WO2018155556A1 - Photonic crystal - Google Patents
Photonic crystal Download PDFInfo
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- WO2018155556A1 WO2018155556A1 PCT/JP2018/006465 JP2018006465W WO2018155556A1 WO 2018155556 A1 WO2018155556 A1 WO 2018155556A1 JP 2018006465 W JP2018006465 W JP 2018006465W WO 2018155556 A1 WO2018155556 A1 WO 2018155556A1
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- photonic crystal
- surface layer
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
Definitions
- the present invention provides, for example, a photonic crystal.
- a photonic crystal is a nanostructure whose refractive index changes periodically in the order of the wavelength of light. Since the photonic crystal can freely control the path of light, research is mainly conducted in the field of optoelectronics such as information communication and information processing.
- the photonic crystal shows the characteristic of reflecting incident light as monochromatic visible light.
- a POCT product or the like has been studied, and in recent years, a photonic crystal has attracted attention in the biodevice field.
- POCT is an abbreviation for Point of Care Test.
- POCT is a POCT guideline issued by the Japanese Society for Clinical Laboratory Automation. It is a test performed by the subject or a test performed by the subject himself. The test time can be shortened and the test can be performed at the test location (test visible to the subject). It is defined as an inspection having the advantage of A test reagent used at the time of POCT is called a POCT product.
- Patent Document 1 describes an example of a POCT product to which a resin photonic crystal is applied.
- a resin photonic crystal is applied to POCT products.
- inexpensive resin or glass is often used as a raw material.
- a specific application method assumes that a photonic crystal is used for the antigen detection part of the POCT product, and the intensity or wavelength of reflected light that changes depending on the presence or absence of the antigen is judged by human vision.
- Patent Document 1 uses a photonic crystal made of resin such as polyvinyl chloride (PVC). Resin-made photonic crystals have low reflected light intensity. That is, since the refractive index of the resin used for the photonic crystal is as small as 1.5, the light reflectance and the intensity of the reflected light are small. As a result, there has been a problem that slight changes in reflected light due to the presence or absence of an antigen cannot be recognized by human vision.
- resin such as polyvinyl chloride (PVC).
- Patent Document 2 describes a method for forming a thin film having a high refractive index.
- a thin film having a high refractive index is formed by a method that does not require conditions such as high vacuum, in which guanidine carbonate as a raw material is heated and evaporated on a substrate.
- Forming a thin film having a high refractive index on a substrate can be said to be one method for easily changing the light reflectivity of the substrate surface.
- Patent Document 2 does not describe a photonic crystal.
- Patent Document 3 discloses that a monolithic structure in which a fluid-containing structure and a periodic surface lattice structure of a photonic crystal sensor are integrated includes an optically transparent base layer, a cured polymer layer, and the cured polymer. It describes a thin film made of a relatively high refractive index material deposited on the layer. TiO 2 or Ti 2 O 3 is described as a relatively high refractive index material.
- U.S. Patent No. 6,057,031 describes a sensor comprising a nanoporous material having a low refractive index, supported on a bottom surface by a substrate, and coated on the top surface with a high dielectric constant dielectric coating.
- Patent Document 4 describes tin oxide, tantalum pentoxide, zinc sulfide, titanium dioxide, and silicon nitride as dielectric coating materials. Patent Documents 3 to 4 do not describe guanidine derivatives.
- JP 2014-202574 A International Publication No. 2014/098251 Special table 2010-509590 Special table 2009-520947
- the present invention provides, for example, a photonic crystal having high light reflectivity.
- the present invention is as follows.
- An optical sensor comprising the photonic crystal according to one of (1) to (7).
- a POCT product comprising the photonic crystal according to one of (1) to (7).
- the guanidine derivative is vaporized by heating to form a guanidine derivative on the surface of the base layer of the photonic crystal having a convex portion, and a surface layer containing the guanidine derivative is disposed on the surface of the convex portion of the base layer.
- a method for producing a photonic crystal (11) The method for producing a photonic crystal according to (10), wherein the heating temperature is 300 to 800 ° C.
- the photonic crystal of the present invention has, for example, high light reflectivity.
- the photonic crystal of the present invention is a photonic crystal 6 composed of a base material layer 2 having convex portions 3 and a surface layer 1 arranged on the surface of the base material layer 2 having convex portions 3, and has a concavo-convex structure. .
- the photonic crystal of the present invention is formed by arranging the surface layer 1 at least on the surface of the convex portion 3 of the base material layer 2, for example, by being in close contact therewith.
- the surface layer 1 is preferably disposed also on the surface of the base material layer 2 in terms of improving the light reflectance.
- the photonic crystal of the present invention will be illustrated based on FIG.
- the photonic crystal 6 of the present invention is composed of a surface layer 1 and a base material layer 2 as shown in FIG.
- the surface layer 1 is disposed at least on the surface of the convex portion 3 of the base material layer 2.
- the convex portion 3 is illustrated by filling.
- the base material layer 2 forms an uneven structure as shown in FIG. By covering the surface of the base material layer 2 with the surface layer 1, the photonic crystal 6 is formed.
- the surface layer 1 contains a guanidine derivative.
- the surface layer 1 is preferably made of a guanidine derivative.
- the content of the guanidine derivative is preferably 90% by mass or more, more preferably 95% by mass or more, most preferably 98% by mass or more, and even more preferably 99% by mass or more.
- the content of the guanidine derivative includes not only the guanidine derivative but also the content of a reaction product generated by heating the guanidine derivative.
- the content of the guanidine derivative in the surface layer 1 is preferably calculated by measuring X-ray diffraction. X-ray diffraction can be measured by X-ray diffraction measurement described in Patent Document 2, for example.
- FIG. 1 An example of a method for forming the surface layer 1 in the photonic crystal 6 is shown in FIG.
- a guanidine derivative 10 is placed in a quartz glass boat 9 and covered with a photonic crystal 6 a having a base material layer 2 and a convex portion 3 to form a surface layer forming set 8. At this time, the surface having the convex portion 3 is covered so as to face the boat 9.
- This surface layer forming set 8 is heated to a predetermined temperature in a furnace and kept warm for 1 minute.
- the guanidine derivative is vaporized by heating.
- the surface layer forming set 8 is cooled and taken out from the furnace, so that the photonic crystal 6 in which the surface layer 1 is formed (for example, attached) to the base material layer 2 is obtained.
- the heating temperature in the furnace is preferably 300 to 800 ° C., more preferably 380 to 700 ° C., most preferably 500 to 600 ° C., and even more preferably 570 ° C., from the viewpoint of ensuring a refractive index and forming a uniform surface layer. preferable.
- guanidine derivatives include guanidines and guanidine salts that are salts of guanidines.
- guanidines include guanidine, nitroguanidine, aminonitroguanidine, aminoguanidine diaminoguanidine, triaminoguanidine and the like. Of the guanidines, guanidine is preferred.
- guanidine salts include inorganic acid salts such as hydrochlorides, sulfates, carbonates and nitrates, and organic acid salts such as acetates. Of the guanidine salts, carbonates are preferred. Of the guanidine derivatives, guanidine carbonate is preferred.
- the guanidine derivative may be commercially available or may be synthesized by a known method.
- the refractive index of the surface layer 1 is preferably larger than the refractive index of the base material layer 2 in terms of improving the light reflectance of the photonic crystal.
- the refractive index of the surface layer 1 is more preferably 2.0 or more.
- the refractive index of the surface layer 1 is preferably 3.4 or less in that the surface layer 1 can be formed uniformly. By adjusting the heating temperature in the furnace when the surface layer 1 is formed, the refractive index of the surface layer 1 can be set to a predetermined value.
- the thickness 23 of the surface layer 1 is preferably 1 nm or more, more preferably 100 to 1200 nm, most preferably 300 to 1000 nm, and even more preferably 500 to 800 nm. When the thickness 23 of the surface layer 1 is 1 nm or more, the light reflectance is improved. When the thickness 23 of the surface layer 1 is 1000 nm or less, the surface layer 1 can be formed uniformly.
- the refractive index of the base material layer 2 is preferably smaller than the refractive index of the surface layer 1 in terms of improving the light reflectance of the photonic crystal.
- the refractive index of the base material layer 2 1.6 or less are more preferable.
- the refractive index of the base material layer 2 is preferably 1.0 or more, more preferably 1.3 or more, and most preferably 1.4 or more.
- a structure in which the convex portions 3 are regularly arranged as protrusions in each direction is preferable.
- a planar lattice is preferable.
- the planar lattice is preferably one or more of an orthorhombic lattice, a hexagonal lattice, a tetragonal lattice, a rectangular lattice, and a parallel lattice, and more preferably a hexagonal lattice.
- an equilateral triangular lattice is preferable.
- the structure in which the protrusions 3 are regularly arranged as protrusions has a larger surface area than the groove-like structure (line and space structure) shown in FIG. 4 and provides higher light reflectivity.
- FIG. 3 shows a structure in which the convex portions 3 are arranged in an equilateral triangular lattice shape. In FIG. 4, the irregularities are ridges, and the ridges are parallel to each other.
- Examples of the method for forming the concavo-convex structure include imprint, laser processing, photolithography and the like. Among these, imprint is preferable. As the imprint, thermal imprint or UV imprint is preferable, and thermal imprint is more preferable.
- Thermal imprinting is a method for producing a substrate having a fine structure by pressing a mold (mold) having a fine structure against the substrate and transferring the fine structure to a substrate softened by heating. This thermal imprint enables nano-order microfabrication.
- the material of the base material layer 2 is preferably glass or resin, more preferably glass.
- the glass at least one of soda lime glass, quartz glass, borosilicate glass, optical glass, and boron-added quartz glass is preferable, and boron-added quartz glass is more preferable.
- the resin one or more of a thermoplastic resin and an ultraviolet curable resin are preferable.
- the thickness 21 of the base material layer 2 is preferably 100 ⁇ m to 5 mm, more preferably 500 ⁇ m to 2 mm.
- the thickness 21 of the base material layer 2 does not include the height 5 of the convex portion.
- the convex portion 3 is preferably made of the same material as the base material layer 2.
- a shape of the convex part 3 a cone and a column are preferable, and a cone is more preferable.
- a pyramid as shown in Drawing 5 (a)
- the section of convex part 3 is a triangle, and a regular triangle is more preferred.
- a cone shape or a pyramid shape is preferable, and a cone shape is more preferable.
- As a column as shown in Drawing 5 (b), it is preferred that the section of convex part 3 is a quadrangle, and a square is more preferred.
- a columnar shape or a prismatic shape is preferable.
- the cross section refers to, for example, a surface cut from the bottom surface in the height direction (the direction of the apex in the case of a cone and the direction of the top surface in the case of a column).
- the pitch 4 of the convex portions 3 is preferably 100 to 800 nm, more preferably 150 to 650 nm, and most preferably 200 to 350 nm. When it is 100 nm or more, the light reflectivity is excellent. When it is 800 nm or less, the transparency is excellent.
- the pitch 4 of the convex portions 3 is, for example, the dimension between the convex portions 3 adjacent to each other.
- the pitch 4 is a dimension between the apex of the cone and the apex of the cone, as shown in FIG.
- the pitch 4 refers to the dimension between the side surface of the column body and the side surface of the column body as shown in FIG.
- the pitch 4 refers to the dimension between the side surface of the groove-like structure and the side surface of the groove-like structure, as shown in FIG.
- the height 5 of the convex portion 3 is preferably 100 to 800 nm, more preferably 150 to 650 nm, and most preferably 200 to 350 nm. When it is 100 nm or more, the light reflectivity is excellent, and when it is 800 nm or less, the transparency is excellent.
- the height 5 of the convex portion 3 refers to, for example, the dimension from the bottom surface of the convex portion 3 to the apex or top surface of the convex portion 3.
- the aspect ratio of the uneven structure is preferably 10: 1 to 1: 5, more preferably 2: 1 to 1: 2.
- the aspect ratio means (the height of the convex part 5) / (the width 22 of the convex part).
- the aspect ratio is 10: 1 (that is, 10) or less, the contact area between the liquid sample and the flow path is large, and the capillary force increases, so that the liquid sample can be easily moved.
- the aspect ratio is 1: 5 (that is, 0.2) or more, it becomes easy to form a concavo-convex structure by imprinting or the like.
- the convex portion 3 is a cone
- the width 22 of the convex portion may be the diameter 22 of the bottom surface of the cone 3 as shown in FIGS.
- the width 22 of the convex portion may be the diameter 22 of the bottom side of the column 3.
- the method for laminating the surface layer 1 and the base material layer 2 having the convex portions 3 is not particularly limited, but a method for depositing the surface layer, a method for pressure bonding, and a base material having the surface layer 1 and the convex portions 3 are used. Examples thereof include a method of applying an adhesive between the layer 2 and a method by heat sealing.
- the present invention may have an adhesive layer 7 between the surface layer 1 and the base material layer 2 having the projections 3 as shown in FIG.
- Adhesives used for the adhesive layer 7 include rubber adhesives, acrylic adhesives, cross-linked acrylic adhesives, vinyl adhesives, and silicone adhesives. Agents and the like. You may use an ultraviolet absorber, an infrared absorber, etc. for these adhesives as needed.
- the photonic crystal 6 of the present invention has high light reflectivity.
- the optical sensor to which the photonic crystal 6 of the present invention is applied can recognize, for example, a change in the intensity of reflected light or a change in wavelength caused by a change in the environment on the surface layer 1.
- Guanidine carbonate Commercially available photonic crystal: Thickness 21 of the base material layer is 1 mm, the convex part 3 is a cone, the cross section of the convex part 3 is a regular triangle, a refractive index of 1.5, an imprint, and a predetermined convex part Boron-added quartz glass having a height of 3 and a predetermined pitch of projections 3 (hereinafter sometimes referred to as glass)
- Refractive index Evaluation was performed using a spectroscopic ellipsometer M-2000DI-T (manufactured by JA Woollam). The refractive index of the surface layer 1 was evaluated. When the base material layer 2 was not covered with the surface layer 1, the refractive index of the base material layer 2 was evaluated.
- the light source used was a tungsten / halogen light source BPS101 (B & W TEK).
- the spectroscope used was a multi-channel spectroscope Quest X (manufactured by B & W TEK).
- Incident light 14 emitted from the light source 11 was applied to the sample portion 13 at a predetermined incident angle 15.
- the reflected light 16 reflected from the surface of the sample unit 13 at a predetermined reflection angle 17 was received by the light receiving unit 12.
- the reflected light 16 passed through light having a wavelength of 550 nm by a spectroscope (not shown), and then the reflected light 16 having a wavelength of 550 nm was received by the light receiving unit 12. The light reflectance at a wavelength of 550 nm was measured.
- Example 1 A guanidine carbonate 10 (0.5 g) is placed in a boat 9 (2 mL) made of boron-added quartz glass, the height 5 of the convex portions 3 is 270 nm, the pitch 4 of the convex portions 3 is 270 nm, The boat 9 was covered with a boron-added quartz glass (photonic crystal) 6a having the layer 2 and the convex portion 3 (see FIG. 7). The boron-added quartz glass 6a and the boat 9 were heated to 570 ° C. in the furnace and kept for 1 hour, then cooled and taken out from the furnace, whereby the surface layer 1 was formed on the base material layer 2 and the convex part 3. Photonic crystal 6 was obtained. The thickness of the surface layer 1 was 800 nm. The refractive index of the surface layer 1 was 2.0. The surface layer 1 contained 99% by mass or more of a guanidine derivative.
- Example 2 to 7 A surface layer 1 was formed in the same manner as in Example 1. At that time, the height 5 of the protrusions on the glass surface and the pitch 4 of the protrusions were changed from 100 to 800 nm.
- Example 8 to 11 A surface layer 1 was formed in the same manner as in Example 1. At that time, the thickness 23 of the surface layer 1 was changed from 100 to 1200 nm.
- Example 12 to 14 A surface layer 1 was formed in the same manner as in Example 1. At that time, the refractive index of the surface layer 1 was changed from 2.0 to 3.4 by setting the heating temperature in the furnace to the values shown in Table 4.
- Example 1 The same procedure as in Example 1 was performed except that the height 5 of the convex portion was 270 nm, the pitch 4 of the convex portion was 270 nm, and glass having no surface layer was used.
- Example 2 The same procedure as in Example 1 was performed except that glass having a surface having no uneven structure (that is, having no convex portion) was used.
- Example 3 The same procedure as in Example 1 was performed except that the surface 6 did not have a concavo-convex structure (that is, did not have a convex portion) and glass 6 having no surface layer was used.
- Example 15 Regarding the photonic crystal of Example 1 and the photonic crystal of Comparative Example 1, the light reflectance was measured when the incident angle and reflection angle were changed from 15 to 55 degrees in steps of 5 degrees. The measurement results are shown in FIG.
- Example 1 and Comparative Example 1 were compared, the light reflectance increased by 24 to 32% by forming the surface layer 1.
- the light reflectance was small.
- the surface of the base material layer 2 did not have an uneven structure as in Comparative Example 2 and Comparative Example 3, the light reflectance was small.
- the light reflectance was increased by setting the pitch 4 of the protrusions and the height of the protrusions 3 to 100 to 800 nm.
- Example 1 was compared with Examples 8 to 11, the light reflectance was increased by setting the thickness 23 of the surface layer 1 to an appropriate value.
- the photonic crystal of the present invention provides a diffraction grating with high light reflectivity.
- the photonic crystal of the present invention can be used as a light emitting device such as a laser or a sensor or an optical waveguide.
- As an optical sensor to which the photonic crystal of the present invention is applied for example, when applied to a POCT product, the light reflectance and reflected light intensity are improved. That is, the photonic crystal alone does not exhibit light reflectivity that can be applied to POCT, but by increasing the refractive index of the surface layer of the photonic crystal, the light reflectivity and reflected light intensity are increased, and high light reflectivity is achieved. Show.
- the present invention uses a guanidine derivative, it has the following advantages.
- a thin surface layer having a high refractive index can be easily obtained simply by heating the raw material at a low temperature.
- the present invention does not require special conditions such as vacuum deposition, electron beam deposition, and sputtering.
- a guanidine derivative is a molecule having carbon and nitrogen as a skeleton, so the surface layer is lightweight and flexible.
- the present invention is environmentally safe because no metal element is used.
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Abstract
Description
本発明は、例えば、フォトニック結晶を提供する。 The present invention provides, for example, a photonic crystal.
フォトニック結晶とは光の波長のオーダーで屈折率が周期的に変化するナノ構造体である。このフォトニック結晶は光の進路を自在に操ることが可能であるため、情報通信や情報処理等の光エレクトロニクス分野をメインに研究されている。 A photonic crystal is a nanostructure whose refractive index changes periodically in the order of the wavelength of light. Since the photonic crystal can freely control the path of light, research is mainly conducted in the field of optoelectronics such as information communication and information processing.
表面の凸部の高さ及びピッチを100~800nmにする等表面形状を適正化した場合、フォトニック結晶は入射光を単色の可視光として反射する特性を示す。このようなフォトニック結晶に見られる光反射性を応用した光学式センサとして、POCT製品等が検討されており、近年ではバイオデバイス分野でもフォトニック結晶が注目されている。 When the surface shape is optimized such that the height and pitch of the convex portions on the surface are set to 100 to 800 nm, the photonic crystal shows the characteristic of reflecting incident light as monochromatic visible light. As an optical sensor applying the light reflectivity found in such a photonic crystal, a POCT product or the like has been studied, and in recent years, a photonic crystal has attracted attention in the biodevice field.
POCTとは、Point of Care Testの略語である。POCTは、日本臨床検査自動化学会が発行したPOCTガイドラインにおいて、被験者の傍らで行われる検査、或いは、被験者自らが行う検査であり、検査時間を短縮でき、検査場所で検査(被験者に見える検査)できるという利点を有する検査と定義されている。POCT時に用いられる検査試薬のことをPOCT製品と呼ぶ。 POCT is an abbreviation for Point of Care Test. POCT is a POCT guideline issued by the Japanese Society for Clinical Laboratory Automation. It is a test performed by the subject or a test performed by the subject himself. The test time can be shortened and the test can be performed at the test location (test visible to the subject). It is defined as an inspection having the advantage of A test reagent used at the time of POCT is called a POCT product.
特許文献1は樹脂製のフォトニック結晶を適用したPOCT製品に関する例を述べている。フォトニック結晶をPOCT製品に適用した研究では、市販時のコスト削減を念頭に置いているため、原料として安価な樹脂又はガラスを用いることが多い。具体的な適用方法は、POCT製品の抗原検出部へフォトニック結晶を用い、抗原の有無により変化する反射光の強度や波長を人間の視覚で判断することを想定している。
特許文献1はポリ塩化ビニル(PVC)等といった樹脂製のフォトニック結晶を使用している。樹脂製のフォトニック結晶は反射光の強度が小さい。つまり、フォトニック結晶に用いられる樹脂の屈折率が1.5と小さいために、光反射率、そして反射光の強度が小さくなる。その結果、抗原の有無による反射光のわずかな変化を人間の視覚では認識できない、といった課題があった。
特許文献2は高屈折率を有する薄膜の形成方法を述べている。特許文献2では、原料であるグアニジン炭酸塩を加熱し基板に蒸着させるという、高真空等の条件を必要としない手法で高屈折率を有する薄膜を形成している。高屈折率を有する薄膜を基盤に形成することは、基盤表面の光反射性を容易に変化させる手法の一つといえる。特許文献2は、フォトニック結晶について記載がない。
特許文献3は統合された流体含有構造を備えたフォトニック結晶バイオセンサを記載している。特許文献3は、流体含有構造と、フォトニック結晶センサの周期的表面格子構造とを、統合したモノリシック構造が、光学的に透明な基材層、硬化させたポリマー層、及び該硬化させたポリマー層の上に堆積させた比較的高屈折率の材料からなる薄膜であることを記載している。比較的高屈折率の材料として、TiO2又はTi2O3を記載している。
U.S. Patent No. 6,057,049 describes a photonic crystal biosensor with an integrated fluid containing structure.
特許文献4は低屈折率を有し、基板によって底面上に支持され、かつ高誘電率の誘電性コーティングで頂部表面上にコーティングされたナノ多孔性物質を備えるセンサを記載している。特許文献4は、誘電性コーティングの材料として、酸化スズ、五酸化タンタル、硫化亜鉛、二酸化チタン、窒化ケイ素を記載している。
特許文献3~4は、グアニジン誘導体について記載がない。
U.S. Patent No. 6,057,031 describes a sensor comprising a nanoporous material having a low refractive index, supported on a bottom surface by a substrate, and coated on the top surface with a high dielectric constant dielectric coating.
本発明は、例えば、高い光反射性を有するフォトニック結晶を提供する。 The present invention provides, for example, a photonic crystal having high light reflectivity.
即ち、本発明は以下の通りである。
(1)凸部を有する基材層と、凸部を有する基材層の表面に配置する表面層とを有するフォトニック結晶であり、表面層がグアニジン誘導体を含有するフォトニック結晶。
(2)表面層の屈折率が2.0以上である(1)記載のフォトニック結晶。
(3)表面層の光反射率が基材層の光反射率より0.2以上大きい(1)又は(2)記載のフォトニック結晶。
(4)表面層の厚さが1nm以上である(1)~(3)のうちの1項記載のフォトニック結晶。
(5)基材層の屈折率が1.6以下である(1)~(4)のうちの1項記載のフォトニック結晶。
(6)凸部のピッチが100~800nmであり、(1)~(5)のうちの1項記載のフォトニック結晶。
(7)凸部の高さが100~800nmである(1)~(5)のうちの1項記載のフォトニック結晶。
(8)(1)~(7)のうちの1項記載のフォトニック結晶からなる光学式センサ。
(9)(1)~(7)のうちの1項記載のフォトニック結晶からなるPOCT製品。
(10)グアニジン誘導体を加熱により気化させて、凸部を有するフォトニック結晶の基材層の表面にグアニジン誘導体を形成させ、基材層の凸部の表面にグアニジン誘導体を含有する表面層を配置するフォトニック結晶の製造方法。
(11)加熱温度が300~800℃である(10)記載のフォトニック結晶の製造方法。
That is, the present invention is as follows.
(1) A photonic crystal having a base material layer having convex portions and a surface layer disposed on the surface of the base material layer having convex portions, the surface layer containing a guanidine derivative.
(2) The photonic crystal according to (1), wherein the refractive index of the surface layer is 2.0 or more.
(3) The photonic crystal according to (1) or (2), wherein the light reflectance of the surface layer is 0.2 or more larger than the light reflectance of the base material layer.
(4) The photonic crystal according to one of (1) to (3), wherein the thickness of the surface layer is 1 nm or more.
(5) The photonic crystal according to one of (1) to (4), wherein the refractive index of the base material layer is 1.6 or less.
(6) The photonic crystal according to any one of (1) to (5), wherein the pitch of the convex portions is 100 to 800 nm.
(7) The photonic crystal according to one of (1) to (5), wherein the height of the convex portion is 100 to 800 nm.
(8) An optical sensor comprising the photonic crystal according to one of (1) to (7).
(9) A POCT product comprising the photonic crystal according to one of (1) to (7).
(10) The guanidine derivative is vaporized by heating to form a guanidine derivative on the surface of the base layer of the photonic crystal having a convex portion, and a surface layer containing the guanidine derivative is disposed on the surface of the convex portion of the base layer. A method for producing a photonic crystal.
(11) The method for producing a photonic crystal according to (10), wherein the heating temperature is 300 to 800 ° C.
本発明のフォトニック結晶は、例えば、高い光反射性を有する。 The photonic crystal of the present invention has, for example, high light reflectivity.
本発明のフォトニック結晶は、凸部3を有する基材層2と、凸部3を有する基材層2の表面に配置する表面層1とからなるフォトニック結晶6であり、凹凸構造を有する。少なくとも基材層2の凸部3の表面に表面層1を配置することにより、例えば、密着することにより、本発明のフォトニック結晶を形成する。光反射率を向上する点で、表面層1は基材層2の表面にも配置することが好ましい。
The photonic crystal of the present invention is a
本発明のフォトニック結晶について、図1をもとに例示する。例えば、本発明のフォトニック結晶6は、図1に示すように表面層1と基材層2から構成される。表面層1は少なくとも基材層2の凸部3の表面に配置する。説明のために、凸部3は塗りつぶしにより図示している。基材層2は図2に示すように凹凸構造を形成する。基材層2の表面を表面層1で被覆することにより、フォトニック結晶6を形成する。
The photonic crystal of the present invention will be illustrated based on FIG. For example, the
表面層1はグアニジン誘導体を含有する。表面層1はグアニジン誘導体からなることが好ましい。表面層1において、グアニジン誘導体の含有率は90質量%以上が好ましく、95質量%以上がより好ましく、98質量%以上が最も好ましく、99質量%以上が尚更好ましい。表面層1において、例えば、グアニジン誘導体の含有率には、グアニジン誘導体だけでなく、グアニジン誘導体の加熱等により生成した反応物の含有率も含まれる。
表面層1におけるグアニジン誘導体の含有率は、X線回折を測定することにより算出することが好ましい。X線回折は、例えば、特許文献2記載のX線回折測定により測定することが挙げられる。
The
The content of the guanidine derivative in the
フォトニック結晶6における表面層1の形成方法の例を図7に示す。石英ガラス製のボート9内にグアニジン誘導体10を入れ、基材層2と凸部3を有するフォトニック結晶6aで覆い、表面層形成セット8とする。この際、凸部3を有する面をボート9内に対向するようにして覆う。この表面層形成セット8を炉で所定温度に加熱し1分間保温する。加熱によりグアニジン誘導体が気化する。表面層形成セット8を降温し、炉から取り出すことで、基材層2に表面層1が形成(例えば、付着)されたフォトニック結晶6が得られる。炉内の加熱温度は、屈折率を確保し、表面層を均一に形成する点で、300~800℃が好ましく、380~700℃がより好ましく、500~600℃が最も好ましく、570℃が尚更好ましい。
An example of a method for forming the
グアニジン誘導体としては、グアニジン類や、グアニジン類の塩であるグアニジン塩等が挙げられる。グアニジン類としては、グアニジン、ニトログアニジン、アミノニトログアニジン、アミノグアニジンジアミノグアニジン、トリアミノグアニジン等が挙げられる。グアニジン類の中では、グアニジンが好ましい。グアニジン塩としては、塩酸塩、硫酸塩、炭酸塩、硝酸塩等の無機酸塩や、酢酸塩等の有機酸塩等が挙げられる。グアニジン塩の中では、炭酸塩が好ましい。グアニジン誘導体の中では、グアニジン炭酸塩が好ましい。グアニジン誘導体は市販されているものでも良いし、公知の方法で合成しても良い。 Examples of guanidine derivatives include guanidines and guanidine salts that are salts of guanidines. Examples of guanidines include guanidine, nitroguanidine, aminonitroguanidine, aminoguanidine diaminoguanidine, triaminoguanidine and the like. Of the guanidines, guanidine is preferred. Examples of guanidine salts include inorganic acid salts such as hydrochlorides, sulfates, carbonates and nitrates, and organic acid salts such as acetates. Of the guanidine salts, carbonates are preferred. Of the guanidine derivatives, guanidine carbonate is preferred. The guanidine derivative may be commercially available or may be synthesized by a known method.
表面層1の屈折率は、フォトニック結晶の光反射率を向上する点で、基材層2の屈折率よりも大きいことが好ましい。表面層1の屈折率は、2.0以上がより好ましい。表面層1の屈折率は、表面層1を均一に形成できる点で、3.4以下が好ましい。
表面層1を形成する際に炉内の加熱温度を調整することにより、表面層1の屈折率の所定の値にできる。
The refractive index of the
By adjusting the heating temperature in the furnace when the
表面層1の厚さ23は、1nm以上が好ましく、100~1200nmがより好ましく、300~1000nmが最も好ましく、500~800nmが尚更好ましい。表面層1の厚さ23が1nm以上だと光反射率が向上する。表面層1の厚さ23が1000nm以下だと、表面層1を均一に形成できる。
The
基材層2の屈折率は、フォトニック結晶の光反射率を向上する点で、表面層1の屈折率よりも小さいことが好ましい。基材層2の屈折率は、1.6以下がより好ましい。基材層2の屈折率は、1.0以上が好ましく、1.3以上がより好ましく、1.4以上が最も好ましい。
The refractive index of the
基材層2の凹凸構造としては、図3に示すように、凸部3が突起として各方向に規則的に整列する構造が好ましい。凸部3が突起として規則的に整列する構造としては、平面格子が好ましい。平面格子としては、斜方格子、六角格子、正方格子、矩形格子、平行体格子のうちの1種以上が好ましく、六角格子がより好ましい。六角格子の中では、正三角形格子が好ましい。凸部3が突起として規則的に整列する構造は、図4に示す溝状構造(ライン&スペース構造)よりも表面積が大きくなり、より高い光反射性を提供する。図3は、凸部3が正三角形格子状に配列する構造を示す。図4は、凹凸は凸条であり、凸条は互いに平行な構造を示す。
As the concavo-convex structure of the
凹凸構造を形成する方法としては、インプリント、レーザ加工、フォトリソグラフィ等が挙げられる。これらの中では、インプリントが好ましい。インプリントとしては、熱インプリントやUVインプリントが好ましく、熱インプリントがより好ましい。熱インプリントとは、微細構造を有する金型(モールド)を基材に押し当て、加熱により柔らかくした基材に微細構造を転写することにより、微細構造を有する基材を作製する方法である。この熱インプリントではナノオーダーの微細加工が可能である。 Examples of the method for forming the concavo-convex structure include imprint, laser processing, photolithography and the like. Among these, imprint is preferable. As the imprint, thermal imprint or UV imprint is preferable, and thermal imprint is more preferable. Thermal imprinting is a method for producing a substrate having a fine structure by pressing a mold (mold) having a fine structure against the substrate and transferring the fine structure to a substrate softened by heating. This thermal imprint enables nano-order microfabrication.
基材層2の材料としては、ガラスや樹脂が好ましく、ガラスがより好ましい。ガラスとしては、ソーダ石灰ガラス、石英ガラス、ホウケイ酸ガラス、光学ガラス、ホウ素添加石英ガラスのうちの1種以上が好ましく、ホウ素添加石英ガラスがより好ましい。樹脂としては、熱可塑性樹脂と紫外線硬化性樹脂のうちの1種以上が好ましい。
The material of the
基材層2の厚さ21は100μm~5mmが好ましく、500μm~2mmがより好ましい。基材層2の厚さ21は、凸部の高さ5を含まない。
The
凸部3は基材層2と同じ材料からなることが好ましい。
凸部3の形状としては、錐体や柱体が好ましく、錐体がより好ましい。錐体としては、図5(a)のように、凸部3の断面は三角形であることが好ましく、正三角形がより好ましい。断面が三角形である錐体としては、円錐形状や角錐形状が好ましく、円錐形状がより好ましい。柱体としては、図5(b)のように、凸部3の断面は四角形であることが好ましく、正方形がより好ましい。断面が四角形である柱体としては、円柱形状や角柱形状が好ましい。断面とは、例えば、底面から高さ方向(円錐の場合は頂点の方向、柱体の場合は頂面の方向)に向かって切断した面をいう。
The
As a shape of the
凸部3のピッチ4は、100~800nmが好ましく、150~650nmがより好ましく、200~350nmが最も好ましい。100nm以上だと光反射性に優れる。800nm以下だと透明性に優れる。
The
凸部3のピッチ4は、例えば、互いに隣接する、凸部3と凸部3の間の寸法をいう。凸部3が錐体である場合、ピッチ4は、図5(a)のように、錐体の頂点と錐体の頂点の間の寸法をいう。凸部3が柱体である場合、ピッチ4は、図5(b)のように、柱体の側面と柱体の側面の間の寸法をいう。凸部3が溝状構造である場合、ピッチ4は、図4に示すように、溝状構造の側面と溝状構造の側面の間の寸法をいう。
The
凸部3の高さ5は、100~800nmが好ましく、150~650nmがより好ましく、200~350nmが最も好ましい。100nm以上だと光反射性に優れ、800nm以下だと透明性に優れる。
凸部3の高さ5は、例えば、凸部3の底面から凸部3の頂点又は頂面までの寸法をいう。
The
The
凹凸構造のアスペクト比は、10:1~1:5が好ましく、2:1~1:2がより好ましい。アスペクト比とは、(凸部の高さ5)/(凸部の幅22)をいう。アスペクト比が10:1(つまり10)以下だと、液体試料と流路との接触面積が大きく、毛細管力が増加するため、液体試料を移動させやすい。アスペクト比が1:5(つまり0.2)以上だと、インプリント等により凹凸構造を形成しやすくなる。凸部3が錐体である場合、図2や図3に示すように、凸部の幅22は、円錐3の底面の直径22であってよい。図4や図5(b)に示すように、凸部3が柱体である場合、凸部の幅22は、柱体3の底辺の直径22であってよい。
The aspect ratio of the uneven structure is preferably 10: 1 to 1: 5, more preferably 2: 1 to 1: 2. The aspect ratio means (the height of the convex part 5) / (the
表面層1と、凸部3を有する基材層2とを積層する方法としては、特に制限はないが、表面層を蒸着する方法、圧着する方法、表面層1と凸部3を有する基材層2との間に粘接着剤を適用する方法、ヒートシールによる方法等が挙げられる。
The method for laminating the
本発明は、図6に示すように、表面層1と凸部3を有する基材層2との間に粘接着剤層7を有しても良い。粘接着剤層7に使用する粘接着剤としては、ゴム系粘接着剤、アクリル系粘接着剤、架橋アクリル系粘接着剤、ビニル系粘接着剤、シリコーン系粘接着剤等が挙げられる。これらの粘接着剤には必要に応じて、紫外線吸収剤や赤外線吸収剤等を使用してもよい。
The present invention may have an
本発明のフォトニック結晶6は、光反射性が高い。
The
本発明のフォトニック結晶6を適用した光学式センサは、例えば、表面層1上の環境が変化することにより生じる、反射光の強度の変化や波長の変化を認識できる。
The optical sensor to which the
以下、実験例を記載した。結果を表1~4に示した。 Hereafter, experimental examples are described. The results are shown in Tables 1 to 4.
[形状]
凸部の形状:円錐、断面は正三角形
[shape]
Convex shape: cone, cross section is equilateral triangle
[材料]
グアニジン炭酸塩:市販品
フォトニック結晶:基材層の厚さ21は1mm、凸部3は円錐、凸部3の断面は正三角形、屈折率1.5、インプリントにより作製、所定の凸部3の高さと所定の凸部3のピッチを有するホウ素添加石英ガラス(以下、ガラスということもある)
[material]
Guanidine carbonate: Commercially available photonic crystal:
[評価方法]
本発明に使用した物性値の評価方法を記載する。
[Evaluation methods]
A method for evaluating physical properties used in the present invention will be described.
屈折率:
分光エリプソメータ M-2000DI-T(J.A.Woollam社製)を用いて評価した。表面層1の屈折率を評価した。表面層1で基材層2を被覆しない場合、基材層2の屈折率を評価した。
Refractive index:
Evaluation was performed using a spectroscopic ellipsometer M-2000DI-T (manufactured by JA Woollam). The refractive index of the
光反射率:
図8に示す装置系を用いて測定した。光源はタングステン・ハロゲン光源 BPS101(B&W TEK社製)を用いた。分光器はマルチチャンネル分光器 Quest X(B&W TEK社製)を用いた。
光源11から放射された入射光14は、試料部13を所定の入射角15で照射された。試料部13の表面において所定の反射角17で反射した反射光16は、受光部12により受光された。反射光16は分光器(図示せず)により波長550nmの光を通した後に、波長550nmの反射光16が受光部12に受光された。波長550nmの光反射率を測定した。
Light reflectance:
Measurement was performed using the apparatus system shown in FIG. The light source used was a tungsten / halogen light source BPS101 (B & W TEK). The spectroscope used was a multi-channel spectroscope Quest X (manufactured by B & W TEK).
[実施例1]
ホウ素添加石英ガラス製のボート9(2mL)内にグアニジン炭酸塩10(0.5g)を入れ、凸部3の高さ5が270nmであり、凸部3のピッチ4が270nmであり、基材層2を有し、凸部3を有するホウ素添加石英ガラス(フォトニック結晶)6aでボート9を覆った(図7参照)。このホウ素添加石英ガラス6aとボート9を炉内で570℃に昇温させ1時間保温した後、降温し、炉から取り出すことで、基材層2や凸部3に表面層1が形成されたフォトニック結晶6を得た。表面層1の厚さは800nmであった。表面層1の屈折率は2.0であった。
表面層1はグアニジン誘導体を99質量%以上含有した。
[Example 1]
A guanidine carbonate 10 (0.5 g) is placed in a boat 9 (2 mL) made of boron-added quartz glass, the
The
[実施例2~7]
実施例1と同様に表面層1を形成した。その際、ガラス表面の凸部の高さ5及び凸部のピッチ4を100~800nmまで変化させた。
[Examples 2 to 7]
A
[実施例8~11]
実施例1と同様に表面層1を形成した。その際、表面層1の厚さ23を100~1200nmまで変化させた。
[Examples 8 to 11]
A
[実施例12~14]
実施例1と同様に表面層1を形成した。その際、炉内の加熱温度を表4に記載の値にすることにより、表面層1の屈折率を2.0~3.4まで変化させた。
[Examples 12 to 14]
A
[比較例1]
凸部の高さ5が270nmであり、凸部のピッチ4が270nmであり、表面層を有しないガラスを使用したこと以外は、実施例1と同様に行った。
[Comparative Example 1]
The same procedure as in Example 1 was performed except that the
[比較例2]
表面が凹凸構造を有しない(即ち、凸部を有しない)ガラスを使用したこと以外は、実施例1と同様に行った。
[Comparative Example 2]
The same procedure as in Example 1 was performed except that glass having a surface having no uneven structure (that is, having no convex portion) was used.
[比較例3]
表面が凹凸構造を有さず(即ち、凸部を有さず)、表面層を有しないガラス6を使用したこと以外は、実施例1と同様に行った。
[Comparative Example 3]
The same procedure as in Example 1 was performed except that the
[実施例15]
実施例1のフォトニック結晶と比較例1のフォトニック結晶に関し、入射角及び反射角を15~55度まで5度刻みで変化させた場合の光反射率を測定した。測定結果を図9に示した。
[Example 15]
Regarding the photonic crystal of Example 1 and the photonic crystal of Comparative Example 1, the light reflectance was measured when the incident angle and reflection angle were changed from 15 to 55 degrees in steps of 5 degrees. The measurement results are shown in FIG.
実施例1と比較例1を比較すると、表面層1を形成することにより光反射率が24~32%上昇した。比較例1や比較例3のように、表面層1を有しない場合、光反射率が小さかった。比較例2や比較例3のように、基材層2の表面に凹凸構造を有しない場合、光反射率が小さかった。図9を見ると、光の入射角及び反射角が40~50度の場合に、光反射率が大きかった。
実施例1~7を比較すると、凸部のピッチ4と凸部3の高さを100~800nmにすることにより光反射率が上昇した。
実施例1と実施例8~11を比較すると、表面層1の厚さ23を適切な値にすることにより、光反射率が上昇した。
When Example 1 and Comparative Example 1 were compared, the light reflectance increased by 24 to 32% by forming the
Comparing Examples 1 to 7, the light reflectance was increased by setting the
When Example 1 was compared with Examples 8 to 11, the light reflectance was increased by setting the
本発明のフォトニック結晶は、光反射性の高い回折格子を提供する。本発明のフォトニック結晶は、レーザやセンサ等の発光デバイスや光導波路として、使用できる。本発明のフォトニック結晶を適用した光学式センサとして、例えばPOCT製品に適用した場合、光反射率や反射光強度が向上する。即ち、フォトニック結晶のみではPOCTに適用できるほどの光反射性を示さないが、フォトニック結晶の表面層の屈折率を高めることにより、光反射率や反射光強度が増加し、高光反射性を示す。例えば、光反射率を0.1から0.3に増加した場合、反射光の強度は3倍(=0.3/0.1)になるので、人の目で認識しやすくなり、視感度が向上する。例えば、光反射率が基材層単体の場合と比較して0.2以上大きいことにより、視感度が向上する。その結果、POCT製品の視認性向上へつながり、POCT製品の高感度化、低コスト化が見込まれる。
本発明は、グアニジン誘導体を使用するため、以下の利点を有する。本発明は、原料を低温で加熱するだけで、高屈折率を有する薄い表面層が容易に得られる。本発明は、真空蒸着法、電子ビーム蒸着法、スパッタ法等といった特別な条件を用いなくて良い。グアニジン誘導体は、炭素と窒素を骨格とした分子なので、表面層が軽量であり、フレキシブルである。本発明は、金属元素を用いないため、環境上安全である。
The photonic crystal of the present invention provides a diffraction grating with high light reflectivity. The photonic crystal of the present invention can be used as a light emitting device such as a laser or a sensor or an optical waveguide. As an optical sensor to which the photonic crystal of the present invention is applied, for example, when applied to a POCT product, the light reflectance and reflected light intensity are improved. That is, the photonic crystal alone does not exhibit light reflectivity that can be applied to POCT, but by increasing the refractive index of the surface layer of the photonic crystal, the light reflectivity and reflected light intensity are increased, and high light reflectivity is achieved. Show. For example, when the light reflectance is increased from 0.1 to 0.3, the intensity of the reflected light is tripled (= 0.3 / 0.1). Will improve. For example, when the light reflectance is larger by 0.2 or more than that of the base material layer alone, the visibility is improved. As a result, the visibility of the POCT product is improved, and high sensitivity and low cost of the POCT product are expected.
Since the present invention uses a guanidine derivative, it has the following advantages. In the present invention, a thin surface layer having a high refractive index can be easily obtained simply by heating the raw material at a low temperature. The present invention does not require special conditions such as vacuum deposition, electron beam deposition, and sputtering. A guanidine derivative is a molecule having carbon and nitrogen as a skeleton, so the surface layer is lightweight and flexible. The present invention is environmentally safe because no metal element is used.
1 表面層
2 基材層
3 凸部
4 凸部のピッチ
5 凸部の高さ
6 表面層を有するフォトニック結晶
6a 表面層を有しないフォトニック結晶
7 粘接着剤層
8 表面層形成セット
9 ボート
10 グアニジン誘導体
11 光源
12 受光部
13 試料部
14 入射光
15 入射角
16 反射光
17 反射角
21 厚さ
22 凸部の幅
23 表面層の厚さ
DESCRIPTION OF
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| JP2019501413A JPWO2018155556A1 (en) | 2017-02-23 | 2018-02-22 | Photonic crystal |
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| JP2017031790 | 2017-02-23 | ||
| JP2017-031790 | 2017-02-23 |
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| WO2022202033A1 (en) * | 2021-03-24 | 2022-09-29 | ナルックス株式会社 | Glass diffraction grating and method for producing same |
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| JP2009520947A (en) * | 2005-07-08 | 2009-05-28 | エス アール ユー バイオシステムズ,インコーポレイテッド | Structure and manufacturing method of photonic crystal biosensor |
| US20130157882A1 (en) * | 2010-04-20 | 2013-06-20 | President And Fellows Of Harvard College | Biomedical and Chemical Sensing with Nanobeam Photonic Crystal Cavities Using Optical Bistability |
| JP2017215387A (en) * | 2016-05-30 | 2017-12-07 | 国立研究開発法人理化学研究所 | Optical element and light emitting element including the optical element |
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- 2018-02-22 WO PCT/JP2018/006465 patent/WO2018155556A1/en not_active Ceased
- 2018-02-22 JP JP2019501413A patent/JPWO2018155556A1/en active Pending
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| JP2000204301A (en) * | 1999-01-14 | 2000-07-25 | Catalysts & Chem Ind Co Ltd | Coating solution for forming film and lens made of synthetic resin |
| JP2000281970A (en) * | 1999-03-29 | 2000-10-10 | Asahi Optical Co Ltd | Weather resistant hard coat composition |
| JP2009520947A (en) * | 2005-07-08 | 2009-05-28 | エス アール ユー バイオシステムズ,インコーポレイテッド | Structure and manufacturing method of photonic crystal biosensor |
| US20130157882A1 (en) * | 2010-04-20 | 2013-06-20 | President And Fellows Of Harvard College | Biomedical and Chemical Sensing with Nanobeam Photonic Crystal Cavities Using Optical Bistability |
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| WO2022202033A1 (en) * | 2021-03-24 | 2022-09-29 | ナルックス株式会社 | Glass diffraction grating and method for producing same |
| JP7171007B1 (en) * | 2021-03-24 | 2022-11-15 | ナルックス株式会社 | Glass diffraction grating and its manufacturing method |
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| JPWO2018155556A1 (en) | 2019-12-12 |
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