WO2017105062A1 - Method and system for removing biofilm by using high power millimeter waves - Google Patents

Abstract

The present invention presents a method and a system for removing a biofilm by using high power millimeter waves. According to a preferred embodiment of the present invention, the system for removing a biofilm emits a high power millimeter wave beam at an object such that the wave beam penetrates within hundreds of micrometers from the surface of the object, thereby removing a biofilm. The system for removing a biofilm by using high power millimeter waves, of the present invention, comprises: a millimeter wave emission apparatus; a guiding device for reflecting the millimeter waves, which are outputted from the millimeter wave emission apparatus, so as to output the same toward an object having a biofilm formed thereon; a transfer device for moving and rotating the object; and a control device for controlling the guide direction of the guiding device and controlling the transfer device.

Description

Method and system for removing bio film using high power millimeter wave

The present invention relates to a biofilm removal method and system, and more particularly to a biofilm removal method and system formed on the surface of food.

Biofilm refers to a microbial community in which microorganisms are irreversibly attached to the surface of food or the human body to survive in a low-nutrient environment. Pathogenic microorganisms can coexist with other microorganisms on the surface of food or food processing to form a colony and survive for a long time, causing contamination and cross-contamination without affecting sterilization and affecting the food quality / shelf life. This has been reported continuously.

In order to remove such biofilms, conventional technologies use materials that block the communication path between microorganisms such as sterilizers / disinfectants or natural antibacterial agents, treatment with high power microwave heating or pulsed electric field and germicidal light, sterilization with plasma, etc. The method of was applied.

However, disinfectants, disinfectants, and antimicrobial agents applied to foods cause problems in food safety, and high-power microwaves irradiated to foods to remove biofilm are absorbed throughout the foods, and the effect of removing microorganisms on the surface is insufficient. There has been a problem that can damage the freshness of food by heating.

In addition, the pulsed electric field applied to the food surface to remove the biofilm can not be controlled to operate only on the surface, there was a problem that is difficult to selectively apply to the local area. In the case of sterile light, it is difficult to make a large area while maintaining the output density. In the case of sterilization using plasma, when the volume of the sample to be sterilized is large, it is difficult to operate the chamber for plasma sterilization, and in the case of atmospheric plasma, there is a fear of secondary contamination because the electrode should be positioned adjacent to the sample.

As described above, prior art for removing biofilms is disclosed in the following documents.

A. Taraszkiewicz , G. Fila , M. Grinholc , and J. Nakonieczna , "Innovative Strategies to Overcome Biofilm  Resistance, " BioMed  Research International, 150653 (2013).

R. Caubet  et al., "A Radio Frequency Electric Current Enhances Antibiotic Efficacy against Bacterial Biofilms , "Antimicrobial Agents and Chemotherapy, pp. 4662-4664 (2004).

The problem to be solved by the present invention is to provide a biofilm removal method and system that can remove the biofilm formed on the surface of meat and food without chemical treatment such as fungicides or antibacterial agents.

Biofilm removal system using a high power millimeter wave according to a preferred embodiment of the present invention for solving the above problems, the biofilm for outputting the millimeter wave beam to the target object, to remove the biofilm formed on the surface of the target object Removal device.

In addition, the biofilm removal device, a millimeter wave irradiation device for outputting a millimeter wave beam to the target object in accordance with a control signal; And it may include a control device for adjusting the output intensity and pulse period of the millimeter wave irradiated from the millimeter wave irradiation apparatus by changing the period and the duty cycle of the control signal.

In addition, the biofilm removing device further comprises a guiding device 120 for reflecting the millimeter wave beam output from the millimeter wave irradiation device to output the target object on which the biofilm is formed, the control device is the guiding device The direction of the device 120 can be controlled.

The guiding apparatus may further include one or more sub reflectors reflecting the millimeter wave beams emitted from the millimeter wave irradiation apparatus; And a main reflector reflecting the millimeter wave beam reflected from the sub reflector and irradiating the target object.

In addition, the main reflector, the altitude and azimuth may be adjusted according to the control signal of the control device.

The guiding apparatus may adjust the energy density of the millimeter wave beam irradiated to the target object by adjusting a distance between the sub reflector and the main reflector according to a control signal input from the control apparatus.

The guiding apparatus may further include a waist region of the millimeter wave beam, which is a Gaussian beam irradiated onto the target object, by adjusting a distance between the sub reflector and the main reflector according to a control signal input from the control apparatus. The size of the waste area may be adjusted according to the target object.

In addition, the biofilm removing apparatus includes a waveguide (uneven waveguide) having an uneven interior therebetween that protects the millimeter wave irradiation device from the millimeter wave beam reflected from the target object between the millimeter wave irradiation device and the target object. A matching optical system may be further installed.

In addition, the matching optical system may include one or more reflectors such that the width of the millimeter wave beam output from the millimeter wave irradiation device is 0.64 times the inner diameter of the uneven waveguide when the uneven waveguide is incident on the uneven waveguide.

The biofilm removing apparatus may further include a conveying device for moving and rotating the object, and the control device may control the conveying device.

In addition, the transfer apparatus may move the target object to an area to which the millimeter wave beam is irradiated according to a control signal input from the control device, and then rotate the target object by 360 degrees.

On the other hand, the biofilm removal method according to a preferred embodiment of the present invention for solving the above problems, (a) by adjusting the distance between the sub-reflector and the main reflector reflecting the millimeter wave beam output from the millimeter wave irradiation apparatus Adjusting the energy density of the millimeter wave beam to be irradiated to the object; And (c) removing the biofilm formed on the surface of the target object by irradiating a millimeter wave beam to the target object.

In addition, the biofilm removing method of the present invention, before the step (a), by performing the initial setting of the millimeter wave irradiation apparatus, further adjusting the output intensity and pulse period of the millimeter wave beam to be irradiated to the target object It may include.

In addition, in the step (a), the waist region of the millimeter wave beam, which is a Gaussian beam irradiated onto the target object by adjusting the distance between the sub reflector and the main reflector, is positioned on the target object, and the size of the waist region is the target object. Can be adjusted accordingly.

The biofilm removing method of the present invention may further include: (b) moving the target object to a millimeter wave irradiation region between the step (a) and the step (c); and (c) In the step, the millimeter wave beam may be irradiated onto the target object while rotating the target object.

In addition, the method of removing the biofilm of the present invention may further include performing the step (c) after moving the next target object to the millimeter wave irradiation area.

Also, in the step (c), the millimeter wave beam may be irradiated while adjusting the elevation angle and the azimuth angle of the main reflector.

Biofilm removal method and system using a high power millimeter wave in accordance with a preferred embodiment of the present invention, by irradiating a high power millimeter wave beam to the target object, it is penetrated within a few hundred micrometers from the surface of the target object to remove the biofilm.

Thus, according to the present invention, non-chemical treatments can not only dispel concerns about food safety issues, but also use millimeter wave surface effects (heating / high systems) in which the penetration depth of wheat meat is limited to within a few hundred micrometers. Therefore, it is possible to selectively treat only the surface of food, etc., in the case of microwave heating in the prior art, it is difficult to select the area for removing the biofilm when the pulsed electric field is applied. It has the effect of solving the problem.

In addition, while the conventional technology of removing the biofilm using light is required chemical media such as photosensitizer, the present invention is not only possible to adjust the power density, irradiation distribution, etc. using the millimeter wave irradiation device and the guiding device In addition, biofilm removal can be more effectively performed by controlling the power, duration, and repetition rate of the high power millimeter wave.

In addition, using the millimeter wave irradiation apparatus of the present invention, unlike the prior art using light, it is possible to apply a high output / electric field to a large area, and to adjust the irradiation position by adjusting the altitude and azimuth angle of the main reflector of the guiding system. As well as control, the distance between the sub-reflector and the main reflector is adjusted to control the angle at which the millimeter wave beam spreads, thereby controlling the energy density of the millimeter wave beam at the irradiation point.

In addition, the present invention can optimize the millimeter wave field irradiation conditions by adjusting the acceleration voltage pulse duty (pulse width, repetition rate) of the high output millimeter wave generator, and the irradiation electromagnetic field strength by controlling the electron beam current of the high power millimeter wave irradiation apparatus Can be optimized

1A is a diagram showing the configuration of a biofilm removal system using a high output millimeter wave according to a preferred embodiment of the present invention.

1B is a diagram showing the configuration of a matching optical system according to a preferred embodiment of the present invention.

2 is a view showing the configuration of a biofilm removal system using a high output millimeter wave according to a preferred embodiment of the present invention.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

First, referring to FIG. 1A, a biofilm removal system using a high output millimeter wave according to a preferred embodiment of the present invention includes a millimeter wave irradiation device 110, a matching optical system 150, a guiding device 120, and a transfer device ( 130 and the control device 140 is configured.

First, the millimeter wave irradiation device 110 generates a high output millimeter wave beam according to a control signal input from the control device 140 and outputs it to the matching optical system 150, and the millimeter wave beam passing through the matching optical system 150 is It is input to the guiding apparatus 120 and irradiated to the sub reflector 121.

The millimeter wave irradiation device 110 adjusts the output intensity and pulse period of the millimeter wave beam to be irradiated according to the period and duty cycle of the control signal. Irradiation at (121) is made such that the power density on the surface of the target sample is several kW / m ² or more.

The matching optical system 150 includes a waveguide (corrugated waveguide) 153 having an unevenness formed therein, and by irradiating a millimeter wave beam to the guiding device 120 through the uneven waveguide 153, the biofilm The millimeter wave irradiation device 110 is protected by blocking the reflected wave reflected from the object to be removed 200 and flowing into the millimeter wave irradiation device 110.

In detail, in the case of the uneven waveguide 153, the beam α may pass through the uneven waveguide 153 when the width α of the incident beam is 0.64 times the inner diameter β of the uneven waveguide 153. Therefore, in the preferred embodiment of the present invention, by adjusting the angle, distance, curvature, etc. of the reflecting mirrors 151 and 152 included in the matching optical system 150 in advance, it is output from the millimeter wave irradiation device 110 and the uneven waveguide 153 The width? Of the millimeter wave beam incident on the?) Is adjusted to be 0.64 times the inner diameter? Of the uneven waveguide 153.

However, since the reflected wave reflected from the target object 200 is incident on the uneven waveguide 153 in any direction and the width of the beam, there is a probability that it is coupled to the uneven waveguide 153 and passes through the uneven waveguide 153. Significantly lowered, thereby preventing the generation of arcs by standing waves that may be formed by reflected waves between the window of the millimeter wave irradiation apparatus 110 and the matching optical system 150.

The guiding apparatus 120 includes one or more sub reflectors 121 and a main reflector 122 to reflect the millimeter wave output from the millimeter wave irradiation device 110 and output the reflected object to the object on which the biofilm is formed. The sub reflector 121 and the main reflector 122 included in the guiding device 120 are configured to adjust the interval between the sub reflector 121 and the main reflector 122 according to a control signal input from the control device 140. The spacing may be adjusted so that the energy density of the millimeter wave beam irradiated onto the object 200 may be adjusted.

In addition, the main reflector 122 is provided with an azimuth adjusting unit 124 for adjusting the left and right irradiation directions (azimuth angle) of the millimeter beam and an elevation angle adjusting unit 123 for adjusting the up and down irradiation direction (altitude angle) of the millimeter beam. . The altitude angle adjusting unit 123 and the azimuth angle adjusting unit 124 adjust the altitude angle and the azimuth angle according to the control signal input from the control device 140, respectively, and the altitude angle of the millimeter wave beam according to the change of the target object 200. Azimuth can be adjusted adaptively.

At this time, the guiding device 120 adjusts the distance between the sub reflector 121 and / or the distance between the sub reflector 121 and the main reflector 122 according to the control signal input from the control device 140. The waist region of the millimeter wave beam, which is a Gaussian beam (TEM00 or HE11) irradiated to 200, may be positioned on the target object 200, and the size of the waist region may be controlled to be adjusted according to the target object 200. have. When the waist region of the millimeter wave beam is disposed on the target object 200, the millimeter wave beam has the same phase in the region where the beam is irradiated to the target object 200, and the constant electric field is applied to the entire region of the target object 200. Since the millimeter wave beam having the intensity is irradiated, the biofilm removal efficiency can be improved.

The transport apparatus 130 may move the target object 200 to the irradiation area of the millimeter wave beam while supporting the target object 200 on which the biofilm is formed, and may rotate as necessary. The transfer device 130 may be implemented as a conveyor belt that sequentially moves the target object 200 to the irradiation area of the millimeter wave beam according to the control signal of the control device 140, and if necessary, the target object 200. The rotating member 131 may be further provided to rotate 360 degrees.

Finally, the control device 140 outputs a control signal to the millimeter wave irradiation device 110 to control the generation and the period of the millimeter wave, specifically, the duty cycle of the PWM control signal as shown in Figure 1a And the period to adjust the output intensity and pulse period of the millimeter wave to be irradiated.

In addition, the control device 140 outputs a control signal to the guiding device 120, adjusts the distance between the sub reflector 121 and the main reflector 122, the energy of the millimeter wave beam irradiated to the target object 200 In addition to adjusting the density, the azimuth control unit 124 and the altitude control unit 123 are controlled to control the azimuth and altitude angle at which the millimeter wave beam is irradiated onto the target object 200.

In addition, the control device 140 outputs a control signal to the transfer device 130 to move the target object 200 to the area to which the millimeter wave beam is irradiated, and if necessary, by using the rotating member 131. 200) can be rotated.

2 is a flowchart illustrating a biofilm removal method using a high power millimeter wave according to a preferred embodiment of the present invention.

Hereinafter, a method of removing a biofilm using a high power millimeter wave according to a preferred embodiment of the present invention will be described with reference to FIG. 2. However, since the biofilm removal method described with reference to FIG. 2 is performed in the biofilm removal system shown in FIG. 1A, all of the functions described above with reference to FIG. 1A without the explicit description are all biofilm removal methods of the present invention. Note that this is done in.

First, the control device 140 performs the initial setting in accordance with the operation of the administrator. Specifically, the control device 140 adjusts the output intensity and pulse period of the millimeter wave beam to be output from the millimeter wave irradiation device 110 according to the operation of the manager (S210), and outputs from the millimeter wave irradiation device 110. The energy density of the millimeter wave beam to be irradiated to the target object 200 is adjusted by adjusting the distance between the sub reflector 121 and the main reflector 122 reflecting the millimeter wave beam (S220). At this time, the output intensity and pulse period of the millimeter wave beam and the energy density of the millimeter wave beam irradiated to the target object 200 may be automatically set according to the type of the target object 200.

In addition, in step S220, the guiding apparatus 120 may have an interval between the sub reflectors 121 and / or an interval between the sub reflectors 121 and the main reflector 122 according to a control signal input from the control apparatus 140. The waist region of the millimeter wave beam, which is a Gaussian beam irradiated onto the target object 200, may be positioned in the target object 200, and the size of the waist region may be controlled to be adjusted according to the target object 200. When the waist region of the millimeter wave beam is disposed on the target object 200, the millimeter wave beam has the same phase in the region where the beam is irradiated to the target object 200, and the constant electric field is applied to the entire region of the target object 200. Since the millimeter wave beam having the intensity is irradiated, the biofilm removal efficiency can be improved.

Thereafter, the control device 140 controls the transfer device 130 to move the target object 200 to the millimeter wave irradiation area (S230), and applies power to the millimeter wave irradiation device 110 to supply the millimeter wave irradiation device. The biofilm is removed by outputting the millimeter wave beam at 110 and irradiating the millimeter wave beam to the target object 200 (S240). In the step S240, the millimeter wave irradiation device 110 outputs the millimeter wave beam of the intensity and the period set in the step S210 according to the control signal input from the control device 140, and the output millimeter wave beam is a sub-reflector ( 121 and the main reflector 122 are reflected to the target object 200. In addition, when a millimeter wave beam is required in the process of irradiating the target object 200, the control device 140 controls the rotating member 131 to rotate the target object 200 to the entire area of the target object 200. The biofilm can be removed by irradiating a millimeter wave beam.

In addition, when there are a plurality of target objects 200, the control device 140 examines whether there are more target objects 200 to be removed from the biofilm, and if there are more target objects 200, step S230 and After performing step S240 again, the transfer device 130 is controlled to move the next target object 200 to the millimeter wave irradiation area, and then the millimeter wave beam is irradiated to another target object 200 to remove the biofilm. (S250).

Biofilm removal method and system using a high power millimeter wave according to a preferred embodiment of the present invention described so far, by irradiating a high power millimeter wave beam to the target object 200, within a few hundred micrometers from the surface of the target object 200 Penetrate to remove the biofilm.

Thus, according to the present invention, non-chemical treatments can not only dispel concerns about food safety issues, but also use millimeter wave surface effects (heating / high systems) in which the penetration depth of wheat meat is limited to within a few hundred micrometers. Therefore, it is possible to selectively treat only the surface of food, etc., in the case of microwave heating in the prior art, it is difficult to select the area for removing the biofilm when the pulsed electric field is applied. It has the effect of solving the problem.

In addition, while the conventional technology of removing the biofilm using light is required chemical media such as photosensitizer, the present invention is not only possible to adjust the power density, irradiation distribution, etc. using the millimeter wave irradiation device and the guiding device In addition, biofilm removal can be more effectively performed by controlling the power, duration, and repetition rate of the high power millimeter wave.

In addition, using the millimeter wave irradiation apparatus of the present invention, unlike the prior art using light, it is possible to apply a high output / electric field to a large area, and to adjust the irradiation position by adjusting the altitude and azimuth angle of the main reflector of the guiding system. As well as control, the distance between the sub-reflector and the main reflector is adjusted to control the angle at which the millimeter wave beam spreads, thereby controlling the energy density of the millimeter wave beam at the irradiation point.

In addition, the present invention can optimize the millimeter wave field irradiation conditions by adjusting the acceleration voltage pulse duty (pulse width, repetition rate) of the high output millimeter wave generator, and the irradiation electromagnetic field strength by controlling the electron beam current of the high power millimeter wave irradiation apparatus Can be optimized

So far I looked at the center of the preferred embodiment for the present invention. Those skilled in the art will appreciate that the present invention can be implemented in a modified form without departing from the essential features of the present invention. Therefore, the disclosed embodiments should be considered in descriptive sense only and not for purposes of limitation. The scope of the present invention is shown in the claims rather than the foregoing description, and all differences within the scope will be construed as being included in the present invention.

Claims (17)

A biofilm removal apparatus for outputting a millimeter wave beam to a target object to remove the biofilm formed on the surface of the target object. The method of claim 1, wherein the biofilm removing device A millimeter wave irradiation device for outputting a millimeter wave beam to the target object according to a control signal; And And a control device for changing an output intensity and a pulse period of the millimeter wave radiated from the millimeter wave irradiation device by changing a period and a duty cycle of the control signal. The method of claim 2, And a guiding device for reflecting the millimeter wave beam output from the millimeter wave irradiation device and outputting the reflected object to a target object on which a biofilm is formed. And said control device controls the direction of said guiding device. The method of claim 3, wherein the guiding device At least one sub reflector for reflecting the millimeter wave beam emitted from the millimeter wave irradiation device; And And a main reflector reflecting the millimeter wave beam reflected from the sub reflector and irradiating the target object to the target object. The method of claim 4, wherein the main reflector Biofilm removal device, characterized in that the altitude and azimuth is adjusted according to the control signal of the control device. The method of claim 4, wherein the guiding device And controlling the energy density of the millimeter wave beam irradiated to the target object by adjusting a distance between the sub reflector and the main reflector according to a control signal input from the control device. The method of claim 6, wherein the guiding device The waist region of the millimeter wave beam, which is a Gaussian beam irradiated to the target object by adjusting the distance between the sub reflector and the main reflector according to a control signal input from the control device, is positioned on the target object, and the size of the waist region is Biofilm removal device, characterized in that to be adjusted according to the object. The method of claim 2, Between the millimeter wave irradiation device and the target object, a matching optical system including a waveguide (uneven waveguide) having irregularities formed therein is provided to protect the millimeter wave irradiation device from the millimeter wave beam reflected from the target object. Bio film removal apparatus. The method of claim 8, wherein the matching optical system And at least one reflector such that the width of the millimeter wave beam output from the millimeter wave irradiation device is 0.64 times the inner diameter of the uneven waveguide when the uneven waveguide is incident on the uneven waveguide. The method according to any one of claims 2 to 9, Further comprising a transfer device for moving and rotating the object, And said control device controls said transfer device. The method of claim 10, wherein the transfer device And moving the target object to an area to which the millimeter wave beam is irradiated according to a control signal input from the control device, and then rotating the target object by 360 degrees. (a) adjusting an energy density of the millimeter wave beam to be irradiated to the target object by adjusting a distance between the main reflector and the sub reflector reflecting the millimeter wave beam output from the millimeter wave irradiation device; And (c) irradiating a millimeter wave beam to a target object to remove the biofilm formed on the surface of the target object. 13. The method according to claim 12, wherein before step (a) And performing an initial setting of the millimeter wave irradiation device to adjust an output intensity and a pulse period of the millimeter wave beam to be irradiated to the target object. The method of claim 12, wherein step (a) By adjusting the distance between the sub reflector and the main reflector, the waist region of the millimeter wave beam, which is a Gaussian beam irradiated to the target object, is positioned on the target object, and the size of the waist region is adjusted according to the target object. Bio film removal method. The method of claim 12, Between step (a) and step (c) (b) moving the target object to a millimeter wave irradiation area; In the step (c), while rotating the target object, the biofilm removal method, characterized in that for irradiating a millimeter wave beam to the target object. The method of claim 15, and (d) moving the next object to a millimeter wave irradiation area, and then performing step (c). The method of claim 15, wherein step (c) Biofilm removal method characterized in that to irradiate the millimeter wave beam while adjusting the altitude and azimuth angle of the main reflector.

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