WO2018030232A1 - 硬化性樹脂組成物及び有機エレクトロルミネッセンス表示素子用封止剤 - Google Patents
硬化性樹脂組成物及び有機エレクトロルミネッセンス表示素子用封止剤 Download PDFInfo
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- WO2018030232A1 WO2018030232A1 PCT/JP2017/028025 JP2017028025W WO2018030232A1 WO 2018030232 A1 WO2018030232 A1 WO 2018030232A1 JP 2017028025 W JP2017028025 W JP 2017028025W WO 2018030232 A1 WO2018030232 A1 WO 2018030232A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
- C09K3/1006—Materials in mouldable or extrudable form for sealing or packing joints or covers characterised by the chemical nature of one of its constituents
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/02—Details
- H05B33/04—Sealing arrangements, e.g. against humidity
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/844—Encapsulations
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/80—Constructional details
- H10K59/87—Passivation; Containers; Encapsulations
- H10K59/871—Self-supporting sealing arrangements
- H10K59/8722—Peripheral sealing arrangements, e.g. adhesives, sealants
Definitions
- the present invention relates to a curable resin composition that can suppress generation of outgas and is excellent in applicability. Moreover, this invention relates to the sealing agent for organic electroluminescent display elements which consists of this curable resin composition.
- organic thin film elements such as organic electroluminescence display elements (organic EL display elements) and organic thin film solar cell elements
- organic thin film element can be easily produced by vacuum deposition, solution coating, or the like, and thus has excellent productivity.
- the organic EL display element has a thin film structure in which an organic light emitting material layer is sandwiched between a pair of electrodes facing each other. When electrons are injected from one electrode into the organic light emitting material layer and holes are injected from the other electrode, electrons and holes are combined in the organic light emitting material layer to perform self-light emission. Compared with a liquid crystal display element or the like that requires a backlight, the visibility is better, the thickness can be reduced, and direct current low voltage driving is possible.
- organic EL display element has a problem that when the organic light emitting material layer and the electrode are exposed to the outside air, the light emission characteristics thereof are rapidly deteriorated and the life is shortened. Therefore, in the organic EL display element, for the purpose of enhancing stability and durability, a sealing technique for shielding the organic light emitting material layer and the electrode from moisture and oxygen in the atmosphere is indispensable.
- Patent Document 1 discloses a method of filling a photocurable adhesive between organic EL display element substrates in a top emission organic EL display element or the like, and irradiating light to seal.
- a photocurable adhesive has a problem in that an outgas is generated at the time of light irradiation to deteriorate the element, or the coating property is inferior.
- An object of this invention is to provide the curable resin composition which can suppress generation
- the present invention is a curable resin composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein the cationically polymerizable compound is a compound represented by the following formula (1-1), -2) and at least one selected from the group consisting of compounds represented by the following formula (1-3).
- R 1 represents a bond, a linear or branched alkylene group having 1 to 18 carbon atoms, or a linear or branched alkenylene group having 2 to 18 carbon atoms.
- R 2 and R 3 are each independently hydrogen or a linear or branched alkyl group having 1 to 18 carbon atoms.
- R 4 is a linear or branched alkylene group having 3 to 18 carbon atoms, or a linear or branched alkenylene group having 3 to 18 carbon atoms
- R 5 and R 6 are each independently hydrogen or a linear or branched alkyl group having 1 to 18 carbon atoms.
- R 7 and R 8 are each independently a linear or branched alkylene group having 1 to 18 carbon atoms, or a linear or branched carbon number 2 to 18 is an alkenylene group, and each of R 9 to R 12 is independently hydrogen or a linear or branched alkyl group having 1 to 18 carbon atoms.
- the present invention is described in detail below.
- the present inventor has found that by using a specific cationically polymerizable compound, generation of outgas can be suppressed and a curable resin composition having excellent coatability can be obtained, and the present invention has been completed. It was.
- the curable resin composition of the present invention contains a cationic polymerizable compound.
- the cationic polymerizable compound is a group consisting of a compound represented by the formula (1-1), a compound represented by the formula (1-2), and a compound represented by the formula (1-3). It contains at least one selected from the following (hereinafter also referred to as “the epoxy compound according to the present invention”).
- the epoxy compound according to the present invention contains at least one selected from the following (hereinafter also referred to as “the epoxy compound according to the present invention”).
- the curable resin composition of this invention can suppress generation
- the obtained curable resin composition is excellent in the softness
- R 1 in the above formula (1-1), R 4 in the above formula (1-2), and R 7 and R 8 in the above formula (1-3) are compatible with other components.
- a linear or branched alkylene group having 1 to 18 carbon atoms is preferable, and a linear or branched alkylene group having 3 to 12 carbon atoms is preferable. More preferred.
- Examples of the compound represented by the formula (1-1) include 1,3-butadiene diepoxide, 1,5-hexadiene diepoxide, 1,7-octadiene diepoxide, and 1,9-decadiene diepoxide. 1,11-dodecadiene diepoxide and the like.
- Examples of the compound represented by the formula (1-2) include 1,2-epoxycyclopentane, 1,2-epoxycyclohexane, 1,2-epoxycycloheptane, 1,2-epoxycyclooctane, 1, Examples include 2-epoxycyclodecane, 1,2-epoxycyclododecane, 1-methyl-1,2-epoxycyclopentane, and 5,6-epoxy-1-cyclooctene.
- Examples of the compound represented by the above formula (1-3) include 1,2,5,6-diepoxycyclooctane.
- the reagent etc. by Tokyo Chemical Industry Co., Ltd. are mentioned, for example.
- the cationically polymerizable compound contains the compound represented by the above formula (1-1) because the resulting curable resin composition is particularly excellent in curability and flexibility after curing.
- it contains 1,7-octadiene diepoxide, and more preferably.
- the curable resin composition of the present invention may contain other cationically polymerizable compounds as long as the object of the present invention is not impaired.
- the other cationically polymerizable compounds include compounds having two or more cycloalkene oxide groups in one molecule, other epoxy compounds such as bisphenol A type epoxy resin and bisphenol F type epoxy resin, oxetane compounds, Examples include vinyl ether compounds.
- a compound having two or more cycloalkene oxide groups in one molecule is preferable, and two or more cyclohexene oxide groups are contained in one molecule. Compounds are more preferred.
- Examples of the compound having two or more cyclohexene oxide groups in one molecule include 3 ', 4'-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate.
- the preferred lower limit of the content of the epoxy compound according to the present invention in 100 parts by weight of the whole cationic polymerizable compound is 10 parts by weight, and the preferred upper limit is 90 parts by weight.
- the content of the epoxy compound according to the present invention is within this range, the resulting curable resin composition is more excellent in applicability, the effect of suppressing outgassing, and flexibility.
- the more preferable lower limit of the content of the epoxy compound according to the present invention is 20 parts by weight, the more preferable upper limit is 80 parts by weight, and the still more preferable upper limit is 50 parts by weight.
- the curable resin composition of the present invention contains a cationic polymerization initiator.
- the cationic polymerization initiator include a thermal cationic polymerization initiator that generates a protonic acid or a Lewis acid by heating, and a photocationic polymerization initiator that generates a protonic acid or a Lewis acid by light irradiation. It may be a nonionic acid generation type.
- thermal cationic polymerization initiator examples include BF 4 ⁇ , PF 6 ⁇ , SbF 6 ⁇ , or (BX 4 ) ⁇ (where X is phenyl substituted with at least two fluorine or trifluoromethyl groups.
- a sulfonium salt, a phosphonium salt, a quaternary ammonium salt, a diazonium salt, or an iodonium salt, and a sulfonium salt is more preferable.
- sulfonium salts include triphenylsulfonium boron tetrafluoride, triphenylsulfonium hexafluoride antimony, triphenylsulfonium hexafluoride arsenic, tri (4-methoxyphenyl) sulfonium hexafluoride arsenic, and diphenyl (4-phenylthiophenyl). ) Sulfonium arsenic hexafluoride and the like.
- the phosphonium salt include ethyltriphenylphosphonium antimony hexafluoride and tetrabutylphosphonium antimony hexafluoride.
- Examples of the quaternary ammonium salt include dimethylphenyl (4-methoxybenzyl) ammonium hexafluorophosphate, dimethylphenyl (4-methoxybenzyl) ammonium hexafluoroantimonate, dimethylphenyl (4-methoxybenzyl) ammonium tetrakis (penta).
- Fluorophenyl) borate dimethylphenyl (4-methylbenzyl) ammonium hexafluorophosphate, dimethylphenyl (4-methylbenzyl) ammonium hexafluoroantimonate, dimethylphenyl (4-methylbenzyl) ammonium hexafluorotetrakis (pentafluorophenyl) borate , Methylphenyldibenzylammonium, methylphenyldibenzylammonium hexafluoroantimony Hexafluorophosphate, methylphenyldibenzylammonium tetrakis (pentafluorophenyl) borate, phenyltribenzylammonium tetrakis (pentafluorophenyl) borate, dimethylphenyl (3,4-dimethylbenzyl) ammonium tetrakis (pentafluorophenyl) borate, N, N-
- thermal cationic polymerization initiators include, for example, Sun-Aid SI-60, Sun-Aid SI-80, Sun-Aid SI-B3, Sun-Aid SI-B3A, Sun-Aid SI-B4 (all of which are Sanshin Chemical Industry Co., Ltd.). CXC-1612, CXC-1738, CXC-1821 (all manufactured by King Industries), and the like.
- ionic photoacid generating types include, for example, that the anion moiety is BF 4 ⁇ , PF 6 ⁇ , SbF 6 ⁇ , or (BX 4 ) ⁇ (where X is at least An aromatic sulfonium salt, an aromatic iodonium salt, an aromatic diazonium salt, an aromatic ammonium salt, or (2,4, which represents a phenyl group substituted with two or more fluorine or trifluoromethyl groups) -Cyclopentadien-1-yl) ((1-methylethyl) benzene) -Fe salt and the like.
- aromatic sulfonium salt examples include bis (4- (diphenylsulfonio) phenyl) sulfide bishexafluorophosphate, bis (4- (diphenylsulfonio) phenyl) sulfide bishexafluoroantimonate, and bis (4- ( Diphenylsulfonio) phenyl) sulfide bistetrafluoroborate, bis (4- (diphenylsulfonio) phenyl) sulfide tetrakis (pentafluorophenyl) borate, diphenyl-4- (phenylthio) phenylsulfonium hexafluorophosphate, diphenyl-4- ( Phenylthio) phenylsulfonium hexafluoroantimonate, diphenyl-4- (phenylthio) phenylsulfonium tetraflu
- aromatic iodonium salt examples include diphenyliodonium hexafluorophosphate, diphenyliodonium hexafluoroantimonate, diphenyliodonium tetrafluoroborate, diphenyliodonium tetrakis (pentafluorophenyl) borate, bis (dodecylphenyl) iodonium hexafluorophosphate, bis (Dodecylphenyl) iodonium hexafluoroantimonate, bis (dodecylphenyl) iodonium tetrafluoroborate, bis (dodecylphenyl) iodonium tetrakis (pentafluorophenyl) borate, 4-methylphenyl-4- (1-methylethyl) phenyliodonium hexa Fluorophosphate, 4-methylphenyl-4- (1-methylethy
- aromatic diazonium salt examples include phenyldiazonium hexafluorophosphate, phenyldiazonium hexafluoroantimonate, phenyldiazonium tetrafluoroborate, and phenyldiazonium tetrakis (pentafluorophenyl) borate.
- aromatic ammonium salt examples include 1-benzyl-2-cyanopyridinium hexafluorophosphate, 1-benzyl-2-cyanopyridinium hexafluoroantimonate, 1-benzyl-2-cyanopyridinium tetrafluoroborate, 1-benzyl -2-Cyanopyridinium tetrakis (pentafluorophenyl) borate, 1- (naphthylmethyl) -2-cyanopyridinium hexafluorophosphate, 1- (naphthylmethyl) -2-cyanopyridinium hexafluoroantimonate, 1- (naphthylmethyl)
- Examples include -2-cyanopyridinium tetrafluoroborate and 1- (naphthylmethyl) -2-cyanopyridinium tetrakis (pentafluorophenyl) borate.
- Examples of the (2,4-cyclopentadien-1-yl) ((1-methylethyl) benzene) -Fe salt include (2,4-cyclopentadien-1-yl) ((1-methylethyl) benzene.
- nonionic photoacid generators include, for example, nitrobenzyl esters, sulfonic acid derivatives, phosphoric acid esters, phenolsulfonic acid esters, diazonaphthoquinone, N-hydroxyimide sulfonates, and the like. Can be mentioned.
- photocationic polymerization initiators examples include, for example, DTS-200 (manufactured by Midori Chemical Co., Ltd.), UVI6990, UVI6974 (all manufactured by Union Carbide), SP-150, SP-170 (all ADEKA), FC-508, FC-512 (all from 3M), IRGACURE290 (from BASF), PI 2074 (from Rhodia), and the like.
- the content of the cationic polymerization initiator is preferably 0.01 parts by weight and preferably 10 parts by weight with respect to 100 parts by weight of the cationic polymerizable compound.
- the content of the cationic polymerization initiator is 0.01 parts by weight or more, the resulting curable resin composition is more excellent in curability.
- the content of the cationic polymerization initiator is 10 parts by weight or less, the curing reaction of the resulting curable resin composition does not become too fast, the workability is improved, and the cured product is made more uniform. be able to.
- the minimum with more preferable content of the said cationic polymerization initiator is 0.05 weight part, and a more preferable upper limit is 5 weight part.
- the curable resin composition of the present invention may contain a sensitizer.
- the sensitizer has a role of further improving the polymerization initiation efficiency of the cationic polymerization initiator and further promoting the curing reaction of the curable resin composition of the present invention.
- the sensitizer examples include anthracene compounds such as 9,10-dibutoxyanthracene, thioxanthone compounds such as 2,4-diethylthioxanthone, 2,2-dimethoxy-1,2-diphenylethane-1, and the like.
- anthracene compounds such as 9,10-dibutoxyanthracene
- thioxanthone compounds such as 2,4-diethylthioxanthone, 2,2-dimethoxy-1,2-diphenylethane-1, and the like.
- -One benzophenone, 2,4-dichlorobenzophenone, methyl o-benzoylbenzoate, 4,4'-bis (dimethylamino) benzophenone, 4-benzoyl-4'methyldiphenyl sulfide, and the like.
- the content of the sensitizer is preferably 0.05 parts by weight and preferably 3 parts by weight with respect to 100 parts by weight of the cationic polymerizable compound.
- the sensitizing effect is more exhibited.
- the content of the sensitizer is 3 parts by weight or less, light can be transmitted to a deep part without excessive absorption.
- the minimum with more preferable content of the said sensitizer is 0.1 weight part, and a more preferable upper limit is 1 weight part.
- the curable resin composition of the present invention may contain a thermosetting agent.
- thermosetting agent include hydrazide compounds, imidazole derivatives, acid anhydrides, dicyandiamides, guanidine derivatives, modified aliphatic polyamines, addition products of various amines and epoxy resins, and the like.
- hydrazide compound examples include 1,3-bis (hydrazinocarbonoethyl-5-isopropylhydantoin), sebacic acid dihydrazide, isophthalic acid dihydrazide, adipic acid dihydrazide, malonic acid dihydrazide, and the like.
- imidazole derivatives examples include 1-cyanoethyl-2-phenylimidazole, N- (2- (2-methyl-1-imidazolyl) ethyl) urea, 2,4-diamino-6- (2′-methylimidazolyl- (1 ′))-ethyl-s-triazine, N, N′-bis (2-methyl-1-imidazolylethyl) urea, N, N ′-(2-methyl-1-imidazolylethyl) -adipamide, 2- Examples include phenyl-4-methyl-5-hydroxymethylimidazole and 2-phenyl-4,5-dihydroxymethylimidazole.
- acid anhydride examples include tetrahydrophthalic anhydride, ethylene glycol bis (anhydrotrimellitate), and the like. These thermosetting agents may be used independently and 2 or more types may be used together.
- thermosetting agents examples include SDH (manufactured by Nippon Finechem Co., Ltd.), ADH (manufactured by Otsuka Chemical Co., Ltd.), Amicure VDH, Amicure VDH-J, Amicure UDH (all manufactured by Ajinomoto Fine Techno Co., Ltd.). ) And the like.
- the content of the thermosetting agent is preferably 0.5 parts by weight and preferably 30 parts by weight with respect to 100 parts by weight of the cationic polymerizable compound.
- the content of the thermosetting agent is 0.5 parts by weight or more, the resulting curable resin composition is more excellent in thermosetting.
- the content of the thermosetting agent is 30 parts by weight or less, the obtained curable resin composition is excellent in storage stability, and the cured product is excellent in moisture resistance.
- the minimum with more preferable content of the said thermosetting agent is 1 weight part, and a more preferable upper limit is 15 weight part.
- the curable resin composition of the present invention may contain a stabilizer for the purpose of improving storage stability.
- a stabilizer include amine compounds such as benzylamine and aminophenol type epoxy resins.
- the content of the stabilizer is preferably 0.001 part by weight and preferably 2 parts by weight with respect to 100 parts by weight of the cationic polymerizable compound.
- the minimum with more preferable content of the said stabilizer is 0.05 weight part, and a more preferable upper limit is 1 weight part.
- the curable resin composition of the present invention may contain a silane coupling agent.
- the said silane coupling agent has a role which improves the adhesiveness of curable resin composition of this invention, a board
- silane coupling agent examples include 3-aminopropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-isocyanatopropyltrimethoxysilane, and the like. These silane coupling agents may be used independently and 2 or more types may be used together.
- the content of the silane coupling agent is preferably 0.1 parts by weight and preferably 10 parts by weight with respect to 100 parts by weight of the cationic polymerizable compound.
- the minimum with more preferable content of the said silane coupling agent is 0.5 weight part, and a more preferable upper limit is 5 weight part.
- the curable resin composition of the present invention may contain a surface modifier as long as the object of the present invention is not impaired.
- a surface modifier By containing the surface modifier, the flatness of the coating film of the curable resin composition of the present invention can be improved.
- the surface modifier include surfactants and leveling agents.
- Examples of the surface modifier include silicone-based, acrylic-based, and fluorine-based ones.
- Examples of commercially available surface modifiers include BYK-300, BYK-302, BYK-331 (all manufactured by Big Chemie Japan), UVX-272 (manufactured by Enomoto Kasei), Surflon. S-611 (manufactured by AGC Seimi Chemical Co., Ltd.) and the like.
- the curable resin composition of the present invention is a compound or ion exchange resin that reacts with an acid generated in the curable resin composition in order to improve the durability of the element electrode within a range that does not impair the object of the present invention. You may contain.
- Examples of the compound that reacts with the generated acid include substances that neutralize the acid, for example, alkali metal carbonates or bicarbonates, or alkaline earth metal carbonates or bicarbonates.
- alkali metal carbonates or bicarbonates or alkaline earth metal carbonates or bicarbonates.
- calcium carbonate, calcium hydrogen carbonate, sodium carbonate, sodium hydrogen carbonate and the like are used.
- any of a cation exchange type, an anion exchange type, and a both ion exchange type can be used, and in particular, a cation exchange type or a both ion exchange type capable of adsorbing chloride ions. Is preferred.
- the encapsulant for organic EL display elements of the present invention preferably does not contain a solvent because the remaining solvent may cause problems such as deterioration of the organic light emitting material layer or generation of outgas.
- a solvent for the purpose of viscosity adjustment etc. it is preferable that content of a solvent is 1 weight% or less, and it is more preferable that it is 0.1 weight% or less.
- the curable resin composition of the present invention is a curing retarder, a reinforcing agent, a softening agent, a plasticizer, a viscosity modifier, an ultraviolet absorber, and an antioxidant as necessary, as long as the object of the present invention is not impaired.
- You may contain well-known various additives, such as an agent and a desiccant.
- Examples of the method for producing the curable resin composition of the present invention include a cationic polymerizable compound and a cation using a mixer such as a homodisper, a homomixer, a universal mixer, a planetary mixer, a kneader, or a three roll. Examples thereof include a method of mixing a polymerization initiator and an additive such as a silane coupling agent added as necessary.
- the curable resin composition of the present invention has an overall viscosity lower limit of 5 mPa ⁇ s and an upper limit of 200 mPa ⁇ s measured using an E-type viscometer at 25 ° C. and 50 rpm. When the viscosity is within this range, the resulting curable resin composition is more excellent in ink jet coating properties and more suitable as an in-plane sealant for organic EL display elements.
- a more preferable lower limit of the viscosity is 8 mPa ⁇ s, and a more preferable upper limit is 30 mPa ⁇ s.
- the curable resin composition of the present invention is suitably used for sealing, adhesion, coating and the like of electronic devices, and more suitably used as a sealing agent for electronic devices. Especially, it uses especially suitably as a sealing agent for organic EL display elements.
- the sealing agent for organic EL display elements which consists of curable resin composition of this invention is also one of this invention.
- the sealing compound for organic electroluminescent display elements which consists of this curable resin composition can be provided.
- Examples 1 to 9, Comparative Examples 1 to 5 According to the blending ratios described in Tables 1 and 2, each material was stirred and mixed uniformly at a stirring speed of 3000 rpm using a homodisper type stirring mixer (Primix Co., Ltd., “Homodisper L type”). Curable resin compositions of Examples 1 to 9 and Comparative Examples 1 to 5 were prepared.
- Epoxy group reaction rate (%) 100 ⁇ (heat generation amount before curing ⁇ heat generation amount after curing) / heat generation amount before curing “ ⁇ ”, 90% when the reaction rate of the epoxy group is 95% or more
- the curability was evaluated as “ ⁇ ” when it was less than 95%, “ ⁇ ” when it was 70% or more and less than 90%, and “x” when it was less than 70%.
- the “heat generation amount before curing” means the heat generation amount when the unreacted curable resin composition is reacted by heating at a high temperature and completely cured, and the “heat generation amount after curing” It means the calorific value due to the reaction of the residual functional group of the curable resin composition after it has been made.
- this substrate is fixed to the substrate folder of the vacuum deposition apparatus, and 200 mg of N, N′-di (1-naphthyl) -N, N′-diphenylbenzidine ( ⁇ -NPD) is put into an unglazed crucible and other different types.
- 200 mg of tris (8-quinolinolato) aluminum (Alq 3 ) was put in an unglazed crucible, and the inside of the vacuum chamber was depressurized to 1 ⁇ 10 ⁇ 4 Pa. Thereafter, the crucible containing ⁇ -NPD was heated, and ⁇ -NPD was deposited on the substrate at a deposition rate of 15 s / s to form a 600 ⁇ ⁇ hole transport layer.
- the crucible containing Alq 3 was heated to form an organic light emitting material layer having a thickness of 600 ⁇ at a deposition rate of 15 ⁇ / s. Thereafter, the substrate on which the hole transport layer and the organic light emitting material layer are formed is transferred to another vacuum vapor deposition apparatus, and 200 mg of lithium fluoride is added to a tungsten resistance heating boat in the vacuum vapor deposition apparatus, and aluminum is added to another tungsten boat. 1.0 g of wire was added.
- the inside of the vapor deposition unit of the vacuum vapor deposition apparatus is depressurized to 2 ⁇ 10 ⁇ 4 Pa to form a lithium fluoride film with a thickness of 5 mm at a deposition rate of 0.2 kg / s, and then aluminum with a film thickness of 1000 mm at a rate of 20 kg / s. did.
- the inside of the vapor deposition unit was returned to normal pressure with nitrogen, and the substrate on which the laminate having the organic light emitting material layer was arranged was taken out.
- a mask having an opening was placed so as to cover the entire laminated body of the substrate on which the obtained laminated body was arranged, and an inorganic material film A was formed by a plasma CVD method.
- SiH 4 gas and nitrogen gas are used as source gases, the flow rates of each are SiH 4 gas 10 sccm, nitrogen gas 200 sccm, RF power 10 W (frequency 2.45 GHz), chamber temperature 100 ° C., chamber The test was performed under the condition that the internal pressure was 0.9 Torr.
- the formed inorganic material film A had a thickness of about 1 ⁇ m.
- an inorganic material film B was formed by a plasma CVD method to obtain an organic EL display element.
- SiH 4 gas and nitrogen gas are used as source gases, the flow rates of each are SiH 4 gas 10 sccm, nitrogen gas 200 sccm, RF power 10 W (frequency 2.45 GHz), chamber temperature 100 ° C., chamber The test was performed under the condition that the internal pressure was 0.9 Torr.
- the formed inorganic material film B had a thickness of about 1 ⁇ m.
- the obtained organic EL display device was exposed for 100 hours under the conditions of a temperature of 85 ° C. and a humidity of 85%, and then a voltage of 10 V was applied, and the light emission state of the device (the presence or absence of light emission and dark spots) was visually observed. . Evaluation was made as “ ⁇ ” when there was no dark spot or peripheral quenching, and “ ⁇ ” when the dark spot or peripheral quenching was observed, and “X” when the non-light emitting part was significantly enlarged.
- the sealing compound for organic electroluminescent display elements which consists of this curable resin composition can be provided.
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Abstract
Description
以下に本発明を詳述する。
上記カチオン重合性化合物は、上記式(1-1)で表される化合物、上記式(1-2)で表される化合物、及び、上記式(1-3)で表される化合物からなる群より選択される少なくとも1種(以下、「本発明にかかるエポキシ化合物」ともいう)を含有する。本発明にかかるエポキシ化合物を含有することにより、本発明の硬化性樹脂組成物は、アウトガスの発生を抑制することができ、塗布性に優れるものとなる。また、本発明にかかるエポキシ化合物を含有することにより、得られる硬化性樹脂組成物が硬化後の柔軟性に優れ、フレキシブルな電子デバイスにも対応するものとなる。
上記式(1-2)で表される化合物としては、例えば、1,2-エポキシシクロペンタン、1,2-エポキシシクロヘキサン、1,2-エポキシシクロヘプタン、1,2-エポキシシクロオクタン、1,2-エポキシシクロデカン、1,2-エポキシシクロドデカン、1-メチル-1,2-エポキシシクロペンタン、5,6-エポキシ-1-シクロオクテン等が挙げられる。
上記式(1-3)で表される化合物としては、例えば、1,2,5,6-ジエポキシシクロオクタン等が挙げられる。
本発明にかかるエポキシ化合物のうち市販されているものとしては、例えば、東京化成工業社製の試薬等が挙げられる。
なかでも、上記カチオン重合性化合物は、得られる硬化性樹脂組成物が硬化性及び硬化後の柔軟性に特に優れるものとなることから、上記式(1-1)で表される化合物を含有することが好ましく、1,7-オクタジエンジエポキシドを含有することがより好ましい。
上記その他のカチオン重合性化合物としては、例えば、1分子中にシクロアルケンオキサイド基を2個以上有する化合物、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等のその他のエポキシ化合物や、オキセタン化合物や、ビニルエーテル化合物等が挙げられる。なかでも、得られる硬化性樹脂組成物が硬化性により優れるものとなることから、1分子中にシクロアルケンオキサイド基を2個以上有する化合物が好ましく、1分子中にシクロヘキセンオキサイド基を2個以上有する化合物がより好ましい。
上記カチオン重合開始剤としては、加熱によりプロトン酸又はルイス酸を発生する熱カチオン重合開始剤や、光照射によりプロトン酸又はルイス酸を発生する光カチオン重合開始剤が挙げられ、イオン性酸発生型であってもよいし、非イオン性酸発生型であってもよい。
上記ホスホニウム塩としては、エチルトリフェニルホスホニウム六フッ化アンチモン、テトラブチルホスホニウム六フッ化アンチモン等が挙げられる。
上記第4級アンモニウム塩としては、例えば、ジメチルフェニル(4-メトキシベンジル)アンモニウムヘキサフルオロホスフェート、ジメチルフェニル(4-メトキシベンジル)アンモニウムヘキサフルオロアンチモネート、ジメチルフェニル(4-メトキシベンジル)アンモニウムテトラキス(ペンタフルオロフェニル)ボレート、ジメチルフェニル(4-メチルベンジル)アンモニウムヘキサフルオロホスフェート、ジメチルフェニル(4-メチルベンジル)アンモニウムヘキサフルオロアンチモネート、ジメチルフェニル(4-メチルベンジル)アンモニウムヘキサフルオロテトラキス(ペンタフルオロフェニル)ボレート、メチルフェニルジベンジルアンモニウム、メチルフェニルジベンジルアンモニウムヘキサフルオロアンチモネートヘキサフルオロホスフェート、メチルフェニルジベンジルアンモニウムテトラキス(ペンタフルオロフェニル)ボレート、フェニルトリベンジルアンモニウムテトラキス(ペンタフルオロフェニル)ボレート、ジメチルフェニル(3,4-ジメチルベンジル)アンモニウムテトラキス(ペンタフルオロフェニル)ボレート、N,N-ジメチル-N-ベンジルアニリニウム六フッ化アンチモン、N,N-ジエチル-N-ベンジルアニリニウム四フッ化ホウ素、N,N-ジメチル-N-ベンジルピリジニウム六フッ化アンチモン、N,N-ジエチル-N-ベンジルピリジニウムトリフルオロメタンスルホン酸等が挙げられる。
上記イミダゾール誘導体としては、例えば、1-シアノエチル-2-フェニルイミダゾール、N-(2-(2-メチル-1-イミダゾリル)エチル)尿素、2,4-ジアミノ-6-(2’-メチルイミダゾリル-(1’))-エチル-s-トリアジン、N,N’-ビス(2-メチル-1-イミダゾリルエチル)尿素、N,N’-(2-メチル-1-イミダゾリルエチル)-アジポアミド、2-フェニル-4-メチル-5-ヒドロキシメチルイミダゾール、2-フェニル-4,5-ジヒドロキシメチルイミダゾール等が挙げられる。
上記酸無水物としては、例えば、テトラヒドロ無水フタル酸、エチレングリコールビス(アンヒドロトリメリテート)等が挙げられる。
これらの熱硬化剤は、単独で用いられてもよいし、2種以上が併用されてもよい。
上記安定剤としては、例えば、ベンジルアミン等のアミン系化合物やアミノフェノール型エポキシ樹脂等が挙げられる。
上記表面改質剤としては、例えば、界面活性剤やレベリング剤等が挙げられる。
上記表面改質剤のうち市販されているものとしては、例えば、BYK-300、BYK-302、BYK-331(いずれも、ビックケミー・ジャパン社製)、UVX-272(楠本化成社製)、サーフロンS-611(AGCセイミケミカル社製)等が挙げられる。
なお、粘度調整等を目的として溶剤を用いる場合は、溶剤の含有量が1重量%以下であることが好ましく、0.1重量%以下であることがより好ましい。
本発明の硬化性樹脂組成物からなる有機EL表示素子用封止剤もまた、本発明の1つである。
表1、2に記載された配合比に従い、各材料を、ホモディスパー型撹拌混合機(プライミクス社製、「ホモディスパーL型」)を用い、撹拌速度3000rpmで均一に撹拌混合することにより、実施例1~9、比較例1~5の硬化性樹脂組成物を作製した。
実施例及び比較例で得られた各硬化性樹脂組成物について以下の評価を行った。結果を表1、2に示した。
実施例及び比較例で得られた各硬化性樹脂組成物について、E型粘度計(東機産業社製、「VISCOMETER TV-22」)を用いて、25℃、50rpmの条件における粘度を測定した。
ピペットを用いて実施例及び比較例で得られた各硬化性樹脂組成物0.1mLをガラス基板上に塗布し、1分後に広がった直径を測定した。直径が15mm以上だった場合を「◎」、12mm以上15mm未満であった場合を「○」、10mm以上12mm未満であった場合を「△」、10mm未満であった場合を「×」として、塗布性を評価した。
実施例及び比較例で得られた各硬化性樹脂組成物について、紫外線照射装置(クオークテクノロジー社製、「QEL-15SQ3W」)を用いて395nmの紫外線を1500mJ/cm2照射して硬化させた。硬化前後の発熱量をDSC装置(リガク社製、「Thermo Plus2/DSC8230」)を用いて測定し、エポキシ基の反応率を下記式から導出した。なお、実施例8で得られた硬化性樹脂組成物については、紫外線照射に代えて100℃で30分間加熱を行って硬化させた。
エポキシ基の反応率(%)=100×(硬化前の発熱量-硬化後の発熱量)/硬化前の発熱量
エポキシ基の反応率が95%以上であった場合を「◎」、90%以上95%未満であった場合を「○」、70%以上90%未満であった場合を「△」、70%未満であった場合を「×」として硬化性を評価した。
なお、上記「硬化前の発熱量」は、未反応の硬化性樹脂組成物を高温での加熱により反応させ完全硬化した場合の発熱量を意味し、上記「硬化後の発熱量」は、硬化させた後の硬化性樹脂組成物の残留官能基の反応による発熱量を意味する。
実施例及び比較例で得られた各硬化性樹脂組成物を、2枚のPET樹脂の間に100μmの厚みで挟み、硬化性樹脂組成物に紫外線照射装置(クオークテクノロジー社製、「QEL-15SQ3W」)を用いて395nmの紫外線を1500mJ/cm2照射して硬化し、厚み100μmの試験フィルムを作製した。なお、実施例8で得られた硬化性樹脂組成物については、紫外線照射に代えて100℃で30分間加熱を行って硬化させ、試験フィルムを作製した。
得られた試験フィルムを直径1cmの曲率に曲げた際、樹脂フィルムが割れなかった場合を「○」、樹脂フィルムが割れた場合を「×」として柔軟性を評価した。
実施例及び比較例で得られた各硬化性樹脂組成物を、バイアル瓶中に100mg計量して封入し、硬化性樹脂組成物に紫外線照射装置(クオークテクノロジー社製、「QEL-15SQ3W」)を用いて395nmの紫外線を1500mJ/cm2照射して硬化させた。更に、このバイアル瓶を85℃の恒温オーブンで100時間加熱し、バイアル瓶中の気化成分を、ガスクロマトグラフ質量分析計(日本電子社製、「JMS-Q1050」)を用いて測定した。なお、実施例8で得られた硬化性樹脂組成物については、紫外線照射に代えて100℃で30分間加熱を行って硬化させた。
気化成分量が50ppm未満であった場合を「○」、50ppm以上100ppm未満であった場合を「△」、100ppm以上であった場合を「×」として低アウトガス性を評価した。
(有機発光材料層を有する積層体が配置された基板の作製)
ガラス基板(長さ30mm、幅30mm、厚さ0.7mm)にITO電極を1000Åの厚さで成膜したものを基板とした。上記基板をアセトン、アルカリ水溶液、イオン交換水、イソプロピルアルコールにてそれぞれ15分間超音波洗浄した後、煮沸させたイソプロピルアルコールにて10分間洗浄し、更に、UV-オゾンクリーナ(日本レーザー電子社製、「NL-UV253」)にて直前処理を行った。
次に、この基板を真空蒸着装置の基板フォルダに固定し、素焼きの坩堝にN,N’-ジ(1-ナフチル)-N,N’-ジフェニルベンジジン(α-NPD)を200mg、他の異なる素焼き坩堝にトリス(8-キノリノラト)アルミニウム(Alq3)を200mg入れ、真空チャンバー内を、1×10-4Paまで減圧した。その後、α-NPDの入った坩堝を加熱し、α-NPDを蒸着速度15Å/sで基板に堆積させ、膜厚600Åの正孔輸送層を成膜した。次いで、Alq3の入った坩堝を加熱し、15Å/sの蒸着速度で膜厚600Åの有機発光材料層を成膜した。その後、正孔輸送層及び有機発光材料層が形成された基板を別の真空蒸着装置に移し、この真空蒸着装置内のタングステン製抵抗加熱ボートにフッ化リチウム200mgを、別のタングステン製ボートにアルミニウム線1.0gを入れた。その後、真空蒸着装置の蒸着器内を2×10-4Paまで減圧してフッ化リチウムを0.2Å/sの蒸着速度で5Å成膜した後、アルミニウムを20Å/sの速度で1000Å成膜した。窒素により蒸着器内を常圧に戻し、有機発光材料層を有する積層体が配置された基板を取り出した。
得られた積層体が配置された基板の、該積層体全体を覆うように、開口部を有するマスクを設置し、プラズマCVD法にて無機材料膜Aを形成した。
プラズマCVD法は、原料ガスとしてSiH4ガス及び窒素ガスを用い、各々の流量をSiH4ガス10sccm、窒素ガス200sccmとし、RFパワーを10W(周波数2.45GHz)、チャンバー内温度を100℃、チャンバー内圧力を0.9Torrとする条件で行った。
形成された無機材料膜Aの厚さは、約1μmであった。
実施例及び比較例で得られた各硬化性樹脂組成物を、インクジェット吐出装置(マイクロジェット社製、「ナノプリンター300」)を用いて、ガラス基板にインクジェット方式で80pLの吐出量で塗布した。塗布時には膜厚が20μm以下になるよう調整した。次いで、硬化性樹脂組成物に紫外線照射装置(クオークテクノロジー社製、「QEL-15SQ3W」)を用いて395nmの紫外線を1500mJ/cm2照射した後、80℃で30分加熱して硬化させ、樹脂保護膜を形成した。なお、実施例8で得られた硬化性樹脂組成物については、紫外線照射に代えて100℃で30分間加熱を行って硬化させた。
樹脂保護膜を形成した後、該樹脂保護膜の全体を覆うように、開口部を有するマスクを設置し、プラズマCVD法にて無機材料膜Bを形成して有機EL表示素子を得た。
プラズマCVD法は、原料ガスとしてSiH4ガス及び窒素ガスを用い、各々の流量をSiH4ガス10sccm、窒素ガス200sccmとし、RFパワーを10W(周波数2.45GHz)、チャンバー内温度を100℃、チャンバー内圧力を0.9Torrとする条件で行った。
形成された無機材料膜Bの厚さは、約1μmであった。
得られた有機EL表示素子を温度85℃、湿度85%の条件下にて100時間暴露した後、10Vの電圧を印加し、素子の発光状態(発光及びダークスポットの有無)を目視で観察した。ダークスポットや周辺消光が無く均一に発光した場合を「○」、ダークスポットや周辺消光が認められた場合を「△」、非発光部が著しく拡大した場合を「×」として評価した。
Claims (3)
- カチオン重合性化合物とカチオン重合開始剤とを含有する硬化性樹脂組成物であって、
前記カチオン重合性化合物は、下記式(1-1)で表される化合物、下記式(1-2)で表される化合物、及び、下記式(1-3)で表される化合物からなる群より選択される少なくとも1種を含有する
ことを特徴とする硬化性樹脂組成物。
式(1-1)中、R1は、結合手、直鎖状若しくは分岐鎖状の炭素数1~18のアルキレン基、又は、直鎖状若しくは分岐鎖状の炭素数2~18のアルケニレン基であり、R2及びR3は、それぞれ独立に、水素、又は、直鎖状若しくは分岐鎖状の炭素数1~18のアルキル基である。式(1-2)中、R4は、直鎖状若しくは分岐鎖状の炭素数3~18のアルキレン基、又は、直鎖状若しくは分岐鎖状の炭素数3~18のアルケニレン基であり、R5及びR6は、それぞれ独立に、水素、又は、直鎖状若しくは分岐鎖状の炭素数1~18のアルキル基である。式(1-3)中、R7及びR8は、それぞれ独立に、直鎖状若しくは分岐鎖状の炭素数1~18のアルキレン基、又は、直鎖状若しくは分岐鎖状の炭素数2~18のアルケニレン基であり、R9~R12は、それぞれ独立に、水素、又は、直鎖状若しくは分岐鎖状の炭素数1~18のアルキル基である。 - カチオン重合性化合物は、式(1-1)で表される化合物を含有することを特徴とする請求項1記載の硬化性樹脂組成物。
- 請求項1又は2記載の硬化性樹脂組成物からなることを特徴とする有機エレクトロルミネッセンス表示素子用封止剤。
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| WO2019188794A1 (ja) * | 2018-03-30 | 2019-10-03 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| WO2019198470A1 (ja) * | 2018-04-09 | 2019-10-17 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| WO2020110859A1 (ja) * | 2018-11-28 | 2020-06-04 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、及び、有機el表示素子 |
| JPWO2019203123A1 (ja) * | 2018-04-20 | 2021-03-18 | 積水化学工業株式会社 | 有機el表示素子用封止剤及びトップエミッション型有機el表示素子 |
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| JP6378450B2 (ja) * | 2016-09-16 | 2018-08-22 | 積水化学工業株式会社 | 有機エレクトロルミネッセンス表示素子用封止剤 |
| US12312323B2 (en) | 2019-12-11 | 2025-05-27 | Mitsubishi Gas Chemical Company, Inc. | Compound, method for producing same, resin composition, resin sheet, multilayer printed wiring board, and semiconductor device |
| JPWO2021131790A1 (ja) * | 2019-12-27 | 2021-07-01 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2019188794A1 (ja) * | 2018-03-30 | 2019-10-03 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| JPWO2019188794A1 (ja) * | 2018-03-30 | 2021-02-12 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| JP7397666B2 (ja) | 2018-03-30 | 2023-12-13 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| WO2019198470A1 (ja) * | 2018-04-09 | 2019-10-17 | 積水化学工業株式会社 | 有機el表示素子用封止剤 |
| CN112074957A (zh) * | 2018-04-09 | 2020-12-11 | 积水化学工业株式会社 | 有机el显示元件用密封剂 |
| JPWO2019203123A1 (ja) * | 2018-04-20 | 2021-03-18 | 積水化学工業株式会社 | 有機el表示素子用封止剤及びトップエミッション型有機el表示素子 |
| WO2020110859A1 (ja) * | 2018-11-28 | 2020-06-04 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、及び、有機el表示素子 |
| CN112955488A (zh) * | 2018-11-28 | 2021-06-11 | 积水化学工业株式会社 | 固化性树脂组合物、固化物及有机el显示元件 |
| JPWO2020110859A1 (ja) * | 2018-11-28 | 2021-10-07 | 積水化学工業株式会社 | 硬化性樹脂組成物、硬化物、及び、有機el表示素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2018030232A1 (ja) | 2019-06-06 |
| CN108699216B (zh) | 2022-03-18 |
| CN114716648A (zh) | 2022-07-08 |
| CN108699216A (zh) | 2018-10-23 |
| KR20190035599A (ko) | 2019-04-03 |
| CN114716648B (zh) | 2025-01-07 |
| KR102765320B1 (ko) | 2025-02-07 |
| KR102417305B1 (ko) | 2022-07-05 |
| JP7377295B2 (ja) | 2023-11-09 |
| KR20220100993A (ko) | 2022-07-18 |
| TW201816007A (zh) | 2018-05-01 |
| JP7025209B2 (ja) | 2022-02-24 |
| JP2022078065A (ja) | 2022-05-24 |
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