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WO2018066941A1 - Colorimetric photonic crystal structure and colorimetric photonic crystal sensor using same - Google Patents

Colorimetric photonic crystal structure and colorimetric photonic crystal sensor using same Download PDF

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Publication number
WO2018066941A1
WO2018066941A1 PCT/KR2017/011005 KR2017011005W WO2018066941A1 WO 2018066941 A1 WO2018066941 A1 WO 2018066941A1 KR 2017011005 W KR2017011005 W KR 2017011005W WO 2018066941 A1 WO2018066941 A1 WO 2018066941A1
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Prior art keywords
refractive index
photonic crystal
formula
crystal structure
index layer
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French (fr)
Korean (ko)
Inventor
정서현
박종목
공호열
정유진
이세영
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Korea Research Institute of Chemical Technology KRICT
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Korea Research Institute of Chemical Technology KRICT
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Priority claimed from KR1020160129148A external-priority patent/KR101803549B1/en
Priority claimed from KR1020160129149A external-priority patent/KR101803550B1/en
Application filed by Korea Research Institute of Chemical Technology KRICT filed Critical Korea Research Institute of Chemical Technology KRICT
Publication of WO2018066941A1 publication Critical patent/WO2018066941A1/en
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/08Mirrors
    • G02B5/0816Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0841Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising organic materials, e.g. polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F226/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F226/06Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/005Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/1225Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices

Definitions

  • the present invention relates to a color conversion photonic crystal structure sensitive to changes in humidity, and a color conversion photonic crystal sensor using the same.
  • the present invention relates to a method for producing a color conversion photonic crystal structure capable of converting a color represented by adjusting a reflection wavelength.
  • a photonic crystal is a structure in which dielectric materials having different refractive indices are arranged periodically, and overlapping interference occurs between light scattered at each regular lattice point, so that light is not transmitted through a specific wavelength range.
  • a material that reflects light that is, forms an optical band gap.
  • photonic crystals use photons instead of electrons as a means of information processing, and thus, the speed of information processing is excellent and is emerging as a key material for improving the efficiency of the information industry.
  • the photonic crystal can be implemented as a one-dimensional structure in which photons move in the principal axis direction, a two-dimensional structure in which the photons move along a plane, or a three-dimensional structure in which the photons move freely in all directions throughout the material. It is easy to control the optical characteristics and can be applied to various fields.
  • photonic crystals may be applied to optical devices such as photonic crystal fibers, light emitting devices, photovoltaic devices, photonic crystal sensors, semiconductor lasers, and the like.
  • the Bragg stack is a photonic crystal having a one-dimensional structure, and can be easily manufactured by only stacking two layers having different refractive indices, and controlling the optical properties by controlling the refractive index and thickness of the two layers is easy. There is this. Due to these features, the Bragg stack is widely used for applications as photonic crystal sensors that detect electrical, chemical, and thermal stimuli as well as energy devices such as solar cells. Accordingly, studies have been made on various materials and structures for easily manufacturing a photonic crystal sensor excellent in sensitivity and reproducibility.
  • the present inventors have made intensive efforts to use a copolymer including a repeating unit including quaternary ammonium ions in one repeated layer of the Bragg stack as described below.
  • the present invention has been completed by confirming that a color conversion photonic crystal structure sensitive to change and a photonic crystal sensor exhibiting excellent sensitivity can be easily manufactured.
  • the present invention is to provide a color conversion photonic crystal structure sensitive to changes in humidity.
  • the present invention is to provide a color conversion photonic crystal sensor comprising the photonic crystal structure.
  • the present invention is to provide a method of manufacturing a color conversion photonic crystal structure that can display a desired color by adjusting the reflection wavelength.
  • the present invention is to provide a color conversion photonic crystal structure prepared according to the above production method.
  • the present invention is a first refractive index layer comprising a first polymer exhibiting a first refractive index, alternately stacked; And a second refractive index layer comprising a second polymer exhibiting a second refractive index,
  • the first refractive index and the second refractive index are different.
  • One of the first polymer and the second polymer provides a color converting photonic crystal structure, which is a copolymer represented by Formula 1 below:
  • R 1 and R 2 are, each independently, hydrogen or C1-3 alkyl
  • - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX
  • R and R ' are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X ⁇ is 1 Is an anionic
  • L 1 is O or NH
  • Y 1 is benzoylphenyl
  • Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n1 and m1 are each independently an integer of 1 or more
  • n1 + m1 is 100-1,000.
  • the first refractive index layer comprises a first polymer exhibiting a first refractive index
  • the second refractive index layer comprises a second polymer exhibiting a second refractive index different from the first refractive index
  • One of the first polymer and the second polymer is a copolymer represented by the following formula (3),
  • R 5 and R 6 are each independently hydrogen or C 1-3 alkyl
  • X 11 to X 15 are each independently N or CR ′′, at least one of X 11 to X 15 is N,
  • R ′′ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,
  • L 3 is O or NH
  • Y 3 is benzoylphenyl
  • Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n3 and m3 are each independently an integer of 1 or more
  • n3 + m3 is 100 to 1,000
  • R is hydrogen, C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, C7-20 alkylaryl or C7-20 arylalkyl,
  • X is a leaving group
  • the present invention also provides a color conversion photonic crystal sensor comprising the photonic crystal structure.
  • the color conversion photonic crystal structure of the present invention is a high refractive index using a copolymer comprising a repeating unit derived from an acrylate or acrylamide monomer having a repeating unit containing a quaternary ammonium cation and a photoactive functional group. Including the layer, the color may be converted to be visually judged according to the change in humidity, and there is a characteristic that the photonic crystal sensor may be manufactured using the same.
  • a color conversion having a reflection wavelength to be implemented by adjusting the quaternization reaction conditions of nitrogen atoms present in the repeating unit of the copolymer included in one repeated layer There is a feature that a photonic crystal structure can be produced.
  • FIG. 1 schematically illustrates a structure of a color conversion photonic crystal structure according to an embodiment.
  • FIG. 2A shows the reflection wavelength and the color conversion photograph of the photonic crystal structures prepared in Examples 1-1 to 1-9.
  • 2B shows a specular reflection diagram of the photonic crystal structures prepared in Examples 1-1 to 1-9.
  • 3A shows reflection wavelengths and color conversion photographs of the photonic crystal structures prepared in Examples 2-1 to 2-9.
  • 3B shows the specular reflectance of the photonic crystal structures prepared in Examples 2-1 to 2-9.
  • 4A shows the reflection wavelengths and color conversion photographs of the photonic crystal structures prepared in Examples 3-1, 3-2, 4-1, 4-2, 5-1, and 5-2.
  • 4B shows the specular reflectance of the photonic crystal structures prepared in Examples 3-1, 4-1, and 5-1.
  • 4C shows the specular reflectance of the photonic crystal structure prepared in Examples 3-2, 4-2, and 5-2.
  • FIG. 5A shows the reflection wavelength and the color conversion photograph of the photonic crystal structures prepared in Examples 6-1 and 6-2.
  • 5B shows the specular reflectance of the photonic crystal structures prepared in Examples 6-1 and 6-2.
  • FIG. 6A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure prepared in Example 7 according to humidity change.
  • FIG. 6A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure prepared in Example 7 according to humidity change.
  • FIG. 6B shows a specular reflection diagram of the photonic crystal structure prepared in Example 7 according to humidity change.
  • FIG. 7A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure manufactured in Example 8 according to humidity change.
  • FIG. 7A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure manufactured in Example 8 according to humidity change.
  • FIG. 7B shows a specular reflection diagram of the photonic crystal structure prepared in Example 8 according to humidity change.
  • 8A shows the reflection wavelength measurement results of the photonic crystal structures prepared in Examples 9-1 to 9-5.
  • the term 'color conversion photonic crystal structure' used in the present invention is a Bragg stack having a one-dimensional photonic crystal structure manufactured by repeatedly stacking materials having different refractive indices, and having a specific wavelength due to a periodic difference in refractive index of the stacked structures.
  • the light may reflect light in an area, and the reflected wavelength refers to a structure shifted by an external stimulus to convert a reflected color.
  • partial reflection of light occurs at the boundary of each layer of the structure, and many of these reflected waves can structurally interfere to reflect light of a specific wavelength having high intensity.
  • the shift of the reflection wavelength due to the external stimulus occurs as the wavelength of the scattered light changes as the lattice structure of the material forming the layer is changed by the external stimulus.
  • Such a color conversion photonic crystal structure may be manufactured in the form of a coating film coated on a separate substrate or a substrate, or in the form of a free standing film, and includes an optical device such as a photonic crystal fiber, a light emitting device, a photovoltaic device, a photonic crystal sensor, a semiconductor laser, and the like. It can be applied to.
  • the color conversion photonic crystal structure may be used in biosensors such as optical sensors, glucose sensors, protein sensors, DNA sensors, disease diagnosis sensors, portable diagnostic sensors, and the like, such as environmental elements for chemical and species detection. The application is not limited.
  • the color conversion photonic crystal structure of the present invention the first refractive index layer comprising a first polymer exhibiting a first refractive index, alternately stacked; And a second refractive index layer comprising a second polymer exhibiting a second refractive index, wherein the first refractive index and the second refractive index are different.
  • the first refractive index layer may be a high refractive index layer
  • the second refractive index layer may be a low refractive index layer
  • the first refractive index layer may be a low refractive index layer
  • the second refractive index layer may be a high refractive index layer
  • the term 'high refractive index layer' used in the present invention means a layer having a relatively high refractive index among two kinds of layers included in the photonic crystal structure.
  • the polymer included in the high refractive index layer is a copolymer represented by the following formula (1):
  • R 1 and R 2 are each independently hydrogen or C 1-3 alkyl
  • - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX
  • R and R ' are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X ⁇ is 1 Is an anionic
  • L 1 is O or NH
  • Y 1 is benzoylphenyl
  • Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n1 and m1 are each independently an integer of 1 or more
  • n1 + m1 is 100-1,000.
  • the copolymer represented by Chemical Formula 1 includes a repeating unit containing quaternary ammonium ions
  • the polymer has a higher refractive index and hydrophilicity than the polymer containing no quaternary ammonium ions, thereby better responding to external stimuli such as moisture. can do.
  • the repeating unit including the quaternary ammonium ion has a counter ion (X ⁇ ) which is ion-bonded with the quaternary ammonium cation, and thus the refractive index of the high refractive index layer is changed according to the type of the counter ion. It is possible to produce a photonic crystal structure exhibiting color.
  • the refractive index may vary according to the number of quaternary ammonium ions and the type of the relative ions in the copolymer, a color conversion photonic crystal structure having a desired reflection wavelength may be implemented by adjusting the refractive index.
  • the copolymer represented by Chemical Formula 1 further includes repeating units derived from an acrylate or acrylamide-based monomer having a photoactive functional group (Y 1 ), so that photocuring itself is performed without a separate photoinitiator or crosslinker. It may be possible.
  • the copolymer represented by Chemical Formula 1 is a random copolymer of styrene monomer and an acrylate or acrylamide monomer having a photoactive functional group (Y 1 ), and the repeating units between the square brackets of Chemical Formula 1 are random from each other. It may be a random copolymer arranged so as to.
  • the copolymer represented by Formula 1 may be a block copolymer in which blocks of repeating units between square brackets of Formula 1 are connected by covalent bonds. Also, alternatively, it may be an alternating copolymer in which the repeating units between the brackets of Formula 1 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form. The form is not limited.
  • the copolymer represented by Formula 1 may exhibit a refractive index of 1.5 to 1.7.
  • a photonic crystal structure reflecting light of a desired wavelength may be implemented by a difference in refractive index with the polymer represented by Chemical Formula 1.
  • R 1 and R 2 may be each independently hydrogen or methyl.
  • R 1 and R 2 can be hydrogen.
  • X 1 is N + RX ⁇
  • X 2 to X 5 are each independently CR ′;
  • X 2 is N + RX ⁇ , and X 1 , X 3 to X 5 are each independently CR ′; or
  • X 3 is N + RX ⁇
  • X 1 , X 2 , X 4 and X 5 are each independently CR ′.
  • R is C 1-10 alkyl, C 6-10 aryl, or C 7-10 arylalkyl, and R ′ may be hydrogen or C 1-10 alkyl.
  • R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, Or phenylethyl and R 'may be hydrogen, methyl, ethyl, or phenyl.
  • X - is, for the anion of a monovalent (mono-valent), for example, X - is F -, Cl -, Br - , I -, ClO 4 -, SCN-, NO 3 -, or CH 3 CO 2 - it can be.
  • a halogen anion such as F ⁇ , Cl ⁇ , Br ⁇ , or I ⁇ is preferable in view of the ease of quaternization reaction described later.
  • Y 1 may be benzoylphenyl unsubstituted or substituted with C 1-3 alkyl.
  • Y 1 is benzoylphenyl, it may be advantageous in view of ease of photocuring.
  • n1 means the total number of repeating units including quaternary ammonium ions in the copolymer
  • m1 is a repeat derived from an acrylate or acrylamide monomer having a photoactive functional group in the copolymer Means the total number of units.
  • the copolymer represented by Formula 1 may have a molar ratio of n1: m1 of 100: 1 to 100: 20, for example, 100: 1 to 100: 10, and for example, 100: 5 to 100: 10. have.
  • the copolymer represented by Chemical Formula 1 may have a number average molecular weight (Mn) of 10,000 to 300,000 g / mol, for example, 30,000 to 180,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.
  • the copolymer represented by Chemical Formula 1 may be one of the copolymers represented by the following Chemical Formulas 1-1 to 1-3:
  • the high refractive index layer may further include a copolymer represented by the following formula (3):
  • R 5 and R 6 are each independently hydrogen or C 1-3 alkyl
  • X 11 to X 15 are each independently N or CR ′′, at least one of X 11 to X 15 is N,
  • R ′′ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,
  • L 3 is O or NH
  • Y 3 is benzoylphenyl
  • Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n3 and m3 are each independently an integer of 1 or more
  • n3 + m3 is 100-1,000.
  • the high refractive index layer further comprises a copolymer represented by Chemical Formula 3 in the copolymer represented by Chemical Formula 1, metal ions and complexes may be better formed.
  • the molar ratio of the copolymer represented by Chemical Formula 1 and the copolymer represented by Chemical Formula 3 in the high refractive index layer may be 100: 0 to 1:99.
  • the high refractive index layer includes the copolymer represented by the formula (1) and the copolymer represented by the formula (3) simultaneously, the copolymer represented by the formula (1) and the formula (3) in the high refractive index layer
  • the molar ratio of copolymer represented may be 90:10 to 10:90.
  • the copolymer represented by Chemical Formula 3 further includes repeating units derived from an acrylate or acrylamide-based monomer having a photoactive functional group (Y 3 ), so that photocuring by itself is performed without a separate photoinitiator or crosslinker. It may be possible.
  • the copolymer represented by Chemical Formula 3 is randomly copolymerized with styrene-based monomers and an acrylate or acrylamide-based monomer having a photoactive functional group (Y 3 ). It may be a random copolymer arranged so as to.
  • the copolymer represented by Formula 3 may be a block copolymer in which blocks of repeating units between the brackets of Formula 3 are connected by covalent bonds.
  • it may be an alternating copolymer in which the repeating units between the brackets of Formula 3 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form, but the arrangement of the repeating units The form is not limited.
  • the copolymer represented by Formula 3 may exhibit a refractive index of 1.5 to 1.7.
  • the refractive index of the copolymer represented by Formula 3 and the copolymer represented by Formula 1 may be different.
  • the copolymer represented by the formula (2) is present without reacting with the compound represented by the formula (4) in the quaternization reaction (Quarternization) of the method for producing a photonic crystal structure described later. That is, the copolymer represented by Formula 1 is prepared by the reaction of the copolymer represented by Formula 3 with the compound represented by Formula 4.
  • R is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,
  • X is a leaving group
  • the copolymer represented by Formula 1 is produced by quaternization reaction of the structure represented by the compound represented by Formula 4 by laminating a structure having a high refractive index layer containing the copolymer represented by Formula 3, the quaternization reaction
  • the copolymer represented by Chemical Formula 3, which does not participate in, may remain in the finally prepared photonic crystal structure. Therefore, the molar ratio of the copolymer represented by Chemical Formula 1 and the copolymer represented by Chemical Formula 3 in the high refractive index layer may be adjusted according to the quaternization reaction conditions.
  • R 5 and R 6 may be each independently hydrogen or methyl.
  • R 5 and R 6 can be hydrogen.
  • X 11 is N and X 12 to X 15 are each independently CR ′′;
  • X 12 is N and X 11 , X 13 to X 15 are each independently CR ′′; or
  • X 13 is N and X 11 , X 12 , X 14 and X 15 may each independently be CR ′′.
  • R ′′ may be hydrogen or C 1-10 alkyl.
  • R ′′ may be hydrogen, methyl, ethyl, or phenyl.
  • X 1 is N + RBr ⁇
  • X 11 is N
  • X 2 to X 5 and X 12 to X 15 are CH;
  • a 2 X N + RBr - a, and X 12 is N, X 1, X 3 to X 5, X 11 and X 13 to X 15 is CH; or
  • R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, or phenyl May be ethyl.
  • This is due to the copolymer represented by the formula (1) derived from the copolymer represented by the formula (3) as described above.
  • Y 3 may be unsubstituted or benzoylphenyl substituted with C 1-3 alkyl.
  • Y 3 is benzoylphenyl, it may be advantageous in view of the ease of photocuring.
  • n3 means the total number of repeating units including N-membered 6-membered heterocyclic group in the copolymer
  • m3 is from an acrylate or acrylamide monomer having a photoactive functional group in the copolymer The total number of derived repeating units.
  • the copolymer represented by Formula 3 may have a molar ratio of n3: m3 of 100: 1 to 100: 20, for example, 100: 1 to 100: 10, and for example, 100: 5 to 100: 10. have.
  • the copolymer represented by Chemical Formula 3 may have a number average molecular weight (Mn) of 10,000 to 300,000 g / mol, for example, 30,000 to 180,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.
  • the copolymer represented by Chemical Formula 3 may be one of the copolymers represented by the following Chemical Formulas 3-1 to 3-3:
  • n3 and m3 are as defined above.
  • the term 'low refractive index layer' used in the present invention means a layer having a relatively low refractive index among two kinds of layers included in the photonic crystal structure.
  • the polymer included in the low refractive index layer is not the copolymer represented by Chemical Formula 1, but is another of the first polymer and the second polymer, and includes a structural unit derived from the following monomer, It may exhibit low refractive index relative to the copolymers represented: fluoroalkyl acrylamides, fluoroalkyl acrylates and derivatives thereof. These can be applied individually or in mixture of 2 or more types.
  • copolymers by copolymerization of the fluoroalkyl acrylamide, fluoroalkyl acrylate and derivatives thereof with other monomers can also be used.
  • the other of the first polymer and the second polymer may be a copolymer represented by the following formula (2):
  • R 3 and R 4 are each independently hydrogen or C 1-3 alkyl
  • A is C 1-10 fluoroalkyl
  • L 2 is O or NH
  • Y 2 is benzoylphenyl
  • Y 2 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n2 and m2 are each independently an integer of 1 or more,
  • n2 + m2 is 100-1,000.
  • the copolymer represented by the formula (2) includes a repeating unit derived from a fluoroalkyl (A) acrylate monomer
  • the refractive index is lower than that of the polymer not containing the repeating unit, and the thermal stability, chemical resistance, and oxidation Excellent chemical properties such as stability and excellent transparency.
  • 'fluoroalkyl' refers to a functional group in which one or more fluorine atoms are substituted for the hydrogen atom of alkyl, wherein one or more fluorine atoms may be substituted for the hydrogen atom of the side chain as well as the terminal of C 1-10 alkyl, , Two or more fluorine atoms may be all bonded to one carbon atom, or each may be bonded to two or more carbon atoms.
  • the refractive index becomes lower and the hydrophobicity may increase, thereby controlling the difference in refractive index between the high refractive index layer and the low refractive index layer according to the number of fluorine atoms.
  • Color conversion photonic crystal structure having a reflection wavelength can be implemented.
  • the copolymer represented by Chemical Formula 2 may further include a repeating unit derived from an acrylate or acrylamide monomer having a photoactive functional group (Y 2 ), and may be photocurable by itself without a separate photoinitiator or crosslinking agent. .
  • the copolymer represented by Formula 2 is a square bracket of Formula 2 prepared by random copolymerization of a fluoroalkyl (A) acrylate monomer and an acrylate or acrylamide monomer having a photoactive functional group (Y 2 ). It may be a random copolymer in which repeating units in between are randomly arranged with each other.
  • the copolymer represented by Formula 2 may be a block copolymer in which blocks of repeating units between the brackets of Formula 2 are connected by covalent bonds.
  • it may be an alternating copolymer in which the repeating units between the brackets of Formula 2 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form, but the arrangement of the repeating units The form is not limited.
  • the copolymer represented by Formula 2 may exhibit a refractive index of 1.3 to 1.5.
  • a photonic crystal structure reflecting light of a desired wavelength may be implemented by a difference in refractive index with the copolymer represented by Chemical Formula 1 used in the above-described high refractive index layer.
  • R 3 and R 4 may be each independently hydrogen or methyl.
  • R 3 and R 4 can be hydrogen.
  • A may be C1-5 fluoroalkyl.
  • A is fluoromethyl, difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, 1,2-difluoroethyl, 2,2-difluoroethyl, 1,1,2-trifluoroethyl, 1,2,2-trifluoroethyl, 2,2,2-trifluoroethyl, 1-fluoropropyl, 2- Fluoropropyl, 1,1-difluoropropyl, 1,2-difluoropropyl, 2,2-difluoropropyl, 1,1,2-trifluoropropyl, 1,2,2-trifluoro Ropropyl, 2,2,2-trifluoropropyl, 1-fluorobutyl, 2-fluorobutyl, 1,1-difluorobutyl, 1,2-difluorobutyl, 2,2-difluoro Robutyl, 1,1,2-trifluoromethyl,
  • Y 2 may be unsubstituted or benzoylphenyl substituted with C 1-3 alkyl.
  • Y 2 is benzoylphenyl, it is advantageous in view of the ease of photocuring.
  • n2 means the total number of repeating units derived from the fluoroalkyl acrylate-based monomer in the copolymer
  • m2 is an acrylate or acryl having a photoactive functional group (Y 2 ) in the copolymer
  • Y 2 photoactive functional group
  • the copolymer represented by Formula 2 may have a molar ratio of n 2: m 2 of 100: 1 to 100: 10 and a number average molecular weight of 10,000 to 100,000 g / mol.
  • the copolymer represented by Formula 2 may have a molar ratio of n 2: m 2 of 100: 1 to 100: 5, specifically 100: 1 to 100: 2.
  • the copolymer represented by Chemical Formula 2 may have a number average molecular weight of 20,000 to 80,000 g / mol, specifically 20,000 to 60,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.
  • the copolymer represented by Chemical Formula 2 may be one of the copolymers represented by the following Chemical Formulas 2-1 to 2-3:
  • n2 and m2 are as defined above.
  • the color conversion photonic crystal structure according to the present invention includes a first refractive index layer disposed on a lowermost portion, a second refractive index layer disposed on the first refractive index layer, and a first refractive index layer and a second refractive index layer on the second refractive index layer. It is alternately repeated to have a stacked structure.
  • the color conversion photonic crystal structure may further include a substrate on the other surface of the first refractive index layer of the first refractive index layer disposed on the lowermost part according to the use. Therefore, in this case, the substrate may be positioned at the bottom of the color conversion photonic crystal structure.
  • a color conversion photonic crystal structure 10 may include a substrate 11 and a first refractive index layer 13 and a second refractive index layer 15 alternately stacked on the substrate 11. It is composed of
  • the first refractive index layer 13 may be positioned on the top of the color conversion photonic crystal structure. Accordingly, the first refractive index layer 13 is further laminated on the laminate in which the first refractive index layer 13 and the second refractive index layer 15 are alternately stacked, so that the photonic crystal structure includes an odd refractive index layer. Can have In this case, constructive interference between the lights reflected at the interface of each layer is increased, as described later, so that the intensity of the reflection wavelength of the photonic crystal structure can be increased.
  • the substrate 11 is a carbon-based material, metal foil, thin glass, silicon (Si), plastic, polyethylene (PE), polyethylene having excellent mechanical strength, thermal stability, transparency, surface smoothness, ease of handling and waterproofing It may be a polymer film such as terephthalate (PET), polypropylene (PP), paper, skin, clothing, or a wearable material, but is not limited thereto, and various materials that are flexible or not flexible depending on the intended application. Can be used.
  • a difference between the first refractive index n1 and the second refractive index n2 may be 0.01 to 0.5.
  • the difference between the first refractive index n1 and the second refractive index n2 may be 0.05 to 0.3, specifically 0.1 to 0.2.
  • the difference between the refractive indices increases, the optical band gap of the photonic crystal structure increases, so that the light having a desired wavelength may be reflected by adjusting the difference between the refractive indices within the above-described range.
  • the first refractive index n1 may be 1.5 to 1.7
  • the second refractive index n2 may be 1.3 to 1.5
  • the first refractive index layer 13 is a high refractive index layer
  • the second refractive index layer 15 corresponds to a low refractive index layer, so that the photonic crystal structure 10 is disposed on the substrate 11.
  • the low refractive index layer / high refractive index layer / low refractive index layer / high refractive index layer may have a structure stacked sequentially.
  • the first refractive index n1 may be 1.3 to 1.5
  • the second refractive index n2 may be 1.5 to 1.7
  • the first refractive index layer 13 is a low refractive index layer
  • the second refractive index layer 15 corresponds to a high refractive index layer, so that the photonic crystal structure 10 is formed on the substrate 11.
  • the high refractive index layer / low refractive index layer / high refractive index layer / low refractive index layer may have a structure that is sequentially stacked.
  • the ratio of the thickness of the low refractive index layer to the thickness of the high refractive index layer may be 1: 4 to 1: 0.5.
  • the thickness of the low refractive index layer is 25 to 70 nm
  • the thickness of the high refractive index layer may be 50 to 160 nm.
  • the photonic crystal structure is a high refractive index layer formed with a thickness of 50 to 160 nm
  • the second refractive index layer is a low refractive index layer formed with a thickness of 25 to 70 nm in terms of easy color conversion
  • the high refractive index layer is located at the top.
  • the total number of stacked layers of the photonic crystal structure is not limited thereto. Specifically, the total number of stacked layers of the first refractive index layer and the second refractive index layer may be 5 to 30 layers.
  • the interference of the reflected light at each layer boundary surface is sufficiently generated to have a reflection intensity such that a change in color due to an external stimulus is detected.
  • the reflection wavelength ⁇ of the color conversion photonic crystal structure 10 may be determined by Equation 1 below:
  • n1 and n2 are the refractive indices of the first and second refractive index layers 13 and 15, respectively, and d1 and d2 are the refractive indices of the first and second refractive index layers 13 and 15, respectively.
  • the color conversion photonic crystal structure 10 When there is no external stimulus, the color conversion photonic crystal structure 10 exhibits a reflection wavelength ⁇ corresponding to a visible light region of 380 to 760 nm according to Equation 1 to confirm the reflection color by the photonic crystal structure. Can be.
  • the color conversion photonic crystal structure 10 When the color conversion photonic crystal structure 10 is positioned in an environment subject to external stimulation, the crystal lattice of the first polymer and the second polymer constituting the first refractive index layer 13 and the second refractive index layer 15, respectively As the structure is changed, the photonic crystal structure 10 reflects the shifted wavelength [lambda] 'as the shape scattered at each layer boundary is changed. Therefore, the color implemented by the photonic crystal structure can be converted as compared with the case where there is no external stimulus. If the intensity of the external stimulus is high, since the degree of change of the crystal lattice structure of the first polymer and the second polymer is increased and the reflection wavelength is further shifted, the intensity of the external stimulus can be detected according to the color to be implemented.
  • the reflection wavelength is shifted as the humidity changes. That is, the shift in the reflection wavelength of the photonic crystal structure 10 is due to the change in the refractive index of the copolymer represented by Formula 1 included in the high refractive index layer and the increase in the thickness of the high refractive index layer when absorbing moisture.
  • the high refractive index layer of the photonic crystal structure in which moisture is absorbed may have a thickness of 1 to 3 times that of the high refractive index layer of the photonic crystal structure 10.
  • the copolymer represented by Chemical Formula 1 absorbs moisture. And swelling, thereby changing the thickness of the high refractive index layer.
  • the copolymer represented by Chemical Formula 1 is excellent in reactivity with water having high polarity, including quaternary ammonium cation and its counter anion. Therefore, the reflected wavelength of the photonic crystal structure 10 according to Equation 1 may be shifted.
  • the shifted reflection wavelength ⁇ ′ is within a range of 380 nm to 760 nm, so that color change can be observed with the naked eye.
  • the reflection wavelength [lambda] and the shifted reflection wavelength [lambda] ' can be measured by a device such as a reflectometer.
  • the reflection wavelength may be shifted to a longer wavelength. Therefore, the shifted reflection wavelength ⁇ ′ of the photonic crystal structure may have a larger value than the reflection wavelength ⁇ in the absence of an external magnetic pole.
  • the color conversion photonic crystal structure is manufactured by alternately stacking different refractive index layers, and in order to change the color represented by the photonic crystal structure, a new photonic crystal structure may be newly changed by changing a material included in each layer or varying the thickness of each layer. Shall be prepared.
  • the prepared photonic crystal structure is contacted with the quaternization reaction material, but to prepare a photonic crystal structure showing the color to be implemented by adjusting the type and the reaction conditions of the quaternization reaction material. Therefore, when using the manufacturing method according to the present invention, it is possible to easily adjust the reflection wavelength of the photonic crystal structure by using the already prepared photonic crystal structure without producing a new photonic crystal structure.
  • Step 1 Step of manufacturing the bulb structure (step 1)
  • the step 1 is a Bragg stack having a structure in which the first refractive index layer and the second refractive index layer are laminated alternately, the first refractive index layer comprises a first polymer exhibiting a first refractive index, the second refractive index layer is A step of manufacturing a light bulb structure comprising a second polymer exhibiting a second refractive index different from the first refractive index.
  • the first refractive index layer may be a high refractive index layer
  • the second refractive index layer may be a low refractive index layer
  • the first refractive index layer may be a low refractive index layer
  • the second refractive index layer may be a high refractive index layer
  • composition / structure is as described above in the photonic crystal structure except that the precursor structure has a high refractive index layer of the following composition / specification.
  • the term 'high refractive index layer' used in the present invention means a layer having a relatively high refractive index among two kinds of layers included in the bulb structure.
  • the polymer included in the high refractive index layer is a copolymer represented by the following formula (3):
  • R 5 and R 6 are each independently hydrogen or C 1-3 alkyl
  • X 11 to X 15 are each independently N or CR ′′, at least one of X 11 to X 15 is N,
  • R ′′ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,
  • L 3 is O or NH
  • Y 3 is benzoylphenyl
  • Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,
  • n3 and m3 are each independently an integer of 1 or more
  • n3 + m3 is 100-1,000.
  • the light bulb structure may be a high refractive index layer having a thickness of 50 to 120 nm, and a second refractive index layer having a thickness of 25 to 70 nm.
  • Such precursor structures can be manufactured by a manufacturing method comprising the following steps:
  • a first dispersion composition and a second dispersion composition are prepared.
  • Each dispersion composition can be prepared by dispersing a polymer in a solvent, where the dispersion composition is used as a term indicating various states such as solution phase, slurry phase or paste phase.
  • the solvent may be used as long as it can dissolve the first and second polymers, and the first and second polymers may be included in an amount of 0.5 to 5 wt% based on the total weight of the dispersion composition.
  • a dispersion composition having a viscosity suitable for being applied onto a substrate can be prepared.
  • the first dispersion composition may consist of a solvent and a first polymer
  • the second dispersion composition may consist of a solvent and a second polymer.
  • the photocuring agent may not include a separate photoinitiator and a crosslinking agent or inorganic particles. Therefore, the photonic crystal structure can be manufactured more easily and economically, and the dispersion of the optical properties according to the position of the prepared photonic crystal structure can be reduced by not including a separate additive.
  • spin coating dip coating, roll coating, screen coating, spray coating, or the like may be applied by applying the dispersion composition onto a substrate or a refractive index layer.
  • Spin casting, flow coating, screen printing, ink jet, drop casting, or the like may be used, but is not limited thereto.
  • the light irradiation step may be performed by a method of irradiating light of 190 ⁇ 380 nm wavelength.
  • the photocured refractive index layer may be prepared by acting as a photoinitiator of the benzophenone moiety contained in the polymer by the light irradiation.
  • steps a) and b) are repeated several times to produce a bulb structure having a total number of stacked layers of 5 to 30 layers.
  • the total number of stacked layers is odd, it means that the step a) of forming the first refractive index layer is repeated one more time than the step b).
  • Step 2 is a step of preparing a photonic crystal structure by contacting the precursor structure prepared in step 1 with a compound represented by the following formula (4) of the copolymer represented by the formula (3) contained in the high refractive index layer of the precursor structure
  • a compound represented by the following formula (4) of the copolymer represented by the formula (3) contained in the high refractive index layer of the precursor structure The quaternization reaction of the N nitrogen atom with the compound represented by Formula 4 converts the quaternary ammonium ion into quaternary ammonium cation:
  • the quaternization reaction is a nucleophilic substitution reaction between the nitrogen atom of the copolymer represented by Chemical Formula 3 and the compound represented by Chemical Formula 4 of the high refractive index layer. - the anion is produced. Accordingly, the copolymer represented by Chemical Formula 3 is converted into the copolymer represented by Chemical Formula 1 by reacting with the compound represented by Chemical Formula 4.
  • the composition and thickness of the high refractive index layer of the photonic crystal structure manufactured by the step 2 is different from that of the precursor structure.
  • the refractive index of the high refractive index layer of the photonic crystal structure is changed, and the reflection wavelength and the color of the photonic crystal structure are changed.
  • the photonic crystal structure prepared in step 2) may have a reflection wavelength in visible light of 380 to 760 nm, and thus display colors.
  • the reflection wavelength of the photonic crystal structure may be determined by Equation 1 described above.
  • the reflected wavelength of the photonic crystal structure is different from the reflected wavelength of the bulb structure due to the difference in the composition and thickness of the high refractive index layer.
  • the reflection wavelength of the photonic crystal structure may be longer than the reflection wavelength of the precursor structure. This is because the copolymer represented by Chemical Formula 3 is shifted to a longer wavelength as the contact time with the compound represented by Chemical Formula 4 increases.
  • the manufacturing method of the present invention by adjusting the type and reaction conditions of the compound represented by the formula (4) participating in the quaternization reaction, the implementation of the photonic crystal structure having the desired reflection wavelength without the need to prepare a new photonic crystal structure It is possible.
  • the method may further include performing a counterion exchange reaction of the photonic crystal structure.
  • the counterion exchange reaction means exchanging the X ⁇ anion of the copolymer represented by Chemical Formula 4 with another anion, and for this purpose, the photonic crystal structure may be contacted with an anion supply compound. Through this, it is possible to manufacture a new photonic crystal structure having a reflection wavelength different from the photonic crystal structure.
  • a color conversion photonic crystal sensor including the color conversion photonic crystal structure described above is provided.
  • the color conversion photonic crystal sensor may be used as a humidity sensor. Specifically, the color conversion photonic crystal sensor is different in color depending on its type when in contact with moisture, it is possible to confirm the humidity by observing the converted color. In addition, the color conversion photonic crystal sensor is not only the color conversion is clear according to the humidity, it can be quickly restored to the original state when contact with the external stimulus is interrupted, it is possible to reuse repeatedly.
  • Triethylamine A product of 99% purity TCI (Tokyo Chemical Industry) was used.
  • Tetrahydrofuran A Burdick & jackson product having a purity of 99.99% was used.
  • Azobisisobutyronitrile Purified by JUNSEI from 98% purity.
  • N- (2,2,2-trifluoroethyl) acrylate TCI (Tokyo Chemical Industry) company of purity 98% was used.
  • Mn number average molecular weight
  • Tg glass transition temperature
  • Refractive index It measured by ellipsometer.
  • the high refractive index dispersion composition was prepared by dissolving Poly (4VP-BPAA) prepared in Preparation Example 1 in propanol, and the low refractive index dispersion composition was prepared by dissolving Poly (FEA-BPAA) prepared in Preparation Example 2 in ethyl acetate. .
  • the high refractive index dispersion composition was applied on a glass substrate for 30 seconds using a spin coater and then cured at 365 nm for 5 minutes to form a high refractive index layer.
  • the glass substrate on which the high refractive index layer was formed was placed in a propanol solution to remove uncured portions.
  • the low refractive index dispersion composition was applied on the high refractive index layer for 30 seconds using a spin coater, and then cured at 365 nm for 5 minutes to form a low refractive index layer.
  • the glass substrate on which the high refractive index layer and the low refractive index layer were formed was placed in an ethyl acetate solution to remove the uncured portion.
  • a high refractive index layer and a low refractive index layer was repeatedly stacked on the low refractive index layer, thereby preparing a light bulb structure in which a total of seven refractive index layers were laminated.
  • the precursor was placed in a 100 ml vial containing 10 ml of DMF and 226 ⁇ l of benzyl bromide (1.9 ⁇ 10 ⁇ 3 mol), quaternized at 50 ° C. for 20 minutes, washed with ethanol, and dried. To prepare a photonic crystal structure.
  • Example 1-1 except that the quaternization reaction time was changed to 40 minutes, 1 hour, 1 hour 20 minutes, 1 hour 40 minutes, 2 hours, 2 hours 20 minutes, 2 hours 40 minutes, and 3 hours, respectively. Using the same method as in the photonic crystal structure was prepared.
  • the high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer.
  • the low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, these were repeatedly laminated, and thus a photonic crystal structure was obtained in the same manner as in Example 1-1, except that a precursor structure in which a total of seven refractive index layers were laminated was manufactured. Was prepared.
  • Example 2-1 except that the quaternization reaction time was changed to 40 minutes, 1 hour, 1 hour 20 minutes, 1 hour 40 minutes, 2 hours, 2 hours 20 minutes, 2 hours 40 minutes, and 3 hours, respectively. Using the same method as in the photonic crystal structure was prepared.
  • the high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer.
  • the low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they were repeatedly laminated to prepare a precursor structure in which a total of seven refractive index layers were laminated, and then the precursor structure was prepared by 10 ml of DMF and 142 ⁇ l bromoethane (1.9 ⁇ ).
  • a photonic crystal structure was prepared in the same manner as in Example 3-1, except that the quaternization reaction time was changed to 24 hours.
  • Example 3-1 The precursor prepared in Example 3-1 was placed in 100 ml vial containing 10 ml of DMF and 173 ⁇ l of bromopropane (1.9 ⁇ 10 ⁇ 3 mol), and quaternized at 50 ° C. for 5 hours, followed by ethanol. After washing with and dried to prepare a photonic crystal structure.
  • a photonic crystal structure was prepared in the same manner as in Example 4-1, except that the quaternization reaction time was changed to 24 hours.
  • Example 3-1 The precursor structure prepared in Example 3-1 was placed in 100 ml vial containing 10 ml of DMF and 226 ⁇ l of benzyl bromide (1.9 ⁇ 10 ⁇ 3 mol), and quaternized at 50 ° C. for 20 minutes. Washed with ethanol and dried to prepare a photonic crystal structure.
  • a photonic crystal structure was prepared in the same manner as in Example 5-1, except that the quaternization reaction time was changed to 24 hours.
  • the high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer.
  • the low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of seven refractive index layers are laminated,
  • a photonic crystal structure was prepared in the same manner as in Example 6-1, except that the quaternization reaction time was changed to 24 hours.
  • the high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer.
  • the low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of 13 refractive index layers are laminated,
  • the precursor structure was placed in 100 ml vial containing 10 ml of Hexane and 142 ⁇ l of bromoethane (1.9 ⁇ 10 -3 mol), and after quaternization at 50 ° C. for 48 hours, washed with ethanol and dried. , Except that a photonic crystal structure was produced, a photonic crystal structure was produced in the same manner as in Example 1-1.
  • the high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer.
  • the low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of 13 refractive index layers are laminated,
  • the precursor was placed in a 100 ml vial containing 10 ml of DMF and 226 ⁇ l of benzyl bromide (1.9 ⁇ 10 ⁇ 3 mol), quaternized at 50 ° C. for 110 minutes, washed with ethanol, and dried.
  • a photonic crystal structure was produced in the same manner as in Example 1-1, except that the photonic crystal structure was prepared.
  • Example 5-1 The photonic crystal structure prepared in Example 5-1 was placed in 100 ml vial containing 1% of copper (2) perchlorate hexahydrate (Cu (ClO 4 ) 2 6H 2 O), and subjected to counter ion exchange reaction. Prepared.
  • a photonic crystal structure was prepared in the same manner as in Example 9-1, except that the counterion exchange reaction time was changed to 6 hours, 19 hours, 27 hours, and 44 hours, respectively.
  • the quaternized Poly ((4VP-BPAA) copolymer structure included in the high refractive index layer according to the type change of the RX compound prepared in Example is shown in Table 5.
  • the high refractive index layer is 4 If the conversion to the differential poly ((4VP-BPAA) copolymer is not 100%, the poly ((4VP-BPAA) copolymer and the quaternized Poly ((4VP-BPAA) copolymer are included at the same time.
  • the Poly (FEA-BPAA) copolymer included in the low refractive index layer the description was omitted because there is no change in the polymer before and after the quaternization.
  • Test Example 2 quaternization With change in reaction time Color conversion observe
  • the photonic crystal structure prepared in the above example changes the reflection wavelength according to the quaternization reaction time. Specifically, it can be seen that as the quaternization reaction time increases, the reflection wavelength becomes longer and shifts to longer wavelengths.
  • Test Example 3 According to the substituent change of ammonium ion Color conversion observe
  • Examples 3-1, 3-2, and 4-1 to confirm the color conversion according to the R group change and the quaternization reaction time thereof in the R-Br compound for quaternization represented by the formula (4) Colors of the photonic crystal structures prepared in, 4-2, 5-1, and 5-2 were observed, and specular reflectances of the photonic crystal structures were measured using a reflectometer (USB 4000, Ocean Optics), and the results are illustrated in FIGS. 4A and 4B.
  • FIGS. 4A and 4B USB 4000, Ocean Optics
  • the specular reflectance graphs of the photonic crystal structures prepared in 3-2, 4-2 and 5-2 are shown.
  • the 'reflection wavelength shift' means a value in which the reflection wavelength of the photonic crystal structure is shifted after the quaternization reaction with respect to the reflection wavelength of the photonic crystal structure before the quaternization reaction.
  • the photonic crystal structure prepared in the above example shows different reflection wavelengths according to the change of the R group, which is a substituent of ammonium ions, and as the reaction time increases, the reflection wavelength is longer as in the test example 2 above. It can be seen that it is shifted to a longer wavelength.
  • the quaternization reaction of poly (4VP-BPAA) was terminated before 5 hours because the reaction time was no longer changed when the reaction time was increased from 5 hours to 24 hours in the case of quaternization using benzyl bromide. It is understood.
  • Test Example 4 Counter ion change of ammonium ion Color conversion observe
  • the reflection wavelength is increased as the quaternization reaction time increases. It can be seen that it is longer and shifted to longer wavelengths.
  • the composition of the copolymer included in the high refractive index layer is changed by changing the compound for quaternization and controlling the quaternization reaction time, so that the refractive index of the high refractive index layer is changed, thereby causing photonic crystals. It can be seen that the structure exhibits the converted reflection wavelength.
  • Test Example 5 according to the humidity change Color conversion observe
  • the photonic crystal structure prepared in Example 7 was subjected to an environment of 11%, 23%, 33%, 43%, 52%, 68%, 75% and 85% relative humidity, respectively. After exposure to the changed color was observed and the results are shown in Figure 6a, the specular reflectance was measured using a reflectometer (USB 4000, Ocean Optics) and the results are shown in Figure 6b.
  • Example 8 the photonic crystal structure prepared in Example 8 was exposed to an environment of 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80%, and 87% relative humidity, respectively, and then changed color. Observed the result is shown in Figure 7a, the specular reflectance was measured using a reflectometer (USB 4000, Ocean Optics) and the result is shown in Figure 7b.
  • the photonic crystal structures prepared in Examples 7 and 8 have a clear shift in reflection wavelength according to changes in relative humidity, and thus have excellent sensitivity to changes in moisture.
  • the reflection wavelength of the photonic crystal structure is shifted in a direction in which the wavelength increases as the relative humidity increases.
  • the shifted reflection wavelength corresponds to the visible light region, so that the change in the reflection wavelength of the photonic crystal structure may be observed with the naked eye, and thus the photonic crystal structure according to the embodiment may be used to confirm the relative humidity.
  • Test Example 6 According to the change of counter ion of ammonium ion Color conversion observe
  • the specular reflectance of the photonic crystal structures prepared in Examples 9-1 to 9-5 by using a reflectometer USB 4000, Ocean Optics
  • the reflection wavelength and the reflection wavelength shift measurement results are shown in FIG. 6A
  • the specular reflection graph is shown in FIG. 6B.
  • the reflection wavelength of the photonic crystal structure can be changed not only through the quaternization reaction but also through the exchange reaction of the counter ion of the quaternized copolymer.
  • first refractive index layer 15 second refractive index layer

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Abstract

The present invention relates to a colorimetric photonic crystal structure comprising a high-refractive index layer using a copolymer simultaneously comprising a repeat unit containing a quaternary ammonium ion and a repeat unit derived from an acrylate- or acrylamide-based monomer having a photoactive functional group. The colorimetric photonic crystal structure can perform a color conversion, which is visually recognizable according to the humidity change, and can be used to manufacture a photonic crystal sensor. In addition, the present invention is directed to a method for manufacturing a colorimetric photonic crystal structure, the method comprising a step for quaternizing nitrogen atoms present in the repeat units of the copolymer included in one layer that are repeated, and a colorimetric photonic crystal structure with a reflection wavelength to be realized can be manufactured by controlling quaternization reaction conditions.

Description

색변환 광결정 구조체 및 이를 이용한 색변환 광결정 센서Color conversion photonic crystal structure and color conversion photonic crystal sensor using the same

본 발명은 습도의 변화에 감응하는 색변환 광결정 구조체, 및 이를 이용한 색변환 광결정 센서에 관한 것이다.The present invention relates to a color conversion photonic crystal structure sensitive to changes in humidity, and a color conversion photonic crystal sensor using the same.

본 발명은 반사 파장을 조절하여 나타내는 색을 변환시킬 수 있는 색변환 광결정 구조체의 제조 방법에 관한 것이다.The present invention relates to a method for producing a color conversion photonic crystal structure capable of converting a color represented by adjusting a reflection wavelength.

광결정(photonic crystal)이란, 서로 다른 굴절률을 갖는 유전물질이 주기적으로 배열된 구조체로서, 각각의 규칙적인 격자점에서 산란되는 빛들 사이에 중첩적 간섭이 일어나 특정한 파장 영역대에서 빛을 투과시키지 않고 선택적으로 반사하는, 즉 광밴드갭을 형성하는 물질을 의미한다.A photonic crystal is a structure in which dielectric materials having different refractive indices are arranged periodically, and overlapping interference occurs between light scattered at each regular lattice point, so that light is not transmitted through a specific wavelength range. Refers to a material that reflects light, that is, forms an optical band gap.

이러한 광결정은 정보 처리의 수단으로 전자 대신 광자를 이용함으로써, 정보처리의 속도가 우수하여 정보화 산업의 효율 향상을 위한 핵심 물질로 부각되고 있다. 더욱이, 광결정은 광자가 주축 방향으로 이동하는 1차원 구조, 평면을 따라 이동하는 2차원 구조, 또는 물질 전체를 통해 모든 방향으로 자유롭게 이동하는 3차원 구조로 구현될 수 있고, 광밴드갭 조절을 통한 광학적 특성의 제어가 용이하여 다양한 분야에 적용 가능하다. 예를 들어, 광결정은 광결정 섬유, 발광소자, 광기전소자, 광결정 센서, 반도체레이저 등 광학 소자에 응용될 수 있다.Such photonic crystals use photons instead of electrons as a means of information processing, and thus, the speed of information processing is excellent and is emerging as a key material for improving the efficiency of the information industry. Furthermore, the photonic crystal can be implemented as a one-dimensional structure in which photons move in the principal axis direction, a two-dimensional structure in which the photons move along a plane, or a three-dimensional structure in which the photons move freely in all directions throughout the material. It is easy to control the optical characteristics and can be applied to various fields. For example, photonic crystals may be applied to optical devices such as photonic crystal fibers, light emitting devices, photovoltaic devices, photonic crystal sensors, semiconductor lasers, and the like.

특히, 브래그 스택(Bragg stack)은 1차원 구조를 갖는 광결정으로서, 상이한 굴절률을 갖는 두 층의 적층만으로 쉽게 제조가 가능하고, 상기 두 층의 굴절률 및 두께 조절에 의한 광학적 특성의 제어가 용이하다는 장점이 있다. 이러한 특징으로 인해 상기 브래그 스택은 태양 전지와 같은 에너지 소자 뿐만 아니라, 전기적, 화학적, 열적 자극 등을 감지하는 광결정 센서로의 응용에 널리 이용되고 있다. 이에 따라, 감도 및 재현성이 우수한 광결정 센서를 용이하게 제조하기 위한 여러 가지 물질 및 구조에 대한 연구가 이루어지고 있다.In particular, the Bragg stack is a photonic crystal having a one-dimensional structure, and can be easily manufactured by only stacking two layers having different refractive indices, and controlling the optical properties by controlling the refractive index and thickness of the two layers is easy. There is this. Due to these features, the Bragg stack is widely used for applications as photonic crystal sensors that detect electrical, chemical, and thermal stimuli as well as energy devices such as solar cells. Accordingly, studies have been made on various materials and structures for easily manufacturing a photonic crystal sensor excellent in sensitivity and reproducibility.

이에 본 발명자들은 예의 노력한 결과, 후술할 바와 같이 브래그 스택 중 반복되는 하나의 층에 4차 암모늄 이온(Quaternary ammonium cation)을 포함하는 반복 단위를 포함하는 코폴리머를 이용할 경우, 색변환을 통하여 습도의 변화에 감응하는 색변환 광결정 구조체 및 이에 따른 우수한 감도를 나타내는 광결정 센서를 용이하게 제조할 수 있음을 확인하여, 본 발명을 완성하였다.Accordingly, the present inventors have made intensive efforts to use a copolymer including a repeating unit including quaternary ammonium ions in one repeated layer of the Bragg stack as described below. The present invention has been completed by confirming that a color conversion photonic crystal structure sensitive to change and a photonic crystal sensor exhibiting excellent sensitivity can be easily manufactured.

본 발명은 습도의 변화에 감응하는 색변환 광결정 구조체를 제공하기 위한 것이다.The present invention is to provide a color conversion photonic crystal structure sensitive to changes in humidity.

또한, 본 발명은 상기 광결정 구조체를 포함하는 색변환 광결정 센서를 제공하기 위한 것이다.In addition, the present invention is to provide a color conversion photonic crystal sensor comprising the photonic crystal structure.

또한, 본 발명은 반사 파장을 조절하여 원하는 색을 나타낼 수 있는 색변환 광결정 구조체의 제조 방법을 제공하기 위한 것이다.In addition, the present invention is to provide a method of manufacturing a color conversion photonic crystal structure that can display a desired color by adjusting the reflection wavelength.

또한, 본 발명은 상기 제조 방법에 따라 제조된 색변환 광결정 구조체를 제공하기 위한 것이다.In addition, the present invention is to provide a color conversion photonic crystal structure prepared according to the above production method.

상기 과제를 해결하기 위하여, 본 발명은 교대로 적층된, 제1 굴절률을 나타내는 제1 폴리머를 포함하는 제1 굴절률층; 및 제2 굴절률을 나타내는 제2 폴리머를 포함하는 제2 굴절률층;을 포함하고,In order to solve the above problems, the present invention is a first refractive index layer comprising a first polymer exhibiting a first refractive index, alternately stacked; And a second refractive index layer comprising a second polymer exhibiting a second refractive index,

상기 제1 굴절률과 상기 제2 굴절률은 상이하고,The first refractive index and the second refractive index are different,

상기 제1 폴리머 및 상기 제2 폴리머 중 하나는, 하기 화학식 1로 표시되는 코폴리머인, 색변환 광결정 구조체를 제공한다:One of the first polymer and the second polymer provides a color converting photonic crystal structure, which is a copolymer represented by Formula 1 below:

[화학식 1][Formula 1]

Figure PCTKR2017011005-appb-I000001
Figure PCTKR2017011005-appb-I000001

상기 화학식 1에서,In Chemical Formula 1,

R1 및 R2는 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 1 and R 2 are, each independently, hydrogen or C1-3 alkyl,

X1 내지 X5는 각각 독립적으로, N+RX- 또는 CR'이되, X1 내지 X5 중 적어도 하나는 N+RX-이고,And, - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX

여기서 R 및 R'는 각각 독립적으로, 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고, X-는 1가의 음이온이고,Wherein R and R 'are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X is 1 Is an anionic

L1은 O 또는 NH이고,L 1 is O or NH,

Y1은 벤조일페닐이고,Y 1 is benzoylphenyl,

여기서 Y1은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n1 및 m1은 각각 독립적으로 1 이상의 정수이고,n1 and m1 are each independently an integer of 1 or more,

n1+m1은 100 내지 1,000이다.n1 + m1 is 100-1,000.

또한, 본 발명은In addition, the present invention

1) 제1 굴절률층과 제2 굴절률층이 교대로 적층된 전구 구조체를 제조하는 단계; 및1) manufacturing a light bulb structure in which the first refractive index layer and the second refractive index layer are alternately stacked; And

2) 상기 전구 구조체를 하기 화학식 4로 표시되는 화합물과 접촉시켜 광결정 구조체를 제조하는 단계;를 포함하고,2) preparing a photonic crystal structure by contacting the precursor structure with a compound represented by the following formula (4);

상기 제1 굴절률층은 제1 굴절률을 나타내는 제1 폴리머를 포함하고, 상기 제2 굴절률층은 상기 제1 굴절률과 상이한 제2 굴절률을 나타내는 제2 폴리머를 포함하며,The first refractive index layer comprises a first polymer exhibiting a first refractive index, and the second refractive index layer comprises a second polymer exhibiting a second refractive index different from the first refractive index,

상기 제1 폴리머 및 상기 제2 폴리머 중 하나는, 하기 화학식 3으로 표시되는 코폴리머인,One of the first polymer and the second polymer is a copolymer represented by the following formula (3),

색변환 광결정 구조체의 제조 방법:Process for producing color conversion photonic crystal structure:

[화학식 3][Formula 3]

Figure PCTKR2017011005-appb-I000002
Figure PCTKR2017011005-appb-I000002

상기 화학식 3에서,In Chemical Formula 3,

R5 및 R6은 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 5 and R 6 are each independently hydrogen or C 1-3 alkyl,

X11 내지 X15는 각각 독립적으로, N 또는 CR"이되, X11 내지 X15 중 적어도 하나는 N이고,X 11 to X 15 are each independently N or CR ″, at least one of X 11 to X 15 is N,

여기서 R"는 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,Wherein R ″ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,

L3은 O 또는 NH이고,L 3 is O or NH,

Y3은 벤조일페닐이고,Y 3 is benzoylphenyl,

여기서 Y3은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n3 및 m3은 각각 독립적으로 1 이상의 정수이고,n3 and m3 are each independently an integer of 1 or more,

n3+m3은 100 내지 1,000이고,n3 + m3 is 100 to 1,000,

[화학식 4][Formula 4]

R-XR-X

상기 화학식 4에서,In Chemical Formula 4,

R은 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴또는 C7-20 아릴알킬이고,R is hydrogen, C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, C7-20 alkylaryl or C7-20 arylalkyl,

X는 이탈기(leaving group)이다.X is a leaving group.

또한, 본 발명은 상기 광결정 구조체를 포함하는 색변환 광결정 센서를 제공한다.The present invention also provides a color conversion photonic crystal sensor comprising the photonic crystal structure.

본 발명의 색변환 광결정 구조체는, 4차 암모늄 이온(Quaternary ammonium cation)을 포함하는 반복 단위 및 광활성 관능기를 갖는 아크릴레이트 또는 아크릴아미드계 모노머부터 유도된 반복 단위를 동시에 포함하는 코폴리머를 이용한 고굴절률층을 포함하여, 습도 변화에 따라 시각적으로 판단 가능하도록 색이 변환될 수 있고, 이를 이용하여 광결정 센서의 제조가 가능하다는 특징이 있다.The color conversion photonic crystal structure of the present invention is a high refractive index using a copolymer comprising a repeating unit derived from an acrylate or acrylamide monomer having a repeating unit containing a quaternary ammonium cation and a photoactive functional group. Including the layer, the color may be converted to be visually judged according to the change in humidity, and there is a characteristic that the photonic crystal sensor may be manufactured using the same.

본 발명의 색변환 광결정 구조체의 제조 방법은, 반복되는 하나의 층에 포함된 코폴리머의 반복 단위에 존재하는 질소 원자의 4차화(Quarternization) 반응 조건을 조절하여 구현하고자 하는 반사 파장을 갖는 색변환 광결정 구조체를 제조할 수 있다는 특징이 있다.In the method of manufacturing a color conversion photonic crystal structure of the present invention, a color conversion having a reflection wavelength to be implemented by adjusting the quaternization reaction conditions of nitrogen atoms present in the repeating unit of the copolymer included in one repeated layer There is a feature that a photonic crystal structure can be produced.

도 1은, 일 실시예에 따른 색변환 광결정 구조체의 구조를 간략하게 나타낸 것이다.FIG. 1 schematically illustrates a structure of a color conversion photonic crystal structure according to an embodiment.

도 2a는, 실시예 1-1 내지 1-9에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.FIG. 2A shows the reflection wavelength and the color conversion photograph of the photonic crystal structures prepared in Examples 1-1 to 1-9.

도 2b는, 실시예 1-1 내지 1-9에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.2B shows a specular reflection diagram of the photonic crystal structures prepared in Examples 1-1 to 1-9.

도 3a는, 실시예 2-1 내지 2-9에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.3A shows reflection wavelengths and color conversion photographs of the photonic crystal structures prepared in Examples 2-1 to 2-9.

도 3b는, 실시예 2-1 내지 2-9에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.3B shows the specular reflectance of the photonic crystal structures prepared in Examples 2-1 to 2-9.

도 4a는, 실시예 3-1, 3-2, 4-1, 4-2, 5-1 및 5-2에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.4A shows the reflection wavelengths and color conversion photographs of the photonic crystal structures prepared in Examples 3-1, 3-2, 4-1, 4-2, 5-1, and 5-2.

도 4b는, 실시예 3-1, 4-1 및 5-1에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.4B shows the specular reflectance of the photonic crystal structures prepared in Examples 3-1, 4-1, and 5-1.

도 4c는, 실시예 3-2, 4-2 및 5-2에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.4C shows the specular reflectance of the photonic crystal structure prepared in Examples 3-2, 4-2, and 5-2.

도 5a는, 실시예 6-1 및 6-2에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.FIG. 5A shows the reflection wavelength and the color conversion photograph of the photonic crystal structures prepared in Examples 6-1 and 6-2.

도 5b는, 실시예 6-1 및 6-2에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.5B shows the specular reflectance of the photonic crystal structures prepared in Examples 6-1 and 6-2.

도 6a는, 습도 변화에 따른 실시예 7에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.FIG. 6A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure prepared in Example 7 according to humidity change. FIG.

도 6b는, 습도 변화에 따른 실시예 7에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.FIG. 6B shows a specular reflection diagram of the photonic crystal structure prepared in Example 7 according to humidity change. FIG.

도 7a는, 습도 변화에 따른 실시예 8에서 제조한 광결정 구조체의 반사 파장 및 색변환 사진을 나타낸 것이다.FIG. 7A illustrates a reflection wavelength and a color conversion photograph of the photonic crystal structure manufactured in Example 8 according to humidity change. FIG.

도 7b는, 습도 변화에 따른 실시예 8에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.FIG. 7B shows a specular reflection diagram of the photonic crystal structure prepared in Example 8 according to humidity change. FIG.

도 8a는, 실시예 9-1 내지 9-5에서 제조한 광결정 구조체의 반사 파장 측정결과를 나타낸 것이다.8A shows the reflection wavelength measurement results of the photonic crystal structures prepared in Examples 9-1 to 9-5.

도 8b는, 실시예 9-1 내지 9-5에서 제조한 광결정 구조체의 정반사도를 나타낸 것이다.8B shows the specular reflectance of the photonic crystal structures prepared in Examples 9-1 to 9-5.

이하에서 본 발명을 더욱 구체적으로 설명한다. 본 명세서 및 청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니 되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다.Hereinafter, the present invention will be described in more detail. The terms or words used in this specification and claims are not to be construed as limiting in their usual or dictionary meanings, and the inventors may appropriately define the concept of terms in order to best explain their invention in the best way possible. It should be interpreted as meaning and concept corresponding to the technical idea of the present invention based on the principle that the present invention.

또한 본 발명의 명세서에서 사용되는 "포함하는"의 의미는 특정 특성, 영역, 정수, 단계, 동작, 요소 및/또는 성분을 구체화하며, 다른 특성, 영역, 정수, 단계, 동작, 요소 및/또는 성분의 존재나 부가를 제외시키는 것은 아니다.In addition, the meaning of “comprising” as used in the specification of the present invention embodies a particular characteristic, region, integer, step, operation, element and / or component, and other characteristics, region, integer, step, operation, element and / or It does not exclude the presence or addition of ingredients.

이하의 명세서에서 사용된 용어의 일부는 다음과 같이 정의될 수 있다.Some of the terms used in the following specification may be defined as follows.

색변환Color conversion 광결정Photonic crystal 구조체 Structure

먼저, 본 발명에서 사용하는 용어 '색변환 광결정 구조체'는 굴절률이 상이한 물질을 반복적으로 교대 적층하여 제조된 1차원 광결정 구조를 갖는 브래그 스택으로, 적층된 구조의 굴절률의 주기적인 차이에 의해 특정한 파장 영역대의 빛을 반사할 수 있고, 이러한 반사 파장은 외부 자극에 의해 시프트(Shift)되어 반사색이 변환되는 구조체를 의미한다. 구체적으로, 구조체 각각의 층의 경계에서 빛의 부분 반사가 일어나게 되고, 이러한 많은 반사파가 구조적으로 간섭하여 높은 강도를 갖는 특정 파장의 빛이 반사될 수 있다. 이때, 외부 자극에 의한 반사 파장의 시프트는, 층을 형성하는 물질의 격자 구조가 외부 자극에 의해 변화함에 따라 산란되는 빛의 파장이 변화되면서 일어나게 된다. 이러한, 색변환 광결정 구조체는 별도의 기재 또는 기판 상에 코팅된 코팅막 형태로, 혹은 프리 스탠딩 필름의 형태로 제조될 수 있고, 광결정 섬유, 발광소자, 광기전소자, 광결정 센서, 반도체레이저 등 광학 소자에 응용될 수 있다. 예를 들어, 상기 색변환 광결정 구조체는 화학 및 생물 종 탐지를 위한 환경 소자와 같은 광센서, 글루코스 센서, 단백질 센서, DNA 센서, 질병 진단센서, 휴대용 진단센서와 같은 바이오 센서 등에 사용될 수 있으나, 그 응용 분야가 제한되는 것은 아니다.First, the term 'color conversion photonic crystal structure' used in the present invention is a Bragg stack having a one-dimensional photonic crystal structure manufactured by repeatedly stacking materials having different refractive indices, and having a specific wavelength due to a periodic difference in refractive index of the stacked structures. The light may reflect light in an area, and the reflected wavelength refers to a structure shifted by an external stimulus to convert a reflected color. Specifically, partial reflection of light occurs at the boundary of each layer of the structure, and many of these reflected waves can structurally interfere to reflect light of a specific wavelength having high intensity. In this case, the shift of the reflection wavelength due to the external stimulus occurs as the wavelength of the scattered light changes as the lattice structure of the material forming the layer is changed by the external stimulus. Such a color conversion photonic crystal structure may be manufactured in the form of a coating film coated on a separate substrate or a substrate, or in the form of a free standing film, and includes an optical device such as a photonic crystal fiber, a light emitting device, a photovoltaic device, a photonic crystal sensor, a semiconductor laser, and the like. It can be applied to. For example, the color conversion photonic crystal structure may be used in biosensors such as optical sensors, glucose sensors, protein sensors, DNA sensors, disease diagnosis sensors, portable diagnostic sensors, and the like, such as environmental elements for chemical and species detection. The application is not limited.

한편, 본 발명의 색변환 광결정 구조체는, 교대로 적층된, 제1 굴절률을 나타내는 제1 폴리머를 포함하는 제1 굴절률층; 및 제2 굴절률을 나타내는 제2 폴리머를 포함하는 제2 굴절률층;을 포함하고, 상기 제1 굴절률과 상기 제2 굴절률은 상이하다.On the other hand, the color conversion photonic crystal structure of the present invention, the first refractive index layer comprising a first polymer exhibiting a first refractive index, alternately stacked; And a second refractive index layer comprising a second polymer exhibiting a second refractive index, wherein the first refractive index and the second refractive index are different.

따라서, 상기 제1 굴절률층이 고굴절률층이고, 상기 제2 굴절률층이 저굴절률층이거나, 다르게는 상기 제1 굴절률층이 저굴절률층이고, 상기 제2 굴절률층이 고굴절률층일 수 있다.Accordingly, the first refractive index layer may be a high refractive index layer, the second refractive index layer may be a low refractive index layer, or alternatively, the first refractive index layer may be a low refractive index layer, and the second refractive index layer may be a high refractive index layer.

고굴절률층High refractive index layer

본 발명에서 사용하는 용어 '고굴절률층'은 광결정 구조체 내에 포함된 두 종류의 층 중에서 상대적으로 굴절률이 높은 층을 의미한다. 이때, 상기 제1 폴리머 및 상기 제2 폴리머 중 하나로서, 상기 고굴절률층에 포함되는 폴리머는 하기 화학식 1로 표시되는 코폴리머이다:The term 'high refractive index layer' used in the present invention means a layer having a relatively high refractive index among two kinds of layers included in the photonic crystal structure. At this time, as one of the first polymer and the second polymer, the polymer included in the high refractive index layer is a copolymer represented by the following formula (1):

[화학식 1][Formula 1]

Figure PCTKR2017011005-appb-I000003
Figure PCTKR2017011005-appb-I000003

상기 화학식 1에서,In Chemical Formula 1,

R1 및 R2는 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 1 and R 2 are each independently hydrogen or C 1-3 alkyl,

X1 내지 X5는 각각 독립적으로, N+RX- 또는 CR'이되, X1 내지 X5 중 적어도 하나는 N+RX-이고,And, - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX

여기서 R 및 R'는 각각 독립적으로, 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고, X-는 1가의 음이온이고,Wherein R and R 'are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X is 1 Is an anionic

L1은 O 또는 NH이고,L 1 is O or NH,

Y1은 벤조일페닐이고,Y 1 is benzoylphenyl,

여기서 Y1은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n1 및 m1은 각각 독립적으로 1 이상의 정수이고,n1 and m1 are each independently an integer of 1 or more,

n1+m1은 100 내지 1,000이다.n1 + m1 is 100-1,000.

상기 화학식 1로 표시되는 코폴리머는, 4차 암모늄 이온을 포함하는 반복 단위 및 광활성 관능기(Photo-active functional group, Y1)를 갖는 아크릴레이트(L1 = O) 또는 아크릴아미드(L1 = NH)계 모노머부터 유도된 반복 단위를 동시에 포함하는 고분자를 의미한다.The copolymer represented by the formula ( 1 ) is an acrylate (L 1 = O) or acrylamide (L 1 = NH) having a repeating unit containing a quaternary ammonium ion and a photo-active functional group (Y 1 ) It means a polymer containing a repeating unit derived from a) monomer at the same time.

상기 화학식 1로 표시되는 코폴리머가 4차 암모늄 이온을 포함하는 반복 단위를 포함하는 경우, 상기 반복 단위를 포함하지 않는 폴리머에 비하여 굴절률이 높고, 친수성이 증가되어 수분과 같은 외부 자극에 보다 잘 감응할 수 있다.When the copolymer represented by Chemical Formula 1 includes a repeating unit containing quaternary ammonium ions, the polymer has a higher refractive index and hydrophilicity than the polymer containing no quaternary ammonium ions, thereby better responding to external stimuli such as moisture. can do.

또한, 상기 4차 암모늄 이온을 포함하는 반복 단위는 상기 4차 암모늄 양이온과 이온 결합되는 상대 이온(counter ion, X-)을 가지고 있어, 상대 이온의 종류에 따라 고굴절률층의 굴절률을 변화시켜 상이한 색을 나타내는 광결정 구조체의 제조가 가능하다.In addition, the repeating unit including the quaternary ammonium ion has a counter ion (X ) which is ion-bonded with the quaternary ammonium cation, and thus the refractive index of the high refractive index layer is changed according to the type of the counter ion. It is possible to produce a photonic crystal structure exhibiting color.

또한, 상기 코폴리머 내 상기 4차 암모늄 이온의 개수 및 상대 이온의 종류에 따라 굴절률이 변화할 수 있어, 이를 조절하여 원하는 반사 파장을 갖는 색변환 광결정 구조체가 구현될 수 있다.In addition, since the refractive index may vary according to the number of quaternary ammonium ions and the type of the relative ions in the copolymer, a color conversion photonic crystal structure having a desired reflection wavelength may be implemented by adjusting the refractive index.

더욱이, 상기 화학식 1로 표시되는 코폴리머는 광활성 관능기(Y1)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머부터 유도된 반복 단위를 추가로 포함하여, 별도의 광개시제 혹은 가교제(crosslinker) 없이도 자체적으로 광경화가 가능할 수 있다.Furthermore, the copolymer represented by Chemical Formula 1 further includes repeating units derived from an acrylate or acrylamide-based monomer having a photoactive functional group (Y 1 ), so that photocuring itself is performed without a separate photoinitiator or crosslinker. It may be possible.

이러한 상기 화학식 1로 표시되는 코폴리머는, 스티렌계 모노머 및 광활성 관능기(Y1)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머를 랜덤하게 공중합하여 제조된, 상기 화학식 1의 대괄호 사이의 반복 단위들이 서로 랜덤하게 배열되어 있는 랜덤 코폴리머일 수 있다.The copolymer represented by Chemical Formula 1 is a random copolymer of styrene monomer and an acrylate or acrylamide monomer having a photoactive functional group (Y 1 ), and the repeating units between the square brackets of Chemical Formula 1 are random from each other. It may be a random copolymer arranged so as to.

다르게는, 상기 화학식 1로 표시되는 코폴리머는, 상기 화학식 1의 대괄호 사이의 반복 단위들의 블록이 공유 결합에 의해 연결되어 있는 블록 코폴리머일 수 있다. 또한 다르게는, 상기 화학식 1의 대괄호 사이의 반복 단위들이 교차되어 배열되어 있는 교호 코폴리머이거나, 혹은 어느 하나의 반복 단위가 가지 형태로 결합되어 있는 그라프트 코폴리머일 수 있으나, 상기 반복 단위들의 배열 형태가 한정되지는 않는다.Alternatively, the copolymer represented by Formula 1 may be a block copolymer in which blocks of repeating units between square brackets of Formula 1 are connected by covalent bonds. Also, alternatively, it may be an alternating copolymer in which the repeating units between the brackets of Formula 1 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form. The form is not limited.

또한, 상기 화학식 1로 표시되는 코폴리머는 1.5 내지 1.7의 굴절률을 나타낼 수 있다. 상술한 범위일 때, 상기 화학식 1로 표시되는 폴리머와의 굴절률 차이에 의해 원하는 파장의 빛을 반사하는 광결정 구조체가 구현될 수 있다.In addition, the copolymer represented by Formula 1 may exhibit a refractive index of 1.5 to 1.7. When in the above-described range, a photonic crystal structure reflecting light of a desired wavelength may be implemented by a difference in refractive index with the polymer represented by Chemical Formula 1.

상기 화학식 1에서, R1 및 R2는 각각 독립적으로 수소 또는 메틸일 수 있다. 예를 들어, R1 및 R2는 수소일 수 있다.In Formula 1, R 1 and R 2 may be each independently hydrogen or methyl. For example, R 1 and R 2 can be hydrogen.

또한, 상기 화학식 1에서,In addition, in Chemical Formula 1,

X1은 N+RX-이고, X2 내지 X5는 각각 독립적으로 CR'이거나;X 1 is N + RX , and X 2 to X 5 are each independently CR ′;

X2는 N+RX-이고, X1, X3 내지 X5는 각각 독립적으로 CR'이거나; 또는X 2 is N + RX , and X 1 , X 3 to X 5 are each independently CR ′; or

X3은 N+RX-이고, X1, X2, X4 및 X5는 각각 독립적으로 CR'이다.X 3 is N + RX , and X 1 , X 2 , X 4 and X 5 are each independently CR ′.

이때, R은 C1-10 알킬, C6-10 아릴, 또는 C7-10 아릴알킬이고, R'는 수소 또는 C1-10 알킬일 수 있다.Wherein R is C 1-10 alkyl, C 6-10 aryl, or C 7-10 arylalkyl, and R ′ may be hydrogen or C 1-10 alkyl.

예를 들어, R은 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, sec-부필, tert-부틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 페닐, 벤질, 또는 페닐에틸이고, R'는 수소, 메틸, 에틸, 또는 페닐일 수 있다.For example, R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, Or phenylethyl and R 'may be hydrogen, methyl, ethyl, or phenyl.

또한, X-는 1가(mono-valent)의 음이온으로, 예를 들어 X-는 F-, Cl-, Br-, I-, ClO4 -, SCN-, NO3 -, 또는 CH3CO2 -일 수 있다. 특히, 후술하는 4차화 반응의 용이성 측면에서, F-, Cl-, Br-, 또는 I-와 같은 할로겐 음이온이 바람직하다.In addition, X - is, for the anion of a monovalent (mono-valent), for example, X - is F -, Cl -, Br - , I -, ClO 4 -, SCN-, NO 3 -, or CH 3 CO 2 - it can be. In particular, a halogen anion such as F , Cl , Br , or I is preferable in view of the ease of quaternization reaction described later.

또한, 상기 화학식 1에서, Y1은 비치환되거나, 또는 C1-3 알킬로 치환된 벤조일페닐일 수 있다. Y1이 벤조일페닐인 경우, 광경화의 용이성 측면에서 유리할 수 있다.In addition, in Chemical Formula 1, Y 1 may be benzoylphenyl unsubstituted or substituted with C 1-3 alkyl. When Y 1 is benzoylphenyl, it may be advantageous in view of ease of photocuring.

또한, 상기 화학식 1에서, n1은 상기 코폴리머 내 4차 암모늄 이온을 포함하는 반복 단위의 총 개수를 의미하고, m1은 상기 코폴리머 내 광활성 관능기를 갖는 아크릴레이트 또는 아크릴아미드계 모노머로부터 유도된 반복 단위의 총 개수를 의미한다.In addition, in Formula 1, n1 means the total number of repeating units including quaternary ammonium ions in the copolymer, m1 is a repeat derived from an acrylate or acrylamide monomer having a photoactive functional group in the copolymer Means the total number of units.

이때, 상기 화학식 1로 표시되는 코폴리머는 n1:m1의 몰비가 100:1 내지 100:20, 예를 들어, 100:1 내지 100:10, 또한 예를 들어 100:5 내지 100:10일 수 있다. 또한, 상기 화학식 1로 표시되는 코폴리머는 수 평균 분자량(Mn)이 10,000 내지 300,000 g/mol, 예를 들어, 30,000 내지 180,000 g/mol일 수 있다. 상기 범위에서, 상술한 범위의 굴절률을 가지면서도 광경화가 용이한 코폴리머의 제조가 가능하다.In this case, the copolymer represented by Formula 1 may have a molar ratio of n1: m1 of 100: 1 to 100: 20, for example, 100: 1 to 100: 10, and for example, 100: 5 to 100: 10. have. In addition, the copolymer represented by Chemical Formula 1 may have a number average molecular weight (Mn) of 10,000 to 300,000 g / mol, for example, 30,000 to 180,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.

구체적으로, 상기 화학식 1로 표시되는 코폴리머는, 하기 화학식 1-1 내지 1-3으로 표시되는 코폴리머 중 하나일 수 있다:Specifically, the copolymer represented by Chemical Formula 1 may be one of the copolymers represented by the following Chemical Formulas 1-1 to 1-3:

[화학식 1-1][Formula 1-1]

Figure PCTKR2017011005-appb-I000004
Figure PCTKR2017011005-appb-I000004

[화학식 1-2][Formula 1-2]

Figure PCTKR2017011005-appb-I000005
Figure PCTKR2017011005-appb-I000005

[화학식 1-3][Formula 1-3]

Figure PCTKR2017011005-appb-I000006
Figure PCTKR2017011005-appb-I000006

상기 화학식 1-1 내지 1-3에서, R, X-, n1 및 m1의 정의는 앞서 정의한 바와 같다.In Formulas 1-1 to 1-3, the definitions of R, X , n1, and m1 are as defined above.

또한, 상기 고굴절률층은 하기 화학식 3으로 표시되는 코폴리머를 더 포함할 수 있다:In addition, the high refractive index layer may further include a copolymer represented by the following formula (3):

[화학식 3][Formula 3]

Figure PCTKR2017011005-appb-I000007
Figure PCTKR2017011005-appb-I000007

상기 화학식 3에서,In Chemical Formula 3,

R5 및 R6은 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 5 and R 6 are each independently hydrogen or C 1-3 alkyl,

X11 내지 X15는 각각 독립적으로, N 또는 CR"이되, X11 내지 X15 중 적어도 하나는 N이고,X 11 to X 15 are each independently N or CR ″, at least one of X 11 to X 15 is N,

여기서 R"는 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,Wherein R ″ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,

L3은 O 또는 NH이고,L 3 is O or NH,

Y3은 벤조일페닐이고,Y 3 is benzoylphenyl,

여기서 Y3은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n3 및 m3은 각각 독립적으로 1 이상의 정수이고,n3 and m3 are each independently an integer of 1 or more,

n3+m3은 100 내지 1,000이다.n3 + m3 is 100-1,000.

상기 화학식 3으로 표시되는 코폴리머는, N원자 함유 6원 헤테로 고리기를 포함하는 반복 단위 및 광활성 관능기(Photo-active functional group, Y3)를 갖는 아크릴레이트(L3 = O) 또는 아크릴아미드(L3 = NH)계 모노머부터 유도된 반복 단위를 동시에 포함하는 고분자를 의미한다.The copolymer represented by the formula ( 3 ) is an acrylate (L 3 = O) or acrylamide (L 3 = O) having a repeating unit and a photo-active functional group (Y 3 ) containing an N atom-containing 6-membered heterocyclic group 3 = NH) means a polymer comprising a repeating unit derived from the monomer at the same time.

상기 고굴절률층에 상기 화학식 1로 표시되는 코폴리머에 상기 화학식 3으로 표시되는 코폴리머를 더 포함하는 경우, 금속이온과 착물 형성이 더 잘 될 수 있다. 이때, 상기 고굴절률층 내 상기 화학식 1로 표시되는 코폴리머 및 상기 화학식 3으로 표시되는 코폴리머의 몰비는 100: 0 내지 1: 99일 수 있다. 예를 들어, 상기 고굴절률층이 상기 화학식 1로 표시되는 코폴리머와 상기 화학식 3으로 표시되는 코폴리머를 동시에 포함하는 경우, 상기 고굴절률층 내 상기 화학식 1로 표시되는 코폴리머 및 상기 화학식 3으로 표시되는 코폴리머의 몰비는 90: 10 내지 10: 90일 수 있다.When the high refractive index layer further comprises a copolymer represented by Chemical Formula 3 in the copolymer represented by Chemical Formula 1, metal ions and complexes may be better formed. In this case, the molar ratio of the copolymer represented by Chemical Formula 1 and the copolymer represented by Chemical Formula 3 in the high refractive index layer may be 100: 0 to 1:99. For example, when the high refractive index layer includes the copolymer represented by the formula (1) and the copolymer represented by the formula (3) simultaneously, the copolymer represented by the formula (1) and the formula (3) in the high refractive index layer The molar ratio of copolymer represented may be 90:10 to 10:90.

더욱이, 상기 화학식 3으로 표시되는 코폴리머는 광활성 관능기(Y3)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머부터 유도된 반복 단위를 추가로 포함하여, 별도의 광개시제 혹은 가교제(crosslinker) 없이도 자체적으로 광경화가 가능할 수 있다.Furthermore, the copolymer represented by Chemical Formula 3 further includes repeating units derived from an acrylate or acrylamide-based monomer having a photoactive functional group (Y 3 ), so that photocuring by itself is performed without a separate photoinitiator or crosslinker. It may be possible.

이러한 상기 화학식 3으로 표시되는 코폴리머는, 스티렌계 모노머 및 광활성 관능기(Y3)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머를 랜덤하게 공중합하여 제조된, 상기 화학식 3의 대괄호 사이의 반복 단위들이 서로 랜덤하게 배열되어 있는 랜덤 코폴리머일 수 있다.The copolymer represented by Chemical Formula 3 is randomly copolymerized with styrene-based monomers and an acrylate or acrylamide-based monomer having a photoactive functional group (Y 3 ). It may be a random copolymer arranged so as to.

다르게는, 상기 화학식 3으로 표시되는 코폴리머는, 상기 화학식 3의 대괄호 사이의 반복 단위들의 블록이 공유 결합에 의해 연결되어 있는 블록 코폴리머일 수 있다. 또한 다르게는, 상기 화학식 3의 대괄호 사이의 반복 단위들이 교차되어 배열되어 있는 교호 코폴리머이거나, 혹은 어느 하나의 반복 단위가 가지 형태로 결합되어 있는 그라프트 코폴리머일 수 있으나, 상기 반복 단위들의 배열 형태가 한정되지는 않는다.Alternatively, the copolymer represented by Formula 3 may be a block copolymer in which blocks of repeating units between the brackets of Formula 3 are connected by covalent bonds. In addition, alternatively, it may be an alternating copolymer in which the repeating units between the brackets of Formula 3 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form, but the arrangement of the repeating units The form is not limited.

또한, 상기 화학식 3으로 표시되는 코폴리머는 1.5 내지 1.7의 굴절률을 나타낼 수 있다. 다만, 상기 화학식 3으로 표시되는 코폴리머와 상기 화학식 1로 표시되는 코폴리머의 굴절률은 상이할 수 있다.In addition, the copolymer represented by Formula 3 may exhibit a refractive index of 1.5 to 1.7. However, the refractive index of the copolymer represented by Formula 3 and the copolymer represented by Formula 1 may be different.

이때, 화학식 2으로 표시되는 코폴리머는 후술하는 광결정 구조체의 제조 방법의 4차화(Quarternization) 반응에서 화학식 4로 표시되는 화합물과 반응하지 않고 존재한다. 즉, 화학식 1로 표시되는 코폴리머는 상기 화학식 3으로 표시되는 코폴리머와 화학식 4로 표시되는 화합물의 반응에 의해 제조된 것이다.At this time, the copolymer represented by the formula (2) is present without reacting with the compound represented by the formula (4) in the quaternization reaction (Quarternization) of the method for producing a photonic crystal structure described later. That is, the copolymer represented by Formula 1 is prepared by the reaction of the copolymer represented by Formula 3 with the compound represented by Formula 4.

[화학식 4][Formula 4]

R-XR-X

상기 화학식 4에서,In Chemical Formula 4,

R은 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,R is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,

X는 이탈기(leaving group)이다.X is a leaving group.

구체적으로, 상기 화학식 1로 표시되는 코폴리머는 상기 화학식 3으로 표시되는 코폴리머가 포함된 고굴절률층이 적층된 구조체를 화학식 4로 표시되는 화합물과 4차화 반응시켜 생성되는 것으로, 상기 4차화 반응에 참여하지 않은 상기 화학식 3으로 표시되는 코폴리머는 최종 제조된 광결정 구조체 내에 남아있을 수 있다. 따라서, 상기 고굴절률층 내의 상기 화학식 1로 표시되는 코폴리머와 상기 화학식 3으로 표시되는 코폴리머의 몰비는 4차화 반응 조건에 따라 조절할 수 있다.Specifically, the copolymer represented by Formula 1 is produced by quaternization reaction of the structure represented by the compound represented by Formula 4 by laminating a structure having a high refractive index layer containing the copolymer represented by Formula 3, the quaternization reaction The copolymer represented by Chemical Formula 3, which does not participate in, may remain in the finally prepared photonic crystal structure. Therefore, the molar ratio of the copolymer represented by Chemical Formula 1 and the copolymer represented by Chemical Formula 3 in the high refractive index layer may be adjusted according to the quaternization reaction conditions.

상기 화학식 3에서, R5 및 R6은 각각 독립적으로 수소 또는 메틸일 수 있다. 예를 들어, R5 및 R6은 수소일 수 있다.In Formula 3, R 5 and R 6 may be each independently hydrogen or methyl. For example, R 5 and R 6 can be hydrogen.

또한, X11은 N이고, X12 내지 X15는 각각 독립적으로 CR"이거나;And X 11 is N and X 12 to X 15 are each independently CR ″;

X12는 N이고, X11, X13 내지 X15는 각각 독립적으로 CR"이거나; 또는X 12 is N and X 11 , X 13 to X 15 are each independently CR ″; or

X13은 N이고, X11, X12, X14 및 X15는 각각 독립적으로 CR"일 수 있다.X 13 is N and X 11 , X 12 , X 14 and X 15 may each independently be CR ″.

이때, R"는 수소 또는 C1-10 알킬일 수 있다. 예를 들어, R"는 수소, 메틸, 에틸, 또는 페닐일 수 있다.Wherein R ″ may be hydrogen or C 1-10 alkyl. For example, R ″ may be hydrogen, methyl, ethyl, or phenyl.

또한, 상기 화학식 1 및 3에서, X1이 N+RBr-이고, X11이 N이고, X2 내지 X5 및 X12 내지 X15는 CH이거나;In addition, in Chemical Formulas 1 and 3, X 1 is N + RBr , X 11 is N, and X 2 to X 5 and X 12 to X 15 are CH;

X2가 N+RBr-이고, X12가 N이고, X1, X3 내지 X5, X11 및 X13 내지 X15는 CH이거나; 또는A 2 X N + RBr - a, and X 12 is N, X 1, X 3 to X 5, X 11 and X 13 to X 15 is CH; or

X3이 N+RBr-이고, X13가 N이고, X1, X2, X4, X5, X11, X12, X14 및 X15는 CH이고,And a, and X 13 is N, X 1, X 2, X 4, X 5, X 11, X 12, X 14 and X 15 are CH, - X 3 is N + RBr

여기서, R은 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, sec-부필, tert-부틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 페닐, 벤질, 또는 페닐에틸일 수 있다. 이는 상술한 바와 같이 상기 화학식 1로 표시되는 코폴리머가 상기 화학식 3으로 표시되는 코폴리머로부터 유도된 것에 기인한다.Wherein R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, or phenyl May be ethyl. This is due to the copolymer represented by the formula (1) derived from the copolymer represented by the formula (3) as described above.

또한, 상기 화학식 3에서, Y3은 비치환되거나, 또는 C1-3 알킬로 치환된 벤조일페닐일 수 있다. Y3이 벤조일페닐인 경우, 광경화의 용이성 측면에서 유리할 수 있다.In addition, in Formula 3, Y 3 may be unsubstituted or benzoylphenyl substituted with C 1-3 alkyl. When Y 3 is benzoylphenyl, it may be advantageous in view of the ease of photocuring.

또한, 상기 화학식 3에서, n3은 상기 코폴리머 내 N원자 함유 6원 헤테로 고리기를 포함하는 반복 단위의 총 개수를 의미하고, m3은 상기 코폴리머 내 광활성 관능기를 갖는 아크릴레이트 또는 아크릴아미드계 모노머로부터 유도된 반복 단위의 총 개수를 의미한다.In addition, in Formula 3, n3 means the total number of repeating units including N-membered 6-membered heterocyclic group in the copolymer, m3 is from an acrylate or acrylamide monomer having a photoactive functional group in the copolymer The total number of derived repeating units.

이때, 상기 화학식 3으로 표시되는 코폴리머는 n3:m3의 몰비가 100:1 내지 100:20, 예를 들어, 100:1 내지 100:10, 또한 예를 들어 100:5 내지 100:10일 수 있다. 또한, 상기 화학식 3으로 표시되는 코폴리머는 수 평균 분자량(Mn)이 10,000 내지 300,000 g/mol, 예를 들어, 30,000 내지 180,000 g/mol일 수 있다. 상기 범위에서, 상술한 범위의 굴절률을 가지면서도 광경화가 용이한 코폴리머의 제조가 가능하다.In this case, the copolymer represented by Formula 3 may have a molar ratio of n3: m3 of 100: 1 to 100: 20, for example, 100: 1 to 100: 10, and for example, 100: 5 to 100: 10. have. In addition, the copolymer represented by Chemical Formula 3 may have a number average molecular weight (Mn) of 10,000 to 300,000 g / mol, for example, 30,000 to 180,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.

구체적으로, 상기 화학식 3으로 표시되는 코폴리머는, 하기 화학식 3-1 내지 3-3으로 표시되는 코폴리머 중 하나일 수 있다:Specifically, the copolymer represented by Chemical Formula 3 may be one of the copolymers represented by the following Chemical Formulas 3-1 to 3-3:

[화학식 3-1][Formula 3-1]

Figure PCTKR2017011005-appb-I000008
Figure PCTKR2017011005-appb-I000008

[화학식 3-2][Formula 3-2]

Figure PCTKR2017011005-appb-I000009
Figure PCTKR2017011005-appb-I000009

[화학식 3-3][Formula 3-3]

Figure PCTKR2017011005-appb-I000010
Figure PCTKR2017011005-appb-I000010

상기 화학식 3-1 내지 3-3에서, n3 및 m3의 정의는 앞서 정의한 바와 같다.In Formulas 3-1 to 3-3, n3 and m3 are as defined above.

저굴절률층Low refractive index layer

본 발명에서 사용하는 용어 '저굴절률층'은 광결정 구조체 내에 포함된 두 종류의 층 중에서 상대적으로 굴절률이 낮은 층을 의미한다. 상기 저굴절률층에 포함된 폴리머는 상기 화학식 1로 표시되는 코폴리머가 아닌, 상기 제1 폴리머 및 상기 제2 폴리머 중 다른 하나로서, 다음의 모노머로부터 유도된 구조 단위를 포함하여, 상기 화학식 1로 표시되는 코폴리머에 비하여 낮은 굴절률을 나타낼 수 있다: 플루오로알킬 아크릴아마이드, 플루오로알킬 아크릴레이트 및 이들의 유도체. 이들은 단독 또는 2 종 이상 혼합하여 적용될 수 있다. 또한, 상기 제1 폴리머 및 상기 제2 폴리머 중 다른 하나로서, 상기 플루오로알킬 아크릴아마이드, 플루오로알킬 아크릴레이트 및 이들의 유도체와 다른 모노머와의 공중합에 의한 코폴리머 또한 사용 가능하다.The term 'low refractive index layer' used in the present invention means a layer having a relatively low refractive index among two kinds of layers included in the photonic crystal structure. The polymer included in the low refractive index layer is not the copolymer represented by Chemical Formula 1, but is another of the first polymer and the second polymer, and includes a structural unit derived from the following monomer, It may exhibit low refractive index relative to the copolymers represented: fluoroalkyl acrylamides, fluoroalkyl acrylates and derivatives thereof. These can be applied individually or in mixture of 2 or more types. In addition, as the other of the first polymer and the second polymer, copolymers by copolymerization of the fluoroalkyl acrylamide, fluoroalkyl acrylate and derivatives thereof with other monomers can also be used.

구체적으로, 상기 화학식 1로 표시되는 코폴리머가 아닌, 상기 제1 폴리머 및 상기 제2 폴리머 중 다른 하나는, 하기 화학식 2로 표시되는 코폴리머일 수 있다:Specifically, other than the copolymer represented by Formula 1, the other of the first polymer and the second polymer may be a copolymer represented by the following formula (2):

[화학식 2][Formula 2]

Figure PCTKR2017011005-appb-I000011
Figure PCTKR2017011005-appb-I000011

상기 화학식 2에서,In Chemical Formula 2,

R3 및 R4는 각각 독립적으로 수소 또는 C1-3 알킬이고,R 3 and R 4 are each independently hydrogen or C 1-3 alkyl,

A는 C1-10 플루오로알킬이고,A is C 1-10 fluoroalkyl,

L2는 O 또는 NH이고,L 2 is O or NH,

Y2는 벤조일페닐이고,Y 2 is benzoylphenyl,

여기서 Y2는 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 2 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n2 및 m2는 각각 독립적으로 1 이상의 정수이고,n2 and m2 are each independently an integer of 1 or more,

n2+m2는 100 내지 1,000이다.n2 + m2 is 100-1,000.

상기 화학식 2로 표시되는 코폴리머는, 플루오로알킬(A) 아크릴레이트계 모노머로부터 유도된 반복 단위 및 광활성 관능기(Y2)를 갖는 아크릴레이트(L2= O) 또는 아크릴아미드(L2 = NH)계 모노머부터 유도된 반복 단위를 동시에 포함하는 고분자를 의미한다.The copolymer represented by the formula ( 2 ) is an acrylate (L 2 = O) or acrylamide (L 2 = NH) having a repeating unit derived from a fluoroalkyl (A) acrylate monomer and a photoactive functional group (Y 2 ) It means a polymer containing a repeating unit derived from a) monomer at the same time.

상기 화학식 2로 표시되는 코폴리머가 플루오로알킬(A) 아크릴레이트계 모노머로부터 유도된 반복 단위를 포함하는 경우, 상기 반복 단위를 포함하지 않는 폴리머에 비하여 굴절률이 낮고, 열적 안정성, 내화학성, 산화 안정성 등 화학적 성질이 우수하며, 투명성이 뛰어나다. 여기서, '플루오로알킬'은, 하나 이상의 불소 원자가 알킬의 수소 원자를 치환하고 있는 작용기를 의미하며, 이때 하나 이상의 불소 원자는 C1-10 알킬의 말단 뿐만 아니라 측쇄의 수소 원자를 치환할 수도 있으며, 2개 이상의 불소 원자는 하나의 탄소 원자에 모두 결합되어 있거나, 혹은 2개 이상의 탄소 원자에 각각 결합되어 있을 수 있다.When the copolymer represented by the formula (2) includes a repeating unit derived from a fluoroalkyl (A) acrylate monomer, the refractive index is lower than that of the polymer not containing the repeating unit, and the thermal stability, chemical resistance, and oxidation Excellent chemical properties such as stability and excellent transparency. Here, 'fluoroalkyl' refers to a functional group in which one or more fluorine atoms are substituted for the hydrogen atom of alkyl, wherein one or more fluorine atoms may be substituted for the hydrogen atom of the side chain as well as the terminal of C 1-10 alkyl, , Two or more fluorine atoms may be all bonded to one carbon atom, or each may be bonded to two or more carbon atoms.

또한, 상기 화학식 2로 표시되는 코폴리머 내 불소 원자의 수가 증가할수록 굴절률이 더욱 낮아지고, 소수성이 증가할 수 있어, 불소 원자의 수에 따라 고굴절률층과 저굴절률층간의 굴절률 차이를 조절하여 원하는 반사 파장을 갖는 색변환 광결정 구조체가 구현될 수 있다.In addition, as the number of fluorine atoms in the copolymer represented by Formula 2 increases, the refractive index becomes lower and the hydrophobicity may increase, thereby controlling the difference in refractive index between the high refractive index layer and the low refractive index layer according to the number of fluorine atoms. Color conversion photonic crystal structure having a reflection wavelength can be implemented.

더욱이, 상기 화학식 2로 표시되는 코폴리머는 광활성 관능기(Y2)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머부터 유도된 반복 단위를 추가로 포함하여, 별도의 광개시제 혹은 가교제 없이도 자체적으로 광경화가 가능할 수 있다.Furthermore, the copolymer represented by Chemical Formula 2 may further include a repeating unit derived from an acrylate or acrylamide monomer having a photoactive functional group (Y 2 ), and may be photocurable by itself without a separate photoinitiator or crosslinking agent. .

이러한 상기 화학식 2로 표시되는 코폴리머는, 플루오로알킬(A) 아크릴레이트계 모노머 및 광활성 관능기(Y2)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머를 랜덤하게 공중합하여 제조된, 상기 화학식 2의 대괄호 사이의 반복 단위들이 서로 랜덤하게 배열되어 있는 랜덤 코폴리머일 수 있다.The copolymer represented by Formula 2 is a square bracket of Formula 2 prepared by random copolymerization of a fluoroalkyl (A) acrylate monomer and an acrylate or acrylamide monomer having a photoactive functional group (Y 2 ). It may be a random copolymer in which repeating units in between are randomly arranged with each other.

다르게는, 상기 화학식 2로 표시되는 코폴리머는, 상기 화학식 2의 대괄호 사이의 반복 단위들의 블록이 공유 결합에 의해 연결되어 있는 블록 코폴리머일 수 있다. 또한 다르게는, 상기 화학식 2의 대괄호 사이의 반복 단위들이 교차되어 배열되어 있는 교호 코폴리머이거나, 혹은 어느 하나의 반복 단위가 가지 형태로 결합되어 있는 그라프트 코폴리머일 수 있으나, 상기 반복 단위들의 배열 형태가 한정되지는 않는다.Alternatively, the copolymer represented by Formula 2 may be a block copolymer in which blocks of repeating units between the brackets of Formula 2 are connected by covalent bonds. In addition, alternatively, it may be an alternating copolymer in which the repeating units between the brackets of Formula 2 are arranged alternately, or may be a graft copolymer in which any one of the repeating units is combined in a branched form, but the arrangement of the repeating units The form is not limited.

이러한 상기 화학식 2로 표시되는 코폴리머는 1.3 내지 1.5의 굴절률을 나타낼 수 있다. 상술한 범위일 때, 상술한 고굴절률층에 사용된 상기 화학식 1로 표시되는 코폴리머와의 굴절률 차이에 의해 원하는 파장의 빛을 반사하는 광결정 구조체가 구현될 수 있다.The copolymer represented by Formula 2 may exhibit a refractive index of 1.3 to 1.5. In the above-described range, a photonic crystal structure reflecting light of a desired wavelength may be implemented by a difference in refractive index with the copolymer represented by Chemical Formula 1 used in the above-described high refractive index layer.

상기 화학식 2에서, R3 및 R4는 각각 독립적으로 수소 또는 메틸일 수 있다. 예를 들어, R3 및 R4는 수소일 수 있다.In Formula 2, R 3 and R 4 may be each independently hydrogen or methyl. For example, R 3 and R 4 can be hydrogen.

또한, 상기 화학식 2에서, A는 C1-5 플루오로알킬일 수 있다.In addition, in Formula 2, A may be C1-5 fluoroalkyl.

예를 들어, A는 플루오로메틸, 디플루오로메틸, 트리플루오로메틸, 1-플루오로에틸, 2-플루오로에틸, 1,1-디플루오로에틸, 1,2-디플루오로에틸, 2,2-디플루오로에틸, 1,1,2-트리플루오로에틸, 1,2,2-트리플루오로에틸, 2,2,2-트리플루오로에틸, 1-플로오로프로필, 2-플루오로프로필, 1,1-디플루오로프로필, 1,2-디플루오로프로필, 2,2-디플루오로프로필, 1,1,2-트리플루오로프로필, 1,2,2-트리플루오로프로필, 2,2,2-트리플루오로프로필, 1-플로오로부틸, 2-플루오로부틸, 1,1-디플루오로부틸, 1,2-디플루오로부틸, 2,2-디플루오로부틸, 1,1,2-트리플루오로부틸, 1,2,2-트리플루오로부틸 또는 2,2,2-트리플루오로부틸일 수 있다.For example, A is fluoromethyl, difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, 1,2-difluoroethyl, 2,2-difluoroethyl, 1,1,2-trifluoroethyl, 1,2,2-trifluoroethyl, 2,2,2-trifluoroethyl, 1-fluoropropyl, 2- Fluoropropyl, 1,1-difluoropropyl, 1,2-difluoropropyl, 2,2-difluoropropyl, 1,1,2-trifluoropropyl, 1,2,2-trifluoro Ropropyl, 2,2,2-trifluoropropyl, 1-fluorobutyl, 2-fluorobutyl, 1,1-difluorobutyl, 1,2-difluorobutyl, 2,2-difluoro Robutyl, 1,1,2-trifluorobutyl, 1,2,2-trifluorobutyl or 2,2,2-trifluorobutyl.

또한, 상기 화학식 2에서, Y2는 비치환되거나, 또는 C1-3 알킬로 치환된 벤조일페닐일 수 있다. Y2가 벤조일페닐인 경우, 광경화의 용이성 측면에서 유리하다.In addition, in Chemical Formula 2, Y 2 may be unsubstituted or benzoylphenyl substituted with C 1-3 alkyl. When Y 2 is benzoylphenyl, it is advantageous in view of the ease of photocuring.

또한, 상기 화학식 2에서, n2는 상기 코폴리머 내 플루오로알킬 아크릴레이트계 모노머로부터 유도된 반복 단위의 총 개수를 의미하고, m2는 상기 코폴리머 내 광활성 관능기(Y2)를 갖는 아크릴레이트 또는 아크릴아미드계 모노머로부터 유도된 반복 단위의 총 개수를 의미한다.In addition, in Formula 2, n2 means the total number of repeating units derived from the fluoroalkyl acrylate-based monomer in the copolymer, m2 is an acrylate or acryl having a photoactive functional group (Y 2 ) in the copolymer The total number of repeat units derived from amide monomers.

이때, 상기 화학식 2로 표시되는 코폴리머는 n2:m2의 몰비가 100:1 내지 100:10일 수 있고, 수 평균 분자량이 10,000 내지 100,000 g/mol일 수 있다.In this case, the copolymer represented by Formula 2 may have a molar ratio of n 2: m 2 of 100: 1 to 100: 10 and a number average molecular weight of 10,000 to 100,000 g / mol.

예를 들어, 상기 화학식 2로 표시되는 코폴리머는 n2:m2의 몰비가 100:1 내지 100:5, 구체적으로 100:1 내지 100:2일 수 있다. 또한 예를 들어, 상기 화학식 2로 표시되는 코폴리머는 수 평균 분자량이 20,000 내지 80,000 g/mol, 구체적으로 20,000 내지 60,000 g/mol일 수 있다. 상기 범위에서, 상술한 범위의 굴절률을 가지면서도 광경화가 용이한 코폴리머의 제조가 가능하다.For example, the copolymer represented by Formula 2 may have a molar ratio of n 2: m 2 of 100: 1 to 100: 5, specifically 100: 1 to 100: 2. In addition, for example, the copolymer represented by Chemical Formula 2 may have a number average molecular weight of 20,000 to 80,000 g / mol, specifically 20,000 to 60,000 g / mol. In the above range, it is possible to produce a copolymer having a refractive index in the above-described range and easy photocuring.

구체적으로, 상기 화학식 2로 표시되는 코폴리머는, 하기 화학식 2-1 내지 2-3으로 표시되는 코폴리머 중 하나일 수 있다:Specifically, the copolymer represented by Chemical Formula 2 may be one of the copolymers represented by the following Chemical Formulas 2-1 to 2-3:

[화학식 2-1][Formula 2-1]

Figure PCTKR2017011005-appb-I000012
Figure PCTKR2017011005-appb-I000012

[화학식 2-2][Formula 2-2]

Figure PCTKR2017011005-appb-I000013
Figure PCTKR2017011005-appb-I000013

[화학식 2-3][Formula 2-3]

Figure PCTKR2017011005-appb-I000014
Figure PCTKR2017011005-appb-I000014

상기 화학식 2-1 내지 2-3에서, n2 및 m2의 정의는 앞서 정의한 바와 같다.In Formulas 2-1 to 2-3, n2 and m2 are as defined above.

색변환Color conversion 광결정Photonic crystal 구조체 Structure

본 발명에 따른 색변환 광결정 구조체는, 최하부에 배치된 제1 굴절률층, 상기 제1 굴절률층 상에 배치된 제2 굴절률층 및 상기 제2 굴절률층 상에 제1 굴절률층 및 제2 굴절률층이 교대로 반복되어 적층된 구조를 갖는다.The color conversion photonic crystal structure according to the present invention includes a first refractive index layer disposed on a lowermost portion, a second refractive index layer disposed on the first refractive index layer, and a first refractive index layer and a second refractive index layer on the second refractive index layer. It is alternately repeated to have a stacked structure.

또한, 상기 색변환 광결정 구조체는, 용도에 따라 상기 최하부에 배치된 제1 굴절률층의 제2 굴절률층이 배치되지 않은 다른 일면에 기판을 더 포함할 수 있다. 따라서, 이 경우 상기 색변환 광결정 구조체의 최하부에는 기판이 위치할 수 있다.In addition, the color conversion photonic crystal structure may further include a substrate on the other surface of the first refractive index layer of the first refractive index layer disposed on the lowermost part according to the use. Therefore, in this case, the substrate may be positioned at the bottom of the color conversion photonic crystal structure.

이하, 본 발명의 일 구현예에 따른 색변환 광결정 구조체(10) 의 개략적인 구조를 도 1을 참조하여 설명한다.Hereinafter, a schematic structure of the color conversion photonic crystal structure 10 according to an embodiment of the present invention will be described with reference to FIG. 1.

도 1을 참조하면, 일 구현예에 따른 색변환 광결정 구조체(10)는 기판(11), 및 상기 기판(11) 상에 교대로 적층된 제1 굴절률층(13) 및 제2 굴절률층(15)으로 구성된다.Referring to FIG. 1, a color conversion photonic crystal structure 10 according to an embodiment may include a substrate 11 and a first refractive index layer 13 and a second refractive index layer 15 alternately stacked on the substrate 11. It is composed of

이때, 제1 굴절률층(13)은 색변환 광결정 구조체의 최상부에 위치할 수 있다. 따라서, 제1 굴절률층(13)과 제2 굴절률층(15)이 교대로 적층된 적층체 상에 제1 굴절률층(13)이 추가로 적층되어, 상기 광결정 구조체는 홀수 개 층의 굴절률층을 가질 수 있다. 상기의 경우에, 후술하는 바와 같이 각각의 층의 경계면에서 반사된 빛들 간의 보강 간섭이 증가하여, 광결정 구조체의 반사 파장의 강도가 증가할 수 있다.In this case, the first refractive index layer 13 may be positioned on the top of the color conversion photonic crystal structure. Accordingly, the first refractive index layer 13 is further laminated on the laminate in which the first refractive index layer 13 and the second refractive index layer 15 are alternately stacked, so that the photonic crystal structure includes an odd refractive index layer. Can have In this case, constructive interference between the lights reflected at the interface of each layer is increased, as described later, so that the intensity of the reflection wavelength of the photonic crystal structure can be increased.

상기 기판(11)은 기계적 강도, 열적 안정성, 투명성, 표면 평활성, 취급 용이성 및 방수성이 우수한 탄소계 재료, 금속 포일, 박막 유리(thin glass), 실리콘(Si), 플라스틱, 폴리에틸렌(PE), 폴리에틸렌테레프탈레이트(PET), 폴리프로필렌(PP) 등과 같은 고분자 필름, 종이, 피부, 의류, 또는 웨어러블 소재일 수 있으나, 이에 한정되지 않으며, 적용되는 용도에 따라 가요성이 있거나 혹은 가요성이 없는 다양한 소재를 이용할 수 있다.The substrate 11 is a carbon-based material, metal foil, thin glass, silicon (Si), plastic, polyethylene (PE), polyethylene having excellent mechanical strength, thermal stability, transparency, surface smoothness, ease of handling and waterproofing It may be a polymer film such as terephthalate (PET), polypropylene (PP), paper, skin, clothing, or a wearable material, but is not limited thereto, and various materials that are flexible or not flexible depending on the intended application. Can be used.

상기 기판(11) 상에 교대로 적층된 상기 제1 굴절률층(13)은 제1 굴절률(n1)을 나타내는 제1 폴리머를 포함하고, 상기 제2 굴절률층(15)은 제2 굴절률(n2)을 나타내는 제2 폴리머를 포함한다. 이때, 상기 제1 굴절률(n1)과 상기 제2 굴절률(n2)의 차이는 0.01 내지 0.5일 수 있다. 예를 들어, 상기 제1 굴절률(n1)과 상기 제2 굴절률(n2)의 차이는 0.05 내지 0.3, 구체적으로 0.1 내지 0.2일 수 있다. 이러한 굴절률간의 차이가 클수록 광결정 구조체의 광 밴드갭이 커지므로, 상술한 범위 내에서 굴절률간의 차이를 조절하여 원하는 파장의 빛이 반사되도록 제어할 수 있다.The first refractive index layer 13, which is alternately stacked on the substrate 11, includes a first polymer exhibiting a first refractive index n1, and the second refractive index layer 15 has a second refractive index n2. It includes a second polymer that represents. In this case, a difference between the first refractive index n1 and the second refractive index n2 may be 0.01 to 0.5. For example, the difference between the first refractive index n1 and the second refractive index n2 may be 0.05 to 0.3, specifically 0.1 to 0.2. As the difference between the refractive indices increases, the optical band gap of the photonic crystal structure increases, so that the light having a desired wavelength may be reflected by adjusting the difference between the refractive indices within the above-described range.

예를 들어, 상기 제1 굴절률(n1)은 1.5 내지 1.7이고, 상기 제2 굴절률 (n2)은 1.3 내지 1.5일 수 있다. 다시 말하면, 상기 제1 굴절률층(13)이 고굴절률층이고, 상기 제2 굴절률층(15)이 저굴절률층에 해당되어, 상기 광결정 구조체(10)는 기판(11) 상에 고굴절률층/ 저굴절률층/ 고굴절률층/ 저굴절률층/ 고굴절률층이 순차적으로 적층된 구조를 가질 수 있다.For example, the first refractive index n1 may be 1.5 to 1.7, and the second refractive index n2 may be 1.3 to 1.5. In other words, the first refractive index layer 13 is a high refractive index layer, and the second refractive index layer 15 corresponds to a low refractive index layer, so that the photonic crystal structure 10 is disposed on the substrate 11. The low refractive index layer / high refractive index layer / low refractive index layer / high refractive index layer may have a structure stacked sequentially.

다르게는, 상기 제1 굴절률(n1)은 1.3 내지 1.5이고, 상기 제2 굴절률(n2)은 1.5 내지 1.7일 수 있다. 다시 말하면, 상기 제1 굴절률층(13)이 저굴절률층이고, 상기 제2 굴절률층(15)이 고굴절률층에 해당되어, 상기 광결정 구조체(10)는 기판(11) 상에 저굴절률층/ 고굴절률층/ 저굴절률층/ 고굴절률층/ 저굴절률층이 순차적으로 적층된 구조를 가질 수 있다.Alternatively, the first refractive index n1 may be 1.3 to 1.5, and the second refractive index n2 may be 1.5 to 1.7. In other words, the first refractive index layer 13 is a low refractive index layer, and the second refractive index layer 15 corresponds to a high refractive index layer, so that the photonic crystal structure 10 is formed on the substrate 11. The high refractive index layer / low refractive index layer / high refractive index layer / low refractive index layer may have a structure that is sequentially stacked.

또한, 상기 저굴절률층의 두께 대 상기 고굴절률층의 두께의 비는 1:4 내지 1:0.5일 수 있다. 구체적으로, 상기 저굴절률층의 두께는 25 내지 70 nm이고, 상기 고굴절률층의 두께는 50 내지 160 nm일 수 있다. 상술한 범위로 두께를 조절하여, 광결정 구조체의 반사 파장을 조절할 수 있다. 각 굴절률층의 두께는 폴리머 분산액 조성물 내 폴리머의 농도 또는 분산액 조성물의 코팅 속도를 달리하여 조절 가능하다.In addition, the ratio of the thickness of the low refractive index layer to the thickness of the high refractive index layer may be 1: 4 to 1: 0.5. Specifically, the thickness of the low refractive index layer is 25 to 70 nm, the thickness of the high refractive index layer may be 50 to 160 nm. By adjusting the thickness in the above-described range, it is possible to adjust the reflection wavelength of the photonic crystal structure. The thickness of each refractive index layer can be adjusted by varying the concentration of the polymer in the polymer dispersion composition or the coating speed of the dispersion composition.

특히, 상기 광결정성 구조체는 색변환 용이 측면에서 상기 제1 굴절률층이 50 내지 160 nm의 두께로 형성된 고굴절률층이고, 상기 제2 굴절률층이 25 내지 70 nm의 두께로 형성된 저굴절률층이며, 상기 고굴절률층이 최상부에 위치된 구조가 바람직하다.In particular, the photonic crystal structure is a high refractive index layer formed with a thickness of 50 to 160 nm, the second refractive index layer is a low refractive index layer formed with a thickness of 25 to 70 nm in terms of easy color conversion, It is preferable that the high refractive index layer is located at the top.

도 1에서는 총 5층으로 구성된 광결정 구조체(10)만을 도시하나, 상기 광결정 구조체의 총 적층수가 이에 한정되는 것은 아니다. 구체적으로, 상기 제1 굴절률층과 상기 제2 굴절률층의 총 적층수는 5 내지 30 층일 수 있다. 상술한 범위로 적층된 구조체일 경우에, 각각의 층 경계 면에서 반사된 빛들의 간섭이 충분히 일어나 외부 자극에 따른 색의 변화가 감지될 정도의 반사 강도를 가질 수 있다.In FIG. 1, only the photonic crystal structure 10 having a total of five layers is illustrated, but the total number of stacked layers of the photonic crystal structure is not limited thereto. Specifically, the total number of stacked layers of the first refractive index layer and the second refractive index layer may be 5 to 30 layers. In the case of the structures stacked in the above-described range, the interference of the reflected light at each layer boundary surface is sufficiently generated to have a reflection intensity such that a change in color due to an external stimulus is detected.

한편, 상기 색변환 광결정 구조체(10)에 등비례의 모든 색으로 이루어진 다색의 백색광이 입사되면, 각각의 층 경계면에서 입사광의 부분 반사가 일어나게 되고, 이렇게 부분 반사된 빛들의 간섭에 의해 하나의 파장으로 집중된 반사파장(λ)에 따른 색을 나타낼 수 있다.On the other hand, when the multi-colored white light of all colors in equal proportion is incident on the color conversion photonic crystal structure 10, partial reflection of incident light occurs at each layer boundary surface, and one wavelength is caused by the interference of the partially reflected light. It can represent the color according to the reflected wavelength (λ).

구체적으로, 상기 색변환 광결정 구조체(10)의 반사 파장(λ)은 하기 식 1에 의해 결정될 수 있다:Specifically, the reflection wavelength λ of the color conversion photonic crystal structure 10 may be determined by Equation 1 below:

[식 1][Equation 1]

λ = 2(n1*d1 + n2*d2)λ = 2 (n1 * d1 + n2 * d2)

상기 식에서, n1 및 n2는 각각 제1 굴절률층(13) 및 제2 굴절률층(15)의 굴절률을 의미하고, d1 및 d2는 각각 제1 굴절률층(13) 및 제2 굴절률층(15)의 두께를 의미한다. 따라서, 제1 및 제2 폴리머의 종류 및 제1 굴절률층(13) 및 제2 굴절률층(15)의 두께를 조절하여 원하는 반사 파장(λ)을 구현할 수 있다.Wherein n1 and n2 are the refractive indices of the first and second refractive index layers 13 and 15, respectively, and d1 and d2 are the refractive indices of the first and second refractive index layers 13 and 15, respectively. Means thickness. Accordingly, the desired reflection wavelength λ may be realized by adjusting the types of the first and second polymers and the thicknesses of the first refractive index layer 13 and the second refractive index layer 15.

상기 색변환 광결정 구조체(10)는, 외부 자극이 없는 경우에 상기 수학식 1에 따라 380 내지 760 nm의 가시 광선 영역에 해당하는 반사 파장(λ)을 나타내어, 상기 광결정 구조체에 의한 반사색을 확인할 수 있다.When there is no external stimulus, the color conversion photonic crystal structure 10 exhibits a reflection wavelength λ corresponding to a visible light region of 380 to 760 nm according to Equation 1 to confirm the reflection color by the photonic crystal structure. Can be.

이러한 상기 색변환 광결정 구조체(10)가 외부 자극을 받는 환경에 위치되는 경우, 제1 굴절률층(13) 및 제2 굴절률층(15)을 각각 구성하고 있는 제1 폴리머 및 제2 폴리머의 결정 격자 구조가 변화하게 됨으로써, 각각의 층 경계면에서 산란되는 형태가 변화함에 따라, 상기 광결정 구조체(10)는 시프트된 파장(λ')을 반사하게 된다. 따라서, 외부 자극이 없는 경우와 비교하여 광결정 구조체에 의해 구현되는 색이 변환될 수 있다. 만일 외부 자극의 강도가 높다면, 상기 제1 폴리머 및 제2 폴리머의 결정 격자 구조의 변화의 정도가 커져 반사 파장은 더욱 시프트되게 되므로, 구현되는 색에 따라 외부 자극의 강도를 검출할 수 있다.When the color conversion photonic crystal structure 10 is positioned in an environment subject to external stimulation, the crystal lattice of the first polymer and the second polymer constituting the first refractive index layer 13 and the second refractive index layer 15, respectively As the structure is changed, the photonic crystal structure 10 reflects the shifted wavelength [lambda] 'as the shape scattered at each layer boundary is changed. Therefore, the color implemented by the photonic crystal structure can be converted as compared with the case where there is no external stimulus. If the intensity of the external stimulus is high, since the degree of change of the crystal lattice structure of the first polymer and the second polymer is increased and the reflection wavelength is further shifted, the intensity of the external stimulus can be detected according to the color to be implemented.

상기 광결정 구조체(10)의 색변환은 습도의 변화에 따라 반사 파장이 시프트되어 나타난다. 즉, 상기 광결정 구조체(10)의 반사 파장의 시프트는 수분 흡수시 고굴절률층에 포함된 상기 화학식 1로 표시되는 코폴리머의 굴절률의 변화 및 고굴절률층의 두께 증가에 기인한다. 이때, 수분이 흡수된 광결정 구조체의 고굴절률층은 상기 광결정 구조체(10)의 고굴절률층 대비 1 배 내지 3 배의 두께를 가질 수 있다.In the color conversion of the photonic crystal structure 10, the reflection wavelength is shifted as the humidity changes. That is, the shift in the reflection wavelength of the photonic crystal structure 10 is due to the change in the refractive index of the copolymer represented by Formula 1 included in the high refractive index layer and the increase in the thickness of the high refractive index layer when absorbing moisture. In this case, the high refractive index layer of the photonic crystal structure in which moisture is absorbed may have a thickness of 1 to 3 times that of the high refractive index layer of the photonic crystal structure 10.

구체적으로, 상기 광결정 구조체가 수분과 접촉하는 경우, 예를 들어, 상기 광결정 구조체가 수분이 포함된 공기에 노출되거나 혹은 액체인 물에 함침되는 경우, 상기 화학식 1로 표시되는 코폴리머는 수분을 흡수하여 팽윤되고, 이에 따라 고굴절률층의 두께가 변하게 된다. 이는, 상기 화학식 1로 표시되는 코폴리머는 4차 암모늄 양이온 및 이의 상대 음이온을 포함하여 극성이 큰 물과 반응성이 우수하기 때문이다. 따라서, 상기 식 1에 따른 상기 광결정 구조체(10)의 반사파장이 시프트될 수 있다. 이때, 시프트된 반사 파장(λ')은 380 nm 내지 760 nm 범위 내여서 육안으로 색변화를 관찰할 수 있다. 상기 반사 파장(λ) 및 시프트된 반사 파장(λ')은 반사계(Reflectometer)와 같은 장치로 측정 가능하다.Specifically, when the photonic crystal structure is in contact with moisture, for example, when the photonic crystal structure is exposed to air containing moisture or impregnated with liquid water, the copolymer represented by Chemical Formula 1 absorbs moisture. And swelling, thereby changing the thickness of the high refractive index layer. This is because the copolymer represented by Chemical Formula 1 is excellent in reactivity with water having high polarity, including quaternary ammonium cation and its counter anion. Therefore, the reflected wavelength of the photonic crystal structure 10 according to Equation 1 may be shifted. In this case, the shifted reflection wavelength λ ′ is within a range of 380 nm to 760 nm, so that color change can be observed with the naked eye. The reflection wavelength [lambda] and the shifted reflection wavelength [lambda] 'can be measured by a device such as a reflectometer.

또한, 상기 광결정 구조체는 습도가 높을수록, 즉 수분 함량이 높을수록, 장파장으로 반사 파장이 시프트될 수 있다. 따라서, 상기 광결정 구조체의 시프트된 반사 파장(λ')은 외부 자극이 없는 경우의 반사 파장(λ)에 비해 큰 값을 가질 수 있다.In addition, the higher the humidity, that is, the higher the moisture content of the photonic crystal structure, the reflection wavelength may be shifted to a longer wavelength. Therefore, the shifted reflection wavelength λ ′ of the photonic crystal structure may have a larger value than the reflection wavelength λ in the absence of an external magnetic pole.

색변환Color conversion 광결정Photonic crystal 구조체의 제조 방법 Manufacturing method of the structure

일반적으로, 상기 색변환 광결정 구조체는 상이한 굴절률층을 교대로 적층하여 제조되고, 이러한 광결정 구조체가 나타내는 색을 바꾸기 위해서는 각 층에 포함되는 물질을 바꾸거나 혹은 각 층의 두께를 달리하여 신규로 광결정 구조체를 제조하여야 한다.In general, the color conversion photonic crystal structure is manufactured by alternately stacking different refractive index layers, and in order to change the color represented by the photonic crystal structure, a new photonic crystal structure may be newly changed by changing a material included in each layer or varying the thickness of each layer. Shall be prepared.

이에, 본 발명에서는, 제조된 광결정 구조체를 4차화 반응 물질과 접촉시키되 4차화 반응 물질 종류 및 반응 조건을 조절하여 구현하고자 하는 색을 나타내는 광결정 구조체를 제조한다. 따라서, 본 발명에 따르는 제조 방법을 사용하는 경우 신규로 광결정 구조체를 제조하지 않고 이미 제조된 광결정 구조체를 이용하여 광결정 구조체의 반사 파장을 용이하게 조절할 수 있다.Thus, in the present invention, the prepared photonic crystal structure is contacted with the quaternization reaction material, but to prepare a photonic crystal structure showing the color to be implemented by adjusting the type and the reaction conditions of the quaternization reaction material. Therefore, when using the manufacturing method according to the present invention, it is possible to easily adjust the reflection wavelength of the photonic crystal structure by using the already prepared photonic crystal structure without producing a new photonic crystal structure.

전구 구조체를 제조하는 단계 (단계 1)Step of manufacturing the bulb structure (step 1)

상기 단계 1은, 제1 굴절률층과 제2 굴절률층이 교대로 적층된 구조를 갖는 브래그 스택으로, 상기 제1 굴절률층은 제1 굴절률을 나타내는 제1 폴리머를 포함하고, 상기 제2 굴절률층은 상기 제1 굴절률과 상이한 제2 굴절률을 나타내는 제2 폴리머를 포함하는 전구 구조체를 제조하는 단계이다.The step 1 is a Bragg stack having a structure in which the first refractive index layer and the second refractive index layer are laminated alternately, the first refractive index layer comprises a first polymer exhibiting a first refractive index, the second refractive index layer is A step of manufacturing a light bulb structure comprising a second polymer exhibiting a second refractive index different from the first refractive index.

따라서, 상기 제1 굴절률층이 고굴절률층이고, 상기 제2 굴절률층이 저굴절률층이거나, 다르게는 상기 제1 굴절률층이 저굴절률층이고, 상기 제2 굴절률층이 고굴절률층일 수 있다.Accordingly, the first refractive index layer may be a high refractive index layer, the second refractive index layer may be a low refractive index layer, or alternatively, the first refractive index layer may be a low refractive index layer, and the second refractive index layer may be a high refractive index layer.

상기 전구 구조체는 하기 조성/스펙의 고굴절률층을 갖는 것을 제외하고는 나머지 조성/구조는 광결정성 구조체에서 전술한 바와 같다.The remaining composition / structure is as described above in the photonic crystal structure except that the precursor structure has a high refractive index layer of the following composition / specification.

(고굴절률층)(High refractive index layer)

본 발명에서 사용하는 용어 '고굴절률층'은 전구 구조체 내에 포함된 두 종류의 층 중에서 상대적으로 굴절률이 높은 층을 의미한다. 이때, 상기 제1 폴리머 및 상기 제2 폴리머 중 하나로서, 상기 고굴절률층에 포함되는 폴리머는 하기 화학식 3으로 표시되는 코폴리머이다:The term 'high refractive index layer' used in the present invention means a layer having a relatively high refractive index among two kinds of layers included in the bulb structure. At this time, as one of the first polymer and the second polymer, the polymer included in the high refractive index layer is a copolymer represented by the following formula (3):

[화학식 3][Formula 3]

Figure PCTKR2017011005-appb-I000015
Figure PCTKR2017011005-appb-I000015

상기 화학식 3에서,In Chemical Formula 3,

R5 및 R6은 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 5 and R 6 are each independently hydrogen or C 1-3 alkyl,

X11 내지 X15는 각각 독립적으로, N 또는 CR"이되, X11 내지 X15 중 적어도 하나는 N이고,X 11 to X 15 are each independently N or CR ″, at least one of X 11 to X 15 is N,

여기서 R"는 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,Wherein R ″ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl,

L3은 O 또는 NH이고,L 3 is O or NH,

Y3은 벤조일페닐이고,Y 3 is benzoylphenyl,

여기서 Y3은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy,

n3 및 m3은 각각 독립적으로 1 이상의 정수이고,n3 and m3 are each independently an integer of 1 or more,

n3+m3은 100 내지 1,000이다.n3 + m3 is 100-1,000.

화학식 3에 대한 설명은 전술한 바와 같다.Description of the formula (3) is as described above.

상기 전구 구조체는 색변환 용이 측면에서 상기 제1 굴절률층이 50 내지 120 nm의 두께로 형성된 고굴절률층이고, 상기 제2 굴절률층이 25 내지 70 nm의 두께로 형성된 저굴절률층일 수 있다.The light bulb structure may be a high refractive index layer having a thickness of 50 to 120 nm, and a second refractive index layer having a thickness of 25 to 70 nm.

이러한 전구 구조체는 다음의 단계를 포함하는 제조 방법에 의해 제조될 수 있다:Such precursor structures can be manufactured by a manufacturing method comprising the following steps:

a) 상기 제1 폴리머를 포함하는 제1 분산액 조성물을 사용하여 제1 굴절률층을 제조하는 단계;a) preparing a first refractive index layer using a first dispersion composition comprising the first polymer;

b) 상기 제1 굴절률층 상에 제2 폴리머를 포함하는 제2 분산액 조성물을 사용하여 제2 굴절률층을 제조하는 단계;b) preparing a second refractive index layer using a second dispersion composition comprising a second polymer on said first refractive index layer;

c) 상기 단계 a) 및 b)를 반복하여, 상기 제1 굴절률층과 상기 제2 굴절률층이 교대로 적층된 전구 구조체를 제조하는 단계.c) repeating steps a) and b) to produce a bulb structure in which the first and second refractive index layers are alternately stacked.

먼저, 제1 분산액 조성물 및 제2 분산액 조성물을 제조한다. 각각의 분산액 조성물은 폴리머를 용매에 분산시켜 제조될 수 있고, 여기서 분산액 조성물은 용액상, 슬러리상 또는 페이스트상 등의 여러 가지 상태를 나타내는 용어로서 사용된다. 이때, 용매는 제1 및 제2 폴리머를 용해시킬 수 있는 것이면 어느 것이든 사용 가능하며, 제1 및 제2 폴리머는 각각 분산액 조성물 총중량을 기준으로 0.5 내지 5 중량%으로 포함될 수 있다. 상술한 범위에서, 기판 상에 도포되기에 적절한 점도를 갖는 분산액 조성물을 제조할 수 있다.First, a first dispersion composition and a second dispersion composition are prepared. Each dispersion composition can be prepared by dispersing a polymer in a solvent, where the dispersion composition is used as a term indicating various states such as solution phase, slurry phase or paste phase. In this case, the solvent may be used as long as it can dissolve the first and second polymers, and the first and second polymers may be included in an amount of 0.5 to 5 wt% based on the total weight of the dispersion composition. In the above-described range, a dispersion composition having a viscosity suitable for being applied onto a substrate can be prepared.

예를 들어, 상기 제1 분산액 조성물은 용매 및 제1 폴리머로 이루어지고, 상기 제2 분산액 조성물은 용매 및 제2 폴리머로 이루어질 수 있다. 다시 말하면, 광경화를 위한 별도의 광개시제 및 가교제, 혹은 무기물 입자를 포함하지 않을 수 있다. 따라서, 광결정 구조체를 보다 용이하고 경제적으로 제조할 수 있으며, 별도의 첨가제를 포함하지 않아 제조된 광결정 구조체의 위치에 따른 광특성의 편차가 감소될 수 있다.For example, the first dispersion composition may consist of a solvent and a first polymer, and the second dispersion composition may consist of a solvent and a second polymer. In other words, the photocuring agent may not include a separate photoinitiator and a crosslinking agent or inorganic particles. Therefore, the photonic crystal structure can be manufactured more easily and economically, and the dispersion of the optical properties according to the position of the prepared photonic crystal structure can be reduced by not including a separate additive.

다음으로, 제조된 제1 분산액 조성물을 기판 또는 기재 상에 도포한 후 광조사를 수행하여 제1 굴절률층을 제조하고, 이후, 상기 제1 굴절률층 상에 제조된 제2 분산액 조성물을 도포한 후 광조사를 수행하여 제2 굴절률층을 제조할 수 있다.Next, after applying the prepared first dispersion composition on a substrate or substrate to perform a light irradiation to prepare a first refractive index layer, and then after applying the prepared second dispersion composition on the first refractive index layer Irradiation may be performed to prepare a second refractive index layer.

여기서, 상기 분산액 조성물을 기판 또는 굴절률층 상에 도포하는 방법으로 스핀코팅(spin coating), 딥코팅(dip coating), 롤코팅(roll coating), 스크린 코팅(screen coating), 분무코팅(spray coating), 스핀 캐스팅(spin casting), 흐름코팅(flow coating), 스크린 인쇄(screen printing), 잉크젯(ink jet) 또는 드롭 캐스팅(drop casting) 등을 사용할 수 있으나, 이에 한정되는 것은 아니다.Here, spin coating, dip coating, roll coating, screen coating, spray coating, or the like may be applied by applying the dispersion composition onto a substrate or a refractive index layer. Spin casting, flow coating, screen printing, ink jet, drop casting, or the like may be used, but is not limited thereto.

상기 광조사 단계는 190 ~ 380 nm 파장의 빛을 조사하는 방법으로 수행할 수 있다. 상기 광조사에 의해 폴리머 내에 포함된 벤조페논 모이어티가 광개시제로 작용하여 광경화된 굴절률층이 제조될 수 있다.The light irradiation step may be performed by a method of irradiating light of 190 ~ 380 nm wavelength. The photocured refractive index layer may be prepared by acting as a photoinitiator of the benzophenone moiety contained in the polymer by the light irradiation.

이후, 상기 단계 a)와 b)를 각각 수회 반복하여, 총 적층수가 5 내지 30 층인 전구 구조체를 제조한다. 이때, 총 적층수가 홀수인 경우는 제1 굴절률층을 형성하는 단계 a)를 단계 b)에 비해 한 번 더 반복했음을 의미한다.Thereafter, the above steps a) and b) are repeated several times to produce a bulb structure having a total number of stacked layers of 5 to 30 layers. In this case, when the total number of stacked layers is odd, it means that the step a) of forming the first refractive index layer is repeated one more time than the step b).

광결정Photonic crystal 구조체를 제조하는 단계 (단계 2) Step of manufacturing the structure (step 2)

상기 단계 2는, 상기 단계 1에서 제조된 전구 구조체를 하기 화학식 4로 표시되는 화합물과 접촉시켜 광결정 구조체를 제조하는 단계로서, 전구 구조체의 고굴절률층에 포함된 상기 화학식 3으로 표시되는 코폴리머의 N 질소 원자를 화학식 4로 표시되는 화합물과 4차화 반응시켜 4차 암모늄 이온(Quaternary ammonium cation)으로 전환시키는 단계이다:Step 2 is a step of preparing a photonic crystal structure by contacting the precursor structure prepared in step 1 with a compound represented by the following formula (4) of the copolymer represented by the formula (3) contained in the high refractive index layer of the precursor structure The quaternization reaction of the N nitrogen atom with the compound represented by Formula 4 converts the quaternary ammonium ion into quaternary ammonium cation:

4차화 반응은 고굴절률층의 상기 화학식 3으로 표시되는 코폴리머의 질소 원자와 화학식 4로 표시되는 화합물의 친핵성 치환 반응으로, 비공유 전자쌍을 갖는 질소 원자에 R기가 결합되면서 4차 암모늄 양이온과 X- 음이온이 생성된다. 이에 따라, 상기 화학식 3으로 표시되는 코폴리머는 상기 화학식 4로 표시되는 화합물과 반응하여 상기 화학식 1로 표시되는 코폴리머로 전환된다.The quaternization reaction is a nucleophilic substitution reaction between the nitrogen atom of the copolymer represented by Chemical Formula 3 and the compound represented by Chemical Formula 4 of the high refractive index layer. - the anion is produced. Accordingly, the copolymer represented by Chemical Formula 3 is converted into the copolymer represented by Chemical Formula 1 by reacting with the compound represented by Chemical Formula 4.

따라서, 상기 단계 2에 의해 제조되는 광결정 구조체는 상기 전구 구조체에 비해 고굴절률층의 조성 및 두께가 달라진다. 이에 따라, 상기 광결정 구조체의 고굴절률층의 굴절률이 변화하여, 상기 광결정 구조체의 반사 파장 및 나타내는 색이 달라지게 된다.Therefore, the composition and thickness of the high refractive index layer of the photonic crystal structure manufactured by the step 2 is different from that of the precursor structure. As a result, the refractive index of the high refractive index layer of the photonic crystal structure is changed, and the reflection wavelength and the color of the photonic crystal structure are changed.

상기 단계 2)에서 제조된 광결정 구조체는 380 내지 760 nm의 가시광선 내 반사 파장을 가져, 이에 따른 색을 나타낼 수 있다. 이러한 광결정 구조체의 반사 파장은 상술한 식 1에 의해 결정될 수 있다.The photonic crystal structure prepared in step 2) may have a reflection wavelength in visible light of 380 to 760 nm, and thus display colors. The reflection wavelength of the photonic crystal structure may be determined by Equation 1 described above.

또한, 상기 광결정 구조체의 반사파장은, 고굴절률층의 조성 및 두께 차이로 인하여, 상기 전구 구조체의 반사파장과는 상이하다. 구체적으로 상기 광결정 구조체의 반사 파장은 상기 전구 구조체의 반사 파장보다 장파장일 수 있다. 이는, 상기 화학식 3으로 표시되는 코폴리머는 상기 화학식 4로 표시되는 화합물과 접촉 시간이 증가할수록 장파장으로 시프트되는 것에 기인한다.In addition, the reflected wavelength of the photonic crystal structure is different from the reflected wavelength of the bulb structure due to the difference in the composition and thickness of the high refractive index layer. Specifically, the reflection wavelength of the photonic crystal structure may be longer than the reflection wavelength of the precursor structure. This is because the copolymer represented by Chemical Formula 3 is shifted to a longer wavelength as the contact time with the compound represented by Chemical Formula 4 increases.

따라서, 본 발명의 제조 방법에 따를 때 4차화 반응에 참여하는 상기 화학식 4로 표시되는 화합물의 종류 및 반응 조건을 조절하여, 새롭게 광결정 구조체를 제조할 필요 없이 원하는 반사 파장을 갖는 광결정 구조체의 구현이 가능하다.Therefore, according to the manufacturing method of the present invention by adjusting the type and reaction conditions of the compound represented by the formula (4) participating in the quaternization reaction, the implementation of the photonic crystal structure having the desired reflection wavelength without the need to prepare a new photonic crystal structure It is possible.

또한, 상기 단계 2 이후, 상기 광결정 구조체의 상대이온 교환 반응을 수행하는 단계를 더 포함할 수 있다. 여기서, 상대이온 교환 반응이라 함은 상기 화학식 4로 표시되는 코폴리머의 X- 음이온을 다른 음이온으로 교환하는 것을 의미하며, 이를 위해 상기 광결정 구조체를 음이온 공급 화합물과 접촉시킬 수 있다. 이를 통해, 상기 광결정 구조체와는 상이한 반사 파장을 갖는 새로운 광결정 구조체를 제조할 수 있다.In addition, after step 2, the method may further include performing a counterion exchange reaction of the photonic crystal structure. Here, the counterion exchange reaction means exchanging the X anion of the copolymer represented by Chemical Formula 4 with another anion, and for this purpose, the photonic crystal structure may be contacted with an anion supply compound. Through this, it is possible to manufacture a new photonic crystal structure having a reflection wavelength different from the photonic crystal structure.

색변환Color conversion 광결정Photonic crystal 센서 sensor

한편, 본 발명의 또 다른 구현예에 따르면, 상술한 색변환 광결정 구조체를 포함하는 색변환 광결정 센서가 제공된다.On the other hand, according to another embodiment of the present invention, a color conversion photonic crystal sensor including the color conversion photonic crystal structure described above is provided.

상기 색변환 광결정 센서는 습도 센서로 사용될 수 있다. 구체적으로, 상기 색변환 광결정 센서는 수분과 접촉 시 그 종류에 따라 상이하게 색이 변환되므로, 변환된 색을 관찰하여 습도의 확인이 가능하다. 또한, 상기 색변환 광결정 센서는 습도에 따라 색변환이 명확할 뿐만 아니라, 외부 자극과의 접촉이 중단되는 경우 빠르게 원래의 상태로 회복될 수 있어, 반복적으로 재사용이 가능하다.The color conversion photonic crystal sensor may be used as a humidity sensor. Specifically, the color conversion photonic crystal sensor is different in color depending on its type when in contact with moisture, it is possible to confirm the humidity by observing the converted color. In addition, the color conversion photonic crystal sensor is not only the color conversion is clear according to the humidity, it can be quickly restored to the original state when contact with the external stimulus is interrupted, it is possible to reuse repeatedly.

이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시한다.Hereinafter, preferred examples are provided to aid in understanding the present invention.

그러나 하기의 실시예는 본 발명을 더욱 쉽게 이해하기 위하여 제공되는 것일 뿐, 하기 실시예에 의하여 본 발명의 내용이 한정되는 것은 아니다.However, the following examples are merely provided to more easily understand the present invention, and the contents of the present invention are not limited by the following examples.

사용 물질Material used

이하 제조예에서 하기의 물질을 사용하였다. 이때, 각 물질들을 별도의 정제 공정 없이 사용하였다.In the following preparation, the following materials were used. At this time, each material was used without a separate purification process.

- 4-아미노벤조페논: 순도 98%의 TCI(Tokyo chemical industry) 사 제품을 사용하였다.4-aminobenzophenone: TCI (Tokyo Chemical Industry) Co., Ltd., with a purity of 98%, was used.

- 트리에틸아민: 순도 99%의 TCI(Tokyo chemical industry) 사 제품을 사용하였다.Triethylamine: A product of 99% purity TCI (Tokyo Chemical Industry) was used.

- 디클로로메탄: 순도 99.9%의 Burdick&jackson 사 제품을 사용하였다.-Dichloromethane: Purity 99.9% Burdick & Jackson product was used.

- 아크릴로일 클로라이드: 순도 96%의 Merck 사 제품을 사용하였다.Acryloyl chloride: Merck company of purity 96% was used.

- 테트라하이드로퓨란: 순도 99.99%의 Burdick&jackson 사 제품을 사용하였다.Tetrahydrofuran: A Burdick & jackson product having a purity of 99.99% was used.

- 4-비닐피리딘: 순도 95%의 시그마알드리치 사 제품을 사용하였다.4-vinylpyridine: A product of 95% purity Sigma Aldrich was used.

- 아조비스이소부티로니트릴: 순도 98%의 JUNSEI 사 제품을 사용하였다.Azobisisobutyronitrile: Purified by JUNSEI from 98% purity.

- N-(2,2,2-트리플루오로에틸)아크릴레이트: 순도 98%의 TCI(Tokyo chemical industry) 사 제품을 사용하였다.N- (2,2,2-trifluoroethyl) acrylate: TCI (Tokyo Chemical Industry) company of purity 98% was used.

모노머 및 Monomers and 코폴리머의Copolymer 표기 Mark

이하의 제조예 및 비교제조예에서 제조한, 모노머 및 코폴리머의 명칭 및 표기는 하기 표 1과 같다.The names and notations of the monomers and copolymers prepared in the following Preparation Examples and Comparative Preparation Examples are shown in Table 1 below.

명칭designation 표기Mark 제조예 APreparation Example A N-(4-benzoylphenyl)acrylamideN- (4-benzoylphenyl) acrylamide BPAABPAA 제조예 BPreparation Example B N-(2-fluoroethyl)acrylateN- (2-fluoroethyl) acrylate FEAFEA 제조예 1Preparation Example 1 poly(4-vinylpyridine)-co-(N-(4-benzoylphenyl)acrylamide)poly (4-vinylpyridine) -co- (N- (4-benzoylphenyl) acrylamide) Poly(4VP-BPAA)Poly (4VP-BPAA) 제조예 2Preparation Example 2 poly(N-(2-fluoroethyl)acrylate)-co-(N-(4-benzoylphenyl)acrylamidepoly (N- (2-fluoroethyl) acrylate) -co- (N- (4-benzoylphenyl) acrylamide Poly(FEA-BPAA)Poly (FEA-BPAA)

(모노머 합성)(Monomer synthesis)

제조예Production Example A:  A: BPAA의Of BPAA 제조 Produce

9.96 g의 4-아미노벤조페논, 7 mL의 트리에틸아민, 80 mL의 디클로로메탄을 250 mL 라운드 플라스크에 넣은 후 상기 플라스크를 얼음물에 두었다.9.96 g of 4-aminobenzophenone, 7 mL of triethylamine, 80 mL of dichloromethane were placed in a 250 mL round flask and the flask was placed in ice water.

4.06 mL의 아크릴로일 클로라이드를 8 mL의 디클로로메탄에 희석시킨 후 상기 플라스크 내에 천천히 한방울씩 떨어트린 후 12 시간 교반하였다. 상기 반응 종료 후 분별깔때기를 이용하여 미반응물 및 염을 5% NaHCO3 와 염화나트륨 포화수용액으로 제거해준 다음 유기층을 무수 Na2SO4를 이용하여 여분의 물을 제거한 후 회전 증발 농축기를 이용하여 용매를 제거한 후, 상온 진공 오븐에 건조시켜, 노란색 고체의 표제 화합물을 얻었다.4.06 mL of acryloyl chloride was diluted in 8 mL of dichloromethane and slowly dropped dropwise into the flask, followed by stirring for 12 hours. After completion of the reaction, the unreacted material and salt were removed with a 5% NaHCO 3 and saturated aqueous sodium chloride solution using a separatory funnel, and the organic layer was removed using anhydrous Na 2 SO 4 , and then the solvent was removed using a rotary evaporator. After removal, it was dried in a vacuum oven at room temperature to give the title compound as a yellow solid.

제조예Production Example B:  B: FEA의Of FEA 제조 Produce

30 mL의 아크릴로일 클로라이드(37.5 mmol), 52 ml의 트리에틸아민(37.5 mmol) 및 200 mL의 테트라하이드로퓨란을 One-neck round flask에 넣은 후 상기 플라스크를 얼음물에 두었다. 18.3 mL의 2-플루오로에탄올(31.2 mmol)을 30mL의 테트라하이드로퓨란에 희석 시킨 후 상기 플라스크 내에 천천히 한 방울씩 넣어주며 교반하였다. 희석된 용액이 다 들어가면 상온에서 12 시간 교반하였다. 상기 반응 종료 후 침전물을 여과하고, 남은 용액을 회전 증발 농축기를 이용하여 농축시켰다. 농축된 시료를 헥산:에틸 아세테이트 혼합용매를 이용한 컬럼을 통하여 물질만 분리한 후, 회전 증발 농축기로 용매를 제거하여 표제 화합물을 얻었다.30 mL of acryloyl chloride (37.5 mmol), 52 ml of triethylamine (37.5 mmol) and 200 mL of tetrahydrofuran were placed in a One-neck round flask and the flask was placed in ice water. 18.3 mL of 2-fluoroethanol (31.2 mmol) was diluted in 30 mL of tetrahydrofuran and slowly stirred dropwise into the flask. When the diluted solution enters, the mixture was stirred at room temperature for 12 hours. After completion of the reaction, the precipitate was filtered and the remaining solution was concentrated using a rotary evaporator. The concentrated sample was separated only through a column using a hexane: ethyl acetate mixed solvent, and then the solvent was removed using a rotary evaporator to obtain the title compound.

(( 코폴리머의Copolymer 합성) synthesis)

제조예Production Example 1:  One: Poly(4VP-BPAA)의Of Poly (4VP-BPAA) 제조 Produce

Figure PCTKR2017011005-appb-I000016
Figure PCTKR2017011005-appb-I000016

4.5 ml의 4-비닐 피리딘, 0.8448 g의 상기 제조예 A에서 제조한 BPAA, 0.0276 g의 아조비스이소부티로니트릴(1.68×10- 4 mol), 25 ml의 슈랭크 라운드 플라스크에 넣어준 다음 교반하였다. 질소분위기하에서 60도 오일 배스에 플라스크를 넣어서 15시간 반응을 진행하였다. 상기 반응 종료 후 고분자를 추출한 후 상온 진공오븐에 건조시켜, Poly(4VPBPAA)(n3= 250, m3= 20)를 얻었다.4.5 ml of 4-vinylpyridine, acrylonitrile, a BPAA, 0.0276 g of azobisisobutyronitrile was prepared in Preparative Example A, 0.8448 g (1.68 × 10 - 4 mol), then stirred gave put in 25 ml round flask shoe ranks It was. In a nitrogen atmosphere, the flask was placed in a 60 degree oil bath for 15 hours. After completion of the reaction, the polymer was extracted and dried in a vacuum oven at room temperature to obtain Poly (4VPBPAA) (n 3 = 250, m 3 = 20).

제조예Production Example 2:  2: Poly(FEA-BPAA)의Of Poly (FEA-BPAA) 제조 Produce

Figure PCTKR2017011005-appb-I000017
Figure PCTKR2017011005-appb-I000017

1.64 g의 상기 제조예 B에서 제조한 FEA(1.38 mmol), 0.0351 g의 상기 제조예 A에서 제조한 BPAA(0.14 mmol), 0.0046 g의 아조비스이소부티로니트릴(0.028 mmol), 25 ml의 슈랭크 라운드 플라스크에 넣어준 다음 교반하였다. 질소분위기하에서 80 도 오일 배스에 플라스크를 넣어서 15 시간 반응을 진행하였다. 상기 반응 종료 후 고분자를 추출한 후 상온 진공오븐에 건조시켜, Poly(FEA-BPAA)(n2= 495, m2= 5)를 얻었다.1.64 g of FEA (1.38 mmol) prepared in Preparation Example B, 0.0351 g of BPAA (0.14 mmol) prepared in Preparation Example A, 0.0046 g of azobisisobutyronitrile (0.028 mmol), 25 ml of shoe Put into a rank round flask and stirred. Under a nitrogen atmosphere, the flask was placed in an 80 degree oil bath for 15 hours. After the completion of the reaction, the polymer was extracted and dried in a vacuum oven at room temperature to obtain Poly (FEA-BPAA) (n 2 = 495, m 2 = 5).

시험예Test Example 1:  One: 코폴리머의Copolymer 물성 측정 Property measurement

상기 제조예 1 및 2에서 제조한 코폴리머의 구체적인 물성을 하기의 방법으로 측정하였고, 그 결과를 표 2에 나타내었다.Specific physical properties of the copolymers prepared in Preparation Examples 1 and 2 were measured by the following method, and the results are shown in Table 2.

1) Mn(수 평균 분자량): 폴리메틸 메타크릴레이트를 Calibration용 표준 시료로 하여 겔투과크로마토그래피(GPC)를 사용하여 측정하였다.1) Mn (number average molecular weight): Polymethyl methacrylate was measured using gel permeation chromatography (GPC) as a standard sample for calibration.

2) Tg(유리전이온도): DSC(differential scanning calorimeter)를 사용하여 측정하였다.2) Tg (glass transition temperature): Measured using a differential scanning calorimeter (DSC).

3) BPAA 구조 단위의 함량: NMR에 의해 측정하였다.3) Content of BPAA structural unit: measured by NMR.

4) 굴절률: 타원계측법(Ellipsometer)에 의해 측정하였다.4) Refractive index: It measured by ellipsometer.

Figure PCTKR2017011005-appb-T000001
Figure PCTKR2017011005-appb-T000001

(( 색변환Color conversion 광결정Photonic crystal 구조체의 제조) Manufacture of structures)

실시예Example 1-1 1-1

상기 제조예 1에서 제조한 Poly(4VP-BPAA)를 프로판올에 녹여 고굴절률 분산액 조성물을 제조하였고, 상기 제조예 2에서 제조한 Poly(FEA-BPAA)를 에틸 아세테이트에 녹여 저굴절률 분산액 조성물을 제조하였다.The high refractive index dispersion composition was prepared by dissolving Poly (4VP-BPAA) prepared in Preparation Example 1 in propanol, and the low refractive index dispersion composition was prepared by dissolving Poly (FEA-BPAA) prepared in Preparation Example 2 in ethyl acetate. .

유리 기판 상에 상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하였다. 상기 고굴절률층이 형성된 유리 기판을 프로판올 용액에 넣어 경화되지 않은 부분을 제거하였다.The high refractive index dispersion composition was applied on a glass substrate for 30 seconds using a spin coater and then cured at 365 nm for 5 minutes to form a high refractive index layer. The glass substrate on which the high refractive index layer was formed was placed in a propanol solution to remove uncured portions.

다음으로, 상기 고굴절률층 상에 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성하였다. 상기 고굴절률층 및 저굴절률층이 형성된 유리 기판을 에틸 아세테이트 용액에 넣어 경화되지 않는 부분을 제거하였다.Next, the low refractive index dispersion composition was applied on the high refractive index layer for 30 seconds using a spin coater, and then cured at 365 nm for 5 minutes to form a low refractive index layer. The glass substrate on which the high refractive index layer and the low refractive index layer were formed was placed in an ethyl acetate solution to remove the uncured portion.

다음으로, 상기 저굴절률층 상에 고굴절률층 및 저굴절률층을 반복적으로 적층하여, 총 7 층의 굴절률층이 적층된 전구 구조체를 제조하였다.Next, a high refractive index layer and a low refractive index layer was repeatedly stacked on the low refractive index layer, thereby preparing a light bulb structure in which a total of seven refractive index layers were laminated.

이후, 상기 전구 구조체를 10 ml의 DMF 및 226 ㎕의 benzyl bromide(1.9×10-3mol)가 들어 있는 100 ml vial에 담고, 50 도에서 20 분 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조하였다.Subsequently, the precursor was placed in a 100 ml vial containing 10 ml of DMF and 226 μl of benzyl bromide (1.9 × 10 −3 mol), quaternized at 50 ° C. for 20 minutes, washed with ethanol, and dried. To prepare a photonic crystal structure.

실시예Example 1-2 내지 1-9 1-2 to 1-9

각각 4차화 반응 시간을 40 분, 1 시간, 1시간 20분, 1 시간 40분, 2 시간, 2 시간 20 분, 2 시간 40 분 및 3 시간으로 변화시킨 것을 제외하고는, 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.Example 1-1 except that the quaternization reaction time was changed to 40 minutes, 1 hour, 1 hour 20 minutes, 1 hour 40 minutes, 2 hours, 2 hours 20 minutes, 2 hours 40 minutes, and 3 hours, respectively. Using the same method as in the photonic crystal structure was prepared.

실시예Example 2-1 2-1

상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하고, 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성한 후, 이들을 반복적으로 적층하여, 총 7 층의 굴절률층이 적층된 전구 구조체를 제조한 것을 제외하고는, 상기 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.The high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer. The low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, these were repeatedly laminated, and thus a photonic crystal structure was obtained in the same manner as in Example 1-1, except that a precursor structure in which a total of seven refractive index layers were laminated was manufactured. Was prepared.

실시예Example 2-2 내지 2-9 2-2 to 2-9

각각 4차화 반응 시간을 40 분, 1 시간, 1시간 20분, 1 시간 40분, 2 시간, 2 시간 20 분, 2 시간 40 분 및 3 시간으로 변화시킨 것을 제외하고는, 실시예 2-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.Example 2-1 except that the quaternization reaction time was changed to 40 minutes, 1 hour, 1 hour 20 minutes, 1 hour 40 minutes, 2 hours, 2 hours 20 minutes, 2 hours 40 minutes, and 3 hours, respectively. Using the same method as in the photonic crystal structure was prepared.

실시예Example 3-1 3-1

상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하고, 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성한 후, 이들을 반복적으로 적층하여, 총 7 층의 굴절률층이 적층된 전구 구조체를 제조하고, 이후, 상기 전구 구조체를 10 ml의 DMF 및 142 ㎕의 bromoethane(1.9×10-3mol)이 들어 있는 100 ml vial에 담고, 50 ℃에서 5 시간 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조한 것을 제외하고는, 상기 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.The high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer. The low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they were repeatedly laminated to prepare a precursor structure in which a total of seven refractive index layers were laminated, and then the precursor structure was prepared by 10 ml of DMF and 142 µl bromoethane (1.9 ×). 10 -3 mol) contained in 100 ml vial, and after quaternization reaction at 50 ℃ for 5 hours, washed with ethanol and dried to prepare a photonic crystal structure, except that Example 1-1 and The same method was used to prepare the photonic crystal structure.

실시예Example 3-2 3-2

4차화 반응 시간을 24 시간으로 변화시킨 것을 제외하고는, 실시예 3-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.A photonic crystal structure was prepared in the same manner as in Example 3-1, except that the quaternization reaction time was changed to 24 hours.

실시예Example 4-1 4-1

상기 실시예 3-1에서 제조한 전구 구조체를 10 ml의 DMF 및 173 ㎕의 bromopropane(1.9×10-3mol)이 들어 있는 100 ml vial에 담고, 50℃에서 5 시간 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조하였다.The precursor prepared in Example 3-1 was placed in 100 ml vial containing 10 ml of DMF and 173 μl of bromopropane (1.9 × 10 −3 mol), and quaternized at 50 ° C. for 5 hours, followed by ethanol. After washing with and dried to prepare a photonic crystal structure.

실시예Example 4-2 4-2

4차화 반응 시간을 24 시간으로 변화시킨 것을 제외하고는, 실시예 4-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.A photonic crystal structure was prepared in the same manner as in Example 4-1, except that the quaternization reaction time was changed to 24 hours.

실시예Example 5-1 5-1

상기 실시예 3-1에서 제조한 전구 구조체를 10 ml의 DMF 및 226 ㎕의 benzyl bromide(1.9×10-3mol)가 들어 있는 100 ml vial에 담고, 50℃에서 20 분 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조하였다.The precursor structure prepared in Example 3-1 was placed in 100 ml vial containing 10 ml of DMF and 226 μl of benzyl bromide (1.9 × 10 −3 mol), and quaternized at 50 ° C. for 20 minutes. Washed with ethanol and dried to prepare a photonic crystal structure.

실시예Example 5-2 5-2

4차화 반응 시간을 24 시간으로 변화시킨 것을 제외하고는, 실시예 5-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.A photonic crystal structure was prepared in the same manner as in Example 5-1, except that the quaternization reaction time was changed to 24 hours.

실시예Example 6-1 6-1

상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하고, 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성한 후, 이들을 반복적으로 적층하여, 총 7 층의 굴절률층이 적층된 전구 구조체를 제조하고,The high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer. The low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of seven refractive index layers are laminated,

이후, 상기 구조체를 10 ml의 DMF 및 117 ㎕의 Iodomethane(1.9×10-3mol)이 들어 있는 100 ml vial에 담고, 50℃에서 5 시간 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조한 것을 제외하고는, 상기 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.Subsequently, the structure was placed in 100 ml vial containing 10 ml of DMF and 117 μl of Iodomethane (1.9 × 10 −3 mol), and after quaternization at 50 ° C. for 5 hours, washed with ethanol and dried, A photonic crystal structure was prepared in the same manner as in Example 1-1, except that the photonic crystal structure was produced.

실시예Example 6-2 6-2

4차화 반응 시간을 24 시간으로 변화시킨 것을 제외하고는, 실시예 6-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.A photonic crystal structure was prepared in the same manner as in Example 6-1, except that the quaternization reaction time was changed to 24 hours.

실시예Example 7 7

상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하고, 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성한 후, 이들을 반복적으로 적층하여, 총 13 층의 굴절률층이 적층된 전구 구조체를 제조하고,The high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer. The low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of 13 refractive index layers are laminated,

이후, 상기 전구 구조체를 10 ml의 Hexane 및 142 ㎕의 bromoethane(1.9×10-3mol)이 들어 있는 100 ml vial에 담고, 50℃에서 48 시간 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조한 것을 제외하고는, 상기 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.Thereafter, the precursor structure was placed in 100 ml vial containing 10 ml of Hexane and 142 μl of bromoethane (1.9 × 10 -3 mol), and after quaternization at 50 ° C. for 48 hours, washed with ethanol and dried. , Except that a photonic crystal structure was produced, a photonic crystal structure was produced in the same manner as in Example 1-1.

실시예Example 8 8

상기 고굴절률 분산액 조성물을 스핀 코터를 이용하여 30 초간 도포한 후 365 nm에서 5 분간 경화시켜 고굴절률층을 형성하고, 상기 저굴절률 분산액 조성물을 스핀 코터를 이용하여 30초간 도포한 후 365 nm에서 5 분간 경화시켜 저굴절률층을 형성한 후, 이들을 반복적으로 적층하여, 총 13 층의 굴절률층이 적층된 전구 구조체를 제조하고,The high refractive index dispersion composition was applied for 30 seconds using a spin coater, and then cured for 5 minutes at 365 nm to form a high refractive index layer. The low refractive index dispersion composition was applied for 30 seconds using a spin coater, followed by 5 at 365 nm. After curing for a minute to form a low refractive index layer, they are repeatedly laminated to prepare a precursor structure in which a total of 13 refractive index layers are laminated,

이후, 상기 전구 구조체를 10 ml의 DMF 및 226 ㎕의 benzyl bromide(1.9×10-3mol)가 들어 있는 100 ml vial에 담고, 50℃에서 110 분 동안 4차화 반응시킨 후 에탄올로 씻어준 뒤 건조시켜, 광결정 구조체를 제조한 것을 제외하고는, 상기 실시예 1-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.Subsequently, the precursor was placed in a 100 ml vial containing 10 ml of DMF and 226 μl of benzyl bromide (1.9 × 10 −3 mol), quaternized at 50 ° C. for 110 minutes, washed with ethanol, and dried. A photonic crystal structure was produced in the same manner as in Example 1-1, except that the photonic crystal structure was prepared.

실시예Example 9-1 9-1

상기 실시예 5-1에서 제조한 광결정 구조체를 1%의 Copper(2) perchlorate hexahydrate(Cu(ClO4)26H2O)가 들어 있는 100 ml vial에 담고, 상대이온 교환 반응시킨 후 광결정 구조체를 제조하였다.The photonic crystal structure prepared in Example 5-1 was placed in 100 ml vial containing 1% of copper (2) perchlorate hexahydrate (Cu (ClO 4 ) 2 6H 2 O), and subjected to counter ion exchange reaction. Prepared.

실시예Example 9-2 내지 9-5 9-2 to 9-5

각각 상대이온 교환 반응 시간을 6 시간, 19 시간, 27 시간 및 44시간으로 변화시킨 것을 제외하고는, 실시예 9-1과 동일한 방법을 사용하여 광결정 구조체를 제조하였다.A photonic crystal structure was prepared in the same manner as in Example 9-1, except that the counterion exchange reaction time was changed to 6 hours, 19 hours, 27 hours, and 44 hours, respectively.

상기 실시예에서 제조한 광결정 구조체 중 일부의 구조에 대하여 하기 표 3, 표 4에 정리하였다.The structures of some of the photonic crystal structures prepared in the above examples are summarized in Tables 3 and 4 below.

Figure PCTKR2017011005-appb-T000002
Figure PCTKR2017011005-appb-T000002

Figure PCTKR2017011005-appb-T000003
Figure PCTKR2017011005-appb-T000003

또한, 상기 실시예에서 제조한 R-X 화합물의 종류 변화에 따른 고굴절률층에 포함된 4차화된 Poly((4VP-BPAA) 코폴리머 구조를 하기 표 5에 나타내었다. 다만, 상기 고굴절률층은 4차화된 Poly((4VP-BPAA) 코폴리머로의 전환율이 100%가 아닌 경우에는 Poly((4VP-BPAA) 코폴리머와 4차화된 Poly((4VP-BPAA) 코폴리머를 동시에 포함한다. 이때, 저굴절률층에 포함된 Poly(FEA-BPAA) 코폴리머의 경우 4차화 전/후 폴리머의 변화가 없어 기재를 생략하였다.In addition, the quaternized Poly ((4VP-BPAA) copolymer structure included in the high refractive index layer according to the type change of the RX compound prepared in Example is shown in Table 5. However, the high refractive index layer is 4 If the conversion to the differential poly ((4VP-BPAA) copolymer is not 100%, the poly ((4VP-BPAA) copolymer and the quaternized Poly ((4VP-BPAA) copolymer are included at the same time. In the case of the Poly (FEA-BPAA) copolymer included in the low refractive index layer, the description was omitted because there is no change in the polymer before and after the quaternization.

Figure PCTKR2017011005-appb-T000004
Figure PCTKR2017011005-appb-T000004

시험예Test Example 2: 4차화2: quaternization 반응 시간 변화에 따른  With change in reaction time 색변환Color conversion 관찰 observe

4차화 반응 시간 변화에 따른 색변환 여부를 확인하기 위하여, 상기 실시예 1-1 내지 1-9에서 제조한 광결정 구조체의 색을 관찰하여 도 2a에 나타내었고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 광결정 구조체의 정반사도를 측정하여 도 2b에 나타내었다. 또한, 상기 실시예 2-1 내지 2-9에서 제조한 광결정 구조체의 색을 관찰하여 도 3a에 나타내었고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 광결정 구조체의 정반사도를 측정하여 도 3b에 나타내었다. 이때, "Before"는 4차화 반응 전의 광결정 구조체를 의미한다.In order to confirm the color conversion according to the quaternization reaction time change, the colors of the photonic crystal structures prepared in Examples 1-1 to 1-9 were observed and shown in FIG. 2A, and a reflectometer (USB 4000, Ocean Optics) was used. The specular reflectance of the photonic crystal structure was measured and shown in FIG. 2B. In addition, the color of the photonic crystal structures prepared in Examples 2-1 to 2-9 were observed and shown in FIG. 3a. The specular reflectance of the photonic crystal structures was measured using a reflectometer (USB 4000, Ocean Optics), and FIG. Indicated. In this case, "Before" means the photonic crystal structure before the quaternization reaction.

도 2 및 3에서 보는 바와 같이, 상기 실시예에서 제조한 광결정 구조체는 4차화 반응 시간에 따라 반사 파장이 변화됨을 알 수 있다. 구체적으로, 4차화 반응 시간이 증가할수록 반사 파장은 길어져서 장파장으로 시프트됨을 알 수 있다.As shown in Figures 2 and 3, it can be seen that the photonic crystal structure prepared in the above example changes the reflection wavelength according to the quaternization reaction time. Specifically, it can be seen that as the quaternization reaction time increases, the reflection wavelength becomes longer and shifts to longer wavelengths.

시험예Test Example 3: 암모늄 이온의 치환기 변화에 따른  3: According to the substituent change of ammonium ion 색변환Color conversion 관찰 observe

상기 화학식 4로 표시되는 4차화를 위한 R-Br 화합물에서 R기 변화 및 이들의 4차화 반응 시간 변화에 따른 색변환 여부를 확인하기 위하여, 상기 실시예 3-1, 3-2, 4-1, 4-2, 5-1 및 5-2에서 제조한 광결정 구조체의 색을 관찰하였고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 광결정 구조체의 정반사도를 측정하였고, 그 결과를 도 4a, 4b 및 4c에 나타내었다. 이때, 도 4b는 4차화 반응 시간이 5 시간인 실시예 3-1, 4-1 및 5-1에서 제조한 광결정 구조체의 정반사도 그래프이고, 도 4c는 4차화 반응 시간이 24 시간인 실시예 3-2, 4-2 및 5-2 에서 제조한 광결정 구조체의 정반사도 그래프이다. 이때, '반사 파장 시프트'는 4차화 반응 전의 광결정 구조체의 반사 파장 대비 4차화 반응 후 광결정 구조체의 반사 파장이 시프트된 값을 의미한다.Examples 3-1, 3-2, and 4-1 to confirm the color conversion according to the R group change and the quaternization reaction time thereof in the R-Br compound for quaternization represented by the formula (4) Colors of the photonic crystal structures prepared in, 4-2, 5-1, and 5-2 were observed, and specular reflectances of the photonic crystal structures were measured using a reflectometer (USB 4000, Ocean Optics), and the results are illustrated in FIGS. 4A and 4B. And 4c. 4B is a graph of specular reflection of the photonic crystal structures prepared in Examples 3-1, 4-1, and 5-1, in which the quaternization reaction time is 5 hours, and FIG. 4C is an example in which the quaternization reaction time is 24 hours. The specular reflectance graphs of the photonic crystal structures prepared in 3-2, 4-2 and 5-2 are shown. In this case, the 'reflection wavelength shift' means a value in which the reflection wavelength of the photonic crystal structure is shifted after the quaternization reaction with respect to the reflection wavelength of the photonic crystal structure before the quaternization reaction.

도 4에서 보는 바와 같이, 상기 실시예에서 제조한 광결정 구조체는 암모늄 이온의 치환기인 R기의 변화에 따라 상이한 반사 파장을 나타내고, 반응 시간이 증가할수록 상기 시험예 2의 결과와 마찬가지로 반사 파장이 길어져서 장파장으로 시프트됨을 알 수 있다. 또한, 벤질브로마이드를 사용하여 4차화시키는 경우 5 시간에서 24 시간으로 반응 시간을 증가하여도 더 이상 반사 파장의 변화가 없는 것으로 보아 Poly(4VP-BPAA)의 4차화 반응은 5 시간 이전에 종결되는 것으로 파악된다.As shown in Figure 4, the photonic crystal structure prepared in the above example shows different reflection wavelengths according to the change of the R group, which is a substituent of ammonium ions, and as the reaction time increases, the reflection wavelength is longer as in the test example 2 above. It can be seen that it is shifted to a longer wavelength. In addition, the quaternization reaction of poly (4VP-BPAA) was terminated before 5 hours because the reaction time was no longer changed when the reaction time was increased from 5 hours to 24 hours in the case of quaternization using benzyl bromide. It is understood.

시험예Test Example 4: 암모늄 이온의 Counter ion 변화에 따른  4: Counter ion change of ammonium ion 색변환Color conversion 관찰 observe

상기 화학식 4로 표시되는 4차화를 위한 R-Br 화합물 대신 R-I 화합물을 사용한 경우의 색변환 여부를 확인하기 위하여, 상기 실시예 6-1 및 6-2에서 제조한 광결정 구조체의 색을 관찰하여 그 결과를 도 5b에 나타내었고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 광결정 구조체의 정반사도를 측정하여 그 결과를 도 5b에 나타내었다.In order to confirm the color conversion in the case of using a RI compound instead of the R-Br compound for quaternization represented by the formula (4), by observing the color of the photonic crystal structure prepared in Examples 6-1 and 6-2 The results are shown in FIG. 5B. The specular reflectance of the photonic crystal structure was measured using a reflectometer (USB 4000, Ocean Optics), and the results are shown in FIG. 5B.

도 5에서 보는 바와 같이, 상기 실시예에서 제조한 광결정 구조체는 R-Br 화합물 대신 R-I 화합물을 사용한 경우, 즉 4차화된 코폴리머 내 counter ion이 변화된 경우에도 4차화 반응 시간이 증가할수록 반사 파장은 길어져서 장파장으로 시프트됨을 알 수 있다.As shown in FIG. 5, in the photonic crystal structure prepared in Example, when the RI compound is used instead of the R-Br compound, that is, even when the counter ion in the quaternized copolymer is changed, the reflection wavelength is increased as the quaternization reaction time increases. It can be seen that it is longer and shifted to longer wavelengths.

따라서, 시험예 2 내지 4의 결과로부터, 4차화를 위한 화합물 변경 및 4차화 반응 시간 조절에 따라 고굴절률층에 포함되는 코폴리머의 조성이 변화되어, 고굴절률층의 굴절률이 변함에 따라, 광결정 구조체는 변환된 반사 파장을 나타냄을 알 수 있다.Therefore, from the results of Test Examples 2 to 4, the composition of the copolymer included in the high refractive index layer is changed by changing the compound for quaternization and controlling the quaternization reaction time, so that the refractive index of the high refractive index layer is changed, thereby causing photonic crystals. It can be seen that the structure exhibits the converted reflection wavelength.

시험예Test Example 5: 습도 변화에 따른  5: according to the humidity change 색변환Color conversion 관찰 observe

습도 변화에 따른 색변환 정도를 확인하기 위하여, 상기 실시예 7에서 제조한 광결정 구조체를 각각 상대습도 11%, 23%, 33%, 43%, 52%, 68%, 75% 및 85%의 환경에 노출시킨 후, 변화된 색을 관찰하여 그 결과를 도 6a에 나타내었고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 정반사도를 측정하여 그 결과를 도 6b에 나타내었다.In order to confirm the degree of color conversion according to the humidity change, the photonic crystal structure prepared in Example 7 was subjected to an environment of 11%, 23%, 33%, 43%, 52%, 68%, 75% and 85% relative humidity, respectively. After exposure to the changed color was observed and the results are shown in Figure 6a, the specular reflectance was measured using a reflectometer (USB 4000, Ocean Optics) and the results are shown in Figure 6b.

또한, 상기 실시예 8에서 제조한 광결정 구조체를 각각 상대습도 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80% 및 87%의 환경에 노출시킨 후, 변화된 색을 관찰하여 그 결과를 도 7a에 나타내었고, Reflectometer(USB 4000, Ocean Optics)를 이용하여 정반사도를 측정하여 그 결과를 도 7b에 나타내었다.In addition, the photonic crystal structure prepared in Example 8 was exposed to an environment of 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80%, and 87% relative humidity, respectively, and then changed color. Observed the result is shown in Figure 7a, the specular reflectance was measured using a reflectometer (USB 4000, Ocean Optics) and the result is shown in Figure 7b.

상기 도 6 및 7에서 보는 바와 같이, 실시예 7 및 8에서 제조한 광 결정 구조체는 상대 습도의 변화에 따라 반사 파장의 시프트가 명확하여, 수분의 변화에 대한 감도가 우수함을 확인할 수 있다. 또한, 상기 광결정 구조체의 반사 파장은 상대 습도가 높아짐에 따라 파장이 길어지는 방향으로 시프트됨을 알 수 있다. 이때, 시프트된 반사 파장은 가시광선 영역에 해당하여 상기 광결정 구조체의 반사 파장의 변화를 육안으로 관측할 수 있어, 실시예에 따른 광결정 구조체는 상대 습도 확인에 사용 가능함을 확인할 수 있다.As shown in FIGS. 6 and 7, the photonic crystal structures prepared in Examples 7 and 8 have a clear shift in reflection wavelength according to changes in relative humidity, and thus have excellent sensitivity to changes in moisture. In addition, it can be seen that the reflection wavelength of the photonic crystal structure is shifted in a direction in which the wavelength increases as the relative humidity increases. In this case, the shifted reflection wavelength corresponds to the visible light region, so that the change in the reflection wavelength of the photonic crystal structure may be observed with the naked eye, and thus the photonic crystal structure according to the embodiment may be used to confirm the relative humidity.

시험예Test Example 6: 암모늄 이온의 Counter ion 변화에 따른  6: According to the change of counter ion of ammonium ion 색변환Color conversion 관찰 observe

이미 4차화된 코폴리머의 Counter ion 교환에 따른 색변환 여부를확인하기 위하여, Reflectometer(USB 4000, Ocean Optics)를 이용하여 상기 실시예 9-1 내지 9-5에서 제조한 광결정 구조체의 정반사도를 측정하였고, 그 중 반사파장 및 반사파장 시프트 측정 결과를 도 6a에 나타내었고, 정반사도 그래프를 도 6b에 나타내었다.In order to check the color conversion by the counter ion exchange of the already quaternized copolymer, the specular reflectance of the photonic crystal structures prepared in Examples 9-1 to 9-5 by using a reflectometer (USB 4000, Ocean Optics) Among them, the reflection wavelength and the reflection wavelength shift measurement results are shown in FIG. 6A, and the specular reflection graph is shown in FIG. 6B.

도 8에서 보는 바와 같이, 4차화 반응뿐 아니라, 4차화된 코폴리머의 Counter ion의 교환 반응을 통해서도 광결정 구조체의 반사 파장을 변화시킬 수 있음을 알 수 있다.As shown in FIG. 8, it can be seen that the reflection wavelength of the photonic crystal structure can be changed not only through the quaternization reaction but also through the exchange reaction of the counter ion of the quaternized copolymer.

[부호의 설명][Description of the code]

10: 색변환 광결정 구조체 11: 기판10: color conversion photonic crystal structure 11: substrate

13: 제1 굴절률층 15: 제2 굴절률층13: first refractive index layer 15: second refractive index layer

Claims (19)

색변환 광결정 구조체로서,Color conversion photonic crystal structure, 교대로 적층된, 제1 굴절률을 나타내는 제1 폴리머를 포함하는 제1 굴절률층; 및 제2 굴절률을 나타내는 제2 폴리머를 포함하는 제2 굴절률층;을 포함하고,A first refractive index layer comprising a first polymer exhibiting a first refractive index, alternately stacked; And a second refractive index layer comprising a second polymer exhibiting a second refractive index, 상기 제1 굴절률과 상기 제2 굴절률은 상이하고,The first refractive index and the second refractive index are different, 상기 제1 폴리머 및 상기 제2 폴리머 중 하나는, 하기 화학식 1로 표시되는 코폴리머인,One of the first polymer and the second polymer is a copolymer represented by the following formula (1), 색변환 광결정 구조체:Color conversion photonic crystal structure: [화학식 1][Formula 1]
Figure PCTKR2017011005-appb-I000018
Figure PCTKR2017011005-appb-I000018
상기 화학식 1에서,In Chemical Formula 1, R1 및 R2는 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 1 and R 2 are each independently hydrogen or C 1-3 alkyl, X1 내지 X5는 각각 독립적으로, N+RX- 또는 CR'이되, X1 내지 X5 중 적어도 하나는 N+RX-이고,And, - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX 여기서 R 및 R'는 각각 독립적으로, 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고, X-는 1가의 음이온이고,Wherein R and R 'are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X is 1 Is an anionic L1은 O 또는 NH이고,And L 1 is O, or NH, Y1은 벤조일페닐이고,Y 1 is benzoyl, phenyl, 여기서 Y1은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n1 및 m1은 각각 독립적으로 1 이상의 정수이고,n1 and m1 are each independently an integer of 1 or more, n1+m1은 100 내지 1,000이다.n1 + m1 is 100-1,000.
제1항에 있어서,The method of claim 1, X1은 N+RX-이고, X2 내지 X5는 각각 독립적으로 CR'이거나;X 1 is N + RX , and X 2 to X 5 are each independently CR ′; X2는 N+RX-이고, X1, X3 내지 X5는 각각 독립적으로 CR'이거나; 또는 X3은 N+RX-이고, X1, X2, X4 및 X5는 각각 독립적으로 CR'이고,X 2 is N + RX , and X 1 , X 3 to X 5 are each independently CR ′; And a, X 1, X 2, X 4 and X 5 are each independently CR ', - or X 3 is N + RX 여기서, R은 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, sec-부필, tert-부틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 페닐, 벤질, 또는 페닐에틸이고, X-는 F-, Cl-, Br-, I-, ClO4 -, SCN-, NO3 -, 또는 CH3CO2 -이고, R'는 수소, 메틸, 에틸, 또는 페닐인, 색변환 광결정 구조체.Wherein R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, or phenyl and ethyl, X- is F -, Cl -, Br - , I -, ClO 4 -, SCN -, NO 3 -, or CH 3 CO 2 -, and, R 'is hydrogen, methyl, ethyl, or phenyl, Color conversion photonic crystal structure. 제1항에 있어서,The method of claim 1, 상기 제1 폴리머 및 상기 제2 폴리머 중 다른 하나는, 하기 화학식 2로 표시되는 코폴리머인, 색변환 광결정 구조체:The other of the first polymer and the second polymer is a copolymer represented by the formula (2), color conversion photonic crystal structure: [화학식 2][Formula 2]
Figure PCTKR2017011005-appb-I000019
Figure PCTKR2017011005-appb-I000019
상기 화학식 2에서,In Chemical Formula 2, R3 및 R4는 각각 독립적으로 수소 또는 C1-3 알킬이고,R 3 and R 4 are each independently hydrogen or C 1-3 alkyl, A는 C1-10 플루오로알킬이고,A is C 1-10 fluoroalkyl, L2는 O 또는 NH이고,And L 2 represents O or NH, Y2는 벤조일페닐이고,Y 2 is benzoylphenyl, 여기서 Y2는 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 2 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n2 및 m2는 각각 독립적으로 1 이상의 정수이고,n2 and m2 are each independently an integer of 1 or more, n2+m2는 100 내지 1,000이다.n2 + m2 is 100-1,000.
제3항에 있어서,The method of claim 3, R3 및 R4는 각각 독립적으로 수소 또는 메틸이고,R 3 and R 4 are each independently hydrogen or methyl, A는 플루오로메틸, 디플루오로메틸, 트리플루오로메틸, 1-플루오로에틸, 2-플루오로에틸, 1,1-디플루오로에틸, 1,2-디플루오로에틸, 2,2-디플루오로에틸, 1,1,2-트리플루오로에틸, 1,2,2-트리플루오로에틸, 2,2,2-트리플루오로에틸, 1-플로오로프로필, 2-플루오로프로필, 1,1-디플루오로프로필, 1,2-디플루오로프로필, 2,2-디플루오로프로필, 1,1,2-트리플루오로프로필, 1,2,2-트리플루오로프로필, 2,2,2-트리플루오로프로필, 1-플로오로부틸, 2-플루오로부틸, 1,1-디플루오로부틸, 1,2-디플루오로부틸, 2,2-디플루오로부틸, 1,1,2-트리플루오로부틸, 1,2,2-트리플루오로부틸, 또는 2,2,2-트리플루오로부틸인, 색변환 광결정 구조체.A is fluoromethyl, difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, 1,2-difluoroethyl, 2,2- Difluoroethyl, 1,1,2-trifluoroethyl, 1,2,2-trifluoroethyl, 2,2,2-trifluoroethyl, 1-fluoropropyl, 2-fluoropropyl, 1,1-difluoropropyl, 1,2-difluoropropyl, 2,2-difluoropropyl, 1,1,2-trifluoropropyl, 1,2,2-trifluoropropyl, 2 , 2,2-trifluoropropyl, 1-fluorobutyl, 2-fluorobutyl, 1,1-difluorobutyl, 1,2-difluorobutyl, 2,2-difluorobutyl, 1 And, 1,2-trifluorobutyl, 1,2,2-trifluorobutyl, or 2,2,2-trifluorobutyl. 제1항에 있어서,The method of claim 1, 상기 화학식 1로 표시되는 폴리머를 포함하는 굴절률층은 하기 화학식 3으로 표시되는 코폴리머를 더 포함하는, 색변환 광결정 구조체:The refractive index layer comprising the polymer represented by Formula 1 further comprises a copolymer represented by Formula 3, a color conversion photonic crystal structure: [화학식 3][Formula 3]
Figure PCTKR2017011005-appb-I000020
Figure PCTKR2017011005-appb-I000020
상기 화학식 3에서,In Chemical Formula 3, R5 및 R6은 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 5 and R 6 are each independently hydrogen or C 1-3 alkyl, X11 내지 X15는 각각 독립적으로, N 또는 CR"이되, X11 내지 X15 중 적어도 하나는 N이고,X 11 to X 15 are each independently N or CR ″, at least one of X 11 to X 15 is N, 여기서 R"는 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,Wherein R ″ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, L3은 O 또는 NH이고,L 3 is O or NH, Y3은 벤조일페닐이고,Y 3 is benzoylphenyl, 여기서 Y3은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n3 및 m3은 각각 독립적으로 1 이상의 정수이고,n3 and m3 are each independently an integer of 1 or more, n3+m3은 100 내지 1,000이다.n3 + m3 is 100-1,000.
제5항에 있어서,The method of claim 5, 상기 화학식 1로 표시되는 코폴리머 및 상기 화학식 3으로 표시되는 코폴리머의 몰비는 90: 10 내지 10: 90인, 색변환 광결정 구조체.The molar ratio of the copolymer represented by Formula 1 and the copolymer represented by Formula 3 is 90: 10 to 10: 90, the color conversion photonic crystal structure. 제1항에 있어서,The method of claim 1, 상기 제1 굴절률층과 상기 제2 굴절률층의 총 적층수는 5 내지 30 층인, 색변환 광결정 구조체.The total number of stacked layers of the first refractive index layer and the second refractive index layer is 5 to 30 layers, color conversion photonic crystal structure. 제1항에 있어서,The method of claim 1, 상기 제1 굴절률층은 두께가 50 내지 160 nm인 고굴절률층이고,The first refractive index layer is a high refractive index layer having a thickness of 50 to 160 nm, 상기 제2 굴절률층은 두께가 25 내지 70 nm인 저굴절률층인, 색변환 광결정 구조체.The second refractive index layer is a low refractive index layer having a thickness of 25 to 70 nm, color conversion photonic crystal structure. 제1항에 있어서,The method of claim 1, 상기 광결정 구조체의 색변환은 습도 변화에 따라 반사 파장이 시프트되어 나타나는 것인, 색변환 광결정 구조체.Color conversion of the photonic crystal structure is a color conversion photonic crystal structure that appears to shift the reflection wavelength in accordance with the change in humidity. 제1항 내지 제9항 중 어느 한 항의 색변환 광결정 구조체를 포함하는, 색변환 광결정 센서.A color conversion photonic crystal sensor comprising the color conversion photonic crystal structure of claim 1. 1) 제1 굴절률층과 제2 굴절률층이 교대로 적층된 전구 구조체를 제조하는 단계; 및1) manufacturing a light bulb structure in which the first refractive index layer and the second refractive index layer are alternately stacked; And 2) 상기 전구 구조체를 하기 화학식 4로 표시되는 화합물과 접촉시켜 광결정 구조체를 제조하는 단계;를 포함하고,2) preparing a photonic crystal structure by contacting the precursor structure with a compound represented by the following formula (4); 상기 제1 굴절률층은 제1 굴절률을 나타내는 제1 폴리머를 포함하고, 상기 제2 굴절률층은 상기 제1 굴절률과 상이한 제2 굴절률을 나타내는 제2 폴리머를 포함하며,The first refractive index layer comprises a first polymer exhibiting a first refractive index, and the second refractive index layer comprises a second polymer exhibiting a second refractive index different from the first refractive index, 상기 제1 폴리머 및 상기 제2 폴리머 중 하나는, 하기 화학식 3으로 표시되는 코폴리머인,One of the first polymer and the second polymer is a copolymer represented by the following formula (3), 색변환 광결정 구조체의 제조 방법:Process for producing color conversion photonic crystal structure: [화학식 3][Formula 3]
Figure PCTKR2017011005-appb-I000021
Figure PCTKR2017011005-appb-I000021
상기 화학식 3에서,In Chemical Formula 3, R5 및 R6은 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 5 and R 6 are each independently hydrogen or C 1-3 alkyl, X11 내지 X15는 각각 독립적으로, N 또는 CR"이되, X11 내지 X15 중 적어도 하나는 N이고,X 11 to X 15 are each independently N or CR ″, at least one of X 11 to X 15 is N, 여기서 R"는 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고,Wherein R ″ is hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, L3은 O 또는 NH이고,L 3 is O or NH, Y3은 벤조일페닐이고,Y 3 is benzoylphenyl, 여기서 Y3은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 3 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n3 및 m3은 각각 독립적으로 1 이상의 정수이고,n3 and m3 are each independently an integer of 1 or more, n3+m3은 100 내지 1,000이고,n3 + m3 is 100 to 1,000, [화학식 4][Formula 4] R-XR-X 상기 화학식 4에서,In Chemical Formula 4, R은 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴또는 C7-20 아릴알킬이고,R is hydrogen, C1-20 alkyl, C3-20 cycloalkyl, C6-20 aryl, C7-20 alkylaryl or C7-20 arylalkyl, X는 이탈기(leaving group)이다.X is a leaving group.
제11항에 있어서,The method of claim 11, 상기 화학식 3에서,In Chemical Formula 3, X11은 N이고, X12 내지 X15는 각각 독립적으로 CR"이거나;X 11 is N and X 12 to X 15 are each independently CR ″; X12는 N이고, X11, X13 내지 X15는 각각 독립적으로 CR"이거나; 또는X 12 is N and X 11 , X 13 to X 15 are each independently CR ″; or X13은 N이고, X11, X12, X14 및 X15는 각각 독립적으로 CR"이고,X 13 is N, X 11 , X 12 , X 14 and X 15 are each independently CR ″, 여기서, R"는 수소, 메틸, 에틸, 또는 페닐이고,Wherein R ″ is hydrogen, methyl, ethyl, or phenyl, 상기 화학식 4에서,In Chemical Formula 4, R은 메틸, 에틸, n-프로필, 이소프로필, n-부틸, 이소부틸, sec-부필, tert-부틸, n-펜틸, 이소펜틸, 네오펜틸, tert-펜틸, 페닐, 벤질, 또는 페닐에틸이고,R is methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl, n-pentyl, isopentyl, neopentyl, tert-pentyl, phenyl, benzyl, or phenylethyl , X는 F, Cl, Br, I, ClO4, SCN, NO3, 또는 CH3CO2인,X is F, Cl, Br, I, ClO 4 , SCN, NO 3 , or CH 3 CO 2 , 제조 방법.Manufacturing method. 제11항에 있어서,The method of claim 11, 상기 제1 폴리머 및 상기 제2 폴리머 중 다른 하나는, 하기 화학식 2로 표시되는 코폴리머인,The other of the first polymer and the second polymer is a copolymer represented by the following formula (2), 제조 방법:Manufacturing method: [화학식 2][Formula 2]
Figure PCTKR2017011005-appb-I000022
Figure PCTKR2017011005-appb-I000022
상기 화학식 2에서,In Chemical Formula 2, R3 및 R4는 각각 독립적으로 수소 또는 C1-3 알킬이고,R 3 and R 4 are each independently hydrogen or C 1-3 alkyl, A는 C1-10 플루오로알킬이고,A is C 1-10 fluoroalkyl, L2는 O 또는 NH이고,And L 2 represents O or NH, Y2는 벤조일페닐이고,Y 2 is benzoylphenyl, 여기서 Y2는 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 2 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n2 및 m2는 각각 독립적으로 1 이상의 정수이고,n2 and m2 are each independently an integer of 1 or more, n2+m2는 100 내지 1,000이다.n2 + m2 is 100-1,000.
제13항에 있어서,The method of claim 13, R3 및 R4는 각각 독립적으로 수소 또는 메틸이고,R 3 and R 4 are each independently hydrogen or methyl, A는 플루오로메틸, 디플루오로메틸, 트리플루오로메틸, 1-플루오로에틸, 2-플루오로에틸, 1,1-디플루오로에틸, 1,2-디플루오로에틸, 2,2-디플루오로에틸, 1,1,2-트리플루오로에틸, 1,2,2-트리플루오로에틸, 2,2,2-트리플루오로에틸, 1-플로오로프로필, 2-플루오로프로필, 1,1-디플루오로프로필, 1,2-디플루오로프로필, 2,2-디플루오로프로필, 1,1,2-트리플루오로프로필, 1,2,2-트리플루오로프로필, 2,2,2-트리플루오로프로필, 1-플로오로부틸, 2-플루오로부틸, 1,1-디플루오로부틸, 1,2-디플루오로부틸, 2,2-디플루오로부틸, 1,1,2-트리플루오로부틸, 1,2,2-트리플루오로부틸, 또는 2,2,2-트리플루오로부틸인,A is fluoromethyl, difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 1,1-difluoroethyl, 1,2-difluoroethyl, 2,2- Difluoroethyl, 1,1,2-trifluoroethyl, 1,2,2-trifluoroethyl, 2,2,2-trifluoroethyl, 1-fluoropropyl, 2-fluoropropyl, 1,1-difluoropropyl, 1,2-difluoropropyl, 2,2-difluoropropyl, 1,1,2-trifluoropropyl, 1,2,2-trifluoropropyl, 2 , 2,2-trifluoropropyl, 1-fluorobutyl, 2-fluorobutyl, 1,1-difluorobutyl, 1,2-difluorobutyl, 2,2-difluorobutyl, 1 , 1,2-trifluorobutyl, 1,2,2-trifluorobutyl, or 2,2,2-trifluorobutyl, 제조 방법.Manufacturing method. 제11항에 있어서,The method of claim 11, 상기 전구 구조체는 상기 제1 굴절률층과 상기 제2 굴절률층이 교대로 총 5 내지 30 층으로 적층되도록 제조되는,The bulb structure is manufactured such that the first refractive index layer and the second refractive index layer are alternately stacked in a total of 5 to 30 layers, 제조 방법.Manufacturing method. 제11항에 있어서,The method of claim 11, 상기 화학식 4로 표시되는 화합물은 상기 화학식 3로 표시되는 코폴리머 1 몰 대비 1 내지 5 몰로 사용되는,The compound represented by Formula 4 is used in 1 to 5 moles compared to 1 mole of the copolymer represented by Formula 3, 제조 방법.Manufacturing method. 제11항에 있어서,The method of claim 11, 상기 단계 2)에서,In step 2) above, 상기 화학식 3으로 표시되는 코폴리머는 상기 화학식 4로 표시되는 화합물과 반응하여 하기 화학식 1로 표시되는 코폴리머로 전환되는,The copolymer represented by Formula 3 is converted to the copolymer represented by Formula 1 by reacting with the compound represented by Formula 4, 제조 방법:Manufacturing method: [화학식 1][Formula 1]
Figure PCTKR2017011005-appb-I000023
Figure PCTKR2017011005-appb-I000023
상기 화학식 1에서,In Chemical Formula 1, R1 및 R2는 각각 독립적으로, 수소 또는 C1-3 알킬이고,R 1 and R 2 are each independently hydrogen or C 1-3 alkyl, X1 내지 X5는 각각 독립적으로, N+RX- 또는 CR'이되, X1 내지 X5 중 적어도 하나는 N+RX-이고,And, - X 1 to X 5 are, each independently, N + RX - or CR ', provided at least one of X 1 to X 5 is N + RX 여기서 R 및 R'는 각각 독립적으로, 수소, C1-20 알킬, C3-20 사이클로알킬, C6-20 아릴, C7-20 알킬아릴 또는 C7-20 아릴알킬이고, X-는 1가의 음이온이고,Wherein R and R 'are each independently hydrogen, C 1-20 alkyl, C 3-20 cycloalkyl, C 6-20 aryl, C 7-20 alkylaryl or C 7-20 arylalkyl, X is 1 Is an anionic L1은 O 또는 NH이고,And L 1 is O, or NH, Y1은 벤조일페닐이고,Y 1 is benzoyl, phenyl, 여기서 Y1은 비치환되거나, 또는 하이드록시, 할로겐, 니트로, C1-5 알킬 및 C1-5 알콕시로 구성되는 군으로부터 각각 독립적으로 선택되는 1개 내지 4개의 치환기로 치환되고,Wherein Y 1 is unsubstituted or substituted with 1 to 4 substituents each independently selected from the group consisting of hydroxy, halogen, nitro, C 1-5 alkyl and C 1-5 alkoxy, n1 및 m1은 각각 독립적으로 1 이상의 정수이고,n1 and m1 are each independently an integer of 1 or more, n1+m1은 100 내지 1,000이다.n1 + m1 is 100-1,000.
제17항에 있어서,The method of claim 17, 상기 화학식 3으로 표시되는 코폴리머에서 상기 화학식 1로 표시되는 코폴리머로의 전환율은 1% 내지 100%인,Conversion rate of the copolymer represented by Formula 3 to the copolymer represented by Formula 1 is 1% to 100%, 제조 방법.Manufacturing method. 제11항에 있어서,The method of claim 11, 상기 광결정 구조체의 반사 파장은 상기 전구 구조체의 반사 파장보다 장파장인,The reflection wavelength of the photonic crystal structure is longer than the reflection wavelength of the light bulb structure, 제조 방법.Manufacturing method.
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