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WO2017037223A1 - Dispositif de génération d'un jet de plasma et procédé de traitement de surface - Google Patents

Dispositif de génération d'un jet de plasma et procédé de traitement de surface Download PDF

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Publication number
WO2017037223A1
WO2017037223A1 PCT/EP2016/070697 EP2016070697W WO2017037223A1 WO 2017037223 A1 WO2017037223 A1 WO 2017037223A1 EP 2016070697 W EP2016070697 W EP 2016070697W WO 2017037223 A1 WO2017037223 A1 WO 2017037223A1
Authority
WO
WIPO (PCT)
Prior art keywords
flow channel
electrodes
field
dielectric
plasma jet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2016/070697
Other languages
German (de)
English (en)
Inventor
Wolfgang Viöl
Christian Haese
Roland Damm
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Robert Bosch GmbH
Hochschule fuer Angewandte Wissenschaft und Kunst Hildesheim Holzminden Gottingen
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Original Assignee
Robert Bosch GmbH
Hochschule fuer Angewandte Wissenschaft und Kunst Hildesheim Holzminden Gottingen
Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Robert Bosch GmbH, Hochschule fuer Angewandte Wissenschaft und Kunst Hildesheim Holzminden Gottingen, Fraunhofer Gesellschaft zur Foerderung der Angewandten Forschung eV filed Critical Robert Bosch GmbH
Publication of WO2017037223A1 publication Critical patent/WO2017037223A1/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2418—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the electrodes being embedded in the dielectric
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/246—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using external electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Definitions

  • the invention relates to a device and a method for producing a plasma jet with at least one
  • Flow channel is limited by at least one dielectric. Furthermore, the invention relates to a method for surface treatment, in which a plasma jet generated by at least two field electrodes acts on the surface to be treated. Devices and methods of
  • the aforementioned type can be used to influence the chemical or physical properties of material surfaces.
  • the aforementioned type can be used to influence the chemical or physical properties of material surfaces.
  • Adhesive strength of adhesives or coatings improved or a disinfection or germ reduction can be performed.
  • Metal wire is a dielectric shield, so that in the gas space above the surface of the metal wire, a dielectrically impeded charge is generated.
  • the plasma thus generated acts on the surface of the wire. This can be used, for example, for cleaning the surface of the wire. This allows an attached on the wire coating have increased strength.
  • DE 44 040 34 AI is concerned with the use of a dielectrically impeded discharge for gentle cleaning of sensitive surfaces, wherein by cleaning both sterilization and disinfection is to be understood.
  • Electrodes ignite a plasma, which is expelled by a gas flow from a nozzle and so to the
  • the invention is therefore based on the object of specifying a method and a device with which surfaces can be cleaned and / or modified reliably and efficiently.
  • a device which has at least one flow channel.
  • the flow channel is adapted to generate a plasma jet.
  • a working gas can be supplied to the flow channel.
  • Working gas may be an inert or reactive gas in some embodiments of the invention.
  • An inert gas in some embodiments, may be selected from a noble gas, such as argon, helium, or xenon.
  • a reactive gas can react with the surface. For example, a
  • Reactive gas containing atomic oxygen, atomic hydrogen or ozone may be supplied.
  • At least two field electrodes are provided, with which an electric field can be generated in the flow channel.
  • the two field electrodes for example, on both sides of the
  • the working electrodes may surround the flow channel in an annular manner or be arranged coaxially.
  • the field electrodes may contain an electrically conductive material, for example a metal, an alloy or a transparent, conductive oxide. At least one
  • Electrode can be used as a coating on an insulating
  • Substrate may be applied, for example by sputtering, electroless or galvanic deposition.
  • the flow channel is limited by at least one dielectric. This means that forms a dielectrically impeded discharge in the flow channel.
  • the flow channel is limited by at least one dielectric. This means that forms a dielectrically impeded discharge in the flow channel.
  • the Dielek ⁇ trikum in the discharge gap has the effect that the Discharge always only briefly burns and no
  • the plasma formed in the flow channel is expelled from the flow channel by the flow of the working gas.
  • the plasma can be directed to the surface to be treated and act on these.
  • the passive electrode used in the invention comprises a capacitive coupling to the field ⁇ electrodes.
  • a plastic film in some embodiments, may be polyethylene, polypropylene, or polyethylene terephthalate.
  • Foils have a low melting point and can be melted quickly and thus destroyed by the action of a hot plasma.
  • the passive electrode may be made of a metal or alloy in some embodiments of the invention. This has the advantage over a dielectric-provided electrode for forming a dielectrically impeded discharge that the passive electrodes can be shaped much easier and also tips can be produced in a simple manner. The resulting field strength increase leads to a low ignition voltage of the sliding discharge. Furthermore, small structures can be reliably treated with the plasma ⁇ the as emanating from the tips, localized discharges can also penetrate into narrow cavities or trenches.
  • the gas stream of the plasma jets ensures to locate the creeping discharge on the surface to be treated and locally occurring, to prevent hot Ent ⁇ charge channels between the passive electrode efficiently or to cool.
  • Passive electrode in the flow direction of the working gas beyond a mouth of the flow channel This ensures that the sliding discharge ignites on the surface to be treated and not along the upper ⁇ surface of the device, the effect would be only slightly on the surface to be treated.
  • it includes a plurality of passive electrodes surrounding the mouth of the flow channel. This ensures that the sliding discharge reliably forms at least over a partial area, which is also detected by the plasma jet. In some embodiments of the invention, the entire area machined by the plasma jet can also be detected by the sliding charge.
  • Flow channel may be formed as a through hole in a dielectric base body. On the one hand, this reliably results in a flow channel which is bounded on all sides by a dielectric.
  • the device according to the invention can be manufactured by simple processing ⁇ steps quickly and inexpensively.
  • the dielectric base body can have blind holes, in each of which a passive electrode or a field electrode is accommodated.
  • This also allows simple and cost-effective production by the passive electrode and / or the field electrodes are as hollow or solid, metallic cylinder out ⁇ leads.
  • These can be introduced by means of a press fit in ⁇ assigned holes of the dielectric base body and fixed there. The fixing can ⁇ example, by clamping or optionally take place by adhesive bonding.
  • the blind holes are introduced from the front or the back into the base body, the passive electrodes project over the base body at the front in the mouth region in order to reliably ignite the sliding discharge on the surface to be treated.
  • the field electrodes can project beyond the base body on the back side, so that they can be contacted there easily with a high-voltage source.
  • Flow channel between about 0.25 mm and about 2 mm.
  • the thickness of the dielectric layer in the flow channel determines, in addition to the voltage, the frequency and the pulse / pause ratio, the electrical power which is converted in the flow channel. As a result, the plasma density and / or the quantity and / or the quality of the plasma generated can thus be influenced.
  • the dielectric may have a dielectric constant s r between about 5 and about 15. In other embodiments of the invention, the dielectric may have a dielectric constant s r between about 8 and about 12.
  • it may comprise a conveyor with which ambient air can be conveyed through the flow channel.
  • This embodiment has the effect that a separate gas supply, for example ⁇ by compressed gas cylinders, is not required, so that the handling of the device according to the invention is simplified.
  • the Device have between 2 and 10 field electrodes.
  • the shape, size and number of field electrodes also determines the electrical power that is converted in the flow channel. Accordingly, this parameter can be used to adapt the device to different tasks.
  • the number of passive electrodes may be between about 2 and about 6.
  • the type and number of passive electrodes determines the electrical power converted in the sliding discharge.
  • the pulsed high voltage may have a pulse duration of from about 20 ys to about 100 ys.
  • the electrical voltage may be selected between about 4 kV to about 20 kV.
  • the repetition rate of the output voltage pulses may be between about 10 kHz to about 20 kHz. It has been shown that a pulsed high voltage compared to other AC voltages causes an increased plasma density at the same electrical power. In addition, a pulsed high voltage leads to voltage-free pause times in which the ignited discharge filaments completely collapse. This prevents the discharge always ignites in the same discharge channels or filaments and there to a high plasma density with locally high
  • Figure 1 shows a cross section through a first embodiment of the invention.
  • FIG. 2 shows a longitudinal section through the first embodiment of the invention.
  • FIG. 3 shows a cross section through a second embodiment of the invention.
  • FIG. 4 shows a longitudinal section through the second embodiment .
  • FIG. 5 shows a cross section through a third embodiment of the invention.
  • FIG. 6 shows a longitudinal section through the third embodiment .
  • Figure 1 shows a cross section
  • Figure 2 shows a longitudinal section along the section line AA ⁇ .
  • the cross-section is situated in one to about behan ⁇ delnden surfaces parallel plane.
  • the longitudinal section is approximately orthogonal to it.
  • the device has a substantially cuboid base body 10.
  • the main body 10 may contain or consist of a dielectric material.
  • the main body 10 may be made of polyethylene, polypropylene, polytetrafluoroethylene, polyetheretherketone or other known per se, dielectric plastics.
  • the base body 10 may include or consist of a ceramic, for example
  • Alumina, silica, silicon oxynitride or similar materials are used.
  • two through holes 21 and 22 are arranged, which form two flow channels through which the working gas 6 flows during operation of the device.
  • the working gas 6 is conveyed by means of an optional conveyor 60, for example a diaphragm pump, a piston ⁇ compressor or a scroll compressor and by the blown in the substrate to be treated opposite rear side of the base body 10 in the flow channel.
  • an optional conveyor 60 for example a diaphragm pump, a piston ⁇ compressor or a scroll compressor and by the blown in the substrate to be treated opposite rear side of the base body 10 in the flow channel.
  • ambient air may be present be used as working gas.
  • the working gas 6 may be a reactive gas or an inert gas or a gas mixture predeterminable composition which is provided, for example, gas cylinders and injected into the flow channel.
  • the working gas 6 relaxes in the flow channel and leaves it through its mouth 220.
  • field electrodes 31, 32, 34 and 36 are available. As can be seen from Figure 1, the illustrated embodiment uses six field electrodes, for reasons of clarity, only four field electrodes are provided with reference numerals.
  • the field electrodes 31, 32, 34 and 36 are cylindrical in the illustrated embodiment and made of an electrically conductive metal or an alloy.
  • the field electrodes 31, 32, 34 and 36 extend approximately parallel to the flow channels 21 and 22.
  • the field electrodes 31, 32, 34 and 36 are rearwardly beyond the main body 10, so that there with a
  • High voltage source 5 can be contacted.
  • High voltage source may generate an AC voltage, which may be, for example, sinusoidal, rectangular or sawtooth.
  • a rectangular high voltage may also be referred to as a pulsed voltage which produces pulse durations of from about 2 ys to about 100 ys at a repetition rate of about 10 kHz to about 200 kHz, resulting in de-energized pause times.
  • the The invention may have a rectangular high voltage pulse durations of from about 20 ys to about 90 ys at a repetition rate of about 15 kHz to about 60 kHz. By tension-free breaks, the discharge may be erased after each pulse, so that they do not always burns in the same Ent ⁇ charge channels or filaments.
  • passive electrodes 41 and 42 are located on the front side of the basic body 10. In this case as well, not all of them are connected to the
  • the passive electrodes are designed as cylindrical pins, which are accommodated in blind holes.
  • the blind holes are drilled from the substrate facing the substrate to be treated in the base body 10 and also extend approximately parallel to the field electrodes 31, 32, 34 and 36 and the flow channels 21 and 22. This results in an efficient capacitive coupling of Passive electrodes 41 and 42 to the field electrodes 32 and 36, so that there sets an electrical voltage, which leads to the formation of a sliding discharge on the surface to be treated. Due to the
  • the passive electrodes 41 and 42 are beyond the front of the main body 10. This can be done by appropriate depth of blind holes and appropriate length of the passive electrodes are ensured.
  • FIGS. 1 and 2 with two flow channels, six field electrodes and four passive electrodes can, of course, be extended cyclically in order in this way also substrates with a larger size
  • Width can treat, for example, web goods, such as crude steel or packaging film, or large surface elements such as architectural glass.
  • the second embodiment of the invention also uses a flow channel 2, which is formed by a metallic tube.
  • the metallic tube not only delimits the flow channel 2, but is also used as the second field electrode 32.
  • the first field electrode 31 is located concentrically in the interior of the tube, so that a coaxial arrangement of the first field electrode 31 and the second field electrode 32 results.
  • the first field electrode 31 is surrounded by a first insulator 11.
  • the first field electrode 31 may be a wire or cylindrical pin coated by a dielectric 11.
  • the dielectric 11 may for example be applied from the melt to the first electrode 31 or as a tubular Element with an interference fit on the first electrode 31 are pushed.
  • the first and second field electrode 31 and 32 are connected to an unillustrated high voltage source ⁇ . Then, from the surface to be treated opposite side of a working ⁇ gas 6 are passed through the flow channel 2, as described before ⁇ standing.
  • the second field electrode 32 is surrounded by an insulator 12.
  • the insulator 12 may be, for example, a plastic tube, which is connected by an adhesive bond or a press fit with the second field electrode 32.
  • the second insulator 32 provides for a galvanic separation of the passive electrodes 41 and 42 from the field electrode 32.
  • the second insulator 12 may therefore also be omitted in some embodiments of the invention and replaced by an air gap.
  • a passive electrode 41 is connected to a ground contact.
  • the second passive electrode 42 capacitively couples to the second field electrode 32, so that between the tips 410 and 420 of the passive electrodes 41 and 42, a potential difference and subsequently a
  • an optional chamfer 15 may be attached to the second insulator 12.
  • the invention does not teach the use of exactly two passive electrodes 41 and 42 as a solution principle. In other Embodiments of the invention may use a larger or smaller number of passive electrodes or the passive electrodes may have a different shape. Similarly, in some embodiments of the invention, the tips 410 and 420 of the passive electrodes 41 and 42 may be replaced by round or square ends to give the G Verizont ⁇ charge a predetermined shape and / or extent in space.
  • FIGS. 5 and 6 A third embodiment of the invention will be explained with reference to FIGS. 5 and 6. Also in this case, like reference numerals designate like components of the invention.
  • the flow channel 2 is formed by a plastic tube 11, which simultaneously represents the first insulator. Therefore, in the third embodiment, the flow channel 2 is completely enclosed by a dielectric, so that the ignition of an arc or a thermal plasma in the flow channel 2 is reliably avoided.
  • the first field electrode 31 and the second field electrode 32 are arranged on the outside of the first insulator 11. These can be formed, for example, as metallic half-shells, which lie positively against the outside of the first insulator 11. In order to prevent a rollover of the arc or a short circuit between the two field electrodes, they are spaced apart by a gap 13.
  • the gap 13 may optionally be implemented with an insulator or a dielectric in order to increase the insulation resistance.
  • Coating be produced on the insulator 11. This allows a mechanically robust and reliable construction of the device.
  • the two field electrodes 31 and 32 are in turn connected to the two poles of a high voltage source, so that a dielectrically impeded discharge is formed in the flow channel 2, which is expelled from the gas flow 6 of the working gas through the mouth 2. This creates a plasma jet, which modifies the surface to be treated.
  • a second insulator 12 is arranged on the outside of the working electrodes 31 and 32. Also, the second insulator may be formed as a tubular member and pushed onto the outside of the working electrodes.
  • the second insulator 12 may also be designed as a film web, which in the winding process on the
  • the second insulator 12 may also be produced as a dielectric coating or replaced by an air gap.
  • the passive electrodes 41 and 42 On the outside of the second insulator 12 are the passive electrodes 41 and 42, which also as
  • Sheet metal part can be configured in the form of a half shell or quarter shell.
  • the passive electrodes 41 and 42 may also be used

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Fluid Mechanics (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne un dispositif (1) destiné à générer un jet de plasma, comportant au moins un canal d'écoulement (2), auquel un gaz de travail peut être amené, et au moins deux électrodes de champ (31, 32, 34, 36) au moyen desquelles un champ électrique peut être généré dans le canal d'écoulement (2). Le canal d'écoulement (2) est délimité par au moins un diélectrique (10, 11) et le dispositif comprend en outre au moins deux électrodes passives (41, 42) qui sont accouplées de manière capacitive à des électrodes de champ (31, 32, 34, 36) respectivement associées. En outre, l'invention concerne un procédé de traitement de surface dans lequel un jet de plasma, généré par au moins deux électrodes de champ (31, 32, 34, 36), agit sur une surface à traiter et en même temps une décharge glissante agit au moins sur une partie de la surface sollicitée par le jet de plasma.
PCT/EP2016/070697 2015-09-04 2016-09-02 Dispositif de génération d'un jet de plasma et procédé de traitement de surface Ceased WO2017037223A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102015216976.6 2015-09-04
DE102015216976.6A DE102015216976A1 (de) 2015-09-04 2015-09-04 Vorrichtung zur Erzeugung eines Plasma-Jets und Verfahren zur Oberflächenbehandlung

Publications (1)

Publication Number Publication Date
WO2017037223A1 true WO2017037223A1 (fr) 2017-03-09

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PCT/EP2016/070697 Ceased WO2017037223A1 (fr) 2015-09-04 2016-09-02 Dispositif de génération d'un jet de plasma et procédé de traitement de surface

Country Status (2)

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DE (1) DE102015216976A1 (fr)
WO (1) WO2017037223A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115381550A (zh) * 2022-07-15 2022-11-25 重庆科杰医疗技术有限公司 非接触式高周波电场发生与构场结构及治疗装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180055A (en) * 1966-01-14 1970-02-04 Dietrich Erben A Process for the Modification of a Surface of an Artificial Material.
DE4404034A1 (de) 1993-09-27 1995-08-10 Fraunhofer Ges Forschung Barrierenentladung zur Sterilisation
US5961772A (en) 1997-01-23 1999-10-05 The Regents Of The University Of California Atmospheric-pressure plasma jet
DE10219197C1 (de) 2002-04-29 2003-09-25 Fh Hildesheim Holzminden Goe Verfahren und Vorrichtung zur Behandlung der Oberflächen eines Metalldrahts, insbesondere als Beschichtungsvorbehandlung
WO2008017572A1 (fr) * 2006-08-08 2008-02-14 Siemens Aktiengesellschaft Dispositif d'allumage à haute fréquence pour un allumage à plasma à haute fréquence
US20120187844A1 (en) * 2011-01-25 2012-07-26 Advanced Energy Industries, Inc. Electrostatic remote plasma source

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4416351A1 (de) * 1994-05-09 1995-11-16 Siecor Fertigungsgesellschaft Verfahren zur Herstellung von Quarzglas-Vorformen sowie Vorrichtung zu dessen Durchführung
DE202008008736U1 (de) * 2008-07-02 2009-11-19 Melitta Haushaltsprodukte Gmbh & Co. Kg Vorrichtung zur Erzeugung von Plasma mittels elektrischer Entladung
DE102010044252B4 (de) * 2010-09-02 2014-03-27 Reinhausen Plasma Gmbh Vorrichtung und Verfahren zur Erzeugung einer Barriereentladung in einem Gasstrom

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180055A (en) * 1966-01-14 1970-02-04 Dietrich Erben A Process for the Modification of a Surface of an Artificial Material.
DE4404034A1 (de) 1993-09-27 1995-08-10 Fraunhofer Ges Forschung Barrierenentladung zur Sterilisation
US5961772A (en) 1997-01-23 1999-10-05 The Regents Of The University Of California Atmospheric-pressure plasma jet
DE10219197C1 (de) 2002-04-29 2003-09-25 Fh Hildesheim Holzminden Goe Verfahren und Vorrichtung zur Behandlung der Oberflächen eines Metalldrahts, insbesondere als Beschichtungsvorbehandlung
WO2008017572A1 (fr) * 2006-08-08 2008-02-14 Siemens Aktiengesellschaft Dispositif d'allumage à haute fréquence pour un allumage à plasma à haute fréquence
US20120187844A1 (en) * 2011-01-25 2012-07-26 Advanced Energy Industries, Inc. Electrostatic remote plasma source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115381550A (zh) * 2022-07-15 2022-11-25 重庆科杰医疗技术有限公司 非接触式高周波电场发生与构场结构及治疗装置

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