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WO2016185614A1 - Laser processing device and laser processing method - Google Patents

Laser processing device and laser processing method Download PDF

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Publication number
WO2016185614A1
WO2016185614A1 PCT/JP2015/064646 JP2015064646W WO2016185614A1 WO 2016185614 A1 WO2016185614 A1 WO 2016185614A1 JP 2015064646 W JP2015064646 W JP 2015064646W WO 2016185614 A1 WO2016185614 A1 WO 2016185614A1
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WO
WIPO (PCT)
Prior art keywords
laser
laser beam
processing
workpiece
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/064646
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French (fr)
Japanese (ja)
Inventor
鈴木 寛之
秀則 深堀
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
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Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to PCT/JP2015/064646 priority Critical patent/WO2016185614A1/en
Publication of WO2016185614A1 publication Critical patent/WO2016185614A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/36Removing material
    • B23K26/38Removing material by boring or cutting
    • B23K26/382Removing material by boring or cutting by boring
    • B23K26/389Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets

Definitions

  • the present invention relates to a laser processing apparatus and a laser processing method for irradiating a workpiece, which is a workpiece, with a laser beam to process a hole in the workpiece.
  • Patent Documents 1 and 2 describe a technique for forming a hole in a workpiece while rotating a laser beam in a spiral shape.
  • An object of the present invention is to suppress a reduction in processing quality of hole processing in which a hole is formed in a workpiece with a laser beam.
  • the laser processing apparatus of the present invention rotates a spot of the laser light irradiated on the surface of the workpiece, and moves the workpiece away from the position where the laser beam irradiation is started as the rotation proceeds, and a mechanism for processing the workpiece, And an apparatus for increasing the energy of the laser beam from the start to the end of the workpiece processing than when the workpiece processing is started.
  • the present invention can suppress the deterioration of the processing quality of the hole processing in which a hole is formed in a workpiece with a laser beam.
  • FIG. Sectional drawing which shows an example of the workpiece
  • FIG. 1 is a perspective view showing a laser processing apparatus according to the first embodiment.
  • the laser processing apparatus 1 according to the first embodiment rotates the spot SP of the laser beam LL irradiated on the surface of the workpiece W, and moves it away from the position where the irradiation of the laser beam LL is started as the rotation progresses.
  • the laser processing apparatus 1 performs processing such as cutting or drilling on the workpiece W.
  • the processing head 4 includes a mechanism 4G and an optical system 7.
  • the mechanism 4G changes the irradiation direction of the laser light LL.
  • the optical system 7 included in the processing head 4 includes an f ⁇ lens that forms an image of the laser light LL emitted from the mechanism 4G on the surface of the work W of the table 2 and a focus adjustment mechanism that adjusts the focus of the laser light LL.
  • the structure and operation of the mechanism 4G will be described later.
  • the dust collection duct 8 sucks dust generated when the workpiece W is processed by the laser beam LL emitted from the processing head 4.
  • the table 2 includes a first surface 2Ps on which the workpiece W is placed, a second surface 2Pr facing the first surface 2Ps, and side surfaces 2SA, 2SB, 2SC, 2SD that connect the first surface 2Ps and the second surface 2Pr.
  • the shapes of the first surface 2Ps and the second surface 2Pr are both rectangular.
  • the rectangle includes a square. For this reason, the shape of the table 2 is a rectangular parallelepiped.
  • the table 2 places the workpiece W on the machining area 2WA of the first surface 2Ps.
  • the processing area 2WA is an area inside the outer edge 2EG of the first surface 2Ps.
  • the processing head 4 cannot process an object outside the processing area 2WA.
  • the table 2 moves in two directions: a first direction that is parallel to one side of the first surface 2Ps and the second surface 2Pr, and a second direction that intersects the first direction.
  • the direction orthogonal to the first direction and the second direction is the third direction.
  • the first direction and the second direction are orthogonal, that is, intersect at 90 degrees, but the first direction and the second direction may intersect at other than 90 degrees.
  • the first direction is referred to as the X direction
  • the second direction is referred to as the Y direction
  • the third direction is referred to as the Z direction.
  • the first mirror 5M of the first mechanism 5 changes the irradiation direction of the laser light LL along the X direction which is the first direction
  • the second mirror 6M of the second mechanism 6 changes the irradiation direction of the laser light LL to the first direction. It changes along the Y direction which is two directions.
  • the first mirror 5M and the second mirror 6M are galvanometer mirrors.
  • the processing head 4 is fixed to the stationary system of the laser processing apparatus 1, and the table 2 moves. Therefore, the driving devices 10 and 20 change the relative position between the machining head 4 and the table 2 by moving the table 2.
  • the driving device 10 changes the relative position between the machining head 4 and the table 2 in the X direction.
  • the drive device 20 changes the relative position between the machining head 4 and the table 2 in the Y direction.
  • the driving device 10 is appropriately referred to as a first driving device 10
  • the driving device 20 is appropriately referred to as a second driving device 20.
  • the first drive device 10 includes a base 11, rails 12A and 12B, guide members 13A and 13B, a nut 14, a screw 15, and an actuator 16.
  • the base 11 has rails 12A and 12B and an actuator 16 attached thereto and supports them.
  • the rails 12A and 12B extend along the X direction. Both rails 12A, 12B are arranged parallel to each other.
  • the guide member 13A is attached to the rail 12A and moves in the direction in which the rail 12A extends, that is, the X direction.
  • the guide member 13B is attached to the rail 12B and moves in the direction in which the rail 12B extends.
  • the guide members 13A and 13B are attached to the base 21 of the second drive device 20. Since the guide members 13A and 13B move along the rails 12A and 12B, the base 21 also moves along the rails 12A and 12B.
  • the nut 14 is attached to the base 21 of the second drive device 20.
  • the screw 15 is screwed into the nut 14.
  • the actuator 16 is an electric motor.
  • a screw 15 is attached to the shaft of the actuator 16.
  • the nut 14 moves in the direction in which the screw 15 extends, so that the base 21 to which the nut 14 is attached moves in the direction in which the screw 15 extends.
  • the extending direction of the screw 15 is the same X direction as the extending direction of the rails 12A and 12B. Therefore, when the screw 15 rotates, the base 21 moves along the rails 12A and 12B.
  • the actuator 16 rotates the screw 15 to move the base 21 along the rails 12A and 12B.
  • the actuator 16 has an encoder 17.
  • the encoder 17 is a rotary encoder.
  • the encoder 17 detects the rotation angle of the shaft of the actuator 16, that is, the rotation angle of the screw 15.
  • the actuator 16 is controlled by the first driver 30X.
  • the second drive unit 20 includes a base 21, rails 22A and 22B, guide members 23A and 23B, a nut 24, a screw 25, and an actuator 26.
  • the base 21 is attached with rails 22A and 22B and an actuator 26 to support them.
  • the rails 22A and 22B extend along the Y direction. Both rails 22A and 22B are arranged parallel to each other.
  • the guide member 23A is attached to the rail 22A and moves in the direction in which the rail 22A extends, that is, the Y direction.
  • the guide member 23B is attached to the rail 22B and moves in the direction in which the rail 22B extends.
  • the guide members 23A and 23B are attached to the table 2. Since the guide members 23A and 23B move along the rails 22A and 22B, the base 21 also moves along the rails 22A and 22B.
  • the nut 24 is attached to the base 21 of the second drive device 20.
  • the screw 25 is screwed into the nut 24.
  • the actuator 26 is an electric motor.
  • a screw 25 is attached to the shaft of the actuator 26.
  • the nut 24 moves in the direction in which the screw 25 extends, so that the table 2 to which the nut 24 is attached moves in the direction in which the screw 25 extends.
  • the extending direction of the screw 25 is the same Y direction as the extending direction of the rails 22A and 22B. Therefore, when the screw 25 rotates, the table 2 moves along the rails 22A and 22B.
  • the actuator 26 moves the table 2 along the rails 22A and 22B by rotating the screw 25.
  • the actuator 26 has an encoder 27.
  • the encoder 27 is a rotary encoder.
  • the encoder 27 detects the rotation angle of the shaft of the actuator 26, that is, the rotation angle of the screw 25.
  • the actuator 26 is controlled by the second driver 30Y.
  • the table 2 is attached to the first drive device 10 via the second drive device 20.
  • the first drive device 10 moves the table 2 in the X direction via the second drive device 20, more specifically, the base 21, the actuator 26, the screw 25, and the nut 24.
  • the second driving device 20 directly moves the table 2 in the Y direction. Since the rotation angle of the screw 15 that moves the table 2 in the X direction is proportional to the feed amount of the nut 14, the amount of movement of the table 2 in the X direction is obtained from the detection value of the encoder 17. Since the rotation angle of the screw 25 that moves the table 2 in the Y direction is proportional to the feed amount of the nut 24, the amount of movement of the table 2 in the Y direction is obtained from the detection value of the encoder 27.
  • At least one of the first driving device 10 and the second driving device 20 changes the relative position between the processing head 4 and the table 2, but the present invention is not limited to this.
  • the relative position between the machining head 4 and the table 2 may be changed by moving the machining head 4 while the table 2 is stationary. Further, the relative position between the processing head 4 and the table 2 is changed by moving the table 2 in either the X direction or the Y direction and moving the processing head 4 in a direction different from the moving direction of the table 2. May be.
  • the mechanism 4G includes a first mechanism 5 and a second mechanism 6.
  • the first mechanism 5 includes a first mirror 5M and a first actuator 5A.
  • the first mirror 5M reflects the laser beam LL emitted from the laser oscillation device 9 toward the second mechanism 6.
  • the first actuator 5A changes the irradiation direction of the laser light LL toward the second mechanism 6 by changing the inclination of the first mirror 5M.
  • the second mechanism 6 includes a second mirror 6M and a second actuator 6A.
  • the second mirror 6M reflects the laser beam LL reflected by the first mirror 5M of the first mechanism 5 toward the table 2.
  • the second actuator 6A changes the irradiation direction of the laser light LL toward the table 2 by changing the inclination of the second mirror 6M.
  • the first mirror 5M of the first mechanism 5 changes the irradiation direction of the laser light LL along the first direction.
  • the second mirror 6M of the second mechanism 6 changes the irradiation direction of the laser light LL along the second direction.
  • the first direction and the second direction intersect each other, and in the first embodiment, are orthogonal to each other.
  • the mechanism 4G can move the spot SP of the laser beam LL irradiated on the surface of the workpiece W. At this time, the mechanism 4G can move the spot SP along a straight line or a curve, and can also draw a circle on the spot SP or move the spot SP along a spiral.
  • the laser beam LL is a UV (Ultra Violet) laser or a carbon dioxide laser, but the type is not limited.
  • the type of the laser beam LL is selected in accordance with the type and processing method of the workpiece W to be processed by the laser processing apparatus 1.
  • the first actuator 5A and the second actuator 6A are electric motors.
  • the first actuator 5A and the second mirror 6M need only be changed, and are not limited to electric motors.
  • the laser processing apparatus 1 is controlled by the control device 31.
  • the control device 31 includes a processing unit 32, a storage unit 33, and an input / output unit 34.
  • the processing unit 32 is a processor such as a CPU (Central Processing Unit).
  • the storage unit 33 is a RAM (Random Access Memory), a ROM (Read Only Memory), a hard disk drive, a storage device, or a storage device that combines these.
  • the input / output unit 34 is an interface circuit that serves as an interface between the control device 31 and an external device connected to the control device 31.
  • the first actuator 5A, the second actuator 6A, the laser oscillation device 9, the encoders 17 and 27, the first driver 30X, the second driver 30Y, and the input device 35 shown in FIG. 1 are connected to the input / output unit 34.
  • the processing unit 32 acquires the detection values of the encoders 17 and 27 and the information input from the input device 35 via the input / output unit 34. Further, the processing unit 32 transmits control signals to the first actuator 5A, the second actuator 6A, the laser oscillation device 9, the first driver 30X, and the second driver 30Y via the input / output unit 34.
  • the storage unit 33 stores a computer program for the control device 31 to execute processing for controlling the laser processing device 1.
  • the processing unit 32 reads the computer program described above from the storage unit 33 and controls the laser processing apparatus 1. Specifically, the processing unit 32 moves the spot SP of the laser light LL irradiated on the surface of the workpiece W by controlling the first actuator 5A and the second actuator 6A of the mechanism 4G. Further, the processing unit 32 controls the laser oscillation device 9 to switch between irradiation of the laser beam LL and stop of irradiation, or change the energy of the laser beam LL.
  • the control device 31 controls the actuator 16 via the first driver 30X and controls the actuator 26 via the second driver 30Y.
  • the control device 31 controls the actuator 16 and the actuator 26 using the detection value of the encoder 17 and the detection value of the encoder 27.
  • the detection value of the encoder 17 is the rotation angle of the shaft of the actuator 16 and the screw 15
  • the detection value of the encoder 27 is the detection value of the encoder 27, that is, the rotation angle of the shaft of the actuator 26 and the screw 25.
  • the input device 35 is a device for inputting a command and data for operating the laser processing apparatus 1.
  • the input device 35 includes an input unit 35I and a display unit 35M.
  • the input unit 35I is a keyboard, a button, or a touch panel, but is not limited thereto.
  • the display unit 35M is a liquid crystal display, but is not limited to this.
  • the display unit 35 ⁇ / b> M can display information stored in the storage unit 33 of the control device 31 and information on errors that have occurred in the laser processing apparatus 1. The information displayed on the display unit 35M is not limited to these.
  • FIG. 2 is a cross-sectional view showing an example of a workpiece machined by the laser machining apparatus according to the first embodiment.
  • the workpiece W that is a processing target of the laser processing apparatus 1 is a substrate to which an electronic component is attached, more specifically, a printed substrate.
  • the laser processing apparatus 1 performs the hole processing for forming the hole H in the workpiece W by executing the laser processing method according to the first embodiment.
  • the workpiece W is a multilayer substrate having a first layer WA, a second layer WB, and a third layer WC.
  • the workpiece W has a structure in which a metal first layer WA and a metal third layer WC sandwich a resin second layer WB.
  • the metal of the first layer WA and the third layer WC is copper or a copper alloy, and the resin of the second layer WB is polyimide, but is not limited to these materials.
  • the metal of the first layer WA and the third layer WC may be aluminum or an aluminum alloy, and the resin of the second layer WB may be a phenol resin.
  • the first method is a method of condensing and processing the laser beam LL to approximately the diameter of the hole H to be processed.
  • the second method the laser beam LL is condensed to a diameter smaller than the diameter of the hole H to be processed, and the laser beam LL is irradiated while changing the irradiation position of the laser beam LL by the first mirror 5M and the second mirror 6M of the mechanism 4G.
  • the light LL is turned and processed to move away from the center of turning.
  • locus processing the processing by the second method is appropriately referred to as locus processing.
  • the first method is used when the diameter of the hole H to be processed is small, and the second method is used when the diameter of the hole H to be processed is large. Since the laser beam LL needs to be collected and processed from the relationship of the energy density of the laser beam LL necessary for processing, the second method is used when the diameter of the hole H to be processed is large.
  • Carbon dioxide lasers are easy to obtain high output and easy to maintain, but there are some workpieces that are difficult to machine at the wavelength of carbon dioxide lasers.
  • the carbon dioxide laser has a low absorption rate for copper, so that it is difficult to process with the carbon dioxide laser.
  • a UV laser may be used.
  • the first layer WA and the third layer WC made of copper can be drilled with a carbon dioxide laser.
  • the laser processing apparatus 1 condenses the laser light LL to increase the energy density, and operates the first mirror 5M and the second mirror 6M of the mechanism 4G.
  • a hole may be formed by locus processing while changing the irradiation position of the laser beam LL.
  • the laser beam LL is squeezed with respect to the workpiece W by the f ⁇ lens provided in the optical system 7 shown in FIG. Assume that the condensing point of the laser beam LL, that is, the diameter at the spot SP of the laser beam LL is 25 ⁇ m.
  • the mechanism 4G of the laser processing apparatus 1 performs the locus processing so that the processing range of the diameter 25 ⁇ m by the spot SP overlaps little by little for each pulse of the laser beam LL, thereby making the hole H larger than the diameter 25 ⁇ m in the workpiece W. Can be processed.
  • blind hole drilling There are two types of hole drilling in the substrate: blind hole drilling and through hole drilling.
  • a hole is often processed up to the first layer WA and the second layer WB, and a blind hole is formed that stops at the surface of the third layer WC.
  • the laser processing apparatus 1 first focuses the laser beam LL on the surface of the first layer WA of the workpiece W, and processes the first layer WA by trajectory processing.
  • the laser processing apparatus 1 reduces the output of the laser beam LL to reduce the energy density of the laser beam LL with respect to the second layer WB.
  • the energy density at this time is such that the second layer WB, which is resin, can be processed, but the third layer WC, which is copper, cannot be processed.
  • the output of the laser beam LL is not decreased, and the focal position of the laser beam LL with respect to the workpiece W is shifted, thereby shifting the laser beam LL on the surface of the second layer WB.
  • the above-described blind hole processing does not process the first layer WA and the second layer WB every time one hole H is processed, but after all the holes have been processed for the first layer WA, Is changed, and the second layer WB is drilled for all the holes H. By doing in this way, since the frequency
  • the locus processing there is one in which only the outer periphery of the hole H of the first layer WA is processed to leave the central portion and the central portion is removed together when the second layer WB is processed.
  • the productivity is high because the machining is performed only on the outer periphery, but when the second layer WB is machined, the central part is skipped and removed, so it may be unclear whether the central part can be removed reliably. There is sex. Moreover, if the center part skipped when the 2nd layer WB was processed cannot fully collect dust, the frequency which cleans the laser processing apparatus 1 will increase, and the fall of productivity may be caused.
  • the laser machining apparatus 1 first positions the laser beam LL at the center C of the hole H, and moves away from the center C while rotating the laser beam LL from this point.
  • the laser beam LL is moved.
  • the mechanism 4G first positions the laser beam LL at the center C of the hole H, and then moves the spot SP of the laser beam LL along the spiral.
  • the speed at which the spots SP move is low, so that the overlapping ratio of the spots SP increases.
  • a trace of the second layer WB melting may remain in the third layer WC in contact with the second layer WB.
  • the third layer WC in the center portion of the hole H may be excessively processed.
  • the repetition frequency of the laser oscillation device 9 is increased in order to improve productivity, a large amount of laser light LL is irradiated onto the workpiece W in a short time, so that the center portion may be excessively processed due to the effect of heat storage. Increases nature.
  • the start of the spiral trajectory is shifted from the center C in order to avoid excessive machining of the central portion of the third layer WC.
  • the amount of movement in the radial direction for each turn when the laser beam LL moves along the spiral is increased so that the laser at the center portion.
  • the first layer WA may remain in the center of the hole H depending on the conditions, and it is difficult to select conditions that match the specifications of the workpiece W.
  • the locus machining is not performed after confirming the completion of positioning by the mechanism 4G for each pulse.
  • the laser processing apparatus 1 operates the mechanism 4G while operating the mechanism 4G in a state where the laser oscillation device 9 generates pulses of the laser beam LL continuously from the machining start point to the machining end point. Process. For this reason, in the locus machining, it is difficult to change the machining pitch in one spiral locus.
  • the mechanism 4G of the laser processing apparatus 1 turns the spot SP of the laser beam LL irradiated on the surface of the workpiece W and moves away from the position where the irradiation of the laser beam LL is started as the turning progresses.
  • the laser oscillation device 9 increases the energy of the laser light LL between the start and end of processing of the workpiece W, compared to when the processing of the workpiece W is started.
  • the laser processing apparatus 1 causes the third layer WC to be excessive in the center portion of the hole H when drilling, more specifically, blind hole processing, in the third layer WC of the workpiece W. To prevent the machining quality from being lowered. Further, since the laser processing apparatus 1 processes the first layer WA from the central portion, the central portion of the first layer WA can be reliably removed.
  • FIG. 3 is a plan view for explaining hole processing by the laser processing apparatus according to the first embodiment.
  • FIG. 4 is a diagram for explaining conditions when the laser machining apparatus according to Embodiment 1 executes locus machining.
  • 5 to 7 are cross-sectional views for explaining hole processing by the laser processing apparatus according to the first embodiment.
  • the position of the spot SP of the laser beam LL at the start of processing is set to the center of the hole H to be formed. Position to C. If positioning is completed, the laser processing apparatus 1 will start the hole processing by locus processing. Specifically, the laser oscillation device 9 starts irradiating the laser beam LL, and the mechanism 4G operates the first mirror 5M and the second mirror 6M to spiral the spot SP of the laser beam LL on the surface of the workpiece W. Move along. By such processing, the spot SP of the laser beam LL is swung along the spiral.
  • the locus LS of the spot SP of the laser beam LL is from the center C of the hole H to be formed to the outer periphery HE of the hole H shown in FIG. , Spiral or spiral.
  • the spiral locus LS is set with the movement amount ⁇ d to the outside in the radial direction DD as a parameter for each rotation.
  • the spot SP of the laser beam LL circulates a plurality of times from the center C of the hole H to the outer periphery HE and reaches the outer periphery HE.
  • the spot SP of the laser beam LL is smaller in the center of the hole H than the case where the movement amount ⁇ d in the radial direction DD is relatively small. From C to the outer periphery HE.
  • the spot SP of the laser beam LL moves outside the radial direction DD by a movement amount ⁇ d while turning around the center C.
  • the first layer WA of the workpiece W is melted and removed, and a processed portion U is formed. From the processed portion U, the second layer WB is exposed.
  • the spot SP of the laser beam LL moves to the outside of the radial direction DD while turning, and reaches the outer periphery HE of the hole H at the position PE of the locus LS.
  • the spot SP of the laser beam LL repeats turning a plurality of times at the position of the outer periphery HE of the hole H.
  • the laser oscillation device 9 stops the laser beam irradiation, and the hole processing by the trajectory processing is completed.
  • a hole H is formed in the first layer WA of the workpiece W as shown in FIG.
  • the laser processing apparatus 1 performs hole processing by reducing the energy of the laser beam LL. That is, the laser oscillation device 9 of the laser processing apparatus 1 increases the energy of the laser light LL when the speed of movement of the spot SP of the laser light LL is larger than when the speed of movement is low.
  • the laser processing apparatus 1 can suppress deterioration in processing quality due to excessive processing of the third layer WC.
  • the hole machining by the locus machining progresses, that is, as the number of rounds of the spot SP of the laser beam LL increases, the moving speed of the spot SP increases and the overlapping ratio of the spots SP decreases.
  • the laser processing apparatus 1 continues the hole processing by increasing the energy of the laser beam LL from that at the start of the hole processing.
  • the laser processing apparatus 1 can reliably remove the first layer WA even when the moving speed of the spot SP of the laser beam LL increases.
  • FIG. 8 is a diagram showing the relationship between the laser beam energy and the moving speed of the laser beam spot when the laser processing apparatus according to the first embodiment performs hole processing.
  • PS in FIG. 8 is the number of pulses of the laser light LL irradiated onto the workpiece W.
  • PSs indicates the number of pulses at the timing when the laser processing apparatus 1 starts drilling.
  • PSc indicates the number of pulses at which the energy E of the laser beam LL is made larger than that at the start of drilling.
  • PSe indicates the timing when the hole processing by the laser processing apparatus 1 is completed.
  • the moving speed Vc of the spot SP of the laser beam LL increases immediately after the laser processing apparatus 1 starts drilling until a certain number of pulses PS is reached or until a certain time t elapses. To do.
  • the moving speed Vc is a peripheral speed.
  • the laser processing apparatus 1 irradiates the workpiece W with the laser beam LL having the first energy E1 until the pulse number PSc, and the workpiece W receives the laser beam LL having the second energy E2 after the pulse number PSc. Irradiate.
  • the diameter of the processed portion U is Dc as shown in FIGS.
  • the laser processing apparatus 1 rotates the spot SP along the spiral while irradiating the workpiece W with the laser beam LL of the second energy E2, and the outer diameter HE of the hole H, that is, the diameter D
  • the spot SP is circulated a plurality of times at the position.
  • the energy E of the laser beam LL is preferably maximized at the outer periphery HE of the hole H.
  • FIG. 9 is a diagram showing laser beam spot overlap when the laser processing apparatus 1 according to the first embodiment performs hole processing.
  • the timing at which the laser processing apparatus 1 increases the energy E of the laser beam LL than when the processing is started may be a timing at which the overlap ke of the spots SP of the adjacent laser beams LL becomes equal to or greater than a predetermined value. it can.
  • the size of the overlap ke can be obtained from the moving speed Vc of the spot SP of the laser beam LL and the diameter ds of the spot SP.
  • the pulse number PSc at which the energy E of the laser beam LL is changed is determined when determining the machining condition of the workpiece W, and is stored in the storage unit 33 of the control device 31 shown in FIG.
  • the laser processing apparatus 1 forms a hole H having a diameter of 100 ⁇ m on the workpiece W by hole processing by trajectory processing
  • the laser light LL is focused to a diameter of 25 ⁇ m by the f ⁇ lens provided in the optical system 7.
  • the mechanism 4G processes the outer periphery HE of the hole H
  • the operation amount and the operation speed of the first mirror 5M and the second mirror 6M are determined so that the overlap ke is 5 ⁇ m.
  • the spiral trajectory LS moves 15 ⁇ m in the radial direction DD every time the spot SP of the laser beam LL makes one revolution. That is, the movement amount ⁇ d is 15 ⁇ m.
  • the pulse number PSc for increasing the energy E of the laser beam LL is equal to the pulse number PS when the overlap ke of the spot SP of the laser beam LL is smaller than the overlap ke at the start of processing and larger than the overlap ke at the outer periphery HE. Is set.
  • the set pulse number PSc is stored in the storage unit 33 of the control device 31.
  • the energy E of the laser beam LL is set so that the energy E2 when the outer periphery HE is processed is maximized, and the energy E1 from the start of processing to the number of pulses PSc is 1 ⁇ 2 of the energy E2.
  • the energy E1, E2 is stored in the storage unit 33 of the control device 31.
  • the control device 31 drills the workpiece W by trajectory machining using the operation amount, operation speed, pulse number PSc, and energy E1, E2 of the first mirror 5M and the second mirror 6M stored in the storage unit 33.
  • the control device 31 of the laser processing device 1 changes the energy of the laser light LL by changing the gate width of the Q switch.
  • the control device 31 controls the laser oscillation device 9 with the gate width that becomes the energy E1 from the machining start to the pulse number PSc.
  • the control device 31 controls the laser oscillation device 9 with the gate width of energy E2 after the pulse number PSc.
  • the control device 31 controls the laser oscillation device 9 so that the energy E becomes maximum.
  • the control device 31 When processing the outer periphery HE of the hole H, the control device 31 does not determine the number of pulses PS of the laser beam LL, and stops the irradiation of the laser beam LL when the control of the first mirror 5M and the second mirror 6M is completed. To do.
  • the laser oscillation device 9 of the laser processing apparatus 1 increases the energy E of the laser beam LL in two steps of energy E1 and E2 from the start to the end of processing, but increases the energy E stepwise. It is not limited to two stages.
  • the laser oscillation device 9 may change the energy E of the laser beam LL in three stages of E1, E1u, and E2, as shown in FIG. In this case, the energy changes from energy E1 to energy E2 at the number of pulses PSc1, and changes from energy E1u to energy E2 at the number of pulses PSc2.
  • the energy E2 is energy when the output of the laser oscillation device 9 is maximum. Since the energy E of the laser beam LL is increased stepwise, the control of the laser oscillation device 9 can be simplified.
  • the laser oscillation device 9 of the laser processing device 1 may continuously increase the energy E of the laser beam LL as shown in FIG.
  • the laser processing apparatus 1 increases the energy E as the number of pulses PS increases from the start of processing, and sets the maximum value Emax of the energy E at the number of pulses PSc. That is, the energy E of each pulse of the laser beam LL is determined so that the maximum value Emax is obtained at the outer periphery HE of the hole H.
  • the pulse number PSc can be set to the pulse number at the timing when the spot SP of the laser beam LL reaches the outer periphery HE of the hole H, but is not limited thereto.
  • the number of pulses PS when the overlap ke of the spot SP of the laser beam LL is smaller than the overlap ke at the start of processing and larger than the overlap ke at the outer periphery HE may be used.
  • the energy E of the laser beam LL can be easily controlled in accordance with the moving speed Vc of the spot SP of the laser beam LL.
  • FIG. 12 is a diagram showing a modification of the method for moving the laser beam spot in the locus processing by the laser processing apparatus according to the first embodiment.
  • the mechanism 4G of the laser processing apparatus 1 moves the spot SP of the laser beam LL along the spiral. That is, the mechanism 4G continuously changes the position of the spot SP in the radial direction DD so that when the spot SP of the laser beam LL makes one round around the center C, the spot SP moves by the movement amount ⁇ d in the radial direction DD. I let you.
  • the mechanism 4G of the laser processing apparatus 1 causes the circular motion that makes one round around the center C to be the spot SP, and then moves it by the movement amount ⁇ d in the radial direction DD, and makes one round around the center C. Make a circular motion. This is repeated up to the outer periphery HE of the hole H. That is, in the modification, the mechanism 4G moves the spot SP stepwise in the radial direction DD by the movement amount ⁇ d every time the spot SP of the laser beam LL makes one round around the center C.
  • the laser processing apparatus 1 can drill the workpiece W by the trajectory processing.
  • FIG. 13 is a flowchart of the laser processing method according to the first embodiment.
  • the laser processing method according to the first embodiment is realized by the control device 31 shown in FIG.
  • the flowchart shown in FIG. 13 is an example in which the energy E of the laser beam LL increases stepwise.
  • the control device 31 positions the position where the workpiece W is irradiated with the laser light LL at the center C of the hole H to be formed in the workpiece W.
  • the control device 31 controls the laser oscillation device 9 to start irradiating the workpiece W placed on the table 2 with the laser beam LL and the spot SP of the laser beam LL at the center C. Rotate around. That is, the control device 31 turns the spot SP of the laser beam LL and moves it away from the position where the irradiation of the laser beam LL starts, that is, the center C as the turning of the spot SP progresses.
  • the control device 31 reads out the pulse number PSc at the timing of increasing the energy E of the laser beam LL from the storage unit 33 and compares it with the current pulse number PS. If the current number of pulses PS is not the number of pulses PSc, the control device 31 determines in step S102 that it is not time to change the energy E of the laser beam LL (step S102, No). In this case, the control device 31 causes the laser oscillation device 9 to continue irradiation with the laser light LL with the current energy E in step S103.
  • the control device 31 determines in step S102 that it is time to change the energy E of the laser beam LL (step S102, Yes). In this case, the control device 31 increases the energy E of the laser beam LL in step S104. That is, the control device 31 increases the energy E of the laser beam LL between the start and end of processing of the workpiece W, compared to when the processing of the workpiece W is started. Specifically, the control device 31 causes the laser oscillation device 9 to irradiate the laser beam LL with an energy E larger than the current energy E.
  • step S105 the control device 31 determines whether or not the spot SP of the laser beam LL has reached the outer periphery HE of the hole H.
  • step S106 the laser oscillation device 9 is continuously irradiated with the laser beam LL with the energy E increased in step S104.
  • step S107 the control device 31 sets the energy E of the laser beam LL as the maximum value and makes a plurality of spots of the laser beam LL go around. Then, the laser oscillation device 9 is controlled to stop the irradiation with the laser beam LL. Through such processing, a hole H is formed in the first layer WA of the workpiece W.
  • the laser processing apparatus 1 performs the hole processing on the second layer WB at the position of the hole H.
  • the configuration described in the above embodiment shows an example of the contents of the present invention, and can be combined with another known technique, and can be combined with other configurations without departing from the gist of the present invention. It is also possible to omit or change the part.

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Abstract

This laser processing device (1) includes: a mechanism (4G) that processes a workpiece (W) by turning a spot (SP) on the surface of the workpiece (W) irradiated by laser light (LL) and moving the spot (SP) away from the position where irradiation of the laser light (LL) started as turning of the spot (SP) of the laser light (LL) progresses; and a control device (31) that increases, from the start to the end of processing of the workpiece (W), the energy of the laser light (LL) from that used when the processing of the workpiece (W) started.

Description

レーザ加工装置及びレーザ加工方法Laser processing apparatus and laser processing method

 本発明は、レーザ光を被加工物であるワークに照射してワークに穴を加工するレーザ加工装置及びレーザ加工方法に関する。 The present invention relates to a laser processing apparatus and a laser processing method for irradiating a workpiece, which is a workpiece, with a laser beam to process a hole in the workpiece.

 レーザを利用した加工装置が知られている。特許文献1及び特許文献2には、レーザ光を螺旋状に回転させながらワークに穴を形成する技術が記載されている。 Processing devices using lasers are known. Patent Documents 1 and 2 describe a technique for forming a hole in a workpiece while rotating a laser beam in a spiral shape.

特開2014-217860号公報JP 2014-217860 A 特開2007-136471号公報JP 2007-136471 A

 レーザ光を螺旋状に回転させながらワークに穴を形成する場合、金属で樹脂を挟み込んだワークに止まり穴加工をする場合、貫通しない部分の金属に樹脂が溶融した痕跡が残ることがある。このように、ワークの種類及び加工方法によっては、加工後のワークの品質が低下することがある。 When forming a hole in a workpiece while rotating the laser beam in a spiral manner, if a hole is drilled in a workpiece with a resin sandwiched between metals, there may be a trace that the resin has melted in the portion of the metal that does not penetrate. Thus, depending on the type of workpiece and the machining method, the quality of the workpiece after machining may deteriorate.

 本発明は、レーザ光でワークに穴を形成する穴加工の加工品質の低下を抑制することを目的とする。 An object of the present invention is to suppress a reduction in processing quality of hole processing in which a hole is formed in a workpiece with a laser beam.

 本発明のレーザ加工装置は、ワークの表面に照射されるレーザ光のスポットを旋回させ、かつ旋回が進むにしたがってレーザ光の照射を開始した位置から遠ざけて移動させてワークを加工する機構と、ワークの加工の開始から終了までの間に、レーザ光のエネルギをワークの加工が開始されたときよりも大きくする装置と、を含む。 The laser processing apparatus of the present invention rotates a spot of the laser light irradiated on the surface of the workpiece, and moves the workpiece away from the position where the laser beam irradiation is started as the rotation proceeds, and a mechanism for processing the workpiece, And an apparatus for increasing the energy of the laser beam from the start to the end of the workpiece processing than when the workpiece processing is started.

 本発明は、レーザ光でワークに穴を形成する穴加工の加工品質の低下を抑制することができる。 The present invention can suppress the deterioration of the processing quality of the hole processing in which a hole is formed in a workpiece with a laser beam.

実施の形態1に係るレーザ加工装置を示す斜視図The perspective view which shows the laser processing apparatus which concerns on Embodiment 1. FIG. 実施の形態1に係るレーザ加工装置が加工するワークの一例を示す断面図Sectional drawing which shows an example of the workpiece | work which the laser processing apparatus which concerns on Embodiment 1 processes 実施の形態1に係るレーザ加工装置による穴加工を説明するための平面図The top view for demonstrating the hole processing by the laser processing apparatus concerning Embodiment 1 実施の形態1に係るレーザ加工装置が軌跡加工を実行する際の条件を説明するための図The figure for demonstrating the conditions at the time of the laser processing apparatus which concerns on Embodiment 1 performing locus processing 実施の形態1に係るレーザ加工装置による穴加工を説明するための断面図Sectional drawing for demonstrating the hole processing by the laser processing apparatus concerning Embodiment 1 実施の形態1に係るレーザ加工装置による穴加工を説明するための断面図Sectional drawing for demonstrating the hole processing by the laser processing apparatus concerning Embodiment 1 実施の形態1に係るレーザ加工装置による穴加工を説明するための断面図Sectional drawing for demonstrating the hole processing by the laser processing apparatus concerning Embodiment 1 実施の形態1に係るレーザ加工装置が穴加工する場合のレーザ光のエネルギとレーザ光のスポットの移動速度との関係を示す図The figure which shows the relationship between the energy of the laser beam and the moving speed of the spot of a laser beam when the laser processing apparatus which concerns on Embodiment 1 carries out hole processing 実施の形態1に係るレーザ加工装置1が穴加工する場合におけるレーザ光のスポットの重なりを示す図The figure which shows the overlap of the spot of a laser beam in case the laser processing apparatus 1 which concerns on Embodiment 1 carries out hole processing 実施の形態1に係るレーザ加工装置が穴加工する場合のレーザ光のエネルギとの関係の変形例を示す図The figure which shows the modification of the relationship with the energy of the laser beam in case the laser processing apparatus which concerns on Embodiment 1 carries out hole processing 実施の形態1に係るレーザ加工装置が穴加工する場合のレーザ光のエネルギとの関係の変形例を示す図The figure which shows the modification of the relationship with the energy of the laser beam in case the laser processing apparatus which concerns on Embodiment 1 carries out hole processing 実施の形態1に係るレーザ加工装置が軌跡加工においてレーザ光のスポットを移動させる方法の変形例を示す図The figure which shows the modification of the method in which the laser processing apparatus which concerns on Embodiment 1 moves the spot of a laser beam in locus processing 実施の形態1に係るレーザ加工方法のフローチャートFlowchart of laser processing method according to Embodiment 1

 以下に、実施の形態に係るレーザ加工装置を図面に基づいて詳細に説明する。以下に示される実施の形態により本発明が限定されるものではない。 Hereinafter, the laser processing apparatus according to the embodiment will be described in detail with reference to the drawings. The present invention is not limited to the embodiments shown below.

実施の形態1.
 図1は、実施の形態1に係るレーザ加工装置を示す斜視図である。実施の形態1に係るレーザ加工装置1は、ワークWの表面に照射されるレーザ光LLのスポットSPを旋回させ、かつ旋回が進むにしたがってレーザ光LLの照射を開始した位置から遠ざけて移動させてワークWを加工する機構4Gと、ワークWの加工の開始から終了までの間に、レーザ光LLのエネルギをワークWの加工が開始されたときよりも大きくする装置であるレーザ発振装置9と、を含む。
Embodiment 1 FIG.
FIG. 1 is a perspective view showing a laser processing apparatus according to the first embodiment. The laser processing apparatus 1 according to the first embodiment rotates the spot SP of the laser beam LL irradiated on the surface of the workpiece W, and moves it away from the position where the irradiation of the laser beam LL is started as the rotation progresses. A mechanism 4G that processes the workpiece W, and a laser oscillation device 9 that is an apparatus that increases the energy of the laser beam LL from the start to the end of the processing of the workpiece W, compared to when the processing of the workpiece W is started. ,including.

 レーザ加工装置1は、切断又は穴開けといった加工をワークWに施す。加工ヘッド4は、機構4Gと、光学系7とを含む。機構4Gは、レーザ光LLの照射方向を変更する。加工ヘッド4が有する光学系7は、機構4Gから照射されたレーザ光LLをテーブル2のワークWの表面で結像させるfθレンズ及びレーザ光LLの焦点を調整する焦点調整機構を含む。機構4Gの構造及び動作については後述する。集塵ダクト8は、加工ヘッド4から照射されたレーザ光LLによってワークWが加工されたときに発生する粉塵を吸引する。 The laser processing apparatus 1 performs processing such as cutting or drilling on the workpiece W. The processing head 4 includes a mechanism 4G and an optical system 7. The mechanism 4G changes the irradiation direction of the laser light LL. The optical system 7 included in the processing head 4 includes an fθ lens that forms an image of the laser light LL emitted from the mechanism 4G on the surface of the work W of the table 2 and a focus adjustment mechanism that adjusts the focus of the laser light LL. The structure and operation of the mechanism 4G will be described later. The dust collection duct 8 sucks dust generated when the workpiece W is processed by the laser beam LL emitted from the processing head 4.

 テーブル2は、ワークWを載置する第1面2Psと、第1面2Psに対向する第2面2Prと、第1面2Ps及び第2面2Prを接続する側面2SA,2SB,2SC,2SDとを有する。第1面2Ps及び第2面2Prの形状は、いずれも長方形である。長方形は、正方形を含む。このため、テーブル2の形状は、直方体となる。 The table 2 includes a first surface 2Ps on which the workpiece W is placed, a second surface 2Pr facing the first surface 2Ps, and side surfaces 2SA, 2SB, 2SC, 2SD that connect the first surface 2Ps and the second surface 2Pr. Have The shapes of the first surface 2Ps and the second surface 2Pr are both rectangular. The rectangle includes a square. For this reason, the shape of the table 2 is a rectangular parallelepiped.

 テーブル2は、第1面2Psの加工領域2WAにワークWを載置する。加工領域2WAは、第1面2Psの外縁2EGよりも内側の領域である。加工ヘッド4は、加工領域2WAの外側の物体を加工することはできない。テーブル2は、第1面2Ps及び第2面2Prの一辺と平行な方向である第1方向と、第1方向に交差する第2方向との2方向に移動する。第1方向及び第2方向に直交する方向は第3方向である。実施の形態1において、第1方向と第2方向とは直交、すなわち90度で交差するが、第1方向と第2方向とは90度以外で交差してもよい。以下において適宜、第1方向をX方向、第2方向をY方向、第3方向をZ方向と称する。第1機構5の第1ミラー5Mは、レーザ光LLの照射方向を第1方向であるX方向に沿って変更し、第2機構6の第2ミラー6Mは、レーザ光LLの照射方向を第2方向であるY方向に沿って変更する。第1ミラー5M及び第2ミラー6Mは、ガルバノミラーである。 The table 2 places the workpiece W on the machining area 2WA of the first surface 2Ps. The processing area 2WA is an area inside the outer edge 2EG of the first surface 2Ps. The processing head 4 cannot process an object outside the processing area 2WA. The table 2 moves in two directions: a first direction that is parallel to one side of the first surface 2Ps and the second surface 2Pr, and a second direction that intersects the first direction. The direction orthogonal to the first direction and the second direction is the third direction. In the first embodiment, the first direction and the second direction are orthogonal, that is, intersect at 90 degrees, but the first direction and the second direction may intersect at other than 90 degrees. In the following, the first direction is referred to as the X direction, the second direction is referred to as the Y direction, and the third direction is referred to as the Z direction. The first mirror 5M of the first mechanism 5 changes the irradiation direction of the laser light LL along the X direction which is the first direction, and the second mirror 6M of the second mechanism 6 changes the irradiation direction of the laser light LL to the first direction. It changes along the Y direction which is two directions. The first mirror 5M and the second mirror 6M are galvanometer mirrors.

 実施の形態1において、加工ヘッド4はレーザ加工装置1の静止系に固定されており、テーブル2が移動する。このため、駆動装置10,20は、テーブル2を移動させることによって、加工ヘッド4とテーブル2との相対位置を変更する。実施の形態1において、駆動装置10は、加工ヘッド4とテーブル2とのX方向における相対位置を変更する。駆動装置20は、加工ヘッド4とテーブル2とのY方向における相対位置を変更する。以下において、駆動装置10を適宜、第1駆動装置10と称し、駆動装置20を適宜、第2駆動装置20と称する。 In Embodiment 1, the processing head 4 is fixed to the stationary system of the laser processing apparatus 1, and the table 2 moves. Therefore, the driving devices 10 and 20 change the relative position between the machining head 4 and the table 2 by moving the table 2. In the first embodiment, the driving device 10 changes the relative position between the machining head 4 and the table 2 in the X direction. The drive device 20 changes the relative position between the machining head 4 and the table 2 in the Y direction. Hereinafter, the driving device 10 is appropriately referred to as a first driving device 10, and the driving device 20 is appropriately referred to as a second driving device 20.

 第1駆動装置10は、基台11と、レール12A,12Bと、案内部材13A,13Bと、ナット14と、ねじ15と、アクチュエータ16とを含む。基台11は、レール12A,12B及びアクチュエータ16が取り付けられて、これらを支持する。レール12A,12Bは、X方向に沿って延びている。両方のレール12A,12Bは、互いに平行に配置される。案内部材13Aは、レール12Aに取り付けられて、レール12Aが延びる方向、すなわちX方向に移動する。案内部材13Bは、レール12Bに取り付けられて、レール12Bが延びる方向に移動する。 The first drive device 10 includes a base 11, rails 12A and 12B, guide members 13A and 13B, a nut 14, a screw 15, and an actuator 16. The base 11 has rails 12A and 12B and an actuator 16 attached thereto and supports them. The rails 12A and 12B extend along the X direction. Both rails 12A, 12B are arranged parallel to each other. The guide member 13A is attached to the rail 12A and moves in the direction in which the rail 12A extends, that is, the X direction. The guide member 13B is attached to the rail 12B and moves in the direction in which the rail 12B extends.

 案内部材13A,13Bは、第2駆動装置20の基台21に取り付けられる。案内部材13A,13Bはレール12A,12Bに沿って移動するので、基台21もレール12A,12Bに沿って移動する。 The guide members 13A and 13B are attached to the base 21 of the second drive device 20. Since the guide members 13A and 13B move along the rails 12A and 12B, the base 21 also moves along the rails 12A and 12B.

 ナット14は、第2駆動装置20の基台21に取り付けられる。ねじ15は、ナット14にねじ込まれる。実施の形態1において、アクチュエータ16は電動機である。アクチュエータ16のシャフトにねじ15が取り付けられる。ねじ15が回転することにより、ナット14がねじ15の延びる方向に移動するので、ナット14が取り付けられた基台21は、ねじ15の延びる方向に移動する。実施の形態1において、ねじ15の延びる方向は、レール12A,12Bが延びる方向と同一のX方向なので、基台21は、ねじ15が回転すると、レール12A,12Bに沿って移動する。アクチュエータ16は、ねじ15を回転させることにより、基台21をレール12A,12Bに沿って移動させる。 The nut 14 is attached to the base 21 of the second drive device 20. The screw 15 is screwed into the nut 14. In Embodiment 1, the actuator 16 is an electric motor. A screw 15 is attached to the shaft of the actuator 16. As the screw 15 rotates, the nut 14 moves in the direction in which the screw 15 extends, so that the base 21 to which the nut 14 is attached moves in the direction in which the screw 15 extends. In the first embodiment, the extending direction of the screw 15 is the same X direction as the extending direction of the rails 12A and 12B. Therefore, when the screw 15 rotates, the base 21 moves along the rails 12A and 12B. The actuator 16 rotates the screw 15 to move the base 21 along the rails 12A and 12B.

 アクチュエータ16は、エンコーダ17を有している。実施の形態1において、エンコーダ17はロータリーエンコーダである。エンコーダ17は、アクチュエータ16のシャフトの回転角度、すなわちねじ15の回転角度を検出する。アクチュエータ16は、第1ドライバ30Xによって制御される。 The actuator 16 has an encoder 17. In the first embodiment, the encoder 17 is a rotary encoder. The encoder 17 detects the rotation angle of the shaft of the actuator 16, that is, the rotation angle of the screw 15. The actuator 16 is controlled by the first driver 30X.

 第2駆動装置20は、基台21と、レール22A,22Bと、案内部材23A,23Bと、ナット24と、ねじ25と、アクチュエータ26とを含む。基台21は、レール22A,22B及びアクチュエータ26が取り付けられて、これらを支持する。レール22A,22Bは、Y方向に沿って延びている。両方のレール22A,22Bは、互いに平行に配置される。案内部材23Aは、レール22Aに取り付けられて、レール22Aが延びる方向、すなわちY方向に移動する。案内部材23Bは、レール22Bに取り付けられて、レール22Bが延びる方向に移動する。 The second drive unit 20 includes a base 21, rails 22A and 22B, guide members 23A and 23B, a nut 24, a screw 25, and an actuator 26. The base 21 is attached with rails 22A and 22B and an actuator 26 to support them. The rails 22A and 22B extend along the Y direction. Both rails 22A and 22B are arranged parallel to each other. The guide member 23A is attached to the rail 22A and moves in the direction in which the rail 22A extends, that is, the Y direction. The guide member 23B is attached to the rail 22B and moves in the direction in which the rail 22B extends.

 案内部材23A,23Bは、テーブル2に取り付けられる。案内部材23A,23Bはレール22A,22Bに沿って移動するので、基台21もレール22A,22Bに沿って移動する。 The guide members 23A and 23B are attached to the table 2. Since the guide members 23A and 23B move along the rails 22A and 22B, the base 21 also moves along the rails 22A and 22B.

 ナット24は、第2駆動装置20の基台21に取り付けられる。ねじ25は、ナット24にねじ込まれる。実施の形態1において、アクチュエータ26は電動機である。アクチュエータ26のシャフトにねじ25が取り付けられる。ねじ25が回転することにより、ナット24がねじ25の延びる方向に移動するので、ナット24が取り付けられたテーブル2は、ねじ25の延びる方向に移動する。実施の形態1において、ねじ25の延びる方向は、レール22A,22Bが延びる方向と同一のY方向なので、テーブル2は、ねじ25が回転すると、レール22A,22Bに沿って移動する。アクチュエータ26は、ねじ25を回転させることにより、テーブル2をレール22A,22Bに沿って移動させる。 The nut 24 is attached to the base 21 of the second drive device 20. The screw 25 is screwed into the nut 24. In the first embodiment, the actuator 26 is an electric motor. A screw 25 is attached to the shaft of the actuator 26. As the screw 25 rotates, the nut 24 moves in the direction in which the screw 25 extends, so that the table 2 to which the nut 24 is attached moves in the direction in which the screw 25 extends. In the first embodiment, the extending direction of the screw 25 is the same Y direction as the extending direction of the rails 22A and 22B. Therefore, when the screw 25 rotates, the table 2 moves along the rails 22A and 22B. The actuator 26 moves the table 2 along the rails 22A and 22B by rotating the screw 25.

 アクチュエータ26は、エンコーダ27を有している。実施の形態1において、エンコーダ27はロータリーエンコーダである。エンコーダ27は、アクチュエータ26のシャフトの回転角度、すなわちねじ25の回転角度を検出する。アクチュエータ26は、第2ドライバ30Yによって制御される。 The actuator 26 has an encoder 27. In the first embodiment, the encoder 27 is a rotary encoder. The encoder 27 detects the rotation angle of the shaft of the actuator 26, that is, the rotation angle of the screw 25. The actuator 26 is controlled by the second driver 30Y.

 テーブル2は、第2駆動装置20を介して第1駆動装置10に取り付けられる。第1駆動装置10は、第2駆動装置20、より具体的には基台21、アクチュエータ26、ねじ25及びナット24を介してテーブル2をX方向に移動させる。第2駆動装置20は、直接テーブル2をY方向に移動させる。テーブル2をX方向に移動させるねじ15の回転角度は、ナット14の送り量に比例するので、エンコーダ17の検出値により、テーブル2のX方向への移動量が求められる。テーブル2をY方向に移動させるねじ25の回転角度は、ナット24の送り量に比例するので、エンコーダ27の検出値により、テーブル2のY方向への移動量が求められる。 The table 2 is attached to the first drive device 10 via the second drive device 20. The first drive device 10 moves the table 2 in the X direction via the second drive device 20, more specifically, the base 21, the actuator 26, the screw 25, and the nut 24. The second driving device 20 directly moves the table 2 in the Y direction. Since the rotation angle of the screw 15 that moves the table 2 in the X direction is proportional to the feed amount of the nut 14, the amount of movement of the table 2 in the X direction is obtained from the detection value of the encoder 17. Since the rotation angle of the screw 25 that moves the table 2 in the Y direction is proportional to the feed amount of the nut 24, the amount of movement of the table 2 in the Y direction is obtained from the detection value of the encoder 27.

 実施の形態1において、第1駆動装置10及び第2駆動装置20の少なくとも一方が、加工ヘッド4とテーブル2との相対位置を変更するが、このようなものに限定されない。加工ヘッド4とテーブル2との相対位置は、テーブル2が静止して加工ヘッド4が移動することによって変更されてもよい。また、加工ヘッド4とテーブル2との相対位置は、テーブル2がX方向又はY方向のいずれか一方に移動し、加工ヘッド4がテーブル2の移動方向とは異なる方向に移動することによって変更されてもよい。 In the first embodiment, at least one of the first driving device 10 and the second driving device 20 changes the relative position between the processing head 4 and the table 2, but the present invention is not limited to this. The relative position between the machining head 4 and the table 2 may be changed by moving the machining head 4 while the table 2 is stationary. Further, the relative position between the processing head 4 and the table 2 is changed by moving the table 2 in either the X direction or the Y direction and moving the processing head 4 in a direction different from the moving direction of the table 2. May be.

 次に、機構4Gについて説明する。機構4Gは、第1機構5及び第2機構6を有する。第1機構5は、第1ミラー5M及び第1アクチュエータ5Aを有する。第1ミラー5Mは、レーザ発振装置9から照射されたレーザ光LLを第2機構6に向けて反射する。第1アクチュエータ5Aは、第1ミラー5Mの傾きを変更することにより、第2機構6へ向かうレーザ光LLの照射方向を変更する。第2機構6は、第2ミラー6M及び第2アクチュエータ6Aを有する。第2ミラー6Mは、第1機構5の第1ミラー5Mで反射されたレーザ光LLを、テーブル2に向けて反射する。第2アクチュエータ6Aは、第2ミラー6Mの傾きを変更することにより、テーブル2へ向かうレーザ光LLの照射方向を変更する。 Next, the mechanism 4G will be described. The mechanism 4G includes a first mechanism 5 and a second mechanism 6. The first mechanism 5 includes a first mirror 5M and a first actuator 5A. The first mirror 5M reflects the laser beam LL emitted from the laser oscillation device 9 toward the second mechanism 6. The first actuator 5A changes the irradiation direction of the laser light LL toward the second mechanism 6 by changing the inclination of the first mirror 5M. The second mechanism 6 includes a second mirror 6M and a second actuator 6A. The second mirror 6M reflects the laser beam LL reflected by the first mirror 5M of the first mechanism 5 toward the table 2. The second actuator 6A changes the irradiation direction of the laser light LL toward the table 2 by changing the inclination of the second mirror 6M.

 第1機構5の第1ミラー5Mは、レーザ光LLの照射方向を第1方向に沿って変更する。第2機構6の第2ミラー6Mは、レーザ光LLの照射方向を第2方向に沿って変更する。第1方向と第2方向とは互いに交差、実施の形態1では互いに直交する。第1ミラー5M及び第2ミラー6Mの少なくとも一方が動作することにより、機構4Gは、ワークWの表面に照射されたレーザ光LLのスポットSPを移動させることができる。このとき、機構4Gは、スポットSPを直線又は曲線に沿って移動させることもでき、また、スポットSPに円を描かせたり、渦巻に沿ってスポットSPを移動させたりすることもできる。 The first mirror 5M of the first mechanism 5 changes the irradiation direction of the laser light LL along the first direction. The second mirror 6M of the second mechanism 6 changes the irradiation direction of the laser light LL along the second direction. The first direction and the second direction intersect each other, and in the first embodiment, are orthogonal to each other. By operating at least one of the first mirror 5M and the second mirror 6M, the mechanism 4G can move the spot SP of the laser beam LL irradiated on the surface of the workpiece W. At this time, the mechanism 4G can move the spot SP along a straight line or a curve, and can also draw a circle on the spot SP or move the spot SP along a spiral.

 実施の形態1において、レーザ光LLはUV(Ultra Violet)レーザ又は炭酸ガスレーザであるが、種類は限定されない。レーザ加工装置1の加工対象であるワークWの種類及び加工方法に応じて、レーザ光LLの種類が選択される。実施の形態1において、第1アクチュエータ5A及び第2アクチュエータ6Aは電動機であるが、第1ミラー5M及び第2ミラー6Mの傾きを変更できればよく、電動機に限定されない。 In the first embodiment, the laser beam LL is a UV (Ultra Violet) laser or a carbon dioxide laser, but the type is not limited. The type of the laser beam LL is selected in accordance with the type and processing method of the workpiece W to be processed by the laser processing apparatus 1. In the first embodiment, the first actuator 5A and the second actuator 6A are electric motors. However, the first actuator 5A and the second mirror 6M need only be changed, and are not limited to electric motors.

 実施の形態1において、レーザ加工装置1は、制御装置31によって制御される。制御装置31は、図1に示されるように、処理部32と、記憶部33と、入出力部34とを含む。処理部32は、CPU(Central Processing Unit)のようなプロセッサである。記憶部33は、RAM(Random Access Memory)、ROM(Read Only Memory)、ハードディスクドライブ、ストレージデバイス又はこれらを組み合わせた記憶装置である。入出力部34は、制御装置31と、制御装置31に接続される外部機器とのインターフェースの役割を果たすインターフェース回路である。 In the first embodiment, the laser processing apparatus 1 is controlled by the control device 31. As shown in FIG. 1, the control device 31 includes a processing unit 32, a storage unit 33, and an input / output unit 34. The processing unit 32 is a processor such as a CPU (Central Processing Unit). The storage unit 33 is a RAM (Random Access Memory), a ROM (Read Only Memory), a hard disk drive, a storage device, or a storage device that combines these. The input / output unit 34 is an interface circuit that serves as an interface between the control device 31 and an external device connected to the control device 31.

 図1に示される第1アクチュエータ5A、第2アクチュエータ6A、レーザ発振装置9、エンコーダ17,27、第1ドライバ30X、第2ドライバ30Y、及び入力装置35は、入出力部34に接続される。処理部32は、入出力部34を介してエンコーダ17,27の検出値、及び入力装置35から入力された情報を取得する。また、処理部32は、入出力部34を介して、第1アクチュエータ5A、第2アクチュエータ6A、レーザ発振装置9、第1ドライバ30X、及び第2ドライバ30Yに制御のための信号を送信する。 The first actuator 5A, the second actuator 6A, the laser oscillation device 9, the encoders 17 and 27, the first driver 30X, the second driver 30Y, and the input device 35 shown in FIG. 1 are connected to the input / output unit 34. The processing unit 32 acquires the detection values of the encoders 17 and 27 and the information input from the input device 35 via the input / output unit 34. Further, the processing unit 32 transmits control signals to the first actuator 5A, the second actuator 6A, the laser oscillation device 9, the first driver 30X, and the second driver 30Y via the input / output unit 34.

 記憶部33は、レーザ加工装置1を制御するための処理を制御装置31が実行するためのコンピュータプログラムを記憶している。処理部32は、前述したコンピュータプログラムを記憶部33から読み出して、レーザ加工装置1を制御する。具体的には、処理部32は、機構4Gの第1アクチュエータ5A及び第2アクチュエータ6Aを制御することにより、ワークWの表面に照射されるレーザ光LLのスポットSPを移動させる。また、処理部32は、レーザ発振装置9を制御して、レーザ光LLの照射と照射の停止とを切り替えたり、レーザ光LLのエネルギを変更したりする。 The storage unit 33 stores a computer program for the control device 31 to execute processing for controlling the laser processing device 1. The processing unit 32 reads the computer program described above from the storage unit 33 and controls the laser processing apparatus 1. Specifically, the processing unit 32 moves the spot SP of the laser light LL irradiated on the surface of the workpiece W by controlling the first actuator 5A and the second actuator 6A of the mechanism 4G. Further, the processing unit 32 controls the laser oscillation device 9 to switch between irradiation of the laser beam LL and stop of irradiation, or change the energy of the laser beam LL.

 制御装置31は、第1ドライバ30Xを介してアクチュエータ16を制御し、第2ドライバ30Yを介してアクチュエータ26を制御する。制御装置31は、エンコーダ17の検出値及びエンコーダ27の検出値を用いてアクチュエータ16及びアクチュエータ26を制御する。エンコーダ17の検出値は、アクチュエータ16のシャフト及びねじ15の回転角度であり、エンコーダ27の検出値は、エンコーダ27の検出値、すなわちアクチュエータ26のシャフト及びねじ25の回転角度である。 The control device 31 controls the actuator 16 via the first driver 30X and controls the actuator 26 via the second driver 30Y. The control device 31 controls the actuator 16 and the actuator 26 using the detection value of the encoder 17 and the detection value of the encoder 27. The detection value of the encoder 17 is the rotation angle of the shaft of the actuator 16 and the screw 15, and the detection value of the encoder 27 is the detection value of the encoder 27, that is, the rotation angle of the shaft of the actuator 26 and the screw 25.

 入力装置35は、レーザ加工装置1を動作させるための命令及びデータを入力する装置である。入力装置35は、入力部35I及び表示部35Mを有する。実施の形態1において、入力部35Iは、キーボード、ボタン又はタッチパネルであるがこれらに限定されない。表示部35Mは、液晶ディスプレイであるがこれに限定されない。表示部35Mは、制御装置31の記憶部33に記憶されている情報及びレーザ加工装置1に発生したエラーの情報を表示することができる。表示部35Mが表示する情報は、これらに限定されない。 The input device 35 is a device for inputting a command and data for operating the laser processing apparatus 1. The input device 35 includes an input unit 35I and a display unit 35M. In the first embodiment, the input unit 35I is a keyboard, a button, or a touch panel, but is not limited thereto. The display unit 35M is a liquid crystal display, but is not limited to this. The display unit 35 </ b> M can display information stored in the storage unit 33 of the control device 31 and information on errors that have occurred in the laser processing apparatus 1. The information displayed on the display unit 35M is not limited to these.

 図2は、実施の形態1に係るレーザ加工装置が加工するワークの一例を示す断面図である。実施の形態1において、レーザ加工装置1の加工対象であるワークWは、電子部品が取り付けられる基板、より具体的にはプリント基板である。レーザ加工装置1は、実施の形態1に係るレーザ加工方法を実行することにより、ワークWに穴Hを開ける穴加工を施す。ワークWは、第1層WAと、第2層WBと、第3層WCとを有する多層基板である。ワークWは、金属の第1層WA及び金属の第3層WCが、樹脂の第2層WBを挟み込んだ構造である。実施の形態1において、第1層WA及び第3層WCの金属は銅又は銅合金であり、第2層WBの樹脂はポリイミドであるが、これらの材料に限定されない。第1層WA及び第3層WCの金属はアルミニウム又はアルミニウム合金であり、第2層WBの樹脂はフェノール樹脂であってもよい。 FIG. 2 is a cross-sectional view showing an example of a workpiece machined by the laser machining apparatus according to the first embodiment. In the first embodiment, the workpiece W that is a processing target of the laser processing apparatus 1 is a substrate to which an electronic component is attached, more specifically, a printed substrate. The laser processing apparatus 1 performs the hole processing for forming the hole H in the workpiece W by executing the laser processing method according to the first embodiment. The workpiece W is a multilayer substrate having a first layer WA, a second layer WB, and a third layer WC. The workpiece W has a structure in which a metal first layer WA and a metal third layer WC sandwich a resin second layer WB. In Embodiment 1, the metal of the first layer WA and the third layer WC is copper or a copper alloy, and the resin of the second layer WB is polyimide, but is not limited to these materials. The metal of the first layer WA and the third layer WC may be aluminum or an aluminum alloy, and the resin of the second layer WB may be a phenol resin.

 穴加工は、2種類に大別される。第1の方法は、加工する穴Hの直径程度にレーザ光LLを集光して加工する方法である。第2の方法は、加工する穴Hの直径よりも小さい直径にレーザ光LLを集光し、機構4Gが有する第1ミラー5M及び第2ミラー6Mによってレーザ光LLの照射位置を変更しながらレーザ光LLを旋回させ、かつ旋回の中心から遠ざかるように加工する方法である。第2の方法による加工を、以下において、適宜軌跡加工と称する。加工する穴Hの直径が小さい場合は第1の方法が用いられ、加工する穴Hの直径が大きい場合は第2の方法が用いられる。加工に必要なレーザ光LLのエネルギ密度の関係から、レーザ光LLを集光して加工する必要があるため、加工する穴Hの直径が大きい場合は第2の方法が用いられる。 穴 Drilling is roughly divided into two types. The first method is a method of condensing and processing the laser beam LL to approximately the diameter of the hole H to be processed. In the second method, the laser beam LL is condensed to a diameter smaller than the diameter of the hole H to be processed, and the laser beam LL is irradiated while changing the irradiation position of the laser beam LL by the first mirror 5M and the second mirror 6M of the mechanism 4G. In this method, the light LL is turned and processed to move away from the center of turning. Hereinafter, the processing by the second method is appropriately referred to as locus processing. The first method is used when the diameter of the hole H to be processed is small, and the second method is used when the diameter of the hole H to be processed is large. Since the laser beam LL needs to be collected and processed from the relationship of the energy density of the laser beam LL necessary for processing, the second method is used when the diameter of the hole H to be processed is large.

 炭酸ガスレーザは、高い出力が得やすく、メンテナンスも容易であるが、炭酸ガスレーザの波長では加工が難しいワークも存在する。ワークWの第1層WA及び第3層WCの金属として銅が用いられる場合、炭酸ガスレーザは銅に対する吸収率が低いため、炭酸ガスレーザによる加工は難しい。このため、銅で形成された第1層WA及び第3層WCを穴加工する場合、UVレーザが用いられる場合がある。なお、銅の表面を炭酸ガスレーザの吸収率が高い物質で被覆することにより、銅で形成された第1層WA及び第3層WCを炭酸ガスレーザで穴加工することができる。 Carbon dioxide lasers are easy to obtain high output and easy to maintain, but there are some workpieces that are difficult to machine at the wavelength of carbon dioxide lasers. When copper is used as the metal of the first layer WA and the third layer WC of the workpiece W, the carbon dioxide laser has a low absorption rate for copper, so that it is difficult to process with the carbon dioxide laser. For this reason, when drilling the first layer WA and the third layer WC made of copper, a UV laser may be used. In addition, by covering the copper surface with a substance having a high absorption rate of carbon dioxide laser, the first layer WA and the third layer WC made of copper can be drilled with a carbon dioxide laser.

 UVレーザは高い出力を得ることが難しいため、レーザ加工装置1は、レーザ光LLを集光させてエネルギ密度を高くし、かつ機構4Gが有する第1ミラー5M及び第2ミラー6Mを動作させてレーザ光LLの照射位置を変更しながら軌跡加工により穴加工することがある。具体的には、図1に示される光学系7が備えるfθレンズでワークWに対してレーザ光LLを絞り、穴加工する。レーザ光LLの集光点、すなわちレーザ光LLのスポットSPでの直径が25μmであるとする。この場合、レーザ加工装置1の機構4Gは、スポットSPによる直径25μmの加工範囲がレーザ光LLのパルス毎に少しずつ重なるように軌跡加工することで、直径25μmよりも大きい穴HをワークWに加工することができる。 Since it is difficult to obtain a high output of the UV laser, the laser processing apparatus 1 condenses the laser light LL to increase the energy density, and operates the first mirror 5M and the second mirror 6M of the mechanism 4G. A hole may be formed by locus processing while changing the irradiation position of the laser beam LL. Specifically, the laser beam LL is squeezed with respect to the workpiece W by the fθ lens provided in the optical system 7 shown in FIG. Assume that the condensing point of the laser beam LL, that is, the diameter at the spot SP of the laser beam LL is 25 μm. In this case, the mechanism 4G of the laser processing apparatus 1 performs the locus processing so that the processing range of the diameter 25 μm by the spot SP overlaps little by little for each pulse of the laser beam LL, thereby making the hole H larger than the diameter 25 μm in the workpiece W. Can be processed.

 基板の穴加工には、止まり穴加工と貫通穴加工の2種類がる。UVレーザを用いてワークWを加工する場合、第1層WA及び第2層WBまでを穴加工し、第3層WCの表面で止まる、止まり穴加工をすることが多い。このような止まり穴加工をする場合、レーザ加工装置1は、最初にレーザ光LLの焦点をワークWの第1層WAの表面に合わせ、第1層WAを軌跡加工する。次に、レーザ加工装置1は、第2層WBに対して、レーザ光LLの出力を低下させて、レーザ光LLのエネルギ密度を小さくする。このときのエネルギ密度は、樹脂である第2層WBは加工できるが、銅である第3層WCは加工できない大きさとされる。レーザ光LLのエネルギ密度を低下させる他の方法として、レーザ光LLの出力は低下させず、ワークWに対するレーザ光LLの焦点位置をずらすことにより、第2層WBの表面でのレーザ光LLの直径を大きくして、エネルギ密度を低下させる。このような方法でレーザ光LLのエネルギ密度を低下させて、第2層WBのみが加工されるようにしてもよい。 There are two types of hole drilling in the substrate: blind hole drilling and through hole drilling. When processing a workpiece W using a UV laser, a hole is often processed up to the first layer WA and the second layer WB, and a blind hole is formed that stops at the surface of the third layer WC. When performing such blind hole processing, the laser processing apparatus 1 first focuses the laser beam LL on the surface of the first layer WA of the workpiece W, and processes the first layer WA by trajectory processing. Next, the laser processing apparatus 1 reduces the output of the laser beam LL to reduce the energy density of the laser beam LL with respect to the second layer WB. The energy density at this time is such that the second layer WB, which is resin, can be processed, but the third layer WC, which is copper, cannot be processed. As another method for reducing the energy density of the laser beam LL, the output of the laser beam LL is not decreased, and the focal position of the laser beam LL with respect to the workpiece W is shifted, thereby shifting the laser beam LL on the surface of the second layer WB. Increase the diameter to reduce the energy density. Only the second layer WB may be processed by reducing the energy density of the laser beam LL by such a method.

 前述した止まり穴加工は、1個の穴Hを加工する毎に第1層WA及び第2層WBを加工するのではなく、第1層WAに対するすべての穴加工が行われた後、加工条件が変更されて、すべての穴Hに対して第2層WBが穴加工される。このようにすることで、加工条件の切替え回数が少なくなるので、生産性の低下が抑制される。 The above-described blind hole processing does not process the first layer WA and the second layer WB every time one hole H is processed, but after all the holes have been processed for the first layer WA, Is changed, and the second layer WB is drilled for all the holes H. By doing in this way, since the frequency | count of switching of processing conditions decreases, the fall of productivity is suppressed.

 軌跡加工として、第1層WAの穴Hの外周だけを加工して中央部を残し、第2層WBを加工するときに一緒に中央部を取り除くものがある。この軌跡加工の場合、外周のみの加工であるため生産性は高いが、第2層WBを加工する際に中央部を飛ばして除去するため、中央部が確実に除去できるかが不明になる可能性がある。また、第2層WBが加工される際に飛ばされた中央部が十分集塵できないと、レーザ加工装置1を清掃する頻度が増加し、生産性の低下を招く可能性がある。 As the locus processing, there is one in which only the outer periphery of the hole H of the first layer WA is processed to leave the central portion and the central portion is removed together when the second layer WB is processed. In the case of this trajectory machining, the productivity is high because the machining is performed only on the outer periphery, but when the second layer WB is machined, the central part is skipped and removed, so it may be unclear whether the central part can be removed reliably. There is sex. Moreover, if the center part skipped when the 2nd layer WB was processed cannot fully collect dust, the frequency which cleans the laser processing apparatus 1 will increase, and the fall of productivity may be caused.

 このため、渦巻に沿った軌跡で中央部から加工する軌跡加工がある。渦巻に沿った軌跡加工が実行される場合、レーザ加工装置1は、まず穴Hの中心Cにレーザ光LLを位置決めし、ここを起点にレーザ光LLを旋回させながら、中心Cから遠ざかるようにレーザ光LLを移動させる。軌跡加工において、機構4Gは、最初に穴Hの中心Cにレーザ光LLの位置決めをした後、そこから渦巻に沿ってレーザ光LLのスポットSPを移動させる。レーザ光LLが移動を開始した直後はスポットSPが移動する速度が低いため、スポットSP同士の重なる割合が大きくなる。その結果、第2層WBと接する第3層WCに第2層WBが溶融した痕跡が残ることがある。このように、渦巻に沿ってレーザ光LLを移動させる軌跡加工の場合、穴Hの中央部における第3層WCが過剰に加工される可能性がある。特に、生産性を向上させるためにレーザ発振装置9の繰り返し周波数が高くなると、短時間に多くのレーザ光LLがワークWに照射されるため、中央部では蓄熱の影響によって過剰に加工される可能性が高くなる。 For this reason, there is a trajectory machining that processes from the center along a trajectory along the spiral. When the trajectory machining along the spiral is performed, the laser machining apparatus 1 first positions the laser beam LL at the center C of the hole H, and moves away from the center C while rotating the laser beam LL from this point. The laser beam LL is moved. In the locus processing, the mechanism 4G first positions the laser beam LL at the center C of the hole H, and then moves the spot SP of the laser beam LL along the spiral. Immediately after the laser beam LL starts to move, the speed at which the spots SP move is low, so that the overlapping ratio of the spots SP increases. As a result, a trace of the second layer WB melting may remain in the third layer WC in contact with the second layer WB. As described above, in the case of locus processing in which the laser beam LL is moved along the spiral, the third layer WC in the center portion of the hole H may be excessively processed. In particular, when the repetition frequency of the laser oscillation device 9 is increased in order to improve productivity, a large amount of laser light LL is irradiated onto the workpiece W in a short time, so that the center portion may be excessively processed due to the effect of heat storage. Increases nature.

 穴加工において、第3層WCの中央部が過剰に加工されることを回避するため、渦巻の軌跡の開始を中心Cからずれた部分とする手法がある。また、中心Cから外周に向かってレーザ光LLを移動させる穴加工において、レーザ光LLが渦巻に沿って移動する際の1周毎の径方向における移動量を大きくして、中央部でのレーザ光LLの照射数を低減したりする手法がある。しかし、これらの手法は、条件によっては穴Hの中央部に第1層WAが残る可能性があり、ワークWの仕様に合わせた条件を選定することが困難である。 In the hole machining, there is a method in which the start of the spiral trajectory is shifted from the center C in order to avoid excessive machining of the central portion of the third layer WC. Further, in the hole processing for moving the laser beam LL from the center C toward the outer periphery, the amount of movement in the radial direction for each turn when the laser beam LL moves along the spiral is increased so that the laser at the center portion. There is a method of reducing the number of irradiation with the light LL. However, according to these methods, the first layer WA may remain in the center of the hole H depending on the conditions, and it is difficult to select conditions that match the specifications of the workpiece W.

 軌跡加工は、1パルス毎に機構4Gによる位置決めの完了を確認して加工するのではない。レーザ加工装置1は、軌跡加工を実行するにあたり、加工の開始点から加工の終了点まで連続してレーザ光LLのパルスをレーザ発振装置9に発生させた状態で、機構4Gを動作させながら軌跡加工する。このため、軌跡加工は、1つの渦巻の軌跡の中で加工ピッチを変更することが困難である。 The locus machining is not performed after confirming the completion of positioning by the mechanism 4G for each pulse. In executing the locus machining, the laser processing apparatus 1 operates the mechanism 4G while operating the mechanism 4G in a state where the laser oscillation device 9 generates pulses of the laser beam LL continuously from the machining start point to the machining end point. Process. For this reason, in the locus machining, it is difficult to change the machining pitch in one spiral locus.

 実施の形態1において、レーザ加工装置1の機構4Gは、ワークWの表面に照射されるレーザ光LLのスポットSPを旋回させ、かつ旋回が進むにしたがってレーザ光LLの照射を開始した位置から遠ざけて移動させてワークWを加工する。レーザ発振装置9は、ワークWの加工の開始から終了までの間に、レーザ光LLのエネルギをワークWの加工が開始されたときよりも大きくする。このような軌跡加工により、レーザ加工装置1は、ワークWの第3層WCに穴加工、より具多的には止まり穴加工をする際に、穴Hの中央部において第3層WCが過剰に加工されることを抑制して、穴加工の加工品質の低下を抑制する。また、レーザ加工装置1は、中央部から第1層WAを加工するので、第1層WAの中央部を確実に除去することができる。 In the first embodiment, the mechanism 4G of the laser processing apparatus 1 turns the spot SP of the laser beam LL irradiated on the surface of the workpiece W and moves away from the position where the irradiation of the laser beam LL is started as the turning progresses. To move the workpiece W. The laser oscillation device 9 increases the energy of the laser light LL between the start and end of processing of the workpiece W, compared to when the processing of the workpiece W is started. By such locus processing, the laser processing apparatus 1 causes the third layer WC to be excessive in the center portion of the hole H when drilling, more specifically, blind hole processing, in the third layer WC of the workpiece W. To prevent the machining quality from being lowered. Further, since the laser processing apparatus 1 processes the first layer WA from the central portion, the central portion of the first layer WA can be reliably removed.

 図3は、実施の形態1に係るレーザ加工装置による穴加工を説明するための平面図である。図4は、実施の形態1に係るレーザ加工装置が軌跡加工を実行する際の条件を説明するための図である。図5から図7は、実施の形態1に係るレーザ加工装置による穴加工を説明するための断面図である。 FIG. 3 is a plan view for explaining hole processing by the laser processing apparatus according to the first embodiment. FIG. 4 is a diagram for explaining conditions when the laser machining apparatus according to Embodiment 1 executes locus machining. 5 to 7 are cross-sectional views for explaining hole processing by the laser processing apparatus according to the first embodiment.

 レーザ加工装置1の機構4Gは、軌跡加工によってワークWの第1層WAに穴加工を実行するにあたり、加工開始時におけるレーザ光LLのスポットSPの位置を、これから形成しようとする穴Hの中心Cに位置決めする。位置決めが完了したら、レーザ加工装置1は、軌跡加工による穴加工を開始する。具体的には、レーザ発振装置9がレーザ光LLの照射を開始するとともに、機構4Gは第1ミラー5M及び第2ミラー6Mを動作させて、ワークWの表面におけるレーザ光LLのスポットSPを渦巻に沿って移動させる。このような処理により、レーザ光LLのスポットSPを渦巻に沿って旋回する。 When the mechanism 4G of the laser processing apparatus 1 performs the hole processing on the first layer WA of the workpiece W by the locus processing, the position of the spot SP of the laser beam LL at the start of processing is set to the center of the hole H to be formed. Position to C. If positioning is completed, the laser processing apparatus 1 will start the hole processing by locus processing. Specifically, the laser oscillation device 9 starts irradiating the laser beam LL, and the mechanism 4G operates the first mirror 5M and the second mirror 6M to spiral the spot SP of the laser beam LL on the surface of the workpiece W. Move along. By such processing, the spot SP of the laser beam LL is swung along the spiral.

 図4に示されるように、旋回加工による穴加工時において、レーザ光LLのスポットSPの軌跡LSは、これから形成しようとする穴Hの中心Cから、図3に示される穴Hの外周HEまで、渦巻状又は螺旋状となる。渦巻状の軌跡LSは、1回転毎に径方向DDの外側への移動量Δdをパラメータとして設定される。径方向DDへの移動量Δdが相対的に小さい場合、レーザ光LLのスポットSPは、穴Hの中心Cから外周HEに至るまでに複数回周回して、外周HEに至る。径方向DDの移動量Δdが相対的に大きい場合、レーザ光LLのスポットSPは、径方向DDへの移動量Δdが相対的に小さい場合と比較して、より少ない周回数で穴Hの中心Cから外周HEに至る。 As shown in FIG. 4, at the time of drilling by turning, the locus LS of the spot SP of the laser beam LL is from the center C of the hole H to be formed to the outer periphery HE of the hole H shown in FIG. , Spiral or spiral. The spiral locus LS is set with the movement amount Δd to the outside in the radial direction DD as a parameter for each rotation. When the movement amount Δd in the radial direction DD is relatively small, the spot SP of the laser beam LL circulates a plurality of times from the center C of the hole H to the outer periphery HE and reaches the outer periphery HE. When the movement amount Δd in the radial direction DD is relatively large, the spot SP of the laser beam LL is smaller in the center of the hole H than the case where the movement amount Δd in the radial direction DD is relatively small. From C to the outer periphery HE.

 軌跡加工による穴加工が開始すると、レーザ光LLのスポットSPは、中心Cを中心に旋回しながら、移動量Δdずつ径方向DDの外側へ移動する。その過程で、図5及び図6に示されるようにワークWの第1層WAが溶融して除去されて、加工部分Uが形成される。加工部分Uからは、第2層WBが露出している。レーザ光LLのスポットSPは、旋回しながら径方向DDの外側に移動し、軌跡LSの位置PEで穴Hの外周HEに到達する。レーザ光LLのスポットSPは、穴Hの外周HEの位置で旋回を複数回繰り返す。その後、レーザ発振装置9は、レーザ光の照射を停止して、軌跡加工による穴加工が終了する。穴加工が終了すると、図7に示されるように、ワークWの第1層WAには穴Hが形成される。 When the hole processing by the locus processing is started, the spot SP of the laser beam LL moves outside the radial direction DD by a movement amount Δd while turning around the center C. In the process, as shown in FIGS. 5 and 6, the first layer WA of the workpiece W is melted and removed, and a processed portion U is formed. From the processed portion U, the second layer WB is exposed. The spot SP of the laser beam LL moves to the outside of the radial direction DD while turning, and reaches the outer periphery HE of the hole H at the position PE of the locus LS. The spot SP of the laser beam LL repeats turning a plurality of times at the position of the outer periphery HE of the hole H. Thereafter, the laser oscillation device 9 stops the laser beam irradiation, and the hole processing by the trajectory processing is completed. When the hole machining is completed, a hole H is formed in the first layer WA of the workpiece W as shown in FIG.

 前述したように、レーザ光LLのスポットSPが移動を開始した直後は、スポットSPの移動速度が低いため、スポットSP同士の重なる割合が大きくなる。この場合、レーザ加工装置1は、レーザ光LLのエネルギを小さくして穴加工をする。すなわち、レーザ加工装置1のレーザ発振装置9は、レーザ光LLのスポットSPが移動する速度が小さい場合よりも大きい場合の方が、レーザ光LLのエネルギを大きくする。 As described above, immediately after the spot SP of the laser beam LL starts moving, the moving speed of the spot SP is low, so that the overlapping ratio of the spots SP increases. In this case, the laser processing apparatus 1 performs hole processing by reducing the energy of the laser beam LL. That is, the laser oscillation device 9 of the laser processing apparatus 1 increases the energy of the laser light LL when the speed of movement of the spot SP of the laser light LL is larger than when the speed of movement is low.

 このような加工により、レーザ加工装置1は、第3層WCが過剰に加工されることによる加工品質の低下を抑制できる。軌跡加工による穴加工が進行するにしたがって、すなわち、レーザ光LLのスポットSPの周回数が増加するにしたがってスポットSPの移動速度が大きくなり、スポットSP同士の重なる割合が小さくなる。この場合、レーザ加工装置1は、レーザ光LLのエネルギを穴加工の開始時よりも大きくして穴加工を継続する。このような加工により、レーザ加工装置1は、レーザ光LLのスポットSPの移動速度が大きくなった場合でも、第1層WAを確実に除去できる。 By such processing, the laser processing apparatus 1 can suppress deterioration in processing quality due to excessive processing of the third layer WC. As the hole machining by the locus machining progresses, that is, as the number of rounds of the spot SP of the laser beam LL increases, the moving speed of the spot SP increases and the overlapping ratio of the spots SP decreases. In this case, the laser processing apparatus 1 continues the hole processing by increasing the energy of the laser beam LL from that at the start of the hole processing. By such processing, the laser processing apparatus 1 can reliably remove the first layer WA even when the moving speed of the spot SP of the laser beam LL increases.

 図8は、実施の形態1に係るレーザ加工装置が穴加工する場合のレーザ光のエネルギとレーザ光のスポットの移動速度との関係を示す図である。図8のPSは、ワークWに照射されるレーザ光LLのパルス数である。PSsは、レーザ加工装置1が穴加工を開始するタイミングにおけるパルス数を示す。PScは、レーザ光LLのエネルギEを穴加工の開始時よりも大きくするタイミングのパルス数を示す。PSeは、レーザ加工装置1による穴加工が終了するタイミングを示す。 FIG. 8 is a diagram showing the relationship between the laser beam energy and the moving speed of the laser beam spot when the laser processing apparatus according to the first embodiment performs hole processing. PS in FIG. 8 is the number of pulses of the laser light LL irradiated onto the workpiece W. PSs indicates the number of pulses at the timing when the laser processing apparatus 1 starts drilling. PSc indicates the number of pulses at which the energy E of the laser beam LL is made larger than that at the start of drilling. PSe indicates the timing when the hole processing by the laser processing apparatus 1 is completed.

 図8に示されるように、レーザ加工装置1が穴加工を開始した直後からある程度のパルス数PSとなるまで又はある程度の時間tが経過するまで、レーザ光LLのスポットSPの移動速度Vcは増加する。移動速度Vcは周速度である。実施の形態1において、レーザ加工装置1は、パルス数PScまでは第1のエネルギE1のレーザ光LLをワークWに照射し、パルス数PSc以降は第2のエネルギE2のレーザ光LLをワークWに照射する。パルス数PScのタイミングにおいて、加工部分Uの直径は、図3及び図6に示されるようにDcである。パルス数PSc以降において、レーザ加工装置1は、第2のエネルギE2のレーザ光LLをワークWに照射しながらスポットSPを渦巻に沿って旋回させ、直径が穴Hの外周HE、すなわち直径Dの位置に到達したら、その位置で複数回スポットSPを周回させる。穴Hの外周HEで、レーザ光LLのエネルギEは最大とすることが好ましい。このようにすることで、レーザ加工装置1は、外周HEの第1層WAを確実に除去できる。 As shown in FIG. 8, the moving speed Vc of the spot SP of the laser beam LL increases immediately after the laser processing apparatus 1 starts drilling until a certain number of pulses PS is reached or until a certain time t elapses. To do. The moving speed Vc is a peripheral speed. In the first embodiment, the laser processing apparatus 1 irradiates the workpiece W with the laser beam LL having the first energy E1 until the pulse number PSc, and the workpiece W receives the laser beam LL having the second energy E2 after the pulse number PSc. Irradiate. At the timing of the pulse number PSc, the diameter of the processed portion U is Dc as shown in FIGS. After the number of pulses PSc, the laser processing apparatus 1 rotates the spot SP along the spiral while irradiating the workpiece W with the laser beam LL of the second energy E2, and the outer diameter HE of the hole H, that is, the diameter D When the position is reached, the spot SP is circulated a plurality of times at the position. The energy E of the laser beam LL is preferably maximized at the outer periphery HE of the hole H. By doing in this way, the laser processing apparatus 1 can remove the 1st layer WA of outer periphery HE reliably.

 図9は、実施の形態1に係るレーザ加工装置1が穴加工する場合におけるレーザ光のスポットの重なりを示す図である。レーザ加工装置1が、加工を開始したときよりもレーザ光LLのエネルギEを大きくするタイミングは、隣接するレーザ光LLのスポットSPの重なりkeが予め定められた値以上になるタイミングとすることができる。重なりkeの大きさは、レーザ光LLをスポットSPの移動速度Vcと、スポットSPの直径dsとから求めることができる。レーザ光LLのエネルギEが変更されるパルス数PScは、ワークWの加工条件を決定する際に決定され、図1に示される制御装置31の記憶部33に記憶される。 FIG. 9 is a diagram showing laser beam spot overlap when the laser processing apparatus 1 according to the first embodiment performs hole processing. The timing at which the laser processing apparatus 1 increases the energy E of the laser beam LL than when the processing is started may be a timing at which the overlap ke of the spots SP of the adjacent laser beams LL becomes equal to or greater than a predetermined value. it can. The size of the overlap ke can be obtained from the moving speed Vc of the spot SP of the laser beam LL and the diameter ds of the spot SP. The pulse number PSc at which the energy E of the laser beam LL is changed is determined when determining the machining condition of the workpiece W, and is stored in the storage unit 33 of the control device 31 shown in FIG.

 レーザ加工装置1が、直径100μmの穴Hを軌跡加工による穴加工でワークWに形成する場合、レーザ光LLは光学系7が備えるfθレンズにより直径25μmに集光されるものとする。機構4Gが穴Hの外周HEを加工する場合、重なりkeが5μmとなるように、第1ミラー5M及び第2ミラー6Mの動作量及び動作速度が決定される。渦巻状の軌跡LSは、レーザ光LLのスポットSPが1回転する毎に径方向DDへ15μm移動する。すなわち、移動量Δdは15μmである。このように設定された軌跡LSに対して、第1ミラー5M及び第2ミラー6Mの動作量及び動作速度が算出され、制御装置31の記憶部33に記憶される。レーザ光LLのエネルギEを大きくするパルス数PScは、レーザ光LLのスポットSPの重なりkeが、加工開始時の重なりkeよりも小さく、外周HEでの重なりkeよりも大きいときのパルス数PSに設定される。設定されたパルス数PScは、制御装置31の記憶部33に記憶される。レーザ光LLのエネルギEは、外周HEが加工されるときのエネルギE2が最大となるように設定され、加工の開始からパルス数PScまでのエネルギE1は、エネルギE2の1/2とする。エネルギE1,E2は、制御装置31の記憶部33に記憶される。制御装置31は、記憶部33に記憶された第1ミラー5M及び第2ミラー6Mの動作量、動作速度、パルス数PSc、エネルギE1,E2を用いて、ワークWを軌跡加工により穴加工する。 When the laser processing apparatus 1 forms a hole H having a diameter of 100 μm on the workpiece W by hole processing by trajectory processing, the laser light LL is focused to a diameter of 25 μm by the fθ lens provided in the optical system 7. When the mechanism 4G processes the outer periphery HE of the hole H, the operation amount and the operation speed of the first mirror 5M and the second mirror 6M are determined so that the overlap ke is 5 μm. The spiral trajectory LS moves 15 μm in the radial direction DD every time the spot SP of the laser beam LL makes one revolution. That is, the movement amount Δd is 15 μm. With respect to the locus LS set in this way, the operation amount and the operation speed of the first mirror 5M and the second mirror 6M are calculated and stored in the storage unit 33 of the control device 31. The pulse number PSc for increasing the energy E of the laser beam LL is equal to the pulse number PS when the overlap ke of the spot SP of the laser beam LL is smaller than the overlap ke at the start of processing and larger than the overlap ke at the outer periphery HE. Is set. The set pulse number PSc is stored in the storage unit 33 of the control device 31. The energy E of the laser beam LL is set so that the energy E2 when the outer periphery HE is processed is maximized, and the energy E1 from the start of processing to the number of pulses PSc is ½ of the energy E2. The energy E1, E2 is stored in the storage unit 33 of the control device 31. The control device 31 drills the workpiece W by trajectory machining using the operation amount, operation speed, pulse number PSc, and energy E1, E2 of the first mirror 5M and the second mirror 6M stored in the storage unit 33.

 レーザ発振装置9がQスイッチ方式である場合、レーザ加工装置1の制御装置31は、Qスイッチのゲート幅を変化させることにより、レーザ光LLのエネルギを変更する。軌跡加工による穴加工において、制御装置31は、加工開始からパルス数PScまではエネルギE1となるゲート幅でレーザ発振装置9を制御する。制御装置31は、パルス数PSc以降において、エネルギE2となるゲート幅でレーザ発振装置9を制御する。穴Hの外周HEを加工する際において、制御装置31は、エネルギEが最大となるようにレーザ発振装置9を制御する。制御装置31は、穴Hの外周HEを加工する際に、レーザ光LLのパルス数PSは決めず、第1ミラー5M及び第2ミラー6Mの制御が終了した時点でレーザ光LLの照射を停止する。 When the laser oscillation device 9 is a Q switch system, the control device 31 of the laser processing device 1 changes the energy of the laser light LL by changing the gate width of the Q switch. In the hole machining by the locus machining, the control device 31 controls the laser oscillation device 9 with the gate width that becomes the energy E1 from the machining start to the pulse number PSc. The control device 31 controls the laser oscillation device 9 with the gate width of energy E2 after the pulse number PSc. When processing the outer periphery HE of the hole H, the control device 31 controls the laser oscillation device 9 so that the energy E becomes maximum. When processing the outer periphery HE of the hole H, the control device 31 does not determine the number of pulses PS of the laser beam LL, and stops the irradiation of the laser beam LL when the control of the first mirror 5M and the second mirror 6M is completed. To do.

 図10及び図11は、実施の形態1に係るレーザ加工装置が穴加工する場合のレーザ光のエネルギとの関係の変形例を示す図である。前述した例において、レーザ加工装置1のレーザ発振装置9は、レーザ光LLのエネルギEを、加工開始から終了までエネルギE1,E2の2段階で大きくしたが、エネルギEを段階的に大きくする場合、2段階に限定されない。レーザ発振装置9は、レーザ光LLのエネルギEを、図10に示されるように、E1,E1u,E2の3段階で変化させてもよい。この場合、パルス数PSc1でエネルギE1からエネルギE2に変化し、パルス数PSc2でエネルギE1uからエネルギE2に変化する。エネルギE2は、レーザ発振装置9の出力が最大のときのエネルギである。レーザ光LLのエネルギEが段階的に大きくされることにより、レーザ発振装置9の制御を簡単にすることができる。 10 and 11 are diagrams showing modifications of the relationship with the energy of the laser beam when the laser processing apparatus according to the first embodiment performs hole processing. In the above-described example, the laser oscillation device 9 of the laser processing apparatus 1 increases the energy E of the laser beam LL in two steps of energy E1 and E2 from the start to the end of processing, but increases the energy E stepwise. It is not limited to two stages. The laser oscillation device 9 may change the energy E of the laser beam LL in three stages of E1, E1u, and E2, as shown in FIG. In this case, the energy changes from energy E1 to energy E2 at the number of pulses PSc1, and changes from energy E1u to energy E2 at the number of pulses PSc2. The energy E2 is energy when the output of the laser oscillation device 9 is maximum. Since the energy E of the laser beam LL is increased stepwise, the control of the laser oscillation device 9 can be simplified.

 レーザ加工装置1のレーザ発振装置9は、図11に示されるように、レーザ光LLのエネルギEを連続的に大きくしてもよい。この場合、レーザ加工装置1は、加工の開始からパルス数PSが大きくなるにしたがってエネルギEを大きくし、パルス数PScでエネルギEの最大値Emaxとする。すなわち、穴Hの外周HEで最大値Emaxとなるように、レーザ光LLの各パルスのエネルギEが決定される。パルス数PScは、レーザ光LLのスポットSPが穴Hの外周HEに到達したタイミングのパルス数とすることができるが、これに限定されない。前述したように、レーザ光LLのスポットSPの重なりkeが、加工開始時の重なりkeよりも小さく、外周HEでの重なりkeよりも大きいときのパルス数PSであってもよい。レーザ光LLのエネルギEが連続的に大きくされることにより、レーザ光LLのスポットSPの移動速度Vcに合わせてレーザ光LLのエネルギEを制御しやすくなる。 The laser oscillation device 9 of the laser processing device 1 may continuously increase the energy E of the laser beam LL as shown in FIG. In this case, the laser processing apparatus 1 increases the energy E as the number of pulses PS increases from the start of processing, and sets the maximum value Emax of the energy E at the number of pulses PSc. That is, the energy E of each pulse of the laser beam LL is determined so that the maximum value Emax is obtained at the outer periphery HE of the hole H. The pulse number PSc can be set to the pulse number at the timing when the spot SP of the laser beam LL reaches the outer periphery HE of the hole H, but is not limited thereto. As described above, the number of pulses PS when the overlap ke of the spot SP of the laser beam LL is smaller than the overlap ke at the start of processing and larger than the overlap ke at the outer periphery HE may be used. By continuously increasing the energy E of the laser beam LL, the energy E of the laser beam LL can be easily controlled in accordance with the moving speed Vc of the spot SP of the laser beam LL.

 図12は、実施の形態1に係るレーザ加工装置が軌跡加工においてレーザ光のスポットを移動させる方法の変形例を示す図である。前述した説明では、レーザ加工装置1の機構4Gは、渦巻に沿ってレーザ光LLのスポットSPを移動させた。すなわち、機構4Gは、レーザ光LLのスポットSPが中心Cの周りを1周するとスポットSPが径方向DDに移動量Δdだけ移動するように、連続して径方向DDにおけるスポットSPの位置を変化させた。 FIG. 12 is a diagram showing a modification of the method for moving the laser beam spot in the locus processing by the laser processing apparatus according to the first embodiment. In the above description, the mechanism 4G of the laser processing apparatus 1 moves the spot SP of the laser beam LL along the spiral. That is, the mechanism 4G continuously changes the position of the spot SP in the radial direction DD so that when the spot SP of the laser beam LL makes one round around the center C, the spot SP moves by the movement amount Δd in the radial direction DD. I let you.

 変形例において、レーザ加工装置1の機構4Gは、中心Cの周りを1周する円運動をスポットSPにさせた後、径方向DDに移動量Δdだけ移動させ、中心Cの周りを1周する円運動をさせる。これを穴Hの外周HEまで繰り返す。すなわち、変形例において、機構4Gは、レーザ光LLのスポットSPが中心Cの周りを1周する毎に、スポットSPを径方向DDに移動量Δdだけ段階的に移動させる。このように、軌跡LS1,LS2,LS3,LS4,LS5に沿ってレーザ光LLのスポットSPを移動させても、レーザ加工装置1は、軌跡加工によりワークWを穴加工することができる。 In the modification, the mechanism 4G of the laser processing apparatus 1 causes the circular motion that makes one round around the center C to be the spot SP, and then moves it by the movement amount Δd in the radial direction DD, and makes one round around the center C. Make a circular motion. This is repeated up to the outer periphery HE of the hole H. That is, in the modification, the mechanism 4G moves the spot SP stepwise in the radial direction DD by the movement amount Δd every time the spot SP of the laser beam LL makes one round around the center C. Thus, even if the spot SP of the laser beam LL is moved along the trajectories LS1, LS2, LS3, LS4, and LS5, the laser processing apparatus 1 can drill the workpiece W by the trajectory processing.

 図13は、実施の形態1に係るレーザ加工方法のフローチャートである。実施の形態1に係るレーザ加工方法は、図1に示される制御装置31が実現する。図13に示されるフローチャートは、レーザ光LLのエネルギEが段階的に大きくなる例である。制御装置31は、ワークWにレーザ光LLを照射する位置を、これからワークWに形成する穴Hの中心Cに位置決めする。そして、ステップS101において、制御装置31は、レーザ発振装置9を制御して、テーブル2に載置されたワークWにレーザ光LLの照射を開始するとともに、レーザ光LLのスポットSPを中心Cの周りで旋回させる。すなわち、制御装置31は、レーザ光LLのスポットSPを旋回させ、かつスポットSPの旋回が進むにしたがってレーザ光LLの照射を開始した位置、すなわち中心Cから遠ざけて移動させる。 FIG. 13 is a flowchart of the laser processing method according to the first embodiment. The laser processing method according to the first embodiment is realized by the control device 31 shown in FIG. The flowchart shown in FIG. 13 is an example in which the energy E of the laser beam LL increases stepwise. The control device 31 positions the position where the workpiece W is irradiated with the laser light LL at the center C of the hole H to be formed in the workpiece W. In step S101, the control device 31 controls the laser oscillation device 9 to start irradiating the workpiece W placed on the table 2 with the laser beam LL and the spot SP of the laser beam LL at the center C. Rotate around. That is, the control device 31 turns the spot SP of the laser beam LL and moves it away from the position where the irradiation of the laser beam LL starts, that is, the center C as the turning of the spot SP progresses.

 制御装置31は、レーザ光LLのエネルギEを大きくするタイミングのパルス数PScを記憶部33から読み出し、現時点のパルス数PSと比較する。現時点のパルス数PSがパルス数PScでない場合、制御装置31は、ステップS102において、レーザ光LLのエネルギEを変更するタイミングでないと判定する(ステップS102、No)。この場合、制御装置31は、ステップS103において、レーザ発振装置9に、現時点のエネルギEでレーザ光LLの照射を継続させる。 The control device 31 reads out the pulse number PSc at the timing of increasing the energy E of the laser beam LL from the storage unit 33 and compares it with the current pulse number PS. If the current number of pulses PS is not the number of pulses PSc, the control device 31 determines in step S102 that it is not time to change the energy E of the laser beam LL (step S102, No). In this case, the control device 31 causes the laser oscillation device 9 to continue irradiation with the laser light LL with the current energy E in step S103.

 現時点のパルス数PSがパルス数PScある場合、制御装置31は、ステップS102において、レーザ光LLのエネルギEを変更するタイミングであると判定する(ステップS102、Yes)。この場合、制御装置31は、ステップS104において、レーザ光LLのエネルギEを大きくする。すなわち、制御装置31は、ワークWの加工の開始から終了までの間に、レーザ光LLのエネルギEをワークWの加工が開始されたときよりも大きくする。具体的には、制御装置31は、レーザ発振装置9に、現時点のエネルギEよりも大きいエネルギEでレーザ光LLを照射させる。 If the current number of pulses PS is the number of pulses PSc, the control device 31 determines in step S102 that it is time to change the energy E of the laser beam LL (step S102, Yes). In this case, the control device 31 increases the energy E of the laser beam LL in step S104. That is, the control device 31 increases the energy E of the laser beam LL between the start and end of processing of the workpiece W, compared to when the processing of the workpiece W is started. Specifically, the control device 31 causes the laser oscillation device 9 to irradiate the laser beam LL with an energy E larger than the current energy E.

 ステップS105において、制御装置31は、レーザ光LLのスポットSPが穴Hの外周HEに到達したか否かを判定する。スポットSPが穴Hの外周HEに到達していない場合(ステップS105、No)、ステップS106において、レーザ発振装置9に、ステップS104で大きくしたエネルギEでレーザ光LLの照射を継続させる。スポットSPが穴Hの外周HEに到達した場合(ステップS105、Yes)、ステップS107において、制御装置31は、レーザ光LLのエネルギEを最大値として、レーザ光LLのスポットを複数周回させた後、レーザ発振装置9を制御してレーザ光LLの照射を停止する。このような加工により、ワークWの第1層WAに穴Hが形成される。穴Hが形成されたら、レーザ加工装置1は、穴Hの位置の第2層WBに穴加工を施す。 In step S105, the control device 31 determines whether or not the spot SP of the laser beam LL has reached the outer periphery HE of the hole H. When the spot SP has not reached the outer periphery HE of the hole H (No in step S105), in step S106, the laser oscillation device 9 is continuously irradiated with the laser beam LL with the energy E increased in step S104. When the spot SP has reached the outer periphery HE of the hole H (Yes in step S105), in step S107, the control device 31 sets the energy E of the laser beam LL as the maximum value and makes a plurality of spots of the laser beam LL go around. Then, the laser oscillation device 9 is controlled to stop the irradiation with the laser beam LL. Through such processing, a hole H is formed in the first layer WA of the workpiece W. When the hole H is formed, the laser processing apparatus 1 performs the hole processing on the second layer WB at the position of the hole H.

 以上の実施の形態に示した構成は、本発明の内容の一例を示すものであり、別の公知の技術と組み合わせることも可能であるし、本発明の要旨を逸脱しない範囲で、構成の一部を省略又は変更することも可能である。 The configuration described in the above embodiment shows an example of the contents of the present invention, and can be combined with another known technique, and can be combined with other configurations without departing from the gist of the present invention. It is also possible to omit or change the part.

 1 レーザ加工装置、2 テーブル、4 加工ヘッド、4G 機構、5 第1機構、5A 第1アクチュエータ、5M 第1ミラー、6 第2機構、6A 第2アクチュエータ、6M 第2ミラー、7 光学系、8 集塵ダクト、9 レーザ発振装置、10 第1駆動装置、20 第2駆動装置、31 制御装置、32 処理部、33 記憶部、34 入出力部、35 入力装置、H 穴、HE 外周、LL レーザ光、SP スポット、U 加工部分、W ワーク、WA 第1層、WB 第2層、WC 第3層。 1 laser processing device, 2 table, 4 machining head, 4G mechanism, 5 first mechanism, 5A first actuator, 5M first mirror, 6 second mechanism, 6A second actuator, 6M second mirror, 7 optical system, 8 Dust collection duct, 9 laser oscillation device, 10 first drive device, 20 second drive device, 31 control device, 32 processing unit, 33 storage unit, 34 input / output unit, 35 input device, H hole, HE outer periphery, LL laser Light, SP spot, U processed part, W workpiece, WA first layer, WB second layer, WC third layer.

Claims (5)

 ワークの表面に照射されるレーザ光のスポットを旋回させ、かつ旋回が進むにしたがって前記レーザ光の照射を開始した位置から遠ざけて移動させて前記ワークを加工する機構と、
 前記ワークの加工の開始から終了までの間に、前記レーザ光のエネルギを前記ワークの加工が開始されたときよりも大きくする装置と、
 を含むことを特徴とするレーザ加工装置。
A mechanism for processing the workpiece by rotating a spot of the laser beam irradiated on the surface of the workpiece and moving the laser beam away from a position where the irradiation of the laser beam is started as the rotation progresses;
An apparatus for increasing the energy of the laser beam between the start and end of processing of the workpiece, compared to when the processing of the workpiece is started;
A laser processing apparatus comprising:
 前記装置は、
 前記スポットが移動する速度が小さい場合よりも大きい場合の方が、前記レーザ光のエネルギを大きくすることを特徴とする請求項1に記載のレーザ加工装置。
The device is
2. The laser processing apparatus according to claim 1, wherein the energy of the laser light is increased when the moving speed of the spot is higher than when the moving speed is low.
 前記装置は、
 前記レーザ光のエネルギを段階的に大きくすることを特徴とする請求項1又は請求項2に記載のレーザ加工装置。
The device is
The laser processing apparatus according to claim 1, wherein the energy of the laser light is increased stepwise.
 前記装置は、
 前記レーザ光のエネルギを連続的に大きくすることを特徴とする請求項1又は請求項2に記載のレーザ加工装置。
The device is
The laser processing apparatus according to claim 1, wherein the energy of the laser beam is continuously increased.
 ワークの表面にレーザ光を照射する工程と、
 前記レーザ光のスポットを旋回させ、かつ旋回が進むにしたがって前記レーザ光の照射を開始した位置から遠ざけて移動させ、前記ワークの加工の開始から終了までの間に、前記レーザ光のエネルギを前記ワークの加工が開始されたときよりも大きくする工程と、
 前記レーザ光の照射を停止する工程と、
 を含むことを特徴とするレーザ加工方法。
Irradiating the surface of the workpiece with laser light;
The laser beam spot is swung, and moved away from the position where the irradiation of the laser beam is started as the turning proceeds, and the energy of the laser beam is changed from the start to the end of machining the workpiece. A process of making the workpiece larger than when machining of the workpiece was started,
Stopping the laser light irradiation;
A laser processing method comprising:
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KR20200112644A (en) 2019-03-22 2020-10-05 비아 메카닉스 가부시키가이샤 Laser processing apparatus and laser processing method
US12103110B2 (en) 2019-03-22 2024-10-01 Via Mechanics, Ltd. Laser processing apparatus and laser processing method
CN114340167A (en) * 2021-12-29 2022-04-12 广州广合科技股份有限公司 Method for manufacturing blind hole of printed circuit board

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