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WO2016003246A1 - Method for texturing glass substrate for solar cell - Google Patents

Method for texturing glass substrate for solar cell Download PDF

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Publication number
WO2016003246A1
WO2016003246A1 PCT/KR2015/006909 KR2015006909W WO2016003246A1 WO 2016003246 A1 WO2016003246 A1 WO 2016003246A1 KR 2015006909 W KR2015006909 W KR 2015006909W WO 2016003246 A1 WO2016003246 A1 WO 2016003246A1
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Prior art keywords
glass substrate
pattern
coating layer
imprint mold
solar cell
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French (fr)
Korean (ko)
Inventor
이헌
신주현
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Korea University Research and Business Foundation
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Korea University Research and Business Foundation
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/70—Surface textures, e.g. pyramid structures
    • H10P76/00—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a method of texturing a surface of a glass substrate for a solar cell.
  • the solar cell generates electron and hole pairs inside the semiconductor of the solar cell by light from the outside, and electrons move to the n-type semiconductor layer and holes are p-type semiconductor by the electric field generated at the PN junction in the electron and hole pair. Produce power by moving to the floor.
  • texturing processes are widely used in solar cells.
  • the surface of the substrate or various layers constituting the solar cell may be roughened. That is, the uneven pattern may be formed on the surface of the substrate or various layers.
  • the unevenness is formed on the surface of the glass substrate for the solar cell by the texturing process, the light primarily reflected from the surface is re-reflected and incident. Therefore, since the reflectance of the solar light is reduced, the amount of light trapping is increased, thereby increasing the photoelectric conversion efficiency of the solar cell.
  • the plasma etching method As an example of the texturing process which is used recently, the plasma etching method, the scribing method, the sand blasting method, etc. are known.
  • a mask layer such as a photoresist or silicon oxide film is formed on the substrate, and the substrate is etched by plasma to form an uneven pattern on the substrate.
  • the process time is long and the process cost is high because expensive vacuum equipment is required.
  • the surface of the substrate is mechanically cut to form a V-shaped groove, and then the surface of the substrate is chemically etched along the groove to form an uneven pattern on the substrate.
  • this also has a problem that takes a long time.
  • the surface of the glass substrate is physically collided with sand to form an uneven pattern on the substrate.
  • the substrate is damaged during the texturing process, such as contamination of the substrate or cracking of the substrate.
  • the Republic of Korea Patent Publication No. 10-2013-0061915 (hereinafter, the prior art) has been proposed recently.
  • the prior art proposes a method of texturing by discharging an etching liquid for etching a glass substrate onto the glass substrate to etch the glass substrate. In this way, however, the glass substrate cannot be textured into a fine pattern, and there is a limit to the accuracy of the pattern.
  • an object of the present invention is to provide a method for texturing a glass substrate for a solar cell that can quickly and accurately form the irregularities of the desired shape on the surface of the glass substrate.
  • the coating layer pattern having the uneven pattern corresponding to the molding pattern is transferred to the glass substrate. Thereafter, the coating layer pattern having the uneven pattern is separated from the imprint mold to convert the coating layer pattern into a low reflection pattern on the glass substrate.
  • the glass substrate in order to transfer the coating layer pattern to the glass substrate, the glass substrate may be pressed toward the imprint mold while heating the imprint mold.
  • the solution may include at least one of a silica sol, an alkali-silicate-based glass aqueous solution and a spin on glass (SOG).
  • a silica sol an alkali-silicate-based glass aqueous solution
  • a spin on glass (SOG) a spin on glass
  • a process of increasing the hardness of the low reflection pattern may be additionally performed.
  • an ion exchange process may be performed.
  • a process of forming a superhydrophobic coating layer on the low reflection pattern may be additionally performed.
  • a low reflection pattern having a concave-convex pattern of a desired shape quickly and accurately can be formed on the surface of a glass substrate.
  • FIG. 1 is a cross-sectional view illustrating a glass substrate texturing method for a solar cell according to an embodiment of the present invention.
  • first and second may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another.
  • the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.
  • FIG. 1 is a cross-sectional view illustrating a glass substrate texturing method for a solar cell according to an embodiment of the present invention.
  • a glass substrate texturing method for a solar cell includes a coating process, a transfer process, a separation process, and an ion exchange process.
  • an imprint mold 200 having a molding pattern is prepared.
  • the imprint mold 200 may be manufactured through mechanical processing, and a molding pattern may be formed through a lithography process to manufacture a nanoscale pattern.
  • the shape of the molding pattern has a shape corresponding to the shape of the final low reflection pattern. Therefore, the molding pattern may be adjusted according to the shape of the final low reflection pattern.
  • the solution 10 containing silicon oxide is coated on the imprint mold 200.
  • the solution includes a silicon oxide and a solvent, such as a silica sol, an alkali-silicate glass aqueous solution, spin on glass (SOG), and the like.
  • a solvent such as a silica sol, an alkali-silicate glass aqueous solution, spin on glass (SOG), and the like.
  • the solution is made of a material similar to glass, any material having fluidity may be used so as to be coated along a molding pattern of an imprint mold.
  • a component similar to glass means that the solvent (for example, an organic solvent) included in the solution is removed as the imprint mold is heated in the transfer process described later, so that the remaining components except the solvent are similar to the glass component. it means.
  • the solvent for example, an organic solvent
  • the transfer process is for transferring a coating layer pattern having an uneven pattern corresponding to the molding pattern onto a glass substrate.
  • the glass substrate 100 is pressed toward the imprint mold 200 while the imprint mold 200 is heated while the glass substrate 100 is positioned on the coating layer pattern.
  • the coating layer pattern 10 is attached to the glass substrate 100, and thus the coating layer pattern having the uneven pattern corresponding to the molding pattern of the imprint mold is transferred to the glass substrate 100.
  • the coating layer pattern 10 having the uneven pattern corresponding to the molding pattern of the imprint mold is attached to the glass substrate 100, the coating layer pattern having the uneven pattern corresponding to the molding pattern may be transferred to the glass substrate. . This is because the surface bonding force between the glass substrate 100 and the coating layer pattern 10 is higher than the surface bonding force between the imprint mold 200 and the coating layer pattern 10.
  • the coating layer pattern is separated from the imprint mold 200.
  • a low reflection pattern converted from the coating layer pattern 10 is formed on the glass substrate 100.
  • a process of increasing the hardness of the low reflection pattern with respect to the separated glass substrate 100 may be additionally performed.
  • an ion exchange process may be additionally performed.
  • a low hardness material eg, Na 2 O
  • a high hardness material CaO or Al 2 O 3
  • the hardness of the low reflection pattern 10 is increased.
  • This ion exchange process can be carried out by immersing the glass substrate in a solution containing ions (ie, ions to be replaced, CaO or Al 2 O 3 ) of the glass substrate, or through other known methods. Can be.
  • a pattern of a desired shape can be easily and accurately formed on the surface of the glass substrate in a new manner different from the existing one.

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  • Surface Treatment Of Glass (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

Disclosed is a method for texturing a glass substrate for a solar cell, wherein an imprint mold, which has a molding pattern formed thereon, is coated with a solution, which comprises a silicon oxide, thereby forming a coating layer pattern on the imprint mold, and, while the glass substrate is positioned on the coating layer pattern, a coating layer pattern, which has a corrugated pattern corresponding to the molding pattern, is transferred to the glass substrate. Thereafter, the coating layer pattern having the corrugated pattern is separated from the imprint mold, thereby converting the coating layer pattern on the glass substrate to a low-reflection pattern.

Description

태양전지용 유리기판 텍스처링 방법Glass substrate texturing method for solar cell

본 발명은 태양전지용 유리기판의 표면을 텍스처링 하는 방법에 관한 것이다.The present invention relates to a method of texturing a surface of a glass substrate for a solar cell.

태양전지는 외부에서 들어온 빛에 의해 태양전지의 반도체 내부에서 전자와 정공의 쌍이 생성되고, 이러한 전자와 정공 쌍에서 PN 접합에서 발생한 전기장에 의해 전자는 n형 반도체층으로 이동하고 정공은 p형 반도체층으로 이동함으로써 전력을 생산한다. The solar cell generates electron and hole pairs inside the semiconductor of the solar cell by light from the outside, and electrons move to the n-type semiconductor layer and holes are p-type semiconductor by the electric field generated at the PN junction in the electron and hole pair. Produce power by moving to the floor.

태양광을 전기 에너지로 변환시킬 수 있는 태양전지의 전력생산 성능에 있어서, 일반적으로 광 에너지를 전기 에너지로 변환시키는 광전변환 효율이 측정된다.한편, 태양전지로 입사된 태양광의 일부는 태양전지에 포함된 복수의 층들 사이의 경계면에서 반사됨으로써 태양전지의 전력 생산에 기여할 수 없게 되어 태양전지의 효율이 감소될 수 있다. 따라서, 태양전지의 효율 감소를 억제하기 위해서는 상술한 바와 같은 태양광의 반사량을 가급적 줄여야 한다.In the power production performance of a solar cell capable of converting sunlight into electrical energy, photoelectric conversion efficiency of converting light energy into electrical energy is generally measured. On the other hand, a part of the sunlight incident to the solar cell is applied to the solar cell. By reflecting at the interface between the plurality of layers included it can not contribute to the power production of the solar cell can be reduced the efficiency of the solar cell. Therefore, in order to suppress a decrease in efficiency of the solar cell, the amount of reflection of sunlight as described above should be reduced as much as possible.

이를 위하여 태양전지에서는 텍스처링(texturing) 공정이 널리 쓰이고 있다. 텍스처링 공정을 통하여 태양전지를 구성하는 기판이나 다양한 층의 표면이 거칠어 질 수 있다. 즉 기판이나 다양한 층의 표면에 요철 형상의 패턴이 형성될 수 있다.. 상기 텍스처링 공정에 의해 태양전지용 유리기판의 표면에 요철이 형성되면 표면에서 1차적으로 반사된 빛이 재반사 되어 입사된다. 따라서, 태양광의 반사율이 감소되므로 이에 따라 광 포획량이 증가되어 태양전지의 광전변환 효율이 증대될 수 있다.For this purpose, texturing processes are widely used in solar cells. Through the texturing process, the surface of the substrate or various layers constituting the solar cell may be roughened. That is, the uneven pattern may be formed on the surface of the substrate or various layers. When the unevenness is formed on the surface of the glass substrate for the solar cell by the texturing process, the light primarily reflected from the surface is re-reflected and incident. Therefore, since the reflectance of the solar light is reduced, the amount of light trapping is increased, thereby increasing the photoelectric conversion efficiency of the solar cell.

근래 사용되는 있는 텍스처링 공정의 예로서, 플라즈마 식각법, 스크라이빙(Scribing)법, 샌드 블라스트법(Sand Blast) 등이 알려져 있다. 상기 플라즈마 식각법에 따르면, 기판상에 포토레지스트 또는 실리콘 산화막과 같은 마스크 레이어를 형성한 후 플라즈마로 기판을 식각하여 기판 상에 요철 패턴을 형성시킨다. 하지만, 상기 플라즈마 식각 공정의 경우, 그 공정 시간이 길며, 고가의 진공 장비가 필요하기 때문에 공정 단가가 높다는 문제점이 있다.As an example of the texturing process which is used recently, the plasma etching method, the scribing method, the sand blasting method, etc. are known. According to the plasma etching method, a mask layer such as a photoresist or silicon oxide film is formed on the substrate, and the substrate is etched by plasma to form an uneven pattern on the substrate. However, in the case of the plasma etching process, the process time is long and the process cost is high because expensive vacuum equipment is required.

한편, 상기 스크라이빙 공정에 따르면, 기판 표면을 기계적으로 절삭하여 V형 홈을 형성한 후 상기 홈을 따라 상기 기판 표면을 화학적으로 식각하여 기판상에 요철 패턴을 형성한다. 하지만, 이 또한 공정 시간이 오래 걸리는 문제점이 있다.According to the scribing process, the surface of the substrate is mechanically cut to form a V-shaped groove, and then the surface of the substrate is chemically etched along the groove to form an uneven pattern on the substrate. However, this also has a problem that takes a long time.

또한, 상기 샌드 블라스트법 공정에 있어서, 유리기판의 표면을 모래 등을 물리적으로 충돌시켜서 기판상에 요철 패턴을 형성한다. 하지만, 기판이 오염되거나 기판에 크랙이 발생하는 등 텍스처링 공정 중 기판이 손상되는 문제점이 있다.In the sand blasting process, the surface of the glass substrate is physically collided with sand to form an uneven pattern on the substrate. However, there is a problem that the substrate is damaged during the texturing process, such as contamination of the substrate or cracking of the substrate.

한편, 상기한 문제점을 해결하고자, 최근에는 대한민국 공개특허 제10-2013-0061915호(이하, 선행기술)가 제안된 바 있다. 상기 선행기술에서는 유리기판을 식각하는 식각액을 유리기판 위로 토출하여 유리기판을 식각함으로써 텍스처링 하는 방법을 제안하고 있다. 하지만, 이러한 방식으로는 유리기판을 미세한 패턴으로 텍스처링 할 수 없고, 패턴의 정확성에 한계가 존재한다.On the other hand, in order to solve the above problems, the Republic of Korea Patent Publication No. 10-2013-0061915 (hereinafter, the prior art) has been proposed recently. The prior art proposes a method of texturing by discharging an etching liquid for etching a glass substrate onto the glass substrate to etch the glass substrate. In this way, however, the glass substrate cannot be textured into a fine pattern, and there is a limit to the accuracy of the pattern.

따라서, 신속하고 정확하게 원하는 형태의 요철을 유리기판 표면에 형성시킬 수 있는 새로운 형태의 태양전지용 유리기판 텍스처링 방법에 관한 개발이 요구되고 있다.Accordingly, there is a need for a new type of solar cell texturing method for forming a solar cell that can quickly and accurately form irregularities of a desired shape on the surface of the glass substrate.

본 발명은 상기한 문제점을 해결하기 위하여 안출된 것으로, 본 발명의 목적은 신속하고 정확하게 원하는 형태의 요철을 유리기판 표면에 형성시킬 수 있는 태양전지용 유리기판 텍스처링 방법을 제공하는 것이다.The present invention has been made to solve the above problems, an object of the present invention is to provide a method for texturing a glass substrate for a solar cell that can quickly and accurately form the irregularities of the desired shape on the surface of the glass substrate.

본 발명의 일 실시예에 따른 태양전지용 유리기판 텍스처링 방법에 있어서, 몰딩 패턴이 형성되어 있는 임프린트 몰드 상에 실리콘 산화물을 포함하는 용액을 코팅하여 상기 임프린트 몰드 상에 코팅층 패턴을 형성하고, 상기 코팅층 패턴 상에 유리기판이 위치한 상태에서, 상기 몰딩 패턴에 대응되는 요철 패턴을 갖는 코팅층 패턴을 상기 유리기판으로 전사시킨다. 이후, 상기 요철 패턴을 갖는 코팅층 패턴을 상기 임프린트 몰드로부터 분리시켜, 상기 유리기판 상에 상기 코팅층 패턴을 저반사 패턴으로 전환시킨다.In the solar cell glass substrate texturing method according to an embodiment of the present invention, by coating a solution containing silicon oxide on an imprint mold having a molding pattern to form a coating layer pattern on the imprint mold, the coating layer pattern In a state where the glass substrate is positioned on the substrate, the coating layer pattern having the uneven pattern corresponding to the molding pattern is transferred to the glass substrate. Thereafter, the coating layer pattern having the uneven pattern is separated from the imprint mold to convert the coating layer pattern into a low reflection pattern on the glass substrate.

본 발명의 일 실시예에 있어서, 상기 코팅층 패턴을 상기 유리기판으로 전사시키기 위하여, 상기 임프린트 몰드를 가열하면서 상기 유리기판을 상기 임프린트 몰드로 향하여 가압할 수 있다.In one embodiment of the present invention, in order to transfer the coating layer pattern to the glass substrate, the glass substrate may be pressed toward the imprint mold while heating the imprint mold.

본 발명의 일 실시예에 있어서, 상기 용액은 실리카 졸, 알카리-규산계 유리 수용액 및 SOG(Spin On Glass) 중 적어도 하나를 포함할 수 있다.In one embodiment of the present invention, the solution may include at least one of a silica sol, an alkali-silicate-based glass aqueous solution and a spin on glass (SOG).

본 발명의 일 실시예에 따른 태양전지용 유리기판 텍스처링 방법에 있어서, 상기 저반사 패턴의 경도를 증대시키는 공정이 추가적으로 수행될 수 있다.In the solar cell glass substrate texturing method according to an embodiment of the present invention, a process of increasing the hardness of the low reflection pattern may be additionally performed.

여기서, 상기 저반사 패턴의 경도를 증대시키 위하여, 이온 교환 공정이 수행될 수 있다.Here, in order to increase the hardness of the low reflection pattern, an ion exchange process may be performed.

본 발명의 일 실시예에 따른 태양전지용 유리기판 텍스처링 방법에 있어서, 상기 저반사 패턴 상에 초소수성 코팅막을 형성하는 공정이 추가적으로 수행될 수 있다.In the method of texturing a glass substrate for a solar cell according to an embodiment of the present invention, a process of forming a superhydrophobic coating layer on the low reflection pattern may be additionally performed.

본 발명에 따르면, 신속하고 정확하게 원하는 형태의 요철 패턴을 구비한 저반사 패턴을 유리기판의 표면에 형성할 수 있다.According to the present invention, a low reflection pattern having a concave-convex pattern of a desired shape quickly and accurately can be formed on the surface of a glass substrate.

도 1은 본 발명의 일 실시예에 따른 태양전지용 유리기판 텍스처링 방법을 설명하기 위한 단면도들이다.1 is a cross-sectional view illustrating a glass substrate texturing method for a solar cell according to an embodiment of the present invention.

이하, 첨부한 도면을 참조하여 본 발명의 실시예들에 대해 상세히 설명한다. 본 발명은 다양한 변경을 가할 수 있고 여러 가지 형태를 가질 수 있는 바, 특정 실시예들을 도면에 예시하고 본문에 상세하게 설명하고자 한다. 그러나, 이는 본 발명을 특정한 개시 형태에 대해 한정하려는 것이 아니며, 본 발명의 사상 및 기술 범위에 포함되는 모든 변경, 균등물 내지 대체물을 포함하는 것으로 이해되어야 한다. 첨부된 도면에 있어서, 대상물들의 크기와 양은 본 발명의 명확성을 기하기 위하여 실제보다 확대 또는 축소하여 도시한 것이다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. In the accompanying drawings, the size and amount of the objects are shown to be enlarged or reduced than actual for clarity of the invention.

제1, 제2 등의 용어는 다양한 구성요소들을 설명하는데 사용될 수 있지만, 상기 구성요소들은 상기 용어들에 의해 한정되어서는 안 된다. 상기 용어들은 하나의 구성요소를 다른 구성요소로부터 구별하는 목적으로만 사용된다. 예를 들어, 본 발명의 권리 범위를 벗어나지 않으면서 제1 구성요소는 제2 구성요소로 명명될 수 있고, 유사하게 제2 구성요소도 제1 구성요소로 명명될 수 있다.Terms such as first and second may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

본 출원에서 사용한 용어는 단지 특정한 실시예를 설명하기 위해 사용된 것으로, 본 발명을 한정하려는 의도가 아니다. 단수의 표현은 문맥상 명백하게 다르게 뜻하지 않는 한, 복수의 표현을 포함한다. 본 출원에서, "포함하다" 또는 "구비하다" 등의 용어는 명세서 상에 기재된 특징, 단계, 기능, 구성요소 또는 이들을 조합한 것이 존재함을 지정하려는 것이지, 다른 특징들이나 단계, 기능, 구성요소 또는 이들을 조합한 것들의 존재 또는 부가 가능성을 미리 배제하지 않는 것으로 이해되어야 한다.The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "include" are intended to indicate that there is a feature, step, function, component, or combination thereof described on the specification, and other features, steps, functions, components Or it does not exclude in advance the possibility of the presence or addition of them in combination.

한편, 다르게 정의되지 않는 한, 기술적이거나 과학적인 용어를 포함해서 여기서 사용되는 모든 용어들은 본 발명이 속하는 기술 분야에서 통상의 지식을 가진 자에 의해 일반적으로 이해되는 것과 동일한 의미를 가지고 있다. 일반적으로 사용되는 사전에 정의되어 있는 것과 같은 용어들은 관련 기술의 문맥 상 가지는 의미와 일치하는 의미를 가지는 것으로 해석되어야 하며, 본 출원에서 명백하게 정의하지 않는 한, 이상적이거나 과도하게 형식적인 의미로 해석되지 않는다.On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

도 1은 본 발명의 일 실시예에 따른 태양전지용 유리기판 텍스처링 방법을 설명하기 위한 단면도들이다.1 is a cross-sectional view illustrating a glass substrate texturing method for a solar cell according to an embodiment of the present invention.

도 1을 참조하면, 본 실시예에 따른 태양전지용 유리기판 텍스처링 방법은 크게 코팅 공정, 전사 공정, 분리 공정 및 이온 교환 공정을 포함한다.Referring to FIG. 1, a glass substrate texturing method for a solar cell according to the present embodiment includes a coating process, a transfer process, a separation process, and an ion exchange process.

도 1의 (a)에 도시된 바와 같이, 코팅 공정에서는 먼저, 몰딩 패턴이 형성되어 있는 임프린트 몰드(200)를 준비한다. 이때, 임프린트 몰드(200)는 기계적인 가공을 통해서도 제작 가능하며, 나노 스케일의 패턴 제작을 위해서는 리소그래피 공정을 통하여 몰딩 패턴이 형성될 수 있다. 상기 몰딩 패턴의 형상은 최종 저반사 패턴의 형상에 대응되는 형상을 가진다. 따라서, 상기 몰딩 패턴은 최종 저반사 패턴의 형상에 따라 조절될 수 있다.As shown in FIG. 1A, in the coating process, first, an imprint mold 200 having a molding pattern is prepared. In this case, the imprint mold 200 may be manufactured through mechanical processing, and a molding pattern may be formed through a lithography process to manufacture a nanoscale pattern. The shape of the molding pattern has a shape corresponding to the shape of the final low reflection pattern. Therefore, the molding pattern may be adjusted according to the shape of the final low reflection pattern.

그리고, 상기 임프린트 몰드(200) 상에 실리콘 산화물을 포함하는 용액(10)을 코팅한다. 이때, 상기 용액은 실리카 졸, 알카리-규산계 유리 수용액, SOG(Spin On Glass) 등과 같은 실리콘 산화물 및 용매를 포함한다. 또한, 상기 용액이 유리와 비슷한 물질로 이루어짐에 따라 임프린트 몰드의 몰딩 패턴을 따라 코팅될 수 있도록 유동성을 가지는 물질이면 모두 이용 가능하다.  Then, the solution 10 containing silicon oxide is coated on the imprint mold 200. In this case, the solution includes a silicon oxide and a solvent, such as a silica sol, an alkali-silicate glass aqueous solution, spin on glass (SOG), and the like. In addition, as the solution is made of a material similar to glass, any material having fluidity may be used so as to be coated along a molding pattern of an imprint mold.

참고로, 유리와 비슷한 성분이라 함은, 후술하는 전사 공정에서 임프린트 몰드가 가열됨에 따라 용액에 포함된 용매(예를 들어 유기용매)는 제거되므로, 용매를 제외한 나머지 성분이 유리 성분과 비슷함을 의미한다.For reference, a component similar to glass means that the solvent (for example, an organic solvent) included in the solution is removed as the imprint mold is heated in the transfer process described later, so that the remaining components except the solvent are similar to the glass component. it means.

도 1의 (b)에 도시된 바와 같이, 전사 공정은 상기 몰딩 패턴에 대응되는 요철 패턴을 갖는 코팅층 패턴을 유리기판으로 전사하기 위한 것이다. 전사 공정에서는 먼저 유리기판(100)을 코팅층 패턴 상에 위치한 상태에서, 임프린트 몰드(200)를 가열하면서 유리기판(100)을 임프린트 몰드(200)를 향하여 가압한다. 그러면, 코팅층 패턴(10)이 유리기판(100)에 부착되고, 이에 따라 임프린트 몰드의 몰딩 패턴에 대응되는 요철 패턴을 갖는 코팅층 패턴이 유리기판(100)으로 전사된다. 다시 말하면, 임프린트 몰드의 몰딩 패턴에 대응되는 요철 패턴을 가지는 코팅층 패턴 (10)이 유리기판(100)에 부착됨에 따라 상기 몰딩 패턴에 대응되는 요철 패턴을 갖는 코팅층 패턴이 유리기판으로 전사될 수 있다. 이는 유리기판(100)과 코팅층 패턴(10) 사이의 표면결합력이 임프린트 몰드(200)와 코팅층 패턴(10) 사이의 표면결합력 보다 높기 때문이다.As shown in (b) of FIG. 1, the transfer process is for transferring a coating layer pattern having an uneven pattern corresponding to the molding pattern onto a glass substrate. In the transfer process, the glass substrate 100 is pressed toward the imprint mold 200 while the imprint mold 200 is heated while the glass substrate 100 is positioned on the coating layer pattern. Then, the coating layer pattern 10 is attached to the glass substrate 100, and thus the coating layer pattern having the uneven pattern corresponding to the molding pattern of the imprint mold is transferred to the glass substrate 100. In other words, as the coating layer pattern 10 having the uneven pattern corresponding to the molding pattern of the imprint mold is attached to the glass substrate 100, the coating layer pattern having the uneven pattern corresponding to the molding pattern may be transferred to the glass substrate. . This is because the surface bonding force between the glass substrate 100 and the coating layer pattern 10 is higher than the surface bonding force between the imprint mold 200 and the coating layer pattern 10.

도 1의 (c)에 도시된 바와 같이, 분리 공정에서는 코팅층 패턴을 임프린트 몰드(200)로부터 분리한다. 이로써, 상기 유리기판(100) 상에 상기 코팅층 패턴(10)으로 부터 전환된 저반사 패턴이 형성된다.As shown in FIG. 1C, in the separation process, the coating layer pattern is separated from the imprint mold 200. As a result, a low reflection pattern converted from the coating layer pattern 10 is formed on the glass substrate 100.

이후, 도 1의 (d)에 도시된 바와 같이, 분리된 유리기판(100)에 대한 상기 저반사 패턴의 경도를 증대시키는 공정이 추가적으로 수행될 수 있다. 이를 위하여, 이온 교환 공정을 추가적으로 수행될 수 있다. 이온 교환 공정에서는, 이온 교환을 통하여 유리기판, 보다 정확하게는 유리기판에 부착된 저반사 패턴(10)에서 저경도 물질(예를 Na2O)을 고경도의 물질(CaO 또는 Al2O3)로 치환시키며, 이에 따라 저반사 패턴(10)의 경도가 증가한다. 이와 같은 이온 교환 공정은, 유리기판을 이온(즉, 대체하고자 하는 이온, CaO 또는 Al2O3)이 포함된 용액에 유리기판을 담금으로써 수행될 수 있고, 기타 공지되어 있는 다른 방식을 통해서도 수행될 수 있다.Thereafter, as shown in FIG. 1D, a process of increasing the hardness of the low reflection pattern with respect to the separated glass substrate 100 may be additionally performed. To this end, an ion exchange process may be additionally performed. In the ion exchange process, a low hardness material (eg, Na 2 O) is converted into a high hardness material (CaO or Al 2 O 3 ) in a low reflection pattern 10 attached to a glass substrate, more precisely, a glass substrate through ion exchange. The hardness of the low reflection pattern 10 is increased. This ion exchange process can be carried out by immersing the glass substrate in a solution containing ions (ie, ions to be replaced, CaO or Al 2 O 3 ) of the glass substrate, or through other known methods. Can be.

한편, 이온 교환 공정 이후에는, 유리기판의 표면(즉, 요철 패턴이 형성된 저반사 패턴의 표면)에 초소수성 코팅층을 추가적으로 형성함으로써, 자정 작용을 가지는 유리기판을 제조할 수 있다. On the other hand, after the ion exchange process, by additionally forming a superhydrophobic coating layer on the surface of the glass substrate (that is, the surface of the low reflection pattern with the uneven pattern formed), it is possible to manufacture a glass substrate having a self-cleaning action.

상술한 바와 같이, 본 발명에 따르면 기존과는 다른 새로운 방식으로, 유리기판의 표면에 원하는 형태의 패턴을 용이하고 정확하게 형성할 수 있다.As described above, according to the present invention, a pattern of a desired shape can be easily and accurately formed on the surface of the glass substrate in a new manner different from the existing one.

이상에서 본 발명의 바람직한 실시예에 대해 도시하고 설명하였으나, 본 발명은 상술한 특정의 바람직한 실시예에 한정되지 아니하며, 청구범위에서 청구하는 본 발명의 요지를 벗어남이 없이 당해 발명이 속하는 기술분야에서 통상의 지식을 가진 자라면 누구든지 다양한 변형 실시가 가능한 것은 물론이고, 그와 같은 변경은 청구범위 기재의 범위 내에 있게 된다.Although the preferred embodiments of the present invention have been shown and described above, the present invention is not limited to the specific preferred embodiments described above, and the present invention belongs to the present invention without departing from the gist of the present invention as claimed in the claims. Various modifications can be made by those skilled in the art, and such changes are within the scope of the claims.

Claims (6)

몰딩 패턴이 형성되어 있는 임프린트 몰드 상에 실리콘 산화물을 포함하는 용액을 코팅하여 상기 임프린트 몰드 상에 코팅층 패턴을 형성하는 단계;Coating a solution containing silicon oxide on an imprint mold having a molding pattern formed thereon to form a coating layer pattern on the imprint mold; 상기 코팅층 패턴 상에 유리기판이 위치한 상태에서, 상기 몰딩 패턴에 대응되는 요철 패턴을 갖는 코팅층 패턴을 상기 유리기판으로 전사시키는 단계; 및Transferring a coating layer pattern having a concave-convex pattern corresponding to the molding pattern to the glass substrate while the glass substrate is positioned on the coating layer pattern; And 상기 요철 패턴을 갖는 코팅층 패턴을 상기 임프린트 몰드로부터 분리시켜, 상기 유리기판 상에 상기 코팅층 패턴을 저반사 패턴으로 전환시키는 단계를 포함하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.Separating the coating layer pattern having the uneven pattern from the imprint mold, and converting the coating layer pattern into a low reflection pattern on the glass substrate. 제1항에 있어서,The method of claim 1, 상기 코팅층 패턴을 상기 유리기판으로 전사시키는 단계는, 상기 임프린트 몰드를 가열하면서 상기 유리기판을 상기 임프린트 몰드로 향하여 가압하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.The transferring of the coating layer pattern to the glass substrate may include pressing the glass substrate toward the imprint mold while heating the imprint mold. 제1항에 있어서,The method of claim 1, 상기 용액은 실리카 졸, 알카리-규산계 유리 수용액 및 SOG(Spin On Glass) 중 적어도 하나를 포함하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.The solution is a glass substrate texturing method for a solar cell, characterized in that it comprises at least one of a silica sol, an alkali-silicate glass aqueous solution and a spin on glass (SOG). 제1항에 있어서, 상기 저반사 패턴의 경도를 증대시키는 단계를 더 포함하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.The glass substrate texturing method of claim 1, further comprising increasing hardness of the low reflection pattern. 제4항에 있어서, 상기 저반사 패턴의 경도를 증대시키는 단계는 이온 교환 공정을 수행하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.5. The method of claim 4, wherein increasing the hardness of the low reflection pattern is performed by an ion exchange process. 6. 제1항에 있어서, 상기 저반사 패턴 상에 초소수성 코팅막을 형성하는 단계를 더 포함하는 것을 특징으로 하는 태양전지용 유리기판 텍스처링 방법.The glass substrate texturing method of claim 1, further comprising forming a superhydrophobic coating layer on the low reflection pattern.
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