や第2の実施形態と同様の造形法を採用することができる。 When manufacturing a three-dimensional object using the photocurable composition concerning this embodiment, the modeling method similar to the 1st and 2nd embodiment is employable.
このように、本実施形態に係る光硬化性組成物を用いて作製された立体物は、ポリロタキサンの効果により、外部応力などが加わった際にもその応力に応じて架橋点が移動することができるため、応力に対してポリマー間のテンションが均一になる結果、従来の光硬化性組成物よりも靱性の高い硬化物が得られるようになる。さらに、本実施形態に係る光硬化性組成物は、ブロックイソシアネート(a3)を含有する。ブロックイソシアネート(a3)は上記式(3)で表されるように、分子構造中に複数のカーボネート基(-O-(C=O)-O-)を含むポリカーボネート構造を有してもよい。したがって、本実施形態に係る光硬化性組成物を光硬化した後に熱処理して得られる硬化物もその内部に上述のポリカーボネート構造を含む場合、本実施形態に係る光硬化性組成物によれば、高い引張り強さと弾性率を有する立体物を光造形法によって造形することができる。 As described above, the three-dimensional product produced using the photocurable composition according to the present embodiment can move the cross-linking point according to the stress even when an external stress is applied due to the effect of the polyrotaxane. As a result, the tension between the polymers becomes uniform with respect to the stress, and as a result, a cured product having higher toughness than the conventional photocurable composition can be obtained. Furthermore, the photocurable composition which concerns on this embodiment contains block isocyanate (a3). The blocked isocyanate (a3) may have a polycarbonate structure containing a plurality of carbonate groups (—O— (C═O) —O—) in the molecular structure as represented by the above formula (3). Therefore, when the cured product obtained by heat-curing the photocurable composition according to the present embodiment also includes the above-described polycarbonate structure therein, according to the photocurable composition according to the present embodiment, A three-dimensional object having high tensile strength and elastic modulus can be formed by stereolithography.
(用途)
第1~第3の実施形態に係る立体造形用の光硬化性組成物およびその硬化物の用途は特に限定はされない。例えば、光造形法の3Dプリンター用の樹脂、スポーツ用品、医療・介護用品、産業用機械・機器、精密機器、電気・電子機器、電気・電子部品、建材用品等の様々な用途に利用可能である。
(Use)
The use of the photocurable composition for three-dimensional modeling according to the first to third embodiments and the cured product thereof is not particularly limited. For example, it can be used for various applications such as resin for stereolithography 3D printers, sports equipment, medical / nursing care equipment, industrial machinery / equipment, precision equipment, electrical / electronic equipment, electrical / electronic parts, building materials. is there.
以下に本発明を詳しく説明するために実施例を挙げるが、本発明はこれらの実施例に限定されるものではない。なお、実施例、比較例で行った化合物の同定、反応の追跡は、次に述べる方法で測定した。 Examples are given below to describe the present invention in detail, but the present invention is not limited to these examples. In addition, the identification of the compound performed in the Example and the comparative example and the tracking of the reaction were measured by the method described below.
(1)化合物の同定
試料15mgを重クロロホルム(CDCl3)1.1gに溶解させ、核磁気共鳴装置JNM-ECA-400(日本電子製)を用いて1H-NMR測定を行った。
(1) Identification of Compound 15 mg of a sample was dissolved in 1.1 g of deuterated chloroform (CDCl 3 ), and 1 H-NMR measurement was performed using a nuclear magnetic resonance apparatus JNM-ECA-400 (manufactured by JEOL).
(2)反応の追跡(イソシアネート基の消失確認)
試料をフーリエ変換赤外分光装置(パーキンエルマー社製Spectrum One)によりATR法(全反射測定法)で測定を行い、縦軸を吸光度とし、イソシアネート基由来の2260cm-1付近のピークの有無を確認した。
(2) Reaction tracking (confirmation of disappearance of isocyanate groups)
The sample was measured by the ATR method (total reflection measurement method) using a Fourier transform infrared spectrometer (Spectrum One manufactured by Perkin Elmer), and the vertical axis was the absorbance, and the presence or absence of a peak near 2260 cm −1 derived from the isocyanate group was confirmed. did.
(合成例1)ブロックイソシアネート1の合成
(Synthesis Example 1) Synthesis of blocked
上記スキームに基づいて、ブロックイソシアネート1を合成した。まず、500mL反応器にアルゴン雰囲気下、室温でポリテトラヒドロフラン(Mn=650)(100g,154mmol,1.0eq.)、ヘキサメチレンジイソシアネート(207g,1.23mol,1.0eq.)を加え撹拌した。この溶液に2-エチルヘキサンすず(II)(80μL,cat.)を加えた。この溶液を50℃に昇温して同温で5時間撹拌した。この溶液を室温まで放冷した後、激しく撹拌したヘキサン(4L)中に加えた。そのまま15分攪拌した後、15分静置して、上層(ヘキサン層)をデカンテーションで取り除いた。この操作をさらに2回繰り返し、下層(中間体層)を濃縮して、170gのポリテトラヒドロフランジイソシアネート1を得た。
Based on the above scheme, blocked
得られたポリテトラヒドロフランジイソシアネート1にジクロロメタン300mLを加え、攪拌しながら氷冷した。そこに、ハイドロキノン(10mg)、2-(t-ブチルアミノ)エチルメタクリレート(142g,769mmol,5.0eq.)をゆっくり加え、室温で12時間攪拌した。この溶液を赤外分光法によって分析し、上記方法によってイソシアネート由来の吸収ピークが無いことを確認した。
The resulting
次に、激しく攪拌したヘキサン(4L)中に上記溶液をゆっくり加え、そのまま20分攪拌した後、20分静置して、上層のヘキサン層をデカンテーションで取り除いた。この操作をさらに3回繰り返し、目的物である下層をセライトろ過後、高真空下で濃縮し、無色の粘調な液体であるブロックイソシアネート1(184g)を得た。 Next, the above solution was slowly added to hexane (4 L) that was vigorously stirred, stirred as it was for 20 minutes, and then allowed to stand for 20 minutes, and the upper hexane layer was removed by decantation. This operation was repeated three more times, and the lower layer, which was the target product, was filtered through Celite and then concentrated under high vacuum to obtain blocked isocyanate 1 (184 g) as a colorless viscous liquid.
(合成例2)ブロックイソシアネート2の合成 (Synthesis Example 2) Synthesis of blocked isocyanate 2
上記スキームに基づいて、ブロックイソシアネート2を合成した。まず、500mL反応器にアルゴン雰囲気下、室温でポリテトラヒドロフラン(Mn=650)(80g,123mmol,1.0eq.)、4,4´-メチレンビス(シクロヘキシルジイソシアナート)(323g,1.23mol,1.0eq.)を加え撹拌した。この溶液に2-エチルヘキサンすず(II)(80μL,cat.)を加えた。この溶液を50℃に昇温して同温で5時間撹拌した。この溶液を室温まで放冷した後、激しく撹拌したヘキサン(4L)中に加えた。そのまま15分攪拌した後、15分静置して、上層(ヘキサン層)をデカンテーションで取り除いた。この操作をさらに2回繰り返し、下層(中間体層)を濃縮して、126gのポリテトラヒドロフランジイソシアネート2を得た。 Based on the above scheme, blocked isocyanate 2 was synthesized. First, polytetrahydrofuran (M n = 650) (80 g, 123 mmol, 1.0 eq.), 4,4′-methylenebis (cyclohexyl diisocyanate) (323 g, 1.23 mol, at room temperature in a 500 mL reactor at room temperature. 1.0 eq.) Was added and stirred. To this solution was added 2-ethylhexane tin (II) (80 μL, cat.). The solution was heated to 50 ° C. and stirred at the same temperature for 5 hours. The solution was allowed to cool to room temperature and then added to vigorously stirred hexane (4 L). After stirring for 15 minutes, the mixture was allowed to stand for 15 minutes, and the upper layer (hexane layer) was removed by decantation. This operation was further repeated twice, and the lower layer (intermediate layer) was concentrated to obtain 126 g of polytetrahydrofuran diisocyanate 2.
得られたポリテトラヒドロフランジイソシアネート2にジクロロメタン300mLを加え、攪拌しながら氷冷した。そこに、ハイドロキノン(10mg)、2-(t-ブチルアミノ)エチルメタクリレート(114g,615mmol,5.0eq.)をゆっくり加え、室温で1.5日間攪拌した。この溶液を赤外分光法によって分析し、上記方法によってイソシアネート由来の吸収ピークが無いことを確認した。 The resulting polytetrahydrofuran diisocyanate 2 was added with 300 mL of dichloromethane and cooled with ice while stirring. Hydroquinone (10 mg) and 2- (t-butylamino) ethyl methacrylate (114 g, 615 mmol, 5.0 eq.) Were slowly added thereto and stirred at room temperature for 1.5 days. This solution was analyzed by infrared spectroscopy, and it was confirmed by the above method that there was no isocyanate-derived absorption peak.
次に、激しく攪拌したヘキサン(4L)に上記液体をゆっくり加え、そのまま20分攪拌した後、20分静置して、上層のヘキサン層をデカンテーションで取り除いた。この操作をさらに3回繰り返し、目的物である下層をセライトろ過後、高真空下で濃縮し、無色の粘調な液体であるブロックイソシアネート2(124g)を得た。 Next, the above liquid was slowly added to hexane (4 L) that was vigorously stirred, stirred as it was for 20 minutes, and then allowed to stand for 20 minutes, and the upper hexane layer was removed by decantation. This operation was repeated three more times, and the lower layer, which was the target product, was filtered through Celite and then concentrated under high vacuum to obtain blocked isocyanate 2 (124 g) as a colorless viscous liquid.
(合成例3)ブロックイソシアネート3の合成 (Synthesis Example 3) Synthesis of blocked isocyanate 3
上記スキームに基づいて、ブロックイソシアネート3を合成した。まず、300mL反応器にアルゴン雰囲気下、室温でヘキサメチレンジイソシアネート(168g,0.1mol,10eq.)、ポリカーボネートジオール(eternacoll um-90 1/1)(90g,0.1mol,1.0eq.(Mn=900として計算))、2-エチルヘキサンすず(II)(70μL,cat.)を加えた。この溶液を50℃に昇温して同温で3時間撹拌した後、温かいまま激しく撹拌したヘキサン(3L)にゆっくり滴下した。そのまま20分間撹拌した後、静沈させ、上層のヘキサン層を除いた。このヘキサンによる洗浄操作をさらに2回行った後、得られた粘稠な液体を高真空下で濃縮し、無色の粘稠な液体であるポリカーボネートジイソシアネート(151g)を得た。 Based on the above scheme, blocked isocyanate 3 was synthesized. First, hexamethylene diisocyanate (168 g, 0.1 mol, 10 eq.), Polycarbonate diol (etheracolum-90 1/1) (90 g, 0.1 mol, 1.0 eq. (M) at room temperature in an argon atmosphere in a 300 mL reactor. n = 900)), 2-ethylhexane tin (II) (70 μL, cat.) was added. The solution was heated to 50 ° C. and stirred at the same temperature for 3 hours, and then slowly added dropwise to hexane (3 L) vigorously stirred while warm. After stirring for 20 minutes as it was, it was allowed to settle and the upper hexane layer was removed. The washing operation with hexane was further performed twice, and then the resulting viscous liquid was concentrated under high vacuum to obtain polycarbonate diisocyanate (151 g) as a colorless viscous liquid.
得られたポリカーボネートジイソシアネートにジクロロメタン(300mL)、ハイドロキノン(20mg)を加えた後、冷却バスを用いて5℃に保ちながら2-(t-ブチルアミノ)エチルメタクリレート(92.6g,0.5mol,5.0eq.)をゆっくり滴下した。その後、冷却バスを外して室温で14時間撹拌した。この溶液を赤外分光法によって分析し、上記方法によってイソシアネート由来の吸収ピークの消失を確認した。 Dichloromethane (300 mL) and hydroquinone (20 mg) were added to the obtained polycarbonate diisocyanate, and then 2- (t-butylamino) ethyl methacrylate (92.6 g, 0.5 mol, 5) was maintained at 5 ° C. using a cooling bath. 0.0 eq.) Was slowly added dropwise. Thereafter, the cooling bath was removed and the mixture was stirred at room temperature for 14 hours. This solution was analyzed by infrared spectroscopy, and the disappearance of the isocyanate-derived absorption peak was confirmed by the above method.
次に、激しく撹拌したヘキサン(3L)中に上記溶液をゆっくり滴下した。滴下終了後30分間撹拌し、この混合液を静置した。その後、上層のヘキサン層をデカンテーションで除き、もう一度同様の操作を行った。得られた粘稠な液体を高真空下、40℃で6時間乾燥し、無色の非常に粘稠な液体であるブロックイソシアネート3(215g)を得た。 Next, the above solution was slowly dropped into hexane (3 L) that was vigorously stirred. After completion of the dropwise addition, the mixture was stirred for 30 minutes, and the mixture was allowed to stand. Thereafter, the upper hexane layer was removed by decantation, and the same operation was performed once again. The resulting viscous liquid was dried under high vacuum at 40 ° C. for 6 hours to obtain blocked isocyanate 3 (215 g) which was a colorless very viscous liquid.
(合成例4)ブロックイソシアネート4の合成 (Synthesis Example 4) Synthesis of blocked isocyanate 4
上記スキームに基づいて、ブロックイソシアネート4を合成した。まず、500mL反応器にアルゴン雰囲気下、室温で数平均分子量Mnが650であるポリテトラヒドロフラン(100g,154mmol,1.0eq.)、ヘキサメチレンジイソシアネート(207g,1.23mol,8.0eq.)を加え撹拌した。この溶液に2-エチルヘキサン酸スズ(II)(80μL,cat.)を加えた。この溶液を80℃に昇温して同温で8時間撹拌した。この溶液を室温まで放冷した後、激しく撹拌したヘキサン(4L)中に加えた。そのまま15分攪拌した後、15分静置して、上層(ヘキサン層)をデカンテーションで取り除いた。この操作をさらに2回繰り返し、下層を濃縮して、170gのポリテトラヒドロフランテトライソシアネートを得た。 Based on the above scheme, blocked isocyanate 4 was synthesized. First, polytetrahydrofuran (100 g, 154 mmol, 1.0 eq.) And hexamethylene diisocyanate (207 g, 1.23 mol, 8.0 eq.) Having a number average molecular weight Mn of 650 at room temperature in an argon atmosphere in a 500 mL reactor. Added and stirred. To this solution was added tin (II) 2-ethylhexanoate (80 μL, cat.). The solution was heated to 80 ° C. and stirred at the same temperature for 8 hours. The solution was allowed to cool to room temperature and then added to vigorously stirred hexane (4 L). After stirring for 15 minutes, the mixture was allowed to stand for 15 minutes, and the upper layer (hexane layer) was removed by decantation. This operation was further repeated twice, and the lower layer was concentrated to obtain 170 g of polytetrahydrofuran tetraisocyanate.
得られたポリテトラヒドロフランテトライソシアネートにジクロロメタン300mLを加え、攪拌しながら氷冷した。そこに、ハイドロキノン(10mg)、2-(t-ブチルアミノ)エチルメタクリレート(227g,1.23mol,8.0eq.)をゆっくり加え、室温で12時間攪拌した。この溶液を赤外分光法によって分析し、上記方法によってイソシアネート由来の吸収ピークが無いことを確認した。 The resulting polytetrahydrofuran tetraisocyanate was added with 300 mL of dichloromethane and cooled with ice while stirring. Hydroquinone (10 mg) and 2- (t-butylamino) ethyl methacrylate (227 g, 1.23 mol, 8.0 eq.) Were slowly added thereto, and the mixture was stirred at room temperature for 12 hours. This solution was analyzed by infrared spectroscopy, and it was confirmed by the above method that there was no isocyanate-derived absorption peak.
次に、激しく攪拌したヘキサン(4L)中に上記溶液をゆっくり加え、そのまま20分攪拌した後、20分静置して、上層のヘキサン層をデカンテーションで取り除いた。この操作をさらに3回繰り返し、目的物である下層をセライトろ過後、高真空下で濃縮し、無色の粘調な液体であるブロックイソシアネート4(184g)を得た。 Next, the above solution was slowly added to hexane (4 L) that was vigorously stirred, stirred as it was for 20 minutes, and then allowed to stand for 20 minutes, and the upper hexane layer was removed by decantation. This operation was repeated three more times, and the lower layer, which was the target product, was filtered through Celite and then concentrated under high vacuum to obtain blocked isocyanate 4 (184 g) as a colorless viscous liquid.
(実施例1)
まず、以下の処方に従い、光硬化性組成物Aを調製した。
・重合性化合物(a):
<a-1>イソボルニルメタクリレート 39.7質量%
<a-2>ブロックイソシアネート1 53.3質量%
・光ラジカル発生剤(b):
<b-1>ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド 0.7質量%
・鎖延長剤(d):
<d-1>4,4’-メチレン-ビス(シクロヘキシルアミン) 6.3質量%
Example 1
First, the photocurable composition A was prepared according to the following prescription.
Polymerizable compound (a):
<A-1> Isobornyl methacrylate 39.7% by mass
<A-2>
Photoradical generator (b):
<B-1> Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 0.7% by mass
Chain extender (d):
<D-1> 4,4′-methylene-bis (cyclohexylamine) 6.3% by mass
次に、以下の処方に従い、実施例1の立体造形用の光硬化性組成物1を調製した。
・光硬化性組成物A 90質量%
・ポリロタキサン(c):
<c-1>SeRM SA2400C(アドバンスト・ソフトマテリアルズ株式会社製)10.0質量%
Next, according to the following prescription, the
-Photocurable composition A 90 mass%
Polyrotaxane (c):
<C-1> SeRM SA2400C (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
(比較例1)
実施例1においてポリロタキサン(c)を用いない点以外は実施例1と同様にして、比較例1の立体造形用の光硬化性組成物2を調製した。すなわち、比較例1の立体造形用の光硬化性組成物2の組成は、実施例1における光硬化性組成物Aの組成と同じである。
(Comparative Example 1)
A photocurable composition 2 for three-dimensional modeling of Comparative Example 1 was prepared in the same manner as in Example 1 except that the polyrotaxane (c) was not used in Example 1. That is, the composition of the photocurable composition 2 for three-dimensional modeling of Comparative Example 1 is the same as the composition of the photocurable composition A in Example 1.
(実施例2)
まず、以下の処方に従い、光硬化性組成物Bを調製した。
・重合性化合物(a):
<a-1>イソボルニルメタクリレート 39.7質量%
<a-3>ブロックイソシアネート2 53.3質量%
・光ラジカル発生剤(b):ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド 0.7質量%
・鎖延長剤(d):4,4’-ジアミノジフェニルメタン 6.3質量%
(Example 2)
First, the photocurable composition B was prepared according to the following prescription.
Polymerizable compound (a):
<A-1> Isobornyl methacrylate 39.7% by mass
<A-3> Block isocyanate 2 53.3% by mass
Photoradical generator (b): bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 0.7% by mass
Chain extender (d): 4,4′-diaminodiphenylmethane 6.3% by mass
次に、以下の処方に従い、実施例2の立体造形用の光硬化性組成物3を調製した。
・光硬化性組成物B 90質量%
・ポリロタキサン(c):
<c-1>SeRM SA2400C(アドバンスト・ソフトマテリアルズ株式会社製)10.0質量%
Next, according to the following prescription, the photocurable composition 3 for three-dimensional modeling of Example 2 was prepared.
Photocurable composition B 90% by mass
Polyrotaxane (c):
<C-1> SeRM SA2400C (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
(比較例2)
実施例2においてポリロタキサン(c)を用いない点以外は実施例2と同様にして、比較例2の立体造形用の光硬化性組成物4を調製した。すなわち、比較例2の立体造形用の光硬化性組成物4の組成は、実施例2における光硬化性組成物Bの組成と同じである。
(Comparative Example 2)
A photocurable composition 4 for three-dimensional modeling of Comparative Example 2 was prepared in the same manner as in Example 2 except that the polyrotaxane (c) was not used in Example 2. That is, the composition of the photocurable composition 4 for three-dimensional modeling in Comparative Example 2 is the same as the composition of the photocurable composition B in Example 2.
(実施例3)
まず、以下の処方に従い、光硬化性樹成物Cを調製した。
・重合性化合物(a):
<a-1>イソボルニルメタクリレート 39.7質量%
<a-4>ブロックイソシアネート3 53.3質量%
・光ラジカル発生剤(b):
<b-1>ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド 0.7質量%
・鎖延長剤(d):
<d-1>4,4’-ジアミノジフェニルメタン 6.3質量%
(Example 3)
First, a photocurable resin C was prepared according to the following formulation.
Polymerizable compound (a):
<A-1> Isobornyl methacrylate 39.7% by mass
<A-4> Blocked isocyanate 3 53.3 mass%
Photoradical generator (b):
<B-1> Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 0.7% by mass
Chain extender (d):
<D-1> 4,4′-diaminodiphenylmethane 6.3% by mass
次に、以下の処方に従い、実施例3の立体造形用の光硬化性組成物5を調製した。
・光硬化性組成物C 90質量%
・ポリロタキサン(c):
<c-1>SeRM SA2400C(アドバンスト・ソフトマテリアルズ株式会社製)10.0質量%
Next, according to the following prescription, the photocurable composition 5 for three-dimensional modeling of Example 3 was prepared.
-Photocurable composition C 90% by mass
Polyrotaxane (c):
<C-1> SeRM SA2400C (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
(比較例3)
実施例3においてポリロタキサン(c)を用いない点以外は実施例3と同様にして、比較例3の立体造形用の光硬化性組成物6を調製した。すなわち、比較例3の立体造形用の光硬化性組成物6の組成は、実施例3における光硬化性組成物Cの組成と同じである。
(Comparative Example 3)
In Example 3, the photocurable composition 6 for three-dimensional modeling of the comparative example 3 was prepared like Example 3 except not using a polyrotaxane (c). That is, the composition of the photocurable composition 6 for three-dimensional modeling in Comparative Example 3 is the same as the composition of the photocurable composition C in Example 3.
(実施例4)
まず、以下の処方に従い、光硬化性樹成物Dを調製した。
・重合性化合物(a):
<a-1>イソボルニルメタクリレート 39.1質量%
<a-4>ブロックイソシアネート1 49.7質量%
・光ラジカル発生剤(b):
<b-1>ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド 0.6質量%
<反応促進剤>ジラウリン酸ジブチルスズ 0.6質量%
Example 4
First, according to the following prescription, the photocurable resin D was prepared.
Polymerizable compound (a):
<A-1> Isobornyl methacrylate 39.1% by mass
<A-4>
Photoradical generator (b):
<B-1> Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 0.6% by mass
<Reaction accelerator> Dibutyltin dilaurate 0.6% by mass
次に、以下の処方に従い、実施例4の立体造形用の光硬化性組成物7を調製した。
・光硬化性組成物D 90質量%
・ポリロタキサン(c):
<c-2>SeRM SH1310P(アドバンスト・ソフトマテリアルズ株式会社製) 10.0質量%
Next, according to the following prescription, the photocurable composition 7 for three-dimensional modeling of Example 4 was prepared.
-Photocurable composition D 90 mass%
Polyrotaxane (c):
<C-2> SeRM SH1310P (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
(比較例4)
実施例4において反応促進剤を用いない点以外は実施例4と同様にして、比較例4の立体造形用の光硬化性組成物8を調製した。すなわち、比較例4の立体造形用の光硬化性組成物8の組成は、実施例4における光硬化性組成物Cの組成と同じである。
(Comparative Example 4)
A photocurable composition 8 for three-dimensional modeling of Comparative Example 4 was prepared in the same manner as in Example 4 except that no reaction accelerator was used in Example 4. That is, the composition of the three-dimensional photocurable composition 8 of Comparative Example 4 is the same as the composition of the photocurable composition C in Example 4.
(実施例5)
まず、以下の処方に従い、光硬化性樹成物Eを調製した。
・重合性化合物(a):
<a-1>イソボルニルメタクリレート 35.7質量%
<a-5>分岐鎖ブロックイソシアネート4 48.0質量%
・光ラジカル発生剤(b):
<b-1>ビス(2,4,6-トリメチルベンゾイル)-フェニルフォスフィンオキサイド 0.6質量%
・鎖延長剤(d):
<d-1>4,4’-ジアミノジフェニルメタン 5.7質量%
(Example 5)
First, according to the following prescription, the photocurable resin E was prepared.
Polymerizable compound (a):
<A-1> Isobornyl methacrylate 35.7% by mass
<A-5> Branched-chain blocked isocyanate 4 48.0% by mass
Photoradical generator (b):
<B-1> Bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide 0.6% by mass
Chain extender (d):
<D-1> 4,4′-diaminodiphenylmethane 5.7% by mass
次に、以下の処方に従い、実施例5の立体造形用の光硬化性組成物9を調製した。
・光硬化性組成物C 90質量%
・ポリロタキサン(c):
<c-1>SeRM SA2400C(アドバンスト・ソフトマテリアルズ株式会社製)10.0質量%
Next, according to the following prescription, the photocurable composition 9 for three-dimensional modeling of Example 5 was prepared.
-Photocurable composition C 90% by mass
Polyrotaxane (c):
<C-1> SeRM SA2400C (manufactured by Advanced Soft Materials Co., Ltd.) 10.0% by mass
(立体造形用の光硬化性組成物の性能評価)
調製した立体造形用の光硬化性組成物1~6のそれぞれを用いて、下記の方法で硬化物を作製した。まず、2枚の石英ガラスの間に300μmのスペーサーを挟み、この300μmの幅のギャップに光硬化性組成物を流し込んだ。流し込んだ光硬化性組成物に対して紫外線照射機(HOYA-SCHOTT製、商品名「UV LIGHT SOURCE EX250」)で7mW/cm2の紫外線を120秒照射(総エネルギーとして840mJ/cm2)することによって、光硬化物を得た。
(Performance evaluation of photocurable composition for three-dimensional modeling)
Using each of the prepared
得られた光硬化物を125℃の加熱オーブン内に入れて4時間熱処理することにより、光-熱硬化物を得た。 The obtained photocured product was placed in a heating oven at 125 ° C. and heat-treated for 4 hours to obtain a photo-thermoset product.
次に、得られた厚さ約300μmの光-熱硬化物を8号型ダンベル状に打ち抜いて試験片を作製した。この試験片について、JIS K 7127に準じて、引張試験機(商品名「ストログラフEII」、東洋精機製作所製)を用い、試験温度23℃、引張速度10mm/minで測定を行い、引張り弾性率、最大点強度および伸びを測定した。また、この引張り試験で得られた応力-歪み曲線で囲まれた面積から、破断エネルギーを求めた。なお、引張り弾性率は剛性の指標として、最大点強度は強度の指標として、破断エネルギーは靱性の指標として、それぞれ用いることができる。 Next, the obtained photo-thermoset having a thickness of about 300 μm was punched out into a No. 8 type dumbbell to prepare a test piece. This test piece was measured according to JIS K 7127 using a tensile tester (trade name “Strograph EII” manufactured by Toyo Seiki Seisakusho) at a test temperature of 23 ° C. and a tensile speed of 10 mm / min. Maximum point strength and elongation were measured. The breaking energy was determined from the area surrounded by the stress-strain curve obtained in this tensile test. The tensile modulus can be used as an index of rigidity, the maximum point strength can be used as an index of strength, and the breaking energy can be used as an index of toughness.
立体造形用の光硬化性組成物のそれぞれの組成と、それを用いて作製した光-熱硬化物の機械特性を、まとめて表1に示す。 Table 1 summarizes each composition of the photo-curable composition for three-dimensional modeling and the mechanical properties of the light-thermosetting material produced using the composition.
(結果のまとめ)
表1に示すように、比較例1と実施例1、比較例2と実施例2、比較例3と実施例3、をそれぞれ比較すると、(メタ)アクリロイル基を有するポリロタキサン(c)を含有させることで、弾性率および最大点強度を低下させることなく、破断エネルギーを大きくすることができた。すなわち、本発明によれば、剛性(弾性率)および強度(最大点強度)を高いレベルに維持したまま、靱性(破断エネルギー)を向上させることができた。また、該ブロックポリウレタンを使用した場合、実施例4と比較例1を比較するとヒドロキシル基を有する場合ポリロタキサンを含有させることで、破断エネルギーを大きくすることができた。実施例4と比較例4を比較することでヒドロキシル基を含有するポリロタキサンを用いる場合、反応促進剤を添加した方が靭性(破断エネルギー)は大きかった。
(Summary of results)
As shown in Table 1, when Comparative Example 1 and Example 1, Comparative Example 2 and Example 2, and Comparative Example 3 and Example 3 are respectively compared, polyrotaxane (c) having a (meth) acryloyl group is contained. As a result, the breaking energy could be increased without lowering the elastic modulus and the maximum point strength. That is, according to the present invention, it was possible to improve toughness (breaking energy) while maintaining rigidity (elastic modulus) and strength (maximum point strength) at high levels. Moreover, when this block polyurethane was used, when Example 4 and Comparative Example 1 were compared, when it has a hydroxyl group, the break energy could be increased by including a polyrotaxane. When Example 4 and Comparative Example 4 were compared and a polyrotaxane containing a hydroxyl group was used, the toughness (breaking energy) was greater when a reaction accelerator was added.
実施例5では比較例1と比較して、分岐鎖構造を有するブロックイソシアネートにポリロタキサンを含有させたものであるが、高い弾性率を維持したまま、靭性(破断エネルギー)を向上させることができた。 In Example 5, as compared with Comparative Example 1, polyrotaxane was added to a blocked isocyanate having a branched chain structure, but the toughness (breaking energy) could be improved while maintaining a high elastic modulus. .
本発明は上記実施の形態に制限されるものではなく、本発明の精神及び範囲から離脱することなく、様々な変更及び変形が可能である。従って、本発明の範囲を公にするために以下の請求項を添付する。 The present invention is not limited to the above embodiment, and various changes and modifications can be made without departing from the spirit and scope of the present invention. Therefore, in order to make the scope of the present invention public, the following claims are attached.
本願は、2017年3月3日提出の日本国特許出願特願2017-040855及び2017年7月19日提出の日本国特許出願特願2017-140151を基礎として優先権を主張するものであり、その記載内容の全てをここに援用する。 This application claims priority based on Japanese Patent Application No. 2017-040855 filed on Mar. 3, 2017 and Japanese Patent Application No. 2017-140151 filed on Jul. 19, 2017. All the descriptions are incorporated herein.
Claims (20)
(メタ)アクリロイル基またはヒドロキシル基の少なくともいずれか一つを有する複数の環状分子を有するポリロタキサンを含有することを特徴とする立体造形用の光硬化性組成物。 A (meth) acryl compound having a (meth) acryloyl group and a photoradical generator, a photocurable composition for three-dimensional modeling,
A photocurable composition for three-dimensional modeling, comprising a polyrotaxane having a plurality of cyclic molecules having at least one of a (meth) acryloyl group or a hydroxyl group.
A-B-C・・・(1)
(式(1)中、AおよびCは各々独立に、下記式(2)で表される基を表し、Bは下記式(3)で表される基を表す。
(式(2)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(3)中、R3およびR4は各々、置換基を有していてもよい炭素原子数1から20の炭化水素基を表し、aは1以上100以下の整数である。)
で表されるブロックイソシアネートを含有し、
前記ポリロタキサンが(メタ)アクリロイル基を有しており、
鎖延長剤を含有することを特徴とする請求項1に記載の立体造形用の光硬化性組成物。 The (meth) acrylic compound is represented by the following general formula (1)
ABC (1)
(In formula (1), A and C each independently represent a group represented by the following formula (2), and B represents a group represented by the following formula (3).
(In Formula (2), R 1 represents a hydrogen atom or a methyl group, R 2 represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, and L 1 has a substituent. And a divalent hydrocarbon group having 1 to 10 carbon atoms which may be substituted, and in formula (3), R 3 and R 4 each have 1 carbon atom which may have a substituent. To 20 hydrocarbon groups, and a is an integer of 1 or more and 100 or less.)
Containing a blocked isocyanate represented by
The polyrotaxane has a (meth) acryloyl group;
The photocurable composition for three-dimensional modeling according to claim 1, further comprising a chain extender.
A-B-C・・・(1)
(式(1)中、AおよびCは各々独立に、下記式(2)で表される基を表し、Bは下記式(3)で表される基を表す。
(式(2)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(3)中、R3およびR4は各々、置換基を有していてもよい炭素原子数1から20の炭化水素基を表し、aは1以上100以下の整数である。)
で表されるブロックイソシアネートを含有し、
前記ポリロタキサンがヒドロキシル基を有し、
反応促進剤を含有することを特徴とする請求項1に記載の立体造形用の光硬化性組成物。 The (meth) acrylic compound is represented by the following general formula (1)
ABC (1)
(In formula (1), A and C each independently represent a group represented by the following formula (2), and B represents a group represented by the following formula (3).
(In Formula (2), R 1 represents a hydrogen atom or a methyl group, R 2 represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, and L 1 has a substituent. And a divalent hydrocarbon group having 1 to 10 carbon atoms which may be substituted, and in formula (3), R 3 and R 4 each have 1 carbon atom which may have a substituent. To 20 hydrocarbon groups, and a is an integer of 1 or more and 100 or less.)
Containing a blocked isocyanate represented by
The polyrotaxane has a hydroxyl group;
The photocurable composition for three-dimensional modeling according to claim 1, further comprising a reaction accelerator.
(式(A-1)中、cは1以上10以下の整数であり、式(A-2)中、dは1以上10以下の整数である。) The formula (3), wherein R 3 has at least one divalent linking group selected from the group consisting of the following formulas (A-1) to (A-4): The photocurable composition for three-dimensional modeling of description.
(In formula (A-1), c is an integer of 1 to 10, and in formula (A-2), d is an integer of 1 to 10.)
A-B-A・・・(4)
で表されることを特徴とする請求項2から4のいずれか1項に記載の立体造形用の光硬化性組成物。 The blocked isocyanate has the following general formula (4)
ABA ... (4)
The photocurable composition for three-dimensional model | molding of any one of Claim 2 to 4 characterized by the above-mentioned.
A-D-C・・・(5)
(式(5)中、AおよびCは各々独立に、下記式(2)で表される基を表し、Dは下記式(6)で表される基を表す。
ここで、式(2)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、式(6)中、R11、R12およびR13は各々独立に、置換基を有していてもよい炭素原子数1から20の2価の炭化水素基を表し、aおよびbは、いずれか一方は0でもよい、1≦a+b≦50を満たす整数である。)
で表されるブロックイソシアネート基を含有し、
鎖延長剤をさらに含有することを特徴とする請求項1に記載の立体造形用の光硬化性組成物。 The (meth) acrylic compound has the following general formula (5)
A-D-C (5)
(In formula (5), A and C each independently represent a group represented by the following formula (2), and D represents a group represented by the following formula (6).
Here, in formula (2), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may have In formula (6), R 11 , R 12 and R 13 each independently represent a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and a and b are , Either one may be 0, an integer satisfying 1 ≦ a + b ≦ 50. )
Containing a blocked isocyanate group represented by
The photocurable composition for three-dimensional modeling according to claim 1, further comprising a chain extender.
(式(B-1)中、gは1から10の整数であり、式(B-2)中、hおよびiはいずれか一方は0でもよい、1≦h+i≦10を満たす整数であり、式(B-3)中、jおよびkはいずれか一方は0でもよい、1≦j+k≦10を満たす整数である。) 7. The light for three-dimensional modeling according to claim 6, wherein R 11 and R 12 are each independently any one of the following formulas (B-1) to (B-9) in the formula (6): Curable composition.
(In Formula (B-1), g is an integer of 1 to 10, and in Formula (B-2), either h or i may be 0, and is an integer satisfying 1 ≦ h + i ≦ 10, In formula (B-3), either j or k may be 0, and is an integer that satisfies 1 ≦ j + k ≦ 10.)
A-D-A・・・(7)
で表されることを特徴とする請求項6または請求項7に記載の立体造形用の光硬化性組成物。 The blocked isocyanate is represented by the following general formula (7)
AD-A ... (7)
The photocurable composition for three-dimensional modeling of Claim 6 or Claim 7 characterized by the above-mentioned.
(一般式(11)中、A1~A4は各々独立に下記一般式(12)で表わされる構造であり、Bは下記一般式(13)で表わされる構造である。)
(一般式(13)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。また、一般式(13)中、R3a、R3b、R4、R5、R6およびR7は各々独立に、置換基を有していてもよい炭素原子数1から20の2価の炭化水素基を表し、Y1は2価の連結基であり、aは1以上99以下の整数である。)
で表されるブロックイソシアネート基を含有し、
鎖延長剤をさらに含有することを特徴とする請求項1に記載の立体造形用の光硬化性組成物。 The (meth) acrylic compound has the following general formula (11)
(In general formula (11), A 1 to A 4 are each independently a structure represented by the following general formula (12), and B is a structure represented by the following general formula (13).)
(In the general formula (13), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 represents a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may be present, and each of R 3a , R 3b , R 4 , R 5 , R 6 and R 7 in the general formula (13) Independently, it represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, Y 1 is a divalent linking group, and a is an integer of 1 to 99. )
Containing a blocked isocyanate group represented by
The photocurable composition for three-dimensional modeling according to claim 1, further comprising a chain extender.
前記立体造形用の光硬化性組成物が、請求項1乃至請求項17のいずれか一項に記載の立体造形用の光硬化性組成物であることを特徴とする立体物の製造方法。 It is a manufacturing method of a solid thing which has the process of photocuring the photocurable composition for three-dimensional modeling based on slice data, and modeling a modeling thing,
The method for producing a three-dimensional object, wherein the photocurable composition for three-dimensional modeling is the photocurable composition for three-dimensional modeling according to any one of claims 1 to 17.
前記造形物に熱処理を施して立体物を得る工程と、を有する立体物の製造方法であって、
前記立体造形用の光硬化性組成物が、請求項2乃至請求項17のいずれか一項に記載の立体造形用の光硬化性組成物であることを特徴とする立体物の製造方法。 The step of photocuring the photocurable composition for three-dimensional modeling based on the slice data to model the modeled object,
A step of obtaining a three-dimensional object by performing a heat treatment on the three-dimensional object,
The method for producing a three-dimensional object, wherein the photocurable composition for three-dimensional modeling is the photocurable composition for three-dimensional modeling according to any one of claims 2 to 17.
(式(8)中、R1は水素原子またはメチル基を表し、R2は置換基を有していてもよい炭素原子数1から10の炭化水素基を表し、L1は置換基を有していてもよい炭素原子数1から10の2価の炭化水素基を表す。)
で表される繰り返し構造単位と、下記一般式(9)
(式(9)中、R3、R4およびR5は各々独立に、置換基を有していてもよい炭素原子数1から20の炭化水素基を表し、X1およびX2は各々独立に、О(酸素原子)、S(硫黄原子)、およびNH(イミノ基)のいずれかを表す。aは1以上100以下の整数である。)
で表される繰り返し構造単位と、ポリロタキサン構造と、を含有する樹脂。 The following general formula (8)
(In Formula (8), R 1 represents a hydrogen atom or a methyl group, R 2 represents an optionally substituted hydrocarbon group having 1 to 10 carbon atoms, and L 1 has a substituent. Represents a divalent hydrocarbon group having 1 to 10 carbon atoms which may be present.)
A repeating structural unit represented by the following general formula (9):
(In Formula (9), R 3 , R 4 and R 5 each independently represents a hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and X 1 and X 2 are each independently Represents one of O (oxygen atom), S (sulfur atom), and NH (imino group), and a is an integer of 1 or more and 100 or less.
Resin containing the repeating structural unit represented by these, and a polyrotaxane structure.
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| WO2015200201A1 (en) * | 2014-06-23 | 2015-12-30 | Carbon3D, Inc. | Polyurethane resins having multiple mechanisms of hardening for use in producing three-dimensional objects |
| WO2016071811A1 (en) * | 2014-11-04 | 2016-05-12 | Dws S.R.L. | Stereolithographic method and composition |
| JP2017048288A (en) * | 2015-09-01 | 2017-03-09 | Kjケミカルズ株式会社 | Active energy ray curable resin composition |
| WO2017154335A1 (en) * | 2016-03-07 | 2017-09-14 | 住友ゴム工業株式会社 | Rubber composition for three-dimensional additive manufacturing |
| JP2018039962A (en) * | 2016-09-09 | 2018-03-15 | Kjケミカルズ株式会社 | (meth)acrylamide modified polyrotaxane |
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