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WO2017012079A1 - Excimer laser system with annular chamber structure - Google Patents

Excimer laser system with annular chamber structure Download PDF

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Publication number
WO2017012079A1
WO2017012079A1 PCT/CN2015/084740 CN2015084740W WO2017012079A1 WO 2017012079 A1 WO2017012079 A1 WO 2017012079A1 CN 2015084740 W CN2015084740 W CN 2015084740W WO 2017012079 A1 WO2017012079 A1 WO 2017012079A1
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Prior art keywords
cavity
optical path
annular
mirror
excimer laser
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PCT/CN2015/084740
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French (fr)
Chinese (zh)
Inventor
王宇
周翊
宋兴亮
沙鹏飞
范元媛
赵江山
石海燕
李慧
丁金滨
单耀莹
王倩
蔡茜玮
彭卓君
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Academy of Opto Electronics of CAS
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Academy of Opto Electronics of CAS
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Priority to US15/746,730 priority Critical patent/US20180212397A1/en
Priority to JP2018503478A priority patent/JP2018525819A/en
Priority to PCT/CN2015/084740 priority patent/WO2017012079A1/en
Priority to RU2018105969A priority patent/RU2713082C2/en
Priority to EP15898635.6A priority patent/EP3327880B1/en
Priority to KR1020187004705A priority patent/KR102070141B1/en
Publication of WO2017012079A1 publication Critical patent/WO2017012079A1/en
Anticipated expiration legal-status Critical
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06—Construction or shape of active medium
    • H01S3/07—Construction or shape of active medium consisting of a plurality of parts, e.g. segments
    • H01S3/073—Gas lasers comprising separate discharge sections in one cavity, e.g. hybrid lasers
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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    • H01S3/0071—Beam steering, e.g. whereby a mirror outside the cavity is present to change the beam direction
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
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    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/0813—Configuration of resonator
    • H01S3/0816—Configuration of resonator having 4 reflectors, e.g. Z-shaped resonators
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/083—Ring lasers
    • H01S3/0835—Gas ring lasers
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H—ELECTRICITY
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
    • H01S3/2308—Amplifier arrangements, e.g. MOPA
    • H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
    • H01S3/235—Regenerative amplifiers
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
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    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping

Definitions

  • the invention belongs to the technical field of gas lasers, and particularly relates to excimer laser technology and its application, in particular to an excimer laser system having a ring cavity structure.
  • the main oscillation-amplification technique of the dual cavity structure was introduced to resolve the contradiction between output power and line width.
  • the basic idea is to use the seed cavity to generate small energy narrow-width seed light, and inject the large-energy pulse into the amplification cavity to obtain high-quality laser output with narrow line width and high power.
  • the related amplification mechanisms mainly include: MOPA, MOPO (Gigaphoton), MOPRA (Cymer), MORRA (Lambda Physik) and the like.
  • Cymer's XLA100 series (which entered the market in 2002) first introduced the MOPA mechanism into the lithography source, achieving higher operating efficiency and index output than previous single chambers.
  • the output of the power amplification cavity (power amplification cavity PA) in the MOPA structure is susceptible to the synchronous jitter of the main oscillation cavity (MO cavity) and the power amplification cavity PA, resulting in unstable laser output energy.
  • the annular cavity technology is introduced into the double cavity structure.
  • the seed light injection amplification cavity is multi-path amplified in a deeper saturation gain state, so the energy stability of the output is better, and the output beam is better.
  • the mass is modulated by the amplification cavity, increasing the controllability of the output beam.
  • L represents the length of the annular cavity
  • c is the speed of light
  • ⁇ t is the pulse width.
  • the laser system includes a main Oscillator Chamber (MO), a Power Amplifier Chamber (PA), a Linear Narrowing Module (LNM), and a line width.
  • LAM Linewidth Analysis Module
  • MOWB main Oscillator Wavefront Engineering Box
  • OPS Optical Pulse Stretcher
  • OPS Auto Shutter
  • Partial Mirror PR Partial Reflector
  • splitter system first high mirror HR1, second high mirror HR2, third high mirror HR3.
  • the main oscillation cavity MO generates a small energy narrow linewidth laser light pulse (seed light) by means of the line width narrowing module LNM, and the seed light is refracted by the main oscillation cavity wavefront engineering box MO WEB, and then enters the power amplification cavity through a beam splitting system.
  • PA three 45° incident high reflectivity mirrors HR1, HR2, HR3 and splitting system (Splitter) act as circular amplifying cavity mirrors of the power amplifying chamber PA to form a circular multi-pass amplification system for seed light.
  • the circular amplifying optical path structure of the system can be regarded as a quadrilateral shape, wherein only one side of the discharge cavity has the effect of amplifying the seed optical power, and the other three sides are arranged outside the discharge cavity. Due to the size limitation of the discharge cavity, the annular cavity length cannot be further The reduction, resulting in less amplification, the superiority of the multi-pass amplification of the annular cavity can not be well applied.
  • the present invention is directed to the problem that the excimer laser ring cavity structure is limited by the physical size and can not continue to shorten the length of the annular cavity, and the superiority of the depth gain saturation effect of the multi-pass amplification of the annular cavity structure cannot be fully utilized.
  • the present invention provides an excimer laser system including a main oscillation cavity, a power amplification cavity, a linear narrowing module, a line width analysis module, a main oscillation cavity wavefront engineering box, an optical pulse stretcher, and an automatic shutter. , partial mirror, beam splitting system, first high mirror, second high mirror and third high mirror,
  • the main oscillating cavity generates a small energy narrow linewidth laser light pulse as seed light by means of a line width narrowing module, and the seed light is refracted by the main oscillating cavity wavefront engineering box, and enters the power amplifying cavity through the beam splitting system ,
  • the beam splitting system, the first high mirror, the second high mirror and the third high mirror form a quadrilateral annular light path
  • the power amplifying cavity has a first Brewster window pair and a second Brewster window pair, and the first Brewster window is in the same manner as the discharge electrode of the power amplifying cavity An optical path, the second Brewster window pair being in a second optical path that is parallel to the annular optical path of the first amplified optical path.
  • the power amplifying chamber has two parallel discharge electrodes, and the first light path and the second light path of the annular light path respectively pass through the two discharge electrodes.
  • the first high mirror, the second high mirror and the third high mirror are 45° angle mirrors.
  • the invention shortens the annular cavity length of the excimer laser system of the annular cavity structure, increases the number of times of amplification, realizes deeper gain saturation amplification than the conventional structure, and improves the output characteristics of the excimer laser system.
  • FIG. 1 is a schematic structural view of a prior art excimer laser system having a dual cavity MORRA structure
  • FIG. 2 is a schematic structural view of an excimer laser system having a single-electrode dual-chamber MORRA structure according to an embodiment of the present invention
  • FIG 3 is a schematic view showing the structure of an excimer laser system having a two-electrode dual-chamber MORRA structure according to another embodiment of the present invention.
  • the present invention proposes to change the design of the conventional annular cavity partially exposed cavity, and place the entire loop structure. Amplify the cavity, thereby reducing the length of the annular cavity, increasing the number of times of amplification, and improving the output stability.
  • the decrease in L can increase the number of times of amplification N, so the ring is reduced.
  • the cavity length can increase the number of amplifications, resulting in a more stable laser output.
  • placing the annular optical path in the amplification cavity can reduce the adverse effects of external instability on the beam propagation.
  • the laser system includes a main oscillation cavity MO, a power amplification cavity PA, a linear narrowing module LNM, a line width analysis module LAM, a main oscillation cavity wavefront engineering box MO WEB, an optical pulse stretcher OPS, and an automatic shutter.
  • Auto Shutter, splitter system Splitter is a schematic view showing the structure of an excimer laser system having a single-electrode dual-chamber MORRA structure according to an embodiment of the present invention.
  • the laser system includes a main oscillation cavity MO, a power amplification cavity PA, a linear narrowing module LNM, a line width analysis module LAM, a main oscillation cavity wavefront engineering box MO WEB, an optical pulse stretcher OPS, and an automatic shutter.
  • Auto Shutter, splitter system Splitter is a schematic view showing the structure of an excimer laser system having a single-electrode dual-chamber MORRA structure according to an embodiment of the present invention.
  • the laser system includes a main oscillation cavity MO, a
  • the main oscillation cavity MO generates a small energy narrow linewidth laser light pulse as a seed light by means of the line width narrowing module LNM, and the seed light is refracted by the main oscillation cavity wavefront engineering box MO WEB, and then enters the power amplification cavity through a splitting system Splitter.
  • PA, three 45° incident high reflectivity mirrors HR1, HR2, HR3 and splitting system Splitter as circular amplification cavity mirrors of power amplification cavity power amplification cavity PA form a circular multi-pass amplification system for seed light.
  • the splitting system (Splitter), the first high-reflecting mirror (HR1), the second high-reflecting mirror (HR2) and the third high-reflecting mirror (HR3) form a quadrilateral annular optical path, that is, the annular amplifying optical path structure of the system can be It is regarded as a quadrilateral in which the optical path of the discharge electrode through the discharge chamber has an effect of amplifying the seed light power.
  • the power amplifying cavity PA of this embodiment has two pairs of up and down Brewster windows, and the two Brewster windows which are in the same magnifying path as the discharge electrodes are referred to as the first The Brewster window pair (as indicated by the marks B1 and B1' in the drawing), which is placed parallel to the magnifying optical path on another optical path in the discharge chamber, the two Brewster windows are called the second Brewster Window pairs (as indicated by the marks B2, B2' in the drawing).
  • the first Brewster window pair (B1, B1') and the discharge electrode of the power amplification cavity (PA) are in the first optical path of the annular optical path, and the second Brewster window pair (B2) And B2') are in a second optical path parallel to the annular optical path of the first amplified optical path.
  • the laser light emitted by one of the Brests window B1' of B1 and B1' by the first Brewster window is re-incident to the second cloth by the 45° incident high reflectance mirrors HR3 and HR2.
  • the Russell window is located in the power amplification cavity PA in B2, B2' and Brewster window B1'
  • the Brewster window B2' on the same side is incident into the power amplifying chamber PA, and is emitted from the second Brewster window to another Brewster window B2 of B2, B2'.
  • the optical path parallel to the discharge optical path is placed in the discharge cavity, the remaining two optical paths perpendicular to the discharge optical path are no longer limited by the size of the discharge cavity, effectively shortening the length of the annular amplification cavity.
  • the amplifying cavity is a single-electrode structure, and the annular cavity length is effectively shortened compared with the conventional double-cavity MORRA structure, which is advantageous for multi-pass amplification to achieve depth gain saturation amplification, thereby obtaining a more stable index than the conventional structure.
  • Output is advantageous for multi-pass amplification to achieve depth gain saturation amplification, thereby obtaining a more stable index than the conventional structure.
  • FIG. 3 is a schematic view showing the structure of an excimer laser system having a two-electrode dual-chamber MORRA structure according to another embodiment of the present invention.
  • the structure amplification cavity is a two-electrode structure.
  • the power amplifying cavity PA has two parallel discharge electrodes, and the first optical path and the second optical path of the annular optical path respectively pass through the two discharge electrodes, each having a pair of seed lights.
  • the amplification effect can be seen that in this embodiment, not only the annular cavity length is effectively shortened, but also the magnification is doubled compared with the single electrode structure, that is, the same seed light is injected into the amplification cavity, and the structure can be obtained. Higher output energy; and an increase in magnification causes amplification to occur in deeper gain saturation states, thus resulting in better output beam stability for this configuration.
  • the present invention provides structural improvements and performance improvements for the annular cavity energy amplification structure in an excimer laser system.
  • the single (double) electrode structure Through the design of the single (double) electrode structure, the lack of amplification due to the cavity length is improved, and the gain utilization efficiency in the cavity is effectively improved, which provides a guarantee for the effective output of the system energy.
  • the enhancement of the energy amplification characteristic by means of multi-pass cavity transition is the essence of the present invention.
  • the annular cavity structure in the cavity can also reduce the influence of external unfavorable factors caused by the light path passing through the atmosphere.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

An excimer laser system. A master oscillator chamber uses a linewidth narrowing module to generate a narrow linewidth laser light pulse with low energy to serve as seed light, after being refracted by a wave-front engineering box of the master oscillator chamber, the seed light enters the power amplifier chamber through a light splitting system, the light splitting system, a first high reflectivity mirror, a second high reflectivity mirror and a third high reflectivity mirror form a quadrangular annular light path, and the power amplifier chamber has a first Brewster window pair (B1, B1`) and a second Brewster window pair (B2, B2`), wherein the first Brewster window pair (B1, B1`) and a discharging electrode of the power amplifier chamber are both located in a first light path of the annular light path, and the second Brewster window pair (B2, B2`) is located in a second light path of the annular light path which is parallel to a first amplifier light path. By means of the system, the chamber length of an annular chamber of an excimer laser system with an annular chamber structure is shortened, the number of times of amplification is increased, and deeper gain saturation amplification as compared with the traditional structure is realized, thereby improving the output characteristics of the excimer laser system.

Description

一种具有环形腔结构的准分子激光系统Excimer laser system with annular cavity structure 技术领域Technical field

本发明属于气体激光器技术领域，具体涉及准分子激光器技术及其应用，特别是一种具有环形腔结构的准分子激光系统。The invention belongs to the technical field of gas lasers, and particularly relates to excimer laser technology and its application, in particular to an excimer laser system having a ring cavity structure.

背景技术Background technique

随着光刻产业对光源输出功率和线宽要求的不断提高，受限于结构特点，单腔结构准分子器件不能满足高水平输出功率和线宽同时输出的特性。双腔结构的主振荡-放大技术被引入以解决输出功率和线宽的矛盾。其基本思想是利用种子腔产生小能量的窄线宽种子光，注入放大腔输出大能量脉冲，从而得到窄线宽、大功率的优质激光输出。As the lithography industry continues to increase the output power and linewidth requirements of light sources, limited by structural features, single-cavity excimer devices cannot meet the characteristics of high-level output power and line-width simultaneous output. The main oscillation-amplification technique of the dual cavity structure was introduced to resolve the contradiction between output power and line width. The basic idea is to use the seed cavity to generate small energy narrow-width seed light, and inject the large-energy pulse into the amplification cavity to obtain high-quality laser output with narrow line width and high power.

目前相关的放大机制主要包括：MOPA、MOPO(Gigaphoton)、MOPRA(Cymer)、MORRA(Lambda Physik)等。Cymer公司的XLA100系列(2002年进入市场)最早将MOPA机制引入光刻光源，获得了较以往单腔更高的运转效率和指标输出。但是MOPA结构中功率放大腔(功率放大腔PA)输出易受主振荡腔(MO腔)和功率放大腔PA同步抖动影响，造成激光输出能量不稳。此时环形腔技术被引入双腔结构，相比MOPA技术，在环形腔结构中，种子光注入放大腔被多程放大在更深的饱和增益状态，所以输出的能量稳定性更好，且输出光束质量受放大腔调制，增加了输出光束的可控性。At present, the related amplification mechanisms mainly include: MOPA, MOPO (Gigaphoton), MOPRA (Cymer), MORRA (Lambda Physik) and the like. Cymer's XLA100 series (which entered the market in 2002) first introduced the MOPA mechanism into the lithography source, achieving higher operating efficiency and index output than previous single chambers. However, the output of the power amplification cavity (power amplification cavity PA) in the MOPA structure is susceptible to the synchronous jitter of the main oscillation cavity (MO cavity) and the power amplification cavity PA, resulting in unstable laser output energy. At this time, the annular cavity technology is introduced into the double cavity structure. Compared with the MOPA technology, in the annular cavity structure, the seed light injection amplification cavity is multi-path amplified in a deeper saturation gain state, so the energy stability of the output is better, and the output beam is better. The mass is modulated by the amplification cavity, increasing the controllability of the output beam.

但是对于一定脉冲宽度的种子光注入到放大腔，其放大次数受限于放大腔腔长，放大次数N＝c·Δt/L，其中L表示环形腔腔长，c为光速，Δt为脉冲宽度，L越大，放大次数越少，所以，减小环形腔腔长可以增加放大次数，从而得到更加稳定的激光输出。However, for a certain pulse width of seed light injected into the amplification cavity, the number of amplifications is limited by the length of the amplification cavity, and the number of amplifications is N=c·Δt/L, where L represents the length of the annular cavity, c is the speed of light, and Δt is the pulse width. The larger L is, the less the number of times of amplification is. Therefore, reducing the length of the annular cavity can increase the number of times of amplification, thereby obtaining a more stable laser output.

典型的MORRA环形腔结构如图1所示，激光器系统包括主振荡腔MO(Master Oscillator Chamber)、功率放大腔PA(Power Amplifier Chamber)、线性压窄模块LNM(Linewidth Narrowing Module)、线宽分 析模块LAM(Linewidth Analysis Module)、主振荡腔波前工程箱MO WEB(Master Oscillator Wavefront Engineering Box)、光脉冲展宽器OPS(Optical Pulse Stretcher)、自动快门(Auto Shutter)、部分反射镜PR(Partial Reflector)、分束系统(Splitter)、第一高反镜HR1、第二高反镜HR2、第三高反镜HR3。主振荡腔MO借助线宽压窄模块LNM产生小能量窄线宽激光光脉冲(种子光)，该种子光经过主振荡腔波前工程箱MO WEB折射后，通过一个分束系统进入功率放大腔PA，三个45°入射高反射率镜HR1、HR2、HR3与分束系统(Splitter)作为功率放大腔PA的环形放大腔腔镜，形成对种子光的环形多通放大系统。该系统的环形放大光路结构可视为一个四边形，其中只有通过放电腔的一边具有对种子光功率放大的作用，其余三边布置于放电腔外，由于放电腔尺寸限制，环形腔腔长无法进一步减小，造成放大次数较少，环形腔多程放大的优越性无法得到很好地应用。A typical MORRA ring cavity structure is shown in Figure 1. The laser system includes a main Oscillator Chamber (MO), a Power Amplifier Chamber (PA), a Linear Narrowing Module (LNM), and a line width. LAM (Linewidth Analysis Module), main Oscillator Wavefront Engineering Box (MOWB), Optical Pulse Stretcher (OPS), Auto Shutter, Partial Mirror PR (Partial) Reflector), splitter system, first high mirror HR1, second high mirror HR2, third high mirror HR3. The main oscillation cavity MO generates a small energy narrow linewidth laser light pulse (seed light) by means of the line width narrowing module LNM, and the seed light is refracted by the main oscillation cavity wavefront engineering box MO WEB, and then enters the power amplification cavity through a beam splitting system. PA, three 45° incident high reflectivity mirrors HR1, HR2, HR3 and splitting system (Splitter) act as circular amplifying cavity mirrors of the power amplifying chamber PA to form a circular multi-pass amplification system for seed light. The circular amplifying optical path structure of the system can be regarded as a quadrilateral shape, wherein only one side of the discharge cavity has the effect of amplifying the seed optical power, and the other three sides are arranged outside the discharge cavity. Due to the size limitation of the discharge cavity, the annular cavity length cannot be further The reduction, resulting in less amplification, the superiority of the multi-pass amplification of the annular cavity can not be well applied.

发明内容Summary of the invention

本发明的提出旨在针对准分子激光器环形腔结构受限于物理尺寸无法继续缩短环形腔腔长，环形腔结构多程放大实现深度增益饱和效应的优越性无法得到充分利用的问题。The present invention is directed to the problem that the excimer laser ring cavity structure is limited by the physical size and can not continue to shorten the length of the annular cavity, and the superiority of the depth gain saturation effect of the multi-pass amplification of the annular cavity structure cannot be fully utilized.

为解决上述技术问题，本发明提出一种准分子激光系统，包括主振荡腔、功率放大腔、线性压窄模块、线宽分析模块、主振荡腔波前工程箱、光脉冲展宽器、自动快门、部分反射镜、分束系统、第一高反镜、第二高反镜和第三高反镜，In order to solve the above technical problem, the present invention provides an excimer laser system including a main oscillation cavity, a power amplification cavity, a linear narrowing module, a line width analysis module, a main oscillation cavity wavefront engineering box, an optical pulse stretcher, and an automatic shutter. , partial mirror, beam splitting system, first high mirror, second high mirror and third high mirror,

所述主振荡腔借助线宽压窄模块产生小能量窄线宽激光光脉冲作为种子光，该种子光经过主振荡腔波前工程箱折射后，通过所述分束系统进入所述功率放大腔，The main oscillating cavity generates a small energy narrow linewidth laser light pulse as seed light by means of a line width narrowing module, and the seed light is refracted by the main oscillating cavity wavefront engineering box, and enters the power amplifying cavity through the beam splitting system ,

所述分束系统、第一高反镜、第二高反镜和第三高反镜组成四边形的环形光路， The beam splitting system, the first high mirror, the second high mirror and the third high mirror form a quadrilateral annular light path,

所述功率放大腔具有第一布儒斯特窗口对和第二布儒斯特窗口对，所述第一布儒斯特窗口对与该功率放大腔的放电电极同处于所述环形光路的第一光路，所述第二布儒斯特窗口对处于平行于所述第一放大光路的所述环形光路的第二光路。The power amplifying cavity has a first Brewster window pair and a second Brewster window pair, and the first Brewster window is in the same manner as the discharge electrode of the power amplifying cavity An optical path, the second Brewster window pair being in a second optical path that is parallel to the annular optical path of the first amplified optical path.

根据本发明的具体实施方式，所述功率放大腔具有两个平行的放电电极，环形光路中的第一光路和第二光路分别通过所述两个放电电极。According to a specific embodiment of the invention, the power amplifying chamber has two parallel discharge electrodes, and the first light path and the second light path of the annular light path respectively pass through the two discharge electrodes.

根据本发明的具体实施方式，所述第一高反镜、第二高反镜和第三高反镜为45°角反射镜。According to a specific embodiment of the invention, the first high mirror, the second high mirror and the third high mirror are 45° angle mirrors.

本发明缩短了环形腔结构的准分子激光系统的环形腔腔长，增加了放大次数，实现了较传统结构更深的增益饱和放大，改善了准分子激光系统输出特性。The invention shortens the annular cavity length of the excimer laser system of the annular cavity structure, increases the number of times of amplification, realizes deeper gain saturation amplification than the conventional structure, and improves the output characteristics of the excimer laser system.

附图说明DRAWINGS

图1是现有技术的具有双腔MORRA结构的准分子激光系统的结构示意图；1 is a schematic structural view of a prior art excimer laser system having a dual cavity MORRA structure;

图2是本发明的一个实施例的具有单电极双腔MORRA结构的准分子激光系统的结构示意图；2 is a schematic structural view of an excimer laser system having a single-electrode dual-chamber MORRA structure according to an embodiment of the present invention;

图3是本发明的另一个实施例的具有双电极双腔MORRA结构的准分子激光系统的结构示意图。3 is a schematic view showing the structure of an excimer laser system having a two-electrode dual-chamber MORRA structure according to another embodiment of the present invention.

具体实施方式detailed description

针对现有的准分子激光器的环形腔结构由于物理尺寸限制而使环形腔腔长无法继续减小的问题，本发明提出改变传统的环形腔部分暴露腔外的设计，将整个环路结构置于放大腔内，从而减小环形腔腔长，增加放大次数，提高输出稳定性。In view of the problem that the annular cavity structure of the existing excimer laser can not continue to decrease due to the physical size limitation, the present invention proposes to change the design of the conventional annular cavity partially exposed cavity, and place the entire loop structure. Amplify the cavity, thereby reducing the length of the annular cavity, increasing the number of times of amplification, and improving the output stability.

本专利将传统环形腔腔外部分环路置于放大腔内，实现环形腔腔长的明显缩短，由于放大次数N＝c·Δt/L，其中L表示环形腔腔长，c为光速，Δt为脉冲宽度，L的减小可以实现放大次数N增加，所以，减小环 形腔腔长可以增加放大次数，从而得到更加稳定的激光输出。同时，将环形光路置于放大腔内可以减小外界不稳定因素对光束传播产生不利的影响。In this patent, a part of the loop of the outer annular cavity is placed in the amplifying cavity to achieve a significant shortening of the length of the annular cavity, because the number of times of amplification is N=c·Δt/L, where L represents the length of the annular cavity, and c is the speed of light, Δt For the pulse width, the decrease in L can increase the number of times of amplification N, so the ring is reduced. The cavity length can increase the number of amplifications, resulting in a more stable laser output. At the same time, placing the annular optical path in the amplification cavity can reduce the adverse effects of external instability on the beam propagation.

为使本发明的目的、技术方案和优点更加清楚明白，以下结合具体实施例，并参照附图，对本发明作进一步的详细说明。The present invention will be further described in detail below with reference to the specific embodiments of the invention,

图2是本发明的一个实施例的具有单电极双腔MORRA结构的准分子激光系统的结构示意图。如图2所示，该激光系统包括主振荡腔MO、功率放大腔PA、线性压窄模块LNM、线宽分析模块LAM、主振荡腔波前工程箱MO WEB、光脉冲展宽器OPS和自动快门Auto Shutter、分束系统Splitter。2 is a schematic view showing the structure of an excimer laser system having a single-electrode dual-chamber MORRA structure according to an embodiment of the present invention. As shown in FIG. 2, the laser system includes a main oscillation cavity MO, a power amplification cavity PA, a linear narrowing module LNM, a line width analysis module LAM, a main oscillation cavity wavefront engineering box MO WEB, an optical pulse stretcher OPS, and an automatic shutter. Auto Shutter, splitter system Splitter.

主振荡腔MO借助线宽压窄模块LNM产生小能量窄线宽激光光脉冲作为种子光，该种子光经过主振荡腔波前工程箱MO WEB折射后，通过一个分束系统Splitter进入功率放大腔PA，三个45°入射高反射率镜HR1、HR2、HR3与分束系统Splitter作为功率放大腔功率放大腔PA的环形放大腔腔镜，形成对种子光的环形多通放大系统。所述分束系统(Splitter)、第一高反镜(HR1)、第二高反镜(HR2)和第三高反镜(HR3)组成四边形的环形光路，即该系统的环形放大光路结构可视为一个四边形，其中通过放电腔放电电极问的光路具有对种子光功率放大的作用。The main oscillation cavity MO generates a small energy narrow linewidth laser light pulse as a seed light by means of the line width narrowing module LNM, and the seed light is refracted by the main oscillation cavity wavefront engineering box MO WEB, and then enters the power amplification cavity through a splitting system Splitter. PA, three 45° incident high reflectivity mirrors HR1, HR2, HR3 and splitting system Splitter as circular amplification cavity mirrors of power amplification cavity power amplification cavity PA form a circular multi-pass amplification system for seed light. The splitting system (Splitter), the first high-reflecting mirror (HR1), the second high-reflecting mirror (HR2) and the third high-reflecting mirror (HR3) form a quadrilateral annular optical path, that is, the annular amplifying optical path structure of the system can be It is regarded as a quadrilateral in which the optical path of the discharge electrode through the discharge chamber has an effect of amplifying the seed light power.

与图1显示的结构不同的是，该实施例的功率放大腔PA具有上下两对布儒斯特窗口，在此将与放电电极处于同一放大光路的两个布儒斯特窗口称为第一布儒斯特窗口对(附图中如标记B1、B1’所示)，将平行于放大光路置于放电腔内的另一光路上两个布儒斯特窗口称为第二布儒斯特窗口对(附图中如标记B2、B2’所示)。Different from the structure shown in FIG. 1, the power amplifying cavity PA of this embodiment has two pairs of up and down Brewster windows, and the two Brewster windows which are in the same magnifying path as the discharge electrodes are referred to as the first The Brewster window pair (as indicated by the marks B1 and B1' in the drawing), which is placed parallel to the magnifying optical path on another optical path in the discharge chamber, the two Brewster windows are called the second Brewster Window pairs (as indicated by the marks B2, B2' in the drawing).

所述第一布儒斯特窗口对(B1、B1’)与该功率放大腔(PA)的放电电极同处于所述环形光路的第一光路，所述第二布儒斯特窗口对(B2、B2’)处于平行于所述第一放大光路的环形光路的第二光路。The first Brewster window pair (B1, B1') and the discharge electrode of the power amplification cavity (PA) are in the first optical path of the annular optical path, and the second Brewster window pair (B2) And B2') are in a second optical path parallel to the annular optical path of the first amplified optical path.

如图2所示，由第一布儒斯特窗口对B1、B1’中的其中一个布儒斯特窗口B1’出射的激光经45°入射高反射率镜HR3、HR2重新入射到第二布儒斯特窗口对B2、B2’中的与布儒斯特窗口B1’位于功率放大腔PA 同侧的布儒斯特窗口B2’，以入射到功率放大腔PA内，并从第二布儒斯特窗口对B2、B2’中的另一布儒斯特窗口B2出射。此外，相比传统结构，图2所示的两对布儒斯特窗口的功率放大腔PA可以提高通过激光的P光偏振度，得到更优越的激光偏振特性。由于与放电光路平行的光路置于放电腔内，其余垂直于放电光路的两条光路不再受放电腔尺寸限制，有效缩短了环形放大腔腔长。As shown in FIG. 2, the laser light emitted by one of the Brests window B1' of B1 and B1' by the first Brewster window is re-incident to the second cloth by the 45° incident high reflectance mirrors HR3 and HR2. The Russell window is located in the power amplification cavity PA in B2, B2' and Brewster window B1' The Brewster window B2' on the same side is incident into the power amplifying chamber PA, and is emitted from the second Brewster window to another Brewster window B2 of B2, B2'. In addition, compared with the conventional structure, the power amplifying cavity PA of the two pairs of Brewster windows shown in FIG. 2 can improve the polarization degree of the P light passing through the laser, and obtain superior laser polarization characteristics. Since the optical path parallel to the discharge optical path is placed in the discharge cavity, the remaining two optical paths perpendicular to the discharge optical path are no longer limited by the size of the discharge cavity, effectively shortening the length of the annular amplification cavity.

该实施例的结构中，放大腔为单电极结构，较传统双腔MORRA结构，环形腔腔长得到有效的缩短，有利于多程放大实现深度增益饱和放大，从而得到较传统结构更稳定的指标输出。In the structure of the embodiment, the amplifying cavity is a single-electrode structure, and the annular cavity length is effectively shortened compared with the conventional double-cavity MORRA structure, which is advantageous for multi-pass amplification to achieve depth gain saturation amplification, thereby obtaining a more stable index than the conventional structure. Output.

图3是本发明的另一个实施例的具有双电极双腔MORRA结构的准分子激光系统的结构示意图此结构放大腔为双电极结构。3 is a schematic view showing the structure of an excimer laser system having a two-electrode dual-chamber MORRA structure according to another embodiment of the present invention. The structure amplification cavity is a two-electrode structure.

与图2所示的实施例不同的是，该功率放大腔PA具有两个平行的放电电极，环形光路中的第一光路和第二光路分别通过所述两个放电电极，均具有对种子光的放大作用，可见，该实施例中，不仅环形腔腔长得到有效的缩短，而且放大倍数较单电极结构又增加一倍，也就是说，相同的种子光注入到放大腔，此结构可以得到更高的输出能量；并且放大倍数的增加使得放大发生在更深的增益饱和状态，因而，此结构得到的输出光束稳定性更佳。Different from the embodiment shown in FIG. 2, the power amplifying cavity PA has two parallel discharge electrodes, and the first optical path and the second optical path of the annular optical path respectively pass through the two discharge electrodes, each having a pair of seed lights. The amplification effect can be seen that in this embodiment, not only the annular cavity length is effectively shortened, but also the magnification is doubled compared with the single electrode structure, that is, the same seed light is injected into the amplification cavity, and the structure can be obtained. Higher output energy; and an increase in magnification causes amplification to occur in deeper gain saturation states, thus resulting in better output beam stability for this configuration.

综上所述，本发明针对准分子激光系统中环形腔能量放大结构进行了结构改进和性能提升。通过单(双)电极结构的设计，改善由于腔长原因所导致的放大次数低的不足，有效提升腔体内增益利用效率，为系统能量的有效输出提供了保障。借助于多程腔体渡越实现能量放大特性的提升是本发明的实质所在。同时，腔内环形腔结构还可以减少光路通过大气等所带来的外界不利因素的影响。In summary, the present invention provides structural improvements and performance improvements for the annular cavity energy amplification structure in an excimer laser system. Through the design of the single (double) electrode structure, the lack of amplification due to the cavity length is improved, and the gain utilization efficiency in the cavity is effectively improved, which provides a guarantee for the effective output of the system energy. The enhancement of the energy amplification characteristic by means of multi-pass cavity transition is the essence of the present invention. At the same time, the annular cavity structure in the cavity can also reduce the influence of external unfavorable factors caused by the light path passing through the atmosphere.

以上所述的具体实施例，对本发明的目的、技术方案和有益效果进行了进一步详细说明，应理解的是，以上所述仅为本发明的具体实施例而已，并不用于限制本发明，凡在本发明的精神和原则之内，所做的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。 The specific embodiments of the present invention have been described in detail in the foregoing detailed description of the embodiments of the present invention. All modifications, equivalents, improvements, etc., made within the spirit and scope of the invention are intended to be included within the scope of the invention.

Claims (3)

一种准分子激光系统，包括主振荡腔(MO)、功率放大腔(PA)、线性压窄模块(LNM)、线宽分析模块(LAM)、主振荡腔波前工程箱(MO WEB)、光脉冲展宽器(OPS)、自动快门(Auto Shutter)、部分反射镜(PR)、分束系统(Splitter)、第一高反镜(HRl)、第二高反镜(HR2)和第三高反镜(HR3)，An excimer laser system comprising a main oscillation cavity (MO), a power amplification cavity (PA), a linear narrowing module (LNM), a line width analysis module (LAM), a main oscillation cavity wavefront engineering box (MO WEB), Optical Pulse Stretcher (OPS), Auto Shutter, Partial Mirror (PR), Splitter, First High Mirror (HRl), Second High Mirror (HR2) and Third High Mirror (HR3), 所述主振荡腔(MO)借助线宽压窄模块(LNM)产生小能量窄线宽激光光脉冲作为种子光，该种子光经过主振荡腔波前工程箱(MO WEB)折射后，通过所述分束系统(Splitter)进入所述功率放大腔(PA)，The main oscillation cavity (MO) generates a small energy narrow linewidth laser light pulse as a seed light by means of a line width narrowing module (LNM), and the seed light is refracted by a main oscillation cavity wavefront engineering box (MO WEB), and passes through the The splitter system enters the power amplification cavity (PA), 所述分束系统(Splitter)、第一高反镜(HRl)、第二高反镜(HR2)和第三高反镜(HR3)组成四边形的环形光路，The splitting system (Splitter), the first high-reflecting mirror (HR1), the second high-reflecting mirror (HR2), and the third high-reflecting mirror (HR3) form a quadrilateral annular optical path. 其中，所述功率放大腔(PA)具有第一布儒斯特窗口对(B1、B1’)和第二布儒斯特窗口对(B2、B2’)，所述第一布儒斯特窗口对(B1、B1’)与该功率放大腔(PA)的放电电极同处于所述环形光路的第一光路，所述第二布儒斯特窗口对(B2、B2’)处于平行于所述第一放大光路的所述环形光路的第二光路。Wherein the power amplification cavity (PA) has a first Brewster window pair (B1, B1') and a second Brewster window pair (B2, B2'), the first Brewster window Pair (B1, B1') with the discharge electrode of the power amplification cavity (PA) being in the first optical path of the annular optical path, the second Brewster window pair (B2, B2') being parallel to the a second optical path of the annular optical path of the first amplifying optical path. 如权利要求1所述的准分子激光系统，其中，所述功率放大腔(PA)具有两个平行的放电电极，环形光路中的第一光路和第二光路分别通过所述两个放电电极。The excimer laser system according to claim 1, wherein said power amplifying chamber (PA) has two parallel discharge electrodes, and a first optical path and a second optical path of the annular optical path respectively pass through said two discharge electrodes. 如权利要求1或2所述的准分子激光系统，其中，所述第一高反镜(HRl)、第二高反镜(HR2)和第三高反镜(HR3)为45°角反射镜。 The excimer laser system according to claim 1 or 2, wherein said first high mirror (HR1), second high mirror (HR2) and third high mirror (HR3) are 45° angle mirrors .
PCT/CN2015/084740 2015-07-22 2015-07-22 Excimer laser system with annular chamber structure Ceased WO2017012079A1 (en)

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